201134539 六、發明說明： 【發明所屬之技術領域】 本發明係有關一種多通道式化學濾材，尤指一種由多 孔系吸附材直接製作成型出多孔道吸附單體，而把數多孔 道吸附單體陣列定位於邊框内部之設計者。 【先前技術】 按’用於淨化空氣分子污染物之化學濾材，常見之結 構型態有如第一圖所示之瓦楞紙式化學濾材（10)，其乃以 瓦愣紙板做為基體’再將吸附材粉末藉由結合技術（如浸塗 法）附著於瓦楞紙板上；然而，由於前述之瓦楞紙式化學濾 材（10)，其單位體積之吸附材僅約佔濾材整體之3〇%以 下’再者其單位體積之重量也較小，亦即短時間就會吸附 飽和，導致濾材就必須頻繁地更換。 次按’極低濃度（數ppt〜ppb)之惡臭、有毒及腐蝕性 氣體污染物，目前主要是以吸收塔、乾式洗滌吸附器（dry scrubbing adsorptive)及化學吸附濾材予以去除，且大多 有添加化學藥劑加強其淨化效率，以降低氣體中污染物濃 度及增加處理量。而物理吸附、化學吸附及化學吸收為去 除單元中之主要作用機制；其中，物理吸附為可逆反應， 主要以介質表面原有之官能基或孔洞性質進行污染物去 除；化學吸附及化學吸收作用則於介質中添加活性物質， 使巧·染物與添加物產生化學反應（例如酸鹼中和），而對於 所欲去除之污染物的去除率及去除量做不同程度之改善。 例如以活性碳為載體，將金屬鹽類含浸於活性碳上可去除 -3- m 201134539 二氧化硫及硫化氫’常使用之金屬鹽類有鉻鹽、銅鹽、銀 鹽等；改質過之活性碳吸附劑對於高濃度之污染物氣體具 有相當之吸附容量’但其吸附容量會隨污染物濃度下降而 降低，且當線速度增加時，去除效率及吸附容量都會大幅 降低。 再按’一般空氣分子之污染物（Airborne molecular contamination，AMC)包括硫化氫、二氧化硫、二甲基硫、 氫氟酸、硝酸等有機與無機酸、氨氣、甲酸及異丙醇…等 化合物’大多存在於週遭環境中，主要由於交通污染、工 地污染、農業污染、動植物氧化分解、生活污染物、工廠 排放、空氣氣體置換等因素所造成。而近來，國際間對於 環保議題及工業安全衛生及高科技廠潔淨室分子污染物淨 化之日益重視，考量工業廢氣對環境及勞工以至於一般大 眾身體產生之危害，故對於工業廢氣排放標準日趨嚴格， 國内外法規都已制定出相關的濃度及臭味的排放標準。 另一方面，近來高科技廠之高階製程對於含硫化合物 等有機與無機酸或鹼及低沸點有機化合物…等難處理之分 子污染物，在外氣引入潔淨室前的淨化程度要求愈為嚴 苛；例如在半導體晶圓製造廠及TFT_LCD面板光電製造業 面板製程中，去光阻程序（stl^pping pr〇cess)所使用之 去光阻剝離液（stripper)，主要成分為高沸點且幾乎完全 溶於水的有機化合物，包括單乙醇胺（MEA)、二甲基亞颯 (DMS0)以及乙二醇單丁醚（BDG)等；而在去光阻製程中去 光阻劑中的二甲基亞颯雖然是一種高沸點水溶性而且揮發 性低的液體，但在處理過程中，極容易形成低沸點且惡臭 -4 - 201134539 的二甲基硫（dimethyl sulfide，DMS)和二曱基二硫 (dimethyl disul f ide，DMDS)的氣態污染物。然而，以傳 統吸附法、冷凝法及吸收法並無法完全去除低沸點及低水 溶性的DMS與DMDS，而且其在低濃度下即會產生惡臭，極 易影響廠房周圍生活環境而引發民眾抗議，同時也影響到 廠房周圍其他高科技廠高階製程之產品良率。另因DMS之 性質與一般含硫氣態分子污染物不太相同，DMS雖亦屬於與 甲硫醇等性質相似之有機硫化物，但因其酸鹼性質不明顯 且分子較小，性質與硫化氫較接近但更不容易被氧化，故 相當不易處理；故若欲在常溫下將DMS分解，幾乎是不可 能的事，僅能將其吸附去除或氧化轉化成較易吸附之化合 物。 再者，空氣中常見的含硫氣態分子污染物為硫化氫和 二氧化硫，去除的方式一般以強氧化劑如高錳酸鉀等為 主，其反應機制如下： 二氧化硫去除反應機制 3S〇2+2KMn〇4+4KOH — 3K2S〇4+2Mn〇2+2H2〇 Mn〇2+S〇2+2KOH — K2S〇4+MnO+H2〇 ΜηΟ+〇2 — 2Μη〇2 硫化氫去除反應機制 3H2S+2KMn〇4 -> 3S+2Mn〇2+2KOH+2H2〇 然而，一般會使用顆粒狀、粉狀、球狀、纖維狀等之 吸附材經改質劑予以改質而吸附去除硫化物，其改質劑之 活性組成一般主要為過渡金屬，使用方法有直接使用過渡 金屬氧化物，或是將過渡金屬分散在如活性碳之多孔系載 201134539 體表面，或是兩者相互混用。有關去除硫化物之改質劑專 利如下：US 4075282專利案在活性碳碳床上喷出溶液方式 (碘、碘化鉀、硫化鈉、硫化氫鈉、水），可直接吸收二氧 化硫，硫化氫；US 4196183專利案則是在活性碳表面含浸 氧化銅或三氧化二鐵，對於中濃度（20〜250ppm)之硫化氫 具有98%之去除率；US 5063196專利案則是在活性碳表面 含浸碳酸銅，氫氧化銅、碳酸鋅、硝酸銀、三乙基二胺（TEDA) 及有機酸（maleic and酒石酸），而能有效去除氰化氫、氣 化氰（氯氣、氣化氩、二氧化硫）、曱醛及硫化氫，其最大 特點是不含鉻化合物且加入驗性化合物用以吸收酸性氣 體；US 5496785專利案是以乙酸辞、碳酸鉀作為活性碳之 主要活性組成，可有效去除氰化氫、四氣化碳、二氧化硫、 氣氣、氟化氫及硫化氫；而JP1996-323194中揭露一種將 錳離子交換在X型沸石上，可用於去除硫化氫及曱硫醇等 sulfide化合物，在較低之空間流速（3000H〆1)下，其起始 去除率可達99. 9%。 惟，對於如甲硫醇、硫化氫、二氧化硫、二曱基硫、 氫氟酸、琐酸、醋酸等有機與無機酸、氨氣、曱搭、丙二 醇甲醚醋酸酯及異丙醇…等空氣分子污染物之去除，目前 尚無較長效且易更換的移除濾材。 【發明内容】 本發明之主要目的，係欲解決先前技術濾材必須頻繁 更換及不易更換之問題，而具有增長濾材使用壽命及方便 更換之功效。 本發明之另一目的，則具有利用濾材搭配改質技術進 m -6 - 201134539 二曱基硫、氫氟 甲醛及異丙醇... 而有效去除甲硫醇、硫化氫、二氧化硫、 酸、硝酸、醋酸等有機與無機酸、氨氣、 等空氣分子污染物之長效淨化功效。 為達上述功效，本發明之結構特徵，係包括有·· 一邊框；以及 數多孔道吸附單體，由多孔系吸附材直接製作成型， 而陣列定位於該邊框内部者。201134539 VI. Description of the Invention: [Technical Field] The present invention relates to a multi-channel chemical filter material, in particular to a porous channel adsorbing material directly formed into a porous channel adsorbing monomer, and a plurality of porous channels adsorbing monomer The array is positioned by the designer inside the border. [Prior Art] According to the chemical filter material used to purify air molecular pollutants, the common structural type is corrugated paper