TW200952568A - Method of cooling a microwave plasma and system for selective destroying chemical molecules using this method - Google Patents
Method of cooling a microwave plasma and system for selective destroying chemical molecules using this method Download PDFInfo
- Publication number
- TW200952568A TW200952568A TW098117230A TW98117230A TW200952568A TW 200952568 A TW200952568 A TW 200952568A TW 098117230 A TW098117230 A TW 098117230A TW 98117230 A TW98117230 A TW 98117230A TW 200952568 A TW200952568 A TW 200952568A
- Authority
- TW
- Taiwan
- Prior art keywords
- fluid
- tube
- mixture
- gas
- dielectric tube
- Prior art date
Links
- 238000001816 cooling Methods 0.000 title claims abstract description 15
- 238000000034 method Methods 0.000 title claims abstract description 14
- 239000000126 substance Substances 0.000 title claims abstract description 9
- 239000012530 fluid Substances 0.000 claims abstract description 76
- 239000000203 mixture Substances 0.000 claims abstract description 35
- 239000002826 coolant Substances 0.000 claims abstract description 22
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 claims abstract description 14
- 239000007788 liquid Substances 0.000 claims abstract description 10
- 239000004711 α-olefin Substances 0.000 claims abstract description 9
- 230000008878 coupling Effects 0.000 claims abstract description 8
- 238000010168 coupling process Methods 0.000 claims abstract description 8
- 238000005859 coupling reaction Methods 0.000 claims abstract description 8
- 238000002835 absorbance Methods 0.000 claims abstract description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 3
- 238000009832 plasma treatment Methods 0.000 claims abstract description 3
- 239000007789 gas Substances 0.000 claims description 65
- 238000002347 injection Methods 0.000 claims description 19
- 239000007924 injection Substances 0.000 claims description 19
- 230000000295 complement effect Effects 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 3
- 150000001336 alkenes Chemical class 0.000 claims description 2
- 238000004821 distillation Methods 0.000 claims 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 16
- 239000003921 oil Substances 0.000 description 15
- 239000007787 solid Substances 0.000 description 10
- 229910052757 nitrogen Inorganic materials 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 239000004020 conductor Substances 0.000 description 4
- 239000013529 heat transfer fluid Substances 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000002243 precursor Substances 0.000 description 3
- HFDVRLIODXPAHB-UHFFFAOYSA-N 1-tetradecene Chemical compound CCCCCCCCCCCCC=C HFDVRLIODXPAHB-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 238000005108 dry cleaning Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- 239000004575 stone Substances 0.000 description 2
- 231100000331 toxic Toxicity 0.000 description 2
- 230000002588 toxic effect Effects 0.000 description 2
- 231100000419 toxicity Toxicity 0.000 description 2
- 230000001988 toxicity Effects 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 230000009172 bursting Effects 0.000 description 1
- 238000005234 chemical deposition Methods 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 239000004205 dimethyl polysiloxane Substances 0.000 description 1
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 229920001973 fluoroelastomer Polymers 0.000 description 1
- 229920002313 fluoropolymer Polymers 0.000 description 1
- 239000004811 fluoropolymer Substances 0.000 description 1
- 238000002309 gasification Methods 0.000 description 1
- 239000005431 greenhouse gas Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- CXQXSVUQTKDNFP-UHFFFAOYSA-N octamethyltrisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C CXQXSVUQTKDNFP-UHFFFAOYSA-N 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000005289 physical deposition Methods 0.000 description 1
- 238000004987 plasma desorption mass spectroscopy Methods 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 230000035922 thirst Effects 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/461—Microwave discharges
- H05H1/463—Microwave discharges using antennas or applicators
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
- H05H1/2443—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/461—Microwave discharges
- H05H1/4622—Microwave discharges using waveguides
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Electromagnetism (AREA)
- Fluid Mechanics (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Treating Waste Gases (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP08305206A EP2131633A1 (fr) | 2008-05-28 | 2008-05-28 | Procédé de refroidissement d'un plasma micro-onde et système de destruction sélective de molécules chimiques utilisant ce procédé |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW200952568A true TW200952568A (en) | 2009-12-16 |
