TW201205906A - Heat dissipation substrate for LED - Google Patents
Heat dissipation substrate for LED Download PDFInfo
- Publication number
- TW201205906A TW201205906A TW100112468A TW100112468A TW201205906A TW 201205906 A TW201205906 A TW 201205906A TW 100112468 A TW100112468 A TW 100112468A TW 100112468 A TW100112468 A TW 100112468A TW 201205906 A TW201205906 A TW 201205906A
- Authority
- TW
- Taiwan
- Prior art keywords
- heat
- foil
- layer
- copper
- film
- Prior art date
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Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
- H10H20/858—Means for heat extraction or cooling
- H10H20/8581—Means for heat extraction or cooling characterised by their material
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
- F28F21/00—Constructions of heat-exchange apparatus characterised by the selection of particular materials
- F28F21/08—Constructions of heat-exchange apparatus characterised by the selection of particular materials of metal
- F28F21/089—Coatings, claddings or bonding layers made from metals or metal alloys
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0201—Thermal arrangements, e.g. for cooling, heating or preventing overheating
- H05K1/0203—Cooling of mounted components
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/18—Printed circuits structurally associated with non-printed electric components
- H05K1/189—Printed circuits structurally associated with non-printed electric components characterised by the use of a flexible or folded printed circuit
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/022—Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0137—Materials
- H05K2201/0154—Polyimide
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0355—Metal foils
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/10—Details of components or other objects attached to or integrated in a printed circuit board
- H05K2201/10007—Types of components
- H05K2201/10106—Light emitting diode [LED]
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Laminated Bodies (AREA)
- Led Device Packages (AREA)
Abstract
Description
201205906 六、發明說明: 【發明所屬之技術領域】 本發明侧於-種LED錄板。制是關於—種薄、可 折疊且可三維加工的LED用散熱基板。 【先前技術】 近來年由於耗電減少、壽命增長,故將LED(發光二極作 為光源使用的LED照明裝置之需求係急速地 照明時發熱,藉由該發熱而令LED成為高溫時,LED的發光效^ 私=低,而且,也會影響LED的壽命。特別是因為高輸出•高 党度的LED在照明時的發熱量變得更大,故令LED的敎散路, 抑制LED的溫度上升變得更為重要。 w 而^因ϋΐΐ 的基板’係使用散熱性佳的散熱基板,一般 而吕,係使用在作為絕緣層的環氧樹脂膜之一面疊層㈣ 才目反側的面4層織的散絲板。但是,使崎 、,二 要使用自耐電壓面imm左右,最少亦有刚_左右之严夺而 ^者,由於如前述-樣厚的魏樹賴,其熱阻大,故 將熱阻減低。然而,大量添加如前述之益機料f 枝填料而 板,其力―,在麵加4基 :蠢用散熱基板,不可折疊,且無法三維; 維加工,電路設計的自由度將提升,故要可二 之LED用散熱基板。 /、有良好的撓曲特性 專利文獻1中,係揭示一種led照明裳詈,根炎 體、1或多數個表面安裝型的LED、導電電路白^板本 其中,該基板本體,令使用聚酿亞胺的熱 ^破置, 定的三維形狀;該LED,設置於該基板本體==成形為預 電路,設置於該基板本體的表面或背面之1 位置,該導電 接至外部電路,並將其點亮;該咖酬裝置H該LED連 板本體的導電電路減的面,形成由金顧成的散H為在與基 201205906 -方面’專散獻2巾,作為祕導性佳的覆峨,係揭 不-種”、、對策覆銅板,在多層聚醯亞胺膜的一面疊層銅结,並於 疊層熱傳導性良好的金屬板或陶歧而構成,其中,該多 =xKlik亞胺膜,在低熱膨脹性的基體聚酿亞胺⑻層的雙面叠層 早-化具有特定醯亞胺單元的薄層聚酿亞 ^ 熱傳導性佳的金屬板,可舉出厚度5_〜2mm_=而作為 —專3中’係揭示一種用於LED之安裝及相互連 ΪϋΪ,在基板上包含銅或蝴金屬層、鄰接該金屬層的聚 «胺層或黏接劑層、_層、液體或膜 一\ [習知技術文獻] θ [專利文獻1]曰本特開2〇〇8 —293692號公報, [專利文獻2]日本特開2〇〇3 —71982號公報 [專利文獻3]國際公開第2009/073670號公報 【發明内容】 [發明所欲解決的問題] ^發明之目的在於提供—種可三維加叫咖賤敎美 ,㈣,咐細的撓曲特性。 本發明係關於以下事項。 心il5LED用散熱基板,係為在聚醯亞胺膜的—面疊層銅1 ==徵=目反側的面#層㈣或銘合她咖i散熱 為與㈣或齡金糾絲之間的熱阻 2_如第1項記載之LED崎絲板,其巾 箱未經陽極氧化處理(氧化銘膜處理)。 痛>自或铭合金 3. 如第1或2項記載之LED用散熱基 膜的厚度為3〜25μηι。 Ρ忒聚醯亞胺 4. 如第卜3項中任一項記載之咖用散熱基板,其中,該聚 201205906 面'以及與-·合金箱 5.如第4項之LED用散熱基板,其中,該臂 熱性的聚酸亞胺層之雙面疊層熱壓接性的聚驢亞胺層者女。、,、、、耐 6人^第卜5項中任一項之咖用散熱基板,其中 的厚度為9〜·陴,酬_合錢的厚度2〇〇= 胺膜壬:項之咖用散熱基板,其中,該聚醒亞 :置=金、"、該㈣或嚷係藉由域加熱成 的埶金落的表面與1緣或銘合金羯的表面之間 之間的熱阻)’通常係成為細亞 [發明之效果] 合金熱 ::很薄,具有良好的撓曲特性,並 夠的後性優異’故令厚度變薄亦可得到足 之咖用散熱基板,將==膜變得非常薄,故本發明 咖用文i基曲特性,並可三維加工。本發明之 造。 了错由讀性佳的連續式(歸-to-Roll)方式而製 陽極高黏著性為目的,係予《 的銘fl或is合金fg,例二’由於予《陽極氧化處理 皮膜’故使用其時,LED用散熱基有板=曲之=將=硬本的= 201205906 中 使用未娜極氧化處理的轉或齡金絲為理想 【實施方式】 或銅合金羯的表面,且銅箱 。鋁或鋁合金箔的表面之間的熱阻為1.8t 的熱阻較理想ϋίίΤί;"%面與㈣或銘合金落的表面之間 〜以下:而最以二想之樣態為崎/ 之下的表面與紹祕呂合金fl的表面之間物且 f ’例如較理想之樣態為arc/w以上,更 上^…為.5 C/W以上,而最理想之樣態為a2<3c/w以 把人3明tef使用黏接劑等’在聚醒亞胺膜直接疊層銅箱或 ;;:ί=ϊ合面、以及細金== 之二m2專金屬之黏著性佳的聚醯亞月錄,而更理想 郎二趙人^金屬之黏著性佳之熱壓接性的聚醯亞胺層。〒、 與該等金屬之黏著性佳之單層的》亞胺膜,i 亦可為她性的聚醮亞胺層之雙面疊層*以== ΐίϊίΐί ϊ ’且尤可為在耐熱性的親亞胺層之雙面叠層愈 趣性繼亞胺層者。根據機;: =亞胺層較為理想’而更理想之“為疊層=:: 為聚醯亞胺二卩基 ,胺膜叠層銅軸合金馳料齡ί二, 可將聚醯㈣等之雜亞胺前驅物的驗鱗塗佈於鋼羯或201205906 VI. Description of the Invention: [Technical Field to Be Invented] The present invention is directed to a type of LED recording board. The system is about a thin, foldable and three-dimensionally processed heat sink substrate for LEDs. [Prior Art] In recent years, as power consumption is reduced and life is increasing, the demand for LED lighting devices using LEDs (light-emitting diodes as light sources) is generated by rapid illumination, and when the LEDs become high temperature by the heat, the LEDs Luminous effect = private = low, and it will also affect the life of the LED. Especially because the high output and high-party LEDs become more heat-emitting during lighting, so the LED's divergence, suppress the LED temperature rise It is more important. w and ^ because of the substrate's use of a heat-dissipating heat-dissipating substrate, generally used in the surface of an epoxy resin film as an insulating layer (4) Layered woven loose board. However, it is necessary to use the self-endurance voltage surface imm or so, and at least there is a strictness of the left and right, because of the above-like thick Wei Shulai, its thermal resistance Large, so the thermal resistance is reduced. However, a large amount of the addition of the material of the f-filler as described above, the force, the surface is added 4 base: stupid heat-dissipating substrate, non-foldable, and can not be three-dimensional; dimensional processing, circuit The degree of freedom in design will increase, so it is necessary to use LED for two. Thermal substrate. /, has good flexural characteristics. Patent Document 1 discloses a led lighting body, a root body, 1 or a plurality of surface mount type LEDs, a conductive circuit white board, the substrate body, The heat of the polyimine is used to form a three-dimensional shape; the LED is disposed on the substrate body == formed into a pre-circuit, and is disposed at a position on the surface or the back surface of the substrate body, and the conductive is externally connected The circuit, and illuminate it; the remuneration device H of the LED connecting plate body of the conductive circuit minus the surface, formed by Jin Gucheng's scattered H for the purpose of the base 201205906 - 'specialized 2 towels, as a secret guide a good-quality coating, which is a coating of a copper-clad laminate, and a copper-clad layer laminated on one surface of a multilayer polyimide film, and is formed by laminating a metal plate or a ceramic having good thermal conductivity. The multi-xKlik imine film has a low-heat-expandable double-layer laminate of a base polyimide (8) layer, and a thin metal layer having a specific quinone imide unit has a good thermal conductivity. The thickness of 5_~2mm_= and as the -3" reveals a kind of installation for LED Interphase interconnection, comprising a copper or a butterfly metal layer on the substrate, a poly-amine layer or an adhesive layer adjacent to the metal layer, a layer, a liquid or a film-[[Technical Literature] θ [Patent Document 1] [Patent Document 2] Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. 2009-073670. The problem of the invention is to provide a three-dimensionally-added curry, (four), fine deflection characteristics. The present invention relates to the following matters. The core il5LED heat dissipation substrate is used in the polyimide film. The surface of the laminated copper 1 == sign = the opposite side of the surface # layer (four) or the thermal resistance between her and the heat of the (four) or age gold wire 2_ as shown in the first item of the LED silk The board is not anodized (oxidized by the film). Pain> Self- or alloy 3. The thickness of the heat-dissipating base film for LEDs according to item 1 or 2 is 3 to 25 μm. The heat-dissipating substrate for a coffee according to any one of the items of the present invention, wherein the poly-201205906 surface and the alloy container of the fourth aspect are the heat-dissipating substrate for the LED, wherein The arm-heated polyimide layer is double-sided laminated with a thermocompression-bonded polyimide layer. ,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,, a heat-dissipating substrate, wherein the heat-resistance between the surface of the sheet metal falling on the surface of the sheet metal or the surface of the sheet metal or the surface of the alloy 'It is usually made into fine Asia. [The effect of the invention] Alloy heat:: It is very thin, has good flexural properties, and has excellent post-ability. Therefore, the thickness can be reduced to obtain a sufficient heat-dissipating substrate for the coffee. Since the film becomes very thin, the present invention can be used in three-dimensional processing. The invention is made. The fault is made by the continuous (to-to-Roll) method of good readability, and the purpose is to make the high-adhesiveness of the anode. It is used for the "fl or is alloy fg, and the second is used for the anodizing treatment." At this time, the heat dissipation base for the LED has a plate = 曲 = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = The thermal resistance between the surface of the aluminum or aluminum alloy foil is 1.8t, which is better than the ideal ϋ Τ Τ Τ & % % % % % % % % % % % % % % % % % % % % % % % % % % % % % % % % % % % % % % The surface underneath is between the surface of the fine alloy fl and f', for example, the ideal form is arc/w or more, and the upper part is .5 C/W or more, and the most ideal form is a2<; 3c / w to use people 3 Ming tef using adhesives, etc. 'directly laminated copper box in the wake-up imine film;;: ί = 面 surface, and fine gold == two m2 special metal adhesion The best poly-Asian record, but more ideal Lang Er Zhao people ^ metal adhesion of the hot crimping polyimine layer.单, a single layer of imine film with good adhesion to these metals, i can also be a double-sided laminate of her polyimine layer* with == ΐίϊίΐί ϊ 'and especially for heat resistance The double-sided lamination of the pro-imine layer is more interesting than the imine layer. According to the machine;: =imine layer is more ideal' and more ideally "for lamination =:: polyimine diamine, amine film laminated copper alloy, ageing ί, can be used for poly (4), etc. The scale of the imine precursor is coated on steel files or
