200916403 九、發明說明： 【發明所屬之技術領域】 本發明係關於一種加速度感測裝置，更特別有關於—種出 平面加速度感測裝置。 【先前技術】200916403 IX. Description of the Invention: [Technical Field] The present invention relates to an acceleration sensing device, and more particularly to a planar acceleration sensing device. [Prior Art]
CMOS的全名為互補金屬氧化物半導體（c〇mpiementaQThe full name of CMOS is complementary metal oxide semiconductor (c〇mpiementaQ
Metal Oxide Semiconductor)，其主要是使用高純度的矽和鍺 做為基材，透過離子佈值、氧化、沈積等手續所產生的電流特 性來取代傳統的大型電晶體’其最主要的優勢在於大幅縮：的 面積與體積以及批量的製造’這些優勢造京尤了現今 電路產業。 慣 微機電系統（MEMS)所以會成為當前研究重點的原因在於 目前世界潮流強調小體積、低損耗、附加價值高；另外，微機 電系統具備與半導體製程相整合的優勢’更使得微機電系统且 備有可量產的優勢。早期微機電產品主要應用在車輛的安㈣ ，測系統’包括加速度計與胎壓計，在經過數年的發展後，產 品已經大幅擴展到擁有大量市場的消費性電子產品如：手機、 :人數位助理器、數位相機、筆記型電腦及遊戲主機等。微機 屯產業除了將微小化做為基本訴求外，也㈣機械結構與電子 電路相整合技術。c齡MEMS_是利用製造積體電路的半導 體標準製程來同時製造機械結構與電路相整 =㈣電路相整合在同-塊1C晶片上外，其生產的= t穩疋且精準的線寬’並且具備有批量製造、低成本等先 ：優勢g]此4多半導體產業開始投人⑽S—Μ通的元 01265:TW-發明說明書-王傳蔚 200916403 件設計領域中。 依據MEMS元件在CMOS標準製程中製作的先後順序可以將 CM0S-MEMS的製程分為三大類，分別為前段（pre_)、中段 (Intermediate-)及後段（Post-)CMOS 製程。 前段CMOS製程的方法是先定義MEMS結構，然後利用钱刻 停止層的設計來保護標準的CMOS元件，其優點在於可以避免 結構製程時所使用溫度或是蝕刻影響到CM0S的元件表現。一 f個典型的製程是先沉積多晶矽來完成MEMS之結構部分，再利 用氧化矽將元件覆蓋並且利用化學機械研磨（Chemical Mechanical Polishing，CMP)將氧化矽表面磨平，磨平之後便 可以進行第二階段的CMOS製程來製造電路元件。最後步驟是 將原先表面之氧化矽蝕刻移除以釋放元件，完成整個 CM0S-MEMS的結構電路整合。 中段CMOS製程是指因應元件的需要，改變原本的⑽3製 程’在製程中間加人結構所需要的薄膜層或是改變製程參數， 不過基本上-般讓代工廠不允許製程參數的更動所以使 用中段製程的廠商通常是自己擁有元件的製造廠，才能夠因應 自己的需求而改變參數。 後段CMOS製程是指同時間完成姓 又、，’。構與CMOS製程，並於製 程完成後進行懸浮MEMS結構的步驟，；7 ^ 、 叼ν驟，也可以在CMOS製程後再 進仃相關的元件製程，如：電鍍、蝕刻等。 傳統CM0S-MEMS的後製程通常p , 、此做垂直面的钱刻，盔法 蝕刻出與基材平行的孔道來 ‘’、、 面卜夕θ立丨 又马上下電極的間距，因此目前市 上夕疋利用CM0S-MEMS來製作出 出的電谷式同平面加速度 〇1265，TW-發明說明昏王傳蔚 6 200916403 計’這類垂直式的梳狀感測器所感測的電容變化過小以及具有 嚴重的殘留應力’使得元件的表現有限，無法滿足一般加速度 計使用需求。 另外’冒有學者提出利用質量不平衡的結構來感測出平面 之加速度的概念，其概念在於當結構受到出平面的加速度時， 因為質量不平衡，所以結構會產生一扭轉的位移，而透過電容 變化對映輸出電壓變化來瞭解加速度大小。這種結構的製程是 先利用兩道光罩定義出玻璃基材上陽極接合的圖塊與結構運 動的空間，然後，再利用一道光罩在矽晶圓上定義結構並蝕 刻，最後將矽基材與玻璃陽極接合完成整體元件，這種結構的 優點是厚度較厚因此感測的訊號較大且製程簡單；缺點則是其 感測架構只能單純的做單一電容變化感測或是差分式 (di f f erent ial)電容感測，因此在雜訊的處理上較為困難，造 成元件的解析度不佳（因為容易受外界溫度干擾）。 再者’也曾有學者提出了結合面加工與體加工的微量出平 面加速度感測计’其是先利用表面加工的深槽回填（Trench ref i 11)的方法來做為電極間距的犧牲層，然後利用整塊矽晶 圓進行體触刻以懸浮整個質量塊，最後移除犧牲層形成電容間 距便完成了整個元件架構，此結構的優點在於利用深槽回填的 方法可以得到極小的電容間距而使得電容變化量增大而增加 元件的靈敏度，並且利用整塊矽基材之厚度做為質量塊的結構 能夠大幅的增加加速度作用至元件上所產生的位移，因此可以 提高訊號產生的量；此結構的缺點在於製程相當複雜，深槽回 填的犧牲層厚度難以掌控而導致量測範圍不足，並且在移除犧 牲層時會有黏附（stiction)的現象使得製程良率不高。 01265-TW-發明說明書，王傳蔚 7 200916403 目蝻，加速度計已被應用在筆記型電腦的硬碟中，用以 測硬碟所受到的振動，當硬碟所受到之振動過大時，硬碟讀= 頭將會自動將讀寫頭移出硬碟碟片’以免讀寫頭到傷硬碟表 面，進而延長硬碟壽命。另外，加速度計也已應用於遊樂器 機中，其中最引人注目的是其操控遊戲介面遷入多轴的加速 感測器，可以針對遊戲者本身運動所產生的加速度來與遊戲主 機做互動；相同的互動也同時應用在手機的遊戲中。 有鑑於此，便有需要提出一種出平面加速度感測裝置 解決上述問題。 Λ 【發明内容】 曰本發月之目的在於提供—種出平面加速度感測裝置 畺測沿著基板法線方向上的加速度。 本㈣之出平面加速度感測裝置包含一基板、一質量塊斑 至>-個彈性元件。質量塊係設置於框體於基板上所圈的 二容置空間内，藉由彈性元件與框體彈性連接，使得當質量： 朝向或遠離基板移動時，彈性元件可對質量塊施予力量，使其 回復至平衡時的位置。質量塊的兩相對縱向側上，分別設置= 電極，朝框體的兩相對縱向側 w 對縱向側的内側上則分的兩相 縱向側延伸且平行基板。質詈 對Metal Oxide Semiconductor), which uses high-purity lanthanum and cerium as a substrate, replaces traditional large-scale transistors with current characteristics generated by procedures such as ion cloth value, oxidation, and deposition. Its main advantage is its large Shrinking: area and volume and mass manufacturing's advantages make Beijing especially the current circuit industry. The reason why the conventional micro-electromechanical system (MEMS) will become the focus of current research is that the current world trend emphasizes small size, low loss, and high added value; in addition, MEMS has the advantage of integrating with semiconductor manufacturing technology, which makes MEMS more With the advantage of mass production. Early MEMS products were mainly used in vehicle safety (4), and the measurement system 'includes accelerometers and tire pressure gauges. After several years of development, the products have been greatly expanded to consumer electronics products with a large number of markets such as: mobile phones, : people Digital assistants, digital cameras, notebook computers and game consoles. In addition to miniaturization as a basic appeal, the microcomputer industry also (iv) integration of mechanical structures and electronic circuits. The c-age MEMS_ is a semiconductor standard process for manufacturing integrated circuits to simultaneously fabricate mechanical structures and circuit phase-integrated = (4) circuits integrated on the same-block 1C wafer, which produces a stable and accurate line width. And it has the advantages of mass production, low cost, etc.: Advantages g] The 4 semiconductor industries began to invest in (10) S-Μ通元01265: TW-Invention Manual-Wang Chuanwei 200916403 