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TW200946560A - Multifunctional nitrones in non-radical systems - Google Patents

Multifunctional nitrones in non-radical systems Download PDF

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Publication number
TW200946560A
TW200946560A TW097120662A TW97120662A TW200946560A TW 200946560 A TW200946560 A TW 200946560A TW 097120662 A TW097120662 A TW 097120662A TW 97120662 A TW97120662 A TW 97120662A TW 200946560 A TW200946560 A TW 200946560A
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Taiwan
Prior art keywords
nitrone
group
epoxide
acrylate
curable
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TW097120662A
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Chinese (zh)
Inventor
Osama M Musa
Laxmisha M Sridhar
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Henkel Corp
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Publication of TW200946560A publication Critical patent/TW200946560A/en

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/32Compounds containing nitrogen bound to oxygen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/0008Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

This invention is a curable composition comprising a multifunctional nitrone and another compound, such as, acrylate, maleimide, cyanate ester, or epoxy. The nitrone undergoes crosslinking with the other compound through cycloaddition or by nitrone dipole mediated ring opening, without the sensitivity to oxygen suffered by free radical curing.

Description

200946560 九、發明說明: 【發明所屬之技術領城】 本發明係有關使用石肖酮於固化非_自由基居間的有機化 學系統’特別是於固化黏著劑、塗料、及封農劑用配方。在 5 ❹ 10 15 Ο -項具體實例中’黏著劑、塗料、及封_用於電子應用 中Ο 【先前技術】 許多用於目前黏著劑、塗料、及封|劑之固化化學涉及 經自由基引發。自由基m化在m化之前或期間具有氧敏感性 ίί:::後具有顯著收縮之不利條件,產生避免此等問題 【發明内容】 =明為-種可固化組成物,包括—種多官能硝嗣及另 =明書及申請專利範圍來說,化合物被認 為包含早體、絲物、及聚合物。該化合 =稀二醯㈣、氰義、轉氧㈣。_環加^用或 偶極所引發的開環,硝氣經歷與其它化合物交聯,而 未有!自由基固化或交聯遭受之對氧敏感性。 硝_化學在包括硝酮及〜或客 組成物中可提供廣大範圍之固化物之可固化 „ 1匕/显度0固化溫度將取決於牿 裸曰i接產業内’較低的固化溫度有用於例如 接於基底_裸*)、底 裝)、譬面介描你乍在電子封裝件内軟焊電連接之封 '、(在低於固化溫度的溫度B階化學);較 20 200946560 高的固化溫度有用於例如使用可固化組成物取代金屬軟焊 料之應用。 石肖酮為經由搭與炫•基經胺間室溫凝縮反應的一個容易 步驟所製備之1,3-偶極種,如此處描述:200946560 IX. INSTRUCTIONS: [Technology Leading to the Invention] The present invention relates to an organic chemical system for using a schizophyllin to cure a non-radical intermediate, particularly for curing adhesives, coatings, and sealants. In the 5 ❹ 10 15 Ο - item specific examples - Adhesives, coatings, and seals _ used in electronic applications 先前 [Prior Art] Many curing chemistries used in current adhesives, coatings, and sealants involve free radicals. Triggered. The free radical m is oxygen-sensitive before or during m- ing, ίί::: has the disadvantage of significant shrinkage, resulting in avoiding such problems. [Inventive content] = Ming-a kind of curable composition, including - polyfunctional Compounds are considered to contain pre-forms, filaments, and polymers in the context of nitroxide and others. The compound = diterpene (four), cyanide, and oxygen (four). _ Ring plus ^ or open-loop induced by dipole, the gas experienced cross-linking with other compounds, but not! Free radical curing or crosslinking is subject to oxygen sensitivity. Nitrogen _ chemistry can provide a wide range of cured materials in nitrocellulose and ~ or guest compositions. 匕 1 匕 / visibility 0 curing temperature will depend on the 牿 naked 曰 i industry inside the 'lower curing temperature useful (for example, connected to the substrate _ bare *), the bottom surface), the surface of your package in the electronic package soldering electrical connection ', (at the temperature below the curing temperature B-stage chemistry); higher than 20 200946560 The curing temperature is used, for example, in the use of a curable composition in place of a metal soft solder. The stone ketone is a 1,3-dipole prepared by an easy step of the room temperature condensation reaction between the amine and the amine. As described here:

++

❹ 硝酮已知以親偶極(diP〇lar〇philes ) ( 2 7Γ -配偶體 (partner))參與1,3-偶極環加成反應而產生環加成物。環 加成反應對氧及濕氣不敏感且產生稱為異畤唑啶之五員環: 及/或 1,3偶極 異哼唑啶 硝酮亦可藉由開環引發雜環單體(例如環氧化物)之聚 ❿Nitronone is known to participate in the 1,3-dipolar cycloaddition reaction with diP〇lar〇philes (2 7Γ-partner) to produce a cycloadduct. The cycloaddition reaction is insensitive to oxygen and moisture and produces a five-membered ring called isoxazolidine: and/or 1,3 diisoisoxazole pyridinone can also initiate heterocyclic monomers by ring opening ( For example, epoxide

聚合物 合作用:r〇e^ © :>〇 錯合物係由多官能硝酮與多官能2 π -配偶體反應而製 備。該反應之實例展示於此,其中雙順丁烯二醯亞胺與二官 能硝酮反應。反應係於75。(:下二甲基甲醯胺(DMF)中進行: 6 15 200946560Polymer Co-use: r〇e^ © :>〇 The complex is prepared by reacting a polyfunctional nitrone with a polyfunctional 2 π-coupling. An example of this reaction is shown herein in which bis-sandimide is reacted with a difunctional nitrone. The reaction is at 75. (: Lower dimethylformamide (DMF): 6 15 200946560

❹ 5 10 適合與硝酮固化之示範化合物包含,但不限於,含有與 硝酮基有反應性官能度之化合物’例如環氧化物、丙婦酸醋 (其包含甲基丙烯酸酯)、順丁烯二醯亞胺(其包含多官能 化合物,如雙-及參-順丁烯二醯亞胺)、氰酸酯、及乙烯系 (如乙婦鍵及本乙稀)。此等官能度可被附加於各式各樣化 合物,例如聚酯、聚(丁二烯)、矽化烯烴、矽酮樹脂、矽氧 烷、及其它如此材料。在一項具體實例中,化合物係選自由 環氧化物、丙烯酸酯、順丁烯二醯亞胺、及氰酸酯組成之組 群。 與硝酮用於組成物之示範固體芳香族雙順丁稀二醯亞❹ 5 10 Exemplary compounds suitable for curing with nitrones include, but are not limited to, compounds containing reactive functionalities with nitroketones such as epoxides, acetoacetic acid vinegar (which contains methacrylate), cis-butyl An enediminoimine (which contains a polyfunctional compound such as bis- and cis-m-butyleneimine), a cyanate ester, and a vinyl group (such as a bismuth bond and a ethene). Such functionality can be added to a wide variety of compounds such as polyesters, poly(butadiene), deuterated olefins, anthrone resins, oxanes, and other such materials. In one embodiment, the compound is selected from the group consisting of epoxides, acrylates, maleimide, and cyanate esters. Demonstration of solid aromatic bis-bis-butyl succinimide with nitrone

胺(BMI)粉末為具有結構 者,其中X為芳香族 基。具有此等X橋聯基之雙順丁烯二醯亞胺樹脂為商業可得 且可從例如Sartomer (美國)及HOS-Technic GmbH (奥地 利)獲得。 與確酮用於組成物之額外示範順丁婦二酿亞胺包含具 7 15 200946560The amine (BMI) powder is of a structure wherein X is an aromatic group. Bis-butylene iminoimide resins having such X bridged groups are commercially available and are available, for example, from Sartomer (USA) and HOS-Technic GmbH (Austria). An additional demonstration of the use of a ketone with a ketone in the composition of a difenin containing 7 15 200946560

有一般結構、0人者,其中η為1至3且X1為脂族或芳香 族基。X1實體包含聚(丁二烯)、聚(碳酸酯)、聚(胺甲酸酯)、 聚(醚)、聚(酯)、簡單烴、及含有官能度如羰基、羧基、醯 胺、胺甲酸酯、脲、或醚之簡單烴。此等類型之化合物為商 業可得且可從例如 National Starch and Chemical Company 及 Dainippon Ink and Chemical, Inc 獲得。There is a general structure, 0 person, wherein η is 1 to 3 and X1 is an aliphatic or aromatic group. The X1 entity comprises poly(butadiene), poly(carbonate), poly(urethane), poly(ether), poly(ester), simple hydrocarbon, and contains functionalities such as carbonyl, carboxyl, guanamine, amine A simple hydrocarbon of a formate, urea, or ether. Compounds of this type are commercially available and are available, for example, from National Starch and Chemical Company and Dainippon Ink and Chemical, Inc.

特定較好的順丁烯二醯亞胺包含Particularly preferred maleimide containing

(c35)-〇- 其中C36表示36個碳原子之 線型或分支鏈(具有或沒有環狀部分)(c35)-〇- wherein C36 represents a linear or branched chain of 36 carbon atoms (with or without a cyclic moiety)

10 ❹ 8 20094656010 ❹ 8 200946560

與發明化合物用於配方之適合丙烯酸酯包含具有一护 - 者’其中n為1至6,R1為-H或-CH3,且χ2 為芳香族或脂族基《示範X2基包含聚(丁二烯)、聚(碳酸酯)、 5 聚(胺曱酸酯)、聚(醚)、聚(酯)、簡單烴、及含有官能度如羰 基、羧基、醯胺、胺甲酸酯、脲、或醚之簡單烴。商業可: 之材料包含(甲基)丙烯酸丁酯、(甲基)丙烯酸異丁酯、(甲基) 丙烯酸2-乙基己酯、(f基)丙烯酸異癸酯、(甲基)丙烯酸正 月桂酯、(曱基)丙烯酸烷酯、(甲基)丙烯酸十三酯、(甲基) 丙烯酸正十八酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸四氫 糠酯、乙基(甲基)丙烯酸2-笨氧酯、(甲基)丙烯酸異莰酯、 丁二醇二(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙埽酸 醋、1,9-壬二醇二(甲基)丙稀酸酯、(甲基)丙烯酸全氟辛基乙 酯、I,10-癸二醇二(甲基)丙烯酸酯、壬基酚聚丙氧基酯(甲基) 15 丙烯酸酯、及聚戊氧基酯丙烯酸四氫糠酯’得自於Ky0eisha Chemical Co.,LTD ;聚丁二烯胺甲酸酯二甲基丙埽酸醋 9 200946560 (CN302,NTX6513)及聚丁二烯二曱基丙烯酸酯(CN301, NTX6039,PRO6270)得自於 Sartomer Company,Inc ;聚石炭 酸酯胺曱酸酯二丙烯酸酯(ArtResin UN9200A )得自於Suitable acrylates for use in formulating with the inventive compounds include those having the same 'wherein n is 1 to 6, R1 is -H or -CH3, and χ2 is an aromatic or aliphatic group." Exemplary X2 group contains poly(butyl) Alkene, poly(carbonate), 5-poly(amine phthalate), poly(ether), poly(ester), simple hydrocarbon, and containing functional groups such as carbonyl, carboxyl, decylamine, carbamate, urea, Or a simple hydrocarbon of ether. Commercially available: The material comprises butyl (meth)acrylate, isobutyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, isodecyl (f-)acrylate, and (M)acrylic acid. Lauryl ester, alkyl (meth) acrylate, tridecyl (meth) acrylate, n-octadecyl (meth) acrylate, cyclohexyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, B 2-Hydroxy ester of (meth)acrylic acid, isodecyl (meth)acrylate, butanediol di(meth)acrylate, 1,6-hexanediol di(methyl)propionic acid vinegar, 1 , 9-nonanediol di(meth) acrylate, perfluorooctyl (meth) acrylate, I, 10- decane di(meth) acrylate, nonyl phenol polypropoxylate (Methyl) 15 acrylate, and polypentyl ethoxylate tetrahydrofurfuryl acrylate 'from Ky0eisha Chemical Co., LTD; polybutadienyl methacrylate dimethyl acrylate vinegar 9 200946560 (CN302, NTX6513) and polybutadiene dimercapto acrylate (CN301, NTX6039, PRO6270) from Sartomer Company, Inc; polycarbonate amine phthalate dipropylene Oleate (ArtResin UN9200A) is derived from