S 201205906 ϊίϊίΐ將df Ϊ丄醯亞胺化而成為聚醯亞胺膜’並藉由 的led用散熱基板至㈣層於該聚酿亞胺膜,製造本發明 聚巧賴及LED用散熱基板賴造方法。 使用銅$ 鋼合金並無特別限定,但可適當地 使用銅泊,特別疋壓延銅箔或電解銅箔。 更為=或ίί金厚度為9〜200_較為理想,而18〜2_m 相的产有厚度為35〜8G_之銅fi或銅合金紐為理 而,’ _或銅合金細厚度厚者係適於高電流 銅箔或銅合金箔,表示表面粗糙度的 以下,更理想之樣態為2_以下,而最=广=3-過小時’亦可將銅落或銅合金細 合金延電―或是該等之銅 ^發明中使⑽!gf|或!g合金羯並無铜限定,㉝合金 只要為將雜為主成分之與其他金屬的合金即可。齡金: 如可舉出將鎮作為主要添加物質的紹合金(Al g金 如JIS5052合鲞等之JIS5000系。 g糸〇金),例 特性=:理r至少包含織編合金_良好的換曲S 201205906 ϊ ϊ ϊ d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d d Method of making. The use of the copper $ steel alloy is not particularly limited, but a copper belay, particularly a rolled copper foil or an electrolytic copper foil, may be suitably used. More = or ίί gold thickness is 9~200_ is ideal, and 18~2_m phase is produced with a thickness of 35~8G_ copper fi or copper alloy, and '_ or copper alloy is thick and thick. Suitable for high-current copper foil or copper alloy foil, indicating the following surface roughness, more ideally, the state is 2_ or less, and the most = wide = 3 - too small 'can also extend copper or copper alloy fine alloy ―Or such copper. In the invention, (10)!gf| or !g alloy 羯 is not limited by copper, and the 33 alloy may be an alloy of other metals with a main component. Age-age gold: For example, a sinter alloy (Al G gold such as JIS 50002, etc., JIS 5000 series, g 糸〇 gold), which is the main additive substance, may be cited. Example characteristic =: R contains at least weaving alloy _ good change song
Al-Mg系合金,無論是何種組成者均可使用 f =〜5質量%者’更理想之樣態為2〜3 f量%者,其強=里 故較為理想。 又隹 如前述’:由於可得到具有良好的撓曲特性,且加 如未滿4μιη ’再者為3μηι以下’特別是細以 金落較為理想’而最理想之樣縣使畤經陽極氧化處理 或銘合綠。又,使縣麟極氧化處理、或陽極氧化處^^ 201205906 的鋁箔或鋁合金箔的話,可得到優異的耐撓曲性,且更藉由熱壓 接而貼合於聚醯亞胺膜時,不易造成外觀不佳。 再者’亦可使用施以使用含有界面活性劑的鹼性電解液之交 机電解處理(Κ〇處理)的銘箱或铭合金箱,例如The Al-Mg alloy can be used regardless of the composition of the component f = 5% by mass. The more desirable state is 2 to 3 f%, and the strength = the latter is preferable. For example, the above-mentioned: because it can obtain good flexural characteristics, and if it is less than 4μιη ' and then 3μηι or less 'especially fine gold drop is ideal', the most ideal county is anodized Or Ming Green. In addition, when the aluminum foil or the aluminum alloy foil of the anodic oxidation treatment or the anodizing treatment is used, it is excellent in flex resistance and is bonded to the polyimide film by thermocompression bonding. It is not easy to cause poor appearance. Further, it is also possible to use a name box or an alloy case for performing electrolytic treatment (tantalum treatment) using an alkaline electrolyte containing a surfactant, for example,
Pumkawa_SkyAluminumCorp.製:KO處理板,但較理想之樣態為 使用未施以KO處理的鋁箔或鋁合金箔。 0紹箔或銘合金箔,其與聚酿亞胺膜疊層側的表面,亦可予以 $極氧化處理(亦稱為氧化紹膜處理、或是硫酸氧化銘膜處理)、 或處理,但根據耐熱性與折疊性的觀點,較理想之樣態為使 用未經,極氧化處理、或κ〇處理的鋁箔或鋁合金箔。 鋁箔或鋁合金箔之與聚醯亞胺膜貼合的表面,為了去 =或紹合錢之製造而附著的油分,係以有機溶舰理較為^ 鋁,或鋁合金箔的厚度較理想之樣態為2〇〇μιη〜1ηι1η,更理 樣態為250〜500μηι,而最理想之樣態為·〜·μηι。一般 而言,鋁箔或鋁合金箔的厚度薄者係適於折疊用途。 又 本發日种,可在㈣軸合金雜合散熱帥伽㈣而使其 而可焊接的㈣或1S合金羯,例如,藉由使用東洋鋼鈑股 <刀有限公司製:SAP丨ate而可直接焊接。 巧明中,在聚醯亞胺膜與金屬落(銅箱、紹幻鄰接側呈 有了巧接性層時,該熱壓接性層的厚度,較理想之樣態為金g 7聚酿亞胺膜的黏接面之表面粗链度(Rzjis)以二^性 度未滿金屬箔之表面粗糙度(Rzjis)時,得到的用气 變醯亞胺膜與金屬_剝離強度,根據環境而有不均句 接著’以下說明聚醯亞胺膜。 聚醯亞胺膜,並無特別限定,只要是盥铜笔 較理想之㈣為顯娜,可侧疊相;者性佳’ 性、電絕緣性或撓曲性佳者即可。再者!’且耐熱 支撐金編即可,亦可為不受到視需要;用以 201205906 配mi 液極大影響者。 板之形狀者。、吏用早層、或豐層2層以上之多層膜、薄片、 =宇部痛嫌蝴「狐欣 」」(陶u口名)荨,但並非限定於此。 聚驗亞胺膜的厚廑,祐缸 — 絕緣性能,越_好,較理要可得到足夠的電 為二〜35陶,更加理想之樣態為5〜25陶,特別理Ϊ之忒5 〜15_,而最理想之樣態為9〜15陣。理心之樣恶為7 峨點,較理想之樣態為4 _觀點,較理“樣“為9:15二’再者’根據耐焊性與熱 I使用基板之至少—面經利用電暈放電處理、電 面則的且南化處理、物理粗面化處理、石夕烧偶合劑等之表 性等之表面處理的聚醯亞胺膜。單層之熱壓接 况’通常不需要進行利用表面處理劑的表面處理。 ㈣《官能性麵合劑、丙烯 偶合劑專各種物質。 ,院偶合劑,具體㈣,可舉出乙烯基三甲氧基魏、乙稀 5參P-甲氣乙氧基)械、乙稀基苯基三甲氧基石夕烧 二丙烯基二曱氧基矽烧、γ—環氧丙氧基丙基三甲氧基石夕 =、4-環氧丙基丁基三甲氧基魏、γ—胺基丙基三乙氧基魏、 (胺基乙基)γ—胺基丙基三甲氧基矽烷、Ν—3— (4— (3 —月女基,氧基〕丁氧基〕丙基-3-胺基丙基三甲氧齡燒、咪唾 矽烷、三氮雜苯矽烷、γ—毓基丙基三甲氧基矽烷等。聚醯亞胺臈 的表面處理劑,較理想之樣態為胺基矽烷系、環氧基矽烷系之 發烧偶合劑。 ^ 201205906 .又,代替矽烷偶合劑,即令藉由鈦酸鹽系偶人劍、式杜 系偶合劑處理的情況時,亦可得到同樣的效或錯酉义鹽 施。再者,利用魏偶合劑的表面處理係可依照公知的方法而實 以石夕烧偶合鮮之表面處理軒以處理( 广理劑可為維持原本狀態而被包含的曰 ,亦為在聚略胺或聚’胺前驅物、或是該等之 狀態::包含:Ξ藉由320〜5耽_^ 胺膜’在基板之剛性小等難以處理的情況下,可於美 LiLf在I—步驟可剝離的具有剛性之膜或基板而使用: 中擁聚酿亞胺膜,在具有耐熱性的層(sai)與該具有 黏接二屏=使用包含内具黏接劑層之具有熱壓接性及 i 2層以上之多層之具有熱壓接性及/或 。韻構成之一例,可舉出Sa2/Sal/Sa2、ScSai ^fl1//Sa2 *。再者’亦可使用具有熱壓接性之層⑽) 早層的聚醯亞胺膜。 、) 用於接性及/或黏接性的層(sa2),係使 纟合。織有趣接性及人錄接㈣層㈤), 係為選自於具有熱壓接性之層及具有黏接性之層的層。 2層以上之具有熱壓接性及/或黏接性之多層的聚酿亞胺膜 ’具有耐熱性的層(Sal)與具有熱壓接性及/或黏接性的層 目之厚度可適當選擇。但是’本發明中,如前述,最外層之 二壓接性及/或黏接性的層(Sa2)的厚度,較理想之樣態為 五屬箔之與聚醯亞胺膜的黏接面之表面粗糙度(Μ。)以上,更 理想?樣態為0.5,以上,更加理想之樣態為_以上,最理想 樣態為定為2师以上之顧。再者,具有熱壓接性及,或黏接 性的層(Sa2)之厚度,較理想之樣態為3μιη以下。 —本發明之LED用散熱基板,係為疊層銅箔或銅合金箔、聚醯 亞月女臈(聚醯亞胺層)、鋁箔或鋁合金箔者,而根據其製造方法, 201205906 並非限定於此。 咬兜人今=板只7使用在聚廳亞胺膜的一面直接疊層銅箱 接性材料),藉由加熱及/或加μ而疊層i =二在銅泊或銅合金箱、以及㈣或紹合金碰佈成為孰 = 顧胺溶液或聚醯亞胺前驅物溶液(聚醯胺酸 岭液荨),視岛要而加熱乾燥•醯亞胺化,且亦可 醯亞胺膜加熱或加壓等疊層而得者。在銅_ “全^ 介二j f合液專),視需要而加熱乾燥·醯亞胺化,接著, 亦可^献關由將域雜合金落加熱或加壓等疊^得 忒酏亞胺膜與金屬箔(銅箔、鋁箔)直接疊層較為理祁 表,與金職,即令進行加m、力^或力遲二: 理Ϊ 將聚_安膜與金屬荡透過黏接劑而疊層車交為 在聚酿亞胺膜或金屬箱塗佈黏接性 或是塗佈聚醯亞胺顧的樹脂時,其塗二=== oil喊〇 ,、狹縫式塗佈機(slitcoater)、 布钱 (c〇職acoater) #,一般所使用的方法而實施。风 #日#將ΐΐϊί f層或熱壓接性樹脂層的金屬箱與聚醯亞胺_ 耸晶夺了使用加熱竑置、加壓裝置或是加壓加埶裝置將兮 熱條件及加壓條件,視使用的材料而適當選is: 3,金細聚嶋膜之疊層只要可連續或=為, 可,並無特別限定,但使用滾壓疊層(m (7 連續進行較為理想。 且曰_u_nate)或雙帶擠壓等 胺膜聚酿亞胺膜,可適當地使用耐熱性、電絕緣性等佳的聚酿亞 聚歸麵,可使科層的親亞賴,亦可使 乂上之聚麵胺的»亞胺膜。再者,聚酿亞胺的種類亦^特^ 201205906 限定。 脸膜’可藉由公知的方法製造。例如,單層的聚酿亞 月女膜’可藉由以下等方法而得之。 .兄 ±將作為聚酿亞胺之前驅物的聚酿胺酸溶液澆鑄或塗佈於 爻撐體上,將其醯亞胺化的方法; 、 熱的將聚醯亞胺溶液澆鑄或塗佈於支撐體上,並視需要而加 2層以上的聚醯亞胺膜,可藉由以下等方法而得之。 古;^作為聚酿亞胺之前驅物的聚酿胺酸溶液鱗或塗佈於 么ί:而且,在該聚醯胺酸層的頂面,依序地澆鑄或塗佈作 ‘、、、 θ以上的聚醯亞胺之前驅物的聚醯胺酸溶液,將其醯亞胺 化的方法; η η主ϋ*作為第2層以上的聚酿亞胺之前驅物的聚醯胺酸溶液 同夺况“或塗佈於支撐體上,將其醯亞胺化的方法; (5)將聚醯胺酸溶液澆鑄或塗佈於支撐體上,而 的頂面’依序地鱗錢佈第2層以上的聚 亚視需要而加熱的方法; ^6)將第2層以上的聚醯亞胺溶液同時澆鑄或塗佈於支撐體 上’並視需要而加熱的方法; 將以该⑴〜⑹得到之2片以上的聚酿亞胺膜直接 或透過黏接劑而疊層的方法。 人人ΪΪ、’亦可將LED用散熱基板的銅箱或銅合^^、铭笛或銘 &金^1為支撐體,在其上方直接形成聚醯亞胺膜。 亞版膜,尤此適用在耐熱性聚驢亞胺層(Μ)的雙面含 =接性聚醯亞胺層⑽之3層以上之具有_性的聚醯 鄉再者,亦可使用麵i=二 (S2)早層的聚醯亞胺膜。 具有熱壓接性的聚醯亞胺膜中,耐熱性聚醯亞胺層(S1)盥 熱屢接性W亞胺層(S2)的厚度可適當選擇。但是,本發明中、,Pumkawa_SkyAluminumCorp.: KO processing plate, but the ideal form is to use aluminum foil or aluminum alloy foil not treated with KO. 0 Shao Foil or Ming alloy foil, the surface of the laminated side with the poly-imine film, can also be treated with extreme oxidation (also known as oxidation treatment, or sulfuric acid oxidation treatment), or treatment, but From the viewpoint of heat resistance and folding property, it is preferable to use an aluminum foil or an aluminum alloy foil which has not been subjected to extreme oxidation treatment or κ〇 treatment. The surface of the aluminum foil or aluminum alloy foil bonded to the polyimide film, in order to go or = the oil of the manufacture of the oil, the organic solvent is better than aluminum, or the thickness of the aluminum alloy foil is ideal. The form is 2〇〇μιη~1ηι1η, and the more mode is 250~500μηι, and the most ideal form is ·~·μηι. In general, a thin aluminum foil or aluminum alloy foil is suitable for folding applications. In addition, it can be welded (four) or 1S alloy in the (four) shaft alloy hybrid heat sink (four), for example, by using Toyo Steel Co., Ltd. <Knife Co., Ltd.: SAP丨ate Can be welded directly. In the case of Qiaoming, when the polyimide film and the metal drop (the copper box and the sci-fi adjacent side have a clever layer, the thickness of the thermocompression layer is more ideal than the gold g 7 When the surface roughness (Rzjis) of the adhesion surface of the imine film is less than the surface roughness (Rzjis) of the metal foil, the gas yoke film and the metal _ peel strength are obtained according to the environment. However, there is a non-uniform sentence followed by 'the following description of the polyimine film. Polyimine film, there is no particular limitation, as long as it is ideal for the bismuth copper pen (4), it can be side-stacked; Electrical insulation or flexibility is good. Again! 