in the field of design. According to the sequence of MEMS components fabricated in the CMOS standard process, the CM0S-MEMS process can be divided into three categories: pre- (pre_), mid- (intermediate-) and post- (Post-) CMOS processes. The first CMOS process is to define the MEMS structure and then use the design of the stop layer to protect the standard CMOS components. The advantage is that the temperature used in the structural process or the etch affects the performance of the CMOS components. A typical process is to deposit polycrystalline germanium to complete the structural part of the MEMS, then cover the component with yttrium oxide and smooth the surface of the yttrium oxide by chemical mechanical polishing (CMP). A two-stage CMOS process to fabricate circuit components. The final step is to remove the etched yttrium oxide from the original surface to release the components, completing the structural circuit integration of the entire CMOS-MEMS. The mid-range CMOS process refers to changing the original (10)3 process to the film layer required to add the structure in the middle of the process or changing the process parameters in response to the needs of the component. However, basically, the foundry does not allow the process parameters to be changed, so the middle segment is used. The manufacturer of the process is usually the manufacturer that owns the component, and can change the parameters according to their own needs. The latter CMOS process means that the last name is completed at the same time, '. The process of fabricating the CMOS process and suspending the MEMS structure after the process is completed; 7^, 叼ν, or the related component process, such as electroplating, etching, etc., after the CMOS process. The post-process of the traditional CM0S-MEMS is usually p, and the vertical face is engraved. The helmet method etches the hole parallel to the substrate to '', the surface of the surface and the distance between the electrodes immediately, so the current city On the eve of the CM 疋 疋 疋 疋 疋 疋 疋 疋 疋 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 2009 2009 2009 2009 2009 2009 2009 2009 2009 The residual stress' makes the performance of the component limited and cannot meet the requirements of general accelerometer use. In addition, some scholars have proposed the concept of using the mass imbalance structure to sense the acceleration of the plane. The concept is that when the structure receives the acceleration of the plane, because the mass is unbalanced, the structure will produce a torsional displacement. Capacitance changes map the output voltage changes to understand the magnitude of the acceleration. The process of this structure is to first define the space of the anodic bonded block and structure movement on the glass substrate by using two masks, and then use a mask to define the structure on the germanium wafer and etch, and finally the germanium substrate. Bonding with the glass anode completes the integral component. The advantage of this structure is that the thickness is thick, so the sensed signal is large and the process is simple. The disadvantage is that the sensing architecture can only be used for single capacitance change sensing or differential ( Di ff erent ial) Capacitance sensing is therefore difficult in the processing of noise, resulting in poor resolution of components (because it is susceptible to external temperature interference). Furthermore, 'some scholars have proposed a micro-cavity acceleration sensor for surface processing and body machining', which is a deep trench backfill (Trench ref i 11) method for surface processing as a sacrificial layer for electrode spacing. Then, using a whole piece of germanium wafer for body contact to suspend the entire mass, and finally removing the sacrificial layer to form a capacitor pitch completes the entire component structure. The advantage of this structure is that a deep trench backfill method can be used to obtain a very small capacitance pitch. Moreover, the capacitance variation is increased to increase the sensitivity of the component, and the structure using the thickness of the monolithic crucible substrate as the mass block can greatly increase the displacement generated by the acceleration action on the component, thereby increasing the amount of signal generation; The disadvantage of this structure is that the process is quite complicated, the thickness of the sacrificial layer of the deep trench backfill