TW201839027A - Resin composition - Google Patents
Resin composition Download PDFInfo
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- TW201839027A TW201839027A TW107106497A TW107106497A TW201839027A TW 201839027 A TW201839027 A TW 201839027A TW 107106497 A TW107106497 A TW 107106497A TW 107106497 A TW107106497 A TW 107106497A TW 201839027 A TW201839027 A TW 201839027A
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- resin composition
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- 239000011342 resin composition Substances 0.000 title claims abstract description 117
- 239000003822 epoxy resin Substances 0.000 claims abstract description 41
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 41
- 239000011521 glass Substances 0.000 claims abstract description 29
- 150000001875 compounds Chemical class 0.000 claims abstract description 16
- 229920006295 polythiol Polymers 0.000 claims abstract description 12
- 230000035699 permeability Effects 0.000 claims description 29
- 239000000758 substrate Substances 0.000 claims description 25
- 239000005357 flat glass Substances 0.000 claims description 21
- 239000000463 material Substances 0.000 claims description 15
- 239000000565 sealant Substances 0.000 claims description 14
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 11
- 125000003700 epoxy group Chemical group 0.000 claims description 10
- 230000002093 peripheral effect Effects 0.000 claims description 10
- 239000000203 mixture Substances 0.000 abstract description 33
- -1 etc.) Chemical compound 0.000 description 26
- 238000003860 storage Methods 0.000 description 22
- 238000002156 mixing Methods 0.000 description 17
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 15
- 229920000768 polyamine Polymers 0.000 description 15
- 239000002245 particle Substances 0.000 description 13
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 10
- 239000004593 Epoxy Substances 0.000 description 9
- 238000011156 evaluation Methods 0.000 description 9
- 239000010408 film Substances 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 9
- 238000007789 sealing Methods 0.000 description 8
- 150000001412 amines Chemical class 0.000 description 7
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 7
- 239000011256 inorganic filler Substances 0.000 description 7
- 229910003475 inorganic filler Inorganic materials 0.000 description 7
- 239000007788 liquid Substances 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- JOBBTVPTPXRUBP-UHFFFAOYSA-N [3-(3-sulfanylpropanoyloxy)-2,2-bis(3-sulfanylpropanoyloxymethyl)propyl] 3-sulfanylpropanoate Chemical compound SCCC(=O)OCC(COC(=O)CCS)(COC(=O)CCS)COC(=O)CCS JOBBTVPTPXRUBP-UHFFFAOYSA-N 0.000 description 6
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 6
- 239000004202 carbamide Substances 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 6
- 150000003573 thiols Chemical class 0.000 description 6
- VTLHIRNKQSFSJS-UHFFFAOYSA-N [3-(3-sulfanylbutanoyloxy)-2,2-bis(3-sulfanylbutanoyloxymethyl)propyl] 3-sulfanylbutanoate Chemical compound CC(S)CC(=O)OCC(COC(=O)CC(C)S)(COC(=O)CC(C)S)COC(=O)CC(C)S VTLHIRNKQSFSJS-UHFFFAOYSA-N 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- 229910052623 talc Inorganic materials 0.000 description 5
- 230000009974 thixotropic effect Effects 0.000 description 5
- AJSTXXYNEIHPMD-UHFFFAOYSA-N triethyl borate Chemical compound CCOB(OCC)OCC AJSTXXYNEIHPMD-UHFFFAOYSA-N 0.000 description 5
- 102100027123 55 kDa erythrocyte membrane protein Human genes 0.000 description 4
- 101001057956 Homo sapiens 55 kDa erythrocyte membrane protein Proteins 0.000 description 4
- 239000007983 Tris buffer Substances 0.000 description 4
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 4
- 238000001879 gelation Methods 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 239000003381 stabilizer Substances 0.000 description 4
- 239000000454 talc Substances 0.000 description 4
- VZXTWGWHSMCWGA-UHFFFAOYSA-N 1,3,5-triazine-2,4-diamine Chemical compound NC1=NC=NC(N)=N1 VZXTWGWHSMCWGA-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- HECGKCOICWUUJU-UHFFFAOYSA-N bis(diphenylphosphanylmethyl)-phenylphosphane Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)CP(C=1C=CC=CC=1)CP(C=1C=CC=CC=1)C1=CC=CC=C1 HECGKCOICWUUJU-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 3
- 125000002883 imidazolyl group Chemical group 0.000 description 3
- 239000004615 ingredient Substances 0.000 description 3
- 239000004850 liquid epoxy resins (LERs) Substances 0.000 description 3
- 239000004843 novolac epoxy resin Substances 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 150000003512 tertiary amines Chemical class 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- HNHFTARXTMQRCF-UHFFFAOYSA-N 1,3,5-tris(3-sulfanylpropyl)-1,3,5-triazinane-2,4,6-trione Chemical compound SCCCN1C(=O)N(CCCS)C(=O)N(CCCS)C1=O HNHFTARXTMQRCF-UHFFFAOYSA-N 0.000 description 2
- YQMXOIAIYXXXEE-UHFFFAOYSA-N 1-benzylpyrrolidin-3-ol Chemical compound C1C(O)CCN1CC1=CC=CC=C1 YQMXOIAIYXXXEE-UHFFFAOYSA-N 0.000 description 2
- OEBXWWBYZJNKRK-UHFFFAOYSA-N 1-methyl-2,3,4,6,7,8-hexahydropyrimido[1,2-a]pyrimidine Chemical compound C1CCN=C2N(C)CCCN21 OEBXWWBYZJNKRK-UHFFFAOYSA-N 0.000 description 2
- IMQFZQVZKBIPCQ-UHFFFAOYSA-N 2,2-bis(3-sulfanylpropanoyloxymethyl)butyl 3-sulfanylpropanoate Chemical compound SCCC(=O)OCC(CC)(COC(=O)CCS)COC(=O)CCS IMQFZQVZKBIPCQ-UHFFFAOYSA-N 0.000 description 2
- KAJBSGLXSREIHP-UHFFFAOYSA-N 2,2-bis[(2-sulfanylacetyl)oxymethyl]butyl 2-sulfanylacetate Chemical compound SCC(=O)OCC(CC)(COC(=O)CS)COC(=O)CS KAJBSGLXSREIHP-UHFFFAOYSA-N 0.000 description 2
- JJSYPAGPNHFLML-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;3-sulfanylpropanoic acid Chemical compound OC(=O)CCS.OC(=O)CCS.OC(=O)CCS.CCC(CO)(CO)CO JJSYPAGPNHFLML-UHFFFAOYSA-N 0.000 description 2
- UUODQIKUTGWMPT-UHFFFAOYSA-N 2-fluoro-5-(trifluoromethyl)pyridine Chemical compound FC1=CC=C(C(F)(F)F)C=N1 UUODQIKUTGWMPT-UHFFFAOYSA-N 0.000 description 2
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 2
- ZSKYIYFZRRAFGB-UHFFFAOYSA-N 3-[4-[2-[4-(3-sulfanylpropoxy)phenyl]propan-2-yl]phenoxy]propane-1-thiol Chemical compound C=1C=C(OCCCS)C=CC=1C(C)(C)C1=CC=C(OCCCS)C=C1 ZSKYIYFZRRAFGB-UHFFFAOYSA-N 0.000 description 2
- LABQKWYHWCYABU-UHFFFAOYSA-N 4-(3-sulfanylbutanoyloxy)butyl 3-sulfanylbutanoate Chemical compound CC(S)CC(=O)OCCCCOC(=O)CC(C)S LABQKWYHWCYABU-UHFFFAOYSA-N 0.000 description 2
- VHYFNPMBLIVWCW-UHFFFAOYSA-N 4-Dimethylaminopyridine Chemical compound CN(C)C1=CC=NC=C1 VHYFNPMBLIVWCW-UHFFFAOYSA-N 0.000 description 2
- 229910002012 Aerosil® Inorganic materials 0.000 description 2
- 229940123208 Biguanide Drugs 0.000 description 2
- 229930185605 Bisphenol Natural products 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 2
- YAAUVJUJVBJRSQ-UHFFFAOYSA-N [3-(3-sulfanylpropanoyloxy)-2-[[3-(3-sulfanylpropanoyloxy)-2,2-bis(3-sulfanylpropanoyloxymethyl)propoxy]methyl]-2-(3-sulfanylpropanoyloxymethyl)propyl] 3-sulfanylpropanoate Chemical compound SCCC(=O)OCC(COC(=O)CCS)(COC(=O)CCS)COCC(COC(=O)CCS)(COC(=O)CCS)COC(=O)CCS YAAUVJUJVBJRSQ-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 239000004841 bisphenol A epoxy resin Substances 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical group I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 2
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000003094 microcapsule Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000012766 organic filler Substances 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 150000003335 secondary amines Chemical class 0.000 description 2
- LGQXXHMEBUOXRP-UHFFFAOYSA-N tributyl borate Chemical compound CCCCOB(OCCCC)OCCCC LGQXXHMEBUOXRP-UHFFFAOYSA-N 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- NHDIQVFFNDKAQU-UHFFFAOYSA-N tripropan-2-yl borate Chemical compound CC(C)OB(OC(C)C)OC(C)C NHDIQVFFNDKAQU-UHFFFAOYSA-N 0.000 description 2
- LTEHWCSSIHAVOQ-UHFFFAOYSA-N tripropyl borate Chemical compound CCCOB(OCCC)OCCC LTEHWCSSIHAVOQ-UHFFFAOYSA-N 0.000 description 2
- ZNAMMSOYKPMPGC-HTOAHKCRSA-N (2r,3r,4s,5r,6s)-2-(hydroxymethyl)-6-(2-phenylethylsulfanyl)oxane-3,4,5-triol Chemical compound O[C@@H]1[C@@H](O)[C@@H](O)[C@@H](CO)O[C@H]1SCCC1=CC=CC=C1 ZNAMMSOYKPMPGC-HTOAHKCRSA-N 0.000 description 1
- AILUJKZWHGGGRF-UHFFFAOYSA-M (4-methylphenyl)-triphenylphosphanium;thiocyanate Chemical compound [S-]C#N.C1=CC(C)=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 AILUJKZWHGGGRF-UHFFFAOYSA-M 0.000 description 1
- RUEBPOOTFCZRBC-UHFFFAOYSA-N (5-methyl-2-phenyl-1h-imidazol-4-yl)methanol Chemical compound OCC1=C(C)NC(C=2C=CC=CC=2)=N1 RUEBPOOTFCZRBC-UHFFFAOYSA-N 0.000 description 1
- POPHMOPNVVKGRW-UHFFFAOYSA-N 1,2,3,4,4a,5,6,7-octahydronaphthalene Chemical compound C1CCC2CCCCC2=C1 POPHMOPNVVKGRW-UHFFFAOYSA-N 0.000 description 1
- SSUJUUNLZQVZMO-UHFFFAOYSA-N 1,2,3,4,8,9,10,10a-octahydropyrimido[1,2-a]azepine Chemical compound C1CCC=CN2CCCNC21 SSUJUUNLZQVZMO-UHFFFAOYSA-N 0.000 description 1
- GIWQSPITLQVMSG-UHFFFAOYSA-N 1,2-dimethylimidazole Chemical compound CC1=NC=CN1C GIWQSPITLQVMSG-UHFFFAOYSA-N 0.000 description 1
- SQZCAOHYQSOZCE-UHFFFAOYSA-N 1-(diaminomethylidene)-2-(2-methylphenyl)guanidine Chemical compound CC1=CC=CC=C1N=C(N)N=C(N)N SQZCAOHYQSOZCE-UHFFFAOYSA-N 0.000 description 1
- JLPWQEHTPOFCPG-UHFFFAOYSA-N 1-(diaminomethylidene)-2-methylguanidine Chemical compound CN=C(N)N=C(N)N JLPWQEHTPOFCPG-UHFFFAOYSA-N 0.000 description 1
- UBJPWXQSHUPNPG-UHFFFAOYSA-N 1-(diaminomethylidene)-2-prop-2-enylguanidine Chemical compound NC(N)=NC(N)=NCC=C UBJPWXQSHUPNPG-UHFFFAOYSA-N 0.000 description 1
