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TW201328655A - Intervertebral implant - Google Patents

Intervertebral implant Download PDF

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Publication number
TW201328655A
TW201328655A TW101148188A TW101148188A TW201328655A TW 201328655 A TW201328655 A TW 201328655A TW 101148188 A TW101148188 A TW 101148188A TW 101148188 A TW101148188 A TW 101148188A TW 201328655 A TW201328655 A TW 201328655A
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TW
Taiwan
Prior art keywords
implant
lower wall
intervertebral implant
wall
intervertebral
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Application number
TW101148188A
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Chinese (zh)
Inventor
Lutz Biedermann
Wilfried Matthis
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Biedermann Technologies Gmbh
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Publication of TW201328655A publication Critical patent/TW201328655A/en

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Abstract

An intervertebral implant is provided comprising a single piece hollow body with an upper wall (1) configured to engage a first vertebral end plate and a lower wall (2) configured to engage a second vertebral end plate, with two opposite sidewalls (3, 4) connecting the upper wall and the lower wall, respectively, and with a load transmitting part configured to transmit load between the upper wass and the lower wall; wherein the body is configured to assume a compressed condition in which a distance between the upper wall (1) and the lower wall (2) defines a first height (h1) of the implant and an expanded condition in which the distance between the upper wall (1) and the lower wall (2) defines a second height (h2) of the implant that is greater than the first height (h1); and wherein the implant is made of a material that exhibits shape memory properties.

Description

椎間植入物 Intervertebral implant

本發明係關於椎間植入物,包括製成單件式之空心本體,有構成結合第一椎骨終板之上壁,構成結合第二椎骨終板之下壁,連接上壁和下壁之二對立側壁,以及負荷傳輸組件,構成在上壁和下壁之間傳輸負荷。植入物可呈壓縮狀態,具有第一高度和第一寬度,以及擴張狀態,具有第二高度,大於第一高度。植入物由顯示形狀記憶性質的材料製成,使得植入物加熱時可呈擴張狀態。 The invention relates to an intervertebral implant, comprising a single-piece hollow body, which is configured to be combined with the upper wall of the first vertebral endplate, and is configured to join the lower wall of the second vertebral endplate, connecting the upper wall and the lower wall. Two opposing side walls, and a load transfer assembly, constitute a load transfer between the upper and lower walls. The implant can be in a compressed state having a first height and a first width, and an expanded state having a second height that is greater than the first height. The implant is made of a material that exhibits shape memory properties such that the implant can be in an expanded state when heated.

US 2003/0105631 A1記載由形狀記憶材料製成之隔體,用於容易插入椎間空間內。適合人造椎間盤置換手術之已知隔體,包括形狀記憶材料件,在插入之前可撐平或壓時,在定位後,可呈所需之雙凸面形狀。 US 2003/0105631 A1 describes a spacer made of a shape memory material for easy insertion into the intervertebral space. Known spacers suitable for artificial disc replacement surgery, including shape memory material members, which can be flattened or pressed prior to insertion, can be in the desired biconvex shape after positioning.

使用形狀記憶性能之金屬其他椎間盤補缺術,也已公知。例如US 2009/0076613 A1記載一種椎間盤補缺術,包含基板、頂板,以及配置在基板和頂板間之至少二彈簧,其中彈簧各有圈形段,以及分別連接至基板和頂板之二端。彈簧可由形狀記憶合金製成。 Other types of intervertebral disc filling techniques using shape memory properties are also known. For example, US 2009/0076613 A1 describes a disc replacement procedure comprising a substrate, a top plate, and at least two springs disposed between the substrate and the top plate, wherein the springs each have a ring segment and are connected to the two ends of the substrate and the top plate, respectively. The spring can be made of a shape memory alloy.

本發明之目的,在於提供一種椎間植入物,可用於例如椎間盤置換,設計簡單,組件少,處置方便。 It is an object of the present invention to provide an intervertebral implant that can be used, for example, for intervertebral disc replacement, that is simple in design, has fewer components, and is convenient to handle.

此目的係由申請專利範圍第1項之椎間植入物解決。進一步發展列於申請專利範圍附屬項。 This object is solved by the intervertebral implant of claim 1 of the patent application. Further developments are listed in the scope of the patent application.

椎間植入物係單件式植入物,在壓縮狀態時維度小,容許在至少一空間方向擴張。在擴張狀態時,構成將負荷從一椎骨傳輸到另一椎骨。植入物在擴張狀態之形狀,可預變形,在植入物插入並達體溫時,即自動達成擴張狀態。 An intervertebral implant is a one-piece implant that is small in size in the compressed state and allows for expansion in at least one spatial direction. In the expanded state, the configuration transfers the load from one vertebra to the other. The shape of the implant in the expanded state can be pre-deformed, and the expanded state is automatically achieved when the implant is inserted and reaches body temperature.

植入物在壓縮狀態之小型設計,方便椎間植入物插入。具有 圓滑壁部時,可首先引進入椎間空間內,更加方便插入。在壓縮狀態時,可保護椎間端板不與植入物上的結合部結合,得以安全且方便處置。在擴張狀態時,椎間植入物可藉與椎骨端板結合而保固。 The small design of the implant in a compressed state facilitates the insertion of the intervertebral implant. have When the wall is smooth, it can be introduced into the intervertebral space first, which is more convenient for insertion. In the compressed state, the intervertebral endplate can be protected from bonding to the joint on the implant for safe and convenient handling. In the expanded state, the intervertebral implant can be secured by engagement with the vertebral endplate.

本發明其他特點和優點,由附圖所示具體例之說明,即可明瞭。 Other features and advantages of the present invention will be apparent from the description of the embodiments illustrated in the appended claims.

