TW200915349A - Cu-Ni-Si-Co based copper alloy for electronic material and its production method - Google Patents
Cu-Ni-Si-Co based copper alloy for electronic material and its production method Download PDFInfo
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- TW200915349A TW200915349A TW97133869A TW97133869A TW200915349A TW 200915349 A TW200915349 A TW 200915349A TW 97133869 A TW97133869 A TW 97133869A TW 97133869 A TW97133869 A TW 97133869A TW 200915349 A TW200915349 A TW 200915349A
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- 229910000881 Cu alloy Inorganic materials 0.000 title claims abstract description 43
- 239000012776 electronic material Substances 0.000 title claims abstract description 18
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 229910018598 Si-Co Inorganic materials 0.000 title abstract description 8
- 229910008453 Si—Co Inorganic materials 0.000 title abstract description 8
- 239000002245 particle Substances 0.000 claims abstract description 151
- 238000005096 rolling process Methods 0.000 claims abstract description 17
- 239000010949 copper Substances 0.000 claims abstract description 13
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 10
- 238000001816 cooling Methods 0.000 claims description 76
- 238000005098 hot rolling Methods 0.000 claims description 25
- 230000032683 aging Effects 0.000 claims description 24
- 239000000463 material Substances 0.000 claims description 22
- 239000013078 crystal Substances 0.000 claims description 21
- 239000000203 mixture Substances 0.000 claims description 16
- 238000010438 heat treatment Methods 0.000 claims description 13
- 238000005097 cold rolling Methods 0.000 claims description 12
- 229910000851 Alloy steel Inorganic materials 0.000 claims description 8
- 229910052802 copper Inorganic materials 0.000 claims description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 7
- 238000005266 casting Methods 0.000 claims description 7
- 229910052709 silver Inorganic materials 0.000 claims description 7
- 229910052718 tin Inorganic materials 0.000 claims description 7
- 229910052725 zinc Inorganic materials 0.000 claims description 7
- 229910052749 magnesium Inorganic materials 0.000 claims description 6
- 229910052719 titanium Inorganic materials 0.000 claims description 5
- 229910052796 boron Inorganic materials 0.000 claims description 4
- 229910052726 zirconium Inorganic materials 0.000 claims description 4
- 230000008901 benefit Effects 0.000 claims description 3
- 235000021028 berry Nutrition 0.000 claims description 2
- 229910052698 phosphorus Inorganic materials 0.000 claims description 2
- 238000005452 bending Methods 0.000 abstract description 25
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- 239000012071 phase Substances 0.000 description 110
- 229910045601 alloy Inorganic materials 0.000 description 42
- 239000000956 alloy Substances 0.000 description 42
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- 238000000034 method Methods 0.000 description 16
- 230000000694 effects Effects 0.000 description 15
- 239000006104 solid solution Substances 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- 238000009826 distribution Methods 0.000 description 11
- 239000002244 precipitate Substances 0.000 description 11
- 230000008569 process Effects 0.000 description 9
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 8
- 238000003490 calendering Methods 0.000 description 7
- 239000011159 matrix material Substances 0.000 description 7
- 238000001556 precipitation Methods 0.000 description 7
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- 229910052787 antimony Inorganic materials 0.000 description 5
- 229910052790 beryllium Inorganic materials 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 229910052737 gold Inorganic materials 0.000 description 5
- 239000010931 gold Substances 0.000 description 5
- 238000007731 hot pressing Methods 0.000 description 5
- 230000001771 impaired effect Effects 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 4
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- 238000004445 quantitative analysis Methods 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 238000007711 solidification Methods 0.000 description 4
- 230000008023 solidification Effects 0.000 description 4
- 230000035882 stress Effects 0.000 description 4
- 229910018098 Ni-Si Inorganic materials 0.000 description 3
- 229910018529 Ni—Si Inorganic materials 0.000 description 3
- 230000002411 adverse Effects 0.000 description 3
- 229910052785 arsenic Inorganic materials 0.000 description 3
- 229910052797 bismuth Inorganic materials 0.000 description 3
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 3
- 238000004453 electron probe microanalysis Methods 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 229910052748 manganese Inorganic materials 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910017876 Cu—Ni—Si Inorganic materials 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 229910017709 Ni Co Inorganic materials 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 230000003679 aging effect Effects 0.000 description 2
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- 230000033558 biomineral tissue development Effects 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
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- 238000000227 grinding Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
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- 229920006395 saturated elastomer Polymers 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
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- XSOKHXFFCGXDJZ-UHFFFAOYSA-N telluride(2-) Chemical compound [Te-2] XSOKHXFFCGXDJZ-UHFFFAOYSA-N 0.000 description 2
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- 241000219112 Cucumis Species 0.000 description 1
- 235000015510 Cucumis melo subsp melo Nutrition 0.000 description 1
- 229910002482 Cu–Ni Inorganic materials 0.000 description 1
- 229910017816 Cu—Co Inorganic materials 0.000 description 1
- 241000885593 Geisha Species 0.000 description 1
- 241000237536 Mytilus edulis Species 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910001245 Sb alloy Inorganic materials 0.000 description 1
- 229910000676 Si alloy Inorganic materials 0.000 description 1
- 241001062472 Stokellia anisodon Species 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- FJJCIZWZNKZHII-UHFFFAOYSA-N [4,6-bis(cyanoamino)-1,3,5-triazin-2-yl]cyanamide Chemical compound N#CNC1=NC(NC#N)=NC(NC#N)=N1 FJJCIZWZNKZHII-UHFFFAOYSA-N 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000002140 antimony alloy Substances 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
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Abstract
Description
200915349 九、發明說明: 【發明所屬之技術領域】 本發明係關於一種析出硬化型銅合金,特別是關於一 種適用於各種電子機器零件之Cu_Ni—si—&系銅合金。 【先前技術】 對於連接器、開關、繼電器、接腳、端子、導線架等 各種電子機器零件所使用之電子材料用鋼合金,其基本特 性係要求同時具有高強度及高導電性 來,電子零件之高積體化及小型化、薄壁㈣料展= :地’對於電子機器零件所使用之銅合金的要求程度亦逐 漸地高度化。 從高強度及高導電性之觀點,作為電子材料用銅合金, 析出硬化型之銅合金之使用量逐漸増加,而代替以往麟青 :、黄銅等所代表之固溶強化型銅合金。_出硬化型銅合 益係藉由對經固溶處理之過飽和固溶體進行時效處理, :微細之析出物均勾分散,讓合金強㈣,同時 中之固溶元素*,提升導電性。因此, 性能等之機械性質優異,彈11 …貞優異’且導電性、導熱性亦良好之材料。 W硬化型銅合金中,—般被稱為卡㈣、合金(咖⑽ 及Cu—Nl〜Si系銅合金’為兼具較高導電性、強度、 5加工性之代表性銅合金,係業界正 行開發之合金之一 此人A 人如余進 細之H之。此銅合金,係藉由在銅基質中析出微 〃“屬間化合物粒子,來謀求強度與導電率之 5 200915349 提升。 夕2了進一步提升卡遜合金之特性,係進行Ni及si以 卜之》金成分之添加、對特性會造成不良影響之成分之排 '曰、且織之最佳化、析出粒子之最佳化等各種技術開 發。 W > ϋα有藉由添加c。來提升特性。 $於日本特開平U — 222641號公報(專利文獻υ中, D己載有C。會和Ni同樣地與Si形成化合物,而提升機械 強度,當對Cu—Γη—c. / 攸叮獨顿 C〇~Sl糸進行時效處理後,相較於Cu —BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a precipitation hardening type copper alloy, and more particularly to a Cu_Ni-Si-&-type copper alloy suitable for use in various electronic machine parts. [Prior Art] For steel alloys for electronic materials used in various electronic machine parts such as connectors, switches, relays, pins, terminals, lead frames, etc., the basic characteristics are required to have both high strength and high electrical conductivity. Highly integrated and miniaturized, thin-walled (four) material exhibition = : The degree of demand for copper alloys used in electronic machine parts is gradually increasing. From the viewpoint of high strength and high electrical conductivity, as a copper alloy for electronic materials, the use amount of the precipitation hardening type copper alloy is gradually increased, and it is a solid solution strengthening type copper alloy represented by the like. The _ hardening type copper benefit is obtained by aging treatment of the solution-treated supersaturated solid solution, and the fine precipitates are dispersed, so that the alloy is strong (four), and the solid solution element* is at the same time, and the conductivity is improved. Therefore, it is excellent in mechanical properties such as performance, and excellent in elasticity and excellent in electrical conductivity and thermal conductivity. Among the W-hardened copper alloys, it is generally called card (four), alloy (caffe (10) and Cu-Nl~Si-based copper alloys' are representative copper alloys with high electrical conductivity, strength and 5 processability. One of the alloys being developed by the company is a finer H. This copper alloy is enhanced by the precipitation of micro-organismal compound particles in the copper matrix to achieve strength and conductivity of 5 200915349. 2 Further improving the characteristics of the Carson alloy, the addition of Ni and Si to the "gold" component, the adverse effect on the characteristics of the composition of the 曰, and the optimization of the weaving, optimization of the particles Various technologies have been developed. W > ϋα has been enhanced by adding c. $ Japanese Patent Laid-Open No. 222641 (Patent Document υ, D has C. It forms a compound with Si in the same manner as Ni. And to improve the mechanical strength, when the aging treatment of Cu-Γη-c. / 攸叮 顿 C〇~Sl糸, compared to Cu -