'The heat-resistant support gold can be used, or can not be taken as needed; used in 201205906 with the mi liquid greatly affected. The shape of the board. Multilayer film, sheet, or layer of 2 layers or more in the early layer or the layer of the layer, "Yu Xin" (Tao Yu name), but it is not limited to this. The thickness of the imine film is thick. — Insulation performance, the more _ good, it is reasonable to get enough electricity for two ~ 35 pottery, the more ideal form is 5 ~ 25 pottery, especially the 忒 5 ~ 15_, The most ideal form is 9~15. The reason of the evil is 7 峨, and the ideal form is 4 _point. It is reasonable to say that the sample is 9:15 and the second is based on the solder resistance. The heat I uses a surface-treated polyimine film which is at least surface-treated with a surface such as a corona discharge treatment, an electric surface, a southing treatment, a physical roughening treatment, or a zea smelting coupling agent. The single-layer hot-pressing condition usually does not require surface treatment with a surface treatment agent. (4) "Functional surface agent, propylene coupling agent for various substances., hospital coupling agent, specific (4), may be exemplified by vinyl trimethoxy Wei, Ethylene 5 ginseng P-Methane ethoxy), Ethyl phenyl trimethoxy sulphur succinyl dipropenyl dimethoxy oxime, γ-glycidoxypropyl trimethoxy shi = , 4-epoxypropylbutyltrimethoxywei, γ-aminopropyltriethoxywei, (aminoethyl)γ-aminopropyltrimethoxydecane, Ν-3—(4- (3-month-female, oxy]butoxy]propyl-3-aminopropyltrimethoxy-aged, sodium-des-decane, triazaindane, γ-mercaptopropyltrimethoxyindole Etc. The surface treatment agent of polyamidoxime is preferably an amine-based decane-based or epoxy-based decane-based flaming coupling agent. ^ 201205906 . Further, instead of a decane coupling agent, it is made by titanate. When the system is treated with a doll or a dynasty coupler, the same effect or wrong salt can be obtained. Further, the surface treatment using the Wei coupler can be performed according to a known method. Coupling fresh surface treatment to treat (the sputum can be contained in order to maintain the original state, also in the polyamine or poly 'amine precursor, or the state of:: contains: Ξ by 320 ~5耽_^ The amine film 'is difficult to handle when the substrate is difficult to handle, etc., can be used in the film or substrate which can be peeled off in the I-step of LiLf: The heat resistant layer (sai) and the bonded two screens have thermocompression bonding properties and/or using a plurality of layers having thermocompression bonding and a layer of i 2 or more. An example of the rhyme structure is Sa2/Sal/Sa2, ScSai^fl1//Sa2*. Further, a polyimide film having an early layer of a layer (10) having thermocompression bonding property may also be used. ,) The layer (sa2) used for the bonding and/or adhesion is made. The woven fabric and the human (4) layer (5) are selected from the group consisting of a layer having thermocompression bonding and a layer having adhesiveness. Two or more layers of polyacrylonitrile film having thermocompression bonding and/or adhesion, the layer having heat resistance (Sal) and the thickness of the layer having thermocompression bonding and/or adhesion can be Appropriate choice. However, in the present invention, as described above, the thickness of the outermost two pressure-bonding and/or adhesive layer (Sa2) is preferably a bonding surface of the five-component foil and the polyimide film. The surface roughness (Μ.) or more is more desirable. The form is 0.5 or more, and the more ideal form is _ or more. The most ideal form is set to be more than 2 divisions. Further, the thickness of the layer (Sa2) having thermocompression bonding properties or adhesiveness is preferably 3 μm or less. - the heat-dissipating substrate for LED of the present invention is a laminated copper foil or a copper alloy foil, a polyyttrium yam (polyimine layer), an aluminum foil or an aluminum alloy foil, and according to the manufacturing method thereof, 201205906 is not limited herein. The bite is now used on the side of the poly-imide film to laminate the copper box-bonding material), by heating and/or adding μ to laminate i = two in copper or copper alloy boxes, and (4) The alloy is rubbed into a 孰 = guamine solution or a polyimide precursor solution (poly phthalate hydrazine), which is heated and dried depending on the island. • 醯 imidization, and can also be heated by yttrium imide film. It is obtained by lamination or the like. In the copper _ "all ^ two two jf liquid special", if necessary, heat drying, 醯 imidization, and then, can also be added by the domain of the alloy is heated or pressurized The film and metal foil (copper foil, aluminum foil) are directly laminated and compared with the gold, so that the addition of m, force ^ or force is two: Ϊ 聚 聚 聚 聚 聚 聚 聚 聚 聚 聚 聚 聚 聚 聚 聚 聚The layer car is a resin coated with a polyimide or a metal box, or coated with a polyimide, which is coated with two === oil shouting, slit coater (slitcoater) ), cloth money (c〇 job acoater) #, generally used in the implementation of the method. Wind #日# will ΐΐϊί f layer or thermocompression resin layer of metal box and polyimine _ crystallized use heating The heat treatment condition and the pressurization condition of the sputum, the pressurizing device or the pressurizing twisting device are appropriately selected according to the material to be used: 3, the stack of the gold fine concentrating film may be continuous or =, Although it is not particularly limited, it is possible to suitably use heat resistance by using a roll lamination (m (7 is preferably carried out continuously) and 曰_u_nate) or an amine film polyimide film such as double-strand extrusion. Insulation, etc., can be used to make the eucalyptus of the family layer, or to make the melamine on the sputum. The type of melamine can also be used. ^ 201205906 The face film ' can be produced by a known method. For example, a single-layered polystyrene film can be obtained by the following methods. The brother ± will be used as a precursor of the brewing imine. A method in which an amine acid solution is cast or coated on a ruthenium support, and the ruthenium is imidized; a hot polyimine solution is cast or coated on a support, and 2 or more layers are added as needed. The ruthenium imine film can be obtained by the following methods: ancient; ^ as a precursor of the poly-imine, the poly-tantoic acid solution scale or coated on the glutinous acid: and, in the polyamic acid layer On the top surface, a polyamic acid solution of a polyimine precursor of ',, or more than θ is sequentially cast or coated, and the ruthenium is imidized; η η main ϋ* is used as the second layer The polyamic acid solution of the above-mentioned poly-imine precursor is the same as the method of "coating on the support and imidating the ruthenium; (5) casting the poly-proline solution Or a method of coating on the support, and the top surface is sequentially heated by the poly-Asian view of the second layer or more of the scale cloth; ^6) simultaneously casting the second layer of the polyimine solution or A method of applying on the support and heating as needed; and a method of laminating two or more of the polyiminoimide films obtained in the above (1) to (6) directly or through an adhesive. Everyone can't use the copper box of the heat-dissipating substrate of the LED or the copper, the whistle or the Ming & gold ^1 as the support, and the polyimine film is directly formed on the upper side. The sub-type film is particularly suitable for use in the heat-resistant polyimine layer (Μ) of the double-sided yoke-containing polyimide layer (10). i = two (S2) early layer of polyimide film. In the polyimine film having thermocompression bonding property, the thickness of the heat-resistant polyimide layer (S1) and the heat-reactive W-imine layer (S2) can be appropriately selected. However, in the present invention,
S 12 201205906 的厚度,口要可;丨二士彳取外層之熱壓接性聚醯亞胺層(S2) 著性接喊生之足夠的黏 更加理想之樣^2= 1為1,, (叫的厚度,較理想之樣態=μη^τ 接性_亞胺層 藉由在耐熱性聚醯亞胺層(s ) 熱壓接性聚酿亞胺層(S2),而可置厚度大致相同的 的耐的聚醯亞胺膜中’作為耐熱性聚醯亞胺層(si) ?ί (Ti%述特徵、⑴〜⑷之至少兩匕ο)與 有下述特徵i “者。與(3)之組合等),且尤能適用具 心(il在ΐ獨之聚酿亞胺膜的情況中,玻璃轉化溫度為3〇〇。〇 態為不態為玻璃轉化溫度為330t以上,更理想之樣 fϋ在單獨之聚酸亞胺膜的情況中,線膨脹係數(5〇〜200。〇 i目If近似於在聚醯亞麵疊層銅雜之金難的麟張係數 者。具體,g,聚醯亞胺膜的熱膨張係數較理 - cm 〜28x【6⑽/啦/ΐ,而更理想之樣態為9xl0- t20xl0- 6 /cm/C,更加理想之樣態為 12xl〇-6〜18xl〇_6cm/cm/〇c (3) 在單獨之聚酿亞胺膜的情況中,拉伸彈性係數(md、 ASTM「D88'2)為300kg/nmi2以上,而較理想之樣態為5〇〇kg /mm以上’更理想之樣態為7〇〇kg/miTi2以上者。 (4) 較理想之樣態為熱收縮率為0.05%以下者。 财熱,聚酸亞胺層(Si) ’可使用由下述成分所合成的聚酿 亞胺,§亥等成分包含:將選自於3,3,,4,4,一聯苯四羧酸二酐(s — BPDA)、苯均四酸二酐(PMDA)、以及试从—二苯甲酮四 201205906 羧酸二酐(BTDA)之成分作為主成分的酸成分;以及將選自於對 苯二胺(PPD)及4,4,一二胺基二苯醚(DADE)之成分作為主成 分的二胺成分。4,4’一二胺基二苯醚(DADE),可將一部分或全 部以3,4’一二胺基二苯醚(DADE)取代。 耐熱性聚醯亞胺層(S1),例如,以下的聚醯亞胺較為理想。 (1) 由3,3’,4,4’一聯苯四羧酸二酐(5—:6?0八)與對苯二胺 (PPD)所製造的聚醯亞胺,以及根據情況更進一步與4,4’一二胺 基二苯醚(DADE)所製造的聚醯亞胺。該情況中,PPD/DADE (莫耳比)為100/0〜85/15較為理想。 (2) 由3,3’,4,4’一聯苯四缓酸二針(s—BPDA)及苯均四酸 二酐(PMDA)與對苯二胺(ppd )及4,4,一二胺基二苯醚(DADE) 所製造的聚醯亞胺。該情況中,BPDA/PMDA (莫耳比)為15 /85〜85/15,而 PPD/DADE (莫耳比)為 90/10〜10/90 較 為理想。 (3) 由苯均四酸二酐(pmj)A)與對苯二胺(ppD)及4,< —一胺基二苯喊(DADE)所製造的聚醯亞胺。該情況中,DAD: /PPD (莫耳比)為90/10〜10/90較為理想。 (4) 由3,3’,4,4’一二苯曱酮四羧酸二酐(311)八)及苯均四 酉久一酐(PMDA )與對苯二胺(ρρ£))及4,4,一二胺基二苯醚(DADE 所製造的聚醯亞胺。該情況中,BTDA/PMDA (莫 ^80^90^10 , ^ PPD/DADE ^ 30/^90/10 : 為理想。 ’ 再者,在不損及耐熱性聚醯亞胺之物性的範圍内,亦可 其他四羧酸二酐或二胺。 亞胺層(S1層)的耐熱性聚醯亞胺之合成,根福 Γ Γ 範_ ’即令藉由無規聚合或嵌段聚合之 ==聚合後,在反應條件下= _性聚醯亞胺’可如下述而予以製造。