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TW201841566A - Pest control composition containing pyridone compound and quinoline-based compound, method for controlling pests, and novel quinoline compound - Google Patents

Pest control composition containing pyridone compound and quinoline-based compound, method for controlling pests, and novel quinoline compound Download PDF

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Publication number
TW201841566A
TW201841566A TW107112219A TW107112219A TW201841566A TW 201841566 A TW201841566 A TW 201841566A TW 107112219 A TW107112219 A TW 107112219A TW 107112219 A TW107112219 A TW 107112219A TW 201841566 A TW201841566 A TW 201841566A
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Taiwan
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group
substituent
formula
appropriately substituted
alkyl
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TW107112219A
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Chinese (zh)
Inventor
福元健志
梅谷豪毅
伊藤寬之
小原敏明
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日商三井化學Agro股份有限公司
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Publication of TW201841566A publication Critical patent/TW201841566A/en

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    • AHUMAN NECESSITIES
    • A01AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01NPRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
    • A01N43/00Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds
    • A01N43/34Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one nitrogen atom as the only ring hetero atom
    • A01N43/40Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one nitrogen atom as the only ring hetero atom six-membered rings
    • AHUMAN NECESSITIES
    • A01AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01NPRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
    • A01N43/00Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds
    • A01N43/34Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one nitrogen atom as the only ring hetero atom
    • A01N43/40Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one nitrogen atom as the only ring hetero atom six-membered rings
    • A01N43/42Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one nitrogen atom as the only ring hetero atom six-membered rings condensed with carbocyclic rings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D403/00Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00
    • C07D403/02Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings
    • C07D403/04Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings directly linked by a ring-member-to-ring-member bond

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  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Pest Control & Pesticides (AREA)
  • Plant Pathology (AREA)
  • Agronomy & Crop Science (AREA)
  • Engineering & Computer Science (AREA)
  • Dentistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Zoology (AREA)
  • Environmental Sciences (AREA)
  • Agricultural Chemicals And Associated Chemicals (AREA)
  • Plural Heterocyclic Compounds (AREA)

Abstract

An object of the invention is to provide a pest control composition that contains a novel active ingredient and is effective in the control of pests, a method for using such a composition, and a novel quinoline-based compound. The invention provides a pest control composition containing, as an active ingredient, at least one component exhibiting pest control activity selected from the group consisting of compounds represented by formula (1) shown below or salts thereof and quinoline-based compounds, and also provides a novel quinoline-based compound which exhibits pest control activity. In the formula, R1 represents an alkyl group of 1 to 6 carbon atoms which may be substituted, or a haloalkyl group of 1 to 6 carbon atoms or the like, R2 represents a halogen atom, an alkyl group of 1 to 6 carbon atoms which may be substituted, or an alkoxy group of 1 to 6 carbon atoms which may be substituted or the like, R3 represents a hydrogen atom, a halogen atom, or an alkyl group of 1 to 6 carbon atoms which may be substituted or the like, n represents an integer from 0 to 5, X represents an oxygen atom or a sulfur atom, Y represents a phenyl group with a substituent at the ortho position, or a pyridyl group or the like, and the bond that includes the dashed line portion represents a double bond or a single bond.

Description

含有吡啶酮化合物及喹啉系化合物之有害生物防除組成物及有害生物之防除方法、及新穎喹啉系化合物Pesticide-controlling composition containing pyridone compound and quinoline-based compound, method for controlling pests, and novel quinoline-based compound

本發明係關於含有吡啶酮化合物與1種以上之喹啉系化合物作為有效成分之有害生物防除組成物、及新穎的喹啉系化合物。The present invention relates to a pest control composition containing a pyridone compound and one or more quinoline compounds as active ingredients, and a novel quinoline compound.

於農園藝產業,自以往為了防除害蟲、病原菌、雜草等有害生物,一般使用適合各有害生物之防除的農藥。 再者,為了同時防除各種有害生物等,會使用含有多數有效成分的混合組成物。In the agriculture and horticulture industry, in order to prevent pests, pathogenic bacteria, weeds and other harmful organisms, pesticides suitable for the control of various pests have generally been used. Furthermore, in order to prevent various pests and the like at the same time, a mixed composition containing a large number of active ingredients is used.

另一方面,由於長年使用藥劑,出現獲得藥劑耐受性之抗藥性害蟲、耐受性菌,難以利用習知藥劑予以防除的情形增加,因此不斷需要有新的有害生物防除劑。又,為了減少發生抗藥性害蟲、耐受性菌的風險,會使用有不同作用機轉的有效成分組合成的混合劑。On the other hand, due to the use of pharmaceuticals for many years, drug-resistant pests and resistant bacteria that have acquired drug resistance have increased, and it has been difficult to control them with conventional pharmaceuticals. Therefore, new pest control agents are continuously required. In addition, in order to reduce the risk of drug-resistant pests and tolerant bacteria, a mixture of active ingredients having different mechanisms of action is used.

關於1,3,5,6-取代-2-吡啶酮化合物,已有人揭示作為例如:GABA alpha-2/3配體之在3位具有芳基或雜芳基之1,3,5,6-取代-2-吡啶酮化合物(例如參照國際公開第98/55480號)。又,作為細菌性感染症之治療藥,已有人揭示在3位具羧基之1,3,5,6-取代-2-吡啶酮化合物(例如參照歐洲專利第0308020說明書)。但是國際公開第98/55480號及歐洲專利第0308020說明書記載之化合物之用途之用途皆係關於醫藥,和本發明之有害生物防除組成物所屬之技術領域不同。Regarding 1,3,5,6-substituted-2-pyridone compounds, it has been disclosed, for example, that GABA alpha-2 / 3 ligands have aryl or heteroaryl 1,3,5,6 at the 3-position -A substituted-2-pyridone compound (see, for example, International Publication No. 98/55480). In addition, as a therapeutic agent for bacterial infections, a 1,3,5,6-substituted-2-pyridone compound having a carboxyl group at the 3-position has been disclosed (for example, refer to the specification of European Patent No. 0308020). However, the applications of the compounds described in International Publication No. 98/55480 and European Patent No. 0308020 are all related to medicine, and are different from the technical field to which the pest control composition of the present invention belongs.

關於式(2a)或式(2b)表示之喹啉系化合物,專利文獻3、4揭示喹啉系化合物作為殺菌劑,對於稻之稻熱病(Pyricularia oryzae)及番茄、黃瓜及菜豆之灰黴病(Botrytis cinerea)、黃瓜蔓割病(Fusarium oxysporum)等病害,以莖葉散布、土壤處理、種子處理等處理方法顯示有防除效果。又,專利文獻5、6,係針對式(2a)或式(2b)表示之喹啉系化合物與某種殺菌劑之混合揭示,針對與本發明之吡啶酮化合物之混合並未揭示。 [先前技術文獻] [專利文獻]Regarding the quinoline-based compound represented by formula (2a) or formula (2b), Patent Documents 3 and 4 disclose quinoline-based compounds as fungicides, which are effective against Pyricularia oryzae and tomato, cucumber and kidney bean gray mold (Botrytis cinerea), Fusarium oxysporum, and other diseases, such as stem and leaf spread, soil treatment, seed treatment and other treatment methods have shown control effects. In addition, Patent Documents 5 and 6 disclose the mixing of a quinoline-based compound represented by the formula (2a) or the formula (2b) with a certain fungicide, and do not disclose the mixing with the pyridone compound of the present invention. [Prior Art Literature] [Patent Literature]

[專利文獻1] 國際公開第98/55480號 [專利文獻2] 歐洲專利第0308020說明書 [專利文獻3] 國際公開第05/070917號 [專利文獻4] 國際公開第08/066148號 [專利文獻5] 國際公開第11/077514號 [專利文獻6] 國際公開第15/141867號[Patent Literature 1] International Publication No. 98/55480 [Patent Literature 2] European Patent No. 0308020 Specification [Patent Literature 3] International Publication No. 05/070917 [Patent Literature 4] International Publication No. 08/066148 [Patent Literature 5 ] International Publication No. 11/077514 [Patent Document 6] International Publication No. 15/141867

(發明欲解決之課題)(Problems to be Solved by the Invention)

但是前述含有多數有效成分之混合組成物中,會有比起以單劑使用時對於有害生物之效果降低的情形,故急切希望含有新的有效成分且對於有害生物發揮充分防除效果之混合組成物。 本發明之課題在於提供含有新穎吡啶酮化合物或其鹽與喹啉系化合物之組合之發揮有用防除效果之有害生物防除組成物、及其使用方法、及發揮有用防除效果之新穎喹啉系化合物。 (解決課題之方式)However, the above-mentioned mixed composition containing many active ingredients may have a lower effect on pests than when used in a single agent, so it is anxious for a mixed composition containing new active ingredients and exhibiting a sufficient control effect on pests. . An object of the present invention is to provide a pest control composition containing a novel pyridone compound or a salt thereof in combination with a quinoline compound, which exhibits a useful control effect, a method for using the same, and a novel quinoline compound which exhibits a useful control effect. (The way to solve the problem)

本案發明人等為了解決前述課題,針對1,3,5,6-取代-2-吡啶酮化合物群及1,5,6-取代-2-吡啶酮化合物群努力研究,結果發現:含有針對該2-吡啶酮骨架中之6位於鄰位導入了有取代基之芳基或雜芳基的化合物群與1種以上之喹啉系化合物作為有效成分之有害生物防除組成物、及新穎的喹啉系化合物,會發揮優良的有害生物防除活性,乃完成本發明。 亦即本發明如下。In order to solve the above-mentioned problems, the inventors of the present case have studied the 1,3,5,6-substituted-2-pyridone compound group and the 1,5,6-substituted-2-pyridone compound group, and found that A group of compounds in which a substituted aryl or heteroaryl group and 6 or more quinoline compounds are introduced as active ingredients in the 2-pyridone skeleton is introduced at the ortho position, and a novel quinoline This compound has excellent pest control activity and has completed the present invention. That is, the present invention is as follows.

[1] 一種有害生物防除組成物,含有式(1)表示之吡啶酮化合物或其鹽、及選自式(2a)及式(2b)表示之喹啉系化合物或其鹽中之1種以上之成分作為有效成分; 【化1】[式中,R1,表示 羥基、 氰基、 亦可經取代基A適當取代之C1~C6之烷基、 C1~C6之鹵烷基、 亦可經取代基A適當取代之C3~C8之環烷基、 亦可經取代基A適當取代之C2~C6之烯基、 C2~C6之鹵烯基、 亦可經取代基A適當取代之C2~C6之炔基、 C2~C6之鹵炔基、 亦可經取代基A適當取代之C1~C6之烷氧基、 C1~C6之鹵烷氧基、 亦可經取代基A適當取代之C3~C8之環烷氧基、 亦可經取代基A適當取代之C2~C6之烯氧基、 C2~C6之鹵烯氧基、 亦可經取代基A適當取代之C3~C6之炔氧基、 C3~C6之鹵炔氧基、 或R10R11N-,在此,R10及R11各自獨立地表示氫原子、或C1~C6之烷基; R2,表示 鹵素原子、 羥基、 氰基、 硝基、 亦可經取代基B適當取代之C1~C6之烷基、 C1~C6之鹵烷基、 亦可經取代基B適當取代之C3~C8之環烷基、 亦可經取代基B適當取代之C2~C6之烯基、 C2~C6之鹵烯基、 亦可經取代基B適當取代之C2~C6之炔基、 C2~C6之鹵炔基、 亦可經取代基B適當取代之C1~C6之烷氧基、 C1~C6之鹵烷氧基、 亦可經取代基B適當取代之C3~C8之環烷氧基、 亦可經取代基B適當取代之C2~C6之烯氧基、 C2~C6之鹵烯氧基、 亦可經取代基B適當取代之C3~C6之炔氧基、 C3~C6之鹵炔氧基、 R20C(=O)-,在此,R20為C1~C6之烷基、C1~C6之鹵烷基、C3~C8之環烷基、C1~C6之烷氧基、C1~C6之鹵烷氧基、C3~C8之環烷氧基、或R21R22N-,在此,R21及R22各自獨立地表示氫原子、亦可經取代基B1適當取代之C1~C6之烷基、C1~C6之鹵烷基、或C3~C8之環烷基、或表示R21及R22和鍵結之氮原子成為一體而形成氮丙啶基、四氫吖唉基、吡咯啶基、哌啶基、高哌啶基、或氮雜環辛烷基者、 R20C(=O)O-,在此,R20同前述含義、 含有1~2個氧原子之3~6員環之基、 R23-L2-,在此,R23表示C1~C6之烷基、或C1~C6之鹵烷基,L2表示S、SO、或SO2 、 R21R22N-,在此,R21及R22同前述含義、 或R24C(=O)N(R25)-,在此,R24表示氫原子、C1~C6之烷基、C1~C6之鹵烷基、C3~C8之環烷基、C1~C6之烷氧基、C1~C6之鹵烷氧基、C3~C8之環烷氧基、或R21R22N-,在此,R21及R22同前述含義,R25表示氫原子、亦可經取代基B1適當取代之C1~C6之烷基、C1~C6之鹵烷基、或C3~C8之環烷基; R3,表示 氫原子、 鹵素原子、 硝基、 亦可經取代基C適當取代之C1~C6之烷基、 C1~C6之鹵烷基、 亦可經取代基C適當取代之C3~C8之環烷基、 亦可經取代基C適當取代之C1~C6之烷氧基、 C1~C6之鹵烷氧基、 亦可經取代基C適當取代之C2~C6之烯基、 C2~C6之鹵烯基、 亦可經取代基C適當取代之C2~C6之炔基、 C2~C6之鹵炔基、 R30-L3-,在此,R30同前述R23含義、L3同前述L2含義、 R31R32N-,在此,R31及R32同前述R21及R22之含義、 或R33C(=O)-,在此,R33表示C1~C6之烷基、C1~C6之鹵烷基、或C3~C8之環烷基; n為0~5之整數,惟n為2以上時,2以上之R2表示各自獨立的取代基; X表示氧原子、或硫原子; Y表示苯基、吡啶基、嗒基、嘧啶基、吡基、三基、四基、噻吩基、噻唑基、異噻唑基、或噻二唑基, 該苯基中,取代基D取代在鄰位,進而經取代基D1各自獨立地有適當0~4個取代, 該吡啶基、該吡基、該嘧啶基、該嗒基、該三基、或該四基中,取代基D取代在鄰位,且進而經取代基D1各自獨立而有適當0~3個取代, 該噻吩基、該噻唑基、該異噻唑基、或該噻二唑基中,取代基D取代在鄰位,且經取代基D1各自獨立地有適當0~2個取代; 含有破折線部之鍵結,代表雙鍵、或單鍵, 且取代基A,表示選自由羥基、氰基、C3~C8之環烷基、C1~C6之烷氧基、C1~C6之鹵烷氧基、C3~C8之環烷氧基、R12R13N-、及R14-L1-(在此,R12及R13各自獨立地表示氫原子、C1~C6之烷基、C1~C6之鹵烷基、或C3~C8之環烷基、或表示R12及R13和鍵結之氮原子成為一體而形成氮丙啶基、四氫吖唉基、吡咯啶基、哌啶基、高哌啶基、或氮雜環辛烷基者,在此,R14表示C1~C6之烷基、或C1~C6之鹵烷基,L1表示S、SO、或SO2 )構成之群組中之至少1種; 取代基B,表示選自由羥基、氰基、C3~C8之環烷基、C1~C6之烷氧基、C1~C6之鹵烷氧基、C3~C8之環烷氧基、C2~C6之烷氧基烷氧基、R21R22N-(在此,R21及R22同前述含義)、R23-L2-(在此,R23及L2同前述含義)、R26R27R28Si-(在此,R26、R27及R28,各自獨立地表示C1~C6之烷基)、R26R27R28Si-(CH2 )s-O-(在此,s表示1~3之整數,R26、R27及R28同前述含義)、R20C(=O)-(在此,R20同前述含義)、及含有1~2個氧原子之3~6員環之基構成之群組中之至少1種; 取代基B1,表示選自由氰基、C1~C6之烷氧基、C1~C6之鹵烷氧基、及C3~C8之環烷氧基構成之群組中之至少1種; 取代基C,表示選自由羥基、氰基、C3~C8之環烷基、C1~C6之烷氧基、C1~C6之鹵烷氧基、C3~C8之環烷氧基、R31R32N-(在此,R31及R32同前述R21及R22之含義)、及R30-L3-(在此,R30同前述R14之含義、L3同前述L1之含義)構成之群組中之至少1種; 取代基D,選自由鹵素原子、C1~C6之烷基、C1~C6之鹵烷基、C1~C6之烷氧基、及C1~C6之鹵烷氧基構成之群組中之至少1種; 取代基D1,選自由羥基、鹵素原子、C1~C6之烷基、C1~C6之鹵烷基、C3~C8之環烷基、C1~C6之烷氧基、C1~C6之鹵烷氧基、及C3~C8之環烷氧基構成之群組中之至少1種; 【化2】[式中,R2a及R2b各自獨立地表示 亦可經取代基E1適當取代之C1~C6之烷基、 亦可經取代基E2適當取代之芳基、 亦可經取代基E3適當取代之雜芳基、 或亦可經取代基E2適當取代之芳烷基、 或也可R2a與R2b與它們所鍵結之碳原子成為一體而形成亦可經取代基E4適當取代之C3~C10之環烷基環; R2c及R2d各自獨立地表示 氫原子、 亦可經取代基E1適當取代之C1~C6之烷基、 鹵素原子、 C1~C6之烷氧基、 或羥基、 或也可R2c與R2d與它們所鍵結之碳原子成為一體而形成羰基或亦可經取代基E4適當取代之C3~C10之環烷基環; R2e,表示 氫原子、 C2~C7之醯基、 或亦可經取代基E1適當取代之C1~C6之烷基; X1,表示 鹵素原子、 亦可經取代基E5適當取代之C1~C6之烷基、 亦可經取代基E6適當取代之C2~C6之烯基、 亦可經取代基E7適當取代之C2~C6之炔基、 亦可經取代基E2適當取代之芳基、 亦可經取代基E3適當取代之雜芳基、 C1~C6之烷氧基、 亦可經取代基E8適當取代之胺基、 C2~C7之醯基、 氰基、 或也可經取代基E9取代羥基之氫原子之N-羥基烷醯亞胺基; X2表示鹵素原子、C1~C6之烷基、C1~C6之烷氧基或羥基, n1表示0~4之整數、 n2表示0~6之整數、 取代基E1,表示選自由鹵素原子、C1~C6之烷氧基、C1~C6之烷基硫基及苯氧基構成之群組中之至少1種; 取代基E2,表示選自由鹵素原子、C1~C6之烷基、C1~C6之鹵烷基、C1~C6之烷氧基、亦可經取代基E8適當取代之胺基、硝基、氰基、羥基、巰基及C1~C6之烷基硫基構成之群組中之至少1種; 取代基E3,表示選自由鹵素原子、C1~C6之烷基、C1~C6之鹵烷基及C1~C6之烷氧基構成之群組中之至少1種; 取代基E4,表示選自由鹵素原子、C1~C6之烷基、C1~C6之烷氧基及苯氧基構成之群組中之至少1種; 取代基E5,表示選自由鹵素原子、C1~C6之烷氧基、羥基、C2~C7之烷氧基羰基及苯氧基構成之群組中之至少1種; 取代基E6,表示選自由鹵素原子、C1~C6之烷氧基、C2~C7之烷氧基羰基及苯氧基構成之群組中之至少1種; 取代基E7,表示選自由鹵素原子、C1~C6之烷氧基及苯氧基構成之群組中之至少1種; 取代基E8,表示選自由C1~C6之烷基及C2~C7之醯基構成之群組中之至少1種; 取代基E9,表示選自由C1~C6之烷基、C2~C6之烯基、C2~C6之炔基、芳烷基、芳基及雜芳基構成之群組中之至少1種]。[1] A pest control composition comprising a pyridone compound or a salt thereof represented by formula (1), and one or more selected from quinoline-based compounds or salts thereof represented by formula (2a) and formula (2b) Ingredients as effective ingredients; [化 1] [In the formula, R1 represents a hydroxyl group, a cyano group, a C1-C6 alkyl group which may be appropriately substituted by a substituent A, a C1-C6 haloalkyl group, and a C3-C8 ring which may also be appropriately substituted by a substituent A. Alkyl, C2 to C6 alkenyl, which may be appropriately substituted with substituent A, C2 to C6 haloalkenyl, C2 to C6 alkynyl, which may be appropriately substituted with substituent A, C2 to C6 haloalkynyl , C1 ~ C6 alkoxy groups that can be appropriately substituted with substituent A, C1 ~ C6 haloalkoxy groups, C3 ~ C8 cycloalkoxy groups that can also be appropriately substituted with substituent A, or substituents C2 ~ C6 alkenyloxy, C2 ~ C6 haloalkenyloxy suitably substituted by A, C3 ~ C6 alkynyloxy optionally substituted by substituent A, C3 ~ C6 haloalkynyloxy, or R10R11N- Here, R10 and R11 each independently represent a hydrogen atom or an alkyl group of C1 to C6; R2 represents a halogen atom, a hydroxyl group, a cyano group, a nitro group, or a C1 to C6 alkane which may be appropriately substituted by a substituent B Group, C1 to C6 haloalkyl group, C3 to C8 cycloalkyl group which may be appropriately substituted with substituent B, C2 to C6 alkenyl group which may be appropriately substituted with substituent B, and C2 to C6 haloalkenyl group C2 ~ C6 alkynes which can also be appropriately substituted by substituent B , C2 ~ C6 haloalkynyl, C1 ~ C6 alkoxy which can be appropriately substituted by substituent B, C1 ~ C6 haloalkoxy, and C3 ~ C8 cycloalkane which can also be appropriately substituted by substituent B Oxygen, C2 ~ C6 alkenyloxy, which may be appropriately substituted by substituent B, haloalkenoxy of C2 ~ C6, alkynyloxy of C3 ~ C6, which may also be appropriately substituted by substituent B, C3 ~ C6 Haloalkynyloxy, R20C (= O)-, where R20 is C1 ~ C6 alkyl, C1 ~ C6 haloalkyl, C3 ~ C8 cycloalkyl, C1 ~ C6 alkoxy, C1 ~ C6 haloalkoxy, C3 to C8 cycloalkoxy, or R21R22N-. Here, R21 and R22 each independently represent a hydrogen atom, and C1 to C6 alkyl, C1 which may be appropriately substituted by substituent B1. A haloalkyl group of ~ C6, or a cycloalkyl group of C3 ~ C8, or R21 and R22 and a bonded nitrogen atom are integrated to form aziridinyl, tetrahydroazetino, pyrrolidinyl, piperidinyl, Homopiperidinyl, or azaoctyl, R20C (= O) O-, where R20 has the same meaning as above, a 3- to 6-membered ring group containing 1 to 2 oxygen atoms, R23-L2- where, R23 represents alkyl group of C1 ~ C6, or haloalkyl of C1 ~ C6, L2 represents S, SO, or SO 2, R21R22N-, here, R 21 and R22 have the same meanings as above, or R24C (= O) N (R25)-, where R24 represents a hydrogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group, C1 to C6 alkoxy, C1 to C6 haloalkoxy, C3 to C8 cycloalkoxy, or R21R22N-. Here, R21 and R22 have the same meanings as above, R25 represents a hydrogen atom, and may also be substituted. B1 appropriately substituted C1-C6 alkyl, C1-C6 haloalkyl, or C3-C8 cycloalkyl; R3 represents a hydrogen atom, a halogen atom, a nitro group, or C1 that may be appropriately substituted by a substituent C ~ C6 alkyl, C1 ~ C6 haloalkyl, C3 ~ C8 cycloalkyl which can be appropriately substituted by substituent C, C1 ~ C6 alkoxy which can also be appropriately substituted by substituent C, C1 ~ C6 haloalkoxy, C2 to C6 alkenyl, which may be appropriately substituted with substituent C, C2 to C6 haloalkenyl, C2 to C6 alkynyl, which may be appropriately substituted with substituent C, C2 to C6 Haloalkynyl, R30-L3-, where R30 has the meaning of the aforementioned R23, L3 has the meaning of the aforementioned L2, R31R32N-, and here, R31 and R32 have the meaning of the aforementioned R21 and R22, or R33C (= O)-, Here, R33 represents an alkyl group of C1 to C6, a haloalkyl group of C1 to C6, or a cycloalkyl group of C3 to C8; n is 0 to 5 Integer, but when n is 2 or more, two or more of R2 each independently represents a substituent group; X represents an oxygen atom or a sulfur atom; Y represents phenyl, pyridyl, despair Base, pyrimidinyl, pyridine Base, three Base, four Group, thienyl group, thiazolyl group, isothiazolyl group, or thiadiazolyl group, in the phenyl group, the substituent D is substituted in the ortho position, and further, each of the substituents D1 independently has appropriate 0 to 4 substitutions, and the pyridyl group The pyridine Group, the pyrimidinyl group, the da Base, the three Base, or the four In the group, the substituent D is substituted in the ortho position, and further, each of the substituents D1 is independently substituted with appropriate 0 to 3 substitutions. The group D is substituted in the ortho position, and each of the substituents D1 independently has appropriate 0 to 2 substitutions; the bond containing a dashed line portion represents a double bond or a single bond, and the substituent A is selected from the group consisting of a hydroxyl group and a cyanide Group, C3 to C8 cycloalkyl, C1 to C6 alkoxy, C1 to C6 haloalkoxy, C3 to C8 cycloalkoxy, R12R13N-, and R14-L1- (here, R12 and R13 each independently represents a hydrogen atom, a C1 to C6 alkyl group, a C1 to C6 haloalkyl group, or a C3 to C8 cycloalkyl group, or R12 and R13 and a bonded nitrogen atom to form an aziridine. Group, tetrahydroacryl group, pyrrolidinyl, piperidinyl, homopiperidinyl, or azaoctyl group, where R14 represents a C1-C6 alkyl group or a C1-C6 haloalkyl group L1 represents at least one of the group consisting of S, SO, or SO 2 ); Substituent B represents a group selected from the group consisting of hydroxy, cyano, cycloalkyl from C3 to C8, alkoxy from C1 to C6, C1 ~ C6 haloalkoxy, C3 ~ C8 cycloalkoxy, C2 ~ C 6 alkoxyalkoxy, R21R22N- (here, R21 and R22 have the same meaning as above), R23-L2- (here, R23 and L2 have the same meaning as above), R26R27R28Si- (here, R26, R27, and R28 , Each independently represents an alkyl group of C1 to C6), R26R27R28Si- (CH 2 ) sO- (here, s represents an integer of 1 to 3, R26, R27 and R28 have the same meanings as above), R20C (= O)-( Here, R20 has the same meaning as above) and at least one member of the group consisting of a 3 to 6-membered ring containing 1 to 2 oxygen atoms; the substituent B1 represents a alkane selected from the group consisting of cyano and C1 to C6 At least one of the group consisting of oxy, C1 to C6 haloalkoxy, and C3 to C8 cycloalkoxy; the substituent C represents a cycloalkyl group selected from hydroxy, cyano, and C3 to C8 , C1 ~ C6 alkoxy, C1 ~ C6 haloalkoxy, C3 ~ C8 cycloalkoxy, R31R32N- (here, R31 and R32 have the same meaning as R21 and R22 mentioned above), and R30-L3- (Herein, R30 has the meaning of R14 and L3 has the meaning of L1 above); at least one of the group consisting of: D is selected from a halogen atom, an alkyl group of C1 to C6, and a haloalkane of C1 to C6 Group, at least one of the group consisting of C1 ~ C6 alkoxy group and C1 ~ C6 haloalkoxy group; substituent D1, Selected from the group consisting of hydroxyl, halogen atom, C1-C6 alkyl, C1-C6 haloalkyl, C3-C8 cycloalkyl, C1-C6 alkoxy, C1-C6 haloalkoxy, and C3- At least one member of the group consisting of cycloalkoxy groups of C8; [In the formula, R2a and R2b each independently represent an alkyl group of C1 to C6 which may be appropriately substituted by the substituent E1, an aryl group which may be appropriately substituted by the substituent E2, and a heteroaryl group which may be appropriately substituted by the substituent E3. Group, or an aralkyl group which may be appropriately substituted by the substituent E2, or R2a and R2b may be integrated with the carbon atom to which they are bonded to form a cycloalkyl group of C3 to C10 which may also be appropriately substituted by the substituent E4 Ring; R2c and R2d each independently represent a hydrogen atom, an alkyl group of C1 to C6 which may also be appropriately substituted by a substituent E1, a halogen atom, an alkoxy group of C1 to C6, or a hydroxyl group, or R2c and R2d may be used with them The bonded carbon atoms become one to form a carbonyl group or a cycloalkyl ring of C3 ~ C10 which can also be appropriately substituted by the substituent E4; R2e represents a hydrogen atom, a fluorenyl group of C2 ~ C7, or it may also be substituted by E1 Appropriately substituted C1 to C6 alkyl groups; X1 represents a halogen atom, C1 to C6 alkyl groups that may be appropriately substituted with substituent E5, C2 to C6 alkenyl groups that may also be appropriately substituted with substituent E6, or C2 ~ C6 alkynyl suitably substituted with substituent E7, aryl optionally substituted with substituent E2, and optionally substituted E3 Appropriately substituted heteroaryl, C1-C6 alkoxy groups, amine groups that may also be appropriately substituted with substituents E8, fluorenyl groups from C2-C7, cyano groups, or hydrogen atoms that may also be substituted with a substituent E9 N-hydroxyalkanoimide group; X2 represents a halogen atom, an alkyl group of C1 to C6, an alkoxy group or a hydroxyl group of C1 to C6, n1 represents an integer of 0 to 4, n2 represents an integer of 0 to 6, substituent E1 , Represents at least one selected from the group consisting of a halogen atom, an alkoxy group of C1 to C6, an alkylthio group of C1 to C6, and a phenoxy group; and the substituent E2 represents a group selected from a halogen atom, C1 to C6 Alkyl, C1 ~ C6 haloalkyl, C1 ~ C6 alkoxy, amine, nitro, cyano, hydroxy, mercapto, and C1 ~ C6 alkylthio At least one of the group consisting of; the substituent E3 represents at least one selected from the group consisting of a halogen atom, an alkyl group of C1 to C6, a haloalkyl group of C1 to C6, and an alkoxy group of C1 to C6 The substituent E4 represents at least one selected from the group consisting of a halogen atom, an alkyl group of C1 to C6, an alkoxy group of C1 to C6, and a phenoxy group; the substituent E5 represents a group selected from a halogen atom, C1 ~ C6 alkoxy At least one of the group consisting of a hydroxy group, a hydroxyl group, an alkoxycarbonyl group of C2 to C7, and a phenoxy group; the substituent E6 represents a group selected from a halogen atom, an alkoxy group of C1 to C6, and an alkoxy group of C2 to C7 At least one member of the group consisting of carbonyl and phenoxy groups; the substituent E7 represents at least one member selected from the group consisting of halogen atoms, alkoxy groups of C1 to C6, and phenoxy groups; the substituent group E8 , Represents at least one selected from the group consisting of C1 to C6 alkyl groups and C2 to C7 fluorenyl groups; the substituent E9 represents a group selected from C1 to C6 alkyl groups, C2 to C6 alkenyl groups, C2 to C6 is at least one member of the group consisting of alkynyl, aralkyl, aryl, and heteroaryl].

[2] 如[1]之有害生物防除組成物,其中,式(1)表示之吡啶酮化合物中, R1表示 氰基、 亦可經取代基A適當取代之C1~C6之烷基、 C1~C6之鹵烷基、 亦可經取代基A適當取代之C3~C8之環烷基、 亦可經取代基A適當取代之C2~C6之烯基、 C2~C6之鹵烯基、 亦可經取代基A適當取代之C2~C6之炔基、 或R10R11N-,在此,R10及R11各自獨立地表示氫原子、或C1~C6之烷基; R2,表示 鹵素原子、 羥基、 氰基、 亦可經取代基B適當取代之C1~C6之烷基、 C1~C6之鹵烷基、 亦可經取代基B適當取代之C1~C6之烷氧基、 C1~C6之鹵烷氧基、 亦可經取代基B適當取代之C3~C8之環烷氧基、 亦可經取代基B適當取代之C2~C6之烯氧基、 亦可經取代基B適當取代之C3~C6之炔氧基、 R20C(=O)O-(在此,R20表示C1~C6之烷基、C1~C6之鹵烷基、C3~C8之環烷基、C1~C6之烷氧基、C1~C6之鹵烷氧基、C3~C8之環烷氧基、或R21R22N-(在此,R21及R22各自獨立地表示氫原子、亦可經取代基B1適當取代之C1~C6之烷基、C1~C6之鹵烷基、或C3~C8之環烷基、或表示R21及R22和鍵結之氮原子成為一體而形成氮丙啶基、四氫吖唉基、吡咯啶基、哌啶基、高哌啶基、或氮雜環辛烷基者))、 或R23-L2-(在此,R23表示C1~C6之烷基、或C1~C6之鹵烷基,L2表示S、SO、或SO2 ); R3,表示 氫原子、 鹵素原子、 亦可經取代基C適當取代之C1~C6之烷基、 亦可經取代基C適當取代之C3~C8之環烷基、 亦可經取代基C適當取代之C1~C6之烷氧基、 亦可經取代基C適當取代之C2~C6之炔基、 或R30-L3-,在此,R30同前述R23含義、L3同前述L2含義; Y,為苯基、或吡啶基, 該苯基中,取代基D取代在鄰位,進而經取代基D1各自獨立地有適當0~4個取代, 該吡啶基中,取代基D取代在鄰位,且進而經取代基D1各自獨立而有適當0~3個取代。[2] The pest control composition according to [1], wherein in the pyridone compound represented by the formula (1), R1 represents a cyano group, a C1-C6 alkyl group, and C1- C6 haloalkyl, C3 to C8 cycloalkyl which may be appropriately substituted with substituent A, C2 to C6 alkenyl which may be appropriately substituted with substituent A, C2 to C6 haloalkenyl, or C2 ~ C6 alkynyl, or R10R11N-, which is appropriately substituted by substituent A, where R10 and R11 each independently represent a hydrogen atom or an alkyl group of C1-C6; R2 represents a halogen atom, a hydroxyl group, a cyano group, or C1-C6 alkyl, C1-C6 haloalkyl, which may be appropriately substituted by substituent B, C1-C6 alkoxy, C1-C6 haloalkoxy, which may also be appropriately substituted by substituent B C3 ~ C8 cycloalkoxy groups which may be appropriately substituted with substituent B, C2 ~ C6 alkoxy groups which may be appropriately substituted with substituent B, and C3 ~ C6 alkynyloxy groups which may be appropriately substituted with substituent B , R20C (= O) O- (Here, R20 represents C1-C6 alkyl, C1-C6 haloalkyl, C3-C8 cycloalkyl, C1-C6 alkoxy, C1-C6 halogen Alkoxy, C3 ~ C8 cycloalkoxy, or R21R22N- (here, R21 and R22 C1-C6 alkyl group, C1-C6 haloalkyl group, C3-C8 cycloalkyl group, or R21 and R22 and bonded nitrogen Atoms are integrated to form aziridinyl, tetrahydroacryl, pyrrolidinyl, piperidinyl, homopiperidinyl, or azaoctyl) Represents C1 ~ C6 alkyl, or C1 ~ C6 haloalkyl, L2 represents S, SO, or SO 2 ); R3 represents hydrogen atom, halogen atom, or C1 ~ C6 which can be appropriately substituted by substituent C Alkyl, C3 ~ C8 cycloalkyl, which may be appropriately substituted with substituent C, C1 ~ C6 alkoxy, which may be appropriately substituted with substituent C, C2 ~ C6, which may be appropriately substituted with substituent C Alkynyl, or R30-L3-, where R30 has the same meaning as R23 and L3 has the same meaning as L2; Y is phenyl or pyridyl, in which the substituent D is substituted in the ortho position and further substituted Each of the groups D1 independently has appropriate 0 to 4 substitutions. In the pyridyl group, the substituent D is substituted in the ortho position, and further, each of the substituents D1 is independently substituted with appropriate 0 to 3 substitutions.

[3] 如[2]之有害生物防除組成物,其中,式(1)表示之吡啶酮化合物中, R1表示亦可經取代基A適當取代之C1~C6之烷基、或C1~C6之鹵烷基; R2表示鹵素原子、亦可經取代基B適當取代之C1~C6之烷基、或亦可經取代基B適當取代之C1~C6之烷氧基; R3表示氫原子、鹵素原子、或亦可經取代基C適當取代之C1~C6之烷基。[3] The pest control composition according to [2], wherein in the pyridone compound represented by the formula (1), R1 represents a C1-C6 alkyl group or a C1-C6 alkyl group which can also be appropriately substituted by a substituent A Haloalkyl; R2 represents a halogen atom, an alkyl group of C1 to C6 which may be appropriately substituted by substituent B, or an alkoxy group of C1 to C6 which may also be appropriately substituted by substituent B; R3 represents a hydrogen atom, a halogen atom Or a C1-C6 alkyl group which may be appropriately substituted by a substituent C.

[4] 如[1]之有害生物防除組成物,其中, 式(2a)或式(2b)表示之喹啉系化合物中, R2a及R2b各自獨立地為亦可經取代基E1適當取代之C1~C6之烷基, R2c及R2d各自獨立地為氫原子、亦可經取代基E1適當取代之C1~C6之烷基或鹵素原子, R2e為氫原子或亦可經取代基E1適當取代之C1~C6之烷基, X1為鹵素原子, X2為鹵素原子, n1為0~4之整數, n2為0~6之整數。[4] The pest control composition according to [1], wherein, in the quinoline-based compound represented by formula (2a) or formula (2b), R2a and R2b are each independently C1 which may be appropriately substituted by substituent E1 ~ C6 alkyl, R2c and R2d are each independently a hydrogen atom, an alkyl or halogen atom of C1 ~ C6 which may be appropriately substituted by substituent E1, R2e is a hydrogen atom or C1 which may also be appropriately substituted by substituent E1 An alkyl group of ~ C6, X1 is a halogen atom, X2 is a halogen atom, n1 is an integer of 0 to 4, and n2 is an integer of 0 to 6.

[5] 如[1]之有害生物防除組成物,其中, 式(2a)或式(2b)表示之喹啉系化合物為式(2c)或式(2d)表示之喹啉系化合物; 【化3】[式中,R2f表示氫原子或甲基,X3、X4及X5各自獨立地表示氫原子或氟原子,X6及X7各自獨立地表示氫原子、甲基或氟原子]。[5] The pest control composition according to [1], wherein the quinoline compound represented by formula (2a) or (2b) is a quinoline compound represented by formula (2c) or (2d); 3] [In the formula, R2f represents a hydrogen atom or a methyl group, X3, X4, and X5 each independently represent a hydrogen atom or a fluorine atom, and X6 and X7 each independently represent a hydrogen atom, a methyl group, or a fluorine atom].

[6] 如[4]之有害生物防除組成物,其中,式(2a)或式(2b)表示之喹啉系化合物係選自由3-(4,4-二氟-3,3-二甲基-3,4-二氫異喹啉-1-基)喹啉、3-(4,4-二氟-3,3-二甲基-3,4-二氫異喹啉-1-基)-8-氟喹啉、8-氟-3-(5-氟-3,3,4,4-四甲基-1,2,3,4-四氫異喹啉-1-基)喹啉及8-氟-3-(5-氟-3,3-二甲基-3,4-二氫異喹啉-1-基)喹啉構成之群組中之至少1種。[6] The pest control composition according to [4], wherein the quinoline compound represented by formula (2a) or formula (2b) is selected from the group consisting of 3- (4,4-difluoro-3,3-dimethyl -3,4-dihydroisoquinolin-1-yl) quinoline, 3- (4,4-difluoro-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl ) -8-fluoroquinoline, 8-fluoro-3- (5-fluoro-3,3,4,4-tetramethyl-1,2,3,4-tetrahydroisoquinolin-1-yl) quine And at least one member of the group consisting of 8-fluoro-3- (5-fluoro-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) quinoline.

[7] 一種防除有害生物之方法,係施用如[1]之有害生物防除組成物。[7] A method for controlling pests by applying a pest control composition such as [1].

[8] 一種防除有害生物之方法,係同時施用含有如[1]之式(1)表示之吡啶酮化合物或其鹽作為有效成分之組成物、及含有如[1]之式(2a)或式(2b)表示之喹啉系化合物或其鹽作為有效成分之組成物。[8] A method for controlling pests, comprising simultaneously applying a composition containing a pyridone compound or a salt thereof represented by formula (1) as shown in [1] as an active ingredient, and containing a formula (2a) as shown in [1] or A composition in which a quinoline compound or a salt thereof represented by formula (2b) is an active ingredient.

[9] 一種防除有害生物之方法,係施用含有如[1]之式(1)表示之吡啶酮化合物或其鹽作為有效成分之組成物、或含有如[1]之式(2a)或式(2b)表示之喹啉系化合物或其鹽作為有效成分之組成物中之任一者後再施用另一者之組成物。[9] A method for controlling pests by applying a composition containing a pyridone compound or a salt thereof represented by formula (1) as in [1] as an active ingredient, or containing formula (2a) or formula as in [1] Any one of the quinoline-based compounds represented by (2b) or a salt thereof as an active ingredient is applied to the other composition.

[10] 一種喹啉系化合物或其鹽,係如[5]之式(2c)或式(2d)表示之喹啉系化合物,R2f為氫原子或甲基,X3為氟原子,X4、X5、X6及X7各自獨立地為氫原子或氟原子,惟式(2c)中,X4、X5、X6或X7中之至少一者為氟原子,式(2d)中,X4或X5中任一者為氟原子。[10] A quinoline-based compound or a salt thereof, which is a quinoline-based compound represented by formula (2c) or formula (2d) in [5], R2f is a hydrogen atom or a methyl group, X3 is a fluorine atom, X4, X5 , X6 and X7 are each independently a hydrogen atom or a fluorine atom, but in formula (2c), at least one of X4, X5, X6 or X7 is a fluorine atom, and in formula (2d), any of X4 or X5 is Is a fluorine atom.

[11] 如[10]之喹啉系化合物或其鹽,其中,式(2c)或式(2d)表示之喹啉系化合物為3-(4,4-二氟-3,3-二甲基-3,4-二氫異喹啉-1-基)-8-氟喹啉、8-氟-3-(5-氟-3,3,4,4-四甲基-1,2,3,4-四氫異喹啉-1-基)喹啉、或8-氟-3-(5-氟-3,3-二甲基-3,4-二氫異喹啉-1-基)喹啉。[11] The quinoline compound or a salt thereof according to [10], wherein the quinoline compound represented by the formula (2c) or the formula (2d) is 3- (4,4-difluoro-3,3-dimethyl -3,4-dihydroisoquinolin-1-yl) -8-fluoroquinoline, 8-fluoro-3- (5-fluoro-3,3,4,4-tetramethyl-1,2, 3,4-tetrahydroisoquinolin-1-yl) quinoline, or 8-fluoro-3- (5-fluoro-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl )quinoline.

[12] 如[11]之喹啉系化合物或其鹽,其中,式(2c)或式(2d)表示之喹啉系化合物為3-(4,4-二氟-3,3-二甲基-3,4-二氫異喹啉-1-基)-8-氟喹啉或8-氟-3-(5-氟-3,3,4,4-四甲基-1,2,3,4-四氫異喹啉-1-基)喹啉。[12] The quinoline compound or a salt thereof according to [11], wherein the quinoline compound represented by the formula (2c) or the formula (2d) is 3- (4,4-difluoro-3,3-dimethyl -3,4-dihydroisoquinolin-1-yl) -8-fluoroquinoline or 8-fluoro-3- (5-fluoro-3,3,4,4-tetramethyl-1,2, 3,4-tetrahydroisoquinolin-1-yl) quinoline.

[13] 一種防除有害生物之方法,包括下列步驟: 對於需要防除有害生物之植物個體、種子、土壤、苗箱、或穴盤施用有效量之如[1]之式(I)之化合物或其鹽及式(2a)或式(2b)表示之喹啉系化合物或其鹽。[13] A method for controlling pests, comprising the steps of: applying an effective amount of a compound of formula (I) as described in [1] or a plant, seed, soil, seed box, or tray to the pests A salt and a quinoline-based compound represented by formula (2a) or formula (2b) or a salt thereof.

[14] 一種如[1]之式(I)之化合物或其鹽及式(2a)或式(2b)表示之喹啉系化合物或其鹽之用途,係作為有害生物防除劑。 (發明之效果)[14] The use of a compound of formula (I) or a salt thereof as in [1] and a quinoline compound or a salt thereof represented by formula (2a) or formula (2b), as a pest control agent. (Effect of the invention)

依照本發明,可提供含有新穎之有效成分之對於防除有害生物有用的有害生物防除組成物及其使用方法、及新穎的喹啉系化合物。According to the present invention, it is possible to provide a pest control composition useful for controlling pests containing a novel active ingredient, a method for using the same, and a novel quinoline compound.

以下針對本實施方式説明。 又,申請專利範圍及說明書中使用的各用語,若無特別指明,係依該技術領域一般使用的定義 本說明書中,使用之簡稱說明如下。 DMF:N,N-二甲基甲醯胺、THF:四氫呋喃、Me:甲基、Et:乙基、Pr:丙基、Bu:丁基、Pentyl:戊基、Hexyl:己基、Ac:乙醯基、Ph:苯基、Py:吡啶基、i:異、sec:第二、t:第三、c:環、=:雙鍵、≡:參鍵。表之欄位內,單獨的“-”代表無取代,關於Pr、Bu、Pentyl、Hexyl無接頭辭時,代表為正(normal)。 -di-:-二-、-tri-:-三-、-penta-:-五-、1,3-dioxolan-2-yl:1,3-二氧雜環戊烷-2-基、1,3-dioxan-2-yl:1,3-二氧雜環己烷-2-基。This embodiment will be described below. It should be noted that the terms used in the scope of patent application and the description in the specification, unless otherwise specified, are in accordance with the definitions commonly used in the technical field, and the abbreviations used in the specification are described below. DMF: N, N-dimethylformamide, THF: tetrahydrofuran, Me: methyl, Et: ethyl, Pr: propyl, Bu: butyl, Pentyl: pentyl, Hexyl: hexyl, Ac: acetamidine Group, Ph: phenyl, Py: pyridyl, i: iso, sec: second, t: third, c: ring, =: double bond, ≡: reference bond. In the column of the table, a single “-” stands for no substitution. When Pr, Bu, Pentyl, and Hexyl have no linker, it means normal. -di-:-di-, -tri-:-tri-, -penta-:-penta-, 1,3-dioxolan-2-yl: 1,3-dioxolan-2-yl, 1 , 3-dioxan-2-yl: 1,3-dioxan-2-yl.

以下針對本說明書中使用之用語之定義說明。 Cx~Cy之記載,代表有x個至y個碳原子。 用語「亦可經適當取代」,係指經取代或無取代。使用此用語時,若未明示取代基之數目時,代表取代基之數為1。 C1~C6之烷基,可以為直鏈狀或分支狀,可列舉甲基、乙基、丙基、異丙基、丁基、異丁基、第二丁基、第三丁基、戊基、異戊基、2-甲基丁基、新戊基、1-乙基丙基、己基、4-甲基戊基、3-甲基戊基、2-甲基戊基、1-甲基戊基、3,3-二甲基丁基、2,2-二甲基丁基、1,1-二甲基丁基、1,2-二甲基丁基、1,3-二甲基丁基、2,3-二甲基丁基、或2-乙基丁基等。The definitions of the terms used in this manual are explained below. The records of Cx ~ Cy represent x to y carbon atoms. The term "may also be appropriately substituted" means substituted or unsubstituted. When this term is used, if the number of substituents is not specified, the number of substituents is 1. The C1-C6 alkyl group may be linear or branched, and examples thereof include methyl, ethyl, propyl, isopropyl, butyl, isobutyl, second butyl, third butyl, and pentyl , Isopentyl, 2-methylbutyl, neopentyl, 1-ethylpropyl, hexyl, 4-methylpentyl, 3-methylpentyl, 2-methylpentyl, 1-methyl Amyl, 3,3-dimethylbutyl, 2,2-dimethylbutyl, 1,1-dimethylbutyl, 1,2-dimethylbutyl, 1,3-dimethyl Butyl, 2,3-dimethylbutyl, or 2-ethylbutyl.

鹵素原子可列舉氟原子、氯原子、溴原子、碘原子等。Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.

C1~C6之鹵烷基,係指前述C1~C6之烷基中之氫原子經1個或2個以上之鹵素原子任意取代而得者。經2個以上之鹵素原子取代時,此等鹵素原子可相同也可不同,其取代數只要能以取代基的形式存在即無特殊限制。C1~C6之鹵烷基之具體例可列舉一氟甲基、二氟甲基、三氟甲基、一氯甲基、一溴甲基、一碘甲基、氯二氟甲基、溴二氟甲基、1-氟乙基、2-氟乙基、1,1-二氟乙基、2,2-二氟乙基、2,2,2-三氟乙基、1,1,2,2-四氟乙基、五氟乙基、2,2,2-三氯乙基、3,3-二氟丙基、3,3,3-三氟丙基、七氟丙基、七氟異丙基、2,2,2-三氟-1-(三氟甲基)乙基、九氟丁基、九氟-第二丁基、3,3,4,4,5,5,5-七氟戊基、十一氟戊基、十三氟己基等。C1 ~ C6 haloalkyl refers to those obtained by arbitrarily substituting one or more halogen atoms of hydrogen atoms in the aforementioned C1 ~ C6 alkyl groups. When two or more halogen atoms are substituted, these halogen atoms may be the same or different, and the number of substitutions is not particularly limited as long as they can exist as substituents. Specific examples of the C1-C6 haloalkyl group include monofluoromethyl, difluoromethyl, trifluoromethyl, monochloromethyl, monobromomethyl, monoiodomethyl, chlorodifluoromethyl, and bromodi Fluoromethyl, 1-fluoroethyl, 2-fluoroethyl, 1,1-difluoroethyl, 2,2-difluoroethyl, 2,2,2-trifluoroethyl, 1,1,2 2,2-tetrafluoroethyl, pentafluoroethyl, 2,2,2-trichloroethyl, 3,3-difluoropropyl, 3,3,3-trifluoropropyl, heptafluoropropyl, hepta Fluoroisopropyl, 2,2,2-trifluoro-1- (trifluoromethyl) ethyl, nonafluorobutyl, nonafluoro-second butyl, 3,3,4,4,5,5, 5-heptafluoropentyl, undecafluoropentyl, tridecylfluorohexyl and the like.

C1~C6之氟烷基,代表前述C1~C6之烷基中之氫原子經1個或2個以上之氟原子任意取代而得者。C1~C6之氟烷基之具體例可列舉一氟甲基、二氟甲基、三氟甲基、1-氟乙基、2-氟乙基、1,1-二氟乙基、2,2-二氟乙基、2,2,2-三氟乙基、1,1,2,2-四氟乙基、五氟乙基、3,3-二氟丙基、3,3,3-三氟丙基、七氟丙基、七氟異丙基、2,2,2-三氟-1-(三氟甲基)乙基、九氟丁基、九氟-第二丁基、3,3,4,4,5,5,5-七氟戊基、十一氟戊基、十三氟己基等。The fluoroalkyl group of C1 to C6 represents a hydrogen atom in the aforementioned C1 to C6 alkyl group obtained by arbitrarily replacing one or more fluorine atoms. Specific examples of the fluoroalkyl group of C1 to C6 include monofluoromethyl, difluoromethyl, trifluoromethyl, 1-fluoroethyl, 2-fluoroethyl, 1,1-difluoroethyl, and 2, 2-difluoroethyl, 2,2,2-trifluoroethyl, 1,1,2,2-tetrafluoroethyl, pentafluoroethyl, 3,3-difluoropropyl, 3,3,3 -Trifluoropropyl, heptafluoropropyl, heptafluoroisopropyl, 2,2,2-trifluoro-1- (trifluoromethyl) ethyl, nonafluorobutyl, nonafluoro-second butyl, 3,3,4,4,5,5,5-heptafluoropentyl, undecafluoropentyl, tridecylfluorohexyl, etc.

C3~C8之環烷基,係指環丙基、環丁基、環戊基、環己基、環庚基、或環辛基等。C3 ~ C8 cycloalkyl refers to cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, or cyclooctyl.

C2~C6之烯基,表示有1個或2個以上之雙鍵且為直鏈狀或分支狀不飽和烴基者。又,有幾何異構物時,為僅E體或Z體中之一者,或E體與Z體之任意比例之混合物,只要是指定碳數之範圍即無特殊限制。 C2~C6之烯基之具體例可列舉乙烯基、1-丙烯基、烯丙基、1-丁烯基、2-丁烯基、3-丁烯基、1-戊烯基、2-戊烯基、3-戊烯基、4-戊烯基、3-甲基-2-丁烯基、1-己烯基、2-己烯基、3-己烯基、4-己烯基、5-己烯基、4-甲基-3-戊烯基、3-甲基-2-戊烯基等。The C2 to C6 alkenyl group means one having one or two or more double bonds and being a linear or branched unsaturated hydrocarbon group. When there are geometric isomers, it is only one of E-form or Z-form, or a mixture of E-form and Z-form in any ratio, and there is no particular limitation as long as it is within the specified carbon number range. Specific examples of the alkenyl group of C2 to C6 include vinyl, 1-propenyl, allyl, 1-butenyl, 2-butenyl, 3-butenyl, 1-pentenyl, and 2-pentyl. Alkenyl, 3-pentenyl, 4-pentenyl, 3-methyl-2-butenyl, 1-hexenyl, 2-hexenyl, 3-hexenyl, 4-hexenyl, 5-hexenyl, 4-methyl-3-pentenyl, 3-methyl-2-pentenyl, and the like.

C2~C6之鹵烯基,係指前述C2~C6之烯基中之氫原子經1個或2個以上之鹵素原子任意取代而得者。經2個以上之鹵素原子取代時,此等鹵素原子可相同也可不同,其取代數只要能以取代基的形式存在即無特殊限制。C2~C6之鹵烯基之具體例可列舉2-氟乙烯基、2,2-二氟乙烯基、2,2-二氯乙烯基、3-氟烯丙基、3,3-二氟烯丙基、3,3-二氯烯丙基、4,4-二氟-3-丁烯基、5,5-二氟-4-戊烯基、6,6-二氟-5-己烯基等。C2 ~ C6 haloalkenyl refers to those obtained by arbitrarily replacing one or more halogen atoms of hydrogen atoms in the alkenyl groups of C2 ~ C6. When two or more halogen atoms are substituted, these halogen atoms may be the same or different, and the number of substitutions is not particularly limited as long as they can exist as substituents. Specific examples of the haloalkenyl group of C2 to C6 include 2-fluorovinyl, 2,2-difluorovinyl, 2,2-dichlorovinyl, 3-fluoroallyl, and 3,3-difluoroene. Propyl, 3,3-dichloroallyl, 4,4-difluoro-3-butenyl, 5,5-difluoro-4-pentenyl, 6,6-difluoro-5-hexene Base etc.

C2~C6之炔基,係指有1個或2個以上之參鍵,且為直鏈狀或分支狀不飽和烴基者。C2~C6之炔基之具體例可列舉乙炔基、1-丙炔基、炔丙基、1-丁炔基、2-丁炔基、3-丁炔基、1-戊炔基、2-戊炔基、3-戊炔基、4-戊炔基、1,1-二甲基-2-丙炔基、1-己炔基、2-己炔基、3-己炔基、4-己炔基、5-己炔基等。C2 ~ C6 alkynyl refers to those which have one or more than two reference bonds and are linear or branched unsaturated hydrocarbon groups. Specific examples of the alkynyl group of C2 to C6 include ethynyl, 1-propynyl, propargyl, 1-butynyl, 2-butynyl, 3-butynyl, 1-pentynyl, 2- Pentynyl, 3-pentynyl, 4-pentynyl, 1,1-dimethyl-2-propynyl, 1-hexynyl, 2-hexynyl, 3-hexynyl, 4- Hexynyl, 5-hexynyl and the like.

C2~C6之鹵炔基,係指前述C2~C6之炔基中之氫原子經1個或2個以上之鹵素原子任意取代而得者。經2個以上之鹵素原子取代時,此等鹵素原子可相同也可不同,其取代數只要能以取代基的形式存在即無特殊限制。C2~C6之鹵炔基之具體例可列舉2-氟乙炔基、2-氯乙炔基、2-溴乙炔基、2-碘乙炔基、3,3-二氟-1-丙炔基、3-氯-3,3-二氟-1-丙炔基、3-溴-3,3-二氟-1-丙炔基、3,3,3-三氟-1-丙炔基、4,4-二氟-1-丁炔基、4,4-二氟-2-丁炔基、4-氯-4,4-二氟-1-丁炔基、4-氯-4,4-二氟-2-丁炔基、4-溴-4,4-二氟-1-丁炔基、4-溴-4,4-二氟-2-丁炔基、4,4,4-三氟-1-丁炔基、4,4,4-三氟-2-丁炔基、5,5-二氟-3-戊炔基、5-氯-5,5-二氟-3-戊炔基、5-溴-5,5-二氟-3-戊炔基、5,5,5-三氟-3-戊炔基、6,6-二氟-4-己炔基、6-氯-6,6-二氟-4-己炔基、6-溴-6,6-二氟-4-己炔基、6,6,6-三氟-4-己炔基等。C2 ~ C6 haloalkynyl refers to those obtained by arbitrarily replacing one or more halogen atoms of hydrogen atoms in the alkynyl groups of C2 ~ C6. When two or more halogen atoms are substituted, these halogen atoms may be the same or different, and the number of substitutions is not particularly limited as long as they can exist as substituents. Specific examples of the haloalkynyl group of C2 to C6 include 2-fluoroethynyl, 2-chloroethynyl, 2-bromoethynyl, 2-iodoethynyl, 3,3-difluoro-1-propynyl, 3 -Chloro-3,3-difluoro-1-propynyl, 3-bromo-3,3-difluoro-1-propynyl, 3,3,3-trifluoro-1-propynyl, 4, 4-difluoro-1-butynyl, 4,4-difluoro-2-butynyl, 4-chloro-4,4-difluoro-1-butynyl, 4-chloro-4,4-di Fluoro-2-butynyl, 4-bromo-4,4-difluoro-1-butynyl, 4-bromo-4,4-difluoro-2-butynyl, 4,4,4-trifluoro -1-butynyl, 4,4,4-trifluoro-2-butynyl, 5,5-difluoro-3-pentynyl, 5-chloro-5,5-difluoro-3-pentyne , 5-bromo-5,5-difluoro-3-pentynyl, 5,5,5-trifluoro-3-pentynyl, 6,6-difluoro-4-hexynyl, 6-chloro -6,6-difluoro-4-hexynyl, 6-bromo-6,6-difluoro-4-hexynyl, 6,6,6-trifluoro-4-hexynyl and the like.

C1~C6之烷氧基,係指前述C1~C6之烷基經由氧原子鍵結成者。C1~C6之烷氧基具體而言可列舉甲氧基、乙氧基、丙氧基、異丙氧基、丁氧基、異丁氧基、第二丁氧基、第三丁氧基、戊氧基、異戊氧基、2-甲基丁氧基、新戊氧基、1-乙基丙氧基、己氧基、4-甲基戊氧基、3-甲基戊氧基、2-甲基戊氧基、1-甲基戊氧基、3,3-二甲基丁氧基、2,2-二甲基丁氧基、1,1-二甲基丁氧基、1,2-二甲基丁氧基、1,3-二甲基丁氧基、2,3-二甲基丁氧基、及2-乙基丁氧基等。The C1-C6 alkoxy group refers to those in which the C1-C6 alkyl group is bonded via an oxygen atom. Specific examples of the alkoxy group of C1 to C6 include methoxy, ethoxy, propoxy, isopropoxy, butoxy, isobutoxy, second butoxy, third butoxy, Pentyloxy, isopentyloxy, 2-methylbutoxy, neopentyloxy, 1-ethylpropoxy, hexyloxy, 4-methylpentoxy, 3-methylpentoxy, 2-methylpentoxy, 1-methylpentoxy, 3,3-dimethylbutoxy, 2,2-dimethylbutoxy, 1,1-dimethylbutoxy, 1 , 2-dimethylbutoxy, 1,3-dimethylbutoxy, 2,3-dimethylbutoxy, and 2-ethylbutoxy.

C1~C6之鹵烷氧基,係指前述C1~C6之烷氧基中之氫原子經1個或2個以上之鹵素原子任意取代而得者。經2個以上之鹵素原子取代時,此等鹵素原子可相同也可不同,其取代數只要能以取代基的形式存在即無特殊限制。C1~C6之鹵烷氧基之具體例可列舉二氟甲氧基、三氟甲氧基、氯二氟甲氧基、溴二氟甲氧基、2-氟乙氧基、2,2-二氟乙氧基、2,2,2-三氟乙氧基、1,1,2,2-四氟乙氧基、五氟乙氧基、2,2,2-三氯乙氧基、3,3-二氟丙氧基、3,3,3-三氟丙氧基、七氟丙氧基、七氟異丙氧基、2,2,2-三氟-1-(三氟甲基)-乙氧基、九氟丁氧基、九氟-第二丁氧基、3,3,4,4,5,5,5-七氟戊氧基、十一氟戊氧基、十三氟己氧基等。C1 ~ C6 haloalkoxy refers to those obtained by arbitrarily replacing one or more halogen atoms of hydrogen atoms in the alkoxy groups of C1 ~ C6. When two or more halogen atoms are substituted, these halogen atoms may be the same or different, and the number of substitutions is not particularly limited as long as they can exist as substituents. Specific examples of the haloalkoxy group of C1 to C6 include difluoromethoxy, trifluoromethoxy, chlorodifluoromethoxy, bromodifluoromethoxy, 2-fluoroethoxy, and 2,2- Difluoroethoxy, 2,2,2-trifluoroethoxy, 1,1,2,2-tetrafluoroethoxy, pentafluoroethoxy, 2,2,2-trichloroethoxy, 3,3-difluoropropoxy, 3,3,3-trifluoropropoxy, heptafluoropropoxy, heptafluoroisopropoxy, 2,2,2-trifluoro-1- (trifluoromethyl ) -Ethoxy, nonafluorobutoxy, nonafluoro-second butoxy, 3,3,4,4,5,5,5-heptafluoropentyloxy, undecylpentyloxy, ten Trifluorohexyloxy and the like.

C3~C8之環烷氧基,係指前述C3~C8之環烷基經氧原子而鍵結成者。C3~C8之環烷氧基具體而言可列舉環丙氧基、環丁氧基、環戊氧基、環己氧基、環庚氧基、及環辛氧基等。The cycloalkoxy group of C3 ~ C8 refers to the above-mentioned cycloalkyl group of C3 ~ C8 which is bonded via an oxygen atom. Specific examples of the cycloalkoxy group of C3 to C8 include cyclopropoxy, cyclobutoxy, cyclopentyloxy, cyclohexyloxy, cycloheptyloxy, and cyclooctyloxy.

C2~C6之烯氧基,係指前述C2~C6之烯基經氧原子鍵結而成者。又,有幾何異構物時,為僅E體或Z體中之一者,或E體與Z體之任意比例之混合物,只要是指定碳數之範圍即無特殊限制。C2~C6之烯氧基之具體例可列舉乙烯氧基、1-丙烯氧基、烯丙氧基、1-丁烯氧基、2-丁烯氧基、3-丁烯氧基、1-戊烯氧基、2-戊烯氧基、3-戊烯氧基、4-戊烯氧基、3-甲基-2-丁烯氧基、1-己烯氧基、2-己烯氧基、3-己烯氧基、4-己烯氧基、5-己烯氧基、4-甲基-3-戊烯氧基、3-甲基-2-戊烯氧基等。The alkenyloxy group of C2 ~ C6 refers to the aforementioned alkenyl group of C2 ~ C6 which is bonded by an oxygen atom. When there are geometric isomers, it is only one of E-form or Z-form, or a mixture of E-form and Z-form in any ratio, and there is no particular limitation as long as it is within the specified carbon number range. Specific examples of the alkenyloxy group in C2 to C6 include ethyleneoxy, 1-propenyloxy, allyloxy, 1-butenyloxy, 2-butenyloxy, 3-butenyloxy, 1- Pentenyloxy, 2-pentenyloxy, 3-pentenyloxy, 4-pentenyloxy, 3-methyl-2-butenyloxy, 1-hexenyloxy, 2-hexenyloxy Group, 3-hexenyloxy, 4-hexenyloxy, 5-hexenyloxy, 4-methyl-3-pentenyloxy, 3-methyl-2-pentenyloxy and the like.

C2~C6之鹵烯氧基,係指前述C2~C6之烯氧基中之氫原子經1個或2個以上之鹵素原子任意取代而得者。經2個以上之鹵素原子取代時,此等鹵素原子可相同也可不同,其取代數只要能以取代基的形式存在即無特殊限制。C2~C6之鹵烯氧基之具體例可列舉2-氟乙烯氧基、2,2-二氟乙烯氧基、2,2-二氯乙烯氧基、3-氟烯丙氧基、3,3-二氟烯丙氧基、3,3-二氯烯丙氧基、4,4-二氟-3-丁烯氧基、5,5-二氟-4-戊烯氧基、6,6-二氟-5-己烯氧基等。C2 ~ C6 haloalkenyloxy refers to those obtained by arbitrarily replacing the hydrogen atom in the alkenyloxy group of C2 ~ C6 with one or more halogen atoms. When two or more halogen atoms are substituted, these halogen atoms may be the same or different, and the number of substitutions is not particularly limited as long as they can exist as substituents. Specific examples of the haloalkenyloxy group of C2 to C6 include 2-fluoroethyleneoxy, 2,2-difluoroethyleneoxy, 2,2-dichloroethyleneoxy, 3-fluoroallyloxy, 3, 3-difluoroallyloxy, 3,3-dichloroallyloxy, 4,4-difluoro-3-butenyloxy, 5,5-difluoro-4-pentenyloxy, 6, 6-difluoro-5-hexenyloxy and the like.

C3~C6之炔氧基,係指前述C2~C6之炔基之中,C3~C6之炔基經氧原子鍵結成者。C3~C6之炔氧基之具體例可列舉炔丙氧基、2-丁炔氧基、3-丁炔氧基、2-戊炔氧基、3-戊炔氧基、4-戊炔氧基、1,1-二甲基-2-丙炔氧基、、2-己炔氧基、3-己炔氧基、4-己炔氧基、5-己炔氧基等。The alkynyloxy group of C3 to C6 refers to the alkynyl group of C2 to C6, and the alkynyl group of C3 to C6 is bonded by an oxygen atom. Specific examples of the alkynyloxy group in C3 to C6 include propargyloxy, 2-butynyloxy, 3-butynyloxy, 2-pentynyloxy, 3-pentynyloxy, and 4-pentynyloxy. Group, 1,1-dimethyl-2-propynyloxy, 2-hexynyloxy, 3-hexynyloxy, 4-hexynyloxy, 5-hexynyloxy and the like.

C3~C6之鹵炔氧基,係指前述C3~C6之炔氧基中之氫原子經1個或2個以上之鹵素原子任意取代而得者。經2個以上之鹵素原子取代時,此等鹵素原子可相同也可不同,其取代數只要能以取代基的形式存在即無特殊限制。C3~C6之鹵炔氧基之具體例可列舉1,1-二氟-2-丙炔氧基、4,4-二氟-2-丁炔氧基、4-氯-4,4-二氟-2-丁炔氧基、4-溴-4,4-二氟-2-丁炔氧基、4,4,4-三氟-2-丁炔氧基、5,5-二氟-3-戊炔氧基、5-氯-5,5-二氟-3-戊炔氧基、5-溴-5,5-二氟-3-戊炔氧基、5,5,5-三氟-3-戊炔氧基、6,6-二氟-4-己炔氧基、6-氯-6,6-二氟-4-己炔氧基、6-溴-6,6-二氟-4-己炔氧基、6,6,6-三氟-4-己炔氧基等。C3 ~ C6 haloalkynyloxy refers to those obtained by arbitrarily replacing one or more halogen atoms of hydrogen atoms in the alkynyloxy groups of C3 ~ C6. When two or more halogen atoms are substituted, these halogen atoms may be the same or different, and the number of substitutions is not particularly limited as long as they can exist as substituents. Specific examples of the alkynyloxy group of C3 to C6 include 1,1-difluoro-2-propynyloxy, 4,4-difluoro-2-butynyloxy, 4-chloro-4,4-di Fluoro-2-butynyloxy, 4-bromo-4,4-difluoro-2-butynyloxy, 4,4,4-trifluoro-2-butynyloxy, 5,5-difluoro- 3-pentynyloxy, 5-chloro-5,5-difluoro-3-pentynyloxy, 5-bromo-5,5-difluoro-3-pentynyloxy, 5,5,5-tris Fluoro-3-pentynyloxy, 6,6-difluoro-4-hexynyloxy, 6-chloro-6,6-difluoro-4-hexynyloxy, 6-bromo-6,6-di Fluoro-4-hexynyloxy, 6,6,6-trifluoro-4-hexynyloxy and the like.

C2~C6之烷氧基烷氧基,係指前述C1~C6之烷氧基中之C1~C5之烷氧基中之氫原子經1個或2個以上之C1~C5烷氧基任意取代而成者。碳數之總和若為指定碳數之範圍則無特殊限制。C2~C6之烷氧基烷氧基之具體例可列舉甲氧基甲氧基、乙氧基甲氧基、丙氧基甲氧基、異丙氧基甲氧基、甲氧基乙氧基、乙氧基乙氧基、丙氧基乙氧基、異丙氧基乙氧基、甲氧基丙氧基、乙氧基丙氧基、丙氧基丙氧基、異丙氧基丙氧基等。The alkoxyalkoxy group of C2 ~ C6 means the hydrogen atom in the alkoxy group of C1 ~ C5 in the alkoxy group of C1 ~ C6 mentioned above is optionally substituted by one or more C1 ~ C5 alkoxy groups Become. There is no special restriction if the total number of carbon numbers is within the specified carbon number range. Specific examples of the alkoxyalkoxy group of C2 to C6 include methoxymethoxy, ethoxymethoxy, propoxymethoxy, isopropoxymethoxy, and methoxyethoxy. , Ethoxyethoxy, propoxyethoxy, isopropoxyethoxy, methoxypropoxy, ethoxypropoxy, propoxypropoxy, isopropoxypropoxy Base etc.

