TW201800401A - Production method for thiocarbonyl compound - Google Patents
Production method for thiocarbonyl compound Download PDFInfo
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- TW201800401A TW201800401A TW106101716A TW106101716A TW201800401A TW 201800401 A TW201800401 A TW 201800401A TW 106101716 A TW106101716 A TW 106101716A TW 106101716 A TW106101716 A TW 106101716A TW 201800401 A TW201800401 A TW 201800401A
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- carbon atoms
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 22
- 150000003564 thiocarbonyl compounds Chemical class 0.000 title abstract description 8
- 239000002904 solvent Substances 0.000 claims abstract description 27
- 239000003513 alkali Substances 0.000 claims abstract description 24
- 239000007864 aqueous solution Substances 0.000 claims abstract description 21
- 239000000203 mixture Substances 0.000 claims abstract description 14
- 238000000034 method Methods 0.000 claims abstract description 6
- 150000001875 compounds Chemical class 0.000 claims description 97
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 30
- 125000004432 carbon atom Chemical group C* 0.000 claims description 21
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 12
- 125000000217 alkyl group Chemical group 0.000 claims description 11
- -1 alkyl sulfur Chemical compound 0.000 claims description 11
- 125000005843 halogen group Chemical group 0.000 claims description 10
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 9
- 125000003545 alkoxy group Chemical group 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 6
- 125000003118 aryl group Chemical group 0.000 claims description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 5
- 239000000243 solution Substances 0.000 claims description 4
- 229910052717 sulfur Inorganic materials 0.000 claims description 4
- 239000011593 sulfur Substances 0.000 claims description 4
- 238000002156 mixing Methods 0.000 claims description 3
- 239000004215 Carbon black (E152) Substances 0.000 claims description 2
- 229930195733 hydrocarbon Natural products 0.000 claims description 2
- 150000002430 hydrocarbons Chemical class 0.000 claims description 2
- 238000006243 chemical reaction Methods 0.000 abstract description 17
- 239000003795 chemical substances by application Substances 0.000 abstract description 10
- 238000000746 purification Methods 0.000 abstract description 5
- 239000006227 byproduct Substances 0.000 abstract description 4
- 150000001728 carbonyl compounds Chemical class 0.000 abstract description 2
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 18
- 150000007514 bases Chemical class 0.000 description 13
- 239000013078 crystal Substances 0.000 description 13
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 238000000926 separation method Methods 0.000 description 12
- 239000003153 chemical reaction reagent Substances 0.000 description 11
- 239000007788 liquid Substances 0.000 description 10
- 239000010410 layer Substances 0.000 description 9
- 235000011121 sodium hydroxide Nutrition 0.000 description 9
- 125000000623 heterocyclic group Chemical group 0.000 description 7
- 150000007529 inorganic bases Chemical class 0.000 description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 6
- 229940125782 compound 2 Drugs 0.000 description 6
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 5
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical group C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 5
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical group C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 5
- 125000001931 aliphatic group Chemical group 0.000 description 5
- 229910052698 phosphorus Inorganic materials 0.000 description 5
- 239000011574 phosphorus Substances 0.000 description 5
- 238000007086 side reaction Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 4
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 4
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 4
- 150000002894 organic compounds Chemical class 0.000 description 4
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical group C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 3
- 229940126214 compound 3 Drugs 0.000 description 3
- YWEUIGNSBFLMFL-UHFFFAOYSA-N diphosphonate Chemical compound O=P(=O)OP(=O)=O YWEUIGNSBFLMFL-UHFFFAOYSA-N 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 239000012044 organic layer Substances 0.000 description 3
- DLYUQMMRRRQYAE-UHFFFAOYSA-N phosphorus pentoxide Inorganic materials O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- YBYIRNPNPLQARY-UHFFFAOYSA-N 1H-indene Chemical compound C1=CC=C2CC=CC2=C1 YBYIRNPNPLQARY-UHFFFAOYSA-N 0.000 description 2
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 2
- DHXVGJBLRPWPCS-UHFFFAOYSA-N Tetrahydropyran Chemical group C1CCOCC1 DHXVGJBLRPWPCS-UHFFFAOYSA-N 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- QARVLSVVCXYDNA-UHFFFAOYSA-N bromobenzene Chemical compound BrC1=CC=CC=C1 QARVLSVVCXYDNA-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- 235000013365 dairy product Nutrition 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 2
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 2
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 2
- 125000001624 naphthyl group Chemical group 0.000 description 2
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 2
- 150000007530 organic bases Chemical class 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- CYQAYERJWZKYML-UHFFFAOYSA-N phosphorus pentasulfide Chemical compound S1P(S2)(=S)SP3(=S)SP1(=S)SP2(=S)S3 CYQAYERJWZKYML-UHFFFAOYSA-N 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 125000000168 pyrrolyl group Chemical group 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 125000003396 thiol group Chemical group [H]S* 0.000 description 2
- 125000003944 tolyl group Chemical group 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical group C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- 125000000355 1,3-benzoxazolyl group Chemical group O1C(=NC2=C1C=CC=C2)* 0.000 description 1
- IANQTJSKSUMEQM-UHFFFAOYSA-N 1-benzofuran Chemical group C1=CC=C2OC=CC2=C1 IANQTJSKSUMEQM-UHFFFAOYSA-N 0.000 description 1
- 125000004973 1-butenyl group Chemical group C(=CCC)* 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- POXWDTQUDZUOGP-UHFFFAOYSA-N 1h-1,4-diazepine Chemical group N1C=CC=NC=C1 POXWDTQUDZUOGP-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- MFGOFGRYDNHJTA-UHFFFAOYSA-N 2-amino-1-(2-fluorophenyl)ethanol Chemical compound NCC(O)C1=CC=CC=C1F MFGOFGRYDNHJTA-UHFFFAOYSA-N 0.000 description 1
- 125000004974 2-butenyl group Chemical group C(C=CC)* 0.000 description 1
- VHYFNPMBLIVWCW-UHFFFAOYSA-N 4-Dimethylaminopyridine Chemical compound CN(C)C1=CC=NC=C1 VHYFNPMBLIVWCW-UHFFFAOYSA-N 0.000 description 1
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 description 1
- 208000019901 Anxiety disease Diseases 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- DGCXLZPEHMHXHR-UHFFFAOYSA-N C1(=CC=CC=C1)SC.C(C1=CC=CC=C1)SCC1=CC=CC=C1 Chemical compound C1(=CC=CC=C1)SC.C(C1=CC=CC=C1)SCC1=CC=CC=C1 DGCXLZPEHMHXHR-UHFFFAOYSA-N 0.000 description 1
- 0 CC=C(C=CC(*)=C)P(S1)(SP1(c1ccc(*)cc1)=S)=S Chemical compound CC=C(C=CC(*)=C)P(S1)(SP1(c1ccc(*)cc1)=S)=S 0.000 description 1
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 1
- BWGNESOTFCXPMA-UHFFFAOYSA-N Dihydrogen disulfide Chemical compound SS BWGNESOTFCXPMA-UHFFFAOYSA-N 0.000 description 1
