200905264 九、發明說明 【發明所屬之技術領域】 本發明爲有關硬化性樹脂組成物、由該組成物形成保 護膜之方法及保護膜。更詳細而言,爲一種適合用於形成 液晶顯示元件(LCD)用彩色濾光片及電荷偶合裝置(CCD) 用彩色濾光片之材料的組成物,使用該組成物之保護膜的 形成方法及該組成物所形成之保護膜。 【先前技術】 LCD或C CD等之放射線裝置,於該製造步驟中,常 使用溶劑、酸或鹼溶液等對顯示元件進行浸漬處理,又, 以濺鍍方法形成配線電極層之際,其元件表面常局部地曝 曬於高溫之中。因此,爲防止因前述處理造成元件之劣化 或損傷,對於該些處理,常於元件表面舖設由具有耐性之 薄膜所形成之保護膜。 該些保護膜,多被要求必須具有對形成於該保護膜之 基體或下層,或形成於保護膜上之層具有高度密著性,膜 本身具有平滑且強韌性,具有透明性,具有高度耐熱性及 耐光性,即使長期間也不會產生著色、黃變、白化等變質 現象,具有優良耐水性、耐溶劑性、耐酸性及耐鹼性等之 性能。爲形成可滿足前述各種特性之保護膜所使用的材料 ,已知例如含有具有縮水甘油基之聚合物的熱硬化性組成 物(請參考特開平5-78453號公報及特開2001-91732號公報) 200905264 又,該些保護膜作爲彩色液晶顯示裝置或電荷偶合元 件之彩色濾光片的保護膜使用時,一般多要求形成於底層 基板上之彩色濾光片所造成之段差平坦化。 又,彩色液晶顯不裝置,例如 STN(Super Twisted Nematic)方式或TFT(Thin Film Transister)方式之彩色液晶顯 示元件中,爲均勻地保持液晶層之晶胞間隙時,多將顆粒 狀之調距器散佈於保護膜上並使其貼合於面板之方式進行 。其後再將該密封材以熱壓著方式將液晶晶胞密封,此時 所施加知熱與壓力,常會造成存在顆粒之部分的保護膜 呈現凹陷現象,故常會造成晶胞間隙極爲困擾之問題。 特別是以STN方式以製造彩色液晶顯示元件之際, 因彩色濾光片與對向基板之貼何須在精確度極高之狀態下 進行,故對於保護膜則要求應具有極高度之段差平坦化性 能及耐熱耐壓性能。 又,近年來多採用使用濺鍍法於彩色濾光片之保護膜 上形成配線電極(氧化銦錫:ITO,或氧化銦鋅:IZO)膜, 再以酸·鹼等對ITO或IZO進行圖型形成(patterning)之方 式。因此,彩色濾光片保護膜於濺鍍法時,其局部表面暴 露於高溫下,且必須經過各種藥品之處理。因此,於進行 該些處理之際,ITO或IZO圖型線寬將無法達到必要之纖 細度以上等,故極需求一種配線電極具有良好圖型形成特 性,及藥品處理時ITO或IZO不會由保護膜上剝離之與 配線電極之密著性等。 但是,爲提供上述密著性時,黏著助劑於保護膜形成 -6- 200905264 時將以昇華物方式污染塗佈機内部,而會產生必須進行管 理、洗淨等問題。但由目前之觀點觀察時,並不止於黏著 助劑,而有傾向材料之低污染物質(outgas)化之現象。又 ,以往之黏著助劑中,對於配線電極之圖型形成特性並不 充分。 前述保護膜之形成,方便上可使用具有可以簡單之方 法即可形成具有優良硬度之保護膜的優點之熱硬化性組成 物,但具有上述各種特性之保護膜樹脂組成物,因具有可 形成強固交聯的反應性交聯基或觸媒,因此該組成物本身 會有產品壽命極爲短暫之問題,故於控制上爲極困難者。 即,除組成物之塗佈性能本身會產生經時性的惡化以外, 塗佈機所產生之頻繁的污染,而常需要進行洗淨等必要之 操作上亦爲極煩雜之工作。 可滿足透明性等之作爲保護膜所需要之一般要求之性 能以外,仍能簡易地滿足上述各種性能的保護膜,且作爲 組成物時,仍能具有優良之保存安定性的材料則仍屬未知 〇 又,特開平4-218561號公報中,則揭不一種用於塗料 、油墨、黏著劑、成形品之含有潛在化羧基化合物之熱硬 化性組成物,但對於彩色濾光片之保護膜則未有任何揭示 【發明內容】 本發明爲基於以上之情事所提出者’其目的爲,提供 200905264 一種即使於表面具有低平坦性之基體時,於該基體上,亦 可形成具有高度平坦性之硬化膜,此外,具有高度透明性 與高表面硬度,且具有優良之耐熱耐壓性、耐酸性、耐鹼 性、耐濺鍍性等各種耐性,此外,並適合使用於具有出良 好圖型形成特性支配線電極的光裝置用保護膜,又,形成 保護膜時產生較低之昇華物量,且作爲組成物時具有優良 保存安定性之組成物,使用上述組成物之保護膜的形成方 法,及以上述組成物所形成之保護膜。 本發明之其他目的與優點,可由下述說明而明瞭。 本發明之上述目的及優點,第一爲,一種彩色濾光片 之保護膜用硬化性樹脂組成物,其特徵爲含有,[A]含有 具有由氧雜環丙烷基、氧雜環丁院基及烯丙基所成群中所 選出之至少1種官能基之聚合性不飽和化合物之聚合物, 及[B]可與[A]成分經由熱產生交聯反應之含有官能基之矽 氧烷低聚物之方式予以達成。 本發明之上述目的及優點,第二爲,一種彩色濾光片 之保護膜的形成方法’其特徵爲,使用前述硬化性樹脂組 成物形成塗膜,其次經加熱處理之方式予以達成。 本發明之上述目的及優點,第三爲,一種彩色濾光片 之保護膜’其特徵爲,由前述硬化性樹脂組成物所形成之 方式予以達成。 以下’將對本發明之樹脂組成物的各成分進行說明。 [A ]共聚合物 200905264 本發明之[A]共聚合物爲,含有具有由氧雜環丙烷基 、氧雜環丁烷基及烯丙基所成群中所選出之至少1種官能 基之聚合性不飽和化合物所得之重複單位的共聚合物。 [A]共聚合物,只要可滿足上述條件時,則未有任何 限制,其可爲加成聚合物、聚加成聚合物、聚縮合聚合物 中任一者皆可。 本發明中,較佳之[A]聚合物例如, (Al) (a)具有由氧雜環丙烷基、氧雜環丁烷基及烯丙 基所成群中所選出之至少1種之官能基之聚合性不飽和化 合物(以下,亦稱爲「不飽和化合物(a)」),與(bl)聚合性 不飽和羧酸及/或聚合性不飽和多元羧酸酐(以下,統稱爲 「不飽和化合物(b 1)」)與,(b 2 )不飽和化合物(a)及不飽 和化合物(b 1)以外之聚合性不飽和化合物(以下’亦稱爲 「不飽和化合物(b 2)」)所得之共聚合物(以下’亦稱爲「 共聚合物(A1)」); (A2)分子中含有由2個以上之氧雜環丙烷基、氧雜環 丁烷基及烯丙基所成群中所選出之至少1種之官能基’與 由羧酸之縮醛酯構造、羧酸之縮酮酯構造、羧酸之i -烷基 環烷酯構造及羧酸之卜構造所成群中所選出之至少1種的 構造之聚合物(以下’亦稱爲「聚合物(A2)」); (A3)不飽和化合物(a) ’與(b5)不飽和化合物(a)以外 之聚合性不飽和化合物(以下,亦稱爲「不飽和化合物 (b 5)」)之共聚合物,且分子中不含錢酸之縮酵醋構造、 殘酸之縮酮酯構造、殘酸之1_院基環院酯構造及竣酸之t_ -9- 200905264 丁酯構造中任一者之共聚合物(以下,亦稱爲「共聚合物 (A3)」)等。 又,聚合物(A2)以,(A2-1)不飽和化合物(a),與(b3) 含有由羧酸之縮醛酯構造、羧酸之縮酮酯構造、羧酸之 烷基環烷酯構造及羧酸之t-丁酯構造所成群中所選出之至 少1種構造之聚合性不飽和化合物(以下,亦稱爲「不飽和 化合物(b3)」),與(b4)不飽和化合物(a)及不飽和化合物 (b3)以外之聚合性不飽和化合物(以下,亦稱爲「不飽和 化合物(b4)」)所得之共聚合物(以下,亦稱爲「共聚合物 (A 2 - 1 )」)爲更佳。 又,共聚合物(A1)可再含有羧酸之縮醛酯構造、羧酸 之縮酮酯構造、羧酸之1-烷基環烷酯構造、羧酸之t-丁酯 構造,聚合物(A2)可再含有羧基或羧酸酐基。 共聚合物(A1)、聚合物(A2)及共聚合物(A3)中,不飽 和化合物(a)例如’(甲基)丙烯酸縮水甘油酯、α-乙基丙烯 酸縮水甘油酯、α - η -丙基丙烯酸縮水甘油酯、α - η - 丁基丙 烯酸縮水甘油酯、(甲基)丙烯酸3,4-環氧丁酯、α-乙基丙 烯酸3,4-環氧丁酯、(甲基)丙烯酸6,7-環氧戊酯、α-乙基丙 烯酸6,7 -環氧戊酯、〇 -乙烯基苄基縮水甘油醚、m -乙烯基 苄基縮水甘油醚、P-乙烯基苄基縮水甘油醚、3-甲基-3-( 甲基)丙烯醯氧甲基氧雜環丁烷、3·乙基-3-(甲基)丙烯醯 氧甲基氧雜環丁烷、丙烯酸烯丙酯、甲基丙烯酸烯丙酯等 〇 該些不飽和化合物(a),於後述[B]成分中可與[A]成分 -10- 200905264 進行熱交聯反應之官能基(以下,亦稱爲「熱交聯反應基 」)爲乙烯基、烯丙基、(甲基)丙烯醯基、羧基、羥基、 氫硫基、脲基、苯乙烯基或胺基之情形時,可與[B]成分 進行交聯反應。 該些不飽和化合物(a)中,甲基丙烯酸縮水甘油酯、 甲基丙烯酸-6,7-環氧戊酯、〇-乙烯基苄基縮水甘油醚、m-乙烯基苄基縮水甘油醚、p-乙烯基苄基縮水甘油醚、3-甲 基-3-(甲基)丙烯醯氧甲基氧雜環丁烷、3-乙基-3-(甲基)丙 烯醯氧甲基氧雜環丁烷、甲基丙烯酸烯丙酯等,就提高共 聚合反應性及所製得之保護膜或絶緣膜的耐熱性、表面硬 度等觀點而言爲較佳。 上述不飽和化合物(a),可單獨或將2種以上混合使用 〇 共聚合物(A 1 )中,不飽和化合物(b 1 )例如, (甲基)丙烯酸、巴豆酸、α-乙基丙烯酸、α-η-丙基丙 烯酸、α-η-丁基丙烯酸' 馬來酸、富馬酸、檬康酸、中康 酸、依康酸等不飽和羧酸; 馬來酸酐、依康酸酐、檬康酸酐 '順-1,2,3,4·四氫化 苯二甲酸酐等不飽和多元羧酸酐 等。 該些不飽和化合物(b 1 ),於後述[Β]成分之熱交聯反 應基爲氧雜環丙烷基、氧雜環丁烷基、表硫基(episulfido) 、羥基、氫硫基或胺基之情形時,可與[B]成分進行交聯 反應。 -11 - 200905264 該些不飽和化合物(b 1)之中,不飽和羧酸特別是以丙 烯酸、甲基丙烯酸爲佳,不飽和多元羧酸酐特別是以馬來 酸酐爲佳。該些較佳之不飽和化合物(bl)’因共聚合反應 性較高,又,可有效地提高所得保護膜之耐熱性或表面硬 度。 上述不飽和化合物(b 1 ),可單獨或將2種以上混合使 用。 又,不飽和化合物(b 2 ),例如, (甲基)丙烯酸2-羥乙酯、(甲基)丙烯酸2-羥丙酯等(甲 基)丙烯酸羥烷酯; (甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯 酸η-丙酯、(甲基)丙烯酸i_丙酯、(甲基)丙烯酸n_ 丁酯、 (甲基)丙烯酸i -丁酯、(甲基)丙烯酸see-丁酯、(甲基)丙 烯酸t-丁酯等(甲基)丙烯酸烷酯; (甲基)丙烯酸環戊酯、(甲基)丙烯酸環己酯、(甲基) 丙烯酸2-甲基環己酯、(甲基)丙烯酸三環[5.2.1.02,6]癸烷-8-基(以下’三環[5.2.1.02’6]癸烷-8_基亦稱爲「二環戊基 (dicyclopentanyl)」)、(甲基)丙烯酸2_二環戊基氧乙酯、( 甲基)丙烯酸異冰片酯等(甲基)丙烯酸脂環式酯; (甲基)丙稀酸苯酯、(甲基)丙烯酸苄酯等(甲基)丙烯 酸芳酯; 馬來酸二乙酯、富馬酸二乙酯、依康酸二乙酯等不飽 和二羧酸二酯; N-苯基馬來醯亞胺、N_苄基馬來醯亞胺、n-環己基馬 -12- 200905264 來醯亞胺、N-琥珀酸醯亞胺基-3-馬來醯亞胺苯甲酸酯、 N-琥珀酸醯亞胺基-4-馬來醯亞胺丁酸酯、N-琥珀酸醯亞 胺基-6-馬來醯亞胺己酸酯、N-琥珀酸醯亞胺基-3-馬來醯 亞胺丙酸酯、N-(9-吖啶基)馬來醯亞胺等不飽和二羰基醯 亞胺衍生物; (甲基)丙烯腈、α-氯基丙烯腈、氰化亞乙烯基等氰化 乙烯基化合物; (甲基)丙烯醯胺、N,N-二甲基(甲基)丙烯醯胺等不飽 和醯胺化合物; 苯乙烯、α-甲基苯乙烯、m-甲基苯乙烯、p-甲基苯乙 烯、乙烯基甲苯、P-甲氧基苯乙烯等芳香族乙烯基化合物 » 茚、1-甲基茚等茚衍生物; 1,3-丁二烯、異戊二烯、2,3-二甲基-1,3-丁二烯等共 軛二烯系化合物以外,例如 氯化乙烯、氯化亞乙烯、乙酸乙烯 等。 該些不飽和化合物(b2)中,(甲基)丙烯酸羥烷酯、甲 基丙烯酸甲酯、甲基丙烯酸t -丁酯、丙烯酸環己酯、甲基 丙烯酸二環戊酯、丙烯酸2 -甲基環己酯、N -苯基馬來醯亞 胺、N -環己基馬來醯亞胺、苯乙烯、p -甲氧基苯乙烯、 1,3-丁二烯等爲佳。該些較佳之不飽和化合物(b2),具有 高共聚合反應性,且可有效提高所得之保護膜的耐熱性( 但,1 ,3 - 丁一稀之情形除外)或表面硬度(但,1, 3 - 丁一稀 -13- 200905264 之情形除外)。 上述不飽和化合物(b2)可單獨或將2種以上混合使用 〇 共聚合物(A1)之較佳具體例如, 丙烯酸縮水甘油酯/丙烯酸/丙烯酸二環戊基/苯乙烯共 聚合物、 甲基丙烯酸縮水甘油酯/甲基丙烯酸/甲基丙烯酸二環 戊基/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/甲基丙烯酸/甲基丙烯酸甲酯/ 苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/甲基丙烯酸/丙烯酸環己酯/p-甲氧基苯乙烯共聚合物、 丙烯酸縮水甘油酯/丙烯酸/N-苯基馬來醯亞胺/苯乙烯 共聚合物、 甲基丙烯酸縮水甘油酯/甲基丙烯酸/N-苯基馬來醯亞 胺/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/甲基丙烯酸/N-環己基馬來醯 亞胺/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/甲基丙烯酸/甲基丙烯酸二環 戊基/1,3-丁二烯共聚合物、 甲基丙烯酸6,7-環氧庚酯/甲基丙烯酸/甲基丙烯酸二 環戊基/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/甲基丙烯酸/甲基丙烯酸二環 戊基/苯乙烯/1,3-丁二烯共聚合物、 -14- 200905264 甲基丙烯酸6,7 -環氧戊酯/丙稀酸/馬來酸酐/苯乙稀共 聚合物、 甲基丙烯酸6,7 -環氧戊酯/丙烯酸/馬來酸酐/甲基丙烯 酸t-丁基共聚合物、 3-乙基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/丙烯酸/丙 烯酸二環戊基/苯乙烯共聚合物、 3_乙基_3_(甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸/甲基丙烯酸二環戊基/苯乙烯共聚合物、 3_乙基_3-(甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸/甲基丙烯酸甲酯/苯乙烯共聚合物、 3_乙基_3_(甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸/丙烯酸環己基/p-甲氧基苯乙烯共聚合物、 3 -乙基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/丙烯酸/N-苯基馬來醯亞胺/苯乙烯共聚合物、 3-乙基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸/N-苯基馬來醯亞胺/苯乙烯共聚合物、 3-乙基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸/N-環己基馬來醯亞胺/苯乙烯共聚合物、 3-乙基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸/甲基丙烯酸二環戊基/1,3 -丁二烯共聚合物、 3-乙基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸/甲基丙烯酸二環戊基/苯乙烯/1,3-丁二烯共聚合物、 3 -乙基- 3- (甲基)丙烯醯氧甲基氧雜環丁烷/丙烯酸/馬 來酸酐/苯乙烯共聚合物、 -15- 200905264 3-乙基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/丙烯酸/馬 來酸酐/甲基丙烯酸t-丁基共聚合物、 甲基丙烯酸烯丙酯/丙烯酸/丙烯酸二環戊基/苯乙烯共 聚合物、 甲基丙烯酸烯丙酯/甲基丙烯酸/甲基丙烯酸二環戊基/ 苯乙烯共聚合物、 甲基丙烯酸烯丙酯/甲基丙烯酸/甲基丙烯酸甲酯/苯乙 燒共聚合物、 甲基丙烯酸烯丙酯/甲基丙烯酸/丙烯酸環己基/p-甲氧 基苯乙烯共聚合物、 甲基丙烯酸烯丙酯/丙烯酸/N-苯基馬來醯亞胺/苯乙烯 共聚合物、 甲基丙烯酸烯丙酯/甲基丙烯酸/N-苯基馬來醯亞胺/苯 乙嫌共聚合物、 甲基丙烯酸烯丙酯/甲基丙烯酸/N-環己基馬來醯亞胺/ 苯乙烯共聚合物、 甲基丙烯酸烯丙酯/甲基丙烯酸/甲基丙烯酸二環戊基 71,3-丁二烯共聚合物、 甲基丙烯酸烯丙酯/甲基丙烯酸/甲基丙烯酸二環戊基/ 苯乙烯/1,3-丁二烯共聚合物、 甲基丙烯酸烯丙酯/丙烯酸/馬來酸酐/苯乙烯共聚合物 、 甲基丙烯酸烯丙酯/丙烯酸/馬來酸酐/甲基丙烯酸t-丁 基共聚合物等。 -16- 200905264 該些共聚合物(A1)中,更佳者例如, 甲基丙烯酸縮水甘油酯/甲基丙烯酸/甲基丙烯酸二環 戊基/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/甲基丙烯酸/N-苯基馬來醯亞 胺/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/甲基丙烯酸/N-環己基馬來醯 亞胺/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/甲基丙烯酸/甲基丙烯酸二環 戊基/1,3-丁二烯共聚合物、 甲基丙烯酸縮水甘油酯/甲基丙烯酸/甲基丙烯酸二環 戊基/苯乙烯/1,3-丁二烯共聚合物、 3-乙基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸/甲基丙烯酸二環戊基/苯乙烯共聚合物、 3 -乙基- 3- (甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸/N-苯基馬來醯亞胺/苯乙烯共聚合物、 3-乙基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸/N-環己基馬來醯亞胺/苯乙烯共聚合物、 3 -乙基- 3- (甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸/甲基丙烯酸二環戊基/1,3-丁二烯共聚合物、 3-乙基- 3- (甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸/甲基丙烯酸二環戊基/苯乙烯/1,3-丁二烯共聚合物、 3 -甲基- 3- (甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸/甲基丙烯酸二環戊基/苯乙烯共聚合物、 3 -甲基- 3- (甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 -17- 200905264 酸/N-苯基馬來醯亞胺/苯乙烯共聚合物、 3 -甲基- 3- (甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸/N -環己基馬來醯亞胺/苯乙烯共聚合物、 3 -甲基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸/甲基丙烯酸二環戊基/丨,3· 丁二烯共聚合物、 3 -甲基- 3- (甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸/甲基丙烯酸二環戊基/苯乙烯/1,3-丁二烯共聚合物、 甲基丙烯酸烯丙酯/甲基丙烯酸/甲基丙烯酸二環戊基/ 苯乙烯共聚合物、 甲基丙烯酸烯丙酯/甲基丙烯酸/N-苯基馬來醯亞胺/苯 乙烯共聚合物、 甲基丙烯酸烯丙酯/甲基丙烯酸/Ν·環己基馬來醯亞胺/ 苯乙烯共聚合物、 甲基丙烯酸烯丙酯/甲基丙烯酸/甲基丙烯酸二環戊基 /1,3-丁二烯共聚合物、 甲基丙烯酸烯丙酯/甲基丙烯酸/甲基丙烯酸二環戊基/ 苯乙烯/1,3-丁二烯共聚合物 等。 共聚合物(A 1)中,由不飽和化合物(a)所生成之重複 單位之含有率,相對於全體重複單位,較佳爲10〜70重量 %,更佳爲2 0 ~ 6 0重量%。不飽和化合物(b 1)所生成之重複 單位之合計含有率,相對於全體重複單位’較佳爲5〜40重 量%,更佳爲10〜30重量%。不飽和化合物(b2)所生成之重 複單位之含有率,相對於全體重複單位’較佳爲10〜70重 -18- 200905264 量%,更佳爲20〜50重量%。 不飽和化合物(a)所生成之重複單位之含有率未達10 重量%時,保護膜之耐熱性或表面硬度會有降低之傾向’ 又,超過70重量%時,組成物之保存安定性會有降低之傾 向。又,(bl)聚合性不飽和羧酸及聚合性不飽和多元羧酸 酐所生成之重複單位之合計含有率未達5重量%時’保護 膜之耐熱性、表面硬度或耐藥品性會有降低之傾向,又超 過40重量%時,組成物之保存安定性會有降低之傾向。又 ,(b2)其他聚合性不飽和化合物所生成之重複單位之含有 率未達1 0重量%時,組成物之保存安定性會有降低之傾向 ,又超過70重量%時,保護膜之耐熱性或表面硬度會有降 低之傾向。 其次,聚合物(A2)具有由羧酸之縮醛酯構造、羧酸之 縮酮酯構造、羧酸之1-烷基環烷酯構造及羧酸之t-丁酯構 造所成群中所選出之至少1種之構造。聚合物(A2),只要 滿足上述條件時,則無特別限定,其可爲加成聚合物、聚 加成聚合物、聚縮合聚合物等任一者皆可。 形成羧酸之縮醛酯構造之基,例如,1 -甲氧乙氧基、 1-乙氧乙氧基、1-n-丙氧乙氧基、Ι-i-丙氧乙氧基、1-n-丁 氧乙氧基、Ι-i-丁氧乙氧基、l_sec-丁氧乙氧基、Ι-t-丁氧 乙氧基、1-環戊基氧基乙氧基、1-環己基氧基乙氧基、1-降冰片烷基氧基乙氧基、1-冰片基氧基乙氧基、1-苯基氧 基乙氧基、1-(卜萘基氧基)乙氧基、1·苄基氧基乙氧基、 1-苯乙基氧基乙氧基、(環己基)(甲氧基)甲氧基、(環己基 -19- 200905264 )(乙氧基)甲氧基、(環己基)(η-丙氧基)甲氧基、(環己基 )(i-丙氧基)甲氧基、(環己基)(環己基氧基)甲氧基、(環己 基)(苯氧基)甲氧基、(環己基)(苄氧基)甲氧基、(苯基)(甲 氧基)甲氧基、(苯基)(乙氧基)甲氧基、(苯基)(n-丙氧基) 甲氧基、(苯基)(i-丙氧基)甲氧基、(苯基)(環己基氧基)甲 氧基、(苯基)(苯氧基)甲氧基、(苯基)(苄氧基)甲氧基、( 苄基)(甲氧基)甲氧基、(苄基)(乙氧基)甲氧基、(苄基)(n-丙氧基)甲氧基、(苄基)(i-丙氧基)甲氧基、(苄基)(環己基 氧基)甲氧基、(苄基)(苯氧基)甲氧基、(苄基)(苄氧基)甲 氧基' 2-四氫呋喃基氧基、2-四氫吡喃基氧基等。 該些基團中,又以1-乙氧乙氧基、1-環己基氧基乙氧 基、2_四氫吡喃基氧基、1-n -丙氧乙氧基、2 -四氫吡喃基 氧基爲更佳者。 形成羧酸之縮酮酯構造之基,例如,1-甲基-1-甲氧 基乙氧基、1-甲基-1-乙氧乙氧基、1-甲基-1-n -丙氧乙氧 基' 1-甲基- Ι- i-丙氧乙氧基、1-甲基-1-n -丁氧乙氧基、1-甲基- Ι-i-丁氧乙氧基、1-甲基- Ι-sec-丁氧乙氧基、1-甲 基- Ι-t-丁氧乙氧基、1-甲基-1·環戊基氧基乙氧基、1-甲 基-1-環己基氧基乙氧基、1-甲基-1-降冰片烷基氧基乙氧 基、1-甲基-1-冰片基氧基乙氧基、1-甲基-1-苯基氧基乙 氧基、1-甲基-1-(1-萘基氧基)乙氧基、1-甲基-1-苄基氧基 乙氧基、1_甲基·;!_苯乙基氧基乙氧基、1-環己基-1-甲氧 基乙氧基、1-環己基-1-乙氧乙氧基、1-環己基-1-n -丙氧 乙氧基、1-環己基- Ι-i·丙氧乙氧基、:!-環己基-1-環己基氧 -20- 200905264 基乙氧基、1-環己基-1_苯氧基乙氧基、1-環己基-1-予基 氧基乙氧基、1-苯基-1-甲氧基乙氧基、1-苯基-1-乙氧乙 氧基、1-苯基-1-n-丙氧乙氧基、1-苯基- Ι- i-丙氧乙氧基、 1-苯基-1-環己基氧基乙氧基、卜苯基-1-苯基氧基乙氧基 、1-苯基-1-节基氧基乙氧基、1-千基-1-甲氧基乙氧基、 1-苄基-1-乙氧乙氧基、卜苄基-卜η-丙氧乙氧基、丨_苄基-Ι-i -丙氧乙氧基、1-苄基-1-環己基氧基乙氧基、1-苄基-1-苯基氧基乙氧基、卜苄基-1-苄基氧基乙氧基、2-(2-甲基-四氫呋喃基)氧基、2-(2-甲基-四氫吡喃基)氧基、1-甲氧 基-環戊基氧基、1-甲氧基-環己基氧基等。 其中,又以1-甲基-1-甲氧基乙氧基、1-甲基-1-環己 基氧基乙氧基爲較佳之例不。 可與羧基鍵結形成羧酸之1 -烷基環烷酯構造之基,例 如1-甲基環丙基、1-甲基環丁基、1-甲基環戊基、1-甲基 環己基、1-甲基環庚基、1-甲基環辛基、1-甲基環壬基、 1-甲基環癸基、1-乙基環丙基、1-乙基環丁基、1-乙基環 戊基、1-乙基環己基、1-乙基環庚基、1-乙基環辛基、1· 乙基環壬基、1-乙基ί哀癸基、1-(異)丙基環丙基、1_(異) 丙基環丁基、1-(異)丙基環戊基、1-(異)丙基環己基、1-( 異)丙基環庚基、1-(異)丙基環辛基、1-(異)丙基環壬基、 ι-(異)丙基環癸基、ι-(異)丁基環丙基、ι-(異)丁基環丁基 、1-(異)丁基環戊基、〗-(異)丁基環己基、1·(異)丁基環庚 基、1-(異)丁基環辛基、1-(異)丁基環壬基、丨_(異)丁基環 癸基、1-(異)戊基環丙基、1-(異)戊基環丁基、1_(異)戊基 -21 - 200905264 環戊基、ι-(異)戊基環己基、ι-(異)戊基環庚基、ι-(異)戊 基環辛基、1-(異)戊基環壬基、1-(異)戊基環癸基、1-(異) 己基環丙基、1-(異)己基環丁基、1-(異)己基環戊基、1-( 異)己基環己基、1-(異)己基環庚基、1-(異)己基環辛基、 1-(異)己基環壬基、1-(異)己基環癸基、1-(異)庚基環丙基 、1-(異)庚基環丁基、1-(異)庚基環戊基、1-(異)庚基環己 基、1-(異)庚基環庚基、1-(異)庚基環辛基、1-(異)庚基環 壬基、1-(異)庚基環癸基、1-(異)辛基環丙基、1-(異)辛基 環丁基、1-(異)辛基環戊基、1-(異)辛基環己基、1-(異)辛 基環庚基、1-(異)辛基環辛基、1-(異)辛基環壬基及1-(異) 辛基環癸基等爲較佳之例示。 聚合物(A2),與使用共聚合物(A1)之情形相比較時, 具有良好之保存安定性,且可得到使所得保護膜具有優良 平坦化能力之1液型硬化性樹脂組成物(0〇。 共聚合物(A2-1)中,不飽和化合物(b3),例如,具有 羧酸之縮醛酯構造或羧酸之縮酮酯構造之降冰片烯化合物 、羧酸之縮醛、縮酮或1-烷基環烷酯構造之(甲基)丙烯酸 酯化合物、t-丁基(甲基)丙烯酸酯等。 上述具有縮醛酯構造或縮酮酯構造之降冰片烯化合物 的具體例,例如,2,3-二-四氫吡喃-2-基氧羰基-5-降冰片 烯、 2.3- 二-三甲基矽烷基氧羰基-5-降冰片烯、 2.3- 二-三乙基矽烷基氧羰基-5-降冰片烯、 2.3- 二-t-丁基二甲基矽烷基氧羰基-5-降冰片烯、 -22- 200905264 2,3_二-三甲基甲鍺烷基氧羰基-5-降冰片烯、 2.3- 二-三乙基甲鍺烷基氧羰基-5_降冰片烯、 2.3- 二-t-丁基二甲基甲鍺烷基氧羰基-5_降冰片烯、 — t -丁基氧(親基_5·降冰片稀、 2.3 -二-苄氧基羰基-5_降冰片烯、 2.3- 二-四氫呋喃_2_基氧羰基-5_降冰片烯、 2.3- 二-四氫吡喃_2_基氧羰基_5_降冰片烯、 2.3- 二-環丁基氧羰基-5_降冰片烯、 2.3- 二-環戊基氧羰基_5_降冰片烯、 2.3- 二-環己基氧羰基_5_降冰片烯、 2.3- 二-環庚基氧羰基_5_降冰片烯、 2,3-二-1_甲氧基乙氧基羰基_5_降冰片烯、 2.3 -二- Ι- t-丁氧基乙氧基羰基-5-降冰片烯、 - 卞氧基乙氧基羯基-5·降冰片嫌、 2.3- 二-(環己基)(乙氧基)甲氧基羰基-5_降冰片烯、 2.3- 二-1-甲基-卜甲氧基乙氧基羰基_5_降冰片烯、 2.3- 二-1-甲基-1_丨_丁氧基乙氧基羰基-5_降冰片烯、 2.3- 二-(苄基)(乙氧基)甲氧基羰基-5-降冰片烯等; 上述具有縮醛酯或縮酮酯構造之(甲基)丙烯酸酯化合 物之具體例’例如,1-乙氧基乙基(甲基)丙烯酸酯、四氫-2Η-吡喃-2-基(甲基)丙烯酸酯、1-(環己基氧基)乙基(甲基) 丙烯酸酯、1-(2-甲基丙氧基)乙基(甲基)丙烯酸酯、ΙΟ ,1_ 二甲基 - 乙氧基 ) 乙基 (甲基 ) 丙烯 酸酯、 1-( 環己 基氧基 )乙基(甲基)丙烯酸酯等。 -23- 200905264 上述具有1-烷基環烷酯構造之(甲基)丙烯酸酯化合物 之具體例,例如 1-甲基環丙基(甲基)丙烯酸酯、1-甲基環丁基(甲基) 丙烯酸酯、1-甲基環戊基(甲基)丙烯酸酯、1-甲基環己基( 甲基)丙烯酸酯、1-甲基環庚基(甲基)丙烯酸酯' 1-甲基環 辛基(甲基)丙烯酸酯、1-甲基環壬基(甲基)丙烯酸酯、1-甲基環癸基(甲基)丙烯酸酯、1-乙基環丙基(甲基)丙烯酸 酯、1-乙基環丁基(甲基)丙烯酸酯、1-乙基環戊基(甲基) 丙烯酸酯、1-乙基環己基(甲基)丙烯酸酯、1-乙基環庚基( 甲基)丙烯酸酯、1-乙基環辛基(甲基)丙烯酸酯、1-乙基環 壬基(甲基)丙烯酸酯、1-乙基環癸基(甲基)丙烯酸酯、1-( 異)丙基環丙基(甲基)丙烯酸酯、1-(異)丙基環丁基(甲基) 丙烯酸酯、1-(異)丙基環戊基(甲基)丙烯酸酯、1-(異)丙基 環己基(甲基)丙烯酸酯、1-(異)丙基環庚基(甲基)丙烯酸 酯、1-(異)丙基環辛基(甲基)丙烯酸酯、1-(異)丙基環壬基 (甲基)丙烯酸酯、1-(異)丙基環癸基(甲基)丙烯酸酯、1-( 異)丁基環丙基(甲基)丙烯酸酯、1-(異)丁基環丁基(甲基) 丙烯酸酯、1-(異)丁基環戊基(甲基)丙烯酸酯、1-(異)丁基 環己基(甲基)丙烯酸酯、1-(異)丁基環庚基(甲基)丙烯酸 酯、1-(異)丁基環辛基(甲基)丙烯酸酯、1-(異)-丁基環壬 基(甲基)丙烯酸酯、1-(異)丁基環癸基(甲基)丙烯酸酯、1_ (異)戊基環丙基(甲基)丙烯酸酯、1-(異)戊基環丁基(甲基) 丙烯酸酯、1-(異)戊基環戊基(甲基)丙烯酸酯、1-(異)戊基 環己基(甲基)丙烯酸酯、1-(異)戊基環庚基(甲基)丙烯酸 -24- 200905264 酯、ι-(異)戊基環辛基(甲基)丙烯酸酯、ι-(異)戊基環壬基 (甲基)丙烯酸酯、1-(異)戊基環癸基(甲基)丙烯酸酯、 1-(異)己基環丙基(甲基)丙烯酸酯、1-(異)己基環丁基 (甲基)丙烯酸酯、1-(異)己基環己基(甲基)丙烯酸酯、1-( 異)己基環庚基(甲基)丙烯酸酯、1-(異)己基環辛基(甲基) 丙烯酸酯、1-(異)己基環壬基(甲基)丙烯酸酯、1-(異)己基 環癸基(甲基)丙烯酸酯、1-(異)庚基環丙基(甲基)丙烯酸 酯、1-(異)庚基環丁基(甲基)丙烯酸酯、1-(異)庚基環戊基 (甲基)丙烯酸酯、1-(異)庚基環己基(甲基)丙烯酸酯、1-( 異)庚基環庚基(甲基)丙烯酸酯、1-(異)庚基環辛基(甲基) 丙烯酸酯、1-(異)庚基環壬基(甲基)丙烯酸酯、1-(異)庚基 環癸基(甲基)丙烯酸酯、1-(異)辛基環丙基(甲基)丙烯酸 酯、1-(異)辛基環丁基(甲基)丙烯酸酯、1-(異)辛基環戊基 (甲基)丙儲酸酯、1-(異)辛基環己基(甲基)丙燦酸酯、1-( 異)辛基環庚基(甲基)丙烯酸酯、1-(異)辛基環辛基(甲基) 丙烯酸酯、1-(異)辛基環壬基(甲基)丙烯酸酯、1-(異)辛基 環癸基(甲基)丙烯酸酯等。 其中,以使用卜乙基環戊基(甲基)丙烯酸酯、1-乙基 環己基(甲基)丙烯酸酯、1-(異)丙基環戊基(甲基)丙烯酸 酯、1-(異)丙基環己基(甲基)丙烯酸酯、1-(異)丁基環戊基 (甲基)丙烧酸醋、1-(異)丁基環己基(甲基)丙烯酸酯爲佳 ’更佳爲1-乙基環戊基(甲基)丙烯酸酯、1-乙基環己基(甲 基)丙烯酸酯’最佳爲1-乙基環戊基(甲基)丙烯酸酯、丨-乙 基環己基(甲基)丙烯酸酯。其中,就共聚合反應性及可提 -25- 200905264 高所得保護膜之耐熱性、組成物溶液之保存安定性等觀點 而言爲更適合使用者。 其中,以具有羧酸之縮醛酯、縮酮酯或1-烷基環烷酯 構造之(甲基)丙烯酸酯化合物及t-丁基(甲基)丙烯酸酯爲 較佳,其中又以1-乙氧基甲基丙烯酸乙酯、四氫-2H-吡 喃-2-基甲基丙烯酸酯、1-(環己基氧基)甲基丙烯酸乙酯、 1-(2-甲基丙氧基)甲基丙烯酸乙酯、ΐ-(ι,ι-二甲基-乙氧基 )甲基丙烯酸乙酯、1-(環己基氧基)甲基丙烯酸乙酯、1-乙 基環戊基(甲基)丙烯酸酯、1-乙基環己基(甲基)丙烯酸酯 、t-丁基甲基丙烯酸酯爲更佳。 該些較佳之不飽和化合物(b3 ),除可得到高共聚合反 應性,與優良保存安定性及保護膜之平坦化能力之1液型 硬化性樹脂組成物的同時,對於提高所得保護膜之耐熱性 或表面硬度等亦極爲有效。 上述不飽和化合物(b3),可單獨或將2種以上混合使 用。 又,不飽和化合物(b4),例如,與上述不飽和化合物 (bl)及不飽和化合物(b2)所例示之化合物相同之化合物等 〇 該些不飽和化合物(b4)中,又乙甲基丙烯酸甲酯、丙 烯酸環己酯、甲基丙烯酸二環戊基、丙烯酸2-甲基環己酯 、N•苯基馬來醯亞胺、N_環己基馬來醯亞胺、苯乙烯、P-甲氧基苯乙烯、1,3 -丁二烯等爲佳。該些較佳之不飽和化 合物(b4),可提高共聚合反應性,且對提高所得之保護膜 -26- 200905264 的耐熱性(但,1,3 - 丁二嫌之情形除外)或表面硬度(但, 1,3-丁二烯之情形除外)亦爲有效。 上述不飽和化合物(b4),可單獨或將2種以上混合使 用。 共聚合物(A2 -1)之較佳具體例如, 甲基丙烯酸縮水甘油酯/丙烯酸四氫- 2H -吡喃-2-基/甲 基丙烯酸二環戊基/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/甲基丙烯酸四氫-2H -吡喃- 2-基/甲基丙烯酸二環戊基/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/丙烯酸四氫-2H-吡喃-2·基/N-苯基馬來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/甲基丙烯酸四氫- 2H -吡喃-2-基/N-苯基馬來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/丙烯酸四氫-2H -吡喃-2-基/N-環己基馬來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/甲基丙烯酸四氫- 2H-吡喃-2-基/N-環己基馬來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/丙烯酸1-(環己基氧基)乙基/ 甲基丙烯酸二環戊基/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/甲基丙烯酸1-(環己基氧基)乙 基/甲基丙烯酸二環戊基/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/丙烯酸1-(環己基氧基)乙基 /N-環己基馬來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/甲基丙烯酸1-(環己基氧基)乙 -27- 200905264 基/N-環己基馬來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/2,3-二(四氫吡喃-2_基氧羰基 )-5-降冰片烯/甲基丙烯酸二環戊基/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/2,3-二(四氫吡喃-2-基氧羰基 )-5-降冰片烯/N-環己基馬來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/丙烯酸四氫-2H-吡喃-2-基/甲 基丙烯酸二環戊基/1,3-丁二烯共聚合物、 甲基丙烯酸縮水甘油酯/甲基丙烯酸四氫- 2H -吡喃-2-基/甲基丙烯酸二環戊基/1,3-丁二烯共聚合物、 甲基丙烯酸縮水甘油酯/丙烯酸四氫-2H-吡喃-2-基/甲 基丙烯酸甲酯/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/甲基丙烯酸四氫-2H -吡喃-2-基/甲基丙烯酸甲酯/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/丙烯酸四氫-2H-吡喃-2-基/丙 烯酸環己基/p-甲氧基苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/甲基丙烯酸四氫-2H-吡喃-2-基/丙烯酸環己基/p-甲氧基苯乙烯共聚合物、 丙烯酸縮水甘油酯/甲基丙烯酸t-丁基/N-苯基馬來醯 亞胺/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/甲基丙烯酸t-丁基/N-環己基 馬來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸6,7_環氧庚酯/丙烯酸四氫-2H-吡喃-2_基/ 甲基丙烯酸t-丁基/馬來酸酐共聚合物、 甲基丙烯酸6,7-環氧庚酯/甲基丙烯酸四氫-211-吡喃- -28- 200905264 2-基/甲基丙烯酸t-丁基/馬來酸酐共聚合物、 甲基丙烯酸6,7-環氧庚酯/甲基丙烯酸t-丁基/甲基丙 烯酸二環戊基/苯乙烯共聚合物、 甲基丙烯酸6,7-環氧庚酯/甲基丙烯酸t-丁基/馬來酸 酐/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/丙烯酸1-(環己基氧基)乙基/ 甲基丙烯酸二環戊基/苯乙烯Π,3-丁二烯共聚合物、 甲基丙烯酸縮水甘油酯/甲基丙烯酸1-(環己基氧基)乙 基/甲基丙烯酸二環戊基/苯乙烯/1,3-丁二烯共聚合物 甲基丙烯酸縮水甘油酯/1-乙基環戊基丙烯酸酯/Ν-苯 基馬來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/1-乙基環己基丙烯酸酯/Ν-苯 基馬來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/1-乙基環戊基丙烯酸酯/Ν -苯 基馬來醯亞胺/苯乙烯/甲基丙烯酸共聚合物、 甲基丙烯酸縮水甘油酯/1-乙基環戊基丙烯酸酯/甲基 丙烯酸二環戊基/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/1-乙基環己基丙烯酸酯/甲基 丙烯酸二環戊基/苯乙烯共聚合物、 3-乙基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/丙烯酸四 氫- 2H-吡喃-2-基/甲基丙烯酸二環戊基/苯乙烯共聚合物、 3-乙基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸四氫-2H-吡喃-2-基/甲基丙烯酸二環戊基/苯乙烯共聚合 物、 -29- 200905264 3 -乙基- 3- (甲基)丙烯醯氧甲基氧雜環丁烷/丙烯酸四 氫- 2H-吡喃-2-基/N-苯基馬來醯亞胺/苯乙烯共聚合物、 3-乙基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸四氫-2H-吡喃-2-基/N-苯基馬來醯亞胺/苯乙烯共聚合物 3_乙基_3_(甲基)丙烯醯氧甲基氧雜環丁烷/丙烯酸四 氫- 2H -吡喃-2 -基/N -環己基馬來醯亞胺/苯乙烯共聚合物、 3_乙基_3_(甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸四氫- 2H-吡喃-2-基/N-環己基馬來醯亞胺/苯乙烯共聚合 物、 3 -乙基- 3- (甲基)丙烯醯氧甲基氧雜環丁烷/丙嫌酸i_( 環己基氧基)乙基/甲基丙烯酸二環戊基/苯乙烯共聚合物、 3_乙基_3_(甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸1-(環己基氧基)乙基/甲基丙烯酸二環戊基/苯乙稀共聚 合物、 3-乙基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/丙烯酸1_( 環己基氧基)乙基/N-環己基馬來酸亞胺/苯乙烯共聚合物、 3_乙基_3-(甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸1-(環己基氧基)乙基/N_環己基馬來醯亞胺/苯乙烯共聚 合物、 3-乙基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/2,3_二(四 氫吡喃-2-基氧羰基)-5-降冰片烯/甲基丙烯酸二環戊基/苯 乙烯共聚合物、 3-乙基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/2,3-二(四 -30- 200905264 氫吡喃-2-基氧羰基)-5-降冰片烯/N-環己基馬來醯亞胺/苯 乙烯共聚合物、 3-乙基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/丙烯酸四 氫-2H-吡喃-2-基/甲基丙烯酸二環戊基/1,3-丁二烯共聚合 物、 3-乙基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸四氫-2H-吡喃-2-基/甲基丙烯酸二環戊基/1,3-丁二烯共 聚合物、 3-乙基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/丙烯酸四 氫-2H-吡喃-2-基/甲基丙烯酸甲酯/苯乙烯共聚合物、 3-乙基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸四氫-2H-吡喃-2-基/甲基丙烯酸甲酯/苯乙烯共聚合物、 3-乙基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/丙烯酸四 氫- 2H-吡喃-2-基/丙烯酸環己基/p -甲氧基苯乙烯共聚合物 、 3-乙基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸四氫- 2H -吡喃-2-基/丙烯酸環己基/p -甲氧基苯乙烯共聚 合物、 3 -甲基- 3- (甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸t-丁基/N-苯基馬來醯亞胺/苯乙烯共聚合物、 3 -乙基- 3- (甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸t -丁基/N -環己基馬來釀亞胺/苯乙;):希共聚合物、 3 -甲基- 3- (甲基)丙烯醯氧甲基氧雜環丁烷/丙烯酸四 氫-2H-吡喃-2-基/甲基丙烯酸t-丁基/馬來酸酐共聚合物、 31 - 200905264 3-甲基-3-(甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸四氫-2H-吡喃-2-基/甲基丙烯酸t-丁基/馬來酸酐共聚合 物、 3-甲基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸t-丁基/甲基丙烯酸二環戊基/苯乙烯共聚合物、 3-甲基-3-(甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸t-丁基/馬來酸酐/苯乙烯共聚合物、 3-乙基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/丙烯酸1-( 環己基氧基)乙基/甲基丙烯酸二環戊基/苯乙烯/1,3-丁二 烯共聚合物、 3-乙基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸1-(環己基氧基)乙基/甲基丙烯酸二環戊基/苯乙烯/1,3- 丁二烯共聚合物 3-乙基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/1-乙基環 戊基丙烯酸酯/N-苯基馬來醯亞胺/苯乙烯共聚合物、 3-乙基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/1-乙基環 己基丙烯酸酯/N-苯基馬來醯亞胺/苯乙烯共聚合物、 3-乙基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/1-乙基環 戊基丙烯酸酯/N-苯基馬來醯亞胺/苯乙烯/甲基丙烯酸共聚 合物、 3-乙基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/1-乙基環 戊基丙烯酸酯/甲基丙烯酸二環戊基/苯乙烯共聚合物、 3-乙基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/1-乙基環 己基丙烯酸酯/甲基丙烯酸二環戊基/苯乙烯共聚合物、 -32- 200905264 甲基丙烯酸烯丙酯/丙烯酸四氫-2H-吡喃-2-基/甲基丙 烯酸二環戊基/苯乙烯共聚合物、 甲基丙烯酸烯丙酯/甲基丙烯酸四氫_211-吡喃-2_基/甲 基丙烯酸二環戊基/苯乙烯共聚合物、 甲基丙烯酸烯丙酯/丙烯酸四氫- 2H -吡喃-2-基/N -苯基 馬來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸烯丙酯/甲基丙烯酸四氫-2H-吡喃-2-基/N-苯基馬來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸烯丙酯/丙烯酸四氫- 2H-吡喃-2-基/N-環己 基馬來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸烯丙酯/甲基丙烯酸四氫-2H -吡喃-2-基/N-環己基馬來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸烯丙酯/丙烯酸1-(環己基氧基)乙基/甲基 丙烯酸二環戊基/苯乙烯共聚合物、 甲基丙烯酸烯丙酯/甲基丙烯酸1-(環己基氧基)乙基/ 甲基丙烯酸二環戊基/苯乙烯共聚合物、 甲基丙烯酸烯丙酯/丙烯酸1-(環己基氧基)乙基/N -環 己基馬來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸烯丙酯/甲基丙烯酸1_(環己基氧基)乙基 /N-環己基馬來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸烯丙酯/2,3-二(四氫吡喃-2 -基氧羰基)-5-降冰片烯/甲基丙烯酸二環戊基/苯乙烯共聚合物、 甲基丙烯酸烯丙酯/2,3-二(四氫吡喃-2-基氧羰基)-5-降冰片烯/N-環己基馬來醯亞胺/苯乙烯共聚合物、 -33- 200905264 甲基丙烯酸烯丙酯/丙烯酸四氫-2 Η-吡喃-2-基/甲基丙 烯酸二環戊基/1,3 -丁二烯共聚合物、 甲基丙烯酸烯丙酯/甲基丙烯酸四氫-2H-吡喃-2-基/甲 基丙烯酸二環戊基/1,3-丁二烯共聚合物、 甲基丙烯酸烯丙酯/丙烯酸四氫-2H-吡喃-2-基/甲基丙 烯酸甲酯/苯乙烯共聚合物、 甲基丙烯酸烯丙酯/甲基丙烯酸四氫-2H-吡喃-2-基/甲 基丙烯酸甲酯/苯乙烯共聚合物、 甲基丙烯酸烯丙酯/丙烯酸四氫- 2H -吡喃-2-基/丙烯酸 環己基/p-甲氧基苯乙烯共聚合物、 甲基丙烯酸烯丙酯/甲基丙烯酸四氫-2H-吡喃-2-基/丙 烯酸環己基/p-甲氧基苯乙烯共聚合物、 甲基丙烯酸烯丙酯/甲基丙烯酸t-丁基/N·苯基馬來醯 亞胺/苯乙烯共聚合物、 甲基丙烯酸烯丙酯/甲基丙烯酸t-丁基/N-環己基馬來 醯亞胺/苯乙烯共聚合物、 甲基丙烯酸燒丙酯/丙嫌酸1-(環己基氧基)乙基/甲基 丙烯酸二環戊基/苯乙烯/1,3-丁二烯共聚合物、 甲基丙烯酸烯丙酯/甲基丙烯酸1-(環己基氧基)乙基/ 甲基丙烯酸二環戊基/苯乙烯/1,3 -丁二烯共聚合物 甲基丙烯酸烯丙酯/卜乙基環戊基丙烯酸酯/N_苯基馬 來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸烯丙酯/卜乙基環己基丙烯酸酯/N_苯基馬 來醯亞胺/苯乙烯共聚合物、 -34- 200905264 甲基丙烯酸烯丙酯/1-乙基環戊基丙烯酸酯/N-苯基馬 來醯亞胺/苯乙烯/甲基丙烯酸共聚合物、 甲基丙烯酸烯丙酯/1-乙基環戊基丙烯酸酯/甲基丙烯 酸二環戊基/苯乙烯共聚合物、 甲基丙烯酸烯丙酯/1-乙基環己基丙烯酸酯/甲基丙烯 酸二環戊基/苯乙烯共聚合物、 等。 該些共聚合物(A 2-1)中,更佳者爲, 甲基丙烯酸縮水甘油酯/丙烯酸四氫-2H-吡喃-2-基/甲 基丙烯酸二環戊基/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/甲基丙烯酸四氫-2H-吡喃-2-基/甲基丙烯酸二環戊基/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/丙烯酸四氫-2H-吡喃-2-基/N-苯基馬來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/甲基丙烯酸四氫-2 Η -吡喃· 2 -基/Ν-苯基馬來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/丙烯酸四氫- 2Η -吡喃-2-基/Ν-環己基馬來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/甲基丙烯酸四氫- 2Η-吡喃-2-基/Ν-環己基馬來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/丙烯酸1-(環己基氧基)乙基 /Ν-環己基馬來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/甲基丙烯酸1-(環己基氧基)乙 基/Ν-環己基馬來醯亞胺/苯乙烯共聚合物、 -35- 200905264 甲基丙烯酸縮水甘油酯/2,3 -二(四氫吡喃-2 -基氧羰基 )-5-降冰片烯/甲基丙烯酸二環戊基/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/2,3-二(四氫吡喃-2-基氧羰基 )-5-降冰片烯/N-環己基馬來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/甲基丙烯酸t-丁基/N-環己基 馬來醯亞胺/苯乙烯共聚合物 甲基丙烯酸縮水甘油酯/1-乙基環戊基丙烯酸酯/N-苯 基馬來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/1-乙基環己基丙烯酸酯/N-苯 基馬來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/1-乙基環戊基丙烯酸酯/N-苯 基馬來醯亞胺/苯乙烯/甲基丙烯酸共聚合物、 甲基丙烯酸縮水甘油酯/1-乙基環戊基甲基丙烯酸酯 /N-苯基馬來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/1-乙基環己基甲基丙烯酸酯 /N-苯基馬來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/1-乙基環戊基甲基丙烯酸酯 /N-苯基馬來醯亞胺/苯乙烯/甲基丙烯酸共聚合物、 3-乙基_3-(甲基)丙烯醯氧甲基氧雜環丁烷/丙烯酸四 氫-2H-吡喃-2-基/甲基丙烯酸二環戊基/苯乙烯共聚合物、 3 -乙基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸四氫-2H -卩比喃-2-基/甲基丙嫌酸一戊基/本乙稀共聚合 物、 3 -乙基- 3- (甲基)丙烯醯氧甲基氧雜環丁烷/丙烯酸四 -36- 200905264 氯- 2H -卩比喃-2-基/N -苯基馬來釀亞胺/苯乙輝共聚合物、 3 -乙基- 3- (甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸四氨_211-啦喃-2-基/N -苯基馬來酿亞女/本乙稀共聚合物 3 -乙基- 3- (甲基)丙烯醯氧甲基氧雜環丁烷/丙烯酸四 氫-2H-吡喃-2-基/N-環己基馬來醯亞胺/苯乙烯共聚合物、 3-乙基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸四氫-2H-吡喃-2-基/N-環己基馬來醯亞胺/苯乙烯共聚合 物、 3 -乙基- 3- (甲基)丙烯醯氧甲基氧雜環丁院/丙烯酸1-( 環己基氧基)乙基/N-環己基馬來醯亞胺/苯乙烯共聚合物、 3-乙基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸1-(環己基氧基)乙基/N -環己基馬來醯亞胺/苯乙烯共聚 合物、 3 -乙基- 3- (甲基)丙烯醯氧甲基氧雜環丁烷/2,3-二(四 氫吡喃-2-基氧羰基)-5-降冰片烯/甲基丙烯酸二環戊基/苯 乙烯共聚合物、 3-乙基- 3- (甲基)丙烯醯氧甲基氧雜環丁烷/2,3-二(四 氫吡喃-2-基氧羰基)-5-降冰片烯/N-環己基馬來醯亞胺/苯 乙烯共聚合物、 3 -乙基- 3- (甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸t-丁基/N-環己基馬來醯亞胺/苯乙烯共聚合物 3-乙基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/1-乙基環 戊基丙烯酸酯/N-苯基馬來醯亞胺/苯乙烯共聚合物、 -37- 200905264 3-乙基-3-(甲基)丙烯醯氧甲基氧雜環丁烷n_乙基環 己基丙烯酸酯/N-苯基馬來醯亞胺/苯乙烯共聚合物、 3-乙基-3-(甲基)丙烯醯氧甲基氧雜環丁烷n_乙基環 戊基丙烯酸酯/N-苯基馬來醯亞胺/苯乙烯/甲基丙烯酸共聚 合物、 3_乙基-3_(甲基)丙烯醯氧甲基氧雜環丁烷/〗_乙基環 戊基甲基丙烯酸酯/N-苯基馬來醯亞胺/苯乙烯共聚合物、 3-乙基-3-(甲基)丙烯醯氧甲基氧雜環丁烷乙基環 己基甲基丙烯酸酯/N-苯基馬來醯亞胺/苯乙烯共聚合物、 3-乙基-3-(甲基)丙烯醯氧甲基氧雜環丁烷/1_乙基環 戊基甲基丙烯酸酯/N-苯基馬來醯亞胺/苯乙烯/甲基丙烯酸 共聚合物、 3 -甲基- 3- (甲基)丙烯醯氧甲基氧雜環丁烷/丙烯酸四 氫-2H-吡喃-2-基/甲基丙烯酸二環戊基/苯乙烯共聚合物、 3 -甲基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸四氫-2H-吡喃-2-基/甲基丙烯酸二環戊基/苯乙烯共聚合 物、 3 -甲基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/丙烯酸四 氫-2H-吡喃-2-基/N-苯基馬來醯亞胺/苯乙烯共聚合物、 3-甲基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸四氫-2H-吡喃-2-基/N-苯基馬來醯亞胺/苯乙烯共聚合物 3 -甲基- 3- (甲基)丙烯醯氧甲基氧雜環丁烷/丙烯酸四 氫-2H-吡喃-2-基/N-環己基馬來醯亞胺/苯乙烯共聚合物' -38- 200905264 3-甲基-3-(甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸四氫-2H-吡喃-2-基/N-環己基馬來醯亞胺/苯乙烯共聚合 物、 3 -甲基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/丙烯酸1-( 環己基氧基)乙基/N-環己基馬來醯亞胺/苯乙烯共聚合物、 3-甲基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸1-(環己基氧基)乙基/N-環己基馬來醯亞胺/苯乙烯共聚 合物、 3-甲基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/2,3-二(四 氫吡喃-2-基氧羰基)-5-降冰片烯/甲基丙烯酸二環戊基/苯 乙烯共聚合物、 3-甲基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/2,3-二(四 氫吡喃-2 _基氧羰基)-5 -降冰片烯/N -環己基馬來醯亞胺/苯 乙烯共聚合物、 3 -甲基- 3- (甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸t-丁基/N_環己基馬來醯亞胺/苯乙烯共聚合物 3-甲基-3-(甲基)丙烯醯氧甲基氧雜環丁烷Π-乙基環 戊基丙烯酸酯/N-苯基馬來醯亞胺/苯乙烯共聚合物' 3-甲基-3-(甲基)丙烯醯氧甲基氧雜環丁烷/1-乙基環 己基丙烯酸酯/N-苯基馬來醯亞胺/苯乙烯共聚合物、 3-甲基-3-(甲基)丙烯醯氧甲基氧雜環丁烷Π-乙基環 戊基丙烯酸酯/N-苯基馬來醯亞胺/苯乙烯/甲基丙烯酸共聚 合物、 3 -甲基-3·(甲基)丙烯醯氧甲基氧雜環丁烷乙基環 -39- 200905264 戊基甲基丙烯酸酯/N-苯基馬來醯亞胺/苯乙烯共聚合物、 3 -甲基- 3- (甲基)丙烯醯氧甲基氧雜環丁烷/1·乙基環 己基甲基丙烯酸酯/N-苯基馬來醯亞胺/苯乙烯共聚合物、 3-甲基-3-(甲基)丙烯醯氧甲基氧雜環丁烷Π-乙基環 戊基甲基丙烯酸酯/N-苯基馬來醯亞胺/苯乙烯/甲基丙烯酸 共聚合物、 甲基丙烯酸烯丙酯/丙烯酸四氫-2H-吡喃-2-基/甲基丙 烯酸二環戊基/苯乙烯共聚合物、 甲基丙烯酸烯丙酯/甲基丙烯酸四氫-2H-吡喃-2-基/甲 基丙烯酸二環戊基/苯乙烯共聚合物、 甲基丙烯酸烯丙酯/丙烯酸四氫-2H-吡喃-2-基/N-苯基 馬來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸烯丙酯/甲基丙烯酸四氫-2H-吡喃-2-基/N-苯基馬來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸烯丙酯/丙烯酸四氫-2H-吡喃-2-基/N-環己 基馬來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸烯丙酯/甲基丙烯酸四氫-2H-吡喃-2-基/N-環己基馬來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸烯丙酯/丙烯酸1-(環己基氧基)乙基/N-環 己基馬來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸烯丙酯/甲基丙烯酸1-(環己基氧基)乙基 /N-環己基馬來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸烯丙酯/2,3-二(四氫吡喃-2-基氧羰基)-5-降冰片烯/甲基丙烯酸二環戊基/苯乙烯共聚合物、 -40- 200905264 甲基丙烯酸烯丙酯/2,3-二(四氫吡喃-2-基氧羰基)-5-降冰片烯/N-環己基馬來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸烯丙酯/甲基丙烯酸t_ 丁基/N-環己基馬來 醯亞胺/苯乙烯共聚合物、 甲基丙烯酸烯丙酯/1-乙基環戊基丙烯酸酯/N-苯基馬 來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸烯丙酯/1-乙基環己基丙烯酸酯/N-苯基馬 來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸烯丙酯/1-乙基環戊基丙烯酸酯/N-苯基馬 來醯亞胺/苯乙烯/甲基丙烯酸共聚合物、 甲基丙烯酸烯丙酯/1-乙基環戊基甲基丙烯酸酯/N-苯 基馬來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸烯丙酯/1-乙基環己基甲基丙烯酸酯/N-苯 基馬來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸烯丙酯/1-乙基環戊基甲基丙烯酸酯/N-苯 基馬來醯亞胺/苯乙烯/甲基丙烯酸共聚合物、 等。 共聚合物(A2-1)中,不飽和化合物(a)所生成之重複單 位之含有率,相對於全體重複單位,較佳爲1 〇~7〇重量% ,更佳爲20〜60重量%。不飽和化合物(a)所生成之重複單 位之含有率未達1 〇重量%時,保護膜之耐熱性或表面硬度 會有降低之傾向,又超過70重量%時,組成物之保存安定 性會有降低之傾向。 又,不飽和化合物(b3)所生成之重複單位之含有率’ -41 - 200905264 較佳爲5〜6 0重量% ’更佳爲1 〇 ~ 5 〇重量%。不飽和化合物 (b3)所生成之重複單位之含有率於此範圍内時’可實現保 護膜之良好耐熱性及表面硬度。 又,不飽和化合物(b4)所生成之重複單位之含有率’ 爲不飽和化合物(a)及不飽和化合物(b3)所生成之重複單位 之合計含有率由100重量%所減去之量’使用不飽和化合 物(b4)之不飽和羧酸或不飽和多元羧酸酐之情形時’其所 生成之重複單位之合計含有率超過40重量%時’因會有損 及組成物之保存安定性之疑慮’故以不超過該値爲佳。 其次,共聚合物(A 3 )中,不飽和化合物(b 5 )例如’上 述不飽和化合物(b2)中所例示之化合物爲相同之化合物等 〇 該些不飽和化合物(b5)中,以甲基丙烯酸甲酯、丙烯 酸環己酯、甲基丙烯酸二環戊基、丙烯酸2_甲基環己酯、 N -苯基馬來醯亞胺、N -環己基馬來醯亞胺、苯乙烯、P -甲 氧基苯乙烯、1,3 -丁二烯等爲佳。該些較佳之不飽和化合 物(b5),爲具有高共聚合反應性,且可有效提高所得保護 膜之耐熱性(但,1,3 - 丁二烯之情形除外)或表面硬度(但’ 1,3-丁二烯之情形除外)。 上述不飽和化合物(b 5 ),可單獨或將2種以上混合使 用。 共聚合物(A3)之較佳具體例如, 丙烯酸縮水甘油酯/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/苯乙烯共聚合物、 -42 - 200905264 丙烯酸縮水甘油酯/甲基丙烯酸二環戊基共聚合物、 甲基丙烯酸縮水甘油酯/甲基丙烯酸二環戊基共聚合 物、 甲基丙烯酸6,7-環氧戊酯/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/甲基丙烯酸二環戊基/苯乙稀 共聚合物、 甲基丙烯酸縮水甘油酯/N -苯基馬來醯亞胺/苯乙烯共 聚合物、 甲基丙烯酸縮水甘油酯/N-環己基馬來醯亞胺/苯乙嫌 共聚合物、甲基丙烯酸6,7·環氧戊酯/甲基丙烯酸二環戊基 共聚合物、 甲基丙烯酸6,7-環氧戊酯/N-環己基馬來醯亞胺/苯乙 烯共聚合物、 3 -甲基- 3- (甲基)丙烯醯氧甲基氧雜環丁烷/苯乙烯共 聚合物、 3 -乙基- 3- (甲基)丙烯醯氧甲基氧雜環丁烷/苯乙烯共 聚合物、 甲基丙烯酸烯丙酯/苯乙烯共聚合物、 3 -甲基- 3- (甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙稀 酸二環戊基共聚合物、 3 -乙基- 3- (甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙嫌 酸二環戊基共聚合物、 甲基丙烯酸烯丙酯/甲基丙烯酸二環戊基共聚合物、 3-甲基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙嫌 -43 - 200905264 酸二環戊基/苯乙烯共聚合物、 3-乙基-3-(甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸二環戊基/苯乙烯共聚合物、 甲基丙烯酸烯丙酯/甲基丙烯酸二環戊基/苯乙烯共聚 合物、 3 -甲基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/N-苯基馬 來醯亞胺/苯乙烯共聚合物、 3-乙基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/N-苯基馬 來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸烯丙酯/N -苯基馬來醯亞胺/苯乙烯共聚合 物、 3-甲基_3_(甲基)丙烯醯氧甲基氧雜環丁烷/N_環己基 馬來醯亞胺/苯乙烯共聚合物、甲基丙烯酸縮水甘油酯/N-環己基馬來醯亞胺/苯乙烯共聚合物、 甲基丙烯酸烯丙酯/N-環己基馬來醯亞胺/苯乙烯共聚 合物、 等。 該些共聚合物(A3)中,更佳者爲, 甲基丙烯酸縮水甘油酯/苯乙烯共聚合物、 甲基丙烯酸縮水甘油酯/甲基丙烯酸二環戊基共聚合 物、 甲基丙烯酸縮水甘油酯/甲基丙烯酸二環戊基/苯乙烯 共聚合物、甲基丙烯酸縮水甘油酯/N_環己基馬來醯亞胺/ 苯乙烯共聚合物、 -44- 200905264 3-甲基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/苯乙烯共 聚合物、 3 -甲基- 3- (甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸二環戊基共聚合物、 3-甲基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸二環戊基/苯乙烯共聚合物、3 -甲基- 3- (甲基)丙烯醯氧 甲基氧雜環丁烷/N-環己基馬來醯亞胺/苯乙烯共聚合物 3-乙基- 3-(甲基)丙烯醯氧甲基氧雜環丁烷/苯乙烯共 聚合物、 3 -乙基- 3- (甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸二環戊基共聚合物、 3 -乙基- 3- (甲基)丙烯醯氧甲基氧雜環丁烷/甲基丙烯 酸二環戊基/苯乙烯共聚合物、3 -乙基·3·(甲基)丙烯醯氧 甲基氧雜環丁烷/Ν -環己基馬來醯亞胺/苯乙烯共聚合物 甲基丙烯酸烯丙酯/苯乙烯共聚合物、 甲基丙烯酸烯丙酯/甲基丙烯酸二環戊基共聚合物、 甲基丙烯酸烯丙酯/甲基丙烯酸二環戊基/苯乙烯共聚 合物、甲基丙烯酸烯丙酯/Ν -環己基馬來醯亞胺/苯乙烯共 聚合物 等。 共聚合物(A3)中,不飽和化合物(a)所生成之重複單 位之含有率,相對於全體重複單位,較佳爲1〜9 0重量%, 更佳爲40~90重量%。 不飽和化合物(a)所生成之重複單位之含有率未達 -45- 200905264 量%時,保護膜之耐熱性或表面硬度會有降低之傾向’又 超過9 0重量%時,耐熱性或組成物之保存安定性會有降低 之傾向。 共聚合物[A],於使用凝膠滲透色層分析法(溶出溶 劑:四氫呋喃)所測定之聚苯乙嫌換算重量平均分子量( 以下,亦稱爲「MW」)時,較佳爲1,000〜100,000,更佳爲 2,000~50,000,最佳爲 3,000~40,000。Mw 未達 1,000時,組 成物之塗佈性將不充分,或所形成之保護膜之耐熱性會有 不足之情形,又Mw超過1 00,000時,平坦化性能會有不 充分之情形。 此外,共聚合物[A]之分子量分布(Mw/Mn),較佳爲 5.0以下,更佳爲3.0以下。 該些共聚合物,於共聚合物[A]時,可將上述聚合性 不飽和化合物(a)、及(bl)~(b5)使用適當之溶劑及適當之 聚合起始劑的存在下,以公知之方法,例如自由基聚合之 方式予以合成。 [B]成分 本發明所使用之[B]成分,爲具有可與前述[A]成分進 行熱交聯反應之官能基的矽氧烷低聚物,較佳爲分別以下 述式(1)及下述式(2)表示之烷氧基矽烷經共水解而予以製 造。 SUR1)丨(R2)m(〇R3)n -46- 200905264 其中’ R1爲含有氧雜環丙烷基、氧雜環丁烷基、袠硫 基 '乙烯基、烯丙基、(甲基)丙烯醯基、羧基、羥基、氮 硫基、異氰酸酯基、胺基、脲基或苯乙烯基之取代基,r2 、R3爲相同或相異’分別表示氫原子或丨價之有機基,1、 II分別爲1〜3之整數’ m爲〇〜2之整數。但,l + m + n = 4。 SUR4)x(OR5)4.x (2) 其中’ R 、R5爲相同或相異,分別表示1價之有機基 ,X爲0〜3之整數。 上述水解物/’係指原料中可水解之部分的全部可水解 者’及其一部份水解且—部份未水解而殘存者等,皆包含 於其中。 