is difficult to control, and the measurement range is insufficient, and there is a stiction phenomenon when the sacrificial layer is removed, so that the process yield is not high. 01265-TW-Invention Manual, Wang Chuanwei 7 200916403 It is shown that the accelerometer has been applied to the hard disk of a notebook computer to measure the vibration of the hard disk. When the vibration of the hard disk is too large, the hard disk reads. = The head will automatically move the read/write head out of the hard disk 'to avoid hitting the head to the surface of the hard disk, thus extending the life of the hard disk. In addition, the accelerometer has also been applied to the game machine, the most striking of which is that it controls the game interface to move into the multi-axis acceleration sensor, which can interact with the game host for the acceleration generated by the player's own motion; The same interaction is also applied to the game of the mobile phone. In view of this, there is a need to propose an out-of-plane acceleration sensing device to solve the above problems. Λ 【Abstract】 The purpose of this month is to provide a plane acceleration sensing device to measure the acceleration along the normal direction of the substrate. The out-of-plane acceleration sensing device of the present invention (4) comprises a substrate, a mass spot, and an elastic element. The mass is disposed in the two accommodating spaces of the frame on the substrate, and is elastically connected to the frame by the elastic member, so that the elastic member can apply force to the mass when the mass is moved toward or away from the substrate. Return it to the position at the time of balance. On the opposite longitudinal sides of the mass, = electrodes are respectively provided, extending toward the two longitudinal sides of the longitudinal side of the two longitudinal sides of the frame and extending parallel to the substrate. Quality
:二朝框體的兩相對橫向側延伸且平行基板 J 側延伸且平行基板，而各電極二朝貝夏塊的兩相對橫向 „ ^ , Α 而各電極與其相對電極在基板法線方向上 的投影係部分重疊。當質量塊因外力朝向或遠離基板移動時 01265-TW-發明說明書·王傳蔚 8 200916403 電極與相對電極間的距離會產生變化，造 測量電容值的變化來測俨 值文k ’藉由 上的加速度。 衣直〜者基板法線方向 為了讓本發明之上述和其他目的、 顯，下文特舉本發明實施例，並 \二‘,點能更明 下。 加0所附圖不，作詳細說明如 【實施方式 π明太^考第1a及lb圖其中戴線A_A與截、線B-B係為方便 :月：發明之出平面感測裝。。所纷製的，。點為載線A_A j線之交點。本發明第一實施例之出平面感測裝置ι〇〇 150、一矩形的質量塊12〇與至少一個彈性元件 130。基板150上配置有一矩形的框體16〇，於基板15〇上圈 圍出-容置空間"0。質量塊120設置於容置空間11〇内的基 板150上，其可沿著基板15G的法線方向朝向或遠離基板15〇 ㈣。彈性元件130則連接框體160與質量塊120，使得當質 C. 量塊120沿著基板15G的法線方向朝向或遠離基板15〇移動 時，彈性元件130可對質量士鬼120施予力量，使其回復至平衡 時的位置。 為了里測加速度，質里塊丨20的兩相對縱向側i 2丨、i 23 上，分別設置有電極171、173’朝框體16〇的兩相對縱向側 161、163延伸且平行基板150;而框體16〇的兩相對縱向側 16i、163的内側上則分別設置有相對電極i8i、183，朝質量 塊120的兩相對縱向侧121、123延伸且平行基板15〇 ,電極 171與相對電極181在基板150法線方向上的投影係部分重 01265-TW-發明說明書-王傳蔚 9 200916403 疊，而電極173與相對電極183在基板15〇法線方向上的投影 則部分重疊。當質量塊120因外力沿著基板15〇的法線方向= 動時，此時與質量塊12〇連接的電極171、173也會產生相對 應的移動，造成電極171與相對電極181間的距離產生變化， 同理，電極173與相對電極183間的距離亦會產生變化。由於 電極間距離的變化會造成電極丨7丨與相對電極丨8丨以及電極 173與相對電極183間的電容值產生改變，藉由測量電容值的 广變化可測得加速度感測裝置100沿著基板150法線方向上的加 (j速度。 為了增加電容值以提高加速度感測裝置i 〇〇的靈敏度，可 在質量塊1 20的兩相對橫向側丨22、1 24上分別設置電極丨72、 174朝框體1 6 0的兩相對橫向側1 6 2、1 6 4延伸且平行基板 150 ;而框體160内側的兩相對橫向側162、164上則分別設置 有相對電極182、184,朝質量塊120的兩相對橫向側122、124 延伸且平行基板150’電極172與相對電極182在基板150法 線方向上的投影係部分重疊，而電極i 74與相對電極} 84在基 I 板1 5 0法線方向上的投影則部分重疊。同樣地，當質量塊12 〇 因外力沿著基板1 50的法線方向移動時，電極1 72與相對電極 1 82以及電極1 74與相對電極丨84間的電容值會產生變化，亦 可作為量測加速度感測裝置1〇〇沿著基板150法線方向上加速 度大小的依據。於本發明較佳實施例中，電極1 7丨、丨7 3與基 板1 50間的距離，係分別大於電極1 8丨、1 83與基板丨5〇間的 距離；而電極172 ' 174與基板150間的距離，則係分別小於 電極182、184與基板150間的距離。如此，當質量塊12〇朝 向基板150運動而使得電極171、173與相對電極ι81、183 01265-TW-發明說明書-王傳蔚 1〇 200916403 間的距離減小時，而電極172、174與相對電極182、184間的 距離則會增大；當質量，兔120遠離基板15〇運動而使得；極 17卜173與相對電極181、183間的距離增大時，而電極〖π、 174與相對電極182、184間的距離則會減小。此一設計係所 謂的全差分式電容（fully differential capacitor)設計，能提高量 測的靈敏度。 另外，由於以蝕刻方式不易形成大面積的電極，本發明之 電極 171、172、173、174、181、182、183 與 ι84 亦可設計成 梳狀（comb-like)的電極，亦即每個電極ι71、172、ι73、174、 181 182 1 8 3與1 8 4分別包含複數個面積較小的電極，彼此 相隔一定的距離平行排列。再者，為了解決梳狀電極i7i、 172 ' 173、174、181、182、183 與 184 翹曲的問題，每一電 極 171、172、173、174、181、182、183 與 184 所包含的複數 個平行電極，係以一橫臂192將之連接，每一橫臂丨92的兩端 再各與一加強肋194相連接，以使電極m、ι72、173、174、 1 8 1、1 82、1 83與1 84所包含的複數個平行電極，能具有較均 一的翹曲程度。此外，本發明之出平面加速度感測裝置1 〇〇 車父佳係具有四個彈性元件1 3 〇 ’其中第一個彈性元件丨3 〇連接 框體160的縱向側161與質量塊120的縱向側121 :第二個彈 性元件130連接框體1 60的橫向側1 62與質量塊1 20的橫向側 1 22 ’第二個彈性元件1 3〇連接框體1 60的縱向側1 63與質量 塊1 20的縱向側1 23 ;而第四個彈性元件1 30則連接框體1 60 的檢向側1 64與質量塊120的橫向側1 24，以使得質量塊1 20 因受外力而移動時，彈性元件130能對質量塊12〇提供對稱的 恢復力’質量塊120因此不會產生旋轉運動。而為了克服微機 01265-TW·發明說明書-王傳蔚 11 200916403 電元件常發生紐曲的問題，本發明之出平面加速度感測裝置 1 00之框體1 60係設計成矩形，藉此改善基板1 5〇翹曲的問 題。另外，本發明另在矩形框體1 60的四個角落上各設置位在 基板150上的一固定部196,藉此降低因殘留應力所造成的翹 曲。 