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical group C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 1
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 1
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 1
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical group C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical group C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 1
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical group C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- ZIXLDMFVRPABBX-UHFFFAOYSA-N alpha-methylcyclopentanone Natural products CC1CCCC1=O ZIXLDMFVRPABBX-UHFFFAOYSA-N 0.000 description 1
- 230000036506 anxiety Effects 0.000 description 1
- 125000006615 aromatic heterocyclic group Chemical group 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 239000003849 aromatic solvent Substances 0.000 description 1
- 125000000751 azo group Chemical group [*]N=N[*] 0.000 description 1
- WDIHJSXYQDMJHN-UHFFFAOYSA-L barium chloride Chemical compound [Cl-].[Cl-].[Ba+2] WDIHJSXYQDMJHN-UHFFFAOYSA-L 0.000 description 1
- 229910001626 barium chloride Inorganic materials 0.000 description 1
- RQPZNWPYLFFXCP-UHFFFAOYSA-L barium dihydroxide Chemical compound [OH-].[OH-].[Ba+2] RQPZNWPYLFFXCP-UHFFFAOYSA-L 0.000 description 1
- 229910001863 barium hydroxide Inorganic materials 0.000 description 1
- 150000001555 benzenes Chemical class 0.000 description 1
- 125000003785 benzimidazolyl group Chemical group N1=C(NC2=C1C=CC=C2)* 0.000 description 1
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical group C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- HUCVOHYBFXVBRW-UHFFFAOYSA-M caesium hydroxide Inorganic materials [OH-].[Cs+] HUCVOHYBFXVBRW-UHFFFAOYSA-M 0.000 description 1
- 239000001110 calcium chloride Substances 0.000 description 1
- 229910001628 calcium chloride Inorganic materials 0.000 description 1
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 1
- 239000000920 calcium hydroxide Substances 0.000 description 1
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 1
- 125000000609 carbazolyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 150000008280 chlorinated hydrocarbons Chemical class 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 238000004440 column chromatography Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 229940125904 compound 1 Drugs 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- JMVIPXWCEHBYAH-UHFFFAOYSA-N cyclohexanone;ethyl acetate Chemical compound CCOC(C)=O.O=C1CCCCC1 JMVIPXWCEHBYAH-UHFFFAOYSA-N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- HBNBMOGARBJBHS-UHFFFAOYSA-N dimethylarsane Chemical compound C[AsH]C HBNBMOGARBJBHS-UHFFFAOYSA-N 0.000 description 1
- 125000000532 dioxanyl group Chemical group 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 1
- 125000002883 imidazolyl group Chemical group 0.000 description 1
- 125000001041 indolyl group Chemical group 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 125000005647 linker group Chemical group 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- KEEBHMMBUBEEOV-UHFFFAOYSA-N n-(4-methoxyphenyl)benzamide Chemical compound C1=CC(OC)=CC=C1NC(=O)C1=CC=CC=C1 KEEBHMMBUBEEOV-UHFFFAOYSA-N 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 125000002971 oxazolyl group Chemical group 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 125000004193 piperazinyl group Chemical group 0.000 description 1
- 125000003386 piperidinyl group Chemical group 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 150000004032 porphyrins Chemical group 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000003373 pyrazinyl group Chemical group 0.000 description 1
- 125000003226 pyrazolyl group Chemical group 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 125000001422 pyrrolinyl group Chemical group 0.000 description 1
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000001166 thiolanyl group Chemical group 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
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- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
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- C07C327/22—Esters of monothiocarboxylic acids having carbon atoms of esterified thiocarboxyl groups bound to hydrogen atoms or to acyclic carbon atoms
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- C07—ORGANIC CHEMISTRY
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- C07C327/00—Thiocarboxylic acids
- C07C327/38—Amides of thiocarboxylic acids
- C07C327/40—Amides of thiocarboxylic acids having carbon atoms of thiocarboxamide groups bound to hydrogen atoms or to acyclic carbon atoms
- C07C327/42—Amides of thiocarboxylic acids having carbon atoms of thiocarboxamide groups bound to hydrogen atoms or to acyclic carbon atoms to hydrogen atoms or to carbon atoms of a saturated carbon skeleton
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- C07D307/77—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom ortho- or peri-condensed with carbocyclic rings or ring systems
- C07D307/78—Benzo [b] furans; Hydrogenated benzo [b] furans
- C07D307/82—Benzo [b] furans; Hydrogenated benzo [b] furans with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to carbon atoms of the hetero ring
- C07D307/84—Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen
- C07D307/85—Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen attached in position 2
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Abstract
Description
本發明係關於硫羰基化合物之製造方法。 The present invention relates to a method for producing a thiocarbonyl compound.
作為從羰基化合物製造硫羰基化合物之方法,已揭示例如使用五氧化二磷(P4S10)之硫羰基化合物之製造(非專利文獻1)。又,已揭示使用2,4-雙(4-甲氧基苯基)-1,3-二硫雜-2,4-二磷雜環丁烷-2,4-二硫化物(一般名稱為勞森試劑。以下,若未特別定義時,則係記述為勞森試劑)作為硫化劑之硫羰基化合物之製造方法(專利文獻1,及非專利文獻2、3)。 As a method for producing a thiocarbonyl compound from a carbonyl compound, for example, production of a thiocarbonyl compound using phosphorus pentoxide (P 4 S 10 ) has been disclosed (Non-Patent Document 1). The use of 2,4-bis (4-methoxyphenyl) -1,3-dithia-2,4-diphosphocyclobutane-2,4-disulfide (commonly known as Lawson's reagent. Hereinafter, unless otherwise defined, it is described as Lawson's reagent.) A method for producing a thiocarbonyl compound as a vulcanizing agent (Patent Document 1, and Non-Patent Documents 2, 3).
[專利文獻1] WO2001/046180 [Patent Document 1] WO2001 / 046180
[非專利文獻1] 新實驗化學講座14 有機化合物之合成與反應[III] 1817-1821(1978年 丸善股份有限公司) [Non-Patent Document 1] Lecture on New Experimental Chemistry 14 Synthesis and Reaction of Organic Compounds [III] 1817-1821 (1978 Maruzen Co., Ltd.)
[非專利文獻2] J. Am. Chem. Soc. 2015, 137, 9273. [Non-Patent Document 2] J. Am. Chem. Soc. 2015, 137, 9273.
[非專利文獻3] J. Org. Chem. 2002, 67, 6461. [Non-Patent Document 3] J. Org. Chem. 2002, 67, 6461.
非專利文獻1所揭示之方法由於係使用硫化氫或二氧化硫作為硫化劑,在工業化規模下之實施則會有產生各種問題之可能性。另一方面,在硫化劑係使用五硫化二磷時,五硫化二磷雖為固體,但吸濕性強,吸濕時進行分解而產生硫化氫,產生諸多副生成物而有變得必須要有純化作業等之問題。 Since the method disclosed in Non-Patent Document 1 uses hydrogen sulfide or sulfur dioxide as a vulcanizing agent, implementation on an industrial scale may cause various problems. On the other hand, when phosphorous pentasulfide is used in the vulcanizing agent system, although phosphorus pentasulfide is solid, it is highly hygroscopic. It decomposes during moisture absorption to generate hydrogen sulfide. Many by-products are generated, which requires purification work. .