含有氧雜丙院基之化合物(1)的具體例如,3 -環氧 丙氧基甲基二甲氧基矽烷、3_環氧丙氧基甲基三乙氧基矽 烷、3-環氧丙氧基甲基三_n_丙氧基矽烷、3_環氧丙氧基甲 基三-i-丙氧基砂院、3-環氧丙氧基甲基三乙醯氧基矽烷、 3-環氧丙氧基甲基甲基二甲氧基矽烷、3_環氧丙氧基甲基 甲基二乙氧基5夕燒、3_環氧丙氧基甲基甲基二-n_丙氧基 砂院、3_環氧丙氧基甲基甲基二小丙氧基矽烷、3_環氧丙 氧基甲基甲基一乙酶氧基矽烷、3_環氧丙氧基甲基乙基二 甲氧基砂丨兀、3_環氧丙氧基甲基乙基二乙氧基矽烷、3_環 氧丙氧基甲基乙基二-n_丙氧基矽烷、3_環氧丙氧基甲基 -47- 200905264 乙基二-i-丙氧基矽烷、3-環氧丙氧基甲基乙基二乙醯氧基 矽烷、3-環氧丙氧基甲基苯基二甲氧基矽烷、3-環氧丙氧 基甲基苯基二乙氧基矽烷、3-環氧丙氧基甲基苯基二-n_ 丙氧基矽烷、3-環氧丙氧基甲基苯基二-i-丙氧基矽烷、3-環氧丙氧基甲基苯基二乙醯氧基矽烷、3-環氧丙氧基乙基 三甲氧基矽烷、3-環氧丙氧基乙基三乙氧基矽烷、3-環氧 丙氧基乙基三-η-丙氧基矽烷、3-環氧丙氧基乙基三-i-丙 氧基矽烷、3 -環氧丙氧基乙基三乙醯氧基矽烷、3 -環氧丙 氧基乙基甲基二甲氧基矽烷、3-環氧丙氧基乙基甲基二乙 氧基矽烷、3-環氧丙氧基乙基甲基二-η-丙氧基矽烷、3-環 氧丙氧基乙基甲基二-i-丙氧基矽烷、3-環氧丙氧基乙基甲 基二乙醯氧基矽烷、3-環氧丙氧基乙基乙基二甲氧基矽烷 、3-環氧丙氧基乙基乙基二乙氧基矽烷、3-環氧丙氧基乙 基乙基二-η-丙氧基矽烷、3-環氧丙氧基乙基乙基二-i-丙 氧基矽烷、3 -環氧丙氧基乙基乙基二乙醯氧基矽烷、3 -環 氧丙氧基乙基苯基二甲氧基矽烷、3-環氧丙氧基乙基苯基 二乙氧基砂垸、3 -環氧丙氧基乙基苯基一-η -丙氧基砂院 、3 -環氧丙氧基乙基苯基二-i-丙氧基矽烷、3 -環氧丙氧基 乙基苯基二乙醯氧基矽烷、3 -環氧丙氧基丙基三甲氧基矽 烷、3 -環氧丙氧基丙基三乙氧基矽烷、3 -環氧丙氧基丙基 三-η-丙氧基矽烷、3-環氧丙氧基丙基三丙氧基矽烷、 3-環氧丙氧基丙基三乙醯氧基矽烷、3-環氧丙氧基丙基甲 基二甲氧基矽烷、3-環氧丙氧基丙基甲基二乙氧基矽烷、 3-環氧丙氧基丙基甲基二·η-丙氧基矽烷、3-環氧丙氧基丙 -48- 200905264 基甲基二-i-丙氧基矽烷、3-環氧丙氧基丙基甲基二乙釀氧 基砂垸、3·環氧丙氧基丙基乙基二甲氧基砂院' 3_環氧丙 氧基丙基乙基二乙氧基矽烷、3_環氧丙氧基丙基乙基一_ η-丙氧基矽烷、3-環氧丙氧基丙基乙基一 _1_丙氧基砂丨兀、 3-環氧丙氧基丙基乙基二乙醯氧基砂院、3_環氧丙氧基丙 基苯基二甲氧基矽烷、3 -環氧丙氧基丙基苯基一乙氧基砂 烷、3-環氧丙氧基丙基苯基二_η-丙氧基矽烷、3-環氧丙氧 基丙基苯基二-i-丙氧基矽烷、3_環氧丙氧基丙基苯基一乙 醯氧基矽烷、2-(3,4-環氧基環己基)甲基三甲氧基砂垸、 2-(3,4-環氧基環己基)甲基三乙氧基矽烷、2-(3,4_環氧基 環己基)甲基三-η-丙氧基矽烷、2-(3,4-環氧基環己基)甲基 三乙醯氧基矽烷、2-(3,4 -環氧基環己基)甲基甲基二甲氧 基Ϊ夕院、2-(3,4 -環氧基環己基)甲基甲基一乙氧基砂丨兀、 2-(3,4-環氧基環己基)甲基甲基二-η-丙氧基矽烷、2-(3,4- 環氧基環己基)甲基甲基二乙醯氧基矽烷、2·(3,4_環氧基 環己基)甲基乙基二甲氧基矽烷、2_(3,4_環氧基環己基)甲 基乙基二乙氧基矽烷、2-(3,4-環氧基環己基)甲基乙基二-n -丙氧基砂院、2-(3,4 -環氣基環己基)甲基乙基_乙酸氧 基矽烷、2-(3,4·環氧基環己基)甲基苯基二甲氧基矽烷、 2-(3,4-環氧基環己基)甲基苯基二乙氧基矽烷、2-(3,4-環 氧基環己基)甲基苯基二-η-丙氧基矽烷、2-(3,4-環氧基環 己基)甲基苯基二乙醯氧基矽烷' 2-(3,4-環氧基環己基)乙 基三甲氧基矽烷、2-(3,4-環氧基環己基)乙基三乙氧基矽 烷、2-(3,4-環氧基環己基)乙基三-η-丙氧基矽烷、2-(3,4- -49- 200905264 環氧基環己基)乙基三乙醯氧基矽烷、2-(3,4-環氧基環己 基)乙基甲基二甲氧基矽烷、2-(3,4-環氧基環己基)乙基甲 基二乙氧基矽烷、2-(3,4-環氧基環己基)乙基甲基二-η-丙 氧基矽烷、2-(3,4-環氧基環己基)乙基甲基二乙醯氧基矽 烷、2-(3,4-環氧基環己基)乙基乙基二甲氧基矽烷、2-(3,4-環氧基環己基)乙基乙基二乙氧基矽烷、2-(3,4-環氧 基環己基)乙基乙基二-η-丙氧基矽烷、2_(3,4_環氧基環己 基)乙基乙基二乙醯氧基矽烷、2-(3,4-環氧基環己基)乙基 苯基二甲氧基矽烷、2-(3,4-環氧基環己基)乙基苯基二乙 氧基矽烷、2-(3,4-環氧基環己基)乙基苯基二-η-丙氧基矽 烷、2-(3,4-環氧基環己基)乙基苯基二乙醯氧基矽烷、2-(3,4-環氧基環己基)丙基三甲氧基矽烷、2-(3,4-環氧基環 己基)丙基三乙氧基矽烷、2-(3,4-環氧基環己基)丙基三- n-丙氧基矽烷、2-(3,4-環氧基環己基)丙基三乙醯氧基矽烷 、2-(3,4-環氧基環己基)丙基甲基二甲氧基矽烷、2-(3,4-環氧基環己基)丙基甲基二乙氧基矽烷、2-(3,4-環氧基環 己基)丙基甲基二-η-丙氧基矽烷、2-(3,4-環氧基環己基)丙 基甲基二乙醯氧基矽烷、2-(3,4-環氧基環己基)丙基乙基 二甲氧基矽烷、2-(3,4-環氧基環己基)丙基乙基二乙氧基 矽烷、2-(3,4-環氧基環己基)丙基乙基二-η-丙氧基矽烷、 2-(3,4-環氧基環己基)丙基乙基二乙醯氧基矽烷、2-(3,4-環氧基環己基)丙基苯基二甲氧基矽烷、2-(3,4-環氧基環 己基)丙基苯基二乙氧基矽烷、2-(3,4-環氧基環己基)丙基 苯基二-η-丙氧基矽烷、2-(3,4-環氧基環己基)丙基苯基二 -50- 200905264 乙醯氧基矽烷等; 含有表硫基之化合物(1)的具體例如,2,3_表硫基丙氧 基甲基三甲氧基矽烷、2,3 -表硫基丙氧基甲基三乙氧基矽 院、2,3-表硫基丙氧基甲基三-n-丙氧基矽烷、2,3_表硫基 丙氧基甲基三-i-丙氧基矽烷、2,3-表硫基丙氧基甲基三乙 酸氧基砂院、2,3 -表硫基丙氧基甲基甲基二甲氧基矽院、 2,3-表硫基丙氧基甲基甲基二乙氧基矽烷、2,3_表硫基丙 氧基甲基甲基二_n_丙氧基矽烷、2,3_表硫基丙氧基甲基甲 基二-i-丙氧基矽烷、2,3_表硫基丙氧基甲基甲基二乙醯氧 基矽烷、2,3-表硫基丙氧基曱基乙基二甲氧基矽烷、2,3_ 硫基丙黑基甲基乙基二乙氧基砂院' 2,3•表硫基丙氧基 〜 11丙氧基矽;c兀、2,3 -表硫基丙氧基甲基乙基 =丙氧基㈣、2,3_表硫基丙氧基甲基乙基:乙釀氧基 k、2,3 -表硫基丙氧基 一 ^ _ 〒基本基—甲虱基矽烷、2,3-表 硫基丙氧基甲基苯基二乙氧基㈣、2 甚贫甘一 表硫基丙氧基甲 垂本基一 -η-丙氧基矽烷' 丙氧…、2 3*基丙:表硫基丙氧基甲基苯基二小 ,3表硫基丙氧基甲基苯 、2,3-表硫基丙氧 一乙醯氧基矽k 内氧基乙基二甲氧基矽烷、23w 一 基乙基三乙氧基矽烷、2 ,表硫基丙虱 ,-表硫基丙氧基乙I— _ 矽烷、2,3-表硫基丙 乙基二-η-丙氧基 基丙氧基乙基三乙燒' 2,3·表硫 基一甲氧基矽烷、23-表 内氧基乙基甲 _ ,表硫基丙氧基乙基甲其〜 — 烷、2,3-表硫基丙氧基乙基甲 _ _ 〜乙氧基矽 硫基丙氧基乙基甲基— ~ 氧基矽烷、2,3-表 垂中基一_ι·丙氧基矽烷、2 表硫基丙氧基 -51 - 200905264 乙基甲基二乙醒氧權、2,3_表硫基丙氧基乙基乙基二 甲氧基矽烷、2,3-表硫基丙氧基乙基乙基二乙氧基矽烷、 21表硫基丙氧基乙基乙基二η·丙氧㈣垸、2,3_表硫基 丙氧基乙基乙基二小丙氧基矽烷、2,3_表硫基丙氧基乙基 乙基二乙醯氧基砂院、2,3_袠硫基丙氧基乙基苯基二甲氧 基砂院、2,3-表硫基丙氧基乙基苯基二乙氧基砂院、2,3_ 表硫基丙氧基乙基苯基氧基㈣、表硫基丙氧 基乙基苯基丙氧基Μ、2,3表硫基丙氧基乙基苯基 〜乙醯氧基砂院、2,3-表硫基丙氧基丙基三甲氧基砂院、 表硫基丙氧基丙基三乙氧基㈣、2,3_表硫基丙氧基 基三.丙氧㈣垸、2,3_表硫基丙氧基丙基三小丙氧基 砂燒、2,3_表硫基丙氧基丙基三乙醯氧基”、&表硫 ^丙氧基丙基甲基:甲氧基㈣、2,3表硫基丙氧基丙基 基二乙氧基砂院、2,3-表硫基丙氧基丙基甲基二_η_丙氧 基矽烷、2,3-表硫基丙氧基丙基甲基二小丙氧基矽烷、 2,3-表硫基丙氧基丙基甲基二乙醯氧基矽烷、表硫基 ^氧基丙基乙基:甲氧基2,3•表硫基丙氧基縣乙 〜乙氧基矽烷、2,3-表硫基丙氧基丙基乙基二-矽烷、2,3-表硫基丙氧基丙基乙基二小丙氧基矽产23 ^ =基丙基乙基二乙醯氧基砂一表:基丙氧 本一甲氧基矽烷、2,3-表硫基丙氧基丙基苯基二 乙氧基砂院、2,3-表硫基丙氧基丙基苯基二_η,氧織 ^表硫基丙氧基丙基苯基二小丙氧基砂燒、ή硫 赛柯氧基丙基苯基二乙醯氧基矽烷等; -52- 200905264 含有氧雜環丁烷基之化合物u)之具體例如’(氧雜環 丁烷-3-基)甲基三甲氧基矽烷、(氧雜環丁烷_3·基)甲基三 乙氧基矽烷、(氧雜環丁烷-3-基)甲基三-n _丙氧基矽烷、( 氧雜環丁烷-3-基)甲基三-i-丙氧基矽烷、(氧雜環丁烷- 3-基)甲基三乙醯氧基矽烷、(氧雜環丁烷-3-基)甲基甲基二 甲氧基矽烷、(氧雜環丁烷-3-基)甲基甲基二乙氧基矽烷、 (氧雜環丁烷-3-基)甲基甲基二- η-丙氧基矽烷、(氧雜環丁 烷-3 -基)甲基甲基二-i-丙氧基矽烷、(氧雜環丁烷-3·基)甲 基甲基二乙醯氧基矽烷、(氧雜環丁烷-3_基)甲基乙基二甲 氧基矽烷、(氧雜環丁烷-3 -基)甲基乙基二乙氧基矽烷、( 氧雜環丁烷-3-基)甲基乙基二-η-丙氧基矽烷、(氧雜環丁 烷-3-基)甲基乙基二-i-丙氧基矽烷、(氧雜環丁烷_3-基)甲 基乙基二乙醯氧基矽烷、(氧雜環丁烷_3_基)甲基苯基二甲 氧基矽烷、(氧雜環丁烷-3 -基)甲基苯基二乙氧基矽烷、( 氧雜環丁烷-3-基)甲基苯基二-η-丙氧基矽烷、(氧雜環丁 烷-3-基)甲基苯基二-i-丙氧基矽烷、(氧雜環丁烷-3-基)甲 基苯基二乙醯氧基矽烷 '(氧雜環丁烷-3-基)乙基三甲氧基 矽烷、(氧雜環丁烷-3 -基)乙基三乙氧基矽烷、(氧雜環丁 烷-3-基)乙基三-η-丙氧基矽烷、(氧雜環丁烷-3-基)乙基 三-i-丙氧基矽烷、(氧雜環丁烷-3-基)乙基三乙醯氧基矽 烷、(氧雜環丁烷-3-基)乙基甲基二甲氧基矽烷、(氧雜環 丁烷-3-基)乙基甲基二乙氧基矽烷、(氧雜環丁烷-3-基)乙 基甲基二- η-丙氧基矽烷、(氧雜環丁烷-3-基)乙基甲基二-i-丙氧基矽烷、(氧雜環丁烷-3-基)乙基甲基二乙醯氧基矽 -53- 200905264 烷、(氧雜環丁烷-3-基)乙基乙基二甲氧基矽烷、(氧雜環 丁烷-3-基)乙基乙基二乙氧基矽烷、(氧雜環丁烷-3-基)乙 基乙基二-η-丙氧基矽烷、(氧雜環丁烷-3-基)乙基乙基二-i-丙氧基矽烷、(氧雜環丁烷-3-基)乙基乙基二乙醯氧基矽 烷、(氧雜環丁烷_3_基)乙基苯基二甲氧基矽烷、(氧雜環 丁烷-3-基)乙基苯基二乙氧基矽烷、(氧雜環丁烷-3-基)乙 基苯基二- η-丙氧基砂院、(氧雜環丁院-3-基)乙基苯基一· i-丙氧基矽烷、(氧雜環丁烷-3-基)乙基苯基二乙醯氧基矽 烷、(氧雜環丁烷-3-基)丙基三甲氧基矽烷、(氧雜環丁烷_ 3-基)丙基三乙氧基矽烷、(氧雜環丁烷-3-基)丙基三-η-丙 氧基矽烷、(氧雜環丁烷-3-基)丙基三-i-丙氧基矽烷、(氧 雜環丁烷-3-基)丙基三乙醯氧基矽烷、(氧雜環丁烷-3-基) 丙基甲基二甲氧基矽烷、(氧雜環丁烷-3-基)丙基甲基二乙 氧基矽烷、(氧雜環丁烷-3-基)丙基甲基二-η-丙氧基矽院 、(氧雜環丁烷-3 -基)丙基甲基二-i-丙氧基矽烷、(氧雜環 丁烷-3-基)丙基甲基二乙醯氧基矽烷、(氧雜環丁烷-3-基) 丙基乙基二甲氧基矽烷、(氧雜環丁烷-3-基)丙基乙基二乙 氧基矽烷、(氧雜環丁烷-3-基)丙基乙基二-η-丙氧基矽院 、(氧雜環丁烷-3-基)丙基乙基二-i-丙氧基矽烷、(氧雜環 丁烷-3-基)丙基乙基二乙醯氧基矽烷、(氧雜環丁烷_3_基) 丙基苯基二甲氧基矽烷、(氧雜環丁烷-3-基)丙基苯基二乙 氧基矽烷、(氧雜環丁烷-3-基)丙基苯基二_n-丙氧基砂院 、(氧雜環丁烷-3-基)丙基苯基二-i-丙氧基矽烷、(氧雜環 丁烷-3-基)丙基苯基二乙醯氧基矽烷、(3 -甲基氧雜環丁 -54- 200905264 烷-3-基)甲基三甲氧基矽烷、(3_甲基氧雜環丁烷-3_基)甲 基三乙氧基砂焼、(3-甲基氧雜環丁烷-3-基)甲基三-n_丙 氧基矽烷、(3-甲基氧雜環丁烷_3_基)甲基三_i_丙氧基矽烷 、(3 -甲基氧雜環丁烷_3_基)甲基三乙醯氧基矽烷、(3_甲 基氧雜環丁烷-3-基)甲基甲基二甲氧基矽烷、(3_甲基氧雜 環丁烷-3-基)甲基甲基二乙氧基矽烷、(3 _甲基氧雜環丁 烷-3-基)甲基甲基二-n-丙氧基矽烷、(3 _甲基氧雜環丁烷_ 3 -基)甲基甲基二-i-丙氧基矽烷、(3 -甲基氧雜環丁烷-3-基 )甲基甲基二乙醯氧基矽烷、(3_甲基氧雜環丁烷_3_基)甲 基乙基二甲氧基矽烷、(3 -甲基氧雜環丁烷-3 -基)甲基乙基 二乙氧基矽烷、(3 -甲基氧雜環丁烷-3 -基)甲基乙基二-n-丙氧基矽烷、(3 -甲基氧雜環丁烷-3-基)甲基乙基二·ί_丙氧 基矽烷、(3-甲基氧雜環丁烷-3-基)甲基乙基二乙醯氧基矽 院、(3 -甲基氧雜環丁院-3-基)甲基苯基二甲氧基砂院' (3 -甲基氧雜環丁烷-3-基)甲基苯基二乙氧基矽烷、(3_甲 基氧雜環丁烷-3-基)甲基苯基二_n_丙氧基矽烷、(3_甲基 氧雜環丁烷-3-基)甲基苯基二-i-丙氧基矽烷、(3 -甲基氧雜 環丁院-3 -基)甲基苯基二乙酿氧基砂院、(3 -甲基氧雜環丁 烷-3-基)乙基三甲氧基矽烷、(3 -甲基氧雜環丁烷-3-基)乙 基三乙氧基矽烷、(3_甲基氧雜環丁烷-3 -基)乙基三-n-丙 氧基矽烷、(3 -甲基氧雜環丁烷-3-基)乙基三-i_丙氧基矽烷 、(3 -甲基氧雜環丁烷-3 -基)乙基三乙醯氧基矽烷、(3·甲 基氧雜環丁烷-3-基)乙基甲基二甲氧基矽烷、(3-甲基氧雜 環丁烷-3·基)乙基甲基二乙氧基矽烷、(3 -甲基氧雜環丁 -55- 200905264 烷-3-基)乙基甲基二-η-丙氧基矽烷、(3-甲基氧雜環丁烷-3 -基)乙基甲基二-卜丙氧基砂院、(3_甲基氧雜環丁垸-3_基 )乙基甲基二乙醯氧基砂院、(3 -甲基氧雜環丁院·3 -基)乙 基乙基二甲氧基矽烷、甲基氧雜環丁烷-3-基)乙基乙基 二乙氧基矽烷、(3-甲基氧雜環丁烷-3-基)乙基乙基二-η-丙氧基矽烷、(3-甲基氧雜環丁烷-3-基)乙基乙基二-i-丙氧 基矽烷、(3-甲基氧雜環丁烷-3-基)乙基乙基二乙醯氧基矽 烷、(3 -甲基氧雜環丁烷-3-基)乙基苯基二甲氧基矽烷、 (3-甲基氧雜環丁烷-3-基)乙基苯基二乙氧基矽烷、(3-甲 基氧雑環丁烷-3-基)乙基苯基二- η-丙氧基矽烷、(3-甲基 氧雜環丁烷-3-基)乙基苯基二-i-丙氧基矽烷、(3-甲基氧雜 環丁烷基)乙基苯基二乙醯氧基矽烷、(3-甲基氧雜環丁 烷-3-基)丙基三甲氧基矽烷、(3 -甲基氧雜環丁烷-3-基)丙 基三乙氧基砂焼、(3 -甲基氧雜環丁院-3-基)丙基三-η -丙 氧基矽烷、(3 -甲基氧雜環丁烷-3 -基)丙基三小丙氧基矽烷 、(3 -甲基氣雜環丁院-3-基)丙基二乙酸氧基砂焼、(3 -甲 基氧雜環丁烷-3 -基)丙基甲基二甲氧基矽烷、(3_甲基氧雜 環丁烷-3-基)丙基甲基二乙氧基矽烷、(3 _甲基氧雜環丁 烷-3 -基)丙基甲基二-n_丙氧基矽烷、(3_甲基氧雜環丁烷_ 3 -基)丙基甲基二-i-丙氧基矽烷、(3_甲基氧雜環丁烷_3_基 )丙基甲基二乙醯氧基矽烷、(3 -甲基氧雜環丁烷-3-基)丙 基乙基二甲氧基矽烷、(3 -甲基氧雜環丁烷-3_基)丙基乙基 二乙氧基矽烷、(3-甲基氧雜環丁烷-3_基)丙基乙基二-n-丙氧基矽烷、(3-甲基氧雜環丁烷·3-基)丙基乙基二_i_丙氧 -56- 200905264 基矽烷、(3-甲基氧雜環丁烷-3-基)丙基乙基二乙醯氧基矽 烷、(3-甲基氧雜環丁烷_3_基)丙基苯基二甲氧基矽烷、 (3-甲基氧雜環丁烷-3-基)丙基苯基二乙氧基矽烷、(3-甲 基氧雜環丁院-3 -基)丙基苯基二- η-丙氧基矽烷、(3 -甲基 氧雜環丁烷-3-基)丙基苯基二-i-丙氧基矽烷、(3-甲基氧雜 環丁烷-3·基)丙基苯基二乙醯氧基矽烷、(3-乙基氧雜環丁 烷-3-基)甲基三甲氧基矽烷、(3-乙基氧雜環丁烷-3-基)甲 基三乙氧基矽烷、(3-乙基氧雜環丁烷-3-基)甲基三-η-丙 氧基矽烷、(3-乙基氧雜環丁烷-3-基)甲基三-i-丙氧基矽烷 、(3-乙基氧雜環丁烷-3-基)甲基三乙醯氧基矽烷、(3-乙 基氧雜環丁烷-3-基)甲基甲基二甲氧基矽烷、(3 -乙基氧雜 環丁烷-3-基)甲基甲基二乙氧基矽烷、(3 -乙基氧雜環丁 烷-3-基)甲基甲基二-η-丙氧基矽烷、(3-乙基氧雜環丁烷-3 -基)甲基甲基二-i-丙氧基矽烷、(3 -乙基氧雜環丁烷-3-基 )甲基甲基二乙醯氧基矽烷、(3 -乙基氧雜環丁烷-3-基)甲 基乙基二甲氧基砂院、(3 -乙基氧雜環丁院基)甲基乙基 二乙氧基矽烷、(3-乙基氧雜環丁烷-3-基)甲基乙基二-n-丙氧基矽烷、(3-乙基氧雜環丁烷-3-基)甲基乙基二-i_丙氧 基矽烷、(3-乙基氧雜環丁烷-3-基)甲基乙基二乙醯氧基矽 烷、(3 -乙基氧雜環丁烷-3-基)甲基苯基二甲氧基矽烷、 (3-乙基氧雜環丁烷-3-基)甲基苯基二乙氧基矽烷、(3·乙 基氧雜環丁烷-3-基)甲基苯基二- η-丙氧基矽烷、(3 -乙基 氧雜環丁烷-3-基)甲基苯基二-i-丙氧基矽烷、(3_乙基氧雜 環丁烷-3-基)甲基苯基二乙醯氧基矽烷、(3·乙基氧雜環丁 -57- 200905264 烷-3 -基)乙基三甲氧基矽烷、(3 -乙基氧雜環丁烷-3-基)乙 基三乙氧基矽烷、(3 -乙基氧雜環丁烷-3-基)乙基三-η -丙 氧基矽烷、(3 -乙基氧雜環丁烷-3-基)乙基三-i-丙氧基矽烷 、(3_乙基氧雜環丁烷-3-基)乙基三乙醯氧基矽烷、〇 -乙 基氧雜環丁烷-3-基)乙基甲基二甲氧基矽烷、(3-乙基氧雜 環丁烷-3-基)乙基甲基二乙氧基矽烷、(3-乙基氧雜環丁 烷-3-基)乙基甲基二-η-丙氧基矽烷、(3-乙基氧雜環丁烷-3 -基)乙基甲基二-i-丙氧基砂院、(3 -乙基氧雜環丁院-3-基 )乙基甲基二乙釀氧基砂院、(3 -乙基氧雜ϊ哀丁院-3-基)乙 基乙基—甲氧基砂院、(3 -乙基氧雑環丁院-3 -基)乙基乙基 二乙氧基砂院、(3 -乙基氧雜環丁院-3 -基)乙基乙基一 -n-丙氧基矽烷、(3-乙基氧雜環丁烷-3-基)乙基乙基二-i-丙氧 基矽烷、(3 -乙基氧雜環丁烷-3 -基)乙基乙基二乙醯氧基矽 烷、(3 -乙基氧雜環丁烷-3 -基)乙基苯基二甲氧基矽烷、 (3-乙基氧雜環丁烷-3·基)乙基苯基二乙氧基矽烷、(3-乙 基氧雜環丁烷-3-基)乙基苯基二- η-丙氧基矽烷、(3-乙基 氧雜環丁烷-3-基)乙基苯基二-i-丙氧基矽烷、(3-乙基氧雜 環丁烷-3-基)乙基苯基二乙醯氧基矽烷、(3-乙基氧雜環丁 烷-3-基)丙基三甲氧基矽烷、(3-乙基氧雜環丁烷-3-基)丙 基三乙氧基矽烷、(3-乙基氧雜環丁烷-3-基)丙基三-η-丙 氧基矽烷、(3-乙基氧雜環丁烷-3-基)丙基三-i-丙氧基矽烷 、(3-乙基氧雜環丁烷-3-基)丙基三乙醯氧基矽烷、(3-乙 基氧雜環丁烷-3-基)丙基甲基二甲氧基矽烷、(3-乙基氧雜 環丁烷-3_基)丙基甲基二乙氧基矽烷、(3-乙基氧雜環丁 -58- 200905264 烷-3-基)丙基甲基二-η·丙氧基矽烷、(3_乙基氧雜環丁烷-3-基)丙基甲基二-i-丙氧基矽烷、(3-乙基氧雜環丁烷-3-基 )丙基甲基二乙醯氧基矽烷、(3-乙基氧雜環丁烷-3-基)丙 基乙基二甲氧基矽烷' (3-乙基氧雜環丁烷-3-基)丙基乙基 二乙氧基矽烷、(3 -乙基氧雜環丁烷-3-基)丙基乙基二-n-丙氧基矽烷、(3-乙基氧雜環丁烷-3-基)丙基乙基二-i-丙氧 基矽烷、(3-乙基氧雜環丁烷-3-基)丙基乙基二乙醯氧基矽 烷、(3-乙基氧雜環丁烷-3-基)丙基苯基二甲氧基矽烷、 (3-乙基氧雜環丁烷-3-基)丙基苯基二乙氧基矽烷、(3-乙 基氧雜環丁院-3 -基)丙基苯基一 _n_丙氧基砂院、(3 -乙基 氧雜環丁烷-3-基)丙基苯基二-i_丙氧基矽烷、(3-乙基氧雜 環丁烷-3-基)丙基苯基二乙醯氧基矽烷等; 含有乙烯基之化合物(1)之具體例如’乙烯基三甲氧 基矽烷、乙烯基三乙氧基矽烷、乙烯基三-η-丙氧基矽烷 、乙烯基三-i -丙氧基矽烷、乙儲基三乙醯氧基矽烷、乙燦 基三(甲氧基乙氧基)砂院、乙稀基甲基二甲氧基砍院、乙 烯基甲基二乙氧基矽烷、乙烯基甲基二丙氧基矽烷、 乙烯基甲基二-i-丙氧基砂院、乙稀基甲基二乙醯氧基砂院 、乙烯基乙基二甲氧基矽院、乙稀基乙基二乙氧基砂院、 乙烯基乙基二-η -丙氧基矽院、乙烧基乙基二-丨-丙氧基砍 烷、乙烯基乙基二乙醯氧基砍院、乙嫌基乙基二(甲氧基 乙氧基)矽烷、乙烯基苯基二甲氧基砂院、乙烯基苯基二 乙氧基矽烷、乙烯基苯基二-η·丙氧基砂院、乙稀基苯基 二-i-丙氧基矽烷、乙烯基苯基二乙釀氧基砂院、乙嫌基苯 -59- 200905264 基二(甲氧基乙氧基)矽烷等; 含有烯丙基之化合物(1)之具體例如’烯丙基三甲氧 基矽烷、烯丙基三乙氧基矽烷、烯丙基三-η-丙氧基矽烷 、烯丙基三-i-丙氧基矽烷、烯丙基三乙醯氧基矽烷、烯丙 基三(甲氧基乙氧基)矽烷、烯丙基甲基二甲氧基矽烷、烯 丙基甲基二乙氧基矽烷、烯丙基甲基二-η-丙氧基矽烷、 烯丙基甲基二-i-丙氧基矽烷、烯丙基甲基二乙醯氧基矽烷 、烯丙基乙基二甲氧基矽烷、烯丙基乙基二乙氧基矽烷、 烯丙基乙基二- η-丙氧基矽烷、烯丙基乙基二-i-丙氧基矽 烷、烯丙基乙基二乙醯氧基矽烷、烯丙基乙基二(甲氧基 乙氧基)矽烷、烯丙基苯基二甲氧基矽烷、烯丙基苯基二 乙氧基矽烷、烯丙基苯基二-η-丙氧基矽烷、烯丙基苯基 二-i-丙氧基矽烷、烯丙基苯基二乙醯氧基矽烷、烯丙基苯 基二(甲氧基乙氧基)矽烷等; 含有(甲基)丙烯醯基之化合物(1)之具體例如,3-(甲 基)丙燃醯基甲基三甲氧基砂院、3-(甲基)丙燃醯基甲基三 乙氧基矽烷、3-(甲基)丙烯醯基甲基三-n_丙氧基矽烷、3_ (甲基)丙烯醯基甲基三-i-丙氧基矽烷、3-(甲基)丙烯醯基 甲基三乙醯氧基矽烷、3-(甲基)丙烯醯基甲基甲基二甲氧 基矽烷、3-(甲基)丙烯醯基甲基甲基二乙氧基矽烷、3-(甲 基)丙烯醯基甲基甲基二-η-丙氧基矽烷、3-(甲基)丙烯醯 基甲基甲基二-i-丙氧基矽烷、3-(甲基)丙烯醯基甲基甲基 二乙醯氧基矽烷、3-(甲基)丙烯醯基甲基乙基二甲氧基矽 烷、3-(甲基)丙烯醯基甲基乙基二乙氧基矽烷、3-(甲基) -60- 200905264 丙烯醯基甲基乙基二-η-丙氧基矽烷、3-(甲基)丙烯醯基甲 基乙基二-i -丙氧基砍院、3-(甲基)丙嫌酿基甲基乙基二乙 醯氧基矽烷' 3-(甲基)丙烯醯基甲基苯基二甲氧基矽烷、 3-(甲基)丙烯醯基甲基苯基二乙氧基矽烷、3-(甲基)丙烯 醯基甲基苯基二-η-丙氧基矽烷、3-(甲基)丙烯醯基甲基苯 基一 -i-丙氧基砂院、3-(甲基)丙稀醯基甲基苯基二乙醯氧 基矽烷、3-(甲基)丙烯醯基乙基三甲氧基矽烷、3-(甲基) 丙烦酿基乙基二乙氧基砂院、3-(甲基)丙嫌醯基乙基三- n-丙氧基矽烷、3-(甲基)丙烯醯基乙基三-i-丙氧基矽烷、3-( 甲基)丙烯醯基乙基三乙醯氧基矽烷' 3-(甲基)丙烯醯基乙 基甲基二甲氧基矽烷、3-(甲基)丙烯醯基乙基甲基二乙氧 基石夕院、3-(甲基)丙嫌醯基乙基甲基二·η-丙氧基砂院、3-(甲基)丙烯醯基乙基甲基二-i-丙氧基矽烷、3-(甲基)丙烯 醯基乙基甲基二乙醯氧基矽烷、3-(甲基)丙烯醯基乙基乙 基二甲氧基矽烷、3-(甲基)丙烯醯基乙基乙基二乙氧基矽 烷、3-(甲基)丙烯醯基乙基乙基二-n -丙氧基矽烷、3-(甲 基)丙稀酿基乙基乙基二-i -丙氧基砂院、3-(甲基)丙稀醯 基乙基乙基二乙醯氧基矽烷、3-(甲基)丙烯醯基乙基苯基 二甲氧基矽烷、3-(甲基)丙烯醯基乙基苯基二乙氧基矽烷 、3-(甲基)丙烯醯基乙基苯基二-n_丙氧基矽烷、3_(甲基) 丙烯醯基乙基苯基二-i-丙氧基矽烷、3-(甲基)丙烯醯基乙 基苯基二乙醯氧基矽烷、3-(甲基)丙烯醯基丙基三甲氧基 矽烷、3-(甲基)丙烯醯基丙基三乙氧基矽烷、3_(甲基)丙 烯醯基丙基三- η-丙氧基矽烷、3-(甲基)丙烯醯基丙基三- i- -61 - 200905264 丙氧基矽烷、3-(甲基)丙烯醯基丙基三乙醯氧基矽烷、3_( 甲基)丙烯醯基丙基甲基二甲氧基矽烷、3-(甲基)丙烯醯基 丙基甲基二乙氧基矽烷、3-(甲基)丙烯醯基丙基甲基二-n-丙氧基矽烷、3-(甲基)丙烯醯基丙基甲基二_i_丙氧基矽烷 、3-(甲基)丙烯醯基丙基甲基二乙醯氧基矽烷、3_(甲基) 丙烯醯基丙基乙基二甲氧基矽烷、3-(甲基)丙烯醯基丙基 乙基二乙氧基矽烷、3-(甲基)丙烯醯基丙基乙基二-n-丙氧 基矽烷、3-(甲基)丙烯醯基丙基乙基二-i-丙氧基矽烷,3-( 甲基)丙烯醯基丙基乙基二乙醯氧基矽烷、3-(甲基)丙烯醯 基丙基苯基二甲氧基矽烷、3-(甲基)丙烯醯基丙基苯基二 乙氧基矽烷、3-(甲基)丙烯醯基丙基苯基二-η-丙氧基矽烷 、3-(甲基)丙烯醯基丙基苯基二-i-丙氧基矽烷、3-(甲基) 丙烯醯基丙基苯基二乙醯氧基矽烷等; 含有羧基之化合物(1)之具體例如,羧基甲基三甲氧 基矽烷、羧基甲基三乙氧基矽烷、羧基甲基三-η -丙氧基 矽烷、羧基甲基三-i-丙氧基矽烷、羧基甲基三乙醯氧基矽 烷、羧基甲基三(甲氧基乙氧基)矽烷、羧基甲基甲基二甲 氧基矽烷、羧基甲基甲基二乙氧基矽烷、羧基甲基甲基 二-η-丙氧基矽烷、羧基甲基甲基二-i_丙氧基矽烷、羧基 甲基甲基二乙醯氧基矽烷、羧基甲基乙基二甲氧基矽烷、 羧基甲基乙基二乙氧基矽烷、羧基甲基乙基二-η-丙氧基 矽烷、羧基甲基乙基二-i-丙氧基矽烷、羧基甲基乙基二乙 醯氧基矽烷、羧基甲基乙基二(甲氧基乙氧基)矽烷、羧基 甲基苯基二甲氧基矽烷、羧基甲基苯基二乙氧基矽烷 '羧 -62- 200905264 基甲基苯基二-η-丙氧基矽烷、羧基甲基苯基二-i-丙氧基 矽烷、羧基甲基苯基二乙醯氧基矽烷、羧基甲基苯基二( 甲氧基乙氧基)矽烷、2-羧基乙基三甲氧基矽烷、2-羧基 乙基三乙氧基矽烷、2-羧基乙基三-η-丙氧基矽烷、2-羧基 乙基三-i-丙氧基矽烷、2-羧基乙基三乙醯氧基矽烷、2-羧 基乙基三(甲氧基乙氧基)矽烷、2 -羧基乙基甲基二甲氧基 矽烷、2-羧基乙基甲基二乙氧基矽烷、2-羧基乙基甲基 二-η-丙氧基矽烷、2-羧基乙基甲基二-i-丙氧基矽烷、2-羧基乙基甲基二乙醯氧基矽烷、2 -羧基乙基乙基二甲氧基 矽烷、2-羧基乙基乙基二乙氧基矽烷、2-羧基乙基乙基 二-η-丙氧基矽烷、2-羧基乙基乙基二-i-丙氧基矽烷、2-羧基乙基乙基二乙醯氧基矽烷、2 -羧基乙基乙基二(甲氧 基乙氧基)砂院、2 -殘基乙基本基„甲氧基砂院、2 -殘基 乙基苯基二乙氧基矽烷、2·羧基乙基苯基二-η-丙氧基矽 烷、2-羧基乙基苯基二-i-丙氧基矽烷、2-羧基乙基苯基二 乙釀氧基砂院、2 -竣基乙基苯基_(甲氧基乙氧基)砍院% » 含有羥基之化合物(1)之具體例如,羥基甲基三甲氧 基矽烷、羥基甲基三乙氧基矽烷、羥基甲基三-η-丙氧基 矽烷、羥基甲基三-i-丙氧基矽烷、羥基甲基三乙醯氧基矽 烷、羥基甲基三(甲氧基乙氧基)矽烷、羥基甲基甲基二甲 氧基矽烷、羥基甲基甲基二乙氧基矽烷、羥基甲基甲基 二-η-丙氧基矽烷、羥基甲基甲基二-i-丙氧基矽烷、羥基 甲基甲基二乙醯氧基矽烷、羥基甲基乙基二甲氧基矽烷、 -63- 200905264 羥基甲基乙基二乙氧基矽烷、羥基甲基乙基二-η-丙氧基 矽烷、羥基甲基乙基二-i-丙氧基矽烷、羥基甲基乙基二乙 醯氧基矽烷、羥基甲基乙基二(甲氧基乙氧基)矽烷、羥基 甲基苯基二甲氧基矽烷、羥基甲基苯基二乙氧基矽烷、羥 基甲基苯基二-η-丙氧基矽烷、羥基甲基苯基二-i-丙氧基 矽烷、羥基甲基苯基二乙醯氧基矽烷、羥基甲基苯基二( 甲氧基乙氧基)矽烷、2-羥乙酯三甲氧基矽烷、2-羥乙酯 三乙氧基矽烷、2-羥乙酯三- η-丙氧基矽烷、2-羥乙酯三-i-丙氧基矽烷、2-羥乙酯三乙醯氧基矽烷、2-羥乙酯三(甲 氧基乙氧基)矽烷、2-羥乙酯甲基二甲氧基矽烷、2-羥乙 酯甲基二乙氧基矽烷、2-羥乙酯甲基二-η-丙氧基矽烷、2-羥乙酯甲基二-i-丙氧基矽烷、2-羥乙酯甲基二乙醯氧基矽 烷、2-羥乙酯乙基二甲氧基矽烷、2-羥乙酯乙基二乙氧基 矽烷、2-羥乙酯乙基二-η-丙氧基矽烷、2-羥乙酯乙基二-i-丙氧基矽烷、2-羥乙酯乙基二乙醯氧基矽烷、2-羥乙酯 乙基二(甲氧基乙氧基)矽烷、2-羥乙酯苯基二甲氧基矽烷 、2-羥乙酯苯基二乙氧基矽烷、2-羥乙酯苯基二-η-丙氧基 矽烷、2-羥乙酯苯基二-i-丙氧基矽烷、2-羥乙酯苯基二乙 醯氧基矽烷、2-羥乙酯苯基二(甲氧基乙氧基)矽烷、3-羥 丙酯三甲氧基矽烷、3 -羥丙酯三乙氧基矽烷、3 -羥丙酯 三-n_丙氧基矽烷、3-羥丙酯三-i-丙氧基矽烷、3-羥丙酯 三乙醯氧基矽烷、3 -羥丙酯三(甲氧基乙氧基)矽烷、3 -羥 丙酯甲基二甲氧基矽烷、3-羥丙酯甲基二乙氧基矽烷、3-羥丙酯甲基二-η-丙氧基矽烷、3-羥丙酯甲基二-i-丙氧基 -64 - 200905264 矽烷、3-羥丙酯甲基二乙醯氧基矽烷、3-羥丙酯乙基二甲 氧基矽烷、3 -羥丙酯乙基二乙氧基矽烷、3 -羥丙酯乙基 二- η-丙氧基矽烷、3-羥丙酯乙基二-i-丙氧基矽烷、3-羥 丙酯乙基二乙醯氧基矽烷、3 -羥丙酯乙基二(甲氧基乙氧 基)矽烷、3-羥丙酯苯基二甲氧基矽烷、3 -羥丙酯苯基二 乙氧基矽烷、3-羥丙酯苯基二-η-丙氧基矽烷、3-羥丙酯苯 基二-i-丙氧基矽烷、3-羥丙酯苯基二乙醯氧基矽烷、3-羥 丙酯苯基二(甲氧基乙氧基)矽烷、4-羥基- (p-羥基苯基羰 基氧基)苄基三甲氧基矽烷、4-羥基-(p-羥基苯基羰基氧基 )苄基三乙氧基矽烷、4-羥基-(p-羥基苯基羰基氧基)苄基 三- η-丙氧基矽烷、4-羥基-(p-羥基苯基羰基氧基)苄基三-i-丙氧基矽烷、4-羥基-(ρ-羥基苯基羰基氧基)苄基三乙醯 氧基矽烷、4-羥基- (p-羥基苯基羰基氧基)苄基三(甲氧基 乙氧基)矽烷、4-羥基-(ρ-羥基苯基羰基氧基)苄基甲基二 甲氧基矽烷、4-羥基-(ρ-羥基苯基羰基氧基)苄基甲基二乙 氧基矽烷、4-羥基-(ρ-羥基苯基羰基氧基)苄基甲基二-n-丙氧基矽烷、4-羥基-(ρ-羥基苯基羰基氧基)苄基甲基二-i-丙氧基矽烷、4-羥基-(ρ-羥基苯基羰基氧基)苄基甲基二乙 酿氣基砂院、4 -經基- (ρ -經基本基鑛基氧基)卞基乙基一甲 氧基矽烷、4-羥基-(ρ-羥基苯基羰基氧基)苄基乙基二乙氧 基矽烷、4-羥基-(ρ-羥基苯基羰基氧基)苄基乙基二-η-丙 氧基砂垸、4 -經基- (ρ -經基苯基撰基氧基)节基乙基_-i -丙 氧基Ϊ夕垸、4 -經基- (ρ -經基苯基簾基氧基)节基乙基_•乙釀 氧基矽烷、4-羥基-(ρ-羥基苯基羰基氧基)苄基乙基二(甲 -65- 200905264 氧基乙氧基)砍院、4 -徑基- (p -經基苯基鑛基氧基)节基苯 基二甲氧基矽烷、4-羥基-(p-羥基苯基羰基氧基)苄基苯基 二乙氧基矽烷、4-羥基-(p-羥基苯基羰基氧基)苄基苯基 二-η -丙氧基砂院、4_經基-(ρ -淫基苯基碳基氧基)节基苯 基二-i-丙氧基矽烷、4-羥基-(Ρ-羥基苯基羰基氧基)苄基苯 基二乙醯氧基矽烷、4-羥基-〇)-羥基苯基羰基氧基)苄基苯 基二(甲氧基乙氧基)矽烷等; 含有氫硫基之化合物(1)之具體例如’氫硫基甲基三 甲氧基矽烷、氫硫基甲基三乙氧基矽烷、氫硫基甲基三-n-丙氧基矽烷、氫硫基甲基三丙氧基矽烷、氫硫基甲基 三乙醯氧基矽烷、氫硫基甲基三(甲氧基乙氧基)矽烷、氫 硫基甲基甲基二甲氧基矽烷、氫硫基甲基甲基二乙氧基矽 烷、氫硫基甲基甲基二-η-丙氧基矽烷、氫硫基甲基甲基 二-i-丙氧基矽烷、氫硫基甲基甲基二乙醯氧基矽烷、氫硫 基甲基乙基二甲氧基矽烷、氫硫基甲基乙基二乙氧基矽烷 、氫硫基甲基乙基二-η-丙氧基矽烷、氫硫基甲基乙基二-i-丙氧基矽烷、氫硫基甲基乙基二乙醯氧基矽烷、氫硫基 甲基乙基二(甲氧基乙氧基)矽烷、氫硫基甲基苯基二甲氧 基石夕院、氯硫基甲基苯基一乙氧基砂院、氮硫基甲基苯基 二-η-丙氧基矽烷、氫硫基甲基苯基二-i-丙氧基矽烷、氫 硫基甲基苯基二乙醯氧基矽烷、氫硫基甲基苯基二(甲氧 基乙氧基)矽烷、2-氫硫基乙基三甲氧基矽烷、2-氫硫基 乙基三乙氧基矽烷、2·氫硫基乙基三-η-丙氧基矽烷、2-氫 硫基乙基三-i_丙氧基矽烷、2-氫硫基乙基三乙醯氧基矽烷 -66- 200905264 、2-氫硫基乙基三(甲氧基乙氧基)矽烷、2-氫硫基乙基甲 基二甲氧基矽烷、2-氫硫基乙基甲基二乙氧基矽烷、2_氫 硫基乙基甲基二-η-丙氧基矽烷、2-氫硫基乙基甲基二-i-丙氧基矽烷、2-氫硫基乙基甲基二乙醯氧基矽烷、2-氫硫 基乙基乙基二甲氧基矽烷、2-氫硫基乙基乙基二乙氧基矽 烷、2-氫硫基乙基乙基二-η-丙氧基矽烷、2-氫硫基乙基乙 基二-i-丙氧基矽烷、2_氫硫基乙基乙基二乙醯氧基矽烷、 2-氫硫基乙基乙基二(甲氧基乙氧基)矽烷、2-氫硫基乙基 苯基二甲氧基矽烷、2 -氫硫基乙基苯基二乙氧基矽烷、2-氫硫基乙基苯基二-η -丙氧基矽烷、2 -氫硫基乙基苯基二-i-丙氧基矽烷、2-氫硫基乙基苯基二乙醯氧基矽烷、2-氫 硫基乙基苯基二(甲氧基乙氧基)矽烷、3 -氫硫基丙基三甲 氧基矽烷、3 -氫硫基丙基三乙氧基矽烷、3 -氫硫基丙基 三- η-丙氧基矽烷、3 -氫硫基丙基三-i-丙氧基矽烷、3 -氫 硫基丙基三乙醯氧基矽烷、3_氫硫基丙基三(甲氧基乙氧 基)矽烷、3-氫硫基丙基甲基二甲氧基矽烷、3 -氫硫基丙 基甲基二乙氧基矽烷、3 -氫硫基丙基甲基二-η -丙氧基矽 烷、3 -氫硫基丙基甲基二_i_丙氧基矽烷、3 -氫硫基丙基甲 基二乙醯氧基矽烷、3 -氫硫基丙基乙基二甲氧基矽烷、3-氫硫基丙基乙基二乙氧基矽烷、3-氫硫基丙基乙基二-n-丙氧基矽烷、3-氫硫基丙基乙基二-i-丙氧基矽烷、3-氫硫 基丙基乙基二乙醯氧基矽烷、3 -氫硫基丙基乙基二(甲氧 基乙氧基)矽烷、3 -氫硫基丙基苯基二甲氧基矽烷、3 -氫 硫基丙基苯基二乙氧基砍院' 3 -氫硫基丙基苯基二·η·丙 -67- 200905264 氧基矽烷、3-氫硫基丙基苯基二-i_丙氧基矽烷、3-氫硫基 丙基苯基二乙醯氧基矽烷、3 -氫硫基丙基苯基二(甲氧基 乙氧基)矽烷等; 含有異氰酸酯基之化合物(1)之具體例如,異氰酸醋 甲基三甲氧基矽烷、異氰酸酯甲基三乙氧基矽烷、異氯酸 酯甲基三-η-丙氧基矽烷、異氰酸酯甲基三-i_丙氧基砂院 、異氰酸酯甲基三乙醯氧基矽烷、異氰酸酯甲基三(甲氧 基乙氧基)矽烷、異氰酸酯甲基甲基二甲氧基矽烷 '異氰 酸酯甲基甲基二乙氧基矽烷、異氰酸酯甲基甲基二·η_丙 氧基矽烷、異氰酸酯甲基甲基二-i-丙氧基矽烷、異氰酸酯 甲基甲基二乙醯氧基矽烷、異氰酸酯甲基乙基二甲氧基矽 烷、異氰酸酯甲基乙基二乙氧基矽烷、異氰酸酯甲基乙基 二-η -丙氧基矽烷、異氰酸酯甲基乙基二小丙氧基矽烷、 異氰酸酯甲基乙基二乙醯氧基矽烷、異氰酸酯甲基乙基二 (甲氧基乙氧基)矽烷、異氰酸酯甲基苯基二甲氧基矽烷、 異氰酸酯甲基苯基二乙氧基矽烷、異氰酸酯甲基苯基二_ n -丙氧基矽烷、異氰酸酯甲基苯基二-i-丙氧基矽烷、異氰 酸酯甲基苯基二乙醯氧基矽烷、異氰酸酯甲基苯基二(甲 氧基乙氧基)矽烷、2-異氰酸酯乙基三甲氧基矽烷、2-異 氰酸酯乙基三乙氧基矽烷、2-異氰酸酯乙基三-η-丙氧基 矽烷、2-異氰酸酯乙基三-i-丙氧基矽烷、2·異氰酸酯乙基 三乙醯氧基砍院、2 -異氰酸醋乙基三(甲氧基乙氧基)砂垸 、2 -異氰酸酯乙基甲基二甲氧基矽烷、2 -異氰酸酯乙基甲 基二乙氧基矽烷、2-異氰酸酯乙基甲基二-n_丙氧基矽烷 -68- 200905264 、2-異氰酸酯乙基甲基二-i-丙氧基矽烷、2-異氰酸酯乙基 甲基二乙醯氧基矽烷、2-異氰酸酯乙基乙基二甲氧基矽烷 、2-異氰酸酯乙基乙基二乙氧基矽烷、2-異氰酸酯乙基乙 基二-η-丙氧基矽烷、2_異氰酸酯乙基乙基二-i-丙氧基矽 烷、2-異氰酸酯乙基乙基二乙醯氧基矽烷、2_異氰酸酯乙 基乙基二(甲氧基乙氧基)矽烷、2-異氰酸酯乙基苯基二甲 氧基矽烷、2-異氰酸酯乙基苯基二乙氧基矽烷、2-異氰酸 酯乙基苯基二-η-丙氧基矽烷、2-異氰酸酯乙基苯基二-i_ 丙氧基矽烷、2-異氰酸酯乙基苯基二乙醯氧基矽烷、2-異 氰酸酯乙基苯基二(甲氧基乙氧基)矽烷、3-異氰酸酯丙基 三甲氧基砂院、3 -異氰酸醋丙基二乙氧基砂院、3 -異氰酸 酯丙基三-η-丙氧基矽烷、3-異氰酸酯丙基三-i-丙氧基矽 烷、3-異氰酸酯丙基三乙醯氧基矽烷、3-異氰酸酯丙基三 (甲氧基乙氧基)矽烷、3 -異氰酸酯丙基甲基二甲氧基矽烷 、3 -異氰酸酯丙基甲基二乙氧基矽烷、3 -異氰酸酯丙基甲 基二-η-丙氧基矽烷、3-異氰酸酯丙基甲基二-i-丙氧基矽 烷、3 -異氰酸酯丙基甲基二乙醯氧基矽烷、3 -異氰酸酯丙 基乙基二甲氧基矽烷、3-異氰酸酯丙基乙基二乙氧基矽烷 、3-異氰酸酯丙基乙基二-η-丙氧基矽烷、3-異氰酸酯丙基 乙基二-i-丙氧基矽烷、3-異氰酸酯丙基乙基二乙醯氧基矽 烷、3-異氰酸酯丙基乙基二(甲氧基乙氧基)矽烷、3-異氰 酸酯丙基苯基二甲氧基矽烷、3 -異氰酸酯丙基苯基二乙氧 基矽烷、3-異氰酸酯丙基苯基二-η-丙氧基矽烷、3-異氰酸 酯丙基苯基二-i-丙氧基矽烷、3-異氰酸酯丙基苯基二乙醯 -69- 200905264 氧基砂院、3 -異氰酸醋丙基苯基一(甲氧基乙氧基)砂院等 » 含有胺基之化合物(1)之具體例如’胺基甲基三甲氧 基矽烷、胺基甲基三乙氧基矽烷、胺基甲基三-η -丙氧基 矽烷、胺基甲基三-i-丙氧基矽烷、胺基甲基三乙醯氧基矽 烷、胺基甲基三(甲氧基乙氧基)矽烷、胺基甲基甲基二甲 氧基矽烷、胺基甲基甲基二乙氧基矽烷、胺基甲基甲基 二-η-丙氧基矽烷、胺基甲基甲基二-i-丙氧基矽烷、胺基 甲基甲基二乙醯氧基矽烷、胺基甲基乙基二甲氧基矽烷、 胺基甲基乙基二乙氧基矽烷、胺基甲基乙基二-η-丙氧基 矽烷、胺基甲基乙基二-i-丙氧基矽烷、胺基甲基乙基二乙 醯氧基矽烷、胺基甲基乙基二(甲氧基乙氧基)矽烷、胺基 甲基苯基二甲氧基矽烷、胺基甲基苯基二乙氧基矽烷、胺 基甲基苯基二-η-丙氧基矽烷、胺基甲基苯基二小丙氧基 矽烷、胺基甲基苯基二乙醯氧基矽烷、胺基甲基苯基二( 甲氧基乙氧基)矽烷、2_胺基乙基三甲氧基矽烷、2-胺基 乙基三乙氧基矽烷、2-胺基乙基三-n-丙氧基矽烷、2-胺基 乙基三-i-丙氧基矽烷、2_胺基乙基三乙醯氧基矽烷、2 -胺 基乙基三(甲氧基乙氧基)矽烷、2-胺基乙基甲基二甲氧基 矽烷、2 -胺基乙基甲基二乙氧基矽烷、2 -胺基乙基甲基 二- η-丙氧基矽烷、2 -胺基乙基甲基二-i -丙氧基矽烷、2-胺基乙基甲基二乙醯氧基矽烷、2 -胺基乙基乙基二甲氧基 石夕院、2 -胺基乙基乙基二乙氧基砂院、2 -胺基乙基乙基 二-η -丙氧基矽烷、2 -胺基乙基乙基二-i -丙氧基矽烷、2- -70- 200905264 胺基乙基乙基二乙醯氧基矽烷、2-胺基乙基乙基二(甲氧 基乙氧基)矽烷、2-胺基乙基苯基二甲氧基矽烷、2-胺基 乙基苯基二乙氧基矽烷、2-胺基乙基苯基二-η-丙氧基矽 烷、2-胺基乙基苯基二-i_丙氧基矽烷、2-胺基乙基苯基二 乙醯氧基矽烷、2-胺基乙基苯基二(甲氧基乙氧基)矽烷、 3-胺基丙基三甲氧基矽烷、3-胺基丙基三乙氧基矽烷、3-胺基丙基三-η-丙氧基矽烷、3-胺基丙基三-i-丙氧基矽烷 、3 -胺基丙基三乙醯氧基矽烷、3 -胺基丙基三(甲氧基乙 氧基)矽烷、3-胺基丙基甲基二甲氧基矽烷、3 -胺基丙基 甲基二乙氧基矽烷、3-胺基丙基甲基二- η-丙氧基矽烷、3-胺基丙基甲基二-i_丙氧基矽烷、3_胺基丙基甲基二乙醯氧 基矽烷、3-胺基丙基乙基二甲氧基矽烷、3-胺基丙基乙基 二乙氧基矽烷、3 -胺基丙基乙基二-η -丙氧基矽烷、3 -胺基 丙基乙基二-i-丙氧基矽烷、3-胺基丙基乙基二乙醯氧基矽 烷、3-胺基丙基乙基二(甲氧基乙氧基)矽烷、3-胺基丙基 苯基二甲氧基砂院、3 -胺基丙基苯基一·乙氧基砂焼、3 -月女BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a curable resin composition, a method of forming a protective film from the composition, and a protective film. More specifically, it is a composition suitable for forming a color filter for a liquid crystal display element (LCD) and a color filter for a charge coupled device (CCD), and a method of forming a protective film using the composition And a protective film formed by the composition. [Prior Art] In the manufacturing process, a radiation device such as an LCD or a C CD is usually subjected to immersion treatment using a solvent, an acid or an alkali solution, and the like, and a component of the wiring electrode layer is formed by a sputtering method. The surface is often locally exposed to high temperatures. Therefore, in order to prevent deterioration or damage of the element due to the aforementioned treatment, a protective film formed of a film having resistance is often applied to the surface of the element for the treatment. The protective film is required to have high adhesion to a substrate formed on the protective film or a layer formed on the protective film, and the film itself has smoothness and toughness, transparency, and high heat resistance. It has no deterioration, such as coloring, yellowing, and whitening, and has excellent water resistance, solvent resistance, acid resistance, and alkali resistance. A thermosetting composition containing a polymer having a glycidyl group is known, for example, in order to form a material for a protective film that satisfies the above-mentioned various characteristics (refer to Japanese Laid-Open Patent Publication No. Hei 5-78453 and JP-A No. 2001-91732 200905264 Moreover, when these protective films are used as a protective film for a color filter of a color liquid crystal display device or a charge coupling element, it is generally required to flatten the step caused by the color filter formed on the underlying substrate. Further, in a color liquid crystal display device such as a STN (Super Twisted Nematic) method or a TFT (Thin Film Transister) color liquid crystal display device, in order to uniformly maintain the cell gap of the liquid crystal layer, a granular shift is often employed. The device is spread on the protective film and attached to the panel. Thereafter, the sealing material is sealed by a liquid crystal cell in a hot pressing manner. At this time, the application of the heat and pressure often causes the protective film of the portion of the particles to be concave, so that the cell gap is often troubled. . In particular, when the color liquid crystal display element is manufactured by the STN method, since the color filter and the counter substrate are attached to each other in an extremely high precision state, it is required for the protective film to have a flatness of a very high degree of flatness. Performance and heat and pressure resistance. Further, in recent years, a wiring electrode (indium tin oxide: ITO or indium zinc oxide: IZO) film is formed on a protective film of a color filter by sputtering, and ITO or IZO is patterned by acid or alkali. The way of patterning. Therefore, when the color filter protective film is sputtered, its partial surface is exposed to high temperatures and must be treated with various chemicals. Therefore, at the time of performing these processes, the line width of the ITO or IZO pattern will not be able to achieve the necessary fineness or the like, so that it is highly desirable that a wiring electrode has good pattern formation characteristics, and ITO or IZO will not be treated by the drug. The adhesion of the protective film to the wiring electrode and the like. However, in order to provide the above adhesion, the adhesion promoter will contaminate the inside of the coater by sublimation when the protective film is formed at -6-200905264, which causes problems such as management and washing. However, from the current point of view, it is not limited to the adhesion of additives, but there is a tendency for the material to be outgased. Further, in the conventional adhesion aids, the pattern formation characteristics of the wiring electrodes are not sufficient. In the formation of the protective film, a thermosetting composition having the advantage of being able to form a protective film having excellent hardness in a simple manner can be used, but a protective film resin composition having the above various characteristics can be formed to be strong. Cross-linked reactive cross-linking groups or catalysts, so the composition itself has a problem that the product life is extremely short, so it is extremely difficult to control. In other words, in addition to the deterioration of the coating property itself of the composition, the frequent occurrence of the coating machine, and the necessary operations such as washing are often extremely troublesome. A protective film which can easily satisfy the above various properties in addition to the general requirements required for the protective film such as transparency, and a material which can still have excellent preservation stability as a composition is still unknown. Japanese Patent Laid-Open No. Hei 4-218561 discloses a thermosetting composition containing a latent carboxyl compound for use in paints, inks, adhesives, and molded articles, but for a protective film of a color filter. OBJECTS OF THE INVENTION The present invention has been made in view of the above circumstances, and its object is to provide a substrate having a high degree of flatness even when a substrate having low flatness on a surface is provided. The cured film has high transparency and high surface hardness, and has excellent resistance to heat and pressure resistance, acid resistance, alkali resistance, and splash resistance. In addition, it is suitable for use in forming a good pattern. A protective film for an optical device that supports a wiring electrode, and a lower amount of sublimation material when forming a protective film, and is excellent as a composition. Storage stability of the composition, using the method of forming the protective film of the composition described above, and the protective film formed of the composition described above. Other objects and advantages of the invention will be apparent from the description. The first object of the present invention is to provide a curable resin composition for a protective film for a color filter, characterized in that [A] contains an oxirane group or an oxetane group. a polymer of a polymerizable unsaturated compound having at least one functional group selected from the group consisting of allyl groups, and [B] a functional group-containing oxirane which can be crosslinked by heat with [A] component The way of oligomers is achieved. The above object and advantages of the present invention, and a second method for forming a protective film for a color filter, are characterized in that a coating film is formed by using the curable resin composition, and secondarily, it is heated. The above object and advantages of the present invention, and a third, a protective film for a color filter, are characterized in that the curable resin composition is formed. Hereinafter, each component of the resin composition of the present invention will be described. [A] Copolymer 200905264 The [A] copolymer of the present invention contains at least one functional group selected from the group consisting of an oxiranyl group, an oxetane group and an allyl group. A repeating unit of a copolymer obtained from a polymerizable unsaturated compound. The [A] copolymer is not particularly limited as long as it satisfies the above conditions, and may be any of an addition polymer, a polyaddition polymer, and a polycondensation polymer. In the present invention, a preferred [A] polymer, for example, (Al) (a) has at least one functional group selected from the group consisting of an oxiranyl group, an oxetanyl group and an allyl group. a polymerizable unsaturated compound (hereinafter also referred to as "unsaturated compound (a)"), and (bl) a polymerizable unsaturated carboxylic acid and/or a polymerizable unsaturated polycarboxylic acid anhydride (hereinafter, collectively referred to as "unsaturated" Compound (b 1)") and (b 2 ) unsaturated unsaturated compound (a) and unsaturated compound (b 1) (hereinafter referred to as "unsaturated compound (b 2)") The obtained copolymer (hereinafter referred to as "copolymer (A1)"); (A2) contains two or more oxiranyl groups, oxetanyl groups and allyl groups in the molecule. At least one functional group selected in the group is grouped with a acetal structure of a carboxylic acid, a ketal ester structure of a carboxylic acid, an i-alkylcycloalkanoate structure of a carboxylic acid, and a carboxylic acid structure. a polymer of at least one of the selected structures (hereinafter referred to as "polymer (A2)"); (A3) unsaturated compound (a)' (b5) a copolymer of a polymerizable unsaturated compound other than the unsaturated compound (a) (hereinafter also referred to as "unsaturated compound (b 5)"), and a lactic acid structure containing no acid acid in the molecule, The structure of the ketal ester of residual acid, the structure of the residual acid, and the structure of the phenolic acid ester and the t--9-200905264 of the butyl ester structure (hereinafter, also referred to as "copolymer" A3)") and so on. Further, the polymer (A2) contains (A2-1) an unsaturated compound (a), and (b3) contains a acetal ester structure of a carboxylic acid, a ketal ester structure of a carboxylic acid, and an alkylcycloalkane of a carboxylic acid. a polymerizable unsaturated compound having at least one structure selected from the group consisting of an ester structure and a t-butyl ester structure of a carboxylic acid (hereinafter also referred to as "unsaturated compound (b3)"), and (b4) unsaturated a copolymer obtained from a polymerizable unsaturated compound other than the compound (a) and the unsaturated compound (b3) (hereinafter also referred to as "unsaturated compound (b4)") (hereinafter, also referred to as "copolymer (A) 2 - 1 )") is better. Further, the copolymer (A1) may further contain a acetal structure of a carboxylic acid, a ketal ester structure of a carboxylic acid, a 1-alkylcycloalkane structure of a carboxylic acid, a t-butyl ester structure of a carboxylic acid, and a polymer. (A2) may further contain a carboxyl group or a carboxylic anhydride group. In the copolymer (A1), the polymer (A2) and the copolymer (A3), the unsaturated compound (a) is, for example, 'glycidyl (meth)acrylate, glycidyl α-ethyl acrylate, α-η - glycidyl propyl acrylate, glycidyl α - η -butyl acrylate, 3,4-butyl butyl (meth) acrylate, 3,4-butyl butyl α-ethyl acrylate, (methyl Acetyl 6,7-epoxypentyl acrylate, α-ethyl acrylate 6,7-epoxypentyl ester, 〇-vinylbenzyl glycidyl ether, m-vinylbenzyl glycidyl ether, P-vinyl benzyl Glycidyl ether, 3-methyl-3-(methyl)propene oxiranoxymethyl oxetane, 3·ethyl-3-(methyl) propylene oxiranoxymethyl oxetane, acrylic acid a functional group which can be thermally crosslinked with [A] component-10-200905264 by the above-mentioned unsaturated compound (a), such as allyl ester and allyl methacrylate (hereinafter also When the "thermal crosslinking reaction group" is a vinyl group, an allyl group, a (meth) acrylonitrile group, a carboxyl group, a hydroxyl group, a thiol group, a ureido group, a styryl group or an amine group, B] Ingredients Cross-linking reactions are carried out. Among the unsaturated compounds (a), glycidyl methacrylate, -6,7-epoxypentyl methacrylate, fluorene-vinylbenzyl glycidyl ether, m-vinylbenzyl glycidyl ether, P-vinylbenzyl glycidyl ether, 3-methyl-3-(methyl)propene fluorenyloxymethyl oxetane, 3-ethyl-3-(methyl) propylene oxymethyl oxalate The cyclobutane, allyl methacrylate and the like are preferred from the viewpoints of improving the copolymerization reactivity and the heat resistance and surface hardness of the obtained protective film or insulating film. The above unsaturated compound (a) may be used singly or in combination of two or more kinds of the ruthenium copolymer (A 1 ), for example, (meth)acrylic acid, crotonic acid, and α-ethylacrylic acid. , α-η-propyl acrylate, α-η-butyl acrylate 'maleic acid, fumaric acid, miconic acid, mesaconic acid, isaconic acid and other unsaturated carboxylic acids; maleic anhydride, isocanic anhydride, An unsaturated polycarboxylic acid anhydride such as citraic anhydride 'cis-1,2,3,4·tetrahydrophthalic anhydride or the like. The unsaturated compound (b 1 ), wherein the thermal crosslinking reaction group of the [Β] component described later is an oxiranyl group, an oxetanyl group, an episulfido group, a hydroxyl group, a thiol group or an amine In the case of a base, a crosslinking reaction can be carried out with the component [B]. -11 - 200905264 Among the unsaturated compounds (b 1), the unsaturated carboxylic acid is particularly preferably acrylic acid or methacrylic acid, and the unsaturated polycarboxylic acid anhydride is particularly preferably maleic anhydride. The preferred unsaturated compound (bl)' is highly reactive and can effectively improve the heat resistance or surface hardness of the resulting protective film. The above unsaturated compound (b 1 ) may be used singly or in combination of two or more kinds. Further, the unsaturated compound (b 2 ), for example, hydroxyalkyl (meth) acrylate such as 2-hydroxyethyl (meth)acrylate or 2-hydroxypropyl (meth)acrylate; methyl (meth)acrylate , ethyl (meth)acrylate, η-propyl (meth)acrylate, i-propyl (meth)acrylate, n-butyl (meth)acrylate, i-butyl (meth)acrylate, (A) (meth)acrylic acid alkyl ester such as:-butyl acrylate or t-butyl (meth)acrylate; cyclopentyl (meth)acrylate, cyclohexyl (meth)acrylate, (meth)acrylic acid 2 -Methylcyclohexyl ester, trimethyl (meth)acrylate [5. 