201116340 六、發明說明： 【發明所屬之技術領域】 轉条預塗處理方法及職處理裝置，其麟在非旋 液i而作a理所用的狹缝喷嘴之噴出σ附近形成處理液之 履膜而作為塗佈處理的前置準備。 【先前技術】 用非^平面^示器、(FPD)的製造程序之光微影步驟中多使 、，噴嘴進仃純亚將光阻舰塗佈在破璃基板等被處理基板 液在掃+描方向繞到狹缝喷嘴之背面側而形成的液表 冑長射轉贼斜—絲，目此，其必要條 的==狹縫喷 喷出，背面下端部 以==;設; 液繞進狹缝喷嘴之背面下部而捲取在預塗外二 ΐ /ίΐί1液的液趣靖分成狹缝喷嘴側__側之= 201116340 理而5，係藉由旋轉機構使 嘴 板狀S板其:長度的長條狀的 接祕難 但是^大ΪΙίϊΓ零件之緊固量來調整。 出之光阻劑液的予ϋίϋν η因為用於承接並捲取狹縫喷嘴所喷 而異，並树的尺寸 可能在1/4圏(9〇。)以下或1/5圈(72。)以下妙圈以下，亦 洗塗處‘所述= 理，故有塌為後處 具有Ϊ述S剝ΪίΪί預塗輥之外周面上的光阻劑液之刮板， 本身、在^賴^ r ί阻劑散_周圍或容易附著累積在刮板 佳、消耗魏丨iiiSii細线祕罐力健獅持在最 理法此問題而在專利文獻2中揭示如下預塗處 ::::二=縫嘖嘴噴出固定量的二 之預塗處理結束後將預塗觀的外周面整圈-起洗^ 人數 區，理Λ係將預'錄之外周面在其旋轉方向分割為多 之預涂&νί部分表面區域)依序分配使用在連軌定次數 、、^ίΐ :且其後將預塗棍之外周面整圈—城淨。此-起 #ΐ二LL係措由旋轉機構使預塗輕b連續旋轉並且使洗淨機構血 乾知部動作而將預麵之相面整圈—起洗淨，不須有在各^塗 201116340 處理時用於剝除捲取在預塗輥之表面的塗佈液之刮板，可節省預 塗處理後之洗淨處理中耗費的洗淨液，同時可防止在洗淨及乾燥 處理時產生微粒。 μ 【先前技術文獻】 【專利文獻】 專利文獻1 :日本特開2004—167476 專利文獻2 :日本特開2〇〇7 —237046 【發明内容】 (發明所欲解決之問題） 本發明係本針請人於上述專利文獻2中揭示的預塗處理法 之改f版，並且雜娜峨點提供職處理料及預塗處理 置，實現更加節省在預塗處理巾使_洗淨液，且更制乾燥^ =時間之縮減及洗淨處朗卫具及/或乾祕_工具之長壽 (解決問題之方式） 為，成上述目的，本發明第丨態樣之預塗處理方法，係用於 在非娜塗佈法之塗佈處理的狹縫喷.淨 ，包含二=以ί 二===處理’使該狭縫喷嘴之嗔出口隔著既定ί J 水平配置的_狀或®柱狀之預塗報的頂 將兮、:山使以狹、缝噴嘴噴出固定量的塗佈液後使該雜報旋轉，、 Ξ Γ的塗佈液的—部分捲取在該預塗輕之外周1上??二 :J吏該預塗輥旋轉，並且使綱接觸於_塗輥之外 遠塗佈液的區域而施以粗洗淨；第3步驟，使該 : 淨行過該粗洗淨的該預塗親心面疋而施 洗淨的該預塗輕之外該預塗報旋轉，並且使施行過該精 1 々後處里而,，敢初在粗洗淨步驟(第2步驟)將I淨塾抵接 5 201116340 到旋轉的預妹之外周面，藉由與洗淨麵彈性面接觸互相 而均一且有效率地洗洗去附著於該處的光阻劑液之液膜。並且: 在粗洗淨處理後隨即在精洗淨步驟(第3步驟)中，利用洗 殘留於預塗輥上的薄薄液膜。依據如此2 P皆段(粗洗淨 淨處理方式’不鶴由插人粗洗淨步驟顯著降傾洗淨步驟的)負 擔’且因粗洗淨步驟中使用的洗淨液係再生品 用 量相較於習知而言大幅降低。 夜使用 在本發明的-較佳態様中，預钱之外周面上的塗佈液，係 f巧預塗輥之旋轉而從該預塗輥的頂部之位置前往底部之位 置的途中，f該洗淨墊之粗洗淨。如此，藉由預塗處理中在預塗 塗佈液之賴在半旋轉為止前期間接受粗洗 平處理，可在預魏战止塗佈液的液膜不受期望的擴散。 様中，係在粗洗淨結束後，使洗淨塾退離預 ίίL i i報之外周面中預塗處理所未影響的潔淨區域藉 魏纽糾轉，紅可妙洗淨塾之 依撼Ιίίΐΐ先淨塾’可使當前吸取的的塗佈液向外吐出。 藉，?塾以明顯較大的擠 墊的汙染’可穩定維持洗淨墊的洗淨能力。佩去除洗4 在精洗淨步驟(第3步驟），宜將洗淨液盥氣 外周，:以= 所參塑舰定⑽、冑射在預塗n胸當巾塗佈液捲取 所〜響的既^域，而可節省精洗制的新洗淨液之耗費量。 201116340 的洗於預”之外周面 第6步驟依據此種2階段(拭轉發)乾發之 預塗轨的％轉方向而傾斜的角度接觸於預塗輥之外周面。又“、、 ^以 =之 少』擔及處理“，亦可減 的縫隙中。依據此揮發方法 膜均—且有效率地飛散及揮發，達到乾燥處理 2明第2態樣中的預塗處理方法，係用於 理所用的狹缝喷嘴之喷出σ附近 .= 理之前置準備，包含以下步驟1 1步驟，因; 向St置 定量的塗佈，吏該職“ 塗輥Si汽:周面上;1 2步驟’使捲取在該預 ，之外周面上的塗佈液乾無而成為乾燥膜；$ 3步驟，因應另） 定:：ίΐ理ii=ff嘴之喷出口離開該乾燥膜並隔著既 的ί佈i後使該預錄旋轉，在與該乾燥膜為不同的區 步铲：ϊ if布部分捲取在該預塗輥之外周面上;第4 ~ ’使該碰減轉，並且使洗淨墊接觸於顧塗輥之外周面 201116340 冗取該塗佈㈣各區域而施以粗洗淨，·第$步驟，使該 叙轉’亚且將洗絲供給批騎過雜 洗淨，·以及第6步驟，使該預銶旋轉預=== 過該精洗淨㈣預魏之外周面鮮。 I且使細盯 及第ίϊί)ίΐ=ϊ=ί巧tr在洗淨處理步驟(第4 ^ L、上述弟1恶樣中的預塗處理方法相同的作 預钱之外制在其旋轉方料 蚊回數的預塗處理而使用後，集中將附 的液膜或乾燥膜進行一起洗淨處理及一起 乾域理，故可達到更加大幅節省洗淨液使用量。 的徐樣的預塗處理方法中’使殘存(附著)在該區域内 望μ來者：ϋ燥為乾無膜’作為使用預塗輥之外周面上的期 =區域末员鈿的1次份的預塗處理之結果’並使用與預塗 膜:為不同的區域来實施後續的預塗處理。、因為乾燥 理-不定區域内’故即使在其附近實施後續的預塗處 里不又到來自乾燥膜的影響(干涉）。 a 士車乂 為’乾雜係在藉*自然乾燥而半乾的狀態下形成。 旋轉繼的—部分捲取在預塗幸昆上後，仍使預塗輥的 夂個佈液的自然乾燥。藉由此種自然乾燥法，可將 ;削“淨態下進行-起洗淨’使乾燥膜容易洗去， 之余ir月第3態樣中的預塗處理方法，係用於在非旋轉塗佈法 ^理所㈣狹缝喷嘴之喷出口附近形成塗佈液之液膜而作 前置準備，包含以下步驟：第1步驟，因應1次份 理’使該狹缝喷嘴之噴出口隔著既定關隙而平行地對 喷嘴it，，筒狀或圓柱狀之預塗輥的頂部，並在使該狹縫 的—都疋里的塗佈液後使該預塗輥旋轉，將該喷出的塗佈液 轉，2 在該預塗親之外周面上；第2步驟，使該預塗嫩 予L7丄…f洗淨液將該預塗輕之外周面已捲取該塗佈液的區域 /淨，第3步驟，使該預塗輥旋轉，並且使板狀的擦拭墊接 201116340 觸於該預塗輥之外周面，用 液；以及第4步驟，喷射之賴面的洗淨 向相反的方向，吹過沿旋轉方向之固以與，昆之旋轉方 .圍的f斜丄用於使殘留於該予_之外之周 後隨即進行的後處理而言，利用处^中笛就預塗處理(第1步驟) 由取初通過的擦拭塾拭除。並且 二驟(严3 乂驟)中措 法去除的_賴，在擦難通糊卩使f由擦拭墊亦無 f ΐ吹n過缝隙中的喷吹，從而使其均—且 ° ，因為藉由插入液滴除去步驟(第3步+ p μσ ΐ 步驟(第4步驟)的負擔，並且描古匕:f)而大幅減輕乾燥噴吹 故可大為縮短總乾燥A理時間。门〇、人步驟本身的揮發性能， 本發明第4態樣中的預塗處理奘w 之塗佈處理所用的狹縫噴嘴之嗔出口、^於在非旋轉塗佈法 為塗佈處理的前鮮備，包含；預ϋ塗^之液膜而作 塾，可將洗淨的洗淨 與離開該預塗輥之外周面的第2位:面的第1位置 部，用於將洗淨液供給到該預塗輥換；精洗淨處理 ，部，用於強繼細廳t之外面;乾燥 制該旋轉機構、該粗洗淨處理部、哕二 =，以及控制部，控 部的各動作；並且，因處理部及該乾燥處理 喷出口隔著既定的間_平行地喷嘴的 狀之預塗輕的頂部，並在使該狹縫喷嘴喷或圓柱 f该預塗輥之外周面上，藉由該旋轉機構n 口^刀捲取 精由該粗洗淨處理部使該洗淨墊接觸於該“外已s 201116340 ^塗佈^；，域而施以粗洗淨，藉由該旋轉機構使 •^乞 .。 = .、，. 0 以精洗淨後的該預塗辕之外周面 述第tf第42 =上述構成而實施上 及第2態樣切職處理方法相__=此顧與上述第】 在本發明一較佳態様中，其粒洗♦ > 位置:以從^ j輥的頂部起沿旋轉二離約心 ί:::。’用於直接或藉由該預塗輥之外周面而ίί淨Si: 就一較佳型態而言，洗淨墊具有 涵蓋到另-端的長度與矩形的橫剖、千方=預塗輥—端起 於預塗輕之外周面。精洗淨部 1位置面接觸 ir輸與施合糊喷射流朝 之塗佈處理所旋轉塗佈法’ 為塗佈處理的前置準備，、包* ^=成塗佈液之液膜而作 平配置在既定位置；旋轉機構，使ς予^u狀或圓拉狀，水 淨處理部，用於使用洗淨液將該i塗中心軸旋轉；洗 將擦拭墊之位置在接觸於該 的擦拭墊，並可 預塗輥之外周面的第2位置之面的弟。1位置與離開該 轉方向之固定區間形成在該預塗ίΐίί部’具有： -竭中;_制部’控制該旋轉 201116340 'ί-: -' -·1 — 的塗佈液的—該預塗輕旋轉，將該J 外周面上的塗佈液或其處.取^ 面，拭除附著於該預塗^ 接觸於該預塗輥之外周 該預塗輥旋轉，並且使 周，的洗减’藉_旋轉機構使 使殘留於該預塗報之體喷嘴喷射乾燥氣體， 依據上述第5態樣中的預塗處理 一 — ^述第3態樣巾的預塗處理方法 的預塗處理方法相_侧效果。I猎此仔顺上衫3悲樣中 在本發明之預塗處理裝置中， 產生的水霧藉由細編去除之排；^於將在預塗輥的周圍 (發明之效果） 及作:據處理方法或預塗處理裝置，藉由上述構成 用了戶、現更加卽省在預塗處理所佶用的、、并Β -Γ、去 理時間的縮短化及洗淨處理用工具及/或乾^處理用^具 【實施方式】 (實施發明之最佳形態） ^ 以下參考附加圖式說明本發明的較佳實施形能。 〔預塗處理裝置之構成〕 “ 卢顯示本發明—實施雜中職處理裝置之構成。此預塗 置’係組入例W LCD製造程序用的光微影步驟中進行非旋 主佈法之光阻劑塗佈處理的光阻劑塗佈裝置(未圖示），並配置在 11 201116340 触佈處理而餘被處理基板_浮輸送的塗佈平台(未 口部12的長^ig係由頂面具有狭缝狀之開 開口部12向上方霖出的方+/、中收谷的預塗輥14以其頂部經由 的方式支持。 式，利用轴承(未圖示)以水平且可旋轉 固定圓，，具有 用不鏽鋼製作。 '苒98王長的長度。外设10亦可利 有馬轉機構16具 轉驅動軸係例如藉崎輪咬傳動册耸值且 =服馬達構成’其旋 旋轉角度位Ϊ 編石馬器而可任意控制馬達之旋轉量及 沿正ί =YaQ t&14的頂部(最上频到底部(最下部） 1方向（圖式中為逆時針旋轉)前 / 的仅置配置粗洗淨處理部18之洗淨墊20:.且在糾·角9〇附近 度與矩形的橫剖面形狀:由預的另一端的長 之箱狀的墊保持部22所保持。雖輕4=對的面具有開。 、旋轉控制部及編碼器等，並‘以 動 外田二的堡力接觸於預塗輥14之 外周面的弟1位置(接觸洗淨位置)與離開 2位置(退開位置)之間進行切換。 頂土馬“4之外周面的弟 此洗近’如正上方’配置有洗淨液補給喷嘴28。 縫ίίίΐ ί 2G具有崎長度的長條狀狹 以構成，亚配置成其策出口朝向位於上述第.i位置(接觸洗淨 12 201116340 位置)的洗淨墊20之前部(接觸部)2〇a，或者朝向右 略上游側的預塗輕Η之外周面。進行粗洗淨 30而仗洗淨液槽32汲取的洗淨液(例如 ^ ^祕 2δ，洗淨_給倾28 液除去塵二設置有祕從洗淨 側設祕—相對 ™ 1：;-=宜由謝_顧， r6 長 塗輥⑤魏雜去部48與乾燥喷吹部5G，且從預 ^14的頂部(最上部)起沿正轉方向宜在旋制27〇。〜36〇。的予^ 拭墊以可轉動的方式支持擦拭墊52;以及捧 3面:^擦拭墊52的位置，在接觸於預塗輥!4之 2位置_位置)之置)與離⑽ 板體擦:有塾12預 置)’其往長^方Γ fμ’在上述第1位置(液滴除去位 向而傾斜申的一邊之邊緣部以依照預塗輕14的旋轉方 並^======下’最_30。)’ 去部有.縫隙58 ’設定於沿正轉方向而較液滴除 體噴嘴60内並形成在預塗輕14之周圍；以及氣 之旋轉的方向空巾氣’使其以相反於預塗㈣ 過°亥邊隙58中。此氣體喷嘴60係具有與 201116340 預塗心7 R專長度的狹缝喷嘴，在缝隙58下游側端部 於外殼ίο的上壁部。氣體噴嘴60經由配管6 y二 給部64。配管62的途中設有開關65。 I沾乳體供 從預塗輥U觀察，在精洗淨處理部％及乾燥處理部 後設有抽吸π 66。滅口 66經由真线道⑽及 、月 72 成。水務捕木态70係捕集從抽吸口 66通過直空诵 水霧。水霧捕集器7〇所回收的液體(洗淨液)經由 洗淨液槽32。 & η向翰廷到 外殼1〇的底部’在預塗報14的正下方位置形成有 此排淹口 76輕由排液管78連接到排茂槽8〇。回收到此排_肋 的洗淨液’猎由泵82爾時蚊_方_往洗淨賴ϋ 洗淨液一起送來之光阻劑的裝置，裝備在排洩槽80之中或 洗淨液槽32不侧充如上所伽_水雜絲％及 槽80的已使用洗淨液’亦因應必要而打開開關闕8ι從新洗_ 供給源84補充未使用的新洗淨液(稀釋劑)。排8 液种 32 體’分別可在打開排如側的開關閥86、88時^= 液官90、92輸送到廢液槽(未圖示）。 大 藉由洗淨液槽32、水霧捕集n 7Q、排賴⑽及 類、配管類，構築洗淨液再生系統94，用於將 _ 液再行利用於粗洗淨處理部18。 ]匕使用洗淨 ，控制部96含有依據既錄體而動作的微電腦，統合控制此 邱内的輥旋轉機構16、粗洗淨處理部18、精洗淨處理 口 =、乾燥處理部40、真空裝置72、洗淨液再生 閥(37、45、65等)的各動作。 及_ 〇又、’主控制部％統合控制預塗處理裝置内的全體程序，並至 j預塗處理錢，控舰光__裝置所包含 處理用之狹縫喷嘴98的一切動作。 兀丨^土怖 14 201116340 =6。就預塗處理而言，主控制部％經^噴^二=汗關 光阻劑供給部102、開關閥106，而控制狹100二 位及光阻劑液喷出動作。 ’、鳴 的私動與定 〔預塗處理方法的第1實施例〕 平裝置的該光阻劑塗佈裝置中，每當在塗佈 次份的預塗處理，作為下次塗佈處理的前置準 1處破置進仃1 ，2顯不本實施例中進行i次預塗處理時的 態。塗圖=輕，外周面_1為潔淨狀 狹缝喷嘴98，使得狹缝喷嘴98 ^喷出猎口f = 1〇〇定位 既疋的，隙(例如數K%m)而平行相對。，、、土幸之頂视著 此光阻劑液喷出的動作係在固定日士門里勺光阻劑液R。 之喷出口喷出的光阻劑液在仃。從狹缝喷嘴98 方向往周圍擴散。 、土犏14的頂部附近後在旋轉 絲告ΐ_人，藉由輥旋轉機構16在既定的時序使預涂和1/1 Ba it北如圖2的S2(捲取)所示，岐得光阻劑液土R结到ΪΪ旋 使光阻舰&的_斷轉速度’ _會太快 此，ί ί 將預;轉速度-口氣提高。藉 (刀·斤不’使光阻劑液R的液膜分離，分成狭 15 201116340 缝喷嘴98側與預塗輥14側。 + 光阻劑液膜的分離在既定的 典缝嘴98上升，可使 狭縫喷嘴98從喷嘴喷出口無 17貝π且確實地進行。如此， 液膜RP °另-方面’在預塗輕有光阻劍液的 捲取的光阻劑液的液臈咖。此雜膜，朗有如上所述 尺寸’以旋轉歧的大小 _之旋轉方向捲取 此實施例中，在使井例如7〇。〜乃。。 時停止，並使粗洗淨處理部^的'11^離後隨即使預塗輕Μ暫 2位置)往接觸洗淨位置(第】冑=塾20從當前的退開位置(第 減之外周面。可===期望的塵力接觸於預塗 觸洗淨位置旋膜广希望停止在即將到達接 其次，使麵側=置)。 不，將捲取在預塗輥14之外广汗σ如圖2的S4(粗洗淨)所 淨位置。洗淨墊20利用、自if 5的光阻劑液膜舰移到接觸洗 置的光阻劑液膜拭除通過接觸洗淨位 Μ之外周面落下而移^\除口的；^劑液膜應，一部分從預塗輥 孔質樹脂)20之中。但是，朵阳制側，另一部分被吸入洗淨墊(多 存在預塗輕14之外周面上二:膜_之中亦有未被拭除而殘 Η之旋轉懈轉方向的動此殘存賴撕輸職 如此’在預塗處理中，岡五蚀_ & 士 在此實施例巾，如上^地擴散。 位置後隨即使預塗輥14^時戶^；’在殘存液膜越過接觸洗淨 移動機構24將洗淨墊2〇曰更“」^粗洗淨處理部18中洗淨塾 接在預塗輕之外用/^Λ在剛'驅動而以明陳大的擠壓力抵 C'!! 2t°'20 給到洗淨墊20。 t亦可攸洗淨液補充喷嘴28將洗淨液供 16 201116340 其後，洗淨墊移動機構24使洗 並使洗淨墊20離開預塗報14回到退開位==除推壓力， 時’幸昆旋轉機構16使預塗報14的旋轉再m位置）。約與此同 藉由預塗輥14之旋轉，使上述殘存液5 ^ 部38後，使2流體喷射嘴42動作並將以壓縮 處理 合到未使㈣新洗賴(稀釋餅的 ：^ 氮氣）混 膜爾。主控制部96管理預塗輕14殘存液 =立，署Τΐ由輥旋轉機構16而掌握該區域的當前位置(ί= 向的位置）。因此，可在殘存液膜騰，所附轉方 ΐ部二附f的既定區間期間使2流體噴射嘴42 i射 威置720與精洗序處理部38約同時成為開啟。 1史真工 洗淨粗洗淨處理後隨即進行 ί 域(連接在齡㈣财之後的_多少 =且將〜叉汗染區域亦由精洗淨處理部38利用 : ί二:ΪΓ的清潔(吐出液體)亦可定期進行，而：； 擊力嘴42喷射的2流體喷射流之強烈衝 口 76，盆於以ΓΓ，_ ’其大部分混於洗淨液而流到排泡 口 5其胁成水霧飛散_近。 