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TW200930319A - Ion discharge device - Google Patents

Ion discharge device Download PDF

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Publication number
TW200930319A
TW200930319A TW097150399A TW97150399A TW200930319A TW 200930319 A TW200930319 A TW 200930319A TW 097150399 A TW097150399 A TW 097150399A TW 97150399 A TW97150399 A TW 97150399A TW 200930319 A TW200930319 A TW 200930319A
Authority
TW
Taiwan
Prior art keywords
ion
air
electrode
discharge
flow path
Prior art date
Application number
TW097150399A
Other languages
Chinese (zh)
Inventor
Tetsuya Maekawa
Yasunori Matsui
Asako Ogawa
Takayuki Nakada
Original Assignee
Panasonic Elec Works Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Panasonic Elec Works Co Ltd filed Critical Panasonic Elec Works Co Ltd
Publication of TW200930319A publication Critical patent/TW200930319A/en

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    • AHUMAN NECESSITIES
    • A45HAND OR TRAVELLING ARTICLES
    • A45DHAIRDRESSING OR SHAVING EQUIPMENT; EQUIPMENT FOR COSMETICS OR COSMETIC TREATMENTS, e.g. FOR MANICURING OR PEDICURING
    • A45D20/00Hair drying devices; Accessories therefor
    • A45D20/04Hot-air producers
    • A45D20/08Hot-air producers heated electrically
    • A45D20/10Hand-held drying devices, e.g. air douches
    • A45D20/12Details thereof or accessories therefor, e.g. nozzles, stands
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/2406Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • AHUMAN NECESSITIES
    • A45HAND OR TRAVELLING ARTICLES
    • A45DHAIRDRESSING OR SHAVING EQUIPMENT; EQUIPMENT FOR COSMETICS OR COSMETIC TREATMENTS, e.g. FOR MANICURING OR PEDICURING
    • A45D2200/00Details not otherwise provided for in A45D
    • A45D2200/20Additional enhancing means
    • A45D2200/202Ionisation

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Disinfection, Sterilisation Or Deodorisation Of Air (AREA)
  • Elimination Of Static Electricity (AREA)
  • Cleaning And Drying Hair (AREA)
  • Electrostatic Spraying Apparatus (AREA)

Abstract

Disclosed is an ion discharge device which can stably generate ions for a long time by employing microplasma discharge. The ion discharge device is provided with a main body case (1), an air passage (4) formed to penetrate the main body case (1), and an air blowing section (5) and an ion generating section (6) which are arranged in the air passage (4). Furthermore, the ion generating section (6) is provided with an electrode section (8), and an insulating spacer (7) which is arranged in close contact with or in the vicinity of the electrode section (8). Electricity is discharged in a fine discharge space (S) formed along the insulating spacer (7) by applying a high voltage to an electrode section (8). The air passage (4) is formed to permit the air sent for the ion generating section (6) to pass through both the discharge space (S) and the outer circumference surface of the electrode section (8).

Description

200930319 六、發明說明: 【發明所屬之技術領域】 本發明係有關於-種發射藉由微電衆放電所產 生之離子的離子發射裝置。 【先前技術】200930319 VI. Description of the Invention: TECHNICAL FIELD OF THE INVENTION The present invention relates to an ion-emitting device that emits ions generated by micro-electrical discharge. [Prior Art]

迄今,具備送風部及離子產生部之離子發射裝 置已知的是例如於日本專利公開公報特開2 〇 〇 2 1 9 1 4 2 6號公報中所揭示般具有離子產生機 能的吹風機’該吹風機之結構係自配置有送風部之 風路途中使離子流路分歧,並於該離子流路内配置 離子產生部,且使料產生料產生之貞離子乘著 風朝外部發射。-般而言,前述離子產生部係於針 電極與接地電極間施加高電壓,並#由電暈放電產 ❹ 不過 以產生離子之機構已知的是使用微電 聚放電來產生籬+夕纟士 4致 ..^ 千之、、、口構。右稭由使用該微電漿放 電之離子產生部,則可藉由比電暈放電更高之電力 得非常高的離子產生能力,然而,在使用該 、’《 B、,由於放電部分周邊之氣體溫度會提高,因 士賦予電極#之負載會變大,故,為了要長時間安 定地產生離子’電極部之去熱會成為重大課題。 200930319 【發明内容】 200930319 目的在提供 生離子之離 本發明係有鑑於 一種可使用微電漿放 子發射裝置。 則述問題所發明, 電長時間安定地產 :了f的,本發明係作成一Heretofore, an ion-emitting device having a blower portion and an ion-generating portion is known as a blower having an ion generating function as disclosed in Japanese Laid-Open Patent Publication No. Hei 2 No. 2 1 1 1 2 2 In the structure, the ion flow paths are branched in the middle of the air path in which the air blowing portion is disposed, and the ion generating portion is disposed in the ion flow path, and the helium ions generated by the material generating material are emitted to the outside by the wind. In general, the ion generating portion applies a high voltage between the needle electrode and the ground electrode, and # is produced by corona discharge. However, a mechanism for generating ions is known to use a micro-electrical discharge to generate a fence.士4致..^千之,,,口口. The right straw is obtained by using the micro-plasma discharge ion generating portion, and the ion generating ability can be obtained by a higher electric power than the corona discharge. However, in the use of the "B, due to the gas around the discharge portion The temperature is increased, and the load applied to the electrode # is increased. Therefore, it is a major problem to generate the ion in the electrode portion for a long time. 200930319 SUMMARY OF THE INVENTION 200930319 The object of the present invention is to provide a microplasma discharge device. Invented by the problem, the electricity is stable for a long time: the f, the invention is made into one

子發射裝置具備:本體殼體;風路, 係貝通形成於本體殼體者; :有係;::風路中者。再者,前述離子= 配置於附近者,二絕::^牛,係與電極部密接或 沿著絕绫八η 於電極部施加高電壓,於 、、、刀同件所形成之微小放電空間内產生放 電。且,前述風路係形成為送入前述離子產 送風,可同時通過放電空間與電極部之外周面。The sub-emitting device includes: a body casing; a wind path, and the beacon is formed in the body casing; : a system;:: a wind road. Further, the ion = is disposed in the vicinity, and the second:: ^ cow is in close contact with the electrode portion or a high voltage is applied to the electrode portion along the absolute electrode, and the micro discharge space formed by the same piece of the knife is formed. A discharge is generated inside. Further, the air passage is formed to feed the ion-producing wind, and can simultaneously pass through the discharge space and the outer peripheral surface of the electrode portion.

若依此構成,則可藉由送人放電空間之 將該放電空間内藉由措雷將 μf地生叙離子搬送 至下游側,同時藉由沿著電極部之外周面送入之 几使電極。Ρ有效地散熱,因此可長時間安定、 生及發射離子。 座 扣另,於前述構造之離子發射裝置中,前述放電 空間宜為設置於絕緣分隔件之貫通孔、及絕緣 件與電極部間所形成之間隙中的兩者或—者。若藉 ^ °亥構造,則可利用貫通孔或間隙之適當組合,以 向自由度來δ受定用以產生放電之放電空間。 4 200930319 侧配晉^述離子產生部宜於央持絕緣分隔件之兩 二L 且於兩側電極部間施加高電壓。若 依此構成,則可安定地產生放電。 右 再者,此時,前 隔件之兩側電極部中 密接。若依此構成, 隔件如散熱片般作用 部長期安定地散熱。According to this configuration, the electrode can be transported to the downstream side by the transfer of the discharge space by means of the discharge space, and the electrode can be made by feeding along the outer peripheral surface of the electrode portion. . Ρ effectively dissipates heat, so it can stabilize, generate and emit ions for a long time. Further, in the ion-emitting device of the above configuration, the discharge space is preferably either a through hole provided in the insulating spacer and a gap formed between the insulating member and the electrode portion. If the structure is used, it is possible to use a suitable combination of through holes or gaps to determine the discharge space for generating the discharge to the degree of freedom δ. 4 200930319 The side-and-for-throw ion generation unit is preferably to hold two or two L of insulating spacers and apply a high voltage between the electrode portions on both sides. According to this configuration, the discharge can be stably generated. Right again, at this time, the electrode portions on both sides of the front spacer are in close contact. According to this configuration, the spacers, such as the heat sink, act to cool heat for a long period of time.

述離子產生部宜使夾持絕緣分 的兩者或一者與該絕緣分隔件 則可使與電極部密接之絕緣分 ,並透過該絕緣分隔件使電極 ~、且匕含有複數個前述離子產生部且盘高 ::加部並聯連接,並自該高塵施加部對各離;產 則;::極部施加脈衝狀之高電壓。若依此構成, ::::泥於個體間差異而可於複數離子產生部之 放電且不會不平衡,全體可產生大量之離 ❹ 將二1亦宜於前述風路分歧形成:第-流路,係 二虫广戶斤產生之送風的一部分送入放電空間内 ^及第H係將送風部所產生之送風的另— ^刀^著電極部之外周面通過並送人者。若依此構 藉由:過第—流路送入貫通孔内之送風, =貝通孔Μ由微Μ大量地生成之離子搬送至 Γ侧’㈣藉由透過第二流路沿著放電部之外周 =入之送風’使電極部有效地散熱,因此可長時 間女定地產生及發射離子。 200930319 再者’此時宜具備調整閥,且該調整閥係可變 動流入前述風路中之第一流路與第二流路之送風比 例者。若依此構成’則只要藉由控制調整閥,即可 依照狀況適當地調整用以自貫通孔内搬送離子之風 量及用以將電極部氣冷之風量。Preferably, the ion generating portion is configured such that either or both of the insulating members and the insulating spacer can be insulated from the electrode portion, and the insulating separator can be used to cause the electrode to contain a plurality of the ions. Part and disc height:: The addition parts are connected in parallel, and the high-voltage application part is applied to each of the high-dust application parts; the production:;: the pole part is applied with a pulsed high voltage. According to this configuration, :::: mud can be discharged in the complex ion generating portion without unevenness, and all of them can generate a large amount of separation. The second is also suitable for the formation of the above-mentioned wind path divergence: The flow path is sent to the discharge space by a part of the air blow generated by the two insects, and the H-th system passes the other side of the electrode portion of the air supply unit and passes it to the person. According to this configuration, the air flowing through the through hole is passed through the first-flow path, and the beta channel is transported by the ions generated by the micro-small to the side of the crucible (4) by passing through the second flow path along the discharge portion. The outer circumference = the air supply into the air portion allows the electrode portion to efficiently dissipate heat, so that ions can be generated and emitted for a long time. 200930319 Further, it is preferable to provide an adjustment valve at this time, and the adjustment valve is a ratio of the air flow that flows into the first flow path and the second flow path in the air path. According to this configuration, by controlling the adjustment valve, the air volume for transporting ions from the through hole and the amount of air for cooling the electrode portion can be appropriately adjusted depending on the situation.