2. 1. 02,6] decane-8-yl (hereinafter 'three rings [5. 2. 1. 02'6] decane-8-yl is also known as "dicyclopentanyl", 2-methylcyclopentyloxyethyl (meth)acrylate, isobornyl (meth)acrylate, etc. Acrylate cycloester; phenyl (meth) acrylate, aryl (meth) acrylate such as benzyl (meth) acrylate; diethyl maleate, diethyl fumarate, Yikang Unsaturated dicarboxylic acid diester such as diethyl acid; N-phenyl maleimide, N-benzyl maleimide, n-cyclohexyl horse-12- 200905264 lysine, N-amber醯iminoimido-3-maleimide benzoate, N-succinic acid imidate-4-maleimide butyrate, N-succinic acid succinimide-6-horse Unsaturated dicarbonyl quinone imine such as yttrium hexanoate, N-succinylidene-3-maleimide propionate, N-(9-acridinyl)maleimide a derivative; a vinyl cyanide compound such as (meth)acrylonitrile, α-chloroacrylonitrile or vinylidene cyanide; (meth)acrylamide, N,N-dimethyl(meth)acrylonitrile Unsaturated guanamine compound such as amine; styrene, α-methylstyrene, m-methylphenyl Aromatic vinyl compounds such as alkene, p-methylstyrene, vinyltoluene, and P-methoxystyrene» anthracene derivatives such as hydrazine and 1-methylhydrazine; 1,3-butadiene and isoprene Other than the conjugated diene compound such as an alkene or a 2,3-dimethyl-1,3-butadiene, for example, ethylene chloride, vinylene chloride or vinyl acetate is used. Among the unsaturated compounds (b2), hydroxyalkyl (meth) acrylate, methyl methacrylate, t-butyl methacrylate, cyclohexyl acrylate, dicyclopentyl methacrylate, 2-methyl acrylate Preferably, cyclohexyl ester, N-phenyl maleimide, N-cyclohexylmaleimide, styrene, p-methoxystyrene, 1,3-butadiene or the like. The preferred unsaturated compound (b2) has high copolymerization reactivity and can effectively improve the heat resistance of the obtained protective film (except for 1,3-butadiene) or surface hardness (however, 1 , except for the case of 3 - Ding Yi -13 - 200905264). The above unsaturated compound (b2) may be used singly or in combination of two or more. Preferred examples of the ruthenium copolymer (A1) are, for example, glycidyl acrylate/acrylic acid/dicyclopentyl styrene/styrene copolymer, methyl group. Glycidyl acrylate/methacrylic acid/dicyclopentyl/styrene copolymer methacrylate, glycidyl methacrylate/methacrylic acid/methyl methacrylate/styrene copolymer, methacrylic acid shrinkage Glyceride/methacrylic acid/cyclohexyl acrylate/p-methoxystyrene copolymer, glycidyl acrylate/acrylic acid/N-phenyl maleimide/styrene copolymer, methacrylic acid shrinkage Glyceride/methacrylic acid/N-phenylmaleimide/styrene copolymer, glycidyl methacrylate/methacrylic acid/N-cyclohexylmaleimide/styrene copolymer, Glycidyl methacrylate/methacrylic acid/dicyclopentyl/1,3-butadiene copolymer of methacrylic acid, 6,7-epoxyheptyl methacrylate/methacrylic acid/methacrylic acid Cyclopentyl/styrene copolymer, methacryl Glycidyl ester / methacrylic acid / dicyclopentyl / styrene / 1,3-butadiene copolymer, -14- 200905264 6,7-epoxypentyl methacrylate / acrylic acid / Maleic anhydride/styrene copolymer, 6,7-epoxypentyl methacrylate/acrylic acid/maleic anhydride/t-butyl copolymer methacrylate, 3-ethyl-3-(methyl ) propylene oxime methyl oxetane / acrylic acid / dicyclopentyl styrene / styrene copolymer, 3 - ethyl _ 3 - (meth) propylene oxiranoxy oxetane / methacrylic acid /Dicyclopentyl/styrene copolymer of methacrylic acid, 3_ethyl_3-(meth)acryloyloxymethyloxetane/methacrylic acid/methyl methacrylate/styrene Polymer, 3_ethyl_3_(meth)acryloyloxymethyloxetane/methacrylic acid/cyclohexyl acrylate/p-methoxystyrene copolymer, 3-ethyl-3- (Meth)acryloyloxymethyloxetane/acrylic acid/N-phenylmaleimide/styrene copolymer, 3-ethyl-3-(methyl)propene oxymethyloxy Heterocyclic butane/methacrylic acid/N-phenylmaleimide/phenylethyl Copolymer, 3-ethyl-3-(meth)acryloyloxymethyloxetane/methacrylic acid/N-cyclohexylmaleimide/styrene copolymer, 3-ethyl - 3-(Meth)acryloyloxymethyloxetane/methacrylic acid/dicyclopentyl methacrylate/1,3-,3-butadiene copolymer, 3-ethyl-3-(A) Acryloxymethyl oxetane/methacrylic acid/dicyclopentyl/styrene/1,3-butadiene copolymer, 3-ethyl-3-(methyl) Propylene oxime methyl oxetane / acrylic acid / maleic anhydride / styrene copolymer, -15- 200905264 3-ethyl-3-(methyl) propylene oxiranoxymethyl oxetane / acrylic acid /maleic anhydride/t-butyl copolymer of methacrylate, allyl methacrylate/acrylic acid/dicyclopentyl/styrene copolymer, allyl methacrylate/methacrylic acid/methyl Dicyclopentyl acrylate/styrene copolymer, allyl methacrylate/methacrylic acid/methyl methacrylate/phenethyl ketone copolymer, allyl methacrylate/methacrylic acid/cyclohexyl acrylate /p-methoxybenzene Alkene copolymer, allyl methacrylate / acrylic acid / N-phenyl maleimide / styrene copolymer, allyl methacrylate / methacrylic acid / N-phenyl maleimide /Phenylethylene Synergic Polymer, Allyl Methacrylate / Methacrylic Acid / N-Cyclohexyl Maleimide / Styrene Copolymer, Allyl Methacrylate / Methacrylic Acid / Methacrylic Acid II Cyclopentyl 71,3-butadiene copolymer, allyl methacrylate/methacrylic acid/dicyclopentyl methacrylate/styrene/1,3-butadiene copolymer, methacrylic acid Allyl ester/acrylic acid/maleic anhydride/styrene copolymer, allyl methacrylate/acrylic acid/maleic anhydride/t-butyl copolymer methacrylate, and the like. -16- 200905264 Among the copolymers (A1), more preferred are, for example, glycidyl methacrylate/methacrylic acid/dicyclopentyl/styrene copolymer methacrylate, glycidyl methacrylate /methacrylic acid / N-phenyl maleimide / styrene copolymer, glycidyl methacrylate / methacrylic acid / N-cyclohexyl maleimide / styrene copolymer, methyl Glycidyl acrylate/methacrylic acid/dicyclopentyl/1,3-butadiene copolymer methacrylate, glycidyl methacrylate/methacrylic acid/dicyclopentyl styrene/styrene/ 1,3-butadiene copolymer, 3-ethyl-3-(meth)acrylomethoxymethyl oxetane/methacrylic acid/dicyclopentyl/styrene copolymer , 3-ethyl-3-(meth)acryloyloxymethyloxetane/methacrylic acid/N-phenylmaleimide/styrene copolymer, 3-ethyl-3- (Meth)acryloyloxymethyloxetane/methacrylic acid/N-cyclohexylmaleimide/styrene copolymer, 3-ethyl-3-(methyl)propene fluorene base Heterocyclic butane/methacrylic acid/dicyclopentyl/1,3-butadiene copolymer of methacrylic acid, 3-ethyl-3-(meth)acryloyloxymethyloxetane/ Methacrylic acid/dicyclopentyl/styrene/1,3-butadiene copolymer, 3-methyl-3-(methyl)propenyloxymethyloxetane/methyl Acrylic acid/dicyclopentyl/styrene copolymer of methacrylic acid, 3-methyl-3-(methyl)propenyloxymethyloxetane/methacryl-17- 200905264 Acid/N-benzene Kamalimide/styrene copolymer, 3-methyl-3-(meth)acrylomethoxymethyloxetane/methacrylic acid/N-cyclohexylmaleimide/benzene Ethylene copolymer, 3-methyl-3-(meth)acryloyloxymethyloxetane/methacrylic acid/dicyclopentyl/ruthenium methacrylate, 3·butadiene copolymer, 3-Methyl-3-(meth)acryloyloxymethyloxetane/methacrylic acid/dicyclopentyl/styrene/1,3-butadiene copolymer, methyl Allyl acrylate/methacrylic acid/dicyclopentyl methacrylate/styrene copolymer, Allyl methacrylate/methacrylic acid/N-phenylmaleimide/styrene copolymer, allyl methacrylate/methacrylic acid/Ν·cyclohexylmaleimide/styrene Copolymer, allyl methacrylate/methacrylic acid/dicyclopentyl/1,3-butadiene copolymer methacrylate, allyl methacrylate/methacrylic acid/methacrylic acid bicyclic A pentyl/styrene/1,3-butadiene copolymer or the like. In the copolymer (A1), the content of the repeating unit formed by the unsaturated compound (a) is preferably 10 to 70% by weight, more preferably 2 to 60% by weight based on the entire repeating unit. . The total content of the repeating units formed by the unsaturated compound (b 1) is preferably from 5 to 40% by weight, more preferably from 10 to 30% by weight, based on the total repeating unit. The content of the repeating unit produced by the unsaturated compound (b2) is preferably from 10 to 70% by weight -18 to 200905264% by weight, more preferably from 20 to 50% by weight, based on the entire repeating unit. When the content of the repeating unit formed by the unsaturated compound (a) is less than 10% by weight, the heat resistance or surface hardness of the protective film tends to decrease. Further, when it exceeds 70% by weight, the storage stability of the composition may be There is a tendency to decrease. When the total content of the repeating units of the (bl) polymerizable unsaturated carboxylic acid and the polymerizable unsaturated polycarboxylic acid anhydride is less than 5% by weight, the heat resistance, surface hardness or chemical resistance of the protective film may be lowered. When the tendency is more than 40% by weight, the storage stability of the composition tends to decrease. Further, (b2) when the content of the repeating unit formed by the other polymerizable unsaturated compound is less than 10% by weight, the storage stability of the composition tends to decrease, and when it exceeds 70% by weight, the heat resistance of the protective film Sex or surface hardness tends to decrease. Next, the polymer (A2) has a acetal structure of a carboxylic acid, a ketal ester structure of a carboxylic acid, a 1-alkylcycloalkane structure of a carboxylic acid, and a t-butyl ester structure of a carboxylic acid. At least one of the selected structures. The polymer (A2) is not particularly limited as long as it satisfies the above conditions, and may be any of an addition polymer, a polyaddition polymer, and a polycondensation polymer. Forming a acetal ester structural group of a carboxylic acid, for example, 1-methoxyethoxy, 1-ethoxyethoxy, 1-n-propoxyethoxy, Ι-i-propoxyethoxy, 1 -n-butoxyethoxy, Ι-i-butoxyethoxy, l_sec-butoxyethoxy, Ι-t-butoxyethoxy, 1-cyclopentyloxyethoxy, 1- Cyclohexyloxyethoxy, 1-norbornyloxyethoxy, 1-borneaoxyethoxy, 1-phenyloxyethoxy, 1-(b-naphthyloxy)ethoxy , 1 · benzyloxyethoxy, 1-phenylethyloxyethoxy, (cyclohexyl) (methoxy) methoxy, (cyclohexyl-19- 200905264 ) (ethoxy) methoxy (cyclohexyl)(η-propoxy)methoxy, (cyclohexyl)(i-propoxy)methoxy, (cyclohexyl)(cyclohexyloxy)methoxy, (cyclohexyl) (phenoxy)methoxy, (cyclohexyl)(benzyloxy)methoxy, (phenyl)(methoxy)methoxy, (phenyl)(ethoxy)methoxy, (benzene (n-propoxy) methoxy, (phenyl)(i-propoxy)methoxy, (phenyl)(cyclohexyloxy)methoxy, (phenyl (phenoxy)methoxy, (phenyl)(benzyloxy)methoxy, (benzyl)(methoxy)methoxy, (benzyl)(ethoxy)methoxy, Benzyl)(n-propoxy)methoxy, (benzyl)(i-propoxy)methoxy, (benzyl)(cyclohexyloxy)methoxy, (benzyl)(phenoxy) Methoxy), (benzyl) (benzyloxy)methoxy '2-tetrahydrofuranyloxy, 2-tetrahydropyranyloxy and the like. Among these groups, 1-ethoxyethoxy, 1-cyclohexyloxyethoxy, 2-tetrahydropyranyloxy, 1-n-propoxyethoxy, 2-tetrahydrogen The pyranyloxy group is more preferred. Forming a base of a ketal ester of a carboxylic acid, for example, 1-methyl-1-methoxyethoxy, 1-methyl-1-ethoxyethoxy, 1-methyl-1-n-propyl Oxyethoxyethoxy ' 1-methyl- Ι-i-propoxyethoxy, 1-methyl-1-n-butoxyethoxy, 1-methyl-Ι-i-butoxyethoxy, 1-methyl-Ι-sec-butoxyethoxy, 1-methyl-Ι-t-butoxyethoxy, 1-methyl-1·cyclopentyloxyethoxy, 1-methyl 1-cyclohexyloxyethoxy, 1-methyl-1-norbornyloxyethoxy, 1-methyl-1-borneoyloxyethoxy, 1-methyl-1- Phenyloxyethoxy, 1-methyl-1-(1-naphthyloxy)ethoxy, 1-methyl-1-benzyloxyethoxy, 1-methyl·; Phenylethyloxyethoxy, 1-cyclohexyl-1-methoxyethoxy, 1-cyclohexyl-1-ethoxyethoxy, 1-cyclohexyl-1-n-propoxyethoxy , 1-cyclohexyl-Ι-i·propoxyethoxy,:-cyclohexyl-1-cyclohexyloxy-20- 200905264 ethoxy group, 1-cyclohexyl-1 phenoxyethoxy group, 1-cyclohexyl-1-prenyloxyethoxy, 1-phenyl-1-methoxyethoxy, 1-phenyl-1-ethoxyethoxy, 1-phenyl-1-n -propoxyethoxy, 1-benzene - Ι-i-propoxyethoxy, 1-phenyl-1-cyclohexyloxyethoxy, phenyl-1-phenyloxyethoxy, 1-phenyl-1-phenyloxy Ethyloxy, 1-kilo-1-methoxyethoxy, 1-benzyl-1-ethoxyethoxy, benzyl-p-propoxyethoxy, 丨-benzyl-Ι- I-propoxyethoxy, 1-benzyl-1-cyclohexyloxyethoxy, 1-benzyl-1-phenyloxyethoxy, benzyl-1-benzyloxyethoxy, 2-(2-methyl-tetrahydrofuranyl)oxy, 2-(2-methyl-tetrahydropyranyl)oxy, 1-methoxy-cyclopentyloxy, 1-methoxy-ring Hexyloxy and the like. Among them, 1-methyl-1-methoxyethoxy group and 1-methyl-1-cyclohexyloxyethoxy group are preferred. a group which can be bonded to a carboxyl group to form a 1-alkylcycloalkanoate of a carboxylic acid, such as 1-methylcyclopropyl, 1-methylcyclobutyl, 1-methylcyclopentyl, 1-methylcyclo Hexyl, 1-methylcycloheptyl, 1-methylcyclooctyl, 1-methylcyclodecyl, 1-methylcyclodecyl, 1-ethylcyclopropyl, 1-ethylcyclobutyl, 1-ethylcyclopentyl, 1-ethylcyclohexyl, 1-ethylcycloheptyl, 1-ethylcyclooctyl, 1·ethylcyclodecyl, 1-ethyl 癸 癸, 1- (Isopropyl)cyclopropyl, 1-(iso)propylcyclobutyl, 1-(iso)propylcyclopentyl, 1-(iso)propylcyclohexyl, 1-(iso)propylcycloheptyl , 1-(Isopropyl)cyclooctyl, 1-(iso)propylcyclodecyl, ι-(iso)propylcyclodecyl, i-(iso)butylcyclopropyl, ι-(iso) Butylcyclobutyl, 1-(iso)butylcyclopentyl, 1-(iso)butylcyclohexyl, 1(iso)butylcycloheptyl, 1-(iso)butylcyclooctyl, 1 -(iso)butylcyclodecyl, 丨-(iso)butylcyclodecyl, 1-(iso)pentylcyclopropyl, 1-(iso)pentylcyclobutyl, 1-(iso)pentyl- 21 - 200905264 Cyclopentyl, i-(iso)pentylcyclohexyl, i-(iso)pentylcycloheptyl, Io-(iso)pentylcyclooctyl, 1-(iso)pentylcyclodecyl, 1-(iso)pentylcyclodecyl, 1-(iso)hexylcyclopropyl, 1-(iso)hexyl ring Butyl, 1-(iso)hexylcyclopentyl, 1-(iso)hexylcyclohexyl, 1-(iso)hexylcycloheptyl, 1-(iso)hexylcyclooctyl, 1-(iso)hexylcycloindole , 1-(iso)hexylcyclodecyl, 1-(iso)heptylcyclopropyl, 1-(iso)heptylcyclobutyl, 1-(iso)heptylcyclopentyl, 1-(iso) Heptylcyclohexyl, 1-(iso)heptylcycloheptyl, 1-(iso)heptylcyclooctyl, 1-(iso)heptylcyclodecyl, 1-(iso)heptylcyclodecyl, 1 -(iso)octylcyclopropyl, 1-(iso)octylcyclobutyl, 1-(iso)octylcyclopentyl, 1-(iso)octylcyclohexyl, 1-(iso)octyl ring Heptyl, 1-(iso)octylcyclooctyl, 1-(iso)octylcyclodecyl and 1-(iso)octylcyclodecyl are preferably exemplified. The polymer (A2) has a good storage stability when compared with the case of using the copolymer (A1), and a liquid-type curable resin composition having excellent flattening ability of the obtained protective film can be obtained (0) In the copolymer (A2-1), the unsaturated compound (b3), for example, a norbornene compound having a acetal structure of a carboxylic acid or a ketal ester structure of a carboxylic acid, an acetal of a carboxylic acid, or a condensate (meth) acrylate compound, t-butyl (meth) acrylate, etc. having a ketone or a 1-alkylcycloalkane structure. Specific examples of the norbornene compound having an acetal structure or a ketal ester structure For example, 2,3-di-tetrahydropyran-2-yloxycarbonyl-5-norbornene, 2. 3-Di-trimethyldecyloxycarbonyl-5-norbornene, 2. 3-Di-triethyldecyloxycarbonyl-5-norbornene, 2. 3-Di-t-butyldimethylammonium oxycarbonyl-5-norbornene, -22- 200905264 2,3-di-trimethylformamidinyloxycarbonyl-5-norbornene, 2. 3-Di-triethylformamidinyloxycarbonyl-5-norbornene, 2. 3-Di-t-butyldimethylformyloxycarbonyl-5-norbornene, —t-butyloxy (parophilic _5·norbornic thin, 2. 3-di-benzyloxycarbonyl-5-norbornene, 2. 3-di-tetrahydrofuran-2-yloxycarbonyl-5-norbornene, 2. 3-Di-tetrahydropyran-2-yloxycarbonyl _5_norbornene, 2. 3-Di-cyclobutyloxycarbonyl-5-norbornene, 2. 3-Di-cyclopentyloxycarbonyl _5_norbornene, 2. 3-Di-cyclohexyloxycarbonyl _5_norbornene, 2. 3-Di-cycloheptyloxycarbonyl _5-norbornene, 2,3-di-1 methoxyethoxycarbonyl _5-norbornene, 2. 3 -Di- Ι- t-butoxyethoxycarbonyl-5-norbornene, - methoxy ethoxy fluorenyl-5 · norbornene, 2. 3-di-(cyclohexyl)(ethoxy)methoxycarbonyl-5-norbornene, 2. 3-Di-1-methyl-p-methoxyethoxycarbonyl _5_norbornene, 2. 3-Di-1-methyl-1_丨-butoxyethoxycarbonyl-5-norbornene, 2. 3-di-(benzyl)(ethoxy)methoxycarbonyl-5-norbornene; Specific examples of the above (meth) acrylate compound having a acetal ester or ketal ester structure, for example, 1-ethoxyethyl (meth) acrylate, Tetrahydro-2Η-pyran-2-yl (meth) acrylate, 1-(cyclohexyloxy)ethyl (meth) acrylate, 1-(2-methylpropoxy)ethyl (meth) acrylate, Oh, 1_Dimethyl-ethoxy)ethyl (meth) acrylate, 1-(cyclohexyloxy)ethyl (meth) acrylate or the like. -23- 200905264 Specific examples of the above (meth) acrylate compound having a 1-alkylcycloalkyl ester structure, For example, 1-methylcyclopropyl (meth) acrylate, 1-methylcyclobutyl (meth) acrylate, 1-methylcyclopentyl (meth) acrylate, 1-methylcyclohexyl (meth) acrylate, 1-methylcycloheptyl (meth) acrylate ' 1-methylcyclooctyl (meth) acrylate, 1-methylcyclodecyl (meth) acrylate, 1-methylcyclodecyl (meth) acrylate, 1-ethylcyclopropyl (meth) acrylate, 1-ethylcyclobutyl (meth) acrylate, 1-ethylcyclopentyl (meth) acrylate, 1-ethylcyclohexyl (meth) acrylate, 1-ethylcycloheptyl (meth) acrylate, 1-ethylcyclooctyl (meth) acrylate, 1-ethylcyclodecyl (meth) acrylate, 1-ethylcyclodecyl (meth) acrylate, 1-(Isopropyl)cyclopropyl (meth) acrylate, 1-(Isopropyl)cyclobutyl (meth) acrylate, 1-(Isopropyl)cyclopentyl (meth) acrylate, 1-(iso)propylcyclohexyl (meth) acrylate, 1-(iso)propylcycloheptyl (meth) acrylate, 1-(Isopropyl)cyclooctyl (meth) acrylate, 1-(Isopropyl)cyclodecyl (meth) acrylate, 1-(Isopropyl)cyclodecyl (meth) acrylate, 1-(iso)butylcyclopropyl (meth) acrylate, 1-(iso)butylcyclobutyl (meth) acrylate, 1-(iso)butylcyclopentyl (meth) acrylate, 1-(iso)butylcyclohexyl (meth) acrylate, 1-(iso)butylcycloheptyl (meth) acrylate, 1-(iso)butylcyclooctyl (meth) acrylate, 1-(iso)-butylcyclodecyl (meth) acrylate, 1-(iso)butylcyclononyl (meth) acrylate, 1_(Iso)pentylcyclopropyl (meth) acrylate, 1-(iso)pentylcyclobutyl (meth) acrylate, 1-(iso)pentylcyclopentyl (meth) acrylate, 1-(iso)pentylcyclohexyl (meth) acrylate, 1-(iso)pentylcycloheptyl (meth)acrylic acid -24- 200905264 Ester, Io-(iso)pentylcyclooctyl (meth) acrylate, Io-(iso)pentylcyclodecyl (meth) acrylate, 1-(iso)pentylcyclodecyl (meth) acrylate, 1-(iso)hexylcyclopropyl (meth) acrylate, 1-(iso)hexylcyclobutyl (meth) acrylate, 1-(iso)hexylcyclohexyl (meth) acrylate, 1-(iso)hexylcycloheptyl (meth) acrylate, 1-(iso)hexylcyclooctyl (meth) acrylate, 1-(iso)hexylcyclodecyl (meth) acrylate, 1-(iso)hexylcyclodecyl (meth) acrylate, 1-(iso)heptylcyclopropyl (meth) acrylate, 1-(iso)heptylcyclobutyl(meth)acrylate, 1-(iso)heptylcyclopentyl (meth) acrylate, 1-(iso)heptylcyclohexyl (meth) acrylate, 1-(iso)heptylcycloheptyl (meth) acrylate, 1-(iso)heptylcyclooctyl (meth) acrylate, 1-(iso)heptylcyclodecyl (meth) acrylate, 1-(iso)heptylcyclodecyl (meth) acrylate, 1-(iso)octylcyclopropyl (meth) acrylate, 1-(iso)octylcyclobutyl (meth) acrylate, 1-(iso)octylcyclopentyl (meth)propionate, 1-(iso)octylcyclohexyl (methyl) propionate, 1-(iso)octylcycloheptyl (meth) acrylate, 1-(iso)octylcyclooctyl (meth) acrylate, 1-(iso)octylcyclodecyl (meth) acrylate, 1-(iso)octylcyclodecyl (meth) acrylate, and the like. among them, To use peethylcyclopentyl (meth) acrylate, 1-ethylcyclohexyl (meth) acrylate, 1-(Isopropyl)cyclopentyl (meth) acrylate, 1-(Isopropyl)cyclohexyl (meth) acrylate, 1-(iso)butylcyclopentyl (methyl) propyl sulphuric acid vinegar, 1-(iso)butylcyclohexyl (meth) acrylate is preferred, more preferably 1-ethylcyclopentyl (meth) acrylate, 1-Ethylcyclohexyl (meth) acrylate is most preferably 1-ethylcyclopentyl (meth) acrylate, Bis-ethylcyclohexyl (meth) acrylate. among them, In terms of copolymerization reactivity and heat resistance of the high-strength protective film of -25-200905264, The storage stability of the composition solution is more suitable for the user. among them, With a acetal ester of a carboxylic acid, A (meth) acrylate compound and a t-butyl (meth) acrylate having a ketal ester or a 1-alkylcycloalkane are preferred, Among them, 1-ethoxyethyl methacrylate, Tetrahydro-2H-pyran-2-yl methacrylate, 1-(cyclohexyloxy)ethyl methacrylate, Ethyl 1-(2-methylpropoxy)methacrylate, Ϊ́-(ι, Ι-dimethyl-ethoxy) ethyl methacrylate, 1-(cyclohexyloxy)ethyl methacrylate, 1-ethylcyclopentyl (meth) acrylate, 1-ethylcyclohexyl (meth) acrylate, T-butyl methacrylate is more preferred. The preferred unsaturated compounds (b3), In addition to high copolymerization reactivity, At the same time as the one-pack type curable resin composition which is excellent in the stability of storage and the flattening ability of the protective film, It is also extremely effective for improving the heat resistance or surface hardness of the obtained protective film. The above unsaturated compound (b3), These may be used alone or in combination of two or more. also, Unsaturated compound (b4), E.g, a compound equivalent to the compound exemplified above for the unsaturated compound (b1) and the unsaturated compound (b2), etc. 〇 among the unsaturated compounds (b4), Ethyl methyl methacrylate, Cyclohexyl acrylate, Dicyclopentyl methacrylate, 2-methylcyclohexyl acrylate, N•phenylmaleimide, N_cyclohexylmaleimide, Styrene, P-methoxystyrene, 1, 3-butadiene is preferred. The preferred unsaturated compounds (b4), Can improve copolymerization reactivity, And to improve the heat resistance of the resulting protective film -26- 200905264 (however, 1, 3 - except for the case of Ding Er) or surface hardness (but, 1, Except in the case of 3-butadiene) is also effective. The above unsaturated compound (b4), These may be used alone or in combination of two or more. Preferred specifics of the copolymer (A2-1), for example, Glycidyl methacrylate / tetrahydro- 2H -pyran-2-yl/methacrylic acid dicyclopentyl/styrene copolymer, Glycidyl methacrylate/tetrahydro-2H-pyran-2-yl methacrylate/dicyclopentyl/styrene copolymer of methacrylic acid, Glycidyl methacrylate / tetrahydro-2H-pyran-2-yl acrylate / N-phenyl maleimide / styrene copolymer, Glycidyl methacrylate/tetrahydro-2H-pyran-2-yl/N-phenylmaleimide/styrene copolymer, Glycidyl methacrylate/tetrahydro-2H-pyran-2-yl/N-cyclohexylmaleimide/styrene copolymer, Glycidyl methacrylate/tetrahydro-2H-pyran-2-yl/N-cyclohexylmaleimide/styrene copolymer, Glycidyl methacrylate / 1-(cyclohexyloxy)ethyl acrylate / dicyclopentyl / styrene copolymer of methacrylic acid, Glycidyl methacrylate/1-(cyclohexyloxy)ethyl methacrylate/dicyclopentyl/styrene copolymer of methacrylic acid, Glycidyl methacrylate/1-(cyclohexyloxy)ethyl/N-cyclohexylmaleimide/styrene copolymer, Glycidyl methacrylate/1-(cyclohexyloxy)ethyl methacrylate -27- 200905264 base/N-cyclohexylmaleimide/styrene copolymer, Glycidyl methacrylate/2, 3-bis(tetrahydropyran-2-yloxycarbonyl)-5-norbornene/dicyclopentyl/styrene copolymer of methacrylic acid, Glycidyl methacrylate/2, 3-bis(tetrahydropyran-2-yloxycarbonyl)-5-norbornene/N-cyclohexylmaleimide/styrene copolymer, Glycidyl methacrylate/tetrahydro-2H-pyran-2-yl acrylate/dicyclopentyl methacrylate/1, 3-butadiene copolymer, Glycidyl methacrylate / tetrahydro-2H-pyran-2-yl methacrylate / dicyclopentyl methacrylate / 1, 3-butadiene copolymer, Glycidyl methacrylate/tetrahydro-2H-pyran-2-yl methacrylate/methyl methacrylate/styrene copolymer, Glycidyl methacrylate/tetrahydro-2H-pyran-2-yl methacrylate/methyl methacrylate/styrene copolymer, Glycidyl methacrylate / tetrahydro-2H-pyran-2-yl acrylate / propylene cyclohexyl / p-methoxy styrene copolymer, Glycidyl methacrylate / tetrahydro-2H-pyran-2-yl methacrylate / cyclohexyl acrylate / p-methoxy styrene copolymer, Glycidyl acrylate/t-butyl/N-phenyl maleate methacrylate imine/styrene copolymer, Glycidyl methacrylate/t-butyl/N-cyclohexyl methacrylate maleimide/styrene copolymer, Methacrylic acid 6, 7_epoxyheptyl ester / tetrahydro-2H-pyran-2-yl acrylate / t-butyl / maleic anhydride copolymer of methacrylate, Methacrylic acid 6, 7-epoxyheptyl ester/tetrahydro-211-pyran-methacrylate--28- 200905264 2-based/t-butyl/maleic acid methacrylate copolymer, Methacrylic acid 6, 7-epoxyheptyl ester/t-butyl/methacrylic acid dicyclopentyl/styrene copolymer, Methacrylic acid 6, 7-epoxyheptyl ester/t-butyl/maleic anhydride/styrene copolymer, Glycidyl methacrylate / 1-(cyclohexyloxy)ethyl acrylate / dicyclopentyl methacrylate / styrene oxime, 3-butadiene copolymer, Glycidyl methacrylate/1-(cyclohexyloxy)ethyl methacrylate/dicyclopentyl methacrylate/styrene/1, 3-butadiene copolymer, glycidyl methacrylate/1-ethylcyclopentyl acrylate/Ν-phenylmaleimide/styrene copolymer, Glycidyl methacrylate / 1-ethylcyclohexyl acrylate / hydrazine - phenyl maleimide / styrene copolymer, Glycidyl methacrylate / 1-ethylcyclopentyl acrylate / hydrazine - phenyl maleimide / styrene / methacrylic acid copolymer, Glycidyl methacrylate/1-ethylcyclopentyl acrylate/dicyclopentyl/styrene copolymer of methacrylic acid, Glycidyl methacrylate / 1-ethylcyclohexyl acrylate / dicyclopentyl / styrene copolymer of methacrylic acid, 3-ethyl-3-(meth)acryloyloxymethyloxetane/tetrahydro- 2H-pyran-2-yl/dicyclopentyl/styrene copolymer of methacrylic acid, 3-ethyl-3-(meth)acryloyloxymethyloxetane/tetrahydro-2H-pyran-2-yl methacrylate/dicyclopentyl methacrylate/styrene copolymer , -29- 200905264 3 -Ethyl-3-(methyl)propene oxime oxetane/tetrahydro- 2H-pyran-2-yl/N-phenylmaleimide/benzene Ethylene copolymer, 3-ethyl-3-(meth)acryloyloxymethyloxetane/tetrahydro-2H-pyran-2-yl methacrylate/N-phenylmaleimide/styrene Polymer 3_Ethyl_3_(meth)acryloyloxymethyloxetane/tetrahydro- 2H-pyran-2-yl-N-cyclohexylmaleimide/styrene copolymerization Object, 3_Ethyl_3_(meth)acryloyloxymethyloxetane/tetrahydro- 2H-pyran-2-yl/N-cyclohexylmaleimide/styrene copolymerization Object, 3-ethyl-3-(meth)acryloyloxymethyloxetane/acrylic acid i_(cyclohexyloxy)ethyl/dicyclopentyl/styrene copolymer of methacrylic acid, 3_Ethyl_3_(methyl)acryloyloxymethyloxetane/methacrylic acid 1-(cyclohexyloxy)ethyl/dicyclopentyl/styrene ethylene methacrylate copolymer, 3-ethyl-3-(meth)acryloyloxymethyloxetane/acrylic acid 1-(cyclohexyloxy)ethyl/N-cyclohexylmaleic acid imine/styrene copolymer, 3_Ethyl_3-(meth)acryloyloxymethyloxetane/1-(cyclohexyloxy)ethyl methacrylate/N-cyclohexylmaleimide/styrene copolymerization Object, 3-ethyl-3-(meth)acryloyloxymethyloxetane/2 3_bis(tetrahydropyran-2-yloxycarbonyl)-5-norbornene/dicyclopentyl methacrylate/styrene copolymer, 3-ethyl-3-(meth)acryloyloxymethyloxetane/2 3-二(四-30- 200905264 Hydropyran-2-yloxycarbonyl)-5-norbornene/N-cyclohexylmaleimide/styrene copolymer, 3-ethyl-3-(meth)acryloyloxymethyloxetane/tetrahydro-2H-pyran-2-yl acrylate/dicyclopentyl methacrylate/1, 3-butadiene copolymer, 3-ethyl-3-(meth)acryloyloxymethyloxetane/methacrylic acid tetrahydro-2H-pyran-2-yl/dicyclopentyl methacrylate/1, 3-butadiene copolymer, 3-ethyl-3-(meth)acryloyloxymethyloxetane/tetrahydro-2H-pyran-2-yl/methyl methacrylate/styrene copolymer, 3-ethyl-3-(meth)acryloyloxymethyloxetane/methacrylic acid tetrahydro-2H-pyran-2-yl/methyl methacrylate/styrene copolymer, 3-ethyl-3-(meth)acryloyloxymethyloxetane/tetrahydro- 2H-pyran-2-yl/cyclohexyl acrylate/p-methoxystyrene copolymer, 3-ethyl-3-(meth)acryloyloxymethyloxetane/tetrahydro-2H-pyran-2-yl methacrylate/cyclohexyl acrylate/p-methoxystyrene copolymerization Object, 3-methyl-3-(meth)acryloyloxymethyloxetane/methacrylic acid t-butyl/N-phenylmaleimide/styrene copolymer, 3-ethyl-3-(meth)acryloyloxymethyloxetane/methacrylic acid t-butyl/N-cyclohexylmaleimide/phenylethyl; ): Homopolymer, 3-methyl-3-(meth)acryloyloxymethyloxetane/tetrahydro-2H-pyran-2-yl acrylate/t-butyl/maleic anhydride copolymer, 31 - 200905264 3-Methyl-3-(methyl)propene oxiranyloxymethyl oxetane / tetrahydro-2H-pyran-2-yl methacrylate / t-butyl methacrylate / Malay Anhydride copolymer, 3-methyl-3-(meth)acryloyloxymethyloxetane/methacrylic acid t-butyl/dicyclopentyl/styrene copolymer of methacrylic acid, 3-methyl-3-(meth)acryloyloxymethyloxetane/methacrylic acid t-butyl/maleic anhydride/styrene copolymer, 3-ethyl-3-(meth)acryloyloxymethyloxetane/1-(cyclohexyloxy)ethyl acrylate/dicyclopentyl methacrylate/styrene/1, 3-butadiene copolymer, 3-ethyl-3-(meth)acryloyloxymethyloxetane/methacrylic acid 1-(cyclohexyloxy)ethyl/dicyclopentyl methacrylate/styrene/1, 3-butadiene copolymer 3-ethyl-3-(meth)acrylomethoxymethyl oxetane/1-ethylcyclopentyl acrylate/N-phenylmaleimide/ Styrene copolymer, 3-ethyl-3-(meth)acryloyloxymethyloxetane/1-ethylcyclohexyl acrylate/N-phenylmaleimide/styrene copolymer, 3-ethyl-3-(methyl)propenyloxymethyloxetane/1-ethylcyclopentyl acrylate/N-phenylmaleimide/styrene/methacrylic acid copolymerization Object, 3-ethyl-3-(meth)acryloyloxymethyloxetane/1-ethylcyclopentyl acrylate/dicyclopentyl/styrene copolymer of methacrylic acid, 3-ethyl-3-(meth)acryloyloxymethyloxetane/1-ethylcyclohexyl acrylate/dicyclopentyl/styrene copolymer of methacrylic acid, -32- 200905264 Allyl methacrylate / tetrahydro-2H-pyran-2-yl methacrylate / methacrylic acid dicyclopentyl / styrene copolymer, Allyl methacrylate/tetrahydro-211-pyran-2-yl methacrylate/dicyclopentyl/styrene copolymer of methacrylic acid, Allyl methacrylate/tetrahydro-2H-pyran-2-yl/N-phenyl maleimide/styrene copolymer, Allyl methacrylate / tetrahydro-2H-pyran-2-yl methacrylate / N-phenyl maleimide / styrene copolymer, Allyl methacrylate/tetrahydro-2H-pyran-2-yl/N-cyclohexylmaleimide/styrene copolymer, Allyl methacrylate/tetrahydro-2H-pyran-2-yl/N-cyclohexylmaleimide/styrene copolymer, Allyl methacrylate/1-(cyclohexyloxy)ethyl acrylate/dicyclopentyl/styrene copolymer of methacrylic acid, Allyl methacrylate/1-(cyclohexyloxy)ethyl methacrylate/dicyclopentyl/styrene copolymer of methacrylic acid, Allyl methacrylate/1-(cyclohexyloxy)ethyl/N-cyclohexylmaleimide/styrene copolymer, Allyl methacrylate/methacrylic acid 1_(cyclohexyloxy)ethyl/N-cyclohexylmaleimide/styrene copolymer, Allyl methacrylate/2, 3-bis(tetrahydropyran-2-yloxycarbonyl)-5-norbornene/dicyclopentyl/styrene copolymer of methacrylic acid, Allyl methacrylate/2, 3-bis(tetrahydropyran-2-yloxycarbonyl)-5-norbornene/N-cyclohexylmaleimide/styrene copolymer, -33- 200905264 Allyl methacrylate/tetrahydro-2 Η-pyran-2-yl/methacrylic acid