TW201529173A - Submersible ultrasonic nebulization device - Google Patents

Abstract

A submersible ultrasonic nebulization device is described. The submersible ultrasonic nebulization device includes a tank, a transmission medium, an ultrasonic generator, a solution supplying system and an isolation film. The transmission medium is stored within the tank. The ultrasonic generator is sunk in the transmission medium for generating a plurality of ultrasonic waves. The solution supplying system is suitable to supply a solution over a top of the tank. The isolation film is disposed above the transmission medium to isolate the transmission medium and the solution. The transmission medium can transmit the ultrasonic waves to the isolation film to nebulize the solution above the isolation film.

Description

Submersible ultrasonic atomizing device

The present invention relates to an atomizing device, and more particularly to a submerged ultrasonic atomizing device.

The submersible ultrasonic atomizing device mainly includes an ultrasonic generator. Using the ultrasonic energy generated by the ultrasonic generator, the solution of the desired chemical can be atomized. Among them, the ultrasonic generator usually includes a piezoelectric ceramic. When the submersible ultrasonic atomizing device is used to atomize the chemical solution, the submerged ultrasonic atomizing device is submerged into the chemical solution, and the ultrasonic energy generated by the ultrasonic generator is used to vibrate the chemical solution. Thereby atomizing the chemical solution.

However, the current submersible ultrasonic atomizing device can perform different atomization frequencies, and therefore, when atomizing different chemical solutions, a submerged ultrasonic atomizing device having piezoelectric ceramics with different frequencies is required. Therefore, the submersible ultrasonic atomizing device is not widely applicable. In addition, since the submerged ultrasonic atomizing device is immersed in the chemical solution to be atomized, the submerged ultrasonic atomizing device is in direct contact with the chemical. In order to prevent the submerged ultrasonic atomizing device from being damaged by the chemical solution, it is necessary to use a chemical solution that does not corrode or damage the submersible ultrasonic atomizing device. This will further enhance the applicability of the submersible ultrasonic atomization device. limit.

Accordingly, one aspect of the present invention is to provide a submersible ultrasonic atomization device that includes a conductive medium that delivers ultrasonic energy. Therefore, by adjusting the resonance structure of the ultrasonic energy, the effect of atomizing a solution of different substances using only a single ultrasonic generator can be achieved.

Another aspect of the present invention provides a submerged ultrasonic atomization device comprising a separator for isolating a liquid to be atomized solution supplied from a conductive medium and a solution supply system, thereby preventing the atomization solution from being disposed. The ultrasonic generator in the conductive medium causes damage. Therefore, the submerged ultrasonic atomizing device can be applied not only to atomize various solutions, but also to prolong the service life of the ultrasonic generator.

According to the above object of the present invention, a submerged ultrasonic atomizing device is proposed. The submersible ultrasonic atomization device comprises a tank, a conductive medium, an ultrasonic generator, a solution supply system, and a separator. The conductive medium is stored in the tank. The ultrasonic generator is suspended within the conductive medium. An ultrasonic generator is suitable for generating a plurality of ultrasonic waves. The solution supply system is adapted to supply the solution above the tank. A separator is disposed on the conductive medium to isolate the conductive medium from the solution. The conductive medium can transmit ultrasonic waves to the separator to atomize the solution on the separator.

According to an embodiment of the invention, the conductive medium has a surface tension coefficient and the surface tension coefficient is from 18 mN/mm to 475 mN/mm.

According to another embodiment of the invention, the conductive medium described above comprises water.

According to still another embodiment of the present invention, the submersible ultrasonic atomization device further includes a high frequency generator coupled to the ultrasonic generator to cause the ultrasonic generator to generate ultrasonic waves.

According to still another embodiment of the present invention, the high frequency generator has a frequency range of 30 kHz to 7 MHz.

According to still another embodiment of the present invention, the solution supply system is a continuous solution supply system, a pulsed solution supply system, or a tunable solution supply system. This adjustable solution supply system can supply the solution in a continuous or pulsed manner.

According to still another embodiment of the present invention, the material of the above-mentioned separator comprises a metal material or an organic material.

According to still another embodiment of the present invention, the solution supplied by the solution supply system described above comprises an organic coating solution.

According to still another embodiment of the present invention, the solution supplied by the solution supply system described above comprises an inorganic coating solution.

According to still another embodiment of the present invention, the solution supplied by the solution supply system described above comprises a nano coating solution.