如專利文獻1及非專利文獻2、3所揭示,在使用勞森試劑作為硫化劑時,並無如使用前述硫化劑時般之問題,且近年來廣泛利用做為非常優異之硫化劑。但勞森試劑在反應後必然會產生硫膦(thiophosphone)化合物。因此,為了以高純度取出目的化合物,一般係必須在純化步驟下供給至管柱層析,而難以在工業化規模下實施。尤其,非專利文獻3中明確記載使用勞森試劑所造成之問題點。 As disclosed in Patent Document 1 and Non-Patent Documents 2 and 3, when using Lawson's reagent as a vulcanizing agent, there is no problem as when using the aforementioned vulcanizing agent, and it has been widely used in recent years as a very excellent vulcanizing agent. However, Lawson's reagent must produce thiophosphone compounds after the reaction. Therefore, in order to take out the target compound with high purity, it is generally necessary to supply it to column chromatography in a purification step, and it is difficult to implement it on an industrial scale. In particular, Non-Patent Document 3 clearly describes the problems caused by the use of Lawson's reagent.
發明者等在探討能解決如上述問題之製造方法之結果,發現藉由使用包含勞森試劑之二磷雜環丁烷二硫化物作為硫化劑,即可取得高純度之硫羰基化合物。 As a result of examining the manufacturing method capable of solving the above-mentioned problems, the inventors discovered that a high-purity thiocarbonyl compound can be obtained by using a diphosphocyclobutane disulfide containing a Lawson reagent as a vulcanizing agent.
即,本發明係提供如以下之[1]~[6]者。 That is, the present invention provides the following [1] to [6].
[1]一種包含構造單位(I-3)之化合物(B)之製造方法,其係依序包括:加熱包含構造單位(I-1)之化合物(A)、化合物(C)及溶劑(X)而取得混合物之步驟(1),及,使用使用25重量%以下之濃度之鹼水溶液對取得之混合物進行鹼處理之步驟(2)。
[2]如[1]之製造方法,其係使用10~25重量%濃度之鹼水溶液進行鹼處理。 [2] The production method according to [1], which uses an alkaline aqueous solution having a concentration of 10 to 25% by weight to perform alkali treatment.
[3]如[1]或[2]之製造方法,其中鹼為氫氧化鈉、氫氧化鉀、或此等之混合物。 [3] The manufacturing method according to [1] or [2], wherein the alkali is sodium hydroxide, potassium hydroxide, or a mixture thereof.
[4]如[1]~[3]中任一項之製造方法,其中在60℃以上90℃以下進行鹼處理。 [4] The production method according to any one of [1] to [3], wherein the alkali treatment is performed at 60 ° C or higher and 90 ° C or lower.
[5]如[1]~[4]中任一項之製造方法,其中溶劑(X)為烴溶劑。 [5] The method according to any one of [1] to [4], wherein the solvent (X) is a hydrocarbon solvent.
[6]如[1]~[5]中任一項之製造方法,其係混合並同時進行加熱。 [6] The manufacturing method according to any one of [1] to [5], which is performed while mixing and heating.
根據本發明,在反應後以簡便之純化方法藉由去除源自硫化劑之副生成物,而能以在能工業化之製造方法下取得高純度之硫羰基化合物。 According to the present invention, it is possible to obtain a high-purity sulfur carbonyl compound by a simple and convenient purification method after the reaction by removing byproducts derived from the sulfurizing agent.
以下,詳細說明關於本發明。 Hereinafter, the present invention will be described in detail.
本發明係依序包括:加熱包含構造單位(I-1)之化合物(A)、化合物(C)及溶劑(X),較佳係混合並同時進行加熱,而取得混合物之步驟(1),及對 取得之混合物進行鹼處理之步驟(2)。以下,詳細說明關於步驟(1)。 The present invention sequentially includes: heating the compound (A), the compound (C), and the solvent (X) containing the structural unit (I-1), preferably, step (1) of mixing and simultaneously heating to obtain a mixture, And right The obtained mixture is subjected to step (2) of alkali treatment. Hereinafter, step (1) will be described in detail.
步驟(1)所使用之化合物(A)係包含下述式(I-1)所表示之構造單位。 The compound (A) used in step (1) includes a structural unit represented by the following formula (I-1).
式(I-1)中,A表示-C-、-O-、-S-、或-NR1-之任一者,R1表示氫原子或碳數1~10之烷基。由減少副反應之觀點,以-C-、-O-、或-NR1-為佳,特別係以-O-、-NR1-為好佳。R1係以氫原子或碳數1~3之烷基為佳。 In Formula (I-1), A represents any of -C-, -O-, -S-, or -NR 1- , and R 1 represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms. From the viewpoint of reducing side reactions to -C -, - O-, or -NR 1 - preferably, in particular based -O -, - NR 1 - is good good. R 1 is preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms.
化合物(A)係以下述式(I-2)所表示之化合物為佳。 The compound (A) is preferably a compound represented by the following formula (I-2).
式(I-2)中,M1及M2係各自獨立表示氫原子、脂肪族烴基、烷氧基、芳香族烴基、或雜環基之任一者,亦可為組合此等而成之構造,亦可具有取代基,又,M1與M2亦可相連結而形成環狀構造。M1及M2在具有至少一個亞甲基時,該亞甲基亦可被-O-、-S-、-CO-、-CS-、-COO-、CONR4-、及-NR5CO-中之任一者所取代。在此R4及R5係各自獨立表示碳數1~10之烷基,亦可與M1及或M2連結而形成環狀構造。又,M1及M2在具有環狀構造時,該環構造亦可為縮環構造。A表示與式(I-1)中之A相同 意義。 In the formula (I-2), M 1 and M 2 each independently represent a hydrogen atom, an aliphatic hydrocarbon group, an alkoxy group, an aromatic hydrocarbon group, or a heterocyclic group, and may be a combination of these. The structure may have a substituent, and M 1 and M 2 may be connected to form a cyclic structure. When M 1 and M 2 have at least one methylene group, the methylene group may also be -O-, -S-, -CO-, -CS-, -COO-, CONR 4- , and -NR 5 CO -Replaced by any one of them. Here, R 4 and R 5 each independently represent an alkyl group having 1 to 10 carbon atoms, and may be connected to M 1 and M 2 to form a cyclic structure. When M 1 and M 2 have a ring structure, the ring structure may be a constricted ring structure. A represents the same meaning as A in formula (I-1).
M1及M2之碳數並無特別限定,以碳數0~50為佳,較佳為1~40,更佳為2~30,最佳為3~20。M1及M2之碳數若在上述範圍內時,由於對後述之溶劑(X)之溶解性為良好,並且與化合物(C)之反應性為良好,故為佳。 The carbon number of M 1 and M 2 is not particularly limited, and the carbon number is preferably 0 to 50, more preferably 1 to 40, more preferably 2 to 30, and most preferably 3 to 20. When the number of carbons of M 1 and M 2 is within the above range, the solubility to the solvent (X) described later is good, and the reactivity with the compound (C) is good, so it is preferable.
作為脂肪族烴基,具體地可舉出如甲基、乙基、丙基、丁基、異丙基、tert-丁基、2-乙基己基、環戊基、環己基、1-丁烯基、2-丁烯基等。 Specific examples of the aliphatic hydrocarbon group include methyl, ethyl, propyl, butyl, isopropyl, tert-butyl, 2-ethylhexyl, cyclopentyl, cyclohexyl, and 1-butenyl. , 2-butenyl and the like.