1‧‧‧上壁 1‧‧‧Upper wall

1a,1b‧‧‧上壁部 1a, 1b‧‧‧ upper wall

2‧‧‧下壁 2‧‧‧ Lower wall

2a,2b‧‧‧下壁部 2a, 2b‧‧‧ lower wall

3,4‧‧‧側壁 3,4‧‧‧ side wall

5‧‧‧結合部 5‧‧‧Combination

5a‧‧‧銳利自由邊緣 5a‧‧‧ sharp free edge

6‧‧‧隆部 6‧‧‧Long

6a‧‧‧下壁之凹部 6a‧‧‧The recess of the lower wall

7‧‧‧開縫 7‧‧‧ slitting

8‧‧‧支柱 8‧‧‧ pillar

8a‧‧‧第一端 8a‧‧‧ first end

8b‧‧‧第二端 8b‧‧‧second end

8c‧‧‧開縫 8c‧‧‧ slit

9‧‧‧側向凸部 9‧‧‧ Lateral convex

10,10',10"‧‧‧椎間植入物 10,10',10"‧‧‧ intervertebral implants

20‧‧‧掣子或棘輪鎖定部 20‧‧‧掣子 or ratchet lock

50‧‧‧壓縮裝置 50‧‧‧Compression device

51‧‧‧夾持具 51‧‧‧Clamps

52‧‧‧支持表面 52‧‧‧Support surface

53‧‧‧壓板 53‧‧‧ pressure plate

54‧‧‧壓板凸部 54‧‧‧ platen convex

60,60',60"‧‧‧插入裝置 60,60',60"‧‧‧ insertion device

61‧‧‧套筒 61‧‧‧ sleeve

61a‧‧‧套筒第一端 61a‧‧‧ first end of the sleeve

61b‧‧‧套筒第二端 61b‧‧‧Sleeve second end

62‧‧‧柄部 62‧‧‧ handle

63,63'‧‧‧握爪 63,63'‧‧‧ gripper

63a,63b,63a',63b'‧‧‧臂部 63a, 63b, 63a', 63b'‧‧‧ Arms

64‧‧‧插銷 64‧‧‧Latch

65‧‧‧把手 65‧‧‧Hands

67‧‧‧握爪 67‧‧‧ gripper

67a‧‧‧握爪前部 67a‧‧‧The front of the grip

68‧‧‧插銷 68‧‧‧Latch

69‧‧‧圓筒形凹部 69‧‧‧Cylindrical recess

80,81‧‧‧支柱 80,81‧‧ ‧ pillar

80a,81a‧‧‧支柱第一端 80a, 81a‧‧ ‧ the first end of the pillar

80b,81b‧‧‧支柱第二端 80b, 81b‧‧‧ pillar second end

l‧‧‧植入物長度 l‧‧‧Implant length

h1‧‧‧第一高度 h 1 ‧‧‧first height

h2‧‧‧第二高度 h 2 ‧‧‧second height

w1‧‧‧上壁和下壁之寬度 w 1 ‧‧‧Width of upper and lower walls

w2‧‧‧植入物擴張狀態之寬度 w 2 ‧‧‧Width of the expanded state of the implant

A‧‧‧縱軸線 A‧‧‧ longitudinal axis

第1圖為第一具體例椎間植入物呈壓縮狀態之透視圖;第2圖為第1圖所示椎間植入物之側視圖;第3圖為第1圖所示椎間植入物之俯視圖;第4圖為第1圖所示椎間植入物之另一側視圖;第5圖為第一具體例椎間植入物呈中間狀態之透視圖;第6圖為第5圖所示椎間植入物之側視圖;第7圖為第5圖所示椎間植入物之俯視圖;第8圖為第5圖所示椎間植入物之另一側視圖;第9圖為第一具體例椎間植入物呈擴張狀態之透視圖;第10圖為第9圖所示椎間植入物之側視圖;第11圖為第9圖所示椎間植入物之俯視圖;第12圖為第9圖所示椎間植入物之另一側視圖;第13圖為椎間植入物壓縮裝置連同插入其內的椎間植入物呈擴張狀態之透視圖;第14圖為第13圖所示裝置連同植入物之側視圖;第15圖為第13圖所示裝置連同植入物之另一側視圖;第16圖為椎間植入物壓縮裝置連同插入並壓縮的椎間植入物之透視圖;第17圖為第16圖所示裝置連同植入物之側視圖;第18圖為第16圖所示裝置連同植入物之另一側視圖;第19圖為椎間植入物插入裝置第一具體例之透視圖;第20圖為第19圖所示裝置在第一狀態之部份放大圖;第21圖為第19圖所示裝置在第二狀態之部份放大圖; 第22至27圖為椎間植入物插入二椎骨間之步驟簡圖;第28a圖為椎間植入物插入椎間空間內呈擴張狀態之前視圖;第28b和28c圖為第28a圖之細部放大圖;第29圖為椎間植入物插入椎間空間內呈擴張狀態之側視圖;第30至32圖分別為椎間植入物呈擴張狀態連同第二具體例插入裝置之透視圖、側視圖和俯視圖;第33至35圖分別為椎間植入物呈壓縮狀態連同所附第二具體例插入裝置之透視圖、側視圖和俯視圖;第36至38圖分別為第二具體例椎間植入物呈擴張狀態連同第三具體例插入裝置之透視圖、側視圖和俯視圖;第39至41圖分別為第二具體例椎間植入物呈壓縮狀態連同所附第三具體例插入裝置之透視圖、側視圖和俯視圖;第42圖為第三具體例椎間植入物之側視圖。 1 is a perspective view showing a compressed state of the intervertebral implant of the first specific example; FIG. 2 is a side view of the intervertebral implant shown in FIG. 1; and FIG. 3 is an intervertebral implant shown in FIG. A top view of the implant; FIG. 4 is another side view of the intervertebral implant shown in FIG. 1; FIG. 5 is a perspective view of the first embodiment of the intervertebral implant in an intermediate state; 5 is a side view of the intervertebral implant; FIG. 7 is a plan view of the intervertebral implant shown in FIG. 5; and FIG. 8 is another side view of the intervertebral implant shown in FIG. 5; Figure 9 is a perspective view showing the first embodiment of the intervertebral implant in an expanded state; Figure 10 is a side view of the intervertebral implant shown in Figure 9; and Figure 11 is an intervertebral implant shown in Figure 9. a top view of the implant; Fig. 12 is another side view of the intervertebral implant shown in Fig. 9; and Fig. 13 is an intervertebral implant compression device with an intervertebral implant inserted therein in an expanded state Fig. 14 is a side view of the device shown in Fig. 13 together with the implant; Fig. 15 is another side view of the device shown in Fig. 13 together with the implant; Fig. 16 is an intervertebral implant Compression device along with insertion and compression a perspective view of the intervertebral implant; Figure 17 is a side view of the device shown in Figure 16 along with the implant; Figure 18 is another side view of the device shown in Figure 16 along with the implant; Figure 19 A perspective view of a first embodiment of the intervertebral implant insertion device; a 