首先,使用前述各The thickness of S 12 201205906, the mouth should be; the second layer of the thermo-compressive polyimine layer (S2) of the outer layer of the scorpion is enough to make the ideal adhesion ^2 = 1 is 1, (called thickness, ideal state = μη^τ ligament _ imine layer by heat-bonded polyimide layer (S) in the heat-resistant polyimide layer (S2), and can be set thickness In the substantially same resistant polyimide film, 'as a heat-resistant polyimide layer (si) layer (Ti%, at least two of (1) to (4)) and the following characteristic i. In combination with (3), etc., and especially suitable for the heart (in the case of il in the case of a poly-imine film, the glass transition temperature is 3 〇〇. The 〇 state is not the glass transition temperature of 330t or more. More ideally, in the case of a single polyimide film, the linear expansion coefficient (5 〇 ~ 200. 〇i mesh If approximate to the 张 系数 在 在 在 在 在 近似 近似 近似 近似 近似 近似 近似Specifically, g, the thermal expansion coefficient of the polyimide film is more than - cm ~ 28x [6 (10) / 啦 / ΐ, and more ideally the state is 9xl0 - t20xl0 - 6 / cm / C, more ideally 12xl〇-6~18xl〇_6cm/cm/〇c (3) In the case of a single polyimine film, the tensile modulus (md, ASTM "D88'2) is 300 kg/nmi2 or more, and the preferred state is 5 〇〇kg/mm or more. The ideal state is 7 〇〇kg/miTi2 or more. (4) The preferred mode is that the heat shrinkage rate is 0.05% or less. The heat, the polyimide layer (Si) can be used by the following components The synthesized poly-imine, § hai and other components comprise: will be selected from 3, 3, 4, 4, a biphenyl tetracarboxylic dianhydride (s - BPDA), pyromellitic dianhydride (PMDA) And an acid component containing a component of benzophenone IV 201205906 carboxylic acid dianhydride (BTDA) as a main component; and a selected from p-phenylenediamine (PPD) and 4,4,diaminobiphenyl a diamine component containing a component of ether (DADE) as a main component. 4,4'-diaminodiphenyl ether (DADE), which may be partially or completely substituted with 3,4'-diaminodiphenyl ether (DADE) The heat-resistant polyimine layer (S1), for example, the following polyimine is preferable. (1) From 3,3',4,4'-biphenyltetracarboxylic dianhydride (5::6? 0 VIII) with polyphenyleneimine manufactured by p-phenylenediamine (PPD), and according to Further, it is further polymerized with 4,4'-diaminodiphenyl ether (DADE). In this case, PPD/DADE (Morby) is preferably 100/0 to 85/15. 2) From 3,3',4,4'-biphenyl tetra-acidic two-needle (s-BPDA) and pyromellitic dianhydride (PMDA) with p-phenylenediamine (ppd) and 4,4, one or two Polyimine produced by aminodiphenyl ether (DADE). In this case, BPDA/PMDA (Morby) is 15 / 85 to 85 / 15, while PPD / DADE (Morbi) is ideal for 90/10 ~ 10 / 90. (3) Polyimine produced by pyromellitic dianhydride (pmj) A) and p-phenylenediamine (ppD) and 4, <-monoaminobiphenyl shim (DADE). In this case, DAD: /PPD (Morby ratio) is preferably 90/10 to 10/90. (4) from 3,3',4,4'-dibenzophenone tetracarboxylic dianhydride (311) VIII) and benzene tetrahydrofuran anhydride (PMDA) and p-phenylenediamine (ρρ£) and 4,4,monodiaminodiphenyl ether (polyimine produced by DADE. In this case, BTDA/PMDA (Mo 80^90^10 , ^ PPD/DADE ^ 30/^90/10 : Ideally. In addition, other tetracarboxylic dianhydrides or diamines may be used in the range which does not impair the physical properties of the heat-resistant polyimide. The synthesis of the heat-resistant polyimide of the imine layer (S1 layer) , 根福Γ Γ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _
S 14 201205906 成分’令二胺成分與酸成分(四缓酸 有機溶劑中反應,作為聚酿胺咖、、〜^之大致上料耳置於S 14 201205906 Ingredients' The diamine component is reacted with an acid component (four kinds of acid buffered organic solvent, and is placed as a poly-branched amine coffee, ~^
Si 為4=使用’形成該摻雜液二後= 可製造耐熱性聚酿亞= R時令聚醯胺酸醯亞胺環化而 取a^::明t ’在耐熱性聚醯亞胺之摻雜液的膜上疊層執壓接性 二r 雜液的膜後,可同時將雙方酿亞胺化。本發J, ί,ΐ 參雜液與紐接性聚酿亞胺之換雜液共擠 雜液的ar ΐ &水亞胺之換雜液的膜與熱壓接性聚龜亞胺之摻 雜液層後’可同時將雙賴亞胺化。以下係敘述本方法。 系rn曰t面’熱壓接性聚酸亞胺層(S2)的熱壓接性聚酸亞胺 ^ 有與金屬||之熱壓接性的聚酿亞胺。該熱壓接性聚酿亞 4^較:理想之·為在熱壓接性聚醯亞胺之玻璃轉化溫度以上至 C以下的溫度,可與金屬n疊層之具有紐接性的輯亞胺。. 二壓接性聚酿亞胺層(S2)之熱壓接性聚驢亞胺,更具有以 下特彳玫(2)〜(5)之至少一種較為理想。 _⑵金屬箔與聚醯亞胺(S2)的剝離強度為〇 7^/麵以上, 即7以150 C加熱處理168小時後,剝離強度的保持率亦為9〇% 以上,甚至為95%以上,最佳為1〇〇%以上。 (3) 玻璃轉化溫度為130〜330。(:。 (4) 拉伸彈性係數為1〇〇〜7〇〇Kg/mm2。 (5) 線膨脹係數(50〜200°C) (MD)為 13〜30x10—6cm /cm/〇c 〇 熱壓接性聚醯亞胺層(S2)的熱壓接性聚醯亞胺,可選自於 種種公知的熱可塑性聚醯亞胺。例如,可使用由以下成分所合成 的聚醯亞胺。 該等成分包含:含有選自於2,3,3,,4,一聯苯四羧酸二酐<^一 BPDA)、3,3,,4,4,一聯苯四羧酸二酐(s —BPDA)、苯均四酸二 酐(PMDA)、3,3’,4,4’一二苯曱酮四羧酉复二酐(BTDA)、3,3,,4,4, 15 201205906 -二_四麟二gf、4,4’-氧雙鄰苯二甲酸二酐(qd 羧酉义一酐4之成刀的酉义成刀,而較理想之樣態 分而包含的酸成分;以及 含有選自於1,4-雙(4-胺基苯氧基)苯〜 苯氧基)苯、i,3-雙(3〜胺基苯氧基)苯 ,(月女基 胺基苯氧基)苯基〕丙烧、2,2—雙〔4—卜胺“ =烧、雙〔4- (4-g苯氧基)苯基〕硬、雙〔4— ίίίί)苯基〕礙等之至少在主鏈具有3個苯環的二胺成分, ,理想之樣態為將該等作為主成分而包含,且視需要 在主鏈具有1個或2個苯環的二胺成分。 ,壓接性聚酿亞胺,尤能適用由選自於2,3,3,,4,—聯苯四窥酸 一-(a-BPDA)、3,3’,4,4’-聯苯四羧酸二酐(s—BpDA) 酐(/應A)、及3,3,,4,4,—二苯曱酮四賊二_了^ 勺-文成刀:與遥自於1,4 —雙(4一胺基苯氧基)苯、以—雙 二《苯巧)苯、U —雙(3〜胺基苯氧基)苯、及2,2—雙〔4 苯f基)苯基〕丙烧的二胺成分所合成的聚醯亞胺。 1Γ、、Η:ϊί㈣亞胺’視需要可包含在主鏈具有1個或2個苯環 的一胺成为、或前述以外的二胺成分及酸成分。 ,壓接性聚醯亞胺,特別是由包含u—雙(4—胺基苯氧基 ^下亦有簡稱為TPER的情況)8〇莫耳%以上的二胺成分 ,、3,3,4,4’一聯苯四羧酸二酐(s—BpDA)以及/ 3 3, 4,— =四猶二酐(a—BPDA)所製造的輯亞贿為理想。該情 ί !^ΓΒ1ΦΑ/&—ΒΡ〇Α (莫耳比)為 100/0〜5/95 較為理 者’在不損及熱壓接性聚醯亞胺之物性的範圍内,亦可以 =,四_二酐取代,例如2,2—雙(3,4—二祕苯基)丙烧二 町欢2,3,6,7—萘四羧酸二酐等。 熱壓接性輯亞胺,可如下述而料製造。首先,令前述各 且有機溶射約1(ΚΓ(:以Τ,制是2G〜攸的溫度反應, 不月況而與其他四羧酸二酐及其他二胺於有機溶劑中反應,作Si is 4 = after using 'the formation of the doping liquid II = can be made heat-resistant poly styrene = R when the polyphosphonium quinone imine is cyclized to take a ^:: Ming t ' in heat-resistant polyimine After the film of the doping liquid is laminated on the film of the doping liquid, both sides can be simultaneously imidized. The film of the J, ί, 参 杂 与 与 与 与 与 与 聚 amp amp amp amp amp amp amp amp amp amp amp amp amp amp amp amp amp amp amp amp amp amp amp amp amp amp amp amp amp amp amp amp amp amp amp amp amp amp amp amp After the doping of the liquid layer, the double lysine can be simultaneously aminated. The method is described below. The rn曰t surface is a thermocompression-bonded polyamicimide of the thermocompression-bonded polyamicimide layer (S2). It has a thermocompression bonding property with a metal|| The thermocompression-bonded polystyrene 4 is more desirable: it is a temperature at which the temperature of the thermocompression-bonded polyimine is above the glass transition temperature to below C, and can be bonded to the metal n-layer. amine. The thermocompression-bonded polyimine of the second pressure-sensitive polyimide layer (S2) preferably has at least one of the following special resins (2) to (5). _(2) The peeling strength of the metal foil and the polyimide (S2) is 〇7^/face or more, that is, after 7 hours of heat treatment at 150 C for 168 hours, the retention of the peel strength is also 9% or more, or even 95% or more. The best is more than 1%. (3) The glass transition temperature is 130 to 330. (:) (4) The tensile modulus of elasticity is 1〇〇~7〇〇Kg/mm2. (5) Linear expansion coefficient (50~200°C) (MD) is 13~30x10-6cm /cm/〇c 〇 The thermocompression-bonding polyimine of the thermocompression-bonded polyimide layer (S2) may be selected from various known thermoplastic polyimine. For example, polyimine synthesized from the following components may be used. The components comprise: a material selected from the group consisting of 2, 3, 3, 4, a biphenyltetracarboxylic dianhydride <^a BPDA), 3,3,4,4, a biphenyltetracarboxylic acid Anhydride (s-BPDA), pyromellitic dianhydride (PMDA), 3,3',4,4'-dibenzophenone tetracarboxylate dianhydride (BTDA), 3,3,,4,4, 15 201205906 - 二_四麟二gf, 4,4'-oxydiphthalic dianhydride (qd carboxy 酉 yiyi anhydride 4) is a knife, and the ideal form includes An acid component; and a benzene group selected from the group consisting of 1,4-bis(4-aminophenoxy)benzene~phenoxy)benzene, i,3-bis(3~aminophenoxy)benzene, Aminophenoxy)phenyl]propane, 2,2-bis[4-p-amine" = calcined, bis[4-(4-gphenoxy)phenyl]-hard, bis[4-bru- benzene Basis The diamine component having at least three benzene rings in the main chain is preferably a diamine component which is contained as a main component and optionally has one or two benzene rings in the main chain. The pressure-bonded polyamidiamine is especially suitable for use in the selection of 2,3,3,4,2-biphenyltetrasporin-(a-BPDA), 3,3',4,4'-biphenyl Tetracarboxylic dianhydride (s-BpDA) anhydride (/ should be A), and 3,3,,4,4,-dibenzophenone four thieves two _ ^ ^ spoon - Wencheng knife: and remote from 1,4 - bis(4-aminophenoxy)benzene, bis-bis-benzoic benzene, U-bis(3-aminophenoxy)benzene, and 2,2-bis[4 phenylf-yl)benzene a polyimine synthesized by a diamine component of a propylene group. 1 Γ, Η: ϊ ( ( ( 四 四 视 视 视 视 视 视 视 视 视 视 视 视 视 视 视 视 视 视 视 视 视 视 视 视 视An amine component and an acid component. The pressure-sensitive polyimine component, in particular, a diamine component containing 8 〇 mol% or more, including u-bis (4-aminophenoxyl group, also referred to as TPER) , 3,3,4,4'-biphenyltetracarboxylic dianhydride (s-BpDA) and / 3 3, 4, - = tetra-jujuic anhydride (a-BPDA) The creation of the bribe is ideal. The love ! ΓΒ Α Α Α Α Α 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在Within the range of physical properties, it can also be replaced by a tetra-dianhydride, for example, 2,2-bis(3,4-di-phenyl) propyl sinter, 2,3,6,7-naphthalenetetracarboxylic acid Anhydride, etc. The thermocompression-bonded imine can be produced as follows. First, each of the above-mentioned organic solvents is about 1 (ΚΓ(:, Τ, the temperature is 2G~攸), and it is reacted with other tetracarboxylic dianhydrides and other diamines in an organic solvent.