空通道⑽。另，存在於精 ”亦™髮持料及橫樑 ®却在精洗淨處理部38開始如上所述的精洗淨之動作後，乾焊严 C噴π人)所不，液滴除去部48使擦拭墊52轉動而從當前的退開 17 201116340 5〇使位置(第1位置）。又，乾燥喷吹部 水霧-起被吸入抽吸口 66的下面在排如76側落下，其餘與 暄呈由擦拭塾52拭除亦無法去除的預塗輕14上之薄;r 而被吸入抽吸口 66。 有效率地讀及揮發，變成水霧ma 真4置吹部5G進行的乾燥空氣之喷吹，只要 卩承受逆風， 之間隙尺寸猶有紊亂，在液膜的揮發性方:就= 方==58 :=r於揮發較弱處的所須乾燥制 在此實施例中，即使縫隙58的間隙尺 由乾燥喷吹部5G的乾財氣之喷吹來補償間 =使缝㈣内的揮發率均—化，進而可促進乾燥處理時間 在液滴除去部48中，當預塗輕14之外周面上 域通猶，隨即使擦餘52離_魏14 _退^置ί 另一方面，乾燥噴吹部50如圖2的s 士 ,Τ喿,氣:在經過既定時間(例如10秒左:)停1噴:乾 吹部電後隨即或在經過既定時間後，將i 18 201116340 在使預塗輥為預塗處理後隨即進行的後處理， 18進行的粗洗淨，由替/間，刀別貫施1次由粗洗淨處理部 部奶之液滴除去部=進^^部38進行的精洗淨’由乾燥處理 此即可周全地清潔職去處理之最短循環，通常藉 預塗輥1次旋轉之清潔循環。之外周面。但是，亦可重覆多次上述 初係理為預塗處理隨後的後處理，最 塗輥Η之外周面，藉2洗的洗f墊20抵接到旋轉的預 均-且有效軸G的雜面觸之互相摩擦而 在粗洗淨處理後十 f於越的光阻劑液之液膜RM。並且， 淨而容易ΐ周t也%隨即藉由2流體喷射流之精洗 依據此Ξ 2 昆14上的薄薄殘存液膜财。 洗淨處理部18的動2 fff洗淨)洗淨處理方式’不僅藉由粗 為在粗洗淨處理部18使[、^精洗淨處理部38的負擔，且因 使用量她於^㈣言大幅^績魅過再生，柯使總洗淨液 在面接觸 1^目==8中同洗淨墊20係由多孔質樹脂構成， 光阻劑示的_而快速將已吸取的 穩定維而ϊγ不留下先阻劑之汗染的方式完成， 位置處理時在第1位置(接觸洗淨 Η此，可㈣U外面’原則上此外的時間係離開預塗輥 從而择加夢；的接觸文到光阻劑的汗染染之事態(將 抑iV纽實施财，為了藉由洗淨處理除去縣_著於預 ，4之外周面的洗淨液，在乾燥處理部.4〇的液滴除 、 負的擦拭塾52接觸於預塗親14之外周面而栻除液滴後， 乾域理部40的乾料吹部5G使氣體喷㈣_輥旋轉=相 ς 19 201116340 燥空氣，在縫隙58之中及其出口附近使逆向的銳 木二瑕J之噴吹抵在預塗輥14之外周面。 (拭Γ氣喷吹)乾燥處理方式，不僅藉由液 焊Ϊ大為減輕乾燥喷吹部5G的負擔，且因為乾 於習知=言大m乾燥處理效率高，亦可使總乾燥處理時間相較 在第ί位ittn48 _觀52财拭除精洗料之液滴時 外的時m糸除;ί㈣)接觸於預塗輕14之外周面，原則上此 上*預4 14。藉此，不僅可避免預塗輥14之外周面 從52 Μ及到不受期望的液滴之事態(將 及消“二'達處理時間)，亦可齡 〔預塗處理方法的第2實施例〕 理方圖6瓣此預塗處理裝置可實施的預塗處 ϋ 2實施例亦在魅處理裝置所組人的該光阻齡佈裝置 在塗佈平台上結束一片基板份的塗佈處理時，在此預塗 处丁1次份的預塗處理，作為下次塗佈處理的前置準備。 、、卜在第2實施例中預塗報14的外周面整圈均重置到 △wr狀，後進行第1次及第2次預塗處理時的各階段。 構ιο^ΐ/1 ί的預塗處理中’首先如圖1所示’藉由喷嘴移動機 構100疋位狹缝喷嘴98，使得狹缝喷嘴98的喷出口卩5签 隙(例如數平行地對向於預塗輥14的頂部二疋、Β 其次’如圖5的Sw(喷出)所示，使預塗輕、14靜止，並且 由光阻劑供給部搬使狹缝喷嘴98喷出固定量的光阻劑液r。猎 =光=液喷出的動作在固定時間内進行。從狹縫喷嘴98之 轉動Ϊ次·辕ί轉機構16在既定的時序使預塗報14開始旋 如圖2的Sid捲取)所不，使光阻劑液R繞入狹缝噴嘴兇 20 201116340 撕，將光阻劑液R捲取在預魏14之外周面上。 的旋轉速度，宜為不會太快使光阻劑液 此，序使預塗輥14之旋轉速度-口氣上升。藉 喷嘴98^側麵所7^，光阻雜⑽，分成狹缝 阻判该腔沾H主輥4側。此時，若使狹縫喷嘴98上升，可使光 狹以定的雜更加圓滑且確實地進行。如此，在 液膜RJF。另到，面下端部98續留有光阻劑液的 賊灿另一方面，在預塗輕14 靛轉角度耙圍而§可設定成70。〜75。的尺寸。 SU自^;:使===f的 ^速度可轉在紐舰膜分_^^ 理㈣=洗淨處 在此實施例中，藉由如此在切=3==)全部關閉。 亦使麵14的咖_i 之垂:。=，:1::取: 光阻，液膜咖係從預塗報M之項部往底部在旋^ 上的 假設，在此使預塗輥14的旋轉停止， j方向私動。 力造成的旋轉方向向下的力持續作 淑膜譲1有重 Η之外周面上下垂(擴散）。在預魏 中通常使用2〇cp以下的低黏度光阻劑液，故預日^轉塗佈法 上所述的光阻劑液膜之垂液。 、^ 1上谷易產生如 但是，在此實施例中，因為不佶 其繼續，故實質上消除作用於光阻劑液^t的^走力轉^亭作止用(= 21 201116340 垂液的力），可使捲取在預塗報14上的光阻劑 散亚巧表面張力停止在既定的區域(分割區域)内、。1 就第2種效果而言，藉由使排氣 ^ ，並使纖14的旋轉繼續，可使捲 劑液膜RM!在短時間内有效率地自然乾燥。、 勺先阻 72為開啟並使預塗觀14旋轉時，即使停 士乾燥㈣σρ 5。的氣射嘴6。，預塗輥14上的光 ίΓν58並之中逆風所造成的大幅㈣，容易使^厚均-性 劑液臈二的田逆風 力奮亂而加諸在光阻 逆風地壓力^承受與大氣中放置在靜止 如此，預塗輕U上的光阻劑液膜腕 2部，狀態下使膜的表層部成她 狀恶。到達此種半乾的狀態日寺，即使停 乾 劑液膜聰丨也不會產生垂液。/私止預土114的疑轉，光阻 液膜tiff 將自然乾燥步驟後成為半乾狀態的光阻劑 妒·)稱為光阻劑乾燥膜〔_〕，用來盥自 '、、ν乾燥步驟前完全液體狀態的液膜進行區別。 /、 、>νς如、上所述由預塗輥14之旋轉造成的光阻劑液膜RM〗之自缺乾 花㈣定的時間進行。此期間内，狹缝喷嘴98 ^由 佈;ίΪ ί構⑽^移往塗佈平台，用於—片基板份的光阻ΐ塗 “處理ϊΐ ’ 劑塗佈處理後，狹缝喷嘴98再度回到此 隙®所示定位，使得其喷出σ隔著既定的間 隙而+行地對向於預塗輥14之頂部。 " 她 1第^欠白t預塗處理中，如圖5的(喷出)所*，在離開前 (弟-人)預塗處理中捲取在預塗輕14的第i光阻劑乾燥膜 22 201116340 • 〕並使預塗輥14之頂部相對於狹缝嘖嘴98夕4山 使狭縫喷嘴98噴出固定量的光阻劑液8之喷出口的狀態下， 此時亦與第！次預塗處理^目同步驟^ 步驟，將光阻劑液R捲取在預塗_ 日 （2·2)及分離(S2-3) 尺寸(旋轉角度範圍下7〇。〜75:)而m外f面上既定的旋轉方向 預塗輥Μ的旋轉繼續並從分離〆=液膜_2。並且’使 如此，在預塗輕Μ之外周面與第膜。谢2自然乾燥。 既定的旋轉以iGotSC成向第下=的相鄰分割區域内1 作為隨附於本次(第劑乾燥膜〔腺2〕， 次預;次及第2 以既定的麵挪分·域内， 作為隨附於第3次預塗處理的殘)存^ 3光阻劑乾燥膜〔腹3〕， 〕如==!==_膜_ η上接受任;強::燥ALlig2〕故:為完全未在預塗輥 延長數倍亦仍在半乾的狀態下。一里’故即使自絲燥的時間 能並遠綠t具細例中’在預塗親14之外周面整圈重置到潔淨狀 丁既定次數的預塗處 圈：至= 订預塗輕14的-起洗淨(外周面整圈之清淨人後p現即進 圖6顯示在預塗報14的—圈畀 隨後的-併洗淨戦處理時的各階取後(弟4二人)預塗處理及 23 201116340 最後(第4次)預塗處理，如 捲取(S4獻分離(s4_3)之各步驟二先的喷出队)、 相同，將光阻劑液膜聊捲取在預L 預塗處理時 向第=阻〕的下游_目鄰分割區域内在方疋轉方 「s )伟4-3後隨即跳過自然乾燥步驟，轉移到m ..14 ^ -) (第1位置)。洗二二〔，〕的順序移至接觸洗淨位置 接觸洗淨位置的光阻劑乾燥膜=下的 阻劑液膜RM4。 、〔RM3〕及光 可容易的秋t外f面上的光阻劑液膜驗4當然 ΓΡΜ , Λ 丰乾狀態的先阻劑乾燥膜〔RM!〕、「RM Ί 〕或先阻繼膜腹4的—部分從預 l j 、〔腕3 和:6，’严部分被吸入洗淨塾(多^ 液膜胸陶、〔叫〕或光阻劑 社的 努旋轉方向的下游側移動。在粗洗淨處ii 18;，在 阻劑液膜應4的粗洗淨結束後，使洗淨墊2G回』: 38後猎!r ri轉使各殘存液膜叫，抵達精洗淨處理部 二T t噴殘存液膜職，。在主控制部96的控制下，Ϊ ==喷!：=，塗輕14之外周面上各殘== ' ,、σ吏机脰喷射流從最初的殘存液膜RM〗'抵達 24 201116340 時起不間斷地持續到最後的殘存液 洗淨處理部38開始2 _喷射^ ^通過後。另，約與在精 如此，藉由2流體喷射嘴同時將真空裝置乃開啟。 擊力，容纽周全地洗去附著^射^ 2 ^體噴射流之強烈衝 鹽，，其大部分混於洗淨液並流14之外周面上的殘存液膜 到附近。飛散的水霧吸入到吸^ ^ 76 變成水霧飛散 通道68。 ” 方向，並從該處排出到真空 理部所述的精洗淨之動作後，乾_ 淨液之液滴大1分隨铉A &寸者於預金^ 4之外周面上的洗 I I喊理部4G 11錄猶去部48的捧 拭墊52拭除，亚在通過擦拭塾&後隨 丨= 58 t, 霧ma從抽吸口 66排出。 丁 又风水201116340 VI. Description of the invention: [Technical field of the invention] The strip pre-coating treatment method and the occupational processing device, the lining forms a processing liquid in the vicinity of the ejection σ of the slit nozzle used for the non-cyclonic liquid i And as a pre-preparation for the coating process. [Prior Art] In the photolithography step of the manufacturing process of the non-planar display device (FPD), the nozzle is introduced into the pure film, and the photoresist ship is coated on the substrate substrate such as the glass substrate. + The liquid surface formed by the direction of the back surface of the slit nozzle is slanted and slashed, so that the necessary strips of the == slit are sprayed out, and the lower end of the back surface is set to ==; Winding into the lower part of the back surface of the slit nozzle and winding the liquid in the pre-coated outer ΐ / ΐ 1 1 分成 分成 分成 分成 狭缝 狭缝 = = = 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 It is difficult to adjust the length of the strip, but it is adjusted by the tightening amount of the part. The ϋίϋν η of the photoresist solution is different depending on the nozzle used to receive and wind the slit, and the size of the tree may be below 1/4 圏 (9 〇.) or 1/5 圈 (72.) The following is a good circle, and also the wash area is 'therefore, so there is a squeegee of the photoresist on the outer surface of the pre-coated roll, which is in the back.阻Resistant _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ After the pre-coating treatment of the fixed amount of the second nozzle is completed, the pre-coated outer peripheral surface is completely circled-washed to the number of people, and the outer peripheral surface is pre-coated and expanded in the direction of rotation. ; νί part of the surface area) is used in sequence to use the number of times in the rail, ^ίΐ: and then the outer circumference of the pre-applied stick will be circled--the net. The LL LL LL system is rotated by the rotating mechanism to continuously rotate the pre-coating light b and the blood-drying mechanism of the cleaning mechanism is operated to complete the cleaning of the surface of the pre-face, without having to be coated in each 201116340 Scraper for stripping the coating liquid wound on the surface of the pre-coating roll during processing, which saves the cleaning liquid consumed in the cleaning process after the pre-coating treatment, and prevents the washing and drying process Produce particles. [PRIOR ART DOCUMENT] Patent Document 1: Japanese Patent Laid-Open No. 2004-167476 Patent Document 2: Japanese Patent Application Laid-Open No. Hei No. Hei No. Hei. In the above-mentioned Patent Document 2, the pre-coating treatment method is modified, and the miscellaneous treatment material and the pre-coating treatment are provided to achieve more savings in the pre-coating treatment towel, and the cleaning solution is further improved. Drying ^ = reduction of time and washing place lang and/or dry _ longevity of the tool (method of solving the problem), for the above purpose, the pre-coating method of the first aspect of the present invention is used for The slit coating of the coating treatment of the enamel coating method includes: ???