TW201817776A - Transparent polyimide precursor resin composition with improved resin stability and heat resistance, method for manufacturing polyimide film using the same, and polyimide film prepared therefrom - Google Patents
Transparent polyimide precursor resin composition with improved resin stability and heat resistance, method for manufacturing polyimide film using the same, and polyimide film prepared therefrom Download PDFInfo
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- TW201817776A TW201817776A TW106128437A TW106128437A TW201817776A TW 201817776 A TW201817776 A TW 201817776A TW 106128437 A TW106128437 A TW 106128437A TW 106128437 A TW106128437 A TW 106128437A TW 201817776 A TW201817776 A TW 201817776A
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- heat resistance
- acid dianhydride
- film
- resin composition
- transparent
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- 229920001721 polyimide Polymers 0.000 title claims abstract description 46
- 238000000034 method Methods 0.000 title claims abstract description 20
- 239000002243 precursor Substances 0.000 title claims abstract description 15
- 239000011342 resin composition Substances 0.000 title claims abstract description 14
- 239000011347 resin Substances 0.000 title claims description 25
- 229920005989 resin Polymers 0.000 title claims description 25
- 239000004642 Polyimide Substances 0.000 title claims description 18
- 238000004519 manufacturing process Methods 0.000 title description 3
- 150000004984 aromatic diamines Chemical class 0.000 claims abstract description 35
- 239000003960 organic solvent Substances 0.000 claims abstract description 32
- 239000002253 acid Substances 0.000 claims abstract description 31
- 229920005575 poly(amic acid) Polymers 0.000 claims abstract description 27
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 claims abstract description 19
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims description 56
- -1 dianhydride compound Chemical class 0.000 claims description 46
- 239000000203 mixture Substances 0.000 claims description 46
- 239000000178 monomer Substances 0.000 claims description 25
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 claims description 17
- PXXJHWLDUBFPOL-UHFFFAOYSA-N benzamidine Chemical compound NC(=N)C1=CC=CC=C1 PXXJHWLDUBFPOL-UHFFFAOYSA-N 0.000 claims description 14
- 239000007787 solid Substances 0.000 claims description 12
- 229920002098 polyfluorene Polymers 0.000 claims description 11
- 238000002834 transmittance Methods 0.000 claims description 11
- 150000004985 diamines Chemical class 0.000 claims description 10
- 238000004383 yellowing Methods 0.000 claims description 10
- GEWWCWZGHNIUBW-UHFFFAOYSA-N 1-(4-nitrophenyl)propan-2-one Chemical compound CC(=O)CC1=CC=C([N+]([O-])=O)C=C1 GEWWCWZGHNIUBW-UHFFFAOYSA-N 0.000 claims description 9
- LBVMWHCOFMFPEG-UHFFFAOYSA-N 3-methoxy-n,n-dimethylpropanamide Chemical compound COCCC(=O)N(C)C LBVMWHCOFMFPEG-UHFFFAOYSA-N 0.000 claims description 9
- 239000009719 polyimide resin Substances 0.000 claims description 9
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims description 9
- 235000010290 biphenyl Nutrition 0.000 claims description 8
- 239000004305 biphenyl Substances 0.000 claims description 8
- 150000003949 imides Chemical class 0.000 claims description 8
- UKJLNMAFNRKWGR-UHFFFAOYSA-N cyclohexatrienamine Chemical group NC1=CC=C=C[CH]1 UKJLNMAFNRKWGR-UHFFFAOYSA-N 0.000 claims description 7
- 230000009477 glass transition Effects 0.000 claims description 6
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 claims description 5
- 239000007809 chemical reaction catalyst Substances 0.000 claims description 5
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 4
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 claims description 4
- 150000008064 anhydrides Chemical class 0.000 claims description 4
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 claims description 4
- CYSPWCARDHRYJX-UHFFFAOYSA-N 9h-fluoren-1-amine Chemical group C12=CC=CC=C2CC2=C1C=CC=C2N CYSPWCARDHRYJX-UHFFFAOYSA-N 0.000 claims description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims description 2
- 239000008096 xylene Substances 0.000 claims description 2
- TWKVCLRLFUIZLG-UHFFFAOYSA-N 5-(4-carboxyphenyl)cyclohexa-2,4-diene-1,1,2-tricarboxylic acid Chemical compound C1C(C(O)=O)(C(O)=O)C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)C=C1 TWKVCLRLFUIZLG-UHFFFAOYSA-N 0.000 claims 1
- 238000005266 casting Methods 0.000 abstract description 6
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 50
- 239000000758 substrate Substances 0.000 description 15
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 14
- 239000011521 glass Substances 0.000 description 11
- 238000006243 chemical reaction Methods 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 8
- 229910052757 nitrogen Inorganic materials 0.000 description 7
- 230000003287 optical effect Effects 0.000 description 7
- 239000006227 byproduct Substances 0.000 description 6
- 239000007810 chemical reaction solvent Substances 0.000 description 6
- 125000001153 fluoro group Chemical group F* 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 238000006116 polymerization reaction Methods 0.000 description 6
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 5
- 238000002360 preparation method Methods 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 150000001409 amidines Chemical group 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 4
- 230000000704 physical effect Effects 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000001723 curing Methods 0.000 description 3
- 150000002466 imines Chemical class 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- 238000005054 agglomeration Methods 0.000 description 2
- 230000002776 aggregation Effects 0.000 description 2
- 125000000320 amidine group Chemical group 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- FDQSRULYDNDXQB-UHFFFAOYSA-N benzene-1,3-dicarbonyl chloride Chemical compound ClC(=O)C1=CC=CC(C(Cl)=O)=C1 FDQSRULYDNDXQB-UHFFFAOYSA-N 0.000 description 2
- KANQIAARVSWKKG-UHFFFAOYSA-N bicyclo[2.2.1]hept-5-ene-2,3-dicarbonyl chloride Chemical compound C1C2C=CC1C(C(=O)Cl)C2C(Cl)=O KANQIAARVSWKKG-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 2
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- KYTZHLUVELPASH-UHFFFAOYSA-N naphthalene-1,2-dicarboxylic acid Chemical compound C1=CC=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 KYTZHLUVELPASH-UHFFFAOYSA-N 0.000 description 2
- 229920000768 polyamine Polymers 0.000 description 2
- 239000002861 polymer material Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- LXEJRKJRKIFVNY-UHFFFAOYSA-N terephthaloyl chloride Chemical compound ClC(=O)C1=CC=C(C(Cl)=O)C=C1 LXEJRKJRKIFVNY-UHFFFAOYSA-N 0.000 description 2
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- NSGXIBWMJZWTPY-UHFFFAOYSA-N 1,1,1,3,3,3-hexafluoropropane Chemical compound FC(F)(F)CC(F)(F)F NSGXIBWMJZWTPY-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- XMOJDDYUUPGBIT-UHFFFAOYSA-N 2-amino-6-[2-(3-amino-2-hydroxyphenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]phenol Chemical compound NC1=CC=CC(C(C=2C(=C(N)C=CC=2)O)(C(F)(F)F)C(F)(F)F)=C1O XMOJDDYUUPGBIT-UHFFFAOYSA-N 0.000 description 1
- RUAXWVDEYJEWRY-UHFFFAOYSA-N 4-(4-aminophenyl)aniline;dihydrochloride Chemical compound Cl.Cl.C1=CC(N)=CC=C1C1=CC=C(N)C=C1 RUAXWVDEYJEWRY-UHFFFAOYSA-N 0.000 description 1
- NEQFBGHQPUXOFH-UHFFFAOYSA-N 4-(4-carboxyphenyl)benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1C1=CC=C(C(O)=O)C=C1 NEQFBGHQPUXOFH-UHFFFAOYSA-N 0.000 description 1
- QQGYZOYWNCKGEK-UHFFFAOYSA-N 5-[(1,3-dioxo-2-benzofuran-5-yl)oxy]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(OC=2C=C3C(=O)OC(C3=CC=2)=O)=C1 QQGYZOYWNCKGEK-UHFFFAOYSA-N 0.000 description 1
- ZHBXLZQQVCDGPA-UHFFFAOYSA-N 5-[(1,3-dioxo-2-benzofuran-5-yl)sulfonyl]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(S(=O)(=O)C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 ZHBXLZQQVCDGPA-UHFFFAOYSA-N 0.000 description 1
- MQAHXEQUBNDFGI-UHFFFAOYSA-N 5-[4-[2-[4-[(1,3-dioxo-2-benzofuran-5-yl)oxy]phenyl]propan-2-yl]phenoxy]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(OC2=CC=C(C=C2)C(C)(C=2C=CC(OC=3C=C4C(=O)OC(=O)C4=CC=3)=CC=2)C)=C1 MQAHXEQUBNDFGI-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- LKRUZYNPJUZODM-UHFFFAOYSA-N adamantane-1,3-dicarbonyl chloride Chemical compound C1C(C2)CC3CC1(C(=O)Cl)CC2(C(Cl)=O)C3 LKRUZYNPJUZODM-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- UYGLRNGZSUDIEA-UHFFFAOYSA-N benzene-1,3-dicarboxylic acid;formic acid Chemical compound OC=O.OC(=O)C1=CC=CC(C(O)=O)=C1 UYGLRNGZSUDIEA-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 229930188620 butyrolactone Natural products 0.000 description 1