❹ 則述調整閥宜為可變動送風比例以將第一流路 I之風量保持為略呈一定者。若依此構成,則可安 定地進行貫通孔内之微電漿放電。 片 電 2,亦宜於前述離子產生部之電極部設置散熱 。若依此構成,則可增加電極部的表面積,並使 極部更有效地散熱。 又,亦宜於前述風路中比前述離子產生部更上 游側處配置冷卻部。甚彳 接 A卻邱w ]可將業已透過 :部#部之空氣送入’並使電極部以更高效率散 前述冷卻部亦宜使用帕耳帖單元 成,則可使裝置全體小魏及輕量化。右依此構 此播:’ ϋ宜於前述風路中配置霧氣附加部。若依 4爽峰…J 霧氣附加部附加霧氣之 工亂來生成及發射離子霧。 別L霧氣附加部φ冑使賴耳+ 水。若依此構成,則可 几爪生成露 吏裝置王體小型化及輕量化, 6 200930319 ^亦可於送風中持續地供給水分而生成及發射離子 此時,前述霧氣附加部亦宜酉己置於 比前述離子產生部更上游側處。若依此構成= 元之前述霧氣附加部可兼作生成冷卻風 而使電極邛以更尚效率散熱之冷卻部。 ❹ ❹ 【實施方式】 一以下根據附圖所示之實施形態說明本發明,第 A、一 B圖係顯示本發明訾 子發射裝置。 月貫㈣態中弟-例之離 本例之離子發射裝置係使吸入 朝構成裝置全體之外殼的本體殼體i之;二!:3 且於本體殼體i内貫通形成可連通吸入口 口 3之風路4。於風路 /、表射 游侧,且將離子產…二…5配置於上 千產生邛6配置於下游側,送風部5 係由送風扇所構赤,B 丄& 藉由使該送風扇旋轉驅動, 將本體殼體1外之莉 之工軋自吸入口2導入風路4内並 自發射口 3朝外部發射。 離子產生4 6係圖示般之空心陰極型,且藉 於板狀絕緣分隔件7之戶# 為板狀之金屬製電㈣f向兩側密接配置同樣 持絕緣分隔件;之έ::8 ?成以一對電極部8夾 r之結構。一對電極部8係透過高壓 7 200930319 施加部9電連接,且於兩電極部8間施加高電壓。 於絕緣分隔件7及電極部8上分別以同一開口 =狀 設置朝厚度方向貫通之貫通孔2 〇、工9 ,且藉由 絕緣分隔件7與電極部8之前述密接配置,絕緣分 隔件7之貫通孔1 〇與兩側電極部8之貫通孔1 9 係於厚度方向連通成一直線狀,且前述貫通孔1 〇、1 9之孔徑D係設置成數百之微小直徑。 ❹ 於屬風路4之局部且配置有離子產生部6之部 分,係分歧而形成有第一流路R 1與第二流路R 2 ^第一流路r ;[係將藉由送風部5所送入之送風 的一部分導入前述離子產生部6之貫通孔1〇、工 9内,且使其通過該貫通孔1 0、1 9内後朝下游 侧發射。又,第二流路R 2係將藉由送風部5所送 入之送風的另一部分(即,被送入離子產生部6之 ❾ 送風王體中除了流入第一流路R 1之部分以外的部 刀)沿著前述離子產生部6之兩側電極部8的露出 面流動後,使其朝下游側發射。 第一流路R 1與第二流路R 2係設置成兩者R 1、R 2於相互之上游端分歧後在下游端合流。於 風路4之第一流路R jL與第二流路R 2之分歧部分 的上游,形成越是接近該分歧部分流路截面越會逐 漸地縮小之上游側錐形部11,又,於風路4之第 —流路R1與第二流路r 2之合流部分的下游,形 8 200930319 成越疋遠離该合流部分流路截面越會逐漸地變大之 下游側錐形部1 2。❹ The adjustment valve is preferably a variable air supply ratio to keep the air volume of the first flow path I slightly constant. According to this configuration, the microplasma discharge in the through hole can be stably performed. The sheet 2 is also preferably provided with heat dissipation at the electrode portion of the ion generating portion. According to this configuration, the surface area of the electrode portion can be increased, and the electrode portion can be more efficiently radiated. Further, it is preferable that a cooling portion is disposed on the upstream side of the ion generating portion in the air passage.彳 彳 却 却 却 ] ] ] ] ] ] ] ] ] ] ] ] ] ] ] ] ] ] ] ] ] ] ] ] ] ] ] ] ] ] ] ] ] ] ] ] ] ] ] ] ] ] ] ] Lightweight. Right according to this structure, this broadcast: ' ϋ 配置 配置 配置 配置 配置 配置 配置 配置 配置 配置 配置 配置 配置 配置 配置 配置 配置If the 4th peak...J mist attachment unit is attached to the fog, the ion mist is generated and emitted. Do not let the L mist add-on φ 赖 赖 + water. According to this configuration, it is possible to reduce the size and weight of the body of the dew device by a few claws. 6 200930319 ^ It is also possible to continuously supply water to generate and emit ions during the air supply, and the mist attachment unit should also be placed. It is at the upstream side of the ion generating portion. According to this configuration, the mist adding portion can also serve as a cooling portion for generating a cooling air to dissipate the electrode 更 more efficiently. [Embodiment] The present invention will be described below with reference to the embodiments shown in the drawings, and the drawings A and B show the scorpion launching device of the present invention. In the case of the continuation (fourth) state, the ion-emitting device of the present example is sucked into the body casing i of the outer casing constituting the entire device; the second::3 and penetrates into the body casing i to form a connectable suction port. 3 wind road 4. On the wind road /, the surface of the table, and the ion production ... 2 ... 5 is placed in the thousands of generations 邛 6 placed on the downstream side, the air supply part 5 is configured by the fan, B 丄 & The fan is rotationally driven, and the workpiece rolling from the outside of the main body casing 1 is introduced into the air path 4 from the suction port 2 and emitted from the emission port 3 to the outside. The ion generating 4 6 is a hollow cathode type as shown in the figure, and the household made of the plate-shaped insulating separator 7 is made of a plate-shaped metal (four) f, and the insulating members are also closely attached to the two sides; the following:: 8 ? The structure is formed by sandwiching a pair of electrode portions 8. The pair of electrode portions 8 are electrically connected to the application unit 9 through the high voltage 7 200930319, and a high voltage is applied between the two electrode portions 8. The through-holes 2 and 9 penetrating in the thickness direction are respectively provided in the insulating spacer 7 and the electrode portion 8 in the same opening shape, and the insulating spacer 7 is disposed in close contact with the electrode portion 8 by the insulating spacer 7 and the insulating spacer 7 The through hole 1 〇 and the through hole 1 9 of the both side electrode portions 8 are connected in a line shape in the thickness direction, and the hole diameter D of the through holes 1 〇 and 19 is set to a small diameter of several hundreds.部分 The portion of the air path 4 and the portion where the ion generating unit 6 is disposed is divided into a first flow path R 1 and a second flow path R 2 ^ the first flow path r; [the system will be provided by the air supply unit 5 A part of the supplied air is introduced into the through holes 1 and 9 of the ion generating unit 6, and is passed through the through holes 10 and 19 and then emitted toward the downstream side. Further, the second flow path R 2 is a part of the air blown by the air blowing unit 5 (that is, a part of the air blowing unit that is sent to the ion generating unit 6 except for the portion that flows into the first flow path R 1 . After flowing along the exposed surfaces of the electrode portions 8 on both sides of the ion generating portion 6, the particles are emitted toward the downstream side. The first flow path R 1 and the second flow path R 2 are disposed such that both R 1 and R 2 merge at the upstream end and then merge at the downstream end. The upstream side of the diverging portion of the first flow path R jL and the second flow path R 2 of the air path 4 forms an upstream side tapered portion 11 which gradually narrows toward the cross section of the flow path of the branch portion, and The downstream of the merged portion of the flow path R1 and the second flow path r2, the shape 8 200930319 becomes the downstream side tapered portion 12 which gradually becomes larger as the cross section of the flow path is larger.