- FBHPRUXJQNWTEW-UHFFFAOYSA-N 1-benzyl-2-methylimidazole Chemical compound CC1=NC=CN1CC1=CC=CC=C1 FBHPRUXJQNWTEW-UHFFFAOYSA-N 0.000 description 1
- XZKLXPPYISZJCV-UHFFFAOYSA-N 1-benzyl-2-phenylimidazole Chemical compound C1=CN=C(C=2C=CC=CC=2)N1CC1=CC=CC=C1 XZKLXPPYISZJCV-UHFFFAOYSA-N 0.000 description 1
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 1
- PSYGHMBJXWRQFD-UHFFFAOYSA-N 2-(2-sulfanylacetyl)oxyethyl 2-sulfanylacetate Chemical compound SCC(=O)OCCOC(=O)CS PSYGHMBJXWRQFD-UHFFFAOYSA-N 0.000 description 1
- DJOYTAUERRJRAT-UHFFFAOYSA-N 2-(n-methyl-4-nitroanilino)acetonitrile Chemical compound N#CCN(C)C1=CC=C([N+]([O-])=O)C=C1 DJOYTAUERRJRAT-UHFFFAOYSA-N 0.000 description 1
- KQUNXVBQKPTWHM-UHFFFAOYSA-N 2-(oxiran-2-yl)-1-phenylethane-1,1-diamine Chemical compound C=1C=CC=CC=1C(N)(N)CC1CO1 KQUNXVBQKPTWHM-UHFFFAOYSA-N 0.000 description 1
- NKMOLEYVYVWWJC-UHFFFAOYSA-N 2-[2,4,6-trioxo-3,5-bis[2-(3-sulfanylbutanoyloxy)ethyl]-1,3,5-triazinan-1-yl]ethyl 3-sulfanylbutanoate Chemical compound CC(S)CC(=O)OCCN1C(=O)N(CCOC(=O)CC(C)S)C(=O)N(CCOC(=O)CC(C)S)C1=O NKMOLEYVYVWWJC-UHFFFAOYSA-N 0.000 description 1
- IOWPKEYIXBBDOQ-UHFFFAOYSA-N 2-[3-(trifluoromethyl)anilino]-3,7-dihydropurin-6-one Chemical compound FC(F)(F)C1=CC=CC(NC=2NC=3N=CNC=3C(=O)N=2)=C1 IOWPKEYIXBBDOQ-UHFFFAOYSA-N 0.000 description 1
- HJVAFZMYQQSPHF-UHFFFAOYSA-N 2-[bis(2-hydroxyethyl)amino]ethanol;boric acid Chemical compound OB(O)O.OCCN(CCO)CCO HJVAFZMYQQSPHF-UHFFFAOYSA-N 0.000 description 1
- USGCMNLQYSXCDU-UHFFFAOYSA-N 2-cyclohexyl-1-(diaminomethylidene)guanidine Chemical compound NC(N)=NC(N)=NC1CCCCC1 USGCMNLQYSXCDU-UHFFFAOYSA-N 0.000 description 1
- YTWBFUCJVWKCCK-UHFFFAOYSA-N 2-heptadecyl-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NC=CN1 YTWBFUCJVWKCCK-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- VWSLLSXLURJCDF-UHFFFAOYSA-N 2-methyl-4,5-dihydro-1h-imidazole Chemical compound CC1=NCCN1 VWSLLSXLURJCDF-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- FJNLCHNQVJVCPY-UHFFFAOYSA-N 2-n-methoxy-2-n-methyl-4-n,6-n-dipropyl-1,3,5-triazine-2,4,6-triamine Chemical compound CCCNC1=NC(NCCC)=NC(N(C)OC)=N1 FJNLCHNQVJVCPY-UHFFFAOYSA-N 0.000 description 1
- BKCCAYLNRIRKDJ-UHFFFAOYSA-N 2-phenyl-4,5-dihydro-1h-imidazole Chemical compound N1CCN=C1C1=CC=CC=C1 BKCCAYLNRIRKDJ-UHFFFAOYSA-N 0.000 description 1
- LLEASVZEQBICSN-UHFFFAOYSA-N 2-undecyl-1h-imidazole Chemical compound CCCCCCCCCCCC1=NC=CN1 LLEASVZEQBICSN-UHFFFAOYSA-N 0.000 description 1
- UIDDPPKZYZTEGS-UHFFFAOYSA-N 3-(2-ethyl-4-methylimidazol-1-yl)propanenitrile Chemical compound CCC1=NC(C)=CN1CCC#N UIDDPPKZYZTEGS-UHFFFAOYSA-N 0.000 description 1
- SESYNEDUKZDRJL-UHFFFAOYSA-N 3-(2-methylimidazol-1-yl)propanenitrile Chemical compound CC1=NC=CN1CCC#N SESYNEDUKZDRJL-UHFFFAOYSA-N 0.000 description 1
- BVYPJEBKDLFIDL-UHFFFAOYSA-N 3-(2-phenylimidazol-1-yl)propanenitrile Chemical compound N#CCCN1C=CN=C1C1=CC=CC=C1 BVYPJEBKDLFIDL-UHFFFAOYSA-N 0.000 description 1
- SZUPZARBRLCVCB-UHFFFAOYSA-N 3-(2-undecylimidazol-1-yl)propanenitrile Chemical compound CCCCCCCCCCCC1=NC=CN1CCC#N SZUPZARBRLCVCB-UHFFFAOYSA-N 0.000 description 1
- FAXDZWQIWUSWJH-UHFFFAOYSA-N 3-methoxypropan-1-amine Chemical compound COCCCN FAXDZWQIWUSWJH-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- CXXSQMDHHYTRKY-UHFFFAOYSA-N 4-amino-2,3,5-tris(oxiran-2-ylmethyl)phenol Chemical compound C1=C(O)C(CC2OC2)=C(CC2OC2)C(N)=C1CC1CO1 CXXSQMDHHYTRKY-UHFFFAOYSA-N 0.000 description 1
- XPEKVUUBSDFMDR-UHFFFAOYSA-N 4-methyl-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound CC1C=CCC2C(=O)OC(=O)C12 XPEKVUUBSDFMDR-UHFFFAOYSA-N 0.000 description 1
- TYOXIFXYEIILLY-UHFFFAOYSA-N 5-methyl-2-phenyl-1h-imidazole Chemical compound N1C(C)=CN=C1C1=CC=CC=C1 TYOXIFXYEIILLY-UHFFFAOYSA-N 0.000 description 1
- OEMSKMUAMXLNKL-UHFFFAOYSA-N 5-methyl-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C(C)=CCC2C(=O)OC(=O)C12 OEMSKMUAMXLNKL-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 229910002016 Aerosil® 200 Inorganic materials 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- FERIUCNNQQJTOY-UHFFFAOYSA-M Butyrate Chemical compound CCCC([O-])=O FERIUCNNQQJTOY-UHFFFAOYSA-M 0.000 description 1
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Natural products CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 1
- SJWWDQVPSBYKML-UHFFFAOYSA-N CCC(S)C(O)=O.CCC(S)C(O)=O.CCC(S)C(O)=O.CCC(CO)(CO)CO Chemical compound CCC(S)C(O)=O.CCC(S)C(O)=O.CCC(S)C(O)=O.CCC(CO)(CO)CO SJWWDQVPSBYKML-UHFFFAOYSA-N 0.000 description 1
- WGWDFXRSUWYLMV-UHFFFAOYSA-N CCCCCCCCCCCCN1C(C=CC=C2)=C2N=C1C.C1=CN=CN1 Chemical class CCCCCCCCCCCCN1C(C=CC=C2)=C2N=C1C.C1=CN=CN1 WGWDFXRSUWYLMV-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
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- OKKRPWIIYQTPQF-UHFFFAOYSA-N Trimethylolpropane trimethacrylate Chemical compound CC(=C)C(=O)OCC(CC)(COC(=O)C(C)=C)COC(=O)C(C)=C OKKRPWIIYQTPQF-UHFFFAOYSA-N 0.000 description 1
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- 239000011593 sulfur Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- VXUYXOFXAQZZMF-UHFFFAOYSA-N tetraisopropyl titanate Substances CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 1
- GHPYAGKTTCKKDF-UHFFFAOYSA-M tetraphenylphosphanium;thiocyanate Chemical compound [S-]C#N.C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 GHPYAGKTTCKKDF-UHFFFAOYSA-M 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- JMXKSZRRTHPKDL-UHFFFAOYSA-N titanium(IV) ethoxide Substances [Ti+4].CC[O-].CC[O-].CC[O-].CC[O-] JMXKSZRRTHPKDL-UHFFFAOYSA-N 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
- 125000005270 trialkylamine group Chemical group 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- BOOITXALNJLNMB-UHFFFAOYSA-N tricyclohexyl borate Chemical compound C1CCCCC1OB(OC1CCCCC1)OC1CCCCC1 BOOITXALNJLNMB-UHFFFAOYSA-N 0.000 description 1
- HWJYGSDXNANCJM-UHFFFAOYSA-N tridodecyl borate Chemical class CCCCCCCCCCCCOB(OCCCCCCCCCCCC)OCCCCCCCCCCCC HWJYGSDXNANCJM-UHFFFAOYSA-N 0.000 description 1
- WZGVRXXJKGXOBR-UHFFFAOYSA-N trihexadecyl borate Chemical class CCCCCCCCCCCCCCCCOB(OCCCCCCCCCCCCCCCC)OCCCCCCCCCCCCCCCC WZGVRXXJKGXOBR-UHFFFAOYSA-N 0.000 description 1
- KDQYHGMMZKMQAA-UHFFFAOYSA-N trihexyl borate Chemical compound CCCCCCOB(OCCCCCC)OCCCCCC KDQYHGMMZKMQAA-UHFFFAOYSA-N 0.000 description 1
- WRECIMRULFAWHA-UHFFFAOYSA-N trimethyl borate Chemical compound COB(OC)OC WRECIMRULFAWHA-UHFFFAOYSA-N 0.000 description 1
- AZLXEMARTGQBEN-UHFFFAOYSA-N trinonyl borate Chemical compound CCCCCCCCCOB(OCCCCCCCCC)OCCCCCCCCC AZLXEMARTGQBEN-UHFFFAOYSA-N 0.000 description 1
- GZKLCETYSGSMRA-UHFFFAOYSA-N trioctadecyl borate Chemical class CCCCCCCCCCCCCCCCCCOB(OCCCCCCCCCCCCCCCCCC)OCCCCCCCCCCCCCCCCCC GZKLCETYSGSMRA-UHFFFAOYSA-N 0.000 description 1
- DTBRTYHFHGNZFX-UHFFFAOYSA-N trioctyl borate Chemical compound CCCCCCCCOB(OCCCCCCCC)OCCCCCCCC DTBRTYHFHGNZFX-UHFFFAOYSA-N 0.000 description 1
- MDCWDBMBZLORER-UHFFFAOYSA-N triphenyl borate Chemical compound C=1C=CC=CC=1OB(OC=1C=CC=CC=1)OC1=CC=CC=C1 MDCWDBMBZLORER-UHFFFAOYSA-N 0.000 description 1
- DLVYHYUFIXLWKV-UHFFFAOYSA-N tris(2-ethylhexyl) borate Chemical compound CCCCC(CC)COB(OCC(CC)CCCC)OCC(CC)CCCC DLVYHYUFIXLWKV-UHFFFAOYSA-N 0.000 description 1
- RTMBXAOPKJNOGZ-UHFFFAOYSA-N tris(2-methylphenyl) borate Chemical compound CC1=CC=CC=C1OB(OC=1C(=CC=CC=1)C)OC1=CC=CC=C1C RTMBXAOPKJNOGZ-UHFFFAOYSA-N 0.000 description 1
- FYAMVEZOQXNCIE-UHFFFAOYSA-N tris(3-methylphenyl) borate Chemical compound CC1=CC=CC(OB(OC=2C=C(C)C=CC=2)OC=2C=C(C)C=CC=2)=C1 FYAMVEZOQXNCIE-UHFFFAOYSA-N 0.000 description 1
- RQNVJDSEWRGEQR-UHFFFAOYSA-N tris(prop-2-enyl) borate Chemical compound C=CCOB(OCC=C)OCC=C RQNVJDSEWRGEQR-UHFFFAOYSA-N 0.000 description 1
- WAXLMVCEFHKADZ-UHFFFAOYSA-N tris-decyl borate Chemical compound CCCCCCCCCCOB(OCCCCCCCCCC)OCCCCCCCCCC WAXLMVCEFHKADZ-UHFFFAOYSA-N 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/40—Glass
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
- C08K5/37—Thiols
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K7/00—Use of ingredients characterised by shape
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/10—Materials in mouldable or extrudable form for sealing or packing joints or covers
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Epoxy Resins (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
本發明尤其有關適用於密封劑用途之樹脂組成物、該樹脂組成物之硬化物、及藉由該樹脂組成物之硬化物對挾持顯示元件之一對基板周緣部之間隙予以密封之顯示裝置。In particular, the present invention relates to a resin composition suitable for use as a sealant, a hardened material of the resin composition, and a display device that seals a gap of a peripheral edge portion of a substrate with one of the holding display elements by the hardened material of the resin composition.
近幾年來,有機EL顯示器、電子紙等之各種顯示裝置領域中,使用有機半導體層之薄膜電晶體(TFT)備受矚目,該薄膜電晶體稱為有機TFT。有機TFT由於亦可藉由用以形成以往無機TFT(使用無機半導體層之薄膜電晶體)中之無機半導體層之蒸鍍法等而於低溫度形成有機半導體層,故具有即使是低耐熱性之塑膠薄膜等之基材亦可安裝之優點。In recent years, in the field of various display devices such as organic EL displays and electronic paper, a thin film transistor (TFT) using an organic semiconductor layer has attracted much attention. This thin film transistor is called an organic TFT. The organic TFT can be formed at a low temperature by an evaporation method or the like for forming an inorganic semiconductor layer in a conventional inorganic TFT (thin film transistor using an inorganic semiconductor layer), so it has a low heat resistance. The advantages of substrates such as plastic films can also be installed.