作為芳香族烴基,具體地可舉出如苯基、萘基、甲苯基、茬基、萊基(mesityl)等。 Specific examples of the aromatic hydrocarbon group include a phenyl group, a naphthyl group, a tolyl group, a stubyl group, and a mesityl group.
雜環基係指雜環構造經由1個連結基而連結於式(I-1)所表示之構造單位上之基。作為雜環構造,具體地可舉出如吡咯啶環、吡咯啉環、吡咯環、哌啶環、哌嗪環、吡咯環、咪唑環、吡唑環、吡啶環、吡嗪環、三嗪環、環氧丁烷(oxolane)環、環氧戊烷(oxane)環、二噁烷環、呋喃環、四氫噻吩(thiolane)環、噻吩環、噁唑環、噻唑環、嗎啉環、吲哚環、苯並咪唑環、苯並呋喃環、苯並噻唑環、苯並噁唑環、喹啉環、咔唑環、卟啉環等。 The heterocyclic group refers to a group in which a heterocyclic structure is connected to a structural unit represented by formula (I-1) through a linking group. Specific examples of the heterocyclic structure include a pyrrolidine ring, a pyrroline ring, a pyrrole ring, a piperidine ring, a piperazine ring, a pyrrole ring, an imidazole ring, a pyrazole ring, a pyridine ring, a pyrazine ring, and a triazine ring. Oxolane ring, oxane ring, oxane ring, dioxane ring, furan ring, thiolane ring, thiophene ring, oxazole ring, thiazole ring, morpholine ring, indene An indole ring, a benzimidazole ring, a benzofuran ring, a benzothiazole ring, a benzoxazole ring, a quinoline ring, a carbazole ring, a porphyrin ring, and the like.
M1及M2中,作為組合脂肪族烴基、烷氧基、芳香族烴基、或雜環基之任一者而成之構造,可舉出例如下述之構造等。 Examples of structures in which M 1 and M 2 are combined with any of an aliphatic hydrocarbon group, an alkoxy group, an aromatic hydrocarbon group, or a heterocyclic group include the following structures.
作為M1及M2可具有之取代基,具體地可舉出如鹵素原子、羥基、氰基、硝基、巰基、磺酸基、丙烯醯基、乙烯基、胺基、偶氮基、甲醯基等。 Specific examples of the substituent which M 1 and M 2 may have include a halogen atom, a hydroxyl group, a cyano group, a nitro group, a sulfhydryl group, a sulfonic acid group, an acryl group, a vinyl group, an amine group, an azo group, and a methyl group.醯 基 et al.
作為M1及M2,較佳係以脂肪族烴基、烷氧基、芳香族羥基、及雜環基之任一者為佳,以脂肪族烴基、芳香族烴基、及雜環基為較佳。又,作為M1及M2所具有之取代基,以鹵素原子、巰基、及胺基為佳。其係由於在步驟(1)中之副反應為少之觀點,及步驟(1)取得之包含構造單位(I-3)之化合物(B)提供至後述步驟(2)時之包含構造單位(I-3)之化合物(B)之鹼耐性之觀點上為佳。 M 1 and M 2 are preferably any of an aliphatic hydrocarbon group, an alkoxy group, an aromatic hydroxyl group, and a heterocyclic group, and more preferably an aliphatic hydrocarbon group, an aromatic hydrocarbon group, and a heterocyclic group. . Further, as the substituents M 1 and M 2 have, a halogen atom, a mercapto group, and an amine group are preferred. This is due to the viewpoint that the side reactions in step (1) are small, and the compound (B) containing the structural unit (I-3) obtained in step (1) is included in the structural unit ( I-3) The compound (B) is preferred from the viewpoint of alkali resistance.
作為化合物(A),可舉出如下述之化合物等。 Examples of the compound (A) include the following compounds.
步驟(1)中,化合物(C)係使用作為化合物(A)之硫化劑。化合物(C)係下述式(II)所表示者。化合物(C)為勞森試劑等之二磷雜環丁烷二硫化物化合物。 In the step (1), the compound (C) is used as a vulcanizing agent for the compound (A). The compound (C) is represented by the following formula (II). The compound (C) is a diphosphocyclobutane disulfide compound such as a Lawson's reagent.
化合物(C)中,R2及R3係各自獨立表示氫原子、羥基、鹵素原子、碳數1~6之烷基、碳數1~6之烷 氧基、碳數1~6之烷硫基、或-O-Ar,Ar表示碳數6~10之芳基。作為芳基,具體地可舉出如苯基(以下略稱為Ph)、甲苯基、茬基、萘基等。R2及R3係配合化合物(C)對反應所使用之溶劑(X)之溶解性而適宜選擇即可,但從化合物(C)之製造上之觀點,以R2與R3為相同構造,且係鹵素原子、碳數1~6之烷氧基、或-O-Ph為佳,以甲氧基為最佳。 In the compound (C), R 2 and R 3 each independently represent a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, or an alkyl sulfur having 1 to 6 carbon atoms. Or -O-Ar, Ar represents an aryl group having 6 to 10 carbon atoms. Specific examples of the aryl group include phenyl (hereinafter abbreviated as Ph), tolyl, stubyl, naphthyl, and the like. R 2 and R 3 may be appropriately selected according to the solubility of the compound (C) in the solvent (X) used in the reaction, but from the viewpoint of production of the compound (C), R 2 and R 3 have the same structure. It is preferably a halogen atom, an alkoxy group having 1 to 6 carbon atoms, or -O-Ph, and a methoxy group is most preferred.
A1及A2係各自獨立表示碳數1~6之烷基、或鹵素原子,n1及n2係各自獨立表示0~4之整數。A1及A2係配合化合物(C)對反應所使用之溶劑(X)之溶解性而適宜選擇即可,但從化合物(C)之製造上之觀點,以A1與A2為相同構造,且係氫原子或鹵素原子為佳,又以n1=n2=0或1為佳。 A 1 and A 2 each independently represent an alkyl group having 1 to 6 carbon atoms or a halogen atom, and n 1 and n 2 each independently represent an integer of 0 to 4. A 1 and A 2 may be appropriately selected according to the solubility of the compound (C) in the solvent (X) used in the reaction, but from the viewpoint of production of the compound (C), A 1 and A 2 have the same structure. It is preferably a hydrogen atom or a halogen atom, and n 1 = n 2 = 0 or 1 is more preferable.
作為化合物(C),可舉出如以下之化合物等。 Examples of the compound (C) include the following compounds.
化合物(C)之製造方法係可由五氧化二磷與苯衍生物來製造。勞森試劑之製造方法係記載於例如非專利文獻(Organic Syntheses,Coll.Vol.7,P372、1990年)。具體而言,勞森試劑係能藉由在苯甲醚中使五氧化二磷沸點迴流後進行冷卻,且過濾析出之結晶而製造。 The method for producing the compound (C) can be produced from phosphorus pentoxide and a benzene derivative. A method for producing Lawson's reagent is described in, for example, a non-patent literature (Organic Syntheses, Coll. Vol. 7, P372, 1990). Specifically, Lawson's reagent can be produced by refluxing the phosphorus pentoxide in anisole, cooling it, and filtering the precipitated crystals.