參考第2圖’本發明第二實施例之出平面感測裝置2 〇 〇類 似第一實施例之出平面感測裝置1 〇 〇，但不同的是，出平面感 測裝置200的四個彈性元件230係成線型，且分別位在矩形框 體1 60的四個角落，並分別連接至略呈矩形的質量塊丨2〇的四 個角落。而出平面感測裝置200的其他元件與出平面感測裝置 10 0的相同’於此不再賛述。 請參考第1及3圖，本發明之出平面加速度感測裝置丨〇〇、 2 0 0還可設計成能夠感測二維加速度運動的加速度感測裝置 3〇〇。加速度感測裝置300包含一基板350、感測裝置1〇〇、2〇〇 及一彈性元件330。基板350上配置有一矩形的框體360，於 基板3 5 0上圈圍出一容置空間3 1 〇，感測裝置1 〇 〇、2 〇 〇則置 於容置空間3 1 0内。二彈性元件3 3 0中的一個係連接基板1 5 〇 的一縱向側1 51的外侧與框體360的縱向側361的内側，而另 —個則連接基板1 50的另一縱向側1 53的外侧與框體360的縱 向側363的内側’使得當感測裝置ι〇〇、2〇〇平行基板35〇運 動時，彈性元件330可對感測裝置！ 00、200施予力量，使其 回復至平衡時的位置。另外，本發明在矩形框體36〇的四個角 落上各設置位在基板350上的一固定部396，藉此降低因殘留 應力所造成的翹曲。 01265-TW-發明說明書-王傳蔚. 12 . 200916403 為了量測加速度，基板150的兩相對橫向側152、i54的 外側上，分別設置有複數個彼此平行的電極372、374，朝框 體360的兩相對橫向側362、364延伸；而框體36〇的兩相對 橫向側362、364 #内側上則分別言免置有複數個彼此平行的相 對電極382、384’朝基板150的兩相對橫向側152、154延伸， 並分別插入兩相鄰的電極372與兩相鄰的電極374之間。當感 測裝置100、200平行基板350運動而使得電極372與相對電 極382之間的距離，以及電極374與相對電極384之間的距離 產生變化，造成其間的電容值產生改變，藉由量測電容值的變 化可測得加速度感測裝置300平行基板350的加速度。 本發明之加速度感測裝置300因具有出平面加速度感測裝 置100、200 ,因此可測得一個維度的加速度；再者，由於感 測裝置100、200的整體可視為一個質量塊，其可平行基板35〇 運動，藉此感測裝置300可測得另一個維度的加速度。因此本 發明之加速度感測裝置300可測得至少兩個維度的加速度。 參考第1及4圖’本發明之出平面加速度感測裝置1 〇〇還 可設計成另一種能夠感測二維加速度運動的加速度感測裝置 400。加速度感測裝置400類似加速度感測裝置10〇，但原先 感測裝置1 00的質量塊1 20取代為類似感測裝置3〇〇的結構， 亦即加速度感測裝置400相較於感測裝置1 〇〇另包含一基板 450、一質量塊420及二彈性元件430。基板450上配置有— 矩形的框體460，於基板450上圈圍出一容置空間410，質量 塊420則設於容置空間4 1 0内。二彈性元件430中的一個係連 接框體4 6 0的縱向側4 6 1與質量塊4 2 0的縱向側4 2 1，而另— 個彈性元件430則連接框體460的縱向侧463與質量塊420 01265-TW-發明說明書-王傳蔚 13 200916403 的縱向側423，使得當f量塊420平行基板㈣運動時，彈性 凡件430可對質量塊42〇施予力量，使其回復至平衡時的位 置。另外’矩形框體彻的四個角落上各設置有位在基板45〇 上的-固定部496’藉此降低因殘留應力所造成的紐曲。 為了量測加速度，質量塊420的兩相對橫向側422、424 上，分別設置有複數個彼此平行的電極472、474,朝框體46〇 的兩相對橫向側462 ' 464延伸；而框體46Q的兩相㈣向側 462、464的内側上則分別設置有複數個彼此平行的相對電極 482、484 ’朝質量塊420的兩相對橫向{則似、424延伸，並 分別插入兩相鄰的電極472與兩相鄰的電極474之間。當質量 塊420平行基板450運動而使得電極472與相對電極482之間 的距離以及電極474與相對電極484之間的距離產生變化， 造成其間的電容值產生改變，藉由量測電容值的變化可測得加 速度感測裝置400平行基板450的加速度。 另外，感測裝置400的電極171、173係分別設置於基板 450的兩相對縱向側45 1、453上，朝框體160的兩相對縱向 側161、163延伸且平行基板15〇 ;而電極172、174則分別設 置於基板450的兩相對橫向側452 ' 454上，朝框體160的兩 相對橫向侧162、164延伸且平行基板15〇。此外，感測裝置 400較佳亦係具有四個彈性元件丨3〇，其中第一個彈性元件13〇 連接框體1 6 0的縱向側1 61與基板4 5 0的縱向側4 5 1 ;第二個 彈性元件130連接框體160的橫向側162與基板450的橫向側 452 ;第三個彈性元件13〇連接框體16〇的縱向側ι63與基板 450的縱向側453 ;而第四個彈性元件130則連接框體160的 橫向側164與基板450的橫向側454。而感測裝置400的其他 01265-TW-發明說明書·王傳蔚 .14 200916403 元件與感測裝置i 00的相同，其作用於此不再贅述。 同樣地’當基板450因外力沿著基板150的法線方向移動 時’此時與基板45〇連接的電極m、172、173與174也會產 生相對應的移動，造成電極！ 7〗、1 72、1 73、1 74與相對之電 極181、182、183、184間的電容值產生改變，藉由測量電容 值的變化可測得加速度感測裝置4〇〇沿著基板丨5〇法線方向上 的加速度。 本發明之加速度感測裝置4〇〇可測得平行基板15〇方向上 的加速度，因此可測得一個維度的加速度；再者，基板々Μ 上的結構可視為一個質量塊，其可垂直基板15〇運動，藉此感 測裝置400可測得另一個維度的加速度。因此本發明之加速度 感測裝置400可測得至少兩個維度的加速度。 又The two opposite lateral sides of the frame extend and extend parallel to the substrate J side and are parallel to the substrate, and the electrodes are opposite to the two opposite transverse directions of the Bescha block, and the electrodes and their opposite electrodes are in the normal direction of the substrate. The projection system partially overlaps. When the mass moves toward or away from the substrate due to external force, 01265-TW-Invention Manual·Wang Chuanwei 8 200916403 The distance between the electrode and the opposite electrode changes, and the change of the measured capacitance value is measured to measure the value k' The above-mentioned and other objects and advantages of the present invention will be clarified by the above-mentioned and other objects, and the following will clarify the embodiments of the present invention. No, for a detailed description, such as [the implementation method π Mingtai ^ test 1a and lb diagram, which wears the line A_A and the cut line, the line BB is convenient: month: the invention of the plane sensed device. The system is made. The intersection of the line A_A j line. The plane sensing device ι 150 of the first embodiment of the present invention, a rectangular mass 12 〇 and at least one elastic member 130. The substrate 150 is provided with a rectangular frame 16 , on the substrate 15 〇 circle The enclosure-accommodating space <0. The mass 120 is disposed on the substrate 150 in the accommodating space 11A, which may be oriented toward or away from the substrate 15 (four) along the normal direction of the substrate 15G. The elastic member 130 is connected to the frame The body 160 and the mass 120 are such that when the mass C. mass 120 moves toward or away from the substrate 15〇 along the normal direction of the substrate 15G, the elastic member 130 can apply force to the mass ghost 120 to restore the balance. In order to measure the acceleration, the