S 16 201205906 為聚醯胺酸的溶液。然後,將該聚醯胺 形摻雜賴後,加熱_,令自摻雜液使用’ 將聚》酸_亞胺環化而可製造熱壓接而去除’同時 再者,將如前述而予以製造之聚辟 从如 250t,且添減亞胺化劑,於15〇。$,勺溶液加熱為150〜 度反應,將其敲胺環化後,令溶劑J,’ _^曰=15〜50°C的溫 出成為粉末,之後,藉由將該粉末^解1 不良溶劑中析 接性雜亞胺的有機溶劑溶液。解方、有機洛劑而可得到熱壓 為了得到熱壓接性聚臨亞胺,該有機溶劑中之 基的莫耳數)的使用量作為相對於酸酐ϋ作為私 二酐與讀_的_紅總料數)的^ :Tu ’而最理想之樣 使用-族酐而反觸,該使用量作為 . 基之莫耳量的比,可為_以下之__。四魏-酐的酸酐 熱壓,性聚醯亞胺的製造中,#得到 時,與金屬箔之疊層體,亦即本發明之LED 的刀子1小 度有下降的航。 科狀LED肖散熱基板的黏接強 再者,以限制聚醯胺酸的凝膠化為目的, 時,相對=體成分(聚合物)濃度,於⑽iμ合 添加磷系穩定劑,例如亞磷酸三苯酯'磷酸三苯酯0、乾圍内 又’以促進酿亞胺化為目的,可於摻雜液中添加 合物。例如,可將咪唑、2—曱基咪唑、丨,2—二有枝化 苯基♦坐、苯持坐、異料、取代咖轉,^ 以〇.〇5〜1〇重量%,特別是αι〜2重量%的比例=^酸’ 低溫形成w亞賴,故為了避倾亞職不足而;r 較 再者,以黏接強度的穩定化為目的,亦可於 胺用聚醯胺酸溶液添加有機鋁化合物、無機鋁化合物亞 合物。例如,.可將氫氧化紹、三乙s_同紹等,相對於^=錫^ 以鋁金屬為lppm以上,特別是丨〜丨⑻办坪^^的比例添二, 在由酸成分及二胺成分製造聚醯胺酸時使用的有機溶,,即 201205906 =對於耐熱性聚醯亞胺及熱壓接性聚醯亞胺中之任一情況,亦可 二出N-曱基-2 —吡咯啶酮、N,N—二甲基曱醯胺、N,N—二甲 ς。醯月女、N,N-二乙基乙醯胺、二甲亞礙、六甲基知軸胺、 土己内醢月女、曱g分類等。該等有機溶劑可單獨使用,亦可並 種以上。 耐熱性雜亞胺及熱壓接性聚_胺,為了㈣胺末端 i用λ酸酐,如’可使用鄰苯二甲_及其取代物、六氫鄰 =熱,⑶)的一面或雙面含有熱塵接性聚酿 藉由4方熱接性的聚酿亞胺膜,較理想之樣態為可 〇)藉由共擠製一澆鑄製膜法(亦僅稱為丘 ΪίΐΪί亞胺(S1)之摻雜液與熱壓接性聚酿亞胺⑻)之摻 到多層聚酿亞胺膜的方法;或{ 于…祕^亞月女化而传 ㈣亞胺(S1)之摻雜輯塗佈於支撐體上, 胺膜的^法^社雜液料乾無、酿亞胺化而得到多層聚酿亞 本特=======辭3—刪43號公報(曰 -例^下表不在雙面具有_接性的3層之聚醯亞胺膜的製造之 將耐熱性聚醯亞胺(sn ’ 胺(S2)的聚醯胺酸溶液,藉由^與^接性聚醯亞 成形用模,繞鑄於不錄鋼鏡面給至三層擠製 佈於支撐體面上,俾使耐熱性鑄塗 45—,其兩側之熱塵接性聚酿亞胺層居度為4〜 〜20μηι。然後,於1〇〇〜如价 : θ )的尽度之總和為1 C將起鑄膜乾燥,得到作為半硬化 18 201205906 狀之Γ的乾燥狀態之自支撐性膜的聚酿亞胺膜⑷。 聚酿=膜在之 =2中00==,鱗膜時,於具有=接性的 化而使膜為自支標性的狀態。 乂及/或疋化學酿亞胺 離為亞胺膜(Α) ’溶劑及生成水分較理想之樣 6G質量%,而最理想之樣態為3G〜5◦當旦V 扎〜自支撐性膜升溫至乾燥•酿亞胺化 := 升溫=^:;以町分以上的升溫 的張可ΓίΙ0嶋化之際’對於自支撐性膜增加施予 :後得到之聚酿亞胺膜u)的線___ 〇 間斷地,在將ί 前述2支樓性膜的乾燥步驟,連續或 ”可移動的固定裝置等固“狀:的Ji:!!時 =〇p的範_之高溫,進行乾燥及熱處j支^ 為理I’而最理想之樣態為W1 ^ ; ::i;t㈡機溶劑及生成水等組成的揮2S 16 201205906 is a solution of polylysine. Then, the polyamidiamine is doped and then heated, and the self-doping solution is cyclized using 'poly" acid-imine to produce thermocompression bonding to remove 'at the same time, and will be as described above. The manufacturing is made up of, for example, 250t, and the imidization agent is added at 15〇. $, the spoon solution is heated to a 150-degree reaction, and after cyclization with the amine, the solvent J, ' _ ^ 曰 = 15 to 50 ° C is heated to become a powder, and then the powder is decomposed by 1 An organic solvent solution of a heterojunar mixture in a solvent. The solution and the organic agent can be obtained by hot pressing in order to obtain the thermocompression-type polylinimide, and the molar amount of the base in the organic solvent is used as the dianhydride relative to the anhydride oxime. The total amount of red is ^:Tu 'and the most ideal one is -there is a counter-contact with the anhydride, and the amount used is the ratio of the molar amount of the base, which can be __ below _. The anhydride of tetrawei-anhydride is hot pressed, and in the production of a polyimine, when it is obtained, the laminate with the metal foil, that is, the blade 1 of the LED of the present invention has a small decrease. The bonding of the LED-shaped heat-dissipating substrate is strong, and in order to limit the gelation of the poly-proline, the relative concentration of the body component (polymer) is added to the (10) μμ phosphorus stabilizer, such as phosphorous acid. Triphenyl ester 'triphenyl phosphate 0, dry inside and 'to promote the brewing imidization, can be added to the dope. For example, imidazole, 2-mercaptoimidazole, anthracene, 2-bi-branched phenyl ♦ sitting, benzene holding, dissimilar material, substituted coffee, ^ 〇.〇5~1〇% by weight, especially The ratio of αι to 2% by weight = ^acid' low temperature forms w Yalai, so in order to avoid the lack of sub-sector; r is more, for the purpose of stabilizing the bonding strength, can also be used for amine poly-proline The solution is added with an organoaluminum compound or an inorganic aluminum compound. For example, the amount of aluminum hydroxide can be more than 1 ppm with respect to ^= tin ^, and the ratio of 丨 丨 丨 8 8 8 8 , , , , , , , , , The organic solvent used in the preparation of polyamines by the diamine component, that is, 201205906 = N-mercapto-2 can also be used for any of heat-resistant polyimide and thermocompression-bonded polyimide. - pyrrolidone, N,N-dimethyldecylamine, N,N-dimethylhydrazine.醯月女, N,N-diethyl acetamide, dimethyl sulphate, hexamethyl spiramine, sinus sinensis, 曱g classification, etc. These organic solvents may be used singly or in combination of two or more. Heat-resistant heteroimine and thermocompression-bonded poly-amine, for the (iv) amine terminal i with λ anhydride, such as 'can use phthalic _ _ and its substituents, hexahydro-ortho = heat, (3)) one or both sides A hot-mixed polystyrene film is prepared by a four-part heat-bonding polyimide film, which is preferably formed by co-extrusion of a casting film (also known as a glutinous imine) a method of doping a doped liquid of S1) with a thermocompression-bonded polyimine (8)) into a multi-layered polyimine film; or a doping of (i) imine (S1) The coating is applied to the support, and the amine film is dried and dried, and the imidization is obtained to obtain a multi-layered polyaluminum. =======辞3—Deletion No. 43 (曰- Example ^ The following table is not a heat-resistant polyimine (sn' amine (S2) poly-proline solution produced by a three-layer polyimide film having a double-sided splicing property, by means of ^ and ^ The mold for forming a polythene, which is cast on a non-recorded steel mirror to give a three-layer extruded cloth on the support surface, so that the heat-resistant cast coating is 45-, and the hot-dust jointed polyimine layer on both sides thereof Degree is 4~~20μηι. Then, at 1〇〇~ as: θ) The sum of the best is 1 C, and the cast film is dried to obtain a self-supporting film of a self-supporting film (4) which is a semi-hardened 18 201205906. The poly-growth = film is in the = 2 00 == In the case of the squamous membrane, the membrane is self-supporting in the form of a splicing property. 乂 and/or 疋 酿 酿 酿 为 为 为 为 溶剂 溶剂 溶剂 溶剂 溶剂 溶剂 溶剂 溶剂 溶剂% by mass, and the most ideal form is 3G~5◦When the V is tied to the self-supporting film, the temperature is raised to dry • The imidization: = The temperature rises = ^:; The temperature rises above the town is divided by Zhang Kezhen The line ___ 增加 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于 对于When the device is solid, the shape of Ji:!! = the temperature of 〇p, the drying and heat is the best, and the ideal form is W1 ^; ::i; t (two) machine solvent And the formation of water and other components of the wave 2
Sit重量%以下,充分地將溶劑等自自支撐性ΐίί 自支J置二對 失持展置等之皮帶狀或鏈狀者,且盘該膜銷或是Sit is less than or equal to the weight of Sit, and the solvent or the like is self-supporting, and the self-supporting ΐ ί 自 置 置 置 置 皮带 皮带 皮带 皮带 皮带 皮带 皮带 皮带 皮带 皮带
° ^5 itiiZ 拉伸率i收縮率T最:二膜=向或縱向以適當的 縮的裝置。心之樣料G.5〜5%左右的伸縮倍率)伸 再度 / 19 201205906 能iJf張力下’在100〜督⑽溫度,藉由熱處理較理想 財齡嫩在雙面具有熱 又’製造的長條之在雙面具有鐘接性的聚邮胺膜,可以 適當公知的方法捲取為卷狀。 、 而- Π亞胺膜之洗鑄的摻雜液與支撐體鄰接側的膜表 ϊίίίΓ面鑄的摻雜液與支撐體未鄰接側(空氣側)的膜 聚酿亞胺膜’特別說明使用在如前述之耐峰聚酿亞 胺層(S1)的錢含有題接性懷 的 之LED用散熱基板的製造方法。 '的來I亞Μ美 LED用散熱基板,例如,在該耐熱 工亦即與峨物、峨‘ 你田iED用散熱基板嗜強度的觀點,更理想之揭能成· 使用刖述之在雙面含有熱壓接性聚酿亞胺層 的為. 在熱壓接性雜亞胺層(S2)的縣面( 直。亞胺膜’ 或銅合金羯’並於熱壓接性聚酿 銅笛 直接疊層㈣或銘合金|§而製造。以2)賴表面(B面側) 作為在具有熱壓接性的聚酿亞胺膜之雙面 用政熱基板的製造方法之-例,可舉出以之led 1)將長條狀的金屬箔(銅箔或銅合金/ ° :之·. 壓接性的聚醯亞胺膜、長條狀 欠之具有熱 該順序重疊3片,並送至加熱壓接ί置自力^)依照 使用熱風供給裝置或紅外線加熱機等之加。此時, 在緊接於導入前的沿線,於]50〜25()。,二,車又理想之樣態為 250C左右’特別是高於15〇。〔 20 201205906 · 且為25〇t:以下的溫度,預熱2〜12〇秒鐘左右較為理想。 ' t)使用一對的壓接滾軋或雙帶擠壓,在該加熱壓接區域的溫 度ί較Ϊ酿亞胺(S2)的玻璃轉化溫度高20。〇以上之溫度至400。3 的溫度範圍,特別是在較聚酿亞胺(S2)白勺玻璃轉化溫 1高3(rc 以上之溫度至40(TC的溫度範圍,將金屬箔/聚醯亞胺/金屬箔之 3片重疊於加壓下熱壓接。 / 3)特別是在雙帶擠壓時,陸續於冷卻區域在加壓下冷卻,較 樣態為冷卻至較魏亞胺(S2)之玻猶化溫度低抓以 特別是冷卻至低3叱以上的溫度,在聚醯亞胺膜的雙 面冗層i屬箔,將其捲取為卷狀。 ,據前述而可製造卷狀的LED用散熱基板。 亡°亥製造方法中,藉由於熱壓接前預熱,而防止因為包含於聚 ^亞月女的水义等、熱壓接後之疊層ϋ的發、泡之外觀不佳的產生, 並可防亡電子電路形成時之焊接浴浸潰時之發泡,且根據其而可 =產ΐ產率之惡化。再者,將熱壓接裝置整體設置於爐中的方 法亦可考慮’但由於熱壓接裝置被實質限定於如小型之類者,led ίίΐ基板的?狀受到限制,故並不·。X,即令在外形進行 '^^β至宜層之釗聚酿亞胺亦再度吸濕,而難於避免因熱壓 後的,層體之發泡產生的外觀不佳、焊接顺性之下降。 &擠壓,係為可在加壓下進行高溫加熱一冷卻者,而使用 加,、'、"質的液壓式者較為理想。 厭雙面'具有熱壓接性的聚醯亞胺膜與金屬落,使用雙帶擠 由於加壓下熱壓接—冷卻並疊層,而可適當地將收取速度 ί 分以上’並且’可得到長條且寬為約4QQmm以上,特 上之寬紅接合強度大,而且在金職表面不會 有皺^之【卜酿好的金㈣疊層聚•亞_(.led崎熱基板〕。 酸亞胺LED用散熱基板,供給熱壓接性聚 (亦即保護材2片),在加壓下熱壓接-冷卻而 直曰車又為理&。保護材’只要是非熱壓接性且表面平滑性良好者 201205906 不論材料可使用,例如,金衫,且尤可舉*銅落、不 高耐紐雜亞賴(抑興産股份有限公司製、 LhXS)寺之厚度5〜125μιη左右者。 ,前述而得到的LED用散熱基板,依照公知的方法,藉 ‘線或銅合金箱’形成金屬配線,並於形成金屬 卽~ 曰曰片。