20th view is a partial enlarged view of the device shown in Fig. 19; and a 21st view is a device shown in Fig. 19 in the second state. Partially enlarged view; Figures 22 to 27 are schematic diagrams of the steps of insertion of intervertebral implants between the two vertebrae; Fig. 28a is a front view of the intervertebral implant inserted into the intervertebral space in an expanded state; and Figs. 28b and 28c are diagrams of Fig. 28a Detailed view of the detail; Figure 29 is a side view of the intervertebral implant inserted into the intervertebral space in an expanded state; and Figs. 30 to 32 are perspective views of the intervertebral implant in an expanded state together with the insertion device of the second specific example, respectively. , side view and top view; Figures 33 to 35 are respectively a perspective view, a side view and a top view of the intervertebral implant in a compressed state together with the second embodiment of the insertion device; Figures 36 to 38 are respectively a second specific example The intervertebral implant is in an expanded state together with a perspective view, a side view and a top view of the third embodiment insertion device; FIGS. 39 to 41 are respectively a second embodiment of the intervertebral implant in a compressed state together with the attached third specific example A perspective view, a side view, and a top view of the insertion device; and Fig. 42 is a side view of the intervertebral implant of the third embodiment.

如第1至4圖所示,第一具體例之椎間植入物10,係單件式空心本體,包括上壁1、下壁2,以及連接上壁1和下壁2間之側壁3,4。上壁1和下壁2之長度l,使椎間植入物可完全容納入二椎骨間之椎間空間內。上壁1和下壁2之寬度w1,比長度l小。諸壁之厚度和維度使植入物實質上形成平板條製成的閉圈,如第2圖所示。具體而言,維度使植入物包括有能力可呈第1至4圖所示壓縮狀態,其中上壁和下壁間之距離最小,並界定植入物之第一高度h1,以及呈第9至12圖所示擴張狀態,其中上壁1和下壁2間之距離最大,並界定植入物之第二高度h2。側壁3,4向外彎曲,故呈圓滑形狀,以方便植入物插入椎間空間內。 As shown in Figures 1 to 4, the intervertebral implant 10 of the first embodiment is a one-piece hollow body comprising an upper wall 1, a lower wall 2, and a side wall 3 connecting the upper wall 1 and the lower wall 2 , 4. The length l of the upper wall 1 and the lower wall 2 allows the intervertebral implant to be completely accommodated in the intervertebral space between the two vertebrae. The width w 1 of the upper wall 1 and the lower wall 2 is smaller than the length l. The thickness and dimensions of the walls cause the implant to substantially form a closed loop made of flat strips, as shown in Figure 2. In particular, the dimensions include the ability of the implant to be in a compressed state as shown in Figures 1 through 4, wherein the distance between the upper and lower walls is minimal and defines the first height h 1 of the implant, and The expanded state shown in Figures 9 to 12, wherein the distance between the upper wall 1 and the lower wall 2 is the largest and defines the second height h 2 of the implant. The side walls 3, 4 are outwardly curved so that they are rounded to facilitate insertion of the implant into the intervertebral space.

在上壁1和下壁2設有複數結合部5。結合部5呈肋條形狀,有實質上銳利自由邊緣5a,向外彎入側壁方向。肋條延伸跨越椎間植入物全寬。在圖示具體例中,肋條成組群配置,在長度方向偏離椎間植入物中心。側壁3,4和肋條5間,於上壁1和下壁2設有隆部6,在寬度方向延伸跨越諸壁。隆部6相對於結合部5在壓縮狀態之高度(詳見第2圖),使隆部6阻止結合部5與椎骨端板在插入過程中結合。 A plurality of joint portions 5 are provided on the upper wall 1 and the lower wall 2. The joint portion 5 has a rib shape and has a substantially sharp free edge 5a which is bent outward into the side wall direction. The ribs extend across the full width of the intervertebral implant. In the specific example shown, the ribs are arranged in groups and are offset from the center of the intervertebral implant in the longitudinal direction. Between the side walls 3, 4 and the ribs 5, a ridge portion 6 is provided on the upper wall 1 and the lower wall 2, extending across the walls in the width direction. The height of the ridge 6 relative to the joint 5 in the compressed state (see Figure 2 for details) causes the ridge 6 to prevent the joint 5 from engaging with the vertebral endplate during insertion.