步驟(1)中之化合物(C)之使用量係相對於所使用之化合物(A)1莫耳,通常為0.50×Z~5.0×Z莫耳,以0.50×Z~2.0×Z莫耳為佳,較佳為0.50×Z~1.0×Z莫耳之範圍。在此,Z表示化合物(A)在一分子內所具有之羰基之數。化合物(C)之使用量若在上述範圍內,在 從抑制起因於化合物(C)之副反應、及純化步驟之容易度觀點上為佳。化合物(C)係可各別單獨使用,亦可使用相異之複數者。 The amount of the compound (C) used in step (1) is 1 mole relative to the compound (A) used, usually 0.50 × Z ~ 5.0 × Z mole, and 0.50 × Z ~ 2.0 × Z mole as The range is preferably 0.50 × Z to 1.0 × Z mole. Here, Z represents the number of carbonyl groups that the compound (A) has in one molecule. If the amount of compound (C) used is within the above range, It is preferable from a viewpoint of suppressing the side reaction by compound (C), and the ease of a purification process. The compounds (C) may be used individually or in a plural form.
步驟(1)中所使用之溶劑(X)只要係使用不與所使用之化合物(A)及化合物(C),以及因反應所生成之化合物(B)及起因於化合物(C)之副生成物進行反應者,即無特別限定。 As long as the solvent (X) used in step (1) is not compatible with the compound (A) and compound (C) used, and the compound (B) produced by the reaction and the by-product caused by the compound (C) There is no particular limitation on who reacts.
作為溶劑(X)之具體例,可舉出如戊烷、己烷、庚烷、辛烷等之脂肪族烴溶劑;苯、甲苯、茬、均三甲苯等之芳香族烴溶劑;苯甲醚(anisole)、苯甲基硫醚(thioanisole)等之於分子中具有雜原子之芳香族溶劑;吡啶、吡嗪等之芳香族雜環溶劑;二乙基醚、四氫呋喃、二甲氧基乙烷、1,4-二噁烷等之醚溶劑;及、二氯甲烷、氯仿、氯苯、溴苯等之氯化烴溶劑。從化合物(A)及化合物(C)之溶解性、後述步驟(2)中之鹼處理時之操作性之觀點,以甲苯、茬、均三甲苯、氯苯為佳。溶劑(X)係可組合複數溶劑來使用。 Specific examples of the solvent (X) include aliphatic hydrocarbon solvents such as pentane, hexane, heptane, and octane; aromatic hydrocarbon solvents such as benzene, toluene, stub, and mesitylene; and anisole (anisole), benzyl sulfide (thioanisole) and other aromatic solvents with heteroatoms in the molecule; aromatic heterocyclic solvents such as pyridine and pyrazine; diethyl ether, tetrahydrofuran, dimethoxyethane Ether solvents such as 1,4-dioxane; and chlorinated hydrocarbon solvents such as dichloromethane, chloroform, chlorobenzene, bromobenzene, etc. From the viewpoints of the solubility of the compound (A) and the compound (C) and the operability during the alkali treatment in the step (2) described later, toluene, stubble, mesitylene, and chlorobenzene are preferred. The solvent (X) can be used in combination of plural solvents.
作為實施步驟(1)之溫度,以30℃~160℃之範圍為佳,較佳為50℃~130℃之範圍,最佳為60~120℃。實施步驟(1)之溫度若在上述範圍內,在化合物(A)及化合物(C)之溶解性、及副反應抑制之觀點上為佳。 The temperature for implementing step (1) is preferably in the range of 30 ° C to 160 ° C, more preferably in the range of 50 ° C to 130 ° C, and most preferably 60 to 120 ° C. If the temperature at which the step (1) is carried out is within the above range, it is preferable from the viewpoints of the solubility of the compound (A) and the compound (C) and suppression of side reactions.
實施步驟(1)之反應容器內之壓力通常為大氣壓。但,從化合物(A)或化合物(C)之溶解性之觀 點,在使用沸點為80℃以下之溶劑作為溶劑(X)時,亦可在加壓條件下實施。此時之反應容器內之壓力通常為2kPa~1MPa之範圍。 The pressure in the reaction vessel in which step (1) is performed is usually atmospheric pressure. However, from the viewpoint of the solubility of compound (A) or compound (C) When using a solvent having a boiling point of 80 ° C. or lower as the solvent (X), it may be performed under pressure. The pressure in the reaction vessel at this time is usually in the range of 2 kPa to 1 MPa.
步驟(1)係藉由化合物(A)與化合物(C)之反應,而可取得包含下述式(I-3)所表之構造單位之化合物(B)。式(I-3)中之A係表示與式(I-1)中之A相同意義。 In step (1), a compound (B) containing a structural unit represented by the following formula (I-3) can be obtained by reacting the compound (A) with the compound (C). A in the formula (I-3) represents the same meaning as A in the formula (I-1).
化合物(A)為式(I-2)所表示之化合物時,步驟(1)中取得之化合物(B)為下述式(I-4)所表示之化合物。式(I-4)中之A、M1、及M2係表示與式(I-2)中之A、M1、及M2相同意義。 When the compound (A) is a compound represented by the formula (I-2), the compound (B) obtained in step (1) is a compound represented by the following formula (I-4). A, M 1 and M 2 in the formula (I-4) have the same meanings as A, M 1 and M 2 in the formula (I-2).
作為化合物(B),可舉出如下述之化合物等。 Examples of the compound (B) include the following compounds.
本發明包括對取得之混合物進行鹼處理之步驟(2)。以下,說明關於步驟(2)。步驟(1)中,化合物(C)係變換成下述式(III-1)及式(III-2)所表示之化合物。式(III-1)及式(III-2)中之R2、R3、A1、A2、n1及n2係分別表示與式(II)中相同意義。 The present invention includes a step (2) of subjecting the obtained mixture to an alkali treatment. Hereinafter, step (2) will be described. In step (1), the compound (C) is converted into a compound represented by the following formula (III-1) and formula (III-2). R 2 , R 3 , A 1 , A 2 , n 1 and n 2 in formula (III-1) and formula (III-2) have the same meanings as in formula (II), respectively.
式(III-1)及式(III-2)所表示之化合物一 般係具有氧化性。例如,將步驟(1)所取得之化合物(B)接續提供至反應之情況,式(III-1)及式(III-2)所表示之化合物若混入於化合物(B)時,會有式(III-1)及式(III-2)所表示之化合物引起副反應之憂慮。尤其係在氧化反應中,認為式(III-1)及式(III-2)所表示之化合物與氧化劑反應,導致阻礙目的之反應。因此,以分離化合物(B)與式(III-1)及式(III-2)所表示之化合物為佳。 Compounds represented by formula (III-1) and formula (III-2) General system is oxidizing. For example, in the case where the compound (B) obtained in step (1) is successively provided to the reaction, if the compounds represented by formula (III-1) and formula (III-2) are mixed into compound (B), there will be a formula The compounds represented by (III-1) and formula (III-2) cause anxiety about side reactions. In particular, in the oxidation reaction, it is considered that the compounds represented by the formula (III-1) and the formula (III-2) react with the oxidizing agent to cause a reaction that hinders the purpose. Therefore, it is preferable to isolate the compound (B) from the compound represented by the formula (III-1) and the formula (III-2).
