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TW200942997A - Method for monitoring photolithography process and monitor mark - Google Patents

Method for monitoring photolithography process and monitor mark

Info

Publication number
TW200942997A
TW200942997A TW97112185A TW97112185A TW200942997A TW 200942997 A TW200942997 A TW 200942997A TW 97112185 A TW97112185 A TW 97112185A TW 97112185 A TW97112185 A TW 97112185A TW 200942997 A TW200942997 A TW 200942997A
Authority
TW
Taiwan
Prior art keywords
photolithography process
monitor
monitor mark
monitoring
focus
Prior art date
Application number
TW97112185A
Other languages
Chinese (zh)
Other versions
TWI432915B (en
Inventor
Chien-Min Wu
Chien-Chih Chen
Original Assignee
Powerchip Semiconductor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Powerchip Semiconductor Corp filed Critical Powerchip Semiconductor Corp
Priority to TW97112185A priority Critical patent/TWI432915B/en
Publication of TW200942997A publication Critical patent/TW200942997A/en
Application granted granted Critical
Publication of TWI432915B publication Critical patent/TWI432915B/en

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

A method for monitoring photolithography process includes providing a monitor mark having high sensitivity of the focus of the photolithography process, transferring the monitor mark together with product patterns through the photolithography process, and measuring the deviation of the size of the monitor mart to real-time monitor the focus of the photolithography process.
TW97112185A 2008-04-03 2008-04-03 Method for monitoring photolithography process and monitor mark TWI432915B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW97112185A TWI432915B (en) 2008-04-03 2008-04-03 Method for monitoring photolithography process and monitor mark

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW97112185A TWI432915B (en) 2008-04-03 2008-04-03 Method for monitoring photolithography process and monitor mark

Publications (2)

Publication Number Publication Date
TW200942997A true TW200942997A (en) 2009-10-16
TWI432915B TWI432915B (en) 2014-04-01

Family

ID=44868884

Family Applications (1)

Application Number Title Priority Date Filing Date
TW97112185A TWI432915B (en) 2008-04-03 2008-04-03 Method for monitoring photolithography process and monitor mark

Country Status (1)

Country Link
TW (1) TWI432915B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI470715B (en) * 2010-11-30 2015-01-21 Asml Netherlands Bv Method of operating patterned device and lithography device
TWI571710B (en) * 2014-12-30 2017-02-21 力晶科技股份有限公司 Method and system for monitoring module actuation of alignment light source device in exposure apparatus

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102019100154B4 (en) 2018-09-28 2020-11-05 Taiwan Semiconductor Manufacturing Co. Ltd. Method for performing a lithography process and lithography process monitoring method
US10962892B2 (en) 2018-09-28 2021-03-30 Taiwan Semiconductor Manufacturing Co., Ltd. Lithography process monitoring method

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI470715B (en) * 2010-11-30 2015-01-21 Asml Netherlands Bv Method of operating patterned device and lithography device
US9417533B2 (en) 2010-11-30 2016-08-16 Asml Netherlands B.V. Method of operating a patterning device and lithographic apparatus
US9568833B2 (en) 2010-11-30 2017-02-14 Asml Netherlands B.V. Method of operating a patterning device and lithographic apparatus
US9958788B2 (en) 2010-11-30 2018-05-01 Asml Netherlands B.V. Method of operating a patterning device and lithographic apparatus
TWI571710B (en) * 2014-12-30 2017-02-21 力晶科技股份有限公司 Method and system for monitoring module actuation of alignment light source device in exposure apparatus

Also Published As

Publication number Publication date
TWI432915B (en) 2014-04-01

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