椎間植入物又包括二對立開縫7,延伸貫穿側壁3,4以及上 壁1和下壁2,直到在長度方向離植入物中心有一段距離。開縫7長度由俯視大於開縫間之距離,見第3圖。因此,椎間植入物俯視圖(如第3圖所示),為實質上H形。利用開縫7,把植入物分叉成各半,形成第一和第二上壁部1a,1b,以及第一和第二下壁部2a,2b,如第3和4圖所示。 The intervertebral implant further includes two opposing slits 7, extending through the side walls 3, 4 and above Wall 1 and lower wall 2 are at a distance from the center of the implant in the length direction. The length of the slit 7 is larger than the distance between the slits in a plan view, see Fig. 3. Thus, the top view of the intervertebral implant (as shown in Figure 3) is substantially H-shaped. The slits are bifurcated into the respective halves by the slits 7, and the first and second upper wall portions 1a, 1b, and the first and second lower wall portions 2a, 2b are formed as shown in Figs.

植入物在長度方向的中心設有支柱8,具有第一端8a和第二端8b。第一端8a與上壁1形成單件。第二端8b游離。支柱8在寬度方向的厚度,使其可變形。如第1和2圖所示,支柱8可變形到在植入物於第8圖所示壓縮狀態時,以位於第一端8a和第二端8b間之一部位碰到下壁2,並界定上壁1和下壁2在高度方向之距離,即為植入物之第一高度h1。參見第9和10圖,在擴張狀態時,支柱實質上垂直延伸,或相對於高度方向稍呈角度。當植入物在擴張狀態時,支柱之自由端8b受到下壁2支持。支柱8在下壁2內側可設有掣子或棘輪鎖定部20,例如第28c圖所示。此等掣子20可例如為前淺凹凸部,掣止支柱8之自由端8b。再者,開縫8c從自由端8b按第一端8a方向延伸貫穿支柱,使支柱亦開叉,詳見第9和12圖。 The implant is provided with a post 8 at the center in the longitudinal direction, having a first end 8a and a second end 8b. The first end 8a forms a single piece with the upper wall 1. The second end 8b is free. The thickness of the strut 8 in the width direction makes it deformable. As shown in Figures 1 and 2, the post 8 is deformable to encounter the lower wall 2 at a location between the first end 8a and the second end 8b when the implant is in the compressed state shown in Figure 8, and The distance between the upper wall 1 and the lower wall 2 in the height direction is defined as the first height h 1 of the implant. Referring to Figures 9 and 10, in the expanded state, the struts extend substantially vertically or at an angle relative to the height direction. When the implant is in the expanded state, the free end 8b of the strut is supported by the lower wall 2. The strut 8 may be provided with a detent or ratchet locking portion 20 on the inner side of the lower wall 2, as shown, for example, in Figure 28c. These dice 20 can be, for example, a front shallow concavity that terminates the free end 8b of the strut 8. Further, the slit 8c extends from the free end 8b in the direction of the first end 8a through the struts so that the struts are also split, as shown in Figures 9 and 12.

椎間植入物構成呈二末端狀態和其間之中間狀態;即壓縮狀態,上壁1和下壁2間在高度方向之距離最小,見第1至4圖;和擴張狀態,上壁1和下壁2間之距離最大,如第9至12圖所示。第5至8圖則表示中間狀態,上壁1和下壁2間之距離,尚未達高度方向之全距離。 The intervertebral implant is in a state of two ends and an intermediate state therebetween; that is, a compressed state, the distance between the upper wall 1 and the lower wall 2 in the height direction is the smallest, see Figures 1 to 4; and the expanded state, the upper wall 1 and The distance between the lower walls 2 is the largest, as shown in Figures 9-12. Figures 5 to 8 show the intermediate state, the distance between the upper wall 1 and the lower wall 2, which has not yet reached the full distance in the height direction.

參見第5至12圖,在中間和擴張狀態,上壁1和下壁2間之距離增加,故植入物高度亦增。開縫7也擴張呈V形,寬度向側壁遞增。以致上壁部1a,1b和下壁部2a,2b在背離植入物之方向,分別增加彼此距離。因此,詳見第12圖,椎間植入物俯視稍微X形。所以,植入物寬度在中間和擴張狀態,較壓縮狀態增加。因此,椎間植入物構成在二空間方向,以三維度擴張。 Referring to Figures 5 to 12, in the intermediate and expanded state, the distance between the upper wall 1 and the lower wall 2 is increased, so that the height of the implant is also increased. The slit 7 also expands into a V shape, and the width increases toward the side wall. The upper wall portions 1a, 1b and the lower wall portions 2a, 2b are respectively increased in distance from each other in the direction away from the implant. Thus, as seen in Figure 12, the intervertebral implant is slightly X-shaped in plan view. Therefore, the width of the implant is in the middle and in the expanded state, which is increased compared to the compressed state. Therefore, the intervertebral implant is configured to expand in three dimensions in three dimensions.

在擴張狀態時之側視圖如第10圖所示,鄰近側壁之部位包括實質上V形斷面。在植入物中心部份,上壁1和下壁2彼此距離最大。隆部6不再凸出於結合部5以上。所以,結合部5從上、下壁凸出,可結合椎骨之端板。 The side view in the expanded state is shown in Fig. 10, and the portion adjacent to the side wall includes a substantially V-shaped cross section. In the central portion of the implant, the upper wall 1 and the lower wall 2 are at a maximum distance from each other. The ridge portion 6 no longer protrudes above the joint portion 5. Therefore, the joint portion 5 protrudes from the upper and lower walls and can be combined with the end plate of the vertebra.