============================================================================ The pre-painted top will be: 山, the mountain will be sprayed with a fixed amount of coating liquid in a narrow, slit nozzle to rotate the miscellaneous, and the part of the coating liquid of the crucible is taken up in the pre-coating light 1 Upper two: J吏 The pre-coating roller is rotated, and the joint is applied to the area of the far coating liquid outside the coating roller. Rough washing; in the third step, the net is passed through the rough-washed pre-coated side surface and the pre-coating light is washed and the pre-coating is rotated, and the fine is performed. In the back, I dare to first in the rough washing step (the second step) to abut the 5 201116340 to the outer surface of the rotating pre-sister, and be uniform and efficient by contacting the elastic surface of the washing surface. The liquid film of the photoresist liquid attached thereto is washed and washed. Further, immediately after the rough washing treatment, a thin liquid film remaining on the precoat roll is washed in the fine washing step (third step). According to the 2 P section (the rough washing and the net treatment method, the burden of the washing process is significantly reduced by the inserting of the crude washing step) and the amount of the washing liquid used in the coarse washing step Significantly lower than conventional. In the preferred state of the present invention, the coating liquid on the outer peripheral surface of the pre-money is in the middle of the position from the top of the pre-coating roller to the bottom portion by the rotation of the pre-coating roller. Wash the pad thoroughly. As described above, in the precoating treatment, when the precoating liquid is subjected to the rough washing treatment before the semi-rotation, the liquid film of the coating liquid can be prevented from being diffused as desired. In the middle of the sputum, after the rough washing is finished, the washing 塾 is retreated from the clean area that has not been affected by the pre-coating treatment in the outer surface of the pre- ίίL ii, and the 纽 纽 红 , , , , , , The first cleaning solution can make the currently drawn coating liquid spit out. By borrowing, the contamination with a significantly larger squeezing pad can stably maintain the cleaning ability of the cleaning pad. Pei removal washing 4 In the fine washing step (3rd step), it is advisable to remove the cleaning liquid from the periphery, as follows: ========================================================================= The sound is both in the field, and the consumption of the new washing liquid for the fine washing can be saved. The 6th step of the outer surface of the washing of the pre-painted surface of the 201116340 is in contact with the outer peripheral surface of the pre-coating roller at an angle which is inclined according to the % turning direction of the pre-coating rail of the 2-stage (sweeping) dry hair. Further, ", , ^ = 少 少 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 For the vicinity of the discharge σ of the slit nozzle used for the treatment, the preparation is completed, including the following step 1 1 step; because of the application of the quantitative amount of St, the job "coating roller Si vapor: circumferential surface; 1 2 step 'to make the coiling on the pre-, the outer surface of the coating liquid dry and become a dry film; $ 3 step, in response to another):: ΐ ΐ ii = ff mouth of the nozzle leaves the dry film and separated After the ί cloth i is rotated, the pre-recording is rotated, and the shovel is different in the area from the dry film: the ϊ if cloth is partially wound on the outer surface of the pre-coating roller; the 4th ~ 'the side is reduced And the cleaning pad is brought into contact with the outer surface of the coating roller 201116340, and the coating (four) is redundantly subjected to rough washing, and the first step is to make the rotation ‘Aya will supply the washing wire to the batch and wash it, and the sixth step, so that the pre-twisting rotation is pre-=== The fine cleaning (4) is pre-week and the outer surface is fresh. I and make the peek and the ϊ ϊ ) ) tr 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在After the pre-coating treatment of the number of mosquitoes is used, the liquid film or the dried film is collectively washed and dried together, so that the use amount of the cleaning liquid can be further saved. In the treatment method, 'remaining (attaching) in the area: the drying is dry and no film' as a pre-coating treatment using one part of the period on the outer surface of the pre-coating roll The result 'and the use of the pre-coated film: for the different areas to carry out the subsequent pre-coating treatment. Because of the dry-indefinite area', even if the subsequent pre-coating is carried out in the vicinity, it does not affect the effect from the dry film. (interference) a 士车乂 is 'dry line in the state of borrowing * naturally dry and semi-dry. Rotating - part of the coiling after pre-coating Yukun, still make the pre-coating roll Natural drying of the liquid. By this natural drying method, it can be cut and dried in a clean state. It is easy to wash off, and the precoating treatment method in the third aspect of the ir month is used to form a liquid film of the coating liquid in the vicinity of the discharge port of the slit nozzle of the non-rotating coating method. The preparation comprises the following steps: in the first step, in order to make the nozzle of the slit nozzle parallel to the nozzle, the top of the cylindrical or cylindrical pre-coating roller, with a predetermined closing gap After the coating liquid in the slit is rotated, the pre-coating roller is rotated, and the discharged coating liquid is transferred, 2 on the outer surface of the pre-coated parent; and the second step is to make the pre-coating涂嫩予 L7丄...f washing liquid to pre-coat the outer surface of the coating liquid to take up the area of the coating liquid / net, the third step, the pre-coating roller is rotated, and the plate-shaped wiping pad is connected to 201116340 Touching the outer surface of the pre-coating roller, using the liquid; and in the fourth step, the washing of the sprayed surface is in the opposite direction, blowing through the solidification in the direction of rotation, and the rotation of the circle of the Kun. For the post-treatment that is carried out immediately after the week other than the pre-, the pre-coating treatment is carried out by using the flute (the first step). Wipe the sputum and wipe it off. And the second step (strict 3 乂) is removed in the _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ And °, because by inserting the droplet removal step (the burden of the third step + p μσ ΐ step (step 4), and greatly reducing the dry spray, the total dryness can be greatly shortened. Time. The volatility of the threshold and the human step itself, the exit of the slit nozzle used in the coating treatment of the precoating treatment in the fourth aspect of the present invention, and the coating treatment in the non-rotation coating method. Pre-prepared, including: pre-painting the liquid film, and cleaning the washing and removing the second position from the outer surface of the pre-coating roller: the first position of the surface for washing The cleaning liquid is supplied to the pre-coating roller for replacement; the finishing treatment is used for the surface of the fine chamber t; the rotating mechanism, the rough cleaning processing unit, the second cleaning unit, and the control unit and the control unit are dried. Each of the operations is performed; and the processing unit and the drying processing discharge port are precoated with a light top portion in a predetermined inter-parallel nozzle shape, and the slit is sprayed Spraying or cylinder f on the outer circumferential surface of the pre-coating roller, the cleaning device n is used to wind the cleaning pad to contact the cleaning pad to the "external s 201116340 ^ coating ^; , the domain is applied with rough washing, by the rotating mechanism to make ^^. = .,,. 