201023988 六、發明說明： 【發明所屬之技術領域】 本發明係與一種生物、醫療設備有關，尤指一種用於 生物晶片或醫療工具之乾式清洗及表面處理設備。 【先前技術】 Φ 參 按，長久以來困擾生物科學家使用生物晶片做實驗的 :門題疋Β日片㈤要事則的表面處理才能使用，但經過表 :理的晶片有衰減現象，使用壽命很短，不能保存，往 =:出貨至客戶時即產生衰退，而且在運送過程又有 =問題’令人困擾。如果改用在實驗室自製雖以 =/旦因設備成本會很高且生產時間也很長，所以不能 二前：：面一般使用於清理生物晶片表面上污染物的 法：“ 為濕式清理法；另外-種是乾式清洗 這是在市面上絕大多數人：：：來回多次浸泡沖洗晶片， Π: 2 有機溶劑及無機溶劑，甚至於強酸強 鹼命液，故很容易製造二 外洩，更有回你蔽在 人/可染、或疋在工作時產生毒物 廢棄化學溶劑等困擾。 度的地方，比如生物晶片：…㈣而在需要極度清潔 到達如此高的標準，時’濕式清理法就沒有辦法 了另外一種乾4洗;使::，非常困擾，所以就產生 種：一種是電毅處理法；=類的清洗法最常見的有兩 ,另一種是使用UV清洗》這兩種 3 201023988 清洗方法f常使用在半導體製程上或TFT玻璃基板的清洗 效果卓|但逆兩種方法都存在著設備儀器價格高昂、 設備複雜、操作困難等缺點，例如一台小型電聚處理機的 生產成本很高，以致售價往往超過三萬美金，而且還需要 真二叹備來支板，所以一直無法成為廉價儀器被一般實驗 室、檢驗所或醫院廣泛使用。而且最重要的是：這兩種清 洗法均有嚴重的清洗死角問題。因為在半導體製程上或 ΊΤΤ玻璃基板上清洗均為簡單的平面清洗，但醫療工具如 手術刀等須要多面清洗的物件，電漿清洗器及UV清洗機 均很難克服這個問題。尤其uv清洗法的w燈管在高溫 的腔體内工作，壽命減少，而且危險。以上兩種方式均存 在操作複雜、維護不易等缺點，使用者往往必須要受訓， 增加成本及浪費時間。 因此，吾人提出一種以化學蒸氣反應處理物體的表面 清洗裝置。如第-圖所示，其工作方式為由外部輸入不同 ❹的化學反應氣體進入一封閉腔體la内，再把待處理物（如 生物晶片）2a及反應氣體加熱至高溫，在封閉腔體内氣 體會和待處理物2a產生氣相化學沉積（chemical vap〇r deP〇Siti〇n，CVD)效應。其中，化學反應物（如：別仏狀、201023988 VI. Description of the Invention: [Technical Field] The present invention relates to a biological or medical device, and more particularly to a dry cleaning and surface treatment device for a biochip or a medical tool. [Prior Art] Φ Participation, has long plagued bio-scientists using bio-wafers for experiments: the door title 疋Β 片 (5) surface treatment can be used, but after the table: the wafer has attenuation, the service life is very Short, can't be saved, go to =: When the shipment to the customer, there is a recession, and there is a problem in the shipping process. If it is used in the laboratory, although the cost of the equipment will be high and the production time is very long, it can't be used: the surface is generally used to clean up the pollutants on the surface of the biochip: "For wet cleaning The other method is dry cleaning. This is the vast majority of people on the market::: rinsing and rinsing the wafer several times, Π: 2 organic solvents and inorganic solvents, even strong acid and alkali, so it is easy to manufacture Leaking, there are more troubles when you are covered in people/dyeable, or when you are working, producing poisonous chemical solvents. Degrees, such as biochips: ... (4) and when extreme cleaning is required to reach such high standards, 'wet There is no way to clean up the other method; so that::, very troublesome, so it produces species: one is the electric treatment method; = the most common cleaning method is two, the other is the use of UV cleaning These two 3 201023988 cleaning methods are often used in semiconductor processes or in the cleaning of TFT glass substrates. However, both methods have disadvantages such as high equipment cost, complicated equipment, and difficult operation. The production cost of a small electric polymerization machine is so high that the selling price often exceeds 30,000 US dollars, and it also needs a true second sigh to support the board, so it has not been widely used as a cheap instrument by a general laboratory, an inspection office or a hospital. And the most important thing is that both cleaning methods have serious problems with cleaning corners. Because cleaning on semiconductor processes or on glass substrates is simple flat cleaning, medical tools such as scalpels require multi-faceted cleaning. Plasma cleaners and UV cleaners are difficult to overcome this problem. In