椎間植入物係由形狀記憶材料製成。此類似形狀記憶材料可 例如為形狀記憶合金,諸如顯示形狀記憶性質之某些鎳鈦合金,尤其是鎳鈦諾(Nitinol)。材料亦可為形狀記憶聚合物材料。 The intervertebral implant system is made of a shape memory material. This similar shape memory material can For example, shape memory alloys, such as certain nickel titanium alloys that exhibit shape memory properties, especially Nitinol. The material can also be a shape memory polymer material.

形狀記憶材料之形狀記憶效果,係材料內部在過渡溫度時之相過渡的結果。椎間植入物可製造成在大約體溫或在體溫以下之預定溫度時,呈預變形之擴張狀態,如第9至12圖所示。然後把植入物冷卻並壓縮到呈壓縮狀態。可用例如第13至18圖所示裝置進行壓縮。植入物之壓縮裝置50,包括夾持具51,容納植入物10,並包括支持表面52,以支持例如植入物上壁1。設有壓板53,構成施壓於植入物之對立壁,在圖示例中為下壁2。壓板包括凸部54,在壓板任一端朝支持表面延伸。凸部54做為側向檔件,在高度方向壓縮時,防止植入物在寬度方向進一步擴張。又設有作動器,使壓板53朝下運動。 The shape memory effect of the shape memory material is the result of the phase transition inside the material at the transition temperature. The intervertebral implant can be fabricated in a pre-deformed expanded state at about a predetermined temperature below body temperature or below body temperature, as shown in Figures 9-12. The implant is then cooled and compressed to a compressed state. Compression can be performed using, for example, the apparatus shown in Figures 13-18. The implant compression device 50 includes a holder 51 that houses the implant 10 and includes a support surface 52 to support, for example, the implant upper wall 1. A pressure plate 53 is provided to form a counter wall that is pressed against the implant, which in the illustrated example is the lower wall 2. The pressure plate includes a projection 54 that extends toward either side of the support surface at either end of the pressure plate. The convex portion 54 serves as a lateral step member for preventing the implant from further expanding in the width direction when compressed in the height direction. An actuator is also provided to move the pressure plate 53 downward.

植入物之壓縮可在冷卻狀態下為之,把植入物冷卻到過渡溫度以下。植入物保持壓縮狀態,除非加熱到過渡溫度以上。 The compression of the implant can be in a cooled state to cool the implant below the transition temperature. The implant remains compressed unless heated above the transition temperature.

茲參見第19至21圖說明椎間植入物10插入工具之第一具體例。工具60包括套筒61,有第一端61a和對立第二端61b。柄部62可設在套筒61上,例如接近第二端61b。套筒內設有握爪63之作動部(圖上未示)。握爪63在第一端61a伸出套筒外。握爪為叉形,有二臂部63a,63b,可呈張開狀態,如第20圖所示,臂部63a,63b彼此距離大於植入物寬度,和收斂狀態,如第21圖所示,臂部63a,63b彼此距離較小,在臂部63a,63b末端的插銷64指向叉內側,可結合植入物。可設把手65,連接到作動器。在一方向轉動手把,即把握爪拉入套筒61內,如第20圖所示,使臂部63a,63b收斂,如第21圖所示。臂部長度實質上相當於植入物在壓縮狀態之長度,因此如第23圖所示,當植入物10被一側壁3之插銷64結合時,另一側壁4即頂住臂部末端。 A first specific example of the intervertebral implant 10 insertion tool will be described with reference to Figs. The tool 60 includes a sleeve 61 having a first end 61a and an opposite second end 61b. The handle 62 can be provided on the sleeve 61, for example near the second end 61b. An actuator (not shown) of the gripper 63 is provided in the sleeve. The gripper 63 extends beyond the sleeve at the first end 61a. The gripper has a fork shape and has two arm portions 63a, 63b which can be in an open state. As shown in Fig. 20, the arm portions 63a, 63b are apart from each other by a distance greater than the width of the implant, and a convergent state, as shown in Fig. 21. The arms 63a, 63b are at a small distance from each other, and the pins 64 at the ends of the arms 63a, 63b are directed toward the inside of the fork to engage the implant. A handle 65 can be provided to connect to the actuator. The handle is rotated in one direction, that is, the grip claw is pulled into the sleeve 61, and as shown in Fig. 20, the arm portions 63a, 63b are converged as shown in Fig. 21. The length of the arm substantially corresponds to the length of the implant in the compressed state, so that as shown in Fig. 23, when the implant 10 is joined by the pin 64 of one side wall 3, the other side wall 4 bears against the end of the arm.

茲參見第22至29圖說明椎間植入物10之使用。如第22圖所示,椎間植入物以插入裝置60夾取之前,呈壓縮狀態。如第23圖所示,植入物夾在握爪63的臂部63a,63b之間,使插銷64結合植入物之一側,對立側則頂住叉形握爪的底部。因此,椎間植入物即被握爪牢牢把持。 The use of the intervertebral implant 10 is illustrated in Figures 22-29. As shown in Fig. 22, the intervertebral implant is in a compressed state prior to being grasped by the insertion device 60. As shown in Fig. 23, the implant is sandwiched between the arms 63a, 63b of the gripper 63 such that the latch 64 engages one side of the implant and the opposite side bears against the bottom of the fork grip. Therefore, the intervertebral implant is firmly held by the gripper.