本發明的LED用散熱基板,散熱性佳,° ^5 itiiZ Tensile rate i Shrinkage T is the most: two films = the right or the longitudinal direction with a suitable shrinkage device. The sample of the heart G.5~5% expansion ratio) stretched again / 19 201205906 can iJf tension under the temperature of 100 ~ Du (10), by heat treatment, the ideal aging age is hot on both sides and 'manufactured long The polyimide film having a bell-bonding property on both sides can be wound into a roll shape by a known method. And - the film of the doped liquid of the yttrium imide film and the film on the side adjacent to the support ϊ ί ί Γ Γ Γ Γ Γ Γ Γ Γ Γ Γ 掺杂 掺杂 掺杂 掺杂 掺杂 掺杂 ' ' ' ' ' ' ' ' ' ' ' ' In the method of the above-mentioned peak-resistant polyimide layer (S1), the method for producing a heat-dissipating substrate for LEDs is described. 'I'm coming to Asia and the United States to use the heat-dissipating substrate for LEDs. For example, in the heat-resistant work, that is, the heat-resistant substrate of the object, it is more desirable. The thermocompression-bonded polyimide layer is used in the surface of the thermocompression hybrid imine layer (S2) (straight. imine film 'or copper alloy 羯' and thermo-compression bonding Direct lamination (4) or alloy § §. 2) Lai surface (B side) As a method for manufacturing a double-sided thermal substrate for thermocompression-bonded polyimide film, Led for 1) long strip-shaped metal foil (copper foil or copper alloy / °: · · crimping polyimide film, long strips of heat, the order overlaps 3 pieces, and Send to the heating and crimping ί set the self-power ^) according to the use of hot air supply device or infrared heater, etc. At this time, immediately before the introduction, along the line 50 to 25 (). Second, the ideal state of the car is around 250C', especially above 15〇. [ 20 201205906 · And 25 〇 t: The following temperature, preheating is preferably about 2 to 12 seconds. 't) Using a pair of crimped or double strip extrusions, the temperature in the heated crimp zone is 20 higher than the glass transition temperature of the brewed imine (S2). 〇 Above the temperature to 400. 3 temperature range, especially in the glass transition temperature of the brewing imine (S2) is higher than 3 (rc above the temperature to 40 (TC temperature range, metal foil / poly 醯3 pieces of imine/metal foil are superimposed under pressure and hot-pressed. / 3) Especially in the case of double-belt extrusion, it is cooled under pressure in the cooling zone, and is cooled to the more iminoimine. S2) The glass has a low temperature and is cooled to a temperature of at least 3 Torr, and is wound on a double-sided layer of a polyimide film, and is wound into a roll. In the manufacturing method of the rolled LED, the pre-heating before the thermocompression bonding prevents the lamination of the laminated crucible after the thermocompression bonding, such as the water confinement of the poly-Asian woman. The appearance of the bubble is not good, and the foaming at the time of the formation of the soldering bath during the formation of the electronic circuit can be prevented, and the yield of the crucible can be deteriorated according to the result. Further, the thermocompression bonding apparatus is integrally disposed. The method in the furnace can also be considered 'but because the thermocompression bonding device is substantially limited to such as a small one, the shape of the led ίίΐ substrate is limited, and thus · X, that is, in the shape of '^^β to the layer of 钊 酿 酿 亦 亦 亦 亦 亦 亦 亦 亦 亦 亦 亦 亦 亦 亦 亦 亦 亦 亦 亦 亦 亦 亦 钊 钊 钊 钊 钊 钊 钊 钊 钊 钊 钊 钊 钊 钊 钊 钊 钊 钊& squeezing, which is a high-temperature heating-cooling under pressure, and the use of the addition, ', " quality hydraulic type is ideal. The imide film and the metal drop are double-strand extruded by thermocompression under pressure-cooling and lamination, and the charging speed can be appropriately set to above 'and' and the strip can be obtained and the width is about 4QQmm or more. The wide red joint strength is large, and there is no wrinkle on the surface of the gold metal. [Buy gold (four) laminated poly-Asian _ (.led heat substrate). Acid imide LED heat sink substrate, supply heat pressure Contact poly (that is, 2 pieces of protective material), thermocompression under pressure - cooling and straight brakes are also rational & protective material 'as long as it is non-thermal pressure bonding and good surface smoothness 201205906 regardless of material Use, for example, gold shirt, and especially * copper drop, not high resistance New Zealand Yalai (made by Yixing Co., Ltd., LhXS) The thickness of the temple is about 5 to 125 μm. The heat-dissipating substrate for LED obtained as described above is formed into a metal wire by a 'wire or copper alloy case' according to a known method, and a metal 卽 曰曰 曰曰 is formed. The LED of the present invention. Using a heat sink substrate, heat dissipation is good,
抑i LPT)照明裳置、LED f光用、基板搭載很多的LED,亦可 抑制LED之溫度上昇、發光效率之下降。 ,』JI LPT) Illumination, LED f light, and a large number of LEDs on the substrate can also suppress the temperature rise of the LED and the decrease in luminous efficiency. ,』J
[實施例] 於該=實施例而更詳細地說明本發明,但本發明並非限定 (評價方法) 、财離,強度:依據瓜· C5〇16,以9〇。、寬5麵的條件 测疋聚亞胺膜與鋁箔之間的剝離強度。測 醯ί胺/㈣的疊層體。剝離強度之測定,係實施=[Examples] The present invention will be described in more detail with reference to the examples, but the present invention is not limited thereto (evaluation method), and the strength and strength are 9 〇 according to 瓜·C5〇16. , 5 sides wide condition The peel strength between the polyimide film and the aluminum foil was measured. A laminate of 醯ίamine/(iv) was measured. Determination of peel strength, implementation =
及焊接耐熱260 c · 30秒處理後之3項。 M (2)焊接耐熱性:依據ns · C6481 聚酿亞_的叠層體; 而觀察疊層體的聚酿亞胺膜側有n貫也耐熱處.理後藉由目视 〇 :無發泡,X :有發泡。 的』。亞胺以 ,面成為外側的情況與_以内==’ 〇 ·無裂縫,X :有裂縫。 (參考例1 :耐熱性聚醯亞胺S1 在N-甲基-2-—將對S念U,M, 22 201205906 :聯苯四_二酐(s-BPDA)以麵:998莫耳比加入, 早體濃度成為18% (重量%、町相同),於贼反應3小 得到的聚《酸溶液之25t:之溶液黏度,'約_泊(黏^度單位 (簽考例2 :熱壓接性聚醯亞胺S2用摻雜液之製造) 在N-曱基-2-吼略奶同中將1>3一雙(4 —胺^苯氧基)苯 (TPE-R)與 2,3,3’,4’ —聯苯四羧酸二酐(a—BpDA)及 3 3, 4 斗, —聯苯讀酸二酐(S-BPDA)以1〇〇〇 : 2〇〇 : 8〇〇的莫耳比加/, 俾使單體濃度絲18%,並且摘於單體重量,加人三苯基鱗酸 酉曰0.5重i /,方;40 C反應3小時。得到的聚醯胺酸溶液之25。 之溶液黏度,約1680泊。 (參考例3、4 :熱壓接性多層聚醯亞胺膜A1、A2之製造) 一使用设有二層播製成形用模(多歧管型模)的製膜裝置,改 變三層擠顏之厚度,將財相丨及參考例2 _的聚酿胺酸 溶液澆鑄於金屬製支撐體上,以14(rc的熱風連續地乾燥後,剝離 而形成自支撐性膜。將自該支撐體剝離的自支撐性臈,以加埶焯 自150°C緩慢地升溫至4贼為止,並進行溶劑之去除遵亞胺化' 製造厚度不同的2種類之長條狀的三層聚醯亞胺膜,將其捲取為 卷狀。 ' 評價得到的三層聚醯亞胺膜(層構成:S2/S1//S2)之 的結果係示於此。 (熱壓接性多層聚醯亞胺膜A1) •厚度構成:2.5μηι/7.5μπι/2·5μίη (合計 12.5μηι)。 • S2層的玻璃轉化溫度:240°C。 • S1層的玻璃轉化溫度:在3〇〇°c以上,無法確認明確的溫 度。 } 4W^WMt(50〜20(TC):MD19ppm/t:,TDl8pjpm/t:。 •機械特性(測試方法:ASTM · D882) 1) 抗拉強度:MD,TD各520MPa、 2) 拉伸率:md,td各90%、 3) 拉伸彈性係數:mdjd各7200MPa。 23 201205906 •電特性(測試方法:ASTM · D149) ])崩潰電壓(breakdownvoltage) : 4.9kV。 (熱壓接性多層聚醯亞胺膜A2) ^ •厚度構成.4μηι/17μπι/4μηι (合計 25μηι)。 • S2層的玻璃轉化溫度:240°C。 • S1層的玻璃轉化溫度:在30(TC以上,無法確認明確的溫 度。 里 •線膨脹係數(50〜200°C):MD19ppm/t:,TD18ppm/t:。 •機械特性(測試方法:ASTM · D882) 1)抗拉強度:MD,TD各520MPa、 2 )拉伸率:MD,TD 各 100%、 3 )拉伸彈性係數:md,TD各72〇〇MPa。 •電特性(測試方法:ASTM · D149) Ο崩潰電壓:7.1kV。 該熱壓接性多層聚醯亞胺膜(A1、A2)為厚度12 5μηι^ 25μπι,較習知用於一般的LED用散熱基板之環氧樹脂膜(厚度: 1.2mm)更薄,但電絕緣性係為相同。 以下的實施例中’係於聚醯亞胺膜的A面側疊層銅箔,並於 聚醯亞胺膜的B面側疊層銘箱。 銘’治,為了去除附著於表面的油分,係使用以有機溶劑處理 者。 (實施例1〜3) (LED用散熱基板之製造) 在緊接於雙帶擠壓前之沿線(in-line)以2〇〇°c的熱風加熱3〇 而預熱的3層聚酿亞胺膜A2之一面(A面)疊層電解鋼箔(厚 度丄18μιη、Rz=〇.6pm),並於相反側的面(B面)疊層如表1 所示之無處理或經表面處理的Al_Mg合金箔 (Furukawa-SkyAluminumCorp.製,A5052-H34、厚度:300μη〇, 且=该聚醯亞胺膜Α2送至加熱區域(最高加熱溫度:33〇。〇, 接著送至冷卻區域(最低冷卻溫度:丨8(rc ),在壓接壓力:3 9MPa、And welding heat resistant 260 c · 3 seconds after treatment. M (2) Solder heat resistance: according to the laminate of ns · C6481 聚亚亚_; while the side of the polyimide layer of the laminate was observed to have n heat and heat resistance. Bubble, X: There is foaming. of". The imine has a surface which becomes the outer side and _ or less ==' 〇 · no crack, and X: there is a crack. (Reference Example 1: Heat-resistant polyimine S1 in N-methyl-2--will be S, U, M, 22 201205906: Biphenyltetra-dianhydride (s-BPDA) face: 998 molar ratio Add, the concentration of the early body becomes 18% (% by weight, the same in the same town), and the viscosity of the solution of the polyacid solution is 25t: the viscosity of the solution is about 3 kPa (the viscosity of the unit (test case 2: heat) Manufacture of Crimped Polyimine S2 with Doping Solution) In the case of N-mercapto-2-indenyl milk, 1>3-bis(4-aminophenoxy)benzene (TPE-R) and 2,3,3',4'-biphenyltetracarboxylic dianhydride (a-BpDA) and 3 3, 4 bucket, -biphenyl acid dianhydride (S-BPDA) to 1〇〇〇: 2〇〇 : 8 〇〇 Mo Er Bi Jia /, 俾 单体 单体 单体 单体 单体 单体 单体 单体 单体 单体 单体 单体 单体 单体 单体 单体 单体 单体 单体 单体 单体 单体 单体 单体 单体 单体 单体 单体 单体 单体 单体 单体 单体 单体 单体 单体 单体 单体 单体 单体The viscosity of the solution of the polyamic acid solution is about 1680 poise. (Reference Example 3, 4: manufacture of thermocompression-bonded multilayer polyimide film A1, A2) The film-making device of the mold (multi-manifold type mold) changes the thickness of the three-layer extruded face, and dissolves the grain and the poly-branched acid of Reference Example 2 Casted on a metal support and dried continuously with 14 (r hot air of rc, and then peeled off to form a self-supporting film. The self-supporting crucible peeled from the support is slowly heated from 150 ° C by twisting. Until the thief, the removal of the solvent was followed by imidization. Two types of long-length three-layered polyimide membranes having different thicknesses were produced and wound into a roll. 