Negami Chemicallndustries Co.,LTD ;丙稀酸醋化的脂族胺 5 曱酸酯寡聚物(Ebecryl 230、264、265、270、284、4830、 4833、4834、4835、4866、4881、4883、8402、8800-20R、 8803、8804)得自於 Radcure Specialities, Inc ;聚醋丙烯酸 酯寡聚物(Ebecryl 657、770、810、830、1657、1810、1830) 得自於Radcure Specialities,Inc ;環氧丙稀酸醋樹脂 10 (CN104、m、112、115、116、117、118、119、120、124、 136)得自於Sartomer Company,Inc。在一項具體實例中, 丙烯酸酯樹脂係選自由丙烯酸異莰酯、曱基丙烯酸異莰酯、 丙烯酸月桂酯、曱基丙烯酸月桂酯、具丙烯酸酯官能度的聚 (丁二烯)及具曱基丙烯酸酯官能度的聚(丁二烯)組成之組 15 群。 〇 與硝酮用於組成物之適合環氧化物包含雙酚、萘、及脂 族類型環氧化物。商業可得之材料包含雙酚類型環氧樹脂 (Epiclon 830LVP、830CRP、835LV、850CRP )得自於 Dainippon Ink & Chemicals, Inc ;萘類型環氧化物(Epiclon 2〇 HP4032)得自於 Dainippon Ink & Chemicals, Inc ;脂族環氧 樹脂(Araldite CY179、184、192、175、179)得自於 Ciba Specialty Chemicals,( Epoxy 1234、249、206 )得自於 Union 200946560Negami Chemical Industries Co., LTD; Acrylated Aliphatic Amine 5 Phthalate Oligomers (Ebecryl 230, 264, 265, 270, 284, 4830, 4833, 4834, 4835, 4866, 4881, 4883, 8402 , 8800-20R, 8803, 8804) from Radcure Specialities, Inc; Polyacetate acrylate oligomers (Ebecryl 657, 770, 810, 830, 1657, 1810, 1830) from Radcure Specialities, Inc; Epoxy Acrylic vinegar resin 10 (CN 104, m, 112, 115, 116, 117, 118, 119, 120, 124, 136) was obtained from Sartomer Company, Inc. In one embodiment, the acrylate resin is selected from the group consisting of isodecyl acrylate, isodecyl methacrylate, lauryl acrylate, lauryl methacrylate, poly(butadiene) having acrylate functionality, and ruthenium. Group 15 group consisting of poly(butadiene) based on acrylate functionality. Suitable epoxides for the use of hydrazine and nitrone include bisphenol, naphthalene, and aliphatic type epoxides. Commercially available materials comprising bisphenol type epoxy resins (Epiclon 830LVP, 830CRP, 835LV, 850CRP) are available from Dainippon Ink & Chemicals, Inc; naphthalene type epoxide (Epiclon 2〇 HP4032) from Dainippon Ink &amp Chemicals, Inc; aliphatic epoxy resin (Araldite CY179, 184, 192, 175, 179) from Ciba Specialty Chemicals, (Epoxy 1234, 249, 206) from Union 200946560

Carbide Corporation,及(ΕΗΡΕ-3150)得自於 Daicel ChemicalCarbide Corporation, and (ΕΗΡΕ-3150) are available from Daicel Chemical

Industries,Ltd。其它適合環氧樹脂包含環脂族環氧樹脂、雙 酚-A類型環氧樹脂、雙酚-F類型環氧樹脂(如來自HexionIndustries, Ltd. Other suitable epoxy resins include cycloaliphatic epoxy resins, bisphenol-A type epoxy resins, bisphenol-F type epoxy resins (eg from Hexion)

Specialty Chemicals之RSL 1739)、環氧酚醛清漆樹脂、聯 苯類型環氧樹脂、萘類型環氧樹脂、二環戊二烯-酚類型環 氧樹脂、反應性環氧稀釋劑、及其混合物。 與硝酮用於組成物之適合氰酸酯包含具有一般結構Specialty Chemicals RSL 1739), epoxy novolac resin, biphenyl type epoxy resin, naphthalene type epoxy resin, dicyclopentadiene-phenol type epoxy resin, reactive epoxy diluent, and mixtures thereof. Suitable cyanate esters for use in compositions with nitrones contain a general structure

10 15 θ [n=C-〇4—X7 \------------------k一 .....者,其中η為1或更大且X7為烴基。示範X7實 體包含雙酚、酚或曱酚酚醛清漆、二環戊二烯、聚丁二烯、 聚碳酸酯、聚胺曱酸酯、聚醚、或聚酯。商業可得之材料包 含 AroCy L-10、AroCy XU366、AroCy XU371、AroCy XU378、XU71787.02L、及 XU 71787.07L,得自於 Huntsman LLC ; Primaset PT30、Primaset PT30 S75、Primaset PT60、10 15 θ [n=C-〇4—X7 \------------------k one..... where η is 1 or greater and X7 is Hydrocarbyl group. Exemplary X7 bodies comprise bisphenol, phenol or nonanol novolac, dicyclopentadiene, polybutadiene, polycarbonate, polyamine phthalate, polyether, or polyester. Commercially available materials include AroCy L-10, AroCy XU366, AroCy XU371, AroCy XU378, XU71787.02L, and XU 71787.07L, available from Huntsman LLC; Primaset PT30, Primaset PT30 S75, Primaset PT60,

Primaset PT60S、Primaset BADCY、Primaset DA230S、Primaset PT60S, Primaset BADCY, Primaset DA230S,

Primaset MethylCy、及 Primaset LECY,得自於 Lonza Group Limited ; 2-烯丙基酚氰酸酯、4-甲氧基酚氰酸酯、2,2-雙(4-氰酸基本紛)-1,1,1,3,3,3-六氟1丙烧、雙紛八氰酸酷、二婦丙 基雙酚A氰酸酯、4-苯基酚氰酸酯、1,1,1-參(4-氰酸基苯基) 乙烷、4-枯基苯酚氰酸酯、1,1-雙(4-氰酸基苯基)乙烷、 2,2,3,4,4,5,5,6,6,7,7-十一《敗辛二醇《一亂酸醋、及4,4’-雙盼氮 酸醋,得自於 Oakwood Products, Inc。 與硝酮用於組成物之適合乙烯醚包含具有一般結構 11 20 200946560 π者’其中11為1至6且X3為芳香族或脂族基。示 範X3實體包含聚(丁二烯)、聚(碳酸酯)、聚(胺曱酸酯)、聚 (醚)、聚(酯)、簡單烴、及含有官能度如羰基、羧基、醯胺、 胺甲酸醋、脲、或喊之簡單烴。商業可得之樹脂包含環己烷 5 二曱醇二乙烯醚、十二烷基乙烯醚、環己基乙烯醚、2-乙基 己基乙烯醚、二丙二醇二乙烯醚、己烷二醇二乙烯醚、十八 ❹ 烧基乙烯醚、及丁二醇二乙烯醚,得自於InternationalPrimaset MethylCy, and Primaset LECY, available from Lonza Group Limited; 2-allyl phenol cyanate, 4-methoxyphenol cyanate, 2,2-bis(4-cyanate)-1, 1,1,3,3,3-hexafluoro-1-propanone, diceocyanate, dipropyl bisphenol A cyanate, 4-phenylphenol cyanate, 1,1,1-parameter (4-cyanylphenyl) ethane, 4-cumylphenol cyanate, 1,1-bis(4-cyanylphenyl)ethane, 2,2,3,4,4,5, 5,6,6,7,7-11 "Acrylonitrile", a vinegar, and 4,4'-bi-nitrate, available from Oakwood Products, Inc. Suitable vinyl ethers for use in compositions with nitrones include those having the general structure 11 20 200946560 π where 11 is 1 to 6 and X 3 is an aromatic or aliphatic group. Exemplary X3 entities include poly(butadiene), poly(carbonate), poly(amine phthalate), poly(ether), poly(ester), simple hydrocarbons, and functional groups such as carbonyl, carboxyl, decylamine, A urethane, urea, or a simple hydrocarbon. Commercially available resins include cyclohexane 5 dinonanol divinyl ether, dodecyl vinyl ether, cyclohexyl vinyl ether, 2-ethylhexyl vinyl ether, dipropylene glycol divinyl ether, hexanediol divinyl ether , 18 ❹ 烧 vinyl ether, and butanediol divinyl ether, obtained from International