不過,顯示裝置一般具有以一對基板挾持顯示元件之層合構造。因此,於一對基板之周緣部於對向之基板間具有間隙,通常該間隙係以由硬化性組成物所成之密封劑等進行密封。此種由硬化性組成物所成之密封劑,於硬化前必須有侵入一對基板之周緣部基板間之間隙的流動性,故黏度必須充分低,另一方面,硬化後之硬化物必須具有高的耐透濕性。且於顯示元件使用有機TFT之顯示裝置時,對組成物要求低溫硬化性。作為由此等硬化性組成物所成之密封劑,例如於專利文獻1中提案有硬化性組成物,其包含(i)於23℃為液狀之環氧樹脂、(ii)於23℃為固體之2級胺或3級胺、或內包2級胺及3級胺之微膠囊、及(iii)填充劑,相對於(i)及(ii)之合計量100質量份,(iii)含有50~300質量份。 [先前技術文獻] [專利文獻]However, a display device generally has a laminated structure in which a display element is held by a pair of substrates. Therefore, there is a gap between the opposing substrates at the peripheral edge portion of the pair of substrates, and the gap is usually sealed with a sealant or the like made of a curable composition. Such a sealant made of a hardening composition must have fluidity that penetrates the gap between the substrates at the peripheral edge of a pair of substrates before hardening, so the viscosity must be sufficiently low. On the other hand, the hardened material after hardening must have High moisture permeability resistance. Moreover, when a display device using an organic TFT as a display element requires low-temperature curability to the composition. As a sealant made of such a hardenable composition, for example, a hardenable composition is proposed in Patent Document 1, which contains (i) an epoxy resin which is liquid at 23 ° C, and (ii) which is 100 parts by mass of solid secondary amines or tertiary amines, or microcapsules containing secondary amines and tertiary amines, and (iii) fillers relative to the total amount of (i) and (ii), (iii) Contains 50 to 300 parts by mass. [Prior Art Literature] [Patent Literature]
[專利文獻1]國際公開2013/108629號說明書[Patent Document 1] International Publication No. 2013/108629
[發明欲解決之課題][Questions to be Solved by the Invention]
然而,此種密封劑中使用之硬化性組成物,於耐透濕性、低溫硬化性及保存安定性等,要求進一步提高。因此,為提高耐透濕性而高含量調配例如滑石等時,有組成物之黏度變高,失去流動性,於密封作業中之作業性差之傾向。因此,要求該等取得均衡之樹脂組成物。However, the curable composition used in such a sealant is required to be further improved in terms of moisture permeability resistance, low-temperature curability, and storage stability. Therefore, when a high content is blended such as talc to improve the moisture permeability resistance, the viscosity of the composition becomes high, the fluidity is lost, and the workability in the sealing operation tends to be poor. Therefore, these balanced resin compositions are required.
本發明係鑑於此等情況而完成者,為解決此等之課題在於提供黏度低、高流動性,且保存安定性及低溫硬化性優異,而且其硬化物具有極高耐透濕性之樹脂組成物。 [用以解決課題之手段]The present invention was made in view of these circumstances, and in order to solve these problems, it is to provide a resin composition with low viscosity, high fluidity, excellent storage stability, and low-temperature hardening, and the cured product has extremely high moisture permeability resistance. Thing. [Means to solve the problem]
本發明人等為解決上述課題而積極研究之結果,發現含有環氧樹脂、聚硫醇化合物及片狀玻璃之樹脂組成物,於解決上述課題發揮極有利之作用,因而完成本發明。亦即,本發明係如以下。As a result of active research by the present inventors in order to solve the above-mentioned problems, they have found that a resin composition containing an epoxy resin, a polythiol compound, and a sheet glass plays an extremely advantageous role in solving the above-mentioned problems, and thus completed the present invention. That is, the present invention is as follows.
[1] 一種樹脂組成物,其係含有(A)環氧樹脂,(B)聚硫醇化合物及(C)片狀玻璃。 [2] 如上述[1]之樹脂組成物,其中藉由E型黏度計測定之於25℃、20rpm的黏度為0.1~10Pa.s。 [3] 如上述[1]或[2]之樹脂組成物,其中樹脂組成物中之環氧樹脂含量,令樹脂組成物之不揮發分為100質量%時,為20~60質量%。 [4] 如上述[1]~[3]中任一項之樹脂組成物,其中樹脂組成物中之環氧基與硫醇基之莫耳比(環氧基/硫醇基)為0.9~1.5。 [5] 如上述[1]~[4]中任一項之樹脂組成物,其中樹脂組成物中之片狀玻璃含量,令樹脂組成物之不揮發分為100質量%時,為5~40質量%。 [6] 如上述[1]~[5]中任一項之樹脂組成物,其中片狀玻璃之長寬比為10以上、100以下。 [7] 如上述[1]~[6]中任一項之樹脂組成物,其中使樹脂組成物於70℃熱硬化1小時後之硬化物的200 μm厚之透濕度為30(g/m2 .24h)以下。 [8] 如上述[1]~[7]中任一項之樹脂組成物,其係密封劑用。 [9] 如上述[1]~[7]中任一項之樹脂組成物,其係顯示裝置之密封劑用。 [10] 如上述[9]之樹脂組成物,其中顯示裝置係電子紙。 [11] 一種硬化物,其係如上述[1]~[6]中任一項之樹脂組成物的硬化物,且200 μm厚之透濕度為30(g/m2 .24h)以下。 [12] 一種顯示裝置,其包含 顯示元件, 挾持前述顯示元件之一對基板, 密封前述一對基板之周緣部之基板間間隙的硬化物,其係如上述[1]~[7]中任一項之樹脂組成物的硬化物或如上述[11]之硬化物。 [發明效果][1] A resin composition comprising (A) an epoxy resin, (B) a polythiol compound, and (C) a sheet glass. [2] The resin composition as described in [1] above, in which the viscosity measured at 25 ° C and 20 rpm by an E-type viscometer is 0.1 to 10 Pa. s. [3] The resin composition according to the above [1] or [2], wherein the epoxy resin content in the resin composition is 20 to 60% by mass when the non-volatile content of the resin composition is 100% by mass. [4] The resin composition according to any one of the above [1] to [3], wherein the molar ratio (epoxy group / thiol group) of the epoxy group to the thiol group in the resin composition is 0.9 to 1.5. [5] The resin composition according to any one of the above [1] to [4], wherein the content of the flake glass in the resin composition is 5 to 40 when the non-volatile content of the resin composition is 100% by mass. quality%. [6] The resin composition according to any one of the above [1] to [5], wherein the aspect ratio of the sheet glass is 10 or more and 100 or less. [7] The resin composition according to any one of the above [1] to [6], wherein the 200 μm thick moisture permeability of the cured product after the resin composition is thermally cured at 70 ° C. for 1 hour is 30 (g / m 2. 24h) or less. [8] The resin composition according to any one of the above [1] to [7], which is a sealant. [9] The resin composition according to any one of the above [1] to [7], which is a sealant for a display device. [10] The resin composition according to the above [9], wherein the display device is an electronic paper. [11] A hardened product, which is a hardened product of the resin composition according to any one of the above [1] to [6], and has a 200 μm thick moisture permeability of 30 (g / m 2 .24h) or less. [12] A display device comprising a display element, holding a pair of substrates of the display element, and a hardened material that seals a gap between substrates at the peripheral edge portion of the pair of substrates, as described in any of the above [1] to [7] The cured product of one item or the cured product as described in [11] above. [Inventive effect]
依據本發明,可提供硬化前之黏度充分低、流動性優異,且保存安定性亦良好,而且其硬化物具有極高耐透濕性之樹脂組成物。According to the present invention, it is possible to provide a resin composition having sufficiently low viscosity before hardening, excellent fluidity, good storage stability, and extremely hardened moisture permeability.
本發明之樹脂組成物由於具有上述優異特性,因此可使用作為各種技術領域之接著劑、密封劑、保護膜等。尤其可用作為顯示元件或顯示裝置之密封劑,例如若使用於將具有於一對基板間挾持顯示元件之構造的顯示裝置中周緣部之基板間的間隙密封之密封劑,則顯示元件極難以發生因水分所致之性能劣化,可實現高品質之顯示裝置。Since the resin composition of the present invention has the above-mentioned excellent characteristics, it can be used as an adhesive, a sealant, a protective film, and the like in various technical fields. It is particularly useful as a sealant for a display element or a display device. For example, if a sealant is used to seal a gap between substrates in a peripheral portion of a display device having a structure in which a display element is held between a pair of substrates, the display element is extremely unlikely to occur. Performance degradation due to moisture can achieve high-quality display devices.
以下,即以較佳實施形態說明本發明。 又,本說明書中使用記號「~」所規定之數值範圍係包含「~」之兩端(上限及下限)之數值者。例如「0.01~5」表示0.01以上5以下。Hereinafter, the present invention will be described in a preferred embodiment. In addition, the numerical range specified by the symbol "~" in this manual is a value including both ends (upper limit and lower limit) of "~". For example, "0.01 to 5" means 0.01 or more and 5 or less.
本發明之樹脂組成物之主要特徵係至少含有(A)環氧樹脂(以下有時簡稱「(A)成分」),(B)聚硫醇化合物(以下有時簡稱「(B)成分」)及(C)片狀玻璃(以下有時簡稱「(C)成分」)。The main characteristics of the resin composition of the present invention include at least (A) an epoxy resin (hereinafter sometimes referred to as "(A) component"), (B) a polythiol compound (hereinafter sometimes referred to as "(B) component") And (C) sheet glass (hereinafter sometimes referred to as "(C) component").
<(A)環氧樹脂> 本發明之環氧樹脂若為平均每1分子具有2個以上環氧基者,則未特別限定。舉例為例如雙酚A型環氧樹脂、雙酚F型環氧樹脂、雙酚S型環氧樹脂、聯苯型環氧樹脂、聯苯芳烷氧基型環氧樹脂、萘酚型環氧樹脂、萘型環氧樹脂、含磷環氧樹脂、芳香族縮水甘油胺型環氧樹脂(例如四縮縮水甘油基二胺基二苯基甲烷、三縮水甘油基-對-胺基苯酚、二縮水甘油基甲苯二胺、二縮水甘油基苯胺等)、脂環式環氧樹脂、脂肪族鏈狀環氧樹脂、酚酚醛清漆型環氧樹脂、甲酚酚醛清漆型環氧樹脂、雙酚A型酚醛清漆型環氧樹脂、含聚烷二醇骨架之環氧樹脂、具有丁二烯構造之環氧樹脂、雙酚之二縮水甘油醚化物、萘二醇之二縮水甘油醚化物、酚類之縮水甘油醚化物及醇類之二縮水甘油醚化物、以及該等之環氧樹脂的烷基取代物、鹵化物及氫化物等。其中,基於結晶性低,可使所得樹脂組成物之黏度為低黏度之觀點,較好為雙酚A型環氧樹脂、雙酚F型環氧樹脂、酚類之縮水甘油醚化物(例如間苯二酚二縮水甘油醚等)、醇類之二縮水甘油醚化物(例如1,4-環己烷二甲醇二縮水甘油醚等)。環氧樹脂較好環氧當量為50~1500 g/eq之範圍,更好為70~500 g/eq之範圍,又更好為100~200 g/eq之範圍。又,本發明中之「環氧當量」係含有每一克當量環氧基之樹脂克數(g/eq),係依據JIS K 7236規定之方法測定。環氧樹脂可使用1種亦可組合2種以上使用。<(A) Epoxy resin> The epoxy resin of the present invention is not particularly limited as long as it has two or more epoxy groups per molecule. Examples are, for example, bisphenol A epoxy resin, bisphenol F epoxy resin, bisphenol S epoxy resin, biphenyl epoxy resin, biphenylaralkoxy epoxy resin, naphthol epoxy resin. Resins, naphthalene-type epoxy resins, phosphorus-containing epoxy resins, aromatic glycidylamine-type epoxy resins (e.g., tetraglycidyldiaminodiphenylmethane, triglycidyl-p-aminophenol, diamine Glycidyl toluenediamine, diglycidyl aniline, etc.), alicyclic epoxy resin, aliphatic chain epoxy resin, novolac epoxy resin, cresol novolac epoxy resin, bisphenol A Type novolac epoxy resin, epoxy resin containing polyalkylene glycol skeleton, epoxy resin with butadiene structure, diglycidyl etherate of bisphenol, diglycidyl etherate of naphthalene glycol, phenols Glycidyl etherate of alcohols and diglycidyl etherification of alcohols, and alkyl substituents, halides and hydrides of epoxy resins, etc. Among them, bisphenol A type epoxy resin, bisphenol F type epoxy resin, and phenolic glycidyl etherate (e.g. Resorcinol diglycidyl ether, etc.), alcohol diglycidyl etherate (such as 1,4-cyclohexanedimethanol diglycidyl ether, etc.). The epoxy resin preferably has an epoxy equivalent in the range of 50 to 1500 g / eq, more preferably in the range of 70 to 500 g / eq, and more preferably in the range of 100 to 200 g / eq. The "epoxy equivalent" in the present invention is the number of grams (g / eq) of the resin containing one gram equivalent of epoxy groups, and is measured in accordance with the method prescribed by JIS K 7236. The epoxy resin may be used singly or in combination of two or more kinds.
本發明之樹脂組成物,作為其用途之一例,意圖作為將於一對基板間挾持顯示元件之構造的顯示裝置中的周緣部之基板間間隙予以密封之密封劑。因此,硬化前之樹脂組成物必須有侵入該基板間間隙之流動性,且樹脂組成物之主成分的環氧樹脂((A)成分)必須有流動性。因此,環氧樹脂((A)成分)雖可包含固形狀之環氧樹脂,但較好(A)成分全體之50~100質量%為液狀環氧樹脂,更好(A)成分全體之70~100質量%為液狀環氧樹脂。此處,所謂固形狀之環氧樹脂意指於23℃為固體之環氧樹脂,液狀環氧樹脂意指於23℃為液體之環氧樹脂。The resin composition of the present invention is intended as an example of its use, and is intended to be a sealant that seals a gap between substrates in a peripheral portion of a display device having a structure in which a display element is held between a pair of substrates. Therefore, the resin composition before curing must have fluidity that penetrates into the gap between the substrates, and the epoxy resin (the component (A)), which is the main component of the resin composition, must have fluidity. Therefore, although the epoxy resin (component (A)) may include a solid-shaped epoxy resin, 50 to 100% by mass of the entire component (A) is preferably a liquid epoxy resin, and more preferably the entire epoxy component (A). 70 to 100% by mass is a liquid epoxy resin. Here, the solid epoxy resin means an epoxy resin that is solid at 23 ° C, and the liquid epoxy resin means an epoxy resin that is liquid at 23 ° C.