- 125000003739 carbamimidoyl group Chemical group C(N)(=N)* 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000002860 competitive effect Effects 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 229920005570 flexible polymer Polymers 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- VIUHYPPHBQZSPF-UHFFFAOYSA-N naphthalene-1,4-dicarbonyl chloride Chemical compound C1=CC=C2C(C(=O)Cl)=CC=C(C(Cl)=O)C2=C1 VIUHYPPHBQZSPF-UHFFFAOYSA-N 0.000 description 1
- XYQUZYVBQYBQDB-UHFFFAOYSA-N naphthalene-1,5-dicarbonyl chloride Chemical compound C1=CC=C2C(C(=O)Cl)=CC=CC2=C1C(Cl)=O XYQUZYVBQYBQDB-UHFFFAOYSA-N 0.000 description 1
- NZZGQZMNFCTNAM-UHFFFAOYSA-N naphthalene-2,6-dicarbonyl chloride Chemical compound C1=C(C(Cl)=O)C=CC2=CC(C(=O)Cl)=CC=C21 NZZGQZMNFCTNAM-UHFFFAOYSA-N 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
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- 238000000807 solvent casting Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000001029 thermal curing Methods 0.000 description 1
- RKFCDGOVCBYSEW-AUUKWEANSA-N tmeg Chemical compound COC=1C(OC)=CC(C(OC(C=2OC)=C34)=O)=C3C=1OC(=O)C4=CC=2O[C@@H]1O[C@H](CO)[C@@H](O)[C@H](O)[C@H]1O RKFCDGOVCBYSEW-AUUKWEANSA-N 0.000 description 1
- 238000001392 ultraviolet--visible--near infrared spectroscopy Methods 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1003—Preparatory processes
- C08G73/1007—Preparatory processes from tetracarboxylic acids or derivatives and diamines
- C08G73/101—Preparatory processes from tetracarboxylic acids or derivatives and diamines containing chain terminating or branching agents
- C08G73/1014—Preparatory processes from tetracarboxylic acids or derivatives and diamines containing chain terminating or branching agents in the form of (mono)anhydrid
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
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- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1003—Preparatory processes
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- C08G73/1021—Preparatory processes from tetracarboxylic acids or derivatives and diamines characterised by the catalyst used
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1003—Preparatory processes
- C08G73/1007—Preparatory processes from tetracarboxylic acids or derivatives and diamines
- C08G73/1028—Preparatory processes from tetracarboxylic acids or derivatives and diamines characterised by the process itself, e.g. steps, continuous
- C08G73/1032—Preparatory processes from tetracarboxylic acids or derivatives and diamines characterised by the process itself, e.g. steps, continuous characterised by the solvent(s) used
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1039—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors comprising halogen-containing substituents
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- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1075—Partially aromatic polyimides
- C08G73/1078—Partially aromatic polyimides wholly aromatic in the diamino moiety
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08L79/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
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Abstract
Description
發明領域 本發明有關一種具有優越的機械特性、高耐熱性與低熱膨脹係數以及在溶液澆鑄期間不會顯現白濁現象之透明聚醯亞胺前驅物樹脂組成物、一種使用其來製備聚醯亞胺膜之方法以及一種由其所製備之聚醯亞胺膜。本發明可應用於可撓性顯示基板材料以及半導體材料。FIELD OF THE INVENTION The present invention relates to a transparent polyimide precursor resin composition having superior mechanical properties, high heat resistance and low thermal expansion coefficient, and which does not show white turbidity during solution casting, and a method for preparing polyimide using the same. Method of film and a polyimide film prepared from the same. The present invention can be applied to flexible display substrate materials and semiconductor materials.
發明背景 可撓性聚合物材料作為下一代顯示裝置之可撓性顯示器的基板材料,正引起關注。BACKGROUND OF THE INVENTION Flexible polymer materials are attracting attention as substrate materials for flexible displays of next-generation display devices.
通常是使用有機發光二極體(OLED)顯示器作為該可撓性裝置,且使用高處理溫度(300-500ºC)之TFT處理。可忍受此一高處理溫度之聚合物材料非常有限。其中主要是使用具有優越的耐熱性之聚醯亞胺(PI)樹脂。Generally, organic light emitting diode (OLED) displays are used as the flexible device, and TFT processing with a high processing temperature (300-500ºC) is used. Polymer materials that can tolerate this high processing temperature are very limited. Among them, polyimide (PI) resin with superior heat resistance is mainly used.
有機發光二極體(OLED)顯示器之製造,是經由於玻璃基材上塗佈一樹脂且熱固化該樹脂獲得一膜,之後在一系列的步驟之後從該玻璃基材上分離該膜而得。在此製造過程期間,在室溫下塗佈於玻璃基材上之樹脂的穩定性很重要。假如不能確保樹脂的穩定性,則由於樹脂的凝集、白濁現象等等,固化後可能無法獲得均勻的膜,其可能產生缺陷。缺陷亦可能由於TFT沈積過程期間高溫之熱衝擊而導致。因此,需要具有在室溫下優越的樹脂穩定性、高耐熱性與低熱膨脹係數(CTE)之聚醯亞胺(PI)樹脂。Organic light-emitting diode (OLED) displays are manufactured by coating a resin on a glass substrate and thermally curing the resin to obtain a film, and then separating the film from the glass substrate after a series of steps. . During this manufacturing process, the stability of the resin applied to the glass substrate at room temperature is important. If the stability of the resin cannot be ensured, a uniform film may not be obtained after curing due to resin agglomeration, turbidity phenomenon, etc., which may cause defects. Defects may also be caused by high temperature thermal shock during the TFT deposition process. Therefore, a polyimide (PI) resin having excellent resin stability at room temperature, high heat resistance, and low coefficient of thermal expansion (CTE) is needed.
韓國專利公開案第2015-108812號揭示一種聚醯胺酸溶液,其具有優越的熱特性如低熱膨脹速率與高熱解溫度,因此可用於顯示裝置之基層或保護層,以及一種使用其之膜。然而,因為無法確保樹脂的穩定性,所以由於樹脂的凝集、白濁現象等等,固化後無法獲得均勻的膜,且可能會發生缺陷。Korean Patent Publication No. 2015-108812 discloses a polyamic acid solution, which has superior thermal characteristics such as a low thermal expansion rate and a high pyrolysis temperature, and thus can be used as a base layer or a protective layer of a display device, and a film using the same. However, because the stability of the resin cannot be ensured, a uniform film cannot be obtained after curing, and defects may occur due to resin agglomeration, turbidity, and the like.
韓國專利公開案第2013-35691號揭示一種用於製備聚醯胺-醯亞胺共聚物膜之組成物以及方法。然而,其由於副產物的產生以及需要移除該副產物之製程,以致經濟效益有限。Korean Patent Publication No. 2013-35691 discloses a composition and method for preparing a polyfluorene-fluorene imine copolymer film. However, due to the production of by-products and the need to remove the by-products, the economic benefits are limited.
因此,需要一種具有高耐熱性、低熱膨脹係數與優越的機械強度以及良好的樹脂穩定性之聚醯亞胺組成物,以及透過相對簡單的製程之製備方法。 相關技術之參考 專利文件Therefore, there is a need for a polyimide composition having high heat resistance, a low thermal expansion coefficient, superior mechanical strength, and good resin stability, and a preparation method through a relatively simple process. References to related technologies
(專利文件1) 1:韓國專利公開案第2015-108812號。 (專利文件2) 2:韓國專利公開案第2013-35691號。(Patent Document 1) 1: Korean Patent Publication No. 2015-108812. (Patent Document 2) 2: Korean Patent Publication No. 2013-35691.
技術問題 為了解決上述之問題,本發明之發明人已找到一種芳族二胺與酸二酐化合物之組成物,其對於製備具改良之耐熱性以及優化之機械特性之聚醯亞胺膜更有效,以及一種有機溶劑之組成物,其可防止白濁現象。結果是,他們找到一種比現存之聚醯亞胺膜更優越的透明度與樹脂穩定性、高耐熱性與低熱膨脹係數之聚醯亞胺前驅物樹脂組成物,且已完成了本發明。Technical Problem In order to solve the above problems, the inventors of the present invention have found a composition of an aromatic diamine and an acid dianhydride compound, which is more effective for preparing a polyimide film having improved heat resistance and optimized mechanical properties. , And a composition of an organic solvent, which can prevent white turbidity. As a result, they have found a polyimide precursor resin composition having superior transparency and resin stability, high heat resistance and low thermal expansion coefficient than the existing polyimide film, and have completed the present invention.
據此,本發明旨在提供一種聚醯亞胺前驅物樹脂組成物,其可用作為可撓性顯示器之基板材料,其具有透明性、優越的樹脂穩定性、高耐熱性與低熱膨脹係數。Accordingly, the present invention aims to provide a polyimide precursor resin composition, which can be used as a substrate material for a flexible display, which has transparency, superior resin stability, high heat resistance, and a low thermal expansion coefficient.
本發明亦旨在提供一種使用該組成物來製備聚醯亞胺樹脂膜之方法。The present invention also aims to provide a method for preparing a polyimide resin film using the composition.