Speciality Products (ISP) ; Vectomer 4010、4020、4030、 4040、4051、4210、4220、4230、4060、5015,得自於 ίο Sigma-Aldrich, Inc。 與硝酮用於組成物之適合聚(丁二烯)包含聚(丁二烯)、 環氧化的聚(丁二烯)、順丁烯二醯聚(丁二烯)、丙烯酸酯化 的聚(丁二烯)、丁二烯—苯乙烯共聚物、及丁二烯—丙烯腈 共聚物。商業可得之材料包含均聚物丁二烤(Ricon 130、 ® 131、134、142、150、152、153、154、156、157、P30D) 得自於Sartomer Company, Inc ; 丁二烯與苯乙烯之無規共聚 物(Ricon 100、181、184)得自於 Sartomer Company Inc ; 順丁烯二酸化的聚(丁二烯)(Riccm 130MA8、130MA13、 130MA20、131MA5、131MA10、131MA17、131MA20、 20 156MA17 )得自於Sartomer Company,Inc ;丙稀酸酯化的聚 (丁二烯)(CN302、NTX6513、CN3(H、NTX6039、PRO6270、 Ricacryl 3100、Ricacryl 3500)得自於 Sartomer Inc ;環氧化 12 200946560 的聚(丁二烯)(PolyM 600、605)得自於 Sartomer Company,Speciality Products (ISP); Vectomer 4010, 4020, 4030, 4040, 4051, 4210, 4220, 4230, 4060, 5015, available from ίο Sigma-Aldrich, Inc. Suitable poly(butadiene) for use in compositions with nitrones comprises poly(butadiene), epoxidized poly(butadiene), maleic fluorene (butadiene), acrylated poly (butadiene), butadiene-styrene copolymer, and butadiene-acrylonitrile copolymer. Commercially available materials include homopolymer butyl bake (Ricon 130, ® 131, 134, 142, 150, 152, 153, 154, 156, 157, P30D) from Sartomer Company, Inc; butadiene and benzene Random copolymer of ethylene (Ricon 100, 181, 184) was obtained from Sartomer Company Inc; maleated poly(butadiene) (Riccm 130MA8, 130MA13, 130MA20, 131MA5, 131MA10, 131MA17, 131MA20, 20 156MA17) ) from Sartomer Company, Inc; acrylated poly(butadiene) (CN302, NTX6513, CN3 (H, NTX6039, PRO6270, Ricacryl 3100, Ricacryl 3500) from Sartomer Inc; epoxidation 12 200946560 Poly(butadiene) (PolyM 600, 605) from the Sartomer Company,

Inc 及 Epolead PB3600 得自於 Daicel Chemical Industries,Inc and Epolead PB3600 are from Daicel Chemical Industries.

Ltd ;及丙烯腈與丁二烯共聚物(Hycar CTBN系列、ATBN 系列、VTBN系列及ETBN系列)得自於Hanse Chemical。 與硝酮用於組成物之適合矽化烯烴係藉由矽酮與二乙 稀基材料之選擇性梦氫化(selective hydrosilation)反應獲Ltd ; and acrylonitrile and butadiene copolymers (Hycar CTBN series, ATBN series, VTBN series and ETBN series) were obtained from Hanse Chemical. The suitable deuterated olefins used in the composition with nitrone are obtained by selective hydrosilation reaction of anthrone and diethyl-based materials.

Got

,其中化為2或更 多,Π2為1或更多,且χΐι>ιΐ2。此專材料為商業可得且可從 例如 National Starch and Chemical Company 獲得。 10, wherein it is 2 or more, Π 2 is 1 or more, and χΐι>ιΐ2. This specialty material is commercially available and is available, for example, from National Starch and Chemical Company. 10

與硝酮用於組成物之適合矽酮包含具有一般結構Suitable fluorenone with nitrone for the composition contains a general structure

X5 -之反應性矽氧樹脂,其中η為0或任何 整數,X4及X5為氫、甲基、胺、環氧、竣基、羥基、丙烯 酸酯、甲基丙烯酸酯、巯基、酚、或乙烯基官能基,R2及 RHH、-CH3、乙烯基、笨基、或具有大於兩個碳原 子之任何烴結構。商業可得之材料包含KF8〇12、KF8〇〇2、 KF8003 ^ KF-1001 > X-22-3710 > KF6001 ^ X-22-164C > KF2001' X-22-170DX、X-22-173DX、 X~22-174DX、X-22-176DX、 13 15 200946560 KF-857、KF862、KF80CU、X-22-3367、及 X-22-3939A 得自 於 Shin-Etsu Silicone International Trading (Shanghai) Co., Ltd。 與硝酮用於組成物之適合苯乙烯系化合物包含具有一X5 - a reactive oxirane resin wherein η is 0 or any integer and X4 and X5 are hydrogen, methyl, amine, epoxy, decyl, hydroxy, acrylate, methacrylate, decyl, phenol, or ethylene A functional group, R2 and RHH, -CH3, vinyl, stupid, or any hydrocarbon structure having more than two carbon atoms. Commercially available materials include KF8〇12, KF8〇〇2, KF8003^KF-1001 > X-22-3710 > KF6001 ^ X-22-164C > KF2001' X-22-170DX, X-22- 173DX, X~22-174DX, X-22-176DX, 13 15 200946560 KF-857, KF862, KF80CU, X-22-3367, and X-22-3939A from Shin-Etsu Silicone International Trading (Shanghai) Co ., Ltd. Suitable styrenic compounds for use in compositions with nitrones include one

55

1010

15 般結構、.........................Z n之樹脂,其中η為1或更大,R4為—η或 —CH3,且X6為脂族基。示範X3實體包含聚(丁二烯)、聚(破 酸酯)、聚(胺甲酸酯)、聚(it)、聚(酯)、簡單烴、及含有官 能度如羰基、羧基、醯胺、胺甲酸酯、脲、或醚之簡單烴。 此等樹脂為商業可得且可從例如National Starch and Chemical Company 或 Sigma-Aldrich Co 獲得。 對某些應用而言,可將一或多種填料或隔離物(spacer) 或兩者添加於可固性組成物且通常添加用以改良的流變性 質、應力降低、及膠層(bondline)控制。適合的非導電性 填料實例包含乳化紹、氫氧化銘、二氧化碎、經石、雲母、 矽灰石、碳酸妈、氧化鈦(titania)、砂、玻璃、硫酸鋇、錯、碳黑、 有機填料、及有機聚合物(包含但不限於經_化的乙烯聚合 物,如四氟乙烯、三氟乙烯、偏氟乙烯、氟乙烯、偏氣乙烯、 及氣乙烯)。適合的導電性填料實例包含碳黑、石墨、金、 銀、銅、顧、他、錄、銘、碳化石夕、氣化侧、鑽石、及氧化 鋁。顆粒可為範圍自奈米大小至數個亳米之任何適當尺寸, 14 20 200946560 ^於,、#疋否使用作為填料或隔離物(隔離物典型為具有 更户尺寸均勻性之更大尺寸齡)。針對任何糾最終用途 選擇如此尺寸係於熟習技藝者之專門技術範圍内。埴料可由 實踐者決定以適合所選擇最終用途之任何量存在。八 【實施方式】 ° 合成實施例15 general structure, ................. Z n resin, where η is 1 or greater, R4 is -η or -CH3, And X6 is an aliphatic group. Exemplary X3 entities include poly(butadiene), poly(decarboxylate), poly(urethane), poly(it), poly(ester), simple hydrocarbons, and functional groups such as carbonyl, carboxyl, guanamine a simple hydrocarbon of a carbamate, urea, or ether. Such resins are commercially available and are available, for example, from National Starch and Chemical Company or Sigma-Aldrich Co. For some applications, one or more fillers or spacers or both may be added to the curable composition and are typically added for improved rheological properties, stress reduction, and bondline control. . Examples of suitable non-conductive fillers include emulsified, oxidized, oxidized, feldspar, mica, ash, carbonate, titania, sand, glass, barium sulfate, sulphur, carbon black, organic Fillers, and organic polymers (including but not limited to, ethylene-based polymers such as tetrafluoroethylene, trifluoroethylene, vinylidene fluoride, vinyl fluoride, ethylene oxide, and ethylene). Examples of suitable conductive fillers include carbon black, graphite, gold, silver, copper, Gu, He, Lu, Ming, carbon carbide, gasification side, diamond, and aluminum oxide. The granules can be of any suitable size ranging from nanometer size to several glutinous rice, 14 20 200946560 ^,, #疋No use as a filler or spacer (the separator is typically a larger size with a greater uniformity of size) ). Selecting such dimensions for any end use is within the skill of those skilled in the art. The dip can be determined by the practitioner to any amount suitable for the end use selected. Eight [Embodiment] ° Synthesis Example

10 溶點、固化溫度、淨翻之聚合熱、及含有仙與其它 化合物的可固化組成物之聚合熱係由微差掃描熱量計 (DSC )決疋。熱重里分析(tga)係由TGA ( TA 2950 ) 熱重量分析儀器完成。10 The melting point, curing temperature, net heat of polymerization, and the heat of polymerization of the curable composition containing the compound and other compounds are determined by a differential scanning calorimeter (DSC). Thermogravimetric analysis (tga) was performed by a TGA (TA 2950) thermogravimetric analyzer.

實施例1合成硝酮AExample 1 Synthesis of nitrone A

❹ 將氫氧化鉀(23.71g’ 〇.3593mol)於108mL乙醇之溶 液緩慢添加於N-曱基羥胺氣化氫(3〇.〇〇g,〇.3557mol)於 18mL水之溶液。所得沉澱物以真空過濾法予以過濾並丟 棄。500mL四頸圓底燒瓶裝備有冷凝器及機械攪拌器,且裝 填有1,4-苯二醛(】9,29g,〇.1437mol)於54mL乙醇之懸浮 液。在此懸浮液中逐滴添加曱基羥胺溶液(濾液)。混合 物授拌隔夜’然後將沉澱物真空過濾並以水洗滌。使固體產 物在真空與室溫下乾燥隔夜。產率大約為41〇%。ih_nmr 於DMSO (溶劑)中記錄並證明為所欲產物。熔點為252°C。 當樣品以每分鐘1〇它從4〇〇c加熱至3〇〇£)(^$,決定聚合熱為 15 20 200946560 435J/g。TGA I頁示重量損失於·。以〇2 〇.4伙,於為乃謂,及於綱。C為77,8%、。 實施例2合成/G肖酮Β溶 A solution of potassium hydroxide (23.71 g' 〇.3593 mol) in 108 mL of ethanol was slowly added to a solution of N-mercaptohydroxylamine hydrogenated hydrogen (3 〇.〇〇g, 〇. 3557 mol) in 18 mL of water. The resulting precipitate was filtered by vacuum filtration and discarded. A 500 mL four-necked round bottom flask was equipped with a condenser and a mechanical stirrer, and was charged with a suspension of 1,4-benzenedialdehyde (9,29 g, 437.1437 mol) in 54 mL of ethanol. A solution of mercaptohydroxylamine (filtrate) was added dropwise to this suspension. The mixture was mixed overnight. Then the precipitate was vacuum filtered and washed with water. The solid product was dried overnight under vacuum at room temperature. The yield is approximately 41%. Ih_nmr was recorded in DMSO (solvent) and proved to be the desired product. The melting point is 252 ° C. When the sample is heated from 4 〇〇c to 3 ) (), the polymerization heat is 15 20 200946560 435J/g. The TGA I page shows the weight loss in 。2 〇.4伙,于为乃,和于纲. C is 77,8%. Example 2 Synthesis / G succinone oxime

13二==成硝酮A之相同程序製備,除了使用 i,_3-本一酸'取代1,4-本二駿以外。13 2 == Preparation of the same procedure as nitrone A, except that i, _3-mono-acid' was substituted for 1,4-ben.