two opposite longitudinal sides i 2 丨, i 23 of the mass 丨 20 are respectively provided with electrodes 171, 173' extending toward the opposite longitudinal sides 161, 163 of the frame 16 且 and Parallel substrate 150; and opposite sides of the opposite longitudinal sides 16i, 163 of the frame 16A are respectively provided with opposite electrodes i8i, 183 extending toward the opposite longitudinal sides 121, 123 of the mass 120 and parallel to the substrate 15? The projection of the 171 and the opposite electrode 181 in the normal direction of the substrate 150 weighs 01265-TW - the invention specification - Wang Chuanwei 9 200916403, and the projection of the electrode 173 and the opposite electrode 183 in the normal direction of the substrate 15 is partially overlapped. When the mass 120 is along the base due to external force The normal direction of 15 = = moving, at this time, the electrodes 171, 173 connected to the mass 12 也会 also produce a corresponding movement, causing a change in the distance between the electrode 171 and the opposite electrode 181. Similarly, the electrode 173 and The distance between the opposite electrodes 183 also changes. The change in the distance between the electrodes causes a change in the capacitance between the electrode 丨7丨 and the opposite electrode 丨8丨 and between the electrode 173 and the opposite electrode 183, by measuring the wide range of capacitance values. The change can measure the acceleration (j speed) of the acceleration sensing device 100 along the normal direction of the substrate 150. In order to increase the capacitance value to increase the sensitivity of the acceleration sensing device i ,, two opposite lateral directions of the electrodes 丨 72, 174 toward the frame 1 60 can be respectively disposed on the opposite lateral sides 、 22, 1 24 of the mass 120 Sides 1 6 2, 1 6 4 extend and are parallel to substrate 150; and opposite lateral sides 162, 164 on the inside of frame 160 are provided with opposing electrodes 182, 184, respectively, toward opposite lateral sides 122, 124 of mass 120 The projections of the extended and parallel substrate 150' electrode 172 and the opposite electrode 182 in the normal direction of the substrate 150 partially overlap, and the projections of the electrode i 74 and the opposite electrode 84 in the normal direction of the base plate 1 50 are partially overlapped. . Similarly, when the mass 12 移动 moves along the normal direction of the substrate 150 due to an external force, the capacitance between the electrode 1 72 and the opposite electrode 1 82 and between the electrode 1 74 and the opposite electrode 丨 84 may change. The basis of the acceleration of the acceleration sensing device 1 along the normal direction of the substrate 150 is measured. In a preferred embodiment of the present invention, the distance between the electrodes 1 7 丨, 丨 7 3 and the substrate 150 is greater than the distance between the electrodes 1 8 丨, 1 83 and the substrate 丨 5 分别, respectively; and the electrodes 172 ' 174 and The distance between the substrates 150 is smaller than the distance between the electrodes 182, 184 and the substrate 150, respectively. Thus, when the mass 12 运动 moves toward the substrate 150 such that the distance between the electrodes 171, 173 and the opposite electrode ι 81, 183 01265-TW - invention specification - Wang Chuanwei 1 〇 200916403 is reduced, the electrodes 172, 174 and the opposite electrode 182, The distance between 184 will increase; when the mass, the rabbit 120 moves away from the substrate 15〇; when the distance between the pole 17 173 and the opposite electrodes 181, 183 increases, the electrodes π, 174 and the opposite electrode 182, The distance between 184 will decrease. This design is a fully differential capacitor design that increases the sensitivity of the measurement. In addition, since it is difficult to form a large-area electrode by etching, the electrodes 171, 172, 173, 174, 181, 182, 183, and ι84 of the present invention can also be designed as comb-like electrodes, that is, each The electrodes ι 71, 172, ι 73, 174, 181 182 1 8 3 and 1 8 4 respectively comprise a plurality of electrodes having a small area, which are arranged in parallel with each other at a certain distance. Furthermore, in order to solve the problem of warpage of the comb electrodes i7i, 172' 173, 174, 181, 182, 183 and 184, the plural numbers included in each of the electrodes 171, 172, 173, 174, 181, 182, 183 and 184 The