TW201434936A - Dispersing agent for inorganic particles, composition containing the dispersing agent, curable composition, cured product and film - Google Patents
Dispersing agent for inorganic particles, composition containing the dispersing agent, curable composition, cured product and film Download PDFInfo
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- TW201434936A TW201434936A TW102149234A TW102149234A TW201434936A TW 201434936 A TW201434936 A TW 201434936A TW 102149234 A TW102149234 A TW 102149234A TW 102149234 A TW102149234 A TW 102149234A TW 201434936 A TW201434936 A TW 201434936A
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- inorganic particles
- polymer block
- dispersing agent
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- 239000010954 inorganic particle Substances 0.000 title claims abstract description 105
- 239000000203 mixture Substances 0.000 title claims abstract description 82
- 239000002270 dispersing agent Substances 0.000 title claims abstract description 75
- 229920000642 polymer Polymers 0.000 claims abstract description 115
- 125000000524 functional group Chemical group 0.000 claims abstract description 29
- 229920001400 block copolymer Polymers 0.000 claims abstract description 25
- 150000003242 quaternary ammonium salts Chemical group 0.000 claims abstract description 23
- 230000003647 oxidation Effects 0.000 claims abstract description 11
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 11
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims description 29
- 125000000217 alkyl group Chemical group 0.000 claims description 29
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 21
- 125000000623 heterocyclic group Chemical group 0.000 claims description 16
- 239000002612 dispersion medium Substances 0.000 claims description 13
- 125000001302 tertiary amino group Chemical group 0.000 claims description 13
- 125000002947 alkylene group Chemical group 0.000 claims description 9
- 125000003118 aryl group Chemical group 0.000 claims description 9
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 9
- 125000005647 linker group Chemical group 0.000 claims description 4
- 125000001424 substituent group Chemical group 0.000 claims description 4
- 150000001450 anions Chemical class 0.000 claims description 3
- 150000003863 ammonium salts Chemical group 0.000 claims description 2
- 125000001820 oxy group Chemical group [*:1]O[*:2] 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 abstract description 8
- 150000003512 tertiary amines Chemical class 0.000 abstract description 7
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 97
- -1 oxyl group Chemical group 0.000 description 95
- 239000000178 monomer Substances 0.000 description 67
- 229920005989 resin Polymers 0.000 description 26
- 239000011347 resin Substances 0.000 description 26
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 21
- JKNCOURZONDCGV-UHFFFAOYSA-N 2-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound CN(C)CCOC(=O)C(C)=C JKNCOURZONDCGV-UHFFFAOYSA-N 0.000 description 17
- 239000007788 liquid Substances 0.000 description 17
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 17
- 238000006116 polymerization reaction Methods 0.000 description 16
- 239000002904 solvent Substances 0.000 description 16
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 15
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- 239000006185 dispersion Substances 0.000 description 14
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Inorganic materials [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 13
- 239000003505 polymerization initiator Substances 0.000 description 13
- 238000002834 transmittance Methods 0.000 description 13
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 12
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 12
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 12
- 238000000034 method Methods 0.000 description 12
- 150000003254 radicals Chemical class 0.000 description 12
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 11
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 10
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 10
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 10
- 229910000420 cerium oxide Inorganic materials 0.000 description 10
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 9
- 238000004817 gas chromatography Methods 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 9
- 125000004429 atom Chemical group 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 8
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 7
- 229910052744 lithium Inorganic materials 0.000 description 7
- 238000010551 living anionic polymerization reaction Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 7
- 239000001301 oxygen Substances 0.000 description 7
- 229910052760 oxygen Inorganic materials 0.000 description 7
- 239000002798 polar solvent Substances 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- 229920001187 thermosetting polymer Polymers 0.000 description 7
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 7
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000002585 base Substances 0.000 description 6
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 6
- 150000001993 dienes Chemical class 0.000 description 6
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 6
- KPSSIOMAKSHJJG-UHFFFAOYSA-N neopentyl alcohol Chemical compound CC(C)(C)CO KPSSIOMAKSHJJG-UHFFFAOYSA-N 0.000 description 6
- 125000000466 oxiranyl group Chemical group 0.000 description 6
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 6
- 229920002554 vinyl polymer Polymers 0.000 description 6
- 125000006273 (C1-C3) alkyl group Chemical group 0.000 description 5
- JMWGZSWSTCGVLX-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;2-methylprop-2-enoic acid Chemical compound CC(=C)C(O)=O.CC(=C)C(O)=O.CC(=C)C(O)=O.CCC(CO)(CO)CO JMWGZSWSTCGVLX-UHFFFAOYSA-N 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 5
- 241000428199 Mustelinae Species 0.000 description 5
- 238000009826 distribution Methods 0.000 description 5
- 239000002609 medium Substances 0.000 description 5
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 5
- 229910052753 mercury Inorganic materials 0.000 description 5
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 5
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- VZXTWGWHSMCWGA-UHFFFAOYSA-N 1,3,5-triazine-2,4-diamine Chemical compound NC1=NC=NC(N)=N1 VZXTWGWHSMCWGA-UHFFFAOYSA-N 0.000 description 4
- 125000004975 3-butenyl group Chemical group C(CC=C)* 0.000 description 4
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 4
- 150000001335 aliphatic alkanes Chemical class 0.000 description 4
- 238000010539 anionic addition polymerization reaction Methods 0.000 description 4
- PASDCCFISLVPSO-UHFFFAOYSA-N benzoyl chloride Chemical compound ClC(=O)C1=CC=CC=C1 PASDCCFISLVPSO-UHFFFAOYSA-N 0.000 description 4
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 4
- 229940043279 diisopropylamine Drugs 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- 239000003999 initiator Substances 0.000 description 4
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 4
- 239000012454 non-polar solvent Substances 0.000 description 4
- 125000004430 oxygen atom Chemical group O* 0.000 description 4
- 229910052708 sodium Inorganic materials 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- 125000003718 tetrahydrofuranyl group Chemical group 0.000 description 4
- 125000001412 tetrahydropyranyl group Chemical group 0.000 description 4
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 3
- 125000006022 2-methyl-2-propenyl group Chemical group 0.000 description 3
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 229910052783 alkali metal Inorganic materials 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 125000002511 behenyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 238000005227 gel permeation chromatography Methods 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 239000004611 light stabiliser Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 125000004433 nitrogen atom Chemical group N* 0.000 description 3
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 description 3
- 239000005020 polyethylene terephthalate Substances 0.000 description 3
- 230000000379 polymerizing effect Effects 0.000 description 3
- 229910052700 potassium Inorganic materials 0.000 description 3
- 239000011591 potassium Substances 0.000 description 3
- 229920006395 saturated elastomer Polymers 0.000 description 3
- 239000007962 solid dispersion Substances 0.000 description 3
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 3
- 229920005992 thermoplastic resin Polymers 0.000 description 3
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 description 2
- 125000004973 1-butenyl group Chemical group C(=CCC)* 0.000 description 2
- 125000006039 1-hexenyl group Chemical group 0.000 description 2
- 125000006028 1-methyl-2-butenyl group Chemical group 0.000 description 2
- 125000006021 1-methyl-2-propenyl group Chemical group 0.000 description 2
- 125000006023 1-pentenyl group Chemical group 0.000 description 2
- 125000006017 1-propenyl group Chemical group 0.000 description 2
- SDJHPPZKZZWAKF-UHFFFAOYSA-N 2,3-dimethylbuta-1,3-diene Chemical compound CC(=C)C(C)=C SDJHPPZKZZWAKF-UHFFFAOYSA-N 0.000 description 2
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 2
- 125000004974 2-butenyl group Chemical group C(C=CC)* 0.000 description 2
- IQQVCMQJDJSRFU-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.CCC(CO)(CO)CO IQQVCMQJDJSRFU-UHFFFAOYSA-N 0.000 description 2
- 125000006040 2-hexenyl group Chemical group 0.000 description 2
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 2
- 125000006029 2-methyl-2-butenyl group Chemical group 0.000 description 2
- RCJMVGJKROQDCB-UHFFFAOYSA-N 2-methylpenta-1,3-diene Chemical compound CC=CC(C)=C RCJMVGJKROQDCB-UHFFFAOYSA-N 0.000 description 2
- 125000006024 2-pentenyl group Chemical group 0.000 description 2
- 125000006041 3-hexenyl group Chemical group 0.000 description 2
- 125000006042 4-hexenyl group Chemical group 0.000 description 2
- 125000006043 5-hexenyl group Chemical group 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- 125000000882 C2-C6 alkenyl group Chemical group 0.000 description 2
- 125000000041 C6-C10 aryl group Chemical group 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 2
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 2
- 239000005977 Ethylene Substances 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 2
- 150000001339 alkali metal compounds Chemical class 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 2
- OJMOMXZKOWKUTA-UHFFFAOYSA-N aluminum;borate Chemical compound [Al+3].[O-]B([O-])[O-] OJMOMXZKOWKUTA-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O ammonium group Chemical group [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- KCXMKQUNVWSEMD-UHFFFAOYSA-N benzyl chloride Chemical compound ClCC1=CC=CC=C1 KCXMKQUNVWSEMD-UHFFFAOYSA-N 0.000 description 2
- 229940073608 benzyl chloride Drugs 0.000 description 2
- GZUXJHMPEANEGY-UHFFFAOYSA-N bromomethane Chemical compound BrC GZUXJHMPEANEGY-UHFFFAOYSA-N 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- 229910000019 calcium carbonate Inorganic materials 0.000 description 2
- OSGAYBCDTDRGGQ-UHFFFAOYSA-L calcium sulfate Chemical compound [Ca+2].[O-]S([O-])(=O)=O OSGAYBCDTDRGGQ-UHFFFAOYSA-L 0.000 description 2
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 2
- 239000004927 clay Substances 0.000 description 2
- 229910052570 clay Inorganic materials 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- MGNZXYYWBUKAII-UHFFFAOYSA-N cyclohexa-1,3-diene Chemical compound C1CC=CC=C1 MGNZXYYWBUKAII-UHFFFAOYSA-N 0.000 description 2
- SNRUBQQJIBEYMU-UHFFFAOYSA-N dodecane Chemical compound CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000005842 heteroatom Chemical group 0.000 description 2
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- VAMFXQBUQXONLZ-UHFFFAOYSA-N icos-1-ene Chemical compound CCCCCCCCCCCCCCCCCCC=C VAMFXQBUQXONLZ-UHFFFAOYSA-N 0.000 description 2
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 2
- 150000002460 imidazoles Chemical class 0.000 description 2
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 2
- AMXOYNBUYSYVKV-UHFFFAOYSA-M lithium bromide Chemical compound [Li+].[Br-] AMXOYNBUYSYVKV-UHFFFAOYSA-M 0.000 description 2
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 2
- HSZCZNFXUDYRKD-UHFFFAOYSA-M lithium iodide Chemical compound [Li+].[I-] HSZCZNFXUDYRKD-UHFFFAOYSA-M 0.000 description 2
- 238000010550 living polymerization reaction Methods 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- YIXJRHPUWRPCBB-UHFFFAOYSA-N magnesium nitrate Chemical compound [Mg+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O YIXJRHPUWRPCBB-UHFFFAOYSA-N 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910001507 metal halide Inorganic materials 0.000 description 2
- 150000005309 metal halides Chemical class 0.000 description 2
- 150000004702 methyl esters Chemical class 0.000 description 2
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 2
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 125000005187 nonenyl group Chemical group C(=CCCCCCCC)* 0.000 description 2
- 125000004365 octenyl group Chemical group C(=CCCCCCC)* 0.000 description 2
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 150000001451 organic peroxides Chemical class 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- 125000000864 peroxy group Chemical group O(O*)* 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920002098 polyfluorene Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 239000011164 primary particle Substances 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 150000003839 salts Chemical group 0.000 description 2
- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 2
- 125000000446 sulfanediyl group Chemical group *S* 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 125000004434 sulfur atom Chemical group 0.000 description 2
- BGHCVCJVXZWKCC-UHFFFAOYSA-N tetradecane Chemical compound CCCCCCCCCCCCCC BGHCVCJVXZWKCC-UHFFFAOYSA-N 0.000 description 2
- 238000012719 thermal polymerization Methods 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 description 1
- RRKODOZNUZCUBN-CCAGOZQPSA-N (1z,3z)-cycloocta-1,3-diene Chemical compound C1CC\C=C/C=C\C1 RRKODOZNUZCUBN-CCAGOZQPSA-N 0.000 description 1
- NSYRAUUZGRPOHS-BQYQJAHWSA-N (3E)-2-methylocta-1,3-diene Chemical compound CCCC\C=C\C(C)=C NSYRAUUZGRPOHS-BQYQJAHWSA-N 0.000 description 1
- BOGRNZQRTNVZCZ-AATRIKPKSA-N (3e)-3-methylpenta-1,3-diene Chemical compound C\C=C(/C)C=C BOGRNZQRTNVZCZ-AATRIKPKSA-N 0.000 description 1
- AHAREKHAZNPPMI-AATRIKPKSA-N (3e)-hexa-1,3-diene Chemical compound CC\C=C\C=C AHAREKHAZNPPMI-AATRIKPKSA-N 0.000 description 1
- 125000006832 (C1-C10) alkylene group Chemical group 0.000 description 1
- PMJHHCWVYXUKFD-SNAWJCMRSA-N (E)-1,3-pentadiene Chemical compound C\C=C\C=C PMJHHCWVYXUKFD-SNAWJCMRSA-N 0.000 description 1
- GBVSONMCEKNESD-UHFFFAOYSA-N 1,1'-biphenyl;lithium Chemical compound [Li].C1=CC=CC=C1C1=CC=CC=C1 GBVSONMCEKNESD-UHFFFAOYSA-N 0.000 description 1
- BOGRNZQRTNVZCZ-UHFFFAOYSA-N 1,2-dimethyl-butadiene Natural products CC=C(C)C=C BOGRNZQRTNVZCZ-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical compound C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 1
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 1
- ALVZNPYWJMLXKV-UHFFFAOYSA-N 1,9-Nonanediol Chemical compound OCCCCCCCCCO ALVZNPYWJMLXKV-UHFFFAOYSA-N 0.000 description 1
- OEVVKKAVYQFQNV-UHFFFAOYSA-N 1-ethenyl-2,4-dimethylbenzene Chemical compound CC1=CC=C(C=C)C(C)=C1 OEVVKKAVYQFQNV-UHFFFAOYSA-N 0.000 description 1
- RLRINNKRRPQIGW-UHFFFAOYSA-N 1-ethenyl-2-[4-(2-ethenylphenyl)butyl]benzene Chemical compound C=CC1=CC=CC=C1CCCCC1=CC=CC=C1C=C RLRINNKRRPQIGW-UHFFFAOYSA-N 0.000 description 1
- NVZWEEGUWXZOKI-UHFFFAOYSA-N 1-ethenyl-2-methylbenzene Chemical compound CC1=CC=CC=C1C=C NVZWEEGUWXZOKI-UHFFFAOYSA-N 0.000 description 1
- DTNCNFLLRLHPNJ-UHFFFAOYSA-N 1-ethenyl-4-(1-ethoxyethoxy)benzene Chemical compound CCOC(C)OC1=CC=C(C=C)C=C1 DTNCNFLLRLHPNJ-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- PEBXLTUWFWEWGV-UHFFFAOYSA-N 1-methyl-2-(2-phenylethenyl)benzene Chemical compound CC1=CC=CC=C1C=CC1=CC=CC=C1 PEBXLTUWFWEWGV-UHFFFAOYSA-N 0.000 description 1
- BRTFDAKANYMMMA-UHFFFAOYSA-N 1-phenyl-1-propylhydrazine Chemical compound CCCN(N)C1=CC=CC=C1 BRTFDAKANYMMMA-UHFFFAOYSA-N 0.000 description 1
- IGGDKDTUCAWDAN-UHFFFAOYSA-N 1-vinylnaphthalene Chemical compound C1=CC=C2C(C=C)=CC=CC2=C1 IGGDKDTUCAWDAN-UHFFFAOYSA-N 0.000 description 1
- PIZHFBODNLEQBL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1 PIZHFBODNLEQBL-UHFFFAOYSA-N 0.000 description 1
- IJLJDZOLZATUFK-UHFFFAOYSA-N 2,2-dimethylpropyl prop-2-enoate Chemical compound CC(C)(C)COC(=O)C=C IJLJDZOLZATUFK-UHFFFAOYSA-N 0.000 description 1
- ZFFMLCVRJBZUDZ-UHFFFAOYSA-N 2,3-dimethylbutane Chemical group CC(C)C(C)C ZFFMLCVRJBZUDZ-UHFFFAOYSA-N 0.000 description 1
- AZUHIVLOSAPWDM-UHFFFAOYSA-N 2-(1h-imidazol-2-yl)-1h-imidazole Chemical class C1=CNC(C=2NC=CN=2)=N1 AZUHIVLOSAPWDM-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- UHFFVFAKEGKNAQ-UHFFFAOYSA-N 2-benzyl-2-(dimethylamino)-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=CC=C1 UHFFVFAKEGKNAQ-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- XUDBVJCTLZTSDC-UHFFFAOYSA-N 2-ethenylbenzoic acid Chemical compound OC(=O)C1=CC=CC=C1C=C XUDBVJCTLZTSDC-UHFFFAOYSA-N 0.000 description 1
- XUGNJOCQALIQFG-UHFFFAOYSA-N 2-ethenylquinoline Chemical compound C1=CC=CC2=NC(C=C)=CC=C21 XUGNJOCQALIQFG-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- 125000004493 2-methylbut-1-yl group Chemical group CC(C*)CC 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 1
- ORNUPNRNNSVZTC-UHFFFAOYSA-N 2-vinylthiophene Chemical compound C=CC1=CC=CS1 ORNUPNRNNSVZTC-UHFFFAOYSA-N 0.000 description 1
- FRIBMENBGGCKPD-UHFFFAOYSA-N 3-(2,3-dimethoxyphenyl)prop-2-enal Chemical compound COC1=CC=CC(C=CC=O)=C1OC FRIBMENBGGCKPD-UHFFFAOYSA-N 0.000 description 1
- YNJSNEKCXVFDKW-UHFFFAOYSA-N 3-(5-amino-1h-indol-3-yl)-2-azaniumylpropanoate Chemical compound C1=C(N)C=C2C(CC(N)C(O)=O)=CNC2=C1 YNJSNEKCXVFDKW-UHFFFAOYSA-N 0.000 description 1
- BOJMHHBWYPDQQH-UHFFFAOYSA-N 3-ethenylthiophene Chemical compound C=CC=1C=CSC=1 BOJMHHBWYPDQQH-UHFFFAOYSA-N 0.000 description 1
- 125000006032 3-methyl-3-butenyl group Chemical group 0.000 description 1
- OXUKGAGPJSQCDS-UHFFFAOYSA-N 3-methylbut-2-enyl prop-2-enoate Chemical compound CC(C)=CCOC(=O)C=C OXUKGAGPJSQCDS-UHFFFAOYSA-N 0.000 description 1
- WHMAUXBUBOMQMS-UHFFFAOYSA-N 3-methylbut-3-enyl prop-2-enoate Chemical compound CC(=C)CCOC(=O)C=C WHMAUXBUBOMQMS-UHFFFAOYSA-N 0.000 description 1
- IGLWCQMNTGCUBB-UHFFFAOYSA-N 3-methylidenepent-1-ene Chemical compound CCC(=C)C=C IGLWCQMNTGCUBB-UHFFFAOYSA-N 0.000 description 1
- JJZNCUHIYJBAMS-UHFFFAOYSA-N 3-phenyl-2h-1,2-oxazol-5-one Chemical compound N1OC(=O)C=C1C1=CC=CC=C1 JJZNCUHIYJBAMS-UHFFFAOYSA-N 0.000 description 1