本發明亦旨在提供一種用該製備方法製得之聚醯亞胺樹脂膜,以10-15μm之膜厚度為基礎,該膜具有300ºC或更高的玻璃轉移溫度、在100至300ºC之範圍內25ppm/ºC或更低的熱膨脹係數、在550nm之波長下85%或更高的透射率以及在550nm之波長下7或更低的黃化指數(YI)。 技術方案The present invention also aims to provide a polyimide resin film prepared by the preparation method. Based on a film thickness of 10-15 μm, the film has a glass transition temperature of 300 ° C or higher and is in the range of 100 to 300 ° C. A thermal expansion coefficient of 25 ppm / ºC or lower, a transmittance of 85% or higher at a wavelength of 550 nm, and a yellowing index (YI) of 7 or lower at a wavelength of 550 nm. Technical solutions
本發明提供一種具改良之樹脂穩定性與高耐熱性之透明聚醯亞胺前驅物樹脂組成物,其含有芳族二胺組份、酸二酐化合物以及一有機溶劑,其中該芳族二胺組份(A)含有作為氟化芳族二胺單體之2,2'-雙(三氟甲基)-4,4'-二胺聯苯(TFMB)、作為具有醯胺基團之二胺單體之N-(4-胺苯基)-4-胺苯甲醯胺(DBA)或其等之混合物;該酸二酐化合物(B)是含有作為氟化芳族酸二酐之4,4’-(六氟異亞丙基)二酞酸酐(6FDA)與作為非氟化芳族酸二酐之焦蜜石酸二酐(PMDA)或3,3,4,4'-聯苯四羧酸二酐(BPDA)之混合物;以及該有機溶劑(C)是γ-丁內酯(GBL)與N-甲基-2-吡咯啶酮(NMP)之混合物、γ-丁內酯(GBL)與3-甲氧基-N,N-二甲基丙醯胺(DMPA)之混合物或單獨為3-甲氧基-N,N-二甲基丙醯胺(DMPA)。The invention provides a transparent polyimide precursor resin composition with improved resin stability and high heat resistance, which contains an aromatic diamine component, an acid dianhydride compound, and an organic solvent, wherein the aromatic diamine Component (A) contains 2,2'-bis (trifluoromethyl) -4,4'-diamine biphenyl (TFMB) as a fluorinated aromatic diamine monomer, as the second one having a fluorenamine group N- (4-aminophenyl) -4-amine benzamidine (DBA) or a mixture thereof, which is an amine monomer; the acid dianhydride compound (B) contains 4 as a fluorinated aromatic acid dianhydride. , 4 '-(hexafluoroisopropylidene) diphthalic anhydride (6FDA) and pyromelite dianhydride (PMDA) or 3,3,4,4'-biphenyl as non-fluorinated aromatic acid dianhydride A mixture of tetracarboxylic dianhydride (BPDA); and the organic solvent (C) is a mixture of γ-butyrolactone (GBL) and N-methyl-2-pyrrolidone (NMP), γ-butyrolactone ( GBL) is a mixture with 3-methoxy-N, N-dimethylpropanamide (DMPA) or 3-methoxy-N, N-dimethylpropanamide (DMPA) alone.
本發明亦提供一種用於製備一透明聚醯亞胺樹脂膜之方法,該方法包括通過熱處理使用該組成物製得之聚醯胺酸溶液製備一膜。The present invention also provides a method for preparing a transparent polyimide resin film. The method comprises preparing a film by heat treating a polyamidic acid solution prepared from the composition.
本發明亦提供一種由該製備方法製得之聚醯亞胺樹脂膜,以10-15μm之膜厚度為基礎,該膜具有300ºC或更高的玻璃轉移溫度、在100至300ºC之範圍內25ppm/ºC或更低的熱膨脹係數、在550nm之波長下85%或更高的透射率以及在550nm之波長下7或更低的黃化指數(YI)。 有利的功效The invention also provides a polyimide resin film prepared by the preparation method. Based on a film thickness of 10-15 μm, the film has a glass transition temperature of 300 ° C or higher and a range of 100 ppm to 300 ° C / 25 ppm / Thermal expansion coefficient of ºC or lower, transmittance of 85% or higher at a wavelength of 550 nm, and a yellowing index (YI) of 7 or lower at a wavelength of 550 nm. Beneficial effect
本發明提供一種聚醯亞胺前驅物樹脂組成物,其相較於現存的聚醯胺酸溶液,具有在室溫下優越的樹脂穩定性,且在溶液澆鑄期間沒有顯現白濁現象。當透過熱固化製成膜時,該組成物展現出優越的機械、光學以及耐熱特性。因此,本發明可應用於可撓性顯示基板材料、半導體材料等等。The present invention provides a polyimide precursor resin composition, which has superior resin stability at room temperature compared to existing polyamidic acid solutions, and does not show white turbidity during solution casting. When formed into a film through thermal curing, the composition exhibits superior mechanical, optical, and heat resistance characteristics. Therefore, the present invention can be applied to flexible display substrate materials, semiconductor materials, and the like.
此外,本發明在現存的聚醯胺酸溶液之製備方法中保有競爭力,因為不需移除副產物之製程。In addition, the present invention remains competitive in the existing method of preparing a polyamic acid solution, as the process of removing by-products is not required.
實施本發明之方法 本發明之聚醯亞胺前驅物樹脂組成物(之後稱作“聚醯胺酸組成物")提供一種具有高耐熱性、低熱膨脹係數與優越的機械強度之透明聚醯亞胺膜,其經由優化芳族二胺與酸二酐化合物之組成從而改良耐熱性與優化機械特性,以及經由優化有機溶劑之組成從而使白濁現象不會發生,以及經由優化其等之使用量。本發明之聚醯亞胺前驅物組成物,即“該聚醯胺酸組成物",指的是一種用於製備聚醯胺酸溶液(其是用於製備聚醯亞胺膜)之組成物。Carrying out the method of the present invention The polyimide precursor resin composition of the present invention (hereinafter referred to as "polyamic acid composition") provides a transparent polyimide having high heat resistance, a low coefficient of thermal expansion, and superior mechanical strength. The amine film is used to optimize the composition of the aromatic diamine and the acid dianhydride compound to improve heat resistance and mechanical properties, and to optimize the composition of the organic solvent so that the phenomenon of white turbidity does not occur, and by optimizing the amount of use. The polyimide precursor composition of the present invention, that is, the "polyacid composition" refers to a composition for preparing a polyamic acid solution (which is used to prepare a polyimide film). .
更特別地,本發明之聚醯胺酸組成物含有芳族二胺組份、芳族二胺組份(A),其含有氟化芳族二胺、具有醯胺基團之二胺化合物或其等之混合物;酸二酐化合物(B),其含有氟化芳族酸二酐與非氟化芳族酸二酐化合物;一有機溶劑(C),其含有γ-丁內酯(GBL)與N-甲基-2-吡咯啶酮(NMP)或3-甲氧基-N,N-二甲基丙醯胺(DMPA);以及一反應催化劑(D)。該等組份詳述於下。 (A)芳族二胺組份More specifically, the polyamidic acid composition of the present invention contains an aromatic diamine component and an aromatic diamine component (A), which contains a fluorinated aromatic diamine, a diamine compound having a fluorene group, or A mixture thereof; an acid dianhydride compound (B) containing a fluorinated aromatic acid dianhydride and a non-fluorinated aromatic acid dianhydride compound; an organic solvent (C) containing γ-butyrolactone (GBL) With N-methyl-2-pyrrolidone (NMP) or 3-methoxy-N, N-dimethylpropanamide (DMPA); and a reaction catalyst (D). These components are detailed below. (A) Aromatic diamine component
在本發明中,該芳族二胺組份含有作為氟化芳族二胺單體之2,2'-雙(三氟甲基)-4,4'-二胺聯苯(TFMB)、作為具有醯胺基團之二胺單體之N-(4-胺苯基)-4-胺苯甲醯胺(DBA)或其等之混合物。In the present invention, the aromatic diamine component contains 2,2'-bis (trifluoromethyl) -4,4'-diamine biphenyl (TFMB) as a fluorinated aromatic diamine monomer, as N- (4-aminophenyl) -4-amine benzamidine (DBA) or a mixture thereof, which is a diamine monomer having an amidino group.
更特別地,以全部的二胺化合物計,該作為氟化芳族二胺單體之2,2'-雙(三氟甲基)-4,4'-二胺聯苯(TFMB)之含量可為30-100莫耳%,以及以全部的二胺化合物計,該N-(4-胺苯基)-4-胺苯甲醯胺(DBA)之含量可為5-50莫耳%。可另外含非氟化芳族二胺作為餘量。More specifically, the content of 2,2'-bis (trifluoromethyl) -4,4'-diamine biphenyl (TFMB) as a fluorinated aromatic diamine monomer based on the total diamine compound It may be 30-100 mol%, and the content of the N- (4-aminophenyl) -4-amine benzamidine (DBA) may be 5-50 mol% based on the entire diamine compound. A non-fluorinated aromatic diamine may additionally be included as a balance.
當該芳族二胺組份(A)含具有氟取代基之氟化芳族二胺時,由於分子鏈中該氟取代基之間的電荷轉移作用,可得到具優越的光學特性之聚醯亞胺膜。When the aromatic diamine component (A) contains a fluorinated aromatic diamine having a fluorine substituent, a polyfluorene with superior optical characteristics can be obtained due to the charge transfer between the fluorine substituents in the molecular chain. Imine film.