parallel electrodes are connected by a cross arm 192, and each end of each cross arm 92 is connected to a reinforcing rib 194 so that the electrodes m, ι 72, 173, 174, 1 8 1 , 1 82 The plurality of parallel electrodes included in 1 83 and 1 84 can have a relatively uniform degree of warpage. In addition, the planar acceleration sensing device 1 of the present invention has four elastic members 1 3 〇' wherein the first elastic member 丨3 〇 connects the longitudinal side 161 of the frame 160 with the longitudinal direction of the mass 120 Side 121: the second elastic element 130 connects the lateral side 1 62 of the frame 1 60 with the lateral side 1 22 of the mass 1 20 'The second elastic element 1 3 〇 connects the longitudinal side 1 63 of the frame 1 60 with the mass The longitudinal side 1 23 of the block 1 20; and the fourth elastic element 1 30 connects the detecting side 1 64 of the frame 1 60 with the lateral side 1 24 of the mass 120 so that the mass 1 20 is moved by an external force At this time, the elastic member 130 can provide a symmetrical restoring force to the mass 12', so that the mass 120 does not cause a rotational motion. However, in order to overcome the problem that the microcomputer 01265-TW·Invention Manual-Wang Chuanwei 11 200916403 electrical components often occur, the frame 1 60 of the planar acceleration sensing device 100 of the present invention is designed to be rectangular, thereby improving the substrate 1 5 The problem of warping. Further, the present invention further provides a fixing portion 196 on the substrate 150 at each of the four corners of the rectangular frame 160, thereby reducing warpage caused by residual stress. Referring to Figure 2, the out-of-plane sensing device 2 of the second embodiment of the present invention is similar to the out-of-plane sensing device 1 of the first embodiment, but differs in the four resilience of the out-of-plane sensing device 200. The elements 230 are linear and are respectively located at the four corners of the rectangular frame 160 and are respectively connected to the four corners of the slightly rectangular mass 丨2〇. The other elements of the out-of-plane sensing device 200 are the same as those of the out-of-plane sensing device 100, and are not described herein. Referring to Figures 1 and 3, the planar acceleration sensing device 丨〇〇, 2000 of the present invention can also be designed as an acceleration sensing device capable of sensing two-dimensional acceleration motion. The acceleration sensing device 300 includes a substrate 350, sensing devices 1 and 2, and a resilient member 330. A rectangular frame body 360 is disposed on the substrate 350, and an accommodating space 3 1 围 is enclosed in the substrate 350. The sensing devices 1 〇 〇 and 2 〇 置 are disposed in the accommodating space 310. One of the two elastic members 3 3 0 connects the outer side of one longitudinal side 1 51 of the substrate 1 5 to the inner side of the longitudinal side 361 of the frame 360, and the other connects the other longitudinal side 1 53 of the substrate 150. The outer side of the longitudinal side 363 of the frame 360 and the inner side of the longitudinal side 363 of the frame 360 enable the elastic member 330 to be attached to the sensing device when the sensing device ι, 2 〇〇 parallel substrate 35 ! is moved! 00, 200 apply force to return to the position at the balance. Further, the present invention provides a fixing portion 396 on the substrate 350 at each of the four corners of the rectangular frame 36', thereby reducing warpage caused by residual stress. 01265-TW-Invention Manual-Wang Chuanwei. 12 . 200916403 In order to measure the acceleration, a plurality of electrodes 372 and 374 which are parallel to each other are disposed on the outer sides of the opposite lateral sides 152 and i54 of the substrate 150, respectively. The opposite lateral sides 362, 364 extend; and the opposite lateral sides 362, 364 # of the frame 36〇 are respectively provided with a plurality of opposing electrodes 382, 384' that are parallel to each other toward the opposite lateral sides 152 of the substrate 150. 