100‧‧‧Submersible ultrasonic atomizing device

102‧‧‧ slots

104‧‧‧Transmission medium

106‧‧‧Supersonic generator

108‧‧‧Solution supply system

110‧‧‧Supersonic

112‧‧‧solution

114‧‧‧Separator

116‧‧‧ fog

118‧‧‧High frequency generator

120‧‧‧Storage space

The above and other objects, features, advantages and embodiments of the present invention will become more <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; Schematic diagram of the atomizing device.

Please refer to FIG. 1 , which is a schematic diagram of a submerged ultrasonic atomization device according to an embodiment of the present invention. In the present embodiment, the submerged ultrasonic atomizing device 100 can be used to atomize a solution containing various chemical agents to perform a desired treatment such as coating or nanogranulation. In some embodiments, the tank 102, the conductive medium 104, the ultrasonic generator 106, the solution supply system 108, and the isolation membrane 114 are primarily included.

The tank 102 has a storage space 120 for storage of the conductive medium 104. In some examples, the material of the trench 102 is preferably a material that does not chemically react with the conductive medium 104 to avoid affecting the conductive effect of the conductive medium 104 on ultrasonic energy, and the lifetime of the trench 102.

The conductive medium 104 is disposed in the storage space 120 of the slot 102. In a preferred embodiment, the conductive medium 104 fills the entire storage space 120 to facilitate the transmission of ultrasonic energy. In some embodiments, the conductive medium 104 can be selected from media having a surface tension coefficient of from 18 mN/mm to 475 mN/mm. In an exemplary embodiment, conductive medium 104 comprises water.

The ultrasonic generator 106 sinks into the conductive medium 104 in the storage space 120 of the slot 102 and is covered by the conductive medium 104. In a preferred embodiment, the ultrasonic generator 106 is entirely sunk into the conductive medium 104 and is completely covered by the conductive medium 104. The ultrasonic generator 106 can generate a plurality of ultrasonic waves 110, and the conductive medium 104 encasing the ultrasonic generator 106 can conduct the ultrasonic waves 110. In some exemplary examples, the ultrasonic generator 106 comprises a piezoelectric ceramic. In some embodiments, the submerged ultrasonic atomization device 100 more selectively includes a high frequency generator 118, and the high frequency generator 118 is coupled to the ultrasonic generator 106. In these embodiments, ultrasonic generation The processor 106 generates the ultrasonic wave 110 by driving the high frequency signal provided by the high frequency generator 118. In some exemplary examples, the frequency provided by the high frequency generator 118 ranges from 30 KHz to 7 MHz.

In some embodiments, the solution supply system 108 is disposed adjacent to the tank 102 and is preferably positioned above the tank 102 to supply the solution 112 to be atomized above the tank 102. However, the solution supply system 108 can be located at a location other than the adjacent tank 102 as long as the solution supply system 108 can supply the solution 112 to be atomized above the tank 102 through an additional disposed conduit. Moreover, in some embodiments, the solution supply system 108 is a continuous solution supply system, i.e., the solution supply system 108 can supply the solution 112 to be atomized in a continuous manner. In other embodiments, the solution supply system 108 is a pulsed solution supply system, i.e., the solution supply system 108 can supply the solution 112 to be atomized in a pulsed manner. In still other embodiments, the solution supply system 108 is a tunable solution supply system that combines the ability to continuously and pulsing a solution 112 to be atomized, such that the solution supply system 108 can be adjusted to process requirements. Solution 112 is supplied in a continuous mode or in a pulsed manner.

The solution supply system 108 can supply the desired solution 112 according to user preset requirements. For example, when the submerged ultrasonic atomizing device 100 is used to perform surface coating treatment on a workpiece, the solution 112 to be atomized may be a solution containing a coating material. If the submerged granulation is to be performed by the submerged ultrasonic atomizing device 100, the solution 112 to be atomized may be a solution containing the nanoparticle material. In some embodiments, the solution 112 supplied by the solution supply system 108 can comprise an organic coating solution, an inorganic coating solution, or a solution. Rice coating solution.

A separator 114 is disposed over the conductive medium 104 to isolate the conductive medium 104 from the solution 112 supplied by the solution supply system 108. In a preferred embodiment, the separator 114 is disposed on the trench 102 and encloses the opening of the trench 102 to more effectively isolate the solution 112 supplied by the conductive medium 104 and the solution supply system 108 above the trench 102. The solution 112 is blocked from entering the conductive medium 104 to damage the ultrasonic generator 106 immersed in the conductive medium 104. The material of the separator 114 is preferably selected from materials that are not affected by the conductive medium 104 and the solution 112, such as materials that are not corroded by the conductive medium 104 and the solution 112, to extend the life of the separator 114 and prevent contamination of the solution 112. Medium 104. In some embodiments, the material of the isolation film 114 may comprise a metallic material or an organic material.