chemical filter material (10) as shown in the first figure, which uses corrugated cardboard as the base body and then adsorbs. The powder is attached to the corrugated board by a bonding technique (such as dip coating); however, due to the corrugated chemical filter (10) described above, the adsorbent per unit volume is only about 3% of the total of the filter. The weight per unit volume is also small, that is, it is saturated in a short time, and the filter material must be frequently replaced. Pressed 'very low concentration (number of ppt~ppb) of odor, toxic and corrosive gas pollutants, currently mainly removed by absorption tower, dry scrubbing adsorptive and chemical adsorption filter, and most of them are added Chemical agents enhance their purification efficiency to reduce the concentration of pollutants in the gas and increase the amount of treatment. Physical adsorption, chemisorption and chemical absorption are the main mechanisms of action in the removal unit; among them, physical adsorption is a reversible reaction, mainly removing pollutants from the original functional groups or pores on the surface of the medium; chemical adsorption and chemical absorption are The active substance is added to the medium to cause a chemical reaction between the dye and the additive (for example, acid-base neutralization), and the removal rate and the removal amount of the pollutant to be removed are improved to different degrees. For example, activated carbon is used as a carrier, and metal salts are impregnated on activated carbon to remove -3- m 201134539 sulfur dioxide and hydrogen sulfide. The commonly used metal salts are chromium salts, copper salts, silver salts, etc.; The carbon adsorbent has a considerable adsorption capacity for a high concentration of pollutant gas', but its adsorption capacity decreases as the concentration of the pollutant decreases, and when the linear velocity increases, the removal efficiency and the adsorption capacity are greatly reduced. Then press 'Airborne molecular contamination (AMC) including hydrogen sulfide, sulfur dioxide, dimethyl sulfide, hydrofluoric acid, nitric acid and other organic and inorganic acids, ammonia, formic acid and isopropanol... Most of them exist in the surrounding environment, mainly due to traffic pollution, site pollution, agricultural pollution, oxidative decomposition of animals and plants, domestic pollutants, factory emissions, and air gas replacement. Recently, the international community has paid more and more attention to environmental issues, industrial safety and hygiene, and purification of molecular pollutants in clean rooms of high-tech factories. Considering the harm caused by industrial waste gases to the environment and labor to the general public, industrial waste gas emission standards are becoming stricter. Domestic and foreign regulations have formulated relevant emission and odor emission standards. On the other hand, recent high-tech processes in high-tech plants require more stringent levels of toxic impurities such as organic and inorganic acids or bases and low-boiling organic compounds, such as sulfur compounds, before they are introduced into clean