Nl Sl系合金’機械強度、導電性皆會獲得些許提升。因 此在成本上若允許的 ^ J 選擇 Cu-Co~ Sl 系或 Cu_Ni —C ο — S i 系。 於曰本特表2005 ~ 532477妹八相广宙 ^ . θ 477唬Α報(專利文獻2),記 載一種由重置計,鎳:1%〜 η/ 鈷 〇.5 〜2.0%,矽:〇 5 =二及剩餘部分之銅及不可避免之雜質所構與 狀合:十含有量w4.3%,(Ni+c〇)/si_2: 1〜7 : 1之鍛鋼合金’該锻 墓金具有超過40%IACS之 $电性。銘發結合後,由 时π f哏制粒子成長 化性,因此會形成有助於時效 杈升^軟 丁双嶸化之矽化物。鈷含有量若 少於0.5% ’則含有姑之石夕化 3 八。# a @ t 相之析出將會不夠充 並且““結合⑽之最錢 小石夕含有料,m錢之合金 與G’5%之最 VX Ύ 〇 ^ ^ ® k 保持在 20 微米 以下。田鈷含有量超過25% 抑;-, 將會析出過剩之第二相 粒子,k成加工性之降低, B賦予對鋼合金並不佳之強 200915349 磁性特性。 於國際公開第2006/ 101 172號小冊子(專利文獻3) 中,則5己載含有Co之Cu_ Ni— Si系合金之強度,可在某 組成條件下獲得大幅提升。具體而言,係記載一種電子材 料用銅口金,其含有Ni :約0 5〜約2 5質量%、C。:約 約2.5質量%、及si :約〇·3〇〜約丨2質量%,剩餘 部分由Cu及不可避免的雜質所構成,該合金組成中之妬 與Co的合計質量相對於Si之質量濃度比(〔Ni+c〇〕/ 匕)為約4 g〔 Ni + Co〕/ Si各約5,且該合金組成中 ” Co之貝里濃度比(Ni/ c〇比)為約〇 $ $ $約2 〇 <戰有在進行固溶處理時,若刻意提高加熱後之 冷部速度’則由於可進一步發揮Cu_Ni— si系銅合金之 強度提升效果,因此使冷卻速度為每秒約1G°C以上來進行 冷卻是有所助益的。 亦已知較佳為控制銅基質中之粗大夾雜物。 於日本特開2001 - 49369號公報(專利 記載有在進杆Γι — χτ. —Nl—Si系合金之成分調整後,視需 p、可精由使其含有Mg、Zn、Sn、Fe、Ti、Zn 、Ag、Be,且控制、選定製造條件來控制基質中之 析出物、έ士曰札产, 刊签貝Τ之 為電… 物等炎雜物之分布,以提供適合作 為電子材料用銅合金之 及導雷,Μ:振S ”叶*體而。’係“己载一種強度 .、之電子材料用銅合金,其特徵在於,含有丨〇 〜4_8wt% 之 菸 λ 〇 3 有 Ι.ϋ 及〇.2〜1.4Wt%之Si,剩餘部分由 200915349 可避免的雜質所構成,又夹雜物之大小在1〇μιη以下,且 5〜ΙΟμιη之大小的夾雜物個數在與壓延方向平行之剖面未 達 5 0 個 / mm2。 又,於該文獻中,記载在半連續鑄造之鑄造時的凝固 過程中,由於有時會生成Ni—Si系之粗大結晶物及析出 物,因此對其加以控制之方法,亦即記載「在以8〇〇它以 上之溫度加熱1小時以上後’不進行熱壓延,使結束溫度 在650°C以上,藉此使粗大夾雜物固溶於基質中。惟加熱 溫度若在90CTC以上,則會有發生大量之銹皮,及在熱壓 延時發生龜裂等問題,因此加熱溫度較佳為8〇〇t>c以上、 未達900°C」。 [專利文獻1]曰本特開平n — 222641號公報 [專利文獻2]日本特表2005 ~ 532477號公報 [專利文獻3]國際公開第2〇〇6/1〇1172號小冊子 [專利文獻4]日本特開2001 — 49369號公報 【發明内容】 如上述,雖然已知可藉由在Cu_Ni_Si系合金添加 ^來提升強度及導電性,但是本發日月人對添加有c〇之 Cu-Nu系合金之組織進行觀察,發現相較於未添加 時,會分布較多之粗大第二相粒子。此第二相粒子主要是 由Co之石夕化物所構成。粗大之第二相粒子不僅無助於提 升強度’而且還會對彎曲加工性造成不良影響。 若為不含有〜之Cu_Ni—Si系合金,即使是在可抑 200915349 制粗大第二相粒子之生成的條件下進行製造,亦無法抑制 粗大第二相粒子之生成。亦即,Cu —Ni—Si—c〇系合金, 即使以專利文獻4所記载之以8〇〇〇c 〜9〇〇t之溫度加熱工 小時以上後進行熱壓延,並使結束溫度在65〇t以上之抑 制粗大夾雜物之生成的方法,亦無法使以c〇矽化物為主 體之粗大第二相粒子充分地固溶於基質中。並且,即使是 專利文獻3所教示之於固溶處理時提高加熱後之冷卻速度 的方法,亦無法充分地抑制粗大之第二相粒子。 從以上之背景,本發明人於先前未公開之日本特願 2007 — 92269號案中,揭示一種抑制粗大第二相粒子之生 成的Cu—Ni-Si-Co系合金。具體而言,係揭示一種含 有 Ni:1.〇〜2.5 質量%、c〇:〇5 〜25f 量%、si:〇3〜 1.2質量%,剩餘部分由Cu及不可避免的雜質所構成之電 子材料用銅合金,其不存在粒徑超過丨仏瓜之第二相粒子, 粒徑為5μιη〜10μΐη之第二相粒子於平行於壓延方向之剖 面為50個/ mm2以下。 為了得到該銅合金,需注意要在Cu — Ni_ si — c〇系 s金之製造步驟中,滿足以下兩條件: (1)熱壓延係在以95(rc〜105(rc加熱i小時以上後 進行,並使熱壓延結束時之溫度在85〇t以上,且以15艽 /s以上之冷卻速度來進行冷卻,及 (2 )固溶處理係在85〇°c〜j 〇5〇。匸下進行,並以b / s以上之冷卻速度來進行冷卻。 該發明之銅合金,雖可在不犧牲導電性及彎曲加工性 9 200915349 下,達成可提升強度之有利合金特性,但尚存 間。 〜= 因此,本發明之課題,在於提供一種可兼具有更高程 度之強度、導電率及彎曲加工性之Cu — Ni—8卜c〇系合 金。又,本發明之另-課題,在於提供一種用以製造該二 Cu— Ni — Si — Co系合金之方法。 本發明人,A 了解決上述課題,經潛心研究後,發現 對於Cu~Nl_Si_Co系合金,較日本特願細卜似69 號案所規定之大小的第二相粒子小的第二相粒子之存在, 會對合金特性造成不良影響。具體而言,係發現粒徑在 Ο.ΙμΓη以上、1μπι以下,各含有丨糾%以上之犯、及w 之第二相粒子的密度係重要因素,可藉由使該第二相粒子 之密度在平行於壓延方向之剖面上為ΐχΐ〇4個/my以上、 lxl〇7個/mm2以下,來提升合金特性,特別是彎曲加工性。 \ 為了將第二相粒子控制在上述之密度,熱壓延時或隨 後之材料之冷卻速度非常重要。具體而言,係發現於Cu — Ni — Si—Co系合金之製造步驟中,以95〇χ:〜ι〇5(Γί^σ& 1小時以上後,進行熱壓延,並使熱壓延結束時之溫度在 650°C以上,且於熱壓延途中或其後之冷卻時,進行2階 段冷卻,亦即以材料溫度從85(rc降低至65〇。(:時之平均 冷卻速度為l°C/s以上、未達15〇C//s來進行冷卻,且以 從650°C降低至400°C時之平均冷卻速度在15t>c/s以上來 進行冷卻’係在控制第二相粒子之密度上非常重要。 以上述見解為背景所完成之本發明,係一種電子材料 200915349 賴合金,其含有州:1.0〜2.5質量%、Co :〇·5〜2·5質 篁%、Si: 0.3 〜12 督番 〇/ • 量^,剩餘部分由Cu及不可避免之 雜質所構成,粒徑:〇_丨 μ 1 M上、1 μιη以下,且各含有i 貝里/6以上之Ni、Co及Sl的第二相粒子,於平行於壓延 方向之剖面,為上、1><1〇7個/匪2以下。 f 本發明之電子材料用銅合金,於一實施形態中,不存 在拉控超過1〇叫之第二相粒子,粒徑為5〜之第二 相粒子於平行於壓延方向之剖面為50個/mm2以下。 本發明之電子材料用銅合金,於另—實施形態中,進 一步含有最多〇.5質量%之cr。 、本發明之電子材料用鋼合金,並且於另一實施形態中, 進-步含有總計最多0.5質量%之選自Mg、應、Ag及p 之1種或2種以上之元素。 本發明之電子材料用鋼合金,並且於另一實施形態中, 進:步含有總計最多2.〇質量%之選自……種或 2種之元素。 之屯子材料用銅合金,並且於另一實施形態中, :了步含有總計最彡2·〇質量%之選自AsUB、 1 Zr、…及Fe之1種或2種以上之元素。 本發"明之Φ 11_ ' ' 其與壓延方向正广斗用銅合金’並且於另-實施形態中, 本發明,介t之剖面之平均結晶粒徑在20叫以下。 人 為—種用以製造上述銅合金之方法,係包 含依序進行下述步驟: 將有所需組成之鑄錠加以熔解鑄造之步驟; 11 200915349 —在950°C〜l〇50°C下加熱】小時以上後,進行熱壓 延,然後使熱壓延結束時之溫度在65〇t以上,且在熱壓 延途中或隨後之冷卻時,使材料溫度從85(rc降低至 °c時之平均冷卻速度在rC/s以上、未達15t/s,並使 從650°C降低至400°c時之平均冷卻速度在15t/s以上 步驟; 一冷壓延步驟; f i. -於850t〜lG5〇t下進行固溶處理,且使材料 降低至彻。c時之平均冷卻速度在15t/s以上之步驟;又 一任意之冷壓延步驟; 一時效處理步驟;及 —任思之冷壓延步稼。 本發明,亦為一種使用上述銅合金之伸銅品。 m’r一種使用上述銅合金之電子機器零件。 本發明,由於係對特定大小之第二相 狀態,因此可進一步接弁X 4 二制其分布 進步k升合金特性,特別是彎曲加工性。 【實施方式] [Ni、Co及Si之添加量]The mechanical strength and electrical conductivity of the Nl Sl alloy will be slightly improved. Therefore, if the cost is allowed, ^ J select Cu-Co~ Sl system or Cu_Ni - C ο - S i system.曰 曰 本 本 2005 2005 2005 2005 2005 2005 2005 2005 2005 2005 2005 2005 2005 2005 2005 2005 2005 2005 2005 2005 2005 2005 2005 2005 2005 2005 2005 2005 2005 2005 2005 2005 2005 2005 唬Α 唬Α 唬Α 唬Α 唬Α 唬Α 唬Α 唬Α 唬Α 唬Α 唬Α 唬Α 唬Α 唬Α 唬Α 唬Α 唬Α 唬Α 唬Α 唬Α 唬Α 唬Α 唬Α 唬Α 唬Α 唬Α 唬Α 唬Α 唬Α 唬Α 唬Α 唬Α 唬Α 唬Α 唬Α 〇5 = two and the remaining part of the copper and the inevitable impurities of the structure and composition: ten content w4.3%, (Ni + c 〇) / si_2: 1 ~ 7 : 1 forged steel alloy 'the forge gold Has more than 40% IACS of electricity. After the combination of Mingfa and Fa, the growth of the particles by π f哏 is formed, so that a sulphate which contributes to the aging effect and the softness of the bismuth is formed. If the cobalt content is less than 0.5%, then it contains a few of them. # a @ t The precipitation of the phase will not be enough and "" combines the most money of (10) Xiaoshi Xi contains the material, the alloy of m money and the best VX Ύ 〇 ^ ^ ® k of G'5% are kept below 20 microns. The content of cobalt in the field exceeds 25%. -, will precipitate excess second phase particles, k becomes less processability, B gives poor strength to steel alloys 200915349 Magnetic properties. In the pamphlet of International Publication No. 2006/101 172 (Patent Document 3), the strength of the Cu-Ni-Si alloy containing 5 Co can be greatly improved under certain composition conditions. Specifically, it is described that copper metal for electronic materials contains Ni: from about 0 5 to about 25 mass%, C. : about 2.5% by mass, and si: about 〇·3〇 to about 丨2% by mass, and the balance is composed of Cu and unavoidable impurities, and the total mass of bismuth and Co in the alloy composition is relative to the mass of Si. The concentration ratio ([Ni+c〇]/匕) is about 5 g [Ni + Co] / Si of about 5, and the "Bere concentration ratio of Co (Ni / c 〇 ratio) in the alloy composition is about 〇 $ $ 约约2 〇<There is a tendency to increase the speed of the cold part after heating when the solution treatment is carried out, so that the strength of the Cu_Ni-Si-based copper alloy can be further enhanced, so that the cooling rate is about every second. Cooling above 1 G ° C is helpful. It is also known to control the coarse inclusions in the copper matrix. Japanese Patent Laid-Open No. 2001-49369 (the patent is incorporated herein by reference). After adjusting the composition of the Nl-Si alloy, it is necessary to p, and can be refined to contain Mg, Zn, Sn, Fe, Ti, Zn, Ag, Be, and control and select the manufacturing conditions to control the precipitates in the matrix, The gentleman 曰 产 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , Copper alloy and mine guide, Μ: vibration S ” leaf * body. 'System is a kind of copper alloy for electronic materials, which is characterized by containing 丨〇~4_8wt% of smoke λ 〇3 .