❹ 於第一流路R i與第二流路R 2之分歧部分包 含有調整閥1 3,且該調整閥i 3可變動於風路4 内朝離子產生部6流動之送風中流人第-流路R 1 Y、第一机路R 2之送風比例。於本例中包含有用以 調整第一流路尺1之開口的球閥以作為前述調整閥 ^ …丨而,亦可為其他閥結構。前述調整閥1 3 係與離子發射I置之控制電路部2 Q連接,且藉由 該控制電路部2 0進行控制,以將流入第一心R 1之达風w里保持為略呈—^量。前述控制電路部 2 0係驅動控制送風部5、高壓施加部g、調整闕 1 3等以取得所期望量之離子及送風量。 / /刀隔第一流路R 1與第二流路R 2之隔壁部工 4係由管狀之隔壁丄4 a與同樣呈管狀之隔壁工‘ b所構成,該隔壁工4 a係分隔第一流路只丄之上 游側^刀(即’自分歧部分將送風導引至貫通孔1 〇、1 9内的部分)及與其並列設置之第二流路R 2之上游側部分,該隔壁1 4 b則分隔第一流路尺 1之下游側部分(即,將發射自貫通孔工〇、工9 =送風導引至合流部分的部分)及與其並列設置之 第二流路尺2之下游側部分。兩隔壁1 4 a、1 4 b係設置成其端部與電極部8之平板面密接。 9 200930319 八^又,第二流路R 2沿著電極部8流動之散熱部 “ 5係構成以下形狀’即:使沿著上游側電極呷 8之平板面通過的部分! 5 a ;跨越中央之絕緣分 隔件7且沿著兩側電極部8之外周面通過的部分丄 5 b ;及沿著下游側電極部8之平板面通過的部分 1 5 c連通成側視下呈反「匚」字狀。 於由前述構造所構成之本例之離子發射裝置 ❹巾’㈣下未®示之操仙“絲子生成之開始 指令輸出至控制電路部2 〇,則控制電路部2 〇合 藉由送風部5將外部大氣導人風路4内並朝離子^ 生邛6送風,同時藉由高壓施加部9於離子產生部 6,電極部8間施加高電壓。藉由該高電壓施加: 於設置在離子產生部6之絕緣分隔件7之貫通孔1 〇7會開始放電,且於該貫通孔丄〇内以高密度生 B 成,米尺寸之微小電漿(以下稱作「微電漿」)Γ藉 由前述貫通孔1〇内之微電漿放電,相較於電暈^ 電可以更高密度生成離子,即,於本例中,藉由具 有數百/zm之孔徑D的前述貫通孔i 〇,形成沿^ 絕緣分隔件7之微小放電空間s。 藉由送風部5朝離子產生部6傳送之送風會透 過上游侧錐形部1 1加壓後分流至第一流路尺I與 第二流路R 2。穿過第一流路r χ之上游侧部分; 一直線狀導入至離子產生部6之貫通孔1〇、 10 200930319 内之送風會使貫通孔i㈣以 有效地朝下游側搬出, 厅生成之離子 谢朝風…之下之下游 牙過第-流路R 2之上游側部 = 部分15之送風會透過 之放熱 狀的各部分15a、l5h成二下王反「〔」字 電極部8之平板面及外月 c ’沿者上游側分歧 The diverging portion of the first flow path R i and the second flow path R 2 includes a regulating valve 13 , and the adjusting valve i 3 can be varied in the air flow flowing into the air generating portion 6 into the first flow of the air flowing into the ion generating portion 6 The ratio of the air supply to the road R 1 Y and the first machine path R 2 . In this example, a ball valve for adjusting the opening of the first flow path 1 is included as the above-described adjustment valve, and may be another valve structure. The adjustment valve 13 is connected to the control circuit unit 2 Q of the ion emission I, and is controlled by the control circuit unit 20 to keep the wind flowing into the first core R 1 slightly -^ the amount. The control circuit unit 20 drives and controls the blower unit 5, the high pressure application unit g, the adjustment 阙1, and the like to obtain a desired amount of ions and air supply amount. / / The partition wall portion 1 of the first flow path R 1 and the second flow path R 2 is composed of a tubular partition wall 丄 4 a and a tubular body partition wall b, which partitions the first flow The upstream side of the road is only the knives (ie, the portion from the branching portion that guides the supply air to the through holes 1 〇, 19) and the upstream side portion of the second flow path R 2 that is juxtaposed thereto, the partition wall 14 b separating the downstream side portion of the first flow path rule 1 (i.e., the portion that is emitted from the through hole process, the work 9 = the air supply guide to the merge portion) and the downstream side portion of the second flow path 2 disposed therewith . The two partition walls 14a and 14b are disposed such that their end portions are in close contact with the flat surface of the electrode portion 8. 9 200930319 Further, the heat dissipation portion of the second flow path R 2 flowing along the electrode portion 8 "5 forms the following shape": a portion through which the flat surface of the upstream side electrode 8 passes; 5 a ; a portion of the insulating spacer 7 and passing along the outer peripheral surface of the both side electrode portions 8; and a portion 15c passing along the flat surface of the downstream side electrode portion 8 are connected in a side view to be "反" Word shape. In the ion-emitting device of the present embodiment, which is constituted by the above-described structure, the output command of the filament generation is output to the control circuit unit 2, the control circuit unit 2 is coupled to the air supply unit. 5, the outside air is guided into the air passage 4 and supplied to the ion generating chamber 6, and a high voltage is applied between the electrode portion 8 by the high voltage applying portion 9 to the ion generating portion 6. By the high voltage application: The through hole 1 〇7 of the insulating spacer 7 of the ion generating portion 6 starts to discharge, and is formed at a high density in the through hole, and a small plasma of a rice size (hereinafter referred to as "microplasma") Γ By the microplasma discharge in the through hole 1〇, ions can be generated at a higher density than the corona electrode, that is, in the present example, the through hole having the aperture D of several hundred/zm i 〇, a minute discharge space s is formed along the insulating spacer 7. The air blown to the ion generating unit 6 by the air blowing unit 5 is pressurized by the upstream tapered portion 11 and then branched to the first flow path I and the second flow path R 2 . The upstream side portion of the first flow path r 穿过 passes through the through holes 1〇, 10 200930319 which are linearly introduced into the ion generating portion 6, so that the through hole i (4) is effectively carried out toward the downstream side, and the ion generated by the hall is Xie Chaofeng The downstream side of the downstream tooth-passing path R 2 is the upper side of the first-flow path R 2 = the portion 15 of the heat-dissipating portion 15a, l5h that passes through the heat-dissipating portion is formed into a flat surface of the "["-shaped electrode portion 8 and Month c' along the upstream side

周面及平板面繞入、S且:Γ電極部8之外 部8之熱後,穿過第路::有效地解除兩電極 、罘一机路R 2之下游側部分朝風 路4内之下游側錐形部i 2放出。 ❿ 、自第-流路R1朝下游侧放出且含有大量離子 之送風與自第二流路R 2朝下游側放出之受妖後之 送風係於下游侧錐形部1 2内合流,且伴隨著合流 後之充分流量後透過發射口 3朝本體殼體^外發 射。乘著該發射風,藉由離子產生部6之微電漿放 電所大量生成之離子會朝外部空間強勢地發射。 如前所述,此時,由於控制電路部2 〇係控制 调整閥1 3之開口以使流入第一流路r 1之送風流 $保持為略呈一定量(換言之,納入預定之適當範 圍内)’因此,貫通孔1 〇内之微電漿放電不會影響 到風路4全體之風量而可安定地進行,具體而言, 藉由控制電路部2 〇控制調整閥1 3,以使送風部 已之輪出越大,流入第一流路R 1之風量比例會越 11 200930319 J又亦可為以下結構,即:包含有可檢測穿@ 第:流路…之風量(即’穿過貫通孔1〇= 風里)的感测器,並依照該感測器之輪出,The circumferential surface and the flat surface are wound around, and the heat of the outer portion 8 of the electrode portion 8 is passed through the first path: the two electrodes are effectively released, and the downstream side portion of the first machine path R 2 is downstream of the air path 4 The side tapered portion i 2 is discharged.送 , the air blown from the first flow path R1 toward the downstream side and containing a large amount of ions and the air blown from the second flow path R 2 to the downstream side are merged in the downstream side tapered portion 12, and are accompanied by After the combined flow, the sufficient flow rate is transmitted through the emission port 3 to the outside of the body casing. By the emission of the wind, a large amount of ions generated by the micropulp discharge of the ion generating portion 6 are strongly emitted toward the external space. As described above, at this time, since the control circuit unit 2 controls the opening of the regulating valve 13 to keep the air flow amount flowing into the first flow path r 1 to a certain amount (in other words, it is included in the predetermined appropriate range) Therefore, the micro-plasma discharge in the through-hole 1 does not affect the air volume of the entire air path 4, and can be stably performed. Specifically, the control circuit unit 2 controls the adjustment valve 13 to make the air supply unit. The larger the wheel has been, the more the air flow rate into the first flow path R 1 will be. 11 200930319 J can also be the following structure, that is, the air volume including the detectable wear @第:流路... 1〇 = wind in the sensor, and according to the sensor's turn,

電路部2 〇控制調整閥1 3。 I ❹The circuit unit 2 〇 controls the adjustment valve 13 . I ❹

依此,若藉由本例之離子發射裝置,則可藉由 離子產生部6之兩電極部8有效地散熱:並 猎由貝通孔1 〇内之微電漿放電生成大量之離子, 且將在此所產生之大量離子藉由送風有效地自貫通 ^10内搬送至下游側,並使散熱用送風與離子搬 l用送風合流後,伴隨著充分之風量朝外部發射。 二在此朝外部放出之離子中含有硝酸離子,且含 有該確酸離子的水會將頭髮或皮膚保持在弱酸性, =時藉由該石肖酸離子所具有之高水合力使頭髮或皮 保持水分。又,藉由適當地控制放電條件,亦可 生成及放出超氧自由基或羥自由基,此時,可取得 脫臭效果、除菌效果、過敏原鈍化效果、農藥分解 效果或有躺讀(㈣)縣。H解 月1J述構4之離子發射裝置例如可作成吹風機使 I,作成該吹風機使用時會構成以下結構,即:使 貝通形成於本體殼體1内之風路4中比送風部5更 、参側口P刀刀歧成雙向,並於分歧之一者配置前述 子產生部6且使離子發射口開口,並;^另一者配 置加熱器且使溫風發射口開口。 12 200930319 第二圖係顯示離子產生部6之電極 例。於該變形例中,启μ $ 支开/ 在上游側及下游側電極部8露 =平板面突設多數散熱片16,藉由前述散心 二=:rR2内流動之送風所接觸之電極 =的表面積會增加’且可更有效地進行利用氣冷 之電極部8之去熱。According to this, if the ion emitting device of this example is used, the two electrode portions 8 of the ion generating portion 6 can be effectively dissipated: and a large amount of ions are generated by the microplasma discharge in the Beton hole 1 ,, and The large amount of ions generated here are efficiently transported from the inside of the through hole 10 to the downstream side by the air blow, and the air blower for heat dissipation is merged with the air blow by the ion transport, and then emitted to the outside with a sufficient air volume. 2. The ions emitted to the outside contain nitrate ions, and the water containing the acid ions will keep the hair or skin weakly acidic, and the hair or skin will be made by the high hydration force of the stone acid ions. Keep moisture. Further, by appropriately controlling the discharge conditions, super-oxygen radicals or hydroxyl radicals can be generated and released, and at this time, a deodorizing effect, a sterilization effect, an allergen passivation effect, a pesticide decomposition effect, or a lying reading can be obtained ( (4) County. For example, the ion emitting device of the fourth embodiment can be made into a hair dryer to make I. When the hair dryer is used, the following configuration is adopted, that is, the air passage 4 in which the beacon is formed in the main body casing 1 is more than the air blowing portion 5; The side-side P-knife is bidirectional, and the sub-generating portion 6 is disposed in one of the divisions and the ion-emitting opening is opened, and the other is configured with a heater and the warm-air emission opening is opened. 12 200930319 The second figure shows an example of an electrode of the ion generating unit 6. In this modification, the opening μ $ is open/the upstream side and the downstream side electrode portion 8 are exposed to the flat surface, and a plurality of fins 16 are protruded, and the electrodes which are in contact with the air flowing through the air gap ==rR2== The surface area is increased 'and the heat removal by the air-cooled electrode portion 8 can be performed more efficiently.