C2~C12之烷氧基烷基,係指前述C1~C6之烷基鍵結了前述C1~C6之烷氧基者。碳數之總和若為指定碳數之範圍則無特殊限制。C2~C12之烷氧基烷基之具體例可列舉甲氧基甲基、乙氧基甲基、2-甲氧基乙基、2-乙氧基乙基等。C2 to C12 alkoxyalkyl refers to those in which the aforementioned C1 to C6 alkyl groups are bonded to the aforementioned C1 to C6 alkoxy groups. There is no special restriction if the total number of carbon numbers is within the specified carbon number range. Specific examples of the alkoxyalkyl group of C2 to C12 include a methoxymethyl group, an ethoxymethyl group, a 2-methoxyethyl group, and a 2-ethoxyethyl group.

C2~C7之烷氧基羰基,係指羰基鍵結了前述C1~C6之烷氧基而成者。C2~C7之烷氧基羰基之具體例可列舉甲氧基羰基、乙氧基羰基、丙氧基羰基、異丙氧基羰基、1-丁氧基羰基、2-丁氧基羰基、1-戊氧基羰基、1-乙基丙氧基羰基、1-己基羰基等。The alkoxycarbonyl group of C2 to C7 refers to a group in which a carbonyl group is bonded to the alkoxy group of C1 to C6. Specific examples of the alkoxycarbonyl group of C2 to C7 include methoxycarbonyl, ethoxycarbonyl, propoxycarbonyl, isopropoxycarbonyl, 1-butoxycarbonyl, 2-butoxycarbonyl, and 1- Pentyloxycarbonyl, 1-ethylpropoxycarbonyl, 1-hexylcarbonyl and the like.

C1~C6之烷基硫基,係指前述C1~C6之烷基鍵結了硫原子而成者。C1~C6之烷基硫基之具體例可列舉甲硫基、乙基硫基、丙基硫基、異丙基硫基、丁基硫基、異丁基硫基、第二丁基硫基、第三丁基硫基、戊基硫基、異戊基硫基、2-甲基丁基硫基、新戊基硫基、1-乙基丙基硫基、己基硫基、4-甲基戊基硫基、3-甲基戊基硫基、2-甲基戊基硫基、1-甲基戊基硫基、3,3-二甲基丁基硫基、2,2-二甲基丁基硫基、1,1-二甲基丁基硫基、1,2-二甲基丁基硫基、1,3-二甲基丁基硫基、2,3-二甲基丁基硫基、2-乙基丁基硫基等。The C1-C6 alkylthio group refers to a group in which the C1-C6 alkyl group is bonded with a sulfur atom. Specific examples of the alkylthio group of C1 to C6 include methylthio group, ethylthio group, propylthio group, isopropylthio group, butylthio group, isobutylthio group, and second butylthio group. , Third butylthio, pentylthio, isopentylthio, 2-methylbutylthio, neopentylthio, 1-ethylpropylthio, hexylthio, 4-methyl Pentylthio, 3-methylpentylthio, 2-methylpentylthio, 1-methylpentylthio, 3,3-dimethylbutylthio, 2,2-bis Methylbutylthio, 1,1-dimethylbutylthio, 1,2-dimethylbutylthio, 1,3-dimethylbutylthio, 2,3-dimethyl Butylthio, 2-ethylbutylthio, and the like.

C2~C7之醯基,係指羰基鍵結了前述C1~C6烷基而成者。C2~C7之醯基之具體例可列舉乙醯基、丙醯基、1-丁醯基、2-甲基丙醯基、1-戊醯基、2-甲基丁醯基、1-己醯基、2-甲基戊醯基、2-乙基丁醯基等。The fluorenyl group of C2 to C7 refers to a group in which a carbonyl group is bonded to the aforementioned C1 to C6 alkyl group. Specific examples of the fluorenyl group of C2 to C7 include ethyl fluorenyl, propyl fluorenyl, 1-butyl fluorenyl, 2-methyl propyl fluorenyl, 1-pentyl fluorenyl, 2-methyl butyl fluorenyl, 1-hexane fluorenyl, 2 -Methylpentyl, 2-ethylbutylfluorenyl and the like.

C3~C8之烷基磺醯基乙基,係在磺醯基乙基之硫原子上鍵結了前述C1~C6烷基而成者。若碳數之總和為指定之碳數之範圍內則無特殊限制。C3~C8之烷基磺醯基乙基可列舉2-甲基磺醯基乙基、2-乙基磺醯基乙基、2-(1-丙基磺醯基)乙基、2-(2-丙基磺醯基)乙基、1-甲基-2-甲基磺醯基乙基、1-乙基-2-甲基磺醯基乙基、2-甲基-2-甲基磺醯基乙基、2-乙基-2-乙基磺醯基乙基、1-甲基-2-甲基-2甲基磺醯基乙基等。The alkylsulfonylethyl group of C3 ~ C8 is obtained by bonding the aforementioned C1 ~ C6 alkyl group to a sulfur atom of a sulfoethyl group. If the sum of carbon numbers is within the specified carbon number range, there are no special restrictions. Examples of C3 to C8 alkylsulfonylethyl include 2-methylsulfonylethyl, 2-ethylsulfonylethyl, 2- (1-propylsulfonyl) ethyl, 2- ( 2-propylsulfonyl) ethyl, 1-methyl-2-methylsulfonylethyl, 1-ethyl-2-methylsulfonylethyl, 2-methyl-2-methyl Sulfonylethyl, 2-ethyl-2-ethylsulfonylethyl, 1-methyl-2-methyl-2methylsulfonylethyl, and the like.

芳基表示C6~C14之1~3環性之芳香族之環。芳基之具體例可列舉苯基、萘基、蒽基等。Aryl represents a C1-C14 1-3 aromatic ring. Specific examples of the aryl group include a phenyl group, a naphthyl group, and an anthryl group.

雜芳基,係指含有1個或2個以上之相同或相異之環構成雜原子之5至14員之1~3環性之芳香族之環。雜原子之種類不特別限定,可例示氮原子、氧原子、硫原子等。雜芳基之具體例可列舉呋喃基、噻吩基、吡咯基、唑基、異唑基、二氫異唑基、噻唑基、異噻唑基、咪唑基、吡唑基、二唑基、噻二唑基、三唑基、四唑基、吡啶基、氮呯基、氧雜氮呯基等5至7員之單環族雜芳基、苯并呋喃基、異苯并呋喃基、苯并噻吩基、吲哚基、異吲哚基、吲唑基、苯并唑基、苯并異唑基、苯并噻唑基、苯并異噻唑基、苯并二唑基、苯并噻二唑基、苯并三唑基、喹啉基、異喹啉基、啉基、喹唑啉基、喹啉基、呔基、啶基、嘌呤基(purinyl)、喋啶基(pteridinyl)、咔唑基、咔啉基、吖啶基、2-吖啶基、3-吖啶基、4-吖啶基、9-吖啶基、啡 基、啡噻基、啡基等8至14員之多環性雜芳基。Heteroaryl refers to a 1 to 3 cyclic aromatic ring containing 5 to 14 members of a heteroatom containing one or two identical or different rings. The type of the hetero atom is not particularly limited, and examples thereof include a nitrogen atom, an oxygen atom, and a sulfur atom. Specific examples of the heteroaryl group include furyl, thienyl, pyrrolyl, Oxazolyl, iso Oxazolyl, dihydroiso Oxazolyl, thiazolyl, isothiazolyl, imidazolyl, pyrazolyl, Diazyl, thiadiazolyl, triazolyl, tetrazolyl, pyridyl, azepine, oxaazepine, etc. 5- to 7-membered monocyclic heteroaryl, benzofuryl, isobenzo Furyl, benzothienyl, indolyl, isoindolyl, indazolyl, benzo Oxazolyl Oxazolyl, benzothiazolyl, benzoisothiazolyl, benzo Diazolyl, benzothiadiazolyl, benzotriazolyl, quinolinyl, isoquinolinyl, Quinolyl, quinazolinyl, quinol Phenyl base, Pyridyl, purinyl, pteridinyl, carbazolyl, carbolinyl, acridinyl, 2-acridyl, 3-acridyl, 4-acridyl, 9-acridyl Base, brown Base Base, brown 8 to 14-membered polycyclic heteroaryl.

芳烷基,表示前述C1~C6之烷基之1個或2個以上之氫原子經前述芳基取代成之基。芳烷基之具體例可列舉苄基、1-萘基甲基、2-萘基甲基、蒽甲基、菲甲基、苊甲基、二苯基甲基、1-苯乙基、2-苯乙基、1-(1-萘基)乙基、1-(2-萘基)乙基、2-(1-萘基)乙基、2-(2-萘基)乙基、3-苯基丙基、3-(1-萘基)丙基、3-(2-萘基)丙基、4-苯基丁基、4-(1-萘基)丁基、4-(2-萘基)丁基、5-苯基戊基、5-(1-萘基)戊基、5-(2-萘基)戊基、6-苯基己基、6-(1-萘基)己基、6-(2-萘基)己基。An aralkyl group refers to a group in which one or more hydrogen atoms of the C1-C6 alkyl group are substituted by the aryl group. Specific examples of the aralkyl group include benzyl, 1-naphthylmethyl, 2-naphthylmethyl, anthracenemethyl, phenanthrylmethyl, fluorenylmethyl, diphenylmethyl, 1-phenethyl, 2 -Phenethyl, 1- (1-naphthyl) ethyl, 1- (2-naphthyl) ethyl, 2- (1-naphthyl) ethyl, 2- (2-naphthyl) ethyl, 3 -Phenylpropyl, 3- (1-naphthyl) propyl, 3- (2-naphthyl) propyl, 4-phenylbutyl, 4- (1-naphthyl) butyl, 4- (2 -Naphthyl) butyl, 5-phenylpentyl, 5- (1-naphthyl) pentyl, 5- (2-naphthyl) pentyl, 6-phenylhexyl, 6- (1-naphthyl) Hexyl, 6- (2-naphthyl) hexyl.

C3~C10之環烷基環,係指環丙基環、環丁基環、環戊基環、環己基環、環庚基環、或環辛基環等。The C3-C10 cycloalkyl ring refers to a cyclopropyl ring, a cyclobutyl ring, a cyclopentyl ring, a cyclohexyl ring, a cycloheptyl ring, or a cyclooctyl ring.

N-羥基烷醯亞胺基,係指羥基亞胺基甲基、N-羥基乙烷醯亞胺基、N-羥基丙烷醯亞胺基、N-羥基丁烷醯亞胺基等。The N-hydroxyalkylimino group refers to a hydroxyiminomethyl group, an N-hydroxyethaneimino group, an N-hydroxypropane group imine group, an N-hydroxybutane group imine group, and the like.

含1~2個氧原子之3~6員環之基之具體例可列舉1,2-環氧乙烷基、環氧丙烷基、氧雜環戊烷基(oxolanyl)、氧雜環己烷基(oxanyl)、1,3-二氧雜環戊烷基、1,3-二氧雜環己烷基(1,3-dioxanyl)、1,4-二氧雜環己烷基(1,4-dioxanyl)等。Specific examples of the 3- to 6-membered ring group containing 1 to 2 oxygen atoms include 1,2-oxiranyl, propylene oxide, oxolanyl, and oxane (Oxanyl), 1,3-dioxanyl, 1,3-dioxanyl (1,3-dioxanyl), 1,4-dioxanyl (1, 4-dioxanyl) and the like.

本發明之有害生物防除組成物(以下有時簡稱本發明之組成物),其特徵為:將下式(1)表示之吡啶酮化合物或其鹽(本說明書中,有時簡稱式(1)表示之化合物、本發明化合物)、以及選自式(2a)或式(2b)表示之喹啉系化合物或其鹽(本說明書中,有時簡稱式(2a)或式(2b)表示之化合物、或總稱喹啉系化合物)中之1種以上之成分予以組合作為有效成分。The pest control composition of the present invention (hereinafter sometimes referred to as the composition of the present invention) is characterized in that a pyridone compound represented by the following formula (1) or a salt thereof (in this specification, sometimes referred to as the formula (1) Compound represented by the present invention, compound of the present invention), and a quinoline-based compound represented by the formula (2a) or the formula (2b) or a salt thereof (in this specification, the compound represented by the formula (2a) or the formula (2b) may be abbreviated Or collectively referred to as a quinoline-based compound) as an active ingredient.

【化4】【化5】 [Chemical 4] [Chemical 5]

以下針對式(1)説明。 式(1)之R1表示羥基、氰基、亦可經取代基A適當取代之C1~C6之烷基、C1~C6之鹵烷基、亦可經取代基A適當取代之C3~C8之環烷基、亦可經取代基A適當取代之C2~C6之烯基、C2~C6之鹵烯基、亦可經取代基A適當取代之C2~C6之炔基、C2~C6之鹵炔基、亦可經取代基A適當取代之C1~C6之烷氧基、C1~C6之鹵烷氧基、亦可經取代基A適當取代之C3~C8之環烷氧基、亦可經取代基A適當取代之C2~C6之烯氧基、C2~C6之鹵烯氧基、亦可經取代基A適當取代之C3~C6之炔氧基、C3~C6之鹵炔氧基、或R10R11N-(在此,R10及R11各自獨立地表示氫原子、或C1~C6之烷基。)。Formula (1) will be described below. R1 in the formula (1) represents a hydroxy group, a cyano group, a C1 to C6 alkyl group which can be appropriately substituted with a substituent A, a C1 to C6 haloalkyl group, and a C3 to C8 ring which can also be appropriately substituted with a substituent A. Alkyl, C2 to C6 alkenyl, which may be appropriately substituted with substituent A, C2 to C6 haloalkenyl, C2 to C6 alkynyl, C2 to C6 haloalkynyl, which may also be appropriately substituted with substituent A , C1 ~ C6 alkoxy groups which can be appropriately substituted with substituent A, C1 ~ C6 haloalkoxy groups, C3 ~ C8 cycloalkoxy groups which can also be appropriately substituted with substituent A, or substituents A is appropriately substituted C2 ~ C6 alkoxy, C2 ~ C6 haloalkoxy, C3 ~ C6 alkynoxy, C3 ~ C6 haloalkoxy, or R10R11N- (Here, R10 and R11 each independently represent a hydrogen atom or an alkyl group of C1 to C6.)

其中R1宜為氰基、亦可經取代基A適當取代之C1~C6之烷基、C1~C6之鹵烷基、亦可經取代基A適當取代之C3~C8之環烷基、亦可經取代基A適當取代之C2~C6之烯基、C2~C6之鹵烯基、亦可經取代基A適當取代之C2~C6之炔基、或R10R11N-(在此,R10及R11同前述含義。)較理想, 尤其亦可經取代基A適當取代之C1~C6之烷基、或C1~C6之鹵烷基為較佳。Among them, R1 is preferably a cyano group, an alkyl group of C1 to C6 which can be appropriately substituted by substituent A, a haloalkyl group of C1 to C6, a cycloalkyl group of C3 to C8 which can also be appropriately substituted by substituent A, or C2 to C6 alkenyl, C2 to C6 haloalkenyl appropriately substituted with substituent A, C2 to C6 alkynyl optionally substituted with substituent A, or R10R11N- (here, R10 and R11 are the same as previously described Meaning.) Ideally, especially C1-C6 alkyl groups or C1-C6 haloalkyl groups which can also be appropriately substituted by the substituent A are preferred.

式(1)之「取代基A」,係表示選自由羥基、氰基、C3~C8之環烷基、C1~C6之烷氧基、C1~C6之鹵烷氧基、C3~C8之環烷氧基、R12R13N-(在此,R12及R13各自獨立地表示氫原子、C1~C6之烷基、C1~C6之鹵烷基、或C3~C8之環烷基、或表示R12及R13和鍵結之氮原子成為一體而形成氮丙啶基、四氫吖唉基(azetidinyl)基、吡咯啶基、哌啶基、高哌啶基、或氮雜環辛烷基(azocanyl)者。)、及R14-L1-(在此,R14表示C1~C6之烷基、或C1~C6之鹵烷基,L1表示S、SO、或SO2 。)構成之群組中之至少1種。"Substituent A" in formula (1) represents a ring selected from the group consisting of hydroxyl, cyano, cycloalkyl of C3 to C8, alkoxy of C1 to C6, haloalkoxy of C1 to C6, and ring of C3 to C8 Alkoxy, R12R13N- (here, R12 and R13 each independently represent a hydrogen atom, an alkyl group of C1 to C6, a haloalkyl group of C1 to C6, or a cycloalkyl group of C3 to C8, or R12 and R13 and The bonded nitrogen atoms become one to form aziridinyl, azetidinyl, pyrrolidinyl, piperidinyl, homopiperidinyl, or azocanyl.) And R14-L1- (here, R14 represents an alkyl group of C1 to C6, or a haloalkyl group of C1 to C6, and L1 represents S, SO, or SO 2. ) At least one of the group consisting of R1 and L1.

其中取代基A宜為氰基、C1~C6之烷氧基、或R14-L1-(在此,R14及L1同前述含義。)較理想, 尤其氰基、或C1~C6之烷氧基為較佳。Among them, the substituent A is preferably a cyano group, an alkoxy group of C1 to C6, or R14-L1- (here, R14 and L1 have the same meanings as described above.) It is preferable that the cyano group or the alkoxy group of C1 to C6 is particularly Better.

取代基A之理想具體例可列舉 羥基;氰基; 作為C3~C8之環烷基之環丙基、環丁基、環戊基、及環己基; 作為C1~C6之烷氧基之甲氧基、乙氧基、丙氧基、及異丙氧基; 作為C1~C6之鹵烷氧基之二氟甲氧基、三氟甲氧基、2,2-二氟乙氧基、2,2,2-三氟乙氧基、3,3-二氟丙氧基、及3,3,3-三氟丙氧基; C3~C8之環烷氧基可列舉環丙氧基、環丁氧基、環戊氧基、及環己氧基; 作為R12R13N-(在此,R12及R13同前述含義。)之胺基、二甲胺基、乙基甲胺基、及二乙胺基; 及作為R14-L1-(在此,R14及L1同前述含義。)之甲硫基、甲烷亞磺醯基、甲烷磺醯基、三氟甲硫基、三氟甲烷亞磺醯基、及三氟甲烷磺醯基。Preferred specific examples of the substituent A include a hydroxyl group; a cyano group; a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group as the cycloalkyl group of C3 to C8; and a methoxy group as the alkoxy group of C1 to C6. Group, ethoxy group, propoxy group, and isopropoxy group; difluoromethoxy group, trifluoromethoxy group, 2,2-difluoroethoxy group, haloalkoxy group as C1 to C6, 2, 2,2-trifluoroethoxy, 3,3-difluoropropoxy, and 3,3,3-trifluoropropoxy; Examples of cycloalkoxy groups C3 to C8 include cyclopropoxy and cyclobutane An amine group, a cyclopentyloxy group, and a cyclohexyloxy group; an amine group, a dimethylamino group, an ethylmethylamino group, and a diethylamino group as R12R13N- (here, R12 and R13 have the same meanings as described above); And R14-L1- (herein, R14 and L1 have the same meanings as above.) Methylthio, methanesulfinyl, methanesulfonyl, trifluoromethylthio, trifluoromethanesulfinyl, and three Fluoromethanesulfonyl.

取代基A之更理想之具體例可列舉 羥基;氰基; 作為C3~C8之環烷基之環丙基、及環丁基; C1~C6之烷氧基之甲氧基、及乙氧基; C1~C6之鹵烷氧基之二氟甲氧基、三氟甲氧基、2,2-二氟乙氧基、及2,2,2-三氟乙氧基; C3~C8之環烷氧基之環丙氧基、及環丁氧基; 作為R12R13N-(在此,R12及R13同前述含義。)之二甲胺基、乙基甲胺基、及二乙胺基; 及作為R14-L1-(在此,R14及L1同前述含義。)之甲硫基、甲烷亞磺醯基、及甲烷磺醯基。More preferable specific examples of the substituent A include a hydroxy group; a cyano group; a cyclopropyl group as a cycloalkyl group of C3 to C8, and a cyclobutyl group; a methoxy group of an alkoxy group of C1 to C6, and an ethoxy group ; C1 ~ C6 haloalkoxy, difluoromethoxy, trifluoromethoxy, 2,2-difluoroethoxy, and 2,2,2-trifluoroethoxy; C3 ~ C8 ring Cyclopropoxy and cyclobutoxy of alkoxy; dimethylamino, ethylmethylamino, and diethylamino as R12R13N- (here, R12 and R13 have the same meanings as above.); And as R14-L1- (herein, R14 and L1 have the same meanings as above.) Methylthio, methanesulfinyl, and methanesulfonyl.

式(1)之R1包括羥基、及氰基。 式(1)之R1中之「亦可經取代基A適當取代之C1~C6之烷基」之C1~C6之烷基,與前述定義為同義,較佳為甲基、乙基、丙基、異丙基、丁基、或異丁基,更佳為甲基、或乙基。具有取代基A時,C1~C6之烷基中之氫原子可經取代基A任意地取代。R1 in formula (1) includes a hydroxyl group and a cyano group. The C1-C6 alkyl group of "C1-C6 alkyl group which may also be appropriately substituted by substituent A" in R1 of formula (1) is synonymous with the foregoing definition, preferably methyl, ethyl, propyl , Isopropyl, butyl, or isobutyl, more preferably methyl or ethyl. When having a substituent A, a hydrogen atom in the alkyl group of C1 to C6 may be optionally substituted by the substituent A.

式(1)之R1中之「C1~C6之鹵烷基」和前述定義為同含義,較佳為2-氟乙基、2,2-二氟乙基、2,2,2-三氟乙基、3,3-二氟丙基、或3,3,3-三氟丙基,更佳為2-氟乙基、2,2-二氟乙基、或2,2,2-三氟乙基。The "C1 to C6 haloalkyl group" in R1 of formula (1) has the same meaning as the foregoing definition, preferably 2-fluoroethyl, 2,2-difluoroethyl, 2,2,2-trifluoro Ethyl, 3,3-difluoropropyl, or 3,3,3-trifluoropropyl, more preferably 2-fluoroethyl, 2,2-difluoroethyl, or 2,2,2-tri Fluoroethyl.

式(1)之R1中之「亦可經取代基A適當取代之C3~C8之環烷基」之C3~C8之環烷基和前述定義為同含義,較佳為環丙基、環丁基、環戊基、或環己基,更佳為環丙基、或環丁基。有取代基A時,C3~C8之環烷基中之氫原子可經取代基A任意地取代。The cycloalkyl group of C3 ~ C8 of "C3 ~ C8 cycloalkyl group which may also be appropriately substituted by substituent A" in R1 of formula (1) has the same meaning as the foregoing definition, and preferably cyclopropyl group or cyclobutyl group Group, cyclopentyl, or cyclohexyl, more preferably cyclopropyl or cyclobutyl. When the substituent A is present, the hydrogen atom in the cycloalkyl group of C3 to C8 may be optionally substituted by the substituent A.

式(1)之R1中之「亦可經取代基A適當取代之C2~C6之烯基」之C2~C6之烯基和前述定義為同含義,較佳為乙烯基、1-丙烯基、或烯丙基,更佳為乙烯基、或烯丙基。有取代基A時,C2~C6之烯基中之氫原子可經取代基A任意地取代。The alkenyl groups of C2 to C6 of "alkenyl groups of C2 to C6 which may also be appropriately substituted by substituent A" in R1 of formula (1) have the same meanings as the foregoing definitions, preferably vinyl, 1-propenyl, Or allyl, more preferably vinyl, or allyl. When there is a substituent A, the hydrogen atom in the alkenyl group of C2 to C6 may be optionally substituted by the substituent A.

式(1)之R1中之「C2~C6之鹵烯基」和前述定義為同含義,較佳為2-氟乙烯基、2,2-二氟乙烯基、3-氟烯丙基、或3,3-二氟烯丙基,更佳為2-氟乙烯基、或2,2-二氟乙烯基。The "haloalkenyl group of C2 to C6" in R1 of formula (1) has the same meaning as the foregoing definition, and is preferably 2-fluorovinyl, 2,2-difluorovinyl, 3-fluoroallyl, or 3,3-difluoroallyl, more preferably 2-fluorovinyl, or 2,2-difluorovinyl.

式(1)之R1中之「亦可經取代基A適當取代之C2~C6之炔基」之C2~C6之炔基和前述定義為同含義,較佳為炔丙基、2-丁炔基、或3-丁炔基,更佳為炔丙基。有取代基A時,C2~C6之炔基中之氫原子可經取代基A任意地取代。The alkynyl groups of C2 to C6 of "C2 to C6 alkynyl groups which may also be appropriately substituted by substituent A" in R1 of formula (1) have the same meanings as above, preferably propargyl and 2-butyne Or 3-butynyl, more preferably propargyl. When there is a substituent A, a hydrogen atom in the alkynyl group of C2 to C6 may be optionally substituted by the substituent A.

式(1)之R1中之「C2~C6之鹵炔基」和前述定義為同含義,較佳為4,4-二氟-2-丁炔基、4-氯-4,4-二氟-2-丁炔基、4-溴-4,4-二氟-2-丁炔基、或4,4,4-三氟-2-丁炔基,更佳為4,4-二氟-2-丁炔基、或4,4,4-三氟-2-丁炔基。The "haloalkynyl group of C2 to C6" in R1 of formula (1) has the same meaning as the foregoing definition, and is preferably 4,4-difluoro-2-butynyl, 4-chloro-4,4-difluoro 2-butynyl, 4-bromo-4,4-difluoro-2-butynyl, or 4,4,4-trifluoro-2-butynyl, more preferably 4,4-difluoro- 2-butynyl, or 4,4,4-trifluoro-2-butynyl.

式(1)之R1中之「亦可經取代基A適當取代之C1~C6之烷氧基」之C1~C6之烷氧基和前述定義為同含義,較佳為甲氧基、乙氧基、丙氧基、異丙氧基、丁氧基、或異丁氧基,更佳為甲氧基、或乙氧基。有取代基A時,C1~C6之烷氧基中之氫原子可經取代基A任意地取代。The alkoxy groups of C1 to C6 of "C1 to C6 alkoxy groups that may also be appropriately substituted by substituent A" in R1 of formula (1) have the same meanings as the foregoing definitions, preferably methoxy and ethoxy Group, propoxy, isopropoxy, butoxy, or isobutoxy, more preferably methoxy or ethoxy. When the substituent A is present, the hydrogen atom in the alkoxy group of C1 to C6 may be optionally substituted by the substituent A.

式(1)之R1中之「C1~C6之鹵烷氧基」和前述定義為同含義,較佳為二氟甲氧基、三氟甲氧基、2,2-二氟乙氧基、2,2,2-三氟乙氧基、3,3-二氟丙氧基、或3,3,3-三氟丙氧基,更佳為二氟甲氧基、三氟甲氧基、2,2-二氟乙氧基、或2,2,2-三氟乙氧基。The "haloalkoxy group of C1 to C6" in R1 of formula (1) has the same meaning as the foregoing definition, and is preferably difluoromethoxy, trifluoromethoxy, 2,2-difluoroethoxy, 2,2,2-trifluoroethoxy, 3,3-difluoropropoxy, or 3,3,3-trifluoropropoxy, more preferably difluoromethoxy, trifluoromethoxy, 2,2-difluoroethoxy, or 2,2,2-trifluoroethoxy.

式(1)之R1中之「亦可經取代基A適當取代之C3~C8之環烷氧基」之C3~C8之環烷氧基和前述定義為同含義,較佳為環丙氧基、環丁氧基、環戊氧基、或環己氧基,更佳為環丙氧基、或環丁氧基。有取代基A時,C3~C8之環烷氧基中之氫原子可經取代基A任意地取代。The C3 to C8 cycloalkoxy group of "C3 to C8 cycloalkoxy group that may also be appropriately substituted with substituent A" in R1 of formula (1) has the same meaning as the foregoing definition, and cyclopropyloxy group is preferred. , Cyclobutoxy, cyclopentyloxy, or cyclohexyloxy, more preferably cyclopropoxy or cyclobutoxy. When the substituent A is present, the hydrogen atom in the cycloalkoxy group of C3 to C8 may be optionally substituted by the substituent A.

式(1)之R1中之「亦可經取代基A適當取代之C2~C6之烯氧基」之C2~C6之烯氧基和前述定義為同含義,較佳為乙烯氧基、1-丙烯氧基、或烯丙氧基,更佳為乙烯氧基。有取代基A時,C2~C6之烯氧基中之氫原子可經取代基A任意地取代。The alkenyl group of C2 to C6 of the "alkenyl group of C2 to C6 which may also be appropriately substituted by substituent A" in R1 of formula (1) has the same meaning as the foregoing definition, preferably vinyloxy group, 1- Allyloxy or allyloxy is more preferably ethyleneoxy. When there is a substituent A, the hydrogen atom in the alkenyloxy group of C2 to C6 may be optionally substituted by the substituent A.

式(1)之R1中之「C2~C6之鹵烯氧基」和前述定義為同含義,較佳為2-氟乙烯氧基、2,2-二氟乙烯氧基、3-氟烯丙氧基、或3,3-二氟烯丙氧基,更佳為2-氟乙烯氧基、或2,2-二氟乙烯氧基。The "haloalkenyloxy group of C2 to C6" in R1 of formula (1) has the same meaning as the foregoing definition, and is preferably 2-fluoroethyleneoxy, 2,2-difluoroethyleneoxy, 3-fluoroallyl Oxy, or 3,3-difluoroallyloxy, more preferably 2-fluoroethyleneoxy, or 2,2-difluoroethyleneoxy.

式(1)之R1中之「亦可經取代基A適當取代之C3~C6之炔氧基」之C3~C6之炔氧基和前述定義為同含義,較佳為炔丙氧基、2-丁炔氧基、或3-丁炔氧基,更佳為炔丙氧基。有取代基A時,C3~C6之炔氧基中之氫原子可經取代基A任意地取代。The alkynyloxy group of C3 to C6 of "C3 to C6 alkynyloxy group that may also be appropriately substituted by substituent A" in R1 of formula (1) has the same meaning as the foregoing definition, and is preferably propargyloxy, 2 -Butynyloxy or 3-butynyloxy, more preferably propargyloxy. When there is a substituent A, the hydrogen atom in the alkynyloxy group of C3 to C6 may be optionally substituted by the substituent A.

式(1)之R1中之「C3~C6之鹵炔氧基」和前述定義為同含義,較佳為4,4-二氟-2-丁炔氧基、4-氯-4,4-二氟-2-丁炔氧基、4-溴-4,4-二氟-2-丁炔氧基、或4,4,4-三氟-2-丁炔氧基,更佳為4,4-二氟-2-丁炔氧基、或4,4,4-三氟-2-丁炔氧基。The "C3 to C6 haloalkynyloxy group" in R1 of formula (1) has the same meaning as the foregoing definition, and is preferably 4,4-difluoro-2-butynyloxy group, 4-chloro-4,4- Difluoro-2-butynyloxy, 4-bromo-4,4-difluoro-2-butynyloxy, or 4,4,4-trifluoro-2-butynyloxy, more preferably 4, 4-difluoro-2-butynyloxy, or 4,4,4-trifluoro-2-butynyloxy.

式(1)之R1中之「R10R11N-」(在此,R10及R11各自獨立地表示氫原子或C1~C6之烷基。)之C1~C6之烷基和前述定義為同含義。「R10R11N-」較佳可列舉胺基、二甲胺基、乙基甲胺基、及二乙胺基,更佳可列舉胺基、及二甲胺基。"R10R11N-" in R1 in formula (1) (here, R10 and R11 each independently represent a hydrogen atom or an alkyl group of C1 to C6.) The alkyl group of C1 to C6 has the same meaning as the foregoing definition. "R10R11N-" preferably includes an amino group, a dimethylamino group, an ethylmethylamino group, and a diethylamino group, and more preferably an amino group and a dimethylamino group.

R2,表示鹵素原子、羥基、氰基、硝基、亦可經取代基B適當取代之C1~C6之烷基、C1~C6之鹵烷基、亦可經取代基B適當取代之C3~C8之環烷基、亦可經取代基B適當取代之C2~C6之烯基、C2~C6之鹵烯基、亦可經取代基B適當取代之C2~C6之炔基、C2~C6之鹵炔基、亦可經取代基B適當取代之C1~C6之烷氧基、C1~C6之鹵烷氧基、亦可經取代基B適當取代之C3~C8之環烷氧基、亦可經取代基B適當取代之C2~C6之烯氧基、C2~C6之鹵烯氧基、亦可經取代基B適當取代之C3~C6之炔氧基、C3~C6之鹵炔氧基、R20C(=O)-(在此,R20,表示C1~C6之烷基、C1~C6之鹵烷基、C3~C8之環烷基、C1~C6之烷氧基、C1~C6之鹵烷氧基、C3~C8之環烷氧基、或R21R22N-(在此,R21及R22各自獨立地表示氫原子、亦可經取代基B1適當取代之C1~C6之烷基、C1~C6之鹵烷基、或C3~C8之環烷基,或表示R21及R22和鍵結之氮原子成為一體而形成氮丙啶基、四氫吖唉基、吡咯啶基、哌啶基、高哌啶基、或氮雜環辛烷基者。))、R20C(=O)O-(在此,R20同前述含義。)、含有1~2個氧原子之3~6員環之基、R23-L2-(在此,R23表示C1~C6之烷基、或C1~C6之鹵烷基,L2表示S、SO、或SO2 。)、R21R22N-(在此,R21及R22同前述含義。)、或R24C(=O)N(R25)-(在此,R24表示氫原子、C1~C6之烷基、C1~C6之鹵烷基、C3~C8之環烷基、C1~C6之烷氧基、C1~C6之鹵烷氧基、C3~C8之環烷氧基、或R21R22N-(在此,R21及R22同前述含義。),R25表示氫原子、亦可經取代基B1適當取代之C1~C6之烷基、C1~C6之鹵烷基、或C3~C8之環烷基。)。R2 represents a halogen atom, a hydroxyl group, a cyano group, a nitro group, a C1 to C6 alkyl group which may be appropriately substituted by a substituent B, a C1 to C6 haloalkyl group, or a C3 to C8 which may also be appropriately substituted Cycloalkyl, C2 to C6 alkenyl, C2 to C6 haloalkenyl, C2 to C6 alkynyl, C2 to C6 halide that may be appropriately substituted with substituent B Alkynyl, C1 ~ C6 alkoxy, which may be appropriately substituted with substituent B, C1 ~ C6 haloalkoxy, C3 ~ C8, cycloalkoxy which may also be appropriately substituted with substituent B, or C2 to C6 alkenyloxy, C2 to C6 haloalkenyloxy appropriately substituted with substituent B, C3 to C6 alkynyloxy, C3 to C6 haloalkynyloxy, R20C (= O)-(Here, R20 represents C1-C6 alkyl, C1-C6 haloalkyl, C3-C8 cycloalkyl, C1-C6 alkoxy, C1-C6 haloalkoxy Group, C3 to C8 cycloalkoxy group, or R21R22N- (here, R21 and R22 each independently represent a hydrogen atom, a C1 to C6 alkyl group that can be appropriately substituted by a substituent B1, or a C1 to C6 haloalkane Or C3 ~ C8 cycloalkyl, or R21 and R22 and the bonded nitrogen atom to form an aziridinyl group, Acridine, pyrrolidinyl, piperidinyl, homopiperidinyl, or azaoctyl.)), R20C (= O) O- (here, R20 has the same meaning as above.), Contains 1 ~ A radical of 3 to 6 members of two oxygen atoms, R23-L2- (Here, R23 represents a C1 to C6 alkyl group, or C1 to C6 haloalkyl group, and L2 represents S, SO, or SO 2. ) , R21R22N- (here, R21 and R22 have the same meaning as above.), Or R24C (= O) N (R25)-(here, R24 represents a hydrogen atom, a C1-C6 alkyl group, and a C1-C6 haloalkyl group , C3 to C8 cycloalkyl, C1 to C6 alkoxy, C1 to C6 haloalkoxy, C3 to C8 cycloalkoxy, or R21R22N- (here, R21 and R22 have the same meanings as above.) R25 represents a hydrogen atom, a C1 to C6 alkyl group, a C1 to C6 haloalkyl group, or a C3 to C8 cycloalkyl group that can also be appropriately substituted by the substituent B1.)

其中R2宜為鹵素原子、羥基、氰基、亦可經取代基B適當取代之C1~C6之烷基、C1~C6之鹵烷基、亦可經取代基B適當取代之C1~C6之烷氧基、C1~C6之鹵烷氧基、亦可經取代基B適當取代之C3~C8之環烷氧基、亦可經取代基B適當取代之C2~C6之烯氧基、亦可經取代基B適當取代之C3~C6之炔氧基、R20C(=O)O-(在此,R20同前述含義。)、或R23-L2-(在此,R23及L2同前述含義。)較理想, 尤其鹵素原子、亦可經取代基B適當取代之C1~C6之烷基、或亦可經取代基B適當取代之C1~C6之烷氧基較佳。Among them, R2 is preferably a halogen atom, a hydroxyl group, a cyano group, a C1 to C6 alkyl group which may be appropriately substituted by a substituent B, a C1 to C6 haloalkyl group, or a C1 to C6 alkyl group which may also be appropriately substituted by a substituent B. Oxygen, C1 ~ C6 haloalkoxy, C3 ~ C8 cycloalkoxy which can be appropriately substituted with substituent B, C2 ~ C6 alkenoxy which can also be appropriately substituted with substituent B, or The alkynyloxy group of C3 ~ C6 substituted with substituent B, R20C (= O) O- (here, R20 has the same meaning as above), or R23-L2- (here, R23 and L2 have the same meaning as above.) Desirably, a halogen atom, a C1-C6 alkyl group which may be appropriately substituted by a substituent B, or an C1-C6 alkoxy group which may also be appropriately substituted by a substituent B is preferred.

式(1)之「取代基B」,係表示選自由羥基、氰基、C3~C8之環烷基、C1~C6之烷氧基、C1~C6之鹵烷氧基、C3~C8之環烷氧基、C2~C6之烷氧基烷氧基、R21R22N-(在此,R21及R22同前述含義。)、R23-L2-(在此,R23及L2同前述含義。)、R26R27R28Si-(在此,R26、R27、及R28各自獨立地表示C1~C6之烷基。)、R26R27R28Si-(CH2 )s-O-(在此,s表示1~3之整數,R26、R27、及R28同前述含義。)、R20C(=O)-(在此,R20同前述R20之含義。)、及含有1~2個氧原子之3~6員環之基構成之群組中之至少1種。"Substituent B" in formula (1) represents a ring selected from the group consisting of hydroxy, cyano, cycloalkyl of C3 to C8, alkoxy of C1 to C6, haloalkoxy of C1 to C6, and ring of C3 to C8 Alkoxy, C2-C6 alkoxyalkoxy, R21R22N- (here, R21 and R22 have the same meaning as above.), R23-L2- (here, R23 and L2 have the same meaning as above.), R26R27R28Si- ( Here, R26, R27, and R28 each independently represent an alkyl group of C1 to C6.), R26R27R28Si- (CH 2 ) sO- (here, s represents an integer of 1 to 3, and R26, R27, and R28 are the same as described above. Meaning.), R20C (= O)-(Here, R20 has the same meaning as R20.), And at least one of the group consisting of a 3 to 6 member ring base containing 1 to 2 oxygen atoms.

其中取代基B,宜為氰基、C3~C8之環烷基、C1~C6之烷氧基、C2~C6之烷氧基烷氧基、R23-L2-(在此,R23及L2同前述含義。)、R26R27R28Si-(在此,R26、R27、及R28同前述含義。)、R26R27R28Si-(CH2 )s-O-(在此,s、R26、R27、及R28同前述含義。)、R20C(=O)-(在此,R20同前述含義。)、或含有1~2個氧原子之3~6員環之基較理想, 尤其氰基、或C1~C6之烷氧基較佳。Among them, the substituent B is preferably a cyano group, a cycloalkyl group of C3 to C8, an alkoxy group of C1 to C6, an alkoxyalkoxy group of C2 to C6, and R23-L2- (here, R23 and L2 are the same as described above) Meaning.), R26R27R28Si- (here, R26, R27, and R28 have the same meaning as above.), R26R27R28Si- (CH 2 ) sO- (here, s, R26, R27, and R28 have the same meaning as above.), R20C ( = O)-(Here, R20 has the same meaning as above.), Or a 3 to 6 membered ring containing 1 to 2 oxygen atoms is preferred, and a cyano group or an alkoxy group of C1 to C6 is preferred.

取代基B之理想具體例可列舉 羥基;氰基; 作為C3~C8之環烷基之環丙基、環丁基、環戊基、及環己基; 作為C1~C6之烷氧基之甲氧基、乙氧基、丙氧基、異丙氧基、丁氧基、及異丁氧基; 作為C1~C6之鹵烷氧基之二氟甲氧基、三氟甲氧基、2,2-二氟乙氧基、2,2,2-三氟乙氧基、3,3-二氟丙氧基、及3,3,3-三氟丙氧基; 作為C3~C8之環烷氧基之環丙氧基、環丁氧基、環戊氧基、及環己氧基; 作為C2~C6之烷氧基烷氧基之甲氧基甲氧基、乙氧基甲氧基、甲氧基乙氧基、乙氧基乙氧基、及甲氧基丙氧基; 作為R21R22N-(在此,R21及R22同前述含義。)之胺基、二甲胺基、乙基甲胺基、二乙胺基、吡咯啶基、及哌啶基; 作為R23-L2-(在此,R23及L2同前述含義。)之甲硫基、甲烷亞磺醯基、甲烷磺醯基、三氟甲硫基、三氟甲烷亞磺醯基、及三氟甲烷磺醯基; 作為R26R27R28Si-(在此,R26、R27、及R28同前述含義。)之三甲基矽基、及三乙基矽基; 作為R26R27R28Si-(CH2 )s-O-(在此,s、R26、R27、及R28同前述含義。)之2-(三甲基矽基)乙氧基、及2-(三乙基矽基)乙氧基; 作為R20C(=O)-(在此,R20同前述含義。)之乙醯基、丙醯基、二氟乙醯基、三氟乙醯基、環丙烷羰基、甲氧基羰基、乙氧基羰基、2,2-二氟乙氧基羰基、3,3,3-三氟丙氧基羰基、環丙氧基羰基、胺基羰基、二甲胺基羰基、乙基甲胺基羰基、二乙胺基羰基、吡咯啶基羰基、及哌啶基羰基; 及作為含有1~2個氧原子之3~6員環之基之氧雜環戊烷基、烷基、1,3-二氧雜環戊烷基、及1,3-二氧雜環己烷基(1,3-dioxanyl)。Preferred specific examples of the substituent B include a hydroxy group; a cyano group; a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group as the cycloalkyl group of C3 to C8; and a methoxy group as the alkoxy group of C1 to C6. Group, ethoxy group, propoxy group, isopropoxy group, butoxy group, and isobutoxy group; difluoromethoxy group, trifluoromethoxy group, haloalkoxy group as C1 to C6, 2, 2 -Difluoroethoxy, 2,2,2-trifluoroethoxy, 3,3-difluoropropoxy, and 3,3,3-trifluoropropoxy; as the cycloalkoxy group of C3 ~ C8 Cyclopropyloxy, cyclobutoxy, cyclopentyloxy, and cyclohexyloxy; methoxymethoxy, ethoxymethoxy, and methoxy as alkoxyalkoxy groups of C2 to C6 Oxyethoxy, ethoxyethoxy, and methoxypropoxy; R21R22N- (here, R21 and R22 have the same meanings as above.) Amino, dimethylamino, ethylmethylamino , Diethylamino, pyrrolidinyl, and piperidinyl; methylthio, methanesulfinyl, methanesulfonyl, and trifluoro as R23-L2- (here, R23 and L2 have the same meanings as above.) Methylthio, trifluoromethanesulfinyl, and trifluoromethanesulfonyl; as R26R27R28Si- (here, R26, R27, And R28 have the same meaning as above.) Trimethylsilyl and triethylsilyl; and R26R27R28Si- (CH 2 ) sO- (here, s, R26, R27, and R28 have the same meaning as above.) Of 2- (Trimethylsilyl) ethoxy and 2- (triethylsilyl) ethoxy; R20C (= O)-(here, R20 has the same meaning as above.) , Difluoroacetamido, trifluoroacetamido, cyclopropanecarbonyl, methoxycarbonyl, ethoxycarbonyl, 2,2-difluoroethoxycarbonyl, 3,3,3-trifluoropropoxycarbonyl , Cyclopropoxycarbonyl, aminocarbonyl, dimethylaminocarbonyl, ethylmethylaminocarbonyl, diethylaminocarbonyl, pyrrolidinylcarbonyl, and piperidinylcarbonyl; and as containing 1 to 2 oxygen atoms 3- to 6-membered ring radicals, oxetanyl, Alkyl, 1,3-dioxanyl, and 1,3-dioxanyl.

取代基B之更理想之具體例可列舉 羥基;氰基; 作為C3~C8之環烷基之環丙基、及環丁基; 作為C1~C6之烷氧基之甲氧基、及乙氧基; 作為C1~C6之鹵烷氧基之二氟甲氧基、三氟甲氧基、2,2-二氟乙氧基、及2,2,2-三氟乙氧基; 作為C3~C8之環烷氧基之環丙氧基、及環丁氧基; 作為C2~C6之烷氧基烷氧基之甲氧基甲氧基、乙氧基甲氧基、甲氧基乙氧基、及乙氧基乙氧基; 作為R21R22N-(在此,R21及R22同前述含義。)之二甲胺基、乙基甲胺基、及二乙胺基; 作為R23-L2-(在此,R23及L2同前述含義。)之甲硫基、甲烷亞磺醯基、及甲烷磺醯基; 作為R26R27R28Si-(在此,R26、R27、及R28同前述含義。)之三甲基矽基; 作為R26R27R28Si-(CH2 )s-O-(在此,s、R26、R27、及R28同前述含義。)之2-(三甲基矽基)乙氧基; 作為R20C(=O)-(在此,R20同前述含義。)之乙醯基、二氟乙醯基、三氟乙醯基、甲氧基羰基、乙氧基羰基、胺基羰基、二甲胺基羰基、乙基甲胺基羰基、及二乙胺基羰基; 及作為含有1~2個氧原子之3~6員環之基之1,3-二氧雜環戊烷基、及1,3-二氧雜環己烷基(1,3-dioxanyl)。More preferable specific examples of the substituent B include a hydroxyl group; a cyano group; a cyclopropyl group as a cycloalkyl group of C3 to C8, and a cyclobutyl group; a methoxy group as an alkoxy group of C1 to C6, and ethoxy group Difluoromethoxy, trifluoromethoxy, 2,2-difluoroethoxy, and 2,2,2-trifluoroethoxy as haloalkoxy groups of C1 ~ C6; as C3 ~ C8 cyclopropoxy cyclopropoxy and cyclobutoxy; C2 ~ C6 alkoxyalkoxy methoxymethoxy, ethoxymethoxy, methoxyethoxy , And ethoxyethoxy; as dimethylamino, ethylmethylamino, and diethylamino groups of R21R22N- (here, R21 and R22 have the same meanings as above.) As R23-L2- (here , R23 and L2 have the same meaning as above.) Of methylthio, methanesulfinyl, and methanesulfonyl; and trimethylsilyl as R26R27R28Si- (here, R26, R27, and R28 have the same meaning as above.) ; As R (R26R27R28Si- (CH 2 ) sO- (here, s, R26, R27, and R28 have the same meaning as above)) 2- (trimethylsilyl) ethoxy; as R20C (= O)-(in Therefore, R20 has the same meaning as above.) Ethyl, difluoroethyl, trifluoroethyl, and methoxycarbonyl , Ethoxycarbonyl, aminocarbonyl, dimethylaminocarbonyl, ethylmethylaminocarbonyl, and diethylaminocarbonyl; and as a group of 3 to 6 membered rings containing 1 to 2 oxygen atoms, 3-dioxolyl, and 1,3-dioxanyl.

式(1)之「取代基B1」,表示選自由氰基、C1~C6之烷氧基、C1~C6之鹵烷氧基、及C3~C8之環烷氧基構成之群組中之至少1種。其中取代基B1宜為氰基、或C1~C6之烷氧基較佳。The "substituent B1" of the formula (1) represents at least one selected from the group consisting of a cyano group, an alkoxy group of C1 to C6, a haloalkoxy group of C1 to C6, and a cycloalkoxy group of C3 to C8. 1 species. Among them, the substituent B1 is preferably a cyano group or an alkoxy group of C1 to C6.

取代基B1之理想具體例可列舉 氰基; 作為C1~C6之烷氧基之甲氧基、乙氧基、丙氧基、異丙氧基、丁氧基、及異丁氧基; 作為C1~C6之鹵烷氧基之二氟甲氧基、三氟甲氧基、2,2-二氟乙氧基、2,2,2-三氟乙氧基、3,3-二氟丙氧基、及3,3,3-三氟丙氧基; 及作為C3~C8之環烷氧基之環丙氧基、環丁氧基、環戊氧基、及環己氧基。Preferred specific examples of the substituent B1 include a cyano group; a methoxy group, an ethoxy group, a propoxy group, an isopropoxy group, a butoxy group, and an isobutoxy group as the alkoxy group of C1 to C6; and a C1 group ~ C6 haloalkoxy, difluoromethoxy, trifluoromethoxy, 2,2-difluoroethoxy, 2,2,2-trifluoroethoxy, 3,3-difluoropropoxy And 3,3,3-trifluoropropoxy; and cyclopropoxy, cyclobutoxy, cyclopentyloxy, and cyclohexyloxy, which are cycloalkoxy groups of C3 to C8.

取代基B1之更理想之具體例可列舉 氰基; 作為C1~C6之烷氧基之甲氧基、及乙氧基; 作為C1~C6之鹵烷氧基之二氟甲氧基、三氟甲氧基、2,2-二氟乙氧基、及2,2,2-三氟乙氧基; 及作為C3~C8之環烷氧基之環丙氧基、及環丁氧基。More preferable specific examples of the substituent B1 include cyano; methoxy and ethoxy as alkoxy groups of C1 to C6; difluoromethoxy and trifluoro as alkoxy groups of C1 to C6; Methoxy, 2,2-difluoroethoxy, and 2,2,2-trifluoroethoxy; and cyclopropoxy and cyclobutoxy, which are cycloalkoxy groups of C3 to C8.

式(1)之R2中之鹵素原子和前述定義為同含義,較佳為氟原子、氯原子、溴原子、或碘原子。 式(1)之R2包括羥基、氰基、及硝基。The halogen atom in R2 in formula (1) has the same meaning as the foregoing definition, and is preferably a fluorine atom, a chlorine atom, a bromine atom, or an iodine atom. R2 of formula (1) includes a hydroxyl group, a cyano group, and a nitro group.

式(1)之R2中之「亦可經取代基B適當取代之C1~C6之烷基」之C1~C6之烷基和前述定義為同含義,較佳為甲基、乙基、丙基、異丙基、丁基、或異丁基,更佳為甲基、乙基、丙基、或異丙基。有取代基B時,C1~C6之烷基中之氫原子可經取代基B任意地取代。The C1-C6 alkyl group of the "C1-C6 alkyl group which may also be appropriately substituted by the substituent B" in R2 of formula (1) has the same meaning as the foregoing definition, preferably methyl, ethyl, propyl , Isopropyl, butyl, or isobutyl, more preferably methyl, ethyl, propyl, or isopropyl. When there is a substituent B, the hydrogen atom in the alkyl group of C1 to C6 may be optionally substituted by the substituent B.

式(1)之R2中之「C1~C6之鹵烷基」和前述定義為同含義,較佳為二氟甲基、三氟甲基、2,2-二氟乙基、2,2,2-三氟乙基、3,3-二氟丙基、或3,3,3-三氟丙基,更佳為二氟甲基、三氟甲基、2,2-二氟乙基、或2,2,2-三氟乙基。The "C1 to C6 haloalkyl group" in R2 in formula (1) has the same meaning as the foregoing definition, and is preferably difluoromethyl, trifluoromethyl, 2,2-difluoroethyl, 2,2, 2-trifluoroethyl, 3,3-difluoropropyl, or 3,3,3-trifluoropropyl, more preferably difluoromethyl, trifluoromethyl, 2,2-difluoroethyl, Or 2,2,2-trifluoroethyl.

式(1)之R2中之「亦可經取代基B適當取代之C3~C8之環烷基」之C3~C8之環烷基和前述定義為同含義,較佳為環丙基、環丁基、環戊基、或環己基,更佳為環丙基、或環丁基。有取代基B時C3~C8之環烷基中之氫原子可經取代基B任意地取代。The cycloalkyl group of C3 ~ C8 of "C3 ~ C8 cycloalkyl group which may also be appropriately substituted by substituent B" in R2 of formula (1) has the same meaning as the foregoing definition, preferably cyclopropyl group and cyclobutyl group. Group, cyclopentyl, or cyclohexyl, more preferably cyclopropyl or cyclobutyl. When having a substituent B, a hydrogen atom in a cycloalkyl group of C3 to C8 may be optionally substituted by a substituent B.

式(1)之R2中之「亦可經取代基B適當取代之C2~C6之烯基」之C2~C6之烯基和前述定義為同含義,較佳為乙烯基、1-丙烯基、烯丙基、1-丁烯基、2-丁烯基、或3-丁烯基,更佳為乙烯基、1-丙烯基、或烯丙基。有取代基B時C2~C6之烯基中之氫原子可經取代基B任意地取代。The alkenyl groups of C2 to C6 in the "alkenyl groups of C2 to C6 which may also be appropriately substituted by the substituent B" in R2 of formula (1) have the same meanings as the foregoing definitions, preferably vinyl, 1-propenyl, Allyl, 1-butenyl, 2-butenyl, or 3-butenyl, more preferably vinyl, 1-propenyl, or allyl. When there is a substituent B, the hydrogen atom in the alkenyl group of C2 to C6 may be optionally substituted by the substituent B.

式(1)之R2中之「C2~C6之鹵烯基」和前述定義為同含義,較佳為2-氟乙烯基、2,2-二氟乙烯基、2,2-二氯乙烯基、3-氟烯丙基、3,3-二氟烯丙基、或3,3-二氯烯丙基,更佳為2-氟乙烯基、或2,2-二氟乙烯基。The "haloalkenyl group of C2 to C6" in R2 of formula (1) has the same meaning as the foregoing definition, preferably 2-fluorovinyl, 2,2-difluorovinyl, and 2,2-dichlorovinyl , 3-fluoroallyl, 3,3-difluoroallyl, or 3,3-dichloroallyl, more preferably 2-fluorovinyl, or 2,2-difluorovinyl.

式(1)之R2中之「亦可經取代基B適當取代之C2~C6之炔基」之C2~C6之炔基和前述定義為同含義,較佳為乙炔基、1-丙炔基、炔丙基、1-丁炔基、2-丁炔基、或3-丁炔基,更佳為乙炔基、1-丙炔基、或炔丙基。有取代基B時C2~C6之炔基中之氫原子可經取代基B任意地取代。The alkynyl group of C2 to C6 of "C2 to C6 alkynyl group which may also be appropriately substituted by substituent B" in R2 of formula (1) has the same meaning as the foregoing definition, preferably ethynyl and 1-propynyl , Propargyl, 1-butynyl, 2-butynyl, or 3-butynyl, more preferably ethynyl, 1-propynyl, or propargyl. When there is a substituent B, the hydrogen atom in the alkynyl group of C2 to C6 may be optionally substituted by the substituent B.

式(1)之R2中之「C2~C6之鹵炔基」和前述定義為同含義,較佳為3,3-二氟-1-丙炔基、3,3,3-三氟-1-丙炔基、4,4-二氟-1-丁炔基、4,4-二氟-2-丁炔基、4,4,4-三氟-1-丁炔基、或4,4,4-三氟-2-丁炔基,更佳為3,3-二氟-1-丙炔基、或3,3,3-三氟-1-丙炔基。The "haloalkynyl group of C2 to C6" in R2 of formula (1) has the same meaning as the foregoing definition, and is preferably 3,3-difluoro-1-propynyl, 3,3,3-trifluoro-1 -Propynyl, 4,4-difluoro-1-butynyl, 4,4-difluoro-2-butynyl, 4,4,4-trifluoro-1-butynyl, or 4,4 , 4-Trifluoro-2-butynyl, more preferably 3,3-difluoro-1-propynyl, or 3,3,3-trifluoro-1-propynyl.

式(1)之R2中之「亦可經取代基B適當取代之C1~C6之烷氧基」之C1~C6之烷氧基和前述定義為同含義,較佳為甲氧基、乙氧基、丙氧基、異丙氧基、丁氧基、異丁氧基、或戊氧基,更佳為甲氧基、乙氧基、丙氧基、異丙氧基、丁氧基、或戊氧基。有取代基B時C1~C6之烷氧基中之氫原子可經取代基B任意地取代。The C1-C6 alkoxy group of "C1-C6 alkoxy group that may also be appropriately substituted by substituent B" in R2 of formula (1) has the same meaning as the foregoing definition, and preferably methoxy group and ethoxy group Group, propoxy, isopropoxy, butoxy, isobutoxy, or pentoxy, more preferably methoxy, ethoxy, propoxy, isopropoxy, butoxy, or Pentyloxy. When there is a substituent B, the hydrogen atom in the alkoxy group of C1 to C6 may be optionally substituted by the substituent B.

式(1)之R2中之「C1~C6之鹵烷氧基」和前述定義為同含義,較佳為二氟甲氧基、三氟甲氧基、2,2-二氟乙氧基、2,2,2-三氟乙氧基、3,3-二氟丙氧基、或3,3,3-三氟丙氧基,更佳為二氟甲氧基、三氟甲氧基、2,2-二氟乙氧基、或2,2,2-三氟乙氧基。The "C1 to C6 haloalkoxy group" in R2 of formula (1) has the same meaning as the foregoing definition, and is preferably difluoromethoxy, trifluoromethoxy, 2,2-difluoroethoxy, 2,2,2-trifluoroethoxy, 3,3-difluoropropoxy, or 3,3,3-trifluoropropoxy, more preferably difluoromethoxy, trifluoromethoxy, 2,2-difluoroethoxy, or 2,2,2-trifluoroethoxy.

式(1)之R2中之「亦可經取代基B適當取代之C3~C8之環烷氧基」之C3~C8之環烷氧基和前述定義為同含義,較佳為環丙氧基、環丁氧基、環戊氧基、或環己氧基,更佳為環丙氧基、或環丁氧基。有取代基B時C3~C8之環烷氧基中之氫原子可經取代基B任意地取代。The C3 to C8 cycloalkoxy group of "C3 to C8 cycloalkoxy group which may also be appropriately substituted with substituent B" in R2 of formula (1) has the same meaning as the foregoing definition, and cyclopropyloxy group is preferred. , Cyclobutoxy, cyclopentyloxy, or cyclohexyloxy, more preferably cyclopropoxy or cyclobutoxy. When there is a substituent B, the hydrogen atom in the cycloalkoxy group of C3 to C8 may be optionally substituted by the substituent B.

式(1)之R2中之「亦可經取代基B適當取代之C2~C6之烯氧基」之C2~C6之烯氧基和前述定義為同含義,較佳為乙烯氧基、1-丙烯氧基、烯丙氧基、1-丁烯氧基、2-丁烯氧基、或3-丁烯氧基,更佳為乙烯氧基、1-丙烯氧基、或烯丙氧基。有取代基B時C2~C6之烯氧基中之氫原子可經取代基B任意地取代。The alkenyl group of C2 to C6 of the "alkenyl group of C2 to C6 which may also be appropriately substituted by substituent B" in R2 of formula (1) has the same meaning as the foregoing definition, preferably vinyloxy group, 1- Allyloxy, allyloxy, 1-butenyloxy, 2-butenyloxy, or 3-butenyloxy, more preferably ethyleneoxy, 1-propenyloxy, or allyloxy. When there is a substituent B, the hydrogen atom in the alkenyloxy group of C2 to C6 may be optionally substituted by the substituent B.

式(1)之R2中之「C2~C6之鹵烯氧基」和前述定義為同含義,較佳為2-氟乙烯氧基、2,2-二氟乙烯氧基、2,2-二氯乙烯氧基、3-氟烯丙氧基、3,3-二氟烯丙氧基、或3,3-二氯烯丙氧基,更佳為2-氟乙烯氧基、或2,2-二氟乙烯氧基。The "haloalkenyloxy group of C2 to C6" in R2 of formula (1) has the same meaning as the foregoing definition, and is preferably 2-fluoroethyleneoxy, 2,2-difluoroethyleneoxy, 2,2-di Vinyl chloride, 3-fluoroallyloxy, 3,3-difluoroallyloxy, or 3,3-dichloroallyloxy, more preferably 2-fluoroethyleneoxy, or 2,2 -Difluoroethyleneoxy.

式(1)之R2中之「亦可經取代基B適當取代之C3~C6之炔氧基」之C3~C6之炔氧基和前述定義為同含義,較佳為炔丙氧基、2-丁炔氧基、或3-丁炔氧基,更佳為炔丙氧基。有取代基B時C3~C6之炔氧基中之氫原子可經取代基B任意地取代。The alkynyloxy group of C3 ~ C6 of "C3 ~ C6 alkynyloxy group which may also be appropriately substituted by substituent B" in R2 of formula (1) has the same meaning as the foregoing definition, preferably propargyloxy, 2 -Butynyloxy or 3-butynyloxy, more preferably propargyloxy. When there is a substituent B, the hydrogen atom in the alkynyloxy group of C3 to C6 may be optionally substituted by the substituent B.

式(1)之R2中之「C3~C6之鹵炔氧基」和前述定義為同含義,較佳為4,4-二氟-2-丁炔氧基、4-氯-4,4-二氟-2-丁炔氧基、4-溴-4,4-二氟-2-丁炔氧基、或4,4,4-三氟-2-丁炔氧基,更佳為4,4-二氟-2-丁炔氧基、或4,4,4-三氟-2-丁炔氧基。The "C3 to C6 haloalkynyloxy group" in R2 of formula (1) has the same meaning as the foregoing definition, and is preferably 4,4-difluoro-2-butynyloxy group, 4-chloro-4,4- Difluoro-2-butynyloxy, 4-bromo-4,4-difluoro-2-butynyloxy, or 4,4,4-trifluoro-2-butynyloxy, more preferably 4, 4-difluoro-2-butynyloxy, or 4,4,4-trifluoro-2-butynyloxy.

式(1)之R2中之「R20C(=O)-」(在此,R20表示C1~C6之烷基、C1~C6之鹵烷基、C3~C8之環烷基、C1~C6之烷氧基、C1~C6之鹵烷氧基、C3~C8之環烷氧基、或R21R22N-(在此,R21及R22各自獨立地表示氫原子、亦可經取代基B1適當取代之C1~C6之烷基、C1~C6之鹵烷基、或C3~C8之環烷基,或表示R21及R22和鍵結之氮原子成為一體而形成氮丙啶基、四氫吖唉基、吡咯啶基、哌啶基、高哌啶基、或氮雜環辛烷基者。))之各用語和前述定義為同含義。「R20C(=O)-」較佳可列舉乙醯基、丙醯基、二氟乙醯基、三氟乙醯基、環丙烷羰基、甲氧基羰基、乙氧基羰基、2,2-二氟乙氧基羰基、2,2,2-三氟乙氧基羰基、環丙氧基羰基、胺基羰基、二甲胺基羰基、乙基甲胺基羰基、二乙胺基羰基、吡咯啶基羰基、及哌啶基羰基,更佳可列舉乙醯基、二氟乙醯基、三氟乙醯基、甲氧基羰基、乙氧基羰基、胺基羰基、二甲胺基羰基、乙基甲胺基羰基、及二乙胺基羰基。"R20C (= O)-" in R2 of formula (1) (here, R20 represents a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group, and a C1-C6 alkyl group Oxygen, haloalkoxy of C1 to C6, cycloalkoxy of C3 to C8, or R21R22N- (here, R21 and R22 each independently represent a hydrogen atom, and C1 to C6 which may be appropriately substituted by a substituent B1 Alkyl group, C1 ~ C6 haloalkyl group, or C3 ~ C8 cycloalkyl group, or it means that R21 and R22 and the bonded nitrogen atom are integrated to form aziridinyl group, tetrahydroazetino group, pyrrolidinyl group , Piperidinyl, homopiperidinyl, or azaoctyl.)) Each term and the foregoing definition have the same meaning. Examples of "R20C (= O)-" include ethyl, propyl, difluoroethyl, trifluoroethyl, cyclopropanecarbonyl, methoxycarbonyl, ethoxycarbonyl, and 2,2- Difluoroethoxycarbonyl, 2,2,2-trifluoroethoxycarbonyl, cyclopropoxycarbonyl, aminocarbonyl, dimethylaminocarbonyl, ethylmethylaminocarbonyl, diethylaminocarbonyl, pyrrole Pyridylcarbonyl and piperidinylcarbonyl, more preferably, ethynyl, difluoroacetamido, trifluoroacetamido, methoxycarbonyl, ethoxycarbonyl, aminocarbonyl, dimethylaminocarbonyl, Ethylmethylaminocarbonyl and diethylaminocarbonyl.

式(1)之R2中之「R20C(=O)O-」之R20同前述含義。「R20C(=O)O-」較佳可列舉乙醯氧基、丙醯氧基、二氟乙醯氧基、三氟乙醯氧基、環丙烷羰氧基、甲氧基羰氧基、乙氧基羰氧基、2,2-二氟乙氧基羰氧基、2,2,2-三氟乙氧基羰氧基、環丙氧基羰氧基、胺基羰氧基、二甲胺基羰氧基、乙基甲胺基羰氧基、二乙胺基羰氧基、吡咯啶基羰氧基、及哌啶基羰氧基,更佳可列舉乙醯氧基、二氟乙醯氧基、三氟乙醯氧基、甲氧基羰氧基、乙氧基羰氧基、胺基羰氧基、二甲胺基羰氧基、乙基甲胺基羰氧基、及二乙胺基羰氧基。R20 of "R20C (= O) O-" in R2 of formula (1) has the same meaning as described above. "R20C (= O) O-" is preferably exemplified by ethoxyl, propionyloxy, difluoroethoxyl, trifluoroethoxyl, cyclopropanecarbonyloxy, methoxycarbonyloxy, Ethoxycarbonyloxy, 2,2-difluoroethoxycarbonyloxy, 2,2,2-trifluoroethoxycarbonyloxy, cyclopropoxycarbonyloxy, aminocarbonyloxy, di Methylaminocarbonyloxy, ethylmethylaminocarbonyloxy, diethylaminocarbonyloxy, pyrrolidinylcarbonyloxy, and piperidinylcarbonyloxy, more preferably ethoxyl, difluoro Ethoxy, trifluoroethoxy, methoxycarbonyloxy, ethoxycarbonyloxy, aminocarbonyloxy, dimethylaminocarbonyloxy, ethylmethylaminocarbonyloxy, and Diethylaminocarbonyloxy.

式(1)之R2中之「含有1~2個氧原子之3~6員環之基」和前述定義為同含義,較佳為氧雜環戊烷基、烷基、1,3-二氧雜環戊烷基、或1,3-二氧雜環己烷基(1,3-dioxanyl),更佳為1,3-二氧雜環戊烷基、或1,3-二氧雜環己烷基(1,3-dioxanyl)。The "3 to 6-membered ring group containing 1 to 2 oxygen atoms" in R2 in formula (1) has the same meaning as the foregoing definition, and is preferably an oxetanyl group, Alkyl, 1,3-dioxanyl, or 1,3-dioxanyl, more preferably 1,3-dioxanyl, Or 1,3-dioxanyl.

式(1)之R2中之「R23-L2-」(在此,R23表示C1~C6之烷基、或C1~C6之鹵烷基,L2為S、SO、或SO2 。)之各用語和前述定義為同含義。「R23-L2-」較佳可列舉甲硫基、甲烷亞磺醯基、甲烷磺醯基、三氟甲硫基、三氟甲烷亞磺醯基、三氟甲烷磺醯基、(氯甲基)硫基、(氯甲烷)亞磺醯基、及(氯甲烷)磺醯基,更佳可列舉甲硫基、甲烷亞磺醯基、甲烷磺醯基、(氯甲基)硫基、(氯甲烷)亞磺醯基、及(氯甲烷)磺醯基。R2 of formula (1) are of the "R23-L2 -" (Here, R23 represents an alkyl group of C1 ~ C6, or haloalkyl of C1 ~ C6, L2 is S, SO, or SO 2) of each term It has the same meaning as the foregoing definition. "R23-L2-" Preferably, methylthio, methanesulfinyl, methanesulfonyl, trifluoromethylthio, trifluoromethanesulfinyl, trifluoromethanesulfinyl, (chloromethyl) ) Thio, (chloromethane) sulfinyl, and (chloromethane) sulfonyl, more preferably methylthio, methanesulfinyl, methanesulfonyl, (chloromethyl) sulfanyl, ( (Chloromethane) sulfinyl, and (chloromethane) sulfonyl.

式(1)之R2中之「R21R22N-」之R21及R22同前述含義。「R21R22N-」較佳可列舉胺基、二甲胺基、乙基甲胺基、二乙胺基、吡咯啶基、及哌啶基,更佳可列舉二甲胺基、乙基甲胺基、及二乙胺基。R21 and R22 of "R21R22N-" in R2 of formula (1) have the same meanings as described above. "R21R22N-" preferably includes amino, dimethylamino, ethylmethylamino, diethylamino, pyrrolidinyl, and piperidinyl, and more preferably, dimethylamino, ethylmethylamino , And diethylamino.