- OCTVDLUSQOJZEK-UHFFFAOYSA-N 4,5-diethylocta-1,3-diene Chemical compound CCCC(CC)C(CC)=CC=C OCTVDLUSQOJZEK-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- OBWFOWLCVBNCRD-UHFFFAOYSA-N 4-[4-ethyl-5-(4-methylphenyl)-3-(trifluoromethyl)pyrazol-1-yl]benzenesulfonamide Chemical compound CCC=1C(C(F)(F)F)=NN(C=2C=CC(=CC=2)S(N)(=O)=O)C=1C1=CC=C(C)C=C1 OBWFOWLCVBNCRD-UHFFFAOYSA-N 0.000 description 1
- YKVAWSVTEWXJGJ-UHFFFAOYSA-N 4-chloro-2-methylsulfanylthieno[3,2-d]pyrimidine Chemical compound CSC1=NC(Cl)=C2SC=CC2=N1 YKVAWSVTEWXJGJ-UHFFFAOYSA-N 0.000 description 1
- KFDVPJUYSDEJTH-UHFFFAOYSA-N 4-ethenylpyridine Chemical compound C=CC1=CC=NC=C1 KFDVPJUYSDEJTH-UHFFFAOYSA-N 0.000 description 1
- DZGGGLJOCYPKHN-UHFFFAOYSA-N 4-ethenylquinoline Chemical compound C1=CC=C2C(C=C)=CC=NC2=C1 DZGGGLJOCYPKHN-UHFFFAOYSA-N 0.000 description 1
- UGWOAPBVIGCNOV-UHFFFAOYSA-N 5-ethenyldec-5-ene Chemical compound CCCCC=C(C=C)CCCC UGWOAPBVIGCNOV-UHFFFAOYSA-N 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 101710141544 Allatotropin-related peptide Proteins 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- QIVIGWJTDRZEBG-UHFFFAOYSA-N C(CCCCCCC)N(CCCCCCCCCC)CCCCCCCC.[Li] Chemical compound C(CCCCCCC)N(CCCCCCCCCC)CCCCCCCC.[Li] QIVIGWJTDRZEBG-UHFFFAOYSA-N 0.000 description 1
- GPMHQOUFOKZDFY-UHFFFAOYSA-N C=CC1=CC=CC=C1.C1(=CC=CC=C1)C1=CC=C(C=C1)C1=CC=CC=C1 Chemical compound C=CC1=CC=CC=C1.C1(=CC=CC=C1)C1=CC=C(C=C1)C1=CC=CC=C1 GPMHQOUFOKZDFY-UHFFFAOYSA-N 0.000 description 1
- NTZRDKVFLPLTPU-UHFFFAOYSA-N CC[Na] Chemical compound CC[Na] NTZRDKVFLPLTPU-UHFFFAOYSA-N 0.000 description 1
- LOZYPXZJZSTREJ-UHFFFAOYSA-N CN(CCCCCCCCCC)C.[Li] Chemical compound CN(CCCCCCCCCC)C.[Li] LOZYPXZJZSTREJ-UHFFFAOYSA-N 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- 229910020366 ClO 4 Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 1
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 1
- 239000005909 Kieselgur Substances 0.000 description 1
- 229920000106 Liquid crystal polymer Polymers 0.000 description 1
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 101150113738 PCS60 gene Proteins 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 229930182556 Polyacetal Natural products 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- 239000004113 Sepiolite Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- FMRLDPWIRHBCCC-UHFFFAOYSA-L Zinc carbonate Chemical compound [Zn+2].[O-]C([O-])=O FMRLDPWIRHBCCC-UHFFFAOYSA-L 0.000 description 1
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 1
- FKTNMXBKLGHVFM-UHFFFAOYSA-M [Br-].COC[N+](C)(C)CCC.C=CC Chemical compound [Br-].COC[N+](C)(C)CCC.C=CC FKTNMXBKLGHVFM-UHFFFAOYSA-M 0.000 description 1
- UNSWNGMPCLNEJD-UHFFFAOYSA-M [Br-].O1C(C1)C[N+](C)(C)CC.C=CC Chemical compound [Br-].O1C(C1)C[N+](C)(C)CC.C=CC UNSWNGMPCLNEJD-UHFFFAOYSA-M 0.000 description 1
- MZVQCMJNVPIDEA-UHFFFAOYSA-N [CH2]CN(CC)CC Chemical group [CH2]CN(CC)CC MZVQCMJNVPIDEA-UHFFFAOYSA-N 0.000 description 1
- NYPDAGRRMPQQPT-UHFFFAOYSA-M [Cl-].COC[N+](C)(C)CCC.C=CC Chemical compound [Cl-].COC[N+](C)(C)CCC.C=CC NYPDAGRRMPQQPT-UHFFFAOYSA-M 0.000 description 1
- PAYYGHIBOOREAA-UHFFFAOYSA-M [Cl-].COC[N+](C)(C)CCCC.C=CC Chemical compound [Cl-].COC[N+](C)(C)CCCC.C=CC PAYYGHIBOOREAA-UHFFFAOYSA-M 0.000 description 1
- CGVDYRPQHQABGC-UHFFFAOYSA-M [F-].COC[N+](C)(C)CCCC.C=CC Chemical compound [F-].COC[N+](C)(C)CCCC.C=CC CGVDYRPQHQABGC-UHFFFAOYSA-M 0.000 description 1
- ILUOYSZZDONLAE-UHFFFAOYSA-M [I-].O1C(C1)C[N+](C)(C)CC.C=CC Chemical compound [I-].O1C(C1)C[N+](C)(C)CC.C=CC ILUOYSZZDONLAE-UHFFFAOYSA-M 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 229920006243 acrylic copolymer Polymers 0.000 description 1
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 150000008051 alkyl sulfates Chemical class 0.000 description 1
- 229940100198 alkylating agent Drugs 0.000 description 1
- 239000002168 alkylating agent Substances 0.000 description 1
- 125000005529 alkyleneoxy group Chemical group 0.000 description 1
- 125000000746 allylic group Chemical group 0.000 description 1
- 150000004645 aluminates Chemical class 0.000 description 1
- 229910001586 aluminite Inorganic materials 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- VCNTUJWBXWAWEJ-UHFFFAOYSA-J aluminum;sodium;dicarbonate Chemical compound [Na+].[Al+3].[O-]C([O-])=O.[O-]C([O-])=O VCNTUJWBXWAWEJ-UHFFFAOYSA-J 0.000 description 1
- 229910052586 apatite Inorganic materials 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 238000010560 atom transfer radical polymerization reaction Methods 0.000 description 1
- 150000001540 azides Chemical class 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- WDIHJSXYQDMJHN-UHFFFAOYSA-L barium chloride Chemical compound [Cl-].[Cl-].[Ba+2] WDIHJSXYQDMJHN-UHFFFAOYSA-L 0.000 description 1
- 229910001626 barium chloride Inorganic materials 0.000 description 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- AYJRCSIUFZENHW-DEQYMQKBSA-L barium(2+);oxomethanediolate Chemical compound [Ba+2].[O-][14C]([O-])=O AYJRCSIUFZENHW-DEQYMQKBSA-L 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 239000000440 bentonite Substances 0.000 description 1
- 229910000278 bentonite Inorganic materials 0.000 description 1
- SVPXDRXYRYOSEX-UHFFFAOYSA-N bentoquatam Chemical compound O.O=[Si]=O.O=[Al]O[Al]=O SVPXDRXYRYOSEX-UHFFFAOYSA-N 0.000 description 1
- UHOVQNZJYSORNB-UHFFFAOYSA-N benzene Substances C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- AGEZXYOZHKGVCM-UHFFFAOYSA-N benzyl bromide Chemical compound BrCC1=CC=CC=C1 AGEZXYOZHKGVCM-UHFFFAOYSA-N 0.000 description 1
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 150000001642 boronic acid derivatives Chemical class 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 238000012662 bulk polymerization Methods 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- UPIWXMRIPODGLE-UHFFFAOYSA-N butyl benzenecarboperoxoate Chemical group CCCCOOC(=O)C1=CC=CC=C1 UPIWXMRIPODGLE-UHFFFAOYSA-N 0.000 description 1
- FNAQSUUGMSOBHW-UHFFFAOYSA-H calcium citrate Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O.[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O FNAQSUUGMSOBHW-UHFFFAOYSA-H 0.000 description 1
- 239000001354 calcium citrate Substances 0.000 description 1
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 1
- 239000000292 calcium oxide Substances 0.000 description 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- 239000001506 calcium phosphate Substances 0.000 description 1
- AOWKSNWVBZGMTJ-UHFFFAOYSA-N calcium titanate Chemical compound [Ca+2].[O-][Ti]([O-])=O AOWKSNWVBZGMTJ-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- NEHMKBQYUWJMIP-NJFSPNSNSA-N chloro(114C)methane Chemical compound [14CH3]Cl NEHMKBQYUWJMIP-NJFSPNSNSA-N 0.000 description 1
- HRYZWHHZPQKTII-UHFFFAOYSA-N chloroethane Chemical compound CCCl HRYZWHHZPQKTII-UHFFFAOYSA-N 0.000 description 1
- YACLQRRMGMJLJV-UHFFFAOYSA-N chloroprene Chemical compound ClC(=C)C=C YACLQRRMGMJLJV-UHFFFAOYSA-N 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- HGCIXCUEYOPUTN-UHFFFAOYSA-N cis-cyclohexene Natural products C1CCC=CC1 HGCIXCUEYOPUTN-UHFFFAOYSA-N 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- SPTHWAJJMLCAQF-UHFFFAOYSA-M ctk4f8481 Chemical compound [O-]O.CC(C)C1=CC=CC=C1C(C)C SPTHWAJJMLCAQF-UHFFFAOYSA-M 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- ZSWFCLXCOIISFI-UHFFFAOYSA-N cyclopentadiene Chemical compound C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 1
- 229910001647 dawsonite Inorganic materials 0.000 description 1
- DIOQZVSQGTUSAI-NJFSPNSNSA-N decane Chemical compound CCCCCCCCC[14CH3] DIOQZVSQGTUSAI-NJFSPNSNSA-N 0.000 description 1
- GUJOJGAPFQRJSV-UHFFFAOYSA-N dialuminum;dioxosilane;oxygen(2-);hydrate Chemical compound O.[O-2].[O-2].[O-2].[Al+3].[Al+3].O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O GUJOJGAPFQRJSV-UHFFFAOYSA-N 0.000 description 1
- GDVKFRBCXAPAQJ-UHFFFAOYSA-A dialuminum;hexamagnesium;carbonate;hexadecahydroxide Chemical compound [OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Al+3].[Al+3].[O-]C([O-])=O GDVKFRBCXAPAQJ-UHFFFAOYSA-A 0.000 description 1
- 125000004177 diethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- DENRZWYUOJLTMF-UHFFFAOYSA-N diethyl sulfate Chemical compound CCOS(=O)(=O)OCC DENRZWYUOJLTMF-UHFFFAOYSA-N 0.000 description 1
- 229940008406 diethyl sulfate Drugs 0.000 description 1
- HQWPLXHWEZZGKY-UHFFFAOYSA-N diethylzinc Chemical compound CC[Zn]CC HQWPLXHWEZZGKY-UHFFFAOYSA-N 0.000 description 1
- VAYGXNSJCAHWJZ-UHFFFAOYSA-N dimethyl sulfate Chemical compound COS(=O)(=O)OC VAYGXNSJCAHWJZ-UHFFFAOYSA-N 0.000 description 1
- 125000002474 dimethylaminoethoxy group Chemical group [H]C([H])([H])N(C([H])([H])[H])C([H])([H])C([H])([H])O* 0.000 description 1
- NJLLQSBAHIKGKF-UHFFFAOYSA-N dipotassium dioxido(oxo)titanium Chemical compound [K+].[K+].[O-][Ti]([O-])=O NJLLQSBAHIKGKF-UHFFFAOYSA-N 0.000 description 1
- JYCKNDWZDXGNBW-UHFFFAOYSA-N dipropyl sulfate Chemical compound CCCOS(=O)(=O)OCCC JYCKNDWZDXGNBW-UHFFFAOYSA-N 0.000 description 1
- BIAWWFZNZAIXRF-UHFFFAOYSA-N ditert-butyl 1-benzoylcyclohexa-3,5-diene-1,3-dicarboperoxoate Chemical compound C1C(C(=O)OOC(C)(C)C)=CC=CC1(C(=O)OOC(C)(C)C)C(=O)C1=CC=CC=C1 BIAWWFZNZAIXRF-UHFFFAOYSA-N 0.000 description 1
- POULHZVOKOAJMA-UHFFFAOYSA-M dodecanoate Chemical compound CCCCCCCCCCCC([O-])=O POULHZVOKOAJMA-UHFFFAOYSA-M 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- JJVJPJWQXDQCEI-UHFFFAOYSA-N ethenylhydrazine Chemical compound NNC=C JJVJPJWQXDQCEI-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- ZWCRLFIZIYVXMG-UHFFFAOYSA-N ethyl 2-acetyloxyacetate Chemical compound CCOC(=O)COC(C)=O ZWCRLFIZIYVXMG-UHFFFAOYSA-N 0.000 description 1
- 229960003750 ethyl chloride Drugs 0.000 description 1
- WHRIKZCFRVTHJH-UHFFFAOYSA-N ethylhydrazine Chemical compound CCNN WHRIKZCFRVTHJH-UHFFFAOYSA-N 0.000 description 1
- 125000000219 ethylidene group Chemical group [H]C(=[*])C([H])([H])[H] 0.000 description 1
- BLHLJVCOVBYQQS-UHFFFAOYSA-N ethyllithium Chemical compound [Li]CC BLHLJVCOVBYQQS-UHFFFAOYSA-N 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000003682 fluorination reaction Methods 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 239000010440 gypsum Substances 0.000 description 1
- 229910052602 gypsum Inorganic materials 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 125000001072 heteroaryl group Chemical group 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- LNMQRPPRQDGUDR-UHFFFAOYSA-N hexyl prop-2-enoate Chemical compound CCCCCCOC(=O)C=C LNMQRPPRQDGUDR-UHFFFAOYSA-N 0.000 description 1
- 125000003707 hexyloxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 229910001701 hydrotalcite Inorganic materials 0.000 description 1
- 229960001545 hydrotalcite Drugs 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229940079865 intestinal antiinfectives imidazole derivative Drugs 0.000 description 1
- INQOMBQAUSQDDS-UHFFFAOYSA-N iodomethane Chemical compound IC INQOMBQAUSQDDS-UHFFFAOYSA-N 0.000 description 1
- XJTQJERLRPWUGL-UHFFFAOYSA-N iodomethylbenzene Chemical compound ICC1=CC=CC=C1 XJTQJERLRPWUGL-UHFFFAOYSA-N 0.000 description 1
- 239000002563 ionic surfactant Substances 0.000 description 1
- GJRQTCIYDGXPES-UHFFFAOYSA-N iso-butyl acetate Natural products CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 description 1
- FGKJLKRYENPLQH-UHFFFAOYSA-M isocaproate Chemical compound CC(C)CCC([O-])=O FGKJLKRYENPLQH-UHFFFAOYSA-M 0.000 description 1
- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 229940070765 laurate Drugs 0.000 description 1
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 description 1
- 229910052451 lead zirconate titanate Inorganic materials 0.000 description 1
- 238000004811 liquid chromatography Methods 0.000 description 1
- URMHJZVLKKDTOJ-UHFFFAOYSA-N lithium;(3-methyl-1-phenylpentyl)benzene Chemical compound [Li+].C=1C=CC=CC=1[C-](CC(C)CC)C1=CC=CC=C1 URMHJZVLKKDTOJ-UHFFFAOYSA-N 0.000 description 1
- UUQLCJCZFWUWHH-UHFFFAOYSA-N lithium;1-phenylhexylbenzene Chemical compound [Li+].C=1C=CC=CC=1[C-](CCCCC)C1=CC=CC=C1 UUQLCJCZFWUWHH-UHFFFAOYSA-N 0.000 description 1
- UBJFKNSINUCEAL-UHFFFAOYSA-N lithium;2-methylpropane Chemical compound [Li+].C[C-](C)C UBJFKNSINUCEAL-UHFFFAOYSA-N 0.000 description 1
- WGOPGODQLGJZGL-UHFFFAOYSA-N lithium;butane Chemical compound [Li+].CC[CH-]C WGOPGODQLGJZGL-UHFFFAOYSA-N 0.000 description 1
- NVMMPHVQFFIBOS-UHFFFAOYSA-N lithium;dibutylazanide Chemical compound [Li+].CCCC[N-]CCCC NVMMPHVQFFIBOS-UHFFFAOYSA-N 0.000 description 1
- QLEXLQBDIFPTQE-UHFFFAOYSA-N lithium;diheptylazanide Chemical compound [Li+].CCCCCCC[N-]CCCCCCC QLEXLQBDIFPTQE-UHFFFAOYSA-N 0.000 description 1
- OWYFNXMEEFAXTO-UHFFFAOYSA-N lithium;dipropylazanide Chemical compound [Li+].CCC[N-]CCC OWYFNXMEEFAXTO-UHFFFAOYSA-N 0.000 description 1
- VHZUDFGDYYYCGI-UHFFFAOYSA-N lithium;hexylazanide Chemical compound [Li+].CCCCCC[NH-] VHZUDFGDYYYCGI-UHFFFAOYSA-N 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- KJJBSBKRXUVBMX-UHFFFAOYSA-N magnesium;butane Chemical compound [Mg+2].CCC[CH2-].CCC[CH2-] KJJBSBKRXUVBMX-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 229910000000 metal hydroxide Inorganic materials 0.000 description 1
- 150000004692 metal hydroxides Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910001463 metal phosphate Inorganic materials 0.000 description 1
- 229910052976 metal sulfide Inorganic materials 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 229940102396 methyl bromide Drugs 0.000 description 1
- UNASZPQZIFZUSI-UHFFFAOYSA-N methylidyneniobium Chemical compound [Nb]#C UNASZPQZIFZUSI-UHFFFAOYSA-N 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 229910052901 montmorillonite Inorganic materials 0.000 description 1
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 1
- DIOQZVSQGTUSAI-UHFFFAOYSA-N n-butylhexane Natural products CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 1
- PZUGJLOCXUNFLM-UHFFFAOYSA-N n-ethenylaniline Chemical compound C=CNC1=CC=CC=C1 PZUGJLOCXUNFLM-UHFFFAOYSA-N 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 125000003566 oxetanyl group Chemical group 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- CFJYNSNXFXLKNS-UHFFFAOYSA-N p-menthane Chemical compound CC(C)C1CCC(C)CC1 CFJYNSNXFXLKNS-UHFFFAOYSA-N 0.000 description 1
- VSIIXMUUUJUKCM-UHFFFAOYSA-D pentacalcium;fluoride;triphosphate Chemical compound [F-].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O VSIIXMUUUJUKCM-UHFFFAOYSA-D 0.000 description 1
- 125000002958 pentadecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 238000006552 photochemical reaction Methods 0.000 description 1
- 125000003386 piperidinyl group Chemical group 0.000 description 1
- PMJHHCWVYXUKFD-UHFFFAOYSA-N piperylene Natural products CC=CC=C PMJHHCWVYXUKFD-UHFFFAOYSA-N 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920001955 polyphenylene ether Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 235000019422 polyvinyl alcohol Nutrition 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- ZYBHSWXEWOPHBJ-UHFFFAOYSA-N potassium;propan-2-ylbenzene Chemical compound [K+].C[C-](C)C1=CC=CC=C1 ZYBHSWXEWOPHBJ-UHFFFAOYSA-N 0.000 description 1
- 125000001844 prenyl group Chemical group [H]C([*])([H])C([H])=C(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- QTECDUFMBMSHKR-UHFFFAOYSA-N prop-2-enyl prop-2-enoate Chemical compound C=CCOC(=O)C=C QTECDUFMBMSHKR-UHFFFAOYSA-N 0.000 description 1
- 229940090181 propyl acetate Drugs 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 238000005956 quaternization reaction Methods 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 1
- 125000003548 sec-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229910052624 sepiolite Inorganic materials 0.000 description 1
- 235000019355 sepiolite Nutrition 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 229910021653 sulphate ion Inorganic materials 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 1
- GJBRNHKUVLOCEB-UHFFFAOYSA-N tert-butyl benzenecarboperoxoate Chemical compound CC(C)(C)OOC(=O)C1=CC=CC=C1 GJBRNHKUVLOCEB-UHFFFAOYSA-N 0.000 description 1
- CIHOLLKRGTVIJN-UHFFFAOYSA-N tert‐butyl hydroperoxide Chemical compound CC(C)(C)OO CIHOLLKRGTVIJN-UHFFFAOYSA-N 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 229920006259 thermoplastic polyimide Polymers 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- QORWJWZARLRLPR-UHFFFAOYSA-H tricalcium bis(phosphate) Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O QORWJWZARLRLPR-UHFFFAOYSA-H 0.000 description 1
- 235000013337 tricalcium citrate Nutrition 0.000 description 1
- 229940078499 tricalcium phosphate Drugs 0.000 description 1
- 229910000391 tricalcium phosphate Inorganic materials 0.000 description 1
- 235000019731 tricalcium phosphate Nutrition 0.000 description 1
- VOITXYVAKOUIBA-UHFFFAOYSA-N triethylaluminium Chemical compound CC[Al](CC)CC VOITXYVAKOUIBA-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- RIUWBIIVUYSTCN-UHFFFAOYSA-N trilithium borate Chemical compound [Li+].[Li+].[Li+].[O-]B([O-])[O-] RIUWBIIVUYSTCN-UHFFFAOYSA-N 0.000 description 1
- FZGFBJMPSHGTRQ-UHFFFAOYSA-M trimethyl(2-prop-2-enoyloxyethyl)azanium;chloride Chemical compound [Cl-].C[N+](C)(C)CCOC(=O)C=C FZGFBJMPSHGTRQ-UHFFFAOYSA-M 0.000 description 1
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- BIKXLKXABVUSMH-UHFFFAOYSA-N trizinc;diborate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]B([O-])[O-].[O-]B([O-])[O-] BIKXLKXABVUSMH-UHFFFAOYSA-N 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000011667 zinc carbonate Substances 0.000 description 1
- 235000004416 zinc carbonate Nutrition 0.000 description 1
- 229910000010 zinc carbonate Inorganic materials 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
- C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
- C08F297/026—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type polymerising acrylic acid, methacrylic acid or derivatives thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
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- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Graft Or Block Polymers (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Emulsifying, Dispersing, Foam-Producing Or Wetting Agents (AREA)
Abstract
本發明提供一種無機粒子用分散劑,由含有聚合物嵌段(a)及聚合物嵌段(b)之嵌段共聚物構成,其中,聚合物嵌段(a)含有選自由具有三級胺基的重複單位及具有四級銨鹽結構的重複單位組成之群中至少1種重複單位,聚合物嵌段(b)含有選自由具有交聯性官能基的重複單位及具有具備捕捉自由基之功能之結構的重複單位組成之群中至少1種重複單位,上述自由基係利用光之氧化所產生。The present invention provides a dispersing agent for inorganic particles, which is composed of a block copolymer containing a polymer block (a) and a polymer block (b), wherein the polymer block (a) contains a compound selected from the group consisting of tertiary amines At least one repeating unit of the repeating unit of the group and the repeating unit having the quaternary ammonium salt structure, the polymer block (b) containing a repeating unit selected from the group consisting of having a crosslinkable functional group and having a trapping radical At least one repeating unit of the repeating unit composition of the functional structure is formed by oxidation of light.
