TW200949185A - Thermal interconnect and integrated interface systems, methods of production and uses thereof - Google Patents
Thermal interconnect and integrated interface systems, methods of production and uses thereof Download PDFInfo
- Publication number
- TW200949185A TW200949185A TW098108094A TW98108094A TW200949185A TW 200949185 A TW200949185 A TW 200949185A TW 098108094 A TW098108094 A TW 098108094A TW 98108094 A TW98108094 A TW 98108094A TW 200949185 A TW200949185 A TW 200949185A
- Authority
- TW
- Taiwan
- Prior art keywords
- heat sink
- layer
- sink assembly
- coupling
- thermally conductive
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
- H01L23/3737—Organic materials with or without a thermoconductive filler
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/42—Fillings or auxiliary members in containers or encapsulations selected or arranged to facilitate heating or cooling
- H01L23/427—Cooling by change of state, e.g. use of heat pipes
- H01L23/4275—Cooling by change of state, e.g. use of heat pipes by melting or evaporation of solids
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/42—Fillings or auxiliary members in containers or encapsulations selected or arranged to facilitate heating or cooling
- H01L23/433—Auxiliary members in containers characterised by their shape, e.g. pistons
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/544—Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
- H01L23/3731—Ceramic materials or glass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
- H01L23/3732—Diamonds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
- H01L23/3735—Laminates or multilayers, e.g. direct bond copper ceramic substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
- H01L23/3736—Metallic materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/095—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00 with a principal constituent of the material being a combination of two or more materials provided in the groups H01L2924/013 - H01L2924/0715
- H01L2924/097—Glass-ceramics, e.g. devitrified glass
- H01L2924/09701—Low temperature co-fired ceramic [LTCC]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/4935—Heat exchanger or boiler making
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Materials Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
- Cooling Or The Like Of Electrical Apparatus (AREA)
- Laminated Bodies (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US3639708P | 2008-03-13 | 2008-03-13 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW200949185A true TW200949185A (en) | 2009-12-01 |
Family
ID=41065764
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW098108094A TW200949185A (en) | 2008-03-13 | 2009-03-12 | Thermal interconnect and integrated interface systems, methods of production and uses thereof |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US20100319898A1 (fr) |
| TW (1) | TW200949185A (fr) |
| WO (1) | WO2009114372A2 (fr) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI875774B (zh) * | 2019-07-22 | 2025-03-11 | 美商雷神公司 | 選擇性順應型化學氣相沉積(cvd)鑽石或其他散熱件 |
Families Citing this family (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20100038066A1 (en) * | 2008-08-14 | 2010-02-18 | Tai-Her Yang | Thermal conducting principle and device for prestressed clamping type multi-layered structure |
| US20100129648A1 (en) * | 2008-11-26 | 2010-05-27 | Jun Xu | Electronic packaging and heat sink bonding enhancements, methods of production and uses thereof |
| EP2597041A1 (fr) * | 2011-11-22 | 2013-05-29 | Active Space Technologies GmbH | Sangle thermique |
| US9390998B2 (en) * | 2012-02-17 | 2016-07-12 | Invensas Corporation | Heat spreading substrate |
| DE102012104593B4 (de) * | 2012-05-29 | 2016-02-25 | Sma Solar Technology Ag | Halbleiterbauelement |
| US9190341B2 (en) | 2012-06-05 | 2015-11-17 | Texas Instruments Incorporated | Lidded integrated circuit package |