式(1)之R2中之「R24C(=O)N(R25)-」(在此,R24表示氫原子、C1~C6之烷基、C1~C6之鹵烷基、C3~C8之環烷基、C1~C6之烷氧基、C1~C6之鹵烷氧基、C3~C8之環烷氧基、或R21R22N-(在此,R21及R22同前述含義。),R25表示氫原子、亦可經取代基B1適當取代之C1~C6之烷基、C1~C6之鹵烷基、或C3~C8之環烷基。)之各用語和前述定義為同含義。R24較佳可列舉氫原子、甲基、乙基、二氟甲基、三氟甲基、環丙基、甲氧基、乙氧基、2,2-二氟乙氧基、2,2,2-三氟乙氧基、環丙氧基、胺基、二甲胺基、乙基甲胺基、二乙胺基、吡咯啶基、及哌啶基,更佳可列舉氫原子、甲基、二氟甲基、三氟甲基、甲氧基、乙氧基、胺基、二甲胺基、乙基甲胺基、及二乙胺基。又,R25較佳可列舉氫原子、甲基、乙基、丙基、甲氧基甲基、乙氧基甲基、甲氧基乙基、乙氧基乙基、氰基甲基、2-氰基乙基、2,2-二氟乙基、2,2,2-三氟乙基、及環丙基,更佳可列舉氫原子、甲基、乙基、甲氧基甲基、乙氧基甲基、甲氧基乙基、乙氧基乙基、氰基甲基、2,2-二氟乙基、及2,2,2-三氟乙基。"R24C (= O) N (R25)-" in R2 of formula (1) (here, R24 represents a hydrogen atom, an alkyl group of C1 to C6, a haloalkyl group of C1 to C6, or a cycloalkane of C3 to C8 Group, C1 to C6 alkoxy group, C1 to C6 haloalkoxy group, C3 to C8 cycloalkoxy group, or R21R22N- (here, R21 and R22 have the same meaning as above.), R25 represents a hydrogen atom, and The C1-C6 alkyl group, C1-C6 haloalkyl group, or C3-C8 cycloalkyl group, which may be appropriately substituted by the substituent B1, have the same meanings as the foregoing definitions. Preferred examples of R24 include a hydrogen atom, methyl, ethyl, difluoromethyl, trifluoromethyl, cyclopropyl, methoxy, ethoxy, 2,2-difluoroethoxy, 2,2, 2-trifluoroethoxy, cyclopropoxy, amino, dimethylamino, ethylmethylamino, diethylamino, pyrrolidinyl, and piperidinyl, more preferably a hydrogen atom, methyl , Difluoromethyl, trifluoromethyl, methoxy, ethoxy, amine, dimethylamino, ethylmethylamino, and diethylamino. Further, R25 preferably includes a hydrogen atom, methyl, ethyl, propyl, methoxymethyl, ethoxymethyl, methoxyethyl, ethoxyethyl, cyanomethyl, 2- Cyanoethyl, 2,2-difluoroethyl, 2,2,2-trifluoroethyl, and cyclopropyl. More preferred examples include hydrogen atom, methyl, ethyl, methoxymethyl, and ethyl. Oxymethyl, methoxyethyl, ethoxyethyl, cyanomethyl, 2,2-difluoroethyl, and 2,2,2-trifluoroethyl.

式(1)之n為0~5之整數。惟n為2以上時,2個以上之R2表示各自獨立的取代基,可相同或不同,可任意地選擇。N in the formula (1) is an integer of 0 to 5. However, when n is 2 or more, two or more R 2 represent independent substituents, which may be the same or different, and may be arbitrarily selected.

式(1)之R3表示氫原子、鹵素原子、硝基、亦可經取代基C適當取代之C1~C6之烷基、C1~C6之鹵烷基、亦可經取代基C適當取代之C3~C8之環烷基、亦可經取代基C適當取代之C1~C6之烷氧基、C1~C6之鹵烷氧基、亦可經取代基C適當取代之C2~C6之烯基、C2~C6之鹵烯基、亦可經取代基C適當取代之C2~C6之炔基、C2~C6之鹵炔基、R30-L3-(在此,R30同前述R23含義、L3同前述L2含義。)、R31R32N-(在此,R31及R32與前述R21及R22同義。)、或R33C(=O)-(在此,R33表示C1~C6之烷基、C1~C6之鹵烷基、或C3~C8之環烷基。)。R3 in the formula (1) represents a hydrogen atom, a halogen atom, a nitro group, a C1-C6 alkyl group which may be appropriately substituted by a substituent C, a C1-C6 haloalkyl group, or a C3 which may also be appropriately substituted by a substituent C ~ C8 cycloalkyl, C1 ~ C6 alkoxy which can be appropriately substituted by substituent C, C1 ~ C6 haloalkoxy, C2 ~ C6 alkenyl which can also be appropriately substituted by substituent C, C2 ~ C6 haloalkenyl, C2 ~ C6 alkynyl, C2 ~ C6 haloalkynyl, R30-L3- (where R30 has the same meaning as R23 and L3 has the same meaning as L2 .), R31R32N- (here, R31 and R32 are synonymous with the aforementioned R21 and R22.), Or R33C (= O)-(here, R33 represents a C1-C6 alkyl group, a C1-C6 haloalkyl group, or C3 ~ C8 cycloalkyl.).

其中R3宜為氫原子、鹵素原子、亦可經取代基C適當取代之C1~C6之烷基、亦可經取代基C適當取代之C3~C8之環烷基、亦可經取代基C適當取代之C1~C6之烷氧基、亦可經取代基C適當取代之C2~C6之炔基、或R30-L3-(在此,R30及L3同前述含義。)較理想, 尤其氫原子、鹵素原子、或亦可經取代基C適當取代之C1~C6之烷基較佳。Among them, R3 is preferably a hydrogen atom, a halogen atom, an alkyl group of C1 to C6 which may be appropriately substituted by a substituent C, a cycloalkyl group of C3 to C8 which may also be appropriately substituted by a substituent C, or an appropriate substituent C Substituted alkoxy groups of C1 to C6, alkynyl groups of C2 to C6 which may also be appropriately substituted by the substituent C, or R30-L3- (here, R30 and L3 have the same meanings as above.) Ideally, especially hydrogen atoms, A halogen atom or a C1-C6 alkyl group which may be appropriately substituted by a substituent C is preferred.

式(1)之「取代基C」,表示選自由羥基、氰基、C3~C8之環烷基、C1~C6之烷氧基、C1~C6之鹵烷氧基、C3~C8之環烷氧基、R31R32N-(在此,R31及R32は、前述R21及R22と同義。)、及R30-L3-(在此,R30同前述R14之含義,L3同前述L1之含義。)構成之群組中之至少1種。其中取代基C宜為氰基、C1~C6之烷氧基、或R30-L3-(在此,R30及L3同前述含義。)較理想, 尤其氰基、或C1~C6之烷氧基較佳。"Substituent C" in formula (1) represents a group selected from the group consisting of hydroxyl, cyano, cycloalkyl of C3 to C8, alkoxy of C1 to C6, haloalkoxy of C1 to C6, and cycloalkane of C3 to C8 A group consisting of oxygen, R31R32N- (here, R31 and R32 は, the aforementioned R21 and R22 are synonymous.), And R30-L3- (here, R30 has the meaning of the aforementioned R14, and L3 has the meaning of the aforementioned L1.) At least one of the group. Among them, the substituent C is preferably a cyano group, an alkoxy group of C1 to C6, or R30-L3- (here, R30 and L3 have the same meanings as above.) It is preferable, especially a cyano group or an alkoxy group of C1 to C6. good.

取代基C之理想具體例可列舉 羥基;氰基; 作為C3~C8之環烷基之環丙基、環丁基、環戊基、及環己基; 作為C1~C6之烷氧基之甲氧基、乙氧基、丙氧基、異丙氧基、丁氧基、及異丁氧基; 作為C1~C6之鹵烷氧基之二氟甲氧基、三氟甲氧基、2,2-二氟乙氧基、2,2,2-三氟乙氧基、3,3-二氟丙氧基、及3,3,3-三氟丙氧基; 作為C3~C8之環烷氧基之環丙氧基、環丁氧基、環戊氧基、及環己氧基; 作為R31R32N-(在此,R31及R32與前述R21及R22同義。)之胺基、二甲胺基、乙基甲胺基、二乙胺基、吡咯啶基、及哌啶基; 及作為R30-L3-(在此,R30同前述R14之含義、L3同前述L1之含義。)之甲硫基、甲烷亞磺醯基、甲烷磺醯基、三氟甲硫基、三氟甲烷亞磺醯基、及三氟甲烷磺醯基。Preferred specific examples of the substituent C include a hydroxy group; a cyano group; a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group as the cycloalkyl group of C3 to C8; and a methoxy group as the alkoxy group of C1 to C6 Group, ethoxy group, propoxy group, isopropoxy group, butoxy group, and isobutoxy group; difluoromethoxy group, trifluoromethoxy group, haloalkoxy group as C1 to C6, 2, 2 -Difluoroethoxy, 2,2,2-trifluoroethoxy, 3,3-difluoropropoxy, and 3,3,3-trifluoropropoxy; as the cycloalkoxy group of C3 ~ C8 Cyclopropyloxy, cyclobutoxy, cyclopentyloxy, and cyclohexyloxy; as amine groups, dimethylamino groups, R31R32N- (here, R31 and R32 have the same meanings as R21 and R22 described above), Ethylmethylamino, diethylamino, pyrrolidinyl, and piperidinyl; and methylthio, which is R30-L3- (herein, R30 has the meaning of the aforementioned R14, and L3 has the meaning of the aforementioned L1.) Methanesulfinyl, methanesulfonyl, trifluoromethylthio, trifluoromethanesulfinyl, and trifluoromethanesulfinyl.

取代基C之更理想之具體例可列舉 羥基;氰基; 作為C3~C8之環烷基之環丙基、及環丁基; 作為C1~C6之烷氧基之甲氧基、及乙氧基; 作為C1~C6之鹵烷氧基之二氟甲氧基、三氟甲氧基、2,2-二氟乙氧基、及2,2,2-三氟乙氧基; 作為C3~C8之環烷氧基之環丙氧基、及環丁氧基; 作為R31R32N-(在此,R31及R32同前述含義。)之二甲胺基、乙基甲胺基、及二乙胺基; 及作為R30-L3-(在此,R30及L3同前述含義。)之甲硫基、甲烷亞磺醯基、及甲烷磺醯基。More preferable specific examples of the substituent C include a hydroxyl group; a cyano group; a cyclopropyl group as a cycloalkyl group of C3 to C8, and a cyclobutyl group; a methoxy group as an alkoxy group of C1 to C6, and ethoxy group Difluoromethoxy, trifluoromethoxy, 2,2-difluoroethoxy, and 2,2,2-trifluoroethoxy as haloalkoxy groups of C1 ~ C6; as C3 ~ C8 cycloalkoxy cyclopropoxy, and cyclobutoxy; R31R32N- (here, R31 and R32 have the same meanings as above.) Dimethylamino, ethylmethylamino, and diethylamino And R30-L3- (herein, R30 and L3 have the same meanings as above.) Methylthio, methanesulfinyl, and methanesulfonyl.

式(1)之R3包括氫原子、及硝基。 式(1)之R3中之「鹵素原子」和前述定義為同含義,較佳為氟原子、氯原子、溴原子、或碘原子。R3 in formula (1) includes a hydrogen atom and a nitro group. The "halogen atom" in R3 in formula (1) has the same meaning as the foregoing definition, and is preferably a fluorine atom, a chlorine atom, a bromine atom, or an iodine atom.

式(1)之R3中之「亦可經取代基C適當取代之C1~C6之烷基」之C1~C6之烷基和前述定義為同含義,較佳為甲基、乙基、丙基、異丙基、丁基、或異丁基,更佳為甲基、乙基、或丙基。有取代基C時,C1~C6之烷基中之氫原子可經取代基C任意地取代。The C1-C6 alkyl group of "C1-C6 alkyl group which may also be appropriately substituted by the substituent C" in R3 of formula (1) has the same meaning as the foregoing definition, preferably methyl, ethyl, propyl , Isopropyl, butyl, or isobutyl, more preferably methyl, ethyl, or propyl. When there is a substituent C, a hydrogen atom in the alkyl group of C1 to C6 may be optionally substituted by the substituent C.

式(1)之R3中之「C1~C6之鹵烷基」和前述定義為同含義,較佳為二氟甲基、三氟甲基、2,2-二氟乙基、2,2,2-三氟乙基、3,3-二氟丙基、或3,3,3-三氟丙基,更佳為二氟甲基、三氟甲基、2,2-二氟乙基、或2,2,2-三氟乙基。The "C1 to C6 haloalkyl group" in R3 in formula (1) has the same meaning as the foregoing definition, and is preferably difluoromethyl, trifluoromethyl, 2,2-difluoroethyl, 2,2, 2-trifluoroethyl, 3,3-difluoropropyl, or 3,3,3-trifluoropropyl, more preferably difluoromethyl, trifluoromethyl, 2,2-difluoroethyl, Or 2,2,2-trifluoroethyl.

式(1)之R3中之「亦可經取代基C適當取代之C3~C8之環烷基」之C3~C8之環烷基和前述定義為同含義,較佳為環丙基、環丁基、環戊基、或環己基,更佳為環丙基、或環丁基。有取代基C時,C3~C8之環烷基中之氫原子可經取代基C任意地取代。The cycloalkyl group of C3 ~ C8 of "C3 ~ C8 cycloalkyl group which may also be appropriately substituted by substituent C" in R3 of formula (1) has the same meaning as the foregoing definition, preferably cyclopropyl group and cyclobutyl group Group, cyclopentyl, or cyclohexyl, more preferably cyclopropyl or cyclobutyl. When the substituent C is present, the hydrogen atom in the cycloalkyl group of C3 to C8 may be optionally substituted by the substituent C.

式(1)之R3中之「亦可經取代基C適當取代之C1~C6之烷氧基」之C1~C6之烷氧基和前述定義為同含義,較佳為甲氧基、乙氧基、丙氧基、異丙氧基、丁氧基、或異丁氧基,更佳為甲氧基、乙氧基、丙氧基、或異丙氧基。有取代基C時,C1~C6之烷氧基中之氫原子可經取代基C任意地取代。The alkoxy group of C1 to C6 in the alkoxy group of C1 to C6 which may also be appropriately substituted by the substituent C in R3 of formula (1) has the same meaning as the foregoing definition, preferably methoxy and ethoxy Group, propoxy, isopropoxy, butoxy, or isobutoxy, more preferably methoxy, ethoxy, propoxy, or isopropoxy. When the substituent C is present, the hydrogen atom in the alkoxy group of C1 to C6 may be optionally substituted by the substituent C.

式(1)之R3中之「C1~C6之鹵烷氧基」和前述定義為同含義,較佳為二氟甲氧基、三氟甲氧基、2,2-二氟乙氧基、2,2,2-三氟乙氧基、3,3-二氟丙氧基、或3,3,3-三氟丙氧基,更佳為二氟甲氧基、三氟甲氧基、2,2-二氟乙氧基、或2,2,2-三氟乙氧基。The "haloalkoxy group of C1 to C6" in R3 in formula (1) has the same meaning as the foregoing definition, and is preferably difluoromethoxy, trifluoromethoxy, 2,2-difluoroethoxy, 2,2,2-trifluoroethoxy, 3,3-difluoropropoxy, or 3,3,3-trifluoropropoxy, more preferably difluoromethoxy, trifluoromethoxy, 2,2-difluoroethoxy, or 2,2,2-trifluoroethoxy.

式(1)之R3中之「亦可經取代基C適當取代之C2~C6之烯基」之C2~C6之烯基和前述定義為同含義,較佳為乙烯基、1-丙烯基、烯丙基、1-丁烯基、2-丁烯基、或3-丁烯基,更佳為乙烯基、1-丙烯基、或烯丙基。有取代基C時,C2~C6之烯基中之氫原子可經取代基C任意地取代。The alkenyl groups of C2 to C6 in "R2 of formula (1)" Alkenyl groups of C2 to C6 which may also be appropriately substituted by substituent C "have the same meanings as above, preferably vinyl, 1-propenyl, Allyl, 1-butenyl, 2-butenyl, or 3-butenyl, more preferably vinyl, 1-propenyl, or allyl. When there is a substituent C, the hydrogen atom in the alkenyl group of C2 to C6 may be optionally substituted by the substituent C.

式(1)之R3中之「C2~C6之鹵烯基」和前述定義為同含義,較佳為2-氟乙烯基、2,2-二氟乙烯基、2,2-二氯乙烯基、3-氟烯丙基、3,3-二氟烯丙基、或3,3-二氯烯丙基,更佳為2-氟乙烯基、或2,2-二氟乙烯基。The "haloalkenyl group of C2 to C6" in R3 of formula (1) has the same meaning as the foregoing definition, and is preferably 2-fluorovinyl, 2,2-difluorovinyl, 2,2-dichlorovinyl , 3-fluoroallyl, 3,3-difluoroallyl, or 3,3-dichloroallyl, more preferably 2-fluorovinyl, or 2,2-difluorovinyl.

式(1)之R3中之「亦可經取代基C適當取代之C2~C6之炔基」之C2~C6之炔基和前述定義為同含義,較佳為乙炔基、1-丙炔基、炔丙基、1-丁炔基、2-丁炔基、或3-丁炔基,更佳為乙炔基、1-丙炔基、或炔丙基。有取代基C時,C2~C6之炔基中之氫原子可經取代基C任意地取代。The alkynyl groups of C2 to C6 of "alkynyl groups of C2 to C6 which may also be appropriately substituted by substituent C" in R3 of formula (1) have the same meanings as the foregoing definitions, preferably ethynyl and 1-propynyl , Propargyl, 1-butynyl, 2-butynyl, or 3-butynyl, more preferably ethynyl, 1-propynyl, or propargyl. When there is a substituent C, the hydrogen atom in the alkynyl group of C2 to C6 may be optionally substituted by the substituent C.

式(1)之R3中之「C2~C6之鹵炔基」和前述定義為同含義,較佳為3,3-二氟-1-丙炔基、3,3,3-三氟-1-丙炔基、4,4-二氟-1-丁炔基、4,4-二氟-2-丁炔基、4,4,4-三氟-1-丁炔基、或4,4,4-三氟-2-丁炔基,更佳為3,3-二氟-1-丙炔基、或3,3,3-三氟-1-丙炔基。The "C2 to C6 haloalkynyl group" in R3 of formula (1) has the same meaning as the foregoing definition, and is preferably 3,3-difluoro-1-propynyl, 3,3,3-trifluoro-1 -Propynyl, 4,4-difluoro-1-butynyl, 4,4-difluoro-2-butynyl, 4,4,4-trifluoro-1-butynyl, or 4,4 , 4-Trifluoro-2-butynyl, more preferably 3,3-difluoro-1-propynyl, or 3,3,3-trifluoro-1-propynyl.

式(1)之R3中之「R30-L3-」中,R30同前述R23之含義,L3同前述L2之含義。「R30-L3-」較佳可列舉甲硫基、甲烷亞磺醯基、甲烷磺醯基、三氟甲硫基、三氟甲烷亞磺醯基、及三氟甲烷磺醯基,更佳可列舉甲硫基、甲烷亞磺醯基、及甲烷磺醯基。In "R30-L3-" in R3 in formula (1), R30 has the same meaning as that of R23, and L3 has the same meaning as that of L2. "R30-L3-" preferably includes methylthio, methanesulfinyl, methanesulfonyl, trifluoromethylsulfanyl, trifluoromethanesulfinyl, and trifluoromethanesulfinyl, and more preferably Examples are methylthio, methanesulfinyl, and methanesulfonyl.

式(1)之R3中之「R31R32N-」中,R31及R32與前述R21及R22同義,較佳為胺基、二甲胺基、乙基甲胺基、二乙胺基、吡咯啶基、或哌啶基,更佳為二甲胺基、乙基甲胺基、或二乙胺基。In "R31R32N-" in R3 in formula (1), R31 and R32 have the same meanings as the aforementioned R21 and R22, and are preferably an amino group, dimethylamino group, ethylmethylamino group, diethylamino group, pyrrolidinyl group, Or piperidinyl, more preferably dimethylamino, ethylmethylamino, or diethylamino.

式(1)之R3中之「R33C(=O)-」(在此,R33表示C1~C6之烷基、C1~C6之鹵烷基、或C3~C8之環烷基)之各用語和前述定義為同含義。「R33C(=O)-」較佳可列舉乙醯基、丙醯基、二氟乙醯基、三氟乙醯基、及環丙烷羰基,更佳可列舉乙醯基、二氟乙醯基、及三氟乙醯基。The terms of "R33C (= O)-" in R3 of formula (1) (here, R33 represents a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a C3-C8 cycloalkyl group) and The foregoing definitions have the same meaning. "R33C (= O)-" preferably includes ethenyl, propionyl, difluoroethylsulfonyl, trifluoroethylsulfonyl, and cyclopropanecarbonyl, and more preferably, ethylsulfonyl and difluoroethylsulfonyl , And trifluoroacetamido.

式(1)之X表示氧原子、或硫原子。理想的X為氧原子。X in formula (1) represents an oxygen atom or a sulfur atom. Ideally X is an oxygen atom.

式(1)之Y表示苯基、吡啶基、嗒基、嘧啶基、吡基、三基、四基、噻吩基、噻唑基、異噻唑基、或噻二唑基。 該苯基中,取代基D係在鄰位取代,而取代基D1各自獨立地適當有0~4個取代。 該吡啶基、該嗒基、該嘧啶基、該吡基、該三基、或該四基,取代基D係在鄰位取代,且取代基D1各自獨立地適當有0~3個取代。 該噻吩基、該噻唑基、該異噻唑基、或該噻二唑基中,取代基D係在鄰位取代,且取代基D1各自獨立地適當有0~2個取代。Y in formula (1) represents phenyl, pyridyl, Base, pyrimidinyl, pyridine Base, three Base, four Group, thienyl, thiazolyl, isothiazolyl, or thiadiazolyl. In the phenyl group, the substituent D is substituted at the ortho position, and the substituents D1 are each independently suitably substituted with 0 to 4 substituents. The pyridyl, the da Group, the pyrimidinyl group, the pyridine Base, the three Base, or the four Group, the substituent D is substituted at the ortho position, and each of the substituents D1 is independently substituted with 0 to 3 as appropriate. In the thienyl group, the thiazolyl group, the isothiazolyl group, or the thiadiazolyl group, the substituent D is substituted in the ortho position, and the substituents D1 each independently have 0 to 2 substitutions as appropriate.

式(1)之「取代基D」係表示選自由鹵素原子、C1~C6之烷基、C1~C6之鹵烷基、C1~C6之烷氧基、及C1~C6之鹵烷氧基構成之群組中之至少1種。 其中取代基D為鹵素原子、或C1~C6之烷基較理想, 尤其,鹵素原子較佳。The "substituent D" of the formula (1) means that it is selected from the group consisting of a halogen atom, an alkyl group of C1 to C6, a haloalkyl group of C1 to C6, an alkoxy group of C1 to C6, and a haloalkoxy group of C1 to C6. At least 1 of the group. Among them, the substituent D is a halogen atom or an alkyl group of C1 to C6, and a halogen atom is particularly preferable.

取代基D之理想具體例可列舉 作為鹵素原子之氟原子、氯原子、溴原子、及碘原子; 作為C1~C6之烷基之甲基、乙基、及丙基; 作為C1~C6之鹵烷基之二氟甲基、三氟甲基、2,2-二氟乙基、及2,2,2-三氟乙基; 作為C1~C6之烷氧基之甲氧基、乙氧基、丙氧基、異丙氧基、丁氧基、異丁氧基、及第三丁氧基; 及作為C1~C6之鹵烷氧基之二氟甲氧基、三氟甲氧基、2,2-二氟乙氧基、2,2,2-三氟乙氧基、3,3-二氟丙氧基、及3,3,3-三氟丙氧基。Preferred specific examples of the substituent D include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom as a halogen atom; a methyl group, an ethyl group, and a propyl group as the alkyl group of C1 to C6; and a halogen group as C1 to C6 Difluoromethyl, trifluoromethyl, 2,2-difluoroethyl, and 2,2,2-trifluoroethyl of alkyl; methoxy and ethoxy as alkoxy groups of C1 to C6 , Propoxy, isopropoxy, butoxy, isobutoxy, and tertiary butoxy; and difluoromethoxy, trifluoromethoxy, haloalkoxy as C1 to C6, 2 2,2-difluoroethoxy, 2,2,2-trifluoroethoxy, 3,3-difluoropropoxy, and 3,3,3-trifluoropropoxy.

取代基D之更理想之具體例可列舉 作為鹵素原子之氟原子、氯原子、及溴原子; 作為C1~C6之烷基之甲基、及乙基; 作為C1~C6之烷氧基之甲氧基、乙氧基、丙氧基、及異丙氧基; 及作為C1~C6之鹵烷氧基之二氟甲氧基、三氟甲氧基、2,2-二氟乙氧基、及2,2,2-三氟乙氧基。More preferable specific examples of the substituent D include a fluorine atom, a chlorine atom, and a bromine atom as a halogen atom; a methyl group and an ethyl group as the alkyl group of C1 to C6; and a methyl group as the alkoxy group of C1 to C6. Oxy, ethoxy, propoxy, and isopropoxy; and difluoromethoxy, trifluoromethoxy, 2,2-difluoroethoxy, haloalkoxy, C1 to C6, And 2,2,2-trifluoroethoxy.

式(1)之「取代基D1」,表示選自由羥基、鹵素原子、C1~C6之烷基、C1~C6之鹵烷基、C3~C8之環烷基、C1~C6之烷氧基、C1~C6之鹵烷氧基、及C3~C8之環烷氧基構成之群組中之至少1種。 其中取代基D1宜為羥基、鹵素原子、C1~C6之烷基、C1~C6之烷氧基、或C1~C6之鹵烷基較理想, 更佳為鹵素原子、C1~C6之烷基、C1~C6之烷氧基、或C1~C6之鹵烷氧基較佳。The "substituent D1" of formula (1) represents a group selected from the group consisting of a hydroxyl group, a halogen atom, an alkyl group of C1 to C6, a haloalkyl group of C1 to C6, a cycloalkyl group of C3 to C8, an alkoxy group of C1 to C6, At least one of the group consisting of C1 to C6 haloalkoxy and C3 to C8 cycloalkoxy. Among them, the substituent D1 is preferably a hydroxyl group, a halogen atom, an alkyl group of C1 to C6, an alkoxy group of C1 to C6, or a haloalkyl group of C1 to C6, more preferably a halogen atom, an alkyl group of C1 to C6, C1-C6 alkoxy or C1-C6 haloalkoxy is preferred.

取代基D1之理想具體例可列舉 羥基; 作為鹵素原子之氟原子、氯原子、溴原子、及碘原子; 作為C1~C6之烷基之甲基、乙基、及丙基; 作為C1~C6之鹵烷基之二氟甲基、三氟甲基、2,2-二氟乙基、及2,2,2-三氟乙基; 作為C3~C8之環烷基之環丙基、環丁基、環戊基、及環己基; 作為C1~C6之烷氧基之甲氧基、乙氧基、丙氧基、異丙氧基、丁氧基、異丁氧基、及第三丁氧基; 作為C1~C6之鹵烷氧基之二氟甲氧基、三氟甲氧基、2,2-二氟乙氧基、2,2,2-三氟乙氧基、3,3-二氟丙氧基、及3,3,3-三氟丙氧基; 及作為C3~C8之環烷氧基之環丙氧基、環丁氧基、環戊氧基、及環己氧基。Preferred specific examples of the substituent D1 include a hydroxyl group; a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom as a halogen atom; a methyl group, an ethyl group, and a propyl group as the alkyl group of C1 to C6; and a C1 to C6 group Haloalkyl difluoromethyl, trifluoromethyl, 2,2-difluoroethyl, and 2,2,2-trifluoroethyl; cyclopropyl, cyclopropyl Butyl, cyclopentyl, and cyclohexyl; methoxy, ethoxy, propoxy, isopropoxy, butoxy, isobutoxy, and tert-butyl as alkoxy groups of C1 to C6 Oxygen; difluoromethoxy, trifluoromethoxy, 2,2-difluoroethoxy, 2,2,2-trifluoroethoxy, 3,3 as haloalkoxy groups of C1 to C6 -Difluoropropoxy, and 3,3,3-trifluoropropoxy; and cyclopropoxy, cyclobutoxy, cyclopentyloxy, and cyclohexyloxy as the cycloalkoxy groups of C3 to C8 base.

取代基D1之更理想之具體例可列舉 羥基; 作為鹵素原子之氟原子、氯原子、及溴原子; 作為C1~C6之烷基之甲基、及乙基; 作為C1~C6之鹵烷基之二氟甲基、及三氟甲基; 作為C3~C8之環烷基之環丙基、及環丁基; 作為C1~C6之烷氧基之甲氧基、乙氧基、丙氧基、及異丙氧基; 作為C1~C6之鹵烷氧基之二氟甲氧基、三氟甲氧基、2,2-二氟乙氧基、及2,2,2-三氟乙氧基; 及作為C3~C8之環烷氧基之環丙氧基、及環丁氧基。More preferable specific examples of the substituent D1 include a hydroxyl group; a fluorine atom, a chlorine atom, and a bromine atom as a halogen atom; a methyl group and an ethyl group as the C1 to C6 alkyl group; and a haloalkyl group as the C1 to C6 Difluoromethyl and trifluoromethyl; cyclopropyl and cyclobutyl as cycloalkyl groups of C3 to C8; methoxy, ethoxy, and propoxy groups as alkoxy groups of C1 to C6 , And isopropoxy; difluoromethoxy, trifluoromethoxy, 2,2-difluoroethoxy, and 2,2,2-trifluoroethoxy as haloalkoxy groups of C1 to C6 And cyclopropoxy, and cyclobutoxy as cycloalkoxy of C3 to C8.

以下詳細説明式(1)之Y之具體的例。 A) Y為苯基時,Y表示式(a)表示之次構造(在此,D及D1與前述為同義,ma表示0~4之整數。)。 【化6】 Specific examples of Y in the formula (1) will be described in detail below. A) When Y is a phenyl group, Y represents a substructure represented by the formula (a) (here, D and D1 have the same meanings as above, and ma represents an integer of 0 to 4). [Chemical 6]

式(a)之ma表示0~4之整數。 式(a)之ma為2以上時,2個以上之D1表示各自獨立的取代基,可相同或不同,可任意地選擇。 本說明書中,Y為苯基時,鄰位係如式(a)所示,意指有取代基D之苯基之位置。 取代基D位在鄰位之苯基成為本發明之特徵。Ma in the formula (a) represents an integer of 0 to 4. When ma in formula (a) is 2 or more, two or more D1 represent independent substituents, which may be the same or different, and may be arbitrarily selected. In the present specification, when Y is a phenyl group, the ortho position is as shown in formula (a), which means a position of a phenyl group having a substituent D. A phenyl group in which the substituent D is in the ortho position becomes a feature of the present invention.

式(a)之理想組合為2-D-6-D1-苯基、2-D-4-D1-苯基、或2-D-4-D1-6-D1-苯基。在此,例如:「2-D-6-D1-苯基」,係指在2位有取代基D、在6位有取代基D1之二取代苯基,以下之記載亦同。The ideal combination of formula (a) is 2-D-6-D1-phenyl, 2-D-4-D1-phenyl, or 2-D-4-D1-6-D1-phenyl. Here, for example, "2-D-6-D1-phenyl" refers to a disubstituted phenyl group having a substituent D at the 2-position and a substituent D1 at the 6-position. The same applies to the following description.

B) Y為吡啶基、嗒基、嘧啶基、吡基、三基、或四基時,Y係以式(b)表示之次構造(在此,D及D1與前述為同義,mb表示0~3之整數。) 【化7】B) Y is pyridyl, Base, pyrimidinyl, pyridine Base, three Base, or quad At base time, Y is a substructure represented by formula (b) (here, D and D1 are synonymous with the foregoing, and mb represents an integer from 0 to 3.) .

式(b)之G1、G2、G3及G4各自獨立地表示碳原子或氮原子。惟G1、G2、G3及G4中的至少一個為氮原子。理想的G1、G2、G3及G4係G1、G2、G3及G4中的任一者為氮原子。亦即,係吡啶基。 式(b)之mb表示0~3之整數。 式(b)之mb為2以上時,2個以上之D1表示各自獨立的取代基,可相同或不同,可任意地選擇。G1, G2, G3, and G4 in formula (b) each independently represent a carbon atom or a nitrogen atom. However, at least one of G1, G2, G3, and G4 is a nitrogen atom. Desirably, any of G1, G2, G3, and G4 is a nitrogen atom in G1, G2, G3, and G4. That is, it is pyridyl. Mb in the formula (b) represents an integer of 0 to 3. When mb of the formula (b) is 2 or more, two or more D1 represent independent substituents, which may be the same or different, and may be arbitrarily selected.

本說明書中,Y為吡啶基、嗒基、嘧啶基、吡基、三基、或四基時,鄰位係如式(b)所示,代表有取代基D之6員環之位置。 式(b)之次構造之具體例如下所示。In this specification, Y is pyridyl, Base, pyrimidinyl, pyridine Base, three Base, or quad At base time, the ortho position is as shown in formula (b), and represents the position of the 6-membered ring with substituent D. A specific example of the substructure of the formula (b) is shown below.

【化8】 [Chemical 8]

取代基D位在鄰位吡啶基、嗒基、嘧啶基、吡基、三基、或四基成為本發明之特徵。Substituent D is ortho-pyridyl, Base, pyrimidinyl, pyridine Base, three Base, or quad The base becomes a feature of the present invention.

式(b)之理想組合為3-D-2-吡啶基、3-D-5-D1-2-吡啶基、2-D-3-吡啶基、2-D-4-D1-3-吡啶基、2-D-6-D1-3-吡啶基、2-D-4-D1-6-D1-3-吡啶基、4-D-3-吡啶基、4-D-2-D1-3-吡啶基、4-D-6-D1-3-吡啶基、4-D-2-D1-6-D1-3-吡啶基、3-D-4-吡啶基、或3-D-5-D1-4-吡啶基。The ideal combination of formula (b) is 3-D-2-pyridyl, 3-D-5-D1-2-pyridyl, 2-D-3-pyridyl, 2-D-4-D1-3-pyridine Base, 2-D-6-D1-3-pyridyl, 2-D-4-D1-6-D1-3-pyridyl, 4-D-3-pyridyl, 4-D-2-D1-3 -Pyridyl, 4-D-6-D1-3-pyridyl, 4-D-2-D1-6-D1-3-pyridyl, 3-D-4-pyridyl, or 3-D-5- D1-4-pyridyl.

C) Y為噻吩基、噻唑基、異噻唑基、或噻二唑基時,Y表示式(c-1)、式(c-2)或式(c-3)表示之次構造; 【化9】【化10】【化11】在此,D及D1與前述為同義,mc表示0~2之整數。C) When Y is thienyl, thiazolyl, isothiazolyl, or thiadiazolyl, Y represents a secondary structure represented by formula (c-1), formula (c-2), or formula (c-3); 9】 [Chemical 10] [Chemical 11] Here, D and D1 are synonymous with the foregoing, and mc represents an integer of 0 to 2.

式(c-1)、式(c-2)及式(c-3)中,G5與G6各自獨立地表示碳原子或氮原子。 式(c-1)、式(c-2)及式(c-3)之mc表示0~2之整數。 式(c-1)、式(c-2)及式(c-3)之mc為2時,2個D1表示各自獨立的取代基,可相同或不同,可任意地選擇。In Formula (c-1), Formula (c-2), and Formula (c-3), G5 and G6 each independently represent a carbon atom or a nitrogen atom. In the formula (c-1), the formula (c-2), and the formula (c-3), mc represents an integer of 0 to 2. When mc of Formula (c-1), Formula (c-2), and Formula (c-3) is 2, two D1 represent independent substituents, which may be the same or different, and may be arbitrarily selected.

本說明書中,Y為噻吩基、噻唑基、異噻唑基、或噻二唑基時,鄰位係如式(c-1)、式(c-2)及式(c-3)所示,意指有取代基D之5員環之位置。 式(c-1)之次構造之具體例如下所示。In the present specification, when Y is thienyl, thiazolyl, isothiazolyl, or thiadiazolyl, the ortho position is as shown in formula (c-1), formula (c-2), and formula (c-3), Means the position of the 5-membered ring with substituent D. A specific example of the substructure of the formula (c-1) is shown below.

【化12】 [Chemical 12]

式(c-2)之次構造之具體例如下所示。 【化13】 A specific example of the substructure of the formula (c-2) is shown below. [Chemical 13]

式(c-3)之次構造之取代基之具體例如下所示。 【化14】 Specific examples of the substituent of the substructure of formula (c-3) are shown below. [Chemical 14]

取代基D位在鄰位之噻吩基、噻唑基、異噻唑基、或噻二唑基成為本發明之特徵。A thienyl, thiazolyl, isothiazolyl, or thiadiazolyl group in which the substituent D is ortho is a feature of the present invention.

式(1)中,包括破折線部之鍵結,代表 【化15】表示之處。 式(1)中,包括破折線部之鍵結代表雙鍵或單鍵。In formula (1), the bond including the broken line part represents [化 15] Where to say it. In the formula (1), the bond including the broken line portion represents a double bond or a single bond.

式(1)中包括破折線部之鍵結為雙鍵時,係代表式(1a)表示之化合物、或其鹽; 【化16】 When the bond including the broken line portion in formula (1) is a double bond, it represents the compound represented by formula (1a), or a salt thereof; [Chem. 16]

式中,R1、R2、R3、X、Y及n和式(1)為相同含意。In the formula, R1, R2, R3, X, Y, and n have the same meaning as in formula (1).

式(1)之包括破折線部之鍵結為單鍵時,表示式(1b)表示之化合物、或其鹽; 【化17】 When the bond including the broken line portion in the formula (1) is a single bond, it represents the compound represented by the formula (1b), or a salt thereof; [Chem. 17]

式中,R1、R2、R3、X、Y及n同式(1)之含意。In the formula, R1, R2, R3, X, Y, and n have the same meanings as in formula (1).

式(1b)中,R3為氫以外之取代基時,係R體或S體僅任一者,或R體與S體之任意比例之混合物。In the formula (1b), when R3 is a substituent other than hydrogen, it is only one of the R form and the S form, or a mixture of the R form and the S form in any ratio.

式(1)表示之化合物有時會有1個或2個軸不對稱。此時之異構物比為單獨或任意比例之混合比,並不特別限定。 式(1)表示之化合物有時會包括不對稱原子。此時之異構物比為單獨或任意比例之混合比,無特殊限制。 式(1)表示之化合物有時包括幾何異構物。此時之異構物比為單獨或任意比例之混合比,無特殊限制。The compound represented by formula (1) may have one or two axis asymmetry. The isomer ratio at this time is a mixing ratio of an individual ratio or an arbitrary ratio, and is not particularly limited. The compound represented by formula (1) may include asymmetric atoms in some cases. The isomer ratio at this time is a mixing ratio of an individual or an arbitrary ratio, and is not particularly limited. The compound represented by formula (1) sometimes includes geometric isomers. The isomer ratio at this time is a mixing ratio of an individual or an arbitrary ratio, and is not particularly limited.

式(1)表示之化合物有時能形成鹽。可列舉如鹽酸、硫酸、乙酸、富馬酸、馬來酸之酸鹽、如鈉、鉀、鈣之金屬鹽等,但只要能作為農藥使用即可,並無特殊限制。The compound represented by formula (1) may form a salt. Examples thereof include hydrochloric acid, sulfuric acid, acetic acid, fumaric acid, and maleic acid salts, and metal salts such as sodium, potassium, and calcium, but they are not particularly limited as long as they can be used as pesticides.

然後本發明之式(I)表示之吡啶酮化合物之具體化合物,利用表1所示之構造式、表2所示之(R2)n、及氧原子或硫原子X之組合來表達。該等化合物係用於例示,本發明不受限於此等化合物。Then, the specific compound of the pyridone compound represented by the formula (I) of the present invention is expressed by a combination of the structural formula shown in Table 1, (R2) n shown in Table 2, and an oxygen atom or a sulfur atom X. These compounds are used for illustration, and the present invention is not limited to these compounds.

【表1】 【Table 1】

【表2】 接續表1 [Table 2] Continue to Table 1

【表3】 接續表1 [Table 3] Continue to Table 1

【表4】 接續表1 [Table 4] Continue to Table 1

【表5】 接續表1 [Table 5] Continued from Table 1

【表6】 接續表1 [Table 6] Continue to Table 1

【表7】 接續表1 [Table 7] continued from Table 1

【表8】 接續表1 [Table 8] Continue to Table 1

【表9】 接續表1 [Table 9] Continue to Table 1

【表10】 接續表1 [Table 10] Continued from Table 1

【表11】 接續表1 [Table 11] continued to Table 1

【表12】 接續表1 [Table 12] continued to Table 1

【表13】 接續表1 [Table 13] Continued from Table 1

【表14】 接續表1 [Table 14] Continued from Table 1

【表15】 接續表1 [Table 15] Continued with Table 1

【表16】 接續表1 [Table 16] Continued from Table 1

【表17】 接續表1 [Table 17] continued from Table 1

【表18】 接續表1 [Table 18] Continued with Table 1

【表19】 接續表1 [Table 19] Continued with Table 1

【表20】 接續表1 [Table 20] Continued from Table 1

以下,例如表2中之「2-F-」之記載,係指(R2)n鍵結之苯基之2位有氟原子鍵結,「2-F-3-HO-」之記載,係指2位有氟原子鍵結,3位有羥基鍵結,「2,3-di-F」之記載,係指2位與3位有氟原子鍵結,其他記載亦同。Hereinafter, for example, the description of "2-F-" in Table 2 means that the fluorine atom is bonded at the 2-position of the phenyl group (R2) n-bonded, and the description of "2-F-3-HO-" is It means that there is a fluorine atom bond at the 2-position and a hydroxyl bond at the 3-position. The description of "2,3-di-F" means that there is a fluorine atom bond at the 2-position and the 3-position, and other records are the same.

【表21】 [Table 21]

【表22】 接續表2 [Table 22] Continued with Table 2

【表23】 接續表2 [Table 23] Continued with Table 2

【表24】 接續表2 [Table 24] Continued with Table 2

【表25】 接續表2 [Table 25] continued to Table 2

【表26】 接續表2 [Table 26] continued to Table 2

【表27】 接續表2 [Table 27] Continued with Table 2

【表28】 接續表2 [Table 28] Continued with Table 2

【表29】 接續表2 [Table 29] Continued with Table 2

【表30】 接續表2 [Table 30] Continued with Table 2

【表31】 接續表2 [Table 31] Continued with Table 2

【表32】 接續表2 [Table 32] Continued with Table 2

【表33】 接續表2 [Table 33] Continued with Table 2

【表34】 接續表2 [Table 34] Continued with Table 2

【表35】 接續表2 [Table 35] Continued with Table 2

【表36】 接續表2 [Table 36] Continued with Table 2

【表37】 接續表2 [Table 37] Continued with Table 2

【表38】 接續表2 [Table 38] Continued with Table 2

【表39】 接續表2 [Table 39] Continued with Table 2

【表40】 接續表2 [Table 40] Continued with Table 2

【表41】 接續表2 [Table 41] Continued with Table 2

【表42】 接續表2 [Table 42] Continued with Table 2

【表43】 接續表2 [Table 43] Continued with Table 2

【表44】 接續表2 [Table 44] Continued with Table 2

【表45】 接續表2 [Table 45] Continued with Table 2

【表46】 接續表2 [Table 46] Continued with Table 2

【表47】 接續表2 [Table 47] Continued with Table 2

【表48】 接續表2 [Table 48] Continued with Table 2

然後針對式(1)表示之吡啶酮化合物之製造方法説明。 [製造方法A]Next, the manufacturing method of the pyridone compound represented by Formula (1) is demonstrated. [Manufacturing method A]

【化18】 [Chemical 18]

式中,R4表示氫原子、羥基、氰基、亦可經取代基A適當取代之C1~C6之烷基、C1~C6之鹵烷基、亦可經取代基A適當取代之C3~C8之環烷基、亦可經取代基A適當取代之C2~C6之烯基、C2~C6之鹵烯基、亦可經取代基A適當取代之C2~C6之炔基、C2~C6之鹵炔基、亦可經取代基A適當取代之C1~C6之烷氧基、C1~C6之鹵烷氧基、亦可經取代基A適當取代之C3~C8之環烷氧基、亦可經取代基A適當取代之C2~C6之烯氧基、C2~C6之鹵烯氧基、亦可經取代基A適當取代之C3~C6之炔氧基、C3~C6之鹵炔氧基、或R10R11N-(在此,R10及R11各自獨立地表示氫原子、或C1~C6之烷基。),R5表示氫原子、或C1~C6之烷基,n、R2、R3、X及Y同前述含義。In the formula, R4 represents a hydrogen atom, a hydroxyl group, a cyano group, an alkyl group of C1 to C6 which can be appropriately substituted by substituent A, a haloalkyl group of C1 to C6, or an alkyl group of C3 to C8 which can also be appropriately substituted by substituent A. Cycloalkyl, C2 to C6 alkenyl, C2 to C6 haloalkenyl, C2 to C6 alkynyl, C2 to C6 haloalkynyl, which may be appropriately substituted with substituent A Group, C1-C6 alkoxy group, C1-C6 haloalkoxy group, C1-C6 alkoxy group, C3-C8 alkoxy group, which may be appropriately substituted by substituent A C2 ~ C6 alkenyloxy, C2 ~ C6 haloalkenyloxy suitably substituted by group A, C3 ~ C6 alkynyloxy optionally substituted by substituent A, C3 ~ C6 haloalkynyloxy, or R10R11N -(Here, R10 and R11 each independently represent a hydrogen atom or an alkyl group of C1 to C6.), R5 represents a hydrogen atom or an alkyl group of C1 to C6, and n, R2, R3, X, and Y have the same meanings as described above. .

製造方法A,係獲得本發明化合物及含有本發明化合物之製造中間體之式(1b-a)表示之化合物之方法,包括使式(3)表示之化合物與R4NH2 於酸存在下反應之步驟。Production method A is a method for obtaining a compound represented by the formula (1b-a) containing a compound of the present invention and a production intermediate containing the compound of the present invention, including a step of reacting a compound represented by the formula (3) with R4NH 2 in the presence of an acid. .

本反應使用之R4NH2 可就市售品取得或以公知之方法製造。R4NH2 亦可為形成了和如鹽酸、乙酸之酸性化合物之鹽者,只要目的反應會進行即可,無特殊限制。R4NH 2 used in this reaction can be obtained from a commercially available product or can be produced by a known method. R4NH 2 may also be a salt formed with an acidic compound such as hydrochloric acid and acetic acid, as long as the intended reaction proceeds, and there is no particular limitation.

本反應使用之R4NH2 只要相對於式(3)表示之化合物為1當量以上即可,若目的反應會進行即可,並無特殊限制,較佳為1當量以上200當量以下。The R4NH 2 used in this reaction may be 1 equivalent or more relative to the compound represented by the formula (3), and it is not particularly limited if the intended reaction proceeds, and it is preferably 1 equivalent to 200 equivalents.

本反應使用之酸可列舉鹽酸、硫酸等無機酸類、乙酸、甲烷磺酸、對甲苯磺酸等有機酸類,若目的反應會進行即可,並無特殊限制,較佳為乙酸。又,使用R4NH2 與酸性化合物之鹽時,無需使用酸。Examples of the acid used in the reaction include inorganic acids such as hydrochloric acid and sulfuric acid, and organic acids such as acetic acid, methanesulfonic acid, and p-toluenesulfonic acid. The reaction can be performed without particular limitation, and acetic acid is preferred. When a salt of R4NH 2 and an acidic compound is used, it is not necessary to use an acid.

本反應使用之酸之量只要相對於R4NH2 為1當量以上即可,若目的反應會進行即可,並無特殊限制,較佳為1當量以上200當量以下。又,使用之酸為液體時,亦可作為溶劑使用。The amount of the acid used in this reaction is only required to be 1 equivalent or more with respect to R4NH 2 , and it is not particularly limited if the intended reaction will proceed, and it is preferably 1 equivalent to 200 equivalents. When the acid used is a liquid, it can also be used as a solvent.

本反應也可使用溶劑,但並非必要。 本反應使用之溶劑若目的反應會進行即可,並無特殊限制,可列舉乙酸、甲烷磺酸等酸性系溶劑、二乙醚、二異丙醚、甲基-第三丁醚、二甲氧基乙烷、四氫呋喃、二烷等醚系溶劑、甲醇、乙醇、異丙醇等醇系溶劑、苯、甲苯、二甲苯、均三甲苯、氯苯、二氯苯等苯系溶劑、乙酸乙酯、乙酸異丙酯、乙酸丁酯等酯系溶劑、乙腈等腈系溶劑、N-甲基吡咯烷酮、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺等醯胺系溶劑、1,3-二甲基-2-咪唑啶酮等脲系溶劑、二氯甲烷、二氯乙烷、氯仿、四氯化碳等鹵素系溶劑等。該等溶劑可單獨使用或將2種以上以任意比例混用。溶劑較佳可列舉酸性系溶劑,更佳可列舉乙酸。A solvent can also be used in this reaction, but it is not necessary. The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds. Examples include acidic solvents such as acetic acid and methanesulfonic acid, diethyl ether, diisopropyl ether, methyl-tertiary butyl ether, and dimethoxy group. Ethane, tetrahydrofuran, di Ether solvents such as alkane, alcohol solvents such as methanol, ethanol, isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, ethyl acetate, isopropyl acetate, acetic acid Ester solvents such as butyl ester, nitrile solvents such as acetonitrile, N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, and other amine solvents, 1,3- Urea solvents such as dimethyl-2-imidazolidone, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride. These solvents can be used singly or in a mixture of two or more kinds at any ratio. The solvent is preferably an acidic solvent, and more preferably acetic acid.

本反應使用之溶劑量若目的反應會進行即可,並無特殊限制,通常相對於式(3)表示之化合物為3重量倍以上200重量倍以下。The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, and is usually 3 to 200 times the weight of the compound represented by formula (3).

本反應進行時之溫度,若目的反應會進行即可,並無特殊限制,通常為50℃以上180℃以下或溶劑之沸點以下。The temperature at which the reaction proceeds is not particularly limited as long as the intended reaction proceeds, and is usually 50 ° C or higher and 180 ° C or lower or the boiling point of the solvent.

反應之後處理可藉由對於反應混合物添加水或適當的水溶液,以進行分液操作。使用水溶液時,可任意地使用溶有鹽酸、硫酸等之酸性水溶液、溶有氫氧化鉀、氫氧化鈉、碳酸鈉、碳酸鉀、碳酸氫鈉、碳酸氫鉀等之鹼水溶液、食鹽水等。分液操作時,視需要也可追加甲苯、二甲苯、苯、氯苯、二氯苯等苯系溶劑、乙酸乙酯、乙酸異丙酯、乙酸丁酯等酯系溶劑、二乙醚、二異丙醚、甲基-第三丁醚等醚系溶劑、二氯甲烷、二氯乙烷、氯仿、四氯化碳等鹵素系溶劑、己烷、庚烷、環己烷、甲基環己烷等烴系溶劑等不和水互溶之溶劑。又,該等溶劑可以單獨使用,也可將2種以上以任意比例混合。分液之次數無特殊限制,可以因應目的之純度、產量實施。The post-reaction treatment can be carried out by adding water or a suitable aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid and the like are dissolved, an alkali aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, potassium bicarbonate, etc. are dissolved, and a saline solution can be optionally used. During the liquid separation operation, if necessary, benzene solvents such as toluene, xylene, benzene, chlorobenzene, and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate, and butyl acetate, diethyl ether, and diisocyanate may be added. Ether solvents such as propyl ether and methyl tertiary butyl ether; halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride; hexane, heptane, cyclohexane, methylcyclohexane Solvents that are not compatible with water, such as hydrocarbon solvents. These solvents may be used alone or as a mixture of two or more of them in an arbitrary ratio. There are no special restrictions on the number of liquid separations, and it can be performed according to the purity and yield of the purpose.

前述獲得之含式(1b-a)表示之化合物之反應混合物可利用硫酸鈉、硫酸鎂等乾燥劑去除水分,但並非必要。The aforementioned reaction mixture containing the compound represented by the formula (1b-a) can be removed by using a desiccant such as sodium sulfate and magnesium sulfate, but it is not necessary.

前述獲得之含式(1b-a)表示之化合物之反應混合物,只要化合物不分解,可於減壓下將溶劑餾去。 溶劑餾去後獲得之含式(1b-a)表示之化合物之反應混合物,可利用適當溶劑以洗淨、再沉澱、再結晶、管柱層析等精製。可因應目的之純度適當設定。As long as the reaction mixture containing the compound represented by the formula (1b-a) obtained above is not decomposed, the solvent can be distilled off under reduced pressure. The reaction mixture containing the compound represented by the formula (1b-a) obtained after the solvent is distilled off can be purified by using an appropriate solvent for washing, reprecipitation, recrystallization, column chromatography, and the like. It can be appropriately set according to the purity of the purpose.

依照製造方法A,式(1b-a)表示之化合物中之R4表示氫原子時能製造之式(2)表示之化合物,可成為獲得本發明化合物中之式(1b)表示之化合物之有用的製造中間體。According to the production method A, the compound represented by the formula (2) which can be produced when R4 in the compound represented by the formula (1b-a) represents a hydrogen atom can be useful for obtaining the compound represented by the formula (1b) among the compounds of the present invention. Manufacture of intermediates.

式(2)表示之製造中間體之具體例,可利用表3所示之構造式、表2所示之(R2)n、以及氧原子或硫原子X之組合來表達。該等化合物係用於例示,本發明並非限定於此等。Specific examples of the manufacturing intermediate represented by formula (2) can be expressed by a combination of the structural formula shown in Table 3, (R2) n shown in Table 2, and an oxygen atom or a sulfur atom X. These compounds are used for illustration, and the present invention is not limited thereto.

【表49】 [Table 49]

【表50】 接續表3 [Table 50] Continued with Table 3

【表51】 接續表3 [Table 51] Continued with Table 3

【表52】 接續表3 [Table 52] Continued with Table 3

【表53】 接續表3 [Table 53] Continued with Table 3

【表54】 接續表3 [Table 54] Continued with Table 3

【表55】 接續表3 [Table 55] Continued with Table 3

說明將此式(2)表示之化合物利用於作為製造中間體並獲得本發明之式(1b)之方法。The method of using the compound represented by the formula (2) as a production intermediate and obtaining the formula (1b) of the present invention will be described.

[製造方法B] 【化19】 [Manufacturing Method B] [Chem. 19]

式中,Lv表示甲烷磺醯基、三氟甲烷磺醯基、對甲苯磺醯基、鹵素原子等脱離基,R1、R2、R3、X、Y及n同前述含義。In the formula, Lv represents a leaving group such as methanesulfonyl, trifluoromethanesulfonyl, p-toluenesulfonyl, and halogen atom, and R1, R2, R3, X, Y, and n have the same meanings as described above.

製造方法B,係獲得式(1b)表示之化合物之方法,包括使式(2)表示之製造中間體與R1Lv於鹼之存在下,在溶劑中使其反應的步驟。Production method B is a method for obtaining a compound represented by formula (1b), and includes a step of reacting a production intermediate represented by formula (2) with R1Lv in the presence of a base in a solvent.

本反應使用之R1Lv,可就市售品取得或依公知之方法製造。The R1Lv used in this reaction can be obtained from a commercially available product or manufactured by a known method.

本反應使用之R1Lv之量,相對於式(2)表示之化合物為1當量以上即可,若目的反應會進行即可,並無特殊限制,較佳為1當量以上10當量以下。The amount of R1Lv used in this reaction is only 1 equivalent or more with respect to the compound represented by formula (2), and it is sufficient if the intended reaction proceeds, and there is no particular limitation, preferably 1 equivalent or more and 10 equivalents or less.

本反應使用之鹼可以列舉氫氧化鈉、氫氧化鉀、碳酸鈉、碳酸鉀、碳酸銫、氫化鈉等無機鹼類,若目的反應會進行即可,並無特殊限制。Examples of the base used in the reaction include inorganic bases such as sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, and sodium hydride, and the reaction can be carried out without particular limitation.

本反應使用之鹼之量相對於式(2)表示之化合物為1當量以上即可,若目的反應會進行即可,並無特殊限制,較佳為1當量以上10當量以下。The amount of the base used in this reaction is 1 equivalent or more with respect to the compound represented by the formula (2), and it is sufficient if the intended reaction proceeds. There is no particular limitation, and it is preferably 1 equivalent to 10 equivalents.

本反應使用之溶劑,若目的反應會進行即可,並無特殊限制,可以列舉二乙醚、二異丙醚、甲基-第三丁醚、二甲氧基乙烷、四氫呋喃、二烷等醚系溶劑、甲醇、乙醇、異丙醇等醇系溶劑、苯、甲苯、二甲苯、均三甲苯、氯苯、二氯苯等苯系溶劑、乙酸乙酯、乙酸異丙酯、乙酸丁酯等酯系溶劑、乙腈等腈系溶劑、N-甲基吡咯烷酮、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺等醯胺系溶劑、1,3-二甲基-2-咪唑啶酮等脲系溶劑、二氯甲烷、二氯乙烷、氯仿、四氯化碳等鹵素系溶劑、二甲基亞碸、環丁碸等硫系溶劑、丙酮、甲乙酮、甲基異丁酮等酮系溶劑等。該等溶劑可單獨使用或將2種以上以任意之比例混合使用。The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, and examples thereof include diethyl ether, diisopropyl ether, methyl-third butyl ether, dimethoxyethane, tetrahydrofuran, and diamine. Ether solvents such as alkane, alcohol solvents such as methanol, ethanol, isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, ethyl acetate, isopropyl acetate, acetic acid Ester solvents such as butyl ester, nitrile solvents such as acetonitrile, N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, and other amine solvents, 1,3- Urea solvents such as dimethyl-2-imidazolidinone, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, sulfur solvents such as dimethylmethylene, cyclobutane, acetone, Ketone solvents such as methyl ethyl ketone and methyl isobutyl ketone. These solvents may be used singly or as a mixture of two or more kinds in any ratio.

本反應使用之溶劑量,若目的反應會進行即可,並無特殊限制,但通常相對於式(2)表示之化合物為3重量倍以上200重量倍以下。The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 3 to 200 times the weight of the compound represented by formula (2).

實施本反應時之溫度,若目的反應會進行即可,並無特殊限制,但通常為0℃以上150℃以下或溶劑之沸點以下。The temperature at which the reaction is carried out is not particularly limited as long as the intended reaction proceeds, but it is usually 0 ° C or higher and 150 ° C or lower or the boiling point of the solvent.

反應之後處理可藉由對於反應混合物添加水或適當的水溶液以進行分液操作。使用水溶液時,可任意地使用溶有鹽酸、硫酸等之酸性水溶液、溶有氫氧化鉀、氫氧化鈉、碳酸鈉、碳酸鉀、碳酸氫鈉、碳酸氫鉀等之鹼水溶液、溶有硫代硫酸鈉、亞硫酸鈉等含硫之鹽的水溶液、食鹽水等。分液操作時,視需要可追加甲苯、二甲苯、苯、氯苯、二氯苯等苯系溶劑、乙酸乙酯、乙酸異丙酯、乙酸丁酯等酯系溶劑、二乙醚、二異丙醚、甲基-第三丁醚等醚系溶劑、二氯甲烷、二氯乙烷、氯仿、四氯化碳等鹵素系溶劑、己烷、庚烷、環己烷、甲基環己烷等烴系溶劑等不和水互溶之溶劑。又,該等溶劑可單獨使用也可將2種以上以任意比例混合。分液之次數無特殊限制,可因應目的純度、產量實施。The post-reaction treatment can be carried out by adding water or a suitable aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, etc. is dissolved, an alkali aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, potassium bicarbonate, etc. are dissolved, and a thio group is dissolved can be optionally used. Aqueous solutions of sulfur salts, such as sodium sulfate and sodium sulfite, and saline solution. During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, etc .; ester solvents such as ethyl acetate, isopropyl acetate, and butyl acetate; Ether solvents such as ether, methyl-tertiary butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride; hexane, heptane, cyclohexane, methylcyclohexane, etc. Solvents that are miscible with water, such as hydrocarbon solvents. These solvents may be used alone or as a mixture of two or more of them in an arbitrary ratio. There are no special restrictions on the number of liquid separations, which can be performed according to the purity and yield of the purpose.

前述獲得之含式(1b)表示之化合物之反應混合物可利用硫酸鈉、硫酸鎂等乾燥劑去除水分但非必要。The reaction mixture containing the compound represented by the formula (1b) obtained above can be removed by using a desiccant such as sodium sulfate and magnesium sulfate, but it is not necessary.

前述獲得之含式(1b)表示之化合物之反應混合物,只要化合物不分解,可於減壓下溶劑餾去。 溶劑餾去後獲得之含式(1b)表示之化合物之反應混合物,可利用適當溶劑以洗淨、再沉澱、再結晶、管柱層析等精製。可因應目的純度適當設定。The reaction mixture containing the compound represented by the formula (1b) obtained above can be distilled off under reduced pressure as long as the compound does not decompose. The reaction mixture containing the compound represented by the formula (1b) obtained after the solvent is distilled off can be purified by using an appropriate solvent for washing, reprecipitation, recrystallization, column chromatography, and the like. It can be appropriately set according to the purpose purity.

[製造方法C] 【化20】 [Manufacturing Method C] [Chem. 20]

式中,SR表示硫化劑,R1、R2、R3、Y及n與前述為同義。In the formula, SR represents a vulcanizing agent, and R1, R2, R3, Y, and n have the same meanings as described above.

製造方法C係獲得式(1b)表示之化合物中之式(1b-c)表示之化合物之製造方法,包括使式(1b-b)表示之化合物與硫化劑(SR)於溶劑中反應之步驟。Production method C is a production method for obtaining a compound represented by formula (1b-c) among the compounds represented by formula (1b), including a step of reacting a compound represented by formula (1b-b) with a vulcanizing agent (SR) in a solvent. .

本反應使用之硫化劑可列舉勞森試藥(Lawesson'sreagent)(2,4-雙(4-甲氧基苯基)-1,3-二硫雜-2,4-二磷雜環丁烷-2,4-二硫醚(2,4-bis(4-methoxyphenyl)-1,3-dithia- 2,4-diphosphetane-2,4-disulfide))。Examples of the sulfurizing agent used in this reaction include Lawesson's reagent (2,4-bis (4-methoxyphenyl) -1,3-dithia-2,4-diphosphatidine Alkane-2,4-disulfide (2,4-bis (4-methoxyphenyl) -1,3-dithia-2,4-diphosphetane-2,4-disulfide)).

本反應使用之硫化劑之量只要相對於式(1b-b)表示之化合物為0.5當量以上即可,若目的反應會進行即可,並無特殊限制,較佳為1當量以上10當量以下。The amount of the vulcanizing agent used in this reaction is only required to be 0.5 equivalent or more with respect to the compound represented by the formula (1b-b), and it is not particularly limited if the intended reaction proceeds, and it is preferably 1 equivalent to 10 equivalents.

本反應使用之溶劑若目的反應會進行即可,並無特殊限制,可列舉二乙醚、二異丙醚、甲基-第三丁醚、二甲氧基乙烷、四氫呋喃、二烷等醚系溶劑、苯、甲苯、二甲苯、均三甲苯、氯苯、二氯苯等苯系溶劑等。該等溶劑可單獨使用或將2種以上以任意比例混合使用。The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, and examples include diethyl ether, diisopropyl ether, methyl-third butyl ether, dimethoxyethane, tetrahydrofuran, and diamine. Ether solvents such as alkane, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, and dichlorobenzene. These solvents may be used singly or as a mixture of two or more kinds in any ratio.

本反應使用之溶劑量若目的反應會進行即可,並無特殊限制,通常相對於式(1b-b)表示之化合物為3重量倍以上200重量倍以下。The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, and is usually 3 to 200 times the weight of the compound represented by the formula (1b-b).

本反應進行時之溫度若目的反應會進行即可,並無特殊限制,通常為50℃以上180℃以下或溶劑之沸點以下。The temperature at which the reaction proceeds is not particularly limited as long as the intended reaction proceeds, and is usually 50 ° C or higher and 180 ° C or lower or the boiling point of the solvent.

反應之後處理可藉由對於反應混合物添加水、或適當的水溶液以進行分液操作。使用水溶液時,可任意使用溶有鹽酸、硫酸等之酸性水溶液、溶有氫氧化鉀、氫氧化鈉、碳酸鈉、碳酸鉀、碳酸氫鈉、碳酸氫鉀等之鹼水溶液、食鹽水等。分液操作時,視需要可追加甲苯、二甲苯、苯、氯苯、二氯苯等苯系溶劑、乙酸乙酯、乙酸異丙酯、乙酸丁酯等酯系溶劑、二乙醚、二異丙醚、甲基-第三丁醚等醚系溶劑、二氯甲烷、二氯乙烷、氯仿、四氯化碳等鹵素系溶劑、己烷、庚烷、環己烷、甲基環己烷等烴系溶劑等和水不互溶之溶劑。又,該等溶劑可單獨使用也可將2種以上以任意比例混合。分液之次數無特殊限制,可因應目的之純度、產量實施。又,本反應中,分液操作並非必要。The post-reaction treatment can be carried out by adding water to the reaction mixture or a suitable aqueous solution for liquid separation. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid and the like are dissolved, an alkali aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, potassium bicarbonate and the like are dissolved, and a saline solution can be optionally used. During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, etc .; ester solvents such as ethyl acetate, isopropyl acetate, and butyl acetate; Ether solvents such as ether, methyl-tertiary butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride; hexane, heptane, cyclohexane, methylcyclohexane, etc. Hydrocarbon solvents and other solvents that are immiscible with water. These solvents may be used alone or as a mixture of two or more of them in an arbitrary ratio. There are no special restrictions on the number of liquid separations, which can be implemented according to the purity and yield of the purpose. In this reaction, a liquid separation operation is not necessary.

前述獲得之含式(1b-c)表示之化合物之反應混合物可利用硫酸鈉、硫酸鎂等乾燥劑去除水分但非必要。The reaction mixture containing the compound represented by the formula (1b-c) obtained above can be removed by using a desiccant such as sodium sulfate and magnesium sulfate, but it is not necessary.

前述獲得之含式(1b-c)表示之化合物之反應混合物,只要化合物不分解,可於減壓下將溶劑餾去。 溶劑餾去後獲得之含式(1b-c)表示之化合物之反應混合物,可利用適當溶劑以洗淨、再沉澱、再結晶、管柱層析等精製。可因應目的純度而適當設定。As long as the reaction mixture containing the compound represented by the formula (1b-c) obtained above is not decomposed, the solvent can be distilled off under reduced pressure. The reaction mixture containing the compound represented by the formula (1b-c) obtained after the solvent is distilled off can be purified by using an appropriate solvent for washing, reprecipitation, recrystallization, column chromatography, and the like. It can be appropriately set according to the purity of the purpose.

[製造方法D] 【化21】 [Manufacturing Method D] [Chem. 21]

式中,R3a表示也可經取代基C適當取代之C1~C6之烷基、C1~C6之鹵烷基、也可經取代基C適當取代之C3~C8之環烷基、也可經取代基C適當取代之C2~C6之烯基、C2~C6之鹵烯基、也可經取代基C適當取代之C2~C6之炔基、或C2~C6之鹵炔基,Lv、R1、R2、X、Y及n與前述為同義。In the formula, R3a represents a C1-C6 alkyl group, a C1-C6 haloalkyl group, which may be appropriately substituted by a substituent C, or a C3-C8 cycloalkyl group, which may also be appropriately substituted by a substituent C, or may be substituted. C2 to C6 alkenyl, C2 to C6 haloalkenyl, C2 to C6 alkynyl, or C2 to C6 haloalkynyl, which can be appropriately substituted with substituent C, Lv, R1, R2 , X, Y, and n are synonymous with the foregoing.

製造方法D,係合成式(1b)表示之化合物中之R3a係也可經取代基C適當取代之C1~C6之烷基、C1~C6之鹵烷基、也可經取代基C適當取代之C3~C8之環烷基、也可經取代基C適當取代之C2~C6之烯基、C2~C6之鹵烯基、也可經取代基C適當取代之C2~C6之炔基、或C2~C6之鹵炔基的式(1b-e)表示之化合物之合成方法,包括使式(1b-d)表示之化合物與R3aLv於鹼存在下於溶劑中反應之步驟。Production method D is a compound in which R3a in the compound represented by the formula (1b) is a C1-C6 alkyl group, a C1-C6 haloalkyl group that may also be appropriately substituted by a substituent C, or may be appropriately substituted by a substituent C C3 to C8 cycloalkyl, C2 to C6 alkenyl, C2 to C6 haloalkenyl, C2 to C6 alkynyl, or C2 A method for synthesizing a compound represented by the formula (1b-e) of a haloalkynyl group of ~ C6 includes a step of reacting the compound represented by the formula (1b-d) with R3aLv in a solvent in the presence of a base.

本反應使用之R3aLv可就市售品取得或依公知之方法製造。 本反應使用之R3aLv之量相對於式(1b-d)表示之化合物為1當量以上即可,若目的反應會進行即可,並無特殊限制,較佳為1當量以上1.8當量以下。The R3aLv used in this reaction can be obtained from a commercially available product or manufactured by a known method. The amount of R3aLv used in this reaction is 1 equivalent or more with respect to the compound represented by the formula (1b-d), and there is no particular limitation as long as the intended reaction proceeds, and it is preferably 1 equivalent to 1.8 equivalents.

本反應使用之鹼可列舉氫化鈉等金屬氫化物類、甲基鋰、丁基鋰、第二丁基鋰、第三丁基鋰、己基鋰等有機鋰類、二異丙基胺基鋰、六甲基二矽氮烷鋰、六甲基二矽氮烷鈉、六甲基二矽氮烷鉀等金屬胺化物類。Examples of the base used in this reaction include metal hydrides such as sodium hydride, methyllithium, butyllithium, organic lithium such as second butyllithium, third butyllithium, and hexyllithium, lithium diisopropylamino, Metal amines such as lithium hexamethyldisilazane, sodium hexamethyldisilazane, and potassium hexamethyldisilazane.

本反應使用之鹼之量相對於式(1b-d)表示之化合物為1當量以上即可,若目的反應會進行即可,並無特殊限制,較佳為1當量以上10當量以下。The amount of the base used in this reaction is 1 equivalent or more with respect to the compound represented by the formula (1b-d), and it is sufficient if the intended reaction proceeds, and there is no particular limitation, and it is preferably 1 equivalent to 10 equivalents.