Description
本發明係關於一種可使無機粒子均勻地分散於溶劑或樹脂等中之無機粒子用分散劑、或含有該分散劑與無機粒子之組成物。進而,本發明係關於一種含有該無機粒子用分散劑與硬化性成分之硬化性組成物、使該硬化性組成物硬化而成之硬化物及使該硬化性組成物硬化而成之薄膜。 The present invention relates to a dispersing agent for inorganic particles which can uniformly disperse inorganic particles in a solvent or a resin, or a composition containing the dispersing agent and inorganic particles. Furthermore, the present invention relates to a curable composition containing the dispersant for inorganic particles and a curable component, a cured product obtained by curing the curable composition, and a film obtained by curing the curable composition.
本案係基於2013年1月11日於日本提出申請之日本特願2013-004098號及2013年1月18日於日本提出申請之日本特願2013-006985號而主張優先權,並將其內容引用於此。 The priority is claimed based on Japanese Patent Application No. 2013-004098 filed on January 11, 2013 in Japan, and Japanese Patent Application No. 2013-006985 filed on January 18, 2013 in Japan. herein.
藉由使無機粒子均勻地分散於介質中,可改變各種材料之特性。例如,可使氧化鋯分散於透明樹脂中而藉此改變該透明樹脂之折射率。無機粒子容易凝聚,一般對溶劑或樹脂等介質之分散性低。因此,為了使無機粒子分散於溶劑或樹脂等中,使用分散劑。 The properties of various materials can be changed by uniformly dispersing the inorganic particles in the medium. For example, zirconia may be dispersed in a transparent resin to thereby change the refractive index of the transparent resin. The inorganic particles are easily aggregated, and generally have low dispersibility in a medium such as a solvent or a resin. Therefore, in order to disperse inorganic particles in a solvent, a resin, etc., a dispersing agent is used.
作為此種分散劑,有離子性或非離子性之界面活性劑系分散劑,或聚乙烯醇類、聚丙烯酸、丙烯酸共聚物等聚合物系分散劑,或十八 醯胺、伸乙基雙醯胺等醯胺系分散劑等。專利文獻1中,提出由具有原子移動聚合(ATRP)之聚合起始劑碎片(fragment)且具有極性不同之2種嵌段之嵌段聚合物構成的聚合物系分散劑。 As such a dispersing agent, there are ionic or nonionic surfactant-based dispersing agents, or polymer-based dispersing agents such as polyvinyl alcohols, polyacrylic acid, and acrylic copolymers, or eighteen A guanamine-based dispersing agent such as guanamine or ethylbisguanamine. Patent Document 1 proposes a polymer-based dispersant comprising a block polymer having atomic mobile polymerization (ATRP) polymerization initiator fragments and having two types of blocks having different polarities.
[專利文獻1]日本特表2002-534542號公報 [Patent Document 1] Japanese Patent Publication No. 2002-534542
分散劑一般而言分子量小,故而若為了使無機粒子分散而大量使用分散劑,則會有降低由高分子化合物構成之材料、例如樹脂等之硬度的情形。 Since the dispersing agent generally has a small molecular weight, if a dispersing agent is used in a large amount in order to disperse the inorganic particles, the hardness of a material composed of a polymer compound, for example, a resin or the like may be lowered.
又,含有分散於樹脂中之無機粒子而成的樹脂材料要求耐候性、尤其是不易於因UV等光而黃變等特性。除添加用以使無機粒子分散之分散劑以外,添加受阻胺系光穩定劑等,藉此可實現無機粒子之均勻分散及提高耐光性。然而,若大量添加分散劑及光穩定劑,則有產生樹脂材料之機械強度降低等弊病之傾向,故而即便要求高耐光性,亦不可將該等大量添加於樹脂中。 Further, the resin material containing the inorganic particles dispersed in the resin is required to have weather resistance, and in particular, it is not easily yellowed by light such as UV. In addition to the dispersing agent for dispersing the inorganic particles, a hindered amine-based light stabilizer or the like is added, whereby uniform dispersion of the inorganic particles and improvement of light resistance can be achieved. However, when a large amount of a dispersing agent and a light stabilizer are added, there is a tendency that the mechanical strength of the resin material is lowered, and even if high light resistance is required, such a large amount cannot be added to the resin.
本發明之課題在於提供一種可使無機粒子均勻地分散於溶劑或樹脂等,可提高含有被分散之無機粒子的組成物或其硬化物之特性(可提高含有被分散之無機粒子而成之組成物的耐光性,不降低含有被分散之無機粒子的樹脂硬化物等之硬度等)的無機粒子用分散劑、及含有該分散劑與無機粒子之組成物。進而,本發明之課題在於提供一種含有該無機粒子用分散劑與硬化性成分的硬化性組成物、使該硬化性組成物硬化而成之硬化物及使該硬化性組成物硬化而成之薄膜。 An object of the present invention is to provide a composition which can uniformly disperse inorganic particles in a solvent or a resin, and can improve the composition of the composition containing the dispersed inorganic particles or the cured product thereof (the composition containing the dispersed inorganic particles can be improved) The dispersing agent for inorganic particles and the composition containing the dispersing agent and the inorganic particles are not required to reduce the light resistance of the material, such as the hardness of the resin cured product containing the dispersed inorganic particles. Further, an object of the present invention is to provide a curable composition containing a dispersant for an inorganic particle and a curable component, a cured product obtained by curing the curable composition, and a film obtained by curing the curable composition. .
本發明者等人為解決上述課題而進行了潛心研究,結果發 現:含有聚合物嵌段(a)及聚合物嵌段(b)之嵌段共聚物作為無機粒子用分散劑具有優異之特性,其中,聚合物嵌段(a)含有選自由具有三級胺基的重複單位及具有四級銨鹽結構的重複單位組成之群中至少1種重複單位,聚合物嵌段(b)含有選自由具有交聯性官能基的重複單位及具有具備捕捉自由基之功能之結構的重複單位組成之群中至少1種重複單位,且,上述自由基係利用光之氧化所產生,從而完成本發明。 The inventors of the present invention conducted intensive studies to solve the above problems, and the results were Now, the block copolymer containing the polymer block (a) and the polymer block (b) has excellent characteristics as a dispersing agent for inorganic particles, wherein the polymer block (a) contains a compound selected from the group consisting of tertiary amines At least one repeating unit of the repeating unit of the group and the repeating unit having the quaternary ammonium salt structure, the polymer block (b) containing a repeating unit selected from the group consisting of having a crosslinkable functional group and having a trapping radical The present invention is completed by at least one repeating unit of the repeating unit composition of the structure of the function, and the radical is generated by oxidation of light.
即,本發明包含以下形態。 That is, the present invention includes the following aspects.
[1]一種無機粒子用分散劑,由含有聚合物嵌段(a)及聚合物嵌段(b)之嵌段共聚物構成,其中,聚合物嵌段(a)含有選自由具有三級胺基的重複單位及具有四級銨鹽結構的重複單位組成之群中至少1種重複單位,聚合物嵌段(b)含有選自由具有交聯性官能基的重複單位及具有具備捕捉自由基之功能之結構的重複單位組成之群中至少1種重複單位,上述自由基係利用光之氧化所產生。 [1] A dispersing agent for inorganic particles, comprising a block copolymer comprising a polymer block (a) and a polymer block (b), wherein the polymer block (a) contains a compound selected from the group consisting of tertiary amines At least one repeating unit of the repeating unit of the group and the repeating unit having the quaternary ammonium salt structure, the polymer block (b) containing a repeating unit selected from the group consisting of having a crosslinkable functional group and having a trapping radical At least one repeating unit of the repeating unit composition of the functional structure is formed by oxidation of light.
[2]如[1]之無機粒子用分散劑,其中,具有交聯性官能基之重複單位為式(I)表示之重複單位。 [2] The dispersing agent for inorganic particles according to [1], wherein the repeating unit having a crosslinkable functional group is a repeating unit represented by the formula (I).
(式(I)中,R1表示氫原子或C1~C3烷基,R2及R3分別獨立地表示氫原子或C1~C6烷基,Q表示亦可具有烷基作為取代基之含氧飽和雜環基、 或C2~C20烯基,n1表示CR2R3之重複數且為0~6之任一整數) (In the formula (I), R 1 represents a hydrogen atom or a C1 to C3 alkyl group, and R 2 and R 3 each independently represent a hydrogen atom or a C1 to C6 alkyl group, and Q represents an oxygen group which may have an alkyl group as a substituent. a saturated heterocyclic group, or a C2~C20 alkenyl group, n1 represents a repeating number of CR 2 R 3 and is an integer of 0 to 6)
[3]如[1]之無機粒子用分散劑,其中,具有具備捕捉自由基之功能之結構的重複單位為式(I')表示之重複單位,其中,上述自由基係利用光之氧化所產生。 [3] The dispersing agent for inorganic particles according to [1], wherein the repeating unit having a structure having a function of capturing a radical is a repeating unit represented by the formula (I'), wherein the radical is oxidized by light. produce.
(式(I')中,R0表示氫原子或C1~C3烷基,P1、P2、P3及P4分別獨立地表示C1~C6之烷基,P1、P2、P3及P4之C1~C6之烷基亦可互相鍵結而形成環,X表示二價連結基,Y表示氫原子、氧基(oxyl group)或C1~C6之烷基,n2表示0或1,r表示C1~C3烷基,m表示0或1) (In the formula (I'), R 0 represents a hydrogen atom or a C1 to C3 alkyl group, and P 1 , P 2 , P 3 and P 4 each independently represent a C1 to C6 alkyl group, P 1 , P 2 , P 3 And the alkyl groups of C1 to C6 of P 4 may be bonded to each other to form a ring, X represents a divalent linking group, Y represents a hydrogen atom, an oxyl group or an alkyl group of C1 to C6, and n2 represents 0 or 1 , r represents C1~C3 alkyl, m represents 0 or 1)
[4]如[1]之無機粒子用分散劑,由含有聚合物嵌段(a)及聚合物嵌段(b)之嵌段共聚物構成,其中,聚合物嵌段(a)含有具有四級銨鹽結構之重複單位,聚合物嵌段(b)含有具有2,2,6,6-四烷基哌啶結構、2,2,5,5-四烷基吡咯啶結構、1,2,2,6,6-五烷基哌啶結構或1,2,2,5,5-五烷基吡咯啶結構之重複單位。 [4] The dispersing agent for inorganic particles according to [1], which is composed of a block copolymer containing a polymer block (a) and a polymer block (b), wherein the polymer block (a) contains four a repeating unit of the ammonium salt structure, the polymer block (b) contains a 2,2,6,6-tetraalkylpiperidine structure, a 2,2,5,5-tetraalkylpyrrole structure, 1,2 , a repeating unit of a 2,6,6-pentaalkylpiperidine structure or a 1,2,2,5,5-pentapyrrolidinium structure.
[5]如[1]至[4]中任一項之無機粒子用分散劑,其中,具有四級銨鹽結構 之重複單位為式(II)表示之重複單位。 [5] The dispersing agent for inorganic particles according to any one of [1] to [4], which has a quaternary ammonium salt structure The repeating unit is a repeating unit represented by the formula (II).
(式(II)中,R4表示氫原子或C1~C3烷基,R5、R6及R7分別獨立地表示C1~C6烷基或C6~C10芳基C1~C6烷基,X表示C1~C10伸烷基或C1~C10伸烷基-O-C1~C10伸烷基,Z-表示相對陰離子(counteranion)) (In the formula (II), R 4 represents a hydrogen atom or a C1 to C3 alkyl group, and R 5 , R 6 and R 7 each independently represent a C1 to C6 alkyl group or a C6 to C10 aryl C1 to C6 alkyl group, and X represents C1~C10 alkyl or C1~C10 alkyl-O-C1~C10 alkyl, Z - represents relative anion (counteranion)
[6]如[1]至[5]中任一項之無機粒子用分散劑,其中,聚合物嵌段(b)進一步含有式(III)表示之重複單位。 [6] The dispersing agent for inorganic particles according to any one of [1] to [5] wherein the polymer block (b) further contains a repeating unit represented by the formula (III).
(式(III)中,R8表示氫原子或C1~C3烷基,R9表示C1~C20烷基或C6~C10芳基C1~C6烷基) (In the formula (III), R 8 represents a hydrogen atom or a C1 to C3 alkyl group, and R 9 represents a C1 to C20 alkyl group or a C6 to C10 aryl C1 to C6 alkyl group)
[7]一種組成物,含有無機粒子、[1]至[6]中任一項之無機粒子用分散劑、及分散介質。 [7] A composition comprising the inorganic particles, the dispersing agent for inorganic particles according to any one of [1] to [6], and a dispersion medium.
[8]一種硬化性組成物,含有無機粒子、[1]至[6]中任一項之無機粒子用分散劑、及硬化性成分。 [8] A curable composition comprising the inorganic particles, the dispersing agent for inorganic particles according to any one of [1] to [6], and a curable component.
[9]一種硬化物,其係使[8]之硬化性組成物硬化而成者。 [9] A cured product obtained by hardening a curable composition of [8].
[10]一種薄膜,其係使[8]之硬化性組成物硬化而成者。 [10] A film obtained by curing the curable composition of [8].
本發明之無機粒子用分散劑具有優異之分散性能。進而,使本發明之硬化性組成物硬化而成之硬化物顯示良好的硬度,或者使本發明之無機粒子用分散劑含有於樹脂等分散介質中而成之組成物的耐光性優異。 The dispersing agent for inorganic particles of the present invention has excellent dispersibility. Furthermore, the cured product obtained by curing the curable composition of the present invention exhibits good hardness, or the composition obtained by dispersing the inorganic particles of the present invention in a dispersion medium such as a resin is excellent in light resistance.
本發明之無機粒子用分散劑由含有聚合物嵌段(a)及聚合物嵌段(b)之嵌段共聚物構成。 The dispersing agent for inorganic particles of the present invention is composed of a block copolymer containing a polymer block (a) and a polymer block (b).
聚合物嵌段(a)為含有選自由具有三級胺基之重複單位及具有四級銨鹽結構之重複單位組成之群中至少1種重複單位者。 The polymer block (a) is one containing at least one repeating unit selected from the group consisting of a repeating unit having a tertiary amino group and a repeating unit having a quaternary ammonium salt structure.
具有四級銨鹽結構之重複單位只要為於重複單位上具有四級銨鹽結構者,則並無特別限制。作為較佳之具有四級銨鹽結構之重複單位,可列舉式(II)表示之重複單位。 The repeating unit having a quaternary ammonium salt structure is not particularly limited as long as it has a quaternary ammonium salt structure in a repeating unit. As a preferred repeating unit having a quaternary ammonium salt structure, a repeating unit represented by the formula (II) can be cited.
式(II)中,R4表示氫原子或C1~C3烷基,R5、R6及R7分別獨立地表 示C1~C6烷基或C6~C10芳基C1~C6烷基,X表示C1~C10伸烷基或C1~C10伸烷基-O-C1~C10伸烷基,Z-表示相對陰離子。再者,C1、C3、C6、C10等表示構成該基之碳原子之數。 In the formula (II), R 4 represents a hydrogen atom or a C1 to C3 alkyl group, and R 5 , R 6 and R 7 each independently represent a C1 to C6 alkyl group or a C6 to C10 aryl C1 to C6 alkyl group, and X represents C1. ~ C10 alkylene or C1 ~ C10 alkylene group -O-C1 ~ C10 alkylene group, Z - represents a counter anion. Further, C1, C3, C6, C10 and the like represent the number of carbon atoms constituting the group.
本發明中烷基可為直鏈,亦可為支鏈。作為C1~C3烷基,可列舉:甲基、乙基、正丙基、異丙基等。作為C1~C6烷基,可列舉:甲基、乙基、正丙基、異丙基、正丁基、二級丁基、異丁基、三級丁基、正戊基、正己基等。 In the present invention, the alkyl group may be a straight chain or a branched chain. Examples of the C1-C3 alkyl group include a methyl group, an ethyl group, a n-propyl group, and an isopropyl group. Examples of the C1 to C6 alkyl group include a methyl group, an ethyl group, a n-propyl group, an isopropyl group, a n-butyl group, a secondary butyl group, an isobutyl group, a tertiary butyl group, a n-pentyl group, and a n-hexyl group.
作為C1~C10伸烷基,可列舉:亞甲基、伸乙基、丙烷-1,3-二基、丙烷-1,2-二基、丁烷-1,4-二基、丁烷-2,3-二基、戊烷-1,5-二基、戊烷-1,4-二基、2-甲基丁烷-1,4-二基、己烷-1,6-二基、辛烷-1,8-二基、癸烷-1,10-二基等。 Examples of the C1 to C10 alkylene group include a methylene group, an ethylidene group, a propane-1,3-diyl group, a propane-1,2-diyl group, a butane-1,4-diyl group, and a butane- 2,3-diyl, pentane-1,5-diyl, pentane-1,4-diyl, 2-methylbutane-1,4-diyl, hexane-1,6-diyl , octane-1,8-diyl, decane-1,10-diyl and the like.
作為C6~C10芳基C1~C6烷基,可列舉苄基、苯乙基、3-苯基-正丙基、1-苯基-正己基、萘-1-基甲基、2-萘-2-基乙基、1-萘-2-基-正丙基、茚-1-基甲基等。 Examples of the C6-C10 aryl C1-C6 alkyl group include a benzyl group, a phenethyl group, a 3-phenyl-n-propyl group, a 1-phenyl-n-hexyl group, a naphthalen-1-ylmethyl group, and a 2-naphthalene- 2-ylethyl, 1-naphthalen-2-yl-n-propyl, indol-1-ylmethyl and the like.
作為Z-,可列舉:Cl-、Br-、I-、ClO4 -、BF4 -、CH3COO-、PF6 -等。 Examples of Z - include Cl - , Br - , I - , ClO 4 - , BF 4 - , CH 3 COO - , PF 6 - and the like.
聚合物嵌段(a)含有之選自由具有三級胺基之重複單位及具有四級銨鹽結構之重複單位組成之群中至少1種重複單位的比率較佳為10~100質量%。若聚合物嵌段(a)含有之選自由具有三級胺基之重複單位及具有四級銨鹽結構之重複單位組成之群中至少1種重複單位之比率低,則有無機粒子用分散劑之分散性能降低的傾向。 The ratio of the polymer block (a) to at least one repeating unit selected from the group consisting of a repeating unit having a tertiary amino group and a repeating unit having a quaternary ammonium salt structure is preferably from 10 to 100% by mass. If the polymer block (a) contains a ratio of at least one repeating unit selected from the group consisting of a repeating unit having a tertiary amino group and a repeating unit having a quaternary ammonium salt structure, there is a dispersing agent for inorganic particles. The tendency of the dispersion performance to decrease.
聚合物嵌段(a)中亦可含有不具有三級胺基或四級銨鹽結構之重複單位。作為該重複單位,例如,可列舉:源自於(甲基)丙烯酸 系單體之重複單位、源自於芳香族乙烯基系單體之重複單位、源自於共軛二烯系單體之重複單位等。 The polymer block (a) may also contain repeating units having no tertiary amino group or quaternary ammonium salt structure. As the repeating unit, for example, it is exemplified by (meth)acrylic acid The repeating unit of the monomer, the repeating unit derived from the aromatic vinyl monomer, the repeating unit derived from the conjugated diene monomer, and the like.
聚合物嵌段(a)可為選自由具有三級胺基之重複單位及具有四級銨鹽結構之重複單位組成之群中至少1種重複單位、與不具有三級胺基或四級銨鹽結構之重複單位無規地連接而成者,亦可為交替地連接而成者。 The polymer block (a) may be at least one repeating unit selected from the group consisting of a repeating unit having a tertiary amino group and a repeating unit having a quaternary ammonium salt structure, and having no tertiary or tertiary ammonium. The repeating units of the salt structure are randomly connected, and may be alternately connected.
聚合物嵌段(a)例如可藉由使具有三級胺基之單體及/或具有四級銨鹽結構之單體、與視需要不具有三級胺基或四級銨鹽結構之單體聚合而獲得,或者可藉由使具有三級胺基之單體與視需要可與其共聚之其他單體聚合,接著使三級胺基全部或一部分四級化而獲得。 The polymer block (a) can be, for example, a monomer having a tertiary amino group and/or a monomer having a quaternary ammonium salt structure, and optionally a tertiary amino group or a quaternary ammonium salt structure. It is obtained by bulk polymerization, or can be obtained by polymerizing a monomer having a tertiary amino group with another monomer copolymerizable with it, and then quaternizing all or a part of the tertiary amine group.