然後,把椎間植入物使用側向進路引入椎間空間內,見第24至26圖。如第24圖所示,臂部63a,63b圓滑邊緣和圓滑側邊3,4,可供 滑順插入植入物。由第25圖可見,在植入物壓縮狀態之隆部6,其高度和結合部5之頂峰5a相同或稍高,故在插入之際,隆部之圓滑形狀可保護椎骨端板,不受結合部5之傷害。在第26圖所示最後插入狀態時,被握爪臂部夾持之植入物10,已完全引進。再開啟握爪63之臂部63a,63b,小心除去插入裝置。詳見第27圖,植入物仍然在壓縮狀態。利用體熱的作用,植入物開始擴張如第28a圖所示,因而擴大椎間空間。在擴張狀態,結合部5結合椎骨端板,以防止椎間植入物移動。支柱8最後實質上垂直延伸,會被掣子20所拘,見第28b和28c圖。在擴張狀態,支柱另外承載作用於上壁之負荷,傳輸至下壁。於擴張之際,椎間植入物亦在寬度方向擴張,如第29圖所示,因而容許負荷轉移於更大寬度,使植入物更為穩定。 The intervertebral implant is then introduced into the intervertebral space using a lateral approach, see Figures 24-26. As shown in Fig. 24, the rounded edges of the arms 63a, 63b and the rounded sides 3, 4 are available. Smooth insertion into the implant. As can be seen from Fig. 25, the height of the ridge portion 6 in the compressed state of the implant is the same as or slightly higher than the peak 5a of the joint portion 5, so that the rounded shape of the ridge portion protects the vertebral end plate at the time of insertion. The damage of the joint portion 5. At the final insertion state shown in Fig. 26, the implant 10 held by the grip arm portion has been completely introduced. The arms 63a, 63b of the gripper 63 are then opened and the insertion device is carefully removed. See Figure 27 for details, the implant is still in compression. Using the action of body heat, the implant begins to expand as shown in Figure 28a, thus expanding the intervertebral space. In the expanded state, the joint 5 is combined with the vertebral endplate to prevent movement of the intervertebral implant. The struts 8 eventually extend substantially vertically and are held by the scorpion 20, see Figures 28b and 28c. In the expanded state, the strut additionally carries a load acting on the upper wall and is transmitted to the lower wall. At the time of expansion, the intervertebral implant also expands in the width direction, as shown in Fig. 29, thus allowing the load to be transferred to a greater width, making the implant more stable.

參見第30至35圖,表示插入裝置之第二具體例。插入裝置60'包括握爪67,有前部67a,插銷68由此按握爪67縱軸線A之垂直方向,延伸到離前部67a一段距離。插銷68長度比開縫7寬度小,見第32圖,使插銷68可在植入物擴張狀態,進出植入物。插銷68外表面和握爪67的圓滑前部67a間之距離,實質上相當於側壁3,4之厚度,因此當插銷結合植入物時,如第34圖所示,握爪可牢牢持有植入物。 Referring to Figures 30 to 35, a second specific example of the insertion device is shown. The insertion device 60' includes a grip 67 having a front portion 67a whereby the latch 68 extends in a vertical direction of the longitudinal axis A of the grip 67 to a distance from the front portion 67a. The length of the latch 68 is less than the width of the slit 7, see Fig. 32, so that the latch 68 can be moved into and out of the implant while the implant is in an expanded state. The distance between the outer surface of the latch 68 and the rounded front portion 67a of the gripper 67 substantially corresponds to the thickness of the side walls 3, 4, so that when the latch is combined with the implant, as shown in Fig. 34, the gripper can be held firmly There are implants.

使用時,插入裝置60'聯結於擴張狀態之植入物。再將植入物以附設插入裝置壓縮。在壓縮狀態,握爪和植入物彼此連接。然後,把植入物插入椎間空間。俟植入物擴張後,除去握爪,因插銷68長度比開縫7寬度小。 In use, the insertion device 60' is coupled to the implant in an expanded state. The implant is then compressed with an attached insertion device. In the compressed state, the gripper and the implant are connected to each other. The implant is then inserted into the intervertebral space. After the implant has been expanded, the grip is removed because the length of the latch 68 is less than the width of the slit 7.

參見第36至41圖說明椎間植入物第二具體例和插入裝置第三具體例。 A third embodiment of the intervertebral implant and a third embodiment of the insertion device will be described with reference to Figs. 36 to 41.

第二具體例之椎間植入物10',另外在一側壁3有肋條狀凸部9,側向背離側壁3延伸。由於開縫7之故,各上壁部1a,1b和各下壁部2a,2b,與側向凸部9關聯。凸部外端呈實質上圓形斷面。 The intervertebral implant 10' of the second embodiment has a rib-like projection 9 on one side wall 3 extending laterally away from the side wall 3. Due to the slit 7, the upper wall portions 1a, 1b and the respective lower wall portions 2a, 2b are associated with the lateral projections 9. The outer end of the convex portion has a substantially circular cross section.

第三具體例之插入裝置60"類似第一具體例之插入裝置60,包括套筒61和從套筒第一端61a延伸之握爪63'。握爪63'包括臂部63a',63b',在離其自由端一段距離有圓筒形凹部69,與植入物之側向凸部9形狀相配。握爪63'呈張開位置,臂部彼此有一段距離,容許植入物的側向凸部9引進。握爪63'可再呈收斂位置,如第39至41圖所示,側向凸部9 被臂部夾持,牢牢把持於凹部69內。植入物在壓縮狀態時,握爪寬度使全部側向凸部9實質上在寬度方向,可包容在握爪臂部之間,如第39圖所示。植入物和插入裝置之用法,類似第一具體例中植入物和裝置之使用。植入物在壓縮狀態被插入裝置取用。當植入物在二椎骨之間時,無側向凸部9之對立側壁4即為引進之第一部份。由於圓滑之側壁,可輕易進行引進。 The insertion device 60 of the third embodiment is similar to the insertion device 60 of the first specific example, comprising a sleeve 61 and a grip 63' extending from the first end 61a of the sleeve. The grip 63' includes arms 63a', 63b' At a distance from its free end, there is a cylindrical recess 69 that matches the shape of the lateral projection 9 of the implant. The grip 63' is in an open position and the arms are at a distance from one another to allow the side of the implant Introduced to the convex portion 9. The gripper 63' can be again in a converging position, as shown in Figs. 39 to 41, the lateral convex portion 9 It is clamped by the arm and firmly held in the recess 69. When the implant is in the compressed state, the grip width is such that all of the lateral projections 9 are substantially in the width direction and can be accommodated between the grip arm portions as shown in Fig. 39. The use of the implant and the insertion device is similar to the use of the implant and device in the first embodiment. The implant is inserted into the device in a compressed state. When the implant is between the two vertebrae, the opposite side wall 4 without the lateral projections 9 is the first portion of the introduction. Thanks to the sleek side wall, it can be easily introduced.