本反應使用之溶劑若目的反應會進行即可,並無特殊限制,可列舉二乙醚、二異丙醚、甲基-第三丁醚、二甲氧基乙烷、四氫呋喃、二烷等醚系溶劑、苯、甲苯、二甲苯、均三甲苯、氯苯、二氯苯等苯系溶劑等。該等溶劑可單獨使用或將2種以上以任意比例混合使用。The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, and examples include diethyl ether, diisopropyl ether, methyl-third butyl ether, dimethoxyethane, tetrahydrofuran, and diamine. Ether solvents such as alkane, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, and dichlorobenzene. These solvents may be used singly or as a mixture of two or more kinds in any ratio.

本反應使用之溶劑量若目的反應會進行即可,並無特殊限制,通常相對於式(1b-d)表示之化合物為3重量倍以上200重量倍以下。The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, and is usually 3 to 200 times the weight of the compound represented by the formula (1b-d).

本反應進行時之溫度若目的反應會進行即可,並無特殊限制,通常為-80℃以上100℃以下或溶劑之沸點以下。The temperature at which the reaction proceeds is not particularly limited as long as the intended reaction proceeds, and is usually -80 ° C to 100 ° C or lower than the boiling point of the solvent.

反應之後處理可藉由對於反應混合物添加水或適當的水溶液以進行分液操作。使用水溶液時,可任意地使用溶有鹽酸、硫酸等之酸性水溶液、溶有氫氧化鉀、氫氧化鈉、碳酸鈉、碳酸鉀、碳酸氫鈉、碳酸氫鉀等之鹼水溶液、溶有硫代硫酸鈉、亞硫酸鈉等含硫之鹽的水溶液、食鹽水等。分液操作時,視需要亦可追加甲苯、二甲苯、苯、氯苯、二氯苯等苯系溶劑、乙酸乙酯、乙酸異丙酯、乙酸丁酯等酯系溶劑、二乙醚、二異丙醚、甲基-第三丁醚等醚系溶劑、二氯甲烷、二氯乙烷、氯仿等鹵素系溶劑、己烷、庚烷、環己烷、甲基環己烷等烴系溶劑等和水不互溶之溶劑。又,該等溶劑可單獨使用也可將2種以上以任意比例混合。分液之次數無特殊限制,可因應目的之純度、產量實施。The post-reaction treatment can be carried out by adding water or a suitable aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, etc. is dissolved, an alkali aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, potassium bicarbonate, etc. are dissolved, and a thio group is dissolved can be optionally used Aqueous solutions of sulfur salts, such as sodium sulfate and sodium sulfite, and saline solution. During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene, and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate, and butyl acetate, diethyl ether, and diisocyanate can be added as needed. Ether solvents such as propyl ether and methyl tertiary butyl ether, halogen solvents such as dichloromethane, dichloroethane, and chloroform, hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane, etc. Miscible with water. These solvents may be used alone or as a mixture of two or more of them in an arbitrary ratio. There are no special restrictions on the number of liquid separations, which can be implemented according to the purity and yield of the purpose.

前述獲得之含式(1b-e)表示之化合物之反應混合物可利用硫酸鈉、硫酸鎂等乾燥劑去除水分但非必要。The reaction mixture containing the compound represented by the formula (1b-e) obtained above can be removed by using a desiccant such as sodium sulfate and magnesium sulfate, but it is not necessary.

前述獲得之含式(1b-e)表示之化合物之反應混合物,只要化合物不分解,可以於減壓下將溶劑餾去。 溶劑餾去後獲得之含式(1b-e)表示之化合物之反應混合物可利用適當的溶劑以洗淨、再沉澱、再結晶、管柱層析等進行精製。可因應目的純度而適當設定。As long as the reaction mixture containing the compound represented by the formula (1b-e) obtained above is not decomposed, the solvent can be distilled off under reduced pressure. The reaction mixture containing the compound represented by the formula (1b-e) obtained after the solvent is distilled off can be purified by using an appropriate solvent for washing, reprecipitation, recrystallization, column chromatography, and the like. It can be appropriately set according to the purity of the purpose.

[製造方法E] 【化22】 [Manufacturing method E] [Chem. 22]

式中,Ox表示氧化劑,R1、R2、R3、X、Y及n同前述之含意。In the formula, Ox represents an oxidant, and R1, R2, R3, X, Y, and n have the same meanings as described above.

製造方法E係獲得式(1a)表示之化合物之方法,包括使式(1b)表示之化合物與氧化劑(Ox)於溶劑中反應之步驟。Production method E is a method for obtaining a compound represented by the formula (1a), and includes a step of reacting the compound represented by the formula (1b) with an oxidizing agent (Ox) in a solvent.

就本反應使用之氧化劑而言,可以使用二氧化錳等金屬氧化物類、2,3-二氯-5,6-二氰基-對苯醌等苯醌類、偶氮雙異丁腈、過氧化苯甲醯基等自由基起始劑與N-氯琥珀醯亞胺、N-溴琥珀醯亞胺、N-碘琥珀醯亞胺、1,3-二氯-5,5-二甲基乙內醯脲、1,3-二溴-5,5-二甲基乙內醯脲、1,3-二碘-5,5-二甲基乙內醯脲等鹵化劑組合者等。As the oxidant used in this reaction, metal oxides such as manganese dioxide, benzoquinones such as 2,3-dichloro-5,6-dicyano-p-benzoquinone, azobisisobutyronitrile, Free radical initiators such as benzamyl peroxide and N-chlorosuccinimide, N-bromosuccinimide, N-iodosuccinimide, 1,3-dichloro-5,5-dimethyl Combinations of halogenating agents such as methylhydantoin, 1,3-dibromo-5,5-dimethylhydantoin, 1,3-diiodo-5,5-dimethylhydantoin and the like.

以下針對氧化劑係金屬氧化物類之方法説明。 本反應使用之氧化劑之量,只要相對於式(1b)表示之化合物為1當量以上即可,若目的反應會進行即可,並無特殊限制,通常為1當量以上200當量以下。The method of the oxidant-based metal oxides will be described below. The amount of the oxidizing agent used in this reaction may be 1 equivalent or more with respect to the compound represented by the formula (1b), and it is not particularly limited if the intended reaction proceeds, and is usually 1 equivalent to 200 equivalents.

本反應使用之溶劑若目的反應會進行即可,並無特殊限制,可以列舉苯、甲苯、二甲苯、均三甲苯、氯苯、二氯苯等苯系溶劑、二氯甲烷、二氯乙烷、氯仿、四氯化碳等鹵素系溶劑等。該等溶劑可單獨使用或將2種以上以任意比例混合使用。The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds. Examples include benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, and dichlorobenzene, methylene chloride, and dichloroethane. , Chloroform, carbon tetrachloride and other halogen solvents. These solvents may be used singly or as a mixture of two or more kinds in any ratio.

本反應使用之溶劑量若目的反應會進行即可,並無特殊限制,通常相對於式(1b)表示之化合物為3重量倍以上200重量倍以下。The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, and is usually 3 to 200 times the weight of the compound represented by formula (1b).

本反應進行時之溫度若目的反應會進行即可,並無特殊限制,通常為0℃以上150℃以下或溶劑之沸點以下。The temperature at which the reaction proceeds is not particularly limited as long as the intended reaction proceeds, and is usually 0 ° C to 150 ° C or lower than the boiling point of the solvent.

反應之後處理可藉由過濾未溶解之金屬類以將其除去。再者,可藉由對於反應混合物添加水或適當的水溶液以進行分液操作。使用水溶液時,可以任意地使用溶有鹽酸、硫酸等之酸性水溶液、溶有氫氧化鉀、氫氧化鈉、碳酸鈉、碳酸鉀、碳酸氫鈉、碳酸氫鉀等之鹼水溶液、食鹽水等。分液操作時,視需要可追加甲苯、二甲苯、苯、氯苯、二氯苯等苯系溶劑、乙酸乙酯、乙酸異丙酯、乙酸丁酯等酯系溶劑、二乙醚、二異丙醚、甲基-第三丁醚等醚系溶劑、二氯甲烷、二氯乙烷、氯仿、四氯化碳等鹵素系溶劑、己烷、庚烷、環己烷、甲基環己烷等烴系溶劑等和水不互溶之溶劑。又,該等溶劑可單獨使用也可將2種以上以任意比例混合。分液之次數無特殊限制,可因應目的之純度、產量實施。又,本反應中,分液操作並非必要。After the reaction, undissolved metals can be removed by filtering. Furthermore, a liquid separation operation can be performed by adding water or a suitable aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid and the like are dissolved, an alkali aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, potassium bicarbonate, etc. are dissolved, and saline are optionally used. During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, etc .; ester solvents such as ethyl acetate, isopropyl acetate, and butyl acetate; Ether solvents such as ether, methyl-tertiary butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride; hexane, heptane, cyclohexane, methylcyclohexane, etc. Hydrocarbon solvents and other solvents that are immiscible with water. These solvents may be used alone or as a mixture of two or more of them in an arbitrary ratio. There are no special restrictions on the number of liquid separations, which can be implemented according to the purity and yield of the purpose. In this reaction, a liquid separation operation is not necessary.

前述獲得之含式(1a)表示之化合物之反應混合物可利用硫酸鈉、硫酸鎂等乾燥劑去除水分但非必要。The reaction mixture containing the compound represented by the formula (1a) obtained above can be removed by using a desiccant such as sodium sulfate and magnesium sulfate, but it is not necessary.

前述獲得之含式(1a)表示之化合物之反應混合物,只要化合物不分解,可於減壓下將溶劑餾去。 溶劑餾去後獲得之含式(1a)表示之化合物之反應混合物可利用適當的溶劑以洗淨、再沉澱、再結晶、管柱層析等精製。可因應目的純度而適當設定。As long as the reaction mixture containing the compound represented by the formula (1a) obtained above is not decomposed, the solvent can be distilled off under reduced pressure. The reaction mixture containing the compound represented by the formula (1a) obtained after the solvent is distilled off can be purified using an appropriate solvent for washing, reprecipitation, recrystallization, column chromatography, and the like. It can be appropriately set according to the purity of the purpose.

以下針對氧化劑為苯醌類之方法説明。 本反應使用之氧化劑之量相對於式(1b)表示之化合物若為1當量以上即可,若目的反應會進行即可,並無特殊限制,通常為1當量以上20當量以下。The following is a description of a method in which the oxidant is a benzoquinone. The amount of the oxidizing agent used in this reaction may be 1 equivalent or more with respect to the compound represented by the formula (1b), and it is sufficient if the intended reaction proceeds. There is no particular limitation, and it is usually 1 to 20 equivalents.

本反應使用之溶劑若目的反應會進行即可,並無特殊限制,可以列舉苯、甲苯、二甲苯、均三甲苯、氯苯、二氯苯等苯系溶劑、二氯甲烷、二氯乙烷、氯仿、四氯化碳等鹵素系溶劑等。該等溶劑可單獨使用或將2種以上以任意比例混合使用。The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds. Examples include benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, and dichlorobenzene, methylene chloride, and dichloroethane. , Chloroform, carbon tetrachloride and other halogen solvents. These solvents may be used singly or as a mixture of two or more kinds in any ratio.

本反應使用之溶劑量,若目的反應會進行即可,並無特殊限制,通常相對於式(1b)表示之化合物為3重量倍以上200重量倍以下。The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, and is usually 3 to 200 times the weight of the compound represented by the formula (1b).

本反應進行時之溫度,若目的反應會進行即可,並無特殊限制,通常為0℃以上150℃以下或溶劑之沸點以下。The temperature at which the reaction proceeds is not particularly limited as long as the intended reaction proceeds, and is usually 0 ° C or higher and 150 ° C or lower or the boiling point of the solvent.

反應之後處理可藉由對於反應混合物添加水或適當的水溶液以進行分液操作。使用水溶液時可以任意地使用溶有鹽酸、硫酸等之酸性水溶液、溶有氫氧化鉀、氫氧化鈉、碳酸鈉、碳酸鉀、碳酸氫鈉、碳酸氫鉀等之鹼水溶液、食鹽水等。分液操作時,視需要可追加甲苯、二甲苯、苯、氯苯、二氯苯等苯系溶劑、乙酸乙酯、乙酸異丙酯、乙酸丁酯等酯系溶劑、二乙醚、二異丙醚、甲基-第三丁醚等醚系溶劑、二氯甲烷、二氯乙烷、氯仿、四氯化碳等鹵素系溶劑、己烷、庚烷、環己烷、甲基環己烷等烴系溶劑等和水不互溶之溶劑。又,該等溶劑可單獨使用也可將2種以上以任意比例混合。分液之次數無特殊限制,可因應目的之純度、產量實施。又,本反應中,分液操作並非必要。The post-reaction treatment can be carried out by adding water or a suitable aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid and the like are dissolved, an alkali aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, potassium bicarbonate and the like are dissolved, and a saline solution can be optionally used. During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, etc .; ester solvents such as ethyl acetate, isopropyl acetate, and butyl acetate; Ether solvents such as ether, methyl-tertiary butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride; hexane, heptane, cyclohexane, methylcyclohexane, etc. Hydrocarbon solvents and other solvents that are immiscible with water. These solvents may be used alone or as a mixture of two or more of them in an arbitrary ratio. There are no special restrictions on the number of liquid separations, which can be implemented according to the purity and yield of the purpose. In this reaction, a liquid separation operation is not necessary.

前述獲得之含式(1a)表示之化合物之反應混合物可利用硫酸鈉、硫酸鎂等乾燥劑去除水分但非必要。The reaction mixture containing the compound represented by the formula (1a) obtained above can be removed by using a desiccant such as sodium sulfate and magnesium sulfate, but it is not necessary.

前述獲得之含式(1a)表示之化合物之反應混合物,只要化合物可分解,可以於減壓下將溶劑餾去。 溶劑餾去後獲得之含式(1a)表示之化合物之反應混合物可利用適當的溶劑以洗淨、再沉澱、再結晶、管柱層析等精製。可因應目的純度而適當設定。As long as the reaction mixture containing the compound represented by the formula (1a) obtained above is decomposable, the solvent can be distilled off under reduced pressure. The reaction mixture containing the compound represented by the formula (1a) obtained after the solvent is distilled off can be purified using an appropriate solvent for washing, reprecipitation, recrystallization, column chromatography, and the like. It can be appropriately set according to the purity of the purpose.

以下針對氧化劑為自由基起始劑與鹵化劑之組合的方法説明。 本反應使用之自由基起始劑與鹵化劑之量若各相對於式(1b)表示之化合物各為0.01當量以上與1.0當量以上即可,若目的反應會進行即可,並無特殊限制。較佳為自由基起始劑為0.01當量以上1當量以下,鹵化劑為1當量以上3當量以下。The following describes a method in which the oxidant is a combination of a radical initiator and a halogenating agent. The amounts of the radical initiator and the halogenating agent used in this reaction are only 0.01 equivalents or more and 1.0 equivalents or more relative to the compound represented by formula (1b), and there is no particular limitation as long as the intended reaction proceeds. The free radical initiator is preferably 0.01 to 1 equivalent, and the halogenating agent is preferably 1 to 3 equivalents.

本反應使用之溶劑,若目的反應會進行即可,並無特殊限制,可列舉氯苯、二氯苯等鹵化苯系溶劑、乙酸乙酯、乙酸異丙酯、乙酸丁酯等酯系溶劑、二氯甲烷、二氯乙烷、氯仿、四氯化碳等鹵素系溶劑、己烷、庚烷、環己烷、甲基環己烷等烴系溶劑等。該等溶劑可單獨使用或將2種以上以任意比例混合使用。The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds. Examples include halogenated benzene solvents such as chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate, and butyl acetate. Halogen solvents such as methylene chloride, dichloroethane, chloroform, and carbon tetrachloride; hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane; and the like. These solvents may be used singly or as a mixture of two or more kinds in any ratio.

本反應使用之溶劑量,若目的反應會進行即可,並無特殊限制,通常相對於式(1b)表示之化合物為3重量倍以上200重量倍以下。The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, and is usually 3 to 200 times the weight of the compound represented by the formula (1b).

本反應進行時之溫度,若目的反應會進行即可,並無特殊限制,通常為20℃以上150℃以下或溶劑之沸點以下。The temperature at which the reaction proceeds is not particularly limited as long as the intended reaction proceeds, and is usually 20 ° C to 150 ° C or lower than the boiling point of the solvent.

反應之後處理可藉由對於反應混合物添加水或適當的水溶液以進行分液操作。使用水溶液時,可任意地使用溶有鹽酸、硫酸等之酸性水溶液、溶有氫氧化鉀、氫氧化鈉、碳酸鈉、碳酸鉀、碳酸氫鈉、碳酸氫鉀等之鹼水溶液、溶有硫代硫酸鈉、亞硫酸鈉等含硫之鹽的水溶液、食鹽水等。分液操作時視需要也可以追加甲苯、二甲苯、苯、氯苯、二氯苯等苯系溶劑、乙酸乙酯、乙酸異丙酯、乙酸丁酯等酯系溶劑、二乙醚、二異丙醚、甲基-第三丁醚等醚系溶劑、二氯甲烷、二氯乙烷、氯仿等鹵素系溶劑、己烷、庚烷、環己烷、甲基環己烷等烴系溶劑等和水不互溶之溶劑。又,該等溶劑可單獨使用也可將2種以上以任意比例混合。分液之次數無特殊限制,可因應目的之純度、產量實施。The post-reaction treatment can be carried out by adding water or a suitable aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, etc. is dissolved, an alkali aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, potassium bicarbonate, etc. are dissolved, and a thio group is dissolved can be optionally used. Aqueous solutions of sulfur salts, such as sodium sulfate and sodium sulfite, and saline solution. During the liquid separation operation, if necessary, benzene solvents such as toluene, xylene, benzene, chlorobenzene, and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate, and butyl acetate, diethyl ether, and diisopropyl may be added. Ether solvents such as ether, methyl-tertiary butyl ether, halogen solvents such as dichloromethane, dichloroethane, and chloroform; hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane; and Water immiscible solvent. These solvents may be used alone or as a mixture of two or more of them in an arbitrary ratio. There are no special restrictions on the number of liquid separations, which can be implemented according to the purity and yield of the purpose.

前述獲得之含式(1a)表示之化合物之反應混合物可利用硫酸鈉、硫酸鎂等乾燥劑去除水分但非必要。The reaction mixture containing the compound represented by the formula (1a) obtained above can be removed by using a desiccant such as sodium sulfate and magnesium sulfate, but it is not necessary.

前述獲得之含式(1a)表示之化合物之反應混合物,只要化合物不分解,可以於減壓下將溶劑餾去。 溶劑餾去後獲得之含式(1a)表示之化合物之反應混合物,可屆由適當的溶劑以洗淨、再沉澱、再結晶、管柱層析等進行精製。可因應目的純度而適當設定。As long as the reaction mixture containing the compound represented by the formula (1a) obtained above is not decomposed, the solvent can be distilled off under reduced pressure. The reaction mixture containing the compound represented by the formula (1a) obtained after the solvent is distilled off can be purified with an appropriate solvent by washing, reprecipitation, recrystallization, column chromatography, and the like. It can be appropriately set according to the purity of the purpose.

[製造方法F] 【化23】 [Manufacturing Method F]

式中,R3b表示鹵素原子,HalR表示鹵化劑,R1、R2、X、Y及n與前述為同義。In the formula, R3b represents a halogen atom, HalR represents a halogenating agent, and R1, R2, X, Y, and n have the same meanings as described above.

製造方法F係獲得式(1a)表示之化合物中之R3b表示鹵素原子之式(1a-b)表示之化合物之製造方法,包括使式(1a-a)表示之化合物與鹵化劑(HalR)於溶劑中反應之步驟。Production method F is a method for obtaining a compound represented by formula (1a-b) in which R3b represents a halogen atom in the compound represented by formula (1a), which comprises combining the compound represented by formula (1a-a) with a halogenating agent (HalR) in Step of reaction in a solvent.

本反應使用之鹵化劑可列舉Selectfluor(N-氟-N’-三乙二胺雙(四氟硼酸鹽))、N-氯琥珀醯亞胺、N-溴琥珀醯亞胺、N-碘琥珀醯亞胺、1,3-二氯-5,5-二甲基乙內醯脲、1,3-二溴-5,5-二甲基乙內醯脲、1,3-二碘-5,5-二甲基乙內醯脲、溴、碘等。Examples of the halogenating agent used in this reaction include Selectfluor (N-fluoro-N'-triethylenediamine bis (tetrafluoroborate)), N-chlorosuccinimide, N-bromosuccinimide, and N-iodoamber Arsenimine, 1,3-dichloro-5,5-dimethylhydantoin, 1,3-dibromo-5,5-dimethylhydantoin, 1,3-diiodo-5 , 5-dimethylhydantoin, bromine, iodine, etc.

本反應使用之鹵化劑之量,只要是對於式(1a-a)表示之化合物為1當量以上即可,若目的反應會進行即可,並無特殊限制,較佳為1當量以上10當量以下。惟含乙內醯脲之鹵化劑之量若為0.5當量以上,只要目的之反應可進行即可,無特殊限制,較佳為1當量以上5當量以下。The amount of the halogenating agent used in this reaction is only required to be 1 equivalent or more for the compound represented by formula (1a-a), and it is not particularly limited if the objective reaction will proceed, and it is preferably 1 equivalent to 10 equivalents. . However, if the amount of the halogenating agent containing hydantoin is 0.5 equivalent or more, as long as the intended reaction can proceed, there is no particular limitation, and it is preferably 1 equivalent to 5 equivalents.

本反應使用之鹵化劑為碘化劑時,可以添加如鹽酸、硫酸等無機酸類、乙酸、三氟乙酸、甲烷磺酸、三氟甲烷磺酸等有機酸之酸。 本反應使用之鹵化劑為碘化劑時使用之酸之量,若相對於式(1a-a)表示之化合物為0.01當量以上即可,若目的反應會進行即可,並無特殊限制,較佳為0.1當量以上3當量以下。 When the halogenating agent used in this reaction is an iodinating agent, acids such as inorganic acids such as hydrochloric acid and sulfuric acid, organic acids such as acetic acid, trifluoroacetic acid, methanesulfonic acid, and trifluoromethanesulfonic acid can be added. The amount of acid used when the halogenating agent used in this reaction is an iodinating agent is only 0.01 equivalent or more with respect to the compound represented by the formula (1a-a), and it can be carried out if the intended reaction proceeds, and there is no particular limitation. It is preferably from 0.1 to 3 equivalents.

本反應使用之溶劑若目的反應會進行即可,並無特殊限制,可列舉:硫酸、乙酸、三氟乙酸、甲烷磺酸、三氟甲烷磺酸等酸性系溶劑、二乙醚、二異丙醚、甲基-第三丁醚、二甲氧基乙烷、四氫呋喃、二烷等醚系溶劑、甲醇、乙醇、異丙醇等醇系溶劑、苯、甲苯、二甲苯、均三甲苯、氯苯、二氯苯等苯系溶劑、乙酸乙酯、乙酸異丙酯、乙酸丁酯等酯系溶劑、乙腈等腈系溶劑、N-甲基吡咯烷酮、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺等醯胺系溶劑、1,3-二甲基-2-咪唑啶酮等脲系溶劑、二氯甲烷、二氯乙烷、氯仿、四氯化碳等鹵素系溶劑等。該等溶劑可單獨使用或將2種以上以任意比例混合使用。The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds. Examples include acidic solvents such as sulfuric acid, acetic acid, trifluoroacetic acid, methanesulfonic acid, and trifluoromethanesulfonic acid, diethyl ether, and diisopropyl ether. , Methyl-tertiary butyl ether, dimethoxyethane, tetrahydrofuran, di Ether solvents such as alkane, alcohol solvents such as methanol, ethanol, isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, ethyl acetate, isopropyl acetate, acetic acid Ester solvents such as butyl ester, nitrile solvents such as acetonitrile, N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, and other amine solvents, 1,3- Urea solvents such as dimethyl-2-imidazolidone, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride. These solvents may be used singly or as a mixture of two or more kinds in any ratio.

本反應使用之溶劑量若目的反應會進行即可,並無特殊限制,通常相對於式(1a-a)表示之化合物為3重量倍以上200重量倍以下。The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, and is usually 3 to 200 times the weight of the compound represented by the formula (1a-a).

本反應進行時之溫度若目的反應會進行即可,並無特殊限制,通常為0℃以上150℃以下或溶劑之沸點以下。The temperature at which the reaction proceeds is not particularly limited as long as the intended reaction proceeds, and is usually 0 ° C to 150 ° C or lower than the boiling point of the solvent.

反應之後處理可藉由對於反應混合物添加水或適當的水溶液以進行分液操作。使用水溶液時,可任意地使用溶有鹽酸、硫酸等之酸性水溶液、溶有氫氧化鉀、氫氧化鈉、碳酸鈉、碳酸鉀、碳酸氫鈉、碳酸氫鉀等之鹼水溶液、溶有硫代硫酸鈉、亞硫酸鈉等含硫之鹽之水溶液、食鹽水等。分液操作時視需要可以追加甲苯、二甲苯、苯、氯苯、二氯苯等苯系溶劑、乙酸乙酯、乙酸異丙酯、乙酸丁酯等酯系溶劑、二乙醚、二異丙醚、甲基-第三丁醚等醚系溶劑、二氯甲烷、二氯乙烷、氯仿、四氯化碳等鹵素系溶劑、己烷、庚烷、環己烷、甲基環己烷等烴系溶劑等和水不互溶之溶劑。又,該等溶劑可單獨使用也可將2種以上以任意比例混合。分液之次數無特殊限制,可因應目的之純度、產量實施。The post-reaction treatment can be carried out by adding water or a suitable aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, etc. is dissolved, an alkali aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, potassium bicarbonate, etc. are dissolved, and a thio group is dissolved can be optionally used. Aqueous solutions of sulfur salts, such as sodium sulfate and sodium sulfite, and saline solution. During the liquid separation operation, if necessary, benzene solvents such as toluene, xylene, benzene, chlorobenzene, and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate, and butyl acetate, diethyl ether, and diisopropyl ether can be added. , Ether solvents such as methyl, tertiary butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride; hydrocarbons such as hexane, heptane, cyclohexane, and methylcyclohexane It is a solvent that is immiscible with water. These solvents may be used alone or as a mixture of two or more of them in an arbitrary ratio. There are no special restrictions on the number of liquid separations, which can be implemented according to the purity and yield of the purpose.

前述獲得之含式(1a-b)表示之化合物之反應混合物可利用硫酸鈉、硫酸鎂等乾燥劑去除水分但非必要。The reaction mixture containing the compound represented by the formula (1a-b) obtained above can be removed by using a desiccant such as sodium sulfate and magnesium sulfate, but it is not necessary.

前述獲得之含式(1a-b)表示之化合物之反應混合物,只要化合物不分解,可以於減壓下將溶劑餾去。 溶劑餾去後獲得之含式(1a-b)表示之化合物之反應混合物,可藉由適當的溶劑以洗淨、再沉澱、再結晶、管柱層析等進行精製。可因應目的純度而適當設定。As long as the reaction mixture containing the compound represented by the formula (1a-b) obtained above is not decomposed, the solvent can be distilled off under reduced pressure. The reaction mixture containing the compound represented by the formula (1a-b) obtained after the solvent is distilled off can be purified by washing with a suitable solvent, reprecipitation, recrystallization, column chromatography, and the like. It can be appropriately set according to the purity of the purpose.

[製造方法G] 【化24】 [Manufacturing Method G] [Chem. 24]

式中,R3c表示也可經取代基C適當取代之C1~C6之烷基、C1~C6之鹵烷基、也可經取代基C適當取代之C3~C8之環烷基、也可經取代基C適當取代之C2~C6之烯基、C2~C6之鹵烯基、也可經取代基C適當取代之C2~C6之炔基、或C2~C6之鹵炔基,J表示氧原子或硫原子,Q表示氫原子或金屬,R1、R2、R3b、X、Y及n與前述為同義。In the formula, R3c represents a C1-C6 alkyl group, a C1-C6 haloalkyl group, which may be appropriately substituted by a substituent C, or a C3-C8 cycloalkyl group, which may also be appropriately substituted by a substituent C, or may be substituted. C2 to C6 alkenyl, C2 to C6 haloalkenyl, C2 to C6 alkynyl, or C2 to C6 haloalkynyl, which may be appropriately substituted with substituent C, J represents an oxygen atom or A sulfur atom, Q represents a hydrogen atom or a metal, and R1, R2, R3b, X, Y, and n are synonymous with the foregoing.

製造方法G係合成式(1a)表示之化合物中之R3c表示也可經取代基C適當取代之C1~C6之烷基、C1~C6之鹵烷基、也可經取代基C適當取代之C3~C8之環烷基、也可經取代基C適當取代之C2~C6之烯基、C2~C6之鹵烯基、也可經取代基C適當取代之C2~C6之炔基、或C2~C6之鹵炔基且J表示氧原子或硫原子之式(1a-c)表示之化合物之方法,包括使式(1a-b)表示之化合物與R3c-J-Q在過渡金屬類存在下反應之偶聯反應獲得之步驟。Production method G: In the compound represented by formula (1a), R3c represents a C1-C6 alkyl group which may be appropriately substituted by a substituent C, a haloalkyl group of C1-C6, or C3 which may be appropriately substituted by a substituent C. ~ C8 cycloalkyl, C2 ~ C6 alkenyl, C2 ~ C6 haloalkenyl, C2 ~ C6 alkynyl, or C2 ~ A method for a compound represented by the formula (1a-c) having a haloalkynyl group of C6 and J representing an oxygen atom or a sulfur atom, comprising the step of reacting a compound represented by the formula (1a-b) with R3c-JQ in the presence of a transition metal Steps to obtain the combined reaction.

式(1a-b)表示之化合物中,理想的R3b為氯原子、溴原子、或碘原子。In the compound represented by the formula (1a-b), R3b is preferably a chlorine atom, a bromine atom, or an iodine atom.

本反應使用之R3c-J-Q可就市售品取得或以公知之方法製造。理想的Q為氫原子、或鈉、鉀等鹼金屬類。 本反應使用之R3c-J-Q之量若相對於式(1a-b)表示之化合物為1當量以上即可,若目的反應會進行即可,並無特殊限制。Q為氫原子時,也可作為溶劑使用。R3c-J-Q used in this reaction can be obtained from a commercially available product or manufactured by a known method. Ideally, Q is a hydrogen atom or an alkali metal such as sodium or potassium. The amount of R3c-J-Q used in this reaction may be 1 equivalent or more with respect to the compound represented by formula (1a-b), and it is not particularly limited as long as the intended reaction proceeds. When Q is a hydrogen atom, it can also be used as a solvent.

本反應使用之過渡金屬類也可以有配位子,為乙酸鈀、[1,1’-雙(二苯基膦基)二茂鐵]二氯化鈀、參(二亞苄基丙酮)二鈀、肆(三苯基膦)鈀、雙(三苯基膦)二氯化鈀等鈀類等。The transition metals used in this reaction may also have ligands, such as palladium acetate, [1,1'-bis (diphenylphosphino) ferrocene] palladium dichloride, and ginseng (dibenzylideneacetone). Palladium, such as palladium, tris (triphenylphosphine) palladium, and bis (triphenylphosphine) palladium dichloride.

本反應使用之過渡金屬類之量相對於式(1a-b)表示之化合物為0.001當量以上1當量以下,若目的反應會進行即可,並無特殊限制。The amount of the transition metal used in this reaction is 0.001 equivalent to 1 equivalent with respect to the compound represented by formula (1a-b), and it is not particularly limited as long as the intended reaction proceeds.

為了使本反應有效率地進行,可以添加三苯基膦、1,1’-雙(二苯基膦基)二茂鐵、2-二環己基膦基-2’4’6’-三異丙基聯苯、2-二第三丁基膦基-2’4’6’-三異丙基聯苯等膦配位子。In order for this reaction to proceed efficiently, triphenylphosphine, 1,1'-bis (diphenylphosphino) ferrocene, 2-dicyclohexylphosphino-2'4'6'-triiso Phosphine ligands such as propylbiphenyl and 2-di-tert-butylphosphino-2'4'6'-triisopropylbiphenyl.

本反應使用之膦配位子之量相對於式(1a-b)表示之化合物為0.001當量以上1當量以下,若目的反應會進行即可,並無特殊限制。The amount of the phosphine ligand used in this reaction is 0.001 equivalent or more and 1 equivalent or less based on the compound represented by formula (1a-b), and it is not particularly limited if the intended reaction proceeds.

本反應使用之鹼為如碳酸鈉、碳酸鉀、碳酸銫之無機鹼類、如三乙胺、三丁胺、二異丙基乙胺等有機鹼類等。The bases used in this reaction are inorganic bases such as sodium carbonate, potassium carbonate, and cesium carbonate, and organic bases such as triethylamine, tributylamine, and diisopropylethylamine.

本反應使用之鹼之量相對於式(1a-b)表示之化合物為1當量以上即可,若目的反應會進行即可,並無特殊限制,較佳為1當量以上50當量以下。The amount of the base used in this reaction is 1 equivalent or more with respect to the compound represented by the formula (1a-b), and it is sufficient if the intended reaction proceeds, and there is no particular limitation, and it is preferably 1 equivalent to 50 equivalents.

本反應使用之溶劑若目的反應會進行即可,並無特殊限制,可列舉R3c-J-H(式中,R3c與前述為同義,J表示氧原子)表示之醇溶劑、二乙醚、二異丙醚、甲基-第三丁醚、二甲氧基乙烷、四氫呋喃、二烷等醚系溶劑、苯、甲苯、二甲苯、均三甲苯、氯苯、二氯苯等苯系溶劑等。該等溶劑可單獨使用或將2種以上以任意比例混合使用。The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, and examples include R3c-JH (wherein R3c is synonymous with the above, J represents an oxygen atom), an alcohol solvent represented by diethyl ether, and diisopropyl ether , Methyl-tertiary butyl ether, dimethoxyethane, tetrahydrofuran, di Ether solvents such as alkane, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, and dichlorobenzene. These solvents may be used singly or as a mixture of two or more kinds in any ratio.

本反應使用之溶劑量若目的反應會進行即可,並無特殊限制,通常相對於式(1a-b)表示之化合物為3重量倍以上200重量倍以下。The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, and is usually 3 to 200 times the weight of the compound represented by the formula (1a-b).

本反應進行時之溫度若目的反應會進行即可,並無特殊限制,通常為30℃以上200℃以下或溶劑之沸點以下。The temperature at which the reaction proceeds is not particularly limited as long as the intended reaction proceeds, and is usually 30 ° C or higher and 200 ° C or lower or the boiling point of the solvent.

反應之後處理可藉由對於反應混合物添加水或適當的水溶液以進行分液操作。使用水溶液時,可任意地使用溶有鹽酸、硫酸等之酸性水溶液、溶有氫氧化鉀、氫氧化鈉、碳酸鈉、碳酸鉀、碳酸氫鈉、碳酸氫鉀等之鹼水溶液、食鹽水等。分液操作時視需要可以追加甲苯、二甲苯、苯、氯苯、二氯苯等苯系溶劑、乙酸乙酯、乙酸異丙酯、乙酸丁酯等酯系溶劑、二乙醚、二異丙醚、甲基-第三丁醚等醚系溶劑、二氯甲烷、二氯乙烷、氯仿、四氯化碳等鹵素系溶劑、己烷、庚烷、環己烷、甲基環己烷等烴系溶劑等和水不互溶之溶劑。又,該等溶劑可單獨使用也可將2種以上以任意比例混合。分液之次數無特殊限制,可因應目的之純度、產量實施。又,也可藉由進行過濾操作以去除不溶物,但非必要。The post-reaction treatment can be carried out by adding water or a suitable aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid and the like are dissolved, an alkali aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, potassium bicarbonate, etc. are dissolved, and a saline solution can be optionally used. During the liquid separation operation, if necessary, benzene solvents such as toluene, xylene, benzene, chlorobenzene, and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate, and butyl acetate, diethyl ether, and diisopropyl ether can be added. , Ether solvents such as methyl, tertiary butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride; hydrocarbons such as hexane, heptane, cyclohexane, and methylcyclohexane It is a solvent that is immiscible with water. These solvents may be used alone or as a mixture of two or more of them in an arbitrary ratio. There are no special restrictions on the number of liquid separations, which can be implemented according to the purity and yield of the purpose. In addition, filtration may be performed to remove insoluble matter, but this is not necessary.

前述獲得之含式(1a-c)表示之化合物之反應混合物,只要化合物不分解,可以於減壓下將溶劑餾去。 溶劑餾去後獲得之含式(1a-c)表示之化合物之反應混合物,可利用適當的溶劑以洗淨、再沉澱、再結晶、管柱層析等精製。可因應目的純度而適當設定。As long as the reaction mixture containing the compound represented by the formula (1a-c) obtained above is not decomposed, the solvent can be distilled off under reduced pressure. The reaction mixture containing the compound represented by the formula (1a-c) obtained after the solvent is distilled off can be purified using an appropriate solvent for washing, reprecipitation, recrystallization, column chromatography, and the like. It can be appropriately set according to the purity of the purpose.

[製造方法H] 【化25】 [Manufacturing method H] [Chem. 25]

式中,R3d表示也可經取代基C適當取代之C1~C6之烷基、C1~C6之鹵烷基、也可經取代基C適當取代之C3~C8之環烷基、也可經取代基C適當取代之C2~C6之烯基、或C2~C6之鹵烯基,R3d-B表示有機硼酸類,R1、R2、R3b、X、Y及n與前述為同義。In the formula, R3d represents a C1-C6 alkyl group, a C1-C6 haloalkyl group, which may be appropriately substituted with a substituent C, or a C3-C8 cycloalkyl group, which may also be appropriately substituted with a substituent C, or may be substituted. C2 to C6 alkenyl, or C2 to C6 haloalkenyl appropriately substituted with the group C, R3d-B represents organic boric acids, and R1, R2, R3b, X, Y, and n are synonymous with the foregoing.

製造方法H係合成式(1a)表示之化合物中之R3d表示也可經取代基C適當取代之C1~C6之烷基、C1~C6之鹵烷基、也可經取代基C適當取代之C3~C8之環烷基、也可經取代基C適當取代之C2~C6之烯基、或C2~C6之鹵烯基之式(1a-d)表示之化合物之方法,包括使式(1a-b)表示之化合物與有機硼酸類(R3d-B)於過渡金屬類及之鹼存在下反應之利用鈴木-宮浦偶聯獲得之步驟。Production method H: In the compound represented by formula (1a), R3d represents a C1-C6 alkyl group which may be appropriately substituted by a substituent C, a haloalkyl group of C1-C6, or C3 which may be appropriately substituted by a substituent C. A method of a compound represented by the formula (1a-d) of a cycloalkyl group of ~ C8, an alkenyl group of C2 ~ C6, or a haloalkenyl group of C2 ~ C6, which may also be appropriately substituted by a substituent C, comprising making formula (1a- b) A step obtained by reacting a compound represented by an Suzuki-Miyaura coupling with an organic boric acid (R3d-B) in the presence of a transition metal and a base.

式(1a-b)中,理想之R3b為氯原子、溴原子、或碘原子。In formula (1a-b), R3b is preferably a chlorine atom, a bromine atom, or an iodine atom.

本反應使用之R3d-B表示有機硼酸、有機硼酸酯等有機硼酸類,可就市售品取得或以公知之方法製造。 本反應使用之R3d-B之量若相對於式(1a-b)表示之化合物為1當量以上即可,若目的反應會進行即可,並無特殊限制,較佳為1當量以上10當量以下。R3d-B used in this reaction represents an organic boric acid such as an organic boric acid or an organic borate, and can be obtained from a commercially available product or produced by a known method. The amount of R3d-B used in this reaction may be 1 equivalent or more relative to the compound represented by formula (1a-b), and it is not particularly limited if the intended reaction will proceed, and it is preferably 1 equivalent to 10 equivalents. .

本反應使用之過渡金屬類為鈀、鎳、釕等,也可以有配位子。較佳為乙酸鈀、[1,1’-雙(二苯基膦基)二茂鐵]二氯化鈀、參(二亞苄基丙酮)二鈀、肆(三苯基膦)鈀、雙(三苯基膦)二氯化鈀等鈀類。The transition metals used in this reaction are palladium, nickel, ruthenium, etc., and may have ligands. Preferred are palladium acetate, [1,1'-bis (diphenylphosphino) ferrocene] palladium dichloride, ginsyl (dibenzylideneacetone) dipalladium, tris (triphenylphosphine) palladium, bis (Triphenylphosphine) Palladium such as palladium dichloride.

本反應使用之過渡金屬類之量相對於式(1a-b)表示之化合物為0.001當量以上1當量以下,若目的反應會進行即可,並無特殊限制。The amount of the transition metal used in this reaction is 0.001 equivalent to 1 equivalent with respect to the compound represented by formula (1a-b), and it is not particularly limited as long as the intended reaction proceeds.

為了使本反應有效率地進行,可添加三苯基膦、三環己基膦等膦配位子。 本反應使用之膦配位子之量相對於式(1a-b)表示之化合物為0.001當量以上1當量以下,若目的反應會進行即可,並無特殊限制。In order to make this reaction proceed efficiently, phosphine ligands such as triphenylphosphine and tricyclohexylphosphine may be added. The amount of the phosphine ligand used in this reaction is 0.001 equivalent or more and 1 equivalent or less based on the compound represented by formula (1a-b), and it is not particularly limited if the intended reaction proceeds.

本反應使用之鹼為如碳酸鈉、碳酸鉀、碳酸銫、磷酸三鉀之無機鹼類、如甲醇鈉、乙醇鈉、第三丁醇鉀等金屬醇鹽類等。The bases used in this reaction are inorganic bases such as sodium carbonate, potassium carbonate, cesium carbonate, and tripotassium phosphate, and metal alkoxides such as sodium methoxide, sodium ethoxide, and potassium tert-butoxide.

本反應使用之鹼之量相對於式(1a-b)表示之化合物為1當量以上即可,若目的反應會進行即可,並無特殊限制,較佳為1當量以上50當量以下。The amount of the base used in this reaction is 1 equivalent or more with respect to the compound represented by the formula (1a-b), and it is sufficient if the intended reaction proceeds, and there is no particular limitation, and it is preferably 1 equivalent to 50 equivalents.

本反應使用之溶劑若目的反應會進行即可,並無特殊限制,可列舉水溶劑、二乙醚、二異丙醚、甲基-第三丁醚、二甲氧基乙烷、四氫呋喃、二烷等醚系溶劑、苯、甲苯、二甲苯、均三甲苯、氯苯、二氯苯等苯系溶劑等。該等溶劑可單獨使用或將2種以上以任意比例混合使用。The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, and examples include water solvents, diethyl ether, diisopropyl ether, methyl-third butyl ether, dimethoxyethane, tetrahydrofuran, diamine Ether solvents such as alkane, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, and dichlorobenzene. These solvents may be used singly or as a mixture of two or more kinds in any ratio.

本反應使用之溶劑量若目的反應會進行即可,並無特殊限制,通常相對於式(1a-b)表示之化合物為3重量倍以上200重量倍以下。The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, and is usually 3 to 200 times the weight of the compound represented by the formula (1a-b).

本反應進行時之溫度若目的反應會進行即可,並無特殊限制,通常為30℃以上200℃以下或溶劑之沸點以下。The temperature at which the reaction proceeds is not particularly limited as long as the intended reaction proceeds, and is usually 30 ° C or higher and 200 ° C or lower or the boiling point of the solvent.

反應之後處理可藉由對於反應混合物添加水或適當的水溶液以進行分液操作。使用水溶液時,可任意使用溶有鹽酸、硫酸等之酸性水溶液、溶有氫氧化鉀、氫氧化鈉、碳酸鈉、碳酸鉀、碳酸氫鈉、碳酸氫鉀等之鹼水溶液、食鹽水等。分液操作時視需要可以追加甲苯、二甲苯、苯、氯苯、二氯苯等苯系溶劑、乙酸乙酯、乙酸異丙酯、乙酸丁酯等酯系溶劑、二乙醚、二異丙醚、甲基-第三丁醚等醚系溶劑、二氯甲烷、二氯乙烷、氯仿、四氯化碳等鹵素系溶劑、己烷、庚烷、環己烷、甲基環己烷等烴系溶劑等和水不互溶之溶劑。又,該等溶劑可單獨使用也可將2種以上以任意比例混合。分液之次數無特殊限制,可因應目的之純度、產量實施。又,可藉由進行過濾操作去除不溶物,但非必要。The post-reaction treatment can be carried out by adding water or a suitable aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid and the like are dissolved, an alkali aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, potassium bicarbonate and the like are dissolved, and a saline solution can be optionally used. During the liquid separation operation, if necessary, benzene solvents such as toluene, xylene, benzene, chlorobenzene, and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate, and butyl acetate, diethyl ether, and diisopropyl ether can be added. , Ether solvents such as methyl, tertiary butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride; hydrocarbons such as hexane, heptane, cyclohexane, and methylcyclohexane It is a solvent that is immiscible with water. These solvents may be used alone or as a mixture of two or more of them in an arbitrary ratio. There are no special restrictions on the number of liquid separations, which can be implemented according to the purity and yield of the purpose. In addition, insoluble matter can be removed by performing a filtration operation, but it is not necessary.

前述獲得之含式(1a-d)表示之化合物之反應混合物,只要化合物不分解,可以於減壓下將溶劑餾去。As long as the reaction mixture containing the compound represented by the formula (1a-d) obtained above is not decomposed, the solvent can be distilled off under reduced pressure.

溶劑餾去後獲得之含式(1a-d)表示之化合物之反應混合物,可利用適當的溶劑以洗淨、再沉澱、再結晶、管柱層析等精製。可因應目的純度而適當設定。The reaction mixture containing the compound represented by the formula (1a-d) obtained after the solvent is distilled off can be purified by using an appropriate solvent for washing, reprecipitation, recrystallization, column chromatography, and the like. It can be appropriately set according to the purity of the purpose.

[製造方法I] 【化26】 [Manufacturing Method I] [Chem. 26]

式中,R3e表示也可經取代基C適當取代之C2~C6之炔基、或C2~C6之鹵炔基,R1、R2、R3b、X、Y及n與前述為同義。In the formula, R3e represents an alkynyl group of C2 to C6 or a haloalkynyl group of C2 to C6 which may be appropriately substituted by a substituent C, and R1, R2, R3b, X, Y, and n have the same meanings as described above.

製造方法I係合成式(1a)表示之化合物中之R3e為也可經取代基C適當取代之C2~C6之炔基、或C2~C6之鹵炔基之式(1a-e)表示之化合物之方法,包括使(1a-b)表示之化合物與末端炔化合物於過渡金屬類及鹼之存在下反應之利用園頭偶聯獲得之步驟。Production method I is a compound represented by formula (1a-e) in which R3e in the compound represented by formula (1a) is an alkynyl group of C2 to C6 which may be appropriately substituted by substituent C, or a haloalkynyl group of C2 to C6 The method includes the step of obtaining the compound represented by (1a-b) by a round-head coupling by reacting the compound represented by (1a-b) with a terminal alkyne compound in the presence of a transition metal and a base.

式(1a-b)中,理想之R3b為氯原子、溴原子、或碘原子。In formula (1a-b), R3b is preferably a chlorine atom, a bromine atom, or an iodine atom.

本反應使用之末端炔化合物可就市售品取得或以公知之方法製造。又,末端炔化合物也可使用三甲基矽基乙炔。此時,於式(1a-b)表示之化合物導入三甲基矽基乙炔基後需進行脱矽基化。針對脱矽基化,可以參考Journal of the American Chemical Society,第131卷,2號,634-643頁(2009)及Journal of Organometallic Chemistry,696卷,25號,4039-4045頁(2011)等非專利文獻實施。The terminal alkyne compound used in this reaction can be obtained from a commercially available product or produced by a known method. As the terminal alkyne compound, trimethylsilylacetylene can also be used. At this time, after introducing the trimethylsilylethynyl compound into the compound represented by the formula (1a-b), it is necessary to perform desilylation. For desilication, you can refer to Journal of the American Chemical Society, Vol. 131, No. 2, pp. 634-643 (2009) and Journal of Organometallic Chemistry, Vol. 696, No. 25, pp. 4039-4045 (2011), etc. Patent literature implementation.

本反應使用之末端炔化合物之量相對於式(1a-b)表示之化合物為1當量以上即可,若目的反應會進行即可,並無特殊限制,較佳為1當量以上10當量以下。The amount of the terminal alkyne compound used in this reaction may be 1 equivalent or more with respect to the compound represented by formula (1a-b), and it is sufficient if the intended reaction proceeds, and is not particularly limited, preferably 1 equivalent to 10 equivalents.

本反應使用之過渡金屬類也可以有配位子,為乙酸鈀、[1,1’-雙(二苯基膦基)二茂鐵]二氯化鈀、參(二亞苄基丙酮)二鈀、肆(三苯基膦)鈀、雙(三苯基膦)二氯化鈀等鈀類等。又,也可同時使用氯化銅、溴化銅、碘化銅等銅類。The transition metals used in this reaction may also have ligands, such as palladium acetate, [1,1'-bis (diphenylphosphino) ferrocene] palladium dichloride, and ginseng (dibenzylideneacetone). Palladium, such as palladium, tris (triphenylphosphine) palladium, and bis (triphenylphosphine) palladium dichloride. Moreover, copper, such as copper chloride, copper bromide, and copper iodide, can also be used simultaneously.

本反應使用之過渡金屬類之量為鈀類等及銅類,各相對於式(1a-b)表示之化合物為0.001當量以上即可,只要目的反應會進行即可,並無特殊限制。理想量為兩者皆為0.001當量以上1當量以下。The amount of the transition metal used in this reaction is palladium or the like and copper, and each of them should be 0.001 equivalent or more with respect to the compound represented by the formula (1a-b), as long as the intended reaction proceeds, there is no particular limitation. The ideal amount is 0.001 equivalent to 1 equivalent.

本反應使用之鹼可列舉如三乙胺、三丁胺、異丙胺、二乙胺、二異丙胺、二異丙基乙胺等有機胺類、碳酸鈉、碳酸鉀、碳酸銫等無機鹼類等。Examples of the base used in this reaction include organic amines such as triethylamine, tributylamine, isopropylamine, diethylamine, diisopropylamine, and diisopropylethylamine, and inorganic bases such as sodium carbonate, potassium carbonate, and cesium carbonate. Wait.

本反應使用之鹼之量若相對於式(1a-b)表示之化合物為1當量以上即可,若目的反應會進行即可,並無特殊限制,較佳為1當量以上50當量以下。又,關於為有機鹼且液體狀者,可作為溶劑使用。The amount of the base used in this reaction may be 1 equivalent or more with respect to the compound represented by the formula (1a-b), and it may be carried out if the intended reaction proceeds, and is not particularly limited, and preferably 1 to 50 equivalents. Moreover, those which are organic bases and liquid can be used as a solvent.

為了使本反應有效率地進行,可添加三第三丁基膦、2-二環己基膦基-2’4’6’-三異丙基聯苯等膦配位子,但非必要。In order to make this reaction proceed efficiently, phosphine ligands such as tri-tertiary butylphosphine and 2-dicyclohexylphosphino-2'4'6'-triisopropylbiphenyl can be added, but it is not necessary.

本反應使用之膦配位子之量只要相對於式(1a-b)表示之化合物為0.001當量以上1當量以下即可,若目的反應會進行即可,並無特殊限制。The amount of the phosphine ligand used in this reaction is only required to be 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by formula (1a-b), and there is no particular limitation as long as the intended reaction proceeds.

本反應使用之溶劑若目的反應會進行即可,並無特殊限制,可以列舉二乙醚、二異丙醚、甲基-第三丁醚、二甲氧基乙烷、四氫呋喃、二烷等醚系溶劑、苯、甲苯、二甲苯、均三甲苯、氯苯、二氯苯等苯系溶劑、乙酸乙酯、乙酸異丙酯、乙酸丁酯等酯系溶劑、乙腈等腈系溶劑、N-甲基吡咯烷酮、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺等醯胺系溶劑、1,3-二甲基-2-咪唑啶酮等脲系溶劑、二氯甲烷、二氯乙烷、氯仿、四氯化碳等鹵素系溶劑、三乙胺、三丁胺、異丙胺、二乙胺、二異丙胺、二異丙基乙胺等有機胺溶劑等。該等溶劑可單獨使用或將2種以上以任意比例混合使用。The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, and examples thereof include diethyl ether, diisopropyl ether, methyl-third butyl ether, dimethoxyethane, tetrahydrofuran, and diamine. Ether solvents such as alkane, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate, butyl acetate, and nitrile solvents such as acetonitrile , N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, and other amine-based solvents, 1,3-dimethyl-2-imidazolidone, and other urea-based solvents Solvents, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride, organic amines such as triethylamine, tributylamine, isopropylamine, diethylamine, diisopropylamine, and diisopropylethylamine Solvents, etc. These solvents may be used singly or as a mixture of two or more kinds in any ratio.

本反應使用之溶劑量若目的反應會進行即可,並無特殊限制,通常相對於式(1a-b)表示之化合物為3重量倍以上200重量倍以下。The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, and is usually 3 to 200 times the weight of the compound represented by the formula (1a-b).

本反應進行時之溫度若目的反應會進行即可,並無特殊限制,通常為0℃以上150℃以下或溶劑之沸點以下。The temperature at which the reaction proceeds is not particularly limited as long as the intended reaction proceeds, and is usually 0 ° C to 150 ° C or lower than the boiling point of the solvent.

反應之後處理可藉由對於反應混合物添加水或適當的水溶液以進行分液操作。使用水溶液時,可任意使用溶有鹽酸、硫酸等之酸性水溶液、溶有氫氧化鉀、氫氧化鈉、碳酸鈉、碳酸鉀、碳酸氫鈉、碳酸氫鉀等之鹼水溶液、食鹽水等。分液操作時視需要可以追加甲苯、二甲苯、苯、氯苯、二氯苯等苯系溶劑、乙酸乙酯、乙酸異丙酯、乙酸丁酯等酯系溶劑、二乙醚、二異丙醚、甲基-第三丁醚等醚系溶劑、二氯甲烷、二氯乙烷、氯仿、四氯化碳等鹵素系溶劑、己烷、庚烷、環己烷、甲基環己烷等烴系溶劑等和水不互溶之溶劑。又,該等溶劑可單獨使用,也可將2種以上依任意比例混合。分液之次數無特殊限制,可因應目的之純度、產量實施。又,也可利用過濾操作將不溶物去除,但並非必要。The post-reaction treatment can be carried out by adding water or a suitable aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid and the like are dissolved, an alkali aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, potassium bicarbonate and the like are dissolved, and a saline solution can be optionally used. During the liquid separation operation, if necessary, benzene solvents such as toluene, xylene, benzene, chlorobenzene, and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate, and butyl acetate, diethyl ether, and diisopropyl ether can be added. , Ether solvents such as methyl, tertiary butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride; hydrocarbons such as hexane, heptane, cyclohexane, and methylcyclohexane It is a solvent that is immiscible with water. These solvents may be used alone or as a mixture of two or more of them in an arbitrary ratio. There are no special restrictions on the number of liquid separations, which can be implemented according to the purity and yield of the purpose. In addition, insoluble matter may be removed by a filtration operation, but it is not necessary.

前述獲得之含式(1a-e)表示之化合物之反應混合物,只要化合物不分解,可以於減壓下將溶劑餾去。 溶劑餾去後獲得之含式(1a-e)表示之化合物之反應混合物可利用以適當溶劑進行洗淨、再沉澱、再結晶、管柱層析等以精製。可因應目的純度而適當設定。As long as the reaction mixture containing the compound represented by the formula (1a-e) obtained above is not decomposed, the solvent can be distilled off under reduced pressure. The reaction mixture containing the compound represented by the formula (1a-e) obtained after the solvent is distilled off can be purified by washing with a suitable solvent, reprecipitation, recrystallization, column chromatography, and the like. It can be appropriately set according to the purity of the purpose.

[製造方法J] 【化27】 [Manufacturing Method J] [Chem. 27]

式中,R2a表示C1~C6之烷氧基,nb表示0~4之整數(惟nb為2以上時,2個以上之R2代表各自獨立的取代基。),R1、R2、R3、X、Y及破折線部與前述為同義。In the formula, R2a represents an alkoxy group of C1 to C6, and nb represents an integer of 0 to 4 (but when nb is 2 or more, two or more R2 represent independent substituents.), R1, R2, R3, X, Y and the dashed line portion are synonymous with the foregoing.

製造方法J係合成式(1)表示之化合物中之有羥基之式(1-b)表示之化合物之方法,包括使R2a為C1~C6之烷氧基之式(1-a)表示之化合物與酸反應而得之步驟。Production method J is a method for synthesizing a compound represented by formula (1-b) having a hydroxyl group among compounds represented by formula (1), including a compound represented by formula (1-a) in which R2a is an alkoxy group of C1 to C6. A step obtained by reacting with an acid.

本反應使用之酸為三氯化硼、三溴化硼等鹵化硼類等。The acids used in this reaction are boron halides such as boron trichloride and boron tribromide.

本反應使用之酸之量相對於式(1-a)表示之化合物為1當量以上即可,若目的反應會進行即可,並無特殊限制,較佳為1當量以上10當量以下。The amount of the acid used in this reaction is 1 equivalent or more with respect to the compound represented by the formula (1-a), and there is no particular limitation if the intended reaction will proceed, and it is preferably 1 equivalent to 10 equivalents.

本反應使用之溶劑若目的反應會進行即可,並無特殊限制,可以列舉苯、甲苯、二甲苯、均三甲苯、氯苯、二氯苯等苯系溶劑、乙腈等腈系溶劑、二氯甲烷、二氯乙烷、氯仿、四氯化碳等鹵素系溶劑、己烷、庚烷、環己烷、甲基環己烷等烴系溶劑等。該等溶劑可單獨使用或將2種以上以任意比例混合使用。The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, and examples thereof include benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, and dichlorobenzene, nitrile solvents such as acetonitrile, and dichloride. Halogen solvents such as methane, dichloroethane, chloroform, and carbon tetrachloride; and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. These solvents may be used singly or as a mixture of two or more kinds in any ratio.

本反應使用之溶劑量若目的反應會進行即可,並無特殊限制,通常相對於式(1-a)表示之化合物為3重量倍以上200重量倍以下。The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, and is usually 3 to 200 times the weight of the compound represented by the formula (1-a).

本反應進行時之溫度若目的反應會進行即可,並無特殊限制,通常為-80℃以上100℃以下或溶劑之沸點以下。The temperature at which the reaction proceeds is not particularly limited as long as the intended reaction proceeds, and is usually -80 ° C to 100 ° C or lower than the boiling point of the solvent.

反應之後處理可藉由對於反應混合物添加水或適當的水溶液以進行分液操作。使用水溶液時,可以任意使用溶有鹽酸、硫酸等之酸性水溶液、溶有氫氧化鉀、氫氧化鈉、碳酸鈉、碳酸鉀、碳酸氫鈉、碳酸氫鉀等之鹼水溶液、食鹽水等。分液操作時視需要可以追加甲苯、二甲苯、苯、氯苯、二氯苯等苯系溶劑、乙酸乙酯、乙酸異丙酯、乙酸丁酯等酯系溶劑、二乙醚、二異丙醚、甲基-第三丁醚等醚系溶劑、二氯甲烷、二氯乙烷、氯仿、四氯化碳等鹵素系溶劑、己烷、庚烷、環己烷、甲基環己烷等烴系溶劑等和水不互溶之溶劑。又,該等溶劑可單獨使用也可將2種以上以任意比例混合。分液之次數無特殊限制,可因應目的之純度、產量實施。The post-reaction treatment can be carried out by adding water or a suitable aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid and the like are dissolved, an alkali aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, potassium bicarbonate and the like are dissolved, and a saline solution can be optionally used. During the liquid separation operation, if necessary, benzene solvents such as toluene, xylene, benzene, chlorobenzene, and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate, and butyl acetate, diethyl ether, and diisopropyl ether can be added. , Ether solvents such as methyl, tertiary butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride; hydrocarbons such as hexane, heptane, cyclohexane, and methylcyclohexane It is a solvent that is immiscible with water. These solvents may be used alone or as a mixture of two or more of them in an arbitrary ratio. There are no special restrictions on the number of liquid separations, which can be implemented according to the purity and yield of the purpose.

前述獲得之含式(1-b)表示之化合物之反應混合物可利用硫酸鈉、硫酸鎂等乾燥劑去除水分但非必要。The reaction mixture containing the compound represented by the formula (1-b) obtained above may be used to remove moisture using desiccants such as sodium sulfate and magnesium sulfate, but it is not necessary.

前述獲得之含式(1-b)表示之化合物之反應混合物,只要化合物不分解,可以於減壓下將溶劑餾去。 溶劑餾去後獲得之含式(1-b)表示之化合物之反應混合物可利用適當的溶劑以洗淨、再沉澱、再結晶、管柱層析等精製。可因應目的純度而適當設定。As long as the reaction mixture containing the compound represented by the formula (1-b) obtained above is not decomposed, the solvent can be distilled off under reduced pressure. The reaction mixture containing the compound represented by the formula (1-b) obtained after the solvent is distilled off can be purified by using an appropriate solvent for washing, reprecipitation, recrystallization, column chromatography, and the like. It can be appropriately set according to the purity of the purpose.

[製造方法K] 【化28】 [Manufacturing method K] [Chem. 28]

式中,R2b-O-表示也可經取代基B適當取代之C1~C6之烷氧基、C1~C6之鹵烷氧基、也可經取代基B適當取代之C3~C8之環烷氧基、也可經取代基B適當取代之C2~C6之烯氧基、C2~C6之鹵烯氧基、也可經取代基B適當取代之C3~C6之炔氧基、C3~C6之鹵炔氧基、或R20C(=O)O-基,Lv、R1、R2、R3、R20、X、Y、nb及破折線部與前述為同義。In the formula, R2b-O- represents an alkoxy group of C1 to C6 which may be appropriately substituted by substituent B, a haloalkoxy group of C1 to C6, and a cycloalkoxy group of C3 to C8 which may be appropriately substituted by substituent B. Group, C2 ~ C6 alkenyloxy group, C2 ~ C6 haloalkenyloxy group, which may also be appropriately substituted with substituent B, C3 ~ C6 alkynyloxy group, and C3 ~ C6 halide which may be appropriately substituted with substituent B An alkynyloxy group or an R20C (= O) O- group, Lv, R1, R2, R3, R20, X, Y, nb, and a dashed line are synonymous with the foregoing.

製造方法K係合成式(1)表示之化合物中之R2b-O-表示也可經取代基B適當取代之C1~C6之烷氧基、C1~C6之鹵烷氧基、也可經取代基B適當取代之C3~C8之環烷氧基、也可經取代基B適當取代之C2~C6之烯氧基、C2~C6之鹵烯氧基、也可經取代基B適當取代之C3~C6之炔氧基、C3~C6之鹵炔氧基、或R20C(=O)O-基(R20同前述之含意。)之式(1-c)表示之化合物之方法,包括使式(1-b)表示之化合物與R2b-Lv於鹼存在下在溶劑中反應之步驟。Production method K is a compound represented by formula (1) where R2b-O- represents a C1 to C6 alkoxy group, a C1 to C6 haloalkoxy group that may be appropriately substituted by a substituent B, or a substituent B is appropriately substituted C3 ~ C8 cycloalkoxy, C2 ~ C6 alkenyloxy, C2 ~ C6 haloalkoxy, or C3 ~ A method of a compound represented by the formula (1-c) of an alkynyloxy group of C6, a alkynyloxy group of C3 to C6, or an R20C (= O) O- group (R20 has the same meaning as described above.) Includes the following formula (1) a step of reacting the compound represented by -b) with R2b-Lv in a solvent in the presence of a base.

本反應使用之R2b-Lv可就市售品取得或以公知之方法製造。 本反應使用之R2b-Lv若相對於式(1-b)表示之化合物為1當量以上即可,若目的反應會進行即可,並無特殊限制,較佳為1當量以上10當量以下。The R2b-Lv used in this reaction can be obtained from a commercially available product or manufactured by a known method. The R2b-Lv used in this reaction may be 1 equivalent or more with respect to the compound represented by formula (1-b), and it may be carried out if the intended reaction proceeds, and is not particularly limited, and is preferably 1 equivalent to 10 equivalents.

本反應使用之鹼可列舉碳酸鈉、碳酸鉀、碳酸銫、氫化鈉等無機鹼類、三乙胺、三丁胺、二異丙基乙胺、吡啶、4-二甲胺基吡啶、三甲基吡啶、二甲基吡啶等有機鹼類,但若目的反應會進行即可,並無特殊限制。Examples of the base used in the reaction include inorganic bases such as sodium carbonate, potassium carbonate, cesium carbonate, and sodium hydride, triethylamine, tributylamine, diisopropylethylamine, pyridine, 4-dimethylaminopyridine, and trimethylamine. Organic bases such as pyridine and dimethylpyridine, but there is no particular limitation as long as the intended reaction proceeds.

本反應使用之鹼若相對於式(1-b)表示之化合物為1當量以上即可,若目的反應會進行即可,並無特殊限制,較佳為1當量以上10當量以下。The base used in this reaction may be 1 equivalent or more with respect to the compound represented by the formula (1-b), and may be carried out if the intended reaction proceeds, and is not particularly limited, and is preferably 1 equivalent to 10 equivalents.

本反應使用之溶劑若目的反應會進行即可,並無特殊限制,可以列舉二乙醚、二異丙醚、甲基-第三丁醚、二甲氧基乙烷、四氫呋喃、二烷等醚系溶劑、甲醇、乙醇、異丙醇等醇系溶劑、苯、甲苯、二甲苯、均三甲苯、氯苯、二氯苯等苯系溶劑、乙酸乙酯、乙酸異丙酯、乙酸丁酯等酯系溶劑、乙腈等腈系溶劑、N-甲基吡咯烷酮、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺等醯胺系溶劑、1,3-二甲基-2-咪唑啶酮等脲系溶劑、二氯甲烷、二氯乙烷、氯仿、四氯化碳等鹵素系溶劑、二甲基亞碸、環丁碸等硫系溶劑、丙酮、甲乙酮、甲基異丁酮等酮系溶劑等。該等溶劑可單獨使用或將2種以上以任意比例混合使用。The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, and examples thereof include diethyl ether, diisopropyl ether, methyl-third butyl ether, dimethoxyethane, tetrahydrofuran, and diamine. Ether solvents such as alkane, alcohol solvents such as methanol, ethanol, isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, ethyl acetate, isopropyl acetate, acetic acid Ester solvents such as butyl ester, nitrile solvents such as acetonitrile, N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, and other amine solvents, 1,3- Urea solvents such as dimethyl-2-imidazolidinone, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, sulfur solvents such as dimethylmethylene, cyclobutane, acetone, Ketone solvents such as methyl ethyl ketone and methyl isobutyl ketone. These solvents may be used singly or as a mixture of two or more kinds in any ratio.

本反應使用之溶劑量若目的反應會進行即可,並無特殊限制,通常相對於式(1-b)表示之化合物為3重量倍以上200重量倍以下。The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, and is usually 3 to 200 times the weight of the compound represented by the formula (1-b).

本反應進行時之溫度若目的反應會進行即可,並無特殊限制,通常為-20℃以上150℃以下或溶劑之沸點以下。The temperature at which the reaction proceeds is not particularly limited as long as the intended reaction proceeds, and is usually -20 ° C to 150 ° C or lower than the boiling point of the solvent.

反應之後處理可藉由對於反應混合物添加水或適當的水溶液以進行分液操作。使用水溶液時,可任意使用溶有鹽酸、硫酸等之酸性水溶液、溶有氫氧化鉀、氫氧化鈉、碳酸鈉、碳酸鉀、碳酸氫鈉、碳酸氫鉀等之鹼水溶液、溶有硫代硫酸鈉、亞硫酸鈉等含硫之鹽之水溶液、食鹽水等。分液操作時視需要可以追加甲苯、二甲苯、苯、氯苯、二氯苯等苯系溶劑、乙酸乙酯、乙酸異丙酯、乙酸丁酯等酯系溶劑、二乙醚、二異丙醚、甲基-第三丁醚等醚系溶劑、二氯甲烷、二氯乙烷、氯仿、四氯化碳等鹵素系溶劑、己烷、庚烷、環己烷、甲基環己烷等烴系溶劑等和水不互溶之溶劑。又,該等溶劑可單獨使用也可將2種以上以任意比例混合。分液之次數無特殊限制,可因應目的之純度、產量實施。The post-reaction treatment can be carried out by adding water or a suitable aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid and the like are dissolved, an alkali aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, potassium hydrogen carbonate and the like are dissolved, and thiosulfuric acid is dissolved Aqueous solutions of sulfur salts, such as sodium and sodium sulfite, and saline solution. During the liquid separation operation, if necessary, benzene solvents such as toluene, xylene, benzene, chlorobenzene, and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate, and butyl acetate, diethyl ether, and diisopropyl ether can be added. , Ether solvents such as methyl, tertiary butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride; hydrocarbons such as hexane, heptane, cyclohexane, and methylcyclohexane It is a solvent that is immiscible with water. These solvents may be used alone or as a mixture of two or more of them in an arbitrary ratio. There are no special restrictions on the number of liquid separations, which can be implemented according to the purity and yield of the purpose.

前述獲得之含式(1-c)表示之化合物之反應混合物可利用硫酸鈉、硫酸鎂等乾燥劑去除水分但非必要。The reaction mixture containing the compound represented by the formula (1-c) obtained above can be used to remove moisture using desiccants such as sodium sulfate and magnesium sulfate, but it is not necessary.

前述獲得之含式(1-c)表示之化合物之反應混合物,只要化合物不分解,可以於減壓下將溶劑餾去。 溶劑餾去後獲得之含式(1-c)表示之化合物之反應混合物,可利用適當溶劑以洗淨、再沉澱、再結晶、管柱層析等精製。可因應目的純度而適當設定。As long as the reaction mixture containing the compound represented by the formula (1-c) obtained above is not decomposed, the solvent can be distilled off under reduced pressure. The reaction mixture containing the compound represented by the formula (1-c) obtained after the solvent is distilled off can be purified by using an appropriate solvent for washing, reprecipitation, recrystallization, column chromatography, and the like. It can be appropriately set according to the purity of the purpose.