作為具有四級銨鹽結構之單體,例如,可列舉式(IIm1)表示之單體。式(IIm1)中之記號係與式(II)中之記號相同之含義。作為具有四級銨鹽結構之單體的具體例,可列舉:(甲基)丙烯醯氧基乙基三甲基氟化銨、(甲基)丙烯醯氧基乙基三甲基氯化銨、(甲基)丙烯醯氧基乙基三甲基溴化銨、(甲基)丙烯醯氧基乙基三甲基碘化銨、(甲基)丙烯醯氧基丙基三甲基氟化銨、(甲基)丙烯醯氧基丙基三甲基氯化銨、(甲基)丙烯醯氧基丙基三甲基溴化銨、(甲基)丙烯醯氧基丙基三甲基碘化銨、(甲 基)丙烯醯氧基丁基三甲基氟化銨、(甲基)丙烯醯氧基丁基三甲基氯化銨、(甲基)丙烯醯氧基丁基三甲基溴化銨、(甲基)丙烯醯氧基丁基三甲基碘化銨等。該等可單獨使用1種或者組合2種以上使用。 As the monomer having a quaternary ammonium salt structure, for example, a monomer represented by the formula (IIm1) can be cited. The symbol in the formula (IIm1) has the same meaning as the symbol in the formula (II). Specific examples of the monomer having a quaternary ammonium salt structure include (meth)acryloxyethyltrimethylammonium fluoride and (meth)acryloxyethyltrimethylammonium chloride. , (meth) propylene oxiranyl ethyl trimethyl ammonium bromide, (meth) propylene oxiranyl ethyl trimethyl ammonium iodide, (methyl) propylene methoxy propyl trimethyl fluorination Ammonium, (meth) propylene methoxy propyl trimethyl ammonium chloride, (meth) propylene methoxy propyl trimethyl ammonium bromide, (methyl) propylene methoxy propyl trimethyl iodine Ammonium, (a Base) propylene methoxy butyl trimethyl ammonium fluoride, (meth) propylene methoxy butyl trimethyl ammonium chloride, (meth) propylene methoxy butyl trimethyl ammonium bromide, ( Methyl) propylene methoxy butyl trimethyl ammonium iodide or the like. These may be used alone or in combination of two or more.
作為具有三級胺基之單體,例如,可列舉式(IIm2)表示之單體。式(IIm2)中之記號係與式(II)中之記號相同之含義。作為具有三級胺基之單體的具體例,可列舉:(甲基)丙烯酸二甲胺基乙酯、(甲基)丙烯酸二甲胺基丙酯、(甲基)丙烯酸二甲胺基丁酯、(甲基)丙烯酸二乙胺基乙酯、(甲基)丙烯酸二乙胺基丙酯、(甲基)丙烯酸二乙胺基丁酯、(甲基)丙烯酸二甲胺基乙氧基乙酯、(甲基)丙烯酸二甲胺基乙氧基丙酯、(甲基)丙烯酸二乙胺基丁氧基丁酯等。該等可單獨使用1種或者組合2種以上使用。 As the monomer having a tertiary amino group, for example, a monomer represented by the formula (IIm2) can be cited. The symbol in the formula (IIm2) has the same meaning as the symbol in the formula (II). Specific examples of the monomer having a tertiary amino group include dimethylaminoethyl (meth)acrylate, dimethylaminopropyl (meth)acrylate, and dimethylaminobutyl (meth)acrylate. Ester, diethylaminoethyl (meth)acrylate, diethylaminopropyl (meth)acrylate, diethylaminobutyl (meth)acrylate, dimethylaminoethoxy (meth)acrylate Ethyl ester, dimethylaminoethoxypropyl (meth)acrylate, diethylaminobutoxybutyl (meth)acrylate, and the like. These may be used alone or in combination of two or more.
作為可用以獲得聚合物嵌段(a)之其他單體,可列舉:(甲基)丙烯酸;(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸正丙酯、(甲基)丙烯酸異丙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸二級丁酯、(甲基)丙烯酸三級丁酯、(甲基)丙烯酸己酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸1-乙基環己酯、(甲基)丙烯酸苄酯等(甲基)丙烯酸酯;苯乙烯;鄰甲基苯乙烯、對甲基苯乙烯、對三級丁基苯乙烯、α-甲基苯乙烯、對三級 丁氧基苯乙烯、間三級丁氧基苯乙烯、對(1-乙氧基乙氧基)苯乙烯、2,4-二甲基苯乙烯、乙烯基苯胺、乙烯基苯甲酸等苯乙烯衍生物;2-乙烯基吡啶、4-乙烯基吡啶、2-乙烯基喹啉、4-乙烯基喹啉、2-乙烯基噻吩、4-乙烯基噻吩等乙烯基雜芳基;乙烯基萘、乙烯基蒽等;1,3-丁二烯、異戊二烯、2-乙基-1,3-丁二烯、2-三級丁基-1,3-丁二烯、2-苯基-1,3-丁二烯、2,3-二甲基-1,3-丁二烯、1,3-戊二烯、2-甲基-1,3-戊二烯、3-甲基-1,3-戊二烯、1,3-己二烯、2-甲基-1,3-辛二烯、4,5-二乙基-1,3-辛二烯、3-丁基-1,3-辛二烯、1,3-環戊二烯、1,3-環己二烯、1,3-環辛二烯、1,3-三環癸二烯、月桂油烯、氯丁二烯等共軛二烯等。該等可單獨使用1種或者組合2種以上使用。 As another monomer which can be used to obtain the polymer block (a), (meth)acrylic acid; methyl (meth)acrylate, ethyl (meth)acrylate, n-propyl (meth)acrylate, Isopropyl (meth)acrylate, n-butyl (meth)acrylate, isobutyl (meth)acrylate, n-butyl (meth)acrylate, tert-butyl (meth)acrylate, (methyl) ) hexyl acrylate, cyclohexyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, 1-ethylcyclohexyl (meth) acrylate, benzyl (meth) acrylate, etc. (methyl Acrylate; styrene; o-methyl styrene, p-methyl styrene, p-terphenyl styrene, α-methyl styrene, three-stage Styrene, butylene styrene, p-(1-ethoxyethoxy)styrene, 2,4-dimethylstyrene, vinyl aniline, vinyl benzoic acid, etc. a derivative; a vinyl heteroaryl group such as 2-vinylpyridine, 4-vinylpyridine, 2-vinylquinoline, 4-vinylquinoline, 2-vinylthiophene, 4-vinylthiophene; vinylnaphthalene; , vinyl hydrazine, etc.; 1,3-butadiene, isoprene, 2-ethyl-1,3-butadiene, 2-tributyl-1,3-butadiene, 2-benzene -1,3-butadiene, 2,3-dimethyl-1,3-butadiene, 1,3-pentadiene, 2-methyl-1,3-pentadiene, 3-methyl -1,3-pentadiene, 1,3-hexadiene, 2-methyl-1,3-octadiene, 4,5-diethyl-1,3-octadiene, 3-butyl -1,3-octadiene, 1,3-cyclopentadiene, 1,3-cyclohexadiene, 1,3-cyclooctadiene, 1,3-tricyclodecadiene, laurelene a conjugated diene such as chloroprene or the like. These may be used alone or in combination of two or more.
本發明之聚合物嵌段(b)為含有選自由具有交聯性官能基之重複單位及具有具備捕捉自由基之功能之結構的重複單位組成之群中至少1種重複單位者,且上述自由基係利用光之氧化所產生。 The polymer block (b) of the present invention is one containing at least one repeating unit selected from the group consisting of a repeating unit having a crosslinkable functional group and a repeating unit having a structure having a function of capturing a radical, and the above freedom The base system is produced by oxidation of light.
將聚合物嵌段(b)含有具有交聯性官能基之重複單位的情形設為第一態樣,將聚合物嵌段(b)含有具有具備捕捉自由基之功能之結構的重複單位,且上述自由基係利用光之氧化所產生之情形設為第二態樣,於以下進行說明。 The polymer block (b) contains a repeating unit having a crosslinkable functional group as a first aspect, and the polymer block (b) contains a repeating unit having a structure having a function of capturing a radical, and The case where the radical is generated by oxidation of light is referred to as a second aspect and will be described below.
(第一態樣) (first aspect)
於本發明第一態樣中,聚合物嵌段(b)為含有具有交聯性官能基之重複單位者。交聯性官能基較佳為非極性或低極性。作為非極性或低極性之交聯性官能基,可列舉:乙烯基或2-丙烯-2-基等含有碳-碳雙鍵之基、環氧乙烷基或氧環丁基(oxetanyl)等含氧飽和雜環基等。非極性或低極性 之交聯性官能基可根據本發明之硬化性組成物含有之硬化性成分中含有的官能基而適當設定。作為本發明之無機粒子用分散劑中具有較佳之非極性或低極性之交聯性官能基的重複單位,可列舉式(I)表示之重複單位。 In the first aspect of the invention, the polymer block (b) is a repeating unit containing a crosslinkable functional group. The crosslinkable functional group is preferably non-polar or low polarity. Examples of the non-polar or low-polarity crosslinkable functional group include a group having a carbon-carbon double bond such as a vinyl group or a 2-propen-2-yl group, an oxirane group or an oxetanyl group. An oxygen-containing saturated heterocyclic group or the like. Non-polar or low polarity The crosslinkable functional group can be appropriately set according to the functional group contained in the curable component contained in the curable composition of the present invention. The repeating unit having a preferred non-polar or low-polar crosslinkable functional group in the dispersing agent for inorganic particles of the present invention may be a repeating unit represented by the formula (I).
式(I)中,R1表示氫原子或C1~C3烷基,R2及R3分別獨立地表示氫原子或C1~C6烷基,Q表示亦可具有烷基作為取代基之含氧飽和雜環基或C2~C20烯基,n1表示CR2R3之重複數且為0~6之任一整數。 In the formula (I), R 1 represents a hydrogen atom or a C1 to C3 alkyl group, and R 2 and R 3 each independently represent a hydrogen atom or a C1 to C6 alkyl group, and Q represents an oxygen-containing saturated group which may have an alkyl group as a substituent. A heterocyclic group or a C2 to C20 alkenyl group, and n1 represents a repeating number of CR 2 R 3 and is an integer of any of 0 to 6.
C1~C3烷基或C1~C6烷基係如於式(II)之說明中已述者。 The C1-C3 alkyl group or the C1-C6 alkyl group is as described in the description of the formula (II).
Q中之含氧飽和雜環基為含有至少1個氧原子作為構成環之原子的飽和雜環基。又,除氧原子以外,亦可含有氮原子、硫原子等其他雜原子作為構成環之原子。含氧飽和雜環基之構成環的原子數較佳為3~8,更佳為3~6。 The oxygen-saturated heterocyclic group in Q is a saturated heterocyclic group containing at least one oxygen atom as an atom constituting the ring. Further, in addition to the oxygen atom, other hetero atoms such as a nitrogen atom or a sulfur atom may be contained as atoms constituting the ring. The number of atoms of the constituent ring of the oxygen-saturated heterocyclic group is preferably from 3 to 8, more preferably from 3 to 6.
作為含氧飽和雜環基之具體例,可列舉:環氧乙烷基、氧環丁基、四氫呋喃基、四氫哌喃基、啉基、硫代啉基等。該等之中,較佳為環氧乙烷基、氧環丁基、四氫呋喃基、四氫哌喃基。 Specific examples of the oxygen-containing saturated heterocyclic group include an oxiranyl group, an oxocyclobutyl group, a tetrahydrofuranyl group, and a tetrahydropyranyl group. Olinyl, thio Orolinic group and the like. Among these, an oxiranyl group, an oxocyclobutyl group, a tetrahydrofuranyl group, or a tetrahydropyranyl group is preferable.
Q中之含氧飽和雜環基之構成環的原子亦可經較佳為C1~C6烷基取代。C1~C6烷基係如於式(II)之說明中已述者。 The atom constituting the ring of the oxygen-saturated heterocyclic group in Q may also be substituted with a C1 to C6 alkyl group. The C1-C6 alkyl group is as described in the description of formula (II).
作為Q中之C2~C20烯基,可列舉:乙烯基、1-丙烯基、 2-丙烯-1-基、2-丙烯-2-基、1-丁烯基、2-丁烯基、3-丁烯基、1-甲基-2-丙烯基、2-甲基-2-丙烯基、1-戊烯基、2-戊烯基、3-戊烯基、4-戊烯基、1-甲基-2-丁烯基、2-甲基-2-丁烯基、1-己烯基、2-己烯基、3-己烯基、4-己烯基、5-己烯基、庚烯基、辛烯基、癸烯基、十五烯基、二十烯基、二十三烯基等。該等之中,較佳為C2~C6烯基,更佳為乙烯基。 Examples of the C2 to C20 alkenyl group in Q include a vinyl group and a 1-propenyl group. 2-propen-1-yl, 2-propen-2-yl, 1-butenyl, 2-butenyl, 3-butenyl, 1-methyl-2-propenyl, 2-methyl-2 - propenyl, 1-pentenyl, 2-pentenyl, 3-pentenyl, 4-pentenyl, 1-methyl-2-butenyl, 2-methyl-2-butenyl, 1-hexenyl, 2-hexenyl, 3-hexenyl, 4-hexenyl, 5-hexenyl, heptenyl, octenyl, nonenyl, pentadecyl, eicosene Base, behenyl, and the like. Among these, a C2 to C6 alkenyl group is preferred, and a vinyl group is more preferred.
於本發明第一態樣中,聚合物嵌段(b)中含有之式(I)表示之重複單位的比率較佳為20~100質量%。若聚合物嵌段(b)中含有之式(I)表示之重複單位的比率低,則有使硬化性組成物硬化而成之硬化物之硬度降低的傾向。 In the first aspect of the invention, the ratio of the repeating unit represented by the formula (I) contained in the polymer block (b) is preferably from 20 to 100% by mass. When the ratio of the repeating unit represented by the formula (I) contained in the polymer block (b) is low, the hardness of the cured product obtained by curing the curable composition tends to decrease.
於本發明第一態樣中,聚合物嵌段(b)較佳為進一步含有式(III)表示之重複單位。 In the first aspect of the invention, the polymer block (b) preferably further contains a repeating unit represented by the formula (III).
式(III)中,R8表示氫原子或C1~C3烷基,R9表示C1~C20烷基或C6~C10芳基C1~C6烷基。 In the formula (III), R 8 represents a hydrogen atom or a C1 to C3 alkyl group, and R 9 represents a C1 to C20 alkyl group or a C6 to C10 aryl C1 to C6 alkyl group.
C1~C3烷基及C6~C10芳基C1~C6烷基係如於式(II)之說明中已述者。 The C1-C3 alkyl group and the C6-C10 aryl C1-C6 alkyl group are as described in the description of the formula (II).
作為C1~C20烷基,可列舉:甲基、乙基、正丙基、異丙基、正丁基、異丁基、二級丁基、三級丁基、正戊基、異戊基、新戊基、三級戊基、己 基、庚基、辛基、壬基、癸基、十一基、十二基、二十基等。該等之中,較佳為C1~C6烷基。 Examples of the C1-C20 alkyl group include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, secondary butyl, tert-butyl, n-pentyl, isopentyl, Neopentyl, tertiary amyl, Base, heptyl, octyl, decyl, decyl, eleven, twelfth, twenty base, and the like. Among these, a C1 to C6 alkyl group is preferred.
於本發明第一態樣中,聚合物嵌段(b)中含有之式(III)表示之重複單位的比率較佳為80質量%以下。若將聚合物嵌段(b)中含有之式(III)表示之重複單位的比率設為上述範圍,則有使硬化性組成物硬化而成之硬化物之硬度提高的傾向。 In the first aspect of the invention, the ratio of the repeating unit represented by the formula (III) contained in the polymer block (b) is preferably 80% by mass or less. When the ratio of the repeating unit represented by the formula (III) contained in the polymer block (b) is in the above range, the hardness of the cured product obtained by curing the curable composition tends to increase.
於本發明第一態樣中,聚合物嵌段(b)中,除式(I)及式(III)表示之重複單位以外,亦可含有不具有四級銨鹽結構之重複單位。作為該重複單位,例如可列舉:源自於芳香族乙烯基系單體之重複單位、源自於共軛二烯系單體之重複單位等。 In the first aspect of the present invention, the polymer block (b) may contain a repeating unit having no quaternary ammonium salt structure in addition to the repeating unit represented by the formula (I) and the formula (III). Examples of the repeating unit include a repeating unit derived from an aromatic vinyl monomer, a repeating unit derived from a conjugated diene monomer, and the like.
於本發明第一態樣中,聚合物嵌段(b)可為式(I)表示之重複單位、式(III)表示之重複單位、及視需要除式(I)及式(III)表示之重複單位以外之不具有四級銨鹽結構的重複單位無規地連接而成者,亦可為交替地連接而成者。 In the first aspect of the present invention, the polymer block (b) may be a repeating unit represented by the formula (I), a repeating unit represented by the formula (III), and optionally represented by the formula (I) and formula (III). The repeating units other than the repeating unit and having no quaternary ammonium salt structure are randomly connected, and may be alternately joined.
於本發明第一態樣中,聚合物嵌段(b)例如可藉由使具有非極性或低極性之交聯性官能基之單體與視需要可與其共聚之其他單體聚合而獲得。 In the first aspect of the invention, the polymer block (b) can be obtained, for example, by polymerizing a monomer having a non-polar or low-polarity crosslinkable functional group with other monomers copolymerizable with it as needed.
作為具有非極性或低極性之交聯性官能基的單體,可列舉:(甲基)丙烯酸環氧丙酯、(甲基)丙烯酸氧環丁烷-2-基甲酯、(甲基)丙烯酸氧環丁烷-3-基甲酯、(甲基)丙烯酸(2-甲基氧環丁烷-2-基)甲酯、(甲基)丙烯酸(3-甲基氧環丁烷-3-基)甲酯、(甲基)丙烯酸(2-乙基氧環丁烷-2-基)甲酯、(甲基)丙烯酸(3-乙基氧環丁烷-3 -基)甲酯、(甲基)丙烯酸(3-丙基氧環丁烷-3-基)甲酯、(甲基)丙烯酸2-(氧環丁烷-2-基)乙酯、(甲基)丙烯酸2-(氧環丁烷-3-基)乙酯、(甲基)丙烯酸(四氫呋喃-2-基)甲酯、(甲基)丙烯酸(四氫呋喃-3-基)甲酯、(甲基)丙烯酸(2-甲基四氫呋喃-2-基)甲酯、(甲基)丙烯酸(3-甲基四氫呋喃-3-基)甲酯、(甲基)丙烯酸(5-甲基四氫呋喃-2-基)甲酯、(甲基)丙烯酸(4-甲基四氫呋喃-2-基)甲酯、(甲基)丙烯酸(3-甲基四氫呋喃-2-基)甲酯、(甲基)丙烯酸(2-甲基四氫呋喃-3-基)甲酯、(甲基)丙烯酸(5-甲基四氫呋喃-3-基)甲酯、(甲基)丙烯酸(4-甲基四氫呋喃-3-基)甲酯、(甲基)丙烯酸2-(四氫呋喃-3-基)乙酯、(甲基)丙烯酸環氧乙烷-2-基甲酯、(甲基)丙烯酸(3-甲基環氧乙烷-2-基)甲酯、(甲基)丙烯酸(2-甲基環氧乙烷-2-基)甲酯等,或(甲基)丙烯酸烯丙酯、(甲基)丙烯酸2-甲基-2-丙烯酯、(甲基)丙烯酸(E)-丁烯-2-酯、(甲基)丙烯酸(Z)-丁烯-2-酯、(甲基)丙烯酸3-丁烯酯、(甲基)丙烯酸3-甲基-3-丁烯酯、(甲基)丙烯酸(E)-戊烯-3-基酯、(甲基)丙烯酸(Z)-戊烯-3-基酯、(甲基)丙烯酸3-甲基-2-丁烯酯等。該等之中,較佳為(甲基)丙烯酸烯丙酯。 Examples of the monomer having a non-polar or low-polarity crosslinkable functional group include glycidyl (meth)acrylate, oxycyclobutane-2-ylmethyl (meth)acrylate, and (methyl). Oxycyclobutane-3-ylmethyl acrylate, (2-methyloxocyclobutan-2-yl)methyl (meth)acrylate, (meth)acrylic acid (3-methyloxetane-3 -yl)methyl ester, (2-ethyloxycyclobutane-2-yl)methyl (meth)acrylate, (meth)acrylic acid (3-ethyloxycyclobutane-3) -yl)methyl ester, (3-propyloxycyclobutane-3-yl)methyl (meth)acrylate, 2-(oxocyclobutan-2-yl)ethyl (meth)acrylate, (A) 2-(oxycyclobutane-3-yl)ethyl acrylate, (tetrahydrofuran-2-yl)methyl (meth) acrylate, (tetrahydrofuran-3-yl)methyl (meth) acrylate, (A) (meth)acrylic acid (2-methyltetrahydrofuran-2-yl)methyl ester, (meth)acrylic acid (3-methyltetrahydrofuran-3-yl)methyl ester, (meth)acrylic acid (5-methyltetrahydrofuran-2- Methyl), (4-methyltetrahydrofuran-2-yl)methyl (meth)acrylate, (3-methyltetrahydrofuran-2-yl)methyl (meth)acrylate, (meth)acrylic acid (2) -Methyltetrahydrofuran-3-yl)methyl ester, (5-methyltetrahydrofuran-3-yl)methyl (meth)acrylate, (4-methyltetrahydrofuran-3-yl)methyl (meth)acrylate, 2-(tetrahydrofuran-3-yl)ethyl (meth)acrylate, ethylene oxide-2-ylmethyl (meth)acrylate, (meth)acrylic acid (3-methyloxirane-2- Methyl), (meth)acrylic acid (2-methyloxiran-2-yl)methyl ester, etc., or allyl (meth)acrylate, 2-methyl-2-(meth)acrylate Propylene ester, (E)-butene-2-(meth)acrylate, ( (meth)acrylic acid (Z)-butene-2-ester, 3-butenyl (meth)acrylate, 3-methyl-3-butenyl (meth)acrylate, (meth)acrylic acid (E) -penten-3-yl ester, (Z)-penten-3-yl (meth)acrylate, 3-methyl-2-butenyl (meth)acrylate, and the like. Among these, allyl (meth)acrylate is preferred.