particular, the UV lamp of the uv cleaning method works in a high temperature chamber, and its life is reduced and dangerous. Both of the above methods have the disadvantages of complicated operation and difficult maintenance. Users often have to be trained to increase costs and waste time. Therefore, we propose a surface cleaning device that treats objects by chemical vapor reaction. As shown in the figure, it works by externally inputting different chemical gases. Entering a closed cavity la, and heating the object to be treated (such as biochip) 2a and the reaction gas to a high temperature, In the closed cavity, the gas and the material to be treated 2a produce a chemical vapor deposition (chemical vap〇r deP〇Siti〇n, CVD) effect. Among them, chemical reactants (such as:
Water)放在加熱瓶3a中，加熱瓶允底部放置一小型加熱器 30a，化學反應物加熱後產生蒸氣，透過一導管31&而將 蒸氣導入封閉腔體la中進行反應’即可對待處理物仏進行 活化作用。 惟’由於其係把液態的化學反應化合物加熱成氣態後 4 201023988 入封閉腔體la内；這是現有的cve^m〇cvd所使用 所、式y目為很多化學反應藥劑在常溫下都是呈液體狀， 一以必須加熱成蒸氣態才能參予化學反應。但這種方式有 鈐=失’=氣體在導管31a中會冷卻而液化，甚至阻塞導 這疋半導體產業碰到的一大難題。而現有解決之 ^雉導管31a上纏繞加熱片（圖略），使化學反應物一 在氣態下’但這也增加了製造成本，維護困難度也 相對增加。 有鏗於此’本發明人係為改善並解決上述之缺失，乃 古潛。研丸並配合學理之運用，終於提出一種設計合理且 有效改善上述缺失之本發明。 【發明内容】 本發明之主要目的，在於可提供—種用於生物晶片或 、、療工具之乾式清洗及表面處理設備，其主要係為解決前 _述之問題與缺失，避免被汽化後之化學反應物因冷卻而回 復為液態，因而有阻塞管路之虞等，且無增加該設備之製 造成本、維護容易度等問題。 為了達成上述之目的，本發明係提供一種用於生物晶 片或醬療工具之乾式清洗及表面處理設備，包括一可密閉 ^體 臭氡產生器、以及一流體輸送裝置；可密閉腔體 ^用以供如生物晶片或醫療工具等待處理物置放，並設有 一π改變其内部溫度之加熱器’且可密閉腔體上設有排氣 孔與進氣孔，進氣孔即與臭氧產生器相連通，以對可密閉 5 201023988 腔體供給臭氧’而流體輸送裝置則 並位於可密閉腔體外， 真充化學反應物， 送管.盆中，可 具有伸入可密閉腔體内之微量輸 I…、中τ崔、閉腔體内更設有 輸送裝置之微量輸送管則延伸至蒸發；二，體 化學反應物注入蒸發容器内。 。之相對處’以將 密閉透:所述流體!送裝置將化學反應物注入可 參 在了在閉腔體内始被加熱成為蒸氣 回復液態的問題，+:合田&作 不會有輪入過転中 的阻窠，= 復成液態而造成輸送管路 程中因需裝加㈣’來維持化學反應物在輸入過 氧體狀態而提供的加熱措施等。因此，可 ^解心往的問職缺失’料亦無增純 成本或維護容易度等問題。 製化 【實施方式】 技術^冑胃審查委員能更進—步瞭解本發明之特徵及 打内谷參閱以下有關本發明之詳細說明與附圖，秋 ::圖式僅提供參考與說明用’並非用來對本發明加以 請參閱第二圖，係為本發明之構造示意圖。本發明係 f共—㈣於生物3或醫療工具之乾式清洗及表面處理 汉備’包括-用以放置待處理物（如生物晶片或醫療工且 可朗腔體卜-純產生器2、以及—流體輸送 哀置3 ;其中： 6 201023988 該可密閉腔體1為放置待處理物4的地方，其上設有 一排氣孔11與一進氣孔12，其中之進氣孔12係與上述臭氧 產生器2相連通，以利臭氧（〇3)由該進入孔11進入、並 可由該排氣孔12排出，且該臭氧產生器2再外接一氧氣閥 20以提供氧氣（a)的輸入，並可控制輸入氧氣量的多寡 。因此，當氧氣閥2〇輸入的氧氣受激發而成臭氧，即可被 導引至可密閉腔體丨中，且為了加熱臭氧，在可密閉腔體 _ 1内係設有一加熱器1〇，俾可改變其内部溫度以對臭氧施 加熱量’用以提供高溫的臭氧流向待處理物4。 本發明主要目的，即是由一位於可密閉腔體1外部且 具有微量輸送管30之流體輸送裝置3，其内填充有所需之 化學反應物，而於該可密閉腔體丨内則設有一蒸發容器13 皁々》亥>;il體輸送裝置3之微量輸送管3〇係伸入可密閉腔 體1内，並延伸至蒸發容器13的相對處（如上方），以直 接透過該微量輸送管30將化學反應物注入可密閉腔體丨之 _蒸發容器13。而上述加熱器1〇也同時提供了反應所需的溫 度，故化學反應物於可密閉腔體丨的蒸發容器13中即被加 熱成為蒸氣源。所述化學反應物被加熱成的氣體，可以是 叙有機或無機氣體，且若反應的化學反應物不只一種， 則可視實際需求而增加所述流體輸送裝置3之數量。 而在本發明所舉之實施例中，該流體輸送裝置3係為 左射器，而所述微量輸送管3〇即為該注射器之針頭；另 外’該流體冑送裝置3 ,亦可為一可控制微量流體輸送之果 浦（圖略）。此外，該流體輸送裝置3亦可透過一微電腦 7 201023988 控制器31提供所需注入的化學反應物的劑量。另’若CVD "'的化予過程必須在低壓下進行，則可密閉腔體1便需 要有真工的密閉需求，並可視需要而外加真空泵浦。 曰疋以，藉由上述之構造組成，即可得到本發明用於生 曰曰片或邊療工具之乾式清洗及表面處理設備。 據此，在操作時，係先準備經預洗的生物晶片（即待 處，物4) ’再將其放入可密閉腔體丄中。這時可設定加 _ ”、、器10，工作溫度，並打開臭氧產生器2及加入外揍氧氣 ，使臭氧進入可密閉腔體1和高溫的生物晶片作氧化作用 ’俟設定的時間到達之後，即可停止臭氧進人可密閉腔體 1 ’並改變加熱H1G的工作溫度至化學反應物的反應溫度 ，再透過微電腦控制器31將填充於流體輸送裝置3内的= 學反應物，依所需之劑量注入可密閉腔體1内，以受可密 閉腔體1之加熱器10所設定的反應溫度而被加熱成為蒸氣 ’這時因在特定的化學氣體配方及溫度下，生物晶片的表 參面會被活化或依實際需求而變化，待時間滿足即可停機冷 卻後’取出該生物晶片。 7 因此’藉由本發明用於生物晶片或醫療工具之乾式、、主 洗及表面處理設備，透過所述流體輸送裝置3將化學反應 物注入可密閉腔體1内後，再透過蒸發容器13的承載而使 化學反應物能在可密閉腔體1内始被加熱成為蒸氣，如此 即不會有化學反應物於輸入過程中回復液態的問題，也不 會因為回復成液態而造成輸送管路的阻塞，更無須加裝加 熱片，來維持化學反應物在輸入過程中因需要維持氣體狀 8 201023988 態而提供的加熱措施等。同時亦無需增加製造成本或參塑 維護容易度等問題。 '/曰 綜上所述，本發明確可達到預期之使用目的，而解決 習知之缺失’又因極具新穎性及進步性，完全符合發明專 利申請要件’爰依專利法提出申請，敬請詳查並賜准本案 專利，以保障發明人之權利。 惟以上所述僅為本發明之較佳可行實施例，非因此即 拘，本㉝明之專利！&圍’故舉凡運用本發明說明書及圖式 各所為之等效技術、手段等變化，均同理皆包含於本發 明之範圍内，合予陳明。 