[製造方法L] 【化29】 [Manufacturing Method L] [Chem. 29]

式中,R2c表示鹵素原子,R2d表示也可經取代基B適當取代之C1~C6之烷基、C1~C6之鹵烷基、也可經取代基B適當取代之C3~C8之環烷基、也可經取代基B適當取代之C2~C6之烯基、或C2~C6之鹵烯基,R2d-B表示有機硼酸類,R1、R2、R3、nb、X、Y及破折線部與前述為同義。In the formula, R2c represents a halogen atom, and R2d represents a C1-C6 alkyl group which may be appropriately substituted with a substituent B, a C1-C6 haloalkyl group, and a C3-C8 cycloalkyl group which may also be appropriately substituted with a substituent B. , C2 ~ C6 alkenyl, or C2 ~ C6 haloalkenyl, which may also be appropriately substituted by substituent B, R2d-B represents organic boric acids, R1, R2, R3, nb, X, Y, and the broken line portion and The foregoing is synonymous.

製造方法L係合成式(1)表示之化合物中之R2d為也可經取代基B適當取代之C1~C6之烷基、C1~C6之鹵烷基、也可經取代基B適當取代之C3~C8之環烷基、也可經取代基B適當取代之C2~C6之烯基、或C2~C6之鹵烯基之式(1-e)表示之化合物之方法,包括使式(1-d)表示之化合物與有機硼酸類(R2d-B)反應之利用鈴木-宮浦偶聯獲得之步驟。Production method L: In the compound represented by formula (1), R2d is a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a C3 alkyl group that may be appropriately substituted by a substituent B. A method of a compound represented by the formula (1-e) of a cycloalkyl group of ~ C8, an alkenyl group of C2 ~ C6, or a haloalkenyl group of C2 ~ C6, which may also be appropriately substituted by a substituent B, comprising making formula (1-e) (d) A step obtained by reacting a compound represented by an organic boric acid (R2d-B) by a Suzuki-Miyaura coupling.

式(1-d)中,理想之R2c為氯原子、溴原子、或碘原子。In the formula (1-d), R 2c is preferably a chlorine atom, a bromine atom, or an iodine atom.

可藉由將製造方法H中之式(1a-b)表示之化合物與R3d-B分別替換成式(1-d)表示之化合物與R2d-B,而依製造方法H實施製造方法L。The production method L can be implemented according to the production method H by replacing the compound represented by the formula (1a-b) and R3d-B in the production method H with the compound represented by the formula (1-d) and R2d-B, respectively.

[製造方法M] 【化30】 [Manufacturing Method M] [Chem. 30]

式中,R2e表示也可經取代基B適當取代之C2~C6之炔基、或C2~C6之鹵炔基,R1、R2、R2c、R3、nb、X、Y及破折線部與前述為同義。In the formula, R2e represents an alkynyl group of C2 to C6 or a haloalkynyl group of C2 to C6 which may be appropriately substituted by a substituent B. R1, R2, R2c, R3, nb, X, Y, and a dashed line portion are as described above. Synonymous.

製造方法M係合成式(1)表示之化合物中之R2e為也可經取代基B適當取代之C2~C6之炔基、或C2~C6之鹵炔基之式(1-f)表示之化合物之方法,包括利用使式(1-d)表示之化合物與末端炔化合物反應之園頭偶聯獲得之步驟。Production method M is a compound represented by formula (1-f) in which R2e in the compound represented by formula (1) is an alkynyl group of C2 to C6 which can be appropriately substituted by substituent B or a haloalkynyl group of C2 to C6 The method includes the step of obtaining by coupling a compound represented by the formula (1-d) with a terminal alkyne compound.

式(1-d)表示之化合物中,理想之R2c為氯原子、溴原子、或碘原子。In the compound represented by formula (1-d), it is preferable that R2c is a chlorine atom, a bromine atom, or an iodine atom.

可藉由將製造方法I中之式(1a-b)表示之化合物替換為使用式(1-d)表示之化合物,而依製造方法I實施製造方法M。The manufacturing method M can be carried out according to the manufacturing method I by replacing the compound represented by the formula (1a-b) in the manufacturing method I with a compound represented by the formula (1-d).

[製造方法N] 【化31】 [Manufacturing method N] [Chem. 31]

式中,Da表示鹵素原子、D1a表示鹵素原子、D1b表示C1~C6之烷氧基、C1~C6之鹵烷氧基、或C3~C8之環烷氧基,E表示經鹵素取代之碳原子或氮原子,R1、R2、R3、n、X、Q及破折線部與前述為同義。In the formula, Da represents a halogen atom, D1a represents a halogen atom, D1b represents C1 to C6 alkoxy, C1 to C6 haloalkoxy, or C3 to C8 cycloalkoxy, and E represents a halogen-substituted carbon atom. Or a nitrogen atom, R1, R2, R3, n, X, Q, and a broken line portion are synonymous with the foregoing.

製造方法N表示合成式(1)表示之化合物中之D1b為C1~C6之烷氧基、C1~C6之鹵烷氧基、或C3~C8之環烷氧基且E為經鹵素原子取代之碳原子或氮原子的式(1-h)表示之化合物之方法,包括使式(1-g)表示之化合物與D1b-Q於溶劑中反應之步驟。Production method N represents that in the compound represented by the formula (1), D1b is an alkoxy group of C1 to C6, a haloalkoxy group of C1 to C6, or a cycloalkoxy group of C3 to C8, and E is a halogen substituted group. A method of a compound represented by the formula (1-h) with a carbon atom or a nitrogen atom includes a step of reacting the compound represented by the formula (1-g) with D1b-Q in a solvent.

本反應使用之D1b-Q可就市售品取得或以公知之方法製造。理想之Q為氫原子、或鈉、鉀等鹼金屬類。D1b-Q used in this reaction can be obtained from a commercially available product or manufactured by a known method. Ideally, Q is a hydrogen atom or an alkali metal such as sodium or potassium.

本反應使用之D1b-Q之量若相對於式(1-g)表示之化合物為1當量以上即可,若目的反應會進行即可,並無特殊限制,較佳為1當量以上30當量以下。又,Q表示氫原子時,可作為溶劑使用。The amount of D1b-Q used in this reaction may be 1 equivalent or more with respect to the compound represented by formula (1-g), and it may be performed if the objective reaction proceeds, and there is no particular limitation, preferably 1 equivalent to 30 equivalents. . When Q represents a hydrogen atom, it can be used as a solvent.

本反應使用之鹼宜為碳酸鈉、碳酸鉀、碳酸銫、氫化鈉等無機鹼類為較佳。又,Q為鹼金屬類時,鹼之使用並非必要。The base used in this reaction is preferably an inorganic base such as sodium carbonate, potassium carbonate, cesium carbonate, or sodium hydride. When Q is an alkali metal, the use of an alkali is not necessary.

本反應使用之鹼之量只要是相對於式(1-g)表示之化合物為1當量以上即可,若目的反應會進行即可,並無特殊限制,較佳為1當量以上30當量以下。The amount of the base used in this reaction is only required to be 1 equivalent or more with respect to the compound represented by the formula (1-g), and it is not particularly limited if the intended reaction proceeds, and it is preferably 1 equivalent to 30 equivalents.

本反應使用之溶劑,若目的反應會進行即可,並無特殊限制,可以列舉D1b-H表示之醇系溶劑、二乙醚、二異丙醚、甲基-第三丁醚、二甲氧基乙烷、四氫呋喃、二烷等醚系溶劑、苯、甲苯、二甲苯、均三甲苯、氯苯、二氯苯等苯系溶劑、乙酸乙酯、乙酸異丙酯、乙酸丁酯等酯系溶劑、乙腈等腈系溶劑、N-甲基吡咯烷酮、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺等醯胺系溶劑、1,3-二甲基-2-咪唑啶酮等脲系溶劑、二氯甲烷、二氯乙烷、氯仿、四氯化碳等鹵素系溶劑、二甲基亞碸、環丁碸等硫系溶劑、丙酮、甲乙酮、甲基異丁酮等酮系溶劑等。該等溶劑可單獨使用或將2種以上以任意比例混合使用。The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, and examples thereof include alcohol solvents represented by D1b-H, diethyl ether, diisopropyl ether, methyl-third butyl ether, and dimethoxy group. Ethane, tetrahydrofuran, di Ether solvents such as alkane, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate, butyl acetate, and nitrile solvents such as acetonitrile , N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, and other amine-based solvents, 1,3-dimethyl-2-imidazolidone, and other urea-based solvents Solvents, halogen-based solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride; sulfur-based solvents such as dimethyl sulfene and cyclobutane; ketone solvents such as acetone, methyl ethyl ketone, and methyl isobutyl ketone, etc. . These solvents may be used singly or as a mixture of two or more kinds in any ratio.

本反應使用之溶劑量,若目的反應會進行即可,並無特殊限制,通常相對於式(1-g)表示之化合物為3重量倍以上200重量倍以下。The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, and is usually 3 to 200 times the weight of the compound represented by the formula (1-g).

本反應進行時之溫度,若目的反應會進行即可,並無特殊限制,通常為0℃以上150℃以下或溶劑之沸點以下。The temperature at which the reaction proceeds is not particularly limited as long as the intended reaction proceeds, and is usually 0 ° C or higher and 150 ° C or lower or the boiling point of the solvent.

反應之後處理可藉由對於反應混合物添加水或適當的水溶液以進行分液操作。使用水溶液時,可任意使用溶有鹽酸、硫酸等之酸性水溶液、溶有氫氧化鉀、氫氧化鈉、碳酸鈉、碳酸鉀、碳酸氫鈉、碳酸氫鉀等之鹼水溶液、食鹽水等。分液操作時視需要可以追加甲苯、二甲苯、苯、氯苯、二氯苯等苯系溶劑、乙酸乙酯、乙酸異丙酯、乙酸丁酯等酯系溶劑、二乙醚、二異丙醚、甲基-第三丁醚等醚系溶劑、二氯甲烷、二氯乙烷、氯仿、四氯化碳等鹵素系溶劑、己烷、庚烷、環己烷、甲基環己烷等烴系溶劑等和水不互溶之溶劑。又,該等溶劑可單獨使用也可將2種以上以任意比例混合。分液之次數無特殊限制,可因應目的之純度、產量實施。The post-reaction treatment can be carried out by adding water or a suitable aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid and the like are dissolved, an alkali aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, potassium bicarbonate and the like are dissolved, and a saline solution can be optionally used. During the liquid separation operation, if necessary, benzene solvents such as toluene, xylene, benzene, chlorobenzene, and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate, and butyl acetate, diethyl ether, and diisopropyl ether can be added. , Ether solvents such as methyl, tertiary butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride; hydrocarbons such as hexane, heptane, cyclohexane, and methylcyclohexane It is a solvent that is immiscible with water. These solvents may be used alone or as a mixture of two or more of them in an arbitrary ratio. There are no special restrictions on the number of liquid separations, which can be implemented according to the purity and yield of the purpose.

前述獲得之含式(1-h)表示之化合物之反應混合物可利用硫酸鈉、硫酸鎂等乾燥劑去除水分但非必要。The aforementioned reaction mixture containing the compound represented by the formula (1-h) can be used to remove moisture using desiccants such as sodium sulfate and magnesium sulfate, but it is not necessary.

前述獲得之含式(1-h)表示之化合物之反應混合物,只要化合物不分解,可以於減壓下將溶劑餾去。 溶劑餾去後獲得之含式(1-h)表示之化合物之反應混合物,可藉由適當的溶劑以洗淨、再沉澱、再結晶、管柱層析等精製。可因應目的純度而適當設定。As long as the reaction mixture containing the compound represented by the formula (1-h) obtained above is not decomposed, the solvent can be distilled off under reduced pressure. The reaction mixture containing the compound represented by the formula (1-h) obtained after the solvent is distilled off can be purified by washing with appropriate solvents, reprecipitation, recrystallization, column chromatography, and the like. It can be appropriately set according to the purity of the purpose.

[製造方法O] 【化32】 [Manufacturing method O] [Chem. 32]

式中,R2e表示也可經取代基B適當取代之C1~C6之烷氧基,R2f表示也可經取代基B適當取代之C1~C6之烷氧基,R2g表示鹵素原子,HalR、R1、R3、X、Y及破折線部與前述為同義。In the formula, R2e represents an alkoxy group of C1 to C6 which may also be appropriately substituted with a substituent B, R2f represents an alkoxy group of C1 to C6 which may also be appropriately substituted with a substituent B, R2g represents a halogen atom, HalR, R1, R3, X, Y, and dashed lines are synonymous with the foregoing.

製造方法O係獲得式(1)表示之化合物中之R2e為也可經取代基B適當取代之C1~C6之烷氧基,R2f為也可經取代基B適當取代之C1~C6之烷氧基,R2g為鹵素原子式(1-j)表示之化合物之製造方法,包括使式(1-i)表示之化合物與鹵化劑(HalR)於溶劑中反應之步驟。Production method O is to obtain R2e in the compound represented by formula (1) as an alkoxy group of C1 to C6 which can also be appropriately substituted by substituent B, and R2f being an alkoxy group of C1 to C6 which can also be appropriately substituted by substituent B R2g is a method for producing a compound represented by the halogen atom formula (1-j), which includes a step of reacting the compound represented by the formula (1-i) with a halogenating agent (HalR) in a solvent.

本反應使用之鹵化劑可列舉Selectfluor(N-氟-N’-三乙二胺雙(四氟硼酸鹽))、N-氯琥珀醯亞胺、N-溴琥珀醯亞胺、N-碘琥珀醯亞胺、1,3-二氯-5,5-二甲基乙內醯脲、1,3-二溴-5,5-二甲基乙內醯脲、1,3-二碘-5,5-二甲基乙內醯脲、溴、碘等。Examples of the halogenating agent used in this reaction include Selectfluor (N-fluoro-N'-triethylenediamine bis (tetrafluoroborate)), N-chlorosuccinimide, N-bromosuccinimide, and N-iodoamber Arsenimine, 1,3-dichloro-5,5-dimethylhydantoin, 1,3-dibromo-5,5-dimethylhydantoin, 1,3-diiodo-5 , 5-dimethylhydantoin, bromine, iodine, etc.

本反應使用之鹵化劑之量,若相對於式(1-i)表示之化合物為1當量以上即可,若目的反應會進行即可,並無特殊限制,較佳為1當量以上10當量以下。惟含乙內醯脲之鹵化劑之量若為0.5當量以上,只要目的反應會進行即可,無特殊限制,較佳為1當量以上5當量以下。The amount of the halogenating agent used in this reaction may be 1 equivalent or more relative to the compound represented by formula (1-i), and it may be carried out if the objective reaction proceeds, and there is no particular limitation, preferably 1 equivalent or more and 10 equivalents or less. . However, if the amount of the halogenating agent containing hydantoin is 0.5 equivalent or more, as long as the intended reaction proceeds, there is no particular limitation, and it is preferably 1 equivalent to 5 equivalents.

本反應使用之鹵化劑為碘化劑時,可以添加如鹽酸、硫酸等無機酸類、如乙酸、三氟乙酸、甲烷磺酸、三氟甲烷磺酸等有機酸之酸。 本反應使用之鹵化劑為碘化劑時,使用之酸之量若相對於式(1-i)表示之化合物為0.01當量以上即可,若目的反應會進行即可,並無特殊限制,較佳為0.1當量以上3當量以下。When the halogenating agent used in this reaction is an iodinating agent, it is possible to add acids such as inorganic acids such as hydrochloric acid and sulfuric acid, and organic acids such as acetic acid, trifluoroacetic acid, methanesulfonic acid, and trifluoromethanesulfonic acid. When the halogenating agent used in this reaction is an iodinating agent, the amount of acid used may be 0.01 equivalent or more with respect to the compound represented by formula (1-i), and if the objective reaction will proceed, there is no particular limitation. It is preferably from 0.1 to 3 equivalents.

本反應使用之溶劑,若目的反應會進行即可,並無特殊限制,可以列舉硫酸、乙酸、三氟乙酸、甲烷磺酸、三氟甲烷磺酸等酸性系溶劑、二乙醚、二異丙醚、甲基-第三丁醚、二甲氧基乙烷、四氫呋喃、二烷等醚系溶劑、甲醇、乙醇、異丙醇等醇系溶劑、苯、甲苯、二甲苯、均三甲苯、氯苯、二氯苯等苯系溶劑、乙酸乙酯、乙酸異丙酯、乙酸丁酯等酯系溶劑、乙腈等腈系溶劑、N-甲基吡咯烷酮、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺等醯胺系溶劑、1,3-二甲基-2-咪唑啶酮等脲系溶劑、二氯甲烷、二氯乙烷、氯仿、四氯化碳等鹵素系溶劑等。該等溶劑可單獨使用或將2種以上以任意比例混合使用。The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds. Examples include acidic solvents such as sulfuric acid, acetic acid, trifluoroacetic acid, methanesulfonic acid, and trifluoromethanesulfonic acid, diethyl ether, and diisopropyl ether. , Methyl-tertiary butyl ether, dimethoxyethane, tetrahydrofuran, di Ether solvents such as alkane, alcohol solvents such as methanol, ethanol, isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, ethyl acetate, isopropyl acetate, acetic acid Ester solvents such as butyl ester, nitrile solvents such as acetonitrile, N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, and other amine solvents, 1,3- Urea solvents such as dimethyl-2-imidazolidone, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride. These solvents may be used singly or as a mixture of two or more kinds in any ratio.

本反應使用之溶劑量,若目的反應會進行即可,並無特殊限制,通常相對於式(1-i)表示之化合物為3重量倍以上200重量倍以下。The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, and is usually 3 to 200 times the weight of the compound represented by the formula (1-i).

本反應進行時之溫度,若目的反應會進行即可,並無特殊限制,通常為0℃以上150℃以下或溶劑之沸點以下。The temperature at which the reaction proceeds is not particularly limited as long as the intended reaction proceeds, and is usually 0 ° C or higher and 150 ° C or lower or the boiling point of the solvent.

反應之後處理可藉由對於反應混合物添加水或適當的水溶液以進行分液操作。使用水溶液時,可以任意使用溶有鹽酸、硫酸等之酸性水溶液、溶有氫氧化鉀、氫氧化鈉、碳酸鈉、碳酸鉀、碳酸氫鈉、碳酸氫鉀等之鹼水溶液、溶有硫代硫酸鈉、亞硫酸鈉等含硫之鹽水溶液、食鹽水等。分液操作時視需要可以追加甲苯、二甲苯、苯、氯苯、二氯苯等苯系溶劑、乙酸乙酯、乙酸異丙酯、乙酸丁酯等酯系溶劑、二乙醚、二異丙醚、甲基-第三丁醚等醚系溶劑、二氯甲烷、二氯乙烷、氯仿、四氯化碳等鹵素系溶劑、己烷、庚烷、環己烷、甲基環己烷等烴系溶劑等和水不互溶之溶劑。又,該等溶劑可單獨使用也可將2種以上以任意比例混合。分液之次數無特殊限制,可因應目的之純度、產量實施。The post-reaction treatment can be carried out by adding water or a suitable aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid and the like are dissolved, an alkali aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, potassium hydrogen carbonate and the like are dissolved, and thiosulfuric acid is dissolved Sulfur-containing saline solutions such as sodium, sodium sulfite, and saline. During the liquid separation operation, if necessary, benzene solvents such as toluene, xylene, benzene, chlorobenzene, and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate, and butyl acetate, diethyl ether, and diisopropyl ether can be added. , Ether solvents such as methyl, tertiary butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride; hydrocarbons such as hexane, heptane, cyclohexane, and methylcyclohexane It is a solvent that is immiscible with water. These solvents may be used alone or as a mixture of two or more of them in an arbitrary ratio. There are no special restrictions on the number of liquid separations, which can be implemented according to the purity and yield of the purpose.

前述獲得之含式(1-j)表示之化合物之反應混合物可利用硫酸鈉、硫酸鎂等乾燥劑去除水分但非必要。The reaction mixture containing the compound represented by the formula (1-j) obtained above can be used to remove water using desiccants such as sodium sulfate and magnesium sulfate, but it is not necessary.

前述獲得之含式(1-j)表示之化合物之反應混合物,只要化合物不分解,可以於減壓下將溶劑餾去。 溶劑餾去後獲得之含式(1-j)表示之化合物之反應混合物,可利用適當的溶劑以洗淨、再沉澱、再結晶、管柱層析等精製。可因應目的純度而適當設定。As long as the reaction mixture containing the compound represented by the formula (1-j) obtained above is not decomposed, the solvent can be distilled off under reduced pressure. The reaction mixture containing the compound represented by the formula (1-j) obtained after the solvent is distilled off can be purified by using an appropriate solvent for washing, reprecipitation, recrystallization, column chromatography, and the like. It can be appropriately set according to the purity of the purpose.

[製造方法P] 【化33】 [Manufacturing Method P] [Chem. 33]

式中,La表示S,Lb表示SO或SO2 ,Ox’表示氧化劑。In the formula, La represents S, Lb represents SO or SO 2 , and Ox 'represents an oxidant.

製造方法P係製造式(1)表示之化合物中,R1、R2及R3中含有的Lb為SO或SO2 之式(Lb)表示之化合物之方法,包括使式(1)中之R1、R2或R3中含有的La為S之式(La)表示之化合物與氧化劑(Ox’)於溶劑中反應之步驟。Production method P is a method for producing a compound represented by formula (Lb) in which Lb contained in R1, R2, and R3 is SO or SO 2 among the compounds represented by formula (1), and comprises R1, R2 in formula (1) Or the step of reacting a compound represented by the formula (La) in which La is S contained in R3 with an oxidizing agent (Ox ').

本反應使用之氧化劑可列舉過氧化氫水、間氯過苯甲酸等過氧化物類。又,可添加如鎢酸鈉之過渡金屬類等。Examples of the oxidant used in the reaction include peroxides such as hydrogen peroxide water and m-chloroperbenzoic acid. In addition, transition metals such as sodium tungstate can be added.

本反應使用之氧化劑之量,於製造SO時,相對於式(La)表示之化合物通常為1.0當量以上1.2當量以下,於製造SO2 時,通常為2當量以上10當量以下。又,添加過渡金屬類時,通常為0.001當量以上1當量以下。The amount of oxidant used in this reaction is usually 1.0 to 1.2 equivalents relative to the compound represented by formula (La) when producing SO, and is usually 2 to 10 equivalents when producing SO 2 . When a transition metal is added, it is usually 0.001 equivalent to 1 equivalent.

本反應使用之溶劑,若目的反應會進行即可,並無特殊限制,可以列舉水溶劑、乙酸等酸性系溶劑、苯、甲苯、二甲苯、均三甲苯、氯苯、二氯苯等苯系溶劑、乙腈等腈系溶劑、二氯甲烷、二氯乙烷、氯仿、四氯化碳等鹵素系溶劑等。該等溶劑可單獨使用或將2種以上以任意比例混合使用。The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds. Examples include aqueous solvents, acidic solvents such as acetic acid, benzene, toluene, xylene, mesitylene, chlorobenzene, and dichlorobenzene. Solvents, nitrile solvents such as acetonitrile, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride. These solvents may be used singly or as a mixture of two or more kinds in any ratio.

本反應使用之溶劑量,若目的反應會進行即可,並無特殊限制,通常相對於有式(La)之式(1)表示之化合物為3重量倍以上200重量倍以下。The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, and is usually 3 to 200 times the weight of the compound represented by the formula (1) having the formula (La).

本反應進行時之溫度,若目的反應會進行即可,並無特殊限制,通常為-10℃以上120℃以下或溶劑之沸點以下。The temperature at which the reaction proceeds is not particularly limited as long as the intended reaction proceeds, and is usually -10 ° C or higher and 120 ° C or lower or the boiling point of the solvent.

反應之後處理可藉由對於反應混合物添加水或適當的水溶液以進行分液操作。使用水溶液時,可以任意使用溶有鹽酸、硫酸等之酸性水溶液、溶有氫氧化鉀、氫氧化鈉、碳酸鈉、碳酸鉀、碳酸氫鈉、碳酸氫鉀等之鹼水溶液、溶有硫代硫酸鈉、亞硫酸鈉等含硫之鹽之水溶液、食鹽水等。分液操作時視需要可以追加甲苯、二甲苯、苯、氯苯、二氯苯等苯系溶劑、乙酸乙酯、乙酸異丙酯、乙酸丁酯等酯系溶劑、二乙醚、二異丙醚、甲基-第三丁醚等醚系溶劑、二氯甲烷、二氯乙烷、氯仿、四氯化碳等鹵素系溶劑、己烷、庚烷、環己烷、甲基環己烷等烴系溶劑等和水不互溶之溶劑。又,該等溶劑可單獨使用也可將2種以上以任意比例混合。分液之次數無特殊限制,可因應目的之純度、產量實施。The post-reaction treatment can be carried out by adding water or a suitable aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid and the like are dissolved, an alkali aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, potassium hydrogen carbonate and the like are dissolved, and thiosulfuric acid is dissolved Aqueous solutions of sulfur salts, such as sodium and sodium sulfite, and saline solution. During the liquid separation operation, if necessary, benzene solvents such as toluene, xylene, benzene, chlorobenzene, and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate, and butyl acetate, diethyl ether, and diisopropyl ether can be added. , Ether solvents such as methyl, tertiary butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride; hydrocarbons such as hexane, heptane, cyclohexane, and methylcyclohexane It is a solvent that is immiscible with water. These solvents may be used alone or as a mixture of two or more of them in an arbitrary ratio. There are no special restrictions on the number of liquid separations, which can be implemented according to the purity and yield of the purpose.

前述獲得之含式(Lb)表示之化合物之反應混合物可利用硫酸鈉、硫酸鎂等乾燥劑去除水分但非必要。The reaction mixture containing the compound represented by the formula (Lb) obtained as described above may be used to remove moisture using desiccants such as sodium sulfate and magnesium sulfate, but it is not necessary.

前述獲得之含式(Lb)表示之化合物之反應混合物,只要化合物不分解,可以於減壓下將溶劑餾去。 溶劑餾去後獲得之含式(Lb)表示之化合物之反應混合物,可以利用適當的溶劑以洗淨、再沉澱、再結晶、管柱層析等精製。可因應目的純度而適當設定。As long as the reaction mixture containing the compound represented by the formula (Lb) obtained above is not decomposed, the solvent can be distilled off under reduced pressure. The reaction mixture containing the compound represented by the formula (Lb) obtained after the solvent is distilled off can be purified by using an appropriate solvent for washing, reprecipitation, recrystallization, column chromatography, and the like. It can be appropriately set according to the purity of the purpose.

以下記載製造方法A記載之式(3)表示之化合物之合成方法。 [製造方法Q] 【化34】 A method for synthesizing the compound represented by formula (3) described in Production Method A is described below. [Manufacturing method Q] [Chem. 34]

式中,R2、R3、R5、n、X及Y同前述含義。In the formula, R2, R3, R5, n, X and Y have the same meanings as described above.

製造方法Q係式(3)表示之製造中間體之製造方法,包括使式(4)表示之化合物與式(5)表示之化合物於鹼存在下於溶劑中反應之步驟。Production method Q is a production method of a production intermediate represented by formula (3), which includes a step of reacting a compound represented by formula (4) and a compound represented by formula (5) in a solvent in the presence of a base.

本反應使用之式(4)表示之化合物可以參考例如:Green Chemistry,第41卷,580-585頁、The Journal of Organic Chemistry),第65卷,20號,6458-6461頁(2000)等合成。The compound represented by formula (4) used in this reaction can be synthesized by referring to, for example, Green Chemistry, Vol. 41, pp. 580-585, The Journal of Organic Chemistry), Vol. 65, No. 20, p. 6458-6461 (2000), etc. .

本反應使用之式(5)表示之化合物可以就市售品取得或以公知之方法製造。 本反應使用之式(5)表示之化合物之量若相對於式(4)表示之化合物為1當量以上即可,若目的反應會進行即可,並無特殊限制,較佳為1當量以上3當量以下。The compound represented by the formula (5) used in this reaction can be obtained from a commercially available product or produced by a known method. The amount of the compound represented by the formula (5) used in this reaction may be 1 equivalent or more with respect to the compound represented by the formula (4), and if the objective reaction will proceed, there is no particular limitation, preferably 1 equivalent or more 3 Below equivalent.

本反應使用之鹼為如碳酸鈉、碳酸鉀、碳酸銫、磷酸三鉀之無機鹼類、如甲醇鈉、乙醇鈉、第三丁醇鉀等金屬醇鹽類等。The bases used in this reaction are inorganic bases such as sodium carbonate, potassium carbonate, cesium carbonate, and tripotassium phosphate, and metal alkoxides such as sodium methoxide, sodium ethoxide, and potassium tert-butoxide.

本反應使用之鹼能以觸媒量實施,目的反應會進行即可,並無特殊限制,較佳為相對於式(4)表示之化合物為0.01當量以上3當量以下。The base used in this reaction can be carried out with a catalyst amount, and the objective reaction can be carried out without any particular limitation. It is preferably 0.01 equivalent to 3 equivalents with respect to the compound represented by formula (4).

本反應使用之溶劑可以列舉二乙醚、二異丙醚、甲基-第三丁醚、二甲氧基乙烷、四氫呋喃、二烷等醚系溶劑、苯、甲苯、二甲苯、均三甲苯、氯苯、二氯苯等苯系溶劑、乙酸乙酯、乙酸異丙酯、乙酸丁酯等酯系溶劑、乙腈等腈系溶劑、N-甲基吡咯烷酮、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺等醯胺系溶劑、1,3-二甲基-2-咪唑啶酮等脲系溶劑、二氯甲烷、二氯乙烷、氯仿、四氯化碳等鹵素系溶劑、二甲基亞碸、環丁碸等硫系溶劑、丙酮、甲乙酮、甲基異丁酮等酮系溶劑等。該等溶劑可單獨使用或將2種以上以任意比例混合使用。Examples of the solvent used in this reaction include diethyl ether, diisopropyl ether, methyl-tertiary butyl ether, dimethoxyethane, tetrahydrofuran, and diethyl ether. Ether solvents such as alkane, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate, butyl acetate, and nitrile solvents such as acetonitrile , N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, and other amine-based solvents, 1,3-dimethyl-2-imidazolidone, and other urea-based solvents Solvents, halogen-based solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride; sulfur-based solvents such as dimethyl sulfene and cyclobutane; ketone solvents such as acetone, methyl ethyl ketone, and methyl isobutyl ketone, etc. . These solvents may be used singly or as a mixture of two or more kinds in any ratio.

本反應使用之溶劑量,目的反應會進行即可,並無特殊限制,通常相對於式(4)表示之化合物為3重量倍以上200重量倍以下。The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, and is usually 3 to 200 times the weight of the compound represented by the formula (4).

本反應進行時之溫度,若目的反應會進行即可,並無特殊限制,通常為-50℃以上150℃以下或溶劑之沸點以下。The temperature at which the reaction proceeds is not particularly limited as long as the intended reaction proceeds, and is usually -50 ° C to 150 ° C or below the boiling point of the solvent.

反應之後處理可藉由對於反應混合物添加水或適當的水溶液以進行分液操作。使用水溶液時,可以任意使用溶有鹽酸、硫酸等之酸性水溶液、溶有氫氧化鉀、氫氧化鈉、碳酸鈉、碳酸鉀、碳酸氫鈉、碳酸氫鉀等之鹼水溶液、食鹽水等。分液操作時視需要可以追加甲苯、二甲苯、苯、氯苯、二氯苯等苯系溶劑、乙酸乙酯、乙酸異丙酯、乙酸丁酯等酯系溶劑、二乙醚、二異丙醚、甲基-第三丁醚等醚系溶劑、二氯甲烷、二氯乙烷、氯仿、四氯化碳等鹵素系溶劑、己烷、庚烷、環己烷、甲基環己烷等烴系溶劑等和水不互溶之溶劑。又,該等溶劑可單獨使用也可將2種以上以任意比例混合。分液之次數無特殊限制,可因應目的之純度、產量實施。The post-reaction treatment can be carried out by adding water or a suitable aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid and the like are dissolved, an alkali aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, potassium bicarbonate and the like are dissolved, and a saline solution can be optionally used. During the liquid separation operation, if necessary, benzene solvents such as toluene, xylene, benzene, chlorobenzene, and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate, and butyl acetate, diethyl ether, and diisopropyl ether can be added. , Ether solvents such as methyl, tertiary butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride; hydrocarbons such as hexane, heptane, cyclohexane, and methylcyclohexane It is a solvent that is immiscible with water. These solvents may be used alone or as a mixture of two or more of them in an arbitrary ratio. There are no special restrictions on the number of liquid separations, which can be implemented according to the purity and yield of the purpose.

前述獲得之含式(3)表示之化合物之反應混合物可利用硫酸鈉、硫酸鎂等乾燥劑去除水分但非必要。The reaction mixture containing the compound represented by the formula (3) obtained above can be used to remove moisture using desiccants such as sodium sulfate and magnesium sulfate, but it is not necessary.

前述獲得之含式(3)表示之化合物之反應混合物,只要化合物不分解,可以於減壓下將溶劑餾去。 溶劑餾去後獲得之含式(3)表示之化合物之反應混合物,可以利用適當的溶劑,以洗淨、再沉澱、再結晶、管柱層析等進行精製。可因應目的純度而適當設定。As long as the reaction mixture containing the compound represented by the formula (3) obtained above is not decomposed, the solvent can be distilled off under reduced pressure. The reaction mixture containing the compound represented by the formula (3) obtained after the solvent is distilled off can be purified by washing, reprecipitation, recrystallization, column chromatography, and the like using an appropriate solvent. It can be appropriately set according to the purity of the purpose.

[製造方法R] 【化35】 [Manufacturing method R] [Chem. 35]

式中,R5a表示C1~C6之烷基,R2、R3、n、X及Y與前述為同義。In the formula, R5a represents an alkyl group of C1 to C6, and R2, R3, n, X, and Y have the same meanings as described above.

製造方法R係式(3)表示之化合物中之式(3b)表示之製造中間體之製造方法,包括使式(3a)表示之化合物於酸性條件或鹼性條件下於溶劑中反應之步驟。Production method R is a production method for producing an intermediate represented by formula (3b) among compounds represented by formula (3), and includes a step of reacting a compound represented by formula (3a) in a solvent under acidic or basic conditions.

首先針對酸性條件之反應説明。 本反應使用之酸可列舉鹽酸、氫溴酸、磷酸等無機酸類、乙酸、甲烷磺酸、對甲苯磺酸、三氟乙酸等有機酸類。只要目的反應會進行即可,並無特殊限制。First, the reaction to acidic conditions will be explained. Examples of the acid used in the reaction include inorganic acids such as hydrochloric acid, hydrobromic acid, and phosphoric acid, and organic acids such as acetic acid, methanesulfonic acid, p-toluenesulfonic acid, and trifluoroacetic acid. There is no particular limitation as long as the objective reaction can proceed.

本反應使用之酸之量也可為觸媒量,若目的反應會進行即可,並無特殊限制,較佳為相對於式(3a)表示之化合物為0.01當量以上。又,關於液體狀之酸,可作為溶劑使用。The amount of the acid used in this reaction may also be the amount of the catalyst, as long as the intended reaction will proceed, and there is no particular limitation, it is preferably 0.01 equivalent or more relative to the compound represented by formula (3a). The liquid acid can be used as a solvent.

本反應使用之溶劑,若目的反應會進行即可,並無特殊限制,可以列舉水溶劑、乙酸、甲烷磺酸等酸性系溶劑、二乙醚、二異丙醚、甲基-第三丁醚、二甲氧基乙烷、四氫呋喃、二烷等醚系溶劑、甲醇、乙醇、異丙醇等醇系溶劑、苯、甲苯、二甲苯、均三甲苯、氯苯、二氯苯等苯系溶劑、乙酸乙酯、乙酸異丙酯、乙酸丁酯等酯系溶劑、乙腈等腈系溶劑、N-甲基吡咯烷酮、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺等醯胺系溶劑、1,3-二甲基-2-咪唑啶酮等脲系溶劑、二氯甲烷、二氯乙烷、氯仿、四氯化碳等鹵素系溶劑等。該等溶劑可單獨使用或將2種以上以任意比例混合使用。The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds. Examples include water solvents, acidic solvents such as acetic acid and methanesulfonic acid, diethyl ether, diisopropyl ether, methyl-tertiary butyl ether, Dimethoxyethane, tetrahydrofuran, di Ether solvents such as alkane, alcohol solvents such as methanol, ethanol, isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, ethyl acetate, isopropyl acetate, acetic acid Ester solvents such as butyl ester, nitrile solvents such as acetonitrile, N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, and other amine solvents, 1,3- Urea solvents such as dimethyl-2-imidazolidone, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride. These solvents may be used singly or as a mixture of two or more kinds in any ratio.

本反應使用之溶劑量,若目的反應會進行即可,並無特殊限制,通常相對於式(3a)表示之化合物為3重量倍以上200重量倍以下。The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, and is usually 3 to 200 times the weight of the compound represented by formula (3a).

本反應進行時之溫度,若目的反應會進行即可,並無特殊限制,通常為0℃以上180℃以下或溶劑之沸點以下。The temperature at which the reaction proceeds is not particularly limited as long as the intended reaction proceeds, and is usually 0 ° C to 180 ° C or lower than the boiling point of the solvent.

然後針對鹼性條件之反應説明。 本反應使用之鹼可以列舉氫氧化鋰、氫氧化鈉、氫氧化鉀等無機鹼類,但若目的反應會進行即可,並無特殊限制。Then the reaction for alkaline conditions will be explained. Examples of the base used in this reaction include inorganic bases such as lithium hydroxide, sodium hydroxide, and potassium hydroxide. However, if the intended reaction proceeds, there is no particular limitation.

本反應使用之鹼相對於式(3a)表示之化合物若為1當量以上即可,,若目的反應會進行即可,並無特殊限制,較佳為1當量以上30當量以下、The base used in this reaction may be 1 equivalent or more with respect to the compound represented by the formula (3a), and may be carried out if the intended reaction proceeds, and is not particularly limited. It is preferably 1 equivalent to 30 equivalents,

本反應使用之溶劑,若目的反應會進行即可,並無特殊限制,可以列舉水溶劑、二乙醚、二異丙醚、甲基-第三丁醚、二甲氧基乙烷、四氫呋喃、二烷等醚系溶劑、甲醇、乙醇、異丙醇等醇系溶劑、苯、甲苯、二甲苯、均三甲苯、氯苯、二氯苯等苯系溶劑、乙酸乙酯、乙酸異丙酯、乙酸丁酯等酯系溶劑、乙腈等腈系溶劑、N-甲基吡咯烷酮、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺等醯胺系溶劑、1,3-二甲基-2-咪唑啶酮等脲系溶劑、二氯甲烷、二氯乙烷、氯仿、四氯化碳等鹵素系溶劑等。該等溶劑可單獨使用或將2種以上以任意比例混合使用。The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds. Examples include water solvents, diethyl ether, diisopropyl ether, methyl-third butyl ether, dimethoxyethane, tetrahydrofuran, Ether solvents such as alkane, alcohol solvents such as methanol, ethanol, isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, ethyl acetate, isopropyl acetate, acetic acid Ester solvents such as butyl ester, nitrile solvents such as acetonitrile, N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, and other amine solvents, 1,3- Urea solvents such as dimethyl-2-imidazolidone, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride. These solvents may be used singly or as a mixture of two or more kinds in any ratio.

本反應使用之溶劑量,若目的反應會進行即可,並無特殊限制,通常相對於式(3a)表示之化合物為3重量倍以上200重量倍以下。The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, and is usually 3 to 200 times the weight of the compound represented by formula (3a).

本反應進行時之溫度,若目的反應會進行即可,並無特殊限制,通常為-20℃以上180℃以下或溶劑之沸點以下。The temperature at which the reaction proceeds is not particularly limited as long as the intended reaction proceeds, and is usually -20 ° C to 180 ° C or the boiling point of the solvent.

關於反應之後處理,於酸性條件之反應與於鹼性條件之反應能以共通的方法進行。可藉由對於反應混合物添加水、或適當的水溶液以進行分液操作。使用水溶液時,可以任意使用溶有鹽酸、硫酸等之酸性水溶液、溶有氫氧化鉀、氫氧化鈉、碳酸鈉、碳酸鉀、碳酸氫鈉、碳酸氫鉀等之鹼水溶液、食鹽水等。分液操作時視需要可以追加甲苯、二甲苯、苯、氯苯、二氯苯等苯系溶劑、乙酸乙酯、乙酸異丙酯、乙酸丁酯等酯系溶劑、二乙醚、二異丙醚、甲基-第三丁醚等醚系溶劑、二氯甲烷、二氯乙烷、氯仿、四氯化碳等鹵素系溶劑、己烷、庚烷、環己烷、甲基環己烷等烴系溶劑等和水不互溶之溶劑。又,該等溶劑可單獨使用也可將2種以上以任意比例混合。分液之次數無特殊限制,可因應目的之純度、產量實施。Regarding the post-reaction treatment, the reaction under acidic conditions and the reaction under basic conditions can be carried out by a common method. Liquid separation can be performed by adding water or a suitable aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid and the like are dissolved, an alkali aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, potassium bicarbonate and the like are dissolved, and a saline solution can be optionally used. During the liquid separation operation, if necessary, benzene solvents such as toluene, xylene, benzene, chlorobenzene, and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate, and butyl acetate, diethyl ether, and diisopropyl ether can be added. , Ether solvents such as methyl, tertiary butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride; hydrocarbons such as hexane, heptane, cyclohexane, and methylcyclohexane It is a solvent that is immiscible with water. These solvents may be used alone or as a mixture of two or more of them in an arbitrary ratio. There are no special restrictions on the number of liquid separations, which can be implemented according to the purity and yield of the purpose.

前述獲得之含式(3b)表示之化合物之反應混合物可利用硫酸鈉、硫酸鎂等乾燥劑去除水分但非必要。The aforementioned reaction mixture containing the compound represented by the formula (3b) can be used to remove moisture using desiccants such as sodium sulfate and magnesium sulfate, but it is not necessary.

前述獲得之含式(3b)表示之化合物之反應混合物,只要化合物不分解,可以於減壓下將溶劑餾去。 溶劑餾去後獲得之含式(3b)表示之化合物之反應混合物,可以利用適當的溶劑以洗淨、再沉澱、再結晶、管柱層析等進行精製。可因應目的純度而適當設定。As long as the reaction mixture containing the compound represented by the formula (3b) obtained above is not decomposed, the solvent can be distilled off under reduced pressure. The reaction mixture containing the compound represented by the formula (3b) obtained after the solvent is distilled off can be purified by using an appropriate solvent for washing, reprecipitation, recrystallization, column chromatography, and the like. It can be appropriately set according to the purity of the purpose.

式(3b)表示之化合物也包括式(3b’)表示之異構物; 【化36】式中,R2、R3、n、X及Y與前述為同義。Compounds represented by formula (3b) also include isomers represented by formula (3b '); In the formula, R2, R3, n, X and Y have the same meanings as described above.

式(3b’)表示之化合物可以和式(3b)表示之化合物同樣地操作,可以適用製造方法A。又,式(3b’)表示之化合物包括不對稱碳,其異構物混合比可為單獨也可為任意比例之混合物。再者,也可以為式(3b)表示之化合物與式(3b’)表示之化合物之混合物,其異構物混合比可為單獨也可為任意比例之混合物。The compound represented by the formula (3b ') can be handled in the same manner as the compound represented by the formula (3b), and the production method A can be applied. The compound represented by the formula (3b ') includes an asymmetric carbon, and the mixture ratio of the isomers may be a single or a mixture in any ratio. Furthermore, it may be a mixture of the compound represented by the formula (3b) and the compound represented by the formula (3b '), and the mixing ratio of the isomers may be a single or a mixture in any ratio.

可以將以上所示之製造方法A~製造方法R任意地組合而製造式(1)表示之化合物。或也可以將公知之方法與製造方法A~製造方法R任意地組合而製造式(1)表示之化合物。The compound represented by the formula (1) can be produced by arbitrarily combining the production methods A to R described above. Alternatively, a compound represented by the formula (1) may be produced by arbitrarily combining a known method and the production method A to the production method R.

然後針對式(2a)或式(2b)表示之喹啉系化合物説明。 式(2a)及式(2b)之R2a及R2b各自獨立地表示亦可經取代基E1適當取代之C1~C6之烷基、亦可經取代基E2適當取代之芳基、亦可經取代基E3適當取代之雜芳基、或亦可經取代基E2適當取代之芳烷基,或亦可R2a與R2b與它們所鍵結之碳原子成為一體而形成亦可經取代基E4適當取代之C3~C10之環烷基環。Next, the quinoline-based compound represented by the formula (2a) or the formula (2b) will be described. R2a and R2b of formula (2a) and formula (2b) each independently represent an alkyl group of C1 to C6 which may be appropriately substituted by substituent E1, an aryl group which may be appropriately substituted by substituent E2, or a substituent E3 appropriately substituted heteroaryl, or arylalkyl which may also be appropriately substituted with substituent E2, or R2a and R2b may be integrated with the carbon atom to which they are bonded to form C3, which may also be appropriately substituted with substituent E4 ~ C10 cycloalkyl ring.

其中R2a及R2b各自獨立地表示亦可經取代基E1適當取代之C1~C6之烷基,尤其C1~C6之烷基較理想,甲基更理想。Among them, R2a and R2b each independently represent an alkyl group of C1 to C6 which can also be appropriately substituted by the substituent E1, especially an alkyl group of C1 to C6 is preferable, and a methyl group is more preferable.

式(2a)及式(2b)之R2c及R2d各自獨立地表示氫原子、亦可經取代基E1適當取代之C1~C6之烷基、鹵素原子、C1~C6之烷氧基、或羥基,或也可R2c與R2d與它們所鍵結之碳原子成為一體而形成亦可經羰基或取代基E4適當取代之C3~C10之環烷基環。R2c and R2d of formula (2a) and formula (2b) each independently represent a hydrogen atom, a C1 to C6 alkyl group, a halogen atom, a C1 to C6 alkoxy group, or a hydroxyl group which may also be appropriately substituted by a substituent E1, Alternatively, R2c and R2d may be integrated with the carbon atom to which they are bonded to form a cycloalkyl ring of C3 to C10 which may be appropriately substituted by a carbonyl group or a substituent E4.

其中R2c及R2d各自獨立地表示氫原子、亦可經取代基E1適當取代之C1~C6之烷基,尤其C1~C6之烷基、或鹵素原子較理想,氫原子、甲基或氟原子更理想。Among them, R2c and R2d each independently represent a hydrogen atom, an alkyl group of C1 to C6 which can also be appropriately substituted by the substituent E1, especially an alkyl group of C1 to C6, or a halogen atom is preferred, and a hydrogen atom, a methyl group or a fluorine atom is more preferred ideal.

式(2a)及式(2b)之R2e表示氫原子、C2~C7之醯基、或亦可經取代基E1適當取代之C1~C6之烷基。R2e in formula (2a) and formula (2b) represents a hydrogen atom, a fluorenyl group of C2 to C7, or an alkyl group of C1 to C6 which may be appropriately substituted by a substituent E1.

其中R2e宜為氫原子或亦可經取代基E1適當取代之C1~C6之烷基,尤其C1~C6之烷基較理想,氫原子或甲基更理想。最理想為氫原子。Among them, R2e is preferably a hydrogen atom or an alkyl group of C1 to C6 which may be appropriately substituted by a substituent E1, especially an alkyl group of C1 to C6 is preferable, and a hydrogen atom or a methyl group is more preferable. Most preferably, it is a hydrogen atom.

式(2a)及式(2b)之X1,表示鹵素原子、亦可經取代基E5適當取代之C1~C6之烷基、亦可經取代基E6適當取代之C2~C6之烯基、亦可經取代基E7適當取代之C2~C6之炔基、亦可經取代基E2適當取代之芳基、亦可經取代基E3適當取代之雜芳基、C1~C6之烷氧基、亦可經取代基E8適當取代之胺基、C2~C7之醯基、氰基、或也可經取代基E9取代羥基之氫原子的N-羥基烷醯亞胺基。X1 in formula (2a) and formula (2b) represents a halogen atom, an alkyl group of C1 to C6 which may be appropriately substituted by substituent E5, an alkenyl group of C2 to C6 which may also be appropriately substituted by substituent E6, or C2 ~ C6 alkynyl suitably substituted with substituent E7, aryl optionally substituted with substituent E2, heteroaryl optionally substituted with substituent E3, alkoxy groups C1-C6, or Substituent E8 is an appropriately substituted amine group, C2 to C7 fluorenyl group, cyano group, or N-hydroxyalkylimino group which may also substitute a hydrogen atom of a hydroxyl group through substituent E9.

其中X1宜為鹵素原子較理想,氟原子更理想。Among them, X1 is preferably a halogen atom, and a fluorine atom is more preferable.

式(2a)及式(2b)之X2,表示鹵素原子、C1~C6之烷基、C1~C6之烷氧基或羥基。X2 in formula (2a) and formula (2b) represents a halogen atom, an alkyl group of C1 to C6, an alkoxy group of C1 to C6, or a hydroxyl group.

其中X2宜為鹵素原子較理想,氟原子更理想。Among them, X2 is preferably a halogen atom, and a fluorine atom is more desirable.

式(2a)及式(2b)中,n1表示0~4之整數、n2表示0~6之整數。In formulas (2a) and (2b), n1 represents an integer of 0 to 4, and n2 represents an integer of 0 to 6.

其中n1宜為0~1之整數較理想,n2宜為0~2之整數,尤其0~1之整數較佳。Among them, n1 is preferably an integer of 0 to 1, and n2 is preferably an integer of 0 to 2, especially an integer of 0 to 1 is preferred.

式(2a)及式(2b)之取代基E1,係選自由鹵素原子、C1~C6之烷氧基、C1~C6之烷基硫基及苯氧基構成之群組中之至少1種。The substituent E1 of the formula (2a) and the formula (2b) is at least one selected from the group consisting of a halogen atom, an alkoxy group of C1 to C6, an alkylthio group of C1 to C6, and a phenoxy group.

式(2a)及式(2b)之取代基E2,係選自由鹵素原子、C1~C6之烷基、C1~C6之鹵烷基、C1~C6之烷氧基、亦可經取代基E8適當取代之胺基、硝基、氰基、羥基、巰基及C1~C6之烷基硫基構成之群組中之至少1種。The substituent E2 of the formula (2a) and the formula (2b) is selected from a halogen atom, an alkyl group of C1 to C6, a haloalkyl group of C1 to C6, an alkoxy group of C1 to C6, and may be appropriately substituted by the substituent E8 At least one selected from the group consisting of a substituted amine group, a nitro group, a cyano group, a hydroxyl group, a mercapto group, and a C1 to C6 alkylthio group.

式(2a)及式(2b)之取代基E3,係選自由鹵素原子、C1~C6之烷基、C1~C6之鹵烷基及C1~C6之烷氧基構成之群組中之至少1種。The substituent E3 of the formula (2a) and the formula (2b) is at least 1 selected from the group consisting of a halogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, and a C1-C6 alkoxy group. Species.

式(2a)及式(2b)之取代基E4,係選自由鹵素原子、C1~C6之烷基、C1~C6之烷氧基及苯氧基構成之群組中之至少1種。The substituent E4 of the formula (2a) and the formula (2b) is at least one selected from the group consisting of a halogen atom, an alkyl group of C1 to C6, an alkoxy group of C1 to C6, and a phenoxy group.

式(2a)及式(2b)之取代基E5,係選自由鹵素原子、C1~C6之烷氧基、羥基、C2~C7之烷氧基羰基及苯氧基構成之群組中之至少1種。The substituent E5 of the formula (2a) and the formula (2b) is at least 1 selected from the group consisting of a halogen atom, an alkoxy group of C1 to C6, a hydroxyl group, an alkoxycarbonyl group of C2 to C7, and a phenoxy group. Species.

式(2a)及式(2b)之取代基E6,係選自由鹵素原子、C1~C6之烷氧基、C2~C7之烷氧基羰基及苯氧基構成之群組中之至少1種。The substituent E6 of the formula (2a) and the formula (2b) is at least one selected from the group consisting of a halogen atom, an alkoxy group of C1 to C6, an alkoxycarbonyl group of C2 to C7, and a phenoxy group.

式(2a)及式(2b)之取代基E7,係選自由鹵素原子、C1~C6之烷氧基及苯氧基構成之群組中之至少1種。The substituent E7 of the formula (2a) and the formula (2b) is at least one selected from the group consisting of a halogen atom, an alkoxy group of C1 to C6, and a phenoxy group.

式(2a)及式(2b)之取代基E8,係選自由C1~C6之烷基及C2~C7之醯基構成之群組中之至少1種。The substituent E8 of the formula (2a) and the formula (2b) is at least one selected from the group consisting of a C1 to C6 alkyl group and a C2 to C7 fluorenyl group.

式(2a)及式(2b)之取代基E9,係選自由C1~C6之烷基、C2~C6之烯基、C2~C6之炔基、芳烷基、芳基及雜芳基構成之群組中之至少1種。The substituent E9 of formula (2a) and formula (2b) is selected from the group consisting of C1 to C6 alkyl, C2 to C6 alkenyl, C2 to C6 alkynyl, aralkyl, aryl, and heteroaryl. At least one of the groups.

其中式(2a)或式(2b)表示之喹啉系化合物,宜為式(2c)或式(2d)表示之喹啉系化合物較佳; 【化37】[式中,R2f表示氫原子或甲基,X3、X4及X5各自獨立地表示氫原子或氟原子,X6及X7各自獨立地表示氫原子、甲基或氟原子]。Among them, the quinoline compound represented by formula (2a) or (2b) is preferably a quinoline compound represented by formula (2c) or (2d); [Chem 37] [In the formula, R2f represents a hydrogen atom or a methyl group, X3, X4, and X5 each independently represent a hydrogen atom or a fluorine atom, and X6 and X7 each independently represent a hydrogen atom, a methyl group, or a fluorine atom].

尤其式(2a)或(2b)表示之喹啉系化合物宜為3-(4,4-二氟-3,3-二甲基-3,4-二氫異喹啉-1-基)喹啉(化合物編號:(2)-1)、3-(4,4-二氟-3,3-二甲基-3,4-二氫異喹啉-1-基)-8-氟喹啉(化合物編號:(2)-2)、8-氟-3-(5-氟-3,3,4,4-四甲基-1,2,3,4-四氫異喹啉-1-基)喹啉(化合物編號:(2)-3)、或8-氟-3-(5-氟-3,3-二甲基-3,4-二氫異喹啉-1-基)喹啉(化合物編號:(2)-4)最理想。 【化38】【化39】【化40】【化41】In particular, the quinoline-based compound represented by formula (2a) or (2b) is preferably 3- (4,4-difluoro-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) quine (Compound No .: (2) -1), 3- (4,4-difluoro-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) -8-fluoroquinoline (Compound No .: (2) -2), 8-fluoro-3- (5-fluoro-3,3,4,4-tetramethyl-1,2,3,4-tetrahydroisoquinoline-1- ) Quinoline (compound number: (2) -3), or 8-fluoro-3- (5-fluoro-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) quine Porphyrin (compound number: (2) -4) is most preferred. [Chemical 38] [Chemical 39] [Chemical 40] [Chemical 41] .

發現到為前述式(2c)或式(2d)表示之喹啉系化合物且X3或X4,尤其X3為氟原子時,對於灰黴病、稻之稻熱病、蘋果黑星病、黃瓜炭疽病等病害的效果顯著提高,較為理想。When a quinoline compound represented by the aforementioned formula (2c) or formula (2d) and X3 or X4, especially X3 is a fluorine atom, were found to be gray mold, rice fever, apple scab, cucumber anthracnose, etc. The effect of the disease is significantly improved, which is ideal.

尤其為式(2c)或式(2d)表示之喹啉系化合物,且R2f為氫原子或甲基、X3為氟原子、X4、X5、X6及X7各自獨立地為氫原子或氟原子,惟式(2c)中之X4、X5、X6或X7中之至少一者為氟原子、式(2d)中之X4或X5中之任一者為氟原子的喹啉系化合物或其鹽,對於灰黴病、稻之稻熱病、蘋果黑星病、黃瓜炭疽病等病害顯示顯著效果,故較理想。 尤其上述喹啉系化合物(2)-2、(2)-3、及(2)-4較理想,上述喹啉系化合物(2)-2及(2)-3較佳。Especially, it is a quinoline compound represented by formula (2c) or formula (2d), and R2f is a hydrogen atom or a methyl group, X3 is a fluorine atom, X4, X5, X6, and X7 are each independently a hydrogen atom or a fluorine atom, but A quinoline-based compound or a salt thereof in which at least one of X4, X5, X6 or X7 in formula (2c) is a fluorine atom, and either of X4 or X5 in formula (2d) is a fluorine atom. Diseases such as mildew, rice fever, apple scab, cucumber anthracnose, etc. show significant effects and are therefore ideal. In particular, the quinoline-based compounds (2) -2, (2) -3, and (2) -4 are preferable, and the quinoline-based compounds (2) -2 and (2) -3 are preferable.

此外,發現上述喹啉系化合物(2)-3及(2)-4,容器內土壤殘留試驗之半衰期為7~55日,顯著地有土壤殘留性低的環境動態的特性,較理想。In addition, it was found that the above-mentioned quinoline compounds (2) -3 and (2) -4 have a half-life period of 7 to 55 days for the soil residue test in the container, and have remarkable environmental dynamic characteristics of low soil residue, which is ideal.

針對式(2a)或式(2b)表示之喹啉系化合物、生物活性、或使用此成分之有害生物之防除方法,可參照公知之文獻(例如國際公開第05/070917號或國際公開第08/066148號)。又,針對式(2a)或式(2b)表示之喹啉系化合物及其製造中間體之製造方法,可參照公知之文獻(例如國際公開第05/070917號、國際公開第08/066148號、國際公開第13/047749號、國際公開第13/047750號或國際公開第13/047751號)。For a quinoline-based compound represented by formula (2a) or formula (2b), biological activity, or a method for controlling a pest using this component, refer to a well-known document (for example, International Publication No. 05/070917 or International Publication No. 08 / 066148). For the production method of the quinoline-based compound represented by the formula (2a) or the formula (2b) and a method for producing the intermediate, refer to a known document (for example, International Publication No. 05/070917, International Publication No. 08/066148, International Publication No. 13/047749, International Publication No. 13/047750, or International Publication No. 13/047751).

然後針對本發明之有害生物防除組成物説明。 本發明之有害生物防除組成物,可依一般農藥之製造的常法製造。亦即,該有害生物防除組成物,可將本發明化合物及喹啉系化合物之2種類以上之有效成分混合,並於其中視需要混合擔體及輔助劑等,而製造含有兩者之有效成分的組成物。又,也可以先製造含有本發明化合物及喹啉系化合物中其中一者的組成物後,於其中加入另一者,來製造含有兩者之有效成分之組成物。 通常,較佳係製備混合了兩者之有效成分之混合物,並製造該有害生物防除組成物。 或本發明之有害生物防除組成物,可依一般農藥之製造相關的常法,於僅喹啉系化合物之有效成分中視需要混合擔體及輔助劑等來製造。Then, the pest control composition of this invention is demonstrated. The pest control composition of the present invention can be manufactured in accordance with a common method for manufacturing general pesticides. That is, the pest control composition can be prepared by mixing two or more types of active ingredients of the compound of the present invention and a quinoline compound, and optionally mixing a carrier and an adjuvant, etc., to produce an active ingredient containing the two. Composition. Alternatively, a composition containing one of the compound of the present invention and a quinoline-based compound may be produced first, and then the other may be added to produce a composition containing the active ingredients of both. Generally, it is preferable to prepare a mixture in which the active ingredients of the two are mixed, and to manufacture the pest control composition. Or the pest control composition of the present invention can be produced by mixing a carrier and an adjuvant, etc., as necessary, with only the active ingredients of a quinoline compound according to a common method related to the production of general pesticides.

本發明之有害生物防除組成物中,可直接僅使用本發明化合物及喹啉系化合物之組合、或僅使用喹啉系化合物,但通常會和擔體混合使用,視需要可添加界面活性劑、黏結劑、崩散劑、安定劑、pH調整劑、抗菌防黴劑(防腐劑)、增黏劑、消泡劑、濕潤劑、固定劑、著色劑等輔助劑,並依常法適時地製劑成水合劑、水懸劑、顆粒水合劑、OD劑、粉劑、液劑、乳劑、粒劑、貼片劑等劑型。其形態,只要能發揮效果即可,並無特殊限定。 又,本發明之有害生物防除組成物,也可為本發明化合物與喹啉系化合物製劑成一劑型之態樣,或可為分別製劑成個別的劑型而獲得的兩者的成組的態樣。In the pest control composition of the present invention, only a combination of the compound of the present invention and a quinoline-based compound or only a quinoline-based compound may be directly used, but it is usually mixed with a support, and a surfactant, etc. may be added if necessary. Adhesives, disintegrating agents, stabilizers, pH adjusters, antibacterial and antifungal agents (preservatives), tackifiers, defoamers, humectants, fixatives, colorants and other auxiliary agents are formulated in a timely manner in accordance with ordinary methods. Hydration, water suspension, granule hydration, OD, powder, liquid, emulsion, granule, patch and other dosage forms. The form is not particularly limited as long as it exhibits effects. In addition, the pest control composition of the present invention may be in the form of a one-dose formulation of the compound of the present invention and a quinoline-based compound, or may be in the form of a group of the two obtained by being formulated into separate dosage forms.

本發明之組成物使用之擔體,係指幫助有效成分到達待處理之部位,並為了使有效成分化合物之貯藏、輸送、操作容易而摻合的合成或天然的無機或有機物質,只要是通常農藥使用者即可,固體、液體或氣體皆能使用。此擔體只要效果可以發揮即可,無特殊限制。The carrier used in the composition of the present invention refers to a synthetic or natural inorganic or organic substance that helps the active ingredient reach the place to be treated and is blended for easy storage, transportation, and operation of the active ingredient compound, as long as it is generally Pesticide users only need to use solid, liquid or gas. This support is not limited as long as the effect can be exhibited.

本發明之組成物能使用之固體擔體,例如:膨土、蒙特石(montmorillonite)、矽藻土、白土、滑石、黏土等無機物質、木粉、鋸屑等植物性有機物質、或尿素等。The solid support that can be used for the composition of the present invention includes, for example, inorganic substances such as bentonite, montmorillonite, diatomaceous earth, white clay, talc, clay, plant organic substances such as wood flour, sawdust, or urea.

本發明之組成物能使用之液體擔體,例如:二甲苯、甲苯等芳香族烴類、環烷(naphthene)類、正構石蠟、流動石蠟等脂肪族烴類、丙酮、甲乙酮等酮類、二烷、二乙二醇二甲醚等醚類、乙醇、乙二醇等醇類、碳酸伸乙酯等碳酸酯類、二甲基甲醯胺等非質子性溶劑、水等。 本發明之組成物能使用之氣體擔體,例如:氮氣、二氧化碳氣體等。The liquid carriers that can be used for the composition of the present invention include, for example, aromatic hydrocarbons such as xylene and toluene, naphthene, aliphatic hydrocarbons such as n-paraffin and flowing paraffin, ketones such as acetone and methyl ethyl ketone, two Ethers such as alkane and diethylene glycol dimethyl ether, alcohols such as ethanol and ethylene glycol, carbonates such as ethylene carbonate, aprotic solvents such as dimethylformamide, water, and the like. Gas carriers that can be used for the composition of the present invention, for example, nitrogen, carbon dioxide gas, and the like.

再者,為了增強本發明之組成物中之化合物之效力,也可使用輔助劑。其使用形態,可考慮製劑之劑型、處理方法等,因應目的而單獨或組合使用。輔助劑,例如界面活性劑、黏結劑、崩散劑、安定劑、pH調整劑、防菌防黴劑、增黏劑、消泡劑、抗凍劑等。Furthermore, in order to enhance the effectiveness of the compounds in the composition of the present invention, an adjuvant may be used. The form of use can be considered alone or in combination depending on the purpose of the preparation, including the dosage form and processing method. Adjuvants, such as surfactants, binding agents, disintegrating agents, stabilizers, pH adjusting agents, antibacterial and antifungal agents, thickeners, antifoaming agents, antifreeze agents, and the like.

作為本發明之組成物能使用之界面活性劑,通常可使用為了將農藥製劑予以乳化、分散、擴展或/及濕潤等而使用之界面活性劑。該界面活性劑,例如山梨醇酐脂肪酸酯、聚氧乙烯脂肪酸酯、聚氧乙烯烷醚、聚氧乙烯烷基苯醚、聚氧乙烯聚氧丙烯嵌段聚合物、烷基聚氧乙烯聚氧丙烯嵌段聚合物醚、聚氧乙烯烷胺、聚氧乙烯脂肪酸醯胺、聚氧乙烯雙苯醚、高級醇之聚氧亞烷基加成物、聚氧乙烯醚、酯型聚矽氧、氟系界面活性劑等非離子性界面活性劑; 烷基硫酸鹽、聚氧乙烯烷醚硫酸鹽、聚氧乙烯苄基苯醚硫酸鹽、聚氧乙烯苯乙烯基苯醚硫酸鹽、石蠟磺酸鹽、烷磺酸鹽、AOS、二烷基磺基琥珀酸鹽、烷基苯磺酸鹽、木質素磺酸鹽、聚氧乙烯烷基苯醚磺酸鹽、脂肪酸鹽、N-甲基-脂肪酸肌胺酸鹽、聚氧乙烯烷醚磷酸鹽、聚氧乙烯苯醚磷酸鹽、聚氧乙烯聚氧丙烯嵌段聚合物磷酸鹽、磷脂醯膽鹼、磷脂醯乙醇亞胺、烷基磷酸鹽、三聚磷酸鈉等陰離子性界面活性劑; 烷基三甲基氯化銨、烷基二甲基羥基氯苯胺、氯化本索寧(benzethonium chloride)等陽離子性界面活性劑; 二烷基二胺基乙基甜菜鹼、烷基二甲基苄基甜菜鹼等兩性界面活性劑等。As the surfactant that can be used in the composition of the present invention, a surfactant that is generally used for emulsifying, dispersing, expanding, and / or moisturizing a pesticide formulation can be used. The surfactant, such as sorbitan fatty acid ester, polyoxyethylene fatty acid ester, polyoxyethylene alkyl ether, polyoxyethylene alkyl phenyl ether, polyoxyethylene polyoxypropylene block polymer, alkyl polyoxyethylene Polyoxypropylene block polymer ether, polyoxyethylene alkylamine, polyoxyethylene fatty acid ammonium amine, polyoxyethylene diphenyl ether, polyoxyalkylene adduct of higher alcohol, polyoxyethylene ether, ester polysilicon Non-ionic surfactants such as oxygen and fluorine surfactants; alkyl sulfates, polyoxyethylene alkyl ether sulfates, polyoxyethylene benzyl phenyl ether sulfates, polyoxyethylene styryl phenyl ether sulfates, paraffin waxes Sulfonate, alkane sulfonate, AOS, dialkyl sulfosuccinate, alkylbenzene sulfonate, lignin sulfonate, polyoxyethylene alkyl phenyl ether sulfonate, fatty acid salt, N-formaldehyde Base-fatty acid sarcosinate, polyoxyethylene alkyl ether phosphate, polyoxyethylene phenyl ether phosphate, polyoxyethylene polyoxypropylene block polymer phosphate, phospholipids choline, phospholipids ethanolimine, alkyl Anionic surfactants such as phosphate and sodium tripolyphosphate; alkyltrimethylammonium chloride, alkane Cationic surfactants such as methyl dimethyl hydroxychloroaniline, benzethonium chloride; amphoteric surfactants such as dialkyldiaminoethyl betaine, alkyl dimethyl benzyl betaine, etc. .

黏結劑,例如:海藻酸鈉、聚乙烯醇、阿拉伯膠、羧基甲基纖維素鈉、膨土等。Binders, such as: sodium alginate, polyvinyl alcohol, gum arabic, sodium carboxymethyl cellulose, bentonite, etc.

崩散劑,例如:羧基甲基纖維素CMC鈉、交聯羧甲基纖維素鈉(croscarmellose sodium)等。Disintegrating agents include, for example, sodium carboxymethyl cellulose CMC, croscarmellose sodium and the like.

安定劑,例如:受阻酚系之抗氧化劑、或苯并三唑系、受阻胺系之紫外線吸收劑等。Stabilizers include, for example, hindered phenol-based antioxidants, benzotriazole-based, and hindered amine-based ultraviolet absorbers.

pH調整劑,例如:磷酸、乙酸、氫氧化鈉等。pH adjusting agent, for example: phosphoric acid, acetic acid, sodium hydroxide and the like.

防菌防黴劑,例如:苯甲酸鈉、山梨酸鉀、對羥基苯甲酸酯、1,2-苯并異噻唑啉-3-酮等工業用殺菌劑、防菌防黴劑等。Antibacterial and antifungal agents, such as: industrial bactericides such as sodium benzoate, potassium sorbate, parabens, 1,2-benzoisothiazolin-3-one, antibacterial and antifungal agents, and the like.

增黏劑,例如:三仙膠、瓜爾膠、羧基甲基纖維素鈉、阿拉伯膠、聚乙烯醇、蒙特石等。Tackifiers, such as: Sanxian gum, guar gum, sodium carboxymethyl cellulose, acacia gum, polyvinyl alcohol, montmorillonite, etc.

消泡劑,例如:聚矽氧系化合物等。Antifoaming agents, for example: polysiloxane compounds.

抗凍劑,例如:丙二醇、乙二醇等。Antifreeze, for example: propylene glycol, ethylene glycol, etc.

以上記載之輔助劑係舉例,本發明之組成物使用之輔助劑只要能發揮效果即可,無特殊限制。The adjuvants described above are examples, and the adjuvants used in the composition of the present invention are not particularly limited as long as they exhibit effects.