實施例3合成硝酮c Η h3cv β ^Λτ。识 0 ©Ν fii下列反應流程圖首先製備起始 尸H3 2 +Example 3 Synthesis of nitrone c Η h3cv β ^Λτ. Knowledge 0 ©Ν fii The following reaction flow chart first prepares the start corpse H3 2 +

OH ohc~0^°y^^y〇^_cho ο ο 5_L四_底燒瓶裝備有冷⑼、起泡器、及機械授摔 器,且t填有4_羥苯甲盤(1U2g,〇.〇911m〇丨)、三乙胺 (17.05g > 〇.i689mol) ' DMAP ( 〇.9476g > 0.0078mol) > 10 200946560 及100mL CH2C12。内容物在冰浴中冷卻至低於10°C。將壬 二醢氯(10.25g,0.0455mol)裝填於添加漏斗並逐滴添加於 反應燒瓶。混合物在1CTC下攪拌,移除冷凝器及冰浴,溶液 溫熱至室溫並攪拌隔夜。然後將混合物過濾’濾液以水與鹽 水洗滌及以碳酸氫鈉洗滌兩次。為了自TLC上基線點純化 產物’添加破凝膠(10.0g) ’授拌溶液1小時。—旦基線移 除並以TLC檢查,移除溶劑,b-NMR於CDC13中完成並證 明二酸之存在。OH ohc~0^°y^^y〇^_cho ο ο 5_L The bottom of the flask is equipped with a cold (9), bubbler, and mechanical transfer device, and t is filled with 4_hydroxybenzene plate (1U2g, 〇. 〇911m〇丨), triethylamine (17.05g > 689.i689mol) 'DMAP (〇.9476g > 0.0078mol) > 10 200946560 and 100mL CH2C12. The contents were cooled to below 10 ° C in an ice bath. Dioxachloride (10.25 g, 0.0455 mol) was charged to the addition funnel and added dropwise to the reaction flask. The mixture was stirred at 1 CTC, the condenser and ice bath were removed and the solution was warmed to room temperature and stirred overnight. The mixture was then filtered. The filtrate was washed with water and brine and twice with sodium bicarbonate. In order to purify the product from the baseline at TLC, a broken gel (10.0 g) was added to the solution for 1 hour. Once the baseline was removed and checked by TLC, the solvent was removed and b-NMR was carried out in CDC 13 and the presence of diacid was confirmed.

°θ°θ

將氫氧化鉀(2.84g,0.0506mol)於iimL乙醇之溶液緩慢 =、力於)SU甲基經胺氯化虱(4 2〇g,〇.〇5〇6mol)於2mL水之 〇 溶液。所得固體沉澱物攪拌15分鐘,然後移除並丟棄。100mL 一颈圓底燒瓶裝備有冷凝器及攪拌子,且裝填有二官能醛A solution of potassium hydroxide (2.84 g, 0.0506 mol) in iimL of ethanol was slowly =, and a solution of SU methyl methylamine ruthenium chloride (4 2 g, 〇. 5 〇 6 mol) in 2 mL of water was added. The resulting solid precipitate was stirred for 15 minutes, then removed and discarded. The 100 mL one-neck round bottom flask is equipped with a condenser and a stirrer and is filled with a difunctional aldehyde.

15 (,0.0253mo1)(如上述反應流程圖所示)於0mL 之懸浮液。在懸浮液中添加其餘來自N-甲基羥胺氣化氫 't液士物質。新產物產生沉澱β將具有沉澱物之新混合物攪 =,然後真空過濾並以水洗滌。使固體產物在真空與室 二:乾燥隔夜。產率大約為45.0%。A-nmr於DMSO中完 2〇 成亚證明為所欲產物。熔點為152°C。 20094656015 (, 0.0253 mol) (as shown in the above reaction scheme) in a 0 mL suspension. The remaining from the N-methylhydroxylamine hydrogenation 't liquid substance was added to the suspension. The new product produces a precipitate β which is stirred with a new mixture of precipitates, then vacuum filtered and washed with water. The solid product was allowed to stand in vacuum and room two: dry overnight. The yield was approximately 45.0%. A-nmr was completed in DMSO and proved to be the desired product. The melting point is 152 ° C. 200946560

實施例4合成硝酮DExample 4 Synthesis of nitrone D

根據下列自4-羥苯甲醛開始之反應流程圖製備硝酮D:The nitrone D was prepared according to the following reaction scheme starting from 4-hydroxybenzaldehyde:

N-甲基羥胺氯化氫N-methylhydroxylamine hydrogen chloride

KOH / EtOHKOH / EtOH

® 將氫氧化斜(20.14g,0,359mol)於108mL乙醇之溶液缓慢 添加於N-曱基羥胺氣化氫(30.00g,0.359raol)於18mL水 之溶液。所得固體沉澱物攪拌15分鐘,以真空過濾移除並 丟棄。500mL四頸圓底燒瓶裝備有冷凝器及機械攪拌器,且 裝填有4-經苯曱搭( 36,55g,0.299mol)於71mL乙醇之懸 10 浮液。在懸浮液中添加其餘來自N-甲基經胺氣化氩溶液之物 質。新產物產生沉澱。將具有沉澱物之新混合物攪拌隔夜, 然後真空過濾並以水洗滌。使固體產物在真空與室溫下乾燥 _ 隔夜。產率大約為67.0%。b-NMR於DMS0中完成並證明® A solution of slanting water (20.14 g, 0,359 mol) in 108 mL of ethanol was slowly added to a solution of N-mercaptohydroxylamine hydrogenation (30.00 g, 0.359 raol) in 18 mL of water. The resulting solid precipitate was stirred for 15 minutes, removed by vacuum filtration and discarded. A 500 mL four-necked round bottom flask was equipped with a condenser and a mechanical stirrer, and was charged with a suspension of 4-benzoquinone (36, 55 g, 0.299 mol) in 71 mL of ethanol. The remaining material from the N-methyl amine vaporized argon solution was added to the suspension. The new product produces a precipitate. The new mixture with the precipitate was stirred overnight, then vacuum filtered and washed with water. The solid product was dried under vacuum at room temperature _ overnight. The yield was approximately 67.0%. b-NMR was completed in DMS0 and proved

為所欲產物。熔點為232°C 實施例5合成琐_ EFor the desired product. The melting point is 232 ° C. The synthesis of Example 5 is _ E

根據下列自3-羥苯甲醛開始之反應流程圖製備硝酮E : 200946560Preparation of nitrone E according to the following reaction scheme starting from 3-hydroxybenzaldehyde: 200946560

Ν-甲基羥胺氮化氫Bismuth-methylhydroxylamine hydrogen sulfide

KOH / EtOH CH3KOH / EtOH CH3

❹ 將氫氧化鉀(20.14g,〇.359mol)於l〇8m:L乙醇之溶液緩慢 添加於N-曱基羥胺氯化氫(3〇 00g,〇 359m〇l)於i8mL水 之溶液。所得固體沉澱物攪拌][5分鐘,以真空過濾移除並 丟棄。500mL四頸圓底燒瓶裝備有冷凝器及機械攪拌器,且 裝填有3-¾苯曱搭(36.55g,0.299mol)於71mL乙醇之懸 浮液。在懸浮液中添加其餘來自N-曱基羥胺氯化氫溶液之物 質。新產物產生沉澱。將具有沉澱物之新混合物攪拌隔夜, 然後真空過濾並以水洗滌。使固體產物在真空與室溫下乾燥 隔夜以生成良好產率之硝酮。iH-NMR於DMS0中完成並说 明為產物。熔點為205。(:。 也 實施例6合成硝酮jp Φ溶液 A solution of potassium hydroxide (20.14 g, 359.359 mol) in 10 mL of L ethanol was slowly added to a solution of N-mercaptohydroxylamine hydrogen chloride (3 〇 00 g, 359 359 〇l) in i8 mL of water. The resulting solid precipitate was stirred] [5 min, removed by vacuum filtration and discarded. A 500 mL four-necked round bottom flask was equipped with a condenser and a mechanical stirrer, and was loaded with a suspension of 3-3⁄4 benzoquinone (36.55 g, 0.299 mol) in 71 mL of ethanol. The remaining material from the N-mercaptohydroxylamine hydrogen chloride solution was added to the suspension. The new product produces a precipitate. The new mixture with the precipitate was stirred overnight, then vacuum filtered and washed with water. The solid product was dried under vacuum at room temperature overnight to yield a good yield of nitrone. iH-NMR was completed in DMS0 and described as product. The melting point is 205. (:. Also Example 6 Synthetic nitrone jp Φ

根據下列反應流程圖首先製備起始4-丙块氧其苯甲越.The starting 4-c-block oxygen was first prepared according to the following reaction scheme.

在 4-羥苯曱醛(24.5g,0.2mol)於 DMF 之 >谷液中添加 K2C〇3 15 200946560 (33.31g’0.2m〇i)。混合物攪拌15分鐘。添加溴丙炔 (15,12raL),所得溶液於室溫攪拌隔夜。混合物以乙酸乙 醋稀釋並據出以移除K2C03。遽餅以乙酸乙s旨洗務。濾液在 分液漏斗中取得,以水(4x2〇〇mL)與鹽水洗滌,並於無水 5 M g S 〇 4上乾燥。藉由在真空供箱令乾燥隔夜跟隨進行溶劑蒸 發’提供乾淨hNMR光譜之苯甲醛(29.5g,92%)。 根據下列反應流程圖,然後使用苯甲醛以製備硝酮:K2C〇3 15 200946560 (33.31g'0.2m〇i) was added to 4-hydroxybenzaldehyde (24.5 g, 0.2 mol) in DMF > The mixture was stirred for 15 minutes. Bromopropyne (15,12 raL) was added and the resulting solution was stirred at room temperature overnight. The mixture was diluted with ethyl acetate and taken to remove K2C03. The cake is washed with acetic acid. The filtrate was taken in a sep. funnel, washed with water (4×2 〇〇mL) and brine and dried over anhydrous Benzaldehyde (29.5 g, 92%) was provided as a clean h NMR spectrum by solvent evaporation under vacuum. According to the following reaction scheme, then benzaldehyde is used to prepare the nitrone:

