TW201305372A - 蒸鍍裝置及蒸鍍方法 - Google Patents
蒸鍍裝置及蒸鍍方法 Download PDFInfo
- Publication number
- TW201305372A TW201305372A TW101108853A TW101108853A TW201305372A TW 201305372 A TW201305372 A TW 201305372A TW 101108853 A TW101108853 A TW 101108853A TW 101108853 A TW101108853 A TW 101108853A TW 201305372 A TW201305372 A TW 201305372A
- Authority
- TW
- Taiwan
- Prior art keywords
- vapor deposition
- mask
- substrate
- opening
- deposition mask
- Prior art date
Links
- 238000007740 vapor deposition Methods 0.000 title claims abstract description 392
- 238000000034 method Methods 0.000 title abstract description 13
- 239000000758 substrate Substances 0.000 claims abstract description 174
- 238000001704 evaporation Methods 0.000 claims abstract description 172
- 230000008020 evaporation Effects 0.000 claims abstract description 144
- 230000015572 biosynthetic process Effects 0.000 claims description 73
- 239000002245 particle Substances 0.000 claims description 33
- 239000000463 material Substances 0.000 claims description 27
- 238000012937 correction Methods 0.000 claims description 9
- 238000005530 etching Methods 0.000 claims description 6
- 229910052759 nickel Inorganic materials 0.000 claims description 6
- 239000000956 alloy Substances 0.000 claims description 4
- 229910045601 alloy Inorganic materials 0.000 claims description 4
- 229910052742 iron Inorganic materials 0.000 claims description 4
- 239000011368 organic material Substances 0.000 claims description 4
- 230000004927 fusion Effects 0.000 claims description 3
- 230000012447 hatching Effects 0.000 claims description 2
- 238000000926 separation method Methods 0.000 abstract description 8
- 238000009826 distribution Methods 0.000 description 10
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 7
- 238000000151 deposition Methods 0.000 description 6
- 230000008021 deposition Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000003466 welding Methods 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 3
- 229910001374 Invar Inorganic materials 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000002826 coolant Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000014759 maintenance of location Effects 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 229920006255 plastic film Polymers 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 230000033228 biological regulation Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000005401 electroluminescence Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011064738A JP2012201895A (ja) | 2011-03-23 | 2011-03-23 | 蒸着装置並びに蒸着方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW201305372A true TW201305372A (zh) | 2013-02-01 |
Family
ID=46879152
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW101108853A TW201305372A (zh) | 2011-03-23 | 2012-03-15 | 蒸鍍裝置及蒸鍍方法 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP2012201895A (ja) |
| TW (1) | TW201305372A (ja) |
| WO (1) | WO2012127993A1 (ja) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI472635B (zh) * | 2013-09-13 | 2015-02-11 | Univ Nat Taiwan | 脈衝雷射蒸鍍系統 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102363252B1 (ko) * | 2014-11-12 | 2022-02-16 | 삼성디스플레이 주식회사 | 박막 증착 장치, 이를 이용한 유기 발광 표시 장치의 제조 방법 및 유기 발광 표시 장치 |
| CN113690396B (zh) * | 2021-08-25 | 2023-03-28 | 京东方科技集团股份有限公司 | 掩膜组件及其制造方法、目标结构的制造方法、显示装置 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB9323034D0 (en) * | 1993-11-09 | 1994-01-05 | Gen Vacuum Equip Ltd | Vacuum web coating |
| JP2004119064A (ja) * | 2002-09-24 | 2004-04-15 | Fujitsu Ltd | 薄膜形成装置および薄膜形成方法 |
| TWI472639B (zh) * | 2009-05-22 | 2015-02-11 | Samsung Display Co Ltd | 薄膜沉積設備 |
| JP5328726B2 (ja) * | 2009-08-25 | 2013-10-30 | 三星ディスプレイ株式會社 | 薄膜蒸着装置及びこれを利用した有機発光ディスプレイ装置の製造方法 |
-
2011
- 2011-03-23 JP JP2011064738A patent/JP2012201895A/ja not_active Withdrawn
-
2012
- 2012-02-27 WO PCT/JP2012/054724 patent/WO2012127993A1/ja not_active Ceased
- 2012-03-15 TW TW101108853A patent/TW201305372A/zh unknown
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI472635B (zh) * | 2013-09-13 | 2015-02-11 | Univ Nat Taiwan | 脈衝雷射蒸鍍系統 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2012201895A (ja) | 2012-10-22 |
| WO2012127993A1 (ja) | 2012-09-27 |
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