於本發明第一態樣中,作為可用以獲得聚合物嵌段(b)之其他單體,可列舉:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸三級丁酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸苄酯等。進而,作為可用以獲得聚合物嵌段(b)之其他單體,可列舉與作為可用以獲得聚合物嵌段(a)之其他單體聚合物而例示者相同者。 In the first aspect of the present invention, as other monomers which can be used to obtain the polymer block (b), methyl (meth)acrylate, ethyl (meth)acrylate, or (meth)acrylic acid can be cited. Butyl ester, n-butyl (meth)acrylate, benzyl (meth)acrylate, and the like. Further, as another monomer which can be used to obtain the polymer block (b), the same as those exemplified as the other monomer polymer which can be used to obtain the polymer block (a) can be cited.
(第二態樣) (second aspect)
於本發明第二態樣中,聚合物嵌段(b)為含有具有持有捕捉利用光之氧化藉此產生之自由基之功能之結構的重複單位者。作為具有捕捉利用光之氧化藉此產生之自由基之功能的結構,可列舉受阻胺系光穩定劑中可見之結構,例如,可列舉氮原子鍵結有大體積之烷基的結構。具體而言,可列舉:2,2,6,6-四烷基哌啶結構、2,2,5,5-四烷基吡咯啶結構、1,2,2,6,6-五烷基哌啶結構、1,2,2,5,5-五烷基吡咯啶結構等。 In the second aspect of the present invention, the polymer block (b) is a repeating unit containing a structure having a function of trapping a radical generated by oxidation using light. The structure which has a function of capturing the radical which generate|occur|produces by the oxidation of the light is a structure which can be seen by a hindered amine light stabilizer, and, for example, the structure which the nitrogen atom is bonded with the large- Specific examples thereof include a 2,2,6,6-tetraalkylpiperidine structure, a 2,2,5,5-tetraalkylpyrrole structure, and a 1,2,2,6,6-pentaalkyl group. Piperidine structure, 1,2,2,5,5-pentapyrrolidinium structure, and the like.
作為具有2,2,6,6-四烷基哌啶結構、2,2,5,5-四烷基吡咯啶結構、1,2,2,6,6-五烷基哌啶結構、1,2,2,5,5-五烷基吡咯啶結構等重複單位,較佳為式(I')表示之重複單位。 As a 2,2,6,6-tetraalkylpiperidine structure, a 2,2,5,5-tetraalkylpyrrole structure, a 1,2,2,6,6-pentacyclopiperidine structure, 1 a repeating unit such as a 2,2,5,5-pentapyrrolidinium structure, preferably a repeating unit represented by the formula (I').
式(I')中,R0表示氫原子或C1~C3烷基,P1、P2、P3及P4分別獨立地表示C1~C6之烷基,P1、P2、P3及P4之C1~C6之烷基亦可互相鍵結而形成環,X表示二價連結基,Y表示氫原子、氧基或C1~C6之烷基,n2表示0或1,r表示C1~C3烷基,m表示0或1。 In the formula (I'), R 0 represents a hydrogen atom or a C1 to C3 alkyl group, and P 1 , P 2 , P 3 and P 4 each independently represent a C1 to C6 alkyl group, P 1 , P 2 , P 3 and The alkyl groups of C1 to C6 of P 4 may also be bonded to each other to form a ring, X represents a divalent linking group, Y represents a hydrogen atom, an oxy group or an alkyl group of C1 to C6, n2 represents 0 or 1, and r represents C1~. C3 alkyl, m represents 0 or 1.
C1~C3烷基或C1~C6烷基係如於式(II)之說明中已述者。 The C1-C3 alkyl group or the C1-C6 alkyl group is as described in the description of the formula (II).
作為X中之二價連結基,並無特別限定,較佳為單鍵、C1~C6之伸烷基或C2~C6之伸烷氧基,更佳為單鍵或C1~C6之伸烷氧基,進而更佳為單鍵。 The divalent linking group in X is not particularly limited, and is preferably a single bond, a C1 to C6 alkylene group or a C2 to C6 alkyleneoxy group, more preferably a single bond or a C1 to C6 alkylene oxide. More preferably, it is a single bond.
作為C1~C6之伸烷基,可列舉:亞甲基、伸乙基、伸丙基、甲基伸乙基、伸丁基、1,2-二甲基伸乙基、伸戊基、1-甲基伸丁基、2-甲基伸丁基等。 Examples of the alkylene group of C1 to C6 include a methylene group, an exoethyl group, a propyl group, a methyl group ethyl group, a butyl group, a 1,2-dimethylmethyl group, a pentyl group, and 1 - methyl butyl, 2-methyl butyl and the like.
作為C2~C6之伸烷氧基,可列舉:伸乙氧基、1,2-伸丙氧基、1,3-伸丙氧基、1,2-伸丁氧基、1,4-伸丁氧基及1,6-伸己氧基等。 Examples of the alkoxy group of C2 to C6 include an exoethoxy group, a 1,2-propenyloxy group, a 1,3-propenyloxy group, a 1,2-butoxy group, and a 1,4-extension. Butoxy and 1,6-extended hexyloxy and the like.
於本發明第二態樣中,聚合物嵌段(b)含有之式(I')表示之重複單位的比率較佳為20~100重量%。若聚合物嵌段(b)含有之式(I')表示之重複單位的比率低,則有組成物之耐光性降低的傾向。 In the second aspect of the present invention, the ratio of the repeating unit represented by the formula (I') contained in the polymer block (b) is preferably from 20 to 100% by weight. When the ratio of the repeating unit represented by the formula (I') contained in the polymer block (b) is low, the light resistance of the composition tends to be lowered.
於本發明第二態樣中,聚合物嵌段(b)較佳為進而含有式(III)表示之重複單位。 In the second aspect of the present invention, the polymer block (b) preferably further contains a repeating unit represented by the formula (III).
式(III)中,R8表示氫原子或C1~C3烷基,R9表示C1~C20烷基或C6~C10芳基C1~C6烷基。 In the formula (III), R 8 represents a hydrogen atom or a C1 to C3 alkyl group, and R 9 represents a C1 to C20 alkyl group or a C6 to C10 aryl C1 to C6 alkyl group.
C1~C3烷基及C6~C10芳基C1~C6烷基係如於式(II)之說明中已 述者。 C1~C3 alkyl and C6~C10 aryl C1~C6 alkyl are as described in formula (II) Narrator.
作為C1~C20烷基,可列舉:甲基、乙基、正丙基、異丙基、正丁基、異丁基、二級丁基、三級丁基、正戊基、異戊基、新戊基、三級戊基、己基、庚基、辛基、壬基、癸基、十一基、十二基、二十基等。該等之中,較佳為C1~C6烷基。 Examples of the C1-C20 alkyl group include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, secondary butyl, tert-butyl, n-pentyl, isopentyl, Neopentyl, tertiary amyl, hexyl, heptyl, octyl, decyl, decyl, eleven, twelve, twenty, and the like. Among these, a C1 to C6 alkyl group is preferred.
於本發明第二態樣中,聚合物嵌段(b)含有之式(III)表示之重複單位的比率較佳為80質量%以下。若將聚合物嵌段(b)含有之式(III)表示之重複單位的比率設為上述範圍,則有無機粒子之分散性提高的傾向。 In the second aspect of the present invention, the ratio of the repeating unit represented by the formula (III) contained in the polymer block (b) is preferably 80% by mass or less. When the ratio of the repeating unit represented by the formula (III) contained in the polymer block (b) is in the above range, the dispersibility of the inorganic particles tends to be improved.
於本發明第二態樣中,聚合物嵌段(b)可進而含有具有交聯性官能基之重複單位。交聯性官能基較佳為非極性或低極性。作為非極性或低極性之交聯性官能基,可列舉:乙烯基或2-丙烯-2-基等含有碳-碳雙鍵之基、環氧乙烷基或氧環丁基等含氧飽和雜環基等。非極性或低極性之交聯性官能基可根據本發明之硬化性組成物含有的硬化性成分中包含之官能基而適當設定。作為本發明之無機粒子用分散劑中具有較佳之交聯性官能基的重複單位,可列舉式(IV)表示之重複單位。 In a second aspect of the invention, the polymer block (b) may in turn contain repeating units having crosslinkable functional groups. The crosslinkable functional group is preferably non-polar or low polarity. Examples of the non-polar or low-polarity crosslinkable functional group include oxygen-containing saturated groups such as a vinyl group or a 2-propen-2-yl group having a carbon-carbon double bond, an oxiranyl group or an oxocyclobutyl group. Heterocyclic group and the like. The non-polar or low-polarity crosslinkable functional group can be appropriately set according to the functional group contained in the curable component contained in the curable composition of the present invention. The repeating unit having a preferred crosslinkable functional group in the dispersing agent for inorganic particles of the present invention may be a repeating unit represented by the formula (IV).
式(IV)中,R10表示氫原子或C1~C3烷基,R11及R12分別 獨立地表示氫原子或C1~C6烷基,Q表示亦可具有烷基作為取代基之含氧飽和雜環基或C2~C20烯基,m表示CR11R12之重複數且為0~6之任一整數。 In the formula (IV), R 10 represents a hydrogen atom or a C1 to C3 alkyl group, and R 11 and R 12 each independently represent a hydrogen atom or a C1 to C6 alkyl group, and Q represents an oxygen-containing saturated group which may have an alkyl group as a substituent. Heterocyclyl or C2~C20 alkenyl, m represents the repeat number of CR 11 R 12 and is any integer from 0 to 6.
C1~C3烷基或C1~C6烷基係如於式(II)之說明中已述者。 The C1-C3 alkyl group or the C1-C6 alkyl group is as described in the description of the formula (II).
Q中之含氧飽和雜環基為含有至少1個氧原子作為構成環之原子的飽和雜環基。又,除氧原子以外,亦可含有氮原子、硫原子等其他雜原子作為構成環之原子。含氧飽和雜環基之構成環的原子數較佳為3~8,更佳為3~6。 The oxygen-saturated heterocyclic group in Q is a saturated heterocyclic group containing at least one oxygen atom as an atom constituting the ring. Further, in addition to the oxygen atom, other hetero atoms such as a nitrogen atom or a sulfur atom may be contained as atoms constituting the ring. The number of atoms of the constituent ring of the oxygen-saturated heterocyclic group is preferably from 3 to 8, more preferably from 3 to 6.
作為含氧飽和雜環基之具體例,可列舉:環氧乙烷基、氧環丁基、四氫呋喃基、四氫哌喃基、啉基、硫代啉基等。該等之中,較佳為環氧乙烷基、氧環丁基、四氫呋喃基、四氫哌喃基。 Specific examples of the oxygen-containing saturated heterocyclic group include an oxiranyl group, an oxocyclobutyl group, a tetrahydrofuranyl group, and a tetrahydropyranyl group. Olinyl, thio Orolinic group and the like. Among these, an oxiranyl group, an oxocyclobutyl group, a tetrahydrofuranyl group, or a tetrahydropyranyl group is preferable.
Q中之含氧飽和雜環基之構成環的原子亦可經較佳為C1~C6烷基取代。C1~C6烷基係如於式(II)之說明中已述者。 The atom constituting the ring of the oxygen-saturated heterocyclic group in Q may also be substituted with a C1 to C6 alkyl group. The C1-C6 alkyl group is as described in the description of formula (II).
作為Q中之C2~C20烯基,可列舉:乙烯基、1-丙烯基、2-丙烯-1-基、2-丙烯-2-基、1-丁烯基、2-丁烯基、3-丁烯基、1-甲基-2-丙烯基、2-甲基-2-丙烯基、1-戊烯基、2-戊烯基、3-戊烯基、4-戊烯基、1-甲基-2-丁烯基、2-甲基-2-丁烯基、1-己烯基、2-己烯基、3-己烯基、4-己烯基、5-己烯基、庚烯基、辛烯基、癸烯基、十五烯基、二十烯基、二十三烯基等。該等之中,較佳為C2~C6烯基,更佳為乙烯基。 Examples of the C2 to C20 alkenyl group in Q include a vinyl group, a 1-propenyl group, a 2-propen-1-yl group, a 2-propen-2-yl group, a 1-butenyl group, a 2-butenyl group, and 3 -butenyl, 1-methyl-2-propenyl, 2-methyl-2-propenyl, 1-pentenyl, 2-pentenyl, 3-pentenyl, 4-pentenyl, 1 -methyl-2-butenyl, 2-methyl-2-butenyl, 1-hexenyl, 2-hexenyl, 3-hexenyl, 4-hexenyl, 5-hexenyl , heptenyl, octenyl, nonenyl, pentadecenyl, behenyl, behenyl, and the like. Among these, a C2 to C6 alkenyl group is preferred, and a vinyl group is more preferred.
於本發明第二態樣中,聚合物嵌段(b)含有之式(IV)表示之重複單位的比率較佳為80質量%以下。若增加聚合物嵌段(b)含有之式(IV)表示之重複單位的比率,則有使硬化性組成物硬化而成之硬化物 之硬度變高的傾向。 In the second aspect of the present invention, the ratio of the repeating unit represented by the formula (IV) contained in the polymer block (b) is preferably 80% by mass or less. When the ratio of the repeating unit represented by the formula (IV) contained in the polymer block (b) is increased, there is a cured product obtained by hardening the curable composition. The tendency for the hardness to become higher.
於本發明第二態樣中,聚合物嵌段(b)中,除式(I')、式(III)及式(IV)表示之重複單位以外,亦可進而含有不具有三級胺基或四級銨鹽結構之重複單位。作為該重複單位,例如,可列舉:源自於芳香族乙烯基系單體之重複單位、源自於共軛二烯系單體之重複單位等。 In the second aspect of the present invention, the polymer block (b) may further contain no tertiary amino group in addition to the repeating unit represented by the formula (I'), the formula (III) and the formula (IV). Or a repeating unit of a quaternary ammonium salt structure. Examples of the repeating unit include a repeating unit derived from an aromatic vinyl monomer, a repeating unit derived from a conjugated diene monomer, and the like.
於本發明第二態樣中,聚合物嵌段(b)可為上述重複單位無規地連接而成者,亦可為交替地連接而成者。 In the second aspect of the present invention, the polymer block (b) may be randomly connected to the above repeating units, or may be alternately joined.
於本發明第二態樣中,聚合物嵌段(b)例如可藉由使具有捕捉利用光之氧化藉此產生之自由基之功能的單體與視需要可與其共聚的其他單體聚合而獲得。 In the second aspect of the present invention, the polymer block (b) can be polymerized, for example, by a monomer having a function of capturing a radical generated by oxidation using light, and other monomers copolymerizable with it as needed. obtain.
作為具有捕捉利用光之氧化藉此產生之自由基之功能的單體,可例示下述化合物。 The following compounds are exemplified as the monomer having a function of capturing radicals generated by oxidation of light.
作為具有非極性或低極性之交聯性官能基的單體,可列舉:(甲基)丙烯酸環氧丙酯、(甲基)丙烯酸氧環丁烷-2-基甲酯、(甲基)丙烯酸氧環丁烷-3-基甲酯、(甲基)丙烯酸(2-甲基氧環丁烷-2-基)甲酯、(甲基)丙烯酸(3-甲基氧環丁烷-3-基)甲酯、(甲基)丙烯酸(2-乙基氧環丁烷-2-基)甲酯、(甲基)丙烯酸(3-乙基氧環丁烷-3-基)甲酯、(甲基)丙烯酸(3-丙基氧環丁烷-3-基)甲酯、(甲基) 丙烯酸2-(氧環丁烷-2-基)乙酯、(甲基)丙烯酸2-(氧環丁烷-3-基)乙酯、(甲基)丙烯酸(四氫呋喃-2-基)甲酯、(甲基)丙烯酸(四氫呋喃-3-基)甲酯、(甲基)丙烯酸(2-甲基四氫呋喃-2-基)甲酯、(甲基)丙烯酸(3-甲基四氫呋喃-3-基)甲酯、(甲基)丙烯酸(5-甲基四氫呋喃-2-基)甲酯、(甲基)丙烯酸(4-甲基四氫呋喃-2-基)甲酯、(甲基)丙烯酸(3-甲基四氫呋喃-2-基)甲酯、(甲基)丙烯酸(2-甲基四氫呋喃-3-基)甲酯、(甲基)丙烯酸(5-甲基四氫呋喃-3-基)甲酯、(甲基)丙烯酸(4-甲基四氫呋喃-3-基)甲酯、(甲基)丙烯酸2-(四氫呋喃-3-基)乙酯、(甲基)丙烯酸環氧乙烷-2-基甲酯、(甲基)丙烯酸(3-甲基環氧乙烷-2-基)甲酯、(甲基)丙烯酸(2-甲基環氧乙烷-2-基)甲酯等,或(甲基)丙烯酸烯丙酯、(甲基)丙烯酸2-甲基-2-丙烯酯、(甲基)丙烯酸(E)-丁烯-2-基酯、(甲基)丙烯酸(Z)-丁烯-2-基酯、(甲基)丙烯酸3-丁烯酯、(甲基)丙烯酸3-甲基-3-丁烯酯、(甲基)丙烯酸(E)-戊烯-3-基酯、(甲基)丙烯酸(Z)-戊烯-3-酯、(甲基)丙烯酸3-甲基-2-丁烯酯等。該等之中,較佳為(甲基)丙烯酸烯丙酯。 Examples of the monomer having a non-polar or low-polarity crosslinkable functional group include glycidyl (meth)acrylate, oxycyclobutane-2-ylmethyl (meth)acrylate, and (methyl). Oxycyclobutane-3-ylmethyl acrylate, (2-methyloxocyclobutan-2-yl)methyl (meth)acrylate, (meth)acrylic acid (3-methyloxetane-3 -yl)methyl ester, (2-ethyloxycyclobutane-2-yl)methyl (meth)acrylate, (3-ethyloxycyclobutane-3-yl)methyl (meth)acrylate, (3-propyloxycyclobutane-3-yl)methyl (meth)acrylate, (methyl) 2-(oxocyclobutane-2-yl)ethyl acrylate, 2-(oxocyclobutane-3-yl)ethyl (meth)acrylate, (tetrahydrofuran-2-yl)methyl (meth)acrylate , (meth)acrylic acid (tetrahydrofuran-3-yl)methyl ester, (meth)acrylic acid (2-methyltetrahydrofuran-2-yl)methyl ester, (meth)acrylic acid (3-methyltetrahydrofuran-3-yl) Methyl ester, (5-methyltetrahydrofuran-2-yl)methyl (meth)acrylate, (4-methyltetrahydrofuran-2-yl)methyl (meth)acrylate, (meth)acrylic acid (3- Methyltetrahydrofuran-2-yl)methyl ester, (2-methyltetrahydrofuran-3-yl)methyl (meth)acrylate, (5-methyltetrahydrofuran-3-yl)methyl (meth)acrylate, ( (4-methyltetrahydrofuran-3-yl)methyl (meth)acrylate, 2-(tetrahydrofuran-3-yl)ethyl (meth)acrylate, ethylene oxide-2-ylmethyl (meth)acrylate , (3-methyloxiran-2-yl)methyl (meth)acrylate, (2-methyloxiran-2-yl)methyl (meth)acrylate, or the like (methyl) Alkenyl acrylate, 2-methyl-2-propenyl (meth)acrylate, (E)-buten-2-yl (meth)acrylate, (Z)-butene (meth)acrylate 2-based ester, 3-butenyl (meth)acrylate, (A 3-methyl-3-butenyl acrylate, (E)-penten-3-yl (meth) acrylate, (Z)-penten-3-yl (meth) acrylate, (methyl) ) 3-methyl-2-butenyl acrylate or the like. Among these, allyl (meth)acrylate is preferred.
於本發明第二態樣中,作為可用以獲得聚合物嵌段(b)之單體,可列舉:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸三級丁酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸苄酯等。進而,作為可用以獲得聚合物嵌段(b)之其他單體,可列舉與作為可用以獲得聚合物嵌段(a)之其他單體例示者相同者。 In the second aspect of the present invention, as the monomer which can be used to obtain the polymer block (b), methyl (meth) acrylate, ethyl (meth) acrylate or (meth) acrylate can be cited. Butyl ester, n-butyl (meth)acrylate, benzyl (meth)acrylate, and the like. Further, as other monomers which can be used to obtain the polymer block (b), the same as those exemplified as other monomers which can be used to obtain the polymer block (a) can be cited.