本發明所包含之步驟(2)係將式(III-1)及式(III-2)所表示之化合物變換成下述式(IV-1)及式(IV-2)所表示之化合物,且作成水溶性化合物而變得能容易地被去除。式(IV-1)及式(IV-2)中之R2、R3、A1、A2、n1、及n2係表與式(II)中相同意義。 Step (2) included in the present invention is to convert the compounds represented by formula (III-1) and formula (III-2) into compounds represented by the following formula (IV-1) and formula (IV-2), In addition, it can be easily removed as a water-soluble compound. R 2 , R 3 , A 1 , A 2 , n 1 , and n 2 in the formula (IV-1) and the formula (IV-2) have the same meanings as in the formula (II).
步驟(2)中實施之鹼處理係意指使用鹼性化合物將式(III-1)及式(III-2)所表示之化合物變換成式(IV-1)及式(IV-2)所表示之化合物。 The alkali treatment performed in step (2) means that the compounds represented by formula (III-1) and formula (III-2) are converted into compounds represented by formula (IV-1) and formula (IV-2) using a basic compound. Represented compounds.
作為鹼處理所使用之鹼性化合物,可為有機化合物之鹼(以下略稱為有機鹼),亦可為無機化合物之鹼(以下略稱為無機鹼)。作為有機鹼之具體例,可舉出如三乙基胺、吡啶、哌啶、咪唑、乙二胺、N,N-二甲基-4-胺基吡啶、1,8-二吖雙環[5.4.0]-7-十一烯、1,5-二吖雙 環[4.3.0]-5-壬烯、1,4-二吖雙環[2.2.2]辛烷等。作為無機鹼之具體例,可舉出如氫氧化鋰、氫氧化鈉、氫氧化鉀、氫氧化銫、氫氧化鈣、氫氧化鋇等。使用之鹼性化合物係以無機鹼為佳,以氫氧化鈉、氫氧化鉀為較佳。在不與步驟(1)所取得之化合物(B)進行反應之點、及經濟性之觀點上為佳。鹼性化合物係可分別單獨使用,亦可使用相異之複數者。 The basic compound used in the alkali treatment may be a base of an organic compound (hereinafter referred to as an organic base), or a base of an inorganic compound (hereinafter referred to as an inorganic base). Specific examples of the organic base include triethylamine, pyridine, piperidine, imidazole, ethylenediamine, N, N-dimethyl-4-aminopyridine, 1,8-diazine bicyclic [5.4 .0] -7-undecene, 1,5-diazepine Ring [4.3.0] -5-nonene, 1,4-diazinebicyclo [2.2.2] octane, etc. Specific examples of the inorganic base include lithium hydroxide, sodium hydroxide, potassium hydroxide, cesium hydroxide, calcium hydroxide, and barium hydroxide. The basic compound used is preferably an inorganic base, and more preferably sodium hydroxide or potassium hydroxide. It is preferable from the viewpoint of not reacting with the compound (B) obtained in step (1), and from the viewpoint of economy. The basic compounds can be used individually or in combination.
使用之鹼性化合物為無機鹼時,可直接使用無機鹼,但以使用作為規定濃度之水溶液為佳。將無機鹼使用作為水溶液時,由於能在該水溶液中萃取藉由鹼處理所生成之式(IV-1)及式(IV-2)所表示之化合物,且容易與步驟(1)所取得之化合物(B)分離,故為佳。 When the basic compound used is an inorganic base, an inorganic base can be used directly, but it is preferable to use an aqueous solution with a predetermined concentration. When an inorganic base is used as an aqueous solution, the compounds represented by the formula (IV-1) and the formula (IV-2) produced by the alkali treatment can be extracted in the aqueous solution, and it is easy to obtain the compound obtained in step (1). Compound (B) is preferably isolated.
鹼性化合物係使用作為規定濃度之無機鹼水溶液時,無機鹼之濃度係以10~25重量%之範圍為佳,以15~23重量%之範圍為較佳,以18~22重量%之範圍為最佳。無機鹼濃度若在該濃度之範圍時,由於能有效率地將式(III-1)及式(III-2)所表示之化合物變換成式(IV-1)及式(IV-2)所表示之化合物,且防止物質性質之惡化,故為佳。在此所稱之物質係指由步驟(1)中取得之化合物(A)、化合物(B)、化合物(C)、溶劑(X)、及鹼性化合物所構成之液狀組成物。物質性質之惡化係指例如式(III-1)及式(III-2)及或式(IV-1)及式(IV-2)所表示之化合物等變成塊狀之高黏性狀態,變成不均勻性質。 When an alkaline compound is used as an inorganic alkali aqueous solution of a predetermined concentration, the concentration of the inorganic alkali is preferably in a range of 10 to 25% by weight, more preferably in a range of 15 to 23% by weight, and in a range of 18 to 22% by weight. For the best. When the concentration of the inorganic base is within the range, the compounds represented by the formulae (III-1) and (III-2) can be efficiently converted into those represented by the formulae (IV-1) and (IV-2). It is preferred that the compound is a compound which prevents deterioration of material properties. The substance referred to herein means a liquid composition composed of the compound (A), the compound (B), the compound (C), the solvent (X), and the basic compound obtained in the step (1). Deterioration of material properties means that, for example, the compounds represented by formula (III-1) and formula (III-2) and / or formula (IV-1) and formula (IV-2) become a blocky, highly viscous state, and become Non-uniform nature.
在鹼性化合物係使用作為規定濃度之無機鹼水溶液,且藉由分液操作分離步驟(1)取得之化合物(B)與式(IV-1)及式(IV-2)所表示之化合物之情況,為了改良分液性,亦可使用分液性改良劑。分液性改良劑係指具有分液操作時有機層與水層之比重差為小,或消除低溶解性成分或兩親媒性成分在混合時所產生之乳液或沉澱之作用之化合物。作為分液性改良劑,具體地可舉出如氯化鋰、氯化鈉、氯化鉀、氯化鈣、氯化鋇等之無機氯化合物;甲醇、乙醇、2-丙醇、四氫呋喃、1,4-二噁烷、乙腈、丙酮、2-丁酮等之兩親媒性溶劑等。此等分液性改良劑係以可組合複數而使用。 As the basic compound, an inorganic alkaline aqueous solution having a predetermined concentration is used, and the compound (B) obtained in step (1) is separated from the compound represented by formula (IV-1) and formula (IV-2) by a liquid separation operation. In some cases, in order to improve the liquid separation property, a liquid separation improver may be used. Liquid-separating improver refers to a compound that has a small specific gravity difference between the organic layer and the water layer during the liquid-separating operation, or eliminates the emulsion or precipitation effect of low-solubility components or amphiphilic components when mixed. Specific examples of the liquid-separation improver include inorganic chlorine compounds such as lithium chloride, sodium chloride, potassium chloride, calcium chloride, and barium chloride; methanol, ethanol, 2-propanol, tetrahydrofuran, 1 , 4-dioxane, acetonitrile, acetone, 2-butanone and other amphiphilic solvents. These liquid-separating improvers are used in combination in plural.