且,當該氟化芳族二胺混合與該N-(4-胺苯基)-4-胺苯甲醯胺(DBA)時,由於該芳族結構與該醯胺結構之剛性,可得到具優越的耐熱性與低熱膨脹係數之聚醯亞胺膜。And, when the fluorinated aromatic diamine is mixed with the N- (4-aminophenyl) -4-amine benzamidine (DBA), due to the rigidity of the aromatic structure and the amidine structure, it can be obtained Polyimide film with superior heat resistance and low thermal expansion coefficient.
相較於單獨使用該氟化芳族二胺,當該氟化芳族二胺與該N-(4-胺苯基)-4-胺苯甲醯胺一起用作為該芳族二胺組份時,可能製得具有改良之熱特性,同時維持光學特性之聚醯亞胺膜。Compared to using the fluorinated aromatic diamine alone, when the fluorinated aromatic diamine is used together with the N- (4-aminephenyl) -4-amine benzamidine as the aromatic diamine component It is possible to obtain a polyimide film having improved thermal characteristics while maintaining optical characteristics.
如果該氟化芳族二胺是含氟芳族二胺,其可為一或多種選自於由下列所構成之群組:2,2'-雙(三氟甲基)-4,4'-二胺聯苯(TFMB)、雙(胺羥苯基)六氟丙烷(DBOH)、雙(胺苯氧苯基)六氟丙烷(4BDAF)、2,2'-雙(三氟甲基)-4,3'-二胺聯苯以及2,2'-雙(三氟甲基)-5,5'-二胺聯苯。If the fluorinated aromatic diamine is a fluorine-containing aromatic diamine, it may be one or more selected from the group consisting of: 2,2'-bis (trifluoromethyl) -4,4 ' -Diamine biphenyl (TFMB), bis (aminohydroxyphenyl) hexafluoropropane (DBOH), bis (aminephenoxyphenyl) hexafluoropropane (4BDAF), 2,2'-bis (trifluoromethyl) -4,3'-diamine biphenyl and 2,2'-bis (trifluoromethyl) -5,5'-diamine biphenyl.
更特別地,在本發明中,可使用2,2'-雙(三氟甲基)-4,4'-二胺聯苯(TFMB),其可同時改良透射率與耐熱特性。More specifically, in the present invention, 2,2'-bis (trifluoromethyl) -4,4'-diamine biphenyl (TFMB) can be used, which can improve both transmittance and heat resistance characteristics.
以全部的二胺類化合物為100莫耳%計,當使用TFMB之數量為30-100莫耳%,更特別地50-90莫耳%時,由於分子鏈中該氟取代基之間之電荷轉移,可進一步改良該聚醯亞胺膜之光學特性。Based on 100 mole% of all diamine compounds, when the amount of TFMB is 30-100 mole%, more specifically 50-90 mole%, due to the charge between the fluorine substituents in the molecular chain The transfer can further improve the optical characteristics of the polyfluorene film.
且,在本發明中,不僅可含該氟化芳族二胺單體如TFMB,亦可含該非氟化芳族二胺單體。該氟化芳族二胺與該非氟化芳族二胺之數量總合為100莫耳%。And, in the present invention, not only the fluorinated aromatic diamine monomer such as TFMB, but also the non-fluorinated aromatic diamine monomer. The total amount of the fluorinated aromatic diamine and the non-fluorinated aromatic diamine is 100 mole%.
為了聚醯亞胺樹脂之優越的耐熱性與低熱膨脹係數,可包含具有或能夠形成醯胺結構之化合物。該能夠形成醯胺結構之化合物可為酸鹵化物或二羧酸化合物。例子包括一或多種選自於由下列所構成之群組:對苯二甲醯氯(TPC)、間苯二甲醯二氯(IPC)、1,3-金剛烷二羰基二氯(ADC)、5-降冰片烯-2,3-二羰基氯(NDC)、4,4'-苯甲醯二氯(BDC)、1,4-萘二羧酸二氯化物(1,4-NaDC)、2,6-萘二羧酸二氯化物(2,6-NaDC)、1,5-萘二羧酸二氯化物(1,5-NaDC)、對苯二甲酸(TPA)、間苯二甲酸(IPA)、苯二甲酸(PA)、4,4’-聯苯二羧酸(BDA)以及萘二羧酸(NaDA)。For the superior heat resistance and low thermal expansion coefficient of polyfluorene imide resin, compounds having or capable of forming a fluorene structure may be included. The compound capable of forming an amidine structure may be an acid halide or a dicarboxylic acid compound. Examples include one or more selected from the group consisting of: terephthaloyl chloride (TPC), isophthaloyl dichloride (IPC), 1,3-adamantane dicarbonyl dichloride (ADC) , 5-norbornene-2,3-dicarbonyl chloride (NDC), 4,4'-benzidine dichloride (BDC), 1,4-naphthalenedicarboxylic acid dichloride (1,4-NaDC) , 2,6-naphthalenedicarboxylic acid dichloride (2,6-NaDC), 1,5-naphthalenedicarboxylic acid dichloride (1,5-NaDC), terephthalic acid (TPA), isophthalic acid Formic acid (IPA), phthalic acid (PA), 4,4'-biphenyldicarboxylic acid (BDA), and naphthalenedicarboxylic acid (NaDA).
然而,此等化合物可能會在其等形成醯胺結構之同時導致諸如HCl、H2 O等等之副產物的產生,以及可能會導致醯亞胺膜之膜特性的降低。However, these compounds may cause by-products such as HCl, H 2 O, and the like while they form the amidine structure, and may cause a reduction in the membrane characteristics of the amidine film.
據此,在本發明中,為了在不會產生副產物之情況下將醯胺基團引入分子鏈中,可包含該N-(4-胺苯基)-4-胺苯甲醯胺(DBA)作為具有醯胺基團之二胺化合物,藉此提供優越的耐熱性與低熱膨脹係數。以該二胺類化合物為100莫耳%計,該N-(4-胺苯基)-4-胺苯甲醯胺(DBA)之含量可為5-50莫耳%,更特別地5-20莫耳%,然而不限於此。 (B)酸二酐化合物Accordingly, in the present invention, in order to introduce the amidine group into the molecular chain without generating a by-product, the N- (4-aminophenyl) -4-amine benzamidine (DBA ) As a diamine compound having an amidine group, thereby providing superior heat resistance and a low thermal expansion coefficient. Based on the diamine compound as 100 mole%, the content of the N- (4-aminophenyl) -4-amine benzamidine (DBA) may be 5-50 mole%, more specifically 5- 20 mol%, however, it is not limited to this. (B) acid dianhydride compound
本發明之該芳族酸二酐化合物含20-80莫耳%之氟化芳族酸二酐以及80-20莫耳%之非氟化芳族酸二酐化合物。The aromatic acid dianhydride compound of the present invention contains 20-80 mole% of a fluorinated aromatic acid dianhydride and 80-20 mole% of a non-fluorinated aromatic acid dianhydride compound.
在本發明中當混合使用該氟化芳族酸二酐與該非氟化芳族酸二酐化合物時,可同時改良該聚醯亞胺膜之光學特性與耐熱性。該氟化芳族酸二酐因其氟取代基而可製得具優越的光學特性之聚醯亞胺膜,以及因該芳族酸二酐之剛性分子結構而可製得具優越的耐熱性之聚醯亞胺膜。In the present invention, when the fluorinated aromatic acid dianhydride and the non-fluorinated aromatic acid dianhydride compound are used in combination, the optical properties and heat resistance of the polyfluorene imide film can be improved at the same time. The fluorinated aromatic acid dianhydride can be used to prepare a polyfluorene imine film having superior optical characteristics due to its fluorine substituent, and the aromatic acid dianhydride can be prepared to have superior heat resistance due to its rigid molecular structure. Of polyimide film.
可使用具有氟取代基之芳族酸二酐,作為該氟化芳族酸二酐,例如,一或多種選自於由下列所構成之群組:4,4’-(六氟異亞丙基)二酞酸酐(6FDA)以及4,4'-(4,4'-六氟異亞丙基二苯氧基)雙(酞酐) (6-FDPDA)。更特別地,在本發明中,使用6FDA作為該氟化芳族酸二酐。An aromatic acid dianhydride having a fluorine substituent may be used as the fluorinated aromatic acid dianhydride, for example, one or more selected from the group consisting of: 4,4 '-(hexafluoroisopropylidene Group) diphthalic anhydride (6FDA) and 4,4 '-(4,4'-hexafluoroisopropylidene diphenoxy) bis (phthalic anhydride) (6-FDPDA). More specifically, in the present invention, 6FDA is used as the fluorinated aromatic acid dianhydride.
以全部的酸二酐為100莫耳%計,該氟化芳族酸二酐之含量可為20-80莫耳%,更特別地40-70莫耳%。在此範例內可達到高透射率以及低黃化指數之聚醯亞胺膜。The content of the fluorinated aromatic acid dianhydride may be 20-80 mol%, more specifically 40-70 mol%, based on 100 mol% of the total acid dianhydride. A polyimide film with high transmittance and low yellowing index can be achieved in this example.