| EP2754524B1 (fr) | 2013-01-15 | 2015-11-25 | Corning Laser Technologies GmbH | Procédé et dispositif destinés au traitement basé sur laser de substrats plats, galette ou élément en verre, utilisant un faisceau laser en ligne |
| EP2781296B1 (fr) | 2013-03-21 | 2020-10-21 | Corning Laser Technologies GmbH | Dispositif et procédé de découpe de contours à partir de substrats plats au moyen d'un laser |
| DE202013103599U1 (de) * | 2013-08-09 | 2014-11-13 | Trafomodern Transformatorengesellschaft M.B.H. | Elektrisches Bauteil |
| US11556039B2 (en) | 2013-12-17 | 2023-01-17 | Corning Incorporated | Electrochromic coated glass articles and methods for laser processing the same |
| US9517963B2 (en) | 2013-12-17 | 2016-12-13 | Corning Incorporated | Method for rapid laser drilling of holes in glass and products made therefrom |
| CN106687419A (zh) | 2014-07-08 | 2017-05-17 | 康宁股份有限公司 | 用于激光处理材料的方法和设备 |
| KR20170028943A (ko) | 2014-07-14 | 2017-03-14 | 코닝 인코포레이티드 | 조정가능한 레이저 빔 촛점 라인을 사용하여 투명한 재료를 처리하는 방법 및 시스템 |
| US10695872B2 (en) * | 2015-03-11 | 2020-06-30 | Lockheed Martin Corporation | Heat spreaders fabricated from metal nanoparticles |
| JP7292006B2 (ja) | 2015-03-24 | 2023-06-16 | コーニング インコーポレイテッド | ディスプレイガラス組成物のレーザ切断及び加工 |
| US11186060B2 (en) | 2015-07-10 | 2021-11-30 | Corning Incorporated | Methods of continuous fabrication of holes in flexible substrate sheets and products relating to the same |
| US10730783B2 (en) | 2016-09-30 | 2020-08-04 | Corning Incorporated | Apparatuses and methods for laser processing transparent workpieces using non-axisymmetric beam spots |
| US11542190B2 (en) | 2016-10-24 | 2023-01-03 | Corning Incorporated | Substrate processing station for laser-based machining of sheet-like glass substrates |
| DE102018115509A1 (de) * | 2018-06-27 | 2020-01-02 | Infineon Technologies Ag | Wärmedissipationsvorrichtung, Halbleiterpackagingsystem und Verfahren zum Herstellen derselben |
| US11791237B2 (en) | 2018-06-27 | 2023-10-17 | Intel Corporation | Microelectronic assemblies including a thermal interface material |
| US12166004B2 (en) | 2019-05-08 | 2024-12-10 | Intel Corporation | Solder thermal interface material (STIM) with dopant |
| US12272614B2 (en) | 2019-05-28 | 2025-04-08 | Intel Corporation | Integrated circuit packages with solder thermal interface materials with embedded particles |
| US11682605B2 (en) | 2019-05-28 | 2023-06-20 | Intel Corporation | Integrated circuit packages with asymmetric adhesion material regions |
| US11469154B2 (en) * | 2021-01-17 | 2022-10-11 | Amulaire Thermal Technology, Inc. | IGBT module with heat dissipation structure having specific layer thickness ratio |
| US11997812B2 (en) | 2022-10-12 | 2024-05-28 | Lunar Energy, Inc. | Cover for sealing a power module |
| WO2024081005A1 (fr) * | 2022-10-12 | 2024-04-18 | Lunar Energy, Inc. | Portique de gestion thermique |
| US11889662B1 (en) | 2022-10-12 | 2024-01-30 | Lunar Energy, Inc. | Thermal interface sandwich |
| US11849536B1 (en) | 2022-10-12 | 2023-12-19 | Lunar Energy, Inc. | Gantry for thermal management |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060040112A1 (en) * | 2002-07-15 | 2006-02-23 | Nancy Dean | Thermal interconnect and interface systems, methods of production and uses thereof |
| CN1777990A (zh) * | 2003-02-19 | 2006-05-24 | 霍尼韦尔国际公司 | 热互连系统、其制备方法及其应用 |
-
2009
- 2009-03-05 WO PCT/US2009/036113 patent/WO2009114372A2/fr not_active Ceased
- 2009-03-05 US US12/666,004 patent/US20100319898A1/en not_active Abandoned
- 2009-03-12 TW TW098108094A patent/TW200949185A/zh unknown
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI875774B (zh) * | 2019-07-22 | 2025-03-11 | 美商雷神公司 | 選擇性順應型化學氣相沉積(cvd)鑽石或其他散熱件 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2009114372A3 (fr) | 2009-12-03 |
| WO2009114372A2 (fr) | 2009-09-17 |
| US20100319898A1 (en) | 2010-12-23 |
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