本發明之聚合物嵌段(a)與聚合物嵌段(b)的質量比並無 特別限制,較佳為20/80~80/20,更佳為40/60~60/40。再者,聚合物嵌段(a)與聚合物嵌段(b)相比極性強,故而與極性溶劑或具有極性之官能基的親和性相對較高。另一方面,聚合物嵌段(b)與非極性溶劑或非極性之官能基的親和性相對較高。一般而言,無機粒子之表面具有羥基等官能基。根據無機粒子表面之極性強度及分散介質的極性強度,設定聚合物嵌段(a)與聚合物嵌段(b)之質量比,從而可調節使本發明之無機粒子用分散劑之無機粒子溶解並分散的能力。 The mass ratio of the polymer block (a) to the polymer block (b) of the present invention is not The limit is particularly preferably 20/80 to 80/20, more preferably 40/60 to 60/40. Further, since the polymer block (a) is more polar than the polymer block (b), it has a relatively high affinity with a polar solvent or a functional group having polarity. On the other hand, the polymer block (b) has a relatively high affinity with a non-polar solvent or a non-polar functional group. Generally, the surface of the inorganic particles has a functional group such as a hydroxyl group. The mass ratio of the polymer block (a) to the polymer block (b) is set according to the polarity intensity of the surface of the inorganic particles and the polarity of the dispersion medium, so that the inorganic particles of the inorganic particles of the present invention can be adjusted to be dissolved by the inorganic particles of the dispersant. And the ability to disperse.
構成本發明之無機粒子用分散劑之嵌段共聚物除聚合物嵌段(a)及聚合物嵌段(b)以外,亦可含有聚合物嵌段(c)。 The block copolymer constituting the dispersing agent for inorganic particles of the present invention may contain the polymer block (c) in addition to the polymer block (a) and the polymer block (b).
聚合物嵌段(c)為含有不具有交聯性官能基及四級銨鹽結構之重複單位的聚合物嵌段。具體而言,可列舉含有源自於(甲基)丙烯酸系單體、芳香族乙烯基系單體、共軛二烯系單體等重複單位之聚合物嵌段。關於(甲基)丙烯酸系單體、芳香族乙烯基系單體、共軛二烯系單體等,例示有與已說明者相同者。 The polymer block (c) is a polymer block containing a repeating unit having no crosslinkable functional group and a quaternary ammonium salt structure. Specifically, a polymer block containing a repeating unit derived from a (meth)acrylic monomer, an aromatic vinyl monomer, or a conjugated diene monomer can be mentioned. The (meth)acrylic monomer, the aromatic vinyl monomer, the conjugated diene monomer, and the like are exemplified as those described above.
又,本發明之嵌段共聚物的數量平均分子量較佳為1,000~200,000,更佳為2,000~50,000,進而更佳為4,000~30,000。又,本發明之嵌段共聚物的分子量分佈以重量平均分子量/數量平均分子量之比計,較佳為1.0~2.5,更佳為1.0~2.0。 Further, the block copolymer of the present invention preferably has a number average molecular weight of 1,000 to 200,000, more preferably 2,000 to 50,000, still more preferably 4,000 to 30,000. Further, the molecular weight distribution of the block copolymer of the present invention is preferably from 1.0 to 2.5, more preferably from 1.0 to 2.0, based on the ratio of the weight average molecular weight to the number average molecular weight.
再者,重量平均分子量及數量平均分子量為將利用以N,N-二甲基甲醯胺作為溶劑之凝膠滲透層析法(GPC)測定的資料,利用標準聚甲基丙烯酸甲酯之分子量換算之值。 Further, the weight average molecular weight and the number average molecular weight are data measured by gel permeation chromatography (GPC) using N,N-dimethylformamide as a solvent, and the molecular weight of the standard polymethyl methacrylate is utilized. The value of the conversion.
嵌段共聚物並不特別受其製造方法限制。嵌段共聚物例如可 藉由包含如下之方法獲得:1)使用以獲得聚合物嵌段(a)之單體聚合而獲得聚合物嵌段(a),接著,添加用以獲得聚合物嵌段(b)之單體,使聚合物嵌段(b)之分子鏈自聚合物嵌段(a)之末端成長;2)使用以獲得聚合物嵌段(b)之單體聚合而獲得聚合物嵌段(b),接著,添加用以獲得聚合物嵌段(a)之單體,使聚合物嵌段(a)之分子鏈自聚合物嵌段(b)之末端成長;或者3)使用以獲得聚合物嵌段(a)之單體聚合而獲得聚合物嵌段(a),另外,使用以獲得聚合物嵌段(b)之單體聚合而獲得聚合物嵌段(b),使所得之聚合物嵌段(a)與聚合物嵌段(b)偶合。 Block copolymers are not particularly limited by their method of manufacture. Block copolymers such as It is obtained by the following method: 1) obtaining a polymer block (a) by using a monomer obtained to obtain a polymer block (a), followed by adding a monomer for obtaining a polymer block (b) , the molecular chain of the polymer block (b) is grown from the end of the polymer block (a); 2) the polymer block (b) is obtained by polymerizing the monomer to obtain the polymer block (b), Next, adding a monomer for obtaining the polymer block (a), causing the molecular chain of the polymer block (a) to grow from the end of the polymer block (b); or 3) using to obtain a polymer block The monomer of (a) is polymerized to obtain a polymer block (a), and further, a polymer block (b) is obtained by using a monomer obtained to obtain a polymer block (b), and the obtained polymer block is obtained. (a) Coupling with the polymer block (b).
嵌段共聚物較佳為如上述1)或2)般包含使分子鏈逐次成長之方法。此種逐次聚合較佳為利用活性聚合(living polymerization)法進行。作為活性聚合法,可列舉:活性自由基聚合法、活性陰離子聚合法。該等之中,活性陰離子聚合法就可嚴密地控制組成或分子量之方面而言較佳。 The block copolymer preferably contains a method of sequentially growing a molecular chain as in the above 1) or 2). Such sequential polymerization is preferably carried out by a living polymerization method. Examples of the living polymerization method include a living radical polymerization method and a living anionic polymerization method. Among these, the living anionic polymerization method is preferable in terms of strictly controlling the composition or molecular weight.
於逐次聚合中,自用以獲得最初之聚合物嵌段之單體的聚合,向用以獲得其次之聚合物嵌段之單體之聚合的切換可於用以獲得最初之聚合物嵌段之單體完全消失的時間點進行,或者亦可於稍微殘留之狀態的時間點進行。根據用以獲得最初之聚合物嵌段之單體的殘存量,會有於兩個聚合物嵌段之間形成錐形(taper)部之情形。聚合反應之進行可藉由利用氣相層析法或液相層析法檢測單體的殘量而確認。又,亦可於用以獲得最初之聚合物嵌段之單體的添加結束後,根據單體或溶劑之種類有所不同而攪拌1分鐘至1小時,之後,開始添加用以獲得其次之聚合物嵌段之單體。 In a sequential polymerization, the polymerization of the monomer used to obtain the original polymer block, the switching to the polymerization of the monomer used to obtain the next polymer block can be used to obtain the original polymer block. The time at which the body completely disappears may be performed, or may be performed at a point in time when the body is slightly left. Depending on the residual amount of monomer used to obtain the original polymer block, there will be a case where a taper portion is formed between the two polymer blocks. The progress of the polymerization can be confirmed by detecting the residual amount of the monomer by gas chromatography or liquid chromatography. Further, after the addition of the monomer for obtaining the first polymer block, the mixture may be stirred for 1 minute to 1 hour depending on the type of the monomer or the solvent, after which the addition is started to obtain the second polymerization. The monomer of the block.
用以獲得本發明之嵌段共聚物之活性陰離子聚合中使用的陰離子聚合起始劑並無特別限制。例如,可使用鹼金屬、有機鹼金屬化合物等。 The anionic polymerization initiator used in the living anionic polymerization for obtaining the block copolymer of the present invention is not particularly limited. For example, an alkali metal, an organic alkali metal compound or the like can be used.
作為鹼金屬,可列舉:鋰、鈉、鉀、銫等。作為有機鹼金屬化合物,可列舉上述鹼金屬之烷基化物、烯丙基化物、芳基化物、鋰醯胺化合物等。具體而言,可列舉:乙基鋰、正丁基鋰、二級丁基鋰、三級丁基鋰、乙基鈉、聯苯基鋰、萘基鋰、三苯基鋰、萘基鈉、萘基鉀、2-鋰異丁酸甲酯、2-鋰異丁酸乙酯、2-鋰異丁酸異丙酯、α-甲基苯乙烯鈉二陰離子、1,1-二苯基己基鋰、1,1-二苯基-3-甲基戊基鋰、1,4-二鋰-2-丁烯、1,6-二鋰己烷、聚苯乙烯鋰、異丙苯基鉀、異丙苯基銫、二甲基醯胺鋰、二乙基醯胺鋰、二丁基醯胺鋰,二丙基醯胺鋰、二異丙基醯胺鋰、二庚基醯胺鋰、二己基醯胺鋰、二辛基醯胺鋰等。該等陰離子聚合起始劑可單獨使用1種或者組合2種以上使用。 Examples of the alkali metal include lithium, sodium, potassium, rubidium, and the like. The organic alkali metal compound may, for example, be an alkylate, an allyl compound, an aryl compound or a lithium decylamine compound. Specific examples thereof include ethyl lithium, n-butyl lithium, secondary butyl lithium, tertiary butyl lithium, ethyl sodium, biphenyl lithium, naphthyl lithium, triphenyl lithium, and naphthyl sodium. Naphthyl potassium, methyl 2-lithium isobutyrate, ethyl 2-lithium isobutyrate, isopropyl 2-lithium isobutyrate, sodium α-methylstyrene dianion, 1,1-diphenylhexyl Lithium, 1,1-diphenyl-3-methylpentyllithium, 1,4-dilithium-2-butene, 1,6-dilithium hexane, polystyrene lithium, cumyl potassium, Propyl phenyl hydrazine, lithium dimethyl decylamine, lithium diethyl guanamine, lithium dibutyl amide, lithium dipropyl amide, lithium diisopropyl guanamine, lithium diheptyl amide, two Lithium hexyl amide, lithium dioctyl decylamine, and the like. These anionic polymerization initiators may be used alone or in combination of two or more.
陰離子聚合起始劑的使用量相對於所用之單體的合計量1莫耳,通常為0.0001~0.2莫耳,較佳為0.0005~0.1莫耳。藉由使用該範圍之陰離子聚合起始劑,可產率較佳地製造目標聚合物。關於聚合溫度,只要為不發生移動反應或停止反應等副反應而消耗單體且結束聚合之溫度範圍,則並無特別限制,較佳為-100℃以上且溶劑沸點以下之範圍。又,單體相對於聚合溶劑之濃度並無特別限制,較佳為1~40質量%,更佳為2~15質量%。 The anionic polymerization initiator is used in an amount of from 1 mol to the total of the monomers used, and is usually from 0.0001 to 0.2 mol, preferably from 0.0005 to 0.1 mol. By using an anionic polymerization initiator of this range, the target polymer can be preferably produced in a yield. The polymerization temperature is not particularly limited as long as it is a temperature range in which the monomer is consumed and the polymerization is terminated without causing a side reaction such as a shift reaction or a reaction, and is preferably in the range of -100 ° C or higher and the solvent boiling point or lower. Further, the concentration of the monomer relative to the polymerization solvent is not particularly limited, but is preferably from 1 to 40% by mass, more preferably from 2 to 15% by mass.
利用活性陰離子聚合使具有四級銨鹽結構之單體聚合一般而言較為困難。因此,於利用活性陰離子聚合製造嵌段共聚物之情形時, 使具有三級胺基之單體聚合,之後,利用公知之方法使該三級胺基四級化。四級化可使用作為三級胺之烷基化劑而眾所周知之物質進行。具體而言,可列舉:苄基氯、苄基溴、苄基碘;氯甲烷、氯乙烷、溴甲烷、碘甲烷等鹵代烷;硫酸二甲酯、硫酸二乙酯、硫酸二-正丙酯等硫酸烷基酯等。 It is generally more difficult to polymerize a monomer having a quaternary ammonium salt structure by living anionic polymerization. Therefore, when a block copolymer is produced by living anionic polymerization, The monomer having a tertiary amino group is polymerized, and then the tertiary amine group is quaternized by a known method. The quaternization can be carried out using a well-known substance as an alkylating agent for a tertiary amine. Specific examples thereof include benzyl chloride, benzyl bromide, and benzyl iodide; halogenated alkane such as methyl chloride, ethyl chloride, methyl bromide, and methyl iodide; dimethyl sulfate, diethyl sulfate, and di-n-propyl sulfate; Alkyl sulfate and the like.
關於可用於活性陰離子聚合之溶劑,只要為不參與聚合反應且與聚合物具有相溶性之溶劑,則並無特別限制。具體而言,可例示:二乙醚、四氫呋喃、二烷、三烷等醚系化合物、四甲基乙二胺、六甲基磷醯三胺等三級胺等極性溶劑,或己烷或甲苯等脂肪族、芳香族或脂環式烴化合物等非極性溶劑或低極性溶劑。該等溶劑可單獨使用1種或者組合2種以上使用。於本發明之製造方法中,即便於將非極性溶劑或低極性溶劑與極性溶劑併用之情形時,亦可精度良好地控制聚合,例如,非極性溶劑或低極性溶劑相對於全部溶劑,可使用較佳為5體積%以上、更佳為20體積%以上、進而更佳為50體積%以上。 The solvent which can be used for the living anionic polymerization is not particularly limited as long as it is a solvent which does not participate in the polymerization reaction and is compatible with the polymer. Specifically, it can be exemplified by diethyl ether, tetrahydrofuran, and Alkane, three a polar solvent such as an ether such as an alkane; a polar solvent such as a tertiary amine such as tetramethylethylenediamine or hexamethylphosphonium triamine; or a nonpolar solvent such as an aliphatic, aromatic or alicyclic hydrocarbon compound such as hexane or toluene or Low polar solvent. These solvents may be used alone or in combination of two or more. In the production method of the present invention, even when a nonpolar solvent or a low polar solvent is used in combination with a polar solvent, the polymerization can be controlled with high precision. For example, a nonpolar solvent or a low polar solvent can be used with respect to all solvents. It is preferably 5% by volume or more, more preferably 20% by volume or more, and still more preferably 50% by volume or more.
於本發明中,視需要亦可使用二乙基鋅等二烷基鋅、二丁基鎂等二烷基鎂、三乙基鋁等有機金屬作為聚合穩定劑或者單體或溶劑之精製劑。 In the present invention, an organic metal such as dialkylzinc such as diethylzinc or dialkylmagnesium such as dibutylmagnesium or triethylaluminum may be used as a polymerization stabilizer or a monomer or a solvent.
於活性陰離子聚合中,視需要可於聚合開始時或聚合途中添加鹼金屬鹽、或鹼土金屬鹽等添加劑。作為此種添加劑,具體而言,可例示鈉、鉀、鋇、鎂之硫酸鹽、硝酸鹽、硼酸鹽等無機酸鹽或鹵化物,更具體而言,可列舉鋰或鋇之氯化物、溴化物、碘化物、或硼酸鋰、硝酸鎂、氯化鈉、氯化鉀等。該等之中,較佳為鋰之鹵化物、例如氯化鋰、溴化鋰、碘化鋰、氟化鋰,尤佳為氯化鋰。 In the living anionic polymerization, an additive such as an alkali metal salt or an alkaline earth metal salt may be added at the start of polymerization or during the polymerization as needed. Specific examples of such an additive include inorganic acid salts or halides such as sulfates, nitrates, and borates of sodium, potassium, barium, and magnesium, and more specifically, lithium or barium chloride or bromine. Compound, iodide, or lithium borate, magnesium nitrate, sodium chloride, potassium chloride, and the like. Among these, lithium halides such as lithium chloride, lithium bromide, lithium iodide, lithium fluoride, and particularly preferably lithium chloride are preferred.
以上述方式獲得之嵌段共聚物可直接或者溶解於溶劑中而 作為無機粒子用分散劑使用。本發明之無機粒子用分散劑適合使無機粒子均勻地分散於分散介質中。 The block copolymer obtained in the above manner can be directly or dissolved in a solvent. It is used as a dispersing agent for inorganic particles. The dispersing agent for inorganic particles of the present invention is suitable for uniformly dispersing inorganic particles in a dispersion medium.
本發明之組成物含有無機粒子、本發明之無機粒子用分散劑、及分散介質。於本發明之組成物中,較佳為無機粒子均勻地分散於分散介質中。 The composition of the present invention contains inorganic particles, a dispersing agent for inorganic particles of the present invention, and a dispersion medium. In the composition of the present invention, it is preferred that the inorganic particles are uniformly dispersed in the dispersion medium.
本發明之組成物中使用之無機粒子並無特別限定。該無機粒子之一次粒徑並無特別限定,較佳為1000nm以下,更佳為500nm以下,進而更佳為200nm以下,最佳為100nm以下。 The inorganic particles used in the composition of the present invention are not particularly limited. The primary particle diameter of the inorganic particles is not particularly limited, but is preferably 1000 nm or less, more preferably 500 nm or less, still more preferably 200 nm or less, and most preferably 100 nm or less.
作為構成無機粒子之物質,例如,可列舉:二氧化矽、矽藻土、氧化鋁(alumina)、氧化鋅、二氧化鈦(titania)、氧化鋯(zirconia)、氧化鈣、氧化鎂、氧化鐵、氧化銅、氧化錫、氧化鉻、氧化銻、氧化釔、氧化銫、氧化釤、氧化鑭、氧化鉭、氧化鋱、氧化銪、氧化釹、鐵氧體(ferrite)類等金屬氧化物;氫氧化鈣、氫氧化鎂、氫氧化鋁、鹼性碳酸鎂等金屬氫氧化物;重質碳酸鈣、輕質碳酸鈣、碳酸鋅、碳酸鋇、碳鈉鋁石、水滑石等金屬碳酸鹽;硫酸鈣、硫酸鋇、石膏纖維等金屬硫酸鹽;矽酸鈣(矽灰石、硬矽鈣石)、高嶺土、黏土、滑石、雲母、蒙脫石、膨潤土、活性黏土、海泡石、絲狀鋁英石、絹雲母、玻璃纖維、玻璃珠、玻璃薄片(glass flake)等金屬矽酸鹽;氮化鋁、氮化硼、氮化矽等金屬氮化物;鈦酸鉀、鈦酸鈣、鈦酸鎂、鈦酸鋇、鈦酸鋯酸鉛硼酸鋁等金屬鈦酸鹽;硼酸鋅、硼酸鋁等金屬硼酸鹽;磷酸三鈣等金屬磷酸鹽;硫化鉬等金屬硫化物;碳化矽等金屬碳化物;碳黑、石墨、碳纖維等碳類;金、銀等金屬單體。由該等物質構成之粒子可單獨1種或組合2種以上作為分散對象。該等之中,較佳為金 屬氧化物,更佳為氧化鋯(zirconia)。 Examples of the material constituting the inorganic particles include cerium oxide, diatomaceous earth, alumina, zinc oxide, titania, zirconia, calcium oxide, magnesium oxide, iron oxide, and oxidation. Metal oxides such as copper, tin oxide, chromium oxide, cerium oxide, cerium oxide, cerium oxide, cerium oxide, cerium oxide, cerium oxide, cerium oxide, cerium oxide, cerium oxide, ferrite, etc.; , metal hydroxides such as magnesium hydroxide, aluminum hydroxide, and basic magnesium carbonate; metal carbonates such as heavy calcium carbonate, light calcium carbonate, zinc carbonate, barium carbonate, dawsonite, hydrotalcite; calcium sulfate, Metal sulphate such as barium sulfate or gypsum fiber; calcium citrate (apatite, hard strontite), kaolin, clay, talc, mica, montmorillonite, bentonite, activated clay, sepiolite, filamentous aluminite Metal sericates such as sericite, glass fiber, glass beads, glass flake; metal nitrides such as aluminum nitride, boron nitride, tantalum nitride; potassium titanate, calcium titanate, magnesium titanate, Metal titanium such as barium titanate, lead zirconate titanate or aluminum borate a metal borate such as zinc borate or aluminum borate; a metal phosphate such as tricalcium phosphate; a metal sulfide such as molybdenum sulfide; a metal carbide such as niobium carbide; a carbon such as carbon black, graphite or carbon fiber; a metal such as gold or silver. monomer. The particles composed of these materials may be used alone or in combination of two or more. Among these, preferably gold It is an oxide, more preferably zirconia.
本發明之組成物所含之無機粒子的量較佳為1~80質量%,更佳為5~50質量%。又,本發明之組成物中使用之本發明之無機粒子用分散劑的量相對於無機粒子100質量份,較佳為1~200質量份,更佳為5~100質量份,進而更佳為10~50質量份。 The amount of the inorganic particles contained in the composition of the present invention is preferably from 1 to 80% by mass, more preferably from 5 to 50% by mass. In addition, the amount of the dispersing agent for inorganic particles of the present invention used in the composition of the present invention is preferably from 1 to 200 parts by mass, more preferably from 5 to 100 parts by mass, even more preferably from 100 parts by mass to the inorganic particles. 10 to 50 parts by mass.
於本發明之組成物中,作為分散介質,可使用液體者或固體者。 In the composition of the present invention, as a dispersion medium, a liquid or a solid can be used.