0 In the case of the pre-coating of the pre-coated 辕, the tf 42th = the above-mentioned composition, the implementation of the second and the second aspect of the treatment method __= this and the above] In a preferred embodiment of the invention, the granule wash is > position: to rotate from the top of the ^ j roller to a dichotomous heart:::. 'Used directly or by the outer surface of the pre-coated roll ί SiSi: In a preferred form, the cleaning pad has a cross section covering the length to the other end and a rectangular cross section, thousands of squares = pre-coated roll - Start at the outer surface of the pre-painted light. The fine-washing part 1 is in contact with the ir-transfer and the paste-jet flow is applied to the coating process. The spin coating method is prepared for the coating process, and the package is *^=the liquid film of the coating liquid. The flat position is at a predetermined position; the rotating mechanism is configured to make a u u shape or a round shape, and the water treatment part is used for rotating the i-coating central axis with the cleaning liquid; the position of the wiping pad is contacted with the cleaning Wipe the pad and pre-coat the face of the second position on the outer circumference of the roller. A fixed position of the position and the direction of the turn is formed in the pre-coating layer 具有 具有 具有 具有 具有 具有 具有 具有 具有 具有 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 Applying a light rotation, the coating liquid on the outer surface of the J or the surface thereof is removed, and the pre-coating roller is attached to the pre-coating roller to be rotated around the pre-coating roller, and the cleaning is performed. Decreasing the 'borrowing_rotating mechanism to cause the nozzles remaining in the pre-painted nozzle to spray the dry gas, according to the precoating treatment in the fifth aspect, the precoating treatment of the pre-coating method of the third-state sample towel Method phase _ side effect. In the pre-coating treatment device of the present invention, the generated water mist is removed by fine-graining; and will be placed around the pre-coating roller (the effect of the invention) and According to the treatment method or the precoating treatment device, the above-mentioned constituents are used, and the use of the pre-coating treatment is further reduced, and the cleaning and cleaning processing tools and/or cleaning processing tools and/or 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 [Configuration of Precoating Processing Apparatus] "Lu shows the present invention - the configuration of the processing apparatus for the miscellaneous secondary service. This pre-coating is performed in the photolithography step for the LCD manufacturing process, and the non-rotating main cloth method is performed. A photoresist coating device (not shown) for photoresist coating treatment, and disposed on the 11 201116340 touch cloth treatment, and the substrate to be processed _ floating coating coating platform (the length of the mouth portion 12 is not The pre-coating roller 14 having the slit-shaped opening portion 12 and the upper portion of the slit opening portion 12 is supported upward by the top portion thereof. The bearing is not horizontally rotatable by a bearing (not shown). Fixed circle, made of stainless steel. '苒98 length of the king. Peripheral 10 can also be used with a horse-turning mechanism 16 with a rotating drive shaft system, such as the bucking wheel bite transmission book tower value and = service motor constitutes its rotation Angle position 编 The stone machine can control the rotation of the motor arbitrarily and along the top of the positive ί =YaQ t&14 (the highest frequency to the bottom (lowermost) 1 direction (counterclockwise rotation in the figure) / only The cleaning pad 20 of the rough cleaning processing unit 18 is disposed: and the horizontal and rectangular sides are corrected in the vicinity of the correction angle 9〇. The surface shape is held by the long box-shaped pad holding portion 22 at the other end of the pre-war. Although the light 4=the opposite surface has the opening, the rotation control unit, the encoder, etc., and the movement of the field force The contact between the first position (contact cleaning position) and the departure position 2 (retraction position) of the outer peripheral surface of the pre-coating roller 14 is switched. 'There is a cleaning liquid supply nozzle 28. The slit ίίίΐ ί 2G has a long strip shape with a length of a stripe, and is sub-arranged so that the outlet is oriented toward the above-mentioned .i position (contact cleaning 12 201116340 position) 20 front part (contact part) 2〇a, or the outer surface of the pre-coating taper which is slightly upstream of the right side. The washing liquid (for example, 2 δ 2 δ, which is taken by the washing liquid tank 32, is roughly washed 30. Washing _ to pour 28 liquid to remove dust 2 set secret from the cleaning side set secret - relative TM 1:; - = should be thanks to Xie Gu, r6 long coat roller 5 Wei miscellaneous part 48 and dry blowing part 5G, And from the top (the uppermost part) of the pre-14, in the forward direction, it is preferably rotated 27 〇. 〜 36 〇. The pad is rotatably supported by the wiping pad 52; And holding 3 sides: ^ the position of the wiping pad 52, in contact with the pre-coating roller! 4 position 2 position _ position) and away from the (10) board body wipe: there are 预置 12 presets) 'its long ^ square Γ fμ 'In the above-mentioned first position (the edge portion of the one side of the liquid droplet removal direction is inclined according to the rotation of the pre-coating light 14 and ^======lower 'most _30.)' 