ϋ and 〇.2~1.4Wt% of Si, the remainder is composed of impurities that can be avoided by 200915349, and the size of the inclusions is below 1〇μηη, and the number of inclusions of 5~ΙΟμηη is in the calender In the literature, it is described that in the solidification process during casting of semi-continuous casting, coarse crystals and precipitates of Ni-Si type are sometimes formed. Therefore, the method of controlling the same means that "the heating is not carried out after heating at a temperature of 8 〇〇 or more for 1 hour or more, so that the end temperature is 650 ° C or higher, thereby causing the coarse inclusions to be solid-solved. In the matrix, if the heating temperature is above 90 CTC, there will be a large amount of scale and cracking during hot pressing, so the heating temperature is preferably 8 〇〇t > c or less, less than 900 °. C. [Patent Document 1] 曰本特开平n — 222641号 [Special [Patent Document 2] Japanese Patent Publication No. 2005- 532477 [Patent Document 3] International Publication No. 2-6/1〇1172 [Patent Document 4] Japanese Laid-Open Patent Publication No. 2001-49369. It is known that the strength and conductivity can be improved by adding a Cu_Ni_Si-based alloy, but the microstructure of the Cu-Nu-based alloy to which c〇 is added is observed by the Japanese and Japanese people, and it is found that it is distributed compared to when it is not added. More coarse second phase particles. This second phase particle is mainly composed of Co. The coarse second phase particles not only do not contribute to the increase in strength' but also adversely affect the bending workability. In the case of the Cu_Ni-Si-based alloy which does not contain ~, even if it is produced under the condition that the formation of coarse second-phase particles of 200915349 can be produced, the formation of coarse second-phase particles cannot be suppressed. In other words, the Cu—Ni—Si—c〇 alloy is heated at a temperature of 8〇〇〇c to 9〇〇t as described in Patent Document 4, and then hot rolled and the temperature is terminated. The method of suppressing the formation of coarse inclusions at 65 〇t or more does not allow the coarse second phase particles mainly composed of c ruthenium to be sufficiently solid-solved in the matrix. Further, even in the method of increasing the cooling rate after heating in the solution treatment as taught in Patent Document 3, the coarse second phase particles cannot be sufficiently suppressed. In view of the above, the present inventors have disclosed a Cu-Ni-Si-Co alloy which inhibits the formation of coarse second phase particles in the previously unpublished Japanese Patent Application No. 2007-92269. Specifically, an electron comprising Ni:1.〇~2.5 mass%, c〇:〇5 to 25f%, si:〇3 to 1.2% by mass, and the remainder consisting of Cu and unavoidable impurities is disclosed. The copper alloy for materials has no second phase particles having a particle diameter exceeding that of the melon, and the second phase particles having a particle diameter of 5 μm to 10 μm are 50 or less in a cross section parallel to the rolling direction. In order to obtain the copper alloy, it is necessary to pay attention to the following two conditions in the manufacturing process of Cu-Ni_si-c〇 system s gold: (1) The hot rolling is at 95 (rc~105 (rc heating for more than i hours) After that, the temperature at the end of hot rolling is 85 〇t or more, and the cooling is performed at a cooling rate of 15 艽/s or more, and (2) the solution treatment is performed at 85 ° C ~ j 〇 5 〇 The crucible is carried out and cooled at a cooling rate of b / s or higher. The copper alloy of the invention can achieve favorable alloy properties which can improve strength without sacrificing conductivity and bending workability 9 200915349, but still Therefore, the object of the present invention is to provide a Cu-Ni-8 b-based alloy which can have a higher degree of strength, electrical conductivity and bending workability. Further, another aspect of the present invention - A problem is to provide a method for producing the above-mentioned Cu-Ni-Si-Co alloy. The inventors of the present invention have solved the above problems and found that the Cu~Nl_Si_Co alloy is more desirable than Japan. The size of the second phase particle of the size specified in Case No. 69 is small. The presence of particles has an adverse effect on the properties of the alloy. Specifically, it is found that the particle size is above Ο.ΙμΓη, below 1μπι, and the density of each of the particles containing more than 丨% and the second phase of w is an important factor. By making the density of the second phase particles ΐχΐ〇4/my or more and lxl〇7/mm2 or less in the cross section parallel to the rolling direction, the alloy characteristics, particularly the bending workability, can be improved. It is important to control the second phase particles to the above-mentioned density, the hot pressing delay or the subsequent cooling rate of the material. Specifically, it is found in the manufacturing steps of the Cu-Ni-Si-Co alloy, 95 〇χ: ~ι〇5(Γί^σ& After 1 hour or more, hot rolling is performed, and the temperature at the end of hot rolling is 650 ° C or higher, and during the hot rolling or cooling, 2 stages are performed. Cooling, that is, the material temperature is reduced from 85 (rc to 65 〇. (: the average cooling rate is above l ° C / s, less than 15 〇 C / / s for cooling, and from 650 ° C The average cooling rate at 400 ° C is above 15 t > c / s for cooling ' It is very important to control the density of the second phase particles. The invention completed in the context of the above findings is an electronic material 200915349 Lai alloy containing state: 1.0 to 2.5% by mass, Co: 〇·5~2·5篁%, Si: 0.3 ~12 傅番〇 / • Quantity ^, the remainder consists of Cu and unavoidable impurities, particle size: 〇_丨μ 1 M, 1 μηη or less, and each contains i Berry / The second phase particles of Ni, Co and Sl of 6 or more are upper, 1 > 1 〇 7 / 匪 2 or less in a cross section parallel to the rolling direction. f In the embodiment, the copper alloy for electronic materials has no second phase particles having a pulling control of more than one nickname, and the second phase particles having a particle diameter of 5 to 50 have a cross section parallel to the rolling direction. /mm2 or less. In the other embodiment, the copper alloy for electronic materials of the present invention further contains a maximum of 0.5% by mass of cr. In another embodiment, the steel alloy for an electronic material of the present invention further contains one or two or more elements selected from the group consisting of Mg, s, Ag, and p in a total amount of up to 0.5% by mass. The steel alloy for an electronic material of the present invention, and in another embodiment, the step further comprises a total of up to 2.% by mass of an element selected from the group consisting of: or two. In the other embodiment, the bismuth material is a copper alloy, and in another embodiment, one or two or more elements selected from the group consisting of AsUB, 1 Zr, ..., and Fe are contained in a total amount of 2% by mass. In the present invention, the average crystal grain size of the cross section of the present invention is 20 or less. Artificial method for producing the above copper alloy, comprising the steps of: sequentially casting an ingot having a desired composition; 11 200915349 - heating at 950 ° C to l 〇 50 ° C 】 After more than one hour, hot calendering is carried out, and then the temperature at the end of hot calendering is above 65 〇t, and the temperature of the material is lowered from 85 (rc to °c) during hot rolling or subsequent cooling. The average cooling rate is above rC/s, less than 15t/s, and the average cooling rate is reduced from 650 ° C to 400 ° C above 15 t / s step; a cold rolling step; f i. - at 850 t ~ lG5〇t is subjected to solution treatment, and the material is reduced to a temperature of more than 15 t/s at the time of c. Another arbitrary cold rolling step; an aging treatment step; and - cold rolling of Rensi The present invention is also a copper alloy using the above copper alloy. m'r An electronic machine part using the above copper alloy. The present invention can be further connected due to the second phase state of a specific size. X 4 two system its distribution improves the characteristics of k liter alloy, especially Bending workability. [Embodiment] [Addition of Ni, Co, and Si]
Ni、Co及Si ’可藉由實施適當之 化合物,而可在不#道 “、、处理來形成金屬間 j牡+使導電率劣化下, 勾丨jNi, Co, and Si' can be formed by performing appropriate compounds, and can be formed without treatment.
Ni ^ Co^ ς· 满求高強度化。 W Co及81之添加量,若Ni 達0.5質量%,ς.土 4 建1,0貝量%,Co未 、 S丨未達0.3質量%,則& ^ 未 度,相反地,若χτ· 4 無法传到所需之強 右吣超過2·5 I南之強 C〇超過2.5質量 J2 200915349Ni ^ Co^ ς· Fully high strength. The amount of W Co and 81 added, if Ni reaches 0.5% by mass, ς. soil 4 builds 1,0 ft. %, Co does not, S 丨 does not reach 0.3% by mass, then & ^ is not, conversely, if χτ · 4 can not pass to the strong right 所需 more than 2. 5 I South strong C 〇 more than 2.5 quality J2 200915349
Si超過1·2質量%,則雖然可謀求高強度化,但是導電率 將會顯著降低,並且熱加工性亦會劣化。因此Ni、及si 之添加量,係使Ni為^〜2·5質量%,c〇為〇5〜2·5質 量%,Si為0.3〜U質量%。Ni、c〇及Si之添加量,以 Ni : 1.5〜2.0 質量%、C〇 : 〇.5〜2 〇 質量%、si : 〇 質量%為佳。When Si is more than 1.2% by mass, the strength can be increased, but the electrical conductivity is remarkably lowered and the hot workability is also deteriorated. Therefore, the amounts of addition of Ni and Si are such that Ni is 〜2·5 mass%, c〇 is 〇5 to 2·5 mass%, and Si is 0.3 to U mass%. The addition amount of Ni, c〇 and Si is preferably Ni: 1.5 to 2.0% by mass, C〇: 〇.5 to 2 〇% by mass, and si: 〇% by mass.