且,環氧樹脂基於低黏性、耐透濕性之觀點,較好環氧當量為50 g/eq以上,更好70 g/eq以上,特佳為100 g/eq以上。且,基於低黏性、耐透濕性之觀點,較好環氧當量為500 g/eq以下,更好200 g/eq以下。In addition, from the viewpoints of low viscosity and moisture permeability resistance, the epoxy equivalent is preferably 50 g / eq or more, more preferably 70 g / eq or more, and particularly preferably 100 g / eq or more. In addition, from the viewpoint of low viscosity and moisture permeability resistance, the epoxy equivalent is preferably 500 g / eq or less, and more preferably 200 g / eq or less.
本發明之樹脂組成物中之(A)成分含量並未特別限制,但基於組成物黏度之觀點,該含量於樹脂組成物中不揮發分之合計每100質量%,較好為60質量%以下,更好為55質量%以下,又更好為51質量%以下,特佳為50質量%以下。另一方面,基於組成物黏度之觀點,該含量於樹脂組成物中不揮發分之合計每100質量%,較好為20質量%以上,更好為25質量%以上,特佳為30質量%以上。The content of the component (A) in the resin composition of the present invention is not particularly limited, but from the viewpoint of the viscosity of the composition, the content of the nonvolatile content in the resin composition is 100 mass%, preferably 60 mass% or less. , More preferably 55 mass% or less, still more preferably 51 mass% or less, and particularly preferably 50 mass% or less. On the other hand, from the viewpoint of the viscosity of the composition, the content of the nonvolatile matter in the resin composition is preferably 100% by mass or more per 100% by mass, more preferably 25% by mass or more, and particularly preferably 30% by mass. the above.
<(B)聚硫醇化合物> 本發明之樹脂組成物中,藉由使用聚硫醇化合物作為硬化劑,可使樹脂組成物於低溫度區域硬化,進而亦對樹脂組成物之低黏度化大有助益。聚硫醇化合物若為使環氧基交聯或聚合之化合物,則未特別限定,但較好1分子中之硫醇基數為2~6(2官能~6官能)者,更好為3~6(3官能~6官能)者,例如三羥甲基丙烷三(3-巰基丙酸酯)(簡稱:TMPT)、季戊四醇四(3-巰基丙酸酯)(簡稱:PEMP)、二季戊四醇六(3-巰基丙酸酯)(簡稱:DPMP)、三[(3-巰基丙醯氧基)-乙基]-異氰脲酸酯(簡稱:TEMPIC)、三(3-巰基丙基)異氰脲酸酯(簡稱:TMPIC)、乙二醇雙硫代乙醇酸酯(簡稱:EGTG)、三羥甲基丙烷三硫代乙醇酸酯(簡稱:TMPG)、季戊四醇四硫代乙醇酸酯(簡稱:PETG)、季戊四醇四(3-巰基丁酸酯)、1,4-雙(3-巰基丁醯氧基)丁烷、1,3,5-三(3-巰基丁醯氧基乙基)-1,3,5-三嗪-2,4,6 (1H,3H,5H)-三酮、三羥甲基丙烷三(巰基丁酸酯)(簡稱:TPMB)、三羥甲基乙烷三(3-巰雞丁酸酯)(簡稱:TEMB)、1,3,4,6-四(2-巰基乙基)甘醇脲、4,4’-亞異丙基雙[(3-巰基丙氧基)苯]等。<(B) Polythiol compound> 物 中 In the resin composition of the present invention, by using a polythiol compound as a hardener, the resin composition can be hardened in a low-temperature region, and the viscosity of the resin composition can be reduced. Helpful. The polythiol compound is not particularly limited as long as it is a compound that crosslinks or polymerizes epoxy groups, but it is preferred that the number of thiol groups in one molecule is 2 to 6 (bifunctional to 6functional), and more preferably 3 to 6 (3-functional to 6-functional), such as trimethylolpropane tri (3-mercaptopropionate) (abbreviation: TMPT), pentaerythritol tetra (3-mercaptopropionate) (abbreviation: PEMP), dipentaerythritol hexa (3-mercaptopropionate) (abbreviation: DPMP), tris [(3-mercaptopropionyloxy) -ethyl] -isocyanurate (abbreviation: TEMPIC), tris (3-mercaptopropyl) isopropyl Cyanurate (abbreviation: TMPIC), ethylene glycol dithioglycolate (abbreviation: EGTG), trimethylolpropane trithioglycolate (abbreviation: TMPG), pentaerythritol tetrathioglycolate ( Abbreviations: PETG), pentaerythritol tetrakis (3-mercaptobutyrate), 1,4-bis (3-mercaptobutyryloxy) butane, 1,3,5-tris (3-mercaptobutyryloxyethyl) ) -1,3,5-triazine-2,4,6 (1H, 3H, 5H) -trione, trimethylolpropane tri (mercaptobutyrate) (abbreviation: TPMB), trimethylolethyl Alkane tris (3-mercapto chicken butyrate) (abbreviation: TEMB), 1,3,4,6-tetrakis (2-mercaptoethyl) glycoluril, 4,4'-isopropylidenebis [(3 -Mercaptopropoxy) benzene] and the like.
該等化合物可藉習知方法合成,且可使用市售品。例如三(3-巰基丙基)異氰脲酸酯(簡稱:TMPIC)或4,4’-亞異丙基雙[(3-巰基丁氧基)苯]可藉例如日本特開2012-153794號公報或國際公開2001/00698號中記載之方法合成。作為市售品舉例為SC有機化學股份有限公司製之PEMP,淀化學股份有限公司製之OTG、EGTG、TMTG、PETG、3-MPA、TMTP、PETP,堺化學工業股份有限公司製之TEMP、PEMP、TEMPIC、DPMP,昭和電工股份有限公司製之PE-1(季戊四醇四(3-巰基丁酸酯))、BD-1(1,4-雙(3-巰基丁醯氧基)丁烷)、NR-1(1,3,5-三(3-巰基丁醯氧基乙基)-1,3,5-三嗪-2,4,6(1H,3H,5H)-三酮)、TPMB、TEMB,四國化成工業股份有限公司製之TS-G(1,3,4,6-四(2-巰基乙基)甘醇脲)等。聚硫醇化合物可使用1種,亦可組合2種以上使用。These compounds can be synthesized by conventional methods, and commercially available products can be used. For example, tris (3-mercaptopropyl) isocyanurate (abbreviation: TMPIC) or 4,4'-isopropylidenebis [(3-mercaptobutoxy) benzene] can be obtained by, for example, Japanese Patent Application Laid-Open No. 2012-153794 Synthesized by the method described in Japanese Patent Publication No. 2001 or International Publication No. 2001/00698. Examples of commercially available products are PEMP manufactured by SC Organic Chemicals Co., Ltd., OTG, EGTG, TMTG, PETG, 3-MPA, TMTP, PETP manufactured by Yodo Chemical Co., Ltd., and TEMP and PEMP manufactured by Kao Chemical Industry Co., Ltd. , TEMPIC, DPMP, PE-1 (pentaerythritol tetrakis (3-mercaptobutyrate)), BD-1 (1,4-bis (3-mercaptobutyryloxy) butane) manufactured by Showa Denko Corporation, NR-1 (1,3,5-tris (3-mercaptobutyryloxyethyl) -1,3,5-triazine-2,4,6 (1H, 3H, 5H) -trione), TPMB TEMB, TS-G (1,3,4,6-tetrakis (2-mercaptoethyl) glycol urea) manufactured by Shikoku Chemical Industry Co., Ltd., etc. The polythiol compound may be used singly or in combination of two or more kinds.
聚硫醇化合物基於樹脂組成物之低黏性及低溫硬化性、硬化物之耐透濕性等之觀點,硫醇基當量較好為50~500 g/eq之範圍,更好為75~300 g/eq之範圍,又更好為100~200 g/eq之範圍。又所謂「硫醇基當量」係包含1克當量硫醇基的樹脂克數(g/eq),可以習知的方法例如使用澱粉作為指示劑之碘溶液滴定法來測定。The polythiol compound is based on the viewpoints of low viscosity and low-temperature hardening property of the resin composition, and moisture permeability resistance of the hardened material. The thiol group equivalent is preferably in the range of 50 to 500 g / eq, more preferably 75 to 300. The range of g / eq is more preferably in the range of 100 to 200 g / eq. The so-called "thiol group equivalent" refers to the gram of resin (g / eq) containing 1 gram equivalent of thiol group, and can be measured by a conventional method such as an iodine solution titration method using starch as an indicator.
本發明之樹脂組成物中之(B)成分含量並未特別限制,但較好為樹脂組成物中之環氧基與硫醇基之莫耳比(環氧基/硫醇基),亦即樹脂組成物中之(A)成分所具有之環氧基合計莫耳數(M2)相對於樹脂組成物中之(B)成分所具有之硫醇基之合計莫耳數(M1)之比(M2/M1)為0.9~1.5之含量,更好係該比(M2/M1)為1.0~1.2之含量。The content of the component (B) in the resin composition of the present invention is not particularly limited, but it is preferably a molar ratio (epoxy group / thiol group) of an epoxy group to a thiol group in the resin composition, that is, The ratio of the total molar number of epoxy groups (M2) of the (A) component in the resin composition to the total molar number (M1) of thiol groups of the (B) component in the resin composition ( M2 / M1) is a content of 0.9 to 1.5, and more preferably, the ratio (M2 / M1) is a content of 1.0 to 1.2.
又,基於使樹脂組成物有效地於低溫硬化之觀點,樹脂組成物中之(B)成分含量,令樹脂組成物之不揮發分為100質量%時,較好為10質量%以上,更好為20質量%以上,又更好為25質量%以上,特佳為30質量%以上。另一方面,基於樹脂組成物之保存安定性之觀點,該含量於令樹脂組成物之不揮發分為100質量%時,較好為60質量%以下,更好為50質量%以下,又更好為45質量%以下,特佳為40質量%以下。From the viewpoint of effectively curing the resin composition at low temperature, when the content of the component (B) in the resin composition is such that the non-volatile content of the resin composition is 100% by mass, it is preferably 10% by mass or more, and more preferably It is 20% by mass or more, more preferably 25% by mass or more, and particularly preferably 30% by mass or more. On the other hand, from the viewpoint of storage stability of the resin composition, when the nonvolatile content of the resin composition is 100% by mass, it is preferably 60% by mass or less, more preferably 50% by mass or less, and more It is preferably at most 45% by mass, and particularly preferably at most 40% by mass.
<(C)片狀玻璃> 本發明之樹脂組成物藉由含有片狀玻璃,可將樹脂組成物之硬化物的耐透濕性提高至極高程度。片狀玻璃之玻璃組成係應用以A玻璃、C玻璃及E玻璃等為代表之各種玻璃組成,其中,特佳為E玻璃。又,片狀玻璃一般亦稱為「玻璃片」。<(C) sheet glass> 含有 The resin composition of the present invention can improve the moisture permeability of the cured product of the resin composition to an extremely high level by containing the sheet glass. The glass composition of the flake glass is various glass compositions such as A glass, C glass, and E glass. Among them, E glass is particularly preferred. In addition, the sheet glass is also generally called a "glass sheet."
片狀玻璃之平均厚度較好為0.1~5 μm,更好為1~3 μm。該平均厚度可藉以下方法測定。 使用掃描型電子顯微鏡(SEM),針對100片以上之玻璃片,分別測定厚度,將該測定值予以平均而求得。該情況下,亦可藉掃描型電子顯微鏡觀察玻璃片單體並測定,亦可將玻璃片填充於樹脂中並成形,使其斷裂,觀察其斷裂面而測定。任一測定方法中,均係以使玻璃片剖面(厚度面)垂直於掃描型電子顯微鏡之照射電子束軸之方式,藉由試料台微動裝置調製掃描型電子顯微鏡之試料台。The average thickness of the flake glass is preferably 0.1 to 5 μm, and more preferably 1 to 3 μm. This average thickness can be measured by the following method. Using a scanning electron microscope (SEM), the thickness of each of 100 or more glass pieces was measured, and the measured values were averaged to obtain. In this case, a single glass sheet may be observed and measured by a scanning electron microscope, or the glass sheet may be filled with a resin and molded, and the glass sheet may be fractured, and the fractured surface may be measured. In any of the measurement methods, the sample stage of the scanning electron microscope is adjusted by the sample table micro-movement device so that the cross section (thickness surface) of the glass sheet is perpendicular to the irradiation electron beam axis of the scanning electron microscope.
片狀玻璃之平均粒徑,基於耐透濕性之觀點較好為5 μm以上,更好為20 μm以上,特佳為40 μm以上。且,基於顯示裝置之周緣部之基板間間隙等之密封性之觀點,較好為300 μm以下,更好為200 μm以下,特佳為160 μm以下。The average particle diameter of the flake glass is preferably 5 μm or more, more preferably 20 μm or more, and particularly preferably 40 μm or more from the viewpoint of moisture permeability resistance. In addition, from the viewpoint of sealing properties such as the gap between substrates in the peripheral portion of the display device, it is preferably 300 μm or less, more preferably 200 μm or less, and particularly preferably 160 μm or less.
片狀玻璃之平均粒徑可基於Mie散射理論藉由雷射散射繞射法測定。具體而言,可藉由雷射繞射式粒度分佈測定裝置,以體積基準作成片狀玻璃之粒度分佈,將其中值徑作為平均粒徑予以測定。測定樣品較好使用藉由超音波將片狀玻璃分散於水中者。作為雷射繞射散射粒度分佈測定裝置可使用堀場製作所(股)製LA-500等。The average particle diameter of the flake glass can be measured by laser scattering diffraction method based on Mie scattering theory. Specifically, the particle size distribution of the flake glass can be made on a volume basis by a laser diffraction type particle size distribution measuring device, and the median diameter can be measured as the average particle size. As the measurement sample, a sheet glass is preferably dispersed in water by ultrasonic waves. As a laser diffraction scattering particle size distribution measuring device, LA-500 manufactured by Horiba, Ltd., etc. can be used.