58' is set in the forward rotation direction and is formed in the droplet removal nozzle 60 and formed around the pre-coating light 14; and the direction of the rotation of the air is made to be opposite to the pre-coating (four) 58. This gas nozzle 60 has a slit nozzle having a length of the pre-coated core 7 R of 201116340, and the downstream end portion of the slit 58 is at the upper wall portion of the outer casing ίο. The gas nozzle 60 is fed to the portion 64 via the pipe 6 y . A switch 65 is provided in the middle of the pipe 62. I Wet emulsion is observed from the precoat roller U, and suction π 66 is provided after the fine cleaning portion % and the drying treatment portion. The exit 66 is via the true lane (10) and the month 72. The water harvesting tree 70 series captures the water mist from the suction port 66 through the straight space. The liquid (washing liquid) recovered by the water mist trap 7 is passed through the cleaning liquid tank 32. < η to the bottom of the outer casing 1' is formed at the position immediately below the pre-coating 14 and the discharge port 76 is lightly connected by the discharge pipe 78 to the discharge tank 8〇. Recycling this rib _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ The tank 32 is not filled with the above-mentioned gamma-water rayon% and the used cleaning liquid of the tank 80. The switch 阙8 is also opened as necessary to replenish the unused fresh washing liquid (diluent) from the new washing source 84. The row 8 liquid type 32 body ' can be respectively sent to the waste liquid tank (not shown) when the discharge valves 86 and 88 on the side are opened. The cleaning liquid regeneration system 94 is constructed by the cleaning liquid tank 32, the water mist collection n 7Q, the drainage (10), and the piping and the piping, and is used to reuse the liquid in the rough cleaning processing unit 18. When the cleaning is used, the control unit 96 includes a microcomputer that operates in accordance with the recorded body, and integrally controls the roller rotating mechanism 16 in the middle, the rough cleaning processing unit 18, the fine cleaning processing port =, the drying processing portion 40, and the vacuum. Each operation of the device 72 and the cleaning liquid regeneration valve (37, 45, 65, etc.). And _ 〇 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、兀丨^土恐怖 14 201116340 = 6. In the precoating process, the main control unit % controls the photoresist 100 supply unit 102 and the on-off valve 106 to control the narrow 100-position and the photoresist liquid discharge operation. ', the private movement of the sound and the first embodiment of the precoating treatment method. In the photoresist coating apparatus of the flat device, each time the precoating treatment of the coating is applied, as the next coating treatment The front position 1 is broken into the 仃1, and the second state is not the state in which the pre-coating treatment is performed i times. The coating pattern = light, the outer peripheral surface _1 is a clean slit nozzle 98, so that the slit nozzle 98 ^ is ejected from the hunting port f = 1 〇〇 to position the yoke, the gap (for example, several K% m) and parallel to each other. ,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,, The photoresist liquid sprayed from the discharge port is in the crucible. Spreads from the direction of the slit nozzle 98 to the surroundings. After the top of the bandit 14 is turned on, the wire is rotated, and the roller is rotated by the roller rotating mechanism 16 at a predetermined timing to make the precoat and 1/1 Ba it north as shown in S2 of Figure 2 (winding). The photoresist liquid soil R knot to the cycloid makes the light resistance ship & _ breaking speed ' _ will be too fast, ί ί will pre-; speed - tone improved. By means of the knife, the liquid film of the photoresist liquid R is separated and divided into the narrow 15 201116340 slit nozzle 98 side and the pre-coating roller 14 side. + The separation of the photoresist liquid film rises at the predetermined gauge nozzle 98, The slit nozzle 98 can be made from the nozzle discharge port without 17 π and surely. Thus, the liquid film RP ° is another aspect of the liquid photoresist which is pre-coated with the light-resisting sword liquid. This miscellaneous film, which has the size 'rotated in the direction of rotation' as described above, is taken up in this embodiment, and the well is stopped, for example, 7 〇. The '11^ is followed by the pre-coating lighter temporarily 2 position) to the contact cleaning position (the first) 胄 = 塾 20 from the current retracted position (the first reduction of the outer surface. Can === the desired dust contact In the pre-applied wash position, the rotator is desirably stopped at the next arrival, so that the surface side = set). No, the coil is taken outside the pre-coating roller 14 and the sweat σ is as shown in Fig. 2, S4 (rough washing). The clean position of the cleaning pad 20 is removed from the photoresist film liquid film ship of the if 5, and the photoresist film is removed by contact with the cleaning surface, and the surface is removed by contact with the cleaning surface, and the mouth is removed. ; ^ The liquid film should be partially, from the precoated roller (porous resin) 20. However, on the side of the Duoyang side, the other part is sucked into the washing pad (there are many pre-painted light 14 on the outer surface of the outer surface 2: the film _ also has the rotation of the wrecking direction that has not been erased and the wrecking direction In the pre-coating process, in the pre-coating treatment, the shovel and the shovel are spread in the above-mentioned embodiment. The position is followed by the pre-coating roller 14^ when the household is pressed; The net moving mechanism 24 cleans and washes the washing pad 2 “ 」 粗 粗 粗 粗 粗 粗 粗 粗 粗 粗 粗 粗 粗 粗 粗 粗 粗 粗 粗'!! 2t°'20 is supplied to the cleaning pad 20. t can also be used as the cleaning liquid replenishing nozzle 28 to supply the cleaning liquid 16 201116340. Thereafter, the cleaning pad moving mechanism 24 washes and washes the cleaning pad 20 away. The smear 14 returns to the retracted position == In addition to the pushing pressure, the 'Kun Kun rotating mechanism 16 causes the pre-coating 14 to rotate to the m position). In the same manner, by the rotation of the pre-coating roller 14, after the remaining liquid 5 is 38, the 2 fluid ejecting nozzle 42 is operated and the compression treatment is performed until the (four) new washing is performed (diluted cake: ^ nitrogen) ) Mixed film. The main control unit 96 manages the pre-coating light 14 residual liquid, and the main position of the area (the position of the direction) is grasped by the roller rotating mechanism 16. Therefore, the two fluid ejecting nozzles 42 i and the refining processing unit 38 can be simultaneously opened at the same time during the predetermined interval in which the residual liquid film is ejected. 