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TW201130008A - Electron gun and the vacuum evacuation apparatus - Google Patents

Electron gun and the vacuum evacuation apparatus

Info

Publication number
TW201130008A
TW201130008A TW99131461A TW99131461A TW201130008A TW 201130008 A TW201130008 A TW 201130008A TW 99131461 A TW99131461 A TW 99131461A TW 99131461 A TW99131461 A TW 99131461A TW 201130008 A TW201130008 A TW 201130008A
Authority
TW
Taiwan
Prior art keywords
electrode
electron gun
repeller
repeller electrode
pores
Prior art date
Application number
TW99131461A
Other languages
Chinese (zh)
Other versions
TWI476805B (en
Inventor
Masaya Watanabe
Yoshiro Kusumoto
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Publication of TW201130008A publication Critical patent/TW201130008A/en
Application granted granted Critical
Publication of TWI476805B publication Critical patent/TWI476805B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/063—Geometrical arrangement of electrodes for beam-forming
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/0203—Protection arrangements
    • H01J2237/0213—Avoiding deleterious effects due to interactions between particles and tube elements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06308—Thermionic sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/31—Processing objects on a macro-scale
    • H01J2237/3132—Evaporating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

Disclosed is an electron gun which is provided with a repeller electrode (24) in which a positive voltage is applied to an anode electrode (23) closer to the side of an emission hole (13) than the anode electrode (23), wherein the repeller electrode (24) pushes back positive ions which travel in the direction of a cathode electrode (21) along a central axis line (28) caused by the collision of electron beams with residual gas to the side of a vacuum chamber (18). The repeller electrode (24) having a cylindrical shape is not something to curve the trajectories of electron beams. In addition, a plurality of pores are formed in the repeller electrode (24), so that the gas in the repeller electrode (24) is evacuated passing through the pores. This prevents the positive ions from being incident upon the cathode electrode (21), making it possible to provide the electron gun having a long-life.
TW099131461A 2009-09-18 2010-09-16 Electron gun and the vacuum evacuation apparatus TWI476805B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009216506 2009-09-18

Publications (2)

Publication Number Publication Date
TW201130008A true TW201130008A (en) 2011-09-01
TWI476805B TWI476805B (en) 2015-03-11

Family

ID=43758687

Family Applications (1)

Application Number Title Priority Date Filing Date
TW099131461A TWI476805B (en) 2009-09-18 2010-09-16 Electron gun and the vacuum evacuation apparatus

Country Status (4)

Country Link
JP (1) JP5186599B2 (en)
CN (1) CN102484024B (en)
TW (1) TWI476805B (en)
WO (1) WO2011034086A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI820583B (en) * 2021-02-25 2023-11-01 日商紐富來科技股份有限公司 Cathode mechanism of electron gun, electron gun, and electron beam writing apparatus

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6779847B2 (en) * 2017-09-11 2020-11-04 株式会社ニューフレアテクノロジー Charged particle device, charged particle drawing device and charged particle beam control method
JP6466020B1 (en) 2018-10-16 2019-02-06 株式会社Photo electron Soul Electron gun, electron beam application apparatus, electron emission method using electron gun, and electron beam focal position adjustment method
CN110196362B (en) * 2019-05-05 2022-10-04 中国科学院电子学研究所 System and method for testing emission performance of electron gun
JP7269107B2 (en) * 2019-06-12 2023-05-08 日清紡マイクロデバイス株式会社 electron gun
JP7018418B2 (en) 2019-10-07 2022-02-10 日本電子株式会社 Electron gun, electron microscope, three-dimensional laminated modeling device, and current adjustment method for electron gun
US10923307B1 (en) * 2020-04-13 2021-02-16 Hamamatsu Photonics K.K. Electron beam generator
JP6762635B1 (en) * 2020-04-16 2020-09-30 株式会社Ｐｈｏｔｏ ｅｌｅｃｔｒｏｎ Ｓｏｕｌ Electron gun, electron beam application device, and electron beam emission method

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5784655U (en) * 1980-11-14 1982-05-25
CN1021390C (en) * 1985-04-01 1993-06-23 株式会社岛津制作所 Glow discharge tube for analysis
JPS6386339A (en) * 1986-09-29 1988-04-16 イメイトロン　インコ−ポレ−テツド Ion removing electrode
JPH077648B2 (en) * 1986-11-22 1995-01-30 日本真空技術株式会社 Space charge neutralization electron gun
JPH07249383A (en) * 1994-03-08 1995-09-26 Hitachi Ltd Electron gun and its assembly method
JPH07249391A (en) * 1994-03-09 1995-09-26 Fujitsu Ltd Electron beam equipment
EP0782174A1 (en) * 1995-12-26 1997-07-02 Nihon Shinku Gijutsu Kabushiki Kaisha Sputter ion pump
JP2001176422A (en) * 1999-12-17 2001-06-29 Hitachi Ltd Color cathode ray tube
JP2007066694A (en) * 2005-08-31 2007-03-15 Hamamatsu Photonics Kk X-ray tube

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI820583B (en) * 2021-02-25 2023-11-01 日商紐富來科技股份有限公司 Cathode mechanism of electron gun, electron gun, and electron beam writing apparatus

Also Published As

Publication number Publication date
JP5186599B2 (en) 2013-04-17
WO2011034086A1 (en) 2011-03-24
CN102484024B (en) 2015-08-12
CN102484024A (en) 2012-05-30
TWI476805B (en) 2015-03-11
JPWO2011034086A1 (en) 2013-02-14

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