Family
ID=39811616
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW098117230A TW200952568A (en) | 2008-05-28 | 2009-05-25 | Method of cooling a microwave plasma and system for selective destroying chemical molecules using this method |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20110073282A1 (fr) |
| EP (2) | EP2131633A1 (fr) |
| JP (1) | JP2011522691A (fr) |
| KR (1) | KR20110021816A (fr) |
| TW (1) | TW200952568A (fr) |
| WO (1) | WO2009144110A1 (fr) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101720987B1 (ko) | 2015-04-28 | 2017-04-10 | 주식회사 글로벌스탠다드테크놀로지 | 난분해성 유해가스의 처리장치 및 방법 |
| EP3309815B1 (fr) * | 2016-10-12 | 2019-03-20 | Meyer Burger (Germany) AG | Dispositif de traitement au plasma comprenant deux sources de plasma excitées par micro-ondes couplées ensemble et procédé de fonctionnement d'un tel dispositif de traitement au plasma |
| EP3508552A1 (fr) | 2018-01-05 | 2019-07-10 | Castrol Limited | Matériau à changement de phase pour fluide d'échange thermique/liquide de refroidissement |
| GB201811003D0 (en) | 2018-07-04 | 2018-08-15 | Bp Plc | Multiple cooling circuit systems and methods for using them |
| GB201905733D0 (en) | 2019-04-24 | 2019-06-05 | Bp Plc | Dielectric thermal managment fluids and methods for using them |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SE434676B (sv) * | 1981-10-22 | 1984-08-06 | Skf Steel Eng Ab | Sett och anordning for uppvermning av for industriella endamal avsedd processluft |
| US4828703A (en) * | 1983-12-28 | 1989-05-09 | Union Carbide Corporation | Method for replacing PCB-containing coolants in electrical induction apparatus with substantially PCB-free dielectric coolants |
| CA1261735A (fr) * | 1984-04-20 | 1989-09-26 | William J. Klaila | Methode et dispositif de separation de fractions d'hydrocarbures, pour faciliter l'extraction et le raffinage des hydrocarbures liquides, pour isoler les reservoirs de stockage, et pour le decrassage des citernes de stockage et des pipelines |
| JPH0693397B2 (ja) * | 1987-12-29 | 1994-11-16 | 日本高周波株式会社 | 熱プラズマ発生装置 |
| JPH03214600A (ja) * | 1990-01-17 | 1991-09-19 | Nippon Koshuha Kk | マイクロ波熱プラズマ反応装置 |
| JPH0562793A (ja) * | 1991-08-30 | 1993-03-12 | Hitachi Ltd | プラズマヒータ |
| US5159527A (en) * | 1991-12-05 | 1992-10-27 | Minnesota Mining And Manufacturing Company | Dielectric liquids |
| JP3390788B2 (ja) * | 1993-09-13 | 2003-03-31 | 独立行政法人産業技術総合研究所 | 高周波誘導熱プラズマ発生方法および有機ハロゲン化合物の分解方法 |
| FR2751565B1 (fr) * | 1996-07-26 | 1998-09-04 | Air Liquide | Procede et installation de traitement de gaz perfluores et hydrofluorocarbones en vue de leur destruction |
| DE69733660T2 (de) * | 1996-11-04 | 2006-05-18 | Materials Modification, Inc. | Mikrowellenplasma chemischen synthese von ultrafeinen pulvern |
| FR2762748B1 (fr) * | 1997-04-25 | 1999-06-11 | Air Liquide | Dispositif d'excitation d'un gaz par plasma d'onde de surface |
| JP2000119671A (ja) * | 1998-10-20 | 2000-04-25 | Matsushita Refrig Co Ltd | 冷凍システム |
| FR2787677B1 (fr) * | 1998-12-22 | 2001-01-19 | Air Liquide | Element de canalisation pour dispositif de traitement de gaz et dispositif incorporant un tel element de canalisation |
| JP4035916B2 (ja) * | 1999-03-30 | 2008-01-23 | 松下電工株式会社 | プラズマ処理装置及びプラズマ処理方法 |
| JP2001025658A (ja) * | 1999-07-15 | 2001-01-30 | Mitsubishi Heavy Ind Ltd | プラズマ着火方法及び有機ハロゲン化合物の分解方法 |
| JP4075237B2 (ja) * | 1999-08-17 | 2008-04-16 | 松下電工株式会社 | プラズマ処理システム及びプラズマ処理方法 |
| EP1535303A1 (fr) * | 2002-08-30 | 2005-06-01 | Axcelis Technologies Inc. | Coiffe d'extremite d'un tube a gaz destinee a un generateur de plasma micro-ondes |
| JP2004313998A (ja) * | 2003-04-18 | 2004-11-11 | Ebara Corp | ハロゲン化物の分解装置 |
| JP3621946B1 (ja) * | 2004-02-27 | 2005-02-23 | 三菱重工業株式会社 | 有機ハロゲン化合物放電分解装置およびその方法 |
| JP2008506516A (ja) * | 2004-07-13 | 2008-03-06 | レール・リキード−ソシエテ・アノニム・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード | ガス排出物の大気圧プラズマ処理 |
| JP2006102717A (ja) * | 2004-10-08 | 2006-04-20 | Taiyo Nippon Sanso Corp | 有害成分含有ガスの処理方法および処理装置 |
-
2008
- 2008-05-28 EP EP08305206A patent/EP2131633A1/fr not_active Withdrawn
-
2009
- 2009-04-30 WO PCT/EP2009/055264 patent/WO2009144110A1/fr not_active Ceased
- 2009-04-30 KR KR1020107026506A patent/KR20110021816A/ko not_active Withdrawn
- 2009-04-30 EP EP09753765A patent/EP2286641A1/fr not_active Withdrawn
- 2009-04-30 US US12/994,695 patent/US20110073282A1/en not_active Abandoned
- 2009-04-30 JP JP2011510926A patent/JP2011522691A/ja active Pending
- 2009-05-25 TW TW098117230A patent/TW200952568A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| EP2131633A1 (fr) | 2009-12-09 |
| US20110073282A1 (en) | 2011-03-31 |
| KR20110021816A (ko) | 2011-03-04 |
| WO2009144110A1 (fr) | 2009-12-03 |
| JP2011522691A (ja) | 2011-08-04 |
| EP2286641A1 (fr) | 2011-02-23 |
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