❹ 二、二B圖圖係顯示形成於風路4中之第 -流路R 2之變形例。於該變形例中,在第二流路 R2之途中設置狹幅部17,且狹幅部17之寬度 d係设定為比離子產生部6之貫通孔丄〇、1 9之 孔徑D小,藉由設置該狹幅部i 7,可確保透過第 -流路R 1導入貫通孔工〇、工9内之風量。形成 狹Ί5田。卩1 7處可為第三a圖所示般之散熱部分1 5 之下游侧部分15c,亦可為第三b圖所示般之上 游側部分1 5 a ’或者亦可於下游侧與上游側兩者 设置狹幅部1 7,另’於圖示例中省略調整閥1 3。 第四圖係顯示於第一流路r 1與第二流路r 2 之分歧部分更設置有加壓部丄8之變形例。於該變 形例中’由於構成為在藉由加壓部1 8設定為預定 風壓後將送風導入第一流路r 1及第二流路r 2 内’因此具有可使貫通孔1 〇内之微電漿放電安定 化的效果或可安定地進行利用氣冷之電極部8的去 熱效果。 13 200930319 其次’根據第五圖說明本發明實施形態中第_ 例之離子發射裝置,另,與前述第一例之構造相同 的構造係省略詳細說明’以下詳述與第一例不同之 特徵構造。❹ Two and two B diagrams show a modification of the first flow path R 2 formed in the air passage 4. In this modification, the narrow portion 17 is provided in the middle of the second flow path R2, and the width d of the narrow portion 17 is set to be smaller than the through hole 丄〇 of the ion generating portion 6, and the aperture D of the ninth. By providing the narrow portion i 7, it is possible to ensure the amount of air introduced into the through hole process and the work 9 through the first flow path R1. Form a narrow 5 fields.卩1 7 may be the downstream side portion 15c of the heat dissipating portion 15 as shown in the third a diagram, or may be the upstream side portion 1 5 a ' as shown in the third b diagram, or may be on the downstream side and the upstream side Both sides are provided with a narrow portion 17 and the other is omitted in the illustrated example. The fourth diagram shows a modification in which the pressurizing portion 8 is provided in a divided portion of the first flow path r 1 and the second flow path r 2 . In the modification, the configuration is such that the air is introduced into the first flow path r 1 and the second flow path r 2 after the pressurizing unit 18 is set to a predetermined wind pressure. Therefore, the through hole 1 can be made The effect of the micropulp discharge stabilization or the heat removal effect of the electrode portion 8 by air cooling can be stably performed. 13 200930319 Next, an ion emitting device according to a first embodiment of the present invention will be described with reference to the fifth embodiment, and the same structure as that of the first example will be omitted. Detailed descriptions of the features different from the first example will be described below. .

於本例之離子發射裝置中,在本體殼體1内之 風路4中配置有冷卻部3 〇,且前述冷卻部3 〇係 位於離子產生部6與位於比該離子產生部6更上游 側之送風部5間。圖式例之冷卻部3 〇係由以下構 件所構成之結構,即:熱交換部3 i,係配置於風 路4内者;冷媒槽3 2,係配置於風路4外者,·循 環流路3 3 ’係連通連接熱交換部3工與冷媒们 2者;及泵3 4,係介於循環流路3 3中,且使冷 媒於熱交換部3 1與冷媒槽3 2間循環者。冷媒^ 使用水,另,冷卻部3 〇之結構並不限於圖式例般 之水冷式,亦可為例如❹科帖單元之電 其他結構。冷卻部3 〇 ' 卩丨d ϋ之電子式結構在將本例之離 子發射裝置作成以手样+ # 乂于符式使用的吹風機等較小型 置使用時是特別有效的。 、 於前述構造之本例 已透過冷卻部3 〇冷卻 第二流路R 2,因此, 效率使電極部8散熱, 離子。 之離子發射裝置中,可將業 之空氣送入第一流路R 1及 相較於第一例,亦可以更高 且可於更長期間安定地生成 24 200930319 六圖說明本發明實施形態中第三 ’另,與前述第一例之構造相同 s兒明’以下詳述與第一例不同之 於本例之離子發射裝置中,在本體殼體丄内之 風路 4 中?ξ? St >4« ^ ❹In the ion-emitting device of this example, the cooling portion 3 is disposed in the air passage 4 in the main body casing 1, and the cooling portion 3 is located at the ion generating portion 6 and is located further upstream than the ion generating portion 6. There are 5 air supply parts. The cooling unit 3 of the illustrated example is configured by the following members, that is, the heat exchange unit 3 i is disposed in the air passage 4; the refrigerant tank 3 2 is disposed outside the air passage 4, and is circulated The flow path 3 3 ' connects and connects the heat exchange unit 3 and the refrigerant 2; and the pump 3 4 is disposed in the circulation flow path 3 3 and circulates the refrigerant between the heat exchange unit 31 and the refrigerant tank 3 2 By. The refrigerant 2 uses water, and the structure of the cooling unit 3 is not limited to the water-cooling type as shown in the drawings, and may be, for example, an electric other structure of the unit. The electronic structure of the cooling unit 3 〇 ' 卩丨d 是 is particularly effective when the ion emitting device of this example is used in a smaller type such as a hand dryer + # 乂 使用 使用 符In the present embodiment of the above configuration, the second flow path R 2 is cooled by the cooling unit 3, so that the electrode portion 8 dissipates heat and ions with efficiency. In the ion emitting device, the air can be sent to the first flow path R 1 and can be generated higher than the first example, and can be stably generated for a longer period of time. Third, in addition, the structure of the first example is the same as that of the first embodiment, which is different from the first example in the ion-emitting device of this example, in the wind path 4 in the body casing? ξ? St >4« ^ ❹