可使用沒有引入氟取代基之芳族酸二酐,作為該非氟化芳族酸二酐,如一或多種選自於由下列所構成之群組:焦蜜石酸二酐(PMDA)、3,3',4,4'-聯苯四羧酸二酐(BPDA)、3,3',4,4'-二苯基酮四羧酸二酐(BTDA)、4,4'-氧二酞酸酐(ODPA)、2,2-雙[4-(3,4-二羧基苯氧)苯基]丙烷二酐(BPADA)、3,3’,4,4’-二苯碸四羧酸二酐(DSDA)以及乙二醇雙(4-偏苯三甲酸酐) (TMEG)。更特別地,在本發明中,使用PMDA、BPDA或其混合物作為該非氟化芳族酸二酐。An aromatic acid dianhydride without the introduction of a fluorine substituent may be used as the non-fluorinated aromatic acid dianhydride, such as one or more selected from the group consisting of pyromelite dianhydride (PMDA), 3, 3 ', 4,4'-biphenyltetracarboxylic dianhydride (BPDA), 3,3', 4,4'-diphenylketone tetracarboxylic dianhydride (BTDA), 4,4'-oxydiphthalide Acid anhydride (ODPA), 2,2-bis [4- (3,4-dicarboxyphenoxy) phenyl] propane dianhydride (BPADA), 3,3 ', 4,4'-diphenylphosphonium tetracarboxylic acid di Anhydride (DSDA) and ethylene glycol bis (4-trimellitic anhydride) (TMEG). More specifically, in the present invention, PMDA, BPDA or a mixture thereof is used as the non-fluorinated aromatic acid dianhydride.
以全部的酸二酐為100莫耳%計,該非氟化芳族酸二酐可使用之數量為80-20莫耳%,更特別地30-50莫耳%,且可同時改良該聚醯亞胺膜之耐熱性以及維持高透射率與低黃化指數。 (C)有機溶劑Based on 100 mol% of the total acid dianhydride, the non-fluorinated aromatic acid dianhydride can be used in an amount of 80-20 mol%, more particularly 30-50 mol%, and the polymer can be improved at the same time. The imine film has heat resistance and maintains high transmittance and low yellowing index. (C) Organic solvents
在本發明中,該有機溶劑可為極性溶劑如間甲酚、N-甲基-2-吡咯啶酮(NMP)、N,N-二甲基甲醯胺(DMF)、二甲基乙醯胺(DMAc)、二甲基亞碸(DMSO);低沸點溶劑,如乙酸二乙酯(DEA)、3-甲氧基-N,N-二甲基丙醯胺(DMPA)等等;四氫呋喃(THF)、氯仿等等;或低吸水性溶劑,如γ-丁內酯(GBL)。In the present invention, the organic solvent may be a polar solvent such as m-cresol, N-methyl-2-pyrrolidone (NMP), N, N-dimethylformamide (DMF), dimethylacetamidine Amine (DMAc), dimethylsulfinium (DMSO); low boiling point solvents, such as diethyl acetate (DEA), 3-methoxy-N, N-dimethylpropanamide (DMPA), etc .; tetrahydrofuran (THF), chloroform, etc .; or a low water-absorbent solvent, such as γ-butyrolactone (GBL).
本發明中所使用之有機溶劑在改良白濁現象方面扮演很重要的角色。從圖1-3中可確認白濁現象。圖1顯示由70莫耳%GBL與30莫耳%NMP構成之有機溶劑,在室溫下澆鑄於玻璃基板上之聚醯胺酸溶液具穩定性(無白濁現象),以及圖2顯示由70莫耳%GBL與30莫耳%DMPA構成之有機溶劑,在室溫下具穩定性(無白濁現象)。相反的,圖3顯示單獨由100莫耳%NMP構成之有機溶劑發生白濁現象。The organic solvent used in the present invention plays an important role in improving the phenomenon of white turbidity. The turbidity phenomenon can be confirmed from FIGS. 1-3. Figure 1 shows that the organic solvent consisting of 70 mol% GBL and 30 mol% NMP is stable (no white turbidity) when the polyamic acid solution is cast on a glass substrate at room temperature, and Figure 2 shows that Organic solvent consisting of Molar% GBL and 30 Molar% DMPA is stable at room temperature (no cloudiness). In contrast, FIG. 3 shows that the organic solvent consisting of 100 mole% NMP alone becomes cloudy.
據此,在本發明中,為了改良白濁現象,在室溫下溶液澆鑄期間,需要使用γ-丁內酯(GBL)與N-甲基-2-吡咯啶酮(NMP)之混合物、γ-丁內酯(GBL)與3-甲氧基-N,N-二甲基丙醯胺(DMPA)之混合物或單獨3-甲氧基-N,N-二甲基丙醯胺(DMPA)。Accordingly, in the present invention, in order to improve the turbidity phenomenon, it is necessary to use a mixture of γ-butyrolactone (GBL) and N-methyl-2-pyrrolidone (NMP), γ- A mixture of butyrolactone (GBL) and 3-methoxy-N, N-dimethylpropanamide (DMPA) or 3-methoxy-N, N-dimethylpropanamide (DMPA) alone.
更特別地,可使用30-70莫耳%之γ-丁內酯(GBL)與70-30莫耳%之N-甲基-2-吡咯啶酮(NMP)或3-甲氧基-N,N-二甲基丙醯胺(DMPA)作為該有機溶劑。更特別地,可使用50-70莫耳%之γ-丁內酯(GBL)與30-50莫耳%之N-甲基-2-吡咯啶酮(NMP)或3-甲氧基-N,N-二甲基丙醯胺(DMPA)。選擇性地,可單獨使用100莫耳%之γ-丁內酯(GBL)。 (D)反應催化劑More specifically, 30-70 mole% of gamma-butyrolactone (GBL) and 70-30 mole% of N-methyl-2-pyrrolidone (NMP) or 3-methoxy-N can be used As the organic solvent, N-dimethylpropylamine (DMPA) was used. More specifically, 50-70 mole% of gamma-butyrolactone (GBL) and 30-50 mole% of N-methyl-2-pyrrolidone (NMP) or 3-methoxy-N can be used , N-dimethylpropanamide (DMPA). Alternatively, 100 mol% of γ-butyrolactone (GBL) may be used alone. (D) Reaction catalyst
本發明之聚醯胺酸組成物可另外包含選自於由下列所構成之群組之一或多種反應催化劑:三甲基胺、二甲苯、吡啶以及喹啉,此取決於反應性,但不一定限於此。此外,需要時,在不會嚴重地影響本發明之目的以及功效之範圍內,該聚醯胺酸組成物可含少量的添加物,諸如塑化劑、抗氧化劑、阻燃劑、分散劑、黏度控制劑、流平劑等等。The polyamic acid composition of the present invention may further include one or more reaction catalysts selected from the group consisting of trimethylamine, xylene, pyridine, and quinoline, depending on the reactivity, but not It must be limited to this. In addition, when necessary, the polyamic acid composition may contain a small amount of additives, such as a plasticizer, an antioxidant, a flame retardant, a dispersant, within a range that does not seriously affect the purpose and efficacy of the present invention. Viscosity control agents, leveling agents, etc.
此外,使用該芳族二胺組份、該酸二酐化合物、該有機溶劑以及該反應催化劑製得之本發明之聚醯胺酸組成物,以該聚醯胺酸溶液計,具有10-40重量%,更特別地10-25重量%之固體含量。當該固體含量低於10重量%時,在增加膜厚度方面存在限制。而當該固體含量超過40重量%時,在控制該聚醯胺酸樹脂之黏度方面存在限制。因此,使用前述之範圍。In addition, the polyamino acid composition of the present invention prepared by using the aromatic diamine component, the acid dianhydride compound, the organic solvent, and the reaction catalyst has a polyamine solution of 10-40. A solids content of 10% by weight, more specifically 10-25% by weight. When the solid content is less than 10% by weight, there is a limitation in increasing the film thickness. When the solid content exceeds 40% by weight, there is a limitation in controlling the viscosity of the polyamic acid resin. Therefore, the aforementioned range is used.
更特別地,該聚醯胺酸溶液可包含有機溶劑,使得該固體含量為10-40重量%,且可經由在10-70ºC下混合100莫耳份之該芳族二胺組份以及95-105莫耳份之該酸二酐化合物24-48個小時而製得。反應溫度可隨著所使用的單體變化。More specifically, the polyamine solution may include an organic solvent such that the solid content is 10-40% by weight, and 100 mol parts of the aromatic diamine component and 95- 105 mol parts of the acid dianhydride compound is prepared for 24-48 hours. The reaction temperature may vary with the monomers used.
更特別地,可添加以該芳族二胺組份計,超過-5至5莫耳份數量之該酸二酐化合物,以便達到所需的黏度。這可適度地控制黏度以及確保貯存穩定性。More specifically, the acid dianhydride compound may be added in an amount exceeding -5 to 5 mol parts based on the aromatic diamine component in order to achieve the desired viscosity. This allows moderate viscosity control and ensures storage stability.
更特別地,從該反應產生之聚醯胺酸溶液可具有範圍從1,000至7,000cP之黏度。當該黏度低於1,000cP時,很難獲得所需的厚度。而當其超過7,000cP時,則不容易得到均勻的塗層以及有效的移除溶劑。因此,此範圍是較佳的。More specifically, the polyamic acid solution produced from the reaction may have a viscosity ranging from 1,000 to 7,000 cP. When the viscosity is less than 1,000 cP, it is difficult to obtain a desired thickness. When it exceeds 7,000 cP, it is not easy to obtain a uniform coating and effective solvent removal. Therefore, this range is preferable.