1 Shizheng washed and washed immediately after the treatment ί field (connected in the age (four) after the _ how much = and will be forked dyed area is also used by the fine cleaning treatment department 38: ί 二: ΪΓ clean ( The discharge liquid can also be periodically performed, and:; the strong punch 76 of the 2 fluid jets sprayed by the striking nozzle 42 is filled with the washing liquid to the bubble discharging port 5 The threat is caused by the water mist _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ In the case of π person, the liquid droplet removing unit 48 rotates the wiping pad 52 to the position (first position) from the current retraction 17 201116340. Further, the water mist of the drying blowing portion is sucked into the suction port 66. The lower side of the row falls on the side of the row 76, and the rest is thinner than the pre-coating light 14 which is removed by the wiping blade 52 and can not be removed; r is sucked into the suction port 66. It is efficiently read and volatilized to become a water mist. The spray of dry air by the ma 4 is placed in the blowing part 5G, as long as the 卩 is subjected to the headwind, the gap size is still disordered, and the volatility of the liquid film: = square == 58 : = r is required to dry in a weaker volatilization. In this embodiment, even if the gap of the slit 58 is blown by the dry fuel of the dry blowing portion 5G to compensate for the gap (in the slit) The volatilization rate is uniformized, and the drying treatment time can be promoted in the droplet removing portion 48. When the pre-coating light 14 is on the outer surface, the surface is still passed, even if the rubbing 52 is away from the _Wei 14 _ 退 ^ ί On the other hand, the dry blowing unit 50 is as shown in Fig. 2, Τ喿, gas: after a predetermined time (for example, 10 seconds left:), 1 shot is sprayed: after the dry blow unit is turned off, or after a predetermined time elapses, i 18 201116340 After the pre-coating roll is pre-coated, the post-treatment is carried out immediately, and the coarse washing is performed by 18, and the squeegee is applied once. The ^^ part 38 is cleaned by the drying process, which can be cleaned thoroughly for the shortest cycle, usually by a pre-coating roll for 1 rotation. The outer circumference. However, it can be repeated many times. The above-mentioned initial structure is the post-treatment of the pre-coating treatment, and the outer surface of the most coated roll is attached to the pre-average of the rotation and the surface of the effective axis G by the wash-wash pad 20 of 2 washes. Touching each other and rubbing the liquid film RM of the photoresist liquid after the rough washing treatment. Moreover, the net is easy to ΐ t 也 随 随 随 随 随 随 藉 藉 藉 2 2 2 昆 昆The thin residual liquid film of the cleaning treatment unit 18 is cleaned by the cleaning treatment unit 18, not only by the coarse cleaning processing unit 18 but also by the coarse cleaning processing unit 38. The burden, and because of the amount of use, she is in the ^ (four) statement, the performance of the great rejuvenation, Ke make the total cleaning liquid in the surface contact 1 ^ mesh == 8 with the cleaning pad 20 is composed of porous resin, photoresist _ and quickly the stabilized viscous γ γ that has been absorbed is not left in the way of the first resisting agent, in the first position (contact cleaning , this, can (4) U outside' in principle, the other time is left Pre-coating the roller to choose the dream; the contact text to the sweat staining of the photoresist (will suppress the iV New Zealand implementation, in order to remove the county by washing treatment _ in the pre-, 4 outside the surface of the cleaning liquid The dry material blowing portion 5G of the dry domain portion 40 is removed after the droplets in the drying treatment portion of the drying treatment portion are removed by the negative wiping sheet 52 and the outer peripheral surface of the precoating layer 14 is removed. The gas jet (four)_roller rotation = phase ς 19 201116340 The dry air is sprayed against the outer peripheral surface of the precoat roller 14 in the gap 58 and its outlet. (Washing sputum blowing) The drying treatment method not only greatly reduces the burden on the dry blowing portion 5G by the liquid welding boring, but also makes the total drying processing time high because of the high drying efficiency of the conventional method. Compared with the outer surface of the pre-coating light 14 in the ttn48 _ view 52 拭 48 48 48 ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ί ί ί ί ί ί ί ί ί ί ί ί 接触 接触 接触 接触 接触 接触Thereby, it is possible to avoid not only the situation in which the outer circumferential surface of the precoat roller 14 is from 52 Μ to the undesired liquid droplets (the processing time of the "two" treatment time), but also the age [the second implementation of the precoating treatment method) Example: Figure 6: The precoating process that can be implemented by the precoating device. 2 The embodiment also applies the coating process of the substrate portion on the coating platform of the photoresist device of the group of the device. At this time, the precoating treatment of the pre-coating portion is performed as the pre-preparation of the next coating treatment. In the second embodiment, the outer circumference of the pre-coating 14 is reset to Δ. The wr shape is followed by the first and second precoating processes. In the precoating process of the ιο^ΐ/1 ί, 'first as shown in FIG. 1', the slit is moved by the nozzle moving mechanism 100. The nozzle 98 is such that the discharge port 狭缝 5 of the slit nozzle 98 is gap-finished (for example, the number of the top of the pre-coating roller 14 is parallel to the top two, Β secondly, as shown by Sw (spray) in FIG. 5, so that the pre-coating is performed. Light, 14 is stationary, and the slit nozzle 98 is ejected by the photoresist supply unit to eject a fixed amount of photoresist liquid r. Hunting = light = liquid ejection operation is performed in a fixed time From the rotation of the slit nozzle 98, the rotation mechanism 16 causes the pre-coating 14 to start to rotate as shown in the Sid of FIG. 2 at a predetermined timing, and the photoresist liquid R is wound into the slit nozzle. 201116340 tearing, the photoresist liquid R is taken up on the outer surface of the pre-Wei 14. The rotation speed should be such that the photoresist does not flow too fast, so that the rotation speed of the pre-coating roller 14 - the breath rises. By means of the side surface of the nozzle 98^, the photoresist (10) is divided into slits to block the cavity from the side of the H main roller 4. At this time, if the slit nozzle 98 is raised, the light is narrower and smoother. In this way, in the liquid film RJF, on the other hand, the lower end portion 98 continues to have the photoresist liquid, and on the other hand, it can be set to 70 at a pre-coating speed of 14 turns. ~75. The size of SU. ^:: ============================================================================================= ) All closed. Also make the coffee _i of the face 14: . =,: 1:: Take: the photoresist, the liquid film is from the pre-painted M to the bottom of the hypothesis, here The rotation of the precoat roller 14 is stopped, and the j direction is private. The downward direction of the force in the direction of rotation continues to sag (diffusion) on the peripheral surface of the sputum. In the pre-Wei, a low-viscosity photoresist solution of 2 〇 cp or less is usually used, so the pre-coating method is used. The liquid liquid of the photoresist liquid film described above is easy to produce, for example, in this embodiment, since it does not continue, the force acting on the photoresist liquid is substantially eliminated. Turning the kiosk to stop (= 21 201116340 liquid force), the photoresist surface tension that is wound up on the pre-painted report 14 stops in a predetermined area (segmented area). In the two effects, by rotating the exhaust gas and continuing the