'Evaluated three-layered polyfluorene The results of the imine film (layer composition: S2/S1//S2) are shown here. (Thermal pressure-bonded multilayer polyimide film A1) • Thickness: 2.5 μm / 7.5 μπι / 5 μίη (total 12.5μηι) • Glass transition temperature of S2 layer: 240°C • Glass transition temperature of S1 layer: above 3〇〇°c, no clear temperature can be confirmed. } 4W^WMt(50~20(TC): MD19ppm/t:, TDl8pjpm/t: • Mechanical properties (test method: ASTM · D882) 1) Tensile strength: MD, TD each 520MPa, 2) Tensile rate: md, td each 90%, 3) Stretching Elastic coefficient: mdjd each 7200MPa. 23 201205906 • Electrical characteristics (test method: ASTM · D149)]) breakdown voltage (breakdownvoltage): 4.9kV. (Thermal pressure-bonding multilayer polyimide film A2) ^ • Thickness composition: 4μηι/17μπι/4μηι (total 25μηι). • Glass transition temperature of the S2 layer: 240 °C. • Glass transition temperature of S1 layer: above 30 (TC, no clear temperature can be confirmed. • Linear expansion coefficient (50~200°C): MD19ppm/t:, TD18ppm/t: • Mechanical properties (test method: ASTM · D882) 1) Tensile strength: 520 MPa for MD and TD, 2) Tensile ratio: 100% for MD and TD, 3) Tensile modulus: md, TD 72 MPa each. • Electrical characteristics (test method: ASTM · D149) Ο Crash voltage: 7.1 kV. The thermocompression-bonded multilayer polyimide film (A1, A2) has a thickness of 12 5 μm 2 25 μm, which is thinner than an epoxy resin film (thickness: 1.2 mm) which is conventionally used for general heat dissipation substrates for LEDs, but is electrically The insulation is the same. In the following examples, a copper foil was laminated on the A side of the polyimide film, and a case was laminated on the B side of the polyimide film. In order to remove the oil adhering to the surface, it is treated with an organic solvent. (Examples 1 to 3) (Production of heat-dissipating substrate for LED) 3-layer brewing which was preheated by heating in an in-line of 2 〇〇 ° C immediately before the double-belt extrusion One side (A side) of the imine film A2 is laminated with an electrolytic steel foil (thickness 丄18 μm, Rz=〇.6 pm), and laminated on the opposite side (B side) as shown in Table 1 without treatment or surface. The treated Al_Mg alloy foil (manufactured by Furukawa-SkyAluminum Corp., A5052-H34, thickness: 300 μη〇, and = the polyimide film 2 was sent to a heating zone (maximum heating temperature: 33 〇. 〇, then sent to the cooling zone ( Minimum cooling temperature: 丨8 (rc), at crimping pressure: 3 9MPa,
S 24 201205906 I表1] ~ . 與聚醯亞胺膜Β面疊層側的鋁箔之表面處理 實施例1 無處理 實施例2 Η 硫酸氧化鋁膜處理 實施例3 ΚΟ處理(處理層:約1.5μηι) 壓接時閛2分鐘,連續地熱壓接—冷卻而疊層,製造LED用散熱 基板(寬:540mm、長:30m),並捲取為卷狀。表2表示評價得 到之LED用散熱基板的剝離強度、焊接耐熱性及彎曲加工性的結 果。焊接耐熱性的評價係於25〇°c實施。S 24 201205906 I Table 1] ~ Surface treatment of aluminum foil on the side of the laminate side of the polyimide film No. Example No treatment Example 2 氧化铝 Alumina sulfate film treatment Example 3 Treatment (treatment layer: about 1.5 Μηι) 压 2 minutes during crimping, continuous thermocompression bonding - cooling and lamination, manufacturing a heat dissipation substrate for LED (width: 540 mm, length: 30 m), and winding into a roll shape. Table 2 shows the results of evaluation of the peel strength, solder heat resistance and bending workability of the heat-dissipating substrate for LED obtained. The evaluation of solder heat resistance was carried out at 25 ° C.
剝離強度(N/mm) 一 (AI膜/聚_亞胺間) 焊接耐熱性評價 (250〇C ) 彎曲加工性評價 初期 濕熱後 焊接耐熱f 銅箔外彎曲 銅箔內彎曲 實施例1 實施丽 2.7 3.1 2.9 3.1 〇 〇 〇 4< 3.6 X 〇 X 貫施例3 4< 4< 4< X 〇 X (貫施例4〜5 ) (LED用散熱基板之製造) 在緊接於雙帶擠壓前之沿線以2〇〇。〇的熱風加熱30秒鐘而預 熱的3層聚醯亞胺膜之一面(a面)疊層壓延銅箔(厚度:、 粗縫化等級、Κ_ζ=1.2μηι) ’並於相反側的面(B面)疊層無處理 的 Al~~Mg 合金箔(Furukawa-SkyAluminumCorp.製,Α5052 — H34、厚度:3〇〇μπ〇,且將該聚醯亞胺膜送至加熱區域(最高加 熱溫度.330C),接著送至冷卻區域(最低冷卻溫度:18〇它), f壓接壓力:;3.9MPa、壓接時間2分鐘,連續地熱壓接—冷卻而 疊層,製造LED用散熱基板(寬:540mm、長:3〇m),並捲取 為卷狀。表3表示評價得到之LED用散熱基板的剝離強度、焊接 耐熱性及彎曲加工性的結果。焊接耐熱性的評價係於盘 270°C 實施。 25 201205906 [表3] 聚醯亞胺 膜 剝f (A 雅強度(Ϊ [膜/聚1 si/mm ) 萬亞胺間) 焊接耐熱性評價 ,彎曲加工性評價 初期 濕熱後 焊接耐熱後 250〇C 270〇C 銅链外彎曲 ||箔內彎曲 實施例4 A1 1.7 1.6 1.7 〇 〇 〇 〇 實施例5 A2 3.1 3.3 3.5 〇 X 〇 〇 (熱阻之評價) 藉由如下述的方法,評價以實施例4及實施例5製造之LED 用散熱基板的熱阻。 首先,將製造的LED用散熱基板切割成icmxl 5cm的尺寸。 接著,在具有lOcmxlOcm之面積之銅製的水冷板與LED用散熱 基板之鋁箔側塗佈很薄的熱傳導性潤滑脂,將兩者貼附。之後, 在LED用散熱基板之銅箔側與一邊之側面為1 cmx 1.5cm的電晶體 (2SC3258)塗佈很薄的熱傳導性潤滑脂,並將兩者貼附。為了測 定電晶體與LED用散熱基板之界面的電晶體侧之最表面的溫度 Th、及水冷板與LED用散熱基板之銅箔的接觸部之水冷板側之最 表面的溫度T1,預先在電晶體與水冷板之表面設置用以插入細埶 電偶的溝。 使用如前述而予以製造的LED用散熱基板,並安裝(| 銅箔/巧醯亞胺膜/Al—Mg合金箔/水冷板與細熱電偶„ 接著,在電晶體施加5〜3胃的電力p,等待熱 示 定,測定Th、Tl。 熱阻Rth係由下述式算出。Peeling strength (N/mm) I (between AI film/polyimine) Evaluation of solder heat resistance (250〇C) Evaluation of bending workability Initial heat and humidity after welding heat f Copper foil outer curved copper foil bending Example 1 2.7 3.1 2.9 3.1 〇〇〇 4 < 3.6 X 〇 X Example 3 4 < 4 < 4 < X 〇 X (Examples 4 to 5) (Manufacture of heat-dissipating substrate for LED) Immediately after double-belt extrusion The front line is 2 miles. One side (a side) laminated calendered copper foil (thickness: rough grading grade, Κ_ζ=1.2μηι) of the preheated three-layer polyimide film is heated for 30 seconds by the hot air of the crucible and is on the opposite side. (B side) laminated untreated Al~~Mg alloy foil (manufactured by Furukawa-SkyAluminum Corp., Α5052 - H34, thickness: 3〇〇μπ〇, and the polyimide film is sent to the heating zone (maximum heating temperature) .330C), then sent to the cooling zone (minimum cooling temperature: 18 〇 it), f crimping pressure: 3.9 MPa, crimping time 2 minutes, continuous thermocompression bonding - cooling and lamination, manufacturing heat sink substrate for LED (width: 540 mm, length: 3 〇 m), and wound up in a roll shape. Table 3 shows the results of evaluation of peel strength, solder heat resistance, and bending workability of the heat-dissipating substrate for LED obtained. 270 ° C. 25 201205906 [Table 3] Polyimide film stripping f (A ya strength (Ϊ [film / poly 1 si / mm) between the imine) Welding heat resistance evaluation, bending processability evaluation initial damp heat Post-weld heat-resistant 250〇C 270〇C copper chain outer bending||Foil bending 4 Example A1 1.7 1.6 1. 7 〇〇〇〇 Example 5 A2 3.1 3.3 3.5 〇X 〇〇 (Evaluation of Thermal Resistance) The thermal resistance of the heat-dissipating substrate for LEDs manufactured in Example 4 and Example 5 was evaluated by the following method. The heat-dissipating substrate for the LED was cut into a size of 5 cm of icmxl. Next, a thin heat-conductive grease was applied to the aluminum foil side of the heat-dissipating substrate made of copper and the surface of the heat-dissipating substrate for LEDs having an area of 10 cm x 10 cm, and the two were attached. After that, a very thin thermal conductive grease was applied to the copper foil side of the heat dissipation substrate for LED and the transistor (2SC3258) having a side surface of 1 cm x 1.5 cm, and the two were attached. For measuring the transistor and the LED. The temperature Th1 of the outermost surface of the transistor side of the interface of the heat dissipation substrate and the temperature T1 of the outermost surface of the water-cooled plate side of the contact portion of the water-cooling plate and the copper foil for the heat-dissipating substrate for the LED are previously set on the surface of the transistor and the water-cooled plate. a groove for inserting a fine galvanic couple. Use a heat-dissipating substrate for LEDs manufactured as described above and mount it (|copper foil/small imide film/Al-Mg alloy foil/water-cooled plate and fine thermocouple „ Next, Apply 5 to 3 stomach power to the transistor p, given waiting calorimetry measurement Th, Tl. based thermal resistance Rth is calculated by the following formula.