作為液體分散介質,可列舉:水;己烷、癸烷、十二烷、十四烷等脂肪族烴;環己烷等脂環式烴;甲苯、二甲苯等芳香族烴;丙酮、甲基乙基酮、甲基異丁基酮等酮類;乙酸甲酯、乙酸乙酯、乙酸丙酯、乙酸丁酯、乙酸異丁酯等酯類;甲醇、乙醇、正丙醇、異丙醇、正丁醇、乙二醇、二乙二醇、三乙二醇、丙二醇、甘油等醇類;四氫呋喃、二烷、乙二醇單甲醚(甲基賽路蘇)、乙二醇單乙醚(乙基賽路蘇)、乙二醇單丁醚(丁基賽路蘇)等醚類等。該等之中,就無機粒子之分散性之高度的觀點而言,較佳為脂肪族烴、芳香族烴、酮類、酯類、醇類,更佳為酮類。該等液體分散介質可單獨使用1種或者組合2種以上使用。 Examples of the liquid dispersion medium include water; aliphatic hydrocarbons such as hexane, decane, dodecane, and tetradecane; alicyclic hydrocarbons such as cyclohexane; aromatic hydrocarbons such as toluene and xylene; and acetone and methyl groups. Ketones such as ethyl ketone and methyl isobutyl ketone; esters such as methyl acetate, ethyl acetate, propyl acetate, butyl acetate, isobutyl acetate; methanol, ethanol, n-propanol, isopropanol, Alcohols such as n-butanol, ethylene glycol, diethylene glycol, triethylene glycol, propylene glycol, glycerin; tetrahydrofuran, two Ethers such as alkane, ethylene glycol monomethyl ether (methyl stilbene), ethylene glycol monoethyl ether (ethyl celecoxib), ethylene glycol monobutyl ether (butyl succinyl), and the like. Among these, from the viewpoint of the high dispersibility of the inorganic particles, aliphatic hydrocarbons, aromatic hydrocarbons, ketones, esters, and alcohols are preferable, and ketones are more preferable. These liquid dispersion media may be used alone or in combination of two or more.
本發明之組成物中使用之液體分散介質的量可根據適合之組成物黏度等觀點而適當設定。本發明之組成物中可含有液體分散介質之量較佳為10~50質量%。 The amount of the liquid dispersion medium used in the composition of the present invention can be appropriately set in view of the viscosity of the composition and the like. The amount of the liquid dispersion medium which can be contained in the composition of the present invention is preferably from 10 to 50% by mass.
作為固體分散介質,可列舉熱塑性樹脂、熱固性樹脂、光硬化性樹脂等。再者,於本發明中有時將光硬化性樹脂及熱固性樹脂稱為硬化性成分。於本發明中,較佳為將硬化性成分用作固體分散介質從而製作 硬化性組成物。 Examples of the solid dispersion medium include a thermoplastic resin, a thermosetting resin, and a photocurable resin. Further, in the present invention, the photocurable resin and the thermosetting resin may be referred to as a curable component. In the present invention, it is preferred to use a curable component as a solid dispersion medium. A hardening composition.
作為熱塑性樹脂,可列舉:聚乙烯、聚丙烯、聚氯乙烯、聚偏二氯乙烯(polyvinylidene chloride)、聚苯乙烯、聚乙酸乙烯酯、氟樹脂、ABS樹脂、AS樹脂、丙烯酸樹脂、聚醯胺、聚縮醛、聚碳酸酯、改質聚苯醚、聚對苯二甲酸丁二酯、聚對苯二甲酸乙二酯、環狀聚烯烴、聚苯硫醚、聚碸、聚醚碸、非晶聚芳酯、液晶聚合物、聚醚醚酮、熱塑性聚醯亞胺、聚醯胺醯亞胺等。熱塑性樹脂可使之加熱熔解或溶解於溶劑中,與無機粒子及無機粒子用分散劑混練或混合。 Examples of the thermoplastic resin include polyethylene, polypropylene, polyvinyl chloride, polyvinylidene chloride, polystyrene, polyvinyl acetate, fluororesin, ABS resin, AS resin, acrylic resin, and polyfluorene. Amine, polyacetal, polycarbonate, modified polyphenylene ether, polybutylene terephthalate, polyethylene terephthalate, cyclic polyolefin, polyphenylene sulfide, polyfluorene, polyether oxime , amorphous polyarylate, liquid crystal polymer, polyether ether ketone, thermoplastic polyimide, polyamidimide and the like. The thermoplastic resin can be melted or dissolved in a solvent by heating, and kneaded or mixed with the inorganic particles and the inorganic particles with a dispersing agent.
熱固性樹脂為藉由施加熱而自液體變化為固體者。作為熱固性樹脂,可列舉酚樹脂、環氧樹脂、三聚氰胺樹脂、脲樹脂、不飽和聚酯樹脂、醇酸(alkyd)樹脂、聚胺酯(polyurethane)、熱固性聚醯亞胺等。又,作為熱固性樹脂,可列舉至少含有單體及視需要之低聚物、熱聚合起始劑者。 The thermosetting resin is a one that changes from a liquid to a solid by application of heat. Examples of the thermosetting resin include a phenol resin, an epoxy resin, a melamine resin, a urea resin, an unsaturated polyester resin, an alkyd resin, a polyurethane, a thermosetting polyimine, and the like. Further, examples of the thermosetting resin include those containing at least a monomer, an optional oligomer, and a thermal polymerization initiator.
又,光硬化性樹脂為藉由照射光(紫外線等)而自液體變化為固體者。作為光硬化性樹脂,例如,可列舉至少含有單體及視需要之低聚物、光聚合起始劑者。 Further, the photocurable resin is changed from a liquid to a solid by irradiation with light (such as ultraviolet rays). Examples of the photocurable resin include those containing at least a monomer, an optional oligomer, and a photopolymerization initiator.
作為光硬化性樹脂或熱固性樹脂中所用之單體或低聚物,可列舉:單官能(甲基)丙烯酸酯系單體、苯乙烯、丙烯腈等單乙烯性不飽和化合物;二乙二醇二(甲基)丙烯酸酯、1,4-丁二醇二(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、1,9-壬二醇二(甲基)丙烯酸酯、二(甲基)丙烯酸三伸乙酯、PEG#200二(甲基)丙烯酸酯、PEG#400二(甲基)丙烯酸酯、PEG#600二(甲基)丙烯酸酯、二(甲基)丙烯酸新戊酯、 二羥甲基三環癸烷二(甲基)丙烯酸酯、二新戊四醇六(甲基)丙烯酸酯、新戊四醇三(甲基)丙烯酸酯、新戊四醇四(甲基)丙烯酸酯、三羥甲基丙烷三丙烯酸酯、三羥甲基丙烷四丙烯酸酯等多官能(甲基)丙烯酸酯系單體;(甲基)丙烯酸胺酯;環氧(甲基)丙烯酸酯等。 Examples of the monomer or oligomer used in the photocurable resin or the thermosetting resin include monofunctional (meth)acrylate monomers, monoethylenically unsaturated compounds such as styrene and acrylonitrile; and diethylene glycol. Di(meth)acrylate, 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, 1,9-nonanediol di(methyl) Acrylate, triethyl (di)ethyl acrylate, PEG #200 di(meth) acrylate, PEG #400 di(meth) acrylate, PEG #600 di(meth) acrylate, di (a) Base) neopentyl acrylate, Dimethylol tricyclodecane di(meth)acrylate, dipentaerythritol hexa(meth) acrylate, neopentyl alcohol tri(meth) acrylate, neopentyl alcohol tetra(methyl) a polyfunctional (meth) acrylate monomer such as acrylate, trimethylolpropane triacrylate or trimethylolpropane tetraacrylate; (meth) acrylate; epoxy (meth) acrylate, etc. .
該等之中,較佳為二新戊四醇六(甲基)丙烯酸酯、新戊四醇三(甲基)丙烯酸酯、新戊四醇四(甲基)丙烯酸酯、三羥甲基丙烷三丙烯酸酯、三羥甲基丙烷四丙烯酸酯等多官能(甲基)丙烯酸酯系單體。又,該等可單獨使用1種或者組合2種以上使用。 Among these, dipentaerythritol hexa(meth) acrylate, neopentyl alcohol tri(meth) acrylate, neopentyltetrakis (meth) acrylate, trimethylolpropane are preferred. A polyfunctional (meth) acrylate monomer such as triacrylate or trimethylolpropane tetraacrylate. In addition, these may be used alone or in combination of two or more.
作為聚合起始劑,有藉由光之照射而開始聚合反應者(光聚合起始劑)及藉由加熱而開始聚合反應者(熱聚合起始劑)。作為聚合起始劑之具體例,可列舉:有機過氧化物、咪唑衍生物、雙咪唑衍生物、N-芳基甘胺酸衍生物、有機疊氮化物、二茂鈦類、鋁酸鹽錯合物、N-烷氧基吡啶鎓鹽,9-氧硫衍生物等。 As a polymerization initiator, there is a person who starts a polymerization reaction by light irradiation (photopolymerization initiator) and a polymerization initiator (thermal polymerization initiator) by heating. Specific examples of the polymerization initiator include organic peroxides, imidazole derivatives, bisimidazole derivatives, N-arylglycine derivatives, organic azides, titanocenes, and aluminates. Compound, N-alkoxypyridinium salt, 9-oxosulfur Derivatives, etc.
作為有機過氧化物,可列舉:氫過氧化三級丁基、氫過氧化對薄荷烷、氫過氧化異丙苯、氫過氧化二異丙基苯等氫過氧化物類;三級丁基過氧化月桂酸酯、三級丁基過氧化苯甲酸酯、三級丁基過氧化癸酸酯等過氧化酯類;1,5-二-三級丁基過氧基-3,3,5-三甲基環己烷等過氧縮酮類;過氧化乙醯乙酸乙酯等過氧化酮類;過氧化苯甲醯等過氧化二醯基類。 Examples of the organic peroxide include a tertiary butyl hydroperoxide, hydroperoxide, menthane, cumene hydroperoxide, and diisopropylbenzene hydroperoxide; a tertiary butyl group; Peroxy esters such as oxidized laurate, tertiary butyl peroxybenzoate, and tertiary butyl peroxy phthalate; 1,5-di-tert-butylperoxy-3,3, Peroxy ketals such as 5-trimethylcyclohexane; ketone peroxides such as ethyl acetoxyacetate; and bismuth peroxides such as benzamidine peroxide.
另外,可列舉:安息香、安息香異丙醚、安息香異丁醚、2,2-二乙氧基苯乙酮、2,2-二甲氧基苯基苯乙酮、2-乙基蒽醌、1,3-二(三級丁基二氧羰基)二苯甲酮、4,4'-四(三級丁基二氧羰基)二苯甲酮、3-苯基-5-異唑酮、2-巰基苯并咪唑、雙(2,4,5-三苯基)咪唑、2,2-二甲氧基 -1,2-二苯乙烷-1-酮(商品名Irgacure 651,Ciba Specialty Chemicals股份有限公司製造)、1-羥基-環己基-苯基-酮(商品名Irgacure 184,Ciba Specialty Chemicals股份有限公司製造)、2-苄基-2-二甲胺基-1-(4-啉基苯基)-丁烷-1-酮(商品名Irgacure 369,Ciba Specialty Chemicals股份有限公司製造)、雙(η 5-2,4-二環戊二烯-1-基)-雙(2,6-二氟-3-(1H-吡咯-1-基)-苯基)鈦)(商品名Irgacure 784,Ciba Specialty Chemicals股份有限公司製造)、過氧化二異丙苯、過苯甲酸三級丁酯(t-butyl perbenzoate)、三級丁基過氧己炔-3等。該等聚合起始劑可單獨使用1種或者組合2種以上使用。 Further, examples thereof include benzoin, benzoin isopropyl ether, benzoin isobutyl ether, 2,2-diethoxyacetophenone, 2,2-dimethoxyphenylacetophenone, 2-ethylhydrazine, 1,3-Di(tertiary butyldioxycarbonyl)benzophenone, 4,4'-tetrakis(tert-butyldioxycarbonyl)benzophenone, 3-phenyl-5-iso Oxazolone, 2-mercaptobenzimidazole, bis(2,4,5-triphenyl)imidazole, 2,2-dimethoxy-1,2-diphenylethan-1-one (trade name Irgacure 651) , manufactured by Ciba Specialty Chemicals Co., Ltd.), 1-hydroxy-cyclohexyl-phenyl-ketone (trade name: Irgacure 184, manufactured by Ciba Specialty Chemicals Co., Ltd.), 2-benzyl-2-dimethylamino-1- (4- Polinylphenyl)-butan-1-one (trade name Irgacure 369, manufactured by Ciba Specialty Chemicals Co., Ltd.), bis(η 5-2,4-dicyclopentadien-1-yl)-bis (2) , 6-difluoro-3-(1H-pyrrol-1-yl)-phenyl)titanium) (trade name Irgacure 784, manufactured by Ciba Specialty Chemicals Co., Ltd.), dicumyl peroxide, and perbenzoic acid T-butyl perbenzoate, tertiary butyl peroxyhexyne-3 and the like. These polymerization initiators may be used alone or in combination of two or more.
關於本發明第一態樣之硬化性組成物,無機粒子之含量相對於多官能性單體100質量份,較佳為1~100質量份,聚合起始劑之含量相對於多官能性單體100質量份,較佳為0.5~10質量份,本發明第一態樣之無機粒子用分散劑的含量相對於無機粒子100質量份,較佳為1~200質量份。若使以此種比率含有各成分之硬化性組成物硬化,則可獲得硬度高之硬化物。 In the curable composition of the first aspect of the invention, the content of the inorganic particles is preferably from 1 to 100 parts by mass based on 100 parts by mass of the polyfunctional monomer, and the content of the polymerization initiator is relative to the polyfunctional monomer. The content of the dispersant for inorganic particles according to the first aspect of the present invention is preferably from 1 to 200 parts by mass per 100 parts by mass of the inorganic particles, in terms of 100 parts by mass, preferably 0.5 to 10 parts by mass. When the curable composition containing each component in such a ratio is hardened, a cured product having a high hardness can be obtained.
關於本發明第二態樣之硬化性組成物,無機粒子之含量相對於多官能性單體100質量份,較佳為1~100質量份,聚合起始劑之含量相對於多官能性單體100質量份,較佳為0.5~10質量份,本發明第二態樣之無機粒子用分散劑的含量相對於無機粒子100質量份,較佳為1~200質量份。若使以此種比率含有各成分之硬化性組成物硬化,則可獲得耐光性優異之硬化物。 In the curable composition of the second aspect of the present invention, the content of the inorganic particles is preferably from 1 to 100 parts by mass based on 100 parts by mass of the polyfunctional monomer, and the content of the polymerization initiator is relative to the polyfunctional monomer. The content of the dispersing agent for inorganic particles of the second aspect of the present invention is preferably from 1 to 200 parts by mass per 100 parts by mass of the inorganic particles, in terms of 100 parts by mass, preferably 0.5 to 10 parts by mass. When the curable composition containing each component in such a ratio is cured, a cured product excellent in light resistance can be obtained.
本發明之組成物或硬化性組成物可藉由將各成分適當混合 而製備。於硬化性組成物之製備中,亦可將本發明之無機粒子用分散劑、無機粒子及液體分散介質混合而製備液狀之本發明組成物,並將其與硬化性成分混合。 The composition or curable composition of the present invention can be appropriately mixed by mixing the components And prepared. In the preparation of the curable composition, the inorganic particles of the present invention may be mixed with a dispersant, inorganic particles and a liquid dispersion medium to prepare a liquid composition of the present invention, which is mixed with a curable component.
本發明之硬化性組成物可根據用途成形為膜等期望之形狀,接著進行光照射及/或加熱,製成硬化物。 The curable composition of the present invention can be formed into a desired shape such as a film according to the use, and then subjected to light irradiation and/or heating to obtain a cured product.
加熱並不受其方法特別限定,可使用加熱器等公知手段進行。 Heating is not particularly limited by the method, and it can be carried out by a known means such as a heater.
於光照射中,例如可使用紫外線、可見光線、X射線、電子束等能量射線。該等之中,較佳地使用紫外線。 In the light irradiation, for example, energy rays such as ultraviolet rays, visible rays, X-rays, and electron beams can be used. Among these, ultraviolet rays are preferably used.
可見光線之照射例如可使用白熾燈泡、螢光燈等進行。紫外線之照射例如可使用金屬鹵素燈、氙氣燈、低壓水銀燈、高壓水銀燈、超高壓水銀燈、準分子燈(excimer lamp)、金屬鹵素燈等進行。照射之紫外線的波長範圍並無特別限制,較佳為150nm~400nm,更佳為200nm~380nm。光照射時之環境亦可為大氣環境,較佳為氮氣或二氧化碳等惰性氣體環境或者低氧濃度環境。光照射時之溫度並無特別限定,較佳為10~200℃。 The irradiation of visible light can be performed, for example, using an incandescent bulb, a fluorescent lamp, or the like. The irradiation of ultraviolet rays can be carried out, for example, using a metal halide lamp, a xenon lamp, a low pressure mercury lamp, a high pressure mercury lamp, an ultrahigh pressure mercury lamp, an excimer lamp, a metal halide lamp or the like. The wavelength range of the ultraviolet ray to be irradiated is not particularly limited, but is preferably 150 nm to 400 nm, more preferably 200 nm to 380 nm. The environment under light irradiation may also be an atmospheric environment, preferably an inert gas atmosphere such as nitrogen or carbon dioxide or a low oxygen concentration environment. The temperature at the time of light irradiation is not particularly limited, but is preferably 10 to 200 °C.
硬化之進行狀況可使用傅立葉變換紅外線光譜分析裝置或光化學反應熱量計等進行觀測。藉由該觀測,可設定硬化性組成物之適合的硬化條件(光之照射時間、光強度等、加熱溫度、加熱時間等)。 The progress of the hardening can be observed using a Fourier transform infrared spectroscopy apparatus or a photochemical reaction calorimeter. By this observation, suitable curing conditions (light irradiation time, light intensity, etc., heating temperature, heating time, etc.) of the curable composition can be set.
於使用本發明第一態樣之無機粒子用分散劑之情形時,本發明之硬化性組成物係於硬化時,硬化性成分中之官能基與本發明之無機粒子用分散劑中之交聯性官能基進行反應,無機粒子用分散劑與作為高分子量之樹脂成分之固體分散介質結合,故而可獲得無機粒子用分散劑不會滲出且比先前之硬化性組成物更高硬度的硬化物。尤其是若使硬化性組成物 成形為膜而硬化,則可獲得高硬度之膜。 In the case of using the dispersing agent for inorganic particles according to the first aspect of the present invention, the curable composition of the present invention is a cross-linking functional group in the curable component with the dispersing agent for inorganic particles of the present invention at the time of curing. The functional group is reacted, and the inorganic particles are combined with a dispersing agent and a solid dispersion medium which is a high molecular weight resin component. Therefore, a cured product in which the dispersing agent for inorganic particles does not bleed out and has a higher hardness than the conventional curable composition can be obtained. Hardening composition When it is formed into a film and hardened, a film of high hardness can be obtained.
又,於使用本發明第二態樣之無機粒子用分散劑的情形時,本發明之硬化性組成物可獲得耐光性優異的硬化物。尤其是若使硬化性組成物成形為膜而硬化,則可獲得耐光性優異之膜。 Moreover, when the dispersing agent for inorganic particles of the second aspect of the present invention is used, the curable composition of the present invention can obtain a cured product excellent in light resistance. In particular, when the curable composition is formed into a film and cured, a film excellent in light resistance can be obtained.
顯示實施例,更詳細地說明本發明。然而,本發明之技術範圍並不限定於該等實施例。 The invention is illustrated in more detail by showing examples. However, the technical scope of the present invention is not limited to the embodiments.
比較例1 Comparative example 1
向500mL燒瓶加入四氫呋喃239.6g及氯化鋰0.3g,冷卻至-60℃。對其添加含有正丁基鋰5.3g之己烷溶液(濃度15.4質量%),接著,添加二異丙胺1.4g,攪拌10分鐘。花費5分鐘對其滴加甲基丙烯酸N,N-二甲胺基乙酯(以下,略稱為DMAEMA)18.1g。滴加結束後,攪拌至利用氣相層析法無法檢測出DMAEMA為止。之後,花費30分鐘滴加甲基丙烯酸甲酯(以下,略稱為MMA)42.2g。滴加結束後,攪拌至利用氣相層析法無法檢測出MMA為止。然後,添加甲醇2.0g使活性消失。可獲得具有DMAEMA之聚合物嵌段及MMA之聚合物嵌段、數量平均分子量(Mn)為5480且分子量分佈(Mw/Mn)為1.15之嵌段共聚物。再者,數量平均分子量及重量平均分子量為將利用以N,N-二甲基甲醯胺作為溶劑之凝膠滲透層析法測得之資料利用標準聚甲基丙烯酸甲酯之分子量換算的值。 239.6 g of tetrahydrofuran and 0.3 g of lithium chloride were added to a 500 mL flask, and the mixture was cooled to -60 °C. A hexane solution (concentration: 15.4% by mass) containing 5.3 g of n-butyllithium was added thereto, and then 1.4 g of diisopropylamine was added thereto, followed by stirring for 10 minutes. To the mixture was added dropwise 18.1 g of N,N-dimethylaminoethyl methacrylate (hereinafter abbreviated as DMAEMA) over 5 minutes. After the completion of the dropwise addition, the mixture was stirred until DMAEMA could not be detected by gas chromatography. Thereafter, 42.2 g of methyl methacrylate (hereinafter abbreviated as MMA) was added dropwise over 30 minutes. After the completion of the dropwise addition, the mixture was stirred until the MMA could not be detected by gas chromatography. Then, 2.0 g of methanol was added to make the activity disappear. A block copolymer having a polymer block of DMAEMA and MMA, a block copolymer having a number average molecular weight (Mn) of 5480 and a molecular weight distribution (Mw/Mn) of 1.15 was obtained. Further, the number average molecular weight and the weight average molecular weight are values converted from the molecular weight of the standard polymethyl methacrylate measured by gel permeation chromatography using N,N-dimethylformamide as a solvent. .