其次,根據第 例之離子發射裴置 的構造係省略詳細 特徵構造。 —置有霧氣附加部4 0,且前述霧氣附加 係位於離子產生部6與位於比該離子產生部 ^更上游側之送風部5間。圖式例之霧氣附加部4 中將=’、’帛等保水體4丨_含有水分者配置於風路 中之結構,然而,亦可為其他結構。於前述構造 例之離子發射裝置中,藉由將業已透過霧氣附 4 0附加霧氣之空氣送入下游側之離子產生部 可大量地生成於空氣中之霧氣含有離子(負離 子)之離子霧’並透過發射口 3朝外部發射。前述 ::霧之發射風除了其空氣中之霧氣本身會將外部 二乳加濕之效果外,亦會帶來因保持許多水分之離 子霧附著而賦予頭髮或皮膚許多水分之效果。另, 雖未圖不,然而,包含有可防止保水體4 1中所含 有之水分朝霧㈣加部4 0外漏出的防水結構。 其-人,根據第七圖說明本發明實施形態中第四 例之離子發㈣置’另,與前述第三例之構造相同 的構造係省略詳細說明,以下詳述與第三 特徵構造。 Ν 15 200930319 本例之離子發射裝置之霧氣附 帕耳帖單元5〇來生成露水。前二係:用 於本體殼體1之Μ電源部5::= 力’並使熱自圖中上方之冷卻側朝圖: =。於前述帕耳帖單元50之冷d 置有被配置在風路4内之框狀冷卻構,配 該冷卻構件5 2内诖 Z ’更於 3,藉此,構二:::::狀冷卻構件$ 之散熱側係於形成在本體殼體 耳帖政熱用流路5 4内露it! ώ 耳帖散熱用流路54内产動之^且猎由於該帕 槿。,、… 运風進行散熱之結 ❹ :主耳帖散熱用流路54係形成為自風路4 …,瓜刀歧及合流,因此,藉由送風部5所導入之 的部分係自主流分流而導入帕耳帖散 ==二於通過帕耳帖單元5〇之散熱側後 部發射。…2與主流合流後自發射口3朝外 於風:4之主流中’藉由送風部5送入空氣並 、耳帖早凡5 0供給電力而將兩冷卻構件$ 2、 卻,藉此,將風路4令之送風溫度作成露點 於兩冷部構件5 2、5 3上產生露水,故, ^已通過具有該露水之兩冷㈣件52、53之送 風係於大量地含有霧氣之狀態下被送人下游側之離 200930319 朝外 子產生部6,並於生成離子霧後透過發射 部發射。 ❹ 佐认又’通過冷卻構件5 2、5 3時所冷卻之送風 糸於通過第二流路R 2時沿著離子產生部6之兩電 ,部8之外周面流下並有效地解熱,即,本例之使 白耳,單元5 〇之霧氣附加部4Q係兼作藉由冷 效率使電極部8散熱之冷卻部3 〇,藉由 霧氣附加部4〇,可以高效率使電極部8 二:、=安定地生成離子霧。另,雖未圖示,然 朝該。附=部4〇所產生之露水 f 4 〇外漏出的防水結構。 例二實施形態"五 的槿另,與則述第四例之構造相同 特徵i造詳細說明,以下詳述與細例不同之 元= 中,將與使用帕耳帖單 設置於風路4内比離:::相同的霧氣附加部40 游側處兩者。上游⑴部6更上游側處與更下 藉由生h士 下游側之霧氣附加部4 〇皆 子霧後乘二霧氣’藉此’在生成離 氣附加部40中:錢射。此外’於上游侧之霧 電極部8散熱之冷;冷卻風以高效率使 17 200930319 產生=述第—至第五例之離子發射裝置中,離子 。係構成為在夾持絕緣分隔件7之上游侧與 ::側兩側密接配置電極部8,且藉由高壓施加部 電極部8間施加高電壓,然而,離子產生 配晉於:限於該構造,亦可作成僅將絕緣分隔件7 迕,戍作::8之上游側或下游側中的-者之構 ❹ ❹ 使絕緣分隔件7與電極部8密接而配 =電極部8附近之構造,具體而言,可採用後 J、第七例之離子發射裝置中所例示之構造。 ^九圖係顯示本發明實施形態中第六例之離子 與第一例之構造相同的構造係省略 兄明’以下詳述與第—例不同之特徵構造。 =以料發射裝置t,將設置成直捏小於 件邑穴=7之圓板狀的電極部8配置於絕緣分隔 上游側附近處,藉此’構成離子產生部6。 分隔件;I Ϊ: Ϊ =之ί度:間隙6 〇介緣 緣分隔件7之中 、置/、第例相同之貫通孔1 ,;電極部8側則未設置有貫通孔19。 之間:成二絕緣分隔件7與電極部8間之微小寬度 通,且於盆::其外周緣部分與周圍之風路4連 :、中央部分與絕緣分隔件7之貫通孔丄〇 連通,以孔1G係於其上游端與前述間隙6 〇連 18 200930319 通,且於其下游端與下游側之風路4連通。Next, the structure of the ion-emitting device according to the first example omits the detailed feature structure. The mist adding unit 40 is disposed, and the mist adding unit is located between the ion generating unit 6 and the air blowing unit 5 located on the upstream side of the ion generating unit ^. In the mist adding unit 4 of the illustrated example, the water retaining body 4丨_ containing water such as water is placed in the air passage, but other configurations may be employed. In the ion-emitting device of the above-described configuration example, the ion generating portion that has been supplied with the mist-attached mist to the downstream side can generate a large amount of the ion mist in which the mist in the air contains ions (negative ions). It is emitted to the outside through the launch port 3. In addition to the effect that the mist in the air itself will humidify the external two milk, it also has the effect of giving the hair or skin a lot of moisture due to the adhesion of the ion mist that maintains a lot of moisture. Further, although not shown, a waterproof structure that prevents moisture contained in the water retaining body 4 1 from leaking out of the mist (four) adding portion 40 is included. In the seventh embodiment, the ion-emitting (fourth) arrangement of the fourth example of the embodiment of the present invention will be described. The same structure as the structure of the third example will be omitted, and the detailed description and the third characteristic structure will be described below. Ν 15 200930319 The mist of the ion-emitting device of this example is attached to the Peltier unit 5 to generate dew. The first two series: used for the power supply part 5 of the body casing 1::=force' and the heat from the upper side of the figure to the figure: =. In the cold d of the Peltier unit 50, a frame-like cooling structure disposed in the air passage 4 is disposed, and the cooling member 5 2 is provided with 诖Z 'more than 3, whereby the structure is two: :::: The heat-dissipating side of the cooling member $ is formed in the body casing ear ridge heat flow passage 5 4 exposed it! 耳 The ear post heat-dissipating flow path 54 is produced and the hunting is due to the sputum. , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , And the introduction of Peltiers == two is transmitted through the rear side of the heat-dissipating side of the Peltier unit 5〇. ...2 after the confluence with the main stream, the self-emission port 3 faces the wind: in the mainstream of 4, 'the air is supplied by the air supply unit 5, and the earpieces are supplied with electric power 50 to supply the two cooling members $2, but The air supply temperature of the wind path 4 is used as a dew point to generate dew on the two cold parts 5, 5, 3, so that the air supply through the two cold (four) pieces 52, 53 having the dew is largely contained in the mist. In the state, it is sent to the downstream side of the 200930319 to the external child generating unit 6, and is emitted through the transmitting portion after the ion mist is generated.佐 佐 又 佐 佐 ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' In this example, the mist attachment unit 4Q of the white ear and the unit 5 is also used as the cooling unit 3 散热 for dissipating heat of the electrode unit 8 by the cooling efficiency, and the mist portion 4 〇 can efficiently make the electrode unit 8: , = stable generation of ion fog. In addition, although not shown, it is directed to this. Dew water generated by the attached part 4〇 f 4 Waterproof structure leaking out of the outside. The second embodiment is the same as the structure of the fourth example. The details are the same as the details of the fourth example. The following details are different from the detailed example = in the middle, and the use of the Peltier is set on the wind path 4. Internal ratio::: The same mist attachment unit 40 is at the side of the swim. The upstream (1) portion 6 is further upstream and lower by the mist addition portion 4 on the downstream side of the raw material, and the second mist is used to generate the second gas mist. Further, the mist electrode portion 8 on the upstream side is cooled by heat; the cooling wind generates ions in the ion-emitting device of the first to fifth examples with high efficiency. The electrode portion 8 is disposed in close contact with the :: side of the upstream side of the sandwiched insulating spacer 7, and a high voltage is applied between the high voltage applying portion electrode portions 8. However, the ion generation is limited to the configuration. It is also possible to form the structure in which only the insulating separator 7 is formed on the upstream side or the downstream side of the 8 : ❹ 密 密 密 绝缘 绝缘 绝缘 与 与 电极 电极 电极 构造 构造 构造 构造 构造 构造 构造 构造 构造 构造 构造 构造 构造 构造 构造 构造 构造Specifically, the configuration exemplified in the ion emitting device of the latter J and the seventh example can be employed. The nine-phase diagram shows that the ion of the sixth example in the embodiment of the present invention is the same as the structure of the first example, and the feature structure different from the first example is described below. In the material ejecting apparatus t, the electrode portion 8 having a disk shape in which the straight pinch is smaller than the hole = = 7 is disposed in the vicinity of the upstream side of the insulating partition, thereby constituting the ion generating portion 6. Separator; I Ϊ: Ϊ = ί Degree: gap 6 〇 Between the edge separator 7 and the through hole 1 of the same example, and the through hole 19 is not provided on the electrode portion 8 side. Between: the small width between the two insulating spacers 7 and the electrode portion 8 is passed, and the outer peripheral portion of the basin is connected to the surrounding air passage 4: the central portion is connected to the through hole of the insulating spacer 7 The hole 1G is connected to the gap 6 18 18 200930319 at its upstream end, and is connected to the downstream side air passage 4 at its downstream end.

❹ 於本例中並未設置如第一例般之隔壁部丄4或 凋1閥1 3而形成第-流路R 1或第二流路R 2。 送風部5所產生之送風係如財之箭頭記號所示, 百先會碰撞到上游側電極部8之平板面,並沿著該 電極邛8之外周面迂迴後’分流成穿過前述間隙6 〇到達絕緣分隔件7之貫通孔1 0的支流與沿著絕 緣分隔件7之外周面的支流’並於貫通孔工〇之下 游端合流後自發射口 3朝外部發射。 ;電極部8連接高壓施加部9之負極侧,若藉 由高壓施加部9於離子產生部6之電極部8施加高 電壓’則於設置在絕緣分隔件7之貫通Μ 〇及形 成於絕緣分隔件7與電極部8間之間隙6 〇兩者中 :開始微電漿放電’即,於本例中,藉由前述間隙 6 0+及與其於下游側連通之前述貫通孔工〇,形成 沿著絕緣分隔件7之微小放電空間3,且於該放電 空間S内會產生微電漿放電。 於本狀科發㈣置丨,為了生成離子而朝 外部送出,會藉由送風部5將外部大氣導入風路4 内並朝離子產生部6送風’且藉由高壓施加部9於 離子產生部6之電極部8施加高電>1,並藉由放電 =間S產生微電漀放電。藉由該微電漿放電,於放 電空間S(即,間隙60及貫通孔1〇)内以高密 19 200930319 度生成離子。 2由送風部5朝離子產生部6傳送之送風抑In the present example, the partition wall portion 4 or the valve 1 3 as in the first example is not provided to form the first flow path R 1 or the second flow path R 2 . The air blowing system generated by the air blowing portion 5 is indicated by the arrow of the financial arrow, and the first air member collides with the flat surface of the upstream side electrode portion 8, and is bypassed along the outer peripheral surface of the electrode bore 8 to be branched and passed through the gap 6 The branch flow reaching the through hole 10 of the insulating spacer 7 and the branch flow ' along the outer peripheral surface of the insulating spacer 7 and merged at the downstream end of the through hole process are emitted from the emission port 3 toward the outside. The electrode portion 8 is connected to the negative electrode side of the high voltage applying portion 9, and when a high voltage is applied to the electrode portion 8 of the ion generating portion 6 by the high voltage applying portion 9, the through hole 设置 is provided in the insulating spacer 7 and is formed in the insulating partition. In the gap 6 between the member 7 and the electrode portion 8 :, the microplasma discharge is started, that is, in the present example, the gap is formed by the gap 60+ and the through hole process communicating with the downstream side thereof. A minute discharge space 3 of the insulating spacer 7 is formed, and a microplasma discharge is generated in the discharge space S. In the case of the present invention, in order to generate ions, the external air is introduced into the air path 4 and the air is supplied to the ion generating unit 6 by the air blowing unit 5, and the high voltage applying unit 9 is applied to the ion generating unit. The electrode portion 8 of 6 applies a high electric power > 1, and generates a micro electric discharge by discharge = S. By the microplasma discharge, ions are generated at a high density 19 200930319 degrees in the discharge space S (i.e., the gap 60 and the through hole 1 。). 2, the air blown by the air blowing unit 5 toward the ion generating unit 6

It:部8之上游側的平板面與外周面流動: = …W隔件7之外周緣部碰撞之位置。 碰撞到絕緣分隔件7之外周緣部之送風係其一部分 被达入間隙6 〇内’剩餘的—部分則被送 分隔件7迂迴之流路。 緣 ❹It: the flat surface on the upstream side of the portion 8 and the outer peripheral surface flow: = ...W the position at which the peripheral portion of the spacer 7 collides. A portion of the air supply system that collides with the outer peripheral portion of the insulating spacer 7 is brought into the gap 6 and the remaining portion is sent to the flow path of the partition member 7. Margin