dicyclopentyl/1, 3-butadiene copolymer, Allyl methacrylate/tetrahydro-2H-pyran-2-yl methacrylate/dicyclopentyl methacrylate/1, 3-butadiene copolymer, Allyl methacrylate / tetrahydro-2H-pyran-2-yl methacrylate / methyl methacrylate / styrene copolymer, Allyl methacrylate / tetrahydro-2H-pyran-2-yl methacrylate / methyl methacrylate / styrene copolymer, Allyl methacrylate/tetrahydro-2H-pyran-2-yl acrylate/acrylic acid cyclohexyl/p-methoxystyrene copolymer, Allyl methacrylate/tetrahydro-2H-pyran-2-yl methacrylate/cyclohexyl/p-methoxystyrene copolymer, Allyl methacrylate/t-butyl/N-phenyl maleate methacrylate imine/styrene copolymer, Allyl methacrylate/t-butyl/N-cyclohexylmaleimide/styrene copolymer, Propyl methacrylate/acrylic acid 1-(cyclohexyloxy)ethyl/dicyclopentyl styrene/styrene/1, 3-butadiene copolymer, Allyl methacrylate / 1-(cyclohexyloxy)ethyl methacrylate / Dicyclopentyl methacrylate / styrene / 1, 3-butadiene copolymer, allyl methacrylate / ethyl cyclopentyl acrylate / N_phenyl maleimide / styrene copolymer, Allyl methacrylate / ethyl cyclohexyl acrylate / N_phenyl maleimide / styrene copolymer, -34- 200905264 Allyl methacrylate/1-ethylcyclopentyl acrylate/N-phenylmaleimide/styrene/methacrylic acid copolymer, Allyl methacrylate / 1-ethylcyclopentyl acrylate / methacrylic acid dicyclopentyl / styrene copolymer, Allyl methacrylate / 1-ethylcyclohexyl acrylate / methacrylic acid dicyclopentyl / styrene copolymer, Wait. Among the copolymers (A 2-1), Better yet, Glycidyl methacrylate/tetrahydro-2H-pyran-2-yl acrylate/dicyclopentyl styrene/styrene copolymer, Glycidyl methacrylate / tetrahydro-2H-pyran-2-yl methacrylate / dicyclopentyl / styrene copolymer of methacrylic acid, Glycidyl methacrylate / tetrahydro-2H-pyran-2-yl acrylate / N-phenyl maleimide / styrene copolymer, Glycidyl methacrylate/tetrahydro-2 Η-pyran-2-yl/indole-phenylmaleimide/styrene copolymer, Glycidyl methacrylate/tetrahydro- 2 Η-pyran-2-yl/fluorene-cyclohexylmaleimide/styrene copolymer, Glycidyl methacrylate/tetrahydro-2Η-pyran-2-yl/indole-cyclohexylmaleimide/styrene copolymer, Glycidyl methacrylate / 1-(cyclohexyloxy)ethyl acrylate / fluorene-cyclohexylmaleimide / styrene copolymer, Glycidyl methacrylate/1-(cyclohexyloxy)ethyl/anthracene-cyclohexylmaleimide/styrene copolymer, -35- 200905264 Glycidyl methacrylate/2, 3-bis(tetrahydropyran-2-yloxycarbonyl)-5-norbornene/dicyclopentyl/styrene copolymer of methacrylic acid, Glycidyl methacrylate/2, 3-bis(tetrahydropyran-2-yloxycarbonyl)-5-norbornene/N-cyclohexylmaleimide/styrene copolymer, Glycidyl methacrylate/t-butyl/N-cyclohexylmaleimide/styrene copolymer glycidyl methacrylate/1-ethylcyclopentyl acrylate/N-benzene Kamalimide/styrene copolymer, Glycidyl methacrylate / 1-ethylcyclohexyl acrylate / N-phenyl maleimide / styrene copolymer, Glycidyl methacrylate/1-ethylcyclopentyl acrylate/N-phenylmaleimide/styrene/methacrylic acid copolymer, Glycidyl methacrylate / 1-ethylcyclopentyl methacrylate / N-phenyl maleimide / styrene copolymer, Glycidyl methacrylate / 1-ethylcyclohexyl methacrylate / N-phenyl maleimide / styrene copolymer, Glycidyl methacrylate / 1-ethylcyclopentyl methacrylate / N-phenyl maleimide / styrene / methacrylic acid copolymer, 3-ethyl-3-(meth)acryloyloxymethyloxetane/tetrahydro-2H-pyran-2-yl acrylate/dicyclopentyl methacrylate/styrene copolymer, 3-ethyl-3-(meth)acryloyloxymethyloxetane/tetrahydro-2H-indole-2-yl/methylpropanoic acid-pentyl/benzidine Copolymer, 3-ethyl-3-(meth)acryloyloxymethyloxetane/acrylic acid tetra-36- 200905264 Chloro-2H-indole-2-yl/N-phenyl maleimide/ Phenyl ethene copolymer, 3-ethyl-3-(meth)acryloyloxymethyloxetane/tetraammonium methoxide_211-rollan-2-yl/N-phenyl mala Copolymer 3 -ethyl-3-(meth)acryloyloxymethyloxetane/tetrahydro-2H-pyran-2-yl acrylate/N-cyclohexylmaleimide/styrene Copolymer, 3-ethyl-3-(meth)acryloyloxymethyloxetane/tetrahydro-2H-pyran-2-yl methacrylate/N-cyclohexylmaleimide/styrene polymer, 3-ethyl-3-(meth)acryloyloxymethyloxetane/1-(cyclohexyloxy)ethyl/N-cyclohexylmaleimide/styrene copolymer, 3-ethyl-3-(meth)acryloyloxymethyloxetane/1-(cyclohexyloxy)ethyl/N-cyclohexylmaleimide/styrene copolymerization Object, 3-ethyl-3-(meth)acrylomethoxymethyl oxetane/2 3-bis(tetrahydropyran-2-yloxycarbonyl)-5-norbornene/dicyclopentyl methacrylate/styrene copolymer, 3-ethyl-3-(meth)acryloyloxymethyloxetane/2 3-bis(tetrahydropyran-2-yloxycarbonyl)-5-norbornene/N-cyclohexylmaleimide/styrene copolymer, 3-ethyl-3-(meth)acryloyloxymethyloxetane/t-butyl/N-cyclohexylmaleimide/styrene copolymer 3-ethyl- 3-(Meth)acryloyloxymethyloxetane/1-ethylcyclopentyl acrylate/N-phenylmaleimide/styrene copolymer, -37- 200905264 3-Ethyl-3-(methyl) propylene oxiranoxymethyl oxetane n-ethylcyclohexyl acrylate / N-phenyl maleimide / styrene copolymer, 3-ethyl-3-(meth)acryloyloxymethyloxetane n-ethylcyclopentyl acrylate/N-phenylmaleimide/styrene/methacrylic acid copolymer , 3_Ethyl-3_(meth)acryloyloxymethyloxetane/〗 _ Ethylcyclopentyl methacrylate/N-phenylmaleimide/styrene copolymer, 3-ethyl-3-(meth)acryloyloxymethyloxetaneethylcyclohexyl methacrylate/N-phenylmaleimide/styrene copolymer, 3-ethyl-3-(meth)acryloyloxymethyloxetane/1-ethylcyclopentyl methacrylate/N-phenylmaleimide/styrene/methacrylic acid Copolymer, 3-methyl-3-(meth)acryloyloxymethyloxetane/tetrahydro-2H-pyran-2-yl acrylate/dicyclopentyl methacrylate/styrene copolymer, 3-Methyl-3-(meth)acryloyloxymethyloxetane/tetrahydro-2H-pyran-2-yl methacrylate/dicyclopentyl methacrylate/styrene copolymer , 3-Methyl-3-(meth)acryloyloxymethyloxetane/tetrahydro-2H-pyran-2-yl acrylate/N-phenylmaleimide/styrene copolymer , 3-methyl-3-(methyl)propene oxime oxetane/tetrahydro-2H-pyran-2-yl methacrylate/N-phenylmaleimide/styrene Polymer 3-methyl-3-(meth)acryloyloxymethyloxetane/tetrahydro-2H-pyran-2-yl acrylate/N-cyclohexylmaleimide/styrene Polymer ' -38- 200905264 3-methyl-3-(methyl)propene oxiranyloxymethyl oxetane / tetrahydro-2H-pyran-2-yl/N-cyclohexylmaline Yttrium/styrene copolymer, 3-methyl-3-(meth)acryloyloxymethyloxetane/1-(cyclohexyloxy)ethyl/N-cyclohexylmaleimide/styrene copolymer, 3-Methyl-3-(methyl)propene oxiranyloxymethyloxetane/1-(cyclohexyloxy)ethyl methacrylate/N-cyclohexylmaleimide/styrene copolymerization Object, 3-methyl-3-(meth)acryloyloxymethyloxetane/2 3-bis(tetrahydropyran-2-yloxycarbonyl)-5-norbornene/dicyclopentyl methacrylate/styrene copolymer, 3-methyl-3-(meth)acryloyloxymethyloxetane/2 3-bis(tetrahydropyran-2 yloxycarbonyl)-5-norbornene/N-cyclohexylmaleimide/styrene copolymer, 3-Methyl-3-(meth)acryloyloxymethyloxetane/t-butyl/N-cyclohexylmaleimide/styrene copolymer 3-methyl- 3-(Meth)acryloyloxymethyloxetane-ethylcyclopentyl acrylate/N-phenylmaleimide/styrene copolymer '3-methyl-3-( Methyl)propenyloxymethyloxetane/1-ethylcyclohexyl acrylate/N-phenylmaleimide/styrene copolymer, 3-methyl-3-(meth)acryloyloxymethyloxetane-ethylcyclopentyl acrylate/N-phenylmaleimide/styrene/methacrylic acid copolymer , 3-Methyl-3·(meth)acryloyloxymethyloxetaneethylcyclo-39- 200905264 pentyl methacrylate/N-phenylmaleimide/styrene copolymer , 3-methyl-3-(meth)acryloyloxymethyloxetane/1·ethylcyclohexyl methacrylate/N-phenylmaleimide/styrene copolymer, 3-methyl-3-(meth)acryloyloxymethyloxetane-ethylcyclopentyl methacrylate/N-phenylmaleimide/styrene/methacrylic acid polymer, Allyl methacrylate / tetrahydro-2H-pyran-2-yl acrylate / methacrylic acid dicyclopentyl / styrene copolymer, Allyl methacrylate/tetrahydro-2H-pyran-2-yl methacrylate/dicyclopentyl/styrene copolymer of methacrylic acid, Allyl methacrylate / tetrahydro-2H-pyran-2-yl acrylate / N-phenyl maleimide / styrene copolymer, Allyl methacrylate / tetrahydro-2H-pyran-2-yl methacrylate / N-phenyl maleimide / styrene copolymer, Allyl methacrylate / tetrahydro-2H-pyran-2-yl acrylate / N-cyclohexylmaleimide / styrene copolymer, Allyl methacrylate / tetrahydro-2H-pyran-2-yl methacrylate / N-cyclohexylmaleimide / styrene copolymer, Allyl methacrylate/1-(cyclohexyloxy)ethyl/N-cyclohexylmaleimide/styrene copolymer, Allyl methacrylate/1-(cyclohexyloxy)ethyl/N-cyclohexylmaleimide/styrene copolymer, Allyl methacrylate/2, 3-bis(tetrahydropyran-2-yloxycarbonyl)-5-norbornene/dicyclopentyl/styrene copolymer of methacrylic acid, -40- 200905264 Allyl methacrylate/2, 3-bis(tetrahydropyran-2-yloxycarbonyl)-5-norbornene/N-cyclohexylmaleimide/styrene copolymer, Allyl methacrylate/t-butyl/N-cyclohexylmale methacrylate/styrene copolymer, Allyl methacrylate / 1-ethylcyclopentyl acrylate / N-phenyl maleimide / styrene copolymer, Allyl methacrylate / 1-ethylcyclohexyl acrylate / N-phenyl maleimide / styrene copolymer, Allyl methacrylate / 1-ethylcyclopentyl acrylate / N-phenyl maleimide / styrene / methacrylic acid copolymer, Allyl methacrylate/1-ethylcyclopentyl methacrylate/N-phenylmaleimide/styrene copolymer, Allyl methacrylate/1-ethylcyclohexyl methacrylate/N-phenylmaleimide/styrene copolymer, Allyl methacrylate/1-ethylcyclopentyl methacrylate/N-phenylmaleimide/styrene/methacrylic acid copolymer, Wait. In the copolymer (A2-1), The content of the repeating unit generated by the unsaturated compound (a), Relative to all repeating units, Preferably, it is 1 〇~7〇% by weight, More preferably, it is 20 to 60% by weight. When the content of the repeating unit produced by the unsaturated compound (a) is less than 1% by weight, The heat resistance or surface hardness of the protective film tends to decrease. When it exceeds 70% by weight, The preservation stability of the composition tends to decrease. also, The content of the repeating unit produced by the unsaturated compound (b3) is preferably from 5 to 60% by weight, and more preferably from 1 to 5% by weight. When the content of the repeating unit formed by the unsaturated compound (b3) is within this range, good heat resistance and surface hardness of the protective film can be achieved. also, The content rate of the repeating unit produced by the unsaturated compound (b4) is the amount by which the total content of the repeating units generated by the unsaturated compound (a) and the unsaturated compound (b3) is subtracted from 100% by weight. In the case of the unsaturated carboxylic acid or the unsaturated polycarboxylic acid anhydride of the saturated compound (b4), when the total content of the repeating units formed is more than 40% by weight, 'there is a concern that the storage stability of the composition may be impaired'. Therefore, it is better not to exceed the 値. Secondly, In the copolymer (A 3 ), The unsaturated compound (b 5 ), for example, the compound exemplified in the above unsaturated compound (b2) is the same compound or the like 〇 among the unsaturated compounds (b5), With methyl methacrylate, Cyclohexyl acrylate, Dicyclopentyl methacrylate, 2-methylcyclohexyl acrylate, N-phenyl maleimide, N-cyclohexylmaleimine, Styrene, P-methoxystyrene, 1, 3-butadiene is preferred. The preferred unsaturated compounds (b5), In order to have high copolymerization reactivity, And can effectively improve the heat resistance of the obtained protective film (however, 1, 3 - except for butadiene) or surface hardness (but '1 Except for 3-butadiene). The above unsaturated compound (b 5 ), These may be used alone or in combination of two or more. Preferred specific examples of the copolymer (A3) are, for example, Glycidyl acrylate/styrene copolymer, Glycidyl methacrylate/styrene copolymer, -42 - 200905264 Glycidyl acrylate/dicyclopentyl methacrylate copolymer, Glycidyl methacrylate/dicyclopentyl methacrylate copolymer, Methacrylic acid 6, 7-epoxypentyl ester/styrene copolymer, Glycidyl methacrylate / dicyclopentyl methacrylate / styrene copolymer, Glycidyl methacrylate/N-phenyl maleimide/styrene copolymer, Glycidyl methacrylate / N-cyclohexylmaleimide / phenylethylidene copolymer, Methacrylic acid 6, 7. Epoxypentyl ester / dicyclopentyl methacrylate copolymer, Methacrylic acid 6, 7-epoxypentyl ester / N-cyclohexylmaleimide / styrene copolymer, 3-methyl-3-(meth)acryloyloxymethyloxetane/styrene copolymer, 3-ethyl-3-(meth)acryloyloxymethyloxetane/styrene copolymer, Allyl methacrylate/styrene copolymer, 3-methyl-3-(meth)acrylomethoxymethyl oxetane/methyl propylene dicyclopentyl copolymer, 3-ethyl-3-(meth)acryloyloxymethyloxetane/methylpropionic acid dicyclopentyl copolymer, Allyl methacrylate / dicyclopentyl methacrylate copolymer, 3-methyl-3-(methyl)propenyloxymethyloxetane/methylpropane -43 - 200905264 Acid dicyclopentyl/styrene copolymer, 3-ethyl-3-(meth)acryloyloxymethyloxetane/methacrylic acid dicyclopentyl/styrene copolymer, Allyl methacrylate/dicyclopentyl/styrene copolymer of methacrylic acid, 3-methyl-3-(meth)acrylomethoxymethyl oxetane/N-phenylmaleimide/styrene copolymer, 3-ethyl-3-(meth)acryloyloxymethyloxetane/N-phenylmaleimide/styrene copolymer, Allyl methacrylate/N-phenylmaleimide/styrene copolymer, 3-methyl_3_(methyl)propene oxiranoxymethyloxetane/N_cyclohexyl maleimide/styrene copolymer, Glycidyl methacrylate/N-cyclohexylmaleimide/styrene copolymer, Allyl methacrylate/N-cyclohexylmaleimide/styrene copolymer, Wait. Among the copolymers (A3), Better yet, Glycidyl methacrylate/styrene copolymer, Glycidyl methacrylate/dicyclopentyl methacrylate copolymer, Glycidyl methacrylate/dicyclopentyl methacrylate/styrene copolymer, Glycidyl methacrylate / N_cyclohexylmaleimide / styrene copolymer, -44- 200905264 3-Methyl-3-(meth)acryloyloxymethyloxetane/styrene copolymer, 3-methyl-3-(meth)acryloyloxymethyloxetane/methacrylic acid dicyclopentyl copolymer, 3-methyl-3-(meth)acryloyloxymethyloxetane/methacrylic acid dicyclopentyl/styrene copolymer, 3-Methyl-3-(meth)acryloyloxymethyloxetane/N-cyclohexylmaleimide/styrene copolymer 3-ethyl-3-(methyl)propene oxime Oxymethyloxetane/styrene copolymer, 3-ethyl-3-(meth)acryloyloxymethyloxetane/methacrylic acid dicyclopentyl copolymer, 3-ethyl-3-(meth)acryloyloxymethyloxetane/methacrylic acid dicyclopentyl/styrene copolymer, 3-ethyl·3·(methyl)propene oxime Oxetane/Ν-cyclohexylmaleimide/styrene copolymer allylic methacrylate/styrene copolymer, Allyl methacrylate / dicyclopentyl methacrylate copolymer, Allyl methacrylate/dicyclopentyl/styrene copolymer of methacrylic acid, Allyl methacrylate/Ν-cyclohexylmaleimide/styrene copolymer, and the like. In the copolymer (A3), The content of the repeating unit generated by the unsaturated compound (a), Relative to all repeating units, Preferably, it is 1 to 90% by weight, More preferably 40 to 90% by weight. When the content of the repeating unit generated by the unsaturated compound (a) is less than -45 to 200905264%, When the heat resistance or surface hardness of the protective film is lowered, and when it exceeds 90% by weight, The heat resistance or the preservation stability of the composition tends to decrease. Copolymer [A], For gel permeation chromatography (dissolving solvent: Polystyrene styrene measured by tetrahydrofuran) is converted to a weight average molecular weight (below, Also known as "MW") Preferably 1, 000~100, 000, More preferably 2, 000~50, 000, The best is 3, 000~40, 000. Mw is less than 1, 0000 hours, The coating properties of the composition will be insufficient. Or the heat resistance of the formed protective film may be insufficient. Mw is over 00, 0000 hours, The flattening performance may be insufficient. In addition, The molecular weight distribution (Mw/Mn) of the copolymer [A], Preferably 5. 0 or less, more preferably 3. 0 or less. In the copolymer [A], the polymerizable unsaturated compound (a) and (b1) to (b5) may be used in the presence of a suitable solvent and a suitable polymerization initiator. It is synthesized by a known method such as radical polymerization. [B] component The component [B] used in the present invention is a siloxane oxide oligomer having a functional group capable of thermally crosslinking the component [A], and preferably has the following formula (1) and The alkoxydecane represented by the following formula (2) is produced by cohydrolysis. SUR1)丨(R2)m(〇R3)n -46- 200905264 where 'R1 is an oxacyclopropane group, an oxetanyl group, a sulfonium group 'vinyl group, an allyl group, a (meth) propylene group a substituent of a mercapto group, a carboxyl group, a hydroxyl group, a thiol group, an isocyanate group, an amine group, a ureido group or a styryl group, and r2 and R3 are the same or different from each other, and represent an organic group of a hydrogen atom or a ruthenium, respectively, The integer '1' is an integer of 〇~2, respectively. However, l + m + n = 4. SUR4)x(OR5)4. x (2) wherein 'R and R5 are the same or different, each represents a monovalent organic group, and X is an integer of 0 to 3. The above hydrolyzate/' means that all of the hydrolyzable portion of the hydrolyzable portion of the raw material and a portion thereof are hydrolyzed and partially unhydrolyzed and remain, etc., are contained therein. Specific examples of the compound (1) containing an oxapropyl group are, for example, 3-glycidoxymethyldimethoxydecane, 3-epoxypropoxymethyltriethoxydecane, 3-epoxypropyl Oxymethylmethyltri-n-propoxydecane, 3-epoxypropoxymethyltri-i-propoxylate, 3-glycidoxymethyltriethoxypropane, 3- Glycidoxymethylmethyldimethoxydecane, 3-glycidoxymethylmethyldiethoxy-5, 3-epoxypropoxymethylmethyldi-n-propyl Oxylate sand, 3_glycidoxymethylmethyl dipropoxy decane, 3_glycidoxymethylmethyl-ethyloxy decane, 3_epoxypropoxymethyl Ethyldimethoxysilyl, 3_glycidoxymethylethyldiethoxydecane, 3_glycidoxymethylethyldi-n-propoxydecane, 3_ring Oxypropoxymethyl-47- 200905264 Ethyl di-i-propoxydecane, 3-glycidoxymethylethyldiethoxydecane, 3-glycidoxymethylphenyl Dimethoxydecane, 3-glycidoxymethylphenyldiethoxydecane, 3-glycidoxymethylphenyldi-n-propoxydecane, 3-epoxypropane Oxymethylphenyl di-i-propoxydecane, 3-glycidoxymethylphenyldiethoxydecane, 3-glycidoxyethyltrimethoxydecane, 3-ring Oxypropoxyethyl triethoxy decane, 3-glycidoxyethyl tri-n-propoxy decane, 3-glycidoxyethyl tri-i-propoxy decane, 3 - Glycidoxyethyltriethoxydecane, 3-glycidoxyethylmethyldimethoxydecane, 3-glycidoxyethylmethyldiethoxydecane, 3- Glycidoxyethylmethyldi-n-propoxydecane, 3-glycidoxyethylmethyldi-i-propoxydecane, 3-glycidoxyethylmethyldi Ethoxylated decane, 3-glycidoxyethylethyldimethoxydecane, 3-glycidoxyethylethyldiethoxydecane, 3-glycidoxyethylethyl Di-n-propoxydecane, 3-glycidoxyethylethyldi-i-propoxydecane, 3-glycidoxyethylethyldiethoxydecane, 3 - Glycidoxyethylphenyldimethoxydecane, 3-glycidoxyethylphenyldiethoxysilane, 3-glycidoxyethylphenyl-n- Oxylate sand, 3-glycidoxyethylphenyldi-i-propoxydecane, 3-glycidoxyethylphenyldiethoxydecane, 3-epoxypropoxy Propyltrimethoxydecane, 3-glycidoxypropyltriethoxydecane, 3-glycidoxypropyltris-n-propoxydecane, 3-glycidoxypropyltri Propoxydecane, 3-glycidoxypropyltriethoxydecane, 3-glycidoxypropylmethyldimethoxydecane, 3-glycidoxypropylmethyldi Ethoxy decane, 3-glycidoxypropylmethyldi-n-propoxy decane, 3-glycidoxypropyl-48- 200905264 methyl 2-di-propoxy decane, 3 -glycidoxypropylmethyldiethylphosphoryl sulphate, 3·glycidoxypropylethyldimethoxy sands' 3_glycidoxypropylethyldiethoxy Base decane, 3_glycidoxypropylethyl-1- η-propoxy decane, 3-glycidoxypropylethyl-1-_1-propoxy samarium, 3-epoxy propyl Oxypropylethyldiethoxylate, 3_glycidoxypropylphenyldimethoxydecane, 3-glycidoxypropylphenyl-ethoxylate Sandane, 3-glycidoxypropylphenyl di-n-propoxydecane, 3-glycidoxypropylphenyldi-i-propoxydecane, 3-epoxypropoxy Propyl phenyl monoethoxy decane, 2-(3,4-epoxycyclohexyl)methyltrimethoxy samarium, 2-(3,4-epoxycyclohexyl)methyltriethoxy Baseline, 2-(3,4-epoxycyclohexyl)methyltri-n-propoxydecane, 2-(3,4-epoxycyclohexyl)methyltriethoxypropane, 2 -(3,4-epoxycyclohexyl)methylmethyldimethoxy oxime, 2-(3,4-epoxycyclohexyl)methylmethyl-ethoxy lanthanum, 2 -(3,4-epoxycyclohexyl)methylmethyldi-η-propoxydecane, 2-(3,4-epoxycyclohexyl)methylmethyldiethoxypropane, 2 (3,4-epoxycyclohexyl)methylethyldimethoxydecane, 2-(3,4-epoxycyclohexyl)methylethyldiethoxydecane, 2-(3,4 -Epoxycyclohexyl)methylethyldi-n-propoxylate, 2-(3,4-cyclohexylcyclohexyl)methylethyl-acetoxy oxane, 2-(3,4 ·Epoxycyclohexyl)methylphenyldimethoxydecane, 2-(3,4-epoxy ring Methylphenyldiethoxydecane, 2-(3,4-epoxycyclohexyl)methylphenyldi-η-propoxydecane, 2-(3,4-epoxycyclohexyl )methylphenyldiethoxydecane' 2-(3,4-epoxycyclohexyl)ethyltrimethoxydecane, 2-(3,4-epoxycyclohexyl)ethyltriethoxy Baseline, 2-(3,4-epoxycyclohexyl)ethyltri-n-propoxydecane, 2-(3,4- -49- 200905264 epoxycyclohexyl)ethyltriethoxycarbonyl Baseline, 2-(3,4-epoxycyclohexyl)ethylmethyldimethoxydecane, 2-(3,4-epoxycyclohexyl)ethylmethyldiethoxydecane, 2 -(3,4-epoxycyclohexyl)ethylmethyldi-η-propoxydecane, 2-(3,4-epoxycyclohexyl)ethylmethyldiethoxypropane, 2 -(3,4-epoxycyclohexyl)ethylethyldimethoxydecane, 2-(3,4-epoxycyclohexyl)ethylethyldiethoxydecane, 2-(3, 4-epoxycyclohexyl)ethylethyldi-η-propoxydecane, 2-(3,4-epoxycyclohexyl)ethylethyldiethoxypropane, 2-(3,4 -Epoxycyclohexyl)ethylphenyldimethoxydecane, 2-(3,4-epoxy Cyclohexyl)ethylphenyldiethoxydecane, 2-(3,4-epoxycyclohexyl)ethylphenyldi-η-propoxydecane, 2-(3,4-epoxy ring Hexyl)ethylphenyldiethoxydecane, 2-(3,4-epoxycyclohexyl)propyltrimethoxydecane, 2-(3,4-epoxycyclohexyl)propyltriethyl Oxydecane, 2-(3,4-epoxycyclohexyl)propyltri-n-propoxydecane, 2-(3,4-epoxycyclohexyl)propyltriethoxypropane, 2-(3,4-epoxycyclohexyl)propylmethyldimethoxydecane, 2-(3,4-epoxycyclohexyl)propylmethyldiethoxydecane, 2-(3 , 4-epoxycyclohexyl)propylmethyldi-η-propoxydecane, 2-(3,4-epoxycyclohexyl)propylmethyldiethoxymethoxydecane, 2-(3 , 4-epoxycyclohexyl)propylethyldimethoxydecane, 2-(3,4-epoxycyclohexyl)propylethyldiethoxydecane, 2-(3,4-ring Oxycyclohexyl)propylethyldi-n-propoxydecane, 2-(3,4-epoxycyclohexyl)propylethyldiethoxydecane, 2-(3,4-ring Oxycyclohexyl) propyl phenyl dimethoxy decane, 2-(3,4-epoxycyclohexane Propyl phenyl diethoxy decane, 2-(3,4-epoxycyclohexyl)propyl phenyl di-η-propoxy decane, 2-(3,4-epoxycyclohexyl) Propyl phenyl di-50- 200905264 ethoxy decane, etc.; specific examples of the compound (1) containing an episulfide group, for example, 2,3-epipropylpropyloxymethyltrimethoxynonane, 2,3 - Epismuthylpropyloxymethyltriethoxy oxime, 2,3-episopropylpropoxymethyltri-n-propoxydecane, 2,3-epipropylpropoxymethyltri- I-propoxydecane, 2,3-epithiopropyloxymethyl triacetate oxylate, 2,3-episopropyloxymethylmethyldimethoxy oxime, 2,3 - epithyl propyloxymethylmethyl diethoxy decane, 2,3 - epithiopropyloxymethylmethyl bis-n-propoxy decane, 2,3-epithiopropoxy Methylmethyldi-i-propoxydecane, 2,3-epithiopropoxymethylmethyldiethoxypropane, 2,3-epithiopropoxydecylethyl Oxy decane, 2,3- thiopropyl hexylmethylethyl diethoxy sulphate ' 2,3 • thiopropyl propoxy ~ 11 propoxy hydrazine; c 兀, 2, 3 - thiol Propoxymethylethyl=propoxy (tetra), 2,3 _ Table thiopropyloxymethylethyl: Ethyloxyk, 2,3-epithiopropoxy-^ 〒 〒 basic group - formazan decane, 2,3-epithiopropoxy Methylphenyl diethoxy (tetra), 2 very poor, glucosylpropyloxymethylpyrrolidine, mono-n-propoxydecane, propoxy..., 2 3*ylpropanyl: thiolpropoxy Methylphenyl dim, 3 thiopropylpropoxymethylbenzene, 2,3-epithiopropoxy ethoxy oxime k-oxyethyl dimethoxy decane, 23w monoethyl Triethoxy decane, 2, episulfhydryl, - epithiopropoxyethyl I- decane, 2,3-epoxypropylethyldi-n-propoxypropoxyethyl Triethyl sulphate '2,3·epithio-methoxy decane, 23-epioxyethyl-methyl, thiolpropoxyethyl-methyl--, 2,3-epi-propyl Oxyethylethyl _ _ ethoxylated thiopropyl propyloxyethyl methyl — ~ oxy decane, 2,3-pigmented base _ ι· propoxy decane, 2 thiopropyl propylene oxide基-51 - 200905264 Ethylmethyldiacetate, 2,3_epithiopropoxyethylethyldimethoxydecane, 2,3-epithiopropoxyethylethyl B Base decane, 21 thiopropylpropoxyethylethyl bis-propoxy (tetra) fluorene, 2,3-epithiopropoxyethylethyl bis-propoxy decane, 2,3-epi-thio Propyloxyethylethyldiethoxylate, 2,3_袠thiopropyloxyethylphenyldimethoxylate, 2,3-epoxypropyloxyethylphenyl Diethoxylate, 2,3_ethiopropyloxyethylphenyloxy (tetra), episulfandyloxyethylphenylpropoxypurine, 2,3 thiopropylpropoxyethyl Phenyl-acetoxylate, 2,3-epoxypropyloxypropyltrimethoxylate, episulfofyloxypropyltriethoxy(tetra), 2,3-epithiopropane Oxyl group III. Propoxygen (tetra) 2, 3_ epithyl propyloxypropyl trisuccinyl oxalate, 2, 3_epithiopropoxypropyltriethoxycarbonyl", & Table sulfur - propoxypropyl methyl group: Methoxy (four), 2, 3 thiopropyl propoxy propyl diethoxy sand, 2, 3-epoxypropyloxypropylmethyldi-n-propoxydecane, 2, 3-epoxypropyloxypropylmethyldipropoxydecane, 2, 3-epoxypropyloxypropylmethyldiethoxypropane, Epithioloxypropylethyl: Methoxy 2, 3• Epithiopropyloxy County B~Ethoxydecane, 2, 3-epoxypropyloxypropylethyldi-decane, 2, 3-Tablee thiopropoxypropylethyl bis-propoxy oxime produced 23 ^ = propyl propyl ethyl ethoxylates a table: Propyl oxy-oxy methoxy decane, 2, 3-epoxypropyloxypropylphenyldiethoxylate, 2, 3-epoxypropyloxypropylphenyl di-n, Oxygen-woven thiophenoxypropyl phenyl dipropoxy oxylate, Sulphur, syloxypropylphenyldiethoxypropane, etc.; -52- 200905264 Specific examples of the oxetane group-containing compound u), for example, '(oxetan-3-yl)methyltrimethoxynonane, (oxetane-3-yl)methyltriethoxydecane, (oxetan-3-yl)methyltri-n-propoxydecane, (oxetane-3-yl)methyltri-i-propoxydecane, (oxetane-3-yl)methyltriethoxypropane, (oxetan-3-yl)methylmethyldimethoxydecane, (oxetan-3-yl)methylmethyldiethoxydecane, (oxetan-3-yl)methylmethyldi-n-propoxydecane, (oxetan-3-yl)methylmethyldi-i-propoxydecane, (oxetan-3-yl)methylmethyldiethoxy decane, (oxetane-3-yl)methylethyldimethoxydecane, (oxetane-3-yl)methylethyldiethoxydecane, (oxetane-3-yl)methylethyldi-n-propoxydecane, (oxetan-3-yl)methylethyldi-i-propoxydecane, (oxetane-3-yl)methylethyldiethoxypropane, (oxetane-3-yl)methylphenyldimethoxydecane, (oxetane-3-yl)methylphenyldiethoxydecane, (oxetane-3-yl)methylphenyl di-n-propoxydecane, (oxetan-3-yl)methylphenyldi-i-propoxydecane, (oxetan-3-yl)methylphenyldiethoxy decane '(oxetan-3-yl)ethyltrimethoxy decane, (oxetane-3-yl)ethyltriethoxydecane, (oxetan-3-yl)ethyltri-n-propoxydecane, (oxetan-3-yl)ethyltri-i-propoxydecane, (oxetan-3-yl)ethyltriethoxycarbonyl decane, (oxetan-3-yl)ethylmethyldimethoxydecane, (oxetan-3-yl)ethylmethyldiethoxydecane, (oxetan-3-yl)ethylmethyldi-n-propoxydecane, (oxetan-3-yl)ethylmethyldi-i-propoxydecane, (oxetan-3-yl)ethylmethyldiethoxycarbonyl 矽-53- 200905264 alkane, (oxetan-3-yl)ethylethyldimethoxydecane, (oxetan-3-yl)ethylethyldiethoxydecane, (oxetan-3-yl)ethyldi-n-propoxydecane, (oxetan-3-yl)ethylethyldi-i-propoxydecane, (oxetan-3-yl)ethylethyldiethoxycarbonyl decane, (oxetane-3-yl)ethylphenyldimethoxydecane, (oxetan-3-yl)ethylphenyldiethoxydecane, (oxetane-3-yl)ethylphenyldi-n-propoxy litter, (oxetan-3-yl)ethylphenyl-I-propoxydecane, (oxetan-3-yl)ethylphenyldiethoxycarbonyl decane, (oxetan-3-yl)propyltrimethoxydecane, (oxetane-3-yl)propyltriethoxydecane, (oxetan-3-yl)propyltri-n-propoxydecane, (oxetan-3-yl)propyltri-i-propoxydecane, (oxetane-3-yl)propyltriethoxypropane, (oxetan-3-yl)propylmethyldimethoxydecane, (oxetan-3-yl)propylmethyldiethoxydecane, (oxetan-3-yl)propylmethyldi-n-propoxy fluorene, (oxetane-3-yl)propylmethyldi-i-propoxydecane, (oxetan-3-yl)propylmethyldiethoxydecane, (oxetan-3-yl)propylethyldimethoxydecane, (oxetan-3-yl)propylethyldiethoxy decane, (oxetan-3-yl)propylethyldi-n-propoxy fluorene, (oxetan-3-yl)propylethyldi-i-propoxydecane, (oxetan-3-yl)propylethyldiethoxypropane, (oxetane-3-yl) propyl phenyl dimethoxy decane, (oxetan-3-yl)propylphenyldiethoxydecane, (oxetan-3-yl)propylphenyl bis-n-propoxy sand court, (oxetan-3-yl)propylphenyldi-i-propoxydecane, (oxetan-3-yl)propylphenyldiethoxypropane, (3-methyloxetane-54- 200905264 alk-3-yl)methyltrimethoxydecane, (3_Methyloxetane-3-yl)methyltriethoxylate, (3-methyloxetan-3-yl)methyltri-n-propoxydecane, (3-methyloxetane-3-yl)methyltri-i-propoxydecane, (3-methyloxetane-3-yl)methyltriethoxypropane, (3_methyloxetan-3-yl)methylmethyldimethoxydecane, (3-methyloxacyclobutane-3-yl)methylmethyldiethoxydecane, (3 _methyloxetan-3-yl)methylmethyldi-n-propoxydecane, (3 _methyloxetane-3-yl)methylmethyldi-i-propoxydecane, (3-methyloxetan-3-yl)methylmethyldiethoxypropane, (3_methyloxetane_3_yl)methylethyldimethoxydecane, (3-methyloxetane-3-yl)methylethyldiethoxydecane, (3-methyloxetane-3-yl)methylethyldi-n-propoxydecane, (3-methyloxetan-3-yl)methylethyldi·ί_propoxydecane, (3-methyloxetan-3-yl)methylethyldiethoxycarbonyl 、, (3-methyloxetan-3-yl)methylphenyldimethoxylate' (3-methyloxetan-3-yl)methylphenyldiethoxydecane , (3_methyloxetan-3-yl)methylphenyl bis-n-propoxy decane, (3-methyloxetan-3-yl)methylphenyldi-i-propoxydecane, (3-methyloxacyclobutane-3-yl)methylphenyldiethyloxylate sand pot, (3-methyloxetan-3-yl)ethyltrimethoxydecane, (3-methyloxetan-3-yl)ethyltriethoxydecane, (3_methyloxetane-3-yl)ethyltri-n-propoxydecane, (3-methyloxetan-3-yl)ethyltri-i-propoxydecane, (3-methyloxetane-3-yl)ethyltriethoxypropane, (3. methyl oxetane-3-yl)ethylmethyldimethoxydecane, (3-methyloxacyclobutane-3-yl)ethylmethyldiethoxydecane, (3-methyloxetan-55- 200905264 alk-3-yl)ethylmethyldi-n-propoxydecane, (3-methyloxetane-3-yl)ethylmethyldi-b-propoxy litter, (3_Methyloxetan-3-yl)ethylmethyldiethoxylate, (3-methyloxetan-3-enyl)ethylethyldimethoxydecane, Methyl oxetane-3-yl)ethylethyl diethoxy decane, (3-methyloxetan-3-yl)ethylethyldi-n-propoxydecane, (3-methyloxetan-3-yl)ethylethyldi-i-propoxydecane, (3-methyloxetan-3-yl)ethylethyldiethoxycarbonyl decane, (3-methyloxetan-3-yl)ethylphenyldimethoxydecane, (3-methyloxetan-3-yl)ethylphenyldiethoxydecane, (3-methyloxindolecyclobutane-3-yl)ethylphenyldi-n-propoxydecane, (3-methyloxetan-3-yl)ethylphenyldi-i-propoxydecane, (3-methyloxacyclobutane)ethylphenyldiethoxypropane, (3-methyloxetan-3-yl)propyltrimethoxydecane, (3-methyloxetan-3-yl)propyltriethoxylate, (3-methyloxetan-3-yl)propyltri-n-propoxydecane, (3-methyloxetane-3-yl)propyl tris-propoxy decane, (3-methylacetoin--3-yl) propyl diacetate oxalate, (3-methyloxetane-3-yl)propylmethyldimethoxydecane, (3-methyloxacyclobutane-3-yl)propylmethyldiethoxydecane, (3 _methyloxetan-3-yl)propylmethyldi-n-propoxydecane, (3_methyloxetane-3-yl)propylmethyldi-i-propoxydecane, (3_methyloxetane_3_yl)propylmethyldiethoxypropane, (3-methyloxetan-3-yl)propylethyldimethoxydecane, (3-methyloxetane-3-yl)propylethyldiethoxydecane, (3-methyloxetane-3-yl)propylethyldi-n-propoxydecane, (3-methyloxetane-3-yl)propylethyldi-i-propoxy-56- 200905264 decane, (3-methyloxetan-3-yl)propylethyldiethoxycarbonyl decane, (3-methyloxetane-3-yl)propylphenyldimethoxydecane, (3-methyloxetan-3-yl)propylphenyldiethoxydecane, (3-methyloxetan-3-yl)propylphenyldi-n-propoxydecane, (3-methyloxetan-3-yl)propylphenyldi-i-propoxydecane, (3-methyloxacyclobutane-3.yl)propylphenyldiethoxypropane, (3-ethyloxetan-3-yl)methyltrimethoxydecane, (3-ethyloxetan-3-yl)methyltriethoxydecane, (3-ethyloxetan-3-yl)methyltri-n-propoxydecane, (3-ethyloxetan-3-yl)methyltri-i-propoxydecane, (3-ethyloxetan-3-yl)methyltriethoxypropane, (3-ethyloxetan-3-yl)methylmethyldimethoxydecane, (3-ethyloxacyclobutane-3-yl)methylmethyldiethoxydecane, (3-ethyloxetan-3-yl)methylmethyldi-n-propoxydecane, (3-ethyloxetane-3-yl)methylmethyldi-i-propoxydecane, (3-ethyloxet-3-yl)methylmethyldiethoxypropane, (3-Ethyloxetane-3-yl)methylethyldimethoxy sand, (3-ethyloxetan) methylethyl diethoxy decane, (3-ethyloxetan-3-yl)methylethyldi-n-propoxydecane, (3-ethyloxetan-3-yl)methylethyldi-i-propoxydecane, (3-ethyloxetan-3-yl)methylethyldiethoxycarbonyl decane, (3-ethyloxetan-3-yl)methylphenyldimethoxydecane, (3-ethyloxetan-3-yl)methylphenyldiethoxydecane, (3. ethyl oxetane-3-yl)methylphenyl bis- η-propoxy decane, (3-ethyloxetan-3-yl)methylphenyldi-i-propoxydecane, (3_Ethyloxacyclobutane-3-yl)methylphenyldiethoxypropane, (3. Ethyloxetane-57- 200905264 alk-3-yl)ethyltrimethoxydecane, (3-ethyloxet-3-yl)ethyltriethoxydecane, (3-ethyloxet-3-yl)ethyltri-n-propoxydecane, (3-ethyloxet-3-yl)ethyltri-i-propoxydecane, (3_ethyloxetan-3-yl)ethyltriethoxypropane, 〇-Ethyl oxetane-3-yl)ethylmethyldimethoxydecane, (3-ethyloxacyclobutane-3-yl)ethylmethyldiethoxydecane, (3-ethyloxetan-3-yl)ethylmethyldi-n-propoxydecane, (3-ethyloxetane-3-yl)ethylmethyldi-i-propoxy litter, (3-Ethyloxetane-3-yl)ethylmethyldiethyloxylate, (3-Ethyloxazeridin-3-indolyl) ethylethyl-methoxy sand, (3-Ethyloxyindole ring- 3 -yl)ethylethyl diethoxy sand pot, (3-ethyloxetan-3-yl)ethylethyl-n-propoxydecane, (3-ethyloxetan-3-yl)ethylethyldi-i-propoxydecane, (3-ethyloxetane-3-yl)ethylethyldiethoxycarbonyl decane, (3-ethyloxetane-3-yl)ethylphenyldimethoxydecane, (3-ethyloxetane-3-yl)ethylphenyldiethoxydecane, (3-ethyloxetan-3-yl)ethylphenyldi-n-propoxydecane, (3-ethyloxetan-3-yl)ethylphenyldi-i-propoxydecane, (3-ethyloxacyclobutane-3-yl)ethylphenyldiethoxypropane, (3-ethyloxetan-3-yl)propyltrimethoxydecane, (3-ethyloxetan-3-yl)propyltriethoxydecane, (3-ethyloxetan-3-yl)propyltri-n-propoxydecane, (3-ethyloxetan-3-yl)propyltri-i-propoxydecane, (3-ethyloxetan-3-yl)propyltriethoxypropane, (3-ethyloxetan-3-yl)propylmethyldimethoxydecane, (3-ethyloxacyclobutane-3-yl)propylmethyldiethoxydecane, (3-ethyloxetane-58- 200905264 alk-3-yl)propylmethyldi-n-propoxydecane, (3_ethyloxetan-3-yl)propylmethyldi-i-propoxydecane, (3-ethyloxetan-3-yl)propylmethyldiethoxypropane, (3-ethyloxetan-3-yl)propylethyldimethoxydecane' (3-ethyloxetan-3-yl)propylethyldiethoxydecane, (3-ethyloxet-3-yl)propylethyldi-n-propoxydecane, (3-ethyloxetan-3-yl)propylethyldi-i-propoxydecane, (3-ethyloxetan-3-yl)propylethyldiethoxycarbonyl decane, (3-ethyloxetan-3-yl)propylphenyldimethoxydecane, (3-ethyloxetan-3-yl)propylphenyldiethoxydecane, (3-Ethyloxetane-3-yl)propylphenyl-_n-propoxy sand, (3-ethyloxetan-3-yl)propylphenyldi-i-propoxydecane, (3-ethyloxacyclobutane-3-yl)propylphenyldiethoxymethoxydecane, etc.; Specifically, for example, 'vinyl trimethoxy decane, the vinyl group-containing compound (1), Vinyl triethoxy decane, Vinyl tri-n-propoxydecane, Vinyl tri-i-propoxydecane, B storage base triethoxy decane, Ethyl tris(methoxyethoxy) sand yard, Ethyl methyl dimethoxy cough, Ethylene methyl diethoxy decane, Vinylmethyldipropoxydecane, Vinylmethyldi-i-propoxy sand sand, Ethylmethyldiethoxylate sand chamber, Vinyl ethyl dimethoxy brothel, Ethyl ethylene diethoxy sand yard, Vinylethyldi-n-propoxy fluorene, Ethyl ethiono-di-anthracene-propoxy cetane, Vinyl ethyl diacetoxy chopping, B-ethylidene bis(methoxyethoxy)decane, Vinyl phenyl dimethoxy sand, Vinyl phenyl diethoxy decane, Vinyl phenyl di-n-propoxy sand, Ethylphenyl di-i-propoxydecane, Vinyl phenyl diethoxylate B-phenylbenzene -59- 200905264 bis(methoxyethoxy)decane, etc.; Specifically, for example, 'allyltrimethoxydecane, the allyl group-containing compound (1), Allyl triethoxy decane, Allyl tri-n-propoxydecane, Allyl tri-i-propoxydecane, Allyl triethoxy decane, Allyl tris(methoxyethoxy)decane, Allyl methyl dimethoxy decane, Allylmethyldiethoxy decane, Allylmethyldi-n-propoxydecane, Allylmethyldi-i-propoxydecane, Allylmethyldiethoxydecane, Allylethyldimethoxydecane, Allylethyl diethoxy decane, Allylethyl di-n-propoxydecane, Allylethyl di-i-propoxy decane, Allylethyldiethoxydecane, Allylethyl bis(methoxyethoxy)decane, Allyl phenyl dimethoxy decane, Allyl phenyl diethoxy decane, Allylphenyl di-η-propoxydecane, Allylphenyl di-i-propoxydecane, Allyl phenyl diethoxy decane, Allyl phenyl bis(methoxyethoxy)decane, etc.; Specific examples of the compound (1) containing a (meth) acrylonitrile group, for example, 3-(methyl)-propionyl-mercaptomethyltrimethoxy sand, 3-(methyl)propanyl methoxymethyltriethoxy decane, 3-(methyl)propenylmethyltris-n-propoxydecane, 3_ (meth)acryloylmethyltri-i-propoxydecane, 3-(methyl)propenylmercaptomethyltriethoxypropane, 3-(methyl)propenylmethylmethyldimethoxydecane, 3-(methyl)propenylmethylmethyldiethoxydecane, 3-(methyl)propenylmethylmethyldi-n-propoxydecane, 3-(methyl)propenylmethylmethyldi-i-propoxydecane, 3-(methyl)propenylmethylmethyldiethoxypropane, 3-(methyl)propenylmethylethyldimethoxydecane, 3-(methyl)propenylmethylethyldiethoxydecane, 3-(methyl)-60- 200905264 Acrylmethylethyldi-n-propoxydecane, 3-(Methyl)propenylmethylethyl di-i-propoxy cleavage, 3-(methyl)propanol methylethyldiethyl decyloxydecane ' 3-(methyl)propenylmethylphenyl dimethoxy decane, 3-(methyl)propenylmethylphenyldiethoxydecane, 3-(methyl)propene fluorenylmethylphenyl di-n-propoxy decane, 3-(Methyl)propenylmethylphenyl-I-propoxylate sand, 3-(methyl) propyl benzyl methyl phenyl diethoxy decane, 3-(methyl)propenylethyltrimethoxydecane, 3-(methyl) propyl anthracyl ethyl diethoxy sand pot, 3-(methyl)-propyl-decyl-ethyltri-n-propoxydecane, 3-(methyl)propenylethyltri-i-propoxydecane, 3-(methyl)propenylethyltriethoxypropane' 3-(methyl)propenylethylmethyldimethoxydecane, 3-(methyl)propenylethylmethyldiethoxylate Shi Xiyuan, 3-(methyl)-propyl decyl-ethylmethyldi-n-propoxy sand, 3-(methyl)propenylethylethyldi-i-propoxydecane, 3-(methyl)propene fluorenylethylmethyldiethoxy decane, 3-(methyl)propenylethylethyldimethoxydecane, 3-(methyl)acryloylethylethyl diethoxy decane, 3-(methyl)propenylethylethyldi-n-propoxydecane, 3-(methyl)propanyl ethyl ethyl di-i-propoxy sand, 3-(methyl)allyl hydrazinylethylethyldiethoxy decane, 3-(methyl)propenylethyl phenyl dimethoxy decane, 3-(methyl)propenylethylphenyldiethoxydecane, 3-(methyl)propenylethylphenyldi-n-propoxydecane, 3_(methyl)acryloylethylphenyldi-i-propoxydecane, 3-(methyl)propenylethyl phenyldiethoxy decane, 3-(methyl)propenylpropyltrimethoxy decane, 3-(methyl)propenyl propyl triethoxy decane, 3_(Methyl)propenylpropyltris-n-propoxydecane, 3-(methyl)propenyl propyl tris-i- -61 - 200905264 propoxy decane, 3-(methyl)propenylpropyltriethoxypropane, 3_(methyl)propenylpropylmethyldimethoxydecane, 3-(methyl)propenyl propylmethyldiethoxy decane, 3-(methyl)propenylpropylmethyldi-n-propoxydecane, 3-(methyl)propenylpropylmethyldi-i-propoxydecane, 3-(methyl)propenyl propylmethyldiethoxy decane, 3_(methyl) propylene propyl propyl ethyl dimethoxy decane, 3-(methyl)propenyl propyl ethyl diethoxy decane, 3-(methyl)propenylpropylethyldi-n-propoxydecane, 3-(methyl)propenylpropylethyldi-i-propoxydecane, 3-(methyl)propenylpropylethyldiethoxypropane, 3-(methyl)propenyl propyl phenyl dimethoxy decane, 3-(methyl)propenyl propyl phenyl diethoxy decane, 3-(methyl)propenylpropylphenyldi-η-propoxydecane, 3-(methyl)propenylpropylphenyldi-i-propoxydecane, 3-(methyl) acrylamidopropyl phenyldiethoxy decane, etc.; Specific examples of the compound (1) having a carboxyl group, for example, Carboxymethyltrimethoxydecane, Carboxymethyltriethoxydecane, Carboxymethyltri-n-propoxydecane, Carboxymethyltri-i-propoxydecane, Carboxymethyltriethoxydecane, Carboxymethyltris(methoxyethoxy)decane, Carboxymethylmethyldimethoxydecane, Carboxymethylmethyldiethoxydecane, Carboxymethylmethyl di-n-propoxydecane, Carboxymethylmethyldi-i-propoxydecane, Carboxymethylmethyldiethoxydecane, Carboxymethylethyldimethoxydecane, Carboxymethylethyldiethoxydecane, Carboxymethylethyl di-n-propoxy decane, Carboxymethylethyldi-i-propoxydecane, Carboxymethylethyldiethoxydecane, Carboxymethylethyl bis(methoxyethoxy)decane, Carboxymethylphenyldimethoxydecane, Carboxymethylphenyldiethoxydecane 'carboxy-62- 200905264 methylphenyldi-n-propoxydecane, Carboxymethylphenyl di-i-propoxy decane, Carboxymethylphenyldiethoxydecane, Carboxymethylphenyl bis(methoxyethoxy)decane, 2-carboxyethyltrimethoxydecane, 2-carboxyethyltriethoxydecane, 2-carboxyethyltri-n-propoxydecane, 2-carboxyethyltri-i-propoxydecane, 2-carboxyethyltriethoxydecane, 2-carboxyethyltris(methoxyethoxy)decane, 2-carboxyethylmethyldimethoxy decane, 2-carboxyethylmethyldiethoxydecane, 2-carboxyethylmethyldi-η-propoxydecane, 2-carboxyethylmethyldi-i-propoxydecane, 2-carboxyethylmethyldiethoxydecane, 2-carboxyethylethyldimethoxy decane, 2-carboxyethylethyldiethoxydecane, 2-carboxyethylethyl di-η-propoxydecane, 2-carboxyethylethyldi-i-propoxydecane, 2-carboxyethylethyldiethoxydecane, 2-carboxyethylethyl bis(methoxyethoxy) sand yard, 2-resyl ethyl group methoxy sand courtyard, 2-resin ethyl phenyl diethoxy decane, 2. Carboxyethylphenyl di-n-propoxydecane, 2-carboxyethylphenyldi-i-propoxydecane, 2-carboxyethyl phenyl diethoxylate, 2 - mercaptoethylphenyl-(methoxyethoxy) chopping%» Specifics of the compound containing a hydroxyl group (1) For example, Hydroxymethyltrimethoxydecane, Hydroxymethyltriethoxydecane, Hydroxymethyltri-n-propoxy decane, Hydroxymethyltri-i-propoxydecane, Hydroxymethyltriethoxydecane, Hydroxymethyltris(methoxyethoxy)decane, Hydroxymethylmethyldimethoxydecane, Hydroxymethylmethyldiethoxydecane, Hydroxymethylmethyl di-n-propoxydecane, Hydroxymethylmethyldi-i-propoxydecane, Hydroxymethylmethyldiethoxydecane, Hydroxymethylethyldimethoxydecane, -63- 200905264 hydroxymethylethyldiethoxydecane, Hydroxymethylethyl di-n-propoxy decane, Hydroxymethylethyldi-i-propoxydecane, Hydroxymethylethyldiethoxydecane, Hydroxymethylethyl bis(methoxyethoxy)decane, Hydroxymethylphenyl dimethoxy decane, Hydroxymethylphenyl diethoxy decane, Hydroxymethylphenyl di-n-propoxydecane, Hydroxymethylphenyl di-i-propoxy decane, Hydroxymethylphenyldiethoxymethoxydecane, Hydroxymethylphenyl bis(methoxyethoxy)decane, 2-hydroxyethyl ester trimethoxy decane, 2-hydroxyethyl ester triethoxy decane, 2-hydroxyethyl ester tri-n-propoxy decane, 2-hydroxyethyl ester tri-i-propoxy decane, 2-hydroxyethyltriethyloxydecane, 2-hydroxyethyl tris(methoxyethoxy)decane, 2-hydroxyethyl methyl dimethoxy decane, 2-hydroxyethyl ester methyl diethoxy decane, 2-hydroxyethyl methyl di-η-propoxy decane, 2-hydroxyethyl methyl di-i-propoxy decane, 2-hydroxyethyl methyldiethoxy decane, 2-hydroxyethyl ethyl dimethoxy decane, 2-hydroxyethyl ethyl diethoxy decane, 2-hydroxyethylethyldi-n-propoxydecane, 2-hydroxyethylethyldi-i-propoxydecane, 2-hydroxyethyl ester ethyldiethoxy decane, 2-hydroxyethyl ester ethyl bis(methoxyethoxy)decane, 2-hydroxyethyl phenyl dimethoxy decane, 2-hydroxyethyl phenyl diethoxy decane, 2-hydroxyethyl phenyl di-n-propoxy decane, 2-hydroxyethyl phenyl di-i-propoxy decane, 2-hydroxyethyl phenyldiethoxy decane, 2-hydroxyethyl phenyl bis(methoxyethoxy) decane, 3-hydroxypropyl ester trimethoxy decane, 3-hydroxypropyl ester triethoxy decane, 3-hydroxypropyl ester tri-n-propoxy decane, 3-hydroxypropyl ester tri-i-propoxy decane, 3-hydroxypropyl ester, triethoxydecane, 3-hydroxypropyl tris(methoxyethoxy)decane, 3-hydroxypropyl methyl dimethoxy decane, 3-hydroxypropyl ester methyl diethoxy decane, 3-hydroxypropyl ester methyl di-η-propoxy decane, 3-hydroxypropyl ester methyl di-i-propoxy-64 - 200905264 decane, 3-hydroxypropyl ester methyl diethoxy decane, 3-hydroxypropyl ester ethyl dimethoxy decane, 3-hydroxypropyl ester ethyl diethoxy decane, 3-hydroxypropyl ester ethyl di-n-propoxy decane, 3-hydroxypropyl ester ethyl di-i-propoxy decane, 3-hydroxypropyl ethyl ethane ethoxy decane, 3-hydroxypropyl ester ethyl bis(methoxyethoxy) decane, 3-hydroxypropyl phenyl dimethoxy decane, 3-hydroxypropyl phenyl diethoxy decane, 3-hydroxypropyl phenyl di-η-propoxy decane, 3-hydroxypropyl phenyl di-i-propoxy decane, 3-hydroxypropyl phenyl diethoxy decane, 3-hydroxypropyl phenyl bis(methoxyethoxy) decane, 4-hydroxy-(p-hydroxyphenylcarbonyloxy)benzyltrimethoxydecane, 4-hydroxy-(p-hydroxyphenylcarbonyloxy)benzyltriethoxydecane, 4-hydroxy-(p-hydroxyphenylcarbonyloxy)benzyltri-n-propoxydecane, 4-hydroxy-(p-hydroxyphenylcarbonyloxy)benzyltri-i-propoxydecane, 4-hydroxy-(ρ-hydroxyphenylcarbonyloxy)benzyltriethoxynonoxane, 4-hydroxy-(p-hydroxyphenylcarbonyloxy)benzyltris(methoxyethoxy)decane, 4-hydroxy-(ρ-hydroxyphenylcarbonyloxy)benzylmethyldimethoxydecane, 4-hydroxy-(ρ-hydroxyphenylcarbonyloxy)benzylmethyldiethoxydecane, 4-hydroxy-(ρ-hydroxyphenylcarbonyloxy)benzylmethyldi-n-propoxydecane, 4-hydroxy-(ρ-hydroxyphenylcarbonyloxy)benzylmethyldi-i-propoxydecane, 4-hydroxy-(ρ-hydroxyphenylcarbonyloxy)benzylmethyldiethyl broth 4 - mercapto-(ρ - via basic phenyloxy) decylethyl-methoxy decane, 4-hydroxy-(ρ-hydroxyphenylcarbonyloxy)benzylethyldiethoxydecane, 4-hydroxy-(ρ-hydroxyphenylcarbonyloxy)benzylethyldi-η-propoxy samarium, 4-Hydroxy-(p-pyridylphenyloxy)-glycolylethyl--i-propoxy oxime, 4-hydroxy-(p-pyridylphenylenayloxy)-glycolylethyl-•ethyl oxydecane, 4-hydroxy-(ρ-hydroxyphenylcarbonyloxy)benzylethyl bis(methyl-65-200905264 oxyethoxy) chopping, 4-diameter-(p-pyridylphenyloxy)oxyphenyldimethoxydecane, 4-hydroxy-(p-hydroxyphenylcarbonyloxy)benzylphenyldiethoxydecane, 4-hydroxy-(p-hydroxyphenylcarbonyloxy)benzylphenyl di-η-propoxy litter, 4-Hydroxy-(p-o-phenylphenylcarbooxy)phenyl bis-i-propoxydecane, 4-hydroxy-(indolyl-hydroxyphenylcarbonyloxy)benzylphenyldiethoxydecane, 4-hydroxy-indole)-hydroxyphenylcarbonyloxy)benzylphenylbis(methoxyethoxy)decane; Specific examples of the compound (1) containing a thiol group, such as 'hydrothiomethyl methyl methoxy decane, Hydrogenthiomethyl triethoxy decane, Hydrogenthiomethyltri-n-propoxydecane, Hydrogenthiomethyltripropoxydecane, Hydrogenthiomethyltriethoxypropane, Hydrogenthiomethyltris(methoxyethoxy)decane, Hydrogenthiomethylmethyldimethoxydecane, Hydrogenthiomethylmethyldiethoxy decane, Hydrogenthiomethylmethyldi-n-propoxydecane, Hydrogenthiomethylmethyl di-i-propoxydecane, Hydrogenthiomethylmethyldiethoxypropane, Hydrogenthiomethylethyldimethoxydecane, Hydrogenthiomethylethyldiethoxydecane, Hydrogenthiomethylethyldi-n-propoxydecane, Hydrogenthiomethylethyldi-i-propoxydecane, Hydrogenthiomethylethyldiethoxypropane, Hydrogenthiomethylethyl bis(methoxyethoxy)decane, Hydrogenthiomethyl phenyl dimethoxy stone shed, Chlorothiomethylphenyl-ethoxylate sand, Nitrothiomethylphenyl di-η-propoxydecane, Hydrogenthiomethylphenyl di-i-propoxydecane, Hydrogenthiomethylphenyldiethoxydecane, Hydrogenthiomethylphenyl bis(methoxyethoxy)decane, 2-hydrothioethyltrimethoxydecane, 2-hydrogenthioethyl triethoxy decane, 2. Hydrogenthioethyltri-n-propoxydecane, 2-hydrothioethyltri-i-propoxydecane, 2-Hydroxythioethyltriethoxymethoxydecane -66- 200905264 2-hydrothioethyltris(methoxyethoxy)decane, 2-Hydroxythioethylmethyldimethoxydecane, 2-Hydroxythioethylmethyldiethoxydecane, 2_hydrothioethylmethyldi-n-propoxydecane, 2-Hydroxythioethylmethyldi-i-propoxydecane, 2-hydrothioethylmethyldiethoxypropane, 2-Hydroxythioethylethyldimethoxydecane, 2-hydrothioethylethyldiethoxy decane, 2-Homothioethylethyldi-n-propoxydecane, 2-Homothioethylethyldi-i-propoxydecane, 2_Hexylthioethylethyldiethoxypropane, 2-hydrothioethylethyl bis(methoxyethoxy)decane, 2-hydrothioethyl phenyl dimethoxy decane, 2-Hexylthioethylphenyldiethoxydecane, 2-hydrothioethylphenyldi-n-propoxydecane, 2-Hexylthioethylphenyldi-i-propoxydecane, 2-Hydroxythioethylphenyldiethoxypropane, 2-hydrothioethylphenyl bis(methoxyethoxy)decane, 3-Hydroxypropylpropyltrimethoxydecane, 3-Hydroxypropylpropyltriethoxydecane, 3-Hydroxythiopropyltri-n-propoxydecane, 3-Hydroxythiopropyltri-i-propoxydecane, 3-Hydroxypropyltriethoxymethoxydecane, 3_Hexylthiopropyltris(methoxyethoxy)decane, 3-hydrothiopropylmethyldimethoxydecane, 3-Hydroxythiopropylmethyldiethoxydecane, 3-Hydroxythiopropylmethyldi-n-propoxydecane, 3-Hydroxythiopropylmethyldi-i-propoxydecane, 3-Hydroxythiopropylmethyldiethoxydecane, 3-Hydroxypropylpropyldimethoxydecane, 3-hydrothiopropylethyldiethoxydecane, 3-Hydroxythiopropylethyldi-n-propoxydecane, 3-Hydroxythiopropylethyldi-i-propoxydecane, 3-hydrothiopropylethyldiethoxypropane, 3-Hydroxythiopropylethylbis(methoxyethoxy)decane, 3-Hydroxypropylpropyl phenyl dimethoxy decane, 3-Hydroxypropylpropyl phenyldiethoxy sulfate ' 3 -Homothiopropyl propyl bis η · propyl -67- 200905264 oxoxane, 3-hydrothiopropylphenyldi-i-propoxydecane, 3-hydrothiopropyl propyl diethoxy decane, 3-hydrothiopropylphenyl bis(methoxyethoxy)decane, etc.; Specific examples of the compound (1) containing an isocyanate group, for example, Isocyanuric acid methyltrimethoxydecane, Isocyanate methyl triethoxy decane, Isocyanate methyltri-n-propoxydecane, Isocyanate methyl tri-i-propoxy sand sand, Isocyanate methyltriethoxy decane, Isocyanate methyltris(methoxyethoxy)decane, Isocyanate methylmethyldimethoxydecane 'isocyanate methylmethyldiethoxydecane, Isocyanate methylmethyldi-n-propoxy decane, Isocyanate methylmethyldi-i-propoxydecane, Isocyanate methylmethyldiethoxy decane, Isocyanate methyl ethyl dimethoxy decane, Isocyanate methyl ethyl diethoxy decane, Isocyanate methyl ethyl di-n-propoxy decane, Isocyanate methylethyl dipropoxy decane, Isocyanate methyl ethyl diethoxy decane, Isocyanate methyl ethyl bis(methoxyethoxy) decane, Isocyanate methylphenyl dimethoxy decane, Isocyanate methylphenyl diethoxy decane, Isocyanate methylphenyl bis-n-propoxy decane, Isocyanate methylphenyl di-i-propoxydecane, Isocyanate methylphenyl diethoxy decane, Isocyanate methylphenyl bis(methoxyethoxy)decane, 2-isocyanate ethyltrimethoxydecane, 2-isocyanate ethyltriethoxydecane, 2-isocyanate ethyltri-n-propoxy decane, 2-isocyanate ethyl tri-i-propoxydecane, 2·Isocyanate ethyl triethoxylate chopping, 2-isocyanate ethyl tris(methoxyethoxy)sand 2-isocyanate ethylmethyldimethoxydecane, 2-isocyanate ethyl methyldiethoxy decane, 2-Iocyanate ethylmethyldi-n-propoxydecane -68- 200905264 2-isocyanate ethylmethyldi-i-propoxydecane, 2-isocyanate ethyl methyldiethoxy decane, 2-isocyanate ethylethyldimethoxydecane, 2-isocyanate ethylethyl diethoxy decane, 2-isocyanate ethylethyldi-n-propoxydecane, 2_isocyanate ethylethyldi-i-propoxydecane, 2-isocyanate ethylethyldiethoxy decane, 2_isocyanate ethyl bis(methoxyethoxy)decane, 2-isocyanate ethylphenyl dimethoxy decane, 2-isocyanate ethylphenyl diethoxy decane, 2-isocyanate ethylphenyl di-n-propoxydecane, 2-isocyanate ethylphenyl di-i-propoxy decane, 2-isocyanate ethylphenyldiethoxy decane, 2-isocyanate ethylphenyl bis(methoxyethoxy)decane, 3-isocyanate propyl trimethoxy sand court, 3-isocyanate propyl diethoxy sand pot, 3-isocyanate propyl tri-n-propoxy decane, 3-isocyanate propyl tri-i-propoxy decane, 3-isocyanate propyl triethoxy decane, 3-isocyanate propyl tris(methoxyethoxy)decane, 3-isocyanate propylmethyldimethoxydecane, 3-isocyanate propylmethyldiethoxy decane, 3-isocyanate propylmethyldi-n-propoxy decane, 3-isocyanate propylmethyldi-i-propoxy decane, 3-isocyanate propylmethyldiethoxy decane, 3-isocyanate propylethyldimethoxydecane, 3-isocyanate propylethyldiethoxy decane, 3-isocyanate propylethyldi-n-propoxydecane, 3-isocyanate propyl ethyldi-i-propoxy decane, 3-isocyanate propyl ethyldiethoxy decane, 3-isocyanate propylethyl bis(methoxyethoxy)decane, 3-isocyanate propyl phenyl dimethoxy decane, 3-isocyanate propyl phenyldiethoxy decane, 3-isocyanate propyl phenyl di-η-propoxy decane, 3-isocyanate propyl phenyl di-i-propoxy decane, 3-Isocyanate propyl phenyldiethyl hydrazine -69- 200905264 Oxygen sand yard, 3-Acetopropyl propyl phenyl mono(methoxyethoxy) litre house, etc. » Specific examples of the amine group-containing compound (1), for example, 'aminomethyltrimethoxy decane, Aminomethyltriethoxydecane, Aminomethyltri-n-propoxy decane, Aminomethyltri-i-propoxydecane, Aminomethyltriethoxydecane, Aminomethyltris(methoxyethoxy)decane, Aminomethylmethyldimethoxydecane, Aminomethylmethyldiethoxydecane, Aminomethylmethyl di-n-propoxydecane, Aminomethylmethyldi-i-propoxydecane, Aminomethylmethyldiethoxydecane, Aminomethylethyldimethoxydecane, Aminomethylethyldiethoxydecane, Aminomethylethyldi-η-propoxy decane, Aminomethylethyldi-i-propoxydecane, Aminomethylethyldiethyl decyloxydecane, Aminomethylethyl bis(methoxyethoxy)decane, Aminomethylphenyldimethoxydecane, Aminomethylphenyldiethoxydecane, Aminomethylphenyl di-n-propoxydecane, Aminomethylphenyl dipropoxy decane, Aminomethylphenyldiethoxydecane, Aminomethylphenyl bis(methoxyethoxy)decane, 2_Aminoethyltrimethoxydecane, 2-aminoethyl triethoxy decane, 2-aminoethyltri-n-propoxydecane, 2-aminoethyltri-i-propoxydecane, 2_Aminoethyltriethoxypropane, 2-aminoethyltris(methoxyethoxy)decane, 2-aminoethylmethyldimethoxy decane, 2-aminoethylmethyldiethoxydecane, 2-aminoethylmethyldi-n-propoxydecane, 2-aminoethylmethyldi-i-propoxydecane, 2-aminoethylmethyldiethoxymethoxydecane, 2-aminoethylethyldimethoxy, Shi Xiyuan, 2-Aminoethylethyl diethoxy sand pot, 2-aminoethylethyl di-n-propoxydecane, 2-aminoethylethyldi-i-propoxydecane, 2--70- 200905264 Aminoethylethyldiethoxydecane, 2-aminoethylethyl bis(methoxyethoxy)decane, 2-aminoethyl phenyl dimethoxy decane, 2-aminoethyl phenyl diethoxy decane, 2-aminoethylphenyldi-η-propoxydecane, 2-aminoethylphenyldi-i-propoxydecane, 2-aminoethylphenyldiethoxypropane, 2-aminoethylphenyl bis(methoxyethoxy)decane, 3-aminopropyltrimethoxydecane, 3-aminopropyltriethoxydecane, 3-aminopropyltri-n-propoxydecane, 3-aminopropyltri-i-propoxydecane, 3-aminopropyltriethoxydecane, 3-aminopropyltris(methoxyethoxy)decane, 3-aminopropylmethyldimethoxydecane, 3-aminopropylmethyldiethoxydecane, 3-aminopropylmethyldi-n-propoxydecane, 3-aminopropylmethyldi-i-propoxydecane, 3_Aminopropylmethyldiethoxycarbonyl decane, 3-aminopropylethyldimethoxydecane, 3-aminopropylethyl diethoxy decane, 3-aminopropylethyldi-n-propoxydecane, 3-aminopropylethyldi-i-propoxydecane, 3-aminopropylethyldiethoxycarbonyl decane, 3-aminopropylethyl bis(methoxyethoxy)decane, 3-aminopropyl phenyl dimethoxy sand, 3-aminopropylphenyl-ethoxylate, 3 - month female
I 基丙基苯基二- η-丙氧基砂院、3 -胺基丙基苯基二-i -丙氧 基矽烷、3 -胺基丙基苯基二乙醯氧基矽烷、3 -胺基丙基苯 基二(甲氧基乙氧基)矽烷、N-2-(胺基乙基)-3 -胺基丙基三 甲氧基矽烷、N-2-(胺基乙基)-3 -胺基丙基三乙氧基矽烷、 N-2-(胺基乙基)-3 -胺基丙基三-n-丙氧基矽烷、N-2-(胺基 乙基)-3 -胺基丙基三-i-丙氧基砂院、N-2-(胺基乙基)-3 -胺 基丙基三乙醯氧基矽烷、N-2-(胺基乙基)-3 -胺基丙基三( 甲氧基乙氧基)矽烷、N-2-(胺基乙基)-3·胺基丙基甲基二 -71 - 200905264 甲氧基矽烷、N-2-(胺基乙基)-3-胺基丙基甲基二乙氧基矽 烷、N-2-(胺基乙基)-3-胺基丙基甲基二-η-丙氧基矽烷、 Ν-2-(胺基乙基)-3-胺基丙基甲基二-i·丙氧基矽烷、Ν-2-( 胺基乙基)-3-胺基丙基甲基二乙醯氧基矽烷、Ν-2-(胺基乙 基)-3-胺基丙基乙基二甲氧基矽烷、Ν-2-(胺基乙基)-3-胺 基丙基乙基二乙氧基矽烷、N-2-(胺基乙基)-3-胺基丙基乙 基二-η-丙氧基矽烷、N-2-(胺基乙基)-3-胺基丙基乙基二-i-丙氧基矽烷、N-2-(胺基乙基)-3-胺基丙基乙基二乙醯氧 基矽烷、N-2-(胺基乙基)·3-胺基丙基乙基二(甲氧基乙氧 基)矽烷、Ν-2-(胺基乙基)-3-胺基丙基苯基二甲氧基矽烷 、N-2-(胺基乙基)-3-胺基丙基苯基二乙氧基矽烷、N-2-( 胺基乙基)-3-胺基丙基苯基二-η-丙氧基矽烷、N-2-(胺基 乙基)-3-胺基丙基苯基二-i-丙氧基矽烷、N-2-(胺基乙基)-3 -胺基丙基苯基二乙醯氧基矽烷、N-2-(胺基乙基)-3 -胺基 丙基苯基二(甲氧基乙氧基)矽烷、胺基甲基三甲氧基矽烷 、胺基甲基三乙氧基矽烷、胺基甲基三-η-丙氧基矽烷、 胺基甲基三-i-丙氧基矽烷、胺基甲基三乙醯氧基矽烷、胺 基甲基三(甲氧基乙氧基)矽烷、胺基甲基甲基二甲氧基矽 烷、胺基甲基甲基二乙氧基矽烷、胺基甲基甲基二-η-丙 氧基矽烷、胺基甲基甲基二-i-丙氧基矽烷、胺基甲基甲基 二乙醯氧基矽烷、胺基甲基乙基二甲氧基矽烷、胺基甲基 乙基二乙氧基矽烷、胺基甲基乙基二-η-丙氧基矽烷、胺 基甲基乙基二-i-丙氧基矽烷、胺基甲基乙基二乙醯氧基矽 烷、胺基甲基乙基二(甲氧基乙氧基)矽烷、胺基甲基苯基 -72- 200905264 二甲氧基矽烷、胺基甲基苯基二乙氧基矽烷、胺基甲基苯 基二-η-丙氧基矽烷、胺基甲基苯基二-i-丙氧基矽烷、胺 基甲基苯基二乙醯氧基矽烷、胺基甲基苯基二(甲氧基乙 氧基)矽烷、2-胺基乙基三甲氧基矽烷、2-胺基乙基三乙 氧基矽烷、2-胺基乙基三-η-丙氧基矽烷、2-胺基乙基三- 1- 丙氧基矽烷、2-胺基乙基三乙醯氧基矽烷、2-胺基乙基 三(甲氧基乙氧基)矽烷、2-胺基乙基甲基二甲氧基矽烷、 2- 胺基乙基甲基二乙氧基矽烷、2-胺基乙基甲基二-η-丙氧 基矽烷、2-胺基乙基甲基二-i-丙氧基矽烷、2-胺基乙基甲 基二乙醯氧基矽烷、2 -胺基乙基乙基二甲氧基矽烷、2 -胺 基乙基乙基二乙氧基矽烷、2-胺基乙基乙基二-η-丙氧基 矽烷、2-胺基乙基乙基二-i-丙氧基矽烷、2-胺基乙基乙基 二乙醯氧基矽烷、2 -胺基乙基乙基二(甲氧基乙氧基)矽烷 、2 -胺基乙基苯基二甲氧基矽烷、2 -胺基乙基苯基二乙氧 基矽烷、2_胺基乙基苯基二- η-丙氧基矽烷、2 -胺基乙基苯 基二-i-丙氧基矽烷、2-胺基乙基苯基二乙醯氧基矽烷、2-胺基乙基苯基二(甲氧基乙氧基)矽烷、N-苯基-3-胺基丙基 三甲氧基矽烷、N -苯基-3-胺基丙基三乙氧基矽烷、N -苯 基-3-胺基丙基三-η-丙氧基矽烷、N-苯基-3-胺基丙基三-i-丙氧基矽烷、N-苯基-3-胺基丙基三乙醯氧基矽烷、N-苯 基-3-胺基丙基三(甲氧基乙氧基)矽烷、N-苯基-3-胺基丙 基甲基—甲氧基砂院、N -本基-3-胺基丙基甲基_乙氧基 矽烷、N-苯基-3-胺基丙基甲基二-η-丙氧基矽烷、N-苯基- 3- 胺基丙基甲基二-i-丙氧基矽烷、Ν-苯基-3-胺基丙基甲 -73- 200905264 基二乙醯氧基矽烷、N-苯基-3-胺基丙基乙基二甲氧基矽 烷、N-苯基-3-胺基丙基乙基二乙氧基矽烷、N-苯基-3-胺 基丙基乙基二- η-丙氧基矽烷、N -苯基-3-胺基丙基乙基二_ 丙氧基砂院、Ν -苯基-3 -胺基丙基乙基二乙釀氧基砂院、 N -苯基-3-胺基丙基乙基二(甲氧基乙氧基)矽烷、N-苯基-3 -胺基丙基苯基二甲氧基矽烷、N -苯基-3-胺基丙基苯基 二乙氧基矽烷、N -苯基-3-胺基丙基苯基二- η-丙氧基矽烷 、Ν-苯基-3-胺基丙基苯基二小丙氧基矽烷、Ν-苯基胺 基丙基苯基二乙醯氧基矽烷、N -苯基-3-胺基丙基苯基一( 甲氧基乙氣基)砂院、3 -三甲氧基砍院基-N-(l,3 - —甲基 亞丁基)丙基胺、3 -三乙氧基矽烷基-N-(l,3-二甲基-亞丁 基)丙基胺、3-三-η-丙氧基矽烷基-N-(l,3-二甲基-亞丁基) 丙基胺等; 含有脲基之化合物(1)之具體例如’異氰酸醋甲基二· 甲氧基矽烷、脲基甲基三乙氧基矽烷、脲基甲基三丙 氧基矽烷、脲基甲基三-i-丙氧基矽烷、脲基甲基HZi釀氧1 基矽烷、脲基甲基三(甲氧基乙氧基)矽烷、脲基甲基甲基 二甲氧基矽烷、脲基甲基甲基二乙氧基矽烷、脲基甲基甲 基二-η-丙氧基矽烷、脲基甲基甲基二-i-丙氧基矽烷、脲 基甲基甲基二乙醯氧基矽烷、脲基甲基乙基二甲氧基 、脲基甲基乙基二乙氧基矽烷、脲基甲基乙基二_n-丙氧 基矽烷、脲基甲基乙基二-i-丙氧基矽烷、脲基甲基乙基一 乙醯氧基矽烷、脲基甲基乙基二(甲氧基乙氧基)砍院、脈 基甲基苯基二甲氧基矽烷、脲基甲基苯基二乙氧基砂院、 -74- 200905264 脈基甲基本基_·_η -丙氧基砂院、服基甲基苯基二_i_丙氧 基矽烷、脲基甲基苯基二乙醯氧基矽烷、脲基甲基苯基二 (甲氧基乙氧基)矽烷、2-脲基乙基三甲氧基矽烷、2-脲基 乙基三乙氧基矽烷、2 -脲基乙基三-n-丙氧基矽烷、2 -脲基 乙基三-i-丙氧基矽烷、2 -脲基乙基三乙醯氧基矽烷、2 -脲 基乙基三(甲氧基乙氧基)矽烷、2 -脲基乙基甲基二甲氧基 矽烷、2 -脲基乙基甲基二乙氧基矽烷、2 -脲基乙基甲基 二-η-丙氧基矽烷、2-脲基乙基甲基二-i-丙氧基矽烷、2-脲基乙基甲基二乙醯氧基矽烷、2-脲基乙基乙基二甲氧基 矽烷、2-脲基乙基乙基二乙氧基矽烷、2-脲基乙基乙基 二-η-丙氧基矽烷、2-脲基乙基乙基二-i-丙氧基矽烷、2-脲基乙基乙基二乙醯氧基矽烷、2-脲基乙基乙基二(甲氧 基乙氧基)矽烷、2-脲基乙基苯基二甲氧基矽烷、2-脲基 乙基苯基二乙氧基矽烷、2-脲基乙基苯基二-η-丙氧基矽 烷、2-脲基乙基苯基二-i-丙氧基矽烷、2-脲基乙基苯基二 乙醯氧基矽烷、2 -脲基乙基苯基二(甲氧基乙氧基)矽烷、 3-脲基丙基三甲氧基矽.院、3-脲基丙基三乙氧基矽烷、3-脲基丙基三- η-丙氧基矽烷、3-脲基丙基三-i-丙氧基矽烷 、3 -脲基丙基三乙醯氧基矽烷、3 -脲基丙基三(甲氧基乙 氧基)矽烷、3-脲基丙基甲基二甲氧基矽烷、3-脲基丙基 甲基二乙氧基矽烷、3-脲基丙基甲基二- η-丙氧基矽烷、3-脲基丙基甲基二-i-丙氧基矽烷、3-脲基丙基甲基二乙醯氧 基砂院、3 -服基丙基乙基一甲氧基砂院、3 -脈基丙基乙基 二乙氧基矽烷、3-脲基丙基乙基二·η-丙氧基矽烷、3-脲基 -75- 200905264 丙基乙基二-i-丙氧基矽烷、3-脲基丙基乙基二乙醯氧基矽 烷、3 -脲基丙基乙基二(甲氧基乙氧基)矽烷、3 -脲基丙基 苯基二甲氧基矽烷、3-脲基丙基苯基二乙氧基矽烷、3-脲 基丙基苯基二-η-丙氧基矽烷、3-脲基丙基苯基二-i-丙氧 基矽烷、3 -脲基丙基苯基二乙醯氧基矽烷、3 -脲基丙基苯 基二(甲氧基乙氧基)矽烷等; 含有苯乙烯基之化合物(1)之具體例如,苯乙烯基三 甲氧基矽烷、苯乙烯基三乙氧基矽烷、苯乙烯基三-η-丙 氧基矽烷、苯乙烯基三-i-丙氧基矽烷、苯乙烯基三乙醯氧 基矽烷、苯乙烯基三(甲氧基乙氧基)矽烷、苯乙烯基甲基 二甲氧基矽烷、苯乙烯基甲基二乙氧基矽烷、苯乙烯基甲 基二-η-丙氧基矽烷、苯乙烯基甲基二-i-丙氧基矽烷、苯 乙烯基甲基二乙醯氧基矽烷、苯乙烯基乙基二甲氧基矽烷 、苯乙烯基乙基二乙氧基矽烷、苯乙烯基乙基二-η-丙氧 基矽烷、苯乙烯基乙基二-i-丙氧基矽烷、苯乙烯基乙基二 乙醯氧基矽烷、苯乙烯基乙基二(甲氧基乙氧基)矽烷、苯 乙烯基苯基二甲氧基矽烷、苯乙烯基苯基二乙氧基矽烷、 苯乙烯基苯基二-η-丙氧基矽烷、苯乙烯基苯基二-i-丙氧 基矽烷、苯乙烯基苯基二乙醯氧基矽烷、苯乙烯基苯基二 (甲氧基乙氧基)矽烷等; 等等。 其中,又以含有氧雜環丙烷基、氧雜環丁烷基、羧基 、氫硫基之化合物(1)較適合使用,特別是3 -環氧丙氧基 丙基三甲氧基矽烷、3-環氧丙氧基丙基三乙氧基矽烷、3- -76- 200905264 環氧丙氧基丙基甲基二甲氧基矽烷、3-環氧丙氧基丙基甲 基二乙氧基砂院、2-(3,4 -環氧基環己基)乙基三甲氧基砂 院、2·(3,4 -環氧基環己基)乙基二乙氧基砂院、(3 -乙基氧 雜環丁烷-3-基)丙基三甲氧基矽院、(3 -乙基氧雜環丁烷-3 -基)丙基三乙氧基矽烷、羧基甲基三甲氧基矽烷、3_氫 硫基丙基三甲氧基矽烷、3_氫硫基丙基三乙氧基矽烷與 [Α]成分之反應性等觀點而言爲更佳。 又,含有氧雜環丙烷基、氧雜環丁院基之化合物(1) 以其具有ITO圖型形成特性等觀點而較佳被使用’特別是 以3 -環氧丙氧基丙基三甲氧基矽烷、3_環氧丙氧基丙基三 乙氧基矽烷、3 -環氧丙氧基丙基甲基二甲氧基矽烷、3_環 氧丙氧基丙基甲基二乙氧基砂院、(3 -乙基氧雜環丁院- 3-基)丙基三甲氧基矽烷、(3_乙基氧雜環丁院基)丙基三 乙氧基矽烷爲佳。 化合物(2)之具體例如,四甲氧基砍院、四乙氧基石夕 院(通称TEOS)、四-η -丙氧基砂院、四異丙氧基砍院、四_ n-丁氧基砂院等四院氧基矽垸;甲基二甲氧基矽院、甲基 三乙氧基砂院、甲基三·η -丙氧基5夕院、乙基二乙氧基石夕 院、環己基三乙氧基砂院等單院基二院氧基砂院’本基二 乙氧基砂院、萘基三乙氧基矽烷、氯基苯基三乙氧基矽 院、4-氰基苯基三乙氧基矽烷、4_胺基苯基三乙氧基矽烷 、4 -硝基苯基三乙氧基砂院、甲基本基二乙氧基砂丨兀、 4-羥基苯基三乙氧基砂院等單芳基三院氧基砍院;苯氧基 三乙氧基砂院、萘基氧基三乙氧基砂垸、4_氯基苯基氧基 -77- 200905264 三乙氧基矽烷、4-氰基苯基三氧基乙氧基矽烷、4-胺基苯 基氧基三乙氧基矽烷、4-硝基苯基氧基三乙氧基矽烷、4-甲基苯基氧基三乙氧基矽烷、4-羥基苯基氧基三乙氧基矽 烷等單芳基氧基三烷氧基矽烷;單羥基三甲氧基矽烷、單 羥基三乙氧基矽烷、單羥基三-η-丙氧基矽烷等單羥基三 烷氧基矽烷;二甲基二甲氧基矽烷、二甲基二乙氧基矽烷 、二甲基二-η-丙氧基矽烷、甲基(乙基)二乙氧基矽烷、甲 基(環己基)—乙氧基砂垸等一院基院氧基砂院;甲基( 苯基)二乙氧基矽烷等單烷基單芳基二烷氧基矽烷;二苯 基二乙氧基矽烷等二芳基二烷氧基矽烷;二苯氧基二乙氧 基矽烷等二芳基氧基二烷氧基矽烷;甲基(苯氧基)二乙氧 基矽烷等單烷基單芳基氧基二烷氧基矽烷;苯基(苯氧基) 二乙氧基矽烷等單芳基單芳基氧基二烷氧基矽烷;二羥基 二甲氧基矽烷、二羥基二乙氧基矽烷、二羥基二-η-丙氧 基矽烷等二羥基二烷氧基矽烷;甲基(羥基)二甲氧基矽烷 等單烷基單羥基二烷氧基矽烷;苯基(羥基)二甲氧基矽烷 等單芳基單羥基二烷氧基矽烷;三甲基甲氧基矽烷、三甲 基乙氧基矽烷、三甲基-η-丙氧基矽烷、二甲基(乙基)乙氧 基矽烷、二甲基(環己基)乙氧基矽烷等三烷基單烷氧基矽 烷;二甲基(苯基)乙氧基矽烷等二烷基單芳基單烷氧基矽 烷;甲基(二苯基)乙氧基矽烷等單烷基二芳基單烷氧基矽 烷;三苯氧基乙氧基矽烷等三芳基氧基單烷氧基矽烷;甲 基(二苯氧基)乙氧基矽烷等單烷基二芳基氧基單烷氧基矽 烷;苯基(二苯氧基)乙氧基矽烷等單芳基二芳基氧基單烷 -78- 200905264 氧基砍院;二甲基(苯氧基)乙氧基矽烷等二烷基單芳基氧 基單院氧基砂院;二苯基(苯氧基)乙氧基矽烷等二芳基單 芳基氧基單院氧基砂烷;甲基(苯基)(苯氧基)乙氧基矽烷 等單烷基單芳基單芳基氧基單烷氧基矽烷;三羥基甲氧基 矽烷、三羥基乙氧基矽烷、三羥基_n_丙氧基矽烷等三羥 基單烷氧基矽烷等。 其中’四甲氧基矽烷、四乙氧基矽烷、甲基三甲氧基 矽烷、甲基三乙氧基矽烷、苯基三甲氧基矽烷、苯基三乙 氧基矽烷、二甲基二甲氧基矽烷、二甲基二乙氧基矽烷、 一本基一甲氧基砂院、—苯基二乙氧基砍院等就反應性、 對基板之密著性等觀點而爲較佳。 該些化合物可將任意之複數以任意之組成內容合倂使 用。 上述化合物’於提供作爲共水解反應時,可作爲本發 明所使用之[B]成分。 水解反應’較佳爲於適當之溶劑中進行。該些溶劑, 例如甲醇、乙醇、η-丙醇、異丙基醇、η·丁醇、異丁基酵 、t -丁基醇、丙酮、甲基乙基酮、甲基異丁基酮、丙二醇 單甲基醚、丙二醇甲基醚乙酸酯、四氫呋喃、二囉院、乙 腈等水溶性溶劑或其之水溶液等。 該些水溶性溶劑可以其後之步驟去除,以甲醇、乙酉享 、η•丙醇、異丙基醇、丙酮、甲基乙基酮、甲基異丁基爾 、四氫咲喃等具有較低沸點者爲佳’就原料溶解性之觀黑占 而言’以丙酮 '甲基乙基酮 '甲基異丁基酮等酮類爲更佳 -79- 200905264 ’最佳爲甲基異丁基酬。 合成[B]成分所使用之水解反應,較佳爲於酸觸媒’ 例如’鹽酸、硫酸、硝酸、甲酸、草酸、乙酸 '三氟乙酸 、三氟甲烷磺酸、酸性離子交換樹脂、各種路易士酸等, 或鹼性觸媒例如,氨、1級胺類、2級胺類、3級胺類、吡 啶等之含氮芳香族化合物、鹼性離子交換樹脂、氫氧化鈉 等氫氧化物、碳酸鉀等之碳酸鹽、乙酸鈉等之羧酸鹽、各 種路易士鹼等之存在下進行。水之使用量可配合反應溫度 、反應時間等作適當之設定。例如可採用下述之條件。 水之使用量,相對於上述式(1)所表示之化合物及上 述式(2)所表示之化合物中之烷氧基與鹵素原子之合計量1 莫耳,較佳爲1.5莫耳以下,更佳爲1莫耳以下,最佳爲 0.9莫耳以下之量。 反應溫度較佳爲40~200°C,更佳爲50〜150°C。 反應時間較佳爲30分鐘〜24小時,更佳爲1〜12小時。 [B]成分之凝膠滲透色層分析法(GPC)所得之聚苯乙烯 換算重量平均分子量(以下,亦稱爲「Mw」),較佳爲 500〜10,〇〇〇,更佳爲1,〇〇〇〜3,000。^4\¥未達500時,極難得 到充分之密著性或不容易產生對形成間距時所發生之污染 物的抑制效果,又超過1 0,000時,塗佈性會有惡化之疑慮 〇 又,「B」成分之市售品,例如,BY16-848、BY16-201 、BY 1 6-8 53 C 、 BY 1 6-208 、 BY1 6-209 、 BY 1 6-85 0 、 SF8417、BY 1 6- 849、BY 1 6-8 72、BY 1 6 - 8 5 5 D、SF841 1、 -80- 200905264 SF8413、SF8421、BY16-839、BY16-750、SF8418(以上, 東麗.道康寧·聚矽氧(股)製)、TSF4700、TSF4701、TSF4702 、TSF4703 、 TSF4704 、 TSF4705 、 TSF4706 、 TSF4707 、 TSF4708 、 TSF4709 、 TSF4730 、 TSL9906 、 YF3965 、 XF42-B0970(以上,莫門帖•哈幅滿·金屬製)、X-4 1 - 1 05 3、 X-41-1056 、 X-4卜1805 、 X-41-1810 、 X-40-2651 、 X-40-2655A、X-40-9721(以上、信越化學(股)製)、FM-0711、 FM-072 1、FM-0 725 (以上、窒素(股)製)等。 [C]硬化劑 上述酸酐[C]爲提高所形成之保護膜的耐熱性及硬度 所添加者。酸酐[C],爲(c-Ι)含有具有酸酐基之聚合性不 飽和化合物所生成之重複單位之聚合物(但,共聚合物[A] 除外),或(c-2)多元羧酸酐等。 合成上述(c-Ι)含有具有酸酐基之聚合性不飽和化合物 所生成之重複單位之聚合物所使用之不飽和多元羧酸酐, 例如,由依康酸酐、檬康酸酐、馬來酸酐及順1,2,3,4-四 氫化苯二甲酸酐所成群中所選出之至少1種。 又’合成具有上述無水物基之聚合性不飽和化合物與 烯烴性不飽和化合物之共聚合物所使用之烯烴性不飽和化 合物’例如’由苯乙烯、P-甲基苯乙烯、P-甲氧基苯乙烯 、甲基甲基丙烯酸酯、t-丁基甲基丙烯酸酯、甲基丙烯酸 三環[5.2.1.02,6]癸烷-8_基、2_甲基環己基丙烯酸酯、苯基 馬來醯亞胺及環己基所成群中所選出之至少丨種。 -81 - 200905264 具有酸酐基之聚合性不飽和化合物與烯烴性不館 合物之共聚合物100重量份中,具有酸酐基之聚合性 和化合物的共聚合比例,較佳爲1〜8 0重量份,更 10〜60重量份。使用該些共聚合物時,可得到具有優 坦化性之保護膜。 具有酸酐基之聚合性不飽和化合物與烯烴性不飽 合物所得共聚合物之較佳例示’例如馬來酸酐共聚· 苯乙烯、檬康酸酐/甲基丙烯酸三環[5.2.1. 〇2’6 ]癸烷 共聚合物等。 又,上述具有酸酐基之聚合性不飽和化合物與稀 不飽和化合物之共聚合物的聚苯乙烯換算重量平均分 ,較佳爲500〜50,000’更佳爲500〜10, 〇〇〇。使用具有 分子量範圍之共聚合物時’可得到具有優良平坦化性 護膜。 上述多元羧酸酐(c - 2 ),例如,依康酸酐、琥珀酸 檬康酸酐、十二碳烯琥珀酸酐、丙三羧酸酐、馬來酸 六氫苯二甲酸酐、甲基四氫化苯二甲酸酐、降冰片烯 酸酐等脂肪族二羧酸酐;I,2,3,4-丁烷四羧酸二酐、 烷四羧酸二酐等脂環族多元羧酸二酐;苯二甲酸酐、 四甲酸酐、均苯三甲酸酐、二苯甲酮四羧酸酐等芳香 元羧酸酐;乙二醇雙均苯三甲酸酐、丙三醇三均苯三 酐等含有酯基之酸酐等。其中,芳香族多元羧酸酐, 是均苯三甲酸酐可得到具有商度耐熱性之硬化膜等觀 爲較佳。 !和化 不飽 佳爲 良平 和化 合物/ -8-基 烴性 子量 前述 之保 酐、 酐、 二羧 環戊 均苯 族多 甲酸 特別 點而 -82- 200905264 [D]多官能性化合物 本發明所使用之[D]多官能性化合物,例如可使用陽 離子聚合性化合物及/或多官能(甲基)丙烯酸化合物等。陽 離子聚合性化合物爲分子内具有2個以上之氧雜環丙烷基 或氧雜is 丁院基之化合物(但,前述共聚合物[Α_ι]除外)。 上述分子内具有2個以上氧雜環丙烷基或氧雜環丁烷基之 化合物’例如,分子内具有2個以上之環氧基之化合物, 或具有3,4-環氧基環己基之化合物等。 上述分子内具有2個以上環氧基之化合物,例如,雙 酚A二縮水甘油醚、雙酚F二縮水甘油醚、雙酚S二縮 水甘油醚、氫化雙酚A二縮水甘油醚、氫化雙酚F二縮 水甘油醚、氫化雙酚AD二縮水甘油醚、溴化雙酚A二縮 水甘油醚、溴化雙酚F二縮水甘油醚、溴化雙酚S二縮水 甘油醚等雙酚化合物之二縮水甘油醚類; 1,4-丁二醇二縮水甘油醚、1,6-己二醇二縮水甘油醚 、丙三醇三縮水甘油醚、三羥甲基丙烷三縮水甘油醚、聚 乙烯丙三醇二縮水甘油醚、聚丙二醇二縮水甘油醚等多元 醇之聚縮水甘油醚類; 乙二醇、丙二醇、丙三醇等脂肪族多元醇經加成1種 或2種以上之烷氧化物所得之聚醚多元醇之聚縮水甘油醚 類; 酚酚醛清漆型環氧樹脂; 甲酚酚醛清漆型環氧樹脂; -83- 200905264 多酚型環氧樹脂; 脂肪族長鏈二元酸之二縮水甘油酯類; 高級脂肪酸之縮水甘油酯類; 環氧化大豆油、環氧化亞麻仁油等。 上述分子内具有2個以上環氧基之化合物的市售品, 例如,雙酚A型環氧樹脂EPIKOTE1001、同1002、同1003、 同10 04、同1007、同1009、同1010、同828(以上’日本環 氧樹脂(股)製)等; 雙酚F型環氧樹脂,例如EPIKOTE8〇7(日本環氧樹 脂(股)製)等; 酚酚醛清漆型環氧樹脂,例如EPIKOTE152、同154 、同157S65(以上,日本環氧樹脂(股)製)、EPPN201、同 202(以上,日本化藥(股)製)等; 甲酚酚醛清漆型環氧樹脂,例如EOCN102、同103S 、同104S、1020、1025、1027(以上、日本化藥(股)製)、 EPIKOTE180S75(日本環氧樹脂(股)製)等; 多酚型環氧樹脂,例如 EPIKOTE 1 03 2H60、同 Χγ_ 4000(以上,日本環氧樹脂(股)製)等; 環狀脂肪族環氧樹脂,例如CY-175、同177、同179 、阿羅啦CY-182、同192、184(以上,汽巴特用化學(股) 製),ERL-4234、4299、4221、4206(以上、U.C.C 公司製) ’ SHODYNE509(昭和電工(股)製),EPICLON200、同 40〇( 以上’大日本油墨(股)製),EPIKOTE871、同872(以上, 曰本環氧樹脂(股)製),ED-566 1、同5662(以上,Celanese -84- 200905264 coating公司製)等; 脂肪族聚縮水甘油醚,例如EPOLITE100MF(共榮社 化學(股)製),EPOILTMP(日本油脂(股)製)等。 上述分子内具有2個以上3,4-環氧基環己基之化合物 ,例如,3,4-環氧基環己基甲基-3’,4’-環氧基環己烷羧酸 酯' 2-(3,4-環氧基環己基-5,5-螺-3,4-環氧基)環己烷-甲-二噁烷、雙(3,4-環氧基環己基甲基)己二酸酯、雙(3,4-環 氧基-6-甲基環己基甲基)己二酸酯、3,4-環氧基-6-甲基環 己基_3’,4’-環氧基-6’-甲基環己烷羧酸酯、伸甲基雙(3,4-環氧基環己烷)、二環戊基二環氧化物、乙二醇之二(3,4-環氧基環己基甲基)醚、乙烯雙(3,4-環氧基環己烷羧酸酯) 、內酯改質3,4-環氧基環己基甲基-3’,4’-環氧基環己烷羧 酸酯等。 該些陽離子聚合性化合物中,又以酚酚醛清漆型環氧 樹脂及多酚型環氧樹脂爲佳。 又,多官能性(甲基)丙烯酸酯化合物,例如, 乙二醇二(甲基)丙烯酸酯、1,6 -己二醇二(甲基)丙烯 酸酯、1,9 -壬二醇(甲基)丙烯酸酯、聚丙二醇二(甲基)丙 烯酸酯、四乙二醇二(甲基)丙烯酸酯、雙苯氧基乙醇芴二 丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、季戊四醇三 (甲基)丙烯酸酯、三((甲基)丙烯醯氧乙基)磷酸鹽、季戊 四醇四(甲基)丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯、 二季戊四醇六(甲基)丙烯酸酯、三丙烯醯氧基季戊四醇琥 珀酸{別名:3-丙烯醯氧基-2,2-雙丙烯醯氧甲基·丙基}酯} -85- 200905264 、二丙烯醯氧基季戊四醇琥珀酸{別名:3-丙烯醯氧基-2-丙烯醯氧甲基-丙基}酯}、五丙烯醯氧基二季戊四醇琥珀 酸{別名:[3-(3-丙烯醯氧基-2,2-雙-丙烯醯氧基甲基-丙基 )-2,2-雙-丙烯醯氧基甲基-丙基]酯}、四丙烯醯氧基二季 戊四醇琥珀酸{別名:[3-(3 -丙烯醯氧基-2,2 -雙-丙烯醯氧 基甲基-丙基)-2-丙烯醯氧基甲基·丙基}酯}等。該市售品 例如,ARONIX-M-210、同 M-240、同 M-6200、同 M-309 '同 M-400、同 M-402、同 M-405、同 M-450、同 M-7100 、同M-8030、同M-8060(東亞合成工業(股)製)’ KAYARAD HDDA、同 HX-220、同 R-604、同 TMPTA、同 DPHA、同 DPCA-20 ' 同 DPCA-30、同 DPCA-60、同 DPCA-120(日本 化藥(股)製)’ VISCOAT260、同 312、同 335 HP、同 295、 同3 00、同360、同GPT、同3PA、同400(大阪有機工業(股 )製)等。 其可單獨或組合使用。 [E]硬化促進劑 [E]硬化促進劑爲提高所形成之保護膜的耐熱性或硬 度等目的,而可與[C]硬化劑合倂使用或添加。 硬化促進劑[D]之具體例如, 2-苯基咪唑、2-苯基-4 -甲基咪唑、卜苄基-2-苯基咪 唑、2,4-二胺基-6-[2,-甲基咪唑基-(1,)]-乙基-3-三嗪、 2.4- 二胺基-6-[2,-十一烷基咪唑基-(1,)]-乙基-S-三嗪、 2.4- 二胺基-6-[2,-乙基-4,-甲基咪唑基十一烷基咪唑基- -86 - 200905264 (1’)] -乙基-S-三嗪、2 -苯基- 4,5-二羥基甲基咪唑、2 -苯基-4-甲基-5-羥基甲基咪唑、2_苯基咪唑三聚異氰酸加成物、 2,4-二胺基-6-[2,-甲基咪唑基-(1,)]_乙基-3-三嗪三聚異氰 酸加成物等等。 硬化促進劑[D]之添加量相對於共聚合物[A] 100重量 份’以0.000 1〜10重量份爲佳。就耐熱性或保存安定性等 觀點而言,以0.001〜1重量份爲更佳。 [F]界面活性劑 界面活性劑,爲提高本發明之樹脂組成物的塗佈性能 之目的而可添加。 該些界面活性劑,例如,氟系界面活性劑、聚矽氧系 界面活性劑、非離子系界面活性劑、其他界面活性劑等。 上述氟系界面活性劑,例如,BM CHIMIE公司製商 品名:BM-1000、BM-1100、大日本油墨化學工業(股)製 商品名··美格菲F142D、同F172、同F173、同F183、住 友3M(股)製商品名:普羅拉FC-135、同FC-170C、同 FC-430、同FC-431、(股)尼恩斯製商品名:FTERGENT 250、同251、同222F、FTX-218 '旭硝子(股)製商品名: SAFURON S-112、同 S-113、同 S-131、同 S-141,同 S-145、同 S-3 82,同 SC-101、同 SC-102、同 SC-103、同 SC-104 ' 同 SC-105、同 SC-106 等市售品。 上述聚矽氧系界面活性劑,例如,東麗.道康寧.聚矽 氧(股)製商品名:SH-28PA、SH-190、SH-193、SZ-6032 -87- 200905264 、SF-8428、DC-57、DC-190、PAINTAD19、FZ-2101、同 77、同 2118、L-7001、L-7002、大化學日本(股)製、Byk_ 300、同 306、同 310、同 335、同 341、同 344、同 370、信 越化學工業(股)製商品名:KP 3 4 1、新秋田化成(股)製 商品名:EPTOP EF301、同EF 3 03、同EF3 52等之市售品 〇 上述非離子系界面活性劑,例如,聚氧乙烯烷醚、聚 氧乙烯芳基醚、聚氧乙烯二烷基酯等。 上述聚氧乙烯烷醚,例如,聚氧乙烯月桂醚、聚氧乙 烯硬脂醚、聚氧乙烯油醚等。聚氧乙烯芳基醚,例如,聚 氧乙烯辛基苯基醚、聚氧乙烯壬基苯基醚等。聚氧乙烯二 烷基酯,例如,聚氧乙烯二月桂酯、聚氧乙烯二硬脂酯等 〇 上述其他之界面活性劑,例如共榮社化學(股)製商 品名:(甲基)丙烯酸系共聚合物P0LYFL0W No·57、同 No.90 等。 該些[F ]界面活性劑之添加量,相對於聚合物[A ] 1 〇 0 重量份,較佳爲5重量份以下,更佳爲2重量份以下。界面 活性劑之量超過5重量份時,塗佈步驟中’塗膜會有產生 膜龜裂之情形。 感熱性酸產生劑 本發明之組成物中’可添加感熱性酸產生^。感熱酸 產生劑,例如鏡鹽、苯倂噻唑鐵鹽、銨鹽、鱗鹽等,其中 -88 - 200905264 又以鏑鹽、苯倂噻唑鎗鹽爲較佳使用者。 本發明之樹脂組成物,可將上述各成分,較佳爲均勻 溶解或分散於適當之溶劑中之方式製作。所使用之溶劑, 以可將組成物之各成分溶解或分散,且不與各成分反應者 爲較佳。 又,本發明之樹脂組成物中,[A]成分爲[A3](a)由具 有氧雜環丙烷基、氧雜環丁烷基及烯丙基所成群中所選出 之至少1種之官能基的聚合性不飽和化合物,與(b5)該(a) 成分以外之聚合性不飽和化合物所得之共聚合物,且分子 中不具有羧基、羧酸酐基、羧酸之縮醛酯構造、羧酸之縮 酮酯構造、羧酸之1-烷基環烷酯構造及羧酸之t-丁酯構造 之共聚合物時,可準備不含有[C]硬化劑之第一液,與含 有[C]硬化劑之第二液所形成之組合,於使用前將其混合 使用即可。第一液以含有[D]多官能性化合物爲佳。 該些溶劑例如,醇、醚、乙二醇醚、乙二醇烷醚乙酸 酯、二乙二醇單烷醚、二乙二醇二烷醚 '丙二醇單烷醚、 乙二醇二烷醚、丙二醇烷醚乙酸酯、丙二醇烷醚丙酸酯、 芳香族烴、酮、酯等。 該些具體例例如,醇,如甲醇、乙醇、苄基醇等; 醚如四氫呋喃等; 乙二醇醚如乙二醇單甲基醚、乙二醇單乙基醚等; 乙二醇烷醚乙酸酯如甲基溶纖素乙酸酯、乙基溶纖素 乙酸酯 '乙二醇單丁基醚乙酸酯、二乙二醇單乙基醚乙酸 酯等; -89- 200905264 二乙二醇單烷醚如二乙二醇單甲基醚、二乙二醇單乙 基醚等: 二乙二醇二烷醚如二乙二醇二甲基醚、二乙二醇二乙 基醚、二乙二醇乙基甲基醚等; 丙二醇單烷醚如丙二醇甲基醚、丙二醇乙基醚、丙二 醇丙基醚、丙二醇丁基醚等; 乙二醇二烷醚如丙二醇二甲基醚、丙二醇甲基乙基醚 、丙二醇甲基丙基醚、丙二醇甲基異丙基醚、丙二醇甲基 丁基醚、丙二醇甲基異丁基醚、丙二醇甲基戊基醚、丙二 醇甲基環戊基醚、丙二醇甲基己基醚、丙二醇甲基環己基 醚 '丙二醇甲基庚基醚、丙二醇甲基辛基醚等: 丙二醇烷醚乙酸酯如丙二醇甲基醚乙酸酯、丙二醇乙 基醚乙酸酯、丙二醇丙基醚乙酸酯、丙二醇丁基醚乙酸酯 等; 丙二醇烷醚丙酸酯如丙二醇甲基醚丙酸酯、丙二醇乙 基醚丙酸酯、丙二醇丙基醚丙酸酯、丙二醇丁基醚丙酸酯 等; 芳香族烴如甲苯、二甲苯等; 酮例如甲基乙基酮、環己酮、4-羥基-4-甲基-2-戊酮 、甲基異戊酮等; 酯例如乙酸甲酯、乙酸乙酯、乙酸丙酯、乙酸丁酯、 2-羥基丙酸乙酯、2-羥基-2-甲基丙酸甲酯、2-羥基-2-甲 基丙酸乙酯、羥基乙酸甲酯、羥基乙酸乙酯、羥基乙酸丁 酯、乳酸甲酯、乳酸乙酯、乳酸丙酯、乳酸丁酯、’3 -羥基 -90 - 200905264 丙酸甲酯、3 -羥基丙酸乙酯、3 -羥基丙酸丙酯、3 -羥基丙 酸丁酯、2 -羥基-3-甲基丁酸甲酯、甲氧基乙酸甲酯、甲 氧基乙酸乙酯、甲氧基乙酸丙酯、甲氧基乙酸丁酯、乙氧 基乙酸甲酯、乙氧基乙酸乙酯、乙氧基乙酸丙酯、乙氧基 乙酸丁酯、丙氧基乙酸甲酯、丙氧基乙酸乙酯、丙氧基乙 酸丙酯、丙氧基乙酸丁酯、丁氧基乙酸甲酯、丁氧基乙酸 乙酯、丁氧基乙酸丙酯、丁氧基乙酸丁酯、2-甲氧基丙酸 甲酯、2 -甲氧基丙酸乙酯、2 -甲氧基丙酸丙酯、2 -甲氧基 丙酸丁酯、2-乙氧基丙酸甲酯、2-乙氧基丙酸乙酯、2-乙 氧基丙酸丙酯、2-乙氧基丙酸丁酯、2-丁氧基丙酸甲酯、 2-丁氧基丙酸乙酯、2-丁氧基丙酸丙酯、2-丁氧基丙酸丁 酯、3 -甲氧基丙酸甲酯、3 -甲氧基丙酸乙酯、3 -甲氧基丙 酸丙酯、3-甲氧基丙酸丁酯、3-乙氧基丙酸甲酯、3-乙氧 基丙酸乙酯、3-乙氧基丙酸丙酯、3-乙氧基丙酸丁酯、3_ 丙氧基丙酸甲酯、3-丙氧基丙酸乙酯、3-丙氧基丙酸丙酯 、3-丙氧基丙酸丁酯、3-丁氧基丙酸甲酯、3-丁氧基丙酸 乙酯、3-丁氧基丙酸丙酯、3-丁氧基丙酸丁酯等。 其中,又以醇、二乙二醇、丙二醇烷基乙酸酯、乙二 醇烷醚乙酸酯、二乙二醇二烷醚爲佳,特別是以苄基醇、 二乙二醇乙基甲基醚、丙二醇甲基醚乙酸酯、丙二醇乙基 醚乙酸酯、二乙二醇二甲基醚、乙二醇單丁基醚乙酸酯、 二乙二醇單乙基醚乙酸酯、二乙二醇二乙基醚、3-甲氧基 丙酸甲酯、3-乙氧基丙酸甲酯、3-甲氧基丙酸乙酯等爲更 佳。 -91 - 200905264 溶劑之使用量’相對於本發明組成物中之全固體成分 (含有溶劑之組成物的總量減去溶劑量之量)之含有量,較 佳爲1〜5 0重量%,更佳爲5〜4 0重量%之範圍。 前述溶劑可與高沸點溶劑合倂使用。其中所可倂用之 高沸點溶劑,例如N-甲基甲醯胺、ν,Ν-二甲基甲醯胺、 Ν -甲基甲醯苯胺、Ν -甲基乙醯胺、Ν,Ν -二甲基乙醯胺、 Ν-甲基吡咯烷酮、二甲基亞颯、苄基乙基醚、二己基醚' 丙酮基丙酮、異佛爾酮、己酸、辛酸' 1-辛醇、1-壬醇、 乙酸苄酯、安息香酸乙酯、草酸二乙酯、馬來酸二乙酯、 γ -丁內酯、碳酸乙烯酯、碳酸丙烯酯、苯基溶纖素乙酸酯 等。 於倂用高沸點溶劑時之使用量爲,相對於全溶劑量, 較佳爲90重量%以下,更佳爲80重量%以下。 經依上述方法所製作之組成物,較佳爲使用孔徑 〇.2~3.0μπι,更佳爲使用孔徑0.2~0.5μιη左右之微陶瓷過濾 器等進行過濾後使用。 彩色濾光片保護膜之形成 其次,將對本發明之組成物所使用之彩色濾光片的保 護膜之形成方法進行說明。 將本發明之樹脂組成物溶液塗佈於基板表面’於預燒 焙去除溶劑以形成塗膜後’經由加熱處理而可形成目的之 彩色濾光片的保護膜。 又,本發明之樹脂組成物,於準備前述第一液與第二 -92- 200905264 液所成之套組’再將其混合使用之情形中,將上述套組之 第一液與第二液混合,使該混合物於基板上形成被膜,其 次經由加熱處理而可形成彩色濾光片之保護膜。 可作爲上述基板使用者,例如玻璃、石英、矽、樹脂 等基板。樹脂例如聚對苯二甲酸乙烯酯、聚對苯二甲酸丁 烯酯、聚醚颯、聚碳酸酯、聚醯亞胺等及環狀烯烴之開環 聚合物及其氫化物等樹脂。 塗佈方法例如可採用噴灑法'滾筒塗佈法、回轉塗佈 法、條狀塗佈法、油墨噴射法等適當之方法,特別是以使 用旋轉塗佈法、非旋轉塗佈法(spinless coater)、條狀模 塗佈法(slit die co ate r)等塗佈法爲佳。 上述預燒焙之條件,依各成分之種類或添加比例等而 有所不同,較佳爲可採用70~90°C下1〜15分鐘左右之條件 。塗膜之厚度較佳爲〇_15〜8·5μπι,更佳爲0_15〜6·5μιη,最 佳爲0.1 5〜4.5 μιη。又,此處所稱之塗膜厚度,係指去除溶 劑後之厚度。 塗膜形成後之加熱處理,可使用熱壓板或清淨烤箱等 適當之加熱裝置予以實施。處理溫度,以150〜250°C左右 爲佳,加熱時間於使用熱壓板之情形時爲5〜30分鐘之間, 使用烤箱時爲採用3 0〜90分鐘之間的處理時間。 又,樹脂組成物中使用感放射線性酸產生劑之情形中 ,爲將該樹脂組成物塗佈於基板表面,經預燒焙以去除溶 劑形成塗膜後,經施以放射線照射處理(曝光處理)後而可 形成目的之保護膜。必要時,可於曝光處理後再進行加熱 -93- 200905264 處理亦可。 上述放射線之照射處理中所使用之放射線,例如可見 光線、紫外線、遠紫外線、電子線、X線等,但以含有 1 90〜45Onm波長之光線的紫外線爲佳。 曝光量較佳爲100〜20,000J/m2,更佳爲150〜1 0,000J/m2 〇 放射線照射後可進行任意的加熱處理。此時之加熱溫 度,以150〜2 50 °C左右爲佳,加熱裝置例如可使用熱壓板 、清淨烤箱等適當之裝置。加熱時間,於使用熱壓板之情 形時爲採用5〜30分鐘,於使用烤箱之情形時爲30~90分鐘 的處理時間。 彩色濾光片之保護膜 依此方式形成之保護膜,其膜厚度較佳爲0.1〜8μιη, 更佳爲〇·1〜6μιη,最佳爲〇·1~4μηι。又’本發明之保護膜 於形成於彩色濾光片之具有段差之基板上之情形中,上述 之膜厚度,爲由彩色濾光片之最上部所求得之厚度。 本發明之保護膜,可由下述之實施例得知’除可滿足 密著性、表面硬度、透明性、耐熱性、耐光性、耐溶劑性 等以外,且具有於加熱狀態下的荷重也不會產生凹陷’及 具有於可使底部基板上所形成之彩色濾光片的段差形成平 坦化之優良性能之光裝置用保護膜。 特別是,本發明之保護膜’於面板製造步驟中’即使 暴露於超過25 0 t之加熱過程中’亦具有可承受該狀態之 -94- 200905264 充分耐熱性,即使超過27〇t亦可保證具有充分之尺寸安 定性。 【實施方式】 實施例 以下將以合成例、實施例對本發明作更具體的說明’ 但本發明並不受以下實施例所限定。 (共)聚合物之製造 合成例1 於具備有冷卻管與攪拌機之燒瓶中,將2,2’-偶氮雙-異丁腈5重量份及丙二醇單甲基醚乙酸酯2 00重量份加入其 中。隨後加入甲基丙烯酸縮水甘油酯70重量份及苯乙烯30 重量份,經氮氣取代後緩緩開始攪拌。使液溫度上昇至 9 5 °C,於該溫度下保持5小時而製得含有共聚合物(A-1)之 聚合物溶液。所得聚合物溶液之固體成分濃度爲32.8重量 %。 合成例2 於具備有冷卻管與攪拌機之燒瓶中,加入2,2 ’ -偶氮 雙-異丁腈5重量份及丙二醇單甲基醚乙酸酯200重量份。 隨後加入3-乙基-3-甲基丙烯醯氧甲基氧雜環丁烷80重量 份及苯乙烯2 0重量份’經氮氣取代後緩緩開始攪拌。使溶 液溫度上昇至95t,於該溫度下保持5小時以製得含有共 -95- 200905264 聚合物(A-2)之聚合物溶液。所得聚合物溶液之固體成分 濃度爲3 3.0重量%。 合成例3 於具備有冷卻管與攪拌機之燒瓶中,加入2,2’-偶氮 雙-異丁腈5重量份及丙二醇單甲基醚乙酸酯200重量份。 隨後加入甲基丙烯酸縮水甘油酯7 0重量份、苯乙烯1 5重量 份及N-環己基馬來醯亞胺1 5重量份,經氮氣取代後緩緩 開始攪拌。使溶液溫度上昇至95 t,於此溫度保持5小時 以製得含有共聚合物(A-3)之聚合物溶液。所得聚合物溶 液之固體成分濃度爲3 3 .1重量%。 合成例4 於具備有冷卻管與攪拌機之燒瓶中,加入2,2’-偶氮 雙-異丁腈5重量份及丙二醇單甲基醚乙酸酯200重量份。 隨後加入甲基丙烯酸縮水甘油酯60重量份、苯乙烯10重量 份及三環[5_2·1.02’6]癸烷-8-基甲基丙烯酸酯30重量份,經 氮氣取代後緩緩開始攪拌。使溶液溫度上昇至95 °C,於此 溫度保持5小時以製得含有共聚合物(A-4)之聚合物溶液。 所得聚合物溶液之固體成分濃度爲3 2.9重量%。 合成例5 於具備有冷卻管與攪拌機之燒瓶中,加入2,2’-偶氮雙 (2,4_二甲基戊腈)5重量份及丙二醇單甲基醚乙酸酯200重 -96- 200905264 量份。隨後加入甲基丙烯酸縮水甘油酯50重量份、苯乙烯 15重量份、N-環己基馬來醯亞胺15重量份及甲基丙烯酸20 重量份’經氮氣取代後緩緩開始攪拌。使溶液溫度上昇至 9 5°C,於此溫度保持5小時以製得含有共聚合物(A-5)之聚 合物溶液。所得聚合物溶液之固體成分濃度爲3 3 · 0重量% 合成例6 於具備有冷卻管與攙拌機之燒瓶中,加入2,2’-偶氮雙 (2,4-二甲基戊腈)5重量份及丙二醇單甲基醚乙酸酯200重 量份。隨後加入苯乙烯40重量份及甲基丙烯酸烯丙酯60重 量份’經氮氣取代後緩緩開始攪拌。使溶液溫度上昇至 7〇°C ’於此溫度保持5小時以製得含有共聚合物(A-6)之聚 合物溶液。所得聚合物溶液之固體成分濃度爲32.3重量% 合成例7 於具備有冷卻管與攪拌機之燒瓶中,加入2,2’·偶氮雙 (2,4-二甲基戊腈)5重量份及丙二醇單甲基醚乙酸酯200重 量份。隨後加入甲基丙烯酸縮水甘油酯50重量份、苯乙烯 10重量份及甲基丙烯酸烯丙酯40重量份,經氮氣取代後緩 緩開始攪拌。使溶液溫度上昇至7〇t,於此溫度保持5小 時以製得含有共聚合物(A - 7)之聚合物溶液。所得聚合物 溶液之固體成分濃度爲32.6重量%。 -97- 200905264 合成例8 於具備有冷卻管與攪拌機之燒瓶中,加入2,2,-偶氮雙 (2,4 -二甲基戊腈)5重量份及丙二醇單甲基醚乙酸酯200重 量份。隨後加入3 -乙基-3 -甲基丙烯醯氧甲基氧雜環丁烷 60重量份、苯乙烯10重量份及甲基丙烯酸烯丙酯3〇重量份 ,經氮氣取代後緩緩開始攪拌。使溶液溫度上昇至7 0 °C, 於此溫度保持5小時以製得含有共聚合物(A - 8 )之聚合物溶 液。所得聚合物溶液之固體成分濃度爲3 2.7重量%。 合成例9 於具備有冷卻管與攪拌機之燒瓶中,加入2,2’ -偶氮 雙-異丁腈5重量份及丙二醇單甲基醚乙酸酯200重量份。 隨後加入甲基丙烯酸縮水甘油酯4 5重量份、3 -乙基-3 -甲 基丙烯醯氧甲基氧雜環丁烷40重量份及苯乙烯15重量份, 經氮氣取代後緩緩開始攪拌。使溶液溫度上昇至7 〇 r,於 此溫度保持5小時以製得含有共聚合物(A_9)之聚合物溶液 。所得聚合物溶液之固體成分濃度爲33.3重量%。 合成例1 0 於具備有冷卻管與攪拌機之燒瓶中,加入2,2,-偶氮雙 (2,4 -二甲基戊腈)5重量份及丙二醇單甲基醚乙酸酯200重 量份。隨後加入苯乙烯2 0重量份、N -環己基馬來醯亞胺2 〇 重量份及甲基丙烯酸烯丙酯60重量份,經氮氣取代後緩緩 -98- 200905264 開始攪拌。使溶液溫度上昇至70 °C ’於此溫度保持5小時 以製得含有共聚合物(A-10)之聚合物溶液。所得聚合物溶 液之固體成分濃度爲3 2.5重量%。 合成例1 1 於具備有冷卻管與攪拌機之燒瓶中,加入2,2’·偶氮雙 (2,4-二甲基戊腈)5重量份及丙二醇單甲基醚乙酸酯200重 量份。隨後加入苯乙烯20重量份、N-環己基馬來醯亞胺20 重量份及甲基丙烯酸20重量份、甲基丙烯酸縮水甘油酯20 重量份、1 -乙基環己基甲基丙烯酸酯2 0重量份,經氮氣取 代後緩緩開始攪拌。使溶液溫度上昇至70°C,於此溫度保 持5小時以製得含有共聚合物(A- 1 1 )之聚合物溶液。所得 聚合物溶液之固體成分濃度爲32.6重量%。 合成例1 2 於具備有冷卻管與攪拌機之燒瓶中,加入2,2’_偶氮雙 (2,4-二甲基戊腈)5重量份及丙二醇單甲基醚乙酸酯200重 量份。隨後加入苯乙烯20重量份、N-環己基馬來醯亞胺20 重量份及甲基丙烯酸20重量份、甲基丙烯酸縮水甘油酯20 重量份、1-乙基環戊基甲基丙烯酸酯20重量份,經氮氣取 代後緩緩開始攪拌。使溶液溫度上昇至7〇°C,於此溫度保 持5小時以製得含有共聚合物(A- 1 2)之聚合物溶液。所得 聚合物溶液之固體成分濃度爲32.7重量%。 -99- 200905264 合成例1 3 於具備有冷卻管與攪拌機之燒瓶中,加入2,2’-偶氮雙 (2,4-二甲基戊腈)5重量份及丙二醇單甲基醚乙酸酯200重 量份。隨後加入苯乙烯20重量份、N·環己基馬來醯亞胺20 重量份、甲基丙烯酸20重量份、甲基丙烯酸縮水甘油酯20 重量份及四氫-2H-吡喃-2-基酯20重量份,經氮氣取代後 緩緩開始攪拌。使溶液溫度上昇至70°C,於此溫度保持5 小時以製得含有共聚合物(A- 1 3 )之聚合物溶液。所得聚合 物溶液之固體成分濃度爲32.4重量%。 矽氧烷低聚物[B]之合成例 合成例1 於5 00mL之三口燒瓶中加入苯基三甲氧基矽烷39.6g 及(3-乙基氧雜環丁烷-3-基)丙基三乙氧基矽烷64.0g,再 加入甲基異丁酮1 〇〇g後使其溶解,於所得混合溶液使用 磁石攪拌子進行攪拌中加溫至60 °C。於其中,以1小時時 間連續添加含有1重量%草酸之8.6g的離子交換水。隨後 ,於60 °C下反應4小時後,將所得反應液冷卻至室溫。其 後,將反應副產物之醇部分由反應液減壓餾除。該聚合物 [B-1]之重量平均分子量爲1,600。 合成例2 於500mL之三口燒瓶中,加入二苯基二甲氧基矽烷 48.8g及2-(3,4-環氧基環己基)乙基三甲氧基矽烷49.2g, -100- 200905264 丙二醇甲基醚乙酸酯1 〇〇g後使其溶解,於所得混合溶液 使用磁石攪拌子進行攪拌中加溫至6(TC。於其中’以1小 時時間連續添加含有1重量%草酸之8.6g的離子交換水。 隨後,於60t下反應4小時後,將所得反應液冷卻至室溫 。其後,將反應副產物之醇部分由反應液減壓餾除。該聚 合物[B-2]之重量平均分子量爲2,0 00。 合成例3 於5 00mL之三口燒瓶中,加入四甲氧基矽烷30.4g及 3_環氧丙氧基丙基三甲氧基矽烷47.2g,丙二醇甲基醚 1 〇〇g後使其溶解,於所得混合溶液使用磁石攪拌子進行 攪拌中加溫至6 0 °C。於其中,以1小時時間連續添加含有1 重量%草酸之8.6g的離子交換水。隨後,於60°C下反應4 小時後,將所得反應液冷卻至室溫。其後,將反應副產物 之醇部分由反應液減壓餾除。該聚合物[B-3]之重量平均 分子量爲1,400。 合成例4 於5 OOmL之三口燒瓶中,加入甲基三甲氧基矽烷 27.2g及3 -氫硫基丙基三甲氧基矽烷39.2g,丙二醇甲基醚 1 〇 〇 g後使其溶解,於所得混合溶液使用磁石攪拌子進行 攪拌中加溫至60 °C。於其中,以1小時時間連續添加含有1 重量%草酸之8.6g的離子交換水。隨後,於6〇°C下反應4 小時後,將所得反應液冷卻至室溫。其後,將反應副產物 -101 - 200905264 之醇部分由反應液減壓餾除。該聚合物[B-4]之重量平均 分子量爲1,900。 合成例5 於5 00mL之三口燒瓶中’加入二甲基二甲氧基矽烷 29.8g及3-甲基丙烯醯氧丙基甲基二乙氧基矽烷51.0g,丙 二醇甲基醚1 00g後使其溶解,於所得混合溶液使用磁石 攪拌子進行攪拌中加溫至6 0 °C。於其中,以1小時時間連 續添加含有1重量%草酸之8.6g的離子交換水。隨後,於 6(TC下反應4小時後,將所得反應液冷卻至室溫。其後, 將反應副產物之醇部分由反應液減壓餾除。該聚合物[B-5]之重量平均分子量爲1,800。 合成例6 於500mL之三口燒瓶中,加入甲基三甲氧基矽烷 27.0g及3-丙烯醯基丙基甲基二乙氧基矽烷48.1g,丙二醇 甲基醚1 〇〇g後使其溶解,於所得混合溶液使用磁石攪拌 子進行攪拌中加溫至60°C。於其中’以1小時時間連續添 加含有1重量%草酸之8.6g的離子交換水。隨後’於60°C 下反應4小時後,將所得反應液冷卻至室溫。其後,將反 應副產物之醇部分由反應液減壓餾除。該聚合物[B-6]之 重量平均分子量爲2,100。 樹脂組成物之製作及評估 -102- 200905264 實施例1 於含有上述合成例1所得之共聚合物(A-1)的溶液(相 當於共聚合物(A_l)100重量份(固體成分)之量)中,加入矽 氧烷低聚物(B-1)20重量份、六氫苯二甲酸酐(C-1)40重量 份、硬化促進劑之2-苯基-4-甲基咪唑(D-1)0.1重量份及界 面活性劑之SH-28PA(東麗.道康寧.聚矽氧(股)製)0.1重量 份,再使其固體成分濃度達20重量%之目的,將丙二醇單 甲基醚乙酸酯(S-1)及二乙二醇乙基甲基醚(S-2)以8對2之 比率添加後,再使用孔徑〇 . 5 μιη之微陶瓷過濾器過濾以製 作樹脂組成物。 使用旋轉塗佈器將上述組成物塗佈於Si02集積回路 玻璃基板上後,於熱壓板上以8(TC、5分鐘時間預燒焙以 形成塗膜,再於烤箱中經23 0 °C、60分鐘加熱處理以形成 膜厚2.0μιη之保護膜。 保護膜之評估 (1) 透明性之評估 對上述所形成之具有保護膜之基板,使用分光光度計 ( 1 50-20型雙光束(日立製作所(股)製))測定400〜80 Onm之 透過率。4 0 0 ~ 8 0 0 n m之透過率的最小値係如表1所示。該 値爲95 %以上時,即稱保護膜具有良好透明性。 (2) 耐熱尺寸安定性之評估 對上述所形成之具有保護膜之基板,於烤箱中以 -103- 200905264 2 5 0 °C、1小時時間之條件下加熱,並測定加熱前後之膜厚 度。依下述式所算出之耐熱尺寸安定性則如表1所示。該 値爲95 %以上時,即稱具有良好之耐熱尺寸安定性。 耐熱尺寸安定性=(加熱後之膜厚)/(加熱前之膜厚)χΐ00(%) (3)耐熱變色性之評估 對上述所形成之具有保護膜之基板,於烤箱中以 2 5 0 °C、1小時時間之條件下加熱,加熱前後之透明性依上 述(1)相同方式進行測定。依下述式所算出之耐熱變色性 係如表1所示。該値爲5%以下時,即稱具有良好耐熱變色 性。 耐熱變色性=加熱前之透過率-加熱後之透過率(%) (4)鉛筆硬度之測定 對上述所形成之具有保護膜之基板,使用)131<:· 5 4 00- 1 99 0之8.4.1鉛筆進行刻劃試驗以測定保護膜之表面 硬度。該値係如表1所示。該値具有4H或其以上之硬度時 ,則稱具有良好表面硬度。 (5 )密著性之評估 對上述所形成之具有保護膜之基板,進行加壓試驗 (120。(:、濕度1〇〇%、4小時)後,以113【-540 0- 1 9 90之8.5.3之 -104- 200905264 附著性棋盤孔膠布法評估保護膜之密著性(對Si02之密著 性)。棋盤孔1 〇〇個中,殘留之爲棋盤孔之數係如表2所示 〇 又,對Cr密著性之評估中,除使用Cr基板代替Si〇2集 積回路玻璃基板以外,其他皆依上述相同方法形成膜厚 2. Ομιη之保護膜,並依上述棋盤孔膠布法進行相同之評估 。其結果如表1所示。 (6)昇華物之評估 使後燒焙後之膜厚爲2.0 μηι之方式,使用旋轉塗佈器 將上述組成物塗佈於Si02集積回路玻璃基板上後,於預 燒焙之基板的1〜2 cm上設置玻璃晶圓,並對熱壓板上進行 8CTC、5分鐘之預燒焙以使昇華物附著於玻璃晶圓上。其 後,使用霧化測定器測定附著有昇華物之基板的霧化値, 以評估昇華物之有無。昇華物較多(污染物質(outgas)較多 )之情形,可觀察其霧化値較高(霧化値> 1 ),於無昇華物( 無污染物質(outgas))之情形時,該霧化値幾乎爲趨近於〇 之値。 (7)保存安定性之評估 使用東京計器(股)製 ELD型黏度計以測定實施例1所 製作之保護膜形成用之樹脂組成物的黏度。其後’將該組 成物於2 5 °C下靜置’並每日測定2 5 °C下之溶液黏度。以製 作後之黏度爲基準’計算其增黏5%所需要之日數’該曰 -105- 200905264 數係如表1所示。該日數爲2〇日以上時,即稱其具有良好 之保存安定性。 (8) 耐鹼性之評估 對上述所形成之具有保護膜之基板,將其浸漬於3〇t: 之5%N AOH中3 Omin,浸漬後,於熱壓板上去除水份後測 定膜之厚度。依下述式所算出之耐鹼性係如表1所示。該 値爲95 %以上時,即稱其具有良好之耐鹼性。 耐鹼性=(水份除去後之膜厚)/(浸漬前之膜厚)χ 1〇〇(%) (9) IT0圖型形成特性之評估 對上述所形成之具有保護膜之基板,於High rate Sputtering裝置SH-5 5 0-C12(日本真空技術公司製)中,使 用ITO標靶(ITO充塡率95%以上,In2O3/SnO2 = 90/10重量 比),於60°C下濺鍍ITO。此時之氣體環境爲減壓度 1_0Χ10·5ΡΑ、Ar 氣體流量 3.12xl(T3m3/h、02 氣體流量 1.2xl(T5m3/h。濺鍍後之基板於清淨烤箱中,以24(TC、1 小時時間加熱。 其次,於所得基板上,使用旋轉塗佈器塗佈JSR(股) 製正型光組PFR3 65 0後’於熱壓板上以90°C、2分鐘時間 進行預燒焙以形成塗膜。其後’介由具有1〇μηι/1〇μιη之線 路與空間之光罩,使用曝光機Canon PLA501F(佳能(股)製 )將 ghi 線(波長 436nm、405nm、365nm 之強度比=2_7: -106- 200905264 2.5· 4_8)以換算爲i線爲照度40W/m2、250J/m2之曝光量 照射,於室溫下,使用2.4%TMAH水溶液進行60秒鐘之浸 漬顯影,使用超純水洗條6 0秒鐘後、風乾。其後,再於清 淨烤箱中進行1 5 0 °C、1小時之加熱處理,而製得it◦上形 成有光阻圖型之基板。 其次’使用硝酸/鹽酸以1 /3之重量比混合所得之蝕刻 劑,以濕式蝕刻方式形成I T 0之圖型。將得之基板浸漬於 蝕刻劑中,以每1 〇秒將基板取出,並以光學顯微鏡計測所 形成之ITO線路圖型的線寬,_以測定ITO線路圖型之線 寬達1 Ομιη時之鈾刻時間。以光學顯微鏡計測相當於該蝕 刻時間之1.2倍之時間下,浸漬於蝕刻劑時之ΙΤΟ線路圖 型之線寬,其結果如表1所示。所形成之ΙΤΟ線路圖型之 線寬越趨近於1 〇μηι時,則稱ΙΤΟ圖型形成特性越佳。 實施例2〜18及比較例1〜5 將組成物之各成分的種類及量依表1所記載之內容, 除使用表1所記載之溶劑並配合表1記載之固體成分濃度以 外,其他皆依實施例1相同方法製作樹脂組成物。 使用上述方式所製作之保護膜形成用之樹脂組成物’ 依實施例1相同方式形成保護膜’並進行評估。其結果如 表1所示。 -107- 200905264 s m 中 1 oo t t 1 ) O o 1" « 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 o 1 1 1 卜 1 1 1 1 100 1 1 1 1 1 1 1 1 o 1 1 1 1 1 i 1 1 1 1 1 1 1 1 100 1 1 i 1 1 1 1 1 > J yn 1 1 1 1 1 1 1 1 1 1 1 Ο > 1 1 1 1 1 1 1 1 1 1 1 1 o 1 1 1 1 1 1 1 1 ·μ=5 |K 寸 1 〇 r' < 1 1 1 1 1 1 1 1 1 1 1 1 1 o 1 1 1 1 1 1 1 1 1 m o 1 1 1 1 1 1 l 1 1 1 1 1 1 1 1 1 1 i 1 1 1 1 1 (N 〇 1 1 1 1 1 1 t 1 1 r 1 1 1 o 1 1 1 1 1 1 1 1 1 1 1 _ o 1 1 1 1 1 1 1 1 1 1 1 1 o 1 1 t ! 1 i 1 1 1 1 1 A-l A-2 A-3 A-4 Ί A-5 A-6 A-7 A-8 Os < A-10 A-ll A-12 A-13 ώ i B-2 _B=3_ B-4 B-5 B-6 B-7 B-8 ΒΊ0 X) 共聚合物 (B)成分 -108- 200905264 8fi 實施例 QO 1 1 1 1 1 1 1 1 1 in 1 1—Η 1 1 1 卜 1 1 1 1 1 1 1 1 1 1 ι—( 1 1 1 〇 l 1 1 1 1 1 1 1 1 1 ,丨1 < 1 1 1 yrt 1 1 1 〇 1 1 1 〇 1 1 1 1 1 1 1 寸 1 1 〇 1 1 1 < 1 H 1 1 1 1 ι—Η 1 1 1 1 〇 1 1 1 1 1 1 1 1 r—1 1 1 1 (N 1 〇 1 1 1 o 1 1 1 1 1 Τ~~Η 1 1 1 〇 1 1 1 T_H 1 1 1 1 1 1 1 1 1 C-l C-2 cn 0 _c-4 Ί D-l D-2 D-3 D-4 ώ 1 Ε-2 m ώ Ε-4 ci CN 1 tin uL (C)成分 (D戚分 (Ε戚分 (F戚分 -109- 200905264 (i 4£3 oo S-l/S-2 =8/2 Os Os ON Os ffi vn Ο ο ο 15日以 上 ON ON vr> 〇\ 卜 S-l/S-2 =8/2 ON Os Os m K VO Ο ο ο 15日以 上 Ό\ ON OS VO S-l/S-2 =8/2 Ο ON C\ m K ο 1—^ ο ί—^ ο 15日以 上 On Os 寸 On S-l/S-2 =8/2 ON as ON ON m ffi 100 ο >« 4 ο 15日以 上 On Os (N ON IK 寸 S-l/S-2 =8/2 Os ON s; m 寸 100 ο 1—^ ο 15日以 上 s; 卜 m S-l/S-2 =8/2 Os OS On Os ΓΊ X in ο ο 100 ο 15曰以 上 〇\ ON r- 〇s CN S-l/S-2 =8/2 ON ON Cs On m X ο ο ο f _ _ ο 15日以 上 ON OS '~' S-l/S-2 =8/2 ON ON 00 Os ffi 100 ο ο 15日以 上 as Ό ON Si02 溶劑 固體成分濃度(%) 透明性(%) 耐熱性(%) 耐熱變色性(%) 鉛筆硬度 密著性 昇華物(霧化値) 保存安定性(日)@25°c 耐鹼性(%) ITO圖型形成特性 -110- 200905264I propyl phenyl di- η-propoxy sand, 3-aminopropyl phenyl di-i-propoxy decane, 3-aminopropyl phenyl diethoxy decane, 3 - Aminopropylphenyl bis(methoxyethoxy)decane, N-2-(aminoethyl)-3-aminopropyltrimethoxydecane, N-2-(aminoethyl)- 3-aminopropyltriethoxydecane, N-2-(aminoethyl)-3-aminopropyltri-n-propoxydecane, N-2-(aminoethyl)-3 -Aminopropyltri-i-propoxylate, N-2-(aminoethyl)-3-aminopropyltriethoxypropane, N-2-(aminoethyl)- 3-aminopropyltris(methoxyethoxy)decane, N-2-(aminoethyl)-3.aminopropylmethyldi-71 - 200905264 methoxydecane, N-2- (Aminoethyl)-3-aminopropylmethyldiethoxydecane, N-2-(aminoethyl)-3-aminopropylmethyldi-n-propoxydecane, hydrazine -2-(Aminoethyl)-3-aminopropylmethyldi-i-propoxydecane, anthracene-2-(aminoethyl)-3-aminopropylmethyldiethoxycarbonyl Baseline, indole-2-(aminoethyl)-3-aminopropylethyldimethoxydecane, indole-2-(aminoethyl)-3-amine Propyl ethyl diethoxy decane, N-2-(aminoethyl)-3-aminopropylethyldi-η-propoxy decane, N-2-(aminoethyl)- 3-aminopropylethyldi-i-propoxydecane, N-2-(aminoethyl)-3-aminopropylethyldiethoxypropane, N-2-(amino group) Ethyl) 3-aminopropylethyl bis(methoxyethoxy)decane, indole-2-(aminoethyl)-3-aminopropylphenyldimethoxydecane, N- 2-(Aminoethyl)-3-aminopropylphenyldiethoxydecane, N-2-(aminoethyl)-3-aminopropylphenyldi-η-propoxydecane , N-2-(Aminoethyl)-3-aminopropylphenyldi-i-propoxydecane, N-2-(aminoethyl)-3-aminopropylphenyldiethyl醯oxydecane, N-2-(aminoethyl)-3-aminopropylphenyl bis(methoxyethoxy)decane, aminomethyltrimethoxydecane, aminomethyltriethyl Oxydecane, aminomethyltri-n-propoxydecane, aminomethyltri-i-propoxydecane, aminomethyltriethoxydecane, aminomethyltris(methoxy) Ethoxy)decane, aminomethylmethyldimethoxydecane, aminomethylmethyl Diethoxydecane, aminomethylmethyldi-n-propoxydecane, aminomethylmethyldi-i-propoxydecane, aminomethylmethyldiethoxydecane, amine Methylethyldimethoxydecane, aminomethylethyldiethoxydecane, aminomethylethyldi-n-propoxydecane, aminomethylethyldi-i-propoxy Baseline, aminomethylethyldiethoxydecane, aminomethylethylbis(methoxyethoxy)decane, aminomethylphenyl-72-200905264 dimethoxydecane, amine Methylphenyldiethoxydecane, aminomethylphenyldi-n-propoxydecane, aminomethylphenyldi-i-propoxydecane, aminomethylphenyldiacetamidine Oxydecane, aminomethylphenyl bis(methoxyethoxy)decane, 2-aminoethyltrimethoxydecane, 2-aminoethyltriethoxydecane, 2-aminoethyl Tri-n-propoxydecane, 2-aminoethyltri- 1-propoxydecane, 2-aminoethyltriethoxydecane, 2-aminoethyltris(methoxyethoxy) Base) decane, 2-aminoethylmethyldimethoxydecane, 2-aminoethylmethyldiethyl Baseline, 2-aminoethylmethyldi-n-propoxydecane, 2-aminoethylmethyldi-i-propoxydecane, 2-aminoethylmethyldiethoxycarbonyl Decane, 2-aminoethylethyldimethoxydecane, 2-aminoethylethyldiethoxydecane, 2-aminoethylethyldi-n-propoxydecane, 2-amine Ethylethyldi-i-propoxydecane, 2-aminoethylethyldiethoxydecane, 2-aminoethylethylbis(methoxyethoxy)decane, 2 - Aminoethyl phenyl dimethoxy decane, 2-aminoethyl phenyl diethoxy decane, 2-aminoethyl phenyl di- η-propoxy decane, 2-aminoethyl benzene Di-i-propoxydecane, 2-aminoethylphenyldiethoxydecane, 2-aminoethylphenylbis(methoxyethoxy)decane, N-phenyl-3 -Aminopropyltrimethoxydecane, N-phenyl-3-aminopropyltriethoxydecane, N-phenyl-3-aminopropyltri-n-propoxydecane, N-benzene 3-aminopropyltri-i-propoxydecane, N-phenyl-3-aminopropyltriethoxypropane, N-phenyl-3-aminopropyltris(methoxy Ethyl ethoxy) decane, N- Phenyl-3-aminopropylmethyl-methoxylate, N-benzyl-3-aminopropylmethyl-ethoxy decane, N-phenyl-3-aminopropylmethyl Di-n-propoxydecane, N-phenyl-3-aminopropylmethyldi-i-propoxydecane, fluorenyl-phenyl-3-aminopropylmethyl-73- 200905264醯oxydecane, N-phenyl-3-aminopropylethyldimethoxydecane, N-phenyl-3-aminopropylethyldiethoxydecane, N-phenyl-3- Aminopropylethyldi-n-propoxydecane, N-phenyl-3-aminopropylethyldi-propoxylate, Ν-phenyl-3-aminopropylethyl Ethylene oxide sand, N-phenyl-3-aminopropylethyl bis(methoxyethoxy)decane, N-phenyl-3-aminopropyl phenyl dimethoxy decane, N-phenyl-3-aminopropylphenyldiethoxydecane, N-phenyl-3-aminopropylphenyldi-n-propoxydecane, fluorenyl-phenyl-3-amino Propyl phenyl dipropoxy decane, fluorenyl-phenylaminopropyl phenyldiethoxy decane, N-phenyl-3-aminopropyl phenyl-(methoxyethyl) Sand yard, 3-trimethoxy sulfonyl-N-(l,3-methylbutylidene Propylamine, 3-triethoxydecyl-N-(l,3-dimethyl-butylene)propylamine, 3-tri-n-propoxydecyl-N-(l,3- Dimethyl-butylene) propylamine or the like; specific examples of the compound (1) containing a ureido group, such as 'isocyanate methyl dimethoxy methoxy decane, ureido methyl triethoxy decane, urea group A Tris-propoxydecane, ureidomethyltri-i-propoxydecane, ureidomethyl HZi oxo 1 decane, ureidomethyltris(methoxyethoxy)decane, ureidomethyl Methyldimethoxydecane, ureidomethylmethyldiethoxydecane, ureidomethylmethyldi-n-propoxydecane, ureidomethylmethyldi-i-propoxy decane, Ureidomethylmethyldiethoxydecane, ureidomethylethyldimethoxy, ureidomethylethyldiethoxydecane, ureidomethylethyldi-n-propoxydecane , ureidomethylethyl di-i-propoxy decane, ureidomethylethyl-ethoxy decane, ureidomethylethyl bis(methoxyethoxy) cleavage, vascular base Phenyldimethoxydecane, Ureamethylphenyldiethoxylate, -74- 200905264 Benyl _·_η-propoxy oxalate, ketomethylphenyl bis-i-propoxy decane, ureidomethylphenyldiethoxy decane, ureidomethylphenyl bis(methoxy Ethyl ethoxy) decane, 2-ureidoethyl trimethoxy decane, 2-ureidoethyl triethoxy decane, 2- ureidoethyl tri-n-propoxy decane, 2- ureido Tris-i-propoxydecane, 2-ureidoethyltriethoxydecane, 2-ureidoethyltris(methoxyethoxy)decane, 2-ureidoethylmethyldimethyl Oxydecane, 2-Urylidetoethylmethyldiethoxydecane, 2-Urytylethylmethyldi-n-propoxydecane, 2-Urylicethylmethyldi-i-propoxy Decane, 2-ureidoethylmethyldiethoxydecane, 2-ureidoethylethyldimethoxydecane, 2-ureidoethylethyldiethoxydecane, 2-ureidoethyl Benzyl di-n-propoxydecane, 2-ureidoethylethyldi-i-propoxydecane, 2-ureidoethylethyldiethoxydecane, 2-ureidoethyl Ethyl bis(methoxyethoxy)decane, 2-ureidoethylphenyldimethoxydecane, 2-ureidoethylphenyldiethoxydecane, 2-ureido B Phenyl di-n-propoxydecane, 2-ureidoethylphenyldi-i-propoxydecane, 2-ureidoethylphenyldiethoxydecane, 2-ureidoethylbenzene Di-(methoxyethoxy)decane, 3-ureidopropyltrimethoxyfluorene. , 3-ureidopropyltriethoxydecane, 3-ureidopropyltri-n-propoxydecane, 3-ureidopropyltri-i-propoxydecane, 3-ureidopropyl Triethoxydecane, 3-ureidopropyltris(methoxyethoxy)decane, 3-ureidopropylmethyldimethoxydecane, 3-ureidopropylmethyldiethoxy Decane, 3-ureidopropylmethyldi-n-propoxydecane, 3-ureidopropylmethyldi-i-propoxydecane, 3-ureidopropylmethyldiethoxylate Hospital, 3-propyl propyl ethyl monomethoxy sand, 3-propyl propyl ethyl diethoxy decane, 3-ureidopropyl ethyl bis η-propoxy decane, 3- Urea-75- 200905264 propylethyl di-i-propoxydecane, 3-ureidopropylethyldiethoxydecane, 3-ureidopropylethylbis(methoxyethoxy) ) decane, 3-ureidopropylphenyldimethoxydecane, 3-ureidopropylphenyldiethoxydecane, 3-ureidopropylphenyldi-η-propoxydecane, 3- Ureidopropylphenyldi-i-propoxydecane, 3-ureidopropylphenyldiethoxydecane, 3-ureidopropylphenylbis(methoxyethoxy)decane, etc. Specific examples of the styryl group-containing compound (1), for example, styryltrimethoxydecane, styryltriethoxydecane, styryltris-n-propoxydecane, styryltri-i- Propoxy decane, styryltriethoxydecane, styryltris(methoxyethoxy)decane, styrylmethyldimethoxydecane, styrylmethyldiethoxydecane , styrylmethyldi-n-propoxydecane, styrylmethyldi-i-propoxydecane, styrylmethyldiethoxydecane, styrylethyldimethoxy Decane, styrylethyldiethoxydecane, styrylethyldi-n-propoxydecane, styrylethyldi-i-propoxydecane, styrylethyldiethoxycarbonyl Baseline, styrylethyl bis(methoxyethoxy)decane, styrylphenyldimethoxydecane, styrylphenyldiethoxydecane, styrylphenyldi-n- Propoxy decane, styrylphenyl di-i-propoxy decane, styryl phenyl dimethyl decyl decane, styryl phenyl bis (methoxy ethoxy) ) Silane like; Among them, a compound (1) containing an oxiranyl group, an oxetanyl group, a carboxyl group or a thiol group is preferably used, particularly 3-glycidoxypropyltrimethoxydecane, 3- Glycidoxypropyltriethoxydecane, 3-76-200905264, glycidoxypropylmethyldimethoxydecane, 3-glycidoxypropylmethyldiethoxylate Institute, 2-(3,4-epoxycyclohexyl)ethyltrimethoxy sand, 2·(3,4-epoxycyclohexyl)ethyldiethoxylate, (3-ethyl) Oxetane-3-yl)propyltrimethoxyindole, (3-ethyloxetane-3-yl)propyltriethoxydecane, carboxymethyltrimethoxydecane, 3 It is more preferable from the viewpoints of the reactivity of _hydrothiopropyltrimethoxydecane, 3-hydrothiopropyltriethoxydecane, and the [Α] component. Further, the compound (1) containing an oxiranyl group or an oxetan group is preferably used in view of its ITO pattern formation property, etc., particularly 3-glycidoxypropyltrimethoxy Baseline, 3_glycidoxypropyltriethoxydecane, 3-glycidoxypropylmethyldimethoxydecane, 3-glycidoxypropylmethyldiethoxy Sand yard, (3-ethyloxetan-3-yl)propyltrimethoxydecane, (3-ethyloxetanyl)propyltriethoxydecane is preferred. Specific examples of the compound (2) are, for example, tetramethoxy cleavage, tetraethoxy shixiyuan (commonly known as TEOS), tetra-n-propoxy oxalate, tetraisopropoxy collateral, tetra-n-butoxy砂 院 等 四 四 四 矽垸 矽垸 ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; , cyclohexyl triethoxy sand courtyard, etc., single courtyard, second courtyard, oxygen sand hospital 'beneficiary diethoxy sand court, naphthyl triethoxy decane, chlorophenyl triethoxy fluorene, 4- Cyanophenyl triethoxy decane, 4-aminophenyl triethoxy decane, 4-nitrophenyl triethoxy sand, methyl-based diethoxy lanthanum, 4-hydroxybenzene Single-aryl three-envelope oxidized house such as triethoxy silicate sand; phenoxy triethoxy sand, naphthyloxytriethoxy sand, 4-chlorophenyloxy-77- 200905264 Triethoxydecane, 4-cyanophenyltrioxyethoxysilane, 4-aminophenyloxytriethoxydecane, 4-nitrophenyloxytriethoxydecane, 4 -Methylphenyloxytriethoxydecane, 4-hydroxyphenyloxytriethoxydecane, etc. a hydroxy alkoxy decane; a monohydroxytrimethoxy decane, a monohydroxytriethoxy decane, a monohydroxytri-n-propoxy decane, or the like; a monohydroxytrialkoxy decane; a dimethyldimethoxy group; a hospital such as decane, dimethyldiethoxydecane, dimethyldi-n-propoxydecane, methyl(ethyl)diethoxydecane, methyl(cyclohexyl)-ethoxy samarium a base oxide base; a monoalkyl monoaryl dialkoxy decane such as methyl (phenyl) diethoxy decane; a diaryl dialkoxy decane such as diphenyldiethoxy decane; a diaryloxydialkoxydecane such as phenoxydiethoxydecane; a monoalkylmonoaryloxydialkoxydecane such as methyl(phenoxy)diethoxydecane; Monoaryl monoaryloxydialkoxydecane, such as phenoxy)diethoxydecane; dihydroxydimethoxydecane, dihydroxydiethoxydecane, dihydroxydi-n-propoxydecane Or a mono-alkyl dialkoxy decane such as methyl (hydroxy) dimethoxy decane; or a monoaryl group such as phenyl (hydroxy) dimethoxy decane; Monohydroxy dialkoxy decane; trimethyl methoxy decane, trimethyl ethoxy decane, trimethyl-η-propoxy decane, dimethyl (ethyl) ethoxy decane, dimethyl a trialkylmonoalkoxydecane such as (cyclohexyl)ethoxy decane; a dialkylmonoarylmonoalkoxydecane such as dimethyl(phenyl)ethoxysilane; methyl (diphenyl) a monoalkyldiarylmonoalkoxydecane such as oxydecane; a triaryloxymonoalkoxydecane such as triphenyloxyethoxysilane; or a monoalkane such as methyl (diphenoxy)ethoxydecane Monoaryloxymonoalkoxydecane; monoaryldiaryloxymonoalkylene such as phenyl(diphenoxy)ethoxydecane-78- 200905264 Oxylation; dimethyl (phenoxy) a dialkyl monoaryloxy single-living oxylate; a diarylmonoaryloxy-single-oxy oxa sulphate such as diphenyl(phenoxy)ethoxydecane; Monoalkylmonoarylmonoaryloxymonoalkoxydecane such as methyl(phenyl)(phenoxy)ethoxydecane; trihydroxymethoxydecane, trihydroxyethoxydecane, trihydroxyl_ N_propoxy A trihydroxy monoalkoxydecane or the like such as a decane. Wherein 'tetramethoxy decane, tetraethoxy decane, methyl trimethoxy decane, methyl triethoxy decane, phenyl trimethoxy decane, phenyl triethoxy decane, dimethyl dimethoxy From the viewpoints of reactivity, adhesion to a substrate, and the like, it is preferred from the viewpoints of reactivity, adhesion to a substrate, and the like, such as decane, dimethyldiethoxy decane, a methicone, or a phenyldiethoxy sulphate. These compounds can be used in any combination of any of the plural components. When the above compound ' is provided as a co-hydrolysis reaction, it can be used as the component [B] used in the present invention. The hydrolysis reaction is preferably carried out in a suitable solvent. Such solvents, such as methanol, ethanol, η-propanol, isopropyl alcohol, η·butanol, isobutyl yeast, t-butyl alcohol, acetone, methyl ethyl ketone, methyl isobutyl ketone, A water-soluble solvent such as propylene glycol monomethyl ether, propylene glycol methyl ether acetate, tetrahydrofuran, dioxane or acetonitrile or an aqueous solution thereof. The water-soluble solvent can be removed in the subsequent steps, and is similar to methanol, acetamidine, η-propanol, isopropyl alcohol, acetone, methyl ethyl ketone, methyl isobutyl ketone, tetrahydrofuran, and the like. The low-boiling point is better. In terms of the solubility of the raw material, it is better to use a ketone such as acetone 'methyl ethyl ketone' and methyl isobutyl ketone. -79- 200905264 'Best for methyl isobutylene Basic reward. The hydrolysis reaction used in the synthesis of the component [B] is preferably an acid catalyst such as 'hydrochloric acid, sulfuric acid, nitric acid, formic acid, oxalic acid, acetic acid' trifluoroacetic acid, trifluoromethanesulfonic acid, acidic ion exchange resin, various kinds of Louis. Acid or the like, or a basic catalyst such as ammonia, a primary amine, a secondary amine, a tertiary amine, a nitrogen-containing aromatic compound such as pyridine, a basic ion exchange resin, or a hydroxide such as sodium hydroxide. It is carried out in the presence of a carbonate such as potassium carbonate, a carboxylate such as sodium acetate, or various Lewis bases. The amount of water used can be appropriately set in accordance with the reaction temperature, reaction time, and the like. For example, the following conditions can be employed. The amount of water used is 1 mol, more preferably 1., based on the total of the alkoxy group and the halogen atom in the compound represented by the above formula (1) and the compound represented by the above formula (2). 