【圖式簡單說明】 第圖係習知以化學蒸氣反應處理物體的表面清洗 裝置之構造示意圖。 第二圖係本發明之構造示意圖。 【主要元件符號說明】 <習知> 封閉腔體la 待處理物 2a 加熱瓶 3a 導管 加熱器 30a 31a 9 201023988 <本發明> 可密閉腔體 1 加熱器 10 排氣孔 11 進氣孔 12 蒸發容器13 臭氧產生器 2 氧氣閥 20 流體輸送裝置3 微量輸送管30 電腦控制器31 4 待處理物Water) is placed in the heating bottle 3a. The heating bottle allows a small heater 30a to be placed at the bottom, and the chemical reactant is heated to generate steam. The vapor is introduced into the closed cavity la through a conduit 31& and the reaction is processed.仏 is activated. However, because it heats the liquid chemical reaction compound into a gaseous state, 4 201023988 enters the closed cavity la; this is the existing cve^m〇cvd, and the formula is a lot of chemical reaction agents at room temperature. It is in the form of a liquid, and it must be heated to a vapor state to participate in a chemical reaction. However, this method has the problem that the gas will be cooled and liquefied in the conduit 31a, and even blocking the semiconductor industry. However, in the prior art, the heating piece (not shown) is wound around the conduit 31a, so that the chemical reactant is in a gaseous state, but this also increases the manufacturing cost, and the maintenance difficulty is relatively increased. The present inventors have made it possible to improve and solve the above-mentioned shortcomings. With the use of the research and the use of the theory, the invention finally proposes a invention which is reasonable in design and effective in improving the above-mentioned deficiency. SUMMARY OF THE INVENTION The main object of the present invention is to provide a dry cleaning and surface treatment equipment for a biochip or a therapeutic tool, which is mainly for solving the problems and defects described above, and avoiding being vaporized. The chemical reactant returns to a liquid state due to cooling, and thus there is a problem that the piping is blocked, and the like, and the manufacturing cost and the ease of maintenance of the apparatus are not increased. In order to achieve the above object, the present invention provides a dry cleaning and surface treatment apparatus for a biochip or a sauce treatment tool, comprising a sealable skunk generator, and a fluid delivery device; a closable cavity For a biochip or a medical tool to wait for the treatment to be placed, and provided with a heater that changes its internal temperature, and the ventilating cavity is provided with a venting hole and an air inlet hole, and the air inlet hole is connected to the ozone generator. Passing, to supply the ozone to the closable 5 201023988 cavity, and the fluid delivery device is located outside the closable cavity, and is filled with chemical reactants, sent to the tube, and has a micro-input I extending into the closable cavity. ..., the middle τ Cui, the micro-transport tube with the conveying device in the closed cavity extends to the evaporation; Second, the body chemical reactant is injected into the evaporation container. . The opposite of 'to be sealed: the fluid! delivery device to inject chemical reactants can be involved in the closed cavity is heated to become a vapor recovery liquid, +: Hetian & will not have a round The resistance in the enthalpy, = reconstitution of the liquid, resulting in the need to install (4) in the transport pipe to maintain the chemical reactants in the state of the input of the peroxidation