片狀玻璃之長寬比(平均粒徑/平均厚度),基於硬化物顯示充分高的耐透濕性之觀點,較好為10以上,更好為13以上,基於樹脂組成物之流動性之觀點,較好為100以下,更好為45以下,又更好為40以下。The aspect ratio (average particle diameter / average thickness) of the flake glass is preferably 10 or more, more preferably 13 or more, based on the viewpoint that the cured product exhibits sufficiently high moisture permeability resistance, based on the fluidity of the resin composition. The viewpoint is preferably 100 or less, more preferably 45 or less, and still more preferably 40 or less.
本發明之樹脂組成物中之(C)成分含量並未特別限制,但基於充分提高樹脂組成物之硬化物的耐透濕性之觀點,該含量於令樹脂組成物之不揮發分為100質量%時,較好為5質量%以上,更好為7質量%以上,又更好為10質量%以上,再更好為15質量%以上。另一方面,基於樹脂組成物之低黏性之觀點,該含量於令樹脂組成物之不揮發分為100質量%時,較好為40質量%以下,更好為3質量%以下,又更好為30質量%以下,再更好為25質量%以下。The content of the component (C) in the resin composition of the present invention is not particularly limited, but from the viewpoint of sufficiently improving the moisture permeability of the hardened material of the resin composition, the content is such that the non-volatile content of the resin composition is 100 mass In the case of%, it is preferably 5 mass% or more, more preferably 7 mass% or more, still more preferably 10 mass% or more, and still more preferably 15 mass% or more. On the other hand, from the viewpoint of low viscosity of the resin composition, when the nonvolatile content of the resin composition is 100% by mass, it is preferably 40% by mass or less, more preferably 3% by mass or less, and more It is preferably 30% by mass or less, and even more preferably 25% by mass or less.
<(D)硬化促進劑> 本發明之樹脂組成物根據需要進而含有(D)硬化促進劑(以下有時簡稱為「(D)成分」),而可提高低溫硬化性。作為硬化促進劑,並未特別限定,但舉例為胺系硬化促進劑、胍胺系硬化促進劑、咪唑系硬化促進劑、鏻系硬化促進劑等。該等可使用1種或組合2種以上使用。<(D) Hardening Accelerator> 树脂 The resin composition of the present invention may further contain (D) a hardening accelerator (hereinafter sometimes simply referred to as "(D) component"), if necessary, to improve low-temperature hardening properties. The hardening accelerator is not particularly limited, but examples thereof include amine-based hardening accelerators, guanamine-based hardening accelerators, imidazole-based hardening accelerators, and fluorene-based hardening accelerators. These can be used singly or in combination of two or more kinds.
作為胺系硬化促進劑,並未特別限定,但舉例為三乙胺、三丁胺等之三烷胺,4-二甲胺基吡啶、苄基二甲胺、2,4,6-三(二甲胺基甲基)苯酚、1,8-二氮雜雙環(5.4.0)-十一碳烯(以下簡稱為DBU)等之胺化合物,有機二醯肼(AMICURE VDH-J、AMICURE UDH、AMICURE LDH等(均為味之素精密科技(股)製))等。又,可舉例為含3級胺基之改質聚胺、含脲鍵之改質聚胺、含咪唑之改質聚胺等之改質聚胺。含3級胺基之改質聚胺係對環氧樹脂及/或酚樹脂過量反應具有3級骨架之聚胺所得之胺加成物,舉例為例如ADEKA(股)製之EH4380S、EH3616S、EH5001P、EH4375S等。含咪唑之改質聚胺係對環氧樹脂及/或酚樹脂過量反應具有咪唑骨架之聚胺所得之胺加成物,舉例為例如味之素精密科技(股)製之PN-23、PN-H、PN-40,ADEKA (股)製之EH4346S、T&K TOKA(股)製FXR-1121、AIR PRODUCTS JAPAN(股)製SUNMIDE LH210等。含脲鍵之改質聚胺係對異氰酸酯化合物過量反應聚胺所得之加成物,舉例為例如T&K TOKA(股)製FXR-1020、FXR-1081等。胺系硬化促進劑可使用1種或組合2種以上使用。The amine-based hardening accelerator is not particularly limited, but examples thereof include trialkylamines such as triethylamine, tributylamine, 4-dimethylaminopyridine, benzyldimethylamine, and 2,4,6-tris ( Amine compounds such as dimethylaminomethyl) phenol, 1,8-diazabicyclo (5.4.0) -undecene (hereinafter referred to as DBU), organic dihydrazine (AMICURE VDH-J, AMICURE UDH , AMICURE LDH, etc. (both Ajinomoto Precision Technology Co., Ltd.) and so on. Examples of the modified polyamine include a modified polyamine containing a tertiary amine group, a modified polyamine containing a urea bond, and a modified polyamine containing an imidazole. Modified polyamines containing grade 3 amine groups are amine adducts obtained by excessively reacting polyamines with grade 3 skeletons to epoxy resins and / or phenol resins. Examples include EH4380S, EH3616S, and EH5001P made by ADEKA. , EH4375S, etc. Modified polyamines containing imidazole are amine adducts obtained by excessively reacting polyamines with imidazole skeleton to epoxy resins and / or phenol resins. Examples include PN-23, PN made by Ajinomoto Precision Technology Co., Ltd. -H, PN-40, ADEKA (share) EH4346S, T & K TOKA (share) FXR-1121, AIR PRODUCTS JAPAN (share) SUNMIDE LH210, etc. Modified polyamines containing urea bonds are adducts obtained by reacting polyamines in excess with isocyanate compounds, and examples thereof include FXR-1020 and FXR-1081 manufactured by T & K TOKA. An amine hardening accelerator can be used individually by 1 type or in combination of 2 or more types.
作為胍胺系硬化促進劑並未特別限定,但舉例為二氰基二醯胺、1-甲基胍胺、1-乙基胍胺、1-環己基胍胺、1-苯基胍胺、1-(鄰-甲苯基)胍胺、二甲基胍胺、二苯基胍胺、三甲基胍胺、四甲基胍胺、五甲基胍胺、1,5,7-三氮雜雙環[4.4.0]癸-5-烯、7-甲基-1,5,7-三氮雜雙環[4.4.0]癸-5-烯、1-甲基雙胍胺、1-乙基雙胍胺、1-正丁基雙胍胺、1-正辛基雙胍胺、1,1-二甲基雙胍胺、1,1-二乙基雙胍胺、1-環己基雙胍胺、1-烯丙基雙胍胺、1-苯基雙胍胺、1-(鄰-甲苯基)雙胍胺等。該等可使用1種或組合2種以上。The guanamine-based hardening accelerator is not particularly limited, but examples include dicyanobiamine, 1-methylguanamine, 1-ethylguanamine, 1-cyclohexylguanamine, 1-phenylguanamine, 1- (o-tolyl) guanamine, dimethylguanamine, diphenylguanamine, trimethylguanamine, tetramethylguanamine, pentamethylguanamine, 1,5,7-triazine Bicyclo [4.4.0] dec-5-ene, 7-methyl-1,5,7-triazabicyclo [4.4.0] dec-5-ene, 1-methyl biguanide, 1-ethyl biguanide Amine, 1-n-butyl biguanide, 1-n-octyl biguanide, 1,1-dimethyl biguanide, 1,1-diethyl biguanide, 1-cyclohexyl biguanide, 1-allyl Biguanide, 1-phenyl biguanide, 1- (o-tolyl) biguanide and the like. These can be used singly or in combination of two or more kinds.
作為咪唑系硬化促進劑並未特別限定,但舉例為2-甲基咪唑、2-十一烷基咪唑、2-十七烷基咪唑、1,2-二甲基咪唑、2-乙基-4-甲基咪唑、2-苯基咪唑、2-苯基-4-甲基咪唑、1-苄基-2-甲基咪唑、1-苄基-2-苯基咪唑、1-氰基乙基-2-甲基咪唑、1-氰基乙基-2-十一烷基咪唑、1-氰基乙基-2-乙基-4-甲基咪唑、1-氰基乙基-2-苯基咪唑、1-氰基乙基-2-十一烷基咪唑鎓苯偏三酸鹽、1-氰基乙基-2-苯基咪唑鎓苯偏三酸鹽、2,4-二胺基-6-[2’-甲基咪唑-(1’)]-乙基-s-三嗪、2,4-二胺基-6-[2’-十一烷基咪唑-(1’)]-乙基-s-三嗪、2,4-二胺基-6-[2’-乙基-4-甲基咪唑-(1’)]-乙基-s-三嗪、2,4-二胺基-6-[2’-甲基咪唑-(1’)]-乙基-s-三嗪異氰脲酸加成物、2-苯基咪唑異氰脲酸加成物、2-苯基-4,5-二羥基甲基咪唑、2-苯基-4-甲基-5-羥基甲基咪唑、2,3-二氫-1H-吡咯并[1,2-a]苯并咪唑、1-十二烷基-2-甲基-3-苯并咪唑鎓氯化物、2-甲基咪唑啉、2-苯基咪唑啉、1-(2-羥基)-3-苯氧基丙基-2-甲基咪唑等之咪唑化合物及咪唑化合物與環氧樹脂之加成物等。該等可使用1種或組合2種以上。The imidazole-based hardening accelerator is not particularly limited, but examples include 2-methylimidazole, 2-undecylimidazole, 2-heptadecylimidazole, 1,2-dimethylimidazole, and 2-ethyl- 4-methylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 1-benzyl-2-methylimidazole, 1-benzyl-2-phenylimidazole, 1-cyanoethyl 2-methylimidazole, 1-cyanoethyl-2-undecylimidazole, 1-cyanoethyl-2-ethyl-4-methylimidazole, 1-cyanoethyl-2- Phenylimidazole, 1-cyanoethyl-2-undecylimidazolium trimellitate, 1-cyanoethyl-2-phenylimidazolium trimellitate, 2,4-diamine -6- [2'-methylimidazole- (1 ')]-ethyl-s-triazine, 2,4-diamino-6- [2'-undecylimidazole- (1') ] -Ethyl-s-triazine, 2,4-diamino-6- [2'-ethyl-4-methylimidazole- (1 ')]-ethyl-s-triazine, 2,4 -Diamino-6- [2'-methylimidazole- (1 ')]-ethyl-s-triazine isocyanurate adduct, 2-phenylimidazole isocyanurate adduct, 2 -Phenyl-4,5-dihydroxymethylimidazole, 2-phenyl-4-methyl-5-hydroxymethylimidazole, 2,3-dihydro-1H-pyrrolo [1,2-a] benzene Benzimidazole, 1-dodecyl-2-methyl-3-benzimidazolium Imidazole compounds such as chloride, 2-methylimidazoline, 2-phenylimidazoline, 1- (2-hydroxy) -3-phenoxypropyl-2-methylimidazole and the like between imidazole compounds and epoxy resins Adducts, etc. These can be used singly or in combination of two or more kinds.
作為鏻系硬化促進劑並未特別限定,但舉例為三苯膦、鏻硼酸鹽化合物、四苯基鏻四苯基硼酸鹽、正丁基鏻四苯基硼酸鹽、四丁基鏻癸酸鹽、(4-甲基苯基)三苯基鏻硫代氰酸酯、四苯基鏻硫代氰酸酯、丁基三苯基鏻硫代氰酸酯等。該等可使用1種或組合2種以上。The fluorene-based hardening accelerator is not particularly limited, but examples include triphenylphosphine, fluorene boronate compounds, tetraphenyl fluorene tetraphenylborate, n-butyl fluorene tetraphenylborate, and tetrabutyl fluorene decanoate , (4-methylphenyl) triphenylphosphonium thiocyanate, tetraphenylphosphonium thiocyanate, butyltriphenylphosphonium thiocyanate, and the like. These can be used singly or in combination of two or more kinds.
(D)硬化促進劑中,較好為胺系硬化促進劑,更好為改質聚胺,特佳為含咪唑基之改質聚胺、含脲鍵之改質聚胺硬化促進劑等。(D) Among the hardening accelerators, amine-based hardening accelerators are preferred, modified polyamines are more preferred, and modified polyamines containing imidazole groups and modified polyamine hardening accelerators containing urea bonds are particularly preferred.
本發明之樹脂組成物中,樹脂組成物中之(D)成分含量並未特別限制,但基於提高樹脂組成物之保存安定性之觀點,該含量於令樹脂組成物之不揮發分為100質量%時,較好為20質量%以下,更好為10質量%以下,又更好為5質量%以下。另一方面,基於有效率地使樹脂組成物硬化,提高低溫硬化性之觀點,於令樹脂組成物之不揮發分為100質量%時,較好為0.1質量%以上,更好為1質量%以上,又更好為2質量%以上。In the resin composition of the present invention, the content of the (D) component in the resin composition is not particularly limited, but from the viewpoint of improving the storage stability of the resin composition, the content is such that the non-volatile content of the resin composition is 100 mass In the case of%, it is preferably 20% by mass or less, more preferably 10% by mass or less, and still more preferably 5% by mass or less. On the other hand, from the viewpoint of efficiently curing the resin composition and improving the low-temperature curability, when the non-volatile content of the resin composition is 100% by mass, it is preferably 0.1% by mass or more, more preferably 1% by mass. The above is more preferably 2% by mass or more.