第42圖表示椎間植入物之第三具體例。此植入物10"與前述具體例之植入物不同,在於包括二支柱80,81。支柱各有第一端80a,81a,在凸部5和隆部6之間位置,與上壁一體形成。支柱80,81之第二端80b,81b游離,置於下壁2之凹部6a,與植入物在擴張狀態之隆部6相對應。在壓縮狀態,支柱朝側壁3,4變形。支柱80,81亦有開縫(圖上未示)。植入物其他部位與第一或第二具體例相同。 Fig. 42 shows a third specific example of the intervertebral implant. The implant 10" differs from the implant of the previous specific example in that it includes two legs 80, 81. The legs each have a first end 80a, 81a, between the convex portion 5 and the ridge portion 6, integral with the upper wall The second ends 80b, 81b of the struts 80, 81 are free and placed in the recess 6a of the lower wall 2, corresponding to the ridges 6 of the implant in the expanded state. In the compressed state, the struts are deformed toward the side walls 3, 4. The struts 80, 81 also have slits (not shown). Other parts of the implant are identical to the first or second embodiment.

上述具體例可設想修飾。設備二支柱以上。支柱可有其他形狀容許傳輸負荷。支柱可與上壁或下壁一體形成。可設二開縫7以上,賦予植入物更複雜結構。例如可設更多開縫,以增加擴張。亦可不設開縫。在此情形下,植入物只能在一方向擴張,例如高度方向。 Modifications are conceivable in the above specific examples. More than two pillars of equipment. The struts can have other shapes to allow for transmission loads. The pillars may be integrally formed with the upper or lower wall. Two slits 7 or more can be provided to give the implant a more complicated structure. For example, more slits can be provided to increase expansion. There is no need to open the seam. In this case, the implant can only be expanded in one direction, such as the height direction.

上、下壁寬度不需全長恒等。例如一端寬度可比另一端大。 The width of the upper and lower walls does not need to be full length. For example, one end can be wider than the other end.

3,4‧‧‧側壁 3,4‧‧‧ side wall

5‧‧‧結合部 5‧‧‧Combination

6‧‧‧隆部 6‧‧‧Long

7‧‧‧開縫 7‧‧‧ slitting

8‧‧‧支柱 8‧‧‧ pillar

8c‧‧‧開縫 8c‧‧‧ slit

l‧‧‧植入物長度 l‧‧‧Implant length

w2‧‧‧植入物擴張狀態之寬度 w 2 ‧‧‧Width of the expanded state of the implant

Claims (16)