state of the heating measures. Therefore, there is no such problem as the lack of cost or maintenance ease. [Embodiment] The technology of the stomach review committee can further understand the characteristics of the present invention and the inner valley. Referring to the following detailed description and drawings relating to the present invention, the autumn:: the drawings are only provided for reference and explanation. It is not intended to refer to the second drawing, but is a schematic view of the structure of the present invention. The present invention is a total of - (d) dry cleaning and surface treatment of the biological 3 or medical tools - including - for placing the object to be treated (such as a biochip or medical worker and a cavable body - pure generator 2, and - fluid transport mourning 3; wherein: 6 201023988 the closable cavity 1 is a place where the object to be treated 4 is placed, and is provided with a venting opening 11 and an air inlet opening 12, wherein the air inlet opening 12 is connected to the above The ozone generator 2 is in communication so that ozone (〇3) enters from the inlet hole 11 and can be discharged from the vent hole 12, and the ozone generator 2 is further connected to an oxygen valve 20 to provide an input of oxygen (a). And can control the amount of input oxygen. Therefore, when the oxygen input to the oxygen valve 2 is excited to form ozone, it can be guided into the closable cavity, and in order to heat the ozone, in the closable cavity _ 1 is provided with a heater 1〇, which can change its internal temperature to apply heat to the ozone' to provide high-temperature ozone to the object to be treated 4. The main object of the present invention is to be located outside the closable cavity 1 Fluid delivery device 3 with micro delivery tube 30 The desired chemical reactant is filled therein, and an evaporation container 13 is provided in the closable chamber, and the micro-transport tube 3 of the il body delivery device 3 extends into the closable chamber. In the body 1, and extending to the opposite portion (e.g., the upper portion) of the evaporation container 13, the chemical reactant is directly injected into the condensable chamber 13 through the micro-transport tube 30. The heater 1 is also simultaneously Providing the temperature required for the reaction, the chemical reactant is heated into a vapor source in the evaporation vessel 13 of the closable chamber. The gas to be heated by the chemical reactant may be an organic or inorganic gas, and If there is more than one type of chemical reactants, the amount of the fluid delivery device 3 can be increased according to actual needs. In the embodiment of the present invention, the fluid delivery device 3 is a left-handed device, and the trace amount The delivery tube 3 is the needle of the syringe; in addition, the fluid delivery device 3 can also be a fruit pump (not shown) capable of controlling the micro-fluid delivery. In addition, the fluid delivery device 3 can also be transmitted through a microcomputer 7 201023988 The controller 31 provides the dose of the chemical reactant to be injected. If the CVD " process must be performed at a low pressure, the closed cavity 1 needs to have a practical sealing requirement, and can be used as needed. The vacuum pump is additionally applied. According to the above-mentioned structural