rooms. For example, in semiconductor wafer fabrication plants and TFT_LCD panel optoelectronic manufacturing panel processes, the stripper used in the photoresist process (stl^pping pr〇cess) is mainly composed of high boiling point and almost complete. Water-soluble organic compounds, including monoethanolamine (MEA), dimethyl hydrazine (DMS0), and ethylene glycol monobutyl ether (BDG); etc.; and dimethyl groups in the photoresist during the photoresist removal process Although Aachen is a liquid with high boiling point water solubility and low volatility, it is easy to form dimethyl sulfide (DMS) and dimercapto disulfide with low boiling point and malodor-4 - 201134539 during the treatment. (dimethyl disul f ide, DMDS) gaseous pollutants. However, traditional adsorption, condensation and absorption methods cannot completely remove low-boiling and low-water-soluble DMS and DMDS, and it will produce malodor at low concentrations, which will easily affect the living environment around the plant and cause public protests. It also affects the yield of high-end processes in other high-tech plants around the plant. In addition, the nature of DMS is not the same as that of general sulfur-containing gaseous molecular pollutants. DMS is also an organic sulfide similar in nature to methyl mercaptan. However, its acidity and basicity are not obvious and its molecular size is small. It is relatively close but less prone to oxidation, so it is quite difficult to handle; therefore, it is almost impossible to decompose DMS at normal temperature, and it can only be adsorbed or oxidized into a compound that is more easily adsorbed. Furthermore, the gaseous gaseous pollutants commonly found in the air are hydrogen sulfide and sulfur dioxide. The removal method is generally dominated by strong oxidants such as potassium permanganate. The reaction mechanism is as follows: sulfur dioxide removal reaction mechanism 3S〇2+2KMn〇 4+4KOH — 3K2S〇4+2Mn〇2+2H2〇Mn〇2+S〇2+2KOH — K2S〇4+MnO+H2〇ΜηΟ+〇2 — 2Μη〇2 Hydrogen sulfide removal reaction mechanism 3H2S+2KMn〇4 -> 3S+2Mn〇2+2KOH+2H2 However, generally, the adsorbent materials such as granules, powders, spheres, and fibers are modified by a modifier to adsorb and remove sulfides, and modifiers thereof. The active composition is generally mainly a transition metal, and the method of using the transition metal oxide is directly used, or the transition metal is dispersed on the surface of the porous system such as activated carbon, 201134539, or the two are mixed with each other. The patent for the modifier for removing sulfides is as follows: US 4075282 patent sprays a solution on an activated carbon carbon bed (iodine, potassium iodide, sodium sulfide, sodium hydrogen sulfide, water), which can directly absorb sulfur dioxide and hydrogen sulfide; US 4196183 patent In the case of impregnating copper oxide or ferric oxide on the surface of activated carbon, 98% removal rate for hydrogen sulfide at medium concentration (20~250ppm); US 5063196 patent for impregnating copper carbonate on the surface of activated carbon, oxidizing Copper, zinc carbonate, silver nitrate, triethyldiamine (TEDA) and organic acids (maleic and tartaric acid), which