5 moles or less, more preferably 1 mole or less, the best is 0. 9 moles below the amount. The reaction temperature is preferably from 40 to 200 ° C, more preferably from 50 to 150 ° C. The reaction time is preferably from 30 minutes to 24 hours, more preferably from 1 to 12 hours. The polystyrene-equivalent weight average molecular weight (hereinafter also referred to as "Mw") obtained by gel permeation chromatography (GPC) of the component [B] is preferably 500 to 10, more preferably 1 , 〇〇〇 ~ 3,000. When ^4\¥ is less than 500, it is extremely difficult to obtain sufficient adhesion or it is not easy to produce the inhibitory effect on the contaminants that occur when the spacing is formed. When it exceeds 10,000, the coating property may be deteriorated. , commercially available products of "B", for example, BY16-848, BY16-201, BY 1 6-8 53 C, BY 1 6-208, BY1 6-209, BY 1 6-85 0 , SF8417, BY 1 6- 849, BY 1 6-8 72, BY 1 6 - 8 5 5 D, SF841 1, -80- 200905264 SF8413, SF8421, BY16-839, BY16-750, SF8418 (above, Toray. Dow Corning Polycarbonate (TS), TSF4700, TSF4701, TSF4702, TSF4703, TSF4704, TSF4705, TSF4706, TSF4707, TSF4708, TSF4709, TSF4730, TSL9906, YF3965, XF42-B0970 (above, Momente·Ha Full ·Metal), X-4 1 - 1 05 3, X-41-1056, X-4 Bu 1805, X-41-1810, X-40-2651, X-40-2655A, X-40-9721 ( The above, Shin-Etsu Chemical Co., Ltd., FM-0711, FM-072 1, FM-0 725 (above, 窒素(股)), etc. [C] Hardener The above acid anhydride [C] is added to improve the heat resistance and hardness of the formed protective film. The acid anhydride [C] is a polymer of (c-Ι) a repeating unit containing a polymerizable unsaturated compound having an acid anhydride group (except for the copolymer [A]), or (c-2) a polycarboxylic acid anhydride. Wait. An unsaturated polycarboxylic acid anhydride used for synthesizing the above (c-Ι) polymer containing a repeating unit formed of a polymerizable unsaturated compound having an acid anhydride group, for example, from econic anhydride, citraconic anhydride, maleic anhydride, and cis-1 At least one selected from the group consisting of 2,3,4-tetrahydrophthalic anhydride. Further, 'the olefinic unsaturated compound used for synthesizing a copolymer having a polymerizable unsaturated group having an anhydrous group and an olefinic unsaturated compound, for example, 'by styrene, P-methylstyrene, P-methoxy Styrene, methyl methacrylate, t-butyl methacrylate, methacrylic acid tricyclo [5. 2. 1. 02,6] at least one selected from the group consisting of decane-8-yl, 2-methylcyclohexyl acrylate, phenyl maleimide, and cyclohexyl. -81 - 200905264 In 100 parts by weight of the copolymer of the polymerizable unsaturated compound having an acid anhydride group and the olefinic compound, the polymerizability of the acid anhydride group and the copolymerization ratio of the compound are preferably from 1 to 80% by weight. Parts, more 10 to 60 parts by weight. When these copolymers are used, a protective film having excellent properties can be obtained. A preferred example of a copolymer obtained from an acid anhydride-containing polymerizable unsaturated compound and an olefinic unsaturated compound is, for example, maleic anhydride copolymerized styrene, citric anhydride/methacrylic acid tricyclic [5. 2. 1. 〇 2'6 ] decane copolymer, etc. Further, the polystyrene-equivalent weight average of the copolymer of the polymerizable unsaturated compound having an acid anhydride group and the dilute unsaturated compound is preferably 500 to 50,000', more preferably 500 to 10, Å. When a copolymer having a molecular weight range is used, a film having excellent planarization properties can be obtained. The above polycarboxylic acid anhydride (c - 2 ), for example, isaconic anhydride, citric acid citrate anhydride, dodecene succinic anhydride, propylene tricarboxylic anhydride, maleic acid hexahydrophthalic anhydride, methyl tetrahydrobenzene An aliphatic dicarboxylic anhydride such as acetic anhydride or norbornene anhydride; an alicyclic polycarboxylic dianhydride such as I, 2,3,4-butanetetracarboxylic dianhydride or alkanetetracarboxylic dianhydride; An aromatic carboxylic acid anhydride such as tetracarboxylic anhydride, trimesic anhydride or benzophenone tetracarboxylic anhydride; an acid anhydride containing an ester group such as ethylene glycol bis-benzenetricarboxylic anhydride or glycerol trimellitic anhydride; and the like. Among them, the aromatic polycarboxylic acid anhydride is preferably a pyroformic acid anhydride having a heat resistance which is excellent in heat resistance. And the unsaturated is a good flat compound / -8-alkyl hydrocarbon proton amount of the above-mentioned phthalic anhydride, anhydride, dicarboxycyclopentaylene polycarboxylic acid special point -82-200905264 [D] polyfunctional compound of the present invention As the polyfunctional compound to be used, for example, a cationically polymerizable compound and/or a polyfunctional (meth)acrylic compound can be used. The cationic polymerizable compound is a compound having two or more oxirane groups or oxadin groups in the molecule (except for the above-mentioned copolymer [Α_ι]). a compound having two or more oxirane groups or oxetanyl groups in the molecule, for example, a compound having two or more epoxy groups in the molecule, or a compound having a 3,4-epoxycyclohexyl group Wait. a compound having two or more epoxy groups in the above molecule, for example, bisphenol A diglycidyl ether, bisphenol F diglycidyl ether, bisphenol S diglycidyl ether, hydrogenated bisphenol A diglycidyl ether, hydrogenation double a bisphenol compound such as phenol F diglycidyl ether, hydrogenated bisphenol AD diglycidyl ether, brominated bisphenol A diglycidyl ether, brominated bisphenol F diglycidyl ether, brominated bisphenol S diglycidyl ether Diglycidyl ether; 1,4-butanediol diglycidyl ether, 1,6-hexanediol diglycidyl ether, glycerol triglycidyl ether, trimethylolpropane triglycidyl ether, polyethylene a polyglycidyl ether of a polyhydric alcohol such as glycerol diglycidyl ether or polypropylene glycol diglycidyl ether; an aliphatic polyol such as ethylene glycol, propylene glycol or glycerin is added with one or more kinds of alkoxylation Polyglycidyl ether of polyether polyol obtained by the invention; phenol novolak type epoxy resin; cresol novolac type epoxy resin; -83- 200905264 polyphenol type epoxy resin; aliphatic long chain dibasic acid Glycidyl esters; glycidyl esters of higher fatty acids Epoxidized soybean oil, epoxidized linseed oil. A commercially available product having a compound having two or more epoxy groups in the molecule, for example, a bisphenol A type epoxy resin EPIKOTE 1001, the same 1002, the same 1003, the same 10 04, the same 1007, the same 1009, the same 1010, the same 828 ( The above-mentioned 'Japanese epoxy resin (manufactured by the company)); bisphenol F-type epoxy resin, such as EPIKOTE8〇7 (made by Nippon Epoxy Resin Co., Ltd.); phenol novolac type epoxy resin, such as EPIKOTE152, the same 154 157S65 (above, Japanese epoxy resin), EPPN201, 202 (above, Nippon Chemical Co., Ltd.), etc.; cresol novolac epoxy resin, such as EOCN102, same 103S, same 104S , 1020, 1025, 1027 (above, Nippon Chemical Co., Ltd.), EPIKOTE 180S75 (made by Nippon Epoxy Resin Co., Ltd.), etc.; polyphenol type epoxy resin, such as EPIKOTE 1 03 2H60, Χ γ _ 4000 (above, Japanese epoxy resin (share), etc.; cyclic aliphatic epoxy resin, such as CY-175, the same 177, the same 179, Aro CY-182, the same 192, 184 (above, steam bat chemical) )), ERL-4234, 4299, 4221, 4206 (above, U. C. C company system) 'SHODYNE509 (Showa Electric Co., Ltd.), EPICLON200, 40 〇 (above 'Daily Ink (share) system), EPIKOTE 871, the same 872 (above, 曰本 epoxy resin (share) system), ED-566 1. Same as 5662 (above, manufactured by Celanese-84-200905264 coating company); aliphatic polyglycidyl ether, such as EPOLITE 100MF (manufactured by Kyoeisha Chemical Co., Ltd.), EPOILTMP (made by Nippon Oil & Fats Co., Ltd.) Wait. a compound having two or more 3,4-epoxycyclohexyl groups in the above molecule, for example, 3,4-epoxycyclohexylmethyl-3',4'-epoxycyclohexanecarboxylate' 2 -(3,4-epoxycyclohexyl-5,5-spiro-3,4-epoxy)cyclohexane-methyl-dioxane, bis(3,4-epoxycyclohexylmethyl) Adipate, bis(3,4-epoxy-6-methylcyclohexylmethyl)adipate, 3,4-epoxy-6-methylcyclohexyl_3',4'- Epoxy-6'-methylcyclohexanecarboxylate, methyl bis(3,4-epoxycyclohexane), dicyclopentyl diepoxide, ethylene glycol (3, 4-epoxycyclohexylmethyl)ether, ethylene bis(3,4-epoxycyclohexanecarboxylate), lactone modified 3,4-epoxycyclohexylmethyl-3',4 '-Epoxycyclohexane carboxylate and the like. Among these cationically polymerizable compounds, a phenol novolac type epoxy resin and a polyphenol type epoxy resin are preferred. Further, a polyfunctional (meth) acrylate compound, for example, ethylene glycol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, 1,9-nonanediol (A) Acrylate, polypropylene glycol di(meth)acrylate, tetraethylene glycol di(meth)acrylate, bisphenoxyethanol oxime diacrylate, trimethylolpropane tri(meth) acrylate, Pentaerythritol tri(meth)acrylate, tris((meth)acryloyloxyethyl)phosphate, pentaerythritol tetra(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(methyl) Acrylate, tripropylene decyloxypentaerythritol succinic acid {alias: 3-propenyloxy-2,2-bisacrylomethoxymethyl propyl} ester -85- 200905264, dipropylene decyloxy pentaerythritol succinic acid {alias: 3-propenyloxy-2-propenyloxymethyl-propyl} ester, penta propylene oxydipentaerythritol succinic acid {alias: [3-(3-acryloxy-2,2) -bis-propylene methoxymethyl-propyl)-2,2-bis-acryloxymethyl-propyl] ester, tetrapropylene decyloxy two seasons Pentaerythritol succinic acid {alias: [3-(3-propenyloxy-2,2-di-acryloxymethyl-propyl)-2-propenyloxymethyl]propyl} ester} Wait. The commercial product is, for example, ARONIX-M-210, the same M-240, the same M-6200, the same M-309 'the same M-400, the same M-402, the same M-405, the same M-450, the same M- 7100, same as M-8030, same as M-8060 (manufactured by East Asia Synthetic Industry Co., Ltd.) 'KAYARAD HDDA, same as HX-220, same with R-604, with TMPTA, with DPHA, with DPCA-20' with DPCA-30, Same as DPCA-60, same as DPCA-120 (Nippon Chemical Co., Ltd.) 'VISCOAT260, same 312, same 335 HP, same 295, same 00, same 360, same GPT, same 3PA, same 400 (Osaka Organic Industry (share) system, etc. They can be used singly or in combination. [E] Hardening accelerator [E] The curing accelerator is used in combination with the [C] hardener for the purpose of improving the heat resistance or hardness of the formed protective film. Specific examples of the hardening accelerator [D] are, for example, 2-phenylimidazole, 2-phenyl-4-methylimidazole, benzyl-2-phenylimidazole, 2,4-diamino-6-[2,-A Imidazolyl-(1,)]-ethyl-3-triazine, 2. 4-Diamino-6-[2,-undecylimidazolyl-(1,)]-ethyl-S-triazine, 2. 4-Diamino-6-[2,-ethyl-4,-methylimidazolylundecylimidyl--86 - 200905264 (1')]-Ethyl-S-triazine, 2-Benzene 4- 4,5-dihydroxymethylimidazole, 2-phenyl-4-methyl-5-hydroxymethylimidazole, 2-phenylimidazole trimer isocyanate adduct, 2,4-diamine -6-[2,-Methylimidazolyl-(1,)]-ethyl-3-triazine trimeric isocyanate adduct and the like. The amount of the hardening accelerator [D] added is 0. 0 parts by weight relative to the copolymer [A]. 000 1 to 10 parts by weight is preferred. In terms of heat resistance or preservation stability, etc., 001 to 1 part by weight is more preferred. [F] Surfactant The surfactant may be added for the purpose of improving the coating performance of the resin composition of the present invention. These surfactants are, for example, fluorine-based surfactants, polyoxon-based surfactants, nonionic surfactants, and other surfactants. The fluorine-based surfactant is, for example, a product name of BM CHIMIE Co., Ltd.: BM-1000, BM-1100, Dainippon Ink Chemical Industry Co., Ltd., and the name of the product, Megumi F142D, F172, F173, and F183. Sumitomo 3M (share) system name: Prola FC-135, with FC-170C, with FC-430, with FC-431, (shares) NiNS system name: FTERGENT 250, same 251, with 222F, FTX-218 'Asahi Glass Co., Ltd.' product name: SAFURON S-112, same S-113, same S-131, same S-141, same S-145, same S-3 82, same as SC-101, same SC -102, same as SC-103, same as SC-104' with SC-105, same as SC-106 and other commercial products. The above polyoxo-based surfactant, for example, Toray. Dow Corning. Polyoxyl (trade) system name: SH-28PA, SH-190, SH-193, SZ-6032 -87- 200905264, SF-8428, DC-57, DC-190, PAINTAD19, FZ-2101, the same 77 , with 2118, L-7001, L-7002, Da Chemical Japan (share) system, Byk_300, same 306, same 310, same 335, same 341, same 344, same 370, Shin-Etsu Chemical Industry Co., Ltd. :KP 3 4 1. New Akita Chemicals Co., Ltd. Trade name: EPTOP EF301, EF 3 03, and EF3 52, etc. Commercial products such as the above nonionic surfactants, for example, polyoxyethylene alkyl ethers, poly Oxyethylene aryl ether, polyoxyethylene dialkyl ester, and the like. The above polyoxyethylene alkyl ether is, for example, polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether or the like. A polyoxyethylene aryl ether, for example, polyoxyethylene octylphenyl ether, polyoxyethylene nonylphenyl ether or the like. a polyoxyethylene dialkyl ester, for example, polyoxyethylene dilauryl ester, polyoxyethylene distearyl ester, etc., other such surfactants, for example, manufactured by Kyoeisha Chemical Co., Ltd., trade name: (meth)acrylic acid Copolymer P0LYFL0W No. 57, the same No. 90 and so on. The amount of the [F] surfactant to be added is preferably 5 parts by weight or less, more preferably 2 parts by weight or less based on 1 part by weight of the polymer [A]. When the amount of the surfactant exceeds 5 parts by weight, the coating film may be cracked in the coating step. Heat-sensitive acid generator In the composition of the present invention, a heat-sensitive acid can be added. A sensible acid generator, such as a mirror salt, a benzothiazole iron salt, an ammonium salt, a scale salt, etc., wherein -88 - 200905264 is further preferably a guanidinium salt or a benzothiazole gun salt. The resin composition of the present invention can be produced by uniformly dissolving or dispersing the above components in a suitable solvent. The solvent to be used is preferably one which dissolves or disperses each component of the composition and does not react with each component. Further, in the resin composition of the present invention, the component [A] is [A3] (a) at least one selected from the group consisting of an oxiranyl group, an oxetanyl group and an allyl group. a polymerizable unsaturated compound having a functional group, and a copolymer obtained by (b5) a polymerizable unsaturated compound other than the component (a), and having no carboxyl group, a carboxylic anhydride group, or a acetal structure of a carboxylic acid in the molecule; When a ketal ester structure of a carboxylic acid, a 1-alkylcycloalkane structure of a carboxylic acid, and a t-butyl ester structure of a carboxylic acid are used, a first liquid containing no [C] hardener can be prepared and contained. [C] The combination of the second liquid of the hardener may be used in combination before use. The first liquid preferably contains a [D] polyfunctional compound. Such solvents are, for example, alcohols, ethers, glycol ethers, ethylene glycol alkyl ether acetates, diethylene glycol monoalkyl ethers, diethylene glycol dialkyl ethers, propylene glycol monoalkyl ethers, ethylene glycol dialkyl ethers. , propylene glycol alkyl ether acetate, propylene glycol alkyl ether propionate, aromatic hydrocarbon, ketone, ester, and the like. Such specific examples are, for example, alcohols such as methanol, ethanol, benzyl alcohol, etc.; ethers such as tetrahydrofuran, etc.; glycol ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, etc.; Acetate such as methyl cellosolve acetate, ethyl cellosolve acetate 'ethylene glycol monobutyl ether acetate, diethylene glycol monoethyl ether acetate, etc.; -89- 200905264 Diethylene glycol monoalkyl ether such as diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, etc.: diethylene glycol dialkyl ether such as diethylene glycol dimethyl ether, diethylene glycol diethyl ether Ethylene ether, diethylene glycol ethyl methyl ether, etc.; propylene glycol monoalkyl ether such as propylene glycol methyl ether, propylene glycol ethyl ether, propylene glycol propyl ether, propylene glycol butyl ether, etc.; ethylene glycol dialkyl ether such as propylene glycol Ethyl ether, propylene glycol methyl ethyl ether, propylene glycol methyl propyl ether, propylene glycol methyl isopropyl ether, propylene glycol methyl butyl ether, propylene glycol methyl isobutyl ether, propylene glycol methyl amyl ether, propylene glycol methyl Cyclopentyl ether, propylene glycol methyl hexyl ether, propylene glycol methyl cyclohexyl ether 'propylene glycol methyl heptyl ether, propylene glycol methyl octyl ether, etc.: C Alcohol alkyl ether acetate such as propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate, propylene glycol propyl ether acetate, propylene glycol butyl ether acetate, etc.; propylene glycol alkyl ether propionate such as propylene glycol methyl Ether propionate, propylene glycol ethyl ether propionate, propylene glycol propyl ether propionate, propylene glycol butyl ether propionate, etc.; aromatic hydrocarbons such as toluene, xylene, etc.; ketones such as methyl ethyl ketone, cyclohexyl Ketone, 4-hydroxy-4-methyl-2-pentanone, methyl isoamyl ketone, etc.; esters such as methyl acetate, ethyl acetate, propyl acetate, butyl acetate, ethyl 2-hydroxypropionate, 2 Methyl 2-hydroxy-2-methylpropionate, ethyl 2-hydroxy-2-methylpropionate, methyl hydroxyacetate, ethyl hydroxyacetate, butyl glycolate, methyl lactate, ethyl lactate, lactate Ester, butyl lactate, '3-hydroxy-90 - 200905264 methyl propionate, ethyl 3-hydroxypropionate, propyl 3-hydroxypropionate, butyl 3-hydroxypropionate, 2-hydroxy-3-methyl Methyl butyrate, methyl methoxyacetate, ethyl methoxyacetate, propyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethoxylate B Ethyl ester, propyl ethoxyacetate, butyl ethoxyacetate, methyl propoxyacetate, ethyl propoxyacetate, propyl propoxyacetate, butyl propoxyacetate, butoxyacetate Ester, ethyl butoxylate, propyl butoxyacetate, butyl butoxyacetate, methyl 2-methoxypropionate, ethyl 2-methoxypropionate, 2-methoxypropionic acid Propyl ester, butyl 2-methoxypropionate, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate, propyl 2-ethoxypropionate, 2-ethoxypropionic acid Butyl ester, methyl 2-butoxypropionate, ethyl 2-butoxypropionate, propyl 2-butoxypropionate, butyl 2-butoxypropionate, 3-methoxypropionic acid Methyl ester, ethyl 3-methoxypropionate, propyl 3-methoxypropionate, butyl 3-methoxypropionate, methyl 3-ethoxypropionate, 3-ethoxypropionic acid Ethyl ester, propyl 3-ethoxypropionate, butyl 3-ethoxypropionate, methyl 3-propoxypropionate, ethyl 3-propoxypropionate, 3-propoxypropionic acid Ester, butyl 3-propoxypropionate, methyl 3-butoxypropionate, ethyl 3-butoxypropionate, propyl 3-butoxypropionate, 3-butoxypropionic acid EsterAmong them, alcohol, diethylene glycol, propylene glycol alkyl acetate, ethylene glycol alkyl ether acetate, diethylene glycol dialkyl ether is preferred, especially benzyl alcohol, diethylene glycol ethyl Methyl ether, propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate, diethylene glycol dimethyl ether, ethylene glycol monobutyl ether acetate, diethylene glycol monoethyl ether acetate More preferably, ester, diethylene glycol diethyl ether, methyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-methoxypropionate or the like. -91 - 200905264 The amount of the solvent used is preferably from 1 to 50% by weight based on the total solid content (the total amount of the solvent-containing composition minus the amount of the solvent) in the composition of the present invention. More preferably, it is in the range of 5 to 40% by weight. The aforementioned solvent can be used in combination with a high boiling point solvent. A high boiling point solvent which can be used, for example, N-methylformamide, ν, Ν-dimethylformamide, Ν-methylformanilide, Ν-methylacetamide, hydrazine, hydrazine - Dimethylacetamide, Ν-methylpyrrolidone, dimethyl hydrazine, benzyl ethyl ether, dihexyl ether 'acetone acetone, isophorone, caproic acid, octanoic acid' 1-octanol, 1- Sterol, benzyl acetate, ethyl benzoate, diethyl oxalate, diethyl maleate, γ-butyrolactone, ethylene carbonate, propylene carbonate, phenyl cellosolve acetate, and the like. The amount used in the case of using a high boiling point solvent is preferably 90% by weight or less, and more preferably 80% by weight or less based on the total amount of the solvent. Preferably, the composition prepared by the above method uses an aperture 〇. 2~3. 0μπι, more preferably using a pore size of 0. 2~0. Use a micro ceramic filter of about 5 μm or so to filter. Formation of Color Filter Protective Film Next, a method of forming a protective film for a color filter used in the composition of the present invention will be described. The resin composition solution of the present invention is applied to the surface of the substrate. After the pre-baking to remove the solvent to form a coating film, a protective film of a color filter of interest can be formed by heat treatment. Further, in the case where the resin composition of the present invention is prepared by mixing the first liquid and the second-92-200905264 liquid, the first liquid and the second liquid of the above-mentioned kit are prepared. The mixture is mixed to form a film on the substrate, and secondly, a protective film of a color filter can be formed by heat treatment. It can be used as the substrate user, for example, a substrate such as glass, quartz, rhodium or resin. Resins such as polybutylene terephthalate, polybutylene terephthalate, polyether oxime, polycarbonate, polyimine, and the like, and a ring-opening polymer of a cyclic olefin, and a hydride thereof. The coating method may be, for example, a suitable method such as a spray coating method such as a roll coating method, a rotary coating method, a strip coating method, or an ink jet method, in particular, a spin coating method or a spin coating method (spinless coater). A coating method such as a strip die coating method is preferred. The conditions of the pre-baking are different depending on the type of each component, the ratio of addition, and the like, and it is preferred to use a condition of about 1 to 15 minutes at 70 to 90 °C. The thickness of the coating film is preferably 〇15 to 8·5 μπι, more preferably 0_15 to 6·5 μιη, and most preferably 0. 1 5~4. 5 μιη. Here, the thickness of the coating film referred to herein means the thickness after removing the solvent. The heat treatment after the formation of the coating film can be carried out by using a suitable heating device such as a hot press plate or a clean oven. The treatment temperature is preferably about 150 to 250 ° C, and the heating time is between 5 and 30 minutes in the case of using a hot plate, and the treatment time between 30 and 90 minutes is used in the oven. Further, in the case where a radiation sensitive acid generator is used in the resin composition, the resin composition is applied onto the surface of the substrate, pre-baked to remove the solvent to form a coating film, and then subjected to radiation irradiation treatment (exposure treatment) After that, a protective film of interest can be formed. If necessary, it can be heated after the exposure process -93- 200905264. The radiation used in the irradiation treatment of the above-mentioned radiation is, for example, visible light, ultraviolet light, far ultraviolet light, electron beam, X-ray or the like, but ultraviolet light containing light having a wavelength of from 1 90 to 45 nm is preferable. The exposure amount is preferably from 100 to 20,000 J/m2, more preferably from 150 to 1,0,000 J/m2. 〇 Any heat treatment may be performed after the irradiation of the radiation. The heating temperature at this time is preferably about 150 to 2 50 ° C, and a heating device such as a hot plate or a clean oven can be used. The heating time is 5 to 30 minutes in the case of using a hot plate, and 30 to 90 minutes in the case of using an oven. Protective film of color filter The protective film formed in this manner preferably has a film thickness of 0. 1~8μιη, more preferably 〇·1~6μιη, the best is 〇·1~4μηι. Further, in the case where the protective film of the present invention is formed on a substrate having a step of a color filter, the film thickness is a thickness obtained from the uppermost portion of the color filter. The protective film of the present invention can be obtained from the following examples, except that the adhesion, the surface hardness, the transparency, the heat resistance, the light resistance, the solvent resistance, and the like are satisfied, and the load in the heated state is not There is a recessed film and a protective film for an optical device having excellent performance for flattening the step of the color filter formed on the base substrate. In particular, the protective film of the present invention has a sufficient heat resistance of -94 to 200905264 which can withstand this state even in the heating process of exposure to more than 50,000 in the panel manufacturing step, even if it exceeds 27 〇t. Has sufficient dimensional stability. [Embodiment] Hereinafter, the present invention will be more specifically described by way of Synthesis Examples and Examples, but the present invention is not limited by the following examples. Production of (co)polymer Synthesis Example 1 In a flask equipped with a cooling tube and a stirrer, 5 parts by weight of 2,2'-azobis-isobutyronitrile and 200 parts by weight of propylene glycol monomethyl ether acetate Join it. Subsequently, 70 parts by weight of glycidyl methacrylate and 30 parts by weight of styrene were added, and after stirring with nitrogen, stirring was gradually started. The temperature of the liquid was raised to 95 ° C and maintained at this temperature for 5 hours to obtain a polymer solution containing the copolymer (A-1). The solid content concentration of the obtained polymer solution was 32. 8 wt%. Synthesis Example 2 In a flask equipped with a cooling tube and a stirrer, 5 parts by weight of 2,2'-azobis-isobutyronitrile and 200 parts by weight of propylene glycol monomethyl ether acetate were placed. Subsequently, 80 parts by weight of 3-ethyl-3-methylpropenyloxymethyloxetane and 20 parts by weight of styrene were added, and the stirring was gradually started after substituting with nitrogen. The solution temperature was raised to 95 t, and maintained at this temperature for 5 hours to obtain a polymer solution containing the copolymer of -95-200905264 (A-2). The solid content of the obtained polymer solution is 3 3. 0% by weight. Synthesis Example 3 In a flask equipped with a cooling tube and a stirrer, 5 parts by weight of 2,2'-azobis-isobutyronitrile and 200 parts by weight of propylene glycol monomethyl ether acetate were placed. Subsequently, 70 parts by weight of glycidyl methacrylate, 15 parts by weight of styrene, and 15 parts by weight of N-cyclohexylmaleimide were added, and stirring was gradually started after substituting with nitrogen. The temperature of the solution was raised to 95 t and maintained at this temperature for 5 hours to obtain a polymer solution containing the copolymer (A-3). The solid solution concentration of the obtained polymer solution was 3 3 . 1% by weight. Synthesis Example 4 In a flask equipped with a cooling tube and a stirrer, 5 parts by weight of 2,2'-azobis-isobutyronitrile and 200 parts by weight of propylene glycol monomethyl ether acetate were placed. Subsequently, 60 parts by weight of glycidyl methacrylate, 10 parts by weight of styrene and tricyclo[5_2·1. 02'6] 30 parts by weight of decane-8-yl methacrylate was gradually stirred after being replaced with nitrogen. The temperature of the solution was raised to 95 ° C and maintained at this temperature for 5 hours to prepare a polymer solution containing the copolymer (A-4). The solid content concentration of the obtained polymer solution was 3 2. 9% by weight. Synthesis Example 5 In a flask equipped with a cooling tube and a stirrer, 5 parts by weight of 2,2'-azobis(2,4-dimethylvaleronitrile) and propylene glycol monomethyl ether acetate 200-96 were added. - 200905264 Volume. Subsequently, 50 parts by weight of glycidyl methacrylate, 15 parts by weight of styrene, 15 parts by weight of N-cyclohexylmaleimide, and 20 parts by weight of methacrylic acid were added, and the stirring was gradually started. The temperature of the solution was raised to 95 ° C and maintained at this temperature for 5 hours to obtain a polymer solution containing the copolymer (A-5). The solid content concentration of the obtained polymer solution was 3 3 · 0% by weight. Synthesis Example 6 In a flask equipped with a cooling tube and a chopper, 2,2'-azobis(2,4-dimethylvaleronitrile was added. 