composition, the dry cleaning and surface treatment equipment for the sputum sheet or the edge treatment tool of the present invention can be obtained. Accordingly, in operation, the preparation is pre-prepared. The washed biochip (ie, waiting, object 4) 'replaces it in the closable cavity. At this time, you can set the _", the device 10, the operating temperature, and turn on the ozone generator 2 and add the external helium oxygen. To allow ozone to enter the closable cavity 1 and the high temperature biochip for oxidation. After the set time has elapsed, the ozone can be stopped into the human closable cavity 1' and the reaction temperature of the heated H1G is changed to the reaction of the chemical reactant. At the temperature, the controller reactant filled in the fluid transport device 3 is injected into the closable cavity 1 at a desired dose through the microcomputer controller 31 to be subjected to the reaction set by the heater 10 of the closable cavity 1. Temperature Heating into steam ‘ At this time, due to the specific chemical gas formulation and temperature, the surface of the biochip will be activated or changed according to actual needs. After the time is met, the biochip can be taken out after cooling. 7 Thus, by the dry, main wash and surface treatment apparatus for a biochip or medical tool of the present invention, a chemical reactant is injected into the closable cavity 1 through the fluid transport device 3, and then passed through the evaporation container 13. The carrier allows the chemical reactant to be heated into a vapor in the closable cavity 1, so that there is no problem that the chemical reactant returns to the liquid state during the input process, and the transfer line is not caused by the return to the liquid state. Blocking, there is no need to install a heating plate to maintain the heating measures provided by the chemical reactants during the input process due to the need to maintain the gas state 8 201023988 state. There is also no need to increase manufacturing costs or ease of maintenance. '/In summary, the present invention can achieve the intended purpose of use, and solve the lack of conventional 'because of the novelty and progress, fully meet the requirements of the invention patent application's application under the patent law, please Detailed investigation and grant of the patent in this case to protect the rights of the inventor. However, the above description is only a preferred embodiment of the present invention, and is not limited to the patent of the present invention. The equivalents of the techniques and means used in the specification and drawings of the present invention are all included in the scope of the present invention and are combined with Chen Ming. BRIEF DESCRIPTION OF THE DRAWINGS The figure is a schematic view showing the construction of a surface cleaning apparatus for treating an object by chemical vapor reaction. The second drawing is a schematic view of the construction of the present invention. [Explanation of main component symbols] <General knowledge> Closed cavity la Treated object 2a Heating bottle 3a Conduit heater 30a 31a 9 201023988 <The present invention> Sealable cavity 1 Heater 10 Exhaust hole 11 Intake Hole 12 Evaporation vessel 13 Ozone generator 2 Oxygen valve 20 Fluid delivery device 3 Micro delivery tube 30 Computer controller 31 4 Object to be treated