can effectively remove hydrogen cyanide, gasified cyanide (chlorine, argon, sulfur dioxide), furfural and hydrogen sulfide The most important feature is that it does not contain chromium compounds and incorporates test compounds to absorb acid gases. The US 5496785 patent uses acetic acid and potassium carbonate as the main active components of activated carbon, which can effectively remove hydrogen cyanide and carbon tetrachloride. Sulfur dioxide, gas, hydrogen fluoride and hydrogen sulfide; and JP 1996-323194 discloses a method of exchanging manganese ions on X-type zeolite, which can be used to remove hydrogen sulfide and sulfonium thiol. I9%。 The ide compound, at a lower space flow rate (3000H 〆 1), the initial removal rate of 99.9%. However, for air such as methyl mercaptan, hydrogen sulfide, sulfur dioxide, dimercaptosulfur, hydrofluoric acid, tribasic acid, acetic acid, etc., organic and inorganic acids, ammonia, hydrazine, propylene glycol methyl ether acetate and isopropanol There is no longer-lasting and easily replaceable filter material for the removal of molecular contaminants. SUMMARY OF THE INVENTION The main object of the present invention is to solve the problem that the prior art filter material must be frequently replaced and not easily replaced, and has the advantages of increasing the service life of the filter material and facilitating replacement. Another object of the present invention is to efficiently remove methyl mercaptan, hydrogen sulfide, sulfur dioxide, acid, and the like by using a filter material and a modification technique to enter m -6 - 201134539 dimercaptosulfur, hydrofluoroformaldehyde, and isopropanol. Long-term purification of organic and inorganic acids, ammonia, and other air molecular pollutants such as nitric acid and acetic acid. In order to achieve the above effects, the structural features of the present invention include a frame; and a plurality of cells adsorbing monomers, which are directly formed by a porous adsorbent, and the array is positioned inside the frame.
然而，該多孔道吸附單體之單位面積孔道數為5〇〜 1600PPI(p〇ies per square inch;每英时孔道數）；其中 較佳為150〜400PPI間，且孔道型式為蜂巢狀。 此外，該邊框於内部設置有格架且於前後端設置有格 網。再者，該多孔系吸附材包括活性碳、沸石與氧化鋁； 其中，該活性碳多孔道吸附單體可由煤粉、乳化煤焦油、 水溶性黏合劑、潤滑劑和水，經過原料粉碎、配料、捏合、 擠出成型、乾燥、碳化和活化而得到。另，進一步以該多 孔道吸附單體為載體並合成或含浸有改質劑，而該改質劑 包括 KMn〇4、Cu-EDTA、Ag 或 Cu。 【實施方式】 首先’請參閱第二、三圖所示，本發明係包括有： 一邊框（20)，内部設置有格架（21);以及 數多孔道吸附單體（30)，陣列定位於該邊框（2〇)内 部，而該多孔道吸附單體（30)是由多孔系吸附材直接製作 成型’該多孔系吸附材包括活性碳（A. C.)、沸石（Zeolite) 與氧化鋁（Al2〇3);其中，該活性碳多孔道吸附單體（3〇)可 201134539 由煤粉、乳化煤焦油、水溶性黏合劑、潤滑劑和水，經過 原料粉碎、配料、捏合、擠出成型、乾燥、碳化和活化而 得到者》 此外，該邊框（20)之前後端設置有定位該多孔道吸附 單體（30)之格網（22);另者，進一步以該多孔道吸附單體 (30)為載體並合成或含浸有改質劑，該改質劑包括 Cu-EDTA、Ag或Cu，藉以有效移除DMS、H2S及s〇2等汙染 物。 基於如是之構成，本發明係由多孔系吸附材直接製作 成型出多孔道吸附單體（3〇)，再將數多孔道吸附單體（3〇) 陣列於邊框（20)内部，且搭配格架（21)與格網（22)而把多 孔道吸附單體（30)陣列定位；於是，因該多孔道吸附單體 (30)疋由多孔系吸附材直接製作成型，亦即濾材整體都是 具有吸附功能之吸附材，相較於前述之瓦楞紙式化學濾材 (10)，單位體積之吸附材僅約佔濾材整體之3〇%，本發明 吸附飽和之時間可提升至三倍以上，且因將多孔系吸附材 直接製作成易於更換之單體態樣，而具有增長濾材使用壽 籲 命及方便更換之功效。又，另因以該多孔道吸附單體（3〇) 為載體並合成或含浸有改質劑，則具有有效去除甲硫醇、 硫化氫、二氧化硫、二甲基硫、氫氟酸、琐酸等有機與無 機酸、氨氣、曱齡 '丙二醇甲醚醋酸酯及異丙醇…等空氣 分子之污染物之功效。藉此，本發明對於濃度為〇〇〇lppm 〜100ppm(0. lppb〜lOOOOOppb)之空氣分子污染物，具有極 為優異之長效淨化功效，尤其是對於濃度為0.001ppm〜 lppmClppb〜1000ppb)之空氣分子污染物，乃具有更加優異 -8- m 201134539 之長效淨化功效。 