Rth= (Th-Tl) /P-2xRg 在士之Rg為熱傳導性潤滑脂1層分的熱阻(〇:35。〇/”)。 π 求f以實施例4製造的LED散熱基板之熱阻為 L’m缝其if為!常良好的熱阻。再者,求得以實施例5製造的 led政,基板之熱阻為Ofc/w,且為良好的熱阻。 (實施例6) ’、 (LED用散熱基板之製造) 在緊接於雙帶擠壓前之沿線以·C的熱風加熱3G秒鐘而預 26 *Rth=(Th-Tl) /P-2xRg Rg is the thermal resistance of the thermal conductive grease 1 layer (〇: 35.〇/"). π find f the heat of the LED heat sink substrate manufactured in Example 4. The resistance is L'm and its if is a good thermal resistance. Furthermore, the LED produced by the embodiment 5 is obtained, and the thermal resistance of the substrate is Ofc/w, and is a good thermal resistance. (Example 6) ', (manufacturing of heat-dissipating substrate for LED) is heated by hot air of ·C for 3G seconds immediately before the double-belt extrusion and pre-26 *
S 201205906 熱的3層聚醯亞胺膜Ai之一面疊層電解銅箔(厚度:18μηι), 並於相反側的面疊層Al—Mg合金箔(Fumkawa-SkyAluminimi forp,製,JIS5052—H32(A5052—H32)、厚度:300μη〇,且將 該聚醯亞胺膜Α1送至加熱區域(最高加熱溫度:33(rc),接著S 201205906 A three-layer laminated polyimide film Ai laminated with an electrolytic copper foil (thickness: 18μηι), and laminated on the opposite side of the surface of Al-Mg alloy foil (Fumkawa-SkyAluminimi forp, manufactured by JIS5052-H32) A5052—H32), thickness: 300μη〇, and the polyimine film Α1 is sent to the heating zone (maximum heating temperature: 33 (rc), then
Sit卩,(最低冷卻溫度:18G°C),在壓接壓力:3.9MPa、 L .二ί ’連續熱壓接—冷卻而疊層,製造LED用散轨 疊層體,且㈣==A1—Mg合她勺雙面金屬荡 並具有良好㈣LED錄減板何折疊,可折疊 (熱阻之評價) 散熱基板的熱6製造之LED用 [產業上利用性] .c/w,且為良好的熱阻。 如前述’根據本發明, 具有優異的散触及耐簡性,ϋ加工的L£D肖散熱基板, 例如朝内側折疊,朝外側^。很缚,而且具有良好的撓曲特性, 【圖式簡單說明】 益 號說明】 【主要元件符 益Sit卩, (minimum cooling temperature: 18G °C), laminated at a crimping pressure: 3.9 MPa, L. 2 'continuous thermocompression-cooling, to manufacture a loose-area laminate for LEDs, and (4) == A1 —Mg with her spoon double-sided metal sway and has good (four) LED recording and subtraction board, which is folded, foldable (evaluation of thermal resistance), heat-dissipating substrate, heat, 6 manufacturing, LED [industrial use], .c/w, and good Thermal resistance. As described above, according to the present invention, the L¥D xiao heat-dissipating substrate having excellent detachment and squeezing properties, for example, is folded inwardly and outwardly. Very binding, and has good flexural characteristics, [simplified description of the schema] Benefit Description] [Main component benefits
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| CN (1) | CN102939671A (en) |
| TW (1) | TWI591865B (en) |
| WO (1) | WO2011129232A1 (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2014141340A1 (en) * | 2013-03-11 | 2017-02-16 | パナソニックIpマネジメント株式会社 | Lighting device and display device |
| US9381717B2 (en) * | 2014-01-22 | 2016-07-05 | Asia Vital Components Co., Ltd | Manufacturing method of heat dissipation structure applied to mobile device |
| CN104393162A (en) * | 2014-11-05 | 2015-03-04 | 共青城超群科技股份有限公司 | Copper column type substrate-encapsulated LED |
| EP3276655A1 (en) * | 2016-07-26 | 2018-01-31 | Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO | Method and system for bonding a chip to a substrate |
| CN113507780A (en) * | 2021-07-08 | 2021-10-15 | 江西柔顺科技有限公司 | Heat dissipation circuit board and preparation method thereof |
| CN116406090B (en) * | 2023-05-15 | 2024-02-02 | 台山市科伟电子科技有限公司 | Production process of aluminum-based copper-clad aluminum foil plate |
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| US4413049A (en) * | 1980-06-30 | 1983-11-01 | Dennison Manufacturing Company | Anodized electrostatic imaging surface |
| US4985509A (en) * | 1985-04-18 | 1991-01-15 | Hitachi, Ltd. | Heat curable resin composition |
| JP2542806B2 (en) * | 1985-05-08 | 1996-10-09 | 三洋電機株式会社 | Semiconductor device |
| JPS6433947A (en) * | 1987-07-29 | 1989-02-03 | Hitachi Chemical Co Ltd | Wiring board for mounting semiconductor element |
| JPH02207587A (en) * | 1989-02-06 | 1990-08-17 | Nitto Denko Corp | Circuit board |
| JPH0897526A (en) * | 1993-01-27 | 1996-04-12 | Furukawa Electric Co Ltd:The | Metal base printed wiring board |
| US6175084B1 (en) * | 1995-04-12 | 2001-01-16 | Denki Kagaku Kogyo Kabushiki Kaisha | Metal-base multilayer circuit substrate having a heat conductive adhesive layer |
| US5889639A (en) * | 1997-02-07 | 1999-03-30 | Imation Corp. | Plain carbon steel shutter for removable data storage cartridges |
| JP4457542B2 (en) * | 2001-06-22 | 2010-04-28 | 宇部興産株式会社 | Multi-layer polyimide film with thermocompression bonding, heat-resistant copper-clad board |
| JP2003301048A (en) * | 2002-04-10 | 2003-10-21 | Polymatech Co Ltd | Thermally conductive molded product |
| US20040184272A1 (en) * | 2003-03-20 | 2004-09-23 | Wright Steven A. | Substrate for light-emitting diode (LED) mounting including heat dissipation structures, and lighting assembly including same |
| JP2005175150A (en) * | 2003-12-10 | 2005-06-30 | Ube Ind Ltd | Double-sided circuit board and manufacturing method thereof |
| CN1960870A (en) * | 2004-05-31 | 2007-05-09 | 株式会社钟化 | Polyimide multilayer body and method for producing same |
| US7303315B2 (en) * | 2004-11-05 | 2007-12-04 | 3M Innovative Properties Company | Illumination assembly using circuitized strips |
| US20060127686A1 (en) * | 2004-12-15 | 2006-06-15 | Meloni Paul A | Thermally conductive polyimide film composites having high thermal conductivity useful in an electronic device |
| KR100965441B1 (en) * | 2005-04-04 | 2010-06-24 | 우베 고산 가부시키가이샤 | Copper foil laminated board |
| JP4912624B2 (en) * | 2005-06-14 | 2012-04-11 | 株式会社フジクラ | Manufacturing method of light emitting element mounting substrate and manufacturing method of light emitting element module |
| JP2007012288A (en) * | 2005-06-28 | 2007-01-18 | Toshiba Lighting & Technology Corp | Lighting device and lighting fixture |
| US20070075306A1 (en) * | 2005-09-22 | 2007-04-05 | Toyoda Gosei Co., Ltd. | Light emitting device |
| US20080213605A1 (en) * | 2006-12-07 | 2008-09-04 | Briney Gary C | Multi-functional circuitry substrates and compositions and methods relating thereto |
| JP4943943B2 (en) * | 2007-05-22 | 2012-05-30 | 東レ・デュポン株式会社 | Vehicle lamp using LED lighting device |
| JP5181618B2 (en) * | 2007-10-24 | 2013-04-10 | 宇部興産株式会社 | Metal foil laminated polyimide resin substrate |
| US20100304180A1 (en) * | 2007-12-04 | 2010-12-02 | E.I Du Pont De Nemours And Company | Bendable circuit structure for led mounting and interconnection |
| JP2009172996A (en) * | 2007-12-26 | 2009-08-06 | Shin Etsu Chem Co Ltd | Flexible copper clad laminate and manufacturing method thereof |
| JP5233298B2 (en) * | 2008-02-01 | 2013-07-10 | 宇部興産株式会社 | Polyimide film and method for producing polyimide film |
| JP2009266461A (en) * | 2008-04-23 | 2009-11-12 | Rohm Co Ltd | Light-emitting diode illumination device |
| JP2010021400A (en) * | 2008-07-11 | 2010-01-28 | Mitsui Mining & Smelting Co Ltd | Printed circuit board with excellent heat dissipation property |
-
2011
- 2011-04-05 CN CN2011800268541A patent/CN102939671A/en active Pending
- 2011-04-05 KR KR1020127029108A patent/KR101763974B1/en active Active
- 2011-04-05 WO PCT/JP2011/058649 patent/WO2011129232A1/en not_active Ceased
- 2011-04-05 US US13/640,556 patent/US20130199771A1/en not_active Abandoned
- 2011-04-05 JP JP2012510626A patent/JP5920213B2/en active Active
- 2011-04-11 TW TW100112468A patent/TWI591865B/en active
Also Published As
| Publication number | Publication date |
|---|---|
| JPWO2011129232A1 (en) | 2013-07-18 |
| JP5920213B2 (en) | 2016-05-18 |
| KR20130086936A (en) | 2013-08-05 |
| US20130199771A1 (en) | 2013-08-08 |
| WO2011129232A1 (en) | 2011-10-20 |
| KR101763974B1 (en) | 2017-08-01 |
| CN102939671A (en) | 2013-02-20 |
| TWI591865B (en) | 2017-07-11 |
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