[C r之添加量] Cr由於會在炫解鑄造時之冷卻過程中優先析出於晶粒 粒界,因此可強化粒界,使熱加工時不易發生龜裂,可抑 制產率降低。亦即,在熔解鑄造時析出於粒界之,雖會 1固溶處理等發生再固溶,但是卻會在後續之時效析出 時,生成以Cr為主成分之bcc構造的析出粒子或是與^ 之化合物。於通常之Cu—Ni— si系合金,所添加之W量[Cr addition amount] Since Cr is preferentially precipitated in the grain boundary during the cooling process during the dazzle casting, the grain boundary can be strengthened, and cracking is less likely to occur during hot working, and the yield can be suppressed. In other words, when it is melted and cast, it is precipitated at the grain boundary. Although it is re-dissolved by solid solution treatment, it may form precipitated particles of bcc structure mainly composed of Cr or the like when it is precipitated in the subsequent aging. ^ The compound. The amount of W added in the usual Cu-Ni-Si alloy
中,無助於時效析出之Si會直接固溶於母相而抑制導電率 之上升,但可藉由添加為矽化物形成元素之Cr,進一步使 石夕化物析出’來降低固溶以量,可在無損於強度下,提升 導電率。然而’若Cr濃度超過〇 5質量%,則由於容易形 成粗大之第二相粒子 發明之Cu- Ni~ Si- 之Cr。惟’若未達〇.〇3 為添加〇·〇3〜〇.5質量%, ’因此將會損及製品特性。因此,本 Co系合金中’最多可添加0.5質量% 質量% ’由於其效果小,故較佳 更佳為0.09〜〇.3質量%。 [Mg、Mn、Ag及Ρ之添加量] Mg Mn、Ag及p,添加微量,並不會損及導電率, 且可改善強度、應力緩和特性等之製品特性。添加之效果, 13 200915349 主要是因會固溶於母相而獲得發揮,亦可藉由包含於第二 相粒子來發揮進一步之效果。然而, iVig、Μη、Ag 及 p 之 濃度之總計若超過0.5%,則除了特柹并M & 4 A. 哥性改善效果會達到飽 和外’亦會損及製造性。因此,本發 么人 發明之Cu—Ni-Si-Co 糸a金中,可添加總計最多0.5質量 里/0之選自Mg、Mn、Ag 及P之1種或2種以上之元素。惟,芒 右未達0.01質量%, 則由於其效果小,因此較佳為添加總計〇 〇1〜質量%, 更佳為總計〇.〇4〜〇.2質量%。 、里〇 [Sn及Zn之添加量]Among them, Si which is not helpful in aging precipitation is directly dissolved in the mother phase to suppress an increase in conductivity, but it is possible to further reduce the amount of solid solution by adding Cr which is a constituent element of the telluride to precipitate out of the stone. The conductivity can be improved without impairing the strength. However, if the Cr concentration exceeds 〇 5 mass%, it is easy to form Cr of Cu-Ni~ Si- which is a coarse second phase particle of the invention. However, if it is not 〇.〇3 is added 〇·〇3~〇.5 mass%, ‘so it will damage the product characteristics. Therefore, in the present Co-based alloy, "up to 0.5% by mass of mass%" can be added, and since it is small in effect, it is preferably more preferably 0.09 to 0.3% by mass. [Addition amount of Mg, Mn, Ag, and antimony] Mg Mn, Ag, and p are added in a small amount, and the electrical conductivity is not impaired, and product properties such as strength and stress relaxation properties can be improved. The effect of addition, 13 200915349 is mainly due to the fact that it is dissolved in the matrix phase, and can be further exerted by being contained in the second phase particles. However, if the total concentration of iVig, Μη, Ag, and p exceeds 0.5%, then in addition to the characteristics of M & 4 A. The improvement of the social property will reach saturation, which will also impair the manufacturability. Therefore, in the Cu-Ni-Si-Co 糸a gold of the present invention, one or two or more elements selected from the group consisting of Mg, Mn, Ag, and P may be added in a total amount of up to 0.5 mass%/0. However, if the right side is less than 0.01% by mass, since the effect is small, it is preferable to add a total of 〇1 to 质量%, more preferably 〇.〇4 to 〇.2% by mass. , 〇 [Addition of Sn and Zn]
Sn及Zn’亦是添加微量’並不會損及導電率,且可 改善強度、應力緩和特性、鑛敷性等之製品特性。添加之 效果,主要是因會固溶於母相而獲得發揮。然❿士及以 之總計若超過2.0質量%,則除了 】将性改善效果會達到飽 和外,亦會損及製造性。因此,本 明之 Cu—Nl~ Si— Co 系6至中’可添加總計最多2〇質 τ ^ 貝s 之選自Sn及Zn之 種或2種之元素。惟,若未達〇 „ , 買里/,則由於其效 小,因此較佳為添加總計〇 〇5 .,Λ c 2·ϋ貝量% ’更佳為總 叶0.5〜1.〇質量%。 [As、Sb、Be、Β、Ti、Zr、A1 及 Fe]Sn and Zn' are also added in a small amount, and the electrical conductivity is not impaired, and the properties of the product such as strength, stress relaxation property, mineralization, and the like can be improved. The effect of the addition is mainly due to the fact that it is dissolved in the parent phase. However, if the sum of the gentlemen and the total amount exceeds 2.0% by mass, in addition to the fact that the sexual improvement effect will be saturated, the manufacturing property will be impaired. Therefore, in the Cu-Nl~Si-Co system of the present invention, a total of up to 2 〇 τ ^ s can be added to the element selected from the group consisting of Sn and Zn or two kinds of elements. However, if it does not reach 〇 „ , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , [As, Sb, Be, Β, Ti, Zr, A1, and Fe]
As、Sb、Be、B、Ti、Zr、A1 » ^ f A1及Fe,亦可視所要求之 寸性’藉由調整添加量,來改善導電率、強度、應力 緩和特性、鑛敷性等製α ·、、 艰驭迮寺之裊特性。添加之效果,主要是因 S固溶於母相而獲得發揮,作亦& 4人 叉付嘴评彳-亦可藉由包含於第二相粒 ,3、疋形成新組成之第二相粒子,來發揮進—步之效果。 14 200915349 然而,此等元素之總計若超㉟2〇質量%,則除了特性改 D效果會達到飽和之外,亦會損及製造性。因&,本發明 之 Cu—Ni— Si—Co 备人人 糸合金中,可添加總計最多2 〇質量% 之、自 AS Sb、Be、B、Ti、Zr、A1 及 Fe 之 1 種或 2 種 以上之το素。惟’ 未達G⑽i f量%,則由於其效果小, 因此較佳為添加總計GKG f量%,更佳為總計〇〇5 〜1_0質量%。 上述 Mg、Mn、Ag、P、Sn、Zn、As、Sb、Be、B、Ti、 △、AI及Fe之添加量若合計超過3 〇%,則由於容易損及 製造性’因&較佳為使此等元素之合計量S 2.0 f量%以 下,更佳在1.5質量%以下。 [第二相粒子之分布條件] 卡&金可藉由實施適當之時效處理,使以金屬間 化α物為主體之奈米級之微細第二相粒子析出,不會導致 ‘私率劣化,且可謀求高強度化。然而,本發明之Cu —州 :Co—Sl系合金,與習知之Cu—Ni—si系卡遜合金並不 同,由於積極添加Co來作為用以時效析出硬化之必須成 刀故合易產生粗大之第二相粒子。粗大之第二相粒子由 於會導致合金特性之降低,因此以進行控制較佳。 於本發明中,第二相粒子主要是指矽化物,但並不限 、、此亦礼熔解鑄造之凝固過程所產生之結晶物及在之後 、〃卩過耘所產生之析出物、在熱壓延後之冷卻過程所產 析出物在固溶處理後之冷卻過程所產生之析出物、 及在時效處理過程所產生之析出物。 15 200915349 粗大第二相粒子令,首先,粒徑在Ο.ίμιη以上、1μιη 以下’且各含有⑽以上之Ni、c〇、以之第二相粒子, 亚無助於強化,且無法得到因期待時效析出強化而積極添 =C〇之效果,另,僅含有^⑼以上之Ni、c〇、以中之 一種或二種元素的第2相粒子雖亦無助於強化,但是若相 較於同時含有_以上之Ni、c〇、Si的第2相粒子,則 知害強化之程度較小。因此,此種大小且各含有以 上之沁Co、Si的第二相粒子係原本就不要,且亦為了 於時效處理時提高有助於微細第二相粒子之析出之犯、As, Sb, Be, B, Ti, Zr, A1 » ^ f A1 and Fe, can also improve the conductivity, strength, stress relaxation characteristics, mineralization, etc. by adjusting the amount of addition. · ·,, 袅 驭迮 袅 袅 characteristics. The effect of the addition is mainly due to the fact that S is dissolved in the mother phase and is also played by the 4 people. It can also be formed by the second phase, 3, and the second phase of the new composition. Particles, to play the effect of the step. 14 200915349 However, if the total of these elements exceeds 352 〇 mass%, in addition to the characteristic change D effect will be saturated, it will also damage the manufacturability. In the Cu-Ni-Si-Co-prepared human antimony alloy of the present invention, a total of up to 2 〇 mass% of one of AS Sb, Be, B, Ti, Zr, A1 and Fe may be added or More than 2 kinds of τ. However, if the amount of G(10)i f is less than 5%, the total amount of GKG f is preferably added, and more preferably 〇〇5 to 1_0% by mass. When the total amount of the above-mentioned Mg, Mn, Ag, P, Sn, Zn, As, Sb, Be, B, Ti, Δ, AI, and Fe is more than 3% by weight, the manufacturing property is easily impaired. Preferably, the total amount of these elements is S 2.0 f or less, more preferably 1.5% by mass or less. [Distribution condition of the second phase particles] The card & gold can be deposited by the appropriate aging treatment to precipitate the nano-sized fine second phase particles mainly composed of the intermetallic substance α, without causing the 'privacy rate deterioration. And it is possible to increase the strength. However, the Cu-state: Co-Sl alloy of the present invention is different from the conventional Cu-Ni-si-based Carson alloy, and it is easy to produce coarseness due to the active addition of Co as a necessary tool for ageing precipitation hardening. Second phase particles. The coarse second phase particles are preferable because they cause a decrease in alloy characteristics. In the present invention, the second phase particles mainly refer to the telluride, but are not limited thereto, and the crystals produced by the solidification process of the casting are melted and the precipitates generated after the crucible is heated. Precipitates produced by the cooling process after the solution treatment in the cooling process after rolling, and precipitates generated during the aging treatment. 15 200915349 Coarse second phase particles, first, the particle size is above Ο.ίμιη, below 1μιη, and each contains more than (10) Ni, c〇, and the second phase particles, which does not help to strengthen, and cannot be obtained. It is expected that the aging effect will strengthen and positively add the effect of C〇. In addition, the second phase particles containing only Ni, c〇, one or two elements of ^(9) or more do not contribute to strengthening, but if In the case of the second phase particles containing Ni, c〇, and Si of _ or more at the same time, the degree of enhancement of the damage is small. Therefore, the second phase particle system of such a size and containing each of 沁Co and Si is not originally required, and also contributes to the precipitation of the fine second phase particles in order to improve the precipitation of the fine second phase particles.