被送入間隙6 〇内之送風係將在藉由該間隙6 ◦與貫通孔1 〇所構成之放電空間s内所產生之大 量離子搬送至下游側,並解除電極部8與絕緣分隔 件7之熱後,透過貫通孔i 〇朝下游侧送出。又, 分流至在絕緣分隔件7迂迴側之送風係解除絕緣分 隔件7之熱後與送出自貫通孔1 〇之送風合流,且 伴Ik著合a後之充分風量後自發射口 3朝外部送 出。乘著該充分風量之發射風,藉由離子產生部6 之微電漿放電所大量生成之離子會朝外部空間強勢 地發射。 依此,若藉由本例之離子發射裝置,則可藉由 送風使離子產生部6之電極部8與絕緣分隔件7有 效地散熱,並藉由放電空間S内之微電漿放電生成 大量之離子’又,可將在此所產生之大量離子藉由 送風有效地自貫通孔1 〇内搬送至下游側,並使其 與進行分流以自絕緣分隔件7之外周面解熱之送風 20 200930319 合流後,伴隨著充分之風量朝外部發射。 «====!於第六例之離子發射 更尺电極邛8或絕緣分隔件 變形例。於第十圖所示之變形例 以的各種 通孔19形成於其,央,電極部 孔1 9係透過電極部8與 貝通 〇 ’形成為與絕緣分隔件7側之件7之間隙6 一直線上,又,雷梅^ 貝通孔10排列於 略呈相同直#之圓板;/、絕緣分隔件7係形成為 之例;U 變形例,則相較於第九圖所示 送八至構成放^ 朝外部大量且強勢地放〇 ’因此具有可 :優點’又,亦具有可藉由離 風解除電極部8之熱的優點。 1 9之达 設置:隙=!:未:電極部8與絕緣分隔件7間 密接之構造,此時兩“電極部8與絕緣分隔件7) 7會如散熱片般作用:、、極部8密接之絕緣分隔件 第十一 Α 一 係與第十圖所示之二 =之變形例在下述方面 將貫通孔,19形成於包園即··於電極部8上 8側之各財通孔"園其_央之四處者。電極部 1 9係形成為看自風路4之轴向 200930319 分隔件7側之貫通孔1〇排 線上。若藉由第十-A、十一B圖之變形 、“自上游之送風會通過電 孔1 9,再穿過πβ n I e之锼數貝通 7之貫通迴後通過絕緣分隔件 、、孔1 〇,因此具有難 除電極部8或絕緣分 ‘由广風更有效地解 ❹ ❹ 更有效地解除電極部8之熱,亦 :::广為了 成為具有多數貫通孔19之網狀者。部8形 第十二圖所示之變形例 所示之變形例不同,即·= 下迷方面係與第十圖 7上同時設置有複數貫通孔i〇8Q:邑緣分隔件 8側之貫通孔】9與絕緣 9者。電極部 ==透過間隙60形成為排::2=0 ◦她電::之:7,則可利用複數貫通孔1 詈,日叮来 因此可增加全體之齙早斗士 夏,且可透過電極部δ之各 2離子生成 送入各貫通孔10,因此;;L19直接地將風 地放出離子的優點。 β朝外部大量且強勢 另’於第十二圖之變形 δ與絕緣分隔件7密接之構在作成使電極部 件7具有如散熱片般之機能。f’亦可使絕緣分隔 第十三圖所示1_ 所示之變形例不间 建方面係與第十圖 即:於絕緣分隔件7上設置複 22 200930319 ff通孔10者;及將各貫通孔10之位置形成為 看自風路4之軸向時錯開且未與電極部8側之貫通 孔1 9排列於一直線上者。若藉由第十三圖之變形 Η則可利用複數貫通孔i ◦作為放電空間S,因 =力:全體之離子生成量,又,業已通過電極部 過絕二卜風係穿過間隙6 0而运迴後通 過絕緣力隔件7之貫涵7丨1 n 古1 0,因此可藉由送風更 有也解除電極部8或絕緣分隔件7之熱。 子』ίΓ係顯示本發明實施形態令第七例之離 子發射裝置,另,與第一你丨 ^^a0 、 j之構以相同的構造係省 评兒明,以下詳述與第一例不同之特徵構造。 於本例之料發射裝置之離子產生部㈠,以 數百之略呈均等之寬度使 隔件7與配置在該絕緣分隔件7 :、,、邑緣分 ❹ 之電極部8間,並以與第數:及下游側 徑於絕绫分阡/生7 <數百a m之口 通孔部8之中央設置貫 游側電極部8之貫通孔工◦ ^件7或上 電極部8之t央設置貫通孔19 1 =於下游側 貫通孔10與位於夾持該絕緣分隔件之 :電極部8之貫通孔1 9係形成為排列於一 形成於絕緣分隔件7與兩側電極部8間之微小 23 200930319 寬度之間隙6 0係於其外周緣部分與周圍之風路 連通,且於其t央部分與絕緣分隔件7及電 之貫通孔1 〇、i 9連通。 ❹ 於本例中亦未設置如第一丫列般之隔壁部i 4或 ㉟整閥1 3 °被送人自送風部5之送風首先會在虚 上游側電極部8之平板面碰撞的部分,分流成穿過 亡游側電極部8之貫通孔1 9到達絕緣分隔件7之 貝通孔1 0的支流與沿著上游側電極部8之外周面 迂迴的支流。業已通過貫通孔工0的支流係透過設 置於下游側電極部8之大直徑貫通孔i 9朝更下游 側送*出’沿著上游側電極部8之外周面迂迴的支流 則沿著絕緣分隔件7之外周面與下游側電極部8之 外周面朝更下游側送出後,與業已通過下游側電極 部8之貫通孔丄9的支流合流。 Ο 一又,沿著上游側電極部8之外周面送出的支流 之:部分係透過上游側電極部8與絕緣分隔件7之 間隙6 0被送入絕緣分隔件7之貫通孔丄〇,又, 自上游側電極部8之外周面直接沿著絕緣分隔件7 之外周面送出的支流之一部分係透過絕緣分隔件7 :、下游側電極部8之間隙6 〇被送入下游側電 8之貫通孔1 9。 於本例之離子發射裝置巾,若藉由高屢施加部 於兩侧電極部8間施加高電壓,則於設置在絕緣 24 200930319 分隔件7之貫通孔1 0及形成於該絕緣分隔件γ與 上游側電極部8間之間隙6 0以及形成於該絕緣分 隔件7與下游侧電極部8間之間隙6 0中會開始微 電漿放電,即,於本例中,藉由絕緣分隔件7之貫 通孔1 〇與上游側及下游側之間隙6 〇,形成沿著 絕緣分隔件7之微小放電空間S ’且於該放電空間 s内會產生微電漿放電。 因此,若藉由微電漿放電於放電空間s内以高 密度生成離子,同時藉由送風部5朝離子產生部6 產生达風,則送風的一部分會通過放電空間s並朝 下游侧搬送大量之離子,且送風的另一部分會沿著 電極。卩8或絕緣分隔件7之外周面通過並解熱。通 過離子產生部6時所分流之送風在之後會合流,且 伴隨著合流後之充分風量後自發射口 3朝外部送 出。乘著該充分風量之發射風,藉由離子產生部6 之微電漿放電所大量生成之離子會朝外部空間強勢 地發射。 依此,若藉由本例之離子發射裝置,則可藉由The air supply system that has been fed into the gap 6 搬 transports a large amount of ions generated in the discharge space s formed by the gap 6 ◦ and the through hole 1 至 to the downstream side, and releases the electrode portion 8 and the insulating spacer 7 After the heat, it is sent out through the through hole i 〇 toward the downstream side. In addition, after the heat of the air supply system releasing insulating spacer 7 on the bypass side of the insulating spacer 7 is merged with the air blown from the through hole 1 , the air flow from the through hole 1 合 is merged, and the full air volume after Ib is brought a, and then the external air is discharged from the opening 3 to the outside. Send it out. By the emission of the sufficient air volume, the ions generated by the microplasma discharge of the ion generating portion 6 are strongly emitted toward the external space. According to this, with the ion-emitting device of this example, the electrode portion 8 of the ion generating portion 6 and the insulating spacer 7 can be efficiently dissipated by the air blowing, and a large amount of micro-plasma discharge in the discharge space S is generated. In addition, a large amount of ions generated here can be efficiently transported from the through hole 1 to the downstream side by the air supply, and merged with the air supply 20 200930319 which is shunted to deheat from the outer peripheral surface of the insulating spacer 7. After that, it is launched to the outside with sufficient air volume. «====! Ion emission in the sixth example. More electrode 邛8 or insulating spacer. The various through holes 19 in the modification shown in the tenth embodiment are formed in the center, and the electrode portion hole 19 is formed as a gap 6 between the transmission electrode portion 8 and the shelling member 7 and the member 7 on the side of the insulating spacer 7. On the straight line, again, the Remy ^ Betong hole 10 is arranged in a circular plate which is slightly the same straight; /, the insulating partition 7 is formed as an example; the U modification is compared with the ninth figure. It is advantageous to have a large amount and a strong venting to the outside, and thus has the advantage that the heat of the electrode portion 8 can be released by the wind. 1 9 setting: gap =!: not: the structure of the electrode portion 8 and the insulating spacer 7 are in close contact, at this time, the two "electrode portion 8 and the insulating spacer 7" 7 will act like a heat sink: 8 sec. Insulation spacers 11th Α 变形 变形 变形 第十 第十 = = = = = = = = 在 在 在 在 在 在 在 在 在 在 在 在 在 变形 变形 变形 变形 变形 变形 变形 变形 变形 变形 变形 变形 变形 变形The hole portion is formed by the fourth portion of the through hole 1 on the side of the partition member 7 of the axial direction 200930319 from the axial direction of the air passage 4. If by the tenth-A, eleventh B The deformation of the figure, "the air supply from the upstream passes through the electric hole 19, and then passes through the number of turns of πβ n I e. The pass-through 7 passes through the insulating partition, and the hole 1 〇, thus having the electrode portion 8 difficult to remove. Or the insulating part 'is more effectively solved by the wide wind. ❹ The heat of the electrode portion 8 is more effectively released. Also:: It is widely used as a mesh having a plurality of through holes 19. The modification shown in the modification shown in the twelfth-shaped figure of the eighth portion is different, that is, the lower side of the lower side and the tenth stage 7 are provided with a plurality of through holes i 〇 8Q: the side of the rim edge partition 8 Hole] 9 and insulation 9. The electrode portion==the transmission gap 60 is formed as a row::2=0 ◦ her electricity:::7, the plurality of through holes 1 詈 can be utilized, so that the entire 龅 斗 , , , , , , , , Each of the two ions of the portion δ is sent to each of the through holes 10, so that L19 directly releases the ions from the wind. The β is large and strong toward the outside. The deformation δ of the twelfth figure is in close contact with the insulating spacer 7 so that the electrode member 7 has a function like a heat sink. f' can also separate the insulation according to the modification shown in Fig. 13_ shown in Fig. 1 and the tenth figure: that is, the through hole 2009 10 is provided on the insulating partition member 7; The position of the hole 10 is formed so as to be shifted from the axial direction of the air passage 4 and not aligned with the through hole 1 9 on the electrode portion 8 side. According to the deformation of the thirteenth figure, the plurality of through holes i ◦ can be used as the discharge space S, because the force: the total amount of ions generated, and the passage of the electrode through the electrode through the gap 60 After being transported back, the insulating member 7 is passed through the culvert 7 丨 1 n ancient 10, so that the heat of the electrode portion 8 or the insulating spacer 7 can be released by the blowing. In the embodiment of the present invention, the ion-emitting device of the seventh example is shown, and the structure of the first structure is the same as that of the first structure, and the following detailed description is different from the first example. Characteristic structure. In the ion generating portion (1) of the material emitting device of the present embodiment, the spacer 7 is disposed between the insulating portion 7 and the electrode portion 8 of the insulating spacer 7 in a manner of a uniform width of several hundred, and The number: and the downstream side diameter are in the absolute enthalpy / raw 7 < the center of the through hole portion 8 of several hundred am is provided with the through hole of the traveling side electrode portion 8 or the upper electrode portion 8 The through hole 19 1 is formed in the downstream side through hole 10 and the through hole 19 in the electrode portion 8 sandwiching the insulating spacer is formed to be arranged between the insulating spacer 7 and the side electrode portions 8 The small 23, 200930319 width gap 60 is connected to the surrounding air passage at the outer peripheral portion thereof, and communicates with the insulating spacer 7 and the electrical through holes 1 〇, i 9 at the central portion thereof.本 In this example, the partition wall i 4 or 35, such as the first array, is not provided, and the portion of the air supplied from the air supply unit 5 is first hit by the flat surface of the virtual upstream side electrode portion 8 The branching flow through the through hole 19 of the dead side electrode portion 8 reaches the branch flow of the beacon hole 10 of the insulating spacer 7 and the branch flow which is bypassed along the outer peripheral surface of the upstream side electrode portion 8. The branch flow through the through hole 0 is transmitted through the large diameter through hole i 9 provided in the downstream side electrode portion 8 toward the further downstream side. The branch flow which is bypassed along the outer peripheral surface of the upstream side electrode portion 8 is separated along the insulation. After the outer peripheral surface of the member 7 and the outer peripheral surface of the downstream side electrode portion 8 are sent to the downstream side, they merge with the branch of the through hole 9 of the downstream side electrode portion 8. Further, a portion of the branch which is sent along the outer peripheral surface of the upstream side electrode portion 8 is partially transmitted through the gap 60 of the upstream side electrode portion 8 and the insulating spacer 7 into the through hole of the insulating spacer 7, and A portion of the branch flow directly from the outer peripheral surface of the upstream side electrode portion 8 along the outer peripheral surface of the insulating spacer 7 is transmitted through the insulating spacer 7: the gap 6 of the downstream side electrode portion 8 is sent to the downstream side electric 8 Through hole 1 9 . In the ion-emitting device of the present embodiment, if a high voltage is applied between the electrode portions 8 on both sides by the high-applying portion, the through-hole 10 is provided in the insulating member 24 200930319, and is formed in the insulating spacer γ. The micro-plasma discharge starts in the gap 60 between the upstream side electrode portion 8 and the gap 60 formed between the insulating spacer 7 and the downstream side electrode portion 8, that is, in this example, by the insulating spacer A gap 6 〇 between the through hole 1 and the upstream side and the downstream side forms a micro discharge space S′ along the insulating spacer 7 and a microplasma discharge is generated in the discharge space s. Therefore, when the microplasma discharge generates ions at a high density in the discharge space s and the wind is generated by the blower 5 toward the ion generating portion 6, a part of the blown air passes through the discharge space s and is transported to the downstream side. The ions, and another part of the air supply will follow the electrodes. The outer peripheral surface of the crucible 8 or the insulating spacer 7 passes through and deheats. The air blown by the ion generating unit 6 merges later, and is sent out from the emission port 3 to the outside with a sufficient air volume after the joining. By the emission of the sufficient air volume, the ions generated by the microplasma discharge of the ion generating portion 6 are strongly emitted toward the external space. According to this, if the ion emitting device of this example is used,