在N-甲基羥胺氣化氫(丨5 66g,〇]87m〇1)於cj^ch ( 75mL ) 之懸浮液中添加三乙胺(26.14mL,0.187mo〇。所得混合 物於室溫授拌15分鐘。濾出沉殺物並以CH2C12 ( 25mL)洗 鲦。將濾液逐滴添加於醛(2〇g,〇. 125mol)於CH2C12(丨5〇mL ) 之經攪拌溶液。所得混合物於室溫攪拌隔夜。蒸發掉 CH2C12 ;將冰冷水(5〇mL)添加於殘渣,濾出沉殿物β固體 連續以冷水(20mL)與冷丙酮(40mL)洗滌並於真空烘箱 中乾燥。此提供乾淨iH NMR光譜(DMSO)之確酮產物 (14.2g,77% )。熔點為 132。〇。 實施例7合成硝酮g 20 200946560 •h3c'Triethylamine (26.14 mL, 0.187 mol) was added to a suspension of N-methylhydroxylamine hydrogenation (丨5 66g, 〇]87m〇1) in cj^ch (75mL). 15 minutes. The precipitate was filtered off and washed with CH2C12 (25 mL). The filtrate was added dropwise to a stirred solution of aldehyde (2 〇g, 〇. 125mol) in CH2C12 (丨5 〇mL). Warm stirring overnight. Evaporate CH2C12; add ice-cold water (5〇mL) to the residue, filter out the precipitated solids and wash it in cold water (20mL) and cold acetone (40mL) and dry in a vacuum oven. iH NMR spectroscopy (DMSO) ketone product (14.2 g, 77%). Melting point 132. 〇. Example 7 Synthesis of nitrone g 20 200946560 • h3c'

•‘苄基溴• Benzyl bromide

根據下列反應流程圖貫先製備起始4-苄氧基苯甲酸: Ο k2co3/dmf 在4-羥苯曱醛(10g,81.9mmol)於DMF (75mL)之溶液 5 中添加碳酸鉀(13.57g ’ 98.2mmol)。混合物於室溫攪拌15 分鐘。添加苄基漠(9.73mL,81.9mmol),混合物於室溫授 拌隔夜。添加乙酸乙酯(5〇〇mL),濾出沉澱物並以乙酸乙 酯(50mL )洗滌。濾液以水(4x200mL )與鹽水(1 〇〇mL ) 洗滌。有機層於無水MgSCU上乾燥,蒸發溶劑。產物於真 〇 空中乾燥並提呈於1H NMR。NMR指出為純化合物(I5.2g, 87%)。 根據下列反應流程圖使用4-苄氧基苯甲醛以製備硝酮:The starting 4-benzyloxybenzoic acid was prepared according to the following reaction scheme: Ο k2co3/dmf Potassium carbonate (13.57 g) was added to a solution of 4-hydroxybenzaldehyde (10 g, 81.9 mmol) in DMF (75 mL) ' 98.2 mmol). The mixture was stirred at room temperature for 15 minutes. Benzyl desert (9.73 mL, 81.9 mmol) was added and the mixture was stirred overnight at room temperature. Ethyl acetate (5 mL) was added and the precipitate was filtered and washed ethyl acetate (50mL). The filtrate was washed with water (4 x 200 mL) and brine (1 mL). The organic layer was dried over anhydrous MgSCU and evaporated. The product was dried in vacuo and submitted to 1H NMR. NMR indicated the pure compound (15.2 g, 87%). The nitrone was prepared according to the following reaction scheme using 4-benzyloxybenzaldehyde:

在N-曱基經胺氣化氫(7.8g,93.3mmol)於二氣甲燒(50mL) 之懸浮液中添加三乙胺(13.02mL,93.3mmol)。混合物授 拌20分鐘。過濾沉澱物並以二氯曱烷(20mL)洗滌《將濾 液逐滴添加於醛(13.2g,62,2mL)於二氣曱燒(8〇mL)之 200946560 溶液並於室溫攪拌隔夜。蒸發二氯曱烷,將冷水添加於殘渣 (IOOmL)並攪拌15分鐘。將沉澱物過濾,以水與1 : 1 CH2C12 :庚烷(75mL)洗滌,於真空下乾燥以生成固體硝酮 (12.32g,82%)。硝酮G具有熔點117°C且可與其它樹脂 5 溶混。 實施例8合成硝酮ΗTriethylamine (13.02 mL, 93.3 mmol) was added to a suspension of N-decylamine (m.p. The mixture was mixed for 20 minutes. The precipitate was filtered and washed with dichloromethane (20 mL). <RTI ID=0.0>>>>> Dichloromethane was evaporated, and cold water was added to the residue (100 mL) and stirred for 15 min. The precipitate was filtered, washed with EtOAc EtOAc EtOAc (EtOAc) The nitrone G has a melting point of 117 ° C and is miscible with other resins 5 . Example 8 Synthesis of nitrosone oxime

根據下列反應流程圖製備起始二甲磺酸酯:The starting dimesylate was prepared according to the following reaction scheme:

WeS02CI/Et3N CH2Ci2 99% q〇 在二聚物二醇(Uniqema) (9.07g,16.2mmol)於 CH2C12 (lOOmL)中0°C下添加三乙胺(6.8mL),隨後歷經10分 鐘期間逐滴添加MeSC^Cl ( 2.77mL,35,7mmol)。在相同溫 度攪拌2小時,當T.L.C.指出起始材料消失後(經uv室顯 影),添加水(lOOmL),混合物以Et〇Ac( 300mL)稀釋。 有機層以水(3xl00mL)與鹽水洗滌並於無水MgS04上乾燥 30分鐘。蒸發溶劑,產物於真空下乾燥2小時以提供甲磺酸 酯(11.6g,99%)。 22 15 200946560 根據下列反應流程圖自二甲磺酸酯製備二醛:WeS02CI/Et3N CH2Ci2 99% q〇 Add diethylamine (6.8 mL) in dimer diol (Uniqema) (9.07 g, 16.2 mmol) in CH2C12 (100 mL) at 0 ° C, then drop by 10 min. MeSC^Cl ( 2.77 mL, 35, 7 mmol) was added. After stirring at the same temperature for 2 hours, when T.L.C. indicated that the starting material disappeared (developed through the uv chamber), water (100 mL) was added, and the mixture was diluted with Et EtOAc (300 mL). The organic layer was washed with water (3×10 mL) and brine and dried over anhydrous The solvent was evaporated and the product was dried <RTI ID=0.0> 22 15 200946560 Preparation of dialdehyde from dimesylate according to the following reaction scheme:

將 K2C03 (21.63g,156mmol)與 4-羥苯甲醛(I5.66g, ❿ 128mmol)於DMF (500mL)之懸浮液以機械攪拌器於室溫 5 攪拌30分鐘。逐滴添加二甲磺酸酯於DMF(50mL)之溶液, 所得混合物於8CTC下加熱6小時。當T.L.C (薄層層析法) 指出起始材料消失後,使反應混合物冷卻至室溫並以乙酸乙 酉曰與庚烧(500mL)之1 : 1混合物稀釋。濾出沉澱物並以 庚烷:乙酸乙酯(1 : 1,200mL)洗滌。濾液在分液漏斗中 1〇 取得,以水洗滌數次(4x400mL),隨後以鹽水(3〇〇mL) 洗滌。有機層於無水MgS〇4上乾燥(30分鐘),在5(rc下 ?条發溶劑3小時。所得黏稠液體於真空下乾燥2小時以生 〇 二醛(39.4g,89%)。 根據下列反應流程圖自二醛合成硝酮:A suspension of K2C03 (21.63 g, 156 mmol) and 4-hydroxybenzaldehyde (I5.66 g, ❿ 128 mmol) in DMF (500 mL) was stirred at room temperature for 5 min. A solution of the dimesylate in DMF (50 mL) was added dropwise, and the mixture was stirred at 8 CTC for 6 hr. After T.L.C (Thin Layer Chromatography) indicated the disappearance of the starting material, the reaction mixture was cooled to room temperature and diluted with a 1:1 mixture of ethyl acetate and hexane (500 mL). The precipitate was filtered and washed with heptane: ethyl acetate (1:1, 200 mL). The filtrate was taken in a sep. funnel, washed several times with water (4×400 mL) and then washed with brine (3·mL). The organic layer was dried over anhydrous MgSO.sub.4 (30 min), and solvent was evaporated from &lt;RTI ID=0.0&gt;&gt;&&&&&&&&&&&&&&&&&& Reaction Scheme: Synthesis of nitrone from dialdehyde:

Q Et3N, CH2CI2 93%Q Et3N, CH2CI2 93%

N'ch3 23 200946560N'ch3 23 200946560

在 N-曱基羥胺氣化氫(3.75g,44,9mmol)於 CH2Cl2(20inL) 之懸浮液中添加三乙胺(6.26mL ’ 44.9mmo〇。混合物授拌 15分鐘。過濾沉澱物並以CH/l2 ( 15mL)洗滌。將濾液逐 滴添加於酸(4.3g ’ 5.6mmol)於CHAl2之溶液並於室溫授 5 拌隔夜。混合物以EtOAc (250mL)稀釋,有機層以水(4X 50mL)與鹽水洗丨條並於無水]yigS〇4上乾燥^溶劑蒸發提供 黏稍液體’其使用Kugelrohr於60°C乾燥3小時,以生成石肖 ❹酮為非常黏稠液體(4.24g,93% )。黏度於50°C為7000mPa · s。此反應為高度可再現者。 10 特性實施你丨月斜論 以各種莫耳比,將上述硝酿I調配於包括一或多種下列樹 脂之可固化組成物中。組成物不含溶劑。淨樹脂及組成物係 由微差掃描熱量計(DSC)固化,固化溫度(固化T1與固 )及^合熱(AH)針對各實施例記錄於表中。(上文 15 提,之熔點亦由Dsc決定。)使用熱重量分析(TGA)以 决疋失重且由TGA (TA 2950)儀器完成。 ❹ 參順丁烯二醯亞胺(TMI)Add triethylamine (6.26 mL '44.9 mmo〇) to a suspension of N-mercaptohydroxylamine hydrogenation (3.75 g, 44,9 mmol) in CH2Cl2 (20 inL). Mix the mixture for 15 min. Filter the precipitate and pass CH The mixture was washed with EtOAc (250 mL). Wash with barium and dry on anhydrous yigS〇4. Solvent evaporation to provide a viscous liquid. It was dried using Kugelrohr at 60 °C for 3 hours to form squalane as a very viscous liquid (4.24 g, 93%). The viscosity is 7000 mPa · s at 50 ° C. This reaction is highly reproducible. 10 Characteristics Implementation Your sloping theory is formulated with various molar ratios to formulate the above-mentioned nitrate I in a curable composition comprising one or more of the following resins. The composition contained no solvent. The net resin and composition were cured by a differential scanning calorimeter (DSC), and the curing temperature (cured T1 and solid) and heat (AH) were recorded in the tables for each example. (15 above, the melting point is also determined by Dsc.) Using thermogravimetric analysis (TGA) to determine weight loss And completed by TGA (TA 2950) instrument. 参 cis-butenylene diimide (TMI)

氰酸酯(CE ) 24 200946560Cyanate ester (CE) 24 200946560

NCONCO

OCN 雙F環氧化物(環氧化物) h&lt;H〇-OCN double F epoxide (epoxide) h&lt;H〇-

丙烯酸酉旨Acrylic

雙順丁烯二醯亞胺(BMI)Bis-m-butylene diimide (BMI)

