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TW201343552A - 高純度SiO2之製法 - Google Patents

高純度SiO2之製法 Download PDF

Info

Publication number
TW201343552A
TW201343552A TW102104219A TW102104219A TW201343552A TW 201343552 A TW201343552 A TW 201343552A TW 102104219 A TW102104219 A TW 102104219A TW 102104219 A TW102104219 A TW 102104219A TW 201343552 A TW201343552 A TW 201343552A
Authority
TW
Taiwan
Prior art keywords
cerium oxide
washing
zone
precipitation
sio
Prior art date
Application number
TW102104219A
Other languages
English (en)
Chinese (zh)
Inventor
Juergen Erwin Lang
Hartwig Rauleder
Bodo Frings
Christian Panz
Original Assignee
Evonik Degussa Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Evonik Degussa Gmbh filed Critical Evonik Degussa Gmbh
Publication of TW201343552A publication Critical patent/TW201343552A/zh

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/187Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates
    • C01B33/193Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates of aqueous solutions of silicates
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/141Preparation of hydrosols or aqueous dispersions
    • C01B33/142Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates
    • C01B33/143Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates of aqueous solutions of silicates
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/51Particles with a specific particle size distribution
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/51Particles with a specific particle size distribution
    • C01P2004/53Particles with a specific particle size distribution bimodal size distribution

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
TW102104219A 2012-02-21 2013-02-04 高純度SiO2之製法 TW201343552A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE201210202587 DE102012202587A1 (de) 2012-02-21 2012-02-21 Verfahren zur Herstellung von hochreinem SiO2

Publications (1)

Publication Number Publication Date
TW201343552A true TW201343552A (zh) 2013-11-01

Family

ID=47710140

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102104219A TW201343552A (zh) 2012-02-21 2013-02-04 高純度SiO2之製法

Country Status (3)

Country Link
DE (2) DE102012202587A1 (fr)
TW (1) TW201343552A (fr)
WO (1) WO2013124166A1 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111892059B (zh) * 2020-08-19 2023-04-25 昆明理工大学 一种高纯石英砂的制备方法
CN116194405A (zh) * 2020-10-01 2023-05-30 堺化学工业株式会社 含硼的二氧化硅分散体和其制造方法
CN114735712A (zh) * 2022-04-25 2022-07-12 吉林省临江天元催化剂有限公司 一种硅藻土的提纯方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1282008B (de) * 1964-12-16 1968-11-07 Degussa Verfahren zur Reinigung von gefaellten Kieselsaeuren und/oder Silicaten
DE2855251A1 (de) * 1978-12-21 1980-07-03 Mittex Ag Verfahren und vorrichtung zum herstellen von silikagel
US5100581A (en) 1990-02-22 1992-03-31 Nissan Chemical Industries Ltd. Method of preparing high-purity aqueous silica sol
AU2007226533B2 (en) 2006-03-15 2012-12-13 Reaction Sciences, Inc. Method for making silicon for solar cells and other applications
US20110262336A1 (en) 2008-09-30 2011-10-27 Hartwig Rauleder Production of solar-grade silicon from silicon dioxide
WO2010037705A1 (fr) * 2008-09-30 2010-04-08 Evonik Degussa Gmbh Procédé de préparation de sio2 de grande pureté à partir de solutions silicate
EP2481245A1 (fr) 2009-09-24 2012-08-01 Nokia Siemens Networks OY Procédé pour commander dynamiquement la puissance de transmission de liaison montante d'un équipement utilisateur
US8609068B2 (en) * 2010-02-24 2013-12-17 J.M. Huber Corporation Continuous silica production process and silica product prepared from same

Also Published As

Publication number Publication date
DE112013001058A5 (de) 2014-12-11
WO2013124166A1 (fr) 2013-08-29
DE102012202587A1 (de) 2013-08-22

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