<(E)其他> 本發明之樹脂組成物中,在不損害本發明效果之範圍內,亦可任意含有上述(A)~(D)成分以外之各種添加劑((E)成分)。作為各種添加劑可舉例為保存安定劑、有機填充劑、增黏劑、調平劑、密著性賦予劑、片狀玻璃((C)成分)以外之無機填充材等。<(E) Others> The resin composition of the present invention may optionally contain various additives ((E) components) other than the components (A) to (D) as long as the effects of the present invention are not impaired. Examples of the various additives include a storage stabilizer, an organic filler, a tackifier, a leveling agent, an adhesiveness-imparting agent, and an inorganic filler other than sheet glass ((C) component).
作為保存安定劑舉例為硼酸酯化合物、鈦酸酯化合物、鋁酸酯化合物、鋯酸酯化合物等。Examples of the storage stabilizer include a borate compound, a titanate compound, an aluminate compound, and a zirconate compound.
作為硼酸酯化合物之代表例,舉例為三甲基硼酸酯、三乙基硼酸酯、三正丙基硼酸酯、三異丙基硼酸酯、三正丁基硼酸酯、三戊基硼酸酯、三烯丙基硼酸酯、三己基硼酸酯、三環己基硼酸酯、三辛基硼酸酯、三壬基硼酸酯、三癸基硼酸酯、三-十二烷基硼酸酯、三-十六烷基硼酸酯、三-十八烷基硼酸酯、三(2-乙基己氧基)硼烷、雙(1,4,7,10-四氧雜十一烷基)(1,4,7,10,13-五氧雜十四烷基)(1,4,7-三氧雜十一烷基)硼烷、三苄基硼酸酯、三苯基硼酸酯、三-鄰-甲苯基硼酸酯、三-間-甲苯基硼酸酯、三乙醇胺硼酸酯等。作為鈦酸化合物之代表例舉例為四乙基鈦酸酯、四丙基鈦酸酯、四異丙基鈦酸酯、四丁基鈦酸酯、四辛基鈦酸酯等。作為鋁酸鹽化合物之代表例舉例為三乙基鋁酸酯、三丙基鋁酸酯、三異丙基鋁酸酯、三丁基鋁酸酯、三辛基鋁酸酯等。作為鋯酸酯化合物之代表例舉例為四乙基鋯酸酯、四丙基鋯酸酯、四異丙基鋯酸酯、四丁基鋯酸酯等。該等中,基於廣泛使用性.安全性高、保存安定性優異之觀點,較好為硼酸酯類,更好為三乙基硼酸酯、三正丙基硼酸酯、三異丙基硼酸酯、三正丁基硼酸酯,特佳為三乙基硼酸酯。Representative examples of borate compounds include trimethyl borate, triethyl borate, tri-n-propyl borate, triisopropyl borate, tri-n-butyl borate, Amyl borate, triallyl borate, trihexyl borate, tricyclohexyl borate, trioctyl borate, trinonyl borate, tridecyl borate, tri- Dodecyl borates, tris-hexadecyl borates, tris-octadecyl borates, tris (2-ethylhexyloxy) borane, bis (1,4,7,10 -Tetraoxaundecyl) (1,4,7,10,13-pentaoxatetradecanyl) (1,4,7-trioxaundecyl) borane, tribenzylboron Acid esters, triphenyl borate, tri-o-tolyl borate, tri-m-tolyl borate, triethanolamine borate, and the like. Typical examples of the titanate compound include tetraethyl titanate, tetrapropyl titanate, tetraisopropyl titanate, tetrabutyl titanate, tetraoctyl titanate, and the like. Representative examples of the aluminate compounds include triethylaluminate, tripropylaluminate, triisopropylaluminate, tributylaluminate, and trioctylaluminate. Typical examples of the zirconate compound include tetraethyl zirconate, tetrapropyl zirconate, tetraisopropyl zirconate, tetrabutyl zirconate, and the like. Among these, it is based on widespread use. From the viewpoint of high safety and excellent storage stability, boric acid esters are preferred, and triethyl borate, tri-n-propyl borate, tri-isopropyl borate, and tri-n-butyl borate are more preferred. Esters, particularly preferably triethylborate.
樹脂組成物中之保存安定劑含量並未特別限制,基於提高樹脂組成物之保存安定性之觀點,相對於環氧樹脂100質量份,較好為0.01質量份以上,更好為0.05質量份以上,又更好為0.1質量%以上。另一方面,基於不造成硬化時間延遲之觀點,相對於環氧樹脂100質量份,較好為5質量份以下,更好為3質量份以下,又更好為1質量份以下。The content of the storage stabilizer in the resin composition is not particularly limited. From the viewpoint of improving the storage stability of the resin composition, it is preferably 0.01 parts by mass or more, more preferably 0.05 parts by mass or more, relative to 100 parts by mass of the epoxy resin. And more preferably 0.1% by mass or more. On the other hand, from the viewpoint of not causing a hardening time delay, it is preferably 5 parts by mass or less, more preferably 3 parts by mass or less, and still more preferably 1 part by mass or less with respect to 100 parts by mass of the epoxy resin.
作為有機填充劑舉例為例如橡膠粒子、聚矽氧粉末、尼龍粉末、氟樹脂粉末等,作為增黏劑舉例為例如Orben、Benton等;作為消泡劑或調平劑舉例為例如矽系、氟系、高分子系消泡劑或調平劑,作為密著性賦予劑舉例為例如三唑化合物、噻唑化合物、三嗪化合物、卟啉化合物等。Examples of organic fillers include rubber particles, polysiloxane powder, nylon powder, fluororesin powder, etc., and examples of tackifiers include Orben, Benton, etc .; examples of defoamers or leveling agents, such as silicon, fluorine, etc. For example, as the adhesion-imparting agent, a triazole compound, a thiazole compound, a triazine compound, a porphyrin compound, or the like is used as an adhesion-imparting agent.
又,作為片狀玻璃以外之無機填充材舉例為例如氧化矽、氧化鋁、硫酸鋇、滑石、黏土、雲母粉、氫氧化鋁、氫氧化鎂、碳酸鈣、碳酸鎂、氧化鎂、氮化硼、硼酸鋁、鈦酸鋇、鈦酸鍶、鈦酸鈣、鈦酸鎂、鈦酸鉍、氧化鈦、鋯酸鋇、鋯酸鈣等,一般尤其使用氧化矽。該等可使用1種或組合2種以上。作為市售之無機填充材舉例為日本AEROSIL(股)製「200」、「200CF」、「300」、「300CF」、「380」等之親水性發煙氧化矽,或「R-805」、「R-812」、「RY-200」、「RY-300」、「RX-200」、「RX-300」等之疏水性發煙氧化矽,ADMATECHS(股)製「SOC2」、「SOC1」等。Examples of inorganic fillers other than sheet glass include silica, alumina, barium sulfate, talc, clay, mica powder, aluminum hydroxide, magnesium hydroxide, calcium carbonate, magnesium carbonate, magnesium oxide, and boron nitride. , Aluminum borate, barium titanate, strontium titanate, calcium titanate, magnesium titanate, bismuth titanate, titanium oxide, barium zirconate, calcium zirconate, etc. Generally, silicon oxide is especially used. These can be used singly or in combination of two or more kinds. Examples of commercially available inorganic fillers include hydrophilic fumed silica, such as "200", "200CF", "300", "300CF", "380", etc., manufactured by Japan Aerosil Corporation, or "R-805", "R-812", "RY-200", "RY-300", "RX-200", "RX-300" and other hydrophobic fuming silicas, "SOC2" and "SOC1" made by ADMATECHS Wait.
包含片狀玻璃以外之無機填充材時,其含量於令樹脂組成物之不揮發分為100質量%時,較好為5質量%以下,更好為3質量%以下,又更好為1質量%以下,特佳為0.5質量%以下。且樹脂組成物中之片狀玻璃((C)成分)與片狀玻璃以外之無機填充材之合計含量,於令樹脂組成物之不揮發分為100質量%時,較好為40質量%以下,更好為35質量%以下,又更好為30質量%以下,特佳為25質量%以下。When an inorganic filler other than sheet glass is included, the content is preferably 5 mass% or less, more preferably 3 mass% or less, and even more preferably 1 mass when the non-volatile content of the resin composition is 100 mass%. % Or less, particularly preferably 0.5 mass% or less. When the total content of the sheet glass ((C) component) in the resin composition and the inorganic filler other than the sheet glass is 100% by mass, the resin composition is preferably 40% by mass or less. , More preferably 35 mass% or less, still more preferably 30 mass% or less, and particularly preferably 25 mass% or less.
<樹脂組成物之製造方法> 本發明之樹脂組成物可藉由將例如至少含有(A)~(C)成分之調配成分以3輥、球磨機、珠粒磨機、砂磨機等之混練手段,或超混合機、行星式混合機等之攪拌手段予以混合而調製。調配成分可一次混合,但基於樹脂組成物之保存安定性之觀點,較好依序使環氧樹脂((A)成分)與片狀玻璃((C)成分)混合,於其中混合聚硫醇化合物((B)成分)。<Manufacturing method of resin composition> 之 The resin composition of the present invention can be blended by, for example, a blending component containing at least the components (A) to (C) with a three-roller, ball mill, bead mill, sand mill, or the like. , Or mixing means such as super mixer, planetary mixer, etc. The compounding ingredients can be mixed at one time, but from the viewpoint of storage stability of the resin composition, it is preferable to mix the epoxy resin ((A) component) and the sheet glass ((C) component) in order, and then mix the polythiol therein. Compound ((B) component).
又,調製進而含有硬化促進劑((D)成分)、其他添加劑((E)成分)等之樹脂組成物時,基於分散性之觀點,較好(C)成分以外之片狀玻璃以外之無機填充材與片狀玻璃((C)成分)一起與環氧樹脂((A)成分)混合,基於樹脂組成物之保存安定性之觀點,硬化促進劑((D)成分)及 (E)成分之保存安定劑等較好在混合聚硫醇化合物((B)成分)混合之前,混合於環氧樹脂((A)成分)與片狀玻璃((C)成分)之混合物(使用(E)成分之片狀玻璃以外之無機填充材時,為環氧樹脂((A)成分)與片狀玻璃((C)成分)與片狀玻璃以外之無機填充材之混合物)中。In addition, when preparing a resin composition that further contains a hardening accelerator ((D) component), other additives ((E) component), etc., from the viewpoint of dispersibility, inorganic materials other than sheet glass other than (C) component are preferred. The filler is mixed with the sheet glass ((C) component) and the epoxy resin ((A) component). From the viewpoint of storage stability of the resin composition, the hardening accelerator ((D) component) and (E) component The storage stabilizer and the like are preferably mixed with a mixture of an epoxy resin ((A) component) and a sheet glass ((C) component) before using the polythiol compound ((B) component) (using (E) In the case of an inorganic filler other than sheet glass, it is a mixture of epoxy resin ((A) component) and sheet glass ((C) component) and inorganic filler other than sheet glass).
<樹脂組成物及其用途> 本發明之樹脂組成物其硬化後之硬化物之耐透濕性極高。且後述實施例之耐透濕性之評價係以水蒸氣(氣體)之透過度進行,該評價同時亦成為硬化物之氣體障壁性之評價,本發明之樹脂組成物之硬化物亦顯示氣體障壁性優異。因此,本發明之樹脂組成物可使用作為各種技術領域中之接著劑、密封劑、保護膜等。例如可使用於電子零件、半導體裝置、光電路零件等中之接著劑,太陽電池、高亮度LED、LCD、EL元件、有機TFT等之光半導體元件之密封(被覆元件,使元件與空氣環境隔絕之密封劑),且,可使用於HDD(硬碟驅動器)之密封(以氦氣等之氣體填充HDD內部時,用以防止氣體逸出之密封劑)、印刷電路板之絕緣保護膜等。<Resin composition and its use> 树脂 The resin composition of the present invention has extremely high moisture permeability resistance of the cured product after curing. In addition, the evaluation of the moisture permeability resistance of the examples described below is based on the permeability of water vapor (gas). This evaluation also becomes the evaluation of the gas barrier properties of the hardened material. The hardened material of the resin composition of the present invention also shows the gas barrier properties. Excellent sex. Therefore, the resin composition of the present invention can be used as an adhesive, a sealant, a protective film, and the like in various technical fields. For example, it can be used for adhesives in electronic parts, semiconductor devices, optical circuit parts, etc., and sealing of optical semiconductor devices such as solar cells, high-brightness LEDs, LCDs, EL elements, and organic TFTs (coating elements to isolate the elements from the air environment) In addition, it can be used for sealing of HDD (hard disk drive) (sealing agent to prevent gas from escaping when the inside of HDD is filled with a gas such as helium), and an insulating protective film for printed circuit boards.
本發明之樹脂組成物具有即使於低溫度區域亦快速硬化之優異低溫硬化性,硬化溫度並未特別限定,較好為50~120℃,更好為70~100℃,硬化時間較好為30~120分鐘,更好為60~90分鐘。由於可低溫且短時間硬化,故對於易熱劣化之接著對象物或密封對象物,亦可不產生該等熱劣化而進行接著或密封。因此,對於例如於顯示元件使用有機TFT之顯示裝置(電子紙等)或具有有機EL元件之有機EL裝置等,亦可不使有機TFT或有機EL元件熱劣化而可形成期望之密封構造。硬化時之加熱方法並未特別限定,但可使用例如熱風循環式烘箱、紅外線加熱器、加熱槍、高頻感應加熱裝置、藉由加熱工具之壓著等之加熱等。The resin composition of the present invention has an excellent low-temperature hardening property that it hardens quickly even in a low-temperature region. The hardening temperature is not particularly limited, but is preferably 50 to 120 ° C, more preferably 70 to 100 ° C, and the hardening time is preferably 30. ~ 120 minutes, more preferably 60 ~ 90 minutes. Since it can be cured at a low temperature and for a short time, it is also possible to perform bonding or sealing on an object to be thermally deteriorated or an object to be sealed without causing such thermal degradation. Therefore, for example, a display device (e.g., electronic paper) using an organic TFT for a display element or an organic EL device having an organic EL element can form a desired sealing structure without thermally deteriorating the organic TFT or the organic EL element. The heating method at the time of hardening is not specifically limited, For example, a hot-air circulation type oven, an infrared heater, a heating gun, a high-frequency induction heating device, heating by pressing with a heating tool, or the like can be used.