對含有嵌段共聚物之液體添加乙酸乙酯80mL。接著,利用水清洗3次。然後,使獲得之聚合物溶解於丙二醇1-單甲醚2-乙酸酯(PGMEA)。相對於DMAEMA 1莫耳加入0.8莫耳之苄基氯(以下,略稱為 BzCl)。以固形物成分濃度成為35%之方式,加入由PGMEA 70質量%及1-甲氧基-2-丙醇(以下,略稱為PGME)30質量%構成之混合液。然後,於80℃熟成5小時,從而獲得無機粒子用分散劑A。 80 mL of ethyl acetate was added to the liquid containing the block copolymer. Next, it was washed three times with water. Then, the obtained polymer was dissolved in propylene glycol 1-monomethyl ether 2-acetate (PGMEA). Add 0.8 mole of benzyl chloride to DMAEMA 1 Moore (hereinafter, abbreviated as BzCl). A mixed liquid composed of 70% by mass of PGMEA and 30% by mass of 1-methoxy-2-propanol (hereinafter abbreviated as PGME) was added so that the solid content concentration was 35%. Then, it was aged at 80 ° C for 5 hours to obtain a dispersant A for inorganic particles.
實施例1 Example 1
向200mL燒瓶加入四氫呋喃114.4g及氯化鋰0.1g,冷卻至-60℃。對其添加含有正丁基鋰2.1g之己烷溶液(濃度15.4質量%),接著,添加二異丙胺0.5g,攪拌10分鐘。花費5分鐘對其滴加DMAEMA 7.4g。滴加結束後,攪拌至利用氣相層析法無法檢測出DMAEMA為止。之後,花費15分鐘滴加MMA 7.2g與丙烯酸烯丙酯(以下,略稱為AMA)9.6g之混合液。滴加結束後,攪拌至利用氣相層析法無法檢測出MMA及AMA為止。然後,加入甲醇0.8g,使活性消失。可獲得具有DMAEMA之聚合物嵌段及MMA/AMA之共聚物嵌段、數量平均分子量(Mn)為6000且分子量分佈(Mw/Mn)為1.14之嵌段共聚物。 114.4 g of tetrahydrofuran and 0.1 g of lithium chloride were added to a 200 mL flask, and the mixture was cooled to -60 °C. A hexane solution (concentration: 15.4% by mass) containing 2.1 g of n-butyllithium was added thereto, and then 0.5 g of diisopropylamine was added thereto, followed by stirring for 10 minutes. It took 5 minutes to add DMAEMA 7.4g. After the completion of the dropwise addition, the mixture was stirred until DMAEMA could not be detected by gas chromatography. Thereafter, a mixture of 7.2 g of MMA and 9.6 g of allyl acrylate (hereinafter abbreviated as AMA) was added dropwise over 15 minutes. After the completion of the dropwise addition, the mixture was stirred until gas chromatography was not able to detect MMA and AMA. Then, 0.8 g of methanol was added to make the activity disappear. A block copolymer having a polymer block of DMAEMA and a copolymer block of MMA/AMA, a number average molecular weight (Mn) of 6000, and a molecular weight distribution (Mw/Mn) of 1.14 was obtained.
對含有嵌段共聚物之液體添加乙酸乙酯80mL。接著,利用水清洗3次。然後,使所得之聚合物溶解於PGMEA中。相對於DMAEMA 1莫耳加入0.8莫耳之BzCl。以固形物成分濃度成為35%之方式,加入由PGMEA 70質量%及PGME 30質量%構成之混合液。然後,於80℃熟成5小時,從而獲得無機粒子用分散劑B。 80 mL of ethyl acetate was added to the liquid containing the block copolymer. Next, it was washed three times with water. Then, the obtained polymer was dissolved in PGMEA. 0.8 mole of BzCl was added relative to DMAEMA 1 molar. A mixed liquid composed of 70% by mass of PGMEA and 30% by mass of PGME was added so that the solid content concentration was 35%. Then, it was aged at 80 ° C for 5 hours to obtain a dispersant B for inorganic particles.
實施例2 Example 2
向200mL燒瓶加入四氫呋喃101.6g及氯化鋰0.1g,冷卻至-60℃。對其添加含有正丁基鋰2.1g之己烷溶液(濃度15.4質量%),接著,添加二異丙胺0.6g,攪拌10分鐘。花費5分鐘對其滴加DMAEMA 7.3g。滴加結束後, 攪拌至利用氣相層析法無法檢測出DMAEMA為止。接著,花費15分鐘滴加丙烯酸烯丙酯(以下,略稱為AMA)9.6g與甲基丙烯酸2,2,6,6-四甲基-4-哌啶基酯(以下,略稱為TMPMA)7.2g之混合液。滴加結束後,攪拌至利用氣相層析法無法檢測出AMA及TMPMA為止。然後,加入甲醇0.8g,使活性消失。可獲得具有DMAEMA之聚合物嵌段及AMA/TMPMA之共聚物嵌段、數量平均分子量(Mn)為5780且分子量分佈(Mw/Mn)為1.16之嵌段共聚物。 To a 200 mL flask, 101.6 g of tetrahydrofuran and 0.1 g of lithium chloride were added, and the mixture was cooled to -60 °C. A hexane solution (concentration: 15.4% by mass) containing 2.1 g of n-butyllithium was added thereto, and then 0.6 g of diisopropylamine was added thereto, followed by stirring for 10 minutes. It took 5 minutes to add DMAEMA 7.3 g to it. After the drop is over, Stir until the DMAEMA cannot be detected by gas chromatography. Next, 9.6 g of allylic acrylate (hereinafter abbreviated as AMA) and 2,2,6,6-tetramethyl-4-piperidyl methacrylate (hereinafter, abbreviated as TMPMA) were added dropwise over 15 minutes. ) 7.2 g of the mixture. After the completion of the dropwise addition, the mixture was stirred until gas chromatography could not detect AMA and TMPMA. Then, 0.8 g of methanol was added to make the activity disappear. A block copolymer having a polymer block of DMAEMA and an AMA/TMPMA copolymer block having a number average molecular weight (Mn) of 5780 and a molecular weight distribution (Mw/Mn) of 1.16 was obtained.
對含有嵌段共聚物之液體添加乙酸乙酯80mL。接著,利用水清洗3次。然後,使獲得之聚合物溶解於PGMEA中。相對於DMAEMA 1莫耳加入0.8莫耳之BzCl。以固形物成分濃度成為35%之方式,加入由PGMEA 70質量%及PGME 30質量%構成之混合液。然後,於80℃熟成5小時,從而獲得無機粒子用分散劑C。 80 mL of ethyl acetate was added to the liquid containing the block copolymer. Next, it was washed three times with water. Then, the obtained polymer was dissolved in PGMEA. 0.8 mole of BzCl was added relative to DMAEMA 1 molar. A mixed liquid composed of 70% by mass of PGMEA and 30% by mass of PGME was added so that the solid content concentration was 35%. Then, it was aged at 80 ° C for 5 hours to obtain a dispersant C for inorganic particles.
比較例2 Comparative example 2
將氧化鋯粒子(日本電工公司製造,PCS60;一次粒徑15nm,比表面積65m2/g)45.0質量份、無機粒子用分散劑A 14.3質量份、及甲基乙基酮65.7質量份混合。將該混合物50g投入分散機(AIMEX公司製造,1500rpm,粒徑0.1mm之氧化鋯粒150g),並使之分散3小時,從而獲得分散液A。分散液A中之無機粒子的中值粒徑為67nm。 45.0 parts by mass of zirconia particles (manufactured by Nippon Denshi Co., Ltd., PCS60; primary particle diameter: 15 nm, specific surface area : 65 m 2 / g), 14.3 parts by mass of dispersant A for inorganic particles, and 65.7 parts by mass of methyl ethyl ketone were mixed. 50 g of this mixture was placed in a dispersing machine (manufactured by AIMEX, 1500 rpm, 150 g of zirconium oxide particles having a particle diameter of 0.1 mm), and dispersed for 3 hours to obtain a dispersion A. The median diameter of the inorganic particles in the dispersion A was 67 nm.
實施例3 Example 3
除將無機粒子用分散劑A變為無機粒子用分散劑B以外,利用與比較例2相同之方法製備分散液B。分散液B中之無機粒子的中值粒徑為45nm。 Dispersion B was prepared in the same manner as in Comparative Example 2 except that the dispersant A for inorganic particles was changed to dispersant B for inorganic particles. The median diameter of the inorganic particles in the dispersion B was 45 nm.
實施例4 Example 4
除將無機粒子用分散劑A變為無機粒子用分散劑C以外,利用與比較例2相同之方法製備分散液C。分散液C中之無機粒子之中值粒徑為44nm。 The dispersion C was prepared in the same manner as in Comparative Example 2 except that the dispersant A for the inorganic particles was changed to the dispersant C for inorganic particles. The median diameter of the inorganic particles in the dispersion C was 44 nm.
根據以上之結果,可知相較於無機粒子用分散劑A,本發明之無機粒子用分散劑B及C之緩解無機粒子之凝聚並使之分散的能力變高。 According to the above results, it is understood that the dispersing agents A and C of the inorganic particles of the present invention have a higher ability to agglomerate and disperse the inorganic particles than the dispersing agent A for inorganic particles.
比較例3 Comparative example 3
將分散液A 125質量份、二新戊四醇六丙烯酸酯50質量份、光聚合起始劑(2-甲基-1-(4-甲基苯硫基)-2-啉基丙烷-1-酮,Irgacure 907)2質量份、及甲基乙基酮325質量份混合,從而獲得硬化性組成物。 125 parts by mass of the dispersion A, 50 parts by mass of dipentaerythritol hexaacrylate, and a photopolymerization initiator (2-methyl-1-(4-methylphenylthio)-2- 2 parts by mass of morphyl propane-1-one, Irgacure 907), and 325 parts by mass of methyl ethyl ketone were mixed to obtain a curable composition.
使用#12棒式塗佈機將獲得之硬化性組成物以厚度成為2μm之方式塗佈於聚對苯二甲酸乙二酯膜上,於80℃乾燥3分鐘,使用高壓水銀燈照射400mJ/cm2之光,從而獲得硬化膜A。硬化膜A之馬氏硬度為251.2N/mm。再者,馬氏硬度係使用Picodentor測定。 The obtained curable composition was applied onto a polyethylene terephthalate film to a thickness of 2 μm using a #12 bar coater, dried at 80 ° C for 3 minutes, and irradiated with a high pressure mercury lamp at 400 mJ/cm 2 . Light, thereby obtaining a cured film A. The Martens hardness of the cured film A was 251.2 N/mm. Further, the Martens hardness was measured using a Picentor.
實施例5 Example 5
除將分散液A變為分散液B以外,利用與比較例3相同之方法獲得硬化膜。硬化膜B之馬氏硬度為290.4N/mm。 A cured film was obtained by the same method as Comparative Example 3 except that the dispersion A was changed to the dispersion B. The Martens hardness of the cured film B was 290.4 N/mm.
根據以上之結果,可知相較於使用無機粒子用分散劑A之情形,使用無機粒子用分散劑B之情形可獲得高硬度之硬化物。 From the above results, it is understood that a cured product having a high hardness can be obtained in the case where the dispersant B for inorganic particles is used as compared with the case of using the dispersant A for inorganic particles.
比較例4 Comparative example 4
將分散液A 125質量份、多官能丙烯酸胺酯(GX-8781K;第一工業製藥公司製造)50質量份、光聚合起始劑(2-甲基-1-(4-甲基苯硫基)-2-啉基丙烷-1-酮,Irgacure 907)2質量份、及甲基乙基酮325質量份混合,從而獲得硬化性組成物。 125 parts by mass of the dispersion A, 50 parts by mass of a polyfunctional acrylate (GX-8781K; manufactured by Dai-Il Pharmaceutical Co., Ltd.), a photopolymerization initiator (2-methyl-1-(4-methylphenylthio) )-2- 2 parts by mass of morphyl propane-1-one, Irgacure 907), and 325 parts by mass of methyl ethyl ketone were mixed to obtain a curable composition.
使用#12棒式塗佈機將獲得之硬化性組成物塗佈於厚度188μm之聚對苯二甲酸乙二酯膜(東洋紡織公司製造之Cosmoshine A4300)上,利用熱風循環型乾燥機於80℃乾燥3分鐘。接著,藉由集光型高壓水銀燈(以365nm、313nm、254nm之波長的光作為主成分之UV光,Eye Graphics公司製造,1燈型,120W/cm,燈高9.8cm,輸送帶速度5.7m/分鐘)照射累積照射量400mJ/cm2(254nm)之UV光,形成厚度2μm之硬化膜,從而獲得積層膜A。測定積層膜A之霧度、全光線透過率、折射率、及黃色指數(yellow index)。將其結果示於表1。 The obtained curable composition was applied to a polyethylene terephthalate film (Cosmoshine A4300 manufactured by Toyobo Co., Ltd.) having a thickness of 188 μm using a #12 bar coater, and a hot air circulation type dryer was used at 80 ° C. Dry for 3 minutes. Next, a concentrating type high-pressure mercury lamp (UV light having a wavelength of 365 nm, 313 nm, and 254 nm as a main component, manufactured by Eye Graphics, Inc., 1 lamp type, 120 W/cm, lamp height 9.8 cm, conveyor belt speed 5.7 m) /min) UV light having a cumulative irradiation amount of 400 mJ/cm 2 (254 nm) was irradiated to form a cured film having a thickness of 2 μm, thereby obtaining a laminated film A. The haze, total light transmittance, refractive index, and yellow index of the laminated film A were measured. The results are shown in Table 1.
實施例6 Example 6
除將分散液A變為分散液C以外,利用與比較例4相同之方法形成硬化膜,從而獲得積層膜C。測定積層膜C之霧度、全光線透過率、折射率、及黃色指數。將其結果示於表1。 A cured film was formed in the same manner as in Comparative Example 4 except that the dispersion A was changed to the dispersion C, whereby the laminated film C was obtained. The haze, total light transmittance, refractive index, and yellow index of the laminated film C were measured. The results are shown in Table 1.
(霧度及全光線透過率) (haze and total light transmittance)
根據JIS K 7105進行測定。使用日本電色工業股份有限公司製造之Haze Meter NDH-300A作為測定裝置。再者,全光線透過率(TT)為入射之光中,透出試樣之光的比率(%)。作為透射光線,有擴散光線及平行光線。全光線透過率為擴散光線透過率(DF)與平行光線透過率之和。 The measurement was carried out in accordance with JIS K 7105. Haze Meter NDH-300A manufactured by Nippon Denshoku Industries Co., Ltd. was used as the measuring device. Furthermore, the total light transmittance (TT) is the ratio (%) of the light that is transmitted through the sample among the incident light. As transmitted light, there are diffused rays and parallel rays. The total light transmittance is the sum of the diffused light transmittance (DF) and the parallel light transmittance.
(TT)=(DF)+(平行光線透過率) (TT)=(DF)+(parallel light transmittance)
又,霧度率(Hz)(%)為擴散光線透過率相對於全光線透過率之比率(%)。 Further, the haze ratio (Hz) (%) is a ratio (%) of the diffused light transmittance to the total light transmittance.
(Hz)=(DF)/(TT)×100 (Hz)=(DF)/(TT)×100
(折射率) (refractive index)
使用J.A.Woollam公司製造之高速光譜式橢圓儀(High-speed spectrum ellipsometer)M-2000D測得相對於589nm之光的折射率。 The refractive index with respect to light of 589 nm was measured using a High-speed spectrum ellipsometer M-2000D manufactured by J.A. Woollam.
(馬氏硬度之測定方法) (Method for measuring Martens hardness)
使用Fischer Instruments公司製造之表面被膜物性試驗機Picodentor HM500測試馬氏硬度。 The Martens hardness was tested using a surface film property tester Picodentor HM500 manufactured by Fischer Instruments.
(耐光性[黃色指數:YI]) (light resistance [yellow index: YI])
測定剛製造後之積層膜的YI。將該值定義為「YI0小時」。接著,自製造之積層膜之上方照射波長範圍300-700nm、照射強度500w/cm2之光180小時。然後,測得積層膜之YI。將該值定義為「YI 180小時」。再者,YI為表示色相自無色或白色向黃色方向偏離之程度。依據JIS K7373:2006,使用分光色彩計(NIPPON DENSHOKU SD5000)進行測定。 The YI of the laminated film immediately after the production was measured. Define this value as "YI0 hours". Next, light having a wavelength range of 300 to 700 nm and an irradiation intensity of 500 w/cm 2 was irradiated from above the produced laminated film for 180 hours. Then, the YI of the laminated film was measured. Define this value as "YI 180 hours". Further, YI is a degree indicating that the hue is deviated from colorless or white to yellow. The measurement was carried out using a spectrophotometer (NIPPON DENSHOKU SD5000) in accordance with JIS K7373:2006.
如表1所示,可知相較於使用無機粒子用分散劑A之情形,使用無機粒子用分散劑C之情形可獲得耐光性優異、具有高硬度之硬化物。又,使用無機粒子用分散劑C之情形之氧化鋯粒子的分散性良好,故而折射率變高。 As shown in Table 1, it is understood that a cured product having excellent light resistance and high hardness can be obtained in the case of using the dispersant C for inorganic particles in the case of using the dispersant A for inorganic particles. Moreover, when the dispersing agent C for inorganic particles is used, since the dispersibility of the zirconia particles is good, the refractive index becomes high.
實施例7 Example 7
向200mL燒瓶加入四氫呋喃50.8g及氯化鋰0.05g,冷卻至-60℃。對其添加含有正丁基鋰1.05g之己烷溶液(濃度15.4質量%),接著,添加二異丙胺0.3g,攪拌10分鐘。花費5分鐘對其滴加DMAEMA 3.65g。滴加結束後,攪拌至利用氣相層析法無法檢測出DMAEMA為止。接著,花費10分鐘滴加甲基丙烯酸甲酯(以下,略稱為MMA)4.8g與TMPMA 7.2g之混合液。滴加結束後,攪拌至利用氣相層析法無法檢測出MMA及TMPMA為止。然後,加入甲醇0.4g,使活性消失。可獲得具有DMAEMA之聚合物嵌段及MMA/TMPMA的共聚物嵌段、數量平均分子量(Mn)為5600且分子量分佈(Mw/Mn)為1.18之嵌段共聚物。 To a 200 mL flask, 50.8 g of tetrahydrofuran and 0.05 g of lithium chloride were added, and the mixture was cooled to -60 °C. A hexane solution (concentration: 15.4% by mass) containing 1.05 g of n-butyllithium was added thereto, and then 0.3 g of diisopropylamine was added thereto, followed by stirring for 10 minutes. It took 5 minutes to add DMAEMA 3.65 g to it. After the completion of the dropwise addition, the mixture was stirred until DMAEMA could not be detected by gas chromatography. Next, a mixture of 4.8 g of methyl methacrylate (hereinafter abbreviated as MMA) and 7.2 g of TMPMA was added dropwise over 10 minutes. After the completion of the dropwise addition, the mixture was stirred until gas chromatography could not detect MMA and TMPMA. Then, 0.4 g of methanol was added to make the activity disappear. A copolymer block having a polymer block of DMAEMA and MMA/TMPMA, a block copolymer having a number average molecular weight (Mn) of 5,600 and a molecular weight distribution (Mw/Mn) of 1.18 was obtained.
對含有嵌段共聚物之液體添加乙酸乙酯40mL。接著,利用水清洗3次。然後,使獲得之聚合物溶解於PGMEA中。相對於DMAEMA 1莫耳加入0.8莫耳之BzCl。以固形物成分濃度成為35%之方式,加入由PGMEA 70質量%及PGME 30質量%構成之混合液。其後,於80℃熟成5小時,從而獲得無機粒子用分散劑D。 To the liquid containing the block copolymer, 40 mL of ethyl acetate was added. Next, it was washed three times with water. Then, the obtained polymer was dissolved in PGMEA. 0.8 mole of BzCl was added relative to DMAEMA 1 molar. A mixed liquid composed of 70% by mass of PGMEA and 30% by mass of PGME was added so that the solid content concentration was 35%. Thereafter, the mixture was aged at 80 ° C for 5 hours to obtain a dispersant D for inorganic particles.
使用無機粒子用分散劑D,以與上述相同之方式製作硬化性組成物及硬化膜。相較於使用無機粒子用分散劑A之情形,使用無機粒子用分散劑D之情形之硬化膜的耐光性優異。 A curable composition and a cured film were produced in the same manner as described above using the dispersant D for inorganic particles. In the case where the dispersant A for inorganic particles is used, the cured film using the dispersant D for inorganic particles is excellent in light resistance.
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| TWI774874B (en) * | 2017-11-15 | 2022-08-21 | 日商可樂麗股份有限公司 | (Meth)acrylic block copolymer and active energy ray curable composition containing the same |
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| US20220175812A1 (en) | 2020-12-03 | 2022-06-09 | Battelle Memorial Institute | Polymer nanoparticle and dna nanostructure compositions and methods for non-viral delivery |
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| TWI774874B (en) * | 2017-11-15 | 2022-08-21 | 日商可樂麗股份有限公司 | (Meth)acrylic block copolymer and active energy ray curable composition containing the same |
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