其中C36表示3 6個碳原子之線型或分支鏈(具有或沒有環狀部分)Wherein C36 represents a linear or branched chain of 3 6 carbon atoms (with or without a cyclic moiety)

Θ 實施例9 含有硝酮A及氰酸酯的組成物之DSC ίο 硝酮A與氰酸酯(CE)以各種莫耳比掺合。DSC掃描 指出兩階段固化過程,且隨著硝酮量減少,固化溫度增加。 結果記錄於表1。 表1 :硝酮A及氰酸酯之DSC數據 組分 莫耳比 固化T1 △ HI 固化T2 ΔΗ2 硝酮A : CE 1 : 0.5 154〇C 59J/g 188〇C 776J/g 硝酮A : CE 1:1 156〇C 63J/g 192〇C 1054J/g 25 200946560 硝酮A : CE 0.5 : 1 147〇C 160J/g 208〇C 1051J/g 硝酮A : CE 0.2 : 1 144〇C 70J/g 214〇C 655J/g 實施例10含有硝酮A、氰酸酯、及環氧化物的組成物之实施 Example 9 DSC of a composition containing nitrone A and a cyanate ester The nitrone A and the cyanate ester (CE) were blended in various molar ratios. The DSC scan indicates a two-stage cure process, and as the amount of nitrone decreases, the cure temperature increases. The results are reported in Table 1. Table 1: DSC data components of nitrone A and cyanate ester Mohr ratio cure T1 △ HI cure T2 ΔΗ2 nitrone A: CE 1 : 0.5 154〇C 59J/g 188〇C 776J/g nitrone A : CE 1:1 156〇C 63J/g 192〇C 1054J/g 25 200946560 nitrone A : CE 0.5 : 1 147〇C 160J/g 208〇C 1051J/g nitrone A : CE 0.2 : 1 144〇C 70J/ g 214〇C 655J/g Example 10 contains a composition of nitrone A, cyanate, and epoxide

DSC 硝酮A與上文所示之氰酸酯(CE)及雙F環氧化物以 各種莫耳比掺合於組成物中。組成物經Dsc固化。結果報 5 告於表2。 参2 :硝y △、氰酸酯、及環氧化物之DSc數據 組分 莫耳比 固化T1 △ HI 固化T2 ΔΗ2 硝酮A : CE :環氧 1:1:1 152〇C 16J/g 202〇C 482J/g 硝酮A : CE :環氧 0.5 : 1 : 1 196〇C 792J/g 氺:fe氺* 氺氺氺3({氺 硝酮A : CE :環氧他勿 1 : 0.5 : 1 207〇C 377J/g 250〇C llj/g 硝酮A : CE :環氣 1 : 0.5 : 0.5 198〇C 156J/g 236〇C 26J/g DSC峰於第二登錄為非常廣泛合併τι與T2。於第三 及第四登錄,多數固化發生於第一放熱期間,因此ΔΗ2對於 此等固化為低。DSC nitrone A is blended with the cyanate (CE) and double F epoxides shown above in various molar ratios. The composition was cured by Dsc. The results are reported in Table 2. Reference 2: DSc data component of nitrate y △, cyanate ester, and epoxide Mohr ratio curing T1 △ HI curing T2 ΔΗ2 nitrone A: CE: epoxy 1:1:1 152〇C 16J/g 202 〇C 482J/g nitrone A : CE :epoxy 0.5 : 1 : 1 196 〇C 792J/g 氺:fe氺* 氺氺氺3({氺nitrone A : CE : epoxy hedo 1 : 0.5 : 1 207〇C 377J/g 250〇C llj/g nitrone A : CE : ring gas 1 : 0.5 : 0.5 198〇C 156J/g 236〇C 26J/g DSC peak in the second login is very extensive combined with τι T2. At the third and fourth registrations, most of the curing occurs during the first exotherm, so ΔΗ2 is low for such curing.

實施例11含有硝酮Α及環氧化物的組成物之TGA 硝網A與環氧化物組合經TGA測試於20(TC的失重, 且相較於氰酸酯、環氧化物、及氰酸酯與環氧化物的1 : 1 莫耳比組成物之對照樣品。 物之TGA數據Example 11 TGA containing nitrone oxime and epoxide composition TGA nitrite A combined with epoxide was tested by TGA at 20 (TC weight loss compared to cyanate, epoxide, and cyanate) a control sample with a 1:1 molar ratio of epoxide. TGA data for the substance

組分 --------- 莫耳比 失重 溫度 CE -------- 淨(對照) 4.75% 200°C 環氧化物 淨(對照) 1.66% 200°C 26 200946560Component --------- Mo Erbi Weight Loss Temperature CE -------- Net (Control) 4.75% 200°C Epoxide Net (Control) 1.66% 200°C 26 200946560

CE .環氧化物 淨(對照) 3,2% 200°C 硝酮A:環氧化物 0.5 1 34.1% 200°C 硝酮A:環氧化物 0.2 : 1 33.8% 2〇〇°CEpoxide epoxide net (control) 3,2% 200°C nitrone A: epoxide 0.5 1 34.1% 200°C nitrone A: epoxide 0.2 : 1 33.8% 2〇〇°C

實施例12含有硝酮C、氰酸酯、環氧化物、順丁烯二醯亞 胺、及丙烯酸酯的組成物之DSCExample 12 DSC containing a composition of nitrone C, cyanate, epoxide, maleimide, and acrylate

硝酿)C與氰酸酯、氰酸酯與環氧化物、順丁烯二醯亞 胺、及丙烯酸酯掺合且經DSC固化。結果報告於表4並指 出與例如硝酮A比較’將脂族骨幹導入硝酮將降低聚合熱。 表4 ·硝酮c、氰酸酯、環氧化物、順丁晞二醯亞胺、及丙The nitrate C is blended with cyanate esters, cyanate esters and epoxides, maleimide, and acrylates and cured by DSC. The results are reported in Table 4 and indicate that comparison with, for example, nitrone A, the introduction of an aliphatic backbone into the nitrone will reduce the heat of polymerization. Table 4 · Nitronone c, cyanate ester, epoxide, cis-butane diimide, and C

10 組分 莫耳比 固化T1 Δ HI 固化丁2 ΔΗ2 硝酮C : CE 1:1 123〇C 80J/g 197〇C 560J/g 化物 1:1:1 126〇C 46J/g 205。。 604J/g 硝酮C : TMI 1:1 107°C 47J/g 253〇C 204J/g :丙烯酸酯 1:1 133〇C 71J/g 269〇C 454J/g 實施例13含有硝酮ϋ、氰酸酯、環氧化物、丙烯酸酯、及10 Components Mohr Ratio Curing T1 Δ HI Curing D 2 ΔΗ 2 Nitron Ketone C : CE 1:1 123〇C 80J/g 197〇C 560J/g Compound 1:1:1 126〇C 46J/g 205. . 604J/g nitrone C: TMI 1:1 107°C 47J/g 253〇C 204J/g: acrylate 1:1 133〇C 71J/g 269〇C 454J/g Example 13 contains nitrone oxime and cyanide Acid esters, epoxides, acrylates, and

順丁烯二醯亞胺的組成物之DSC &amp;確綱D具有一個硝酮官能度及一個酚型官能度。硝酮〇 $氛酸酿、氰酸酯與環氧化物、順丁烯二醯亞胺、及丙烯酸 ^掺合且經DSC固化。結果報告於表5並指丨兩階段固化過 程°未顯Τ第二m化峰之彼等配方係於第—放熱完全反應。 表5 ,硝_ d、氰酸酯、環氧化物、丙烯酸酯、及順丁烯二 — 組分 莫耳比 固化ΤΙ △ HI 固化Τ2 ΔΗ2 27 15 200946560 硝酮D :環氧化物 0.5 : 1 : 1 140°C 32J/g 205〇C llOJ/g 硝酮D :環氧化物 1:1:1 138〇C 84J/g 169〇C 157J/g 硝酮D CE 1:1 132〇C 362J/g 202〇C 543J/g 硝酮D ----- CE 0.5 : 1 135〇C 382J/g 199〇C 88J/g 硝酮D CE 0.4 : 1 141°C 721J/g 水氺本*氺 氺氺木氺氺 硝酮D ·&quot; —~~ ^CE 0.25 : 1 138〇C 142J/g 188〇C lOOJ/g 硝輞D 丙烯酸酯 172〇C 16J/g 225〇C 638J/g 硝酮D ~~ — 硝酮D -—~~ 硝酮D —_ —--- ----— 丄· 1 酸酯 0.5 : 1 165〇C 9J/g 257〇C 355J/g _TMI —__ 0.5 : 1 107°C 47J/g 253〇C 204J/g 1:1 140°C 42J/g 225〇C 418J/g D及E上存在酚型官能度可呈現將額外官能度及 刀子直及/或芳族性添加於此等硝酮之機會。酚型基可 二,,$吩型羥基反應的官能度之化合物或樹脂反應。此化 &lt;1=可含有不與酚型羥基反應的額外官能度,從而將該額外 1月b度添加於硝酮。再者,化合物可由各種長度與分支之脂 私鏈組成或由組合脂族基與芳香族基組成,以添加分子量及 /或^族性於硝嗣。本發明包含該等硝酮。 實施例14含有硝酮E、氰酸酯、環氧化物、丙烯酸酯、及 順丁烯二酸亞胺的組成物之DSC 硝酮E與氰酸酯、氰酸酯與環氧化物、順丁烯二醯亞 胺、及丙烯酸酯摻合且經DSC固化。結果報告於表6並指 出硝酮E固化若千化合物較硝酮D慢。 表6 :硝酮e、氰酿酯、環氧化物、丙烯酸酯、及順丁烯二 醯亞胺之DSC數據 28 200946560 組分 莫耳比 固化T1 ΔΗ1 固化T2 ΔΗ2 硝酮E : CE :環氧化物 0.5 : 1 : 1 170°C 44J/g 221〇C 243J/g 瑣嗣E : CE :環氧化物 1:1:1 142〇C 19J/g 171°C 185J/g 硝酮E : CE 1.5 : 1 132〇C 436J/g 227〇C 926J/g 硝酮E : CE 1:1 133〇C 454J/g 229〇C 572J/g 硝酮E : CE 0.5 : 1 135〇C 51J/g 178〇C 123J/g 硝酮E : CE 0.25 : 1 137〇C 6.8J/g 192〇C 295J/g 硝酮E:丙浠酸酯 1:1 160°C 24J/g 252〇C 548J/g 硝酮E:丙烯酸酯 0.5 : 1 158〇C 28J/g 275〇C 331J/g 硝酮E : TMI 1:1 126〇C 32J/g 241〇C 441J/g 石肖酮E : TMI 0.5 : 1 264〇C 127J/gDSC &amp; D of the composition of maleimide has a nitrone function and a phenolic functionality. Nitronone 〇 $ Aromatic acid, cyanate ester and epoxide, maleimide, and acrylic acid blended and cured by DSC. The results are reported in Table 5 and indicate that the two-stage curing process, which does not show the second m-peak, is based on the first-exothermic complete reaction. Table 5, nitrate-d, cyanate, epoxide, acrylate, and cis-butadiene-component Moer-specific cure △ HI Τ Curing Τ 2 ΔΗ2 27 15 200946560 Nitron D: Epoxide 0.5 : 1 : 1 140°C 32J/g 205〇C llOJ/g nitrone D: epoxide 1:1:1 138〇C 84J/g 169〇C 157J/g nitrone D CE 1:1 132〇C 362J/g 202〇C 543J/g nitrone D ----- CE 0.5 : 1 135〇C 382J/g 199〇C 88J/g nitrone D CE 0.4 : 1 141°C 721J/g 水氺本*氺氺氺氺氺 氺氺 D D ·&quot; —~~ ^CE 0.25 : 1 138〇C 142J/g 188〇C lOOJ/g Nitrate D acrylate 172〇C 16J/g 225〇C 638J/g nitrone D ~ ~ — nitrone D-—~~ nitrone D —_ —--- ----— 丄· 1 Acidate 0.5 : 1 165〇C 9J/g 257〇C 355J/g _TMI —__ 0.5 : 1 107 °C 47J/g 253〇C 204J/g 1:1 140°C 42J/g 225〇C 418J/g The presence of phenolic functionality on D and E can present additional functionality and knife straightness and/or aromaticity The opportunity to add these nitrones. The phenolic group can be reacted with a compound or a resin having a functionality of a hydroxy group. This &lt;1 = may contain additional functionality that does not react with the phenolic hydroxyl group, thereby adding this additional 1 month b to the nitrone. Further, the compound may be composed of a variety of lengths and branched aliphatic chains or a combination of aliphatic groups and aromatic groups to add molecular weight and/or grouping to the nitrate. The invention encompasses such nitrones. Example 14 DSC nitrone E containing a composition of nitrone E, cyanate ester, epoxide, acrylate, and maleic acid imide with cyanate ester, cyanate ester and epoxide, cis-butane The enediamine, and the acrylate are blended and cured by DSC. The results are reported in Table 6 and indicate that the nitrone E-curing compound is slower than the nitrone D. Table 6: DSC data for nitrone e, cyanide, epoxide, acrylate, and maleimide 28 200946560 Component Mobi cured T1 ΔΗ1 Cured T2 ΔΗ2 Nitron E: CE: Epoxy Compound 0.5 : 1 : 1 170 ° C 44 J / g 221 〇 C 243 J / g Tricholium E : CE : Epoxide 1:1:1 142 〇 C 19 J / g 171 ° C 185 J / g nitrone E : CE 1.5 : 1 132〇C 436J/g 227〇C 926J/g nitrone E : CE 1:1 133〇C 454J/g 229〇C 572J/g nitrone E : CE 0.5 : 1 135〇C 51J/g 178〇 C 123J/g nitrone E : CE 0.25 : 1 137〇C 6.8J/g 192〇C 295J/g nitrone E: propionate 1:1 160°C 24J/g 252〇C 548J/g nitrone E: Acrylate 0.5 : 1 158〇C 28J/g 275〇C 331J/g Nitron E: TMI 1:1 126〇C 32J/g 241〇C 441J/g Shishenone E: TMI 0.5 : 1 264〇 C 127J/g