以下說明本發明之透明聚醯亞胺膜以及其製備方法。本發明提供一種使用以上所述之聚醯胺酸組成物製得之聚醯胺酸溶液,經過熱醯亞胺化製得之透明聚醯亞胺膜。本發明之聚醯胺酸溶液具黏性,其通過適當的方法塗佈於玻璃基板上並熱處理,可被製成膜。該塗佈可使用非限定之一般常用的方法進行。例如,可使用旋塗、浸塗、溶劑澆鑄、狹縫式塗佈、噴塗等等,但不限於此。The transparent polyfluorene imide film of the present invention and its preparation method are described below. The present invention provides a transparent polyimide film prepared by using a polyamidic acid solution prepared by the above-mentioned polyamidic acid composition and subjecting it to thermal imidization. The polyamic acid solution of the present invention is viscous. It can be coated on a glass substrate by a suitable method and heat-treated to form a film. This coating can be performed by a non-limiting, generally used method. For example, spin coating, dip coating, solvent casting, slit coating, spray coating, and the like can be used, but are not limited thereto.
本發明之聚醯胺酸組成物可通過在高溫換氣烤箱中之熱處理而被製成聚醯亞胺膜。該熱處理在100-450ºC、氮環境下進行30-120分鐘。更特別地,膜可在100ºC/30分鐘、220ºC/30分鐘以及350ºC/30分鐘之溫度時間條件下獲得。在此等條件下,可充份地移除該溶劑,且透過醯亞胺化可使該膜之特性最大化。The polyamic acid composition of the present invention can be made into a polyimide film by heat treatment in a high-temperature ventilation oven. This heat treatment is performed at 100-450ºC under a nitrogen environment for 30-120 minutes. More specifically, membranes are available at temperature times of 100ºC / 30 minutes, 220ºC / 30 minutes, and 350ºC / 30 minutes. Under these conditions, the solvent can be removed adequately, and the properties of the film can be maximized through fluorene imidization.
本發明之透明聚醯亞胺膜因為是使用該聚醯胺酸組成物製得,所以展現高透明度且同時具有低熱膨脹係數。Since the transparent polyfluorene imide film of the present invention is prepared by using the polyphosphonium acid composition, it exhibits high transparency and at the same time has a low thermal expansion coefficient.
本發明之聚醯亞胺膜以10-15μm之膜厚度為基礎,具有300ºC或更高的玻璃轉移溫度、在100至300ºC之範圍內25ppm/ºC或更低,更特別地15ppm/ºC的熱膨脹係數、在550nm之波長下85%或更高的透射率以及在550nm之波長下7或更低,更特別地5或更低的黃化指數(YI)。本發明之聚醯亞胺膜可防止基板上之裝置因膨脹以及皺縮而導致缺陷。且,本發明之聚醯亞胺膜因高透光率以及低黃化指數而可應用於可撓性顯示器上。The polyimide film of the present invention is based on a film thickness of 10-15 μm, has a glass transition temperature of 300ºC or higher, 25ppm / ºC or lower in the range of 100 to 300ºC, and more particularly 15ppm / ºC thermal expansion Coefficient, 85% or higher transmittance at a wavelength of 550 nm, and a yellowing index (YI) of 7 or lower, more specifically 5 or lower, at a wavelength of 550 nm. The polyimide film of the present invention can prevent the device on the substrate from causing defects due to expansion and shrinkage. Moreover, the polyimide film of the present invention can be applied to a flexible display due to its high light transmittance and low yellowing index.
本發明之聚醯亞胺膜可用於各種的應用。特別是,其可提供作為需要高透明度與耐熱性之可撓性顯示器,如OLED顯示器、液晶顯示器、TFT顯示器、可撓性印刷電路板、可撓性OLED表面發光顯示器或電子紙顯示器之基板或保護性膜。The polyfluorene imide film of the present invention can be used in various applications. In particular, it can be provided as a substrate or a flexible display that requires high transparency and heat resistance, such as an OLED display, a liquid crystal display, a TFT display, a flexible printed circuit board, a flexible OLED surface light-emitting display, or an electronic paper display. Protective film.
本發明將透過範例更詳細的說明。下列範例僅供例示說明之目的,本發明之範疇並不受該等範例之限制。比較例1 The present invention will be explained in more detail through examples. The following examples are for illustrative purposes only, and the scope of the present invention is not limited by these examples. Comparative Example 1
為製備表1中指定之組成,將作為二胺類單體之2.547g (0.024mol)之PPD與17.606g (0.055mol)之TFMB,溶於由142.1g之NMP與58.5g之GBL構成之有機溶劑中,於氮環境、室溫下歷時30分鐘至1個小時。然後,在添加作為二酐類單體之24.798g (0.056mol)之6FDA與5.212g (0.024mol)之PMDA後,經過24個小時的聚合作用,進一步添加83.6g之GBL,然後攪拌24個小時(反應溫度:30ºC,以反應溶劑之總重量計,固體含量維持在15重量%),製得聚醯胺酸溶液。用黏度計(Brookfield DV2T, SC4-27)測得之黏度為5,700cP。比較例2-3 In order to prepare the composition specified in Table 1, 2.547 g (0.024 mol) of PPD as a diamine monomer and 17.606 g (0.055 mol) of TFMB were dissolved in an organic composition of 142.1 g of NMP and 58.5 g of GBL. In a solvent, it takes 30 minutes to 1 hour in a nitrogen environment at room temperature. Then, after adding 24.798 g (0.056 mol) of 6FDA and 5.212 g (0.024 mol) of PMDA as dianhydride monomers, after 24 hours of polymerization, further add 83.6 g of GBL, and then stir for 24 hours (Reaction temperature: 30ºC, based on the total weight of the reaction solvent, the solid content is maintained at 15% by weight) to prepare a polyamic acid solution. The viscosity measured with a viscometer (Brookfield DV2T, SC4-27) was 5,700 cP. Comparative Example 2-3
用與比較例1中相同的方法製備聚醯胺酸溶液,但根據表1之指示改變有機溶劑之組成。範例1-5 A polyamic acid solution was prepared in the same manner as in Comparative Example 1, but the composition of the organic solvent was changed according to the instructions in Table 1. Example 1-5
用與比較例1相同的方式製備聚醯胺酸溶液,但依照表1之指示改變有機溶劑之組成。實驗例1 :物理特性之測量 (1)評估在室溫下之白濁現象A polyamic acid solution was prepared in the same manner as in Comparative Example 1, but the composition of the organic solvent was changed according to the instructions in Table 1. Experimental example 1 : Measurement of physical properties (1) Evaluation of white turbidity at room temperature
將於範例1-5與比較例1-3中所製得之聚醯胺酸溶液滴在一玻璃板上,使用棒塗佈器塗佈至一預定厚度(15μm後熱處理,以15%之固體含量以及100μm之溶液厚度為基礎)。保持在溫度25ºC以及濕度>90%之條件下30分鐘後,觀察白濁現象。評估白濁現象之程度,分數從0至5 (0:無白濁,5:嚴重白濁)。 (2)膜之製備以及物理特性之評估The polyamic acid solution prepared in Examples 1-5 and Comparative Examples 1-3 was dropped on a glass plate and applied to a predetermined thickness (15 μm after heat treatment with 15% solids using a bar coater). Content and 100 μm solution thickness). After maintaining at a temperature of 25ºC and a humidity of> 90% for 30 minutes, observe the phenomenon of white turbidity. The degree of turbidity was evaluated with a score from 0 to 5 (0: no turbidity, 5: severe turbidity). (2) Preparation of film and evaluation of physical properties
使用棒塗佈器,將該聚醯胺酸溶液塗佈於玻璃板上,之後在高溫對流烤箱中熱處理。該熱處理在氮環境中,100ºC/30分鐘、220ºC/30分鐘以及350ºC/30分鐘之溫度時間條件下進行。依照以下所述之方法測量所獲得之膜的物理特性。結果提供於表2中。 (a)透射率以及延遲This polyamic acid solution was coated on a glass plate using a bar coater, and then heat-treated in a high-temperature convection oven. The heat treatment is performed in a nitrogen environment at a temperature time of 100ºC / 30 minutes, 220ºC / 30 minutes, and 350ºC / 30 minutes. The physical properties of the obtained film were measured according to the methods described below. The results are provided in Table 2. (a) Transmission and retardation
透射率是使用UV-Vis NIR分光光度計,在550nm下測量,而平面內光遲滯(Ro )以及平面外光遲滯(Rth )是使用延遲器(RETs-100,Otsuka)測量。 (b)黃化指數(YI)The transmittance was measured using a UV-Vis NIR spectrophotometer at 550 nm, while the in-plane light retardation (R o ) and out-of-plane light retardation (R th ) were measured using retarders (RETs-100, Otsuka). (b) Yellowing Index (YI)
黃化指數是使用比色計(LabScan XE)測量。 (c)霧度The yellowing index is measured using a colorimeter (LabScan XE). (c) Haze
霧度是使用霧度計(HAZE-GARD,Toyoseiki)測量。 (d)熱特性Haze is measured using a haze meter (HAZE-GARD, Toyoseiki). (d) Thermal characteristics
膜之玻璃轉移溫度(Tg )以及熱膨脹係數(CTE)是使用TMA 402 F3 (Netzsch)測量。於力量設定至0.05N且以5ºC/min之速率將溫度從30ºC增加至350ºC之張力模式下,測量線性熱膨脹係數。取範圍從100至300ºC之平均值。熱降解溫度(Td ,1%)是使用TG 209 F3 (Netzsch)測量。 (e)機械特性The glass transition temperature (T g ) and the coefficient of thermal expansion (CTE) of the film were measured using TMA 402 F3 (Netzsch). Measure the linear thermal expansion coefficient in tension mode with the force set to 0.05N and the temperature increased from 30ºC to 350ºC at a rate of 5ºC / min. Take the average value from 100 to 300ºC. Thermal degradation temperature (T d , 1%) was measured using TG 209 F3 (Netzsch). (e) Mechanical characteristics
膜之機械特性是使用UTM (Instron)測量。以50mm/min之速率拉伸寬度10mm及夾持間隔100mm之膜樣本,進行測量。 表1
從表1可見,當使用GBL與NMP之70:30 (莫耳%)混合物作為範例1中之有機溶劑時,在溶液澆鑄於玻璃板上後之室溫下沒有觀察到白濁現象。It can be seen from Table 1 that when a 70:30 (mole%) mixture of GBL and NMP was used as the organic solvent in Example 1, no cloudiness was observed at room temperature after the solution was cast on a glass plate.