然而，再將改質劑之合成方式說明如下： (a) (KMn〇4+KOH)/A.C. 取高錳酸鉀79克與氫氧化鉀56克加入1000ml水後充 分攪拌直至高錳酸鉀完全溶解，將溶液1000毫升倒入含有 500克活性碳充分混合，靜置1小時後，將樣品以120°C烘 乾，可得樣品534克。 (b) Cu-EDTA/A. C. 取含結晶水之硝酸銅36克加入500ml水後充分攪拌直 ® 至硝酸銅完全溶解，將硝酸銅溶液250毫升倒入含有200However, the number of pores per unit area of the monomer adsorbed by the porous channel is 5 〇 to 1600 PPI (p〇ies per square inch; the number of channels per inch); preferably, it is between 150 and 400 PPI, and the channel type is honeycomb. In addition, the frame is internally provided with a grid and a grid is provided at the front and rear ends. Furthermore, the porous adsorption material comprises activated carbon, zeolite and alumina; wherein the activated carbon porous channel adsorption monomer can be pulverized, pulverized coal tar, water-soluble binder, lubricant and water, and pulverized and compounded by raw materials. , kneading, extrusion molding, drying, carbonization and activation. Further, the multi-channel adsorption monomer is further used as a carrier and synthesized or impregnated with a modifier, and the modifier includes KMn〇4, Cu-EDTA, Ag or Cu. [Embodiment] First, please refer to the second and third figures, the present invention includes: a frame (20), a grid (21) is disposed inside; and a plurality of porous channels adsorbing monomers (30), array positioning Inside the frame (2〇), the porous channel adsorbing monomer (30) is directly formed from a porous adsorbent material. The porous adsorbent material includes activated carbon (AC), zeolite (Zeolite) and alumina (Al2). 〇3); wherein, the activated carbon porous channel adsorption monomer (3〇) can be 201134539 from pulverized coal, emulsified coal tar, water-soluble binder, lubricant and water, after raw material pulverization, compounding, kneading, extrusion molding, In addition, the front end of the frame (20) is provided with a grid (22) for positioning the porous channel adsorption monomer (30); and further, the monomer is adsorbed by the porous channel ( 30) is a carrier and is synthesized or impregnated with a modifier, which includes Cu-EDTA, Ag or Cu, thereby effectively removing pollutants such as DMS, H2S and s〇2. Based on the composition, the present invention directly forms a porous channel adsorption monomer (3〇) from a porous adsorption material, and then arrays a plurality of porous adsorption monomers (3〇) in the frame (20), and the lattice The frame (21) and the grid (22) position the array of porous channel adsorption monomers (30); thus, the monomer (30) adsorbed by the porous channel is directly formed by the porous adsorption material, that is, the entire filter medium It is an adsorbent material having an adsorption function. Compared with the corrugated paper chemical filter material (10), the adsorbing material per unit volume accounts for only about 3% of the whole filter material, and the time of adsorption saturation of the present invention can be increased by more than three times. Because the porous adsorbent is directly made into a monomer that is easy to replace, it has the effect of increasing the life of the filter and facilitating replacement. In addition, because the porous channel adsorption monomer (3〇) is used as a