rotation of the fiber 14, the roll liquid film RM! can be naturally dried naturally in a short time. When the spoon first block 72 is opened and the pre-coating view 14 is rotated, even if the stopper is dry (four) σρ 5 . The gas nozzle 6. The light on the pre-coating roller 14 and the large amount of the wind caused by the headwind (4), it is easy to make the thickness of the liquid-like agent liquid in the wind against the wind and the pressure in the wind against the wind. When it is placed at a standstill, the photoresist liquid film wrist 2 on the light U is pre-coated, and the surface portion of the film is made to be like her. When you arrive at this semi-dry state, the temple will not produce drip liquid even if you stop the liquid film. / Private stop pre-soil 114 suspected, the photoresist liquid film tiff will become a semi-dry state photoresist after the natural drying step 妒 ·) called photoresist dry film [_], used for ',, ν The liquid film in a completely liquid state before the drying step is distinguished. /, , > ν ς 、 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 光 光 光 光 光 光 光 光 光 光 光 光 光 光 光 光 光 光 光 光 光During this period, the slit nozzle 98 ^ is moved by the cloth; the structure is moved to the coating platform, and the slit nozzle 98 is returned again after the photoresist coating of the substrate substrate is processed. The position shown in this gap is such that its ejection σ is opposite to the top of the pre-coating roller 14 across a predetermined gap. " Her 1st owing white t precoating process, as shown in Fig. 5 (spraying)*, winding the ith photoresist drying film 22 of the pre-coated light 14 in the pre-coating process before leaving (child-person); 2011-16340 • and making the top of the pre-coating roll 14 relative to the slit In the state where the slit nozzle 98 is ejected from the discharge port of the fixed amount of the photoresist liquid 8 at the time of the sip 98, the same step as the first pre-coating process is performed, and the photoresist liquid R is applied. The coiling is carried out in the pre-coating _ day (2·2) and the separating (S2-3) size (rotation angle range 7〇.~75:) and the m-outer f surface is rotated in the predetermined direction of rotation of the pre-coating roller 并 and From the separation 〆 = liquid film _2. And 'make this, in the pre-coating smear outside the surface with the film. Xie 2 naturally dry. The established rotation in the iGotSC into the next = adjacent partition area 1 as Attached to this time (the first Dry film (Gland 2), sub-pre, second and second in a given surface, in the domain, as a residual film attached to the third pre-coating process, 3 photoresist dry film [abdominal 3], 〕如==!==_膜_ η Accepted; Strong:: Dry ALlig2) Therefore: It is not in the state of being completely unexpanded in the pre-coating roller, but still in a semi-dry state. The time can be far and far green t with a fine example of 'pre-coating the outer circumference of the pre-coated pro 14 to the clean-up diced number of pre-coating circles: to = pre-painted light 14 - washed (outer circumference) After the full circle of the cleansing person, the picture is shown in Figure 6. The pre-coating of the pre-painted 14 - the subsequent - and the washing of the 戦 process after the various steps (different 4 brothers) pre-coating treatment and 23 201116340 last ( The fourth time) pre-coating treatment, such as coiling (S4 de-separation (s4_3), the first step of the squirting team), the same, the photoresist liquid film is wrapped in the pre-L pre-coating process to the first = In the downstream part of the _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ The sequence is moved to contact the cleaning position to contact the photoresist at the cleaning position. Agent dry film = lower resist liquid film RM4., [RM3] and light can be easily used on the f surface of the photoresist film 4 of course, Λ, 丰 dry state of the first resist dry film [RM !], "RM Ί 〕 or first block the belly of the membrane - part from the pre-lj, [wrist 3 and: 6, 'strict part is inhaled to wash the 塾 (more ^ liquid film chest pottery, [called] or photoresist The downstream side of the rotation direction of the agent is moved. In the rough washing place ii 18;, after the rough washing of the resist liquid film 4 is finished, the cleaning pad 2G is returned to the following: 38 after hunting! r ri Each residual liquid film is called, and it arrives at the second cleaning unit of the finishing treatment unit. Under the control of the main control unit 96, Ϊ == spray!:=, the residual surface on the outer surface of the light 14 is == ', and the σ吏 machine jet flows from the first residual liquid film RM〗' to 24 201116340 It continues until the last residual liquid washing processing unit 38 starts 2 _ jetting ^ ^. In addition, about the same as in the fine, the vacuum device is turned on at the same time by the two-fluid nozzle. The force of the force is washed away by the strong spray of the sprayed liquid, and most of it is mixed with the residual liquid film on the outer peripheral surface of the washing liquid 14 to the vicinity. The scattered water mist is sucked into the suction ^ ^ 76 into a water mist scattering channel 68. " Direction, and from the place to the vacuum cleaning action described in the vacuum section, the dry liquid droplets are 1 point larger than the A & inch in the pre-gold ^ 4 outside the surface wash II The shouting department 4G 11 recorded that the holding pad 52 of the part 48 was wiped off, and the submerged by the wiping 塾 & followed by 丨 = 58 t, the mist ma was discharged from the suction port 66.
旋轉希望在最初的殘存液到達時起至少1次 == 她帳位置(第1位置)_於預塗親W 此第2實姉中亦與上述第1實施_同，即使在液滴除 拭塾52退開後，亦可如圖6的S4—8(乾燥喷吹挪示， ΐΐϋ部5Q仍暫時繼續儒乾燥空氣，並在經過既定時間後停 =乾^氣。又’在將乾料吹㈣關後隨即或經過既 日守間後，將真空裝置72關閉。 如此，依據此第2實施例，將預塗輥14之外周面在其旋轉方 向分割為多數(例如4個)並將各分割區域分配使用在連^的既定 -人數(4 -欠)的預塗處理’在最後(第4次)的預塗處理除外的各預塗 處理中，藉由在捲取光阻劑液的液膜RMi後亦使預塗輥14的旋^ 繼續動作，可防止光阻劑液膜_{之垂液並將光阻劑液膜保 持在各分割(分配)區域内，並且可使光阻劑液膜在短時間内有 效率地自然乾燥成為半乾狀態的光阻劑乾燥膜〔j^^〕。 25 201116340 如此，在預塗輥14上，因為可防止光阻劑液膜_1之垂液， 因此不必擔心汗染到相鄰的未使用分割區域，因此後續的預塗處 ^不受前面預塗處理造成影響，可提升預塗處理的重現性及$靠 缺卜ί、’Λ為附著於預塗幸昆14上的各光阻劑液膜騰1係在成為自 ϋί半乾狀態之絲劑乾觸〔_〕，或在完全液狀的 淨’故容易洗去’可減輕洗淨機構(粗洗淨處理部 18精洗淨處理部38)的負擔，降低洗淨液的使用量。 出期ϊί =係將藉由多次預塗處理而在預塗輥14之外周面上空 :乞燥處理而—次去除的清潔法，故即使相及 例而言’亦能更進-步削減洗淨液的使用量。上这苐1貝施 ㈣ί ♦在圖示例中，^將預麵14之外周面進行4分匈，人】 旋轉方向的光阻劑液捲取尺寸為^j 將幽Μ之外周面二寸 又，預塗輥14之外周面上—整圈 —/ )人連績使用。 水霧捕集器7(Γ回收在利用排沒槽80或 可將精洗淨處理部38之於可為㈣7所7^方法。亦即， 集中回收到設置在洗淨喷^^下=$)=的洗淨_釋劑） 送往粗洗淨處理部16，而取卜方的托鯈110，亚從托盤110轉 粗洗淨處理部18的洗轉2G 。此時，藉由將 位置，可不侧泵而利用重在低於托盤110的 預塗處理裝置内的其他動，再生洗淨液的轉送。 實施形態。例如，在粗洗淨處理成^能亦非限定於上述 動機構24、齒條與小齒輪二中，墊保持部22、洗淨墊移 (運動轉換機構)％的構成麵能亦可t 26 201116340 iii::在加工乾燥處理部38中亦可使用2流體噴射嘴以外的 就本發明中的塗佈液而言’在光阻劑液以外， 絕緣材料’介電質材料，配線材料等的塗佈液，亦可為夂！ 洗轉。本發明㈣被處理基板稀於 =等他平面顯示器絲板、半導體晶圓、CD基板、光罩'印 【圖式簡單說明】 圖1係顯示本發明一實施形態的預塗處理裝置之構成。 各階y麵4_示第1實施财進行1次份之預塗處理時的 吐屮LLi辭粗洗祕理部巾使洗淨墊將已吸取的塗佈液向外 土出的動作之局部放大剖面圖。 =4係顯*乾•處理部之構成及作S的局部放大剖面圖。 ㈣=ί示4性顯示第2實施例中進行第1次及第2次預塗處 埋及其後處理時的各階段。 示意性顯示第2實施例中進行第4次(最終)預塗處理及 其後處理時的各階段。 ί^β Ξ^顯不时在精洗淨處理部使_洗淨液並在粗洗淨處 σ丨進仃再生之構成的一變形例之剖面圖。 