本發明之樹脂組成物於例如70℃熱硬化1小時(60分鐘)所得之硬化物於200 μm厚度依據JIS Z0208中記載之透濕度試驗方法(杯法)測定時之透濕度顯示30 (g/m2 .24h)以下(較好20(g/m2 .24h)以下)。透濕度若低,由於越低越好,故下限值並未特別限定,現實上大概約3(g/m2 .24h)以上,但不限定於此。因此,以該硬化物密封之密封對象物成為極難以產生因水分所致之劣化。又,本發明中所謂「硬化物」意指硬化反應前之樹脂組成物藉由加熱而反應90%以上者,例如藉由示差掃描熱量測定(DSC),測定來自硬化前之樹脂組成物之總發熱量(H0 ),來自樹脂組成物於70℃加熱1小時所得之硬化物之殘留發熱量(H1 ),藉由以下計算式算出之反應率顯示90%以上。The resin composition of the present invention is, for example, heat-cured at 70 ° C for 1 hour (60 minutes) at a thickness of 200 μm. The moisture permeability when measured according to the moisture permeability test method (cup method) described in JIS Z0208 shows 30 (g / m 2 .24 h) or less (preferably 20 (g / m 2 .24 h) or less). If the water vapor transmission rate is low, the lower limit is better, so the lower limit value is not particularly limited. In reality, it is about 3 (g / m 2 .24 h) or more, but it is not limited thereto. Therefore, the object to be sealed with the hardened material is extremely unlikely to be deteriorated by moisture. In the present invention, the "hardened material" means that the resin composition before the curing reaction reacts by 90% or more by heating. For example, the total amount of the resin composition before curing is measured by differential scanning calorimetry (DSC). The calorific value (H 0 ), the residual calorific value (H 1 ) derived from the hardened material obtained by heating the resin composition at 70 ° C. for 1 hour, and the reaction rate calculated by the following calculation formula shows 90% or more.
反應率(%)=(H0 -H1 )/H0 ×100Response rate (%) = (H 0 -H 1 ) / H 0 × 100
本發明之樹脂組成物於例如70℃熱硬化1小時(60分鐘)所得之硬化物之Tg越高,耐透濕性越良好。該硬化物之Tg並未特別限定,但較好為30℃以上,更好為40℃以上,特佳為50℃以上。For example, the higher the Tg of the cured product obtained by thermally curing the resin composition of the present invention at 70 ° C. for 1 hour (60 minutes), the better the moisture permeability resistance. The Tg of the cured product is not particularly limited, but is preferably 30 ° C or higher, more preferably 40 ° C or higher, and particularly preferably 50 ° C or higher.
又,本發明之樹脂組成物於硬化前藉由E型黏度計測定之25℃、20rpm下之組成物的黏度顯示15Pa.s以下(較好0.1 Pa.s以上10 Pa.s以下),且觸變指數(TI值)顯示未達2.0(較好未達1.5),為低黏度且構造黏性低之液狀物,於室溫顯示高流動性。因此,於狹小凹部或間隙樹脂組成物亦可快速浸入,因此可以例如於具有於一對基板間挾持顯示元件之構造之顯示裝置的周緣部形成之基板間間隙不留有空隙地嵌埋充分量之樹脂組成物。於顯示元件使用有機TFT之顯示裝置(特別是電子紙)中之挾持顯示元件之一對基板的基板間間隙一般為100~300 μm左右而非常狹小,但依據本發明之樹脂組成物,可形成將於該電子紙之一對基板之周緣部形成之基板間之間隙不殘留空隙地予以密封之密封部。而且,由於硬化後之硬化物耐透濕性極高,故極難以發生顯示元件因水分所致之性能劣化,可獲得高品質之電子紙。In addition, the viscosity of the composition of the resin composition of the present invention measured at 25 ° C. and 20 rpm by an E-type viscometer before curing was 15 Pa. s (preferably 0.1 Pa.s or more and 10 Pa.s or less), and the thixotropic index (TI value) shows less than 2.0 (preferably less than 1.5), which is a liquid with low viscosity and low structural viscosity. Shows high fluidity at room temperature. Therefore, the resin composition can be quickly immersed in the narrow recesses or gaps. Therefore, for example, a sufficient amount can be embedded in the gap between the substrates formed at the peripheral edge portion of the display device having a structure in which the display element is held between a pair of substrates without leaving a gap. Resin composition. In a display device (especially an electronic paper) using an organic TFT as a display element, the gap between the substrates of one pair of substrates holding the display element is generally about 100 to 300 μm and is very narrow, but the resin composition according to the present invention can be formed A sealing portion that seals a gap between the substrates formed on the peripheral edge portion of the substrate by one of the electronic papers without leaving a gap. In addition, since the cured product has extremely high moisture permeability resistance, it is extremely difficult for the performance of the display element to deteriorate due to moisture, and a high-quality electronic paper can be obtained.
又,本發明之樹脂組成物具有優異之保存安定性,可長期間不產生膠凝化而直接以低黏度狀態保存。本發明中之所謂「保存安定性」意指生產後使用之狀態,進而於商品流通之購入處耐於使用之期間之安定性。商品流通或長期保管後使用時,藉由於冷藏庫、冷凍庫等之低溫化保存而亦可延長保存安定性。一般基於耐受於20℃以上40℃以下之環境溫度下流通之觀點,保存安定性至少為3小時以上,較好6小時以上,更好12小時以上,又更好為1天以上,尤其更佳為3天以上,特佳為7天以上。保存安定性可以低黏度狀態保存之期間越長越好,其上限並未特別限定,但較好為2週,更好為3週,又更好為1個月,尤其更好為2個月,特佳為3個月,最好為6個月。 [實施例]In addition, the resin composition of the present invention has excellent storage stability and can be directly stored in a low viscosity state without gelation for a long period of time. The so-called "preservation stability" in the present invention means the state of use after production, and furthermore, the stability in the period of use at the place of purchase where the commodity is distributed. When used after circulation or long-term storage, the stability of storage can be extended by keeping the refrigerator and freezer at a lower temperature. Generally based on the viewpoint of withstanding the circulation at an ambient temperature of 20 ° C to 40 ° C, the storage stability is at least 3 hours, preferably 6 hours or more, more preferably 12 hours or more, and more preferably 1 day or more, especially more It is preferably more than 3 days, and particularly preferably more than 7 days. Storage stability The longer the storage period in the low-viscosity state, the better. The upper limit is not particularly limited, but it is preferably 2 weeks, more preferably 3 weeks, more preferably 1 month, and even more preferably 2 months. The best time is 3 months, preferably 6 months. [Example]
以下顯示實施例及比較例更具體說明本發明,但本發明並非限定於以下實施例。又,以下記載中之「份」意指「質量份」。The following examples and comparative examples illustrate the present invention more specifically, but the present invention is not limited to the following examples. In addition, "part" in the following description means "mass part."
1.原料 [(A)成分] (A1) 「jER807」:三菱化學股份有限公司製,雙酚F型環氧樹脂,環氧當量(EPW)160-175 g/eq,液狀 (A2) 「jER828」:三菱化學股份有限公司製,雙酚A型環氧樹脂,環氧當量(EPW)184-194 g/eq,液狀 (A3) 「EX-201」:NAGASE CHEMTEX股份有限公司製,間苯二酚二縮水甘油醚,環氧當量(EPW)117 g/eq,液狀 (A4) 「DME-100」:新日本理化股份有限公司製,1,4-環己烷二甲醇二縮水甘油醚,環氧當量(EPW)145-170 g/eq,液狀1. Raw material [(A) component] (A1) "jER807": Mitsubishi Chemical Corporation, bisphenol F-type epoxy resin, epoxy equivalent (EPW) 160-175 g / eq, liquid (A2) " jER828 ": manufactured by Mitsubishi Chemical Corporation, bisphenol A epoxy resin, epoxy equivalent (EPW) 184-194 g / eq, liquid (A3)" EX-201 ": manufactured by NAGASE CHEMTEX, Inc. Resorcinol diglycidyl ether, epoxy equivalent (EPW) 117 g / eq, liquid (A4) "DME-100": manufactured by Shin Nippon Chemical Co., Ltd., 1,4-cyclohexanedimethanol diglycidyl Ether, epoxy equivalent (EPW) 145-170 g / eq, liquid
[(B)成分] (B1) PEMP:SC有機化學股份有限公司製,季戊四醇四(3-巰基丙酸酯),硫醇當量122 g/eq (B2) TMTP:淀化學工業股份有限公司製,三羥甲基丙烷三(3-巰基丙酸酯),硫醇當量140 g/eq (B3) DPMP:二季戊四醇六(3-巰基丙酸酯),硫醇當量131 g/eq (B4) PE1:昭和電工股份有限公司製「KARENZ MT」,季戊四醇四(3-巰基丁酸酯),硫醇當量136 g/eq (B5) TMPIC:三(3-巰基丙基)異氰脲酸酯,硫醇當量117 g/eq (B6) TS-G:四國化成工業股份有限公司製,1,3,4,6-四(2-巰基乙基)甘醇脲,硫醇當量94 g/eq (B7) 4,4’-亞異丙基雙[(3-巰基丙氧基)苯]:硫醇當量189 g/eq[(B) component] (B1) PEMP: manufactured by SC Organic Chemical Co., Ltd., pentaerythritol tetrakis (3-mercaptopropionate), thiol equivalent 122 g / eq (B2) TMTP: manufactured by Yodo Chemical Industry Co., Ltd., Trimethylolpropane tri (3-mercaptopropionate), thiol equivalent 140 g / eq (B3) DPMP: Dipentaerythritol hexa (3-mercaptopropionate), thiol equivalent 131 g / eq (B4) PE1 : "KARENZ MT" manufactured by Showa Denko Corporation, pentaerythritol tetrakis (3-mercaptobutyrate), thiol equivalent 136 g / eq (B5) TMPIC: tris (3-mercaptopropyl) isocyanurate, sulfur Alcohol equivalent 117 g / eq (B6) TS-G: manufactured by Shikoku Chemical Industry Co., Ltd., 1,3,4,6-tetrakis (2-mercaptoethyl) glycol urea, thiol equivalent 94 g / eq ( B7) 4,4'-isopropylidenebis [(3-mercaptopropoxy) benzene]: thiol equivalent 189 g / eq
[(C)成分] (C1) GF750E:GLASS FLAKE LIMITED製,鱗片狀玻璃,平均粒徑160 μm,平均厚度5 μm,長寬比32 (C2) GF003:GLASS FLAKE LIMITED製,鱗片狀玻璃,平均粒徑40 μm,平均厚度3 μm,長寬比13 (C3) GF-001:GLASS FLAKE LIMITED製,鱗片狀玻璃,平均粒徑40 μm,平均厚度1 μm,長寬比40[(C) component] (C1) GF750E: GLASS FLAKE LIMITED, flake glass, average particle size 160 μm, average thickness 5 μm, aspect ratio 32 (C2) GF003: GLASS FLAKE LIMITED, flake glass, average Particle size 40 μm, average thickness 3 μm, aspect ratio 13 (C3) GF-001: made by GLASS FLAKE LIMITED, flake glass, average particle size 40 μm, average thickness 1 μm, aspect ratio 40
[(D)成分] (D1) AMICURE PN-23:味之素精密技術股份有限公司製,含咪唑基之改質聚胺(固體) (D2) FUJICURE FXR-1081:T&K TOKA股份有限公司製,含脲鍵之改質聚胺,固體類型 (D3) NOVACURE HX-3722:旭化成股份有限公司製,含咪唑之改質微膠囊體[(D) Ingredient] (D1) AMICURE PN-23: Made by Ajinomoto Precision Technology Co., Ltd., imidazole group-containing modified polyamine (solid) (D2) FUJICURE FXR-1081: Made by T & K TOKA Co., Ltd., Modified polyamine containing urea bond, solid type (D3) NOVACURE HX-3722: Modified microcapsules containing imidazole, manufactured by Asahi Kasei Corporation
[其他((E)成分)][Other ((E) ingredients)]
(E1) RD-8AL:龍森股份有限公司製,二氧化矽,平均粒徑15 μm (E2) 滑石MS:日本滑石股份有限公司製,滑石,平均粒徑14 μm (E3) AEROSIL 200:日本AEROSIL股份有限公司製,發煙氧化矽 (E4) TEB:純正化學工業股份有限公司製,三乙基硼酸酯 (E5) HN-2200:日立化成股份有限公司製,3或4-甲基-1,2,3,6-四氫鄰苯二甲酸酐,分子量166(E1) RD-8AL: Longsen Co., Ltd., silica, average particle size 15 μm 15 (E2) Talc MS: Japan Talc Co., Ltd., talc, average particle size 14 μm E (E3) AEROSIL 200: Japan AEROSIL Co., Ltd., fuming silica (E4) TEB: manufactured by Chunzen Chemical Industry Co., Ltd., triethyl borate (E5) HN-2200: manufactured by Hitachi Chemical Co., Ltd., 3 or 4-methyl- 1,2,3,6-tetrahydrophthalic anhydride, molecular weight 166
2. 評價試驗 (1)黏度 藉由E型黏度計RE-80(東機產業公司製,轉子:3°×R9.7),於25℃、20rpm予以測定。2. Evaluation test (1) Viscosity Measured at 25 ° C and 20 rpm using an E-type viscometer RE-80 (manufactured by Toki Sangyo Co., Rotor: 3 ° × R9.7).