實施例15 含有硝酮及環氧化物的組成物之DSC 硝酮亦能開環,因此例如環氧化物或氧代環丁烷的環將 由硝酮偶極引發開環。數個硝酮與環氧化物組合使用且經 DSC固化。結果報告於表9。 5 表9 :硝酮及環氧化物之DSC數據 組分 莫耳比 固化T1 △ HI 硝酮A 環氧化物 1 : 0,5 239。。 1173J/g 硝酮A 環氧化物 1:1 242。。 1042J/g 硝酮A 環氧化物 0.5 : 1 247〇C 795J/g 硝酮A 環氧化物 0.2 : 1 250〇C 600J/g 硝酮C 環氧化物 0.5 : 1 227〇C 578J/g 硝酮C 環氧化物 1:1 223〇C 625J/g 硝酮D 環氧化物 0.5 : 1 182〇C 350J/g 29 200946560 硝酮D:環氧化物 1:1 183〇C 496J/g 實施例16 含有硝酮F、丙烯酸酯、環氧化物、順丁烯二醯 亞胺、及氰酸酯的組成物之性質 經DSC測量,硝酮F以淨形式展現熔點為132°C與聚 合熱為1531J/g。其與其它樹脂可相混。TLC分析指出硝酮F 5 明顯地為非極性。DSC數據報告於表10。 表10 :硝酮F之DSC數據 組分 莫耳比 固4匕T1 △ HI 固4匕T2 ΔΗ2 硝酮F:丙烯酸酯 1:1 218〇C 692J/g 無 無 硝酮F:環氧化物 1 1 166。。 1029J/g 無 無 硝酮F : TMI 1 1 210°C 533J/g 無 無 硝酉同F : CE 1 1 164〇C 956J/g 258〇C 363J/g 調查硝酮F與環氧化物以不同莫耳比之TGA特性,結 果顯示於表11。 表11 :硝酮F、環氧化物、丙烯酸酯、及氰酸酯之TGA數 10 據 組分 莫耳比 於200°C的失重 硝酮F 14% 硝酮F 環氧化物 0.1 : 1 2% 硝酮F 環氧化物 0.2 : 1 4% 硝酮F 環氧化物 1:1 2.50% 硝酮F 丙烯酸酯 1:1 4.80% 硝酮F CE 1:1 2.30% 評估硝酮F與環氧化物及氰酸酯組合(乙醯丙酮鈷作為 30 200946560 觸媒,1重量%)之機械性質;結果報告於表12。在組成物 中使硝酮F用量從0.2莫耳增加至Q 4莫耳軸δη增加, 然而固化溫度降低U)。(:。硝酮F於增加的裝載亦改良經固化 材料之Tg (玻離轉移溫度)2〇i。 機械性質 對照: 環氧化物:氰酸 酯莫耳比2 : 1 〇.2莫耳硝酮jp +對照 質 0.4莫耳硝酮F +對照 固化峰 180°C » 241°C 180。。’ 245。。 170°C,241°C ΔΗ (J/g) 168 , 131 !3〇 &gt; 211 158 , 347 Tg ( DMA ) ^8°C -—*------ 98〇C l〇5°C E’@25C 6.80 E+09 7.71 E+09 5 86 E+09 Tg ( TM A ) _91°C 106°C lll〇C CTE &lt; Tg 1 _ 一 J 實施例17 础, 67.5 _丨_ 1 - ΓΛ 也… 64.5 71.4 ..... 哪工双、叼哪既酿、汉乳敗 ❹ _Example 15 A DSC nitrone containing a nitrone and epoxide-containing composition can also be ring-opened, so that a ring such as an epoxide or oxocyclobutane will be ring-opened by a nitrone dipole. Several nitrones are used in combination with the epoxide and cured by DSC. The results are reported in Table 9. 5 Table 9: DSC data for nitrone and epoxides Component Mohr ratio Curing T1 △ HI Nitron A epoxide 1 : 0,5 239. . 1173 J/g nitrone A epoxide 1:1 242. . 1042J/g nitrone A epoxide 0.5 : 1 247〇C 795J/g nitrone A epoxide 0.2 : 1 250〇C 600J/g nitrone C epoxide 0.5 : 1 227〇C 578J/g nitrone C epoxide 1:1 223〇C 625J/g nitrone D epoxide 0.5 : 1 182〇C 350J/g 29 200946560 nitrone D: epoxide 1:1 183〇C 496J/g Example 16 Contains The properties of the composition of nitrone F, acrylate, epoxide, maleimide, and cyanate were measured by DSC. The nitrone F exhibited a melting point of 132 ° C in a neat form and a heat of polymerization of 1531 J / g. It can be mixed with other resins. TLC analysis indicated that the nitrone F 5 was clearly non-polar. DSC data is reported in Table 10. Table 10: DSC data component of nitrone F. Moerbi solid 4匕T1 △ HI Solid 4匕T2 ΔΗ2 Nitron F: Acrylate 1:1 218〇C 692J/g No nitrone F: Epoxide 1 1 166. . 1029J/g without nitrone F: TMI 1 1 210°C 533J/g without nitrates F: CE 1 1 164〇C 956J/g 258〇C 363J/g Investigation of nitrone F differs from epoxide The TGA characteristics of the molar ratio are shown in Table 11. Table 11: TGA number of nitrone F, epoxide, acrylate, and cyanate 10 Weight loss nitrone F according to component molar ratio of 200 ° C 14% nitrone F epoxide 0.1 : 1 2% Nitronone F epoxide 0.2 : 1 4% nitrone F epoxide 1:1 2.50% nitrone F acrylate 1:1 4.80% nitrone F CE 1:1 2.30% Evaluation of nitrone F and epoxide The mechanical properties of the cyanate ester combination (cobalt acetonide as 30 200946560 catalyst, 1% by weight); the results are reported in Table 12. The amount of nitrone F was increased from 0.2 moles to Q4 molar axis δη in the composition, whereas the curing temperature was lowered by U). (:. The loading of nitrone F also improves the Tg (ionization transfer temperature) of the cured material by 2 〇 i. Mechanical Properties Control: Epoxide: Cyanate Moir Ratio 2 : 1 〇. 2 Mo Nit Ketone jp + control substance 0.4 molar nitrone F + control curing peak 180 ° C » 241 ° C 180. ' 245 ° 170 ° C, 241 ° C Δ Η (J / g) 168, 131 ! 3 〇 &gt; 211 158 , 347 Tg ( DMA ) ^8°C -—*------ 98〇C l〇5°C E'@25C 6.80 E+09 7.71 E+09 5 86 E+09 Tg ( TM A ) _91°C 106°C lll〇C CTE &lt; Tg 1 _ I J Example 17 Foundation, 67.5 _丨_ 1 - ΓΛ Also... 64.5 71.4 ..... Which work double, 叼 既 、, 汉 汉Lost _

醋之DSC及TGA 叫不同樹脂之固化性能及TGA特性,結果 二丄。石肖_ ^較硝’酉同A至卩任_者展現相當小的聚 类ml·的熱穩定性’顯示於20(rc失重少於10%。 DSP ;? ΤΓΛ G與順丁烯二醯亞胺、丙烯酸酯、及氰酸酯之 UbL· i〇A 固化T1 ΔΗ1 固化T2 ΔΗ2 於 200〇C 的失重 二展二林由增加硝酮分子量可減少ΔΗ。所有硝酮〇組The DSC and TGA of vinegar are called the curing properties and TGA characteristics of different resins. Shi Xiao _ ^ is better than the nitrates 酉 A to 卩 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ UbL·i〇A of imine, acrylate, and cyanate solidified T1 ΔΗ1 Curing T2 ΔΗ2 The weight loss at 200〇C is diminished. The increase in nitrocellulose molecular weight can reduce ΔΗ. All nitrone oxime groups