在步驟(1)中取得之化合物(B)係析出作為結晶之情況,為了溶解化合物(B),亦可另追加溶劑。此時可使用之溶劑,具體地可舉出如前述之溶劑(X)之外,尚可舉出如甲醇、乙醇、2-丙醇、1-丁醇、2-丁醇、乙二醇、丙二醇、乙二醇單甲基醚、二丙酮醇等之醇溶劑;丙酮、2-丁酮、甲基異丁基酮、環戊酮、環己酮等之酮溶劑;乙酸乙酯、乙酸丁酯、丙二醇單甲基醚、乳酸乙酯、γ-丁內酯等之酯溶劑;N,N‘-二甲基甲醯胺、N,N‘-二甲基乙醯胺、N-甲基-2-吡咯啶酮、二甲亞碸等之非質子性極性溶劑等。此等溶劑亦可組合複數而使用。 In the case where the compound (B) obtained in step (1) is precipitated as a crystal, a solvent may be added in order to dissolve the compound (B). Examples of solvents that can be used at this time include the solvents (X) as described above, and examples thereof include methanol, ethanol, 2-propanol, 1-butanol, 2-butanol, ethylene glycol, Alcohol solvents such as propylene glycol, ethylene glycol monomethyl ether, and diacetone alcohol; ketone solvents such as acetone, 2-butanone, methyl isobutyl ketone, cyclopentanone, and cyclohexanone; ethyl acetate, butyl acetate Ester solvents such as esters, propylene glycol monomethyl ether, ethyl lactate, γ-butyrolactone; N, N'-dimethylformamide, N, N'-dimethylacetamide, N-methyl Aprotic polar solvents such as 2-pyrrolidone and dimethylarsin. These solvents may be used in combination.
鹼處理所使用之鹼性化合物之量係相對於步驟(1)所使用之化合物(C)1莫耳,通常為2.0/E~20/E莫耳,以2.2/E~10/E莫耳為佳,較佳為2.5/E~5/E莫耳。 在此,E表示鹼性化合物之價數。鹼性化合物之量若在該範圍內,由於能將以化學計量地將全量之式(III-1)及式(III-2)所表示之化合物變換成式(IV-1)及式(IV-2)所表示之化合物,故為佳。並且,在使用無機鹼水溶液作為鹼性化合物之情況,鹼性化合物之量若在上述範圍內,由於能有效率地將式(IV-1)及式(IV-2)所表示之化合物萃取至該水溶液,故為佳。 The amount of the basic compound used in the alkali treatment is 1 mole per mole of the compound (C) used in step (1), usually 2.0 / E ~ 20 / E mole, and 2.2 / E ~ 10 / E mole. More preferably, 2.5 / E ~ 5 / E moles are preferred. Here, E represents the valence of a basic compound. If the amount of the basic compound is within this range, the total amount of the compounds represented by formula (III-1) and formula (III-2) can be converted into formula (IV-1) and formula (IV) stoichiometrically. -2) is preferred. In addition, in the case where an inorganic alkaline aqueous solution is used as the basic compound, if the amount of the basic compound is within the above range, the compounds represented by the formulae (IV-1) and (IV-2) can be efficiently extracted to This aqueous solution is preferred.
在使用無機鹼水溶液作為鹼性化合物之情況,該水溶液之pH係以12.0~13.9之範圍為佳,以13.0~13.9之範圍為較佳。該水溶液之pH若在上述範圍內,由於能將式(III-1)及式(III-2)所表示之化合物有效率地變換成式(IV)所表示之化合物,故為佳。 When an inorganic alkaline aqueous solution is used as the basic compound, the pH of the aqueous solution is preferably in the range of 12.0 to 13.9, and more preferably in the range of 13.0 to 13.9. If the pH of the aqueous solution is within the above range, the compounds represented by the formula (III-1) and the formula (III-2) can be efficiently converted into the compounds represented by the formula (IV), so it is preferable.
實施鹼處理之溫度通常在40~90℃之範圍,以50~85℃為佳,較佳為60~83℃之範圍。溫度若在該溫度之範圍內,由於能將式(III)所表示之化合物有效率地變換成式(IV-1)及式(IV-2)所表示之化合物,故為佳。 The temperature at which the alkali treatment is performed is usually in the range of 40 to 90 ° C, preferably 50 to 85 ° C, and more preferably 60 to 83 ° C. If the temperature is within this temperature range, the compound represented by the formula (III) can be efficiently converted into the compounds represented by the formula (IV-1) and the formula (IV-2), so it is preferable.
以下,依據實施例更加詳細說明本發明。例中之「%」及「份」在未特別定義時,則為重量%及重量份。 Hereinafter, the present invention will be described in more detail based on examples. "%" And "part" in the example are weight% and weight part unless it is specifically defined.
將設置有攪拌機、戴氏冷凝器、溫度計之300mL-四頸燒瓶內作成氮環境,並放入參考專利文獻(日本特開2011-207765)所合成之化合物1粉末10g、勞森試劑(東京化成工業(股)製)6.46g、甲苯111g,在室溫中開始攪拌。以油浴加熱至成為內溫110℃,在內溫110℃下保溫2小時。反應結束後,使內溫冷卻至80℃,使用滴下漏斗花費30分鐘以上將20%苛性鈉水溶液40g滴入系統中,其後在內溫80℃下保溫12小時以上。 A 300 mL four-necked flask equipped with a stirrer, a Dairy condenser, and a thermometer was used as a nitrogen environment, and 10 g of Compound 1 powder synthesized by reference patent document (Japanese Patent Application Laid-Open No. 2011-207765) and Lawson reagent (Tokyo Kasei) 6.46 g (manufactured by Industrial Co., Ltd.) and 111 g of toluene, and stirring was started at room temperature. The oil bath was heated to an internal temperature of 110 ° C, and the temperature was maintained at the internal temperature of 110 ° C for 2 hours. After the reaction was completed, the internal temperature was cooled to 80 ° C., and 40 g of a 20% caustic soda aqueous solution was dropped into the system using a dropping funnel for more than 30 minutes, and then kept at an internal temperature of 80 ° C. for more than 12 hours.
另外準備於下部具有雙通旋塞之500mL-附夾套之可拆式燒瓶,並且設置攪拌機、戴氏冷凝器、溫度計。使用恆溫循環裝置使60℃熱媒循環於夾套中,將內部調整溫度至60℃。將上述分液溶液轉移至該可拆式燒瓶,在內溫60℃下藉由下部雙通旋塞去除分液下層(水層)。對剩餘之甲苯容器加入純水50g,在內溫60度下攪拌30分鐘,其後靜置去除下層(水層)。實施使用純水之分液洗淨共計3次直到排水pH變成<9。減壓濃縮分液後之有機層,將化合物2之濃度調整成25%,並冷卻至25℃。使用布氏漏斗過濾析出之結晶,以甲醇10g洗淨取得之濕晶後,使用減壓乾燥器在60℃中進行乾燥,而取得化合物2之乾燥結晶9.44g。收率90%。 In addition, a 500-mL detachable flask with a jacket with a two-way stopcock was prepared in the lower part, and a stirrer, a Daiichi condenser, and a thermometer were set. A 60 ° C heat medium was circulated in the jacket using a constant temperature circulation device, and the internal temperature was adjusted to 60 ° C. The liquid separation solution was transferred to the separable flask, and the lower liquid separation layer (aqueous layer) was removed by a lower two-way stopcock at an internal temperature of 60 ° C. 50 g of pure water was added to the remaining toluene container, and the mixture was stirred at an internal temperature of 60 ° C for 30 minutes. Thereafter, the lower layer (aqueous layer) was removed by standing. Separation washing with pure water was performed a total of 3 times until the drainage pH became <9. The organic layer after liquid separation was concentrated under reduced pressure, the concentration of Compound 2 was adjusted to 25%, and cooled to 25 ° C. The precipitated crystals were filtered using a Buchner funnel, and the obtained wet crystals were washed with 10 g of methanol, and then dried at 60 ° C. using a reduced-pressure dryer to obtain 9.44 g of dried crystals of Compound 2. The yield was 90%.