(2) 觸變指數(TI值) 藉由E型黏度計RE-80(東機產業公司製,轉子:3°×R9.7),分別於25℃測定2rpm、20rpm之黏度,將2rpm之黏度與20rpm之黏度的比(2rpm/20rpm)作為觸變指數(TI值)。(2) Thixotropic index (TI value) Using an E-type viscometer RE-80 (manufactured by Toki Sangyo Co., Rotor: 3 ° × R9.7), measure the viscosity at 2 rpm and 20 rpm at 25 ° C. The ratio of the viscosity to the viscosity at 20 rpm (2 rpm / 20 rpm) was used as the thixotropic index (TI value).
<評價基準> 〇:未達1.5 △:1.5以上且未達2.0 ×:2.0以上<Evaluation Criteria> 〇: Less than 1.5 △: 1.5 or more and less than 2.0 ×: 2.0 or more
(3)保存安定性 將組成物於塑膠製密閉容器內於25℃保存7天,藉由E型黏度計RE-80(東機產業公司製,轉子:3°×R9.7),於25℃、20rpm予以測定,藉由7天後之黏度/初期黏度算出自初期黏度之增黏率。 <評價基準> 〇:未達1.2倍 △:1.2以上且未達1.5倍 ×:1.5倍以上(3) Storage stability The composition was stored in a plastic closed container at 25 ° C for 7 days. The E-type viscosity meter RE-80 (manufactured by Toki Sangyo Co., Ltd., rotor: 3 ° × R9.7) was used at 25 ° C. The temperature was measured at 20 ° C and 20 ° C, and the viscosity increase rate from the initial viscosity was calculated from the viscosity / initial viscosity after 7 days. <Evaluation criteria> 〇: 1.2 times or less △: 1.2 or more and 1.5 times or less: 1.5 times or more
(4)低溫硬化性 依據JIS C6521藉由加熱板式膠凝化試驗機GT-D(日新科學公司製)測定組成物於70℃直至不拉絲之時間。具體而言,將約0.5g之組成物置於預加熱至70℃之加熱板式膠凝化試驗機上,啟動碼表,重複以前端寬度5mm之刮杓重複接觸圓動作,測定直至膠凝化之時間。 <評價基準> 〇:未達10分 △:10分以上且未達30分 ×:30分以上(4) Low-temperature hardenability The composition was measured at 70 ° C until it was not drawn by a hot plate gelation tester GT-D (manufactured by Nisshin Scientific Co., Ltd.) in accordance with JIS C6521. Specifically, put about 0.5g of the composition on a heating plate type gelation tester preheated to 70 ° C, start the stopwatch, and repeat the contact circle operation with a scraping blade with a width of 5 mm at the front end, and measure until the gelation time. <Evaluation criteria> 〇: Less than 10 points △: More than 10 points and less than 30 points ×: More than 30 points
(5)耐透濕性(透濕度) 於脫模PET膜(NS-80A)之脫模面上塗布組成物,藉由玻璃棒延展至約200 μm之厚度,於70℃之烘箱加熱60分鐘,製作組成物之硬化膜。硬化膜係構成加熱前之膜的樹脂組成物反應90%以上者。使用所製作之硬化膜,以根據JIS Z0208之方法製作鋁杯,自於60℃、80%RH之高溫高濕槽中放置24小時之前後的質量,由下述計算式算出厚度200 μm之硬化物透濕度。(5) Moisture resistance (moisture permeability) 涂布 Coat the composition on the release surface of the release PET film (NS-80A), stretch to a thickness of about 200 μm with a glass rod, and heat in an oven at 70 ° C for 60 minutes To produce a hardened film of the composition. The cured film is a resin composition that constitutes a film before heating in which the reaction is more than 90%. Using the produced hardened film, an aluminum cup was produced in accordance with the method of JIS Z0208. The mass before and after being left in a high-temperature and high-humidity tank at 60 ° C and 80% RH for 24 hours was used to calculate the hardening thickness of 200 μm from the following calculation formula. The material is permeable to humidity.
透濕度(g/m2 .24h)=[(放置24小時後之鋁杯質量(g)-放置前之鋁杯質量(g))/膜面積(m2 )]×(膜厚度之實測值( μm)/200( μm))Moisture permeability (g / m 2 .24h) = [(Mass of aluminum cup after 24 hours (g)-Mass of aluminum cup before placing (g)) / Area of film (m 2 )] × (Measured value of film thickness (μm) / 200 (μm))
<評價基準> 〇:未達20(g/m2 .24h) △:20(g/m2 .24h)以上且未達30(g/m2 .24h) ×:30(g/m2 .24h)以上<Evaluation Criteria> ○: Less than 20 (g / m 2 .24h) △: 20 (g / m 2 .24h) or more and less than 30 (g / m 2 .24h) ×: 30 (g / m 2) . 24h) or more
3. 實施例及比較例 以下述表1、2之上欄所示之調配混合各成分,調製實施例1~18、比較例1~4及參考例1~2之樹脂組成物。表中之(份)表示質量份,(%)表示質量%。3. Examples and Comparative Examples The components shown in the upper columns of Tables 1 and 2 below were mixed to prepare resin compositions of Examples 1 to 18, Comparative Examples 1 to 4 and Reference Examples 1 to 2. In the table, (parts) represents parts by mass, and (%) represents mass%.
樹脂組成物於實施例1~15、17中,係藉由3輥混合機混合(A)成分、(C)成分、(E3),於其中添加(D)成分、(E4),進而以混合機混合,於其中添加(B)成分,以混合機充分分散後,靜置脫泡而調製。又,調製作業於25℃進行,總混合時間為30分。The resin composition was mixed with the components (A), (C), and (E3) by a three-roller mixer in Examples 1 to 15, and 17, and then added the components (D) and (E4) to the mixture. Mix by machine, add component (B) to it, and fully disperse with a mixer, and then stand and defoam to prepare. The preparation operation was performed at 25 ° C, and the total mixing time was 30 minutes.
實施例16中,藉由3輥混合機混合(A)成分、(B)成分、(C)成分、(E3),於其中添加(D)成分、(E4),充分分散後,靜置脫泡而調製。又,混合手段、溫度及總混合時間與實施例1~15相同。In Example 16, (A) component, (B) component, (C) component, and (E3) were mixed with the 3 roll mixer, (D) component, (E4) were added to this, and after fully dispersing, it was left to stand and remove Bubble and modulation. The mixing means, temperature, and total mixing time were the same as those in Examples 1 to 15.
實施例18中,混合(A)成分、(C)成分,於其中添加(D)成分、(E4)充分分散後,靜置脫泡而調製。又,混合手段、溫度及總混合時間與實施例1~15相同。In Example 18, (A) component and (C) component were mixed, (D) component, and (E4) were added, and it fully disperse | distributed, and it stood still and defoamed, and was prepared. The mixing means, temperature, and total mixing time were the same as those in Examples 1 to 15.
比較例1中,混合(A)成分、(E1),於其中添加(D)成分進而混合,於其中添加(E5)充分分散後,靜置脫泡而調製。混合手段、溫度及總混合時間與實施例1~15相同。In Comparative Example 1, the component (A) and (E1) were mixed, the component (D) was added thereto and mixed, and (E5) was added thereto to disperse sufficiently, and the mixture was allowed to stand and defoam to prepare. The mixing means, temperature and total mixing time are the same as those in Examples 1 to 15.
比較例2中,混合(A)成分、(E1),於其中添加(D)成分進而混合,於其中添加(B)成分充分分散後,靜置脫泡而調製。混合手段、溫度及總混合時間與實施例1~15相同。 比較例3~4中,混合(A)成分、(E2)、(E3),於其中添加(C)成分、(E4)進而混合,於其中添加(B)成分充分分散後,靜置脫泡而調製。混合手段、溫度及總混合時間與實施例1~15相同。In Comparative Example 2, the component (A) and (E1) were mixed, the component (D) was added to the mixture, and the component (B) was added to the mixture to disperse the mixture sufficiently. Then, the mixture was left to defoam and prepared. The mixing means, temperature and total mixing time are the same as those in Examples 1 to 15. In Comparative Examples 3 to 4, the components (A), (E2), and (E3) were mixed, the components (C) and (E4) were added to the mixture, and the components (B) were added to the mixture to fully disperse them. And modulation. The mixing means, temperature and total mixing time are the same as those in Examples 1 to 15.
參考例1中,混合(A)成分、(C)成分,於其中添加(D)成分進而混合,於其中添加(E5)充分分散後,靜置脫泡而調製。混合手段、溫度及總混合時間與實施例1~15相同。 參考例2中,混合(A)成分、(C)成分,於其中添加(D)成分進而混合後,靜置脫泡而調製。混合手段、溫度及總混合時間與實施例1~15相同。In Reference Example 1, the component (A) and the component (C) were mixed, the component (D) was added thereto and mixed, and (E5) was added thereto to disperse sufficiently, and then the mixture was left to stand and defoam to prepare. The mixing means, temperature and total mixing time are the same as those in Examples 1 to 15. In Reference Example 2, the component (A) and the component (C) were mixed, and the component (D) was added and mixed, and then the mixture was left to stand and defoamed to prepare a mixture. The mixing means, temperature and total mixing time are the same as those in Examples 1 to 15.
實施例1~18、比較例1~4及參考例1~2之樹脂組成物供於前述評價試驗之結果為表1、2之下欄。又,比較例1、參考例1由於硬化物過於脆,故無法作成試驗片,無法測定硬化物之透濕度。The resin compositions of Examples 1 to 18, Comparative Examples 1 to 4, and Reference Examples 1 to 2 were subjected to the aforementioned evaluation tests. The results are shown in the lower columns of Tables 1 and 2. In addition, since Comparative Example 1 and Reference Example 1 were too brittle, the test piece could not be made, and the moisture permeability of the hardened product could not be measured.
由表1、2可知,如實施例1~18之結果,本發明之樹脂組成物之初期黏度及觸變指數(TI值)低,保存安定性亦良好,硬化物顯示優異之耐濕透性。相對於此,比較例1之樹脂組成物之保存安定性、低溫硬化性及硬化物之耐透濕度差,比較例2、3之樹脂組成物之硬化物的耐透濕性差,比較例4之樹脂組成物之初期黏度、觸變指數(TI值)高,可知不具有如本發明之樹脂組成物般高程度之性能。As can be seen from Tables 1 and 2, as the results of Examples 1 to 18, the initial viscosity and thixotropic index (TI value) of the resin composition of the present invention are low, the storage stability is also good, and the hardened material shows excellent moisture permeability resistance. . In contrast, the resin composition of Comparative Example 1 has poor storage stability, low-temperature hardenability, and moisture permeability resistance of the cured material, and the resin composition of Comparative Examples 2 and 3 has poor moisture permeability resistance. The initial viscosity and thixotropic index (TI value) of the resin composition are high, and it is understood that the resin composition does not have such high performance as the resin composition of the present invention.
本申請案係以於日本提出申請之特願2017-037013為基礎,其內容全文包含於本說明書中。This application is based on Japanese Patent Application No. 2017-037013 filed in Japan, the contents of which are incorporated in this specification in their entirety.
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| JP2022109222A (en) * | 2021-01-14 | 2022-07-27 | パナソニックIpマネジメント株式会社 | Resin composition for laser welding, molded article, laser welded body and method for manufacturing the same |
| CN115651357B (en) * | 2022-09-15 | 2025-04-29 | 华烁电子材料(武汉)有限公司 | Epoxy resin composition and prepreg prepared using the same |
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| JP2004035857A (en) * | 2002-07-08 | 2004-02-05 | Ricoh Co Ltd | Photocurable optical adhesive composition |
| WO2007005650A2 (en) * | 2005-06-30 | 2007-01-11 | Jeld-Wen, Inc. | Molded polymeric structural members and compositions and methods for making them |
| CN101277992A (en) * | 2005-09-30 | 2008-10-01 | 住友电木株式会社 | Epoxy resin composition and semiconductor device |
| JP2007134321A (en) * | 2005-10-14 | 2007-05-31 | Matsushita Electric Ind Co Ltd | LIGHT EMITTING DEVICE, LIGHT EMITTING DEVICE MANUFACTURING METHOD, EXPOSURE DEVICE, AND IMAGE FORMING DEVICE |
| CN100497513C (en) * | 2006-03-29 | 2009-06-10 | 湖南神力实业有限公司 | Rod shaped single parked epoxy adhesive and preparation process |
| AU2008254045B2 (en) * | 2007-05-21 | 2013-02-14 | Mitsubishi Gas Chemical Company, Inc. | Amine epoxy resin curing agent, gas barrier epoxy resin composition comprising the curing agent, coating agent, and adhesive agent for laminate |
| JP5395677B2 (en) * | 2008-01-25 | 2014-01-22 | 三井化学株式会社 | Epoxy polymerizable composition and sealing material composition containing the same |
| DE102008025277A1 (en) * | 2008-05-27 | 2009-12-03 | Merck Patent Gmbh | glass composition |
| JP2010055861A (en) * | 2008-08-27 | 2010-03-11 | Panasonic Corp | Light-emitting device, and manufacturing method of light-emitting device |
| JP5551906B2 (en) * | 2009-09-10 | 2014-07-16 | 積水化学工業株式会社 | Transparent sheet |
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