In the present embodiment, the conductive medium 104 can transmit the ultrasonic waves 110 generated by the ultrasonic generator 106 to the isolation film 114 on the conductive medium 104. The separator 114 can then transfer the energy of the ultrasonic wave 110 to the solution 112 to be atomized sprayed on the separator 114, and the solution 112 to be atomized by the energy of the ultrasonic wave 110 is miniaturized, fog-foamed or vaporized. Turn into a lot of fog 116. In embodiments where the conductive medium 104 fills the entire storage space 120 of the slot 102, the conductive medium 104 can more efficiently transfer the ultrasonic waves 110 generated by the ultrasonic generator 106 to the isolation film 114, and then through the isolation film 114. It is further conducted to the solution 112 to be atomized.

In the present embodiment, the resonant structure of the ultrasonic energy can be adjusted, such as the distance between the solution 112 to be atomized and the conductive medium 104, the range of the area affected by the conductive medium 104 to the solution 112, and the conductive medium 104. The depth, the size of the ultrasonic generator 106, the volume of the conductive medium 104, etc., cause the energy of the ultrasonic wave 110 to resonate, and a resonance interference pattern and a capillary column are formed on the surface of the solution 112, thereby smoothly atomizing the solution 112 into A mist 116 composed of mist beads and/or steam. Therefore, in the present embodiment, by changing the resonance structure of the ultrasonic energy, the ultrasonic generator 106 composed of a piezoelectric ceramic of a single frequency can be used to atomize the solution 112 of different substances.

It is apparent from the above-described embodiments that one of the advantages of the present invention is that the submerged ultrasonic atomization device of the present invention comprises a conductive medium for transmitting ultrasonic energy. Therefore, by adjusting the resonance structure of the ultrasonic energy, the effect of atomizing a solution of different substances using only a single ultrasonic generator can be achieved. Therefore, the application range of the submersible ultrasonic atomization device can be greatly increased.

According to the above embodiments, another advantage of the present invention is that the submerged ultrasonic atomization device of the present invention comprises a separator, which can be used to isolate the medium to be atomized supplied by the conductive medium and the solution supply system, thereby avoiding The atomized solution is intended to cause damage to the ultrasonic generator disposed in the conductive medium. Therefore, the submerged ultrasonic atomizing device can be applied not only to atomize various solutions, but also to prolong the service life of the ultrasonic generator.

While the present invention has been described above by way of example, it is not intended to be construed as a limitation of the scope of the invention. Therefore, the scope of the invention is defined by the scope of the appended claims.

100‧‧‧Submersible ultrasonic atomizing device

102‧‧‧ slots

104‧‧‧Transmission medium

106‧‧‧Supersonic generator

108‧‧‧Solution supply system

110‧‧‧Supersonic

112‧‧‧solution

114‧‧‧Separator

116‧‧‧ fog

118‧‧‧High frequency generator

120‧‧‧Storage space

Claims (10)

A submersible ultrasonic atomization device comprises: a slot; a conductive medium stored in the slot; an ultrasonic generator disposed in the conductive medium, wherein the ultrasonic generator is adapted to generate a plurality of Ultrasonic wave; a solution supply system adapted to supply a solution above the tank; and a separator disposed on the conductive medium to isolate the conductive medium from the solution, wherein the conductive medium can An acoustic wave is transmitted to the separator to atomize the solution on the separator. The submersible ultrasonic atomization device according to claim 1, wherein the conductive medium has a surface tension coefficient, and the surface tension coefficient is from 18 mN/mm to 475 mN/mm. The submersible ultrasonic atomization device of claim 1, wherein the conductive medium comprises water. The submersible ultrasonic atomization device of claim 1, further comprising a high frequency generator coupled to the ultrasonic generator to cause the ultrasonic generator to generate the ultrasonic waves. The submersible ultrasonic atomization device of claim 4, wherein the high frequency generator has a frequency range of 30 kHz to 7 MHz. The submersible ultrasonic atomization device according to claim 1, wherein the solution supply system is a continuous solution supply system, a pulsed solution supply system, or an adjustable solution supply system, the adjustable solution supply system The solution can be supplied in a continuous manner or in a pulsed manner. The submerged ultrasonic atomization device according to claim 1, wherein the material of the separator comprises a metal material or an organic material. The submersible ultrasonic atomization device of claim 1, wherein the solution supplied by the solution supply system comprises an organic coating solution. The submerged ultrasonic atomization device of claim 1, wherein the solution supplied by the solution supply system comprises an inorganic coating solution. The submerged ultrasonic atomization device of claim 1, wherein the solution supplied by the solution supply system comprises a nano coating solution.