carrier and synthesized or impregnated with a modifier, it has effective removal of methyl mercaptan, hydrogen sulfide, sulfur dioxide, dimethyl sulfide, hydrofluoric acid, and tribasic acid. The effects of organic and inorganic acids, ammonia, ageing 'propylene glycol methyl ether acetate and isopropyl alcohol... and other airborne pollutants. Therefore, the present invention has an excellent long-term purification effect on air molecular pollutants having a concentration of 〇〇〇lppm to 100ppm (0.11ppb~lOOOOppb), especially for air having a concentration of 0.001ppm~1ppmClppb~1000ppb) Molecular pollutants have a long-lasting purification effect of -8-m 201134539. However, the synthesis method of the modifier is as follows: (a) (KMn〇4+KOH)/AC Take 79 g of potassium permanganate and 56 g of potassium hydroxide. Add 1000 ml of water and stir well until the potassium permanganate is completely After dissolving, 1000 ml of the solution was poured into a mixture containing 500 g of activated carbon, and after standing for 1 hour, the sample was dried at 120 ° C to obtain 534 g of a sample. (b) Cu-EDTA/A. C. Take 36 g of copper nitrate containing crystal water, add 500 ml of water, stir well until the copper nitrate is completely dissolved, and pour 250 ml of copper nitrate solution into 200
克活性碳多孔道吸附單體之圓形瓶中，以旋轉揮發儀將水 分去除後，再加入剩下的250毫升硝酸銅溶液，再以旋轉 揮發儀將水分去除；續取乙二胺四乙酸（EDTAIn the round bottle of adsorbent monomer in the activated carbon porous channel, remove the water by a rotary volatizer, then add the remaining 250 ml of copper nitrate solution, and then remove the water by a rotary volatizer; continue to take ethylenediaminetetraacetic acid (EDTA
Ethylenediamine Tetraacetic Acid) 0. 7 克分散於 200 毫 升水中，後加入含有硝酸銅之活性破多孔道吸附單體中， 再以旋轉揮發儀將水分去除；將樣品以120°C烘乾，可得樣 品234. 2克。 • (c)5wt% Ag/A. C. 取硝酸銀結晶0.3758克加水1〇克使其完全溶解，將 硝酸銀溶液緩慢滴入含有5g活性碳之多孔道吸附單體之燒 杯中，邊加邊攪拌，待充份攪拌後置於15〇t烘箱中乾燥。 (d)5wt% Ag/Zeol ite 取含有30%Y型沸石（CBV-100)的多孔道蜂巢狀吸附單 體100g加入92. 4ml水後充分攪拌並升溫至5(Tc，取确酸 銀結晶2 · 413 9克加水15克使其完全溶解，將硝酸銀溶液 t S] -9- 201134539 緩慢滴入含有沸石多孔道蜂巢狀吸附單體之溶液中，攪拌1 小時後過濾並水洗，80°C乾燥後以400°C燒結2小時，可得 5%Ag/沸石多孔道蜂巢狀吸附單體。 (e)Cu/Al2〇3 取含結晶水之硝酸銅36克加入50Om 1水後充分授拌直 至硝酸銅完全溶解，將硝酸銅溶液250毫升倒入含有200 克ai2〇3多孔道吸附單體之圓形瓶中，以旋轉揮發儀將水分 去除後，再加入剩下的250毫升硝酸銅溶液，再以旋轉揮 發儀將水分去除。 ® 另，DMS移除率之測試方法： (1) 將欲測試之吸附劑於烘箱中烘乾（90〜100°C，4hr) 後取出，置於乾燥孤中待冷卻，秤重所需之樣品（W1)。 (2) 將吸附測試管之兩蓋口互合後以長尾夾固定，先調 整浮子流量計至所需之流量，尾端以乾式流量計及溼度計 進行氣體流量及溼度量測，再開啟氣體質量流量計並將尾 氣接至總硫分析儀進行總硫濃度分析，直至所需之濃度。 (3) 將吸附劑裝置於測試管中，並打開恆溫循環水槽通 φ 入恆溫水於恆溫槽夾層中。 (4) 將測試管裝至吸附系統上，開始進行反應，直至尾 氣濃度至所設定為止（時間為t)。 (5) 將吸附床取下倒出樣品秤重（W2)。 又，飽和吸附量之計算方法： 秤重吸附量： 吸附量 wt%(g DMS/g 吸附劑）= (W2-Wl)/Wlxl00% 計算吸附量： m 10- 201134539 吸附量wt% (g DMS/g吸附劑） =CxlO-6 x流量（L/min)x t x 62/24. 5/Wlxl〇〇 其中，C為DMS濃度（ppm) 低濃度DMS吸附測試結果如下表一所示： 表一、低濃度MS吸附測試結果 線速 度 (m/s) 吸附劑組成 DMS入 口濃度 (ppb) DMS出 口濃度 (ppb) 起始去 除率 (%) 單位時間 上升濃度 (ppb/hr) 1.0 KMn〇4-KOH/A. C. 150 18 〜30 80 〜87 — 1.0 Cu^-EDTA/A. C 75 6〜9 88 〜92 — 0. 5 Cu“-EDTA/A. C 75 6〜9 88 〜92 0. 42 0. 5 (Mn"+K0H)/A.C. 75 15 80 — 0. 5 鹼式碳酸銅/A. C. 75 7 90 2. 57 0· 5 CuO/A.C. 75 3 95 0. 98 溫度=室溫，溼度=RH 20%，反應器尺寸：2. 4x2. 4公分，充填高 度：3公分’吸附劑尺寸：8〜12mesh，吸附劑用量15ml 於上表中’係於低濃度DMS吸附測試結果，其中明顯 可見’吸附劑Cu2+-EDTA/A. C及CuO/A. C.可有效去除DMS 90 %以上。 