5 parts by weight and 200 parts by weight of propylene glycol monomethyl ether acetate. Subsequently, 40 parts by weight of styrene and 60 parts by weight of allyl methacrylate were added, and the stirring was gradually started after substituting with nitrogen. The temperature of the solution was raised to 7 ° C to maintain this temperature for 5 hours to obtain a polymer solution containing the copolymer (A-6). The solid content concentration of the obtained polymer solution was 32. 3 wt% Synthesis Example 7 In a flask equipped with a cooling tube and a stirrer, 5 parts by weight of 2,2'-azobis(2,4-dimethylvaleronitrile) and propylene glycol monomethyl ether acetate 200 were added. Parts by weight. Subsequently, 50 parts by weight of glycidyl methacrylate, 10 parts by weight of styrene, and 40 parts by weight of allyl methacrylate were added, and stirring was slowly started after substituting with nitrogen. The temperature of the solution was raised to 7 Torr, and this temperature was maintained for 5 hours to prepare a polymer solution containing the copolymer (A-7). The solid concentration of the obtained polymer solution was 32. 6 wt%. -97- 200905264 Synthesis Example 8 In a flask equipped with a cooling tube and a stirrer, 5 parts by weight of 2,2,-azobis(2,4-dimethylvaleronitrile) and propylene glycol monomethyl ether acetate were added. 200 parts by weight. Then, 60 parts by weight of 3-ethyl-3-methylpropenyloxymethyloxetane, 10 parts by weight of styrene and 3 parts by weight of allyl methacrylate were added, and the stirring was started slowly after being replaced by nitrogen. . The temperature of the solution was raised to 70 ° C and maintained at this temperature for 5 hours to prepare a polymer solution containing the copolymer (A - 8 ). The solid content concentration of the obtained polymer solution was 3 2. 7 wt%. Synthesis Example 9 In a flask equipped with a cooling tube and a stirrer, 5 parts by weight of 2,2'-azobis-isobutyronitrile and 200 parts by weight of propylene glycol monomethyl ether acetate were placed. Subsequently, 45 parts by weight of glycidyl methacrylate, 40 parts by weight of 3-ethyl-3-methylpropenyloxymethyloxetane and 15 parts by weight of styrene were added, and the stirring was started slowly after being replaced by nitrogen. . The temperature of the solution was raised to 7 Torr, and maintained at this temperature for 5 hours to prepare a polymer solution containing the copolymer (A-9). The solid content concentration of the obtained polymer solution was 33. 3 wt%. Synthesis Example 10 In a flask equipped with a cooling tube and a stirrer, 5 parts by weight of 2,2,-azobis(2,4-dimethylvaleronitrile) and 200 parts by weight of propylene glycol monomethyl ether acetate were added. . Subsequently, 20 parts by weight of styrene, 2 parts by weight of N-cyclohexylmaleimide and 60 parts by weight of allyl methacrylate were added, and after stirring with nitrogen, stirring was started from -98 to 200905264. The temperature of the solution was raised to 70 ° C to maintain this temperature for 5 hours to prepare a polymer solution containing the copolymer (A-10). The solid content of the obtained polymer solution was 3 2. 5 wt%. Synthesis Example 1 1 In a flask equipped with a cooling tube and a stirrer, 5 parts by weight of 2,2'-azobis(2,4-dimethylvaleronitrile) and 200 parts by weight of propylene glycol monomethyl ether acetate were added. . Subsequently, 20 parts by weight of styrene, 20 parts by weight of N-cyclohexylmaleimide and 20 parts by weight of methacrylic acid, 20 parts by weight of glycidyl methacrylate, and 1 -ethylcyclohexyl methacrylate 20 were added. The parts by weight were gradually stirred after being replaced by nitrogen. The temperature of the solution was raised to 70 ° C and maintained at this temperature for 5 hours to prepare a polymer solution containing the copolymer (A-1 1 ). The solid content concentration of the obtained polymer solution was 32. 6 wt%. Synthesis Example 1 2 In a flask equipped with a cooling tube and a stirrer, 5 parts by weight of 2,2'-azobis(2,4-dimethylvaleronitrile) and 200 parts by weight of propylene glycol monomethyl ether acetate were added. . Subsequently, 20 parts by weight of styrene, 20 parts by weight of N-cyclohexylmaleimide and 20 parts by weight of methacrylic acid, 20 parts by weight of glycidyl methacrylate, and 1-ethylcyclopentyl methacrylate 20 were added. The parts by weight were gradually stirred after being replaced by nitrogen. The temperature of the solution was raised to 7 ° C and maintained at this temperature for 5 hours to prepare a polymer solution containing the copolymer (A-12). The solid content concentration of the obtained polymer solution was 32. 7 wt%. -99- 200905264 Synthesis Example 1 3 In a flask equipped with a cooling tube and a stirrer, 5 parts by weight of 2,2'-azobis(2,4-dimethylvaleronitrile) and propylene glycol monomethyl ether acetate were added. The ester was 200 parts by weight. Subsequently, 20 parts by weight of styrene, 20 parts by weight of N. cyclohexylmaleimide, 20 parts by weight of methacrylic acid, 20 parts by weight of glycidyl methacrylate and tetrahydro-2H-pyran-2-yl ester were added. 20 parts by weight, after stirring with nitrogen, slowly started stirring. The temperature of the solution was raised to 70 ° C and maintained at this temperature for 5 hours to prepare a polymer solution containing the copolymer (A-13). The solid content concentration of the obtained polymer solution was 32. 4% by weight. Synthesis Example of Oxane Oligomer [B] Synthesis Example 1 Phenyltrimethoxydecane 39 was added to a 500 mL three-necked flask. 6g and (3-ethyloxetan-3-yl)propyltriethoxydecane 64. After adding 0 g of methyl isobutyl ketone, it was dissolved, and the resulting mixed solution was heated to 60 ° C with stirring using a magnet stir bar. Among them, 8 wt% of oxalic acid was continuously added over 1 hour. 6 g of ion-exchanged water. Subsequently, after reacting at 60 ° C for 4 hours, the resulting reaction solution was cooled to room temperature. Thereafter, the alcohol portion of the reaction by-product was distilled off from the reaction liquid under reduced pressure. The polymer [B-1] had a weight average molecular weight of 1,600. Synthesis Example 2 In a 500 mL three-necked flask, diphenyldimethoxydecane was added. 8g and 2-(3,4-epoxycyclohexyl)ethyltrimethoxydecane 49. 2g, -100- 200905264 propylene glycol methyl ether acetate was dissolved in 1 〇〇g, and the resulting mixed solution was heated to 6 (TC) with a magnetic stirrer. In which it was continuously added for 1 hour. 1% by weight of oxalic acid 8. 6 g of ion-exchanged water. Subsequently, after reacting at 60 t for 4 hours, the resulting reaction solution was cooled to room temperature. Thereafter, the alcohol portion of the reaction by-product was distilled off from the reaction liquid under reduced pressure. The weight average molecular weight of the polymer [B-2] was 2,00. Synthesis Example 3 In a 500 mL three-necked flask, tetramethoxynonane 30 was added. 4g and 3_glycidoxypropyltrimethoxydecane 47. 2 g of propylene glycol methyl ether was dissolved in 1 〇〇g, and the resulting mixed solution was heated to 60 ° C with stirring using a magnetic stir bar. Among them, 8% of oxalic acid containing 1% by weight was continuously added in 1 hour. 6 g of ion-exchanged water. Subsequently, after reacting at 60 ° C for 4 hours, the resulting reaction solution was cooled to room temperature. Thereafter, the alcohol portion of the reaction by-product was distilled off from the reaction liquid under reduced pressure. The polymer [B-3] had a weight average molecular weight of 1,400. Synthesis Example 4 In a 500 mL three-necked flask, methyltrimethoxydecane was added. 2g and 3-hydrothiopropyltrimethoxydecane 39. 2 g of propylene glycol methyl ether 1 〇 〇 g was dissolved, and the resulting mixed solution was heated to 60 ° C with stirring using a magnetic stir bar. Among them, 8% of oxalic acid containing 1% by weight was continuously added in 1 hour. 6 g of ion-exchanged water. Subsequently, after reacting at 6 ° C for 4 hours, the resulting reaction solution was cooled to room temperature. Thereafter, the alcohol portion of the reaction by-product -101 - 200905264 was distilled off under reduced pressure from the reaction liquid. The polymer [B-4] had a weight average molecular weight of 1,900. Synthesis Example 5 Addition of dimethyldimethoxydecane in a 500 mL three-necked flask 29. 8g and 3-methacryloxypropylmethyldiethoxydecane 51. After 0 g of propylene glycol methyl ether was dissolved in 100 g, the resulting mixed solution was heated to 60 ° C with stirring using a magnet stirrer. Among them, 8% by weight of oxalic acid was continuously added in 1 hour. 6 g of ion-exchanged water. Subsequently, after reacting at 6 (TC for 4 hours, the resulting reaction liquid was cooled to room temperature. Thereafter, the alcohol portion of the reaction by-product was distilled off from the reaction liquid under reduced pressure. The weight average of the polymer [B-5] The molecular weight was 1,800. Synthesis Example 6 In a 500 mL three-necked flask, methyltrimethoxydecane was added. 0g and 3-propenylpropylmethyldiethoxydecane 48. 1 g of propylene glycol methyl ether was dissolved in 1 〇〇g, and the resulting mixed solution was heated to 60 ° C while stirring using a magnet stirrer. In which '8% of oxalic acid was continuously added in 1 hour. 6 g of ion-exchanged water. Subsequently, after reacting at 60 ° C for 4 hours, the resulting reaction solution was cooled to room temperature. Thereafter, the alcohol portion of the reaction by-product was distilled off from the reaction liquid under reduced pressure. The polymer [B-6] had a weight average molecular weight of 2,100. Preparation and Evaluation of Resin Composition-102-200905264 Example 1 A solution containing the copolymer (A-1) obtained in the above Synthesis Example 1 (corresponding to 100 parts by weight (solid content) of the copolymer (A-1)) And adding 20 parts by weight of a siloxane oxide oligomer (B-1), 40 parts by weight of hexahydrophthalic anhydride (C-1), and a 2-phenyl-4-methylimidazole of a hardening accelerator (D) -1)0. 1 part by weight and surfactant SH-28PA (Dong Li. Dow Corning. Polyoxyl (meth) system) 0. 1 part by weight, and the solid concentration of the solid component is 20% by weight, propylene glycol monomethyl ether acetate (S-1) and diethylene glycol ethyl methyl ether (S-2) are 8 to 2 After the ratio is added, use the aperture 〇. A 5 μιη microceramic filter was filtered to prepare a resin composition. After coating the above composition on the SiO 2 accumulation circuit glass substrate using a spin coater, it was pre-baked on a hot plate at 8 (TC, 5 minutes to form a coating film, and then passed through an oven at 230 ° C. Heat treatment for 60 minutes to form a film thickness of 2. 0μιη protective film. Evaluation of Protective Film (1) Evaluation of Transparency The substrate having the protective film formed above was measured for a transmission of 400 to 80 nm by using a spectrophotometer (1 50-20 type double beam (manufactured by Hitachi, Ltd.)). rate. The minimum enthalpy of transmission of 4 0 0 ~ 8 0 0 n m is shown in Table 1. When the enthalpy is 95% or more, the protective film is said to have good transparency. (2) Evaluation of heat-resistant dimensional stability The substrate having the protective film formed above was heated in an oven at -103 to 200905264 2500 ° C for 1 hour, and the film thickness before and after heating was measured. The heat-resistant dimensional stability calculated by the following formula is shown in Table 1. When the enthalpy is 95% or more, it is said to have good heat-resistant dimensional stability. Heat-resistant dimensional stability = (film thickness after heating) / (film thickness before heating) χΐ 00 (%) (3) Evaluation of heat-resistant discoloration The substrate having the protective film formed as described above, in the oven, 2 50 The temperature was heated under the conditions of 1 C for 1 hour, and the transparency before and after the heating was measured in the same manner as in the above (1). The heat-resistant discoloration property calculated by the following formula is shown in Table 1. When the enthalpy is 5% or less, it is said to have good heat discoloration resistance. Heat-resistant discoloration = transmittance before heating - transmittance after heating (%) (4) Measurement of pencil hardness For the substrate having the protective film formed as described above, use 131 <:· 5 4 00- 1 99 0. 8.4.1 A pencil was subjected to a scratch test to determine the surface hardness of the protective film. The lanthanide is shown in Table 1. When the crucible has a hardness of 4H or more, it is said to have a good surface hardness. (5) Evaluation of Adhesiveness After the pressure test was performed on the substrate having the protective film formed as described above (120: (:, humidity: 1%, 4 hours), 113 [-540 0- 1 9 90] 8.5.3-104-200905264 Adhesive checkerboard tape method to evaluate the adhesion of the protective film (adhesion to SiO2). The number of the checkerboard holes in the checkerboard hole is as shown in Table 2. In addition, in the evaluation of Cr adhesion, except for using a Cr substrate instead of the Si〇2 accumulation circuit glass substrate, the protective film of the film thickness of 2. Ομιη is formed by the same method as above, and the above-mentioned checkerboard tape is used. The same evaluation was carried out by the method. The results are shown in Table 1. (6) Evaluation of Sublimation The coating was applied to the SiO 2 accumulation circuit using a spin coater in such a manner that the film thickness after post-baking was 2.0 μm. After the glass substrate, a glass wafer was placed on 1 to 2 cm of the pre-baked substrate, and 8 CTC and 5 minutes of pre-baking were performed on the hot plate to adhere the sublimate to the glass wafer. , using an atomization measuring device to measure the atomization enthalpy of the substrate to which the sublimate is attached, to evaluate the sublimate If there is more sublimation (more outgas), it can be observed that the atomization enthalpy is higher (atomization 値 > 1 ), when there is no sublimate (outgas) (7) Evaluation of storage stability The ELD type viscometer manufactured by Tokyo Keiki Co., Ltd. was used to measure the resin composition for forming a protective film prepared in Example 1. Viscosity. Then 'the composition is allowed to stand at 25 ° C' and the viscosity of the solution at 25 ° C is measured daily. Based on the viscosity after the production, the number of days required to increase the viscosity by 5% is calculated. 'The number of 曰-105- 200905264 is shown in Table 1. When the number of days is more than 2 days, it is said to have good preservation stability. (8) Evaluation of alkali resistance is protected by the above The substrate of the film was immersed in 5% N AOH at 3 〇t: for 30 min, and after immersion, the thickness of the film was measured by removing the water on the hot platen. The alkali resistance system calculated by the following formula was as follows. Table 1. When the niobium is 95% or more, it is said to have good alkali resistance. Alkali resistance = (film thickness after moisture removal) / (dipping The film thickness before χ 1〇〇 (%) (9) Evaluation of the formation characteristics of the IT0 pattern The substrate with the protective film formed above was used in the High Rate Sputtering device SH-5 5 0-C12 (Japan Vacuum Technology Co., Ltd.) In the system, using ITO target (ITO filling rate 95% or more, In2O3/SnO2 = 90/10 weight ratio), sputtering ITO at 60 ° C. At this time, the gas atmosphere is a decompression degree of 1_0 Χ 10 · 5 ΡΑ, The Ar gas flow rate is 3.12xl (T3m3/h, 02 gas flow rate 1.2xl (T5m3/h. The substrate after the sputtering was heated in a clean oven at 24 (TC, 1 hour). Next, on the obtained substrate, a JSR (semiconductor) positive light group PFR3 65 0 was coated on a substrate with a spin coater. The platen was pre-baked at 90 ° C for 2 minutes to form a coating film. Thereafter, a mask with a line and space of 1 〇 μηι/1 〇 μηη was used, and the exposure machine Canon PLA501F was used (Canon) )) The ghi line (intensity ratio of wavelength 436 nm, 405 nm, 365 nm = 2_7: -106 - 200905264 2.5· 4_8) is irradiated with an exposure amount of 40 W/m 2 and 250 J/m 2 converted to an i line at room temperature. The mixture was immersed and developed for 60 seconds using a 2.4% aqueous solution of TMAH, and the strip was washed with ultrapure water for 60 seconds, and then air-dried. Thereafter, it was heated at 150 ° C for 1 hour in a clean oven. A substrate having a photoresist pattern is formed on the substrate. Next, 'the etchant obtained by mixing nitric acid/hydrochloric acid in a weight ratio of 1/3 is used to form a pattern of IT 0 by wet etching. The substrate is immersed in In the etchant, the substrate is taken out every 1 sec and the ITO line formed by optical microscopy is measured. The line width of the type, _ is used to determine the uranium engraving time when the line width of the ITO line pattern is 1 Ομιη. The line pattern of the etchant is immersed in the etchant at a time equivalent to 1.2 times of the etching time by optical microscopy. The line width is as shown in Table 1. The line width of the formed ΙΤΟ line pattern is closer to 1 〇μηι, so that the ΙΤΟ pattern formation characteristics are better. Examples 2 to 18 and Comparative Example 1 ~5 The composition and the amount of each component of the composition were prepared in the same manner as in Example 1 except that the solvent described in Table 1 was used and the solid content concentration shown in Table 1 was used. The resin composition for forming a protective film produced in the above manner was formed and evaluated in the same manner as in Example 1. The results are shown in Table 1. -107- 200905264 sm 1 oo tt 1 ) O o 1" « 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 o 1 1 1 Bu 1 1 1 1 100 1 1 1 1 1 1 1 1 o 1 1 1 1 1 i 1 1 1 1 1 1 1 1 100 1 1 i 1 1 1 1 1 > J yn 1 1 1 1 1 1 1 1 1 1 1 Ο > 1 1 1 1 1 1 1 1 1 1 1 1 o 1 1 1 1 1 1 1 1 ·μ=5 |K inch 1 〇 r' < 1 1 1 1 1 1 1 1 1 1 1 1 1 o 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 ( N 〇1 1 1 1 1 1 t 1 1 r 1 1 1 o 1 1 1 1 1 1 1 1 1 1 1 _ o 1 1 1 1 1 1 1 1 1 1 1 1 o 1 1 t ! 1 i 1 1 1 1 1 Al A-2 A-3 A-4 Ί A-5 A-6 A-7 A-8 Os < A-10 A-ll A-12 A-13 ώ i B-2 _B=3_ B-4 B-5 B-6 B-7 B-8 ΒΊ0 X) Copolymer (B) Component-108- 200905264 8fi Example QO 1 1 1 1 1 1 1 1 1 in 1 1—Η 1 1 1 Bu 1 1 1 1 1 1 1 1 1 1 ι—( 1 1 1 〇l 1 1 1 1 1 1 1 1 1 ,丨1 < 1 1 1 yrt 1 1 1 〇 1 1 1 〇 1 1 1 1 1 1 1 inch 1 1 〇 1 1 1 < 1 H 1 1 1 1 ι—Η 1 1 1 1 〇1 1 1 1 1 1 1 1 r—1 1 1 1 (N 1 〇1 1 1 o 1 1 1 1 1 Τ~~Η 1 1 1 〇1 1 1 T_H 1 1 1 1 1 1 1 1 1 Cl C-2 cn 0 _c-4 Ί Dl D-2 D-3 D-4 ώ 1 Ε-2 m ώ Ε-4 ci CN 1 tin uL ( C) Component (D戚分(Ε戚分(F戚分-109- 200905264 (i 4£3 oo Sl/S-2 =8/2 Os Os ON Os ffi vn Ο ο ο 15+ ON ON ON vr> 〇\卜Sl/S-2 =8/2 ON Os Os m K VO Ο ο ο 15th or more ON\ ON OS VO Sl/S-2 =8/2 Ο ON C\ m K ο 1—^ ο ί —^ ο 15th or more On Os inch On Sl/S-2 =8/2 ON as ON ON m ffi 100 ο >« 4 ο 15 days or more On Os (N ON IK inch Sl/S-2 =8/ 2 Os ON s; m inch 100 ο 1—^ ο 15 days or more s; Bu m Sl/S-2 = 8/2 Os OS On Os ΓΊ X in ο ο 100 ο 15曰 or more ON ON - 〇 〇 CN Sl/S-2 =8/2 ON ON Cs On m X ο ο ο f _ _ ο 15 days or more ON OS '~' Sl/S-2 =8/2 ON ON 00 Os ffi 100 ο ο 15 Above as Ό ON Si02 Solvent solid content concentration (%) Transparency (%) Heat resistance (%) Heat discoloration (%) Pencil hardness Adhesion Sublimation (atomization 保存) Preservation stability (day) @25°c Alkali resistance (%) ITO pattern formation characteristics -110- 200905264
8S 實施例 i 1 I 1 1 1 1 1 1 1 1 o 1 l o 1 1 ( t 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 o r — t 1 1 1 1 1 1 1 1 t 1 1 l 1 1 1 i t 1 1 1 〇 1 1 t 1 t 1 1 o 1 1 1 1 1 1 ΓΛ 1 1 1 I 1 1 1 1 〇 H 1 t 1 1 1 1 1 1 1 1 1 1 1 1 (N 1 1 1 1 < 1 1 o 1 1 1 1 1 1 i 1 1 1 1 i 1 1 m 1 1 i 1 1 1 1 1 o 1 1 1 1 1 1 1 1 1 1 o 1 1 1 1 1 〇 1 1 1 1 1 1 o 1 t 1 1 1 1 1 1 1 1 1 o 1 t 1 1 i 1 1 1 1 1 o 1 1 1 1 1 1 i 1 1 1 1 1 1 1 1 1 1 A-l A-2 A-3 A-4 IT) 1 < A-6 A-7 00 < A-9 | A-10 A-ll A-12 A-13 1 CQ B-2 B-3 丨 B-4 B-5 VO m B-7 ! B-8 1_ B-9 0 ¥ 一 1 CQ X) 共聚合物 < (B)成分 -111 - 2009052648S Example i 1 I 1 1 1 1 1 1 1 1 o 1 lo 1 1 ( t 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 or — t 1 1 1 1 1 1 1 1 t 1 1 l 1 1 1 it 1 1 1 〇1 1 t 1 t 1 1 o 1 1 1 1 1 1 ΓΛ 1 1 1 I 1 1 1 1 〇H 1 t 1 1 1 1 1 1 1 1 1 1 1 1 (N 1 1 1 1 < 1 1 o 1 1 1 1 1 1 i 1 1 1 1 i 1 1 m 1 1 i 1 1 1 1 1 o 1 1 1 1 1 1 1 1 1 1 o 1 1 1 1 1 〇 1 1 1 1 1 1 o 1 t 1 1 1 1 1 1 1 1 1 o 1 t 1 1 i 1 1 1 1 1 o 1 1 1 1 1 1 i 1 1 1 1 1 1 1 1 1 1 Al A- 2 A-3 A-4 IT) 1 < A-6 A-7 00 < A-9 | A-10 A-ll A-12 A-13 1 CQ B-2 B-3 丨B-4 B -5 VO m B-7 ! B-8 1_ B-9 0 ¥ a 1 CQ X) Copolymer <B) -111 - 200905264
8S 中1 VO 1 1 1 1 1 1 1 1 I in 1 1 1 1 ^n 1 1 1 1 1 1 1 1 義 1 宕 1 1 d 1 寸 1 1 1 1 1 1 1 1 1 1 1 1 1 1 m 暴 1 1 1 1 1 1 1 1 1 1 1 1—Η 1 1 IK (N 1 1 1 1 t 1 1 1 1 1 1 1 1 r—H o 1 T—< 1 1 1 1 1 1 1 1 1 1 1 1 1 t—1 1 o 1 1 1 1 1 1 1 1 1 沄 1 1 1 1 1—< 1 as 1 1 1 1 1 1 1 1 沄 1 1 1 1 1 1—H 1 ύ C-2 C-3 C-4 D-l D-2 D-3 D-4 Η ώ Ε-2 E-3 E-4 uL CN uL 1 uL (c)成分 (D)成分 (Ε减分 (F)成分 -112 - 200905264 ss 4£) S-1/S-2 =8/2 Os 〇\ m 〇 100 ο Η Ο 30日以 上 〇\ Os 寸 Os S-1/S-2 二 8/2 〇\ 〇\ <3\ Q\ ro 100 ο ο 30日以 上 On Ο 寸 cK 寸 S-l/S-2 =8/2 〇\ 〇\ m 寸 ο ο ο 15日以 上 a S-l/S-2 =8/2 OS 〇\ ON m ffi ο r-H ο I1 1 Η ο 15日以 上 〇\ (N σ\ 1¾ (N S-l/S-2 =8/2 00 On ON m 寸 100 ο ο 15日以 上 ο Η S-l/S-2 =8/2 〇 CN 〇\ 〇\ ON rn a 寸 100 ο Τ—Η ο 15日以 上 (Τ) Ον CN 〇< Ο S-l/S-2 二 8/2 〇\ 〇\ 00 m 100 ο ο 1 < ο 15日以 上 σν Ον (N 〇\ S-l/S-2 =8/2 〇\ 〇\ os cn k 寸 100 Ο ο 15日以 上 Ον 1 Si〇2 溶劑 固體成分濃度(%) 透明性(%) 耐熱性(%) 耐熱變色性(%) 鉛筆硬度 密著性 昇華物(霧化値) 保存安定性(曰)@25°C 耐鹼性(%) ITO圖型形成特性 -113- 2009052648S Medium 1 VO 1 1 1 1 1 1 1 1 I in 1 1 1 1 ^n 1 1 1 1 1 1 1 1 Meaning 1 宕1 1 d 1 inch 1 1 1 1 1 1 1 1 1 1 1 1 1 1 m Storm 1 1 1 1 1 1 1 1 1 1 1 1—Η 1 1 IK (N 1 1 1 1 t 1 1 1 1 1 1 1 1 r—H o 1 T—< 1 1 1 1 1 1 1 1 1 1 1 1 1 t-1 1 o 1 1 1 1 1 1 1 1 1 沄1 1 1 1 1—< 1 as 1 1 1 1 1 1 1 1 沄1 1 1 1 1 1—H 1 ύ C-2 C-3 C-4 Dl D-2 D-3 D-4 Η ώ Ε-2 E-3 E-4 uL CN uL 1 uL (c) Component (D) component (Ε Ε (F) Ingredients -112 - 200905264 ss 4£) S-1/S-2 =8/2 Os 〇\ m 〇100 ο Η Ο 30 days or more O \ Os inch Os S-1/S-2 2 8/2 〇\ 〇\ <3\ Q\ ro 100 ο ο 30 days or more On Ο inch cK inch Sl/S-2 =8/2 〇\ 〇\ m inch ο ο ο 15 days or more a Sl/S-2 =8/ 2 OS 〇\ ON m ffi ο rH ο I1 1 Η ο 15th or more 〇\ (N σ\ 13⁄4 (N Sl/S-2 =8/2 00 On ON m inch 100 ο ο 15 days or more ο Η Sl/ S-2 =8/2 〇CN 〇\ 〇\ ON rn a inch 100 ο Τ—Η ο 15 days or more (Τ) Ον CN 〇< Ο Sl/S-2 2 8/2 〇\ 〇\ 00 m 100 ο ο 1 < ο 15 days or more σ ν Ον (N 〇\ Sl/S-2 =8/2 〇\ 〇\ os cn k inch 100 Ο ο 15 days or more Ον 1 Si〇2 Solvent solid content concentration (%) Transparency (%) Heat resistance (% Heat-resistant discoloration (%) Pencil hardness Adhesive sublimate (atomized 値) Preservation stability (曰) @25°C Alkali resistance (%) ITO pattern formation characteristics-113- 200905264
8S 比較例 IT) 1 1 1 1 Ο 1 1 I 1 1 1 1 1 I I 1 1 1 1 1 1 1 1 ο 寸 1 1 1 100 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 ΙΟ m 1 1 ο τ-Η 1 1 1 1 1 1 1 1 1 1 1 • 1 1 1 1 1 1 1 1 1 CM 1 ο 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 Ο 1 < Ο 1—Η 1 1 1 1 1 1 1 1 I 1 1 1 1 1 1 1 1 i 1 1 1 1 Ό oo 1 1 1 1 1 1 1 1 1 1 1 1 ο r-H 1 1 ο 1 1 1 1 1 1 I 鹣 卜 1 1 1 1 1 1 1 1 1 1 1 ο Τ-Η 1 1 1 1 1 1 1 1 1 1 1 A-l Α-2 Α-3 寸 < Α-5 Α-6 Α-7 Α-8 Α-9 Α-10 Α-11 Α-12 Α-13 ώ Β-2 Β-3 Β-4 Β-5 Β-6 Β-7 Β-8 I Β-9 ο ι—Η 1 03 τ—Η Μ 共聚合物 (Β)成分 -114- 200905264 8¾ 比較例 1 1 1 1 1 1 1 1 I 1 1 ,··Η 1 1 1 寸 〇 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 〇 1 1 1 1 1 i 1 T—( 1 1 1 CN 1 1 〇 1 1 1 1 1 1 1 1 r-^ 1 1 1 〇 1 1 1 1 1 1 1 1 1 1 H 1 1 1 實施例 00 1 1 1 1 1 1 1 1 1 cn 1 1 1 1—H 1 卜 1 1 1 i 1 1 1 1 1 1 1 1 r—^ 1 t «Ή 1 U C-2 C-3 C-4 D-1 D-2 D-3 D-4 ώ Ε-2 cn ώ E-4 r«H uL (N |X| rn uL (C)成分 (D诚分 (Ε)成分 (F)成分 -115- 200905264 8i 比較例 l/Ί S-l/S-2 =8/2 as 100 100 Ό 15日以 上 On C\ oo 寸 S-l/S-2 =8/2 ON ON On w 100 100 卜 15日以 上 〇\ Os ΙΟ oo m S-l/S-2 =8/2 a\ On On ΓΛ ο ο ο 15日以 上 On 寸 od (N S-l/S-2 =8/2 ο as ON m 寸 ο ο Η 15日以 上 Os od τ—Η S-l/S-2 =8/2 ο ON oo m ο ο »—Η 15日以 上 00 ON in oo 實施例 QO S-l/S-2 =8/2 ON ON ON 〇\ CO Ό ο ο ί—Η ο 30日以 上 C\ a\ 寸 cK S-l/S-2 =8/2 Os as ro in ο Η ο 1 1 ^ ο 30日以 上 as a\ 寸 Os Si〇2 ΰ 溶劑 固體成分濃度(%) 透明性(%) 耐熱性(%) 耐熱變色性(%) 鉛筆硬度 密著性 昇華物(霧化値) 保存安定性(日)@25°C 耐鹼性(%) ITO圖型形成特性 -116- 200905264 又,表1中,密著助劑(B)、酸酐(c)、硬化促進劑(D) 、陽離子聚合性化合物(E)、界面活性劑(F)及溶劑(S)之簡 稱,分別表示以下之內容。 上述合成例所記載之內容 B - 7 :聚矽氧烷氧基低聚物(信越化學(股)製商品名 :X-4 1 - 1 056) B-8 :環氧基變性聚矽氧油(東麗.道康寧·聚矽氧(股) 製商品名:BY16-855D) B-9 :環氧基變性聚矽氧油(莫門帖·哈幅滿·金屬製 商品名:TSF4730) B-10 :羧基變性聚矽氧油(東麗·道康寧‘聚矽氧(股) 製商品名:SF8418) b-Ι : γ-環氧丙氧基丙基三甲氧基矽烷 c-l :六氫苯二甲酸酐 c - 2 :偏苯三酸酐 C-3 : ST/馬來酸酐共聚合物 C-4 : ST/環己基馬來醯亞胺/馬來酸軒共聚合物 D-1 : 2 -苯基-4-甲基咪唑 D-2: 2-苯基-4-甲基咪唑_5_羥基甲基咪唑 D-3 : 2 -苯基-1-苄基咪唑 D-4: 1-苄基-2-甲基咪唑 Ε-1:雙酚Α酚醛清漆型環氧樹脂(日本環氧樹脂(股) 製商品名:EPIKOTE82 8) E-2:酚醛清漆型環氧樹脂(日本環氧樹脂(股)製商 -117- 200905264 品名:EPIKOTE154) E-3 :二季戊四醇六丙烯酸酯(日本化藥(股)製商品 名:KAYARAD DPHA) E-4 :苯并丙烯醯氧基二季戊四醇琥珀酸{別名:[3-(3-丙烯醯氧基-2,2-雙-丙烯醯氧基甲基-丙基)-2,2-雙-丙烯 醯氧基甲基-丙基]酯,簡稱:PADPS} F-1 :聚矽氧系界面活性劑(東麗·道康寧·聚矽氧(股) 製商品名:SH-28PA) F-2 :聚矽氧系界面活性劑(大化學·日本(股)製商品 名:Byk-344) F-3 :氟系界面活性劑((股)尼歐斯製商品名:氟達 FTX-2 1 8) F-4 :聚矽氧系界面活性劑(東麗·道康寧♦聚矽氧(股) 製商品名:PAINTAD19) S-1:丙二醇單甲基醚乙酸酯 S-2:二乙二醇乙基甲基醚 發明效果 本發明爲提供一種即使於表面具有低平坦性之基體時 ,於該基體上亦可形成具有更高平坦性之硬化膜,此外, 具有高透明性及表面硬度,優良的耐熱耐壓性、耐酸性、 耐鹼性、耐濺鍍性等各種耐性,此外亦極適合用於形成具 有良好之配線電極的圖型形成特性之光裝置用保護膜,又 ,形成保護膜形成時所發生之昇華物量較少,且具有作爲 -118- 200905264 組成物之優良保存安定性的樹脂組成物,使用該樹脂組成 物之保護膜的形成方法,及以上述組成物所形成之保護膜 -119-8S Comparative Example IT) 1 1 1 1 Ο 1 1 I 1 1 1 1 1 II 1 1 1 1 1 1 1 1 ο 1 1 1 100 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 ΙΟ m 1 1 ο τ-Η 1 1 1 1 1 1 1 1 1 1 1 • 1 1 1 1 1 1 1 1 1 CM 1 ο 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 Ο 1 < Ο 1—Η 1 1 1 1 1 1 1 1 I 1 1 1 1 1 1 1 1 i 1 1 1 1 Ό oo 1 1 1 1 1 1 1 1 1 1 1 1 ο rH 1 1 ο 1 1 1 1 1 1 I 鹣 1 1 1 1 1 1 1 1 1 1 1 ο Τ-Η 1 1 1 1 1 1 1 1 1 1 1 Al Α-2 Α-3 inch< Α -5 Α-6 Α-7 Α-8 Α-9 Α-10 Α-11 Α-12 Α-13 ώ Β-2 Β-3 Β-4 Β-5 Β-6 Β-7 Β-8 I Β -9 ο ι—Η 1 03 τ—Η Μ Copolymer (Β) Composition-114- 200905264 83⁄4 Comparative Example 1 1 1 1 1 1 1 1 I 1 1 ,··Η 1 1 1 inch 〇1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 〇1 1 1 1 1 i 1 T—( 1 1 1 CN 1 1 〇1 1 1 1 1 1 1 1 r-^ 1 1 1 〇1 1 1 1 1 1 1 1 1 1 H 1 1 1 Example 00 1 1 1 1 1 1 1 1 1 cn 1 1 1 1—H 1 Bu 1 1 1 i 1 1 1 1 1 1 1 1 r—^ 1 t «Ή 1 U C-2 C-3 C-4 D-1 D-2 D-3 D-4 ώ Ε-2 cn ώ E-4 r«H uL (N |X| rn uL (C) Ingredients (D Cheng Cheng (Ε) Ingredient (F) Ingredients -115- 200905264 8i Comparative Example l/Ί Sl/S-2 =8/2 as 100 100 Ό 15+ On C\ oo Inch Sl/S -2 =8/2 ON ON On w 100 100 Bu 15th or more 〇\ Os ΙΟ oo m Sl/S-2 =8/2 a\ On On ΓΛ ο ο ο 15th or more On inch od (N Sl/S -2 =8/2 ο as ON m inch ο ο Η 15 days or more Os od τ—Η Sl/S-2 =8/2 ο ON oo m ο ο »—Η 15 days or more 00 ON in oo Example QO Sl/S-2 =8/2 ON ON ON 〇\ CO Ό ο ο ί—Η ο 30 days or more C\ a\ inch cK Sl/S-2 =8/2 Os as ro in ο Η ο 1 1 ^ ο 30 days or more as a\ inch Os Si〇2 溶剂 Solvent solid content concentration (%) Transparency (%) Heat resistance (%) Heat discoloration (%) Pencil hardness Adhesive sublimate (atomization 保存) Preservation stability Sex (Japanese) @25°C Alkali resistance (%) ITO pattern formation characteristics-116- 200905264 Further, in Table 1, adhesion promoter (B), acid anhydride (c), hardening accelerator (D), cation The abbreviations of the polymerizable compound (E), the surfactant (F), and the solvent (S) respectively indicate the following contents. Contents of the above-mentioned synthesis example B-7: Polyoxyalkyloxyoxyl (trade name: X-4 1 - 1 056, manufactured by Shin-Etsu Chemical Co., Ltd.) B-8: Epoxy-denatured polyfluorene oxide oil (Dongli. Dow Corning·Polyoxime Co., Ltd. Product Name: BY16-855D) B-9: Epoxy-denatured Polyoxyl Oxide (Momente·Haoman·Metal Product Name: TSF4730) B- 10: Carboxyl modified polyoxyxide oil (Dolly Dow Corning 'Polymerized Oxygen Co., Ltd., trade name: SF8418) b-Ι : γ-glycidoxypropyltrimethoxydecane cl: hexahydrophthalate Anhydride c - 2 : trimellitic anhydride C-3 : ST / maleic anhydride copolymer C-4 : ST / cyclohexyl maleimide / maleic acid copolymer D-1 : 2 -phenyl-4- Methylimidazole D-2: 2-phenyl-4-methylimidazole_5-hydroxymethylimidazole D-3 : 2-phenyl-1-benzylimidazole D-4: 1-benzyl-2-methyl Imidazolium-1: bisphenol novolac type epoxy resin (Japanese epoxy resin (stock) product name: EPIKOTE82 8) E-2: novolac type epoxy resin (Japanese epoxy resin (stock) manufacturer -117- 200905264 Name: EPIKOTE154) E-3: Dipentaerythritol hexaacrylate (Nippon Chemical Co., Ltd. Trade name: KAYARAD DPHA) E-4: benzopropenyloxy dipentaerythritol succinic acid {alias: [3-(3-propenyloxy-2,2-bis-acryloxymethyl-propyl) )-2,2-bis-acryloxymethyl-propyl]ester, abbreviated as: PADPS} F-1: polyfluorene-based surfactant (Toray Dow Corning, Polyoxane) :SH-28PA) F-2 : Polyoxo-based surfactant (trade name: Byk-344, manufactured by Daisei Co., Ltd.) F-3: Fluorine-based surfactant (product) Name: Fluoride FTX-2 1 8) F-4: Polyoxane surfactant (Toray Dow Corning ♦ Polyoxane (stock) Manufactured by: PAINTAD19) S-1: Propylene glycol monomethyl ether acetate Ester S-2: diethylene glycol ethyl methyl ether. Effect of the invention The present invention provides a cured film having higher flatness on the substrate even when the substrate having low flatness on the surface is provided. It has high transparency and surface hardness, excellent heat and pressure resistance, acid resistance, alkali resistance, and splash resistance. It is also very suitable for forming pattern formation characteristics with good wiring electrodes. In the case of a protective film for an optical device, the amount of the sublimation substance which is formed when the protective film is formed is small, and the resin composition which is excellent in storage stability of the composition of -118-200905264 is used, and the formation of the protective film using the resin composition is used. Method, and protective film formed by the above composition -119-