且,當在範例2-4中使用GBL與DMPA之混合物時,或在範例5中單獨使用DMPA時,沒有觀察到白濁現象。Moreover, when a mixture of GBL and DMPA was used in Example 2-4, or when DMPA was used alone in Example 5, no white turbidity was observed.
因為GBL較不會吸水,所以當GBL之含量增加時,更能有效的防止白濁現象。DMPA因相同的原因亦具有防止白濁現象之作用。此外,該膜之光學、熱以及機械特性與比較例1-3的相當。Because GBL is less likely to absorb water, when the GBL content increases, it can more effectively prevent white turbidity. DMPA also has the effect of preventing white turbidity for the same reason. In addition, the optical, thermal, and mechanical characteristics of this film were comparable to those of Comparative Examples 1-3.
因此,可看到,當根據本發明之含量使用GBL與NMP或GBL與DMPA作為該有機溶劑時,可在不會降低膜特性之情況下,確保室溫下樹脂之穩定性。比較例4 Therefore, it can be seen that when GBL and NMP or GBL and DMPA are used as the organic solvent according to the content of the present invention, the stability of the resin at room temperature can be ensured without degrading the film characteristics. Comparative Example 4
為製備表2中指定之組成,將21.186g (0.066 mol)作為二胺類單體之TFMB,溶於由86.7g之NMP與117.3g之GBL構成之有機溶劑中,於氮環境、室溫下30分鐘至1個小時。然後,在添加29.881g (0.067mol)作為二酐類單體之6FDA後,經過24個小時的聚合作用,進一步添加85.0g之GBL,然後攪拌24個小時(反應溫度:30ºC,以反應溶劑之總重量計,固體含量維持在15重量%),製得聚醯胺酸溶液。用黏度計(Brookfield DV2T, SC4-27)測得之黏度為4,200cP。範例6 In order to prepare the composition specified in Table 2, 21.186 g (0.066 mol) of TFMB as a diamine monomer was dissolved in an organic solvent composed of 86.7 g of NMP and 117.3 g of GBL, in a nitrogen environment at room temperature. 30 minutes to 1 hour. Then, after adding 29.881g (0.067mol) of 6FDA as dianhydride monomer, after 24 hours of polymerization, further add 85.0g of GBL, and then stir for 24 hours (reaction temperature: 30ºC, based on the reaction solvent) The solid content was maintained at 15% by weight based on the total weight) to prepare a polyamidic acid solution. The viscosity measured with a viscometer (Brookfield DV2T, SC4-27) was 4,200 cP. Example 6
為製備表2中指定之組成物,將作為二胺類單體之2.589g (0.024mol)之PPD與17.899g (0.056mol)之TFMB,溶於由86.7g之NMP與117.3g之GBL構成之有機溶劑中,於氮環境、室溫下30分鐘至1個小時。然後,在添加作為二酐類單體之25.210g (0.057 mol)之6FDA與5.299g (0.024 mol)之PMDA後,經過24個小時的聚合作用,進一步添加85.0g之GBL,然後攪拌24個小時(反應溫度:30ºC,以反應溶劑之總重量計,固體含量維持在15重量%),製得聚醯胺酸溶液。用黏度計(Brookfield DV2T, SC4-27)測得之黏度為6,400cP。範例7 To prepare the composition specified in Table 2, 2.589 g (0.024 mol) of PPD as a diamine monomer and 17.899 g (0.056 mol) of TFMB were dissolved in a composition consisting of 86.7 g of NMP and 117.3 g of GBL In an organic solvent, in a nitrogen environment at room temperature for 30 minutes to 1 hour. Then, after adding 25.210g (0.057 mol) of 6FDA and 5.299g (0.024 mol) of PMDA as dianhydride monomers, after 24 hours of polymerization, further add 85.0g of GBL, and then stir for 24 hours (Reaction temperature: 30ºC, based on the total weight of the reaction solvent, the solid content is maintained at 15% by weight) to prepare a polyamic acid solution. The viscosity measured with a viscometer (Brookfield DV2T, SC4-27) was 6,400 cP. Example 7
為製備表2中指定之組成物,將作為二胺類單體之22.244g (0.069mol)之TFMB與0.842g (0.004mol)之DBA,溶於由86.7g之NMP與117.3g之GBL構成之有機溶劑中,於氮環境、室溫下30分鐘至1個小時。然後,在添加作為二酐類單體之23.063g (0.052mol)之6FDA與4.848g (0.022mol)之PMDA後,經過24個小時的聚合作用,進一步添加85.0g之GBL,然後攪拌24個小時(反應溫度:30ºC,以反應溶劑之總重量計,固體含量維持在15重量%),製得聚醯胺酸溶液。用黏度計(Brookfield DV2T, SC4-27)測得之黏度為4,800cP。範例8 To prepare the composition specified in Table 2, 22.244 g (0.069 mol) of TFMB as a diamine monomer and 0.842 g (0.004 mol) of DBA were dissolved in 86.7 g of NMP and 117.3 g of GBL In an organic solvent, in a nitrogen environment at room temperature for 30 minutes to 1 hour. Then, after adding 23.063g (0.052mol) of 6FDA and 4.848g (0.022mol) of PMDA as dianhydride monomers, after 24 hours of polymerization, 85.0g of GBL was further added, and then stirred for 24 hours. (Reaction temperature: 30ºC, based on the total weight of the reaction solvent, the solid content is maintained at 15% by weight) to prepare a polyamic acid solution. The viscosity measured with a viscometer (Brookfield DV2T, SC4-27) was 4,800 cP. Example 8
為製備表2中指定之組成物,將作為二胺類單體之24.320g (0.076mol)之TFMB,溶於由86.7g之NMP與117.3g之GBL構成之有機溶劑中,於氮環境、室溫下30分鐘至1個小時。然後,在添加作為二酐類單體之17.110g (0.038mol)之6FDA與5.035g (0.038mol)之PMDA後,經過24個小時的聚合作用,進一步添加85.0g之GBL,然後攪拌24個小時(反應溫度:30ºC,以反應溶劑之總重量計,固體含量維持在15重量%),製得聚醯胺酸溶液。用黏度計(Brookfield DV2T, SC4-27)測得之黏度為6,600cP。範例9 In order to prepare the composition specified in Table 2, 24.320 g (0.076 mol) of TFMB as a diamine monomer was dissolved in an organic solvent composed of 86.7 g of NMP and 117.3 g of GBL. 30 minutes to 1 hour at temperature. Then, after adding 17.110g (0.038mol) of 6FDA and 5.035g (0.038mol) of PMDA as dianhydride monomers, after 24 hours of polymerization, further add 85.0g of GBL, and then stir for 24 hours (Reaction temperature: 30ºC, based on the total weight of the reaction solvent, the solid content is maintained at 15% by weight) to prepare a polyamic acid solution. The viscosity measured with a viscometer (Brookfield DV2T, SC4-27) was 6,600 cP. Example 9
為製備表2中指定之組成物,將作為二胺類單體之2.094g (0.019mol)之PPD、18.610g (0.058mol)之TFMB與0.881g (0.004mol)之DBA,溶於由86.7g之NMP與117.3g之GBL構成之有機溶劑中,於氮環境、室溫下30分鐘至1個小時。然後,在添加作為二酐類單體之24.298g (0.055mol)之6FDA與5.115g (0.023mol)之PMDA後,經過24個小時的聚合作用,進一步添加85.0g之GBL,然後攪拌24個小時(反應溫度:30ºC,以反應溶劑之總重量計,固體含量維持在15重量%),製得聚醯胺酸溶液。用黏度計(Brookfield DV2T, SC4-27)測得之黏度為6,800cP。實驗例2 :物理特性之測量 In order to prepare the composition specified in Table 2, 2.094 g (0.019 mol) of PPD as diamine monomer, 18.610 g (0.058 mol) of TFMB and 0.881 g (0.004 mol) of DBA were dissolved in 86.7 g In an organic solvent composed of NMP and 117.3 g of GBL, in a nitrogen environment at room temperature for 30 minutes to 1 hour. Then, after adding 24.298 g (0.055 mol) of 6FDA and 5.115 g (0.023 mol) of PMDA as dianhydride monomers, after 24 hours of polymerization, further add 85.0 g of GBL, and then stir for 24 hours (Reaction temperature: 30ºC, based on the total weight of the reaction solvent, the solid content is maintained at 15% by weight) to prepare a polyamic acid solution. The viscosity measured with a viscometer (Brookfield DV2T, SC4-27) was 6,800 cP. Experimental Example 2 : Measurement of physical characteristics
以與實驗例1中相同的方法,測量範例6-9與比較例4中所製得之聚醯胺酸溶液之物理特性。結果提供在表2中。 表2
從表2之範例6-8可見,當該酸二酐單體PMDA與BPDA以及該二胺單體PPD與DBA之含量增加時,透射率以及熱特性均改良了。至於同時使用TFMB、PPD以及DBA作為該二胺單體之範例9,在無因為DBA之副產物產生之情況下,達到耐熱特性以及低熱膨脹係數。It can be seen from Examples 6-8 in Table 2 that when the content of the acid dianhydride monomers PMDA and BPDA and the diamine monomer PPD and DBA increases, the transmittance and thermal characteristics are improved. As for Example 9 in which TFMB, PPD, and DBA are used as the diamine monomer at the same time, heat resistance characteristics and a low thermal expansion coefficient are achieved without generating by-products of DBA.