是以’本發明中之濾材係以多孔道吸附單體之型式予 以充填而成（如第二圖所示），其可同時去除DMS、Η”及 s〇2，而相較於習知顆粒式充填型式，各自對於DMS、仏5及 S〇2移除效率之測試結果如表二所示： 表二、不同濾材型式之污染物移除率測試結果： 濾材型式 處理 DMS&HzS 效率（％ ) 壓損 使用壽命 習知顆粒式充埴 80 〜87 大 180天 -11 - 201134539 丁360 天~1 多孔道單體丨一" 因此，由表二中可明顯發現，倘若僅使用習知顆粒式 充填攄材⑽⑽㈣瞻），對於污染物廳、H2S等之移除 率及使用壽命較低，M較大；而採用本發明中之多孔道 吸附單體化料材’除具以更換之特徵外，係可有效提 尚廳、H2S等污染物之移除率’且有效增長使用壽命，尤 其針對該DMS更有高於95%之移除效率，並可充分降低其 壓損而具節能之效能。 ^ 綜上所述’本發明所揭示之技術手段確具「新、 「進步性」及「可供產業利用」等發明專利要件，祈請鈞 局惠賜專利，以勵發明，無任德感。 惟，上述所揭露之圖式、說明，僅為本發明之較 施例’大凡熟悉此項技藝人士，依本案精神料所作^ 飾或等效變化，仍應包括本”請相範_。 少Ethylenediamine Tetraacetic Acid) 0. 7 grams dispersed in 200 ml of water, then added to the active porous cell adsorption monomer containing copper nitrate, and then removed by a rotary volatizer; the sample is dried at 120 ° C, the sample can be obtained 234. 2 grams. • (c) 5wt% Ag/AC Take silver nitrate crystal 0.3758g and add 1 gram of water to completely dissolve it. Slowly drip the silver nitrate solution into the beaker containing 5g of activated carbon in the porous channel adsorption monomer, and stir while stirring. The mixture was stirred and placed in a 15 〇 oven to dry. (d) 5wt% Ag/Zeol ite Take 100g of porous channel honeycomb adsorption monomer containing 30% Y zeolite (CBV-100), add 92.4ml water, stir well and raise the temperature to 5 (Tc, take silver crystal 2 · 413 9 grams of water 15 grams to completely dissolve, silver nitrate solution t S] -9- 201134539 slowly dropped into the solution containing zeolite porous channel honeycomb adsorption monomer, stirred for 1 hour, filtered and washed, 80 ° C After drying, sintering at 400 ° C for 2 hours, 5% Ag / zeolite porous channel honeycomb adsorption monomer can be obtained. (e) Cu / Al2 〇 3 Take 36 grams of copper nitrate containing crystal water, add 50Om 1 water and fully mix Until the copper nitrate is completely dissolved, 250 ml of the copper nitrate solution is poured into a round bottle containing 200 g of ai2〇3 porous channel adsorption monomer, and the water is removed by a rotary evaporator, and then the remaining 250 ml of copper nitrate solution is added. Then, remove the moisture by a rotary volatizer. ® In addition, the DMS removal rate test method: (1) The adsorbent to be tested is dried in an oven (90~100 ° C, 4 hr), and then taken out and dried. The sample to be cooled (W1) is to be cooled. (2) The two ends of the adsorption test tube are combined with each other to make a long tail clip. First, adjust the float flowmeter to the required flow rate, the tail end uses a dry flowmeter and hygrometer to measure the gas flow and humidity, then turn on the gas mass flowmeter and connect the exhaust gas to the total sulfur analyzer for total sulfur concentration analysis. (3) Place the adsorbent in the test tube, and open the constant temperature circulating water tank and put it into the thermostatic bath interlayer. (4) Put the test tube on the adsorption system and start the reaction. Until the exhaust gas concentration is set to the time (time is t). (5) Remove the adsorption bed and pour out the sample weight (W2). Also, calculate the saturated adsorption amount: Weighing capacity: Adsorption amount wt% ( g DMS/g adsorbent) = (W2-Wl)/Wlxl00% Calculated adsorption capacity: m 10- 201134539 Adsorption amount wt% (g DMS/g adsorbent) = CxlO-6 x flow rate (L/min) xtx 62/ 24. 