具興進行分流以自絕緣分隔件 可將在此所產生之大量離子 空間S搬送至下游側,並使 分隔件7或電極部8之外周 25 200930319 面解熱之送風合流後, 射。另,於本例中,將下、:者充’之風量朝外部發 9設置成大首下游侧電極部8之貫通孔! a又置成大直徑,並防止於放 子附著於下游側電極部8。 工曰斤生成之離 第十五圖係顯示於笫 絕緣分隔件7與上游惻置中使 ❹ 於該變形例中,藉由絕緣分隔件;:;= 卜 絕緣分隔件7舆下游側電極部 1 0及 沿著絕緣分隔件7之彳,f # π 隙6 ο,形成 電空間s内以空藉由於該放 電節通過並將大量之離子= = ::另-部分沿著電極部8或絕緣分 = 面通過並解熱。 <外周The diverging is performed by self-insulating spacers. The large amount of ion space S generated here can be transported to the downstream side, and the air blown by the heat dissipating heat of the outer surface of the partition member 7 or the electrode portion 8 can be combined. Further, in this example, the air volume of the lower and the lower side is set to the through hole of the large downstream side electrode portion 8! A is again set to a large diameter, and is prevented from adhering to the downstream side electrode portion 8 by the discharge. The fifteenth figure is shown in the 笫 insulating spacer 7 and the upstream ❹ in the modification, by insulating the spacer;:; = 卜 insulating spacer 7 舆 downstream side electrode 10 and along the insulating spacer 7, # f π gap 6 ο, forming an electrical space s to empty due to the discharge node passing and a large number of ions = = :: other part along the electrode portion 8 or Insulation points = surface pass and heat release. <outer week