Si之利用率,較佳為使粗大第二相粒子於時效處理前 先固溶於母相中。因此’使鑄塊之均質化退火、熱壓延等 過程所生成、殘留之第二相粒子於固溶處理時以高溫充分 固溶即可。 然而’若在高溫下,長時間進行固溶處理,則將會導 致再結晶粒之粗大化進行。此由於會大幅使製品之弯曲加 工性劣化,故並不佳。又,某種程度大之第二相粒子,亦 具有防止因結晶粒粗大化所導致之粒界移動的釘札 (pinning)效果。 在此種觀點下,經反覆探討後,本發明人發現最後所 得之銅合金,若粒徑在〇·_以上、⑽以下,且將各含 有iwt%以上之Ni、c〇、Si之第二相粒子,於平行於壓延 々 L制在1x10個/mm2以上、lxl〇7個 下Ιε圍内時,則強度與彎曲加工性兩者可平衡地獲得 提升。㈣粒#之第二相粒子之數目最後未逹lxl〇4個/ 16 200915349 fThe utilization of Si is preferably such that the coarse second phase particles are first dissolved in the matrix phase prior to aging treatment. Therefore, the second phase particles which are formed by the process of homogenization annealing, hot rolling, and the like of the ingot may be sufficiently solid-solved at a high temperature during the solution treatment. However, if the solution treatment is carried out for a long period of time at a high temperature, coarsening of the recrystallized grains will be caused. This is not preferable because the bending workability of the product is greatly deteriorated. Further, the second phase particles having a certain degree of largeness also have a pinning effect of preventing grain boundary movement due to coarsening of crystal grains. From this point of view, after repeated investigations, the inventors have found that the copper alloy finally obtained has a particle diameter of 〇·_ or more and (10) or less, and each of which contains iwt% or more of Ni, c〇, and Si. When the phase particles are made in a range of 1×10 pieces/mm 2 or more and 1×10〇7 lower jaws ε parallel to the rolling 々L, both the strength and the bending workability can be balancedly improved. (4) The number of second phase particles of the grain # last unfinished lxl〇4 / 16 200915349 f
K mm2,則雖可謀求高強度化,但是此係意味於固溶處理時 第二相粒子固溶於母相之固溶量高,第二相粒子之分布零 散。因此,無法得到充分之釘扎效果,結晶粒將會粗大化, 而導致彎曲加工性劣化。另一方面,最後殘留有超過ΐχΐ〇; 個/mm2之該粒徑的第二相粒子的情形,係意指於固溶處 理時第二相粒子之固溶量小,雖可抑制結晶粒之粗大化, 但是將無法得到取決於合金元素之添加量的製品特性,特 別是強度。該粒徑之第二相粒子的殘留密度,更佳為ΐχΐ〇5 個/mm2以上、lxl06個/my以下。 粒徑在Ο.ίμηι以上、1μΓη以下之第二相粒子,可藉由 合併使用FE-EPMA之元素分佈圖(elemental mapping)^影 像解析軟體來進行觀察,而可測量分散於觀察視野之粒子 的濃度、個數與粒徑。各第二相粒子是否各含有iwt%& 上之Ni、Co、Si ’可藉由EPMA之定量分析來進行判斷。 於本發明中’第二相粒子之粒徑,係指以上述條件對第二 相粒子進行觀察時,環繞該粒子之最小圓的直徑。 粒徑超過之粗大第二相粒?,無論其組成為何, 不僅無助於提升強度,且亦會使彎曲加工性降低。尤其是 粒徑超過1 〇μηι之第二相粒子,由於會使得彎曲加工性顯 著降低,因此必須使上限為1〇μηΐβ因此,本發明之較佳 之一實施形態中’不存在粒徑超過1〇μηΐ2第二相粒子。 粒徑為5μΓη〜ΙΟμιη之第二相粒子若在5〇個/^^2以 内’則不會嚴重損及強度、f曲加工性。目此,於本發明 之另一較佳之一實施形態中,粒徑為5μιη〜1〇μιη之第二 17 200915349 相粒子於平行於壓延方向之剖面為5〇個/ my以下,更佳 為25個/ mm2,再更佳為2〇個/爪也2,最佳為η個/ my 以下。 比/粒徑超過1μίη且未達5μηι之第二相粒子,於固溶處理 階段Υ在抑制結晶粒徑之粗大化在Ιμιη左右後,有可能會 在後績之時效處理中發生粗大化,但相較於_以上之第 二相粒子,係認為屬特性劣化之影響較小者。 另,粒徑超過1μιη之第二相粒子之粒徑、個數,可藉 由與所述本發明範圍之粒徑01〜1μη1之第二相粒子相; 的方法’彳纟對平行於材料之壓延方肖的剖自進行钱刻 後、,使用SEM觀察4 ΕΡΜΑ等之電子顯微鏡,藉此來進 [結晶粒徑] 本發明之銅合金,由於係藉由將第二相粒子之分布條 件加以適當化’來防止在固溶處理時再結晶粒之粗大化,、 因此結晶粒亦為微細。於一實施形態中,本發明之銅合金, 與壓延方向正交之剖面的平均結晶粒徑(藉由m刪01切 斷法進行測量)在20,以下,於典型之實施形態中,在18帅 以下,於更典型之實施形態,則為5〜15μιη。 [製造方法] 卡遜系銅合金之一般製程,首先係使用大氣熔解爐, 將電解銅、Ni、Si、Co等之® μ Λ ,、,ρ & 原科加以熔解,以得到所需組 成之溶融液。接著,將此炼融液鑄造成鑄錠 '然後,進行 熱壓延’再反覆進行冷壓延與熱處理,精加工成具有所需 18 200915349 厚度及特性之條、箔。埶 固溶處理,俜以約7Λ......#固溶處理與時效處理。 … 係以約700〜約1之高溫進行加舞,㈣ 一相粒子固溶於以基地中, I加熱使第 亦以熱壓延來兼作/ 基地再結晶。有時 550〇C r ^ t双處理,係在約35〇〜 溶之第二相粒子以奈米級微細粒吏=溶處理所固 效處理可提升強度與導電率…二藉::時 在時效前及/或時效後進行冷壓延。又,^度’有時會 壓延之,! 主报古* 於時效後進行冷 火)。^ 時會在冷壓延後進行去應變退火(低溫退 皮之=述:Γ之間,可適當進行用以去除表面氧化錄 研肖]研磨、珠粒噴擊、酸洗等。 即使是本發明之銅合金經過上述之製程,為了將最後 所得之銅合金其粒徑在G 巧了將敢後 工认·1μηΐ以上、以下之第二相粒 \ :的…態(甚至粒徑超過1μηι之粗大第二相粒子之分 形態)控制在所需狀態’故嚴格控制熱遷延與固溶處理 “進订非常重要。係因為本發明之Cu—犯―系合 金,、以在< Cu-N!-St系卡遜合金並不同,本發明之α Ni Co Si系合金,係積極添加有易使第二相粒子粗大 化之C。(視情況進—步添加⑺來作為用以時效析出硬 化之必須成分之故。此係由於所添加之c〇與Ni、W所共 同形成之第二相粒子的生成及成長速度,對熱處理時之保 持溫度與冷卻速度較為敏感的緣故。 首先’於鑄造時的凝固過程中,由於粗大之結晶物會 19 200915349Although K mm2 can be made to have high strength, this means that the solid solution amount of the second phase particles in the solid phase is high in the solution treatment, and the distribution of the second phase particles is scattered. Therefore, a sufficient pinning effect cannot be obtained, and crystal grains will be coarsened, resulting in deterioration of bending workability. On the other hand, in the case where the second phase particles having a particle diameter of more than ΐχΐ〇2/mm2 remain, the solid solution amount of the second phase particles in the solution treatment is small, and the crystal grains can be suppressed. It is coarsened, but it is impossible to obtain product characteristics, particularly strength, depending on the amount of addition of the alloying elements. The residual density of the second phase particles having the particle diameter is more preferably 个5 pieces/mm2 or more and lx10 pieces/my or less. The second phase particles having a particle diameter of Ο.ίμηι or more and 1 μΓη or less can be observed by combining the elemental mapping of the FE-EPMA and the image analysis software, and the particles dispersed in the observation field can be measured. Concentration, number and particle size. Whether or not each of the second phase particles contains Ni, Co, Si' on iwt% & can be judged by quantitative analysis by EPMA. In the present invention, the particle diameter of the second phase particles means the diameter of the smallest circle surrounding the particles when the second phase particles are observed under the above conditions. Is the particle size larger than the coarse second phase? Regardless of its composition, it does not help to increase the strength, but also reduces the bending workability. In particular, since the second phase particles having a particle diameter of more than 1 〇μηι are significantly deteriorated in bending workability, the upper limit must be 1 〇μη ΐ β. Therefore, in a preferred embodiment of the present invention, 'there is no particle diameter exceeding 1 〇. Ϊ́ηΐ2 second phase particles. When the second phase particles having a particle diameter of 5 μΓη to ΙΟμηη are within 5〇/^^2, the strength and the f-cut property are not seriously impaired. Therefore, in another preferred embodiment of the present invention, the cross section of the second 17 200915349 phase particles having a particle diameter of 5 μm to 1 μm is parallel to the rolling direction of 5 Å/my or less, more preferably 25 More / mm2, more preferably 2 / / claw 2, the best is η / my or less. When the ratio of the second phase particles having a particle diameter of more than 1 μίη and less than 5 μm is suppressed, the coarsening of the crystal grain size in the solution treatment stage may be coarsened in the aging treatment after the aging treatment. Compared with the second phase particles above _, it is considered that the influence of the characteristic deterioration is smaller. Further, the particle diameter and the number of the second phase particles having a particle diameter of more than 1 μm may be phased by the second phase particles having a particle diameter of 01 to 1 μη1 in the range of the present invention; The section of the rolling section is subjected to an electron microscope after observation, and an electron microscope such as 4 ΕΡΜΑ is used to observe the [crystal grain size]. The copper alloy of the present invention is obtained by the distribution condition of the second phase particles. Appropriate to prevent coarsening of recrystallized grains during solution treatment, and thus the crystal grains are also fine. In one embodiment, in the copper alloy of the present invention, the average crystal grain size of the cross section orthogonal to the rolling direction (measured by the m-cutting method) is 20 or less, and in a typical embodiment, at 18 Below handsome, in a more typical embodiment, it is 5~15μιη. [Manufacturing method] The general process of the Caston copper alloy is firstly melted by using an atmospheric melting furnace to dissolve the electrolytic μ, Ni, Si, Co, etc., ρ & original materials to obtain the desired composition. The melt solution. Next, the smelt is cast into an ingot ', and then hot calendered' and then subjected to cold rolling and heat treatment, and finished into a strip and foil having a thickness and characteristics of 18 200915349.固 Solution treatment, 俜 about 7 Λ ... #Solution treatment and aging treatment. The dance is performed at a high temperature of about 700 to about 1, and (4) one-phase particles are solid-dissolved in the base, and I is heated so that it is also heat-calendered to double/recrystallize. Sometimes 550 〇C r ^ t double treatment, is about 35 〇 ~ dissolved second phase particles with nanometer fine granules = solution treatment solid effect treatment can improve strength and conductivity... Cold rolling is performed before and/or after aging. Also, ^ degree' is sometimes calendered, and the main newspaper is ancient* after the aging period. ^ After the cold rolling, the strain relief annealing (low temperature peeling = Γ, can be suitably used to remove the surface oxidation record) grinding, bead blasting, pickling, etc. Even the present invention The copper alloy has undergone the above-mentioned process, in order to make the particle size of the finally obtained copper alloy G, it will be more than 1μηΐ, the following second phase grain: (or even the particle size exceeds 1μηι The shape of the second phase particles is controlled in the desired state. Therefore, it is very important to strictly control the thermal elongation and solid solution treatment. Because of the Cu-initiating alloy of the present invention, it is in < Cu-N! Unlike the St-Cassin alloy, the α Ni Co Si-based alloy of the present invention is positively added with C which tends to coarsen the second phase particles. (Additionally (7) is added as an aging precipitation hardening. This is due to the fact that the formation and growth rate of the second phase particles formed by the addition of c〇 and Ni and W are sensitive to the temperature and cooling rate during the heat treatment. During the solidification process, due to the thick knot Crystal Society 19 200915349