使用ICP發光分析裝置ICPS-7510((股)島 津製作所製),定量取得之化合物2之乾燥結晶中之殘留磷量,其結果為5ppm。 Using ICP luminescence analyzer ICPS-7510 ((share) island (Manufactured by Tsu Seisakusho), and the amount of residual phosphorus in the dried crystals of Compound 2 obtained was quantified, and the result was 5 ppm.
將設置有攪拌機、戴氏冷凝器、溫度計之300mL-四頸燒瓶內作成氮環境,並放入p-苯茴香胺(p-benzanisidide)(東京化成工業(股)製)10g、勞森試劑(東京化成工業(股)製)9.25g、甲苯111g,在室溫下開始攪拌。使用油浴加熱至成為內溫110℃,在內溫110℃下保溫2小時。反應結束後,使內溫冷卻至80℃,使用滴下漏斗花費30分以上將20%苛性鈉水溶液57g滴入於系統中,其後在內溫80℃下保溫12小時以上。 A nitrogen atmosphere was placed in a 300 mL four-necked flask equipped with a stirrer, a Dairy condenser, and a thermometer, and 10 g of p-benzanisidide (manufactured by Tokyo Chemical Industry Co., Ltd.) and Lawson's reagent ( 9.25 g of Tokyo Chemical Industry Co., Ltd. and 111 g of toluene, and stirring was started at room temperature. It was heated to an internal temperature of 110 ° C using an oil bath, and the temperature was maintained at the internal temperature of 110 ° C for 2 hours. After the reaction was completed, the internal temperature was cooled to 80 ° C., and 57 g of a 20% caustic soda aqueous solution was dropped into the system using a dropping funnel for 30 minutes or more, and then kept at an internal temperature of 80 ° C. for more than 12 hours.
另外準備於下部具有雙通旋塞之500mL-附夾套之可拆式燒瓶,並且設置攪拌機、戴氏冷凝器、溫度計。使用恆溫循環裝置使60℃熱媒循環於夾套中,且將內部溫度調整成60℃。將上述分液溶液轉移至該可拆式燒瓶,在內溫60℃下藉由下部雙通旋塞去除分液下層(水層)。對剩餘之甲苯容器加入純水50g,在內溫60度下攪拌30分鐘,其後静置去除下層(水層)。實施使用純水之分液洗淨共計3次直到排水pH變成<9。減壓濃縮分液後之有機層,將化合物3濃度調整成25%,並冷卻至25℃。使 用布氏漏斗過濾析出之結晶,以甲醇10g洗淨取得之濕晶後,使用減壓乾燥器在60℃中進行乾燥,而取得化合物3之乾燥結晶8.89g。收率83%。 In addition, a 500-mL detachable flask with a jacket with a two-way stopcock was prepared in the lower part, and a stirrer, a Daiichi condenser, and a thermometer were set. A 60 ° C heat medium was circulated in the jacket using a constant temperature circulation device, and the internal temperature was adjusted to 60 ° C. The liquid separation solution was transferred to the separable flask, and the lower liquid separation layer (aqueous layer) was removed by a lower two-way stopcock at an internal temperature of 60 ° C. 50 g of pure water was added to the remaining toluene container, and the mixture was stirred at an internal temperature of 60 ° C for 30 minutes. Thereafter, the lower layer (aqueous layer) was removed by standing. Separation washing with pure water was performed a total of 3 times until the drainage pH became <9. The organic layer after liquid separation was concentrated under reduced pressure, the concentration of Compound 3 was adjusted to 25%, and cooled to 25 ° C. Make The precipitated crystals were filtered through a Buchner funnel, and the wet crystals obtained were washed with 10 g of methanol, and then dried at 60 ° C. using a reduced-pressure dryer to obtain 8.89 g of dried crystals of Compound 3. The yield was 83%.
使用ICP發光分析裝置ICPS-7510((股)島津製作所製),定量取得之化合物3之乾燥結晶中之殘留磷量,其結果為8ppm。 The amount of residual phosphorus in the dry crystal of the obtained compound 3 was quantified using an ICP emission analysis device ICPS-7510 (manufactured by Shimadzu Corporation), and the result was 8 ppm.
除了將反應後在20%苛性鈉水溶液下保溫12小時以上之內溫變更成70℃以外,其他全部係與實施例1同樣地實施。使用ICP發光分析裝置ICPS-7510((股)島津製作所製),定量取得之化合物2之乾燥結晶中之殘留磷量,其結果為88ppm。 All operations were performed in the same manner as in Example 1 except that the internal temperature was maintained at 70 ° C. after being held in a 20% caustic soda aqueous solution for more than 12 hours after the reaction. The amount of residual phosphorus in the dried crystal of Compound 2 obtained was quantitatively measured using an ICP emission analysis device ICPS-7510 (manufactured by Shimadzu Corporation), and the result was 88 ppm.
除了將反應後在20%苛性鈉水溶液下保溫12小時以上之內溫變更成60℃以外,其他全部係與實施例1同樣地實施。使用ICP發光分析裝置ICPS-7510((股)島津製作所製),定量取得之化合物2之乾燥結晶中之殘留磷量,其結果為1300ppm。 All operations were performed in the same manner as in Example 1 except that the internal temperature was maintained at 60 ° C. after being held in a 20% caustic soda aqueous solution for more than 12 hours after the reaction. The amount of residual phosphorus in the dry crystal of the obtained compound 2 was quantified using an ICP emission analysis device ICPS-7510 (manufactured by Shimadzu Corporation), and the result was 1300 ppm.
除了反應後所使用之苛性鈉水溶液係變更成8%水溶液100g以外,其他全部係與實施例1同樣地實施。使用 ICP發光分析裝置ICPS-7510((股)島津製作所製),定量取得之化合物2之乾燥結晶中之殘留磷量,其結果為2900ppm。 All operations were performed in the same manner as in Example 1 except that the caustic soda aqueous solution used after the reaction was changed to 100 g of an 8% aqueous solution. use The ICP emission analysis device ICPS-7510 (manufactured by Shimadzu Corporation) quantified the amount of residual phosphorus in the dry crystal of Compound 2 obtained, and the result was 2900 ppm.
將反應後所使用之苛性鈉水溶液變更成30%水溶液27g之際,滴下中產生茶色塊狀不溶物,而變得難以均勻攪拌。 When the caustic soda aqueous solution used after the reaction was changed to 27 g of a 30% aqueous solution, brown insoluble matter was generated during dropping, and it became difficult to stir uniformly.
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