本發明之組成物中之本發明化合物之含量,只要效果可發揮即可並無特殊限制,通常,按重量比為0.01~99%之範圍,較佳為0.1~90%之範圍,更佳為1~80%之範圍。 又,本發明之組成物中之喹啉系化合物之含量只要效果可發揮即可並無特殊限制,通常按重量比計為0.01~99%之範圍,較佳為0.1~90%之範圍,更佳為1~80%之範圍。 本發明之組成物中之本發明化合物與喹啉系化合物之之合計含量,只要效果可發揮即可並無特殊限制,通常按重量比計為0.01~99%之範圍,較佳為0.1~90%之範圍,更佳為1~80%之範圍。The content of the compound of the present invention in the composition of the present invention is not particularly limited as long as the effect can be exhibited. Generally, the weight ratio is in the range of 0.01 to 99%, preferably in the range of 0.1 to 90%, and more preferably The range is 1 ~ 80%. In addition, the content of the quinoline-based compound in the composition of the present invention is not particularly limited as long as the effect can be exhibited, and is usually in a range of 0.01 to 99% by weight ratio, preferably in a range of 0.1 to 90%, more It is preferably in the range of 1 to 80%. The total content of the compound of the present invention and the quinoline compound in the composition of the present invention is not particularly limited as long as the effect can be exhibited, and it is usually in the range of 0.01 to 99% by weight ratio, preferably 0.1 to 90. The range of% is more preferably in the range of 1 to 80%.

本發明之組成物中之本發明化合物與喹啉系化合物之混合比,只要效果可發揮即可並無特殊限制,通常相對於本發明化合物,喹啉系化合物按重量比計為0.001~1000之比率,較佳為0.01~100之比率。The mixing ratio of the compound of the present invention and the quinoline compound in the composition of the present invention is not particularly limited as long as the effect can be exhibited. Generally, the quinoline compound is 0.001 to 1000 by weight ratio relative to the compound of the present invention. The ratio is preferably a ratio of 0.01 to 100.

然後,針對使用了本發明之有害生物防除組成物之有害生物防除方法説明。Then, the pest control method using the pest control composition of this invention is demonstrated.

本發明之組成物可使用在旱田、水田、茶園、果樹園、牧草地、草坪、森林、庭園、街路樹等防除有害生物之用途。The composition of the present invention can be used for controlling pests in dry fields, paddy fields, tea gardens, orchards, grasslands, lawns, forests, gardens, street trees, and the like.

本發明之組成物在農業之施用方法,例如:對於植物個體之莖葉散布處理、苗箱處理、穴盤處理、對於土壤表面之散布處理、對於土壤表面之散布處理後之土壤混合、對於土壤中之注入處理、在土壤中之注入處理後之土壤混合、土壤灌注處理、土壤灌注處理後之土壤混合、對於植物種子之噴吹處理、對於植物種子之塗抹處理、對於植物種子之浸漬處理或對於植物種子之包被處理等。通常可使用該技術領域中具通常知識者利用之施用方法。The agricultural application method of the composition of the present invention is, for example, the treatment of plant stem and leaf spreading, seedling box processing, plug tray processing, soil spreading treatment, soil mixing after soil surface spreading treatment, and soil Injection treatment in the soil, soil mixing after the injection treatment in the soil, soil infusion treatment, soil mixing after the soil infusion treatment, spray treatment on the plant seeds, smear treatment on the plant seeds, immersion treatment on the plant seeds, or For coating of plant seeds, etc. Application methods used by those skilled in the art can generally be used.

作為防除本發明中之有害生物之方法,可以列舉施用本發明之有害生物防除組成物之方法、同時施用含有本發明化合物作為有效成分之組成物、及含有喹啉系化合物作為有效成分之組成物之方法、或施用含有本發明化合物作為有效成分之組成物、或含有喹啉系化合物作為有效成分之組成物中任一者之組成物後,再施用另一者之組成物之方法等。Examples of the method for controlling the pest in the present invention include a method for applying the pest control composition of the present invention, a composition containing the compound of the present invention as an active ingredient, and a composition containing a quinoline compound as an active ingredient. A method of applying a composition containing any one of the compounds of the present invention as an active ingredient or a composition containing a quinoline compound as an active ingredient, and then applying the other composition.

作為施用本發明之有害生物防除組成物之方法,可列舉:施用以含有本發明化合物及喹啉系化合物之2種類以上之有效成分之方式製造之有害生物防除組成物之方法、或使用者在使用前將含有本發明化合物作為有效成分之組成物及含有喹啉系化合物作為有效成分之組成物混合以製備含有本發明化合物及喹啉系化合物之組成物並使用之方法等。Examples of the method for applying the pest control composition of the present invention include a method of applying the pest control composition manufactured by including the compound of the present invention and two or more types of active ingredients of a quinoline compound, or the user A method of preparing a composition containing the compound of the present invention and a quinoline compound and using the composition containing the compound of the present invention as an active ingredient and a composition containing the quinoline compound as an active ingredient before use.

施用了含有本發明化合物作為有效成分之組成物或含有喹啉系化合物作為有效成分之組成物中任一者之組成物後直到施用另一者之組成物為止的時間(期間),只要效果可發揮即可並無特殊限制,例如:在施用任一者之組成物後1分鐘~2週,較佳為施用其中任一者之組成物後5分鐘~1週,更佳施用任一者之組成物後10分鐘~3日。The time (period) after the application of either the composition containing the compound of the present invention as an active ingredient or the composition containing the quinoline compound as an active ingredient until the application of the other composition, as long as the effect is possible There is no particular limitation on the application, for example: 1 minute to 2 weeks after the application of any one of the compositions, preferably 5 minutes to 1 week after the application of any of the compositions, and more preferably the application of any 10 minutes to 3 days after the composition.

本發明之組成物之施用量及稀釋倍率,可因應對象作物、對象有害生物、有害生物之發生程度、本發明之組成物之劑型、施用方法及各種環境條件等來適當選擇並決定。The application amount and dilution ratio of the composition of the present invention can be appropriately selected and determined according to the target crop, the target pest, the occurrence degree of the pest, the dosage form of the composition of the present invention, the application method and various environmental conditions.

散布本發明之組成物時,其施用量只要效果可發揮即可並無特殊限制,通常按有效成分量換算計,每1公頃為1~10000g,較佳為每1公頃10~5000g。 又,使用本發明之組成物作為種子消毒劑時,其施用量只要效果可發揮即可並無特殊限制,通常按有效成分量換算計,種子每1kg為0.001~100g,較佳為0.01~50g。 又,將本發明之組成物之水合劑、顆粒水合劑、液劑、OD劑、水懸劑或乳劑以水稀釋並散布時,其稀釋倍率只要效果可發揮即可並無特殊限制,通常5~50000倍,較佳為10~10000倍。When dispersing the composition of the present invention, its application amount is not particularly limited as long as the effect can be exerted. Generally, it is 1 to 10,000 g per 1 hectare, preferably 10 to 5000 g per 1 hectare, in terms of effective ingredient amount conversion. In addition, when the composition of the present invention is used as a seed disinfectant, its application amount is not particularly limited as long as the effect can be exhibited. Generally, in terms of effective ingredient conversion, the seed is 0.001 to 100 g per 1 kg, preferably 0.01 to 50 g. . In addition, when the hydrating agent, granular hydrating agent, liquid agent, OD agent, aqueous suspension, or emulsion of the composition of the present invention is diluted with water and dispersed, the dilution ratio is not particularly limited as long as the effect can be exhibited, usually 5 ~ 50,000 times, preferably 10 ~ 10000 times.

本發明所指「植物」係光合成而不運動地生活者。具體例可列舉:稻、小麥、大麥、玉米等穀物類、葡萄、蘋果、梨、桃、櫻桃、柿子、柑橘等果樹類、大豆、菜豆、豌豆等豆類、草莓、西瓜等水果類、馬鈴薯、甘薯、芋頭、蒟蒻等芋類、結球甘藍、萵苣、番茄、黃瓜、茄子、甜菜、菠菜、南瓜、青椒等蔬菜類、油麻菜、棉花、向日葵、鬱金香、菊花等花卉類或甘蔗、菸草、草地等,但不限於此等。The "plant" referred to in the present invention refers to a person who photosynthesizes without moving. Specific examples include cereals such as rice, wheat, barley, and corn, grapes, apples, pears, peaches, cherries, persimmons, citrus, and other fruit trees, beans, beans, beans and other peas, strawberries, watermelons, and other fruits, potatoes, Sweet potatoes, taro, coriander and other taro, cabbage, lettuce, tomato, cucumber, eggplant, beet, spinach, pumpkin, green pepper and other vegetables, linseed, cotton, sunflower, tulip, chrysanthemum and other flowers or sugar cane, tobacco, grassland Etc., but not limited to them.

本發明所指之「種子」,係蓄積幼植物為了發芽的營養成分,在農業繁殖中使用者。具體例可列舉玉米、大豆、棉、稲、葉用甜菜、小麥、大麥、向日葵、番茄、黃瓜、茄子、菠菜、豌豆、南瓜、甘蔗、菸草、青椒、油菜等的種子;芋頭、馬鈴薯、甘藷、蒟蒻等種芋、食用黃瓜、鬱金香等的球根、辣韮等種球、或基因等以人為操作生出的植物,該植物例如賦予了自然界原本不存在之除草劑耐性的大豆、玉米、棉花等;適應寒冷地帶之稻、菸草等;賦予了殺蟲物質生產能力的玉米、棉花、馬鈴薯等接受過轉形的種子等,但不限定於此等。The "seed" as referred to in the present invention is a user who accumulates nutritional components of young plants for germination and is used in agricultural reproduction. Specific examples include seeds of corn, soybean, cotton, coriander, leaf beet, wheat, barley, sunflower, tomato, cucumber, eggplant, spinach, pea, pumpkin, sugarcane, tobacco, green pepper, rapeseed, etc .; taro, potato, sweet potato Taro and other taro species, bulbs such as edible cucumbers and tulips, seed bulbs such as chives, or plants derived from human manipulation such as genes, such as soybeans, corn, cotton, etc. that impart herbicide tolerance that did not exist in nature; adaptation Rice, tobacco, etc. in cold regions; corn, cotton, potato, etc., which have been given insecticidal substance production capacity, have undergone transformed seeds, but are not limited to these.

本說明書中,有害生物係指細菌類、真菌類、病毒等病原菌、害蟲、雜草等對於植物的生長造成不利影響的生物。病原菌會感染植物而引起植物病害。害蟲會寄生、加害植物。雜草由於在植物之生長場所或其附近繁茂,會和植物競爭光合成及營養吸收。因該等理由,有害生物會成為植物生長不良、枯死、產量降低等的原因,對於植物有害。本發明之組成物及防除方法對於該等有害生物有效。 以下例示本發明中成為防除對象之具體的病原菌及害蟲。In this specification, pests refer to organisms that cause adverse effects on the growth of plants, such as bacteria, fungi, viruses, and other pathogenic bacteria, pests, and weeds. Pathogens can infect plants and cause plant diseases. Pests can parasite and damage plants. As weeds flourish on or near plant growth sites, they compete with plants for light synthesis and nutrient absorption. For these reasons, harmful organisms can cause poor plant growth, withering, and reduced yield, and are harmful to plants. The composition and control method of the present invention are effective for such pests. Specific pathogenic bacteria and pests to be controlled in the present invention are exemplified below.

病原菌,例如:稻之稻熱病菌(Magnaporthe grisea)、紋枯病菌(Thanatephorus cucumeris)、褐色菌核病菌(Ceratobasidium setariae)、褐色小粒菌核病菌(Waitea circinata)、褐色紋枯病菌(Thanatephorus cucumeris)、球狀菌核病菌(Sclerotium hydrophilum)、紅色菌核病菌(Wairea circinata)、黑腫病菌(Entyloma dactylidis)、小球菌核病菌(Magnaporthe salvinii)、灰色菌核病菌(Ceratobasidium cornigerum)、芝麻葉枯病菌(Cochliobolus miyabeanus)、條葉枯病菌(Sphaerulina oryzina)、馬鹿苗病菌(Gibberella fujikuroi)、苗立枯病菌(Pythium spp.、Fusarium spp.、Trichoderma spp.、Rhizopus spp.、Rhizoctonia solani、Mucor sp.)、苗腐病菌(Pythium spp.、Achlya spp.、Dictyuchus spp.)、稻麴病菌(Claviceps virens)、墨黑穗病菌(Tilletia barclayana)、褐色米病原菌(Curvularia spp.、Alternaria spp.)、黃化萎縮病菌(Sclerophthora macrospora)、白葉枯病菌(Xanthomonas oryzae pv. oryzae)、褐條病菌(Acidovorax avenae subsp. avenae)、內頴褐變病菌(Erwinia ananas)、苗立枯細菌病菌(Burkholderia plantarii)、穀枯細菌病菌(Burkholderia glumae)、葉鞘褐變病菌(Pseudomonas fuscovaginae)、暈輪枯病菌(Pseudomonas syringae pv.oryzae)、株腐病菌(Erwinia chrysanthemi)、黃萎病菌(Phytoplasma oryzae)、條紋葉枯病菌(Rice stripe tenuivirus)、萎縮病菌(Rice dwarf reovirus); 麥類之白粉病菌(Blumeria graminis f. sp. Hordei;f.sp.tritici)、銹病菌(Puccinia striiformis、Puccinia graminis、Puccinia recondita、Puccinia hordei)、斑葉病菌(Pyrenophora graminea)、網斑病菌(Pyrenophora teres)、紅黴菌(Gibberella zeae、Fusarium culmorum、Fusarium avenaceum、Monographella nivalis)、雪腐病菌(Typhula incarnata、Typhula ishikariensis、Monographella nivalis)、裸黑穗病菌(Ustilago nuda)、腥黑穗病菌(Tilletia caries、Tilletia controversa)、眼紋病菌(Pseudocercosporella herpotrichoides)、株腐病菌(Ceratobasidium gramineum)、雲形病菌(Rhynchosporium secalis)、葉枯病菌(Septoria tritici)、稃枯病菌(Phaeosphaeria nodorum)、苗立枯病菌(Fusarium spp.、Pythium spp.、Rhizoctonia spp.、Septoria spp.、Pyrenophora spp.)、立枯病菌(Gaeumannomyces graminis)、碳疽病菌(Colletotrichum graminicola)、麥角病菌(Claviceps purpurea)、斑點病菌(Cochliobolus sativus)、黑節病菌(Pseudomonas syringae pv. syringae); 玉米之紅黴病菌(Gibberella zeae等)、苗立枯病菌(Fusarium avenaceum、Penicillium spp、Pythium spp.、Rhizoctonia spp.)、銹病菌(Puccinia sorghi)、芝麻葉枯病菌(Cochliobolus heterostrophus)、黑穗病菌(Ustilago maydis)、碳疽病菌(Colletotrichum graminicola)、北方斑點病菌(Cochliobolus carbonum)、褐條病菌(Acidovorax avenae subsp. avenae)、條斑細菌病菌(Burkholderia andropogonis)、倒伏細菌病菌(Erwinia chrysanthemi pv. zeae)、萎凋細菌病菌(Erwinia stewartii); 葡萄之露菌病菌(Plasmopara viticola)、銹病菌(Physopella ampelopsidis)、白粉病菌(Uncinula necator)、黑痘病菌(Elsinoe ampelina)、晩腐病菌(Glomerella cingulata、Colletotrichum acutatum)、黑腐病菌(Guignardia bidwellii)、蔓割病菌(Phomopsis viticola)、褐點病菌(Zygophiala jamaicensis)、灰黴病菌(Botrytis cinerea)、芽枯病菌(Diaporthe medusaea)、紫紋羽病菌(Helicobasidium mompa)、白紋羽病菌(Rosellinia necatrix)、根頭癌腫病菌(Agrobacterium vitis); 根頭癌腫病菌(Podosphaera leucotricha)、黑星病菌(Venturia inaequalis)、斑點落葉病菌(Alternaria mali)、紅星病菌(Gymnosporangium yamadae)、花腐病菌(Monilinia mali)、腐爛病菌(Valsa ceratosperma)、輪紋病菌(Botryosphaeria berengeriana)、碳疽病菌(Colletotrichum acutatum、Glomerella cingulata)、褐點病菌(Zygophiala jamaicensis)、褐斑病菌(Gloeodes pomigena)、黑點病菌(Mycosphaerella pomi)、紫紋羽病菌(Helicobasidium mompa)、白紋羽病菌(Rosellinia necatrix)、胴枯病菌(Phomopsis mali、Diaporthe tanakae)、褐斑病菌(Diplocarpon mali)、蘋果之火傷病菌(Erwinia amylovora)、根頭癌腫病菌(Agrobacterium tumefaciens)、毛根病菌(Agrobacterium rhizogenes); 梨之黑斑病(Alternaria kikuchiana)、黑星病菌(Venturia nashicola)、紅星病菌(Gymnosporangium asiaticum)、輪紋病菌(Botryosphaeria berengeriana f.sp. piricola)、胴枯病菌(Phomopsis fukushii)、枝枯細菌病菌(Erwinia sp.)、根頭癌腫病菌(Agrobacterium tumefaciens)、銹色胴枯病(Erwinia chrysanthemi pv. chrysanthemi)、花腐細菌病菌(Pseudomonas syringae pv. syringae); 西洋梨之疫病菌(Phytophthora cactorum、Phytophthora syringae)、枝枯細菌病菌(Erwinia sp.); 桃之黑星病菌(Cladosporium carpophilum)、擬莖點黴屬腐敗病菌(Phomopsis sp.)、疫病菌(Phytophthora sp.)、碳疽病菌(Colletotrichum gloeosporioides)、縮葉病菌(Taphrina deformans)、穿孔細菌病菌(Xhanthomonas campestris pv. pruni)、根頭癌腫病(Agrobacterium tumefaciens); 櫻桃之碳疽病菌(Glomerella cingulata)、幼果菌核病菌(Monilinia kusanoi)、灰星病菌(Monilinia fructicola)、根頭癌腫病菌(Agrobacterium tumefaciens)、樹脂細菌病菌(Pseudomonas syringae pv. syringae); 柿之碳疽病菌(Glomerella cingulata)、落葉病菌(Cercospora kaki;Mycosphaerella nawae)、白粉病菌(Phyllactinia kakikora)、根頭癌腫病菌(Agrobacterium tumefaciens); 柑橘之黑點病菌(Diaporthe citri)、綠黴病菌(Penicillium digitatum)、青黴病菌(Penicillium italicum)、瘡痂病菌(Elsinoe fawcettii)、褐色腐敗病菌(Phytophthora citrophthora)、潰瘍病菌(Xhanthomonas campestris pv. citri)、褐斑細菌病菌(Pseudomonas syringae pv. syringae)、黃龍病菌(Liberibactor asiaticus)、根頭癌腫病菌(Agrobacterium tumefaciens); 番茄、黃瓜、豆類、草莓、馬鈴薯、結球甘藍、茄子、萵苣等的灰黴病菌(Botrytis cinerea); 番茄、黃瓜、豆類、草莓、馬鈴薯、菜籽、結球甘藍、茄子、萵苣等的菌核病菌(Sclerotinia sclerotiorum); 番茄、黃瓜、豆類、白蘿蔔、西瓜、茄子、菜籽、甜椒、菠菜、甜菜等各種蔬菜之苗立枯病菌(Rhizoctonia spp.、Pythium spp.、Fusarium spp.、Phythophthora spp.、Sclerotinia sclerotiorum等); 菜籽、菌(Ralstonia solanacearum); 瓜類之露菌病菌(Pseudoperonospora cubensis)、白粉病菌(Sphaerotheca fuliginea)、碳疽病菌(Colletotrichum orbiculare)、蔓枯病菌(Didymella bryoniae)、蔓割病菌(Fusarium oxysporum)、疫病菌(Phytophthora parasitica、Phytophthora melonis、Phytophthora nicotianae、Phytophthora drechsleri、Phytophthora capsici等)、褐斑細菌病菌(Xhanthomonas campestris pv.cucurbitae)、軟腐病菌(Erwinia carotovora subsp. carotovora)、斑點細菌病菌(Pseudomonas syringae pv. lachrymans)、緣枯細菌病菌(Pseudomonas marginalis pv. marginalis)、癌腫病菌(Streptomyces sp.)、毛根病菌(Agrobacterium rhizogenes)、黃瓜花葉病毒(Cucumber mosaic virus); 番茄之輪紋病菌(Alternaria solani)、葉黴病菌(Fulvia fulva)、疫病菌(Phytophthora infestans)、萎凋病菌(Fusarium oxysporum)、根腐病菌(Pythium myriotylum、Pythium dissotocum)、碳疽病菌(Colletotrichum gloeosporioides)、潰瘍病菌(Clavibacter michiganensis)、莖壞死細菌病菌(Pseudomonas corrugata)、黑斑細菌病菌(Pseudomonas viridiflava)、軟腐病菌(Erwinia carotovora subsp. carotovora)、葉瘤病菌(Crynebacterium sp.)、萎黃病菌(Phytoplasma asteris)、黃化萎縮病菌(Tabaco leaf curl subgroup III geminivirus); 茄之白粉病菌(Sphaerotheca fuliginea等)、褐黴病菌(Mycovellosiella nattrassii)、疫病菌(Phytophthora infestans)、褐色腐敗病菌(Phytophthora capsici)、褐斑細菌病菌(Pseudomonas cichorii)、莖壞死細菌病菌(Pseudomonas corrugata)、莖腐細菌病菌(Erwinia chrysanthemi)、軟腐病菌(Erwinia carotovora subsp. carotovora)、斑點細菌病菌(Pseudomonas sp.); 菜籽之黑斑病菌(Alternaria brassicae)、黑腐病菌(Xhanthomonas campestris pv. campestris)、黑斑細菌病菌(Pseudomonas syringae pv. maculicola)、軟腐病菌(Erwinia carotovora); 十字花科蔬菜之黑斑病菌(Alternaria brassicae等)、白斑病菌(Cercosporella brassicae)、根朽病菌(Phoma lingam)、根瘤病菌(Plasmodiophora brassicae)、露菌病(Peronospora parasitica)、黑腐病菌(Xhanthomonas campestris pv. campestris)、黑斑細菌病菌(Pseudomonas syringae pv. maculicola)、軟腐病菌(Erwinia carotovora subsp. carotovora); 結球甘藍之株腐病菌(Thanatephorus cucumeris)、萎黃病菌(Fusarium oxysporum)、黑褐病菌(Alternaria brassisicola); 白菜之尻腐病菌(Rhizoctonia solani)、黃化病菌(Verticillium dahliae); 蔥之銹病菌(Puccinia allii)、黑斑病菌(Alternaria porri)、白絹病菌(Sclerotium rolfsii)、白色疫病菌(Phytophthora porri)、黑腐菌核病菌(Sclerotium cepivorum); 洋蔥之潰瘍病菌(Curtobacterium flaccumfaciens)、軟腐病菌(Erwinia carotovora subsp. carotovora)、斑點細菌病菌(Pseudomonas syringae pv. syringae)、腐敗病菌(Erwinia rhapontici)、鱗片腐敗病菌(Burkholderia gladioli)、萎黃病菌(Phytoplasma asteris); 蒜之軟腐病菌(Erwinia carotovora subsp. carotovora)、春腐病菌(Pseudomonas marginalis pv.marginalis); 黃豆之紫斑病菌(Cercospora kikuchii)、黑痘病菌(Elsinoe glycines)、黑點病菌(Diaporthe phaseolorum)、立枯絲核菌根腐病菌(Rhizoctonia solani)、莖疫病菌(Phytophthora sojae)、露菌病菌(Peronospora manshurica)、銹病菌(Phakopsora pachyrhizi)、碳疽病菌(Colletotrichum truncatum等)、葉燒病菌(Xhanthomonas campestris pv. glycines)、斑點細菌病菌(Pseudomonas syringae pv. glycinea); 菜豆之碳疽病菌(Colletotrichum lindemuthianum)、青枯病菌(Ralstonia solanacearum)、暈枯病菌(Pseudomonas syringae pv. phaseolicola)、褐斑細菌病菌(Pseudomonas viridiflava)、葉燒病菌(Xhanthomonas campestris pv. phaseoli); 花生之黑澀病菌(Mycosphaerella berkeleyi)、褐斑病菌(Mycosphaerella arachidis)、青枯病菌(Ralstonia solanacearum); 豌豆之白粉病菌(Erysiphe pisi)、露菌病菌(Peronospora pisi)、蔓枯細菌病菌(Pseudomonas syringae pv.pisi)、蔓腐細菌病菌(Xhanthomonas campestris pv. pisi; 蠶豆之露菌病菌(Peronospora viciae)、疫病菌(Phytophthora nicotianae); 馬鈴薯之夏疫病菌(Alternaria solani)、黑痔病菌(Thanatephorus cucumeris)、疫病菌(Phytophthora infestans)、銀痂病菌(Helminthosporium solani)、乾腐病菌(Fusarium oxysporum、Fusarium solani)、粉狀瘡痂病菌(Spongospora subterranea)、青枯病菌(Ralstonia solanacearum)、黑腳病菌(Erwinia carotovora subsp. atroseptica)、瘡痂病菌(Streptomyces scabies、Streptomyces acidiscabies)、軟腐病菌(Erwinia carotovora subsp. carotovora)、黏性腐敗病菌(Crostridium spp.)、輪腐病菌(Clavibacter michiganensis subsp.sepedonicus); 甘薯之立枯病菌(Streptomyces ipomoeae); 甜菜之褐斑病菌(Cercospora beticola)、露菌病菌(Peronospora schachtii)、黑根病菌(Aphanomyces cochioides)、蛇眼病菌(Phoma betae)、根頭癌腫病菌(Agrobacterium tumefaciens)、瘡痂病菌(Streptomyces scabies)、斑點細菌病菌(Pseudomonas syringae pv. aptata); 紅蘿蔔之黑葉枯病菌(Alternaria dauci)、瘤病菌(Rhizobacter dauci)、根頭癌腫病菌(Agrobacterium tumefaciens)、鏈黴菌瘡痂病菌(Streptomyces spp.)、軟腐病菌(Erwinia carotovora subsp. carotovora); 草莓之白粉病菌(Sphaerotheca aphanis var. aphanis)、疫病菌(Phytophthora nicotianae等)、碳疽病菌(Glomerella cingulata等)、果實腐敗病菌(Pythium ultimum)、青枯病菌(Ralstonia solanacearum)、角斑細菌病菌(Xhanthomonas campestris)、芽枯細菌病菌(Pseudomonas marginalis pv. marginalis); 茶之網餅病菌(Exobasidium reticulatum)、白星病菌(Elsinoe leucospila)、碳疽病菌(Colletotrichum theae-sinensis)、輪斑病菌(Pestalotiopsis longiseta)、紅燒病菌(Pseudomonas syringae pv.theae)、潰瘍病菌(Xhanthomonas campestris pv. theicola)、天狗巢病菌(Pseudomonas sp.); 菸草之紅星病菌(Alternaria alternata)、白粉病菌(Erysiphe cichoracearum)、碳疽病菌(Colletotrichum gloeosporioides)、疫病菌(Phytophthora nicotianae)、野火病菌(Pseudomonas syringae pv.tabaci)、黃暈細菌病菌(Pseudomonas syringae pv.mellea)、空洞病菌(Erwinia carotovora subsp. carotovora)、立枯病菌(Ralstonia solanacearum)、菸草鑲嵌病毒(Tobaco mosaic virus); 咖啡之銹病菌(Hemileia vastatrix); 香蕉之黑斑病菌(Mycosphaerella fijiensis)、萎凋病菌(Fusarium oxysporum f.sp cubense); 棉之立枯病菌(Fusarium oxysporum)、白黴病菌(Ramularia areola); 向日葵之菌核病菌(Sclerotinia sclerotiorum)、角點病菌(Xhanthomonas campestris pv.malvacearum)、空洞病菌Erwinia carotovora subsp. carotovora)、斑點細菌病菌(Pseudomonas syringae pv.helianthi); 玫瑰之黑星病菌(Diplocarpon rosae)、白粉病菌(Sphaerotheca pannosa等)、疫病菌(Phytophthora megasperma)、露菌病菌(Peronospora sparsa)、根頭癌腫病菌(Agrobacterium tumefaciens); 菊之褐斑病菌(Septoria obesa)、白銹病菌(Puccinia horiana)、疫病菌(Phytophthora cactorum)、斑點細菌病菌(Pseudomonas cichorii)、軟腐病菌(Erwinia carotovora subsp. carotovora)、根頭癌腫病菌(Agrobacterium tumefaciens)、毛根病菌(Agrobacterium rhizogenes)、綠化病菌(Phytoplasma aurantifolia); 草坪之葉腐病菌(Rhizoctonia solani)、錢斑病菌(Sclerotinia homoeocarpa)、Curvularia葉枯病菌(Curvularia sp.)、銹病菌(Puccinia zoysiae)、長蠕孢黴(Helminthosporium)葉枯病菌(Cochliobolus sp.)、雲形病菌(Rhynchosporium secalis)、立枯病菌(Gaeumannomyces graminis)、碳疽病菌(Colletotrichum sp.)、雪腐褐色小粒菌核病菌(Typhula incarnata)、雪腐黑色小粒菌核病菌(Typhula ishikariensis)、雪腐大粒菌核病菌(Myriosclerotinia borealis)、仙女環(fairy ring)病菌(Marasmius oreades等)、腐黴枯萎病菌(Pythium aphanidermatum等)、稻熱病菌(Pyricularia grisea)等。Pathogens, such as: Magnaporthe grisea, Thanatephorus cucumeris, Ceratobasidium setariae, Waitea circinata, Thanatephorus cucumeris ), Sclerotium hydrophilum, Wairea circinata, Entyloma dactylidis, Magnaporthe salvinii, Ceratobasidium cornigerum, Sesame leaf withered Cochliobolus miyabeanus, Sphaerulina oryzina, Gibberella fujikuroi, Pythium spp., Fusarium spp., Trichoderma spp., Rhizopus spp., Solizorconia ), Pythium spp., Achlya spp., Dictyuchus spp.), Claviceps virens, Tilletia barclayana, Curvularia spp., Alternaria spp., Yellowing Sclerophthora macrospora, Xanthomonas oryzae pv. Oryzae, Acidovorax avenae subsp. avenae), Erwinia ananas, Burkholderia plantarii, Burkholderia glumae, Pseudomonas fuscovaginae, Pseudomonas syringae pv.oryzae), Erwinia chrysanthemi, Phytoplasma oryzae, Rice stripe tenuivirus, Rice dwarf reovirus; Blumeria graminis f. sp. Hordei; f.sp.tritici), Puccinia striiformis, Puccinia graminis, Puccinia recondita, Puccinia hordei, Pyrenophora graminea, Pyrenophora teres, Gibberella zeae, Fusarium culmorum, Fusarium avenaceum, Monographella nivalis), snow rot fungus (Typhula incarnata, Typhula ishikariensis, Monographella nivalis), naked smut (Ustilago nuda), smut black fungus (Tilletia caries, Tilletia controversa), sclerotinia cereus herpes (orse) ), Ceratobasidium gramineum, Rhynchosporium secalis, Septoria tritici, Phaeosphaeria nodorum, Fusarium spp., Pythium spp., Rhizoctonia spp., Septoria spp., Pyrenophora spp. Gaeumannomyces graminis, Colletotrichum graminicola, Claviceps purpurea, Cochliobolus sativus, Pseudomonas syringae pv. Syringae, Gibberella zeae, etc. ), Fusarium avenaceum, Penicillium spp, Pythium spp., Rhizoctonia spp.), Puccinia sorghi, Cochliobolus heterostrophus, Ustilago maydis, and anthracnose Colletotrichum graminicola), Cochliobolus carbonum, Acidovorax avenae subsp.avenae, Burkholderia andropogonis, Erwinia chrysanthemi pv. Zeae, Erwinia stewara ; Grape Plasmopara viticola, rust fungus (Physo pella ampelopsidis), Uncinula necator, Elsinoe ampelina, Glomerella cingulata, Colletotrichum acutatum, Guignardia bidwellii, Phomopsis viticola, Brown spot disease Zygophiala jamaicensis), Botrytis cinerea, Diaporthe medusaea, Helicobasidium mompa, Rosellinia necatrix, Agrobacterium vitis; Root cancer Pathogens (Podosphaera leucotricha), Venturia inaequalis, Alternaria mali, Gymnosporangium yamadae, Monilinia mali, Rot fungus (Valsa ceratosperma), Botryiana ), Colletotrichum acutatum, Glomerella cingulata, Zygophiala jamaicensis, Gloeodes pomigena, Mycosphaerella pomi, Helicobasidium mompa (Rosellinia necatrix), Phomopsis mal i, Diaporthe tanakae), Diplocarpon mali, Erwinia amylovora, Agrobacterium tumefaciens, Agrobacterium rhizogenes; Alternaria kikuchiana, Black Venturia nashicola, Gymnosporangium asiaticum, Botryosphaeria berengeriana f.sp. piricola, Phomopsis fukushii, Erwinia sp., Root nodule Agrobacterium tumefaciens), Erwinia chrysanthemi pv. Chrysanthemi, Pseudomonas syringae pv. Syringae; Phytophthora cactorum, Phytophthora syringae, Phytophthora sp. ); Cladosporium carpophilum, Phomopsis sp., Phytophthora sp., Colletotrichum gloeosporioides, Taphrina deformans, perforation Xhanthomonas campestris pv. Pruni, Agrobacterium tu mefaciens); Cherry anthracnose (Glomerella cingulata), young fruit sclerotinia (Monilinia kusanoi), gray star disease (Monilinia fructicola), root head cancer (Agrobacterium tumefaciens), resinous bacteria (Pseudomonas syringae pv. syringae) ; Glomerella cingulata, Cercospora kaki, Mycosphaerella nawae, Phyllactinia kakikora, Agrobacterium tumefaciens, Diaporthe citri (Penicillium digitatum), Penicillium italicum, Elsinoe fawcettii, Phytophthora citrophthora, Xhanthomonas campestris pv. Citri, Pseudomonas syringae pv. Pathogens (Liberibactor asiaticus), Agrobacterium tumefaciens; Tomato, cucumber, legume, strawberry, potato, cabbage, eggplant, lettuce and other gray mold (Botrytis cinerea); tomato, cucumber, legume, strawberry, potato , Rapeseed, Sclerotinia sclerotiorum, cabbage, eggplant, lettuce, etc .; tomato, cucumber, beans, turnip, watermelon, eggplant, rapeseed, sweet pepper, spinach, beet and other vegetables, Rhizoctonia spp. , Pythium spp., Fusarium spp., Phythophthora spp., Sclerotinia sclerotiorum, etc.); Rapeseed, fungus (Ralstonia solanacearum); Pseudoperonospora cubensis (SphaeroCollele tricigi) orbiculare), Didymella bryoniae, Fusarium oxysporum, Phytophthora parasitica, Phytophthora melonis, Phytophthora nicotianae, Phytophthora drechsleri, Phytophthora capsici bacteria, etc. , Erwinia carotovora subsp. Carotovora, Pseudomonas syringae pv. Lachrymans, Pseudomonas marginalis pv. Marginalis, Streptomyces sp., Agrobacterium rhizogenes Leaf virus (Cucumber mosaic virus); Alternaria solani, Fulvia fulva, Phytophthora infestans, Fusarium oxysporum, Pythium myriotylum, Pythium dissotocum Colletotrichum gloeosporioides, Clavibacter michiganensis, Pseudomonas corrugata, Pseudomonas viridiflava, Erwinia carotovora subsp. Carotovora, Cryne .), Phytoplasma asteris, Tabaco leaf curl subgroup III geminivirus; Sphaerotheca fuliginea, etc .; Mycovellosiella nattrassii, Phytophthora infestans, brown Phytophthora capsici, Pseudomonas cichorii, Pseudomonas corrugata, Erwinia chrysanthemi, Erwinia carotovora subsp. Carotovora, Pseudomonas spse . ); Alternaria brassicae, Xhanthomonas campestris pv. Campestris, Pseudomonas syringae pv. Maculicola, Erwinia carotovora, cruciferous vegetables Pathogens (Alternaria brassicae, etc.), Cercosporella brassicae, Phoma lingam, Plasmodiophora brassicae, Peronospora parasitica, Black rot (Xhanthomonas campestris pv. Campestris), Black spot Bacterial bacteria (Pseudomonas syringae pv. Maculicola), soft rot (Erwinia carotovora subsp. Carotovora); cabbage rot (Thanatephorus cucumeris), Fusarium oxysporum (Farsarium oxysporum), Alternaria brassisicola; Rhizoctonia solani, Verticillium dahliae; Puccinia allii, Alternaria porri, Sclerotium rolfsii, Phytophthora porri, Black rot Sclerotium cepivorum; onion ulcer (C urtobacterium flaccumfaciens), Erwinia carotovora subsp. carotovora, Pseudomonas syringae pv. syringae, Erwinia rhapontici, Burkholderia gladioli, Phytoplasma Erwinia carotovora subsp. Carotovora, Pseudomonas marginalis pv.marginalis; Cercospora kikuchii, Elsinoe glycines, Diaporthe phaseolorum, and Rhizoctonia solani Rhizoctonia solani, Phytophthora sojae, Peronospora manshurica, Phakopsora pachyrhizi, Colletotrichum truncatum, etc., Xhanthomonas campestris pv. ), Pseudomonas syringae pv. Glycinea; Colletotrichum lindemuthianum, Ralstonia solanacearum, Pseudomonas syringae pv. Phaseolicola, Pseifimonmonas viridis ,leaf Xhanthomonas campestris pv. Phaseoli; Mycosphaerella berkeleyi, Mycosphaerella arachidis, Ralstonia solanacearum; Erysiphe pisi, Peronospora ), Pseudomonas syringae pv.pisi, Xhanthomonas campestris pv. Pisi; Peronospora viciae, Phytophthora nicotianae; Phytophthora nicotianae; Alternaria solani ), Thanatephorus cucumeris, Phytophthora infestans, Helminthosporium solani, Fusarium oxysporum, Fusarium solani, Spongospora subterranea Ralstonia solanacearum), Erwinia carotovora subsp. atroseptica, Streptomyces scabies, Streptomyces acidiscabies, Erwinia carotovora subsp. carotovora, Crostridium spp. subsp .sepedonicus); Streptomyces ipomoeae; Cercospora beticola, Peronospora schachtii, Aphanomyces cochioides, Phoma betae, roots Agrobacterium tumefaciens, Streptomyces scabies, Pseudomonas syringae pv. Aptata; Alternaria dauci, Rhizobacter dauci, Agrobacterium tumefaciens), Streptomyces spp., Erwinia carotovora subsp. carotovora; Sphaerotheca aphanis var. aphanis, Phytophthora nicotianae, etc. ), Pythium ultimum, Ralstonia solanacearum, Xhanthomonas campestris, Pseudomonas marginalis pv. Marginalis; Exobasidium reticulatum, White Star Germs (Elsinoe leucospila), Anthrax (Colletotrichum theae-sinensis), Pestalotiopsis longiseta, Pseudomonas syringae pv. Theae, Xhanthomonas campestris pv. Theicola, Pseudomonas sp .; Alternaria nicotianae alternata), Erysiphe cichoracearum, Colletotrichum gloeosporioides, Phytophthora nicotianae, Pseudomonas syringae pv. tabaci, Pseudomonas syringae pv. Erwinia carotovora subsp. Carotovora), Ralstonia solanacearum, Tobacco mosaic virus, Hemileia vastatrix, Mycosphaerella fijiensis, Fusarium oxysporum f. sp cubense); Fusarium oxysporum, Ramularia areola; Sclerotinia sclerotiorum, Xhanthomonas campestris pv.malvacearum, Erwinia carotovora subsp. carotovora subsp. carotovora subsp. ),spot Bacterial bacteria (Pseudomonas syringae pv.helianthi); Diplocarpon rosae, Sphaerotheca pannosa, etc., Phytophthora megasperma, Peronospora sparsa, Agrobacterium tumefaciens ); Septoria obesa, Puccinia horiana, Phytophthora cactorum, Pseudomonas cichorii, Erwinia carotovora subsp. Carotovora, root cancer Agrobacterium tumefaciens), Agrobacterium rhizogenes, Phytoplasma aurantifolia; Rhizoctonia solani, Sclerotinia homoeocarpa, Curvularia sp., Puccinia spp. zoysiae), Helminthosporium, Cochliobolus sp., Rhynchosporium secalis, Gaeumannomyces graminis, Colletotrichum sp. (Typhula incarnata), snow rot black small sclerotia Bacteria (Typhula ishikariensis), Snow rot Sclerotinia sclerotinia (Myriosclerotinia borealis), Fairy ring (Marasmius oreades, etc.), Pythium aphanidermatum (Pythium aphanidermatum, etc.), Pyricularia grisea, etc.

又,害蟲,例如:茶捲葉蛾(Adoxophyes honmai)、蘋果小捲葉蛾(Adoxophyes orana faciata)、蘋果黃捲蛾(Archips breviplicanus)、蘋果小食心蟲(Grapholita inopinata)、亂紋蘋果捲葉蛾(Archips fuscocupreanus)、梨小食心蟲(Grapholita molesta)、茶長捲葉蛾(Choristoneura magnanima)、大豆食心蟲(Leguminivora glycinivorella)、桑姬捲葉蛾(Olethreutes mori)、蘋果茶細蛾(Caloptilia zachrysa)、蘋果姬食心蟲(Argyresthia conjugella)、梨細蛾(Spulerrina astaurota)、豆小捲蛾(Matsumuraeses phaseoli)、蘋果褐捲蛾(Pandemis heparana)、Bucculatrix pyrivorella(Bucculatrix pyrivorella)、桃潛葉蛾(Lyonetia clerkella)、桃蛀果蛾(Carposina niponensis)、銀紋潛葉蛾(Lyonetia prunifoliella malinella)、茶細蛾(Caloptilia theivora)、金蚊細蛾(Phyllonorycter ringoniella)、柑橘潛葉蛾(Phyllocnistis citrella)、蔥菜蛾(Acrolepiopsis sapporensis)、鈴木偽菜蛾(Acrolepiopsis suzukiella)、小菜蛾(Plutella xylostella)、柿果蒂蛾(Stathmopoda masinissa)、Helcystogramma triannulella(Helcystogramma triannulella)、紅鈴蟲(Pectinophora gossypiella)、桃蛀果蛾(Carposina sasakii)、二化螟(Chilo suppressalis)、瘤野螟(Cnaphalocrocis medinalis)、褐斑螟(Ephestiaelutella)、桃蛀野螟(Conogethes punctiferalis)、瓜絹野螟蛾(Diaphania indica)、白緣螟蛾(Etiella zinckenella)、桑絹野螟(Glyphodes pyloalis)、水稻一點大螟(Scirpophaga incertulas)、菜心螟(Hellula undalis)、亞洲玉米螟(Ostrinia furnacalis)、歐洲玉米螟(Ostrinia scapulalis)、禾擬莖草螟(Parapediasia teterrella)、單帶弄蝶(Parnara guttata)、大白粉蝶(Pieris brassicae)、日本紋白蝶(Pieris rapae crucivora)、柑桔鳳蝶(Papilio xuthus)、瘤尺蠖蛾(Ascotis selenaria)、大豆尺蠖(Pseudoplusia includens)、茶毒蛾(Euproctis pseudoconspersa)、舞毒蛾(Lymantria dispar)、旋古毒蛾(Orgyia thyellina)、美國白蛾(Hyphantria cunea)、奇特望燈蛾(Lemyra imparilis)、枯葉夜蛾(Adris tyrannus)、白斑煩夜蛾(Aedia leucomelas)、球菜夜蛾(Agrotis ipsilon)、蕪菁夜蛾(Agrotis segetum)、甘藍銀紋夜蛾(Autographa nigrisigna)、銀紋夜蛾(Ctenoplusia agnata)、蘋果蠹蛾(Cydla pomonella)、棉鈴實夜蛾(Helicoverpa armigera)、煙實夜蛾(Helicoverpa assulta)、玉米穗蟲(Helicoverpa zea)、煙芽夜蛾(Heliothis virescens)、歐洲玉米螟(Ostrinia nubilalis)、甘藍夜蛾(Mamestra brassicae)、分秘夜蛾(Mythimna separata)、稻紫螟(Sesamia inferens)、紅帶黃夜蛾(Naranga aenescens)、南部灰翅夜蛾(Spodoptera eridania)、甜菜夜蛾(Spodoptera exigua)、草地夜蛾(Spodoptera frugiperda)、海灰翅夜蛾(Spodoptera littoralis)、斜紋夜蛾(Spodoptera litura)、淡劍灰翅夜蛾(Spodoptera depravata)、擬尺蠖(Trichoplusia ni)、葡萄果實蛀蟲(Endopiza viteana)、番茄天蛾(Manduca quinquemaculata)、菸草天蛾(Manduca sexta)等鱗翅目昆蟲、 葡萄浮塵子(Arboridia apicalis)、黃綠二室葉蟬(Balclutha saltuella)、二點大葉蟬(Epiacanthus stramineus)、Empoasca fabae(Empoasca fabae)、小綠葉蟬(Empoasca nipponica)、茶綠姬浮塵子(Empoasca onukii)、豆小綠葉蟬(Empoasca sakaii)、Macrosteles striifrons(Macrosteles striifrons)、黑尾浮塵子(Nephotettix cinctinceps)、Psuedatomoscelis seriatus(Psuedatomoscelis seriatus)、斑飛蝨(Laodelphax striatella)、稻褐飛蝨(Nilaparvata lugens)、稻白背飛蝨(Sogatella furcifera)、柑桔木蝨(Diaphorina citri)、梨木蝨(Psylla pyrisuga)、刺粉蝨(Aleurocanthus spiniferus)、銀葉粉蝨(Bemisia argentifolii)、菸草粉蝨(Bemisia tabaci)、柑桔刺粉蝨(Dialeurodes citri)、溫室粉蝨(Trialeurodes vaporariorum)、厚皮香穴粉蝨(Aleurolobus taonabae)、葡萄根瘤蚜(Viteus vitifolii)、偽菜蚜(Lipaphis erysimi)、棉蚜(Aphis gossypii)、捲葉蚜(Aphis spiraecola)、桃蚜(Myzus persicae)、小桔蚜(Toxoptera aurantii)、日本履綿蚧(Drosicha corpulenta)、吹綿蚧(Icerya purchasi)、石蒜綿粉介殼蟲(Phenacoccus solani)、柑桔綿介殼蟲(Pulvinaria aurantii)、柑桔粉介殼蟲(Planococcus citri)、網背盾介殼蟲(Pseudaonidia duplex)、日本粉蚧(Planococcus kuraunhiae)、康氏粉介殼蟲(Pseudococcus comstocki)、梨圓介殼蟲(Comstockaspis perniciosa)、角蠟介殼蟲(Ceroplastes ceriferus)、紅蠟介殼蟲(Ceroplastes rubens)、柑紅臀圓盾介殼蟲(Aonidiella aurantii)、茶圍盾介殼蟲(Fiorinia theae)、茶圓介殼蟲(Pseudaonidia paeoniae)、桑擬白輪盾介殼蟲(Pseudaulacaspis pentagona)、桑擬輪盾介殼蟲(Pseudaulacaspis prunicola)、衛矛矢尖盾蚧(Unaspis euonymi)、箭頭介殼蟲(Unaspis yanonensis)、溫帶臭蟲(Cimex lectularius)、Dolycoris baccarum(Dolycoris baccarum)、菜樁象(Eurydema rugosum)、廣二星椿(Eysarcoris aeneus)、大刺白星樁象(Eysarcoris lewisi)、白星樁象(Eysarcoris ventralis)、艷青樁象(Glaucias subpunctatus)、褐翅椿(Halyomorpha halys)、綠樁象(Nezara antennata)、南方綠樁象(Nezara viridula)、一字樁象(Piezodorus hybneri)、褐翅綠椿象(Plautia crossota)、稻黑樁象(Scotinophora lurida)、細針綠樁象(Cletus punctiger)、中國蛛緣樁象(Leptocorisa chinensis)、點蜂緣樁象(Riptortus clavatus)、黄伊緣蝽(Rhopalus msculatus)、小翅樁象(Cavelerius saccharivorus)、葫蘆小翅長樁象(Togo hemipterus)、赤星樁象(Dysdercus cingulatus)、杜鵑軍配蟲(Stephanitis pyrioides)、日本跳盲蝽(Halticus insularis)、草盲蝽(Lygus lineolaris)、Stenodema sibiricum(Stenodema sibiricum)、赤條透翅盲樁象(Stenotus rubrovittatus)、Trigonotylus caelestialium(Trigonotylus caelestialium)等樁象目昆蟲、 金銅金龜(Anomala cuprea)、姬金龜(Anomala rufocuprea)、小青花金龜(Gametis jucunda)、茶色長青龜(Heptophylla picea)、日本豆金龜(Popillia japonica)、馬鈴薯甲蟲(Lepinotarsa decemlineata)、菜豆瓢蟲(Epilachna varivestis)、褐紋金針蟲(Melanotus fortnumi)、甘蔗櫛叩頭蟲(Melanotus tamsuyensis)、菸甲蟲(Lasioderma serricorne)、褐粉蠹(Lyctusbrunneus)、松小蠹蟲(Tomicus piniperda)、穀蠹(Rhizopertha dominica)、Epuraea domina(Epuraea domina)、菜豆瓢蟲(Epilachna varivestis)、二十八星瓢蟲(Epilachna vigintioctopunctata)、茶色偽步行蟲(Tenebrio molitor)、(赤)擬穀盜(Tribolium castaneum)、白斑星天牛(Anoplophora malasiaca)、松斑天牛(Monochamus alternatus)、黃星天牛(Psacothea hilaris)、葡萄虎斑天牛(Xylotrechus pyrrhoderus)、綠豆象(Callosobruchus chinensis)、黃守瓜(Aulacophora femoralis)、負泥蟲(Oulema oryzae)、甜菜跳甲蟲(Chaetocnema concinna)、十一星瓜葉甲(Diabrotica undecimpunctata)、玉米根螢葉甲(Diabrotica virgifera)、巴氏根螢葉甲(Diabrotica barberi)、黃條葉蚤(Phyllotreta striolata)、番茄葉蚤(Psylliodes angusticollis)、桃短截象蟲(Rhynchites heros)、甘薯蟻象(Cylas formicarius)、棉鈴象鼻蟲(Anthonomus grandis)、稻象鼻蟲(Echinocnemus squameus)、甘藷象鼻蟲(Euscepes postfasciatus)、苜蓿象鼻蟲(Hypera postica)、水稻水象鼻蟲(Lissorhoptrus oryzophilus)、Otiorhynchus sulcatu(Otiorhynchus sulcatus)、穀象(Sitophilus granarius)、玉米象(Sitophilus zeamais)、Sphenophorus venatus vestitus(Sphenophorus venatus vestitus)、青翅蟻形隱翅蟲(Paederus fuscipes)等鞘翅目昆蟲、 臺灣花薊馬(Frankliniella intonsa)、淡色薊馬(Thrips flavus)、西方花薊馬(Frankliniella occidentalis)、變葉木薊馬(Heliothrips haemorrhoidalis)、小黃薊馬(Scirtothrips dorsalis)、南黃薊馬(Thrips palmi)、蔥薊馬(Thrips tabaci)、柿管薊馬(Ponticulothrips diospyrosi)等薊馬目昆蟲、 大豆莢癭蠅(Asphondylia yushimai)、Sitodiplosis mosellana(Sitodiplosis mosellana)、瓜實蠅(Bactrocera cucurbitae)、柑橘小實蠅(Bactrocera dorsalis)、地中海果實蠅(Ceratitis capitata)、稻小潛葉蠅(Hydrellia griseola)、鈴木氏果蠅(Drosophila suzukii)、稻葉潛蠅(Agromyza oryzae)、韭潛蠅(Chromatomyia horticola)、番茄斑潛蠅(Liriomyza bryoniae)、蔥潛蠅(Liriomyza chinensis)、蔬菜斑潛蠅(Liriomyza sativae)、非洲菊斑潛蠅(Liriomyza trifolii)、種蠅(Delia platura)、洋蔥蠅(Delia antique)、甜菜潛蠅(Pegomya cunicularia)、蘋果果實蠅(Rhagoletis pomonella)、黑森癭蚊(Mayetiola destructor)、家蠅(Musca domestica)、黑邊家蠅(Musca hervei)、北栖家蠅(Musca bezzii)、廄刺蠅(Stomoxys calcitrans)、東方臂蠅(Haematobia irritans)、羊毛虱蠅(Melophagus ovinus)、牛蠅(Hypoderma bovis)、美國牛蠅(Hypoderma lineatum)、羊狂蠅(Oestrus ovis)、采采蠅(Glossina palpalis,Glossina morsitans)、Prosimulium yezoensis(Prosimulium yezoensis)、Simulium iwatens(Simulium iwatens)、Tabanus trigonus(Tabanus trigonus)、白斑大蝶蠅(Telmatoscopus albipunctatus)、Leptoconops nipponensis(Leptoconops nipponensis)、嗜牛庫蠓(Culicoides oxystoma)、Anopheles hyracanus sinesis (Anopheles hyracanus sinesis)、甘比亞瘧蚊(Anopheles gambiae)、阿拉伯按蚊(Anopheles arabiensis)、不吉按蚊(Anopheles funestus)、密拉斯虐蚊(Anopheles melas)、矮小虐蚊(Anopheles minimus)、大劣按蚊(Anopheles dirus)、史帝芬塞虐蚊(Anopheles stephensi)、淡色按蚊(Anopheles albimanus)、赤家蚊(Culex pipiens pallens)、地下家蚊(Culex pipiens molestus)、致倦庫蚊(Culex quinquefasciatus)、Culex restuans(Culex restuans)、煤斑蚊(Culex tarsalis)、凶小家蚊(Culex modestus)、三帶喙庫蚊(Culex tritaeniorhynchus)、埃及伊蚊(Aedes aegypti)、白紋伊蚊(Aedes albopicutus)、日本伊蚊(Aedes japonicus)、白肋斑蚊(Aedes vexans)等雙翅目昆蟲、 Apethymus kuri(Apethymus kuri)、Athalia rosae(Athalia rosae)、玫瑰三節葉蜂(Arge pagana)、歐洲新松葉蜂(Neodiprion sertifer)、板栗癭蜂(Dryocosmus kuriphilus)、鬼針遊蟻(Eciton burchelli,Eciton schmitti)、日本弓背蟻(Camponotus japonicus)、大胡蜂(Vespa mandarina)、澳洲螞蟻(Myrmecia spp.)、火家蟻類(Solenopsis spp.)、小黃家蟻(Monomorium pharaonis)等膜翅目昆蟲、 黃臉油葫蘆(Teleogryllus emma)、螻蛄(Gryllotalpa orientalis)、菲律賓飛蝗(Locusta migratoria)、小翅稻蝗(Oxya yezoensis)、沙漠蝗蟲(Schistocerca gregaria)等直翅目昆蟲、 菜白棘跳蟲(Onychiurus folsomi)、西伯利亞棘跳蟲(Onychiurus sibiricus)、圓鉤圓跳蟲(Bourletiella hortensis)等彈尾目昆蟲、 黑蜚蠊(Periplaneta fuliginosa)、大和蜚蠊(Periplaneta japonica)、德國姬蠊(Blattella germanica)、美洲家蠊(Periplaneta Americana)等蜚蠊目昆蟲、 家白蟻(Coptotermes formosanus)、大和白蟻(Reticulitermes speratus)、臺灣白蟻(Odontotermes formosanus)等白蟻目昆蟲、 貓蚤(Ctenocephalidae felis)、狗蚤(Ctenocephalides canis)、雞蚤(Echidnophaga gallinacea)、人蚤(Pulex irritans)、鼠蚤(Xenopsylla cheopis)等蚤目昆蟲、 大雞虱(Menacanthus stramineus)、牛毛虱(Bovicola bovis)等羽虱目昆蟲、 牛血虱(Haematopinus eurysternus)、豬血虱(Haematopinus suis)、長鼻牛虱(Linognathus vituli)、小短鼻牛虱(Solenopotes capillatus)、綿羊體虱(Damalinia ovis)等虱目昆蟲、 白跗線蟎(Phytonemus pallidus)、茶細蟎(Polyphagotarsonemus latus)、双叶跗線蟎(Tarsonemus bilobatus)等塵蟎類、 白菜葉爪蟎(Penthaleus erythrocephalus)、麥蟎(Penthaleus major)等真足蟎類、 稻葉蟎(Oligonychus shinkajii)、柑橘葉蟎(Panonychus citri)、Panonychus mori(Panonychus mori)、蘋果葉蟎(Panonychus ulmi)、神澤葉蟎(Tetranychus kanzawai)、二點葉蟎(Tetranychus urticae)等葉蟎類、 茶尖葉節蜱(Acaphylla theavagrans)、鬱金香銹蜱(Aceria tulipae)、番茄刺皮癭蟎(Aculops lycopersici)、柑桔銹蜱(Aculops pelekassi)、蘋果銹蜱(Aculus schlechtendali)、偽梨銹蜱(Eriophyes chibaensis)、柑桔皺葉刺節蜱(Phyllocoptruta oleivora)等節蜱類、 羅賓根蟎(Rhizoglyphus robini)、長毛根蟎(Tyrophagus putrescentiae)、Tyrophagus similis(Tyrophagus similis)等粉蟎類、 塵蟎(Dermatophagoides pteronyssinus)、美洲室塵蟎(Dermatophagoides farinae)等恙蟎類、 Varroa jacobsoni(Varroa jacobsoni)等蜂蟎類、 澳洲牛蜱(Boophilus microplus)、血紅扇頭蜱(Rhipicephalus sanguineus)、長角血蜱(Haemaphysalis longicornis)、褐黃血蜱(Haemaphysalis flava)、何氏血蜱(Haemaphysalis campanulata)、日本血蜱(Haemaphysalis japonica)、Haemaphysalis megaspinosa(Haemaphysalis megaspinosa)、卵形硬蜱(Ixodes ovatus)、全溝硬蜱(Ixodes persulcatus)、日本硬蜱(Ixodes nipponensis)、Ixodes pacifcus(Ixodes pacifcus)、篦子硬蜱(Ixodes ricinus)、肩板硬蜱(Ixodes scapularis)、美洲大壁蝨(Amblyomma americanum)、斑點鈍眼蜱(Amblyomma maculatum)、花蜱(Amblyomma spp.)、網紋革蜱(Dermacentor recticulatus)、臺灣革蜱(Dermacentor taiwanesis)、安氏革蜱(Dermacentor andersoni)、西海岸革蜱(Dermacentor occidentalis)、變異革蜱(Dermacentor variabilis)、革蜱屬(Dermacentor spp.)等真蜱類、 雅氏姬螯蟎(Cheyletiella yasguri)、布氏姬螯蟎(Cheyletiella blakei)等爪蟎類、 犬疥癬蟲(Demodex canis)、貓蠕形蟎(Demodex cati)等毛囊蠕形蟎類、 羊癢蟎(Psoroptes ovis)等癢蟎類、 人疥蟎(Sarcoptes scabiei)、貓疥蟎(Notoedres cati)、雞疥蟎(Knemidocoptes spp.)等疥蟎類、 普通球潮蟲(Armadillidium vulgare)等甲殻類、 福壽螺(Pomacea canaliculata)、非洲大蝸牛(Achatina fulica)、雙線蛞蝓(Meghimatium bilineatum)、黄蛞蝓(Limax Valentiana)、扁蝸牛(Acusta despecta sieboldiana)、日本陸地蝸牛(Euhadra peliomphala)等腹足類、 咖啡短體線蟲(Prathylenchus coffeae)、穿刺短體線蟲(Prathylenchus penetrans)、核桃傷根線蟲(Prathylenchus vulnus)、黃金線蟲(Globodera rostochiensis)、大豆包囊線蟲(Heterodera glycines)、北方根瘤線蟲(Meloidogyne hapla)、南方根瘤線蟲(Meloidogyne incognita)、台灣葉芽線蟲(Aphelenchoides besseyi)、松材線蟲(Bursaphelenchus xylophilus)等線蟲類、 紅痢阿米巴蟲等阿米巴原蟲類(Rhizopoda)、利什曼原蟲、滴蟲等鞭毛蟲類(Mastigophora)、虐疾原蟲、弓漿蟲等胞子蟲類(Sporozoea)、大腸纖毛蟲等纖毛蟲類(Ciliophora)等原蟲類、 蛔蟲、鉤蟲等線蟲類(Nematoda)、大鉤頭蟲等鉤頭蟲類(Acannthocephala)、針金蟲等線形動物類(Nematomorpha)、肝吸蟲等吸蟲類(Trematoda)、無鉤絛蟲等絛蟲類(Cestoda)等蠕蟲類、 蛔蟲(Ascaris)、犬蛔蟲(Toxocara)、犬小蛔蟲(Toxascaris)、馬蛔蟲(Parascaris)、鶏蛔蟲(Ascaridia)、雞盲腸蟲(Heterakis)、蟯蟲(Oxyuris)、毛細線蟲(Capillaria)、旋毛蟲(Trichinella)、圓蟲(Strongylus、Triodontophorus)、毛線蟲(Trichonema)、豚腎蟲(Stephanurus)、腸結節蟲(Desophagostomum)、大口腸線蟲(Chabertia)、開嘴蟲(Syngamus)、鉤蟲(Ancylostoma、Uncinaria、Necator、Bunostomum)、毛樣線蟲(Trichostrongylus)、古柏毛樣線蟲(Cooperia)、細類毛樣線蟲(Nematodirus)、扭転胃線蟲(Haemonchus)、奧斯特胃蟲(Ostertagia)、肺蟲(Dictyocaulus、Metastrongylus)、犬絲絛蟲(Dirofilaria)、多乳頭絲絛蟲(Parafilaria)、馬絲絛蟲(Setaria)、蟠尾絲蟲(Onchocerca)、胃蟲(Habronema、Arduenna、Acuaria)等線蟲類、 裂頭絛蟲(Diphyllobothrium)、葉狀絛蟲屬(Anoplocephara)、蒙尼茨屬(Moniezia)、犬絛蟲(Dipylidium)、無鉤絛蟲及有鉤絛蟲(Taenia)、囊蟲(Dithyridium)、瑞立絳蟲屬(Raillietina)、包蟲(Echinococcus)等絛蟲類、 住血吸蟲(Schistosoma)、雙口吸蟲(Paramphistomum)、肝蛭(Fasciola)等吸蟲類等。In addition, pests such as: Adoxophyes honmai, Adoxophyes orana faciata, Apple chips breviplicanus, Grapholita inopinata, Apple chips fuscocupreanus, Pear small Grapholita molesta, Choristoneura magnanima, Leguminivora glycinivorella, Olethreutes mori, Caloptilia zachrysa, Argyresthia conjugella, Argyresthia conjugella Spulerrina astaurota), Matsumuraeses phaseoli, Pandemis heparana, Bucculatrix pyrivorella (Bucculatrix pyrivorella), Lyoniaia clerkella, Carposina niponensis Leaf Moth (Lyonetia prunifoliella malinella), Caloptilia theivora, Phyllonorycter ringoniella, Phyllocnistis citrella, Acrolepiopsis sapporensis, Acrolepiopsis suzukiella Plutella xylostella ), Stathmopoda masinissa, Helcystogramma triannulella (Helcystogramma triannulella), Pectinophora gossypiella, Carposina sasakii, Chilo suppressalis, Cnaphalocrocis medinalis , Ephestiaelutella, Conogethes punctiferalis, Diaphania indica, Etiella zinckenella, Glyphodes pyloalis Scirpophaga incertulas), Hellula undalis, Asian corn borer (Ostrinia furnacalis), European corn borer (Ostrinia scapulalis), Parapediasia teterrella, Parnara guttata, Great white butterfly Pieris brassicae, Pieris rapae crucivora, Papilio xuthus, Ascotis selenaria, Pseudoplusia includens, Euproctis pseudoconspersa, Lymantria dispar, Orgyia thyellina, Hyphantria cunea, Lemyra imparilis, Leafworm (Adris tyrannus), Aedia leucomelas, Agrotis ipsilon, Agrotis segetum, Cabbage silverworm (Autographa nigrisigna), Silverweed (Ctenoplusia) agnata), Apple moth (Cydla pomonella), Helicoverpa armigera, Helicoverpa assulta, Helicoverpa zea, Heliothis virescens, European corn borer (Heliothis virescens) Ostrinia nubilalis, Mamestra brassicae, Mythimna separata, Sesamia inferens, Naranga aenescens, Spodoptera eridania, Beet Spodoptera exigua, Spodoptera frugiperda, Spodoptera littoralis, Spodoptera litura, Spodoptera depravata, Trichoplusia ni , Lepidoptera insects such as Grape fruit tapeworm (Endopiza viteana), Tomato hawk moth (Manduca quinquemaculata), Tobacco hawk moth (Manduca sexta), Arboridia apicalis, yellow-green two-chamber Cicada (Balclutha saltuella), Two-pointed Leaf Clover (Epiacanthus stramineus), Empoasca fabae (Empoasca fabae), Empoasca nipponica, Empoasca onukii, Empoasca macros, sakaii (Macrosteles striifrons), Black-tailed Dust (Nephotettix cinctinceps), Psuedatomoscelis seriatus (Psuedatomoscelis seriatus), Laodelphax striatella, Nilaparvata lugens, Rice white-backed lice (Sogatella citrus) Diaphorina citri), Psylla pyrisuga, Aleurocanthus spiniferus, Bemisia argentifolii, Bemisia tabaci, Dialeurodes citri, Greenhouse whitefly Trialeurodes vaporariorum), Aleurolobus taonabae, Viteus vitifolii, Lipaphis erysimi, Cotton aphid (Aphis gossypii), Aphis spiraecola, Myzus persicae), Toxoptera aurantii, Drosicha corpulenta, Icerya purchasi , Lycoris aureus, Phenacoccus solani, Pulvinaria aurantii, Planococcus citri, Pseudaonidia duplex, Planococcus kuraunhiae, Pseudococcus comstocki, Comstockaspis perniciosa, Ceroplastes ceriferus, Ceroplastes rubens, Aonidiella aurantii, tea Fiorinia theae, Pseudaonidia paeoniae, Pseudaulacaspis pentagona, Pseudaulacaspis prunicola, Unaspis euonymi ), Arrow scale insect (Unaspis yanonensis), temperate bug (Cimex lectularius), Dolycoris baccarum (Dolycoris baccarum), vegetable pile elephant (Eurydema rugosum), Guang Erxing Chun (Eysarcoris aeneus), large spiny white star pile elephant (Eysarcoris lewisi) Eysarcoris ventralis, Glaucias subpunctatus, Halyomorpha halys, Nezara antennata, Southern Green Pole Elephant (Nezara viridula), Pinezodorus hybneri, Platynia crossota, Scotinophora lurida, Cletus punctiger, Chinese spider margin pile Elephant (Leptocorisa chinensis), Riptortus clavatus, Rhopalus msculatus, Cavererius saccharivorus, Togo hemipterus, Dysdercus cingulatus Stephanitis pyrioides, Halticus insularis, Lygus lineolaris, Stenodema sibiricum (Stenodema sibiricum), Stenotus rubrovittatus, Trigonotylus caelestialium (Trigonotyl) ) And other elephant insects, Anomala cuprea, Anomala rufocuprea, Gametis jucunda, Heptophylla picea, Popilia japonica, Lepinotarsa decemlineata), Epilachna varivestis, Melanotus fortnumi, sugarcane beetle (Melanotus tamsuyensis), Tobacco beetle (Lasioderma serricorne), Brown mealworm (Lyctusbrunneus), Pine beetle (Tomicus piniperda), Rhizopertha dominica, Epuraea domina (Epuraea domina), Ladybug (Epilachna varives) Epilachna vigintioctopunctata, Tenebrio molitor, Tribolium castaneum, Anoplophora malasiaca, Monochamus alternatus, Yellow star beetle (Psacothea hilaris), grape tiger spotted beetle (Xylotrechus pyrrhoderus), mung bean elephant (Callosobruchus chinensis), yellow guard melon (Aulacophora femoralis), negative mudworm (Oulema oryzae), beet jumping beetle (Chaetocnema concinna), eleven star melon leaves Diabrotica undecimpunctata, Diabrotica virgifera, Diabrotica barberi, Phyllotreta striolata, Tomato leaf fleas (Psylliodes angusticollis) Rhynchites heros), sweet potato ant elephant (Cylas formicarius), cotton boll weevil (Anthonomus grandis), rice weevil (Echinocnemus sq uameus), sweet potato weevil (Euscepes postfasciatus), alfalfa weevil (Hypera postica), rice water weevil (Lissorhoptrus oryzophilus), Otiorhynchus sulcatu (Otiorhynchus sulcatus), corn elephant (Sitophilus granarius), corn elephant (Sitophilus granarius) ), Sphenophorus venatus vestitus (Sphenophorus venatus vestitus), Coleoptera, such as Paederus fuscipes, Taiwan flower thrips (Frankliniella intonsa), light-color thrips (Thrips flavus), western flower thrips (Frankliniella) occidentalis, Heliothrips haemorrhoidalis, Scirtothrips dorsalis, Thrips palmi, Thrips tabaci, Ponticulothrips diospyrosi and other thrips Insects, Asphondylia yushimai, Sitodiplosis mosellana (Sitodiplosis mosellana), Bactrocera cucurbitae, Bactrocera dorsalis, Ceratitis capitata, Hydrellia griseola), Drosophila suzukii, Agromyza oryzae Chromatomyia horticola, Liriomyza bryoniae, Liriomyza chinensis, Liriomyza sativae, Liriomyza trifolii, Delia platura , Onion fly (Delia antique), Beet leaf fly (Pegomya cunicularia), Apple fruit fly (Rhagoletis pomonella), Mayetiola destructor, Musca domestica, Musca domestica, Musca hervei, Northern Musca bezzii, Stomoxys calcitrans, Haematobia irritans, wool lice fly (Melophagus ovinus), cattle fly (Hypoderma bovis), American cattle fly (Hypoderma lineatum), sheep fly (Oestrus ovis), Tsetse flies (Glossina palpalis, Glossina morsitans), Prosimulium yezoensis (Prosimulium yezoensis), Simulium iwatens (Simulium iwatens), Tabanus trigonus (Tabanus trigonus), White-spotted butterfly fly (Telmatoscopus albopopopuncopusopipopuncopus) nipponensis), Culicoides oxystoma, Anopheles hyracanus sinesis (Anopheles hyracanus sinesis), Gambi Anopheles gambiae, Anopheles arabiensis, Anopheles funestus, Anopheles melas, Anopheles minimus, Anopheles dirus, Anopheles dirus, Anopheles stephensi, Anopheles albimanus, Culex pipiens pallens, Culex pipiens molestus, Culex quinquefasciatus, Culex restuans , Culex tarsalis, Culex modestus, Culex tritaeniorhynchus, Aedes aegypti, Aedes albopicutus, Aedes japonica japonicus), Aedes vexans and other diptera insects, Apethymus kuri (Apethymus kuri), Athalia rosae (Athalia rosae), Rose trilobite (Arge pagana), European new pine bee (Neodiprion sertifer), chestnut Stingray bee (Dryocosmus kuriphilus), Eciton burchelli (Eciton schmitti), Japanese bowback ant (Camponotus japonicus), Vespa mandarina, Australian ant (Myrmecia spp. ), Solenopsis spp., Monomorium pharaonis and other Hymenoptera insects, Teleogryllus emma, Gryllotalpa orientalis, Locusta migratoria, Little wings Orthoptera insects such as rice locust (Oxya yezoensis), desert locust (Schistocerca gregaria), Onychiurus folsomi, Onychiurus sibiricus, Bouletiella hortensis, etc. Insects, Periplaneta fuliginosa, Periplaneta japonica, Blattella germanica, Periplaneta Americana, etc., Coptotermes formosanus, Reticulitermes speratus), Taiwan termites (Odontotermes formosanus), termites, cat flea (Ctenocephalidae felis), dog flea (Ctenocephalides canis), chicken flea (Echidnophaga gallinacea), human flea (Pulex irritans), rat flea (Xenopsylla cheopis) and other fleas Order insects, large chicken lice (Menacanthus stramineus), cattle hair lice (Bovicola bovis) and other feather insects, cattle blood (Haematopinus eurysternus), Haematopinus suis, Linognathus vituli, Solenopotes capillatus, Damiania ovis, Phytonemus dust mites, such as pallidus, Polyphagotarsonemus latus, Tarsonemus bilobatus, true foot mites, such as Chinese cabbage mite (Penthaleus erythrocephalus), wheat mite (Penthaleus major), Oligonychus shinkajii), citrus spider mite (Panonychus citri), Panonychus mori (Panonychus mori), apple spider mite (Panonychus ulmi), Tetranychus kanzawai, Tetranychus urticae, etc. Acaphylla theavagrans, Aceria tulipae, Aculops lycopersici, Aculops pelekassi, Aculus schlechtendali, Eriophyes chibaensis ), Arthropod ticks such as Phyllocoptruta oleivora, Rhizoglyphus robini, Tyrophagus putrescentiae, Tyropha Acaroid mites such as gus similis (Tyrophagus similis), dust mites (Dermatophagoides pteronyssinus), chigger mites such as Dermatophagoides farinae, bee mites such as Varroa jacobsoni (Varroa jacobsoni), Australian cattle tick (Boophilus microplus), Rhipicephalus sanguineus, Haemaphysalis longicornis, Haemaphysalis flava, Haemaphysalis campanulata, Haemaphysalis japonica, Haemaphysalis megaspinosa (Haemaphysalis megaspinosa) Ixodes ovatus, Ixodes persulcatus, Ixodes nipponensis, Ixodes pacifcus (Ixodes pacifcus), Ixodes ricinus, Ixodes scapularis , Amblyomma americanum, Amblyomma maculatum, Amblyomma spp., Dermacentor recticulatus, Dermacentor taiwanesis, Dermacentor andersoni ), West Coast Dermacentor occidentalis, Dermacentor variabilis, Leather True ticks such as Dermacentor spp., Claw mites such as Cheyletiella yasguri, cheyletiella blakei, Demodex canis, and Demodex cati), such as Demodex follicles, itch mites, such as sheep mites (Psoroptes ovis), chigger mites (Sarcoptes scabiei), notoedres cati, knemidocoptes spp., etc. Crustaceans such as Armadillidium vulgare, Pomacea canaliculata, Achatina fulica, Meghimatium bilineatum, Limax Valentiana, Acusta despecta sieboldiana, Japan Land snails (Euhadra peliomphala) and other gastropods, Prathylenchus coffeae, Prathylenchus penetrans, Prathylenchus vulnus, Globodera rostochiensis, Heterodeides glycerides ), Meloidogyne hapla, Meloidogyne incognita, Aphelenchoides besseyi, Pine Nematodes such as Bursaphelenchus xylophilus, Rhizopoda, such as Amoeba, Mishigo, Leishmania, Trichomonas, Malaria, Toxoplasma Sporozoea and other protozoa such as Ciliophora, Nematoda such as Ascaris and hookworm, Acannthocephala and other needleworms Linear animals (Nematomorpha), trematodes such as liver flukes (Trematoda), maggots such as hookworms (Cestoda), worms, Ascaris, Toxocara, Toxascaris, Parascaris, Ascaridia, Heterakis, Oxyuris, Capillaria, Trichinella, Strongylus, Triodontophorus, Trichodonma , Stephanurus, Desophagostomum, Chabertia, Syngamus, Ancylostoma, Uncinaria, Necator, Bunostomum, Trichostrongylus, Cooper hair Coeperia, fine Nematodirus, Haemonchus, Ostertagia, Dictyocaulus, Metastrongylus, Dirofilaria, Parafilaria, and Silkworm Setaria), Onchocerca, Habronema, Arduenna, Acuaria, and other nematodes, Diphyllobothrium, Anoplocephara, Moniezia, and Dogworm Ascaris such as Dipylidium, Taenia, Taenia, Dithyridium, Raillietina, Echinococcus, Schistosoma, Paramphistomum ), Liver fluke (Fasciola) and other flukes.