因此在隨後 延前之保持溫度若未達95(rc時,則固溶將會不充分,若 超過105(TC ’則材料可能會熔解。又,當熱壓延結束時之 溫度未達6501:時,則由於所固溶之元素會再度析出,因 此將會導致難以得到高強度。因此為了得到高強度,較佳 為在650°C結束熱壓延,然後迅速進行冷卻。 二第二相粒子固溶於母相中。若在950 小時以上後進行熱磨延,並使熱壓延 以上,則即使是添加有Co (甚至〇 ) 中。950°C以上之溫度條件,與 較之下’屬較高之溫度。當熱壓 然而’於固溶處理前之熱壓延或於固溶處理時,若使 第一相粒子過於固溶,則在固溶處理時用以抑制再結晶粒 之粗大化之具有釘扎效果的第2相粒子將會不足,而導致 結晶粒粗大化。因此,於固溶處理前之熱壓延時,某程度 上必須殘留第2相粒子。 為了達成上述之目的’於熱壓延途中或隨後之冷卻時, 控制材料溫度的降低速度非常重要。重點在於變化從85〇 C至650°C及從650°C至400°C之兩溫度區域的冷卻速度。 具體而言’當材料溫度從850°C降低至650°C時,無論 是熱壓延途中或隨後之冷卻途中,係使平均冷卻速度為i °C/s以上、未達15°C/s,較佳為3°C/s以上、i2°C//s 以下’更佳為5°C/S以上、HTC/s以下。又,當材料溫 度從650°C降低至400°C時’係使平均冷卻速度在15〇c 20 200915349 以上,較佳s 17°C / s α上。藉由此方式,可析出有效作 為釘扎粒子之第二相粒子。 若使從85(TC至65(TC之冷卻速度未達rc/s,則由 於第二相粒子將會過剩析出而粗大化,導致難以進行較佳 之固/合處理,而損害強度與彎曲加工性。於熱壓延後途中, 材料之溫度緩慢降低亦屬—般,但由於其速度—般慢至〇1 〜l°C/s,因此在650〜85(rc之區域進行熱壓延時,有必 要刻意進行冷卻。Therefore, if the holding temperature before the delay is less than 95 (rc, the solid solution will be insufficient. If it exceeds 105 (TC', the material may melt. Also, when the hot rolling is finished, the temperature is less than 6501: In this case, since the element to be solid-solved is precipitated again, it is difficult to obtain high strength. Therefore, in order to obtain high strength, it is preferred to terminate the hot rolling at 650 ° C and then rapidly cool it. It is dissolved in the mother phase. If it is hot-grinded after 950 hours or more and hot rolled or more, even if Co (even 〇) is added, the temperature condition above 950 °C is lower than that of ' It is a higher temperature. When hot pressing, but during hot rolling before solution treatment or during solution treatment, if the first phase particles are too solid solution, they are used to inhibit recrystallized grains during solution treatment. The coarsened second phase particles having a pinning effect will be insufficient, resulting in coarsening of the crystal grains. Therefore, the second phase particles must remain to some extent during the hot pressing delay before the solution treatment. 'When hot rolling or subsequent cooling, The rate of temperature reduction of the material is very important. The focus is on the cooling rate from 85 ° C to 650 ° C and from 650 ° C to 400 ° C. Specifically - when the material temperature is reduced from 850 ° C to At 650 ° C, the average cooling rate is above i ° C / s, less than 15 ° C / s, preferably above 3 ° C / s, i2 ° during hot rolling or subsequent cooling. C / / s below 'better than 5 ° C / S or more, below HTC / s. Also, when the material temperature is reduced from 650 ° C to 400 ° C 'has the average cooling rate above 15 〇 c 20 200915349, Preferably, it is 17 ° C / s α. In this way, the second phase particles which are effective as pinning particles can be precipitated. If the cooling rate from 85 (TC to 65 (TC is less than rc/s), The second phase particles will be excessively precipitated and coarsened, resulting in difficulty in performing a better solidification/bonding treatment, and impairing strength and bending workability. On the way of hot rolling, the temperature of the material is slowly lowered, but due to its The speed is generally as slow as 〇1 to l°C/s, so in 650~85 (the area of rc is subjected to hot pressing delay, it is necessary to deliberately perform cooling.
K ’、、、而’於650〜850。。之區域,提高冷卻速度至某程度 以上亦非是好的方法。係因為若使冷卻速度在以 上’則由於第二相粒子不會析出或僅會微量析出,因此將 無法得到在固溶處理步㈣以阻礙再結晶粒界移動所需之 個數’而導致再結晶粒粗大化,f曲加卫性劣化的緣故。 方面於4〇〇C〜650°C之區域,盡量以提高冷卻 ""佳’必須使平均冷卻速度纟15°C/s以上,較佳A 在听/8以上。係為了防止於65〇〜 = 析出之第二相粒子過於粗大化至必要程度:上之二度= 第,相粒子之析出較為顯著是在纟戰左右,因此未達 〇〇c時之冷卻速度並不會構成問題。 冷卻速度,可藉由在壓延結束後之捲料進行 加熱帶與冷卻帶調整…田 白-又置 來進㈣整即可。當需 之情形,口要4:要施以水冷喷霧即可,而緩慢冷卻 要叹置風循環裝置。 上述方式所析出之第二相粒子,於中間步驟之固溶 21 200915349 處理時’其粒徑及個數將會減少,雖然在時效處理時其粒 捏及個數會增加,但是可藉由使固溶處理及時效處理之條 件為後述之適當條件’來使於最後製品中,粒徑在〇·一 以上、一以下之第二相粒子(甚至粒捏超過_之第二 相粒子)具有所欲之分布形態。 於固溶處理時,同嫌士士,--Γ , 门樣地亦可藉由使固溶處理溫度為 850°C〜1050°C,來使第_相初孚田& 、” 弟一相粒子固溶。於固溶處理後之 冷部過程,由於並無使第二相粒子析出之必要性,因此應 =至·。C之平均冷料度在15t/su,較佳在抓 夕以上。即使不控管熱壓延後之冷卻速度,而僅控制固 ♦處理後之冷料度,亦無法於隨後之時效處理充分抑制 粗大之第二相粒子。熱壓延後之冷卻速度、及固溶處理後 之冷卻速度需一同加以控制。 使冷卻快速的方法,以水冷最具效果。惟,由於會因 尺、所使用之水的溫度而使冷卻速度改變,因此可 控管水溫來使冷卻更為快速。由於水溫若在说以上;, 則有時會無法㈣所需之冷卻速度,因此較佳為保持在25 c 乂下;6·將材料放人儲存有水之槽内進行水冷,則由於 水的溫度容易上升曼2 $ IV I· η 升 5 C以上,因此較佳為以霧狀(喷霧 t霧氣狀)進行噴霧或一直使冷水流入水槽,使材料在 固U水溫(饥以下)進行冷卻,以防止水溫上升。又, 亦可精由水冷喷嘴之增設或增加每單位時間之水量,來提 升冷卻逮度。 於本發明中,熱麼延時之“從850t降低至650t:時之 22 200915349 平均冷卻速度”,係指測量材料溫度從8501降低至65〇 °C之冷卻時間,然後以“(85〇—65〇)(β(:冷卻時間(s),, 所求出之值(<t/s)。 “從65(rc降低至4〇〇它時之平均 冷卻速度”,同樣地,係指以“(650 — 400) ( t 冷卻 時間(s) ’,所求出之值(。C/s)。又,固溶處理時之“至 4〇〇°C為止之平均冷卻速度”,係指測量材料從固溶處理 溫度冷卻至400t之時間,然後以“(固溶溫度—4〇〇)(亡) /冷卻時間(S ) ”所求出之值(。c / s )。 時效處理之條件,只要是對析出物之微細化有效所慣 用進行的條件即可,但需注意設定溫度及時間以使析出物 不粗大化。若舉時效處理條件之一例,則在35〇〜它之 溫度範圍為1〜24小時,更佳為在400〜5〇(rC之溫度範圍 為1〜24小時。另,時效處理後之冷卻速度幾乎不會 出物之大小造成影響。 本發明之Cu—Ni—Si—c〇系合金,可加工成各種之 伸銅品,例如板、條、管、棒及線,並且,本發明之Cu — 沁一 Si—Co系銅合金,可應用於導線架、連接器、接腳、 端子、繼電器、開關、二次電池用箔材等之電子零件等。 [實施例] 以下—起顯示本發明之實施例與比較例,但此等之實 施例僅是提供作為更容易理解本發明及其優點,而非用以 限定本發明。 [製造條件對合金特性所造成之影響的探討] 將表1所δ己載之成分組成(組成號碼1 )之銅合金於 23 200915349 高週波熔解爐在l300〇C下加以熔化,鑄造成厚度3〇mm之 鑄錄。接著’將此鑄錠加熱至l〇〇(TC後,在各種結束溫度 (熱壓延結束溫度)下一邊進行熱壓延至板厚為丨, 一邊控制冷卻速度,熱壓延結束後,以各種冷卻速度迅速 冷卻至400,然後放置在空氣中加以冷卻。接著,為了 去除表面之銹皮,施以端面切削至厚度為9mm,然後以冷 壓延製成厚度為0.15mm之板。接著在950°C下進行12〇 秒之固溶處理,然後馬上以各種冷卻速度將其冷卻至4〇〇 °c’之後再放置於空氣中進行冷卻。接著冷壓延至〇1〇mm, 然後在450°C下於惰性環境氣氛中施以3小時之時效處理, 最後再冷壓延至0.08mm,製得測試片。 [表1] 組成 Ni Co Si ~----- Cr 1·0〜2.5 0.5〜2.5 0·3 〜1.2 〇·〇9〜〇 s ① 1.8 1.1 0.65 以下述方式,對上述方式所製得之各測試片進行結晶 粒徑、第2相粒子之粒度分布及定量分析、強度、導電性 及彎曲加工性之特性評價。K ',, and ' from 650 to 850. . In the area, increasing the cooling rate to a certain level is not a good method. Therefore, if the cooling rate is higher than the above, the second phase particles will not be precipitated or will be precipitated only slightly, so that the number required for the solid solution treatment step (4) to hinder the movement of the recrystallized grain boundary cannot be obtained. The crystal grains are coarsened, and the f-curvature property is deteriorated. In the area of 4〇〇C~650°C, try to improve the cooling "Good. The average cooling rate must be above 15 °C / s, preferably A is above /8. In order to prevent the precipitation of the second phase particles from 65〇~ = to the extent necessary: the second degree = the first, the precipitation of the phase particles is more significant around the battle, so the cooling rate is not reached It does not pose a problem. The cooling rate can be adjusted by heating the belt and the cooling belt after the rolling is completed... Tian Bai - again (4). When necessary, the mouth should be 4: to apply a water-cooled spray, and slow cooling to sigh the wind circulation device. The second phase particles precipitated in the above manner will reduce the particle size and the number of the solid solution 21 200915349 in the intermediate step, although the number of pellets will increase during the aging treatment, but The conditions of the solution treatment and the aging treatment are the appropriate conditions described later, so that in the final product, the second phase particles having a particle diameter of one or more and one or less (even the second phase particles of the granules exceeding _) have The distribution pattern of desire. In the case of solution treatment, the same as the suspect, - Γ, the door can also be made by the solution treatment temperature of 850 ° C ~ 1050 ° C, so that the first phase of the first Futian & The phase particles are solid-solved. In the cold part process after the solution treatment, since there is no necessity to precipitate the second phase particles, the average coldness of the C should be = 15 ° /su, preferably at the scratch Above, even if the cooling rate after hot rolling is not controlled, and only the coldness after the solid treatment is controlled, the coarse second phase particles cannot be sufficiently suppressed by the subsequent aging treatment. The cooling rate after hot rolling, The cooling rate after solution treatment needs to be controlled together. The method of making the cooling fast is the most effective in water cooling. However, since the cooling rate changes due to the temperature of the ruler and the water used, the temperature of the tube can be controlled. To make the cooling faster. If the water temperature is above, then the cooling speed required (4) is sometimes impossible, so it is better to keep it under 25 c ;; 6. Place the material in a tank with water. Water cooling inside, because the temperature of the water is easy to rise, Man 2 $ IV I· η rises 5 C or more, so It is sprayed in a mist (spray t mist) or keeps cold water flowing into the water tank to cool the material at a solid U water temperature (below the hunger) to prevent the water temperature from rising. Also, it can be cooled by a water-cooled nozzle. Add or increase the amount of water per unit time to increase the cooling catch. In the present invention, the thermal delay of "from 850t to 650t: when 22200915349 average cooling rate" means that the measured material temperature is reduced from 8501 to 65.