154 extends and is inserted between two adjacent electrodes 372 and two adjacent electrodes 374, respectively. When the sensing devices 100, 200 move parallel to the substrate 350 such that the distance between the electrode 372 and the opposite electrode 382, and the distance between the electrode 374 and the opposite electrode 384 change, causing a change in the capacitance value therebetween, by measuring The change in capacitance value can measure the acceleration of the acceleration sensing device 300 parallel to the substrate 350. The acceleration sensing device 300 of the present invention can measure the acceleration of one dimension by having the out-of-plane acceleration sensing device 100, 200; further, since the whole of the sensing device 100, 200 can be regarded as a mass, it can be parallel The substrate 35 is moved, whereby the sensing device 300 can measure the acceleration of another dimension. Thus, the acceleration sensing device 300 of the present invention can measure acceleration in at least two dimensions. Referring to Figures 1 and 4, the planar acceleration sensing device 1 of the present invention can also be designed as another acceleration sensing device 400 capable of sensing two-dimensional acceleration motion. The acceleration sensing device 400 is similar to the acceleration sensing device 10〇, but the mass of the original sensing device 100 is replaced by a structure similar to the sensing device 3〇〇, that is, the acceleration sensing device 400 is compared to the sensing device. 1 further includes a substrate 450, a mass 420 and two elastic members 430. A rectangular frame 460 is disposed on the substrate 450, and an accommodating space 410 is encircled on the substrate 450. The mass 420 is disposed in the accommodating space 410. One of the two elastic members 430 is connected to the longitudinal side 461 of the frame 460 and the longitudinal side 421 of the mass 420, and the other elastic member 430 is connected to the longitudinal side 463 of the frame 460. Mass block 420 01265-TW-Invention Manual - Wang Chuanwei 13 The longitudinal side 423 of 200916403 allows the elastic member 430 to apply force to the mass 42 to return to equilibrium when the f-block 420 is moved parallel to the substrate (4) s position. Further, each of the four corners of the rectangular frame body is provided with a fixing portion 496' on the substrate 45A to thereby reduce the click due to residual stress. In order to measure the acceleration, two opposite lateral sides 422, 424 of the mass 420 are respectively provided with a plurality of mutually parallel electrodes 472, 474 extending toward the opposite lateral sides 462 ' 464 of the frame 46 ;; and the frame 46Q On the inner side of the two-phase (four) side faces 462, 464, respectively, a plurality of opposite electrodes 482, 484 which are parallel to each other are disposed to face the two opposite lateral directions of the mass block 420, and are respectively inserted into two adjacent electrodes. 472 is between the two adjacent electrodes 474. When the mass 420 moves parallel to the substrate 450, the distance between the electrode 472 and the opposite electrode 482 and the distance between the electrode 474 and the opposite electrode 484 change, causing a change in the capacitance value therebetween, by measuring the change in the capacitance value. The acceleration of the acceleration sensing device 400 parallel to the substrate 450 can be measured. In addition, the electrodes 171 and 173 of the sensing device 400 are respectively disposed on the opposite longitudinal sides 45 1 and 453 of the substrate 450, extending toward the opposite longitudinal sides 161 and 163 of the frame 160 and parallel to the substrate 15〇; and the electrode 172 And 174 are respectively disposed on the opposite lateral sides 452' 454 of the substrate 450, extending toward the opposite lateral sides 162, 164 of the frame 160 and parallel to the substrate 15A. In addition, the sensing device 400 preferably has four elastic members 丨3 〇, wherein the first elastic member 13 〇 connects the longitudinal side 1 61 of the frame 160 to the longitudinal side 4 5 1 of the substrate 450; The second elastic member 130 connects the lateral side 162 of the frame 160 with the lateral side 452 of the substrate 450; the third elastic member 13 〇 connects the longitudinal side ι 63 of the frame 16 〇 with the longitudinal side 453 of the substrate 450; and the fourth The resilient element 130 then connects the lateral side 164 of the frame 160 to the lateral side 454 of the substrate 450. The other 01265-TW-invention specification of the sensing device 400. Wang Chuanwei. 