【主要元件符號說明】 10:外殼. 12:開口部 14 16 18 預塗輥 輥旋轉機構 粗洗淨處理部 20:洗淨墊 2〇a:前部(接觸部） 27 201116340 22:墊保持部 24:洗淨墊移動機構 26:齒條與小齒輪(運動轉換機構） 28:洗淨液補給喷嘴 30:送液泵 32:洗淨液槽 34、44、62、74:配管 36:過遽器 37、45、65、81、86、88、106:開關閥 38:精洗淨處理部 40:乾燥處理部 42··洗淨喷嘴(2流體喷射嘴） 46:洗淨液/氣體供給部 48:液滴除去部 50:乾燥喷吹部 52:擦拭墊 54:墊支持部 55:橫樑 ， 56:擦拭墊移動機構 58:缝隙 60:氣體喷嘴 64:乾燥氣體供給部 66:抽吸口 68:真空通道 70:水霧捕集器 72:真空裝置 76:排泡口 78:排液管 排洩槽 82:泵 28 201116340 84:新洗淨液供給源 90、92:廢液管 94:洗淨液再生糸統 96:主控制部 98:狹缝喷嘴 98a:背面下端部 1〇〇:喷嘴移動機構 102:光阻劑供給部 104:光阻劑供給管 110:托盤 ma:水霧 qa:液滴 R:光阻劑液 RJF、RM、RMi、RM2、RM4:光阻劑液膜 RM’、RM/、RM2'、RM3、RM4':殘存液膜 〔RMi〕、〔 RM2〕、〔 RM3〕：光阻劑乾燥膜 51 、 Si]、 S2-1、S4-1: 喷出步驟 52 ' S1.2 ' S2-2 ' S4-2： 捲取步驟 53 ' S1.3 ' S2-3 ' S4-3： 分離步驟 S4、S‘5: 粗洗淨步驟 S5:精洗淨步驟 s6:液滴除去/乾燥喷吹步驟 s7、s4_8:乾燥喷吹步驟The rotation is desired to be at least once from the arrival of the initial residual liquid == her account position (first position) _ in the pre-coating pro-W This second embodiment is also the same as the above-described first embodiment, even in the droplet cleaning After the 塾52 is retired, it can also be S4-8 as shown in Fig. 6 (drying and blowing, the squatting 5Q still continues the dry air of Confucianism, and after the lapse of the set time, stop = dry qi. Also 'drying the material After the blowing (four) is turned off immediately or after the circumstance, the vacuum device 72 is closed. Thus, according to the second embodiment, the outer circumferential surface of the precoat roller 14 is divided into a plurality (for example, four) in the direction of rotation thereof and Each divided area is allocated to use a predetermined number of people (4 - under) of the precoating process in each of the precoating processes except the last (fourth) precoating process, by taking up the photoresist liquid After the liquid film RMi, the rotation of the pre-coating roller 14 is further continued, and the liquid film of the photoresist liquid film can be prevented and the photoresist liquid film can be held in each divided (distributed) region, and the light can be made. The resist liquid film is naturally dried in a short period of time to become a semi-dry state photoresist dry film [j^^]. 25 201116340 Thus, on the precoat roller 14, It can prevent the dripping liquid of the photoresist liquid film_1, so there is no need to worry about the sweat staining to the adjacent unused partitioning area, so the subsequent pre-coating position is not affected by the previous pre-coating treatment, and the weight of the pre-coating treatment can be improved. The present and the lack of ί, Λ Λ 附着 附着 附着 附着 附着 附着 附着 附着 附着 附着 昆 昆 昆 昆 昆 昆 昆 昆 昆 昆 昆 昆 昆 昆 昆 昆 昆 昆 昆 昆 昆 昆 昆 昆 昆 昆 昆 昆 昆 昆 昆 昆 昆The net shape of the shape is easy to wash off, and the burden on the cleaning mechanism (the coarse cleaning treatment unit 18) can be reduced, and the amount of the cleaning liquid can be reduced. The coating treatment is carried out on the outer surface of the pre-coating roller 14: the cleaning method of the drying treatment and the secondary removal, so that even if the phase and the example are used, the amount of the cleaning liquid can be further reduced. Besch (four) ί ♦ In the example of the figure, ^ will be 4 points outside the surface of the pre-face 14 Hungarian, the person's rotation direction of the photoresist liquid reeling size is ^j will be outside the secluded two-inch surface, pre-coated The outer circumference of the roller 14 - the full circle - / ) is used continuously. The water mist trap 7 (the Γ is recovered by using the venting tank 80 or the fine rinsing processing unit 38 can be used for the method of 7). That is, the centralized recovery is set under the cleaning spray ^= The washing/removing agent of the == is sent to the rough washing treatment unit 16, and the tray 110 of the take-up side is turned from the tray 110 to the washing and washing unit 18 of the coarse washing treatment unit 18 by 2G. At this time, by the position, the transfer of the cleaning liquid can be regenerated by using other movements in the precoat processing apparatus lower than the tray 110 without pumping the side. Implementation form. For example, the rough cleaning treatment is not limited to the above-described moving mechanism 24, rack and pinion 2, and the configuration of the pad holding portion 22 and the cleaning pad shift (motion conversion mechanism) % can be t 26 201116340 iii: In the processing and drying processing unit 38, other than the two fluid ejection nozzles, the coating liquid in the present invention, other than the photoresist liquid, the insulating material, the dielectric material, the wiring material, etc., may be used. The coating solution can also be 夂! Wash it. The present invention (4) The substrate to be processed is thinner than the other flat panel display, the semiconductor wafer, the CD substrate, and the mask. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a view showing the configuration of a precoat processing apparatus according to an embodiment of the present invention. Each step of the y-plane 4_ shows the spitting of the first step of the first pre-coating process, and the part of the action of the washing agent to enlarge the coating liquid to be taken out. Sectional view. =4 is the structure of the *drying and processing section and a partial enlarged sectional view of S. (4) The four stages show the stages in the first and second precoating and the post-processing in the second embodiment. The respective stages in the fourth (final) precoating treatment and the subsequent processing in the second embodiment are schematically shown. ί^ Ξ 剖面 剖面 剖面 剖面 剖面 剖面 显 显 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 。 。 。 。 。 。 。 。 。 。 [Description of main component symbols] 10: Housing. 12: Opening 14 16 18 Pre-coating roller rotation mechanism Rough cleaning treatment unit 20: Washing pad 2〇a: Front part (contact part) 27 201116340 22: Pad holding part 24: Washing pad moving mechanism 26: rack and pinion (motion conversion mechanism) 28: cleaning liquid supply nozzle 30: liquid supply pump 32: cleaning liquid tank 34, 44, 62, 74: piping 36: over-circulation 37, 45, 65, 81, 86, 88, 106: on-off valve 38: fine cleaning processing unit 40: drying processing unit 42··washing nozzle (2 fluid ejection nozzle) 46: cleaning liquid/gas supply unit 48: droplet removing unit 50: drying blowing unit 52: wiping pad 54: pad supporting portion 55: beam, 56: wiping pad moving mechanism 58: slit 60: gas nozzle 64: drying gas supply portion 66: suction port 68 : Vacuum channel 70: Water mist trap 72: Vacuum device 76: Bubble discharge port 78: Drain pipe drain groove 82: Pump 28 201116340 84: New cleaning liquid supply source 90, 92: Waste liquid pipe 94: Washed Liquid regeneration system 96: main control unit 98: slit nozzle 98a: rear lower end portion 1〇〇: nozzle moving mechanism 102: photoresist supply unit 104: photoresist supply tube 110: tray ma: water mist qa: liquid Drop R: photoresist Solution liquid RJF, RM, RMi, RM2, RM4: photoresist liquid film RM', RM/, RM2', RM3, RM4': residual liquid film [RMi], [RM2], [RM3]: photoresist drying Film 51, Si], S2-1, S4-1: ejection step 52 ' S1.2 ' S2-2 ' S4-2: winding step 53 ' S1.3 ' S2-3 ' S4-3: separation step S4, S'5: rough washing step S5: fine washing step s6: droplet removing/drying blowing step s7, s4_8: drying blowing step
Sl-4、S2-4: 自然乾燥步驟 s4_6:粗洗淨/精洗淨步驟 S4-7:精洗淨/液滴除去/乾燥喷吹步驟 29Sl-4, S2-4: Natural drying step s4_6: rough washing/fine washing step S4-7: fine washing/droplet removal/drying blowing step 29