以下揭示具體的製劑化例,但不限定於此等。Specific formulation examples are disclosed below, but are not limited thereto.

[製劑例1水懸劑] 將本發明化合物(10質量份)、喹啉系化合物(10質量份)、萘磺酸之甲醛縮合物鈉鹽(5質量份)、聚氧乙烯芳基苯醚(1質量份)、丙二醇(5質量份)、矽系消泡劑(0.1質量份)、三仙膠(0.2質量份)、離子交換水(68.7質量份)混合成漿液,再使用DYNO-MILL KDL,以直徑1.0mm之玻璃珠粒進行濕式粉碎,獲得水懸劑。[Preparation Example 1 Water Suspension] The compound of the present invention (10 parts by mass), a quinoline compound (10 parts by mass), a sodium salt (5 parts by mass) of a formaldehyde condensate of naphthalenesulfonic acid, and polyoxyethylene arylphenyl ether (1 part by mass), propylene glycol (5 parts by mass), silicon-based defoamer (0.1 part by mass), Sanxian gum (0.2 part by mass), and ion-exchanged water (68.7 parts by mass) are mixed into a slurry. KDL, wet crushing with glass beads having a diameter of 1.0 mm to obtain an aqueous suspension.

[製劑例2乳劑] 將本發明化合物(5質量份)、喹啉系化合物(5質量份)溶解在二甲苯(35質量份)與環己烷(35質量份)之混合溶液,於此溶液中混合並添加Tween20(20質量份),獲得乳劑。[Preparation Example 2 Emulsion] The compound (5 parts by mass) of the present invention and a quinoline compound (5 parts by mass) were dissolved in a mixed solution of xylene (35 parts by mass) and cyclohexane (35 parts by mass). Tween 20 (20 parts by mass) was added and mixed to obtain an emulsion.

[製劑例3水合劑] 將本發明化合物(10質量份)、喹啉系化合物(10質量份)、白碳(10質量份)、聚乙烯醇(2質量份)、二辛基磺基琥珀酸鈉鹽(0.5質量份)、烷基苯磺酸鈉鹽(5質量份)、煅燒矽藻土(10質量份)及高嶺黏土(52.5質量份)充分地混合,以氣流磨粉機粉碎,獲得水合劑。 [實施例][Hydrant of Formulation Example 3] A compound of the present invention (10 parts by mass), a quinoline compound (10 parts by mass), white carbon (10 parts by mass), polyvinyl alcohol (2 parts by mass), and dioctylsulfoamber The sodium salt (0.5 parts by mass), the sodium salt of alkylbenzenesulfonic acid (5 parts by mass), the calcined diatomaceous earth (10 parts by mass), and the kaolin clay (52.5 parts by mass) were thoroughly mixed, and pulverized with a jet mill. Obtain a hydrating agent. [Example]

以下針對本發明使用之吡啶酮化合物及喹啉系化合物,舉合成例及試驗例進一步具體説明。惟本發明之內容不僅限於該等合成例及試驗例。Hereinafter, the pyridone compound and the quinoline-based compound used in the present invention will be further specifically described with reference to synthesis examples and test examples. However, the content of the present invention is not limited to these synthesis examples and test examples.

[合成例1] 步驟1:5-(2-氯-5-甲氧基苯基)-6-(2,6-二氟苯基)-3,4-二氫吡啶-2(1H)-酮之合成[Synthesis Example 1] Step 1: 5- (2-chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -3,4-dihydropyridine-2 (1H)- Ketone Synthesis

【化42】 [Chemical 42]

將含有4-(2-氯-5-甲氧基苯基)-5-(2,6-二氟苯基)-5-側氧基戊酸1.47g與乙酸銨6.75g之乙酸溶液10ml於130℃反應14小時。冷卻到室溫後,於反應混合物中加入乙酸乙酯與水並分液。於獲得之有機層中加水,加入碳酸鉀直到不再発泡為止後進行分液。其次,將有機層以飽和食鹽水洗淨並以硫酸鈉乾燥。於減壓下進行溶劑餾去後,以二異丙醚將析出物洗淨。獲得之紫色固體為標題的化合物,0.98g。1 H-NMR(CDCl3 )δ:7.25-7.21(1H, m),7.19(1H, d, J=8.8Hz),6.83-6.76(3H, m),6.65(1H, dd, J=8.8,3.4Hz),6.53(1H, d, J=3.4Hz),3.61(3H, s),2.91-2.76(4H, m).10 ml of an acetic acid solution containing 1.47 g of 4- (2-chloro-5-methoxyphenyl) -5- (2,6-difluorophenyl) -5-pentoxypentanoic acid and 6.75 g of ammonium acetate was added to The reaction was carried out at 130 ° C for 14 hours. After cooling to room temperature, ethyl acetate and water were added to the reaction mixture and the layers were separated. Water was added to the obtained organic layer, and potassium carbonate was added until bubbling ceased, followed by liquid separation. Next, the organic layer was washed with saturated brine and dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the precipitate was washed with diisopropyl ether. The obtained purple solid was the title compound, 0.98 g. 1 H-NMR (CDCl 3 ) δ: 7.25-7.21 (1H, m), 7.19 (1H, d, J = 8.8Hz), 6.83-6.76 (3H, m), 6.65 (1H, dd, J = 8.8, 3.4Hz), 6.53 (1H, d, J = 3.4Hz), 3.61 (3H, s), 2.91-2.76 (4H, m).

步驟2:5-(2-氯-5-甲氧基苯基)-6-(2,6-二氟苯基)-1-乙基-3,4-二氫吡啶-2(1H)-酮之合成(化合物編號52)Step 2: 5- (2-Chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -1-ethyl-3,4-dihydropyridine-2 (1H)- Ketone Synthesis (Compound No. 52)

【化43】 [Chemical 43]

在含有5-(2-氯-5-甲氧基苯基)-6-(2,6-二氟苯基)-3,4-二氫吡啶-2(1H)-酮0.50g之DMF溶液5ml中,加入碘乙烷346μl與碳酸銫1.41g,於60℃攪拌2小時。冷卻到室溫後,於反應混合物加入水與乙酸乙酯並分液。獲得之有機層按順序以硫代硫酸鈉水溶液及飽和食鹽水洗淨並以硫酸鈉乾燥。於減壓下將溶劑餾去後,將獲得之殘渣以矽膠管柱層析精製。獲得標題化合物為0.54g的白色固體。DMF solution containing 0.50 g of 5- (2-chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -3,4-dihydropyridine-2 (1H) -one In 5 ml, 346 μl of iodoethane and 1.41 g of cesium carbonate were added, and the mixture was stirred at 60 ° C. for 2 hours. After cooling to room temperature, water and ethyl acetate were added to the reaction mixture and the layers were separated. The obtained organic layer was washed with an aqueous sodium thiosulfate solution and saturated brine in this order, and dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the obtained residue was purified by silica gel column chromatography. The title compound was obtained as 0.54 g of a white solid.

[合成例2] 5-(2-氯-5-甲氧基苯基)-6-(2,6-二氟苯基)-1-乙基吡啶-2(1H)-酮之合成(化合物編號53)[Synthesis Example 2] Synthesis of 5- (2-chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -1-ethylpyridine-2 (1H) -one (compound (No. 53)

【化44】 [Chemical 44]

於含有5-(2-氯-5-甲氧基苯基)-6-(2,6-二氟苯基)-1-乙基-3,4-二氫吡啶-2(1H)-酮520mg之四氯化碳溶液20ml中加入N-溴琥珀醯亞胺258mg與偶氮雙異丁腈23mg,於80℃攪拌90分鐘。冷卻到室溫後,於反應混合物中加水,於減壓下將四氯化碳餾去。於其中加入乙酸乙酯並分液後,將獲得之有機層按順序以硫代硫酸鈉水溶液及飽和食鹽水洗淨並以硫酸鈉乾燥。於減壓下將溶劑餾去後將獲得之殘渣以矽膠管柱層析精製。獲得標題化合物為467mg之白色固體。Contains 5- (2-chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -1-ethyl-3,4-dihydropyridine-2 (1H) -one To 20 ml of 520 mg of a carbon tetrachloride solution, 258 mg of N-bromosuccinimide and 23 mg of azobisisobutyronitrile were added, and stirred at 80 ° C for 90 minutes. After cooling to room temperature, water was added to the reaction mixture, and carbon tetrachloride was distilled off under reduced pressure. After ethyl acetate was added thereto and the mixture was separated, the obtained organic layer was sequentially washed with an aqueous sodium thiosulfate solution and saturated brine, and dried over sodium sulfate. The solvent was distilled off under reduced pressure, and the obtained residue was purified by silica gel column chromatography. The title compound was obtained as 467 mg of a white solid.

[合成例3] 3-氯-5-(2-氯-5-甲氧基苯基)-6-(2,6-二氟苯基)-1-乙基吡啶-2(1H)-酮之合成(化合物編號54)[Synthesis Example 3] 3-chloro-5- (2-chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -1-ethylpyridine-2 (1H) -one Synthesis (Compound No. 54)

【化45】 [Chemical 45]

於含有5-(2-氯-5-甲氧基苯基)-6-(2,6-二氟苯基)-1-乙基吡啶-2(1H)-酮110mg之DMF溶液2ml中加入N-氯琥珀醯亞胺43mg,於70℃攪拌1小時。冷卻到室溫後於反應混合物中加入乙酸乙酯與水並分液。將獲得之有機層以飽和食鹽水洗淨後以硫酸鈉乾燥。於減壓下將溶劑餾去後,將獲得之殘渣以矽膠管柱層析精製。獲得之標題化合物為114mg之白色固體。To 2 ml of a DMF solution containing 110 mg of 5- (2-chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -1-ethylpyridin-2 (1H) -one 43 mg of N-chlorosuccinimide was stirred at 70 ° C for 1 hour. After cooling to room temperature, ethyl acetate and water were added to the reaction mixture and the layers were separated. The obtained organic layer was washed with saturated brine, and then dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the obtained residue was purified by silica gel column chromatography. The title compound obtained was 114 mg of a white solid.

[合成例4] 5-(2-氯-5-羥基苯基)-6-(2,6-二氟苯基)-1-乙基吡啶-2(1H)-酮之合成(化合物編號234)[Synthesis Example 4] Synthesis of 5- (2-chloro-5-hydroxyphenyl) -6- (2,6-difluorophenyl) -1-ethylpyridine-2 (1H) -one (Compound No. 234 )

【化46】 [Chemical 46]

將含有5-(2-氯-5-甲氧基苯基)-6-(2,6-二氟苯基)-1-乙基吡啶-2(1H)-酮4.0g之二氯甲烷溶液40ml冰冷,滴加1.0mol/l之三溴化硼之二氯甲烷溶液23.4ml。於冰冷下攪拌30分鐘後,於反應混合物中加水分液。獲得之有機層按順序以硫代硫酸鈉水溶液及飽和碳酸氫鈉水溶液洗淨並以硫酸鈉乾燥。於減壓下將溶劑餾去後,將獲得之殘渣以己烷洗淨。獲得之標題化合物為3.9g之白色固體。Dichloromethane solution containing 4.0 g of 5- (2-chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -1-ethylpyridine-2 (1H) -one 40ml was ice-cold, and 23.4ml of a 1.0 mol / l boron tribromide dichloromethane solution was added dropwise. After stirring for 30 minutes under ice-cooling, a water solution was added to the reaction mixture. The obtained organic layer was washed with a sodium thiosulfate aqueous solution and a saturated sodium bicarbonate aqueous solution in this order and dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the obtained residue was washed with hexane. The title compound obtained was 3.9 g of a white solid.

[合成例5] 5-(2-氯-5-(甲氧基甲氧基)苯基)-6-(2,6-二氟苯基)-1-乙基吡啶-2(1H)-酮之合成(化合物編號97)[Synthesis Example 5] 5- (2-chloro-5- (methoxymethoxy) phenyl) -6- (2,6-difluorophenyl) -1-ethylpyridine-2 (1H)- Ketone Synthesis (Compound No. 97)

【化47】 [Chemical 47]

於含有氫化鈉(約60重量%、分散於流動石蠟之狀態)0.08g與5-(2-氯-5-羥基苯基)-6-(2,6-二氟苯基)-1-乙基吡啶-2(1H)-酮0.62g之THF溶液加入氯甲基甲醚0.08g,於室溫攪拌3小時。於反應混合物中加入水及乙酸乙酯並分液後,將獲得之有機層以硫酸鎂乾燥。於減壓下將溶劑餾去後將獲得之殘渣以矽膠管柱層析精製。獲得之標題化合物為0.46g之白色固體。Contains 0.08 g of sodium hydride (approximately 60% by weight, dispersed in a flowing paraffin) and 5- (2-chloro-5-hydroxyphenyl) -6- (2,6-difluorophenyl) -1-ethyl A solution of 0.62 g of pyridin-2 (1H) -one in THF was added with 0.08 g of chloromethyl methyl ether, and the mixture was stirred at room temperature for 3 hours. After adding water and ethyl acetate to the reaction mixture and separating the liquids, the obtained organic layer was dried over magnesium sulfate. The solvent was distilled off under reduced pressure, and the obtained residue was purified by silica gel column chromatography. The title compound obtained was 0.46 g of a white solid.

[合成例6] 3-氯-5-(2-氯-5-(甲氧基甲氧基)苯基)-6-(2,6-二氟苯基)-1-乙基吡啶-2(1H)-酮之合成(化合物編號127)[Synthesis Example 6] 3-chloro-5- (2-chloro-5- (methoxymethoxy) phenyl) -6- (2,6-difluorophenyl) -1-ethylpyridine-2 Synthesis of (1H) -one (Compound No. 127)

【化48】 [Chemical 48]

將含有5-(2-氯-5-(甲氧基甲氧基)苯基)-6-(2,6-二氟苯基)-1-乙基吡啶-2(1H)-酮219mg與N-氯琥珀醯亞胺79mg之DMF溶液3ml於70℃攪拌1小時。冷卻到室溫後,於反應混合物加入飽和碳酸氫鈉水溶液與乙酸乙酯並分液。將獲得之有機層按順序以硫代硫酸鈉水溶液及飽和食鹽水洗淨並以硫酸鈉乾燥。於減壓下將溶劑餾去後將獲得之殘渣以矽膠管柱層析精製。獲得之標題化合物為203mg之黃色口香糖狀物質。219 mg of 5- (2-chloro-5- (methoxymethoxy) phenyl) -6- (2,6-difluorophenyl) -1-ethylpyridine-2 (1H) -one was mixed with 3 ml of a DMF solution of 79 mg of N-chlorosuccinimide was stirred at 70 ° C for 1 hour. After cooling to room temperature, a saturated sodium bicarbonate aqueous solution and ethyl acetate were added to the reaction mixture and the layers were separated. The obtained organic layer was washed with an aqueous sodium thiosulfate solution and saturated brine in this order, and dried over sodium sulfate. The solvent was distilled off under reduced pressure, and the obtained residue was purified by silica gel column chromatography. The title compound obtained was 203 mg of a yellow chewing gum.

[合成例7] 5-(2-氯-5-甲氧基苯基)-1-(2,2-二氟乙基)-6-(2,6-二氟苯基)-3,4-二氫吡啶-2(1H)-酮之合成(化合物編號192)[Synthesis Example 7] 5- (2-chloro-5-methoxyphenyl) -1- (2,2-difluoroethyl) -6- (2,6-difluorophenyl) -3,4 -Dihydropyridine-2 (1H) -one (Compound No. 192)

【化49】 [Chemical 49]

將含有5-(2-氯-5-甲氧基苯基)-6-(2,6-二氟苯基)-3,4-二氫吡啶-2(1H)-酮0.50g、對甲苯磺酸2,2-二氟乙酯0.68g及碳酸銫1.40g之DMF溶液10ml,於80℃攪拌4小時。於反應混合物中加入水與乙酸乙酯並分液後,將獲得之有機層按順序以1N鹽酸、飽和碳酸氫鈉水溶液及飽和食鹽水洗淨並以硫酸鈉乾燥。於減壓下將溶劑餾去後將獲得之殘渣以矽膠管柱層析精製。獲得之標題化合物為0.48g之白色固體。0.50 g containing 5- (2-chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -3,4-dihydropyridine-2 (1H) -one, p-toluene 0.68 g of 2,2-difluoroethyl sulfonate and 10 ml of a DMF solution of 1.40 g of cesium carbonate were stirred at 80 ° C for 4 hours. Water and ethyl acetate were added to the reaction mixture and the layers were separated. The obtained organic layer was washed with 1N hydrochloric acid, a saturated aqueous sodium hydrogen carbonate solution and a saturated saline solution in this order, and dried over sodium sulfate. The solvent was distilled off under reduced pressure, and the obtained residue was purified by silica gel column chromatography. The title compound obtained was 0.48 g of a white solid.

[合成例8] 5-(2-氯-5-甲氧基苯基)-1-(2,2-二氟乙基)-6-(2,6-二氟苯基)吡啶-2(1H)-酮之合成(化合物編號194)[Synthesis Example 8] 5- (2-chloro-5-methoxyphenyl) -1- (2,2-difluoroethyl) -6- (2,6-difluorophenyl) pyridine-2 ( Synthesis of 1H) -one (Compound No. 194)

【化50】 [Chemical 50]

於含有5-(2-氯-5-甲氧基苯基)-1-(2,2-二氟乙基)-6-(2,6-二氟苯基)-3,4-二氫吡啶-2(1H)-酮0.42g之四氯化碳溶液15ml中加入N-溴琥珀醯亞胺190mg與偶氮雙異丁腈16mg,於80℃攪拌15分鐘。冷卻到室溫後於反應混合物中加水,於減壓下將四氯化碳餾去。於其中加入乙酸乙酯並分液後,將獲得之有機層按順序以硫代硫酸鈉水溶液及飽和食鹽水洗淨並以硫酸鈉乾燥。於減壓下將溶劑餾去後將獲得之殘渣以矽膠管柱層析精製。獲得之標題化合物為0.38g之白色固體。Contains 5- (2-chloro-5-methoxyphenyl) -1- (2,2-difluoroethyl) -6- (2,6-difluorophenyl) -3,4-dihydro To 15 ml of a carbon tetrachloride solution of 0.42 g of pyridine-2 (1H) -one were added 190 mg of N-bromosuccinimide and 16 mg of azobisisobutyronitrile, and the mixture was stirred at 80 ° C for 15 minutes. After cooling to room temperature, water was added to the reaction mixture, and carbon tetrachloride was distilled off under reduced pressure. After ethyl acetate was added thereto and the mixture was separated, the obtained organic layer was sequentially washed with an aqueous sodium thiosulfate solution and saturated brine, and dried over sodium sulfate. The solvent was distilled off under reduced pressure, and the obtained residue was purified by silica gel column chromatography. The title compound obtained was 0.38 g of a white solid.

[合成例9] 3-溴-5-(2-氯-5-甲氧基苯基)-1-(2,2-二氟乙基)-6-(2,6-二氟苯基)吡啶-2(1H)-酮之合成(化合物編號198)[Synthesis Example 9] 3-bromo-5- (2-chloro-5-methoxyphenyl) -1- (2,2-difluoroethyl) -6- (2,6-difluorophenyl) Synthesis of pyridine-2 (1H) -one (Compound No. 198)

【化51】 [Chemical 51]

將含有5-(2-氯-5-甲氧基苯基)-1-(2,2-二氟乙基)-6-(2,6-二氟苯基)吡啶-2(1H)-酮125mg與N-溴琥珀醯亞胺65mg之DMF溶液5ml於70℃攪拌2小時。於其中追加N-溴琥珀醯亞胺27mg,再於70℃攪拌2小時。冷卻到室溫後,於反應混合物中加入水與乙酸乙酯並分液。將獲得之有機層按順序以硫代硫酸鈉水溶液與飽和食鹽水洗淨並以硫酸鈉乾燥。減壓下將溶劑餾去後將獲得之殘渣以矽膠管柱層析精製。獲得之標題化合物為109mg之灰白色固體。Will contain 5- (2-chloro-5-methoxyphenyl) -1- (2,2-difluoroethyl) -6- (2,6-difluorophenyl) pyridine-2 (1H)- 5 ml of a DMF solution of 125 mg of ketone and 65 mg of N-bromosuccinimide was stirred at 70 ° C for 2 hours. 27 mg of N-bromosuccinimide was added thereto, and the mixture was stirred at 70 ° C for 2 hours. After cooling to room temperature, water and ethyl acetate were added to the reaction mixture and the layers were separated. The obtained organic layer was sequentially washed with an aqueous sodium thiosulfate solution and a saturated saline solution, and dried over sodium sulfate. The solvent was distilled off under reduced pressure, and the obtained residue was purified by silica gel column chromatography. The title compound obtained was 109 mg of an off-white solid.

[合成例10] 5-(2-氯-5-甲氧基苯基)-6-(2,6-二氟苯基)-1-乙基-3-甲基-3,4-二氫吡啶-2(1H)-酮之合成[Synthesis Example 10] 5- (2-chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -1-ethyl-3-methyl-3,4-dihydro Synthesis of pyridine-2 (1H) -one

【化52】 [Chemical 52]

將含有5-(2-氯-5-甲氧基苯基)-6-(2,6-二氟苯基)-1-乙基-3,4-二氫吡啶-2(1H)-酮500mg之THF溶液10ml冷卻到-78℃,滴加1.09mol/l之二異丙基胺基鋰之THF溶液1.33ml,於同溫度攪拌30分鐘。其次,於其中滴加含有碘甲烷82μl之THF溶液2ml,於-78℃攪拌2小時後,升溫到室溫。再於室溫攪拌2小時後,於反應混合物中加入飽和氯化銨水溶液與乙酸乙酯並分液。將獲得之有機層以飽和食鹽水洗淨並以硫酸鈉乾燥。於減壓下將溶劑餾去後將獲得之殘渣以矽膠管柱層析精製。獲得之標題化合物為101mg之白色固體。又,獲得之標題化合物為立體異構混合物。1 H-NMR(CDCl3 )δ:7.24-7.17(1H, m:mixture),7.15-7.13(1H, m:mixture),6.87-6.71(2H, m:mixture),6.57-6.49(2H, m:mixture),3.70-3.14(2H, m:mixture),3.65(3H, s:major),3.58(3H, s:minor),2.98-2.70(2H, m:mixture),2.46-2.37(1H, m:mixture),1.35(3H, d, J=6.7Hz:minor),1.33(3H, d, J=7.0Hz:major),1.00-0.96(3H, m). 立體異構混合物比:約57:43Will contain 5- (2-chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -1-ethyl-3,4-dihydropyridine-2 (1H) -one 10 ml of a 500 mg THF solution was cooled to -78 ° C, and 1.33 mol / l of a solution of lithium diisopropylamino lithium in THF was added dropwise, and stirred at the same temperature for 30 minutes. Next, 2 ml of a THF solution containing 82 µl of methyl iodide was added dropwise thereto, and the mixture was stirred at -78 ° C for 2 hours, and then the temperature was raised to room temperature. After stirring at room temperature for 2 hours, a saturated ammonium chloride aqueous solution and ethyl acetate were added to the reaction mixture, and the mixture was separated. The obtained organic layer was washed with saturated brine and dried over sodium sulfate. The solvent was distilled off under reduced pressure, and the obtained residue was purified by silica gel column chromatography. The title compound obtained was 101 mg of a white solid. The title compound obtained was a stereoisomeric mixture. 1 H-NMR (CDCl 3 ) δ: 7.24-7.17 (1H, m: mixture), 7.15-7.13 (1H, m: mixture), 6.87-6.71 (2H, m: mixture), 6.57-6.49 (2H, m : Mixture), 3.70-3.14 (2H, m: mixture), 3.65 (3H, s: major), 3.58 (3H, s: minor), 2.98-2.70 (2H, m: mixture), 2.46-2.37 (1H, m: mixture), 1.35 (3H, d, J = 6.7Hz: minor), 1.33 (3H, d, J = 7.0Hz: major), 1.00-0.96 (3H, m). Stereoisomer mixture ratio: about 57 : 43

[合成例11] 5-(2-氯-5-甲氧基苯基)-6-(2,6-二氟苯基)-1-乙基-3-甲基吡啶-2(1H)-酮之合成(化合物編號329)[Synthesis Example 11] 5- (2-chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -1-ethyl-3-methylpyridine-2 (1H)- Ketone Synthesis (Compound No. 329)

【化53】 [Chem 53]

將含有5-(2-氯-5-甲氧基苯基)-6-(2,6-二氟苯基)-1-乙基-3-甲基-3,4-二氫吡啶-2(1H)-酮413mg與二氧化錳5.48g之二氯甲烷溶液10ml於加熱回流下攪拌11小時。進而追加二氧化錳1.83g,於加熱回流下攪拌3小時。冷卻到室溫後,將反應混合物進行矽藻土過濾。濾液於減壓下將溶劑餾去後將獲得之殘渣以矽膠管柱層析精製。獲得之標題化合物為291mg之白色固體。Will contain 5- (2-chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -1-ethyl-3-methyl-3,4-dihydropyridine-2 10 ml of a methylene chloride solution of 413 mg of (1H) -one and 5.48 g of manganese dioxide was stirred under reflux for 11 hours. Furthermore, 1.83 g of manganese dioxide was added, and it stirred under heating and refluxing for 3 hours. After cooling to room temperature, the reaction mixture was filtered through celite. The solvent was distilled off under reduced pressure from the filtrate, and the obtained residue was purified by silica gel column chromatography. The title compound obtained was 291 mg of a white solid.

[合成例12] 步驟1:5-(2-氯-5-氟苯基)-6-(2,4,6-三氟苯基)-3,4-二氫吡啶-2(1H)-酮之合成[Synthesis Example 12] Step 1: 5- (2-chloro-5-fluorophenyl) -6- (2,4,6-trifluorophenyl) -3,4-dihydropyridine-2 (1H)- Ketone Synthesis

【化54】 [Chem. 54]

將含有4-(2-氯-5-氟苯基)-5-側氧基-5-(2,4,6-三氟苯基)戊酸4.46g與乙酸銨45.9g之乙酸溶液25ml於130℃攪拌2小時。冷卻到室溫後於反應混合物中加入乙酸乙酯與水並分液。於獲得之有機層中加水,加入碳酸鉀直到不再起泡為止後進行分液。其次將有機層以飽和食鹽水洗淨並以硫酸鈉乾燥。於減壓下將溶劑餾去,以二異丙醚將析出物洗淨。獲得之白色固體為標題的化合物,2.24g。又,洗淨析出物時產生之濾液於減壓下將溶劑餾去後將獲得之殘渣以矽膠管柱層析精製。由濾液獲得之白色固體亦為標題化合物,0.46g。1 H-NMR(CDCl3 )δ:7.28-7.26(1H, m),7.18(1H, brs),6.86-6.83(1H, m),6.74-6.72(1H, m),6.61-6.59(2H,br m),2.85-2.74(4H,br m).25 ml of an acetic acid solution containing 4.46 g of 4- (2-chloro-5-fluorophenyl) -5- pendantoxy-5- (2,4,6-trifluorophenyl) valeric acid and 45.9 g of ammonium acetate was added to Stir at 130 ° C for 2 hours. After cooling to room temperature, ethyl acetate and water were added to the reaction mixture and the layers were separated. Water was added to the obtained organic layer, and potassium carbonate was added until foaming ceased, followed by liquid separation. The organic layer was washed with saturated brine and dried over sodium sulfate. The solvent was distilled off under reduced pressure, and the precipitate was washed with diisopropyl ether. The title compound was obtained as a white solid, 2.24 g. Further, the filtrate generated when the precipitate was washed was distilled off the solvent under reduced pressure, and the obtained residue was purified by silica gel column chromatography. The white solid obtained from the filtrate was also the title compound, 0.46 g. 1 H-NMR (CDCl 3 ) δ: 7.28-7.26 (1H, m), 7.18 (1H, brs), 6.86-6.83 (1H, m), 6.74-6.72 (1H, m), 6.61-6.59 (2H, br m), 2.85-2.74 (4H, br m).

步驟2:5-(2-氯-5-氟苯基)-1-乙基-6-(2,4,6-三氟苯基)-3,4-二氫吡啶-2(1H)-酮之合成(化合物編號320)Step 2: 5- (2-Chloro-5-fluorophenyl) -1-ethyl-6- (2,4,6-trifluorophenyl) -3,4-dihydropyridine-2 (1H)- Ketone Synthesis (Compound No. 320)

【化55】 [Chem 55]

將含有5-(2-氯-5-氟苯基)-6-(2,4,6-三氟苯基)-3,4-二氫吡啶-2(1H)-酮2.70g、碳酸銫7.42g及碘乙烷3.55g之DMF溶液32ml,於55℃攪拌2小時。冷卻到室溫後於反應混合物中加入乙酸乙酯與水並分液。獲得之有機層以飽和食鹽水洗淨並以硫酸鈉乾燥。於減壓下將溶劑餾去後將獲得之殘渣以矽膠管柱層析精製。獲得之標題化合物為2.47g之紅紫色口香糖狀物質。Will contain 5- (2-chloro-5-fluorophenyl) -6- (2,4,6-trifluorophenyl) -3,4-dihydropyridine-2 (1H) -one 2.70 g, cesium carbonate 32ml of 7.42g and 3.55g of iodoethane in DMF was stirred at 55 ° C for 2 hours. After cooling to room temperature, ethyl acetate and water were added to the reaction mixture and the layers were separated. The obtained organic layer was washed with saturated brine and dried over sodium sulfate. The solvent was distilled off under reduced pressure, and the obtained residue was purified by silica gel column chromatography. The title compound obtained was 2.47 g of a red-purple chewing gum-like substance.

[合成例13] 5-(2-氯-5-氟苯基)-1-乙基-6-(2,4,6-三氟苯基)吡啶-2(1H)-酮之合成(化合物編號321)[Synthesis Example 13] Synthesis of 5- (2-chloro-5-fluorophenyl) -1-ethyl-6- (2,4,6-trifluorophenyl) pyridine-2 (1H) -one (compound (No. 321)

【化56】 [Chemical] 56

將含有5-(2-氯-5-氟苯基)-1-乙基-6-(2,4,6-三氟苯基)-3,4-二氫吡啶-2(1H)-酮0.21g及二氧化錳1.42g之甲苯溶液5ml於90℃攪拌5小時。冷卻到室溫後將反應混合物進行矽藻土過濾。將濾液於減壓下進行溶劑餾去後將獲得之殘渣以矽膠管柱層析精製。獲得之標題化合物為0.14g之白色固體。Will contain 5- (2-chloro-5-fluorophenyl) -1-ethyl-6- (2,4,6-trifluorophenyl) -3,4-dihydropyridine-2 (1H) -one 5 ml of a toluene solution of 0.21 g and 1.42 g of manganese dioxide was stirred at 90 ° C for 5 hours. After cooling to room temperature, the reaction mixture was filtered through celite. The filtrate was subjected to solvent distillation under reduced pressure, and the obtained residue was purified by silica gel column chromatography. The title compound obtained was 0.14 g of a white solid.

[合成例14] 3-溴-5-(2-氯-5-氟苯基)-1-乙基-6-(2,4,6-三氟苯基)吡啶-2(1H)-酮之合成(化合物編號381)[Synthesis Example 14] 3-bromo-5- (2-chloro-5-fluorophenyl) -1-ethyl-6- (2,4,6-trifluorophenyl) pyridine-2 (1H) -one Synthesis (Compound No. 381)

【化57】 [Chemical] 57

將含有5-(2-氯-5-氟苯基)-1-乙基-6-(2,4,6-三氟苯基)吡啶-2(1H)-酮0.60g及N-溴琥珀醯亞胺0.33g之DMF溶液30ml於75℃攪拌2.5小時。再者,追加N-溴琥珀醯亞胺0.10g,於75℃攪拌1.5小時。冷卻到室溫後於反應混合物加入水與乙酸乙酯並分液。將獲得之有機層以飽和食鹽水洗淨後以硫酸鈉乾燥。於減壓下將溶劑餾去後將獲得之殘渣以矽膠管柱層析精製。獲得之標題化合物為0.64g之白色固體。0.60 g containing 5- (2-chloro-5-fluorophenyl) -1-ethyl-6- (2,4,6-trifluorophenyl) pyridine-2 (1H) -one and N-bromoamber 30 ml of a solution of rhenium imine 0.33 g in DMF was stirred at 75 ° C for 2.5 hours. Furthermore, 0.10 g of N-bromosuccinimide was added, and it stirred at 75 degreeC for 1.5 hours. After cooling to room temperature, water and ethyl acetate were added to the reaction mixture and the layers were separated. The obtained organic layer was washed with saturated brine, and then dried over sodium sulfate. The solvent was distilled off under reduced pressure, and the obtained residue was purified by silica gel column chromatography. The title compound obtained was 0.64 g of a white solid.

[合成例15] 5-(2-氯-5-氟苯基)-1-乙基-3-甲基-6-(2,4,6-三氟苯基)吡啶-2(1H)-酮之合成(化合物編號461)[Synthesis Example 15] 5- (2-chloro-5-fluorophenyl) -1-ethyl-3-methyl-6- (2,4,6-trifluorophenyl) pyridine-2 (1H)- Ketone Synthesis (Compound No. 461)

【化58】 [Chemical] 58

將含有3-溴-5-(2-氯-5-氟苯基)-1-乙基-6-(2,4,6-三氟苯基)吡啶-2(1H)-酮250mg、甲基硼酸49mg、乙酸鈀(II)6mg、磷酸三鉀403mg及三環己基膦15mg之甲苯8ml與水0.8ml之混合溶液,於100℃攪拌7小時。冷卻到室溫後於反應混合物加入水與乙酸乙酯並分液。獲得之有機層以飽和食鹽水洗淨後以硫酸鈉乾燥。於減壓下將溶劑餾去後將獲得之殘渣以矽膠管柱層析精製。獲得之標題化合物為116mg之白色固體。250 mg of 3-bromo-5- (2-chloro-5-fluorophenyl) -1-ethyl-6- (2,4,6-trifluorophenyl) pyridine-2 (1H) -one, A mixed solution of 49 mg of methylboronic acid, 6 mg of palladium (II) acetate, 403 mg of tripotassium phosphate, and 15 mg of tricyclohexylphosphine in 8 ml of toluene and 0.8 ml of water was stirred at 100 ° C for 7 hours. After cooling to room temperature, water and ethyl acetate were added to the reaction mixture and the layers were separated. The obtained organic layer was washed with saturated brine, and then dried over sodium sulfate. The solvent was distilled off under reduced pressure, and the obtained residue was purified by silica gel column chromatography. The title compound obtained was 116 mg of a white solid.

[合成例16] 3-溴-5-(2-氯-5-氟苯基)-6-(2,6-二氟-4-甲氧基苯基)-1-乙基吡啶-2(1H)-酮之合成(化合物編號476)[Synthesis Example 16] 3-bromo-5- (2-chloro-5-fluorophenyl) -6- (2,6-difluoro-4-methoxyphenyl) -1-ethylpyridine-2 ( Synthesis of 1H) -one (Compound No. 476)

【化59】 [Chemical 59]

於3-溴-5-(2-氯-5-氟苯基)-1-乙基-6-(2,4,6-三氟苯基)吡啶-2(1H)-酮300mg之甲醇溶液8ml中加入28重量%之甲醇鈉之甲醇溶液0.63ml,於加熱回流下攪拌13小時。冷卻到室溫後於反應混合物加入飽和氯化銨水溶液與乙酸乙酯並分液。將獲得之有機層以飽和食鹽水洗淨並以硫酸鈉乾燥。於減壓下將溶劑餾去後將獲得之殘渣以矽膠管柱層析精製。獲得之標題化合物為271mg之白色固體。300 mg of 3-bromo-5- (2-chloro-5-fluorophenyl) -1-ethyl-6- (2,4,6-trifluorophenyl) pyridine-2 (1H) -one in methanol To 8 ml was added 0.63 ml of a 28% by weight sodium methoxide in methanol solution, and the mixture was stirred under reflux for 13 hours. After cooling to room temperature, a saturated ammonium chloride aqueous solution and ethyl acetate were added to the reaction mixture and the layers were separated. The obtained organic layer was washed with saturated brine and dried over sodium sulfate. The solvent was distilled off under reduced pressure, and the obtained residue was purified by silica gel column chromatography. The title compound obtained was 271 mg of a white solid.

[合成例17] 步驟1:5-(3,5-二甲氧基苯基)-6-(2,4,6-三氟苯基)-3,4-二氫吡啶-2(1H)-酮之合成[Synthesis Example 17] Step 1: 5- (3,5-dimethoxyphenyl) -6- (2,4,6-trifluorophenyl) -3,4-dihydropyridine-2 (1H) -Ketone Synthesis

【化60】 [Chemical 60]

於參考例3獲得之未精製之4-(3,5-二甲氧基苯基)-5-側氧基-5-(2,4,6-三氟苯基)戊酸,加入乙酸銨14.18g與乙酸15ml,於120℃攪拌10小時。冷卻到室溫後於反應混合物加入水與乙酸乙酯並分液。將獲得之有機層按順序以飽和碳酸氫鈉水溶液及飽和食鹽水洗淨並以硫酸鈉乾燥。於減壓下將溶劑餾去後,於獲得之固體加入異丙醚並洗淨。獲得之標題化合物為0.99g之褐色固體。1 H-NMR(CDCl3 )δ:6.68(1H, s),6.62(2H, td, J=8.7,1.4Hz),6.26(1H, t, J=2.1Hz),6.16(2H, d, J=2.1Hz),3.65(6H, s),2.87-2.86(2H, m),2.73-2.71(2H, m).Unrefined 4- (3,5-dimethoxyphenyl) -5- pendantoxy-5- (2,4,6-trifluorophenyl) pentanoic acid obtained in Reference Example 3, and ammonium acetate was added 14.18 g and 15 ml of acetic acid were stirred at 120 ° C for 10 hours. After cooling to room temperature, water and ethyl acetate were added to the reaction mixture and the layers were separated. The obtained organic layer was washed with a saturated aqueous sodium hydrogen carbonate solution and a saturated saline solution in this order, and dried over sodium sulfate. After the solvent was distilled off under reduced pressure, isopropyl ether was added to the obtained solid and washed. The title compound obtained was 0.99 g of a brown solid. 1 H-NMR (CDCl 3 ) δ: 6.68 (1H, s), 6.62 (2H, td, J = 8.7, 1.4Hz), 6.26 (1H, t, J = 2.1Hz), 6.16 (2H, d, J = 2.1Hz), 3.65 (6H, s), 2.87-2.86 (2H, m), 2.73-2.71 (2H, m).

步驟2:5-(3,5-二甲氧基苯基)-1-甲基-6-(2,4,6-三氟苯基)-3,4-二氫吡啶-2(1H)-酮之合成Step 2: 5- (3,5-Dimethoxyphenyl) -1-methyl-6- (2,4,6-trifluorophenyl) -3,4-dihydropyridine-2 (1H) -Ketone Synthesis

【化61】 [Chem. 61]

將含有5-(3,5-二甲氧基苯基)-6-(2,4,6-三氟苯基)-3,4-二氫吡啶-2(1H)-酮343mg、碘甲烷176μl與碳酸銫1.85g之DMF溶液6ml於室溫攪拌3小時。於反應混合物中加入水與乙酸乙酯並分液。將獲得之有機層按順序以水、硫代硫酸鈉水溶液及飽和食鹽水洗淨並以硫酸鈉乾燥。於減壓下將溶劑餾去後將獲得之殘渣以矽膠管柱層析精製。獲得之標題化合物為346mg之白色固體。1 H-NMR(CDCl3 )δ:6.62-6.60(2H, m),6.23(1H, t, J=2.1Hz),6.13(2H, d, J=2.1Hz),3.65(6H, s),2.87(3H, s),2.76-2.74(4H, m).Contains 343 mg of 5- (3,5-dimethoxyphenyl) -6- (2,4,6-trifluorophenyl) -3,4-dihydropyridine-2 (1H) -one, methyl iodide 176 μl of 6 ml of a DMF solution with 1.85 g of cesium carbonate was stirred at room temperature for 3 hours. Water and ethyl acetate were added to the reaction mixture and the layers were separated. The obtained organic layer was washed with water, an aqueous sodium thiosulfate solution and a saturated saline solution in this order, and dried over sodium sulfate. The solvent was distilled off under reduced pressure, and the obtained residue was purified by silica gel column chromatography. The title compound obtained was 346 mg of a white solid. 1 H-NMR (CDCl 3 ) δ: 6.62-6.60 (2H, m), 6.23 (1H, t, J = 2.1Hz), 6.13 (2H, d, J = 2.1Hz), 3.65 (6H, s), 2.87 (3H, s), 2.76-2.74 (4H, m).

[合成例18] 5-(3,5-二甲氧基苯基)-1-甲基-6-(2,4,6-三氟苯基)吡啶-2(1H)-酮之合成(化合物編號134)[Synthesis Example 18] Synthesis of 5- (3,5-dimethoxyphenyl) -1-methyl-6- (2,4,6-trifluorophenyl) pyridine-2 (1H) -one ( (Compound No. 134)

【化62】 [Chem 62]

將含有5-(3,5-二甲氧基苯基)-1-甲基-6-(2,4,6-三氟苯基)-3,4-二氫吡啶-2(1H)-酮320mg及二氧化錳4.42g之二氯甲烷溶液12ml,於加熱回流下攪拌5小時。冷卻到室溫後將反應混合物以矽藻土過濾。濾液於減壓下將溶劑餾去後將獲得之殘渣以矽膠管柱層析精製。獲得之標題化合物為263mg之白色固體。Will contain 5- (3,5-dimethoxyphenyl) -1-methyl-6- (2,4,6-trifluorophenyl) -3,4-dihydropyridine-2 (1H)- 320 ml of ketone and 12 ml of dichloromethane solution of 4.42 g of manganese dioxide were stirred under reflux for 5 hours. After cooling to room temperature, the reaction mixture was filtered through celite. The solvent was distilled off under reduced pressure from the filtrate, and the obtained residue was purified by silica gel column chromatography. The title compound obtained was 263 mg of a white solid.

[合成例19] 5-(2-氯-3,5-二甲氧基苯基)-1-甲基-6-(2,4,6-三氟苯基)吡啶-2(1H)-酮之合成(化合物編號136)[Synthesis Example 19] 5- (2-chloro-3,5-dimethoxyphenyl) -1-methyl-6- (2,4,6-trifluorophenyl) pyridine-2 (1H)- Ketone Synthesis (Compound No. 136)

【化63】 [Chem 63]

將含有5-(3,5-二甲氧基苯基)-1-甲基-6-(2,4,6-三氟苯基)吡啶-2(1H)-酮163mg及N-氯琥珀醯亞胺64mg之DMF溶液6ml,於80℃攪拌5小時。再追加N-氯琥珀醯亞胺45mg,於100℃攪拌4小時。冷卻到室溫後於反應混合物加入水與乙酸乙酯並分液。將得之有機層按順序以硫代硫酸鈉水溶液及飽和食鹽水洗淨並以硫酸鈉乾燥。於減壓下將溶劑餾去後將獲得之殘渣以矽膠管柱層析精製。獲得之標題化合物為150mg之白色固體。Contains 163 mg of 5- (3,5-dimethoxyphenyl) -1-methyl-6- (2,4,6-trifluorophenyl) pyridine-2 (1H) -one and N-chloroamber 6 ml of a solution of arsenimide in 64 mg of DMF was stirred at 80 ° C for 5 hours. An additional 45 mg of N-chlorosuccinimide was added, and the mixture was stirred at 100 ° C for 4 hours. After cooling to room temperature, water and ethyl acetate were added to the reaction mixture and the layers were separated. The obtained organic layer was washed with an aqueous sodium thiosulfate solution and saturated brine in this order, and dried over sodium sulfate. The solvent was distilled off under reduced pressure, and the obtained residue was purified by silica gel column chromatography. The title compound obtained was 150 mg of a white solid.

〈參考例1〉 步驟1:2-(2-氯-5-甲氧基苯基)-1-(2,6-二氟苯基)乙酮之合成<Reference Example 1> Step 1: Synthesis of 2- (2-chloro-5-methoxyphenyl) -1- (2,6-difluorophenyl) ethanone

【化64】 [Chemical 64]

將含有2-(2-氯-5-甲氧基苯基)乙酸2.05g之THF溶液30ml冷卻到-78℃後,於-50℃以下滴加1.9mol/L之六甲基二矽氮烷鈉之THF溶液17.21ml,於-78℃攪拌40分鐘。於其中,於-78℃滴加含有2,6-二氟苯甲酸甲酯1.76g之THF溶液10ml後升溫到室溫,攪拌1.5小時。於反應混合物加入飽和氯化銨水溶液,攪拌後加入乙酸乙酯並分液。獲得之有機層以飽和食鹽水洗淨並以硫酸鈉乾燥。於減壓下將溶劑餾去後,將獲得之殘渣以矽膠管柱層析精製,獲得之標題化合物為2.58g之黃色油狀物質。1 H-NMR(CDCl3 )δ:7.40-7.38(1H, m),7.28-7.27(1H, m),6.96-6.94(2H, m),6.83(1H, d, J=3.1Hz),6.78(1H, dd, J=8.9,3.1Hz),4.27(2H, s),3.79(3H, s).After cooling 30 ml of a THF solution containing 2.05 g of 2- (2-chloro-5-methoxyphenyl) acetic acid to -78 ° C, 1.9 mol / L of hexamethyldisilazane was added dropwise below -50 ° C. 17.21 ml of a sodium THF solution was stirred at -78 ° C for 40 minutes. Then, 10 ml of a THF solution containing 1.76 g of methyl 2,6-difluorobenzoate was added dropwise at -78 ° C, and the temperature was raised to room temperature, followed by stirring for 1.5 hours. A saturated ammonium chloride aqueous solution was added to the reaction mixture, and after stirring, ethyl acetate was added and the mixture was separated. The obtained organic layer was washed with saturated brine and dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the obtained residue was purified by silica gel column chromatography to obtain the title compound (2.58 g) as a yellow oily substance. 1 H-NMR (CDCl 3 ) δ: 7.40-7.38 (1H, m), 7.28-7.27 (1H, m), 6.96-6.94 (2H, m), 6.83 (1H, d, J = 3.1Hz), 6.78 (1H, dd, J = 8.9, 3.1Hz), 4.27 (2H, s), 3.79 (3H, s).

步驟2:4-(2-氯-5-甲氧基苯基)-5-(2,6-二氟苯基)-5-側氧基戊酸乙酯之合成Step 2: Synthesis of 4- (2-chloro-5-methoxyphenyl) -5- (2,6-difluorophenyl) -5-pentoxypentanoate

【化65】 [Chem. 65]

於含有2-(2-氯-5-甲氧基苯基)-1-(2,6-二氟苯基)乙酮1.30g之THF溶液15ml中,加入第三丁醇鉀98mg及丙烯酸乙酯525μl,於冰冷下攪拌整夜。於反應混合物加入1N鹽酸與乙酸乙酯並分液後將獲得之有機層以飽和食鹽水洗淨並以硫酸鈉乾燥。於減壓下將溶劑餾去後,獲得標題化合物之1.69g之黃色油狀物質。不進一步精製而使用在下一反應。1 H-NMR(CDCl3 )δ:7.36-7.25(1H, m),7.19(1H, d, J=8.9Hz),6.83(2H, t, J=8.1Hz),6.74-6.71(2H, m),4.91(1H, t, J=7.2Hz),4.13(2H, q, J=7.1Hz),3.76(3H, s),2.57-2.53(1H, m),2.42-2.29(2H, m),2.16-2.07(1H, m),1.25(3H, t, J=7.1Hz).To 15 ml of a THF solution containing 1.30 g of 2- (2-chloro-5-methoxyphenyl) -1- (2,6-difluorophenyl) ethanone, 98 mg of potassium tert-butoxide and ethyl acrylate were added. The ester was 525 μl and stirred overnight under ice-cooling. 1N hydrochloric acid and ethyl acetate were added to the reaction mixture, and the resulting organic layer was washed with saturated brine and dried over sodium sulfate. The solvent was distilled off under reduced pressure to obtain 1.69 g of the title compound as a yellow oily substance. It was used in the next reaction without further purification. 1 H-NMR (CDCl 3 ) δ: 7.36-7.25 (1H, m), 7.19 (1H, d, J = 8.9Hz), 6.83 (2H, t, J = 8.1Hz), 6.74-6.71 (2H, m ), 4.91 (1H, t, J = 7.2Hz), 4.13 (2H, q, J = 7.1Hz), 3.76 (3H, s), 2.57-2.53 (1H, m), 2.42-2.29 (2H, m) , 2.16-2.07 (1H, m), 1.25 (3H, t, J = 7.1Hz).

步驟3:4-(2-氯-5-甲氧基苯基)-5-(2,6-二氟苯基)-5-側氧基戊酸之合成Step 3: Synthesis of 4- (2-chloro-5-methoxyphenyl) -5- (2,6-difluorophenyl) -5- pendant valeric acid

【化66】 [Chemical 66]

於含有4-(2-氯-5-甲氧基苯基)-5-(2,6-二氟苯基)-5-側氧基戊酸乙酯1.69g之THF40ml與水10ml之混合溶液中,加入氫氧化鋰1水合物0.74g,於60℃攪拌3小時。冷卻到室溫後,將反應混合物之溶劑餾去直到液量成為一半左右。於其中加入水與二乙醚並分液,於獲得之水層加入濃鹽酸與乙酸乙酯並分液。將獲得之有機層以飽和食鹽水洗淨並以硫酸鈉乾燥。其次於減壓下將溶劑餾去後,獲得標題化合物之1.47g之黃色口香糖狀物質。不進一步精製而使用在下一反應。1 H-NMR(CDCl3 )δ:7.28-7.27(1H, m),7.19(1H, d, J=8.6Hz),6.83(2H, t, J=8.3Hz),6.75-6.74(1H, m),6.71(1H, dd, J=8.6,3.1Hz),4.92(1H, t, J=7.3Hz),3.75(3H, s),2.60-2.34(3H, m),2.15-2.12(1H, m).In a mixed solution of 40 ml of THF and 10 ml of water containing 1.69 g of 4- (2-chloro-5-methoxyphenyl) -5- (2,6-difluorophenyl) -5-pentoxyvalerate To the solution, 0.74 g of lithium hydroxide monohydrate was added, and the mixture was stirred at 60 ° C for 3 hours. After cooling to room temperature, the solvent of the reaction mixture was distilled off until the liquid volume became about half. Water and diethyl ether were added thereto, and the layers were separated. Concentrated hydrochloric acid and ethyl acetate were added to the obtained aqueous layer, and the layers were separated. The obtained organic layer was washed with saturated brine and dried over sodium sulfate. Then, the solvent was distilled off under reduced pressure to obtain 1.47 g of a yellow chewing gum-like substance of the title compound. It was used in the next reaction without further purification. 1 H-NMR (CDCl 3 ) δ: 7.28-7.27 (1H, m), 7.19 (1H, d, J = 8.6Hz), 6.83 (2H, t, J = 8.3Hz), 6.75-6.74 (1H, m ), 6.71 (1H, dd, J = 8.6, 3.1Hz), 4.92 (1H, t, J = 7.3Hz), 3.75 (3H, s), 2.60-2.34 (3H, m), 2.15-2.12 (1H, m).

〈參考例2〉 步驟1:N’-(2-氯-5-氟亞苄基)-4-甲基苯磺醯基醯肼之合成<Reference Example 2> Step 1: Synthesis of N '-(2-chloro-5-fluorobenzylidene) -4-methylbenzenesulfonylhydrazine

【化67】 [Chemical 67]

將含2-氯-5-氟苯甲醛25.43g與4-甲基苯磺醯基醯肼29.87g之乙醇溶液250ml於室溫攪拌4小時。然後將反應混合物於冰冷下攪拌1小時後將析出物過濾,獲得標題之化合物40.74g之白色固體。1 H-NMR(CDCl3 )δ:8.27(1H, s),8.10(1H, d, J=1.8Hz),7.88(2H, d, J=8.2Hz),7.58(1H, dd, J=9.2,3.1Hz),7.34(2H, d, J=8.2Hz),7.30-7.28(1H, m),7.02-6.99(1H, m),2.43(3H, s).250 ml of an ethanol solution containing 25.43 g of 2-chloro-5-fluorobenzaldehyde and 29.87 g of 4-methylbenzenesulfonylhydrazine was stirred at room temperature for 4 hours. The reaction mixture was then stirred under ice-cooling for 1 hour, and the precipitate was filtered to obtain 40.74 g of the title compound as a white solid. 1 H-NMR (CDCl 3 ) δ: 8.27 (1H, s), 8.10 (1H, d, J = 1.8Hz), 7.88 (2H, d, J = 8.2Hz), 7.58 (1H, dd, J = 9.2 , 3.1Hz), 7.34 (2H, d, J = 8.2Hz), 7.30-7.28 (1H, m), 7.02-6.99 (1H, m), 2.43 (3H, s).

步驟2:2-(2-氯-5-氟苯基)-1-(2,4,6-三氟苯基)乙酮之合成Step 2: Synthesis of 2- (2-chloro-5-fluorophenyl) -1- (2,4,6-trifluorophenyl) ethanone

【化68】 [Chemical 68]

於含氫氧化鈉4.0g之水溶液600ml中加入N’-(2-氯-5-氟亞苄基)-4-甲基苯磺醯基醯肼32.7g與2,4,6-三氟苯甲醛8.0g,於80℃攪拌1小時。冷卻到室溫後於反應混合物添加乙酸乙酯與氯化銨15.0g並攪拌,進行分液。將獲得之有機層以飽和食鹽水洗淨、以硫酸鈉乾燥。於減壓下將溶劑餾去,將獲得之殘渣以矽膠管柱層析精製。獲得標題之化合物6.13g之淡黃色固體。1 H-NMR(CDCl3 )δ:7.36-7.34(1H, m),7.04-7.02(1H, m),6.98-6.96(1H, m),6.76-6.72(2H, m)4.26(2H, s).To 600 ml of an aqueous solution containing 4.0 g of sodium hydroxide was added 32.7 g of N '-(2-chloro-5-fluorobenzylidene) -4-methylbenzenesulfonylhydrazine and 2,4,6-trifluorobenzene. 8.0 g of formaldehyde was stirred at 80 ° C. for 1 hour. After cooling to room temperature, 15.0 g of ethyl acetate and ammonium chloride were added to the reaction mixture, and the mixture was stirred for liquid separation. The obtained organic layer was washed with saturated brine, and dried over sodium sulfate. The solvent was distilled off under reduced pressure, and the obtained residue was purified by silica gel column chromatography. This gave 6.13 g of the title compound as a pale yellow solid. 1 H-NMR (CDCl 3 ) δ: 7.36-7.34 (1H, m), 7.04-7.02 (1H, m), 6.98-6.96 (1H, m), 6.76-6.72 (2H, m) 4.26 (2H, s ).

步驟3:4-(2-氯-5-氟苯基)-5-側氧基-5-(2,4,6-三氟苯基)戊酸乙酯之合成Step 3: Synthesis of 4- (2-chloro-5-fluorophenyl) -5-lanthoxy-5- (2,4,6-trifluorophenyl) valerate

【化69】 [Chemical 69]

將含2-(2-氯-5-氟苯基)-1-(2,4,6-三氟苯基)乙酮6.13g之THF溶液75ml冰冷,加入第三丁醇鉀0.45g與丙烯酸乙酯2.23g,於室溫攪拌8小時。於反應混合物加入10%鹽酸後,加入水與乙酸乙酯並分液。將獲得之有機層以飽和食鹽水洗淨後以硫酸鈉乾燥。於減壓下將溶劑餾去,將獲得之殘渣以矽膠管柱層析精製。獲得標題之化合物4.97g之淡黃色油狀物質。1 H-NMR(CDCl3 )δ:7.30(1H, dd, J=8.9,5.2Hz),7.01-6.98(1H, m),6.92-6.90(1H, m),6.66-6.60(2H, m),4.89(1H, t, J=7.2Hz),4.13(2H, q, J=7.2Hz),2.54-2.52(1H, m),2.35-2.31(2H, m),2.12-2.09(1H, m),1.25(3H, t, J=7.2Hz).75 ml of a THF solution containing 6.13 g of 2- (2-chloro-5-fluorophenyl) -1- (2,4,6-trifluorophenyl) ethanone was ice-cooled, 0.45 g of potassium tert-butoxide and acrylic acid were added 2.23 g of ethyl ester was stirred at room temperature for 8 hours. After adding 10% hydrochloric acid to the reaction mixture, water and ethyl acetate were added and the layers were separated. The obtained organic layer was washed with saturated brine, and then dried over sodium sulfate. The solvent was distilled off under reduced pressure, and the obtained residue was purified by silica gel column chromatography. This gave 4.97 g of the title compound as a pale yellow oily substance. 1 H-NMR (CDCl 3 ) δ: 7.30 (1H, dd, J = 8.9, 5.2Hz), 7.01-6.98 (1H, m), 6.92-6.90 (1H, m), 6.66-6.60 (2H, m) , 4.89 (1H, t, J = 7.2Hz), 4.13 (2H, q, J = 7.2Hz), 2.54-2.52 (1H, m), 2.35-2.31 (2H, m), 2.12-2.09 (1H, m ), 1.25 (3H, t, J = 7.2Hz).

步驟4:4-(2-氯-5-氟苯基)-5-側氧基-5-(2,4,6-三氟苯基)戊酸之合成Step 4: Synthesis of 4- (2-chloro-5-fluorophenyl) -5- pendantoxy-5- (2,4,6-trifluorophenyl) pentanoic acid

【化70】 [Chemical 70]

於含4-(2-氯-5-氟苯基)-5-側氧基-5-(2,4,6-三氟苯基)戊酸乙酯4.97g之THF溶液100ml中,加入水25ml與氫氧化鋰1水合物2.59g,於60℃攪拌2小時。冷卻到室溫後將反應混合物於減壓下將溶劑餾去。於其中加入水與二乙醚並分液。然後,於獲得之水層中加入濃鹽酸使酸性化後,以乙酸乙酯萃取。將獲得之有機層以飽和食鹽水洗淨,以硫酸鈉乾燥。於減壓下將溶劑餾去,獲得標題之化合物4.46g之無色透明膠狀物質。不繼續進行精製而使用在下一反應。1 H-NMR(CDCl3 )δ:7.32-7.29(1H, m),7.00-6.97(1H, m),6.94-6.89(1H, m),6.64-6.60(2H, m),4.89(1H, t, J=7.2Hz),2.58-2.06(4H, m).To 100 ml of a THF solution containing 4.97 g of ethyl 4- (2-chloro-5-fluorophenyl) -5- pendantoxy-5- (2,4,6-trifluorophenyl) valerate was added water 25ml and 2.59g of lithium hydroxide monohydrate were stirred at 60 ° C for 2 hours. After cooling to room temperature, the reaction mixture was distilled off the solvent under reduced pressure. Water and diethyl ether were added thereto and the layers were separated. Then, concentrated hydrochloric acid was added to the obtained aqueous layer to make it acidic, and then extracted with ethyl acetate. The obtained organic layer was washed with saturated brine, and dried over sodium sulfate. The solvent was distilled off under reduced pressure to obtain 4.46 g of the title compound as a colorless transparent gel-like substance. It was used in the next reaction without further purification. 1 H-NMR (CDCl 3 ) δ: 7.32-7.29 (1H, m), 7.00-6.97 (1H, m), 6.94-6.89 (1H, m), 6.64-6.60 (2H, m), 4.89 (1H, t, J = 7.2Hz), 2.58-2.06 (4H, m).

〈參考例3〉 步驟1:N’-(3,5-二甲氧基亞苄基)-4-甲基苯磺醯基醯肼之合成<Reference Example 3> Step 1: Synthesis of N '-(3,5-dimethoxybenzylidene) -4-methylbenzenesulfonylhydrazine

【化71】 [Chemical 71]

將含3,5-二甲氧基苯甲醛10.0g與4-甲基苯磺醯基醯肼11.2g之乙醇溶液100ml於室溫攪拌5小時。將獲得之反應混合物於減壓下將溶劑餾去後,獲得標題之化合物20.0g之黃色固體。1 H-NMR(CDCl3 )δ:8.13(1H, s),7.87(2H, d, J=7.8Hz),7.68(1H, s),7.30(2H, d, J=7.8Hz),6.72(2H, d, J=2.4Hz),6.46(1H, t, J=2.4Hz),3.79(6H, s),2.40(3H, s).100 ml of an ethanol solution containing 10.0 g of 3,5-dimethoxybenzaldehyde and 11.2 g of 4-methylbenzenesulfonylhydrazine was stirred at room temperature for 5 hours. The obtained reaction mixture was distilled off the solvent under reduced pressure to obtain 20.0 g of the title compound as a yellow solid. 1 H-NMR (CDCl 3 ) δ: 8.13 (1H, s), 7.87 (2H, d, J = 7.8Hz), 7.68 (1H, s), 7.30 (2H, d, J = 7.8Hz), 6.72 ( 2H, d, J = 2.4Hz), 6.46 (1H, t, J = 2.4Hz), 3.79 (6H, s), 2.40 (3H, s).

步驟2:2-(3,5-二甲氧基苯基)-1-(2,4,6-三氟苯基)乙酮之合成Step 2: Synthesis of 2- (3,5-dimethoxyphenyl) -1- (2,4,6-trifluorophenyl) ethanone

【化72】 [Chemical 72]

於含N’-(3,5-二甲氧基亞苄基)-4-甲基苯磺醯基醯肼6.68g之水溶液100ml中,加入溶有氫氧化鈉0.80g之水溶液20ml與2,4,6-三氟苯甲醛1.60g,於80℃攪拌90分鐘。冷卻到室溫後,於反應混合物中加入乙酸乙酯並分液。將獲得之有機層按順序以飽和氯化銨水溶液與飽和食鹽水洗淨,以硫酸鈉乾燥。於減壓下將溶劑餾去,將獲得之殘渣以矽膠管柱層析精製。獲得標題之化合物1.85g之黃色油狀物質。1 H-NMR(CDCl3 )δ:6.68-6.66(2H, m),6.35(3H, s),4.06(2H,s),3.75(6H, s).To 100 ml of an aqueous solution containing 6.68 g of N '-(3,5-dimethoxybenzylidene) -4-methylbenzenesulfonylhydrazine, 20 ml of an aqueous solution of 0.80 g of sodium hydroxide and 2, 1.60 g of 4,6-trifluorobenzaldehyde was stirred at 80 ° C for 90 minutes. After cooling to room temperature, ethyl acetate was added to the reaction mixture and the layers were separated. The obtained organic layer was sequentially washed with a saturated aqueous ammonium chloride solution and a saturated saline solution, and dried over sodium sulfate. The solvent was distilled off under reduced pressure, and the obtained residue was purified by silica gel column chromatography. This gave 1.85 g of the title compound as a yellow oily substance. 1 H-NMR (CDCl 3 ) δ: 6.68-6.66 (2H, m), 6.35 (3H, s), 4.06 (2H, s), 3.75 (6H, s).

步驟3:4-(3,5-二甲氧基苯基)-5-側氧基-5-(2,4,6-三氟苯基)戊酸乙酯之合成Step 3: Synthesis of 4- (3,5-dimethoxyphenyl) -5-sideoxy-5- (2,4,6-trifluorophenyl) valerate

【化73】 [Chemical 73]

於含2-(3,5-二甲氧基苯基)-1-(2,4,6-三氟苯基)乙酮1.85g之THF溶液18ml中,加入第三丁醇鉀67mg與丙烯酸乙酯714μl,於冰冷下攪拌整夜。於反應混合物加入飽和氯化銨水溶液與乙酸乙酯並分液。將獲得之有機層以飽和食鹽水洗淨後以硫酸鈉乾燥。於減壓下將溶劑餾去,將獲得之殘渣以矽膠管柱層析精製。獲得標題之化合物1.51g之褐色油狀物質。1 H-NMR(CDCl3 )δ:6.61-6.57(2H, m),6.31-6.29(3H, m),4.19(1H, t, J=7.3Hz),4.13(2H, q, J=7.1Hz),3.73(6H, s),2.49-2.47(1H, m),2.30(2H, t, J=7.5Hz),2.09-2.07(1H, m),1.25(3H, t, J=7.1Hz)To 18 ml of a THF solution containing 1.85 g of 2- (3,5-dimethoxyphenyl) -1- (2,4,6-trifluorophenyl) ethanone, 67 mg of potassium tert-butoxide and acrylic acid were added. 714 μl of ethyl acetate was stirred overnight under ice-cooling. A saturated aqueous ammonium chloride solution and ethyl acetate were added to the reaction mixture, and the layers were separated. The obtained organic layer was washed with saturated brine, and then dried over sodium sulfate. The solvent was distilled off under reduced pressure, and the obtained residue was purified by silica gel column chromatography. Obtained 1.51 g of the title compound as a brown oily substance. 1 H-NMR (CDCl 3 ) δ: 6.61-6.57 (2H, m), 6.31-6.29 (3H, m), 4.19 (1H, t, J = 7.3Hz), 4.13 (2H, q, J = 7.1Hz ), 3.73 (6H, s), 2.49-2.47 (1H, m), 2.30 (2H, t, J = 7.5Hz), 2.09-2.07 (1H, m), 1.25 (3H, t, J = 7.1Hz)

步驟4:4-(3,5-二甲氧基苯基)-5-側氧基-5-(2,4,6-三氟苯基)戊酸之合成Step 4: Synthesis of 4- (3,5-dimethoxyphenyl) -5- pendantoxy-5- (2,4,6-trifluorophenyl) pentanoic acid

【化74】 [Chemical 74]

將含4-(3,5-二甲氧基苯基)-5-側氧基-5-(2,4,6-三氟苯基)戊酸乙酯1.51g與濃鹽酸3ml之乙酸溶液15ml於60℃攪拌3小時。冷卻到室溫後於反應混合物中加入水與乙酸乙酯並分液。將獲得之有機層按順序以水與飽和食鹽水洗淨,以硫酸鈉乾燥。於減壓下將溶劑餾去,獲得標題之化合物。不繼續進行精製而使用在下一步驟之反應。An acetic acid solution containing 1.51 g of 4- (3,5-dimethoxyphenyl) -5- pendantoxy-5- (2,4,6-trifluorophenyl) valerate and 3 ml of concentrated hydrochloric acid 15 ml was stirred at 60 ° C for 3 hours. After cooling to room temperature, water and ethyl acetate were added to the reaction mixture and the layers were separated. The obtained organic layer was washed with water and saturated brine in this order, and dried over sodium sulfate. The solvent was distilled off under reduced pressure to obtain the title compound. The reaction in the next step was used without further purification.