5/Wlxl〇〇, where C is the DMS concentration (ppm). The low-density DMS adsorption test results are shown in Table 1 below: Table 1. Low-concentration MS adsorption test results Linear velocity (m/s) Adsorbent composition DMS inlet concentration (ppb) DMS outlet concentration (ppb) initial removal rate (%) unit time rise concentration (pp b/hr) 1.0 KMn〇4-KOH/AC 150 18 〜30 80 〜87 — 1.0 Cu^-EDTA/A. C 75 6~9 88 ～92 — 0. 5 Cu “-EDTA/A. C 75 6 ~9 88 ～92 0. 42 0. 5 (Mn"+K0H)/AC 75 15 80 — 0. 5 Basic copper carbonate/AC 75 7 90 2. 57 0· 5 CuO/AC 75 3 95 0. 98 Temperature = room temperature, humidity = RH 20%, reactor size: 2. 4x2. 4 cm, filling height: 3 cm 'Adsorbent size: 8~12 mesh, adsorbent dosage 15 ml in the above table' in low concentration DMS Adsorption test results, which clearly show that 'adsorbents Cu2+-EDTA/A. C and CuO/AC can effectively remove more than 90% of DMS. The filter medium in the present invention is filled with a type of porous channel adsorbing monomer (as shown in the second figure), which can simultaneously remove DMS, Η" and s〇2, compared to conventional particles. For the filling type, the test results for the removal efficiency of DMS, 仏5 and S〇2 are shown in Table 2: Table 2. Contaminant removal rate test results for different filter types: Filter type treatment DMS & HzS efficiency (% Pressure loss service life know-how granule filling 埴 80 ~ 87 large 180 days -11 - 201134539 butyl 360 days ~ 1 porous channel monomer & a ", therefore, from Table 2 can be clearly found, if only the use of granules Filling coffin (10)(10)(4)), for the removal rate and service life of the pollutant chamber, H2S, etc., M is larger; and the porous channel adsorption singulation material of the present invention is used to replace the feature In addition, it can effectively improve the removal rate of pollutants such as halls and H2S, and effectively increase the service life, especially for the DMS, which has a removal efficiency higher than 95%, and can fully reduce the pressure loss and save energy. Efficiency. ^ In summary, the technology disclosed in the present invention Section with a really "new," progressive "and" available for industrial use "and other elements of invention patents, patent Prayer Jun bureau vouchsafed to encourage invention, without any sense of morality. However, the drawings and descriptions disclosed above are merely examples of the present invention. Those who are familiar with the art, according to the spirit of the case, or the equivalent changes, should still include this "please _."
•12- 201134539 【圖式簡單說明】 第一圖係習知瓦楞紙式化學濾材之結構說明圖。 第二圖係本發明之結構分解說明圖。 第三圖係本發明之結構組合說明圖。 【主要元件符號說明】 (ίο)瓦楞紙式化學濾材 (20) 邊框 (21) 格架 (22) 格網 (30)多孔道吸附單體•12- 201134539 [Simple description of the diagram] The first figure is a structural description of the corrugated chemical filter material. The second drawing is an exploded view of the structure of the present invention. The third drawing is an explanatory view of the structural combination of the present invention. [Main component symbol description] (ίο) Corrugated chemical filter material (20) Border (21) Grid (22) Grid (30) Porous channel adsorption monomer