冷却 ° C cooling time, and then "(85 〇 - 65 〇) (β (: cooling time (s), the value obtained (< t / s). "From 65 (rc reduced to 4 〇 The average cooling rate at the time of ”, in the same way, refers to the value ((C/s) obtained by "(650 - 400) (t cooling time (s) '. Also, during solid solution treatment" "Average cooling rate up to 4 °C" means the time during which the measured material is cooled from the solution treatment temperature to 400t, and then "(Solid temperature - 4 〇〇) (death) / cooling time (S)" The value obtained (.c / s ). The conditions of the aging treatment are conventionally used as long as it is effective for miniaturization of precipitates. The condition may be, but it is necessary to pay attention to setting the temperature and time so that the precipitate is not coarsened. If one of the aging treatment conditions is in the range of 35 〇, its temperature is 1 to 24 hours, more preferably 400 to 5 〇. (The temperature range of rC is 1 to 24 hours. In addition, the cooling rate after aging treatment hardly affects the size of the material. The Cu-Ni-Si-c lanthanide alloy of the present invention can be processed into various kinds of copper. Products such as plates, strips, tubes, rods and wires, and the Cu-沁-Si-Co-based copper alloy of the present invention can be applied to lead frames, connectors, pins, terminals, relays, switches, secondary batteries Use electronic parts such as foils. [Examples] The present invention and the comparative examples are shown below, but the examples are merely provided to provide a better understanding of the present invention and its advantages, and not to limit the present invention. [Discussion on the influence of the manufacturing conditions on the properties of the alloy] The copper alloy of the composition of δ contained in Table 1 (composition number 1) was melted at 2330015C in a high-frequency melting furnace of 23 200915349, and cast into a thickness of 3 〇mm casting. Then, the ingot is heated to 1 Torr (TC, and then hot rolled to a thickness of 丨 at various end temperatures (hot rolling end temperature), and the cooling rate is controlled, and after the hot rolling is finished, various types are used. The cooling rate was rapidly cooled to 400, and then placed in the air for cooling. Then, in order to remove the scale of the surface, the end face was cut to a thickness of 9 mm, and then cold-rolled to a plate having a thickness of 0.15 mm, followed by 950°. C solution treatment was carried out for 12 seconds, and then immediately cooled to 4 ° C after various cooling rates, and then placed in the air for cooling. Then cold rolling to 〇 1 〇 mm, then at 450 ° C The test piece was prepared by applying an aging treatment for 3 hours in an inert atmosphere, and finally cold rolling to 0.08 mm to prepare a test piece. [Table 1] Composition Ni Co Si ~----- Cr 1·0~2.5 0.5~2.5 0·3 ~1.2 〇·〇9~〇s 1 1.8 1.1 0.65 The crystal grain size, particle size distribution and quantitative analysis, strength, and conductivity of the second phase particles were measured for each test piece obtained in the above manner. And evaluation of the characteristics of bending workability.
結晶粒徑,係對試樣進行樹脂充填,使觀察面與壓延 方向正交,以機械研磨將觀察面精加成鏡面後,在以相對 於水100容量份,濃度36%之鹽酸10容量份之比例所混 合之溶液中,溶解重量為該溶液重量之5%的氯化鐵。Z 24 200915349 試樣浸潰於以上述方式所得之溶液中1〇秒鐘,使金屬組 織出現。接著,以光學顯微鏡將上述金屬組織放大至3〇〇 倍,並拍攝成照片,藉由Jis所規定之切斷法(jish0501), 於照片上分別以25mm之間隔晝出2〇〇mm之線段,在平行 於試樣之板寬方向《5條線、及正交於試樣之板寬方向之 5條線合計1〇條’再計算以上述線段所切到之結晶粒數n, 然後從…。随⑽/⑽⑽。)〕之式求得。所觀察之視野 數,係對各試樣之板厚中央部所任意選定之丨視野。 第二相粒子,會在對材料表面進行電解研磨,使U 之基地冷解後,使第:相粒子殘留下來*出現。電解研磨 液,係使用將磷酸、硫酸、純水加以調整過後者。 對粒仅0.1 1 μιη之第二相粒子進行觀察時,可_由 FE-EPMA (電解放射型ΕΡΜΑ:日本電子股份有限公司製 JXA-8500F),以觀察倍率3〇〇〇倍(觀察視野3〇μιηχ3〇μιη), 對任意1G處進行觀察。第二相粒子之粒徑與分布之測量, 可藉由合併使用二次電子影像之觀察與所附屬之影像解析 軟體’計算粒徑0.1〜_之第二相粒子之個數,並算出 每1 μηι2之個數。 又,測里粒度分布之各粒子中,對其代表者進行 ΕΡΜΑ之定量分析,使用分散於觀察視野之第2相粒子之 粒度分布與濃度分布數據來進行分析,藉此來確認該第二 相粒子各含有1質量%以上之Ni、c〇及Si。 另一方面,對粒徑超過1μιη之第二相粒子進行觀察時, 亦藉由與粒徑(Μ〜1μιη之第二相粒子觀察相@之方法, 25 200915349 以倍率1000倍(觀察視野100χ120μηι),對任意W處進 行觀察,計算粒徑5〜10μηι之析出物個數與粒徑超過ι〇μηι 之析出物個數,然後再算出每lmm2之個數。第二相粒子 之濃度測量,亦是以與粒徑〇_1〜1μηι之第二相粒子相同 之方法’來進行定量分析。 〇強度,係進行壓延平行方向之拉伸測試,來測量〇.2 %安全限應力(YS : MPa )。 〜導电率(EC,% IACS ),係藉由利用惠司同電橋所進 行之體積電阻率測量來求得。 4曲加工性之評價,由於以通常所進行9〇。彎曲測試 難以掌握彎曲加工性之改善效果,因此以astm_e_29〇來 進行18G。彎曲加卫。測試,係在試樣板厚與f曲半徑之比 ^ 2的條件下,進行㈣胃(弯曲轴與壓延方向為同一方 J 聲曲°平彳貝,則以光学顯微鏡對彎曲加工部表面進行 規察’將未觀察到裂痕時判斷為實用上沒有問題,令為〇, 具有裂痕時則為X。 製造條件及結果示於表2。 26 200915349 【(N<〕 特性 电 〇 〇 〇 〇 X X X X X X 導電率 (% IACS) 芝 m in in <n ㈣艺 娥S g 〇〇 ο ON 00 Ο ο 00 ο Ον 00 ο 窆 Ο ο ο in o ss s 第2相粒子之粒徑(μηι) >10 個/mm2 〇 ο ο Ο ο 寸 ο o 00 〇 個/mm2 _ί 〇 r-H Ό f ·Η ^-Η IT) 〇\ οο yri 卜 卜 r—1 1 1—( 〇 xlO4 個/mm2 ss m 芝 § Ο <Ν (Ν 〇\ c5 4537 6485 8731 00 d 9822 結晶粒徑| _I ε η 00 οο Ο IT) CN 寸 cn m CN (N 固溶處理 ο Ο f 〇了 00 00 00 00 00 00 卜 卜 00 00 熱壓延 冷卻速度 (°C/s) 650〜400°C 宕 宕 冷卻速度 (°C/s) 850 〜650。。 ο m ο <η CN CN m 〇 r t in i-H 1 熱壓延結 束 溫度 __0C)__ ο 00 ο ο ο ο ο ο Ο Ο ο ο Ο ο o o o (N o o v〇 Z (Ν m 寸 in \〇 卜 00 Os 〇 200915349The crystal grain size is obtained by filling the sample with a resin so that the observation surface is perpendicular to the rolling direction, and after mechanically grinding the surface to be mirror-finished, 10 parts by volume of hydrochloric acid having a concentration of 36% with respect to 100 parts by volume of water. In the solution in which the ratio is mixed, the dissolved iron is 5% by weight of the solution. Z 24 200915349 The sample was immersed in the solution obtained in the above manner for 1 〇 second to cause the metal structure to appear. Next, the above-mentioned metal structure was magnified to 3 times by an optical microscope, and photographed, and a line of 2 mm was drawn at intervals of 25 mm on the photograph by a cutting method (Jish 0501) prescribed by Jis. , in the width direction of the plate parallel to the sample, "5 lines, and 5 lines orthogonal to the width direction of the sample plate, a total of 1 line", and then calculate the number of crystal grains n cut by the above line segment, and then .... With (10) / (10) (10). )) The formula is obtained. The number of fields of view observed was an arbitrarily selected field of view for the center portion of the thickness of each sample. The second phase particles are subjected to electrolytic polishing on the surface of the material to cool the base of U, and the first phase particles remain* appear. The electrolytic polishing liquid is adjusted by using phosphoric acid, sulfuric acid or pure water. When observing the second phase particles having a particle size of only 0.1 1 μm, it can be obtained by FE-EPMA (electrolytic radiation type: JXA-8500F manufactured by JEOL Ltd.) at an observation magnification of 3 times (observation field of view 3) 〇μιηχ3〇μιη), observe at any 1G. The measurement of the particle size and distribution of the second phase particles can be calculated by combining the observation of the secondary electron image with the attached image analysis software to calculate the number of second phase particles having a particle diameter of 0.1 to _, and calculating each number. The number of μηι2. Further, in each particle of the particle size distribution, the representative of the particle is subjected to quantitative analysis, and the particle size distribution and the concentration distribution data of the second phase particle dispersed in the observation field are used for analysis, thereby confirming the second phase. Each of the particles contains 1% by mass or more of Ni, c〇, and Si. On the other hand, when the second phase particles having a particle diameter of more than 1 μm are observed, the method is also used to observe the phase of the second phase particles of Μ~1 μηη, 25 200915349 at a magnification of 1000 times (the observation field of view 100 χ 120 μηι) Observe any W, and calculate the number of precipitates with a particle size of 5~10μηι and the number of precipitates with a particle diameter exceeding ι〇μηι, and then calculate the number of each lmm2. The concentration of the second phase particles is also measured. The quantitative analysis is performed in the same manner as the second phase particles of the particle size 〇_1~1μηι. The 〇 strength is measured by the tensile test in the parallel direction of rolling, to measure the 安全. 2 % safety limit stress (YS : MPa ~ Conductivity (EC, % IACS) is obtained by measuring the volume resistivity of the bridge with the use of the bridge. 4 The evaluation of the processability is performed by the usual 9 〇. The bending test is difficult. Mastering the improvement of bending workability, 18G is performed with astm_e_29〇. Bending and edging. The test is carried out under the condition of the ratio of the thickness of the sample to the radius of the f-curve of ^ 2 (4). The stomach (the bending axis and the rolling direction are The same side J sounds ° In the case of mussels, the surface of the bent portion was observed by an optical microscope. When the crack was not observed, it was judged that there was no practical problem, and if it was cracked, it was X. The manufacturing conditions and results are shown in Table 2. 200915349 [(N<] characteristic electric 〇〇〇〇XXXXXX conductivity (% IACS) 芝 m in in <n (four) geisha S g 〇〇ο ON 00 Ο ο 00 ο Ον 00 ο 窆Ο ο ο in o ss s Particle size of the second phase particle (μηι) >10/mm2 〇ο ο Ο ο inch ο o 00 〇 /mm2 _ί 〇rH Ό f ·Η ^-Η IT) 〇\ οο yri 卜卜r- 1 1 1—( 〇xlO4 /mm2 ss m 芝 § Ο <Ν (Ν 〇\ c5 4537 6485 8731 00 d 9822 crystal grain size | _I ε η 00 οο Ο IT) CN inch cn m CN (N solid solution Processing ο Ο f 〇 00 00 00 00 00 00 Bu Bu 00 00 Hot rolling cooling rate (°C/s) 650~400°C 宕宕 Cooling rate (°C/s) 850 ~ 650. ο m ο <η CN CN m 〇rt in iH 1 Hot calendering end temperature __0C)__ ο 00 ο ο ο ο ο ο oo Ο ο ο Ο ο ooo (N oov〇Z (Ν m inch in \〇 00 00 Os 〇 200915349
No _1〜4之合金,由於第二相粒子之分布條件適當, 因此強度、導電率及彎曲加工性皆具有優異之特性。In the alloy of No _1 to 4, since the distribution conditions of the second phase particles are appropriate, the strength, electrical conductivity, and bending workability are excellent.