表4顯示依據前述實施例合成之化合物,但本發明化合物不限於此等。 構造A如以下所示。Table 4 shows compounds synthesized according to the foregoing examples, but the compounds of the present invention are not limited thereto. Structure A is shown below.

【化75】 [Chemical 75]

構造B如以下所示。Structure B is shown below.

【化76】 [Chemical 76]

構造C如以下所示。Structure C is shown below.

【化77】 [Chemical 77]

構造D如以下所示。Structure D is shown below.

【化78】 [Chem. 78]

【表56】 [Table 56]

【表57】 接續表4 [Table 57] Continued with Table 4

【表58】 接續表4 [Table 58] Continued with Table 4

【表59】 接續表4 [Table 59] Continued with Table 4

【表60】 接續表4 [Table 60] Continued with Table 4

【表61】 接續表4 [Table 61] Continued with Table 4

【表62】 接續表4 [Table 62] Continued with Table 4

【表63】 接續表4 [Table 63] Continued with Table 4

【表64】 接續表4 [Table 64] Continued to Table 4

【表65】 接續表4 [Table 65] Continued with Table 4

【表66】 接續表4 [Table 66] Continued with Table 4

【表67】 接續表4 [Table 67] Continued with Table 4

【表68】 接續表4 [Table 68] Continued with Table 4

【表69】 接續表4 [Table 69] Continued with Table 4

【表70】 接續表4 [Table 70] Continued with Table 4

【表71】 接續表4 [Table 71] Continued with Table 4

【表72】 接續表4 [Table 72] Continued with Table 4

【表73】 接續表4 [Table 73] Continued with Table 4

【表74】 接續表4 [Table 74] Continued with Table 4

【表75】 接續表4 [Table 75] Continued with Table 4

以下針對表4記載之化合物,表5揭示它們的1 H-NMR資料。The compounds shown in Table 4 are shown below, and Table 1 shows their 1 H-NMR data.

【表76】 [Table 76]

【表77】 接續表5 [Table 77] Continued with Table 5

【表78】 接續表5 [Table 78] Continued with Table 5

【表79】 接續表5 [Table 79] Continued with Table 5

【表80】 接續表5 [Table 80] Continued with Table 5

【表81】 接續表5 [Table 81] Continued with Table 5

【表82】 接續表5 [Table 82] Continued with Table 5

【表83】 接續表5 [Table 83] Continued with Table 5

【表84】 接續表5 [Table 84] Continued with Table 5

【表85】 接續表5 [Table 85] Continued with Table 5

【表86】 接續表5 [Table 86] Continued with Table 5

【表87】 接續表5 [Table 87] Continued with Table 5

【表88】 接續表5 [Table 88] Continued with Table 5

【表89】 接續表5 [Table 89] Continued with Table 5

【表90】 接續表5 [Table 90] Continued with Table 5

【表91】 接續表5 [Table 91] Continued with Table 5

【表92】 接續表5 [Table 92] Continued with Table 5

【表93】 接續表5 [Table 93] Continued with Table 5

【表94】 接續表5 [Table 94] Continued with Table 5

【表95】 接續表5 [Table 95] Continued with Table 5

【表96】 接續表5 [Table 96] Continued with Table 5

【表97】 接續表5 [Table 97] Continued with Table 5

【表98】 接續表5 [Table 98] Continued with Table 5

【表99】 接續表5 [Table 99] Continued with Table 5

【表100】 接續表5 [Table 100] Continued with Table 5

【表101】 接續表5 [Table 101] Continued with Table 5

【表102】 接續表5 [Table 102] Continued with Table 5

【表103】 接續表5 [Table 103] Continued with Table 5

【表104】 接續表5 [Table 104] Continued with Table 5

【表105】 接續表5 [Table 105] Continued with Table 5

【表106】 接續表5 [Table 106] Continued with Table 5

【表107】 接續表5 [Table 107] Continued with Table 5

【表108】 接續表5 [Table 108] Continued with Table 5

【表109】 接續表5 [Table 109] Continued with Table 5

【表110】 接續表5 [Table 110] Continued with Table 5

【表111】 接續表5 [Table 111] Continued with Table 5

【表112】 接續表5 [Table 112] Continued with Table 5

【表113】 接續表5 [Table 113] Continued with Table 5

【表114】 接續表5 [Table 114] Continued with Table 5

【表115】 接續表5 [Table 115] Continued with Table 5

【表116】 接續表5 [Table 116] Continued with Table 5

【表117】 接續表5 [Table 117] Continued with Table 5

【表118】 接續表5 [Table 118] Continued with Table 5

【表119】 接續表5 [Table 119] Continued with Table 5

【表120】 接續表5 [Table 120] Continued with Table 5

【表121】 接續表5 [Table 121] Continued with Table 5

【表122】 接續表5 [Table 122] Continued with Table 5

【表123】 接續表5 [Table 123] Continued with Table 5

【表124】 接續表5 [Table 124] Continued with Table 5

【表125】 接續表5 [Table 125] Continued with Table 5

【表126】 接續表5 [Table 126] Continued with Table 5

【表127】 接續表5 [Table 127] Continued with Table 5

【表128】 接續表5 [Table 128] Continued with Table 5

【表129】 接續表5 [Table 129] Continued with Table 5

【表130】 接續表5 [Table 130] Continued with Table 5

【表131】 接續表5 [Table 131] Continued with Table 5

【表132】 接續表5 [Table 132] Continued with Table 5

[合成例20] 3-(4,4-二氟-3,3-二甲基-3,4-二氫異喹啉-1-基)-8-氟喹啉(化合物編號:(2)-2)[Synthesis Example 20] 3- (4,4-difluoro-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) -8-fluoroquinoline (Compound No .: (2) -2)

步驟1:3-(3,3-二甲基-3,4-二氫異喹啉-1-基)-8-氟喹啉之製造 於2L三頸燒瓶中,將(Z)-2-(3,3-二甲基-3,4-二氫異喹啉-1-基)-3-羥基丙烯醛(23g、0.1mol)及2-氟苯胺(16.7g、0.16mol)之二甲苯(300ml)溶液進行3小時加熱回流後,滴加EATON試藥(五氧化磷-甲磺酸溶液、重量比1:10)(300ml)滴加,再進行3小時加熱回流。於反應液中,在冰冷下加水(500ml),將經二甲苯洗淨之水層以碳酸鉀鹼化,以乙酸乙酯萃取,以硫酸鎂乾燥,並過濾及濃縮。將獲得之殘渣以矽膠管柱層析(己烷/乙酸乙酯=7/3)精製,獲得3-(3,3-二甲基-3,4-二氫異喹啉-1-基)-8-氟喹啉(17.7g)之白色固體,產率58%。1 H-NMR(CDCl3 )δ:9.14(1H, d, J=2.1Hz),8.42(1H, t, J=1.7Hz),7.68(1H, d, J=8.0Hz),7.53(1H, td, J=8.0, 4.9Hz),7.47-7.41(2H, m),7.28(1H, dd, J=7.6, 0.6Hz),7.26-7.23(1H, m),7.17(1H, dd, J=7.8, 0.8Hz),2.88(2H, s),1.34(6H, s)Step 1: Production of 3- (3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) -8-fluoroquinoline In a 2L three-necked flask, place (Z) -2- (3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) -3-hydroxyacryl (23 g, 0.1 mol) and 2-fluoroaniline (16.7 g, 0.16 mol) in xylene After the solution (300 ml) was heated and refluxed for 3 hours, the EATON reagent (phosphorus pentoxide-methanesulfonic acid solution, weight ratio 1:10) (300 ml) was added dropwise, followed by heating and refluxing for 3 hours. Water (500 ml) was added to the reaction solution under ice-cooling, and the aqueous layer washed with xylene was basified with potassium carbonate, extracted with ethyl acetate, dried over magnesium sulfate, filtered and concentrated. The obtained residue was purified by silica gel column chromatography (hexane / ethyl acetate = 7/3) to obtain 3- (3,3-dimethyl-3,4-dihydroisoquinolin-1-yl). -8-fluoroquinoline (17.7 g) as a white solid, yield 58%. 1 H-NMR (CDCl 3 ) δ: 9.14 (1H, d, J = 2.1Hz), 8.42 (1H, t, J = 1.7Hz), 7.68 (1H, d, J = 8.0Hz), 7.53 (1H, td, J = 8.0, 4.9Hz), 7.47-7.41 (2H, m), 7.28 (1H, dd, J = 7.6, 0.6Hz), 7.26-7.23 (1H, m), 7.17 (1H, dd, J = 7.8, 0.8Hz), 2.88 (2H, s), 1.34 (6H, s)

步驟2:3-(4,4-二溴-3,3-二甲基-3,4-二氫異喹啉-1-基)-8-氟喹啉之製造 於1L三頸燒瓶中,在3-(3,3-二甲基-3,4-二氫異喹啉-1-基)-8-氟喹啉(17.7g、58mmol)之氯苯(400ml)溶液中加入1,3-二溴-5,5-二甲基乙內醯脲(19.1g、66.8mmol)及PEROYL TCP(雙(4-第三丁基環己基)過氧二碳酸酯),於70℃進行3小時加熱攪拌。將反應液過濾,將濾液濃縮,獲得3-(4,4-二溴-3,3-二甲基-3,4-二氫異喹啉-1-基)-8-氟喹啉之褐色固體,將其直接用在下一步驟。Step 2: Manufacture of 3- (4,4-dibromo-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) -8-fluoroquinoline in a 1L three-necked flask, To a solution of 3- (3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) -8-fluoroquinoline (17.7 g, 58 mmol) in chlorobenzene (400 ml) was added 1,3 -Dibromo-5,5-dimethylhydantoin (19.1g, 66.8mmol) and PEROYL TCP (bis (4-third butylcyclohexyl) peroxydicarbonate), at 70 ° C for 3 hours Heat and stir. The reaction solution was filtered, and the filtrate was concentrated to obtain brown 3- (4,4-dibromo-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) -8-fluoroquinoline. A solid, which was used directly in the next step.

步驟3:3-(4,4-二氟-3,3-二甲基-3,4-二氫異喹啉-1-基)-8-氟喹啉之製造 於500mL之PFA(聚四氟乙烯)燒瓶中,在三乙胺三氟化氫(18.7g、116mmol)中加入3-(4,4-二溴-3,3-二甲基-3,4-二氫異喹啉-1-基)-8-氟喹啉(24.4g、58mmol)之氯苯(45ml)溶液,於85℃進行5小時加熱攪拌。於反應液中加入20%氫氧化鉀(100ml),分液並將有機層以硫酸鎂乾燥,過濾及濃縮。將獲得之殘渣以矽膠管柱層析(己烷/乙酸乙酯=7/3)精製,獲得3-(4,4-二氟-3,3-二甲基-3,4-二氫異喹啉-1-基)-8-氟喹啉(18.4g)之白色固體,產率93%。1 H-NMR(CDCl3 )δ:9.18(1H, d, J=2.1Hz),8.44(1H, t, J=1.7Hz),7.89(1H, d, J=7.6Hz),7.70-7.66(2H, m),7.59-7.53(2H, m),7.49(1H, ddd, J=10.4, 7.8, 1.4Hz),7.31(1H, dd, J=7.6, 0.9Hz),1.46(6H, s)Step 3: Manufacture of 3- (4,4-difluoro-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) -8-fluoroquinoline in 500mL of PFA In a trifluoroethylene) flask, 3- (4,4-dibromo-3,3-dimethyl-3,4-dihydroisoquinoline-1- was added to triethylamine hydrogen trifluoride (18.7 g, 116 mmol). A solution of chloro) -8-fluoroquinoline (24.4 g, 58 mmol) in chlorobenzene (45 ml) was heated and stirred at 85 ° C for 5 hours. 20% potassium hydroxide (100 ml) was added to the reaction solution, the layers were separated, and the organic layer was dried over magnesium sulfate, filtered, and concentrated. The obtained residue was purified by silica gel column chromatography (hexane / ethyl acetate = 7/3) to obtain 3- (4,4-difluoro-3,3-dimethyl-3,4-dihydroiso Quinolin-1-yl) -8-fluoroquinoline (18.4 g) as a white solid, yield 93%. 1 H-NMR (CDCl 3 ) δ: 9.18 (1H, d, J = 2.1Hz), 8.44 (1H, t, J = 1.7Hz), 7.89 (1H, d, J = 7.6Hz), 7.70-7.66 ( 2H, m), 7.59-7.53 (2H, m), 7.49 (1H, ddd, J = 10.4, 7.8, 1.4Hz), 7.31 (1H, dd, J = 7.6, 0.9Hz), 1.46 (6H, s)

[合成例21] 8-氟-3-(5-氟-3,3,4,4-四甲基-1,2,3,4-四氫異喹啉-1-基)喹啉(化合物編號:(2)-3)[Synthesis Example 21] 8-fluoro-3- (5-fluoro-3,3,4,4-tetramethyl-1,2,3,4-tetrahydroisoquinolin-1-yl) quinoline (compound No .: (2) -3)

步驟1:8-氟-3-(5-氟-3,3,4,4-四甲基-3,4-二氫異喹啉-1-基)喹啉之製造 於500mL三頸燒瓶中,於濃硫酸(115mL)中,在冰冷下滴加3-氰基-8-氟喹啉(20.6g、0.12mol)及3-(2-氟苯基)-2,3-二甲基丁-2-醇(28.3g、0.144mmol)之二氯乙烷(40ml)溶液,於室溫攪拌18小時。於反應液加冰與乙酸乙酯,將水層以氨水予以鹼化,以乙酸乙酯萃取,以硫酸鎂乾燥,過濾及濃縮。將獲得之殘渣溶於氯仿,分濾不溶物,將濾液濃縮,將獲得之殘渣以異丙醚與乙酸乙酯之混合液進行晶析,獲得8-氟-3-(5-氟-3,3,4,4-四甲基-3,4-二氫異喹啉-1-基)喹啉(16.7g)之白色固體,產率40%。1 H-NMR(CDCl3 )δ:9.06(1H, d, J=2.1Hz),8.36(1H, t, J=1.7Hz),7.67(1H, d, J=8.3Hz),7.53(1H, td, J=8.0, 4.9Hz),7.46(1H, ddd, J=10.5, 7.7, 1.3Hz),7.23-7.15(2H, m),6.94(1H, dd, J=7.0, 1.8Hz),1.46(6H, s),1.34(6H, d, J=13.1Hz)Step 1: Production of 8-fluoro-3- (5-fluoro-3,3,4,4-tetramethyl-3,4-dihydroisoquinolin-1-yl) quinoline in a 500 mL three-necked flask In a concentrated sulfuric acid (115 mL), 3-cyano-8-fluoroquinoline (20.6 g, 0.12 mol) and 3- (2-fluorophenyl) -2,3-dimethylbutane were added dropwise under ice cooling. A solution of 2-alcohol (28.3 g, 0.144 mmol) in dichloroethane (40 ml) was stirred at room temperature for 18 hours. Ice and ethyl acetate were added to the reaction solution, and the aqueous layer was basified with aqueous ammonia, extracted with ethyl acetate, dried over magnesium sulfate, filtered, and concentrated. The obtained residue was dissolved in chloroform, the insoluble matter was separated and filtered, and the filtrate was concentrated. The obtained residue was crystallized from a mixed solution of isopropyl ether and ethyl acetate to obtain 8-fluoro-3- (5-fluoro-3, 3,4,4-tetramethyl-3,4-dihydroisoquinolin-1-yl) quinoline (16.7 g) as a white solid with a yield of 40%. 1 H-NMR (CDCl 3 ) δ: 9.06 (1H, d, J = 2.1Hz), 8.36 (1H, t, J = 1.7Hz), 7.67 (1H, d, J = 8.3Hz), 7.53 (1H, td, J = 8.0, 4.9Hz), 7.46 (1H, ddd, J = 10.5, 7.7, 1.3Hz), 7.23-7.15 (2H, m), 6.94 (1H, dd, J = 7.0, 1.8Hz), 1.46 (6H, s), 1.34 (6H, d, J = 13.1Hz)

步驟2:8-氟-3-(5-氟-3,3,4,4-四甲基-1,2,3,4-四氫異喹啉-1-基)喹啉之製造 於氮氣環境下,在2L三頸燒瓶中,於8-氟-3-(5-氟-3,3,4,4-四甲基-3,4-二氫異喹啉-1-基)喹啉(16.7g、47.7mmol)之乙醇(477mL)溶液加入氫化硼鈉(5.4g、0.14mol),於室溫攪拌0.5小時,再進行3小時加熱回流。於反應液加水,將乙醇餾去,並於獲得之殘渣加入水與乙酸乙酯,將有機層以硫酸鎂乾燥,過濾及濃縮。將獲得之殘渣以異丙醚與乙酸乙酯之混合液晶析,獲得8-氟-3-(5-氟-3,3,4,4-四甲基-1,2,3,4-四氫異喹啉-1-基)喹啉(8.7g)之淡黃色固體,產率52%。1 H-NMR(CDCl3 )δ:8.84(1H, d, J=2.1Hz),8.09(1H, t, J=1.8Hz),7.58(1H, d, J=8.3Hz),7.48(1H, td, J=8.0, 5.0Hz),7.38(1H, ddd, J=10.6, 7.7, 1.3Hz),6.95(1H, td, J=8.0, 5.2Hz),6.90-6.85(1H, m),6.43(1H, d, J=7.6Hz),5.41(1H, s),1.54(3H, s),1.46(3H, d, J=4.6Hz),1.31(3H, s),1.20(3H, s)Step 2: Production of 8-fluoro-3- (5-fluoro-3,3,4,4-tetramethyl-1,2,3,4-tetrahydroisoquinolin-1-yl) quinoline in nitrogen 8-fluoro-3- (5-fluoro-3,3,4,4-tetramethyl-3,4-dihydroisoquinolin-1-yl) quinoline in a 2L three-necked flask under ambient conditions (16.7 g, 47.7 mmol) in ethanol (477 mL) was added with sodium borohydride (5.4 g, 0.14 mol), and the mixture was stirred at room temperature for 0.5 hours, and then heated under reflux for 3 hours. Water was added to the reaction solution, and ethanol was distilled off. Water and ethyl acetate were added to the obtained residue. The organic layer was dried over magnesium sulfate, filtered, and concentrated. The obtained residue was crystallized from a mixed liquid crystal of isopropyl ether and ethyl acetate to obtain 8-fluoro-3- (5-fluoro-3,3,4,4-tetramethyl-1,2,3,4-tetramethyl Hydroisoquinolin-1-yl) quinoline (8.7 g) as a pale yellow solid with a yield of 52%. 1 H-NMR (CDCl 3 ) δ: 8.84 (1H, d, J = 2.1Hz), 8.09 (1H, t, J = 1.8Hz), 7.58 (1H, d, J = 8.3Hz), 7.48 (1H, td, J = 8.0, 5.0Hz), 7.38 (1H, ddd, J = 10.6, 7.7, 1.3Hz), 6.95 (1H, td, J = 8.0, 5.2Hz), 6.90-6.85 (1H, m), 6.43 (1H, d, J = 7.6Hz), 5.41 (1H, s), 1.54 (3H, s), 1.46 (3H, d, J = 4.6Hz), 1.31 (3H, s), 1.20 (3H, s)

[合成例22] 8-氟-3-(5-氟-3,3-二甲基-3,4-二氫異喹啉-1-基)喹啉(化合物編號:(2)-4) 於氮氣環境下,在200mL三頸燒瓶中,對於三氟甲磺酸(100g、0.67mol),於冰冷下滴加3-氰基-8-氟喹啉(9.3g、54mmol)及1-(2-氟苯基)-2-甲基丙-2-醇(10.9g、65mmol),於室溫攪拌18小時。將反應液倒入冰水中,將經乙酸乙酯洗淨之水層以氨水予以鹼化,以乙酸乙酯萃取,將有機層水洗,以硫酸鎂乾燥,過濾及濃縮。於獲得之殘渣加入10%氫氧化鈉水(50ml),進行1小時加熱回流。將反應液以乙酸乙酯萃取,以硫酸鎂乾燥,過濾及濃縮,獲得8-氟-3-(5-氟-3,3-二甲基-3,4-二氫異喹啉-1-基)喹啉(10.2g)之白色固體,產率59%。1 H-NMR(CDCl3 )δ:9.12(1H, d, J=2.0Hz),8.41(1H, t, J=1.8Hz),7.68(1H, d, J=8.3Hz),7.53(1H, td, J=7.9, 4.9Hz),7.46(1H, ddd, J=10.4, 7.8, 1.3Hz),7.25-7.16(2H, m),7.00(1H, dd, J=6.6, 2.0Hz),2.89(2H, s),1.35(6H, d, J=9.5Hz)[Synthesis Example 22] 8-fluoro-3- (5-fluoro-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) quinoline (Compound No .: (2) -4) In a 200 mL three-necked flask under nitrogen, 3-cyano-8-fluoroquinoline (9.3 g, 54 mmol) and 1- (trifluoromethanesulfonic acid (100 g, 0.67 mol)) were added dropwise under ice cooling. 2-fluorophenyl) -2-methylpropan-2-ol (10.9 g, 65 mmol), and stirred at room temperature for 18 hours. The reaction solution was poured into ice water, the aqueous layer washed with ethyl acetate was basified with ammonia water, extracted with ethyl acetate, the organic layer was washed with water, dried over magnesium sulfate, filtered and concentrated. To the obtained residue was added 10% sodium hydroxide water (50 ml), and the mixture was heated under reflux for 1 hour. The reaction solution was extracted with ethyl acetate, dried over magnesium sulfate, filtered, and concentrated to obtain 8-fluoro-3- (5-fluoro-3,3-dimethyl-3,4-dihydroisoquinoline-1- ) Quinoline (10.2 g) as a white solid, yield 59%. 1 H-NMR (CDCl 3 ) δ: 9.12 (1H, d, J = 2.0Hz), 8.41 (1H, t, J = 1.8Hz), 7.68 (1H, d, J = 8.3Hz), 7.53 (1H, td, J = 7.9, 4.9Hz), 7.46 (1H, ddd, J = 10.4, 7.8, 1.3Hz), 7.25-7.16 (2H, m), 7.00 (1H, dd, J = 6.6, 2.0Hz), 2.89 (2H, s), 1.35 (6H, d, J = 9.5Hz)

[試驗例1] 對於小麥葉枯病菌(Septoria tritici)及灰黴病菌(Botrytis cinerera)之抗菌試驗 使用二甲基亞碸,製作本發明化合物及喹啉系化合物(2)-1、(2)-2、(2)-3、(2)-4之1000ppm溶液。然後,將製作之各種化合物之1000ppm二甲基亞碸溶液與各病原菌之胞子懸浮液(胞子密度1×105 胞子/mL)適量逐一分注到96井之微滴定板並混合,使有效成分之終濃度成為本發明化合物為10ppm、或喹啉系化合物為10ppm、或它們的組合。微滴定板在暗處於18℃在密閉容器中培養,測定0日後至7日後,藥劑處理區及藥劑無處理區之菌之增殖度。依下列計算式算出利用藥劑處理所致之菌之生長抑制率。 生長抑制率=(1-藥劑處理區之增殖度/藥劑無處理區之增殖度)×100 本發明化合物與喹啉系化合物組合之抗菌試驗結果示於表6、表7、表8、及表9(小麥葉枯病菌)、及表10、表11、表12及表13(灰黴病菌)。表中,“H”代表生長抑制率比75%大,“M”代表生長抑制率為40%以上75%以下,“L”代表生長抑制率未達40%,“ND”代表無法算出生長抑制率。又,表中之編號欄之“無處理”,代表不含本發明化合物或喹啉系化合物。[Test Example 1] Antibacterial test of Septoria tritici and Botrytis cinerera using dimethylsulfene to produce the compounds of the present invention and quinoline compounds (2) -1, (2) 1000 ppm solution of -2, (2) -3, (2) -4. Then, an appropriate amount of each of the 1000 ppm dimethylarsine solution of each compound and the spore suspension of each pathogenic bacteria (cell density 1 × 10 5 cells / mL) was dispensed one by one into a 96-well microtiter plate and mixed to make the active ingredients The final concentration is 10 ppm of the compound of the present invention, or 10 ppm of a quinoline compound, or a combination thereof. The microtiter plate was cultured in a closed container at a dark temperature of 18 ° C, and the proliferation degree of the bacteria in the drug-treated area and the drug-free treatment area was measured after 0 to 7 days. Calculate the growth inhibition rate of the bacteria caused by the chemical treatment according to the following calculation formula. Growth inhibition rate = (1-proliferation degree in the drug treatment area / proliferation degree in the drug-free treatment area) × 100 The results of the antibacterial test on the combination of the compound of the present invention and a quinoline compound are shown in Table 6, Table 7, Table 8, and Table 9 (wheat blight of wheat), and Tables 10, 11, 12, and 13 (gray mildew). In the table, "H" represents a growth inhibition rate greater than 75%, "M" represents a growth inhibition rate of 40% to 75%, "L" represents a growth inhibition rate of less than 40%, and "ND" represents a failure to calculate growth inhibition. rate. In addition, "No treatment" in the numbered column in the table means that the compound of the present invention or the quinoline-based compound is not included.

【表133】 [Table 133]

【表134】 [Table 134]

【表135】 [Table 135]

【表136】 [Table 136]

【表137】 [Table 137]

【表138】 [Table 138]

【表139】 [Table 139]

【表140】 [Table 140]

[試驗例2] 病害防除試驗 本試驗例中,實施喹啉系化合物(2)-2、(2)-3、(2)-4之對於番茄灰黴病(記為GM)、稻稻熱病(記為B)、黃瓜炭疽病(記為A)、蘋果黑星病(記為AS)、結球甘藍黑褐病(記為CA)之防除試驗。以下揭示試驗方法之詳情。[Test Example 2] Disease control test In this test example, quinoline compounds (2) -2, (2) -3, and (2) -4 were applied to tomato gray mold disease (denoted as GM) and rice fever (Denoted as B), cucumber anthracnose (denoted as A), apple scab (denoted as AS), and control of cabbage brown disease (denoted as CA). Details of the test method are disclosed below.

(番茄灰黴病:GM) 播種供試植物(番茄品種:大型福壽)後,栽培直到本葉展開3片。試驗係散布以蒸餾水稀釋各化合物成為50ppm之濃度的稀釋液。對於散布1日後之苗噴霧接種灰黴病菌(Botrytis cinerea)之分生胞子後,在室溫20~23℃之接種室放置約48小時,促進發病。檢查接種2日後之發病程度,並評價其效果。 (稻稻熱病:B) 播種供試植物(稻品種:幸風),栽培直到第2葉展開為止。試驗係散布經蒸餾水稀釋成各化合物為50ppm之濃度的稀釋液。對於散布1日後之苗噴霧接種稻稻熱病菌(Magnaporthe grisea)之分生胞子後,在室溫20~23℃之接種室放置約24小時,促進發病。檢查接種10日後之發病程度,評價其效果。 (黃瓜炭疽病:A) 播種供試植物(黃瓜品種:相模半白)後,栽培直到本葉展開1片為止。試驗係散布經蒸餾水稀釋成各化合物為50ppm之濃度的稀釋液。。對於散布1日後之苗噴霧接種黃瓜碳疽病菌(Colletotrichum orbiculare)之分生胞子後,在室溫為20~23℃之接種室放置約24小時,促進發病。檢查接種10日後之發病程度,評價其效果。 (蘋果黑星病:AS) 播種供試植物(蘋果品種:王林)後,栽培直到本葉展開4片為止。試驗係散布經蒸餾水稀釋成各化合物為50ppm之濃度的稀釋液。對於散布1日後之苗噴霧接種蘋果黑星病菌(Venturia inaequalis)之分生胞子後,在室溫18~20℃之接種室放置約24小時,促進發病。檢查接種10日後之發病程度,評價其效果。 (結球甘藍黑褐病:CA) 播種供試植物(結球甘藍品種:四季穫)後,栽培直到子葉展開為止。試驗係散布經蒸餾水稀釋成各化合物為250ppm之濃度的稀釋液。對於散布1日後之苗噴霧接種結球甘藍黑褐病菌(Alternaria brassicicola)之分生胞子後,在室溫20~23℃之接種室放置約48小時,促進發病。檢查接種2日後之發病程度,評價其效果。(Tomato gray mold: GM) After planting the test plants (tomato varieties: large-scale Fushou), the plants were cultivated until the leaf was expanded to 3 pieces. In the test, a diluted solution in which each compound was diluted with distilled water to a concentration of 50 ppm was spread. After the seedlings were sprayed for 1 day, the conidia of Botrytis cinerea were spray-inoculated, and then placed in an inoculation room at a room temperature of 20 to 23 ° C for about 48 hours to promote disease. The degree of disease onset 2 days after the inoculation was checked and the effect was evaluated. (Rice fever: B) Test plants (rice varieties: Xingfeng) are sown and cultivated until the second leaf is opened. In the test, a diluent diluted with distilled water to a concentration of 50 ppm for each compound was dispersed. After spraying the seedlings 1 day after inoculation with conidia of Magnaporthe grisea, the seedlings were placed in an inoculation room at a room temperature of 20 to 23 ° C for about 24 hours to promote disease. The degree of disease onset 10 days after the inoculation was checked and the effect was evaluated. (Cucumber anthracnose: A) After the test plants (cucumber varieties: Sagami half white) were sown, they were cultivated until the leaf was expanded to one piece. In the test, a diluent diluted with distilled water to a concentration of 50 ppm for each compound was dispersed. . After spraying the seedlings 1 day after inoculation, the conidia of Colletotrichum orbiculare were spray-inoculated, and then placed in an inoculation room at a room temperature of 20 to 23 ° C for about 24 hours to promote disease. The degree of disease onset 10 days after the inoculation was checked and the effect was evaluated. (Apple scab: AS) After the test plant (Apple variety: Wang Lin) was sown, it was cultivated until the leaf was expanded to 4 pieces. In the test, a diluent diluted with distilled water to a concentration of 50 ppm for each compound was dispersed. After spraying the seedlings 1 day after inoculation with the conidia of Venturia inaequalis, the seedlings were placed in an inoculation room at room temperature 18-20 ° C for about 24 hours to promote disease. The degree of disease onset 10 days after the inoculation was checked and the effect was evaluated. (Cabbage dark brown disease: CA) After the test plants (cabbage varieties: obtained in four seasons) were sown, they were cultivated until the cotyledons developed. The test was carried out by diluting a dilute solution with distilled water to a concentration of 250 ppm for each compound. After spraying the seedlings 1 day after inoculation with conidia of Brassica oleracea (Alternaria brassicicola), the seedlings were placed in an inoculation room at a room temperature of 20 to 23 ° C for about 48 hours to promote disease. The degree of morbidity after 2 days of inoculation was checked and the effect was evaluated.

針對以上列方法評價之病害防除試驗,以下列指標評價發病程度。又,防除價係從發病程度算出。 [發病程度] 0:無發病 0.1:發病面積為3%左右 0.3:發病面積為10%左右 0.8:發病面積為25%左右 1.5:發病面積為50%左右 2:發病面積為70%左右 3:發病面積為95%以上 [防除價] 防除價=100{1-(n/N)} N=無處理區之發病程度,n=各區之發病程度 喹啉系化合物之防除試驗之結果,對於番茄灰黴病、稻稻熱病、黃瓜炭疽病、蘋果黑星病、結球甘藍黑褐病,化合物(2)-2、(2)-3、(2)-4顯示防除價95%以上之高防除效果。For the disease control tests evaluated by the methods listed above, the following indicators were used to evaluate the incidence of disease. In addition, the control price is calculated from the degree of onset. [Degree of incidence] 0: no incidence 0.1: incidence area is about 3% 0.3: incidence area is approximately 10% 0.8: incidence area is approximately 25% 1.5: incidence area is approximately 50% 2: incidence area is approximately 70% 3: The area of disease is more than 95% [control price] Control price = 100 {1- (n / N)} N = the degree of disease in the untreated area, n = the degree of disease in each area The results of the control test of quinoline compounds. Tomato gray mold, rice fever, cucumber anthracnose, apple scab, black cabbage brown disease, compounds (2) -2, (2) -3, (2) -4 show control prices above 95% Control effect.

[試驗例3] 對於各種病原菌之抗菌試驗 依和試驗例1同樣的方法、同樣的濃度,測定喹啉系化合物之對於黃瓜蔓割病菌(Fusarium oxysporum f.sp. cucumerinum)、炭疽病菌(Glomerella cingulata)、稻芝麻葉枯病菌(Cochlobolus miyabeanus)、葡萄黑頭病菌(Elinoe ampelina)之抗菌活性。 喹啉系化合物之抗菌試驗之結果,對於黃瓜蔓割病菌、炭疽病菌、稻芝麻葉枯病菌、葡萄黑頭病菌,化合物(2)-2、(2)-3、(2)-4完全地抑制各病原菌之生長。 [產業利用性][Test Example 3] The antibacterial test against various pathogenic bacteria was performed in the same manner and at the same concentration as in Test Example 1. The quinoline-based compounds were tested against Fusarium oxysporum f.sp. cucumerinum and Glomerella cingulata. ), The antibacterial activity of rice sesame leaf blight (Cochlobolus miyabeanus), grape black head (Elinoe ampelina). As a result of the antibacterial test of quinoline-based compounds, compounds (2) -2, (2) -3, (2) -4 were completely inhibited against C. spp. The growth of various pathogenic bacteria. [Industrial availability]

本發明之有害生物防除組成物及新穎喹啉系化合物,顯示優良的有害生物防除效果,故就農藥而言有利用價値。The pest control composition and the novel quinoline-based compound of the present invention exhibit excellent pest control effects, and therefore have a utilization value in terms of pesticides.

Claims (14)

一種有害生物防除組成物,含有式(1)表示之吡啶酮化合物或其鹽、及選自式(2a)及式(2b)表示之喹啉系化合物或其鹽中之1種以上之成分作為有效成分; [化1][式中,R1,表示 羥基、 氰基、 亦可經取代基A適當取代之C1~C6之烷基、 C1~C6之鹵烷基、 亦可經取代基A適當取代之C3~C8之環烷基、 亦可經取代基A適當取代之C2~C6之烯基、 C2~C6之鹵烯基、 亦可經取代基A適當取代之C2~C6之炔基、 C2~C6之鹵炔基、 亦可經取代基A適當取代之C1~C6之烷氧基、 C1~C6之鹵烷氧基、 亦可經取代基A適當取代之C3~C8之環烷氧基、 亦可經取代基A適當取代之C2~C6之烯氧基、 C2~C6之鹵烯氧基、 亦可經取代基A適當取代之C3~C6之炔氧基、 C3~C6之鹵炔氧基、 或R10R11N-,在此,R10及R11各自獨立地表示氫原子、或C1~C6之烷基; R2,表示 鹵素原子、 羥基、 氰基、 硝基、 亦可經取代基B適當取代之C1~C6之烷基、 C1~C6之鹵烷基、 亦可經取代基B適當取代之C3~C8之環烷基、 亦可經取代基B適當取代之C2~C6之烯基、 C2~C6之鹵烯基、 亦可經取代基B適當取代之C2~C6之炔基、 C2~C6之鹵炔基、 亦可經取代基B適當取代之C1~C6之烷氧基、 C1~C6之鹵烷氧基、 亦可經取代基B適當取代之C3~C8之環烷氧基、 亦可經取代基B適當取代之C2~C6之烯氧基、 C2~C6之鹵烯氧基、 亦可經取代基B適當取代之C3~C6之炔氧基、 C3~C6之鹵炔氧基、 R20C(=O)-,在此,R20為C1~C6之烷基、C1~C6之鹵烷基、C3~C8之環烷基、C1~C6之烷氧基、C1~C6之鹵烷氧基、C3~C8之環烷氧基、或R21R22N-,在此,R21及R22各自獨立地表示氫原子、亦可經取代基B1適當取代之C1~C6之烷基、C1~C6之鹵烷基、或C3~C8之環烷基、或表示R21及R22和鍵結之氮原子成為一體而形成氮丙啶基、四氫吖唉基、吡咯啶基、哌啶基、高哌啶基、或氮雜環辛烷基者、 R20C(=O)O-,在此,R20同前述含義、 含有1~2個氧原子之3~6員環之基、 R23-L2-,在此,R23表示C1~C6之烷基、或C1~C6之鹵烷基,L2表示S、SO、或SO2 、 R21R22N-,在此,R21及R22同前述含義、 或R24C(=O)N(R25)-,在此,R24表示氫原子、C1~C6之烷基、C1~C6之鹵烷基、C3~C8之環烷基、C1~C6之烷氧基、C1~C6之鹵烷氧基、C3~C8之環烷氧基、或R21R22N-,在此,R21及R22同前述含義,R25表示氫原子、亦可經取代基B1適當取代之C1~C6之烷基、C1~C6之鹵烷基、或C3~C8之環烷基; R3,表示 氫原子、 鹵素原子、 硝基、 亦可經取代基C適當取代之C1~C6之烷基、 C1~C6之鹵烷基、 亦可經取代基C適當取代之C3~C8之環烷基、 亦可經取代基C適當取代之C1~C6之烷氧基、 C1~C6之鹵烷氧基、 亦可經取代基C適當取代之C2~C6之烯基、 C2~C6之鹵烯基、 亦可經取代基C適當取代之C2~C6之炔基、 C2~C6之鹵炔基、 R30-L3-,在此,R30同前述R23含義、L3同前述L2含義、 R31R32N-,在此,R31及R32同前述R21及R22之含義、 或R33C(=O)-,在此,R33表示C1~C6之烷基、C1~C6之鹵烷基、或C3~C8之環烷基; n為0~5之整數,惟n為2以上時,2以上之R2表示各自獨立的取代基; X表示氧原子、或硫原子; Y表示苯基、吡啶基、嗒基、嘧啶基、吡基、三基、四基、噻吩基、噻唑基、異噻唑基、或噻二唑基, 該苯基中,取代基D取代在鄰位,進而經取代基D1各自獨立地有適當0~4個取代, 該吡啶基、該吡基、該嘧啶基、該嗒基、該三基、或該四基中,取代基D取代在鄰位,且進而經取代基D1各自獨立而有適當0~3個取代, 該噻吩基、該噻唑基、該異噻唑基、或該噻二唑基中,取代基D取代在鄰位,且經取代基D1各自獨立地有適當0~2個取代; 含有破折線部之鍵結,代表雙鍵、或單鍵, 且取代基A,表示選自由羥基、氰基、C3~C8之環烷基、C1~C6之烷氧基、C1~C6之鹵烷氧基、C3~C8之環烷氧基、R12R13N-、及R14-L1-(在此,R12及R13各自獨立地表示氫原子、C1~C6之烷基、C1~C6之鹵烷基、或C3~C8之環烷基、或表示R12及R13和鍵結之氮原子成為一體而形成氮丙啶基、四氫吖唉基、吡咯啶基、哌啶基、高哌啶基、或氮雜環辛烷基者,在此,R14表示C1~C6之烷基、或C1~C6之鹵烷基,L1表示S、SO、或SO2 )構成之群組中之至少1種; 取代基B,表示選自由羥基、氰基、C3~C8之環烷基、C1~C6之烷氧基、C1~C6之鹵烷氧基、C3~C8之環烷氧基、C2~C6之烷氧基烷氧基、R21R22N-(在此,R21及R22同前述含義)、R23-L2-(在此,R23及L2同前述含義)、R26R27R28Si-(在此,R26、R27及R28,各自獨立地表示C1~C6之烷基)、R26R27R28Si-(CH2 )s-O-(在此,s表示1~3之整數,R26、R27及R28同前述含義)、R20C(=O)-(在此,R20同前述含義)、及含有1~2個氧原子之3~6員環之基構成之群組中之至少1種; 取代基B1,表示選自由氰基、C1~C6之烷氧基、C1~C6之鹵烷氧基、及C3~C8之環烷氧基構成之群組中之至少1種; 取代基C,表示選自由羥基、氰基、C3~C8之環烷基、C1~C6之烷氧基、C1~C6之鹵烷氧基、C3~C8之環烷氧基、R31R32N-(在此,R31及R32同前述R21及R22之含義)、及R30-L3-(在此,R30同前述R14之含義、L3同前述L1之含義)構成之群組中之至少1種; 取代基D,選自由鹵素原子、C1~C6之烷基、C1~C6之鹵烷基、C1~C6之烷氧基、及C1~C6之鹵烷氧基構成之群組中之至少1種; 取代基D1,選自由羥基、鹵素原子、C1~C6之烷基、C1~C6之鹵烷基、C3~C8之環烷基、C1~C6之烷氧基、C1~C6之鹵烷氧基、及C3~C8之環烷氧基構成之群組中之至少1種; [化2][式中,R2a及R2b各自獨立地表示 亦可經取代基E1適當取代之C1~C6之烷基、 亦可經取代基E2適當取代之芳基、 亦可經取代基E3適當取代之雜芳基、 或亦可經取代基E2適當取代之芳烷基、 或也可R2a與R2b與它們所鍵結之碳原子成為一體而形成亦可經取代基E4適當取代之C3~C10之環烷基環; R2c及R2d各自獨立地表示 氫原子、 亦可經取代基E1適當取代之C1~C6之烷基、 鹵素原子、 C1~C6之烷氧基、 或羥基、 或也可R2c與R2d與它們所鍵結之碳原子成為一體而形成羰基或亦可經取代基E4適當取代之C3~C10之環烷基環; R2e,表示 氫原子、 C2~C7之醯基、 或亦可經取代基E1適當取代之C1~C6之烷基; X1,表示 鹵素原子、 亦可經取代基E5適當取代之C1~C6之烷基、 亦可經取代基E6適當取代之C2~C6之烯基、 亦可經取代基E7適當取代之C2~C6之炔基、 亦可經取代基E2適當取代之芳基、 亦可經取代基E3適當取代之雜芳基、 C1~C6之烷氧基、 亦可經取代基E8適當取代之胺基、 C2~C7之醯基、 氰基、 或也可經取代基E9取代羥基之氫原子之N-羥基烷醯亞胺基; X2表示鹵素原子、C1~C6之烷基、C1~C6之烷氧基或羥基, n1表示0~4之整數、 n2表示0~6之整數、 取代基E1,表示選自由鹵素原子、C1~C6之烷氧基、C1~C6之烷基硫基及苯氧基構成之群組中之至少1種; 取代基E2,表示選自由鹵素原子、C1~C6之烷基、C1~C6之鹵烷基、C1~C6之烷氧基、亦可經取代基E8適當取代之胺基、硝基、氰基、羥基、巰基及C1~C6之烷基硫基構成之群組中之至少1種; 取代基E3,表示選自由鹵素原子、C1~C6之烷基、C1~C6之鹵烷基及C1~C6之烷氧基構成之群組中之至少1種; 取代基E4,表示選自由鹵素原子、C1~C6之烷基、C1~C6之烷氧基及苯氧基構成之群組中之至少1種; 取代基E5,表示選自由鹵素原子、C1~C6之烷氧基、羥基、C2~C7之烷氧基羰基及苯氧基構成之群組中之至少1種; 取代基E6,表示選自由鹵素原子、C1~C6之烷氧基、C2~C7之烷氧基羰基及苯氧基構成之群組中之至少1種; 取代基E7,表示選自由鹵素原子、C1~C6之烷氧基及苯氧基構成之群組中之至少1種; 取代基E8,表示選自由C1~C6之烷基及C2~C7之醯基構成之群組中之至少1種; 取代基E9,表示選自由C1~C6之烷基、C2~C6之烯基、C2~C6之炔基、芳烷基、芳基及雜芳基構成之群組中之至少1種]。A pest control composition comprising, as a pyridone compound or a salt thereof represented by the formula (1), one or more components selected from the group consisting of a quinoline compound or a salt thereof represented by the formula (2a) and the formula (2b) Active ingredient [In the formula, R1 represents a hydroxyl group, a cyano group, a C1-C6 alkyl group which may be appropriately substituted by a substituent A, a C1-C6 haloalkyl group, and a C3-C8 ring which may also be appropriately substituted by a substituent A. Alkyl, C2 to C6 alkenyl, which may be appropriately substituted with substituent A, C2 to C6 haloalkenyl, C2 to C6 alkynyl, which may be appropriately substituted with substituent A, C2 to C6 haloalkynyl , C1 ~ C6 alkoxy groups that can be appropriately substituted with substituent A, C1 ~ C6 haloalkoxy groups, C3 ~ C8 cycloalkoxy groups that can also be appropriately substituted with substituent A, or substituents C2 ~ C6 alkenyloxy, C2 ~ C6 haloalkenyloxy suitably substituted by A, C3 ~ C6 alkynyloxy optionally substituted by substituent A, C3 ~ C6 haloalkynyloxy, or R10R11N- Here, R10 and R11 each independently represent a hydrogen atom or an alkyl group of C1 to C6; R2 represents a halogen atom, a hydroxyl group, a cyano group, a nitro group, or a C1 to C6 alkane which may be appropriately substituted by a substituent B Group, C1 to C6 haloalkyl group, C3 to C8 cycloalkyl group which may be appropriately substituted with substituent B, C2 to C6 alkenyl group which may be appropriately substituted with substituent B, and C2 to C6 haloalkenyl group C2 ~ C6 alkynes which can also be appropriately substituted by substituent B , C2 ~ C6 haloalkynyl, C1 ~ C6 alkoxy which can be appropriately substituted by substituent B, C1 ~ C6 haloalkoxy, and C3 ~ C8 cycloalkane which can also be appropriately substituted by substituent B Oxygen, C2 ~ C6 alkenyloxy, which may be appropriately substituted by substituent B, haloalkenoxy of C2 ~ C6, alkynyloxy of C3 ~ C6, which may also be appropriately substituted by substituent B, C3 ~ C6 Haloalkynyloxy, R20C (= O)-, where R20 is C1 ~ C6 alkyl, C1 ~ C6 haloalkyl, C3 ~ C8 cycloalkyl, C1 ~ C6 alkoxy, C1 ~ C6 haloalkoxy, C3 to C8 cycloalkoxy, or R21R22N-. Here, R21 and R22 each independently represent a hydrogen atom, and C1 to C6 alkyl, C1 which may be appropriately substituted by substituent B1. A haloalkyl group of ~ C6, or a cycloalkyl group of C3 ~ C8, or R21 and R22 and a bonded nitrogen atom are integrated to form aziridinyl, tetrahydroazetino, pyrrolidinyl, piperidinyl, Homopiperidinyl, or azaoctyl, R20C (= O) O-, where R20 has the same meaning as above, a 3- to 6-membered ring group containing 1 to 2 oxygen atoms, R23-L2- where, R23 represents alkyl group of C1 ~ C6, or haloalkyl of C1 ~ C6, L2 represents S, SO, or SO 2, R21R22N-, here, R 21 and R22 have the same meanings as above, or R24C (= O) N (R25)-, where R24 represents a hydrogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group, C1 to C6 alkoxy, C1 to C6 haloalkoxy, C3 to C8 cycloalkoxy, or R21R22N-. Here, R21 and R22 have the same meanings as above, R25 represents a hydrogen atom, and may also be substituted. B1 appropriately substituted C1-C6 alkyl, C1-C6 haloalkyl, or C3-C8 cycloalkyl; R3 represents a hydrogen atom, a halogen atom, a nitro group, or C1 that may be appropriately substituted by a substituent C ~ C6 alkyl, C1 ~ C6 haloalkyl, C3 ~ C8 cycloalkyl which can be appropriately substituted by substituent C, C1 ~ C6 alkoxy which can also be appropriately substituted by substituent C, C1 ~ C6 haloalkoxy, C2 to C6 alkenyl, which may be appropriately substituted with substituent C, C2 to C6 haloalkenyl, C2 to C6 alkynyl, which may be appropriately substituted with substituent C, C2 to C6 Haloalkynyl, R30-L3-, where R30 has the meaning of the aforementioned R23, L3 has the meaning of the aforementioned L2, R31R32N-, and here, R31 and R32 have the meaning of the aforementioned R21 and R22, or R33C (= O)-, Here, R33 represents an alkyl group of C1 to C6, a haloalkyl group of C1 to C6, or a cycloalkyl group of C3 to C8; n is 0 to 5 Integer, but when n is 2 or more, two or more of R2 each independently represents a substituent group; X represents an oxygen atom or a sulfur atom; Y represents phenyl, pyridyl, despair Base, pyrimidinyl, pyridine Base, three Base, four Group, thienyl group, thiazolyl group, isothiazolyl group, or thiadiazolyl group, in the phenyl group, the substituent D is substituted in the ortho position, and further, each of the substituents D1 independently has appropriate 0 to 4 substitutions, and the pyridyl group The pyridine Group, the pyrimidinyl group, the da Base, the three Base, or the four In the group, the substituent D is substituted in the ortho position, and further, each of the substituents D1 is independently substituted with appropriate 0 to 3 substitutions. The group D is substituted in the ortho position, and each of the substituents D1 independently has appropriate 0 to 2 substitutions; the bond containing a dashed line portion represents a double bond or a single bond, and the substituent A is selected from the group consisting of a hydroxyl group and a cyanide Group, C3 to C8 cycloalkyl, C1 to C6 alkoxy, C1 to C6 haloalkoxy, C3 to C8 cycloalkoxy, R12R13N-, and R14-L1- (here, R12 and R13 each independently represents a hydrogen atom, a C1 to C6 alkyl group, a C1 to C6 haloalkyl group, or a C3 to C8 cycloalkyl group, or R12 and R13 and a bonded nitrogen atom to form an aziridine. Group, tetrahydroacryl group, pyrrolidinyl, piperidinyl, homopiperidinyl, or azaoctyl group, where R14 represents a C1-C6 alkyl group or a C1-C6 haloalkyl group L1 represents at least one of the group consisting of S, SO, or SO 2 ); Substituent B represents a group selected from the group consisting of hydroxy, cyano, cycloalkyl from C3 to C8, alkoxy from C1 to C6, C1 ~ C6 haloalkoxy, C3 ~ C8 cycloalkoxy, C2 ~ C 6 alkoxyalkoxy, R21R22N- (here, R21 and R22 have the same meaning as above), R23-L2- (here, R23 and L2 have the same meaning as above), R26R27R28Si- (here, R26, R27, and R28 , Each independently represents an alkyl group of C1 to C6), R26R27R28Si- (CH 2 ) sO- (here, s represents an integer of 1 to 3, R26, R27 and R28 have the same meanings as above), R20C (= O)-( Here, R20 has the same meaning as above) and at least one member of the group consisting of a 3 to 6-membered ring containing 1 to 2 oxygen atoms; the substituent B1 represents a alkane selected from the group consisting of cyano and C1 to C6 At least one of the group consisting of oxy, C1 to C6 haloalkoxy, and C3 to C8 cycloalkoxy; the substituent C represents a cycloalkyl group selected from hydroxy, cyano, and C3 to C8 , C1 ~ C6 alkoxy, C1 ~ C6 haloalkoxy, C3 ~ C8 cycloalkoxy, R31R32N- (here, R31 and R32 have the same meaning as R21 and R22 mentioned above), and R30-L3- (Herein, R30 has the meaning of R14 and L3 has the meaning of L1 above); at least one of the group consisting of: D is selected from a halogen atom, an alkyl group of C1 to C6, and a haloalkane of C1 to C6 Group, at least one of the group consisting of C1 ~ C6 alkoxy group and C1 ~ C6 haloalkoxy group; substituent D1, Selected from the group consisting of hydroxyl, halogen atom, C1-C6 alkyl, C1-C6 haloalkyl, C3-C8 cycloalkyl, C1-C6 alkoxy, C1-C6 haloalkoxy, and C3- At least one member of the group consisting of cycloalkoxy groups of C8; [In the formula, R2a and R2b each independently represent an alkyl group of C1 to C6 which may be appropriately substituted by the substituent E1, an aryl group which may be appropriately substituted by the substituent E2, and a heteroaryl group which may be appropriately substituted by the substituent E3. Group, or an aralkyl group which may be appropriately substituted by the substituent E2, or R2a and R2b may be integrated with the carbon atom to which they are bonded to form a cycloalkyl group of C3 to C10 which may also be appropriately substituted by the substituent E4 Ring; R2c and R2d each independently represent a hydrogen atom, an alkyl group of C1 to C6 which may also be appropriately substituted by a substituent E1, a halogen atom, an alkoxy group of C1 to C6, or a hydroxyl group, or R2c and R2d may be used with them The bonded carbon atoms become one to form a carbonyl group or a cycloalkyl ring of C3 ~ C10 which can also be appropriately substituted by the substituent E4; R2e represents a hydrogen atom, a fluorenyl group of C2 ~ C7, or it may also be substituted by E1 Appropriately substituted C1 to C6 alkyl groups; X1 represents a halogen atom, C1 to C6 alkyl groups that may be appropriately substituted with substituent E5, C2 to C6 alkenyl groups that may also be appropriately substituted with substituent E6, or C2 ~ C6 alkynyl suitably substituted with substituent E7, aryl optionally substituted with substituent E2, and optionally substituted E3 Appropriately substituted heteroaryl, C1-C6 alkoxy groups, amine groups that may also be appropriately substituted with substituents E8, fluorenyl groups from C2-C7, cyano groups, or hydrogen atoms that may also be substituted with a substituent E9 N-hydroxyalkanoimide group; X2 represents a halogen atom, an alkyl group of C1 to C6, an alkoxy group or a hydroxyl group of C1 to C6, n1 represents an integer of 0 to 4, n2 represents an integer of 0 to 6, substituent E1 , Represents at least one selected from the group consisting of a halogen atom, an alkoxy group of C1 to C6, an alkylthio group of C1 to C6, and a phenoxy group; and the substituent E2 represents a group selected from a halogen atom, C1 to C6 Alkyl, C1 ~ C6 haloalkyl, C1 ~ C6 alkoxy, amine, nitro, cyano, hydroxy, mercapto, and C1 ~ C6 alkylthio At least one of the group consisting of; the substituent E3 represents at least one selected from the group consisting of a halogen atom, an alkyl group of C1 to C6, a haloalkyl group of C1 to C6, and an alkoxy group of C1 to C6 The substituent E4 represents at least one selected from the group consisting of a halogen atom, an alkyl group of C1 to C6, an alkoxy group of C1 to C6, and a phenoxy group; the substituent E5 represents a group selected from a halogen atom, C1 ~ C6 alkoxy At least one of the group consisting of a hydroxy group, a hydroxyl group, an alkoxycarbonyl group of C2 to C7, and a phenoxy group; the substituent E6 represents a group selected from a halogen atom, an alkoxy group of C1 to C6, and an alkoxy group of C2 to C7 At least one member of the group consisting of carbonyl and phenoxy groups; the substituent E7 represents at least one member selected from the group consisting of halogen atoms, alkoxy groups of C1 to C6, and phenoxy groups; the substituent group E8 , Represents at least one selected from the group consisting of C1 to C6 alkyl groups and C2 to C7 fluorenyl groups; the substituent E9 represents a group selected from C1 to C6 alkyl groups, C2 to C6 alkenyl groups, C2 to C6 is at least one member of the group consisting of alkynyl, aralkyl, aryl, and heteroaryl]. 如申請專利範圍第1項之有害生物防除組成物,其中,式(1)表示之吡啶酮化合物中, R1表示 氰基、 亦可經取代基A適當取代之C1~C6之烷基、 C1~C6之鹵烷基、 亦可經取代基A適當取代之C3~C8之環烷基、 亦可經取代基A適當取代之C2~C6之烯基、 C2~C6之鹵烯基、 亦可經取代基A適當取代之C2~C6之炔基、 或R10R11N-,在此,R10及R11各自獨立地表示氫原子、或C1~C6之烷基; R2,表示 鹵素原子、 羥基、 氰基、 亦可經取代基B適當取代之C1~C6之烷基、 C1~C6之鹵烷基、 亦可經取代基B適當取代之C1~C6之烷氧基、 C1~C6之鹵烷氧基、 亦可經取代基B適當取代之C3~C8之環烷氧基、 亦可經取代基B適當取代之C2~C6之烯氧基、 亦可經取代基B適當取代之C3~C6之炔氧基、 R20C(=O)O-(在此,R20表示C1~C6之烷基、C1~C6之鹵烷基、C3~C8之環烷基、C1~C6之烷氧基、C1~C6之鹵烷氧基、C3~C8之環烷氧基、或R21R22N-(在此,R21及R22各自獨立地表示氫原子、亦可經取代基B1適當取代之C1~C6之烷基、C1~C6之鹵烷基、或C3~C8之環烷基、或表示R21及R22和鍵結之氮原子成為一體而形成氮丙啶基、四氫吖唉基、吡咯啶基、哌啶基、高哌啶基、或氮雜環辛烷基者))、 或R23-L2-(在此,R23表示C1~C6之烷基、或C1~C6之鹵烷基,L2表示S、SO、或SO2 ); R3,表示 氫原子、 鹵素原子、 亦可經取代基C適當取代之C1~C6之烷基、 亦可經取代基C適當取代之C3~C8之環烷基、 亦可經取代基C適當取代之C1~C6之烷氧基、 亦可經取代基C適當取代之C2~C6之炔基、 或R30-L3-,在此,R30同前述R23含義、L3同前述L2含義; Y,為苯基、或吡啶基, 該苯基中,取代基D取代在鄰位,進而經取代基D1各自獨立地有適當0~4個取代, 該吡啶基中,取代基D取代在鄰位,且進而經取代基D1各自獨立而有適當0~3個取代。For example, in the pest control composition of the scope of application for patent, in the pyridone compound represented by the formula (1), R1 represents a cyano group, a C1-C6 alkyl group, and C1- C6 haloalkyl, C3 to C8 cycloalkyl which may be appropriately substituted with substituent A, C2 to C6 alkenyl which may be appropriately substituted with substituent A, C2 to C6 haloalkenyl, or C2 ~ C6 alkynyl, or R10R11N-, which is appropriately substituted by substituent A, where R10 and R11 each independently represent a hydrogen atom or an alkyl group of C1-C6; R2 represents a halogen atom, a hydroxyl group, a cyano group, or C1-C6 alkyl, C1-C6 haloalkyl, which may be appropriately substituted by substituent B, C1-C6 alkoxy, C1-C6 haloalkoxy, which may also be appropriately substituted by substituent B C3 ~ C8 cycloalkoxy groups which may be appropriately substituted with substituent B, C2 ~ C6 alkoxy groups which may be appropriately substituted with substituent B, and C3 ~ C6 alkynyloxy groups which may be appropriately substituted with substituent B , R20C (= O) O- (Here, R20 means C1 ~ C6 alkyl, C1 ~ C6 haloalkyl, C3 ~ C8 cycloalkyl, C1 ~ C6 alkoxy, C1 ~ C6 halogen Alkoxy, C3 ~ C8 cycloalkoxy, or R21R22N- ( Here, R21 and R22 each independently represent a hydrogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a C3-C8 cycloalkyl group, or R21 and R22, which can also be appropriately substituted by a substituent B1. Integrates with the bonded nitrogen atom to form aziridinyl, tetrahydroacryl, pyrrolidinyl, piperidinyl, homopiperidinyl, or azacyclooctyl)), or R23-L2- (Here, R23 represents an alkyl group of C1 to C6, or a haloalkyl group of C1 to C6, and L2 represents S, SO, or SO 2 ); R3 represents a hydrogen atom, a halogen atom, or may be appropriately substituted by a substituent C C1-C6 alkyl group, C3-C8 cycloalkyl group which may be appropriately substituted by the substituent C, C1-C6 alkoxy group which may also be appropriately substituted by the substituent C, and may also be appropriately substituted by the substituent C C2 ~ C6 alkynyl, or R30-L3-, where R30 has the same meaning as R23, and L3 has the same meaning as L2; Y is phenyl or pyridyl. In the pyridine group, the substituent D1 is substituted in the ortho position, and further in the pyridine group, the substituent D1 is independently substituted with appropriate 0 to 3 substitutions. 如申請專利範圍第2項之有害生物防除組成物,其中,式(1)表示之吡啶酮化合物中, R1表示亦可經取代基A適當取代之C1~C6之烷基、或C1~C6之鹵烷基; R2表示鹵素原子、亦可經取代基B適當取代之C1~C6之烷基、或亦可經取代基B適當取代之C1~C6之烷氧基; R3表示氫原子、鹵素原子、或亦可經取代基C適當取代之C1~C6之烷基。For example, in the pest control composition of the second scope of the patent application, among the pyridone compounds represented by formula (1), R1 represents a C1-C6 alkyl group or a C1-C6 alkyl group which can also be appropriately substituted by a substituent A. Haloalkyl; R2 represents a halogen atom, an alkyl group of C1 to C6 which may be appropriately substituted by substituent B, or an alkoxy group of C1 to C6 which may also be appropriately substituted by substituent B; R3 represents a hydrogen atom, a halogen atom Or a C1-C6 alkyl group which may be appropriately substituted by a substituent C. 如申請專利範圍第1項之有害生物防除組成物,其中, 式(2a)或式(2b)表示之喹啉系化合物中, R2a及R2b各自獨立地為亦可經取代基E1適當取代之C1~C6之烷基, R2c及R2d各自獨立地為氫原子、亦可經取代基E1適當取代之C1~C6之烷基或鹵素原子, R2e為氫原子或亦可經取代基E1適當取代之C1~C6之烷基, X1為鹵素原子, X2為鹵素原子, n1為0~4之整數, n2為0~6之整數。For example, in the pest control composition of the scope of patent application, in the quinoline-based compound represented by formula (2a) or formula (2b), R2a and R2b are each independently C1 which may be appropriately substituted by substituent E1. ~ C6 alkyl, R2c and R2d are each independently a hydrogen atom, an alkyl or halogen atom of C1 ~ C6 which may be appropriately substituted by substituent E1, R2e is a hydrogen atom or C1 which may also be appropriately substituted by substituent E1 An alkyl group of ~ C6, X1 is a halogen atom, X2 is a halogen atom, n1 is an integer of 0 to 4, and n2 is an integer of 0 to 6. 如申請專利範圍第1項之有害生物防除組成物,其中, 式(2a)或式(2b)表示之喹啉系化合物為式(2c)或式(2d)表示之喹啉系化合物; [化3][式中,R2f表示氫原子或甲基,X3、X4及X5各自獨立地表示氫原子或氟原子,X6及X7各自獨立地表示氫原子、甲基或氟原子]。For example, the pest control composition of the scope of application for patent, wherein the quinoline compound represented by formula (2a) or (2b) is a quinoline compound represented by formula (2c) or (2d); 3] [In the formula, R2f represents a hydrogen atom or a methyl group, X3, X4, and X5 each independently represent a hydrogen atom or a fluorine atom, and X6 and X7 each independently represent a hydrogen atom, a methyl group, or a fluorine atom]. 如申請專利範圍第4項之有害生物防除組成物,其中,式(2a)或式(2b)表示之喹啉系化合物係選自由3-(4,4-二氟-3,3-二甲基-3,4-二氫異喹啉-1-基)喹啉、3-(4,4-二氟-3,3-二甲基-3,4-二氫異喹啉-1-基)-8-氟喹啉、8-氟-3-(5-氟-3,3,4,4-四甲基-1,2,3,4-四氫異喹啉-1-基)喹啉及8-氟-3-(5-氟-3,3-二甲基-3,4-二氫異喹啉-1-基)喹啉構成之群組中之至少1種。For example, the pest control composition of claim 4 in which the quinoline compound represented by formula (2a) or (2b) is selected from 3- (4,4-difluoro-3,3-dimethyl -3,4-dihydroisoquinolin-1-yl) quinoline, 3- (4,4-difluoro-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl ) -8-fluoroquinoline, 8-fluoro-3- (5-fluoro-3,3,4,4-tetramethyl-1,2,3,4-tetrahydroisoquinolin-1-yl) quine And at least one member of the group consisting of 8-fluoro-3- (5-fluoro-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl) quinoline. 一種防除有害生物之方法,係施用如申請專利範圍第1項之有害生物防除組成物。A method for controlling pests is to apply a pest control composition such as the one in the scope of patent application. 一種防除有害生物之方法,係同時施用含有如申請專利範圍第1項之式(1)表示之吡啶酮化合物或其鹽作為有效成分之組成物、及含有如申請專利範圍第1項之式(2a)或式(2b)表示之喹啉系化合物或其鹽作為有效成分之組成物。A method for controlling pests is to simultaneously apply a composition containing a pyridone compound or a salt thereof represented by formula (1) as set forth in item 1 of the scope of patent application as an active ingredient, and a composition containing the formula as set forth in item 1 of the scope of patent application A composition in which a quinoline compound or a salt thereof represented by Formula 2a) or Formula (2b) is an active ingredient. 一種防除有害生物之方法,係施用含有如申請專利範圍第1項之式(1)表示之吡啶酮化合物或其鹽作為有效成分之組成物、或含有如申請專利範圍第1項之式(2a)或式(2b)表示之喹啉系化合物或其鹽作為有效成分之組成物中之任一者後再施用另一者之組成物。A method for controlling pests by applying a composition containing, as an active ingredient, a pyridone compound or a salt thereof represented by formula (1) in item 1 of the scope of patent application, or containing formula (2a) in item 1 of scope of patent application ) Or a quinoline-based compound represented by formula (2b) or a salt thereof as an active ingredient, and then the other composition is applied. 一種喹啉系化合物或其鹽,係如申請專利範圍第5項之式(2c)或式(2d)表示之喹啉系化合物,R2f為氫原子或甲基,X3為氟原子,X4、X5、X6及X7各自獨立地為氫原子或氟原子,惟式(2c)中,X4、X5、X6或X7中之至少一者為氟原子,式(2d)中,X4或X5中任一者為氟原子。A quinoline-based compound or a salt thereof is a quinoline-based compound represented by formula (2c) or formula (2d) in item 5 of the scope of the patent application, R2f is a hydrogen atom or a methyl group, X3 is a fluorine atom, X4, X5 , X6 and X7 are each independently a hydrogen atom or a fluorine atom, but in formula (2c), at least one of X4, X5, X6 or X7 is a fluorine atom, and in formula (2d), any of X4 or X5 is Is a fluorine atom. 如申請專利範圍第10項之喹啉系化合物或其鹽,其中,式(2c)或式(2d)表示之喹啉系化合物為3-(4,4-二氟-3,3-二甲基-3,4-二氫異喹啉-1-基)-8-氟喹啉、8-氟-3-(5-氟-3,3,4,4-四甲基-1,2,3,4-四氫異喹啉-1-基)喹啉、或8-氟-3-(5-氟-3,3-二甲基-3,4-二氫異喹啉-1-基)喹啉。For example, a quinoline compound or a salt thereof according to item 10 of the application, wherein the quinoline compound represented by formula (2c) or formula (2d) is 3- (4,4-difluoro-3,3-dimethyl -3,4-dihydroisoquinolin-1-yl) -8-fluoroquinoline, 8-fluoro-3- (5-fluoro-3,3,4,4-tetramethyl-1,2, 3,4-tetrahydroisoquinolin-1-yl) quinoline, or 8-fluoro-3- (5-fluoro-3,3-dimethyl-3,4-dihydroisoquinolin-1-yl )quinoline. 如申請專利範圍第11項之喹啉系化合物或其鹽,其中,式(2c)或式(2d)表示之喹啉系化合物為3-(4,4-二氟-3,3-二甲基-3,4-二氫異喹啉-1-基)-8-氟喹啉或8-氟-3-(5-氟-3,3,4,4-四甲基-1,2,3,4-四氫異喹啉-1-基)喹啉。For example, a quinoline-based compound or a salt thereof according to item 11 of the application, wherein the quinoline-based compound represented by formula (2c) or formula (2d) is 3- (4,4-difluoro-3,3-dimethyl -3,4-dihydroisoquinolin-1-yl) -8-fluoroquinoline or 8-fluoro-3- (5-fluoro-3,3,4,4-tetramethyl-1,2, 3,4-tetrahydroisoquinolin-1-yl) quinoline. 一種防除有害生物之方法,包括下列步驟: 對於需要防除有害生物之植物個體、種子、土壤、苗箱、或穴盤施用有效量之如申請專利範圍第1項之式(I)之化合物或其鹽及式(2a)或式(2b)表示之喹啉系化合物或其鹽。A method for controlling pests, comprising the steps of: applying an effective amount of a compound of formula (I) as described in item 1 of the patent application scope, or a plant, seed, soil, seed box, or tray to which pest control is required; A salt and a quinoline-based compound represented by formula (2a) or formula (2b) or a salt thereof. 一種如申請專利範圍第1項之式(I)之化合物或其鹽及式(2a)或式(2b)表示之喹啉系化合物或其鹽之用途,係作為有害生物防除劑。The use of a compound of formula (I) or a salt thereof and a quinoline-based compound represented by formula (2a) or formula (2b) or a salt thereof as in item 1 of the scope of application for a patent is a pest control agent.
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