31 20094656031 200946560

Ο 綃酮G ----^ 淨 石亩酮&lt;3 : TMI 誚酮G:丙烤酸醋 1:1 石斑酮G : C£ 0.2 : —--- 減西同G . CE 1: Γ 同G:環氧似勿 1:1Ο 绡 G G ----^ 石 亩 & & 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 1:1 1:1 1:1 1:1 1:1 石 石 石 石 石 石 石 石 石Γ Same as G: Epoxy like 1:1

亦調查硝酮G之機械性質,結果報告於下列表中。以1 |:量%使用乙醯丙i同鈷作為固化引發劑。 t 14 :硝酮G、環氧化物及氮酸酯之機械性質 機械性質 對照 環氧化物:氰酸酯 莫耳比2 : 1 CoAcAc (III) 0.4莫耳硝嗣g + 對照 ^(DSC,完全固化) 122.2。。 110.9°C 固化峰(ΤΠ&amp;Τ2) 180°C,241°C 174〇C » 217〇c Tg ( TMA ) 88〇C 96〇C &quot;cTE&lt;Tg 63.6 78.9 7(GPa,25。。) 6.8 6.0 ~~ Tg (DMA ) 88〇C 99〇C 實施例18 含有硝嗣Η、丙稀酸醋、乳知· ®曰、及雙順丁稀二 醯亞胺的組成物之TGA及DSC 經DSC (微差掃描熱量計)及TGA (熱重量分析)評 估硝酮Η於各種樹脂配方中的特性。TGA結果指出硝酮η 展現良好的熱穩定性,與氰酸酯掺合於200°C展現最小失重 32 5 200946560 0.37%。結果揭示於表μ。 表15 :硝酮Η、丙烯酸酯、氰酸酯、及雙順丁烯二醯亞胺之 TGA及DSC數攄 組分 莫耳比 固化Τ1 Δ HI 固化T2 ΔΗ2 於 200〇C -----—^ ------ — 的失重 硝酮Η 淨 265〇C 125J/g 無 叙 1.62% 硝酮H : ΒΜΙ ι:ι 96〇C 60J/g 267〇C 188J/g 0.46% 硝酮Η:丙婦酸g旨 ι:ι 127〇C 88J/g 260〇C 248J/g 1,17% 硝酮H : CE 1:1 153〇C 356J/g M 4\%\ σ 益 〇 37% 硝酮H:環氧化物 香田,W: 1:1 ----- | 2.00%The mechanical properties of nitrone G were also investigated and the results are reported in the table below. Acetyl i and cobalt were used as curing initiators in an amount of 1 |: %. t 14 : mechanical properties of nitrone G, epoxide and nitrite mechanical properties control epoxide: cyanate molar ratio 2 : 1 CoAcAc (III) 0.4 mol 嗣 g + control ^ (DSC, completely Cured) 122.2. . 110.9 ° C curing peak (ΤΠ &amp; Τ 2) 180 ° C, 241 ° C 174 ° C » 217 ° C Tg ( TMA ) 88 〇 C 96 〇 C &quot; cTE &lt; Tg 63.6 78.9 7 (GPa, 25.) 6.8 6.0 ~~ Tg (DMA ) 88〇C 99〇C Example 18 TGA and DSC of a composition containing nitronium, acrylic acid vinegar, militaris oxime, and biscis dimethyl sulfoxide (Mirt scanning calorimeter) and TGA (thermogravimetric analysis) were used to evaluate the properties of nitrone oxime in various resin formulations. The TGA results indicate that nitrone η exhibits good thermal stability and exhibits minimal weight loss with cyanate ester blending at 200 ° C 32 5 200946560 0.37%. The results are revealed in Table μ. Table 15: TGA and DSC number of nitrone oxime, acrylate, cyanate, and bis-methyleneimine. Molybdenum cure Τ1 Δ HI Curing T2 ΔΗ2 at 200〇C ----- —^ ------ — Weightless nitrone oxime Net 265〇C 125J/g None 1.62% Nitrogen H: ΒΜΙ ι:ι 96〇C 60J/g 267〇C 188J/g 0.46% Nitrononone : 丙酸酸 g ι:ι 127〇C 88J/g 260〇C 248J/g 1,17% nitrone H : CE 1:1 153〇C 356J/g M 4\%\ σ 〇 37% nitrate Ketone H: Epoxide Xiangtian, W: 1:1 ----- | 2.00%

55

梦產物&gt;5用作為黏著劑及封裝劑,特別於半導體封 件)黏著於基底之_丄=: 充之封裝#丨或料覆所造成之間隙底部填 在進-步保護半導體封裝件之封裝劑。因此, 之半導體;及由軟焊接如本文所述組成物黏著於基底 r斑其;接於基底之半導體,1中在半導 &quot;sitr鄉紅間義財謂耻缝填充。 轉_著_置之陣列上半導雜裸晶及金 電連結且底部填充縣麻成物之 圖2描述以軟焊料與基底 倒裝晶片半導體。 _ 33 15Dream product &gt;5 is used as an adhesive and encapsulant, especially for semiconductor seals.) Adhesive to the substrate. 丄 : : : : : : 充 充 充 丨 丨 丨 丨 丨 丨 丨 丨 丨 丨 料 料 料 料 料 底部 底部 底部 底部 底部 底部 底部 底部 底部 底部 底部 底部 底部Encapsulant. Therefore, the semiconductor; and the composition of the solder as described herein adheres to the substrate r spot; the semiconductor connected to the substrate, 1 in the semi-conductor &quot;sitr township red money is said to be a shame filling. The upper semi-conductive micro-matrix and gold-connected array of the array are placed on the bottom of the array and the bottom-filled county is formed. Figure 2 depicts flip chip semiconductor with soft solder and substrate. _ 33 15

Claims (1)

200946560 十、申請專利範圍:200946560 X. Patent application scope: 2. 5 -種可固化組成物’包括 π厶铷,甘、I? ώ丄 但巧驷汉芏夕—種其它可固化 。物^自由%氧化物、氰酸酯 二醯亞胺、及其等組合所組成之組群。 丨員丁烯 根據申請補範圍第丨項之可固她成物,其中至少一種 其它可SHb化合物係選自由環氧化物及氰動旨所组 組群。 》 3.根據申請專利範圍第丨項之可固化組成物,其中至少一種 其它可固化化合物係選自由丙烯酸酯及順丁烯二醯亞胺 10 所組成之组群。 4·根據申請專利範圍第1項之可固化組成物,其中至少—種 其它可固化化合物係選自由2. 5 - Curable composition 'includes π 厶铷, 甘, I ώ丄 ώ丄 驷 驷 驷 驷 驷 驷 — — — — — — — — — — — — — — —. a group consisting of free % oxide, cyanate diimine, and combinations thereof. Employees butenes According to the application of the above paragraph, the at least one other SHb compound is selected from the group consisting of epoxides and cyanogens. 3. The curable composition according to claim 3, wherein the at least one other curable compound is selected from the group consisting of acrylate and maleimide 10. 4. The curable composition according to claim 1, wherein at least one of the other curable compounds is selected from the group consisting of 34 15 7200946560 P34 15 7200946560 P Ο ΟΟ Ο Ο ο jsj -甘 χ|ϊ 7H36表示36個碳原子之線型或分支鏈 k具有或沒有環狀部分)、 4項任一項之可固化組成物,其 及其等組合所组成之組群n 5.根據申請專利範圍第]至 中硝酮係選自由ο ο jsj - 甘χ|ϊ 7H36 represents a linear or branched chain of 36 carbon atoms with or without a cyclic moiety), a curable composition of any of the four, and a combination thereof 5. According to the scope of the patent application, the medium nitrone is selected from 1010 3 Η3〇^οθ3 Η3〇^οθ 35 20094656035 200946560 10 (硝酮E)、10 (nitrone E), 及 36 200946560And 36 200946560 (硝酮Η ) 所組成之組群。 Q 6. —種半導體封裝件,包括用含有硝酮及至少一種其它可固 5 化化合物的組成物黏著於基底之半導體。 7.根據申請專利範圍第6項之半導體封裝件,其中一種其它 可固化化合物係選自由環氧化物、氰酸S旨、丙烤酸S旨、順 丁烯二醯亞胺、及其等組合所組成之組群,硝酮係選自由 Hi^〇rcH3 10 (硝酮A )、 ❿ H3C|〇e f · ηΛ 0〇xe - CHS V_y/X (硝酮B )、 37 200946560a group consisting of (nitrone oxime). Q 6. A semiconductor package comprising a semiconductor adhered to a substrate with a composition comprising a nitrone and at least one other fixable compound. 7. The semiconductor package according to claim 6, wherein one of the other curable compounds is selected from the group consisting of an epoxide, a cyanic acid, a propionic acid, a maleimide, and the like. The group consisting of nitrone is selected from Hi^〇rcH3 10 (nitrone A), ❿H3C|〇ef · ηΛ 0〇xe - CHS V_y/X (nitrone B), 37 200946560 (石肖酉同E)、(Shi Xiaotong with E), 1010 及 38 200946560And 38 200946560 (硝酮Η) 所組成之組群。a group consisting of (nitrone oxime). 8. —種由軟焊接頭電連接於基底之半導體封裝件,其中在半 導體與基底間由軟焊接頭形成之間隙係以包括硝酮及至 少一種其它可固化化合物的組成物填充。 9. 根據申請專利範圍第8項之半導體封裝件,其中一種其它 可固化化合物係選自由環氧化物、氰酸酯、丙烯酸酯、順 丁烯二醯亞胺、及其等組合所組成之組群,硝酮係選自由8. A semiconductor package electrically connected to a substrate by a solder joint, wherein a gap formed by the solder joint between the semiconductor and the substrate is filled with a composition comprising nitrone and at least one other curable compound. 9. The semiconductor package of claim 8 wherein one of the other curable compounds is selected from the group consisting of an epoxide, a cyanate, an acrylate, a maleimide, and the like. Group, nitrone is selected from 10 G10 G 39 20094656039 200946560 (硝酮D )、(nitrone D), (硝酮E)、(nitrone E), 10 H3C、10 H3C, 及 40 200946560And 40 200946560 所組成之組群 Ο ❹ 41 200946560 七、指定代表圖: (一) 本案指定代表圖為:第(1 )圖。 (二) 本代表圖之元件符號簡單說明: 無 ❹10 八、本案若有化學式時,請揭示最能顯示發明特徵的化學式: 無The group formed Ο ❹ 41 200946560 VII. Designated representative map: (1) The representative representative of the case is: (1). (2) A brief description of the symbol of the representative figure: None ❹10 VIII. If there is a chemical formula in this case, please disclose the chemical formula that best shows the characteristics of the invention:
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