No_5之合金,由於從850至65(TC之冷卻速度過大, 因此使得粒徑0 · 1〜1 μηι之第二相粒子的個數變少,結晶 粒徑發生粗大化,而造成彎曲加工性劣化。 Νο·6之合金,由於從650至400°C之冷卻速度過小, 因此使得粗大之第二相粒子的個數增加,強度及彎曲加工 性皆發生劣化。Since the alloy of No. 5 is from 850 to 65 (the cooling rate of TC is too large, the number of second phase particles having a particle diameter of 0 · 1 to 1 μη is reduced, and the crystal grain size is coarsened, resulting in deterioration of bending workability. In the alloy of Νο·6, since the cooling rate from 650 to 400 ° C is too small, the number of coarse second phase particles is increased, and both strength and bending workability are deteriorated.
No.7之合金,由於固溶處理後之冷卻速度過小,因此 使得粗大之第二相粒子的個數增加,強度及彎曲加工性皆 發生劣化。In the alloy of No. 7, since the cooling rate after the solution treatment was too small, the number of coarse second phase particles was increased, and both the strength and the bending workability were deteriorated.
No_8之合金,由於從650至400°C之冷卻速度小,且 固溶處理後之冷卻速度亦過小,因此使得粗大之第二相粒 子的個數增加,強度及彎曲加工性皆發生劣化。In the alloy of No. 8, since the cooling rate from 650 to 400 ° C is small and the cooling rate after the solution treatment is too small, the number of coarse second phase particles is increased, and the strength and bending workability are deteriorated.
No.9之合金’係相當於日本特願2〇〇7_〇92269號案 之合金,由於從850至65(rc之冷卻速度過大,因此使得 粒位0 · 1〜1 之第二相粒子的個數變少,結晶粒徑發生 粗大化’而造成彎曲加工性劣化。The alloy of No. 9 is equivalent to the alloy of the Japanese Patent No. 2〇〇7_〇92269. Since the cooling rate is from 850 to 65 (the cooling rate of rc is too large, the second phase particles of the particle position 0 · 1 to 1 are caused. The number of the particles is reduced, and the crystal grain size is coarsened to deteriorate the bending workability.
No.1〇之合金’由於熱壓延之結束溫度過低’因此使 知粗大之第一相粒子的個數增加’強度及彎曲加工性皆發 生劣化。 [組成對合金特性所造成之影響的探討] 將表3所記載之各種成分組成之銅合金於高週波炫解 爐在1300 C下加以熔化,鑄造成厚度30mm之鑄錠。接著, 28 200915349 將此鑄錠加熱至1 ooo°C後,使結束溫度(熱壓延結束溫度) 為700C ’且一邊進行熱壓延至板厚為1 〇mm,一邊控制冷 卻速度,熱壓延結束後,迅速以各種冷卻速度冷卻至4〇〇 °C,然後放置在空氣中加以冷卻。於任一情形,皆是使從 850至65 0°C之平均冷卻速度為10。〇/8,從650至400。〇 伐有’马了去除表 之平均冷卻速度為20。(: / ; 施以端面切削至厚度為9mm,然後以冷壓延製成厚Z為 0_15mm之板。接著在95(rc下進行12〇秒之固溶處理後, 馬上以18C/s之冷卻速度將其冷卻至,然後再放 置在空氣中加以冷卻D接基、人蔽^ 接著冷壓延至〇 10mm,然後在450 °C下於惰性環境氣氛中施以1 , 士 乳甲施以3小時之時效處理,最後再冷 壓延至0_08mm ’製得測試片。 29 200915349In the alloy of No. 1 ’, the temperature at the end of the hot rolling is too low, so that the number of the first phase particles which are coarse and coarse is increased, and both the strength and the bending workability are deteriorated. [Discussion of the influence of the composition on the properties of the alloy] The copper alloys of the various compositions described in Table 3 were melted in a high-frequency furnace at 1300 C, and cast into an ingot having a thickness of 30 mm. Then, 28 200915349 After heating the ingot to 1 ooo °C, the end temperature (hot calendering end temperature) is 700 C' and the hot rolling is performed to a thickness of 1 〇mm, while controlling the cooling rate, hot rolling At the end, it was quickly cooled to 4 ° C at various cooling rates and then placed in air for cooling. In either case, the average cooling rate from 850 to 65 °C is 10. 〇/8, from 650 to 400. The average cooling rate of the 马 ’ ’ 去除 removal table is 20. (: / ; The end face is cut to a thickness of 9 mm, and then cold-rolled to a plate having a thickness Z of 0_15 mm. Then, after a solution treatment of 12 sec seconds at 95 rc, the cooling rate is immediately 18 C/s. Cool it to, then place it in the air to cool the D-base, then cover it, then cold-calender it to 〇10mm, then apply it to the inert atmosphere at 450 °C for 1 hour. Aging treatment, and finally cold rolling to 0_08mm 'made test piece. 29 200915349
特性 电 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 導電率 (%IACS) σ; 靶S' 缌s Ο οο οο Ο g ο ο σ\ S 〇\ ο <Ν σ\ m oo 5: ▼"H 〇\ oo Q\ OO o 5; W >10 個/mm2 ο ο ο ο ο ο ο ο o o o o Φτ 屮 羿 Ί 躲 〇 l in 個/mm2 00 ο 寸 寸 tn 寸 寸 0.1 〜1 xlO4 個/mm2 : CN g iT) τ—Η CN 00 ΙΛ (Ν CN r*H 00 ΙΛ 00 r~< m νο m v〇 1-H ιτ·Η 1—H 00 結晶 粒徑 B zL ν〇 CN ί»·Η Ο m (Ν ΓΛ cn m CN 其他 0.1 Mg O.lMg O.lMg、0.5Sn、0·5Ζη O.lMg、0.5Sn、0·5Ζη、0.03B O.lAg ί 0.03P ΰ ι—1 ι—Η ί-H ο ιη ν〇 Ο iTi ϊ> ο ^Τ) 00 ο 0.65 \Ti ο 0.65 in v〇 〇 o in 〇 in \〇 o 0.70 ο Ο iTi τ—Η οο Ο ο Ο o o 〇 o o ίΤ) ΟΟ οο 00 00 00 00 00 00 OO oo o <N d Z ι 1 (Ν γ〇 寸 iT) ν〇 Ο 00 〇\ <N CN 200915349 一相粒子之分布 加工性皆具有優Characteristic electric conductivity (%IACS) σ; target S' 缌s Ο οο οο Ο g ο ο σ\ S 〇\ ο <Ν σ\ m oo 5: ▼ "H 〇\ oo Q\ OO o 5; W >10 /mm2 ο ο ο ο ο ο ο ο oooo Φτ 屮羿Ί 〇 l in /mm2 00 ο inch inch tn inch inch 0.1 ~1 xlO4 / Mm2 : CN g iT) τ—Η CN 00 ΙΛ (Ν CN r*H 00 ΙΛ 00 r~< m νο mv〇1-H ιτ·Η 1—H 00 Crystal grain size B zL ν〇CN ί» Η Ο m (Ν cn cn m CN Other 0.1 Mg O.lMg O.lMg, 0.5Sn, 0·5Ζη O.lMg, 0.5Sn, 0·5Ζη, 0.03B O.lAg ί 0.03P ΰ ι—1 ι— Η ί-H ο ιη ν〇Ο iTi ϊ> ο ^Τ) 00 ο 0.65 \Ti ο 0.65 in v〇〇o in 〇in \〇o 0.70 ο Ο iTi τ—Η οο Ο ο Ο oo 〇 oo Τ Τ ο οο 00 00 00 00 00 00 00 OO oo o <N d Z ι 1 (Ν γ〇 inch iT) ν〇Ο 00 〇\ <N CN 200915349 One-phase particle distribution processability is excellent
No.ll〜22之合金,由於任一者之第 條件皆為適當,因此強度、導電率及彎曲 異之特性。 其中,若比較 '〇·15,則兩者之相異在於有 無添加Cr,添加有0.1質量%夕ρ 、 ^ 為之Cr的No.15,其強度及導 电率較為優異。又,即使添加古^ 1 有其他添加元素,強度等亦 會獲得提升。 【圖式簡單說明】 無 【主要元件符號說明】 無 i 31The alloy of No. ll to 22 is suitable for the strength, electrical conductivity and bending properties of any of the above conditions. However, when '〇·15 is compared, the difference between the two is whether or not Cr is added, and 0.1% by mass of 夕ρ and ^ of Cr of No. 15 are added, and the strength and electric conductivity are excellent. Also, even if you add other elements added to the ancient ^ 1 , the intensity will be improved. [Simple description of the diagram] None [Key component symbol description] None i 31
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| TWI406959B (en) * | 2009-04-30 | 2013-09-01 | Jx Nippon Mining & Metals Corp | Cu-Ni-Si-Mg alloy with improved conductivity and bending properties |
| TWI752208B (en) * | 2017-04-04 | 2022-01-11 | 日商同和金屬股份有限公司 | Cu-co-si copper alloy plate material and manufacturing method, and parts using the plate material |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI406959B (en) * | 2009-04-30 | 2013-09-01 | Jx Nippon Mining & Metals Corp | Cu-Ni-Si-Mg alloy with improved conductivity and bending properties |
| TWI752208B (en) * | 2017-04-04 | 2022-01-11 | 日商同和金屬股份有限公司 | Cu-co-si copper alloy plate material and manufacturing method, and parts using the plate material |
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