一種椎間植入物,包括:單件式空心本體,具有構成結合第一椎骨端板之上壁(1),和構成結合第二椎骨端板之下壁(2),分別連接上壁和下壁之二對立側壁(3,4),並有負荷傳輸組件(8;80,81),構成在上壁和下壁間傳輸負荷;其中本體構成呈壓縮狀態,上壁(1)和下壁(2)間之距離界定為植入物第一高度(h1),和擴張狀態,上壁(1)和下壁(2)間之距離界定為植入物第二高度(h2),大於第一高度(h1);又其中植入物係顯示形狀記憶性質之材料製成者。 An intervertebral implant comprising: a one-piece hollow body having a top wall (1) constituting a first vertebral endplate, and a lower wall (2) constituting a second vertebral endplate, respectively connected to the upper wall and The opposite side walls (3, 4) of the lower wall and the load transmission assembly (8; 80, 81) constitute a transmission load between the upper wall and the lower wall; wherein the body is in a compressed state, the upper wall (1) and the lower portion The distance between the walls (2) is defined as the first height (h 1 ) of the implant, and the expanded state, the distance between the upper wall (1) and the lower wall (2) is defined as the second height of the implant (h 2 ) , greater than the first height (h 1 ); and in which the implant exhibits shape memory properties. 如申請專利範圍第1項之椎間植入物,其中負荷傳輸組件(8;80,81)包含至少一支柱(8;80,81),有連接於上壁(1)或下壁(2)之第一端(8a,80a,81a)和第二端(8b,80b,81b),且其中支柱可變形,在壓縮狀態時變形,而在擴張狀態時不變形者。 The intervertebral implant of claim 1, wherein the load transfer assembly (8; 80, 81) comprises at least one post (8; 80, 81) connected to the upper wall (1) or the lower wall (2) The first end (8a, 80a, 81a) and the second end (8b, 80b, 81b), and wherein the struts are deformable, deformed in a compressed state, and are not deformed in an expanded state. 如申請專利範圍第2項之椎間植入物,其中在變形狀態時,支柱(8;80,81)至少一部位係實質上平行於上壁或下壁延伸者。 An intervertebral implant according to claim 2, wherein in the deformed state, at least one of the struts (8; 80, 81) extends substantially parallel to the upper or lower wall. 如申請專利範圍第2或3項之椎間植入物,其中在不變形狀態時,支柱(8;80,81)至少一部位係實質上垂直於上壁或下壁延伸者。 An intervertebral implant according to claim 2 or 3 wherein, in the undeformed state, at least one of the struts (8; 80, 81) extends substantially perpendicular to the upper or lower wall. 如申請專利範圍第2至4項之一椎間植入物,其中支柱(8;80,81)之第二端(8b,80b,81b)在變形狀態時係游離者。 An intervertebral implant according to any one of claims 2 to 4, wherein the second ends (8b, 80b, 81b) of the struts (8; 80, 81) are free when deformed. 如申請專利範圍第2至5項之一椎間植入物,其中支柱(8;80,81)之第二端(8b,80b,81b)在擴張狀態時即掣止於掣子(20,6a)內者。 An intervertebral implant according to any one of claims 2 to 5, wherein the second end (8b, 80b, 81b) of the strut (8; 80, 81) terminates in the dice when it is in an expanded state (20, 6a) Insiders. 如申請專利範圍第2至6項之一椎間植入物,其中支柱(8;80,81)延伸跨越上壁(1)或下壁(2)之實質上全寬者。 An intervertebral implant according to any one of claims 2 to 6, wherein the struts (8; 80, 81) extend across substantially the entire width of the upper wall (1) or the lower wall (2). 如申請專利範圍第1至7項之一椎間植入物,其中植入物(10,10',10")在擴張狀態之形狀係預形成,又其中植入物(10,10',10")在壓縮狀態之形狀係由預形成植入物在材料過渡溫度以下之溫度變形而達成者。 An intervertebral implant according to any one of claims 1 to 7, wherein the implant (10, 10', 10") is pre-formed in an expanded state, and wherein the implant (10, 10', The shape of the 10") in the compressed state is achieved by deformation of the preformed implant at a temperature below the material transition temperature. 如申請專利範圍第1至8項之一椎間植入物,其中上壁(1)、下壁(2)和側壁(3,4)形成閉圈者。 An intervertebral implant according to any one of claims 1 to 8, wherein the upper wall (1), the lower wall (2) and the side walls (3, 4) form a closed loop. 如申請專利範圍第1至9項之一椎間植入物,其中上壁或下壁在壓縮狀態之寬度界定為植入物之第一寬度w1,又其中上壁或下壁在擴張狀態 之寬度界定為植入物之第二寬度w2,第二寬度w2係大於第一寬度w1者。 An intervertebral implant according to any one of claims 1 to 9, wherein the width of the upper or lower wall in the compressed state is defined as the first width w 1 of the implant, and wherein the upper or lower wall is in an expanded state. The width is defined as the second width w 2 of the implant, and the second width w 2 is greater than the first width w 1 . 如申請專利範圍第1至10項之一椎間植入物,其中設有至少一開縫(7),延伸完全貫穿側壁(3,4),進入上壁(1)和下壁(2),且其中開縫(7)寬度在壓縮狀態實質上相同,而在擴張狀態朝側壁遞增者。 An intervertebral implant according to any one of claims 1 to 10, wherein at least one slit (7) is provided, extending completely through the side wall (3, 4), into the upper wall (1) and the lower wall (2) And wherein the slit (7) width is substantially the same in the compressed state, and is increased toward the sidewall in the expanded state. 如申請專利範圍第11項之椎間植入物,其中設有二開縫(7),彼此對立從側壁(3,4)朝上壁(1)和下壁(2)中心延伸,且其中開縫長度比開縫最大寬度更大者。 An intervertebral implant according to claim 11 wherein there are two slits (7) extending from the side walls (3, 4) toward the center of the upper wall (1) and the lower wall (2), and wherein The slit length is greater than the maximum width of the slit. 如申請專利範圍第1至12項之一椎間植入物,其中至少一側壁(3,4)朝外側圓滑者。 An intervertebral implant according to any one of claims 1 to 12, wherein at least one of the side walls (3, 4) is rounded outward. 如申請專利範圍第1至13項之一椎間植入物,其中上壁(1)和下壁(2)包括凸部(5),諸如齒,構成結合椎骨端板,又其中上壁(1)和下壁(2)包括隆部(6),朝外側圓滑,並配置在側壁(3,4)和凸部(5)之間,隆部凸出比凸部遠,而在壓縮狀態係同等高度者。 An intervertebral implant according to any one of claims 1 to 13, wherein the upper wall (1) and the lower wall (2) comprise a convex portion (5), such as a tooth, which constitutes a combined vertebral endplate, and wherein the upper wall ( 1) and the lower wall (2) includes a ridge (6) which is rounded outward and disposed between the side walls (3, 4) and the convex portion (5), the bulge protruding farther than the convex portion, and being in a compressed state The same height. 如申請專利範圍第1至13項之一椎間植入物,又包括凸部(9),從至少一側壁(3,4)側向延伸,以便與插入裝置結合者。 An intervertebral implant according to any one of claims 1 to 13 further includes a projection (9) extending laterally from at least one of the side walls (3, 4) for engagement with the insertion device. 如申請專利範圍第1至15項之一椎間植入物,其中植入物(10,10',10")在俯視或仰視圖中,壓縮狀態時呈實質上H形輪廓,而在擴張狀態時為實質上X形輪廓者。 An intervertebral implant according to any one of claims 1 to 15, wherein the implant (10, 10', 10") has a substantially H-shaped profile in a compressed state in a plan view or a bottom view, and is expanded The state is a substantially X-shaped profile.
TW101148188A 2011-12-22 2012-12-19 Intervertebral implant TW201328655A (en)

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