S之間隙6〇設置於 8間’且下游側電極 岔接,此時,亦可將 搬送至下游側,並有 另’亦可將構成放電空間 絕緣分隔件7與上游側電極部 部8係設置成與絕緣分隔件7 放電空間S所產生之大量離子 效地解除離子產生部6之熱。 不過,第六例或第七例之離子發射裴置所且備 之離子產生部Θ之構造亦可於前述第—至 離子發射裝置中適當地採用。 < 又,於第 例至第七例之離子發㈣置中皆圖 26 200930319 =僅包含有-個離子產生部6之構造,然而,亦可 於風路4中包含有複數㈣之離子產生部6之構 ,’在包含有複數離子產生部6時,藉由使各離子 生邰6與共通之高壓施加部9並聯連接,可在抑 制高塵施加部9之施加電壓後維持或增加全體之離 子產生量。 又’包含有複數離子產生部6且與高壓施加部 並聯連接時,高壓施加部9宜設置成對各離子產 生部6之電極部8施加脈衝狀之高電壓,此係由於 生:6會不可避免地存在有組裝精度等 -間差異,因此,舉例言之,在供給直流電壓時, 於各離子產生部6間容易產生放電之不平衡之故。 相對於此’在呈脈衝狀施加高電壓時,不會拘泥於 複數離子產生部6間存在有組裝精度等個體間差显 2可於所有離子產生部6中產生放電且不會不 # —另,施加脈衝狀之高電壓時’宜將其脈衝頻率 叹^為數十赫至數十千赫,且將脈衝寬度設定為〇 N叫間(即,施加電壓大於放電開始電壓之時間) 構成5 Q%以下’又,亦可使脈衝狀之高電壓 流電壓重叠。 以上根據附圖所示之實施形態說明本發明,然 而,本發明並不限於前述各實施形態,只要是本= 27 200930319 明意圖之範圍内,即可適當地進行設計變更。 此二ΐ:述僅為本發明之較佳可行實施例,非因 明之專利保護範圍,故舉凡運用本發明 ::!及圖式内容所為之等效技術變化,均包含: 權利保護範圍内,合予陳明。 【圖式簡單說明】 ❹ Ο ^ b圖係顯示本發明實施形態中第一 例之離子發射裝置 全俨,笛η 之°兄月® (第一Α圖係顯示裝置 圖係顯示離子產生部)。 形』係顯示同上離子發射裝置之電極部之變 、二B圖係顯示同上離子發射裝置之第 t1·詈脉柄f形例S兒明圖(第三A圖係顯示於下游側 铖Φ-邶田之情形’第三B圖係顯示於上游側設置 狹幅部之情形)。 ^ ΪΓ圖係顯示於同上離子發射裝置之流路中設 置加壓部之變形例說明圖。 第五圖係顯示本發明實施形態中第二例之離子 發射裝置之說明圖。 第八圖係顯示本發明實施形態中第三例之離子 發射裝置之說明圖。 係顯示本發明實施形態中第四例之離子 28 200930319 發射裝置之說明圖。 明實施形態中第五例之離子 第八圖係顯示本發 發射裝置之說明圖。 第九圖係顯示本發明 發射裝置之說明圖。 實施形態中第六例之離子 +圖係顯示同上離子發射裝置之電極部 ,,彖/刀隔件之變形例說明圖。The gap 6 of S is set at 8 ′′ and the downstream side electrode is spliced. At this time, it may be transported to the downstream side, and there may be another 'the discharge space insulating partition 7 and the upstream side electrode part 8 The large amount of ions generated in the discharge space S of the insulating spacer 7 is disposed to effectively release the heat of the ion generating portion 6. However, the configuration of the ion generating portion of the sixth or seventh example of the ion emitting device can be suitably employed in the aforementioned first to ion emitting device. < Further, in the ion-emitting (fourth) of the seventh to seventh examples, FIG. 26 200930319 = the structure including only one ion generating portion 6, but the complex (four) ion generating may be included in the wind path 4. In the configuration of the portion 6, when the plurality of ion generating portions 6 are included, the respective ion generating electrodes 6 are connected in parallel with the common high-voltage applying portion 9 to maintain or increase the total voltage after the application of the voltage by the high-dust applying portion 9 is suppressed. The amount of ions produced. Further, when the plurality of ion generating portions 6 are included and connected in parallel with the high voltage applying portion, the high voltage applying portion 9 is preferably provided with a pulsed high voltage applied to the electrode portions 8 of the respective ion generating portions 6. Since the difference in assembly precision or the like is avoided, for example, when a DC voltage is supplied, a discharge imbalance is likely to occur between the respective ion generating portions 6. On the other hand, when a high voltage is applied in a pulsed manner, there is no difference in the inter-personal difference between the plurality of ion generating portions 6 and the assembly accuracy, and the discharge can be generated in all the ion generating portions 6 without being inferior. When applying a pulsed high voltage, the pulse frequency should be singularly tens of tens to tens of kilohertz, and the pulse width should be set to 〇N (ie, the applied voltage is greater than the discharge start voltage). Below Q%, it is also possible to overlap the pulsed high voltage flow voltage. The present invention has been described above with reference to the embodiments shown in the drawings. However, the present invention is not limited to the embodiments described above, and may be appropriately modified as long as it is within the scope of the present invention. The present invention is only a preferred embodiment of the present invention, and the scope of the invention is not limited to the scope of the patent protection, and the equivalent technical changes of the present invention are: Combined with Chen Ming. BRIEF DESCRIPTION OF THE DRAWINGS The ❹ Ο ^ b diagram shows the full range of the ion-emitting device of the first example of the embodiment of the present invention, and the whistle of the η° brothers and months® (the first image display device shows the ion generating portion) . The shape shows the change of the electrode part of the same ion emitting device, and the second B picture shows the t1·詈 pulse shape of the same ion emitting device. The third figure is shown on the downstream side 铖Φ- The case of Putian 'The third B picture shows the case where the narrow portion is provided on the upstream side). ^ The figure is an explanatory view showing a modification in which a pressurizing portion is provided in a flow path of the same ion emitting device. Fig. 5 is an explanatory view showing an ion-emitting device of a second example of the embodiment of the present invention. Fig. 8 is an explanatory view showing an ion-emitting device of a third example in the embodiment of the present invention. An illustration of a device for emitting ions 28 200930319 in the fourth example of the embodiment of the present invention is shown. The ion of the fifth example in the embodiment shows an explanatory view of the present transmitting device. The ninth drawing shows an explanatory view of the transmitting apparatus of the present invention. The ion + diagram of the sixth example in the embodiment shows an example of a modification of the electrode portion of the upper ion emitting device and the 彖/knife spacer.

❹ 第十一 A、 ^ 、十一 B圖係顯示同上離子發射裝置 一书極邠或絕緣分隔件之其他變形例說明圖(第十 2圖係顯示看自側方之情形,第十-B圖係顯示 看自風路之軸向之情形)。 第十二圖係顯示同上料發射裝置之電極部或 、邑緣刀隔件之另—其他變形例說明圖。 第十三圖侧示同上離子發射裝置之電極部或 絕緣分隔件之又另一其他變形例說明圖。 第十四圖係顯示本發明實施形態中第七例之離 子發射裝置之說明圖。 ^第十五圖係顯示同上離子發射裝置之電極部或 絕緣分隔件之變形例說明圖。 【主要元件符號說明】 1 本體殼體 2 吸入口 3 發射口 29 200930319 4 風路 5 送風部 6 離子產生部 7 絕緣分隔件 8 電極部 9 高壓施加部 1 0貫通孔 1 1上游側錐形部 1 2下游側錐形部 1 3調整閥 1 4隔壁部 14a 隔壁 14b 隔壁 1 5散熱部分 15a 部分 15b 部分 15〇 部分 1 6散熱片 1 7狹幅部 1 8加壓部 1 9貫通孔 2〇控制電路部 3 0冷卻部 3 1熱交換部 30 200930319 3 2冷媒槽 3 3循環流路 34泵 4 0霧氣附加部 4 1保水體 5 0帕耳帖單元 5 1 D C電源部 5 2冷卻構件 ® 5 3冷卻構件 5 4帕耳帖散熱用流路 6 0間隙 D 孔徑 d 寬度 R1第一流路 R 2第二流路 〇 S 放電空間 31❹ The eleventh A, ^, and eleventh B drawings show the other examples of the modification of the same ion-emitting device or the insulating spacer (the tenth figure shows the situation from the side, the tenth-B The figure shows the situation of the axial direction of the wind road). Fig. 12 is a view showing another example of the modification of the electrode portion of the same charging device or the edge of the blade. Fig. 13 is a side view showing still another modification of the electrode portion or the insulating spacer of the same ion emitting device. Fig. 14 is an explanatory view showing an ion emitting device of a seventh example in the embodiment of the present invention. The fifteenth diagram is a view showing a modification of the electrode portion or the insulating spacer of the same ion emitting device. [Description of main components] 1 Main body housing 2 Suction port 3 Emitting port 29 200930319 4 Air path 5 Air supply unit 6 Ion generating unit 7 Insulating partition 8 Electrode part 9 High voltage applying part 10 Through hole 1 1 Upstream side taper 1 2 downstream side tapered portion 1 3 regulating valve 1 4 partition wall portion 14a partition wall 14b partition wall 1 5 heat radiating portion 15a portion 15b portion 15 〇 portion 16 heat sink 1 7 narrow portion 1 8 pressurizing portion 1 9 through hole 2 〇 Control circuit unit 30 cooling unit 3 1 heat exchange unit 30 200930319 3 2 refrigerant tank 3 3 circulation flow path 34 pump 4 mist supply unit 4 1 water retaining body 5 0 Peltier unit 5 1 DC power supply unit 5 2 cooling member® 5 3 cooling member 5 4 Peltier heat dissipation flow path 60 0 clearance D aperture d width R1 first flow path R 2 second flow path 〇 S discharge space 31

Claims (1)

200930319 七、申請專利範圍: 1、一種離子發射裝置,其具備: 本體殼體; 風路,係貫通形成於本體殼體者;及 送風部與離子產生部,係配置於風路中者, 前述離子產生部包含有: ’ 電極部;及 η 叶, ,-认叫❿夏;附近去,200930319 VII. Patent application scope: 1. An ion emitting device, comprising: a body casing; a wind path formed through the body casing; and the air blowing portion and the ion generating portion are disposed in the air path, The ion generating portion includes: 'electrode portion; and η leaf, , - acknowledging ❿ summer; nearby, ❹ 又’藉由於電極部施加高電壓,於沿荽可 二形成,、放電空間内產生放電,且; 產生部之送風同時地通過放 三、如申請專利範圍第丄項所述之離子 其中則述放電空間係設置於絕緣分隔件之裝置, 緣,件與電極部間所形成之間隙中的兩者或一者及絕 述dti範圍第1項所述之離子發射裝置, 電極,,且於兩側電極部^加^電壓件之兩侧配置 其中前述離第=頁所述之離子發射裝置, 部二件之兩侧電極 其更包含1複;圍第1項所述之離一子發射裝置, 聯連接,並自該高壓rΑ子產生部且與高壓施加部並 加脈衝狀之高電壓。C σ°ρ對各離子產生部之電極部施 其中:前項所述之離子發射裝置, 放電將送風部所產生之送風的一部分送人 第二流路’係將送風部所產生之送風的另—部分沿 32 200930319 著電極部之外周面通過並送本 借如Λ請專利範圍第6項所述之離子發❹署 ,、更具備魏閥,且該調整閥係 、、二置’ 之第-流路與第二流路之送風比例者。入削述風路中 8、如申請專利範圍第7項所述 動送風比例以將第」Α之 其中述之離子發射裝置, 1 η、上: P之電極部設置有散熱片。 Ο ❿ 置’其中於前述:路專二.二第離子發射裝 置有冷卻部。 產生°卩更上游側處配 33❹ 'Because the electrode portion is applied with a high voltage, it is formed along the crucible, and a discharge is generated in the discharge space, and the air supply from the generating portion is simultaneously passed through the discharge, as described in the scope of the patent application. The discharge space is provided in the device for insulating the spacer, the edge, the gap formed between the member and the electrode portion, or the ion emitter, the electrode, and the electrode described in the first item of the dti range. The ion emitting device described in the above page is disposed on both sides of the voltage component of the two sides, and the two electrodes on the two sides further comprise one complex; the one-child emission described in the first item The device is connected in series, and a pulsed high voltage is applied from the high voltage r-german generating portion and the high voltage applying portion. C σ°ρ is applied to the electrode portion of each ion generating portion: the ion emitting device according to the above item, wherein the discharge sends a part of the air blow generated by the air blowing portion to the second flow path', and the air blown by the air blowing portion is another - Partially along the outer surface of the electrode part of 32 200930319 and sent to the ion-issuing department as described in item 6 of the patent scope, and further equipped with Wei valve, and the adjustment valve system, the second set - The ratio of the air flow to the flow path of the second flow path. In the description of the wind path, 8. In the case of the application of the scope of the patent, the ratio of the air supply is to be provided with the fins of the ion emitting device, 1 η, upper: P. Ο ’ 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 Produce °卩 more upstream side 33
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