14 200916403 The same components as the sensing device i 00, the functions of which are not described herein. Similarly, when the substrate 450 is moved in the normal direction of the substrate 150 by an external force, the electrodes m, 172, 173, and 174 which are connected to the substrate 45A at this time also cause corresponding movement, resulting in electrodes! The capacitance value between 7, 1, 72, 1 73, 1 74 and the opposite electrode 181, 182, 183, 184 is changed, and the acceleration sensing device 4 can be measured along the substrate by measuring the change in the capacitance value. 5〇 Acceleration in the normal direction. The acceleration sensing device 4 of the present invention can measure the acceleration in the direction of the parallel substrate 15 , so that the acceleration in one dimension can be measured; further, the structure on the substrate 可视 can be regarded as a mass, which can be a vertical substrate. 15 〇 movement, whereby the sensing device 400 can measure the acceleration of another dimension. Thus, the acceleration sensing device 400 of the present invention can measure acceleration in at least two dimensions. also
雖然本發明已以前述較佳實施例揭示，然其並非用 ^㈣’任何熟習此技藝者’纟不脫離本發明之精神和= 3可作各種之更動與修改。因此本發明之保護範 附之申請專利範圍所界定者為準。 田視後 01265-TW-發明說明昏王傳蔚 15 200916403 【圖式簡單說明】 第la圖：為本發明第一實施例之出平面感測装置之立體 圖。 第lb圖；為第la圖之出平面感測裝置局部區域放大圖。 第2圖·為本發明第二貫施例之出平面感測裝置之立體圖。 第3圖·為本發明之一種能夠感測二維加速度運動的感測 裝置的示意圖。 第4圖：為本發明之另一種能夠感測二維加速度運動的感 測装置的示意圖。 01265-TW-發明說明昏王傳蔚 、16 200916403 【主要元件符號說明】 100 感 測 裝 置 110 容 置 空 間 120 質 量 塊 121 縱 向 側 122 橫 向 側 123 縱 向 側 124 橫 向 側 130 彈性 元 件 150 基板 151 縱 向 側 152 橫 向 側 153 縱 向 側 154 橫 向 側 160 框 體 161 縱 向 側 162 橫 向 側 163 縱 向 側 164 橫 向 側 171 電 極 172 電 極 173 電 極 174 電 極 181 相 對 電 極 182 相 對 電 極 183 相 對 電 極 184 相 對 電 極 192 橫臂 194 加 強 肋 196 固 定 部 200 感 測 裝 置 230 彈 性 元 件 300 感 測 裝 置 3 10 容 置 空 間 330 彈性 元 件 350 基板 360 框 體 361 縱 向 側 362 橫 向 側 363 縱 向 側 364 橫 向 側 01265-TW-發明說明書-王傳蔚 Π 200916403 372 電 極 374 電 極 382 相 對 電 極 384 相 對 電 極 396 固 定部 400 感 測 裝 置 410 容 置 空 間 420 質 量 塊 421 縱 向 側 422 橫 向 側 423 縱 向 側 424 橫 向 側 430 彈 性 元 件 450 基板 451 縱 向 側 452 橫 向 側 453 縱 向 側 454 橫 向 側 460 框 體 461 縱 向 側 462 橫 向 側 463 縱 向 側 464 橫 向 側 472 電 極 474 電 極 482 相 對 電 極 484 相 對 電 極 496 固 定部 01265-TW-發明說明書·王傳蔚 18Although the present invention has been disclosed in the foregoing preferred embodiments, it is not intended to be limited to the details of the invention. Therefore, the scope of the patent application of the present invention is defined by the scope of the patent application. Tian Shihou 01265-TW-Invention Description Faint Wang Chuanwei 15 200916403 [Simplified description of the drawings] Fig. la is a perspective view of the plane sensing device according to the first embodiment of the present invention. Figure lb is an enlarged view of a partial area of the plane sensing device of the first drawing. Fig. 2 is a perspective view of a plane sensing device according to a second embodiment of the present invention. Fig. 3 is a schematic view of a sensing device capable of sensing two-dimensional acceleration motion of the present invention. Fig. 4 is a schematic view showing another sensing device capable of sensing two-dimensional acceleration motion of the present invention. 01265-TW-Invention Description Faint Wang Chuanwei, 16 200916403 [Major component symbol description] 100 Sensing device 110 accommodating space 120 Mass block 121 Longitudinal side 122 Lateral side 123 Longitudinal side 124 Lateral side 130 Elastic element 150 Substrate 151 Longitudinal side 152 Lateral Side 153 Longitudinal side 154 Lateral side 160 Frame 161 Longitudinal side 162 Lateral side 163 Longitudinal side 164 Lateral side 171 Electrode 172 Electrode 173 Electrode 174 Electrode 181 Counter electrode 182 Opposite electrode 183 Counter electrode 184 Counter electrode 192 Cross arm 194 Reinforcing rib 196 Fixing Portion 200 Sensing device 230 Elastic element 300 Sensing device 3 10 Accommodating space 330 Elastic element 350 Substrate 360 Frame 361 Longitudinal side 362 Lateral side 363 Longitudinal side 364 Lateral side 01265-TW-Invention manual-Wang ChuanweiΠ 200916403 372 Electrode 374 Electrode 382 opposite electrode 384 opposite electrode 396 fixing portion 400 sensing device 410 accommodating space 420 mass 421 longitudinal side 42 2 Transverse side 423 Longitudinal side 424 Lateral side 430 Elastic element 450 Substrate 451 Longitudinal side 452 Lateral side 453 Longitudinal side 454 Lateral side 460 Frame 461 Longitudinal side 462 Lateral side 463 Longitudinal side 464 Lateral side 472 Electrode 474 Electrode 482 Relative electrode 484 Relative Electrode 496 Fixed part 01265-TW-Invention manual · Wang Chuanwei 18