因此,根據本發明製得之聚醯胺酸溶液可提供作為透明聚醯亞胺膜,其以10-15μm之膜厚度為基礎,具有300ºC或更高的玻璃轉移溫度、在100至300ºC之範圍內25ppm/ºC或更低的熱膨脹係數、在550nm之波長下85%或更高的透射率以及在550nm之波長下7或更低的黃化指數(YI)。Therefore, the polyamic acid solution prepared according to the present invention can be provided as a transparent polyimide film, which is based on a film thickness of 10-15 μm, has a glass transition temperature of 300 ° C or higher, and ranges from 100 to 300 ° C. Internal thermal expansion coefficient of 25 ppm / ºC or lower, transmittance of 85% or higher at a wavelength of 550 nm, and a yellowing index (YI) of 7 or lower at a wavelength of 550 nm.
據此,根據本發明製得之聚醯亞胺膜滿足高透明度、良好樹脂穩定性、高耐熱性、低熱膨脹係數以及優越的機械特性之要求,且能夠廣泛地用作為可撓性顯示器,如OLED顯示器、液晶顯示器、TFT顯示器、可撓性印刷電路板、可撓性OLED表面發光顯示器或電子紙顯示器之基板或保護性膜。Accordingly, the polyimide film prepared according to the present invention satisfies the requirements of high transparency, good resin stability, high heat resistance, low thermal expansion coefficient, and superior mechanical characteristics, and can be widely used as a flexible display, such as OLED display, liquid crystal display, TFT display, flexible printed circuit board, flexible OLED surface light-emitting display or electronic paper display substrate or protective film.
(無)(no)
圖1顯示在室溫下將聚醯胺酸溶液澆鑄於玻璃基板上之期間,範例1之有機溶劑(GBL:NMP=70莫耳%:30莫耳%)產生白濁現象之研究結果(室溫下之穩定性)。 圖2顯示在室溫下將聚醯胺酸溶液澆鑄於玻璃基板上之期間,範例2之有機溶劑(GBL:DMPA=70莫耳%:30莫耳%)產生白濁現象之研究結果(室溫下之穩定性)。 圖3顯示在室溫下將聚醯胺酸溶液澆鑄於玻璃基板上之期間,範例3之有機溶劑(NMP 100莫耳%)產生白濁現象之研究結果(室溫下之穩定性)。Figure 1 shows the results of research on the phenomenon of white turbidity caused by the organic solvent (GBL: NMP = 70 mole%: 30 mole%) of the organic solvent of Example 1 during the casting of the polyamic acid solution on the glass substrate at room temperature (room temperature Stability). Fig. 2 shows the results of a study on the phenomenon of white turbidity caused by the organic solvent (GBL: DMPA = 70 mole%: 30 mole%) during the casting of a polyamic acid solution on a glass substrate at room temperature (room temperature Stability). FIG. 3 shows the results of a study on the cloudiness phenomenon (stability at room temperature) of the organic solvent (NMP 100 mole%) of Example 3 during the casting of a polyamic acid solution on a glass substrate at room temperature.
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| KR102700132B1 (en) * | 2021-12-22 | 2024-08-28 | 에스케이마이크로웍스 주식회사 | Multilayer electronic device, heat-resisting film, and manufacturing method thereof |
| KR20230134903A (en) * | 2022-03-15 | 2023-09-22 | 주식회사 엘지화학 | Polymer resin composition, method of preparing polymer film, polymer film, substrate for display device, and optical device using the same |
| KR102521984B1 (en) * | 2022-05-17 | 2023-04-27 | 주식회사 씨지피머트리얼즈 | Method for manufacturing colorless and transparent polyimide film, and colorless and transparent polyimide film prepared by manufacturing method thereof |
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| JP5109374B2 (en) * | 2006-10-24 | 2012-12-26 | 日立化成工業株式会社 | Polyamideimide resin solution and production method thereof, resin composition and coating composition |
| KR101225842B1 (en) * | 2007-08-27 | 2013-01-23 | 코오롱인더스트리 주식회사 | Colorless polyimide film |
| KR101230418B1 (en) * | 2011-04-05 | 2013-02-06 | 한국화학연구원 | Cross-linked Polyimide film and Preparation method for the same |
| JP6477469B2 (en) * | 2013-07-05 | 2019-03-06 | 三菱瓦斯化学株式会社 | Polyimide resin |
| JP6287608B2 (en) * | 2013-09-02 | 2018-03-07 | 株式会社リコー | Ink composition for ink jet recording, recording apparatus and recorded matter |
| JP6254197B2 (en) * | 2014-02-14 | 2017-12-27 | 旭化成株式会社 | Polyimide precursor and resin composition containing the same |
| JP2015218179A (en) | 2014-05-14 | 2015-12-07 | 日本精化株式会社 | Tetracarboxylic acid dianhydride, and polyimide obtained by using the same |
| JP6368961B2 (en) * | 2014-05-30 | 2018-08-08 | エルジー・ケム・リミテッド | Polyimide-based solution and polyimide-based film manufactured using the same |
| JP2016027085A (en) * | 2014-06-26 | 2016-02-18 | デクセリアルズ株式会社 | Polyimide, polyamic acid, production method thereof, and photosensitive resin composition |
| JP6670238B2 (en) * | 2014-07-17 | 2020-03-18 | 旭化成株式会社 | Resin precursor, resin composition containing the same, polyimide resin film, resin film and method for producing the same |
| CN104151823B (en) * | 2014-09-02 | 2019-02-26 | 长春聚明光电材料有限公司 | Polyimide film and preparation method thereof |
| KR102158223B1 (en) * | 2014-11-17 | 2020-09-22 | 에스케이이노베이션 주식회사 | Polyamic acid solution, polyimde film, and method for manufacturing the same |
| JP2016098260A (en) * | 2014-11-18 | 2016-05-30 | 住友ベークライト株式会社 | Polyamide solution |
| CN107429057B (en) * | 2015-03-13 | 2021-03-30 | 旭化成株式会社 | Polyimide precursor resin composition |
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2016
- 2016-08-23 KR KR1020160107257A patent/KR101899902B1/en active Active
- 2016-09-20 JP JP2019532897A patent/JP6906054B2/en active Active
- 2016-09-20 CN CN201680088588.8A patent/CN109689732B/en active Active
- 2016-09-20 WO PCT/KR2016/010435 patent/WO2018038309A1/en not_active Ceased
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2017
- 2017-08-22 TW TW106128437A patent/TWI713782B/en active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11479643B2 (en) | 2017-09-29 | 2022-10-25 | Lg Chem, Ltd. | Polyimide precursor solution and polyimide film produced using same |
| CN110092908A (en) * | 2019-04-03 | 2019-08-06 | 中国科学院化学研究所 | A kind of Kapton and its preparation method and application |
| TWI878610B (en) * | 2020-09-09 | 2025-04-01 | 日商Kj化成品股份有限公司 | Solvents for resin synthesis and method for making synthetic resins using the solvents, method for making polyimide precursor or polyamide-imide precursor, method for making polyimide or polyamide-imide, method for making polyurethane, polyurethane dispersion and method for making the same, method for making polyimide film, resin varnish, binder resin, ink composition, photosensitive resin composition, adhesive resin composition, resin composition for lubricating coating, heat-resistant coating material |
Also Published As
| Publication number | Publication date |
|---|---|
| CN109689732A (en) | 2019-04-26 |
| KR20180022217A (en) | 2018-03-06 |
| CN109689732B (en) | 2022-02-11 |
| JP2019528368A (en) | 2019-10-10 |
| TWI713782B (en) | 2020-12-21 |
| KR101899902B1 (en) | 2018-09-18 |
| JP6906054B2 (en) | 2021-07-21 |
| WO2018038309A1 (en) | 2018-03-01 |
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