TW200842525A - Reduced-pressure drying device - Google Patents

Abstract

This invention can carry and carry out the substrate efficient, safe, and smoothly. Moreover, the transcript mark of the substrate contacted part generated in the coating film on the substrate can be made a minimum. This reduced-pressure drying unit (VD) 46 carries a substrate G that should receive the reduced-pressure drying process into the chamber 106 by the roller transportation on the carrying side roller transportation path 104a and the internal roller transportation path 104b. On the other hand, this reduced-pressure drying unit (VD) 46 carries out the substrate G that the reduced-pressure drying process ends in the chamber 106 outside the chamber 106 by the roller transportation on the internal roller transportation path 104b and the carrying out side roller transportation path 104c. A lot of lift pins 128 lift the substrate G from the roller transportation path 104b up in the state of the horizontal position and support it in the part of the pinpoint of the extra fine while processing the reduced-pressure drying.

Description

200842525 IX. Description of the Invention: [Technical Field of the Invention] The present invention relates to a vacuum drying apparatus for drying a coating liquid applied on a substrate to be processed under reduced pressure. [Previous technology] This type of vacuum drying apparatus is used in a photolithography process such as a flat panel display (FPD) manufactured by a liquid crystal display (LCD), and is applied to a substrate to be processed (resistance on a glass substrate or the like). The etchant liquid is dried before pre-baking. A known vacuum drying apparatus, for example, as described in the patent document, has a top open tray or a shallow bottom container type lower chamber, and can be airtightly closed or a lid-shaped upper chamber fitted to the top surface of the lower chamber. A pedestal is provided in the lower chamber, and the substrate is horizontally placed on the pedestal, and then the chamber is closed (the upper chamber is closed to the chamber) The lower chamber is subjected to a vacuum drying treatment. When the substrate is carried out into the chamber, the upper chamber is opened by a crane or the like, and the chamber is opened and unloaded, and the pedestal is placed in a cylinder or the like. Then, the substrate is carried out or loaded/unloaded, and the robot is transported by an external transport robot that transports the substrate around the vacuum drying apparatus. [Patent Document 1] 曰本特开 2000_181079 [Summary of the Invention] Problem solved] As described above, the vacuum drying apparatus performs the method of ascending and descending (opening and closing) the dead chamber every time the substrate is carried out into the chamber. However, as the substrate is enlarged, the device structure may be various. In other cases, if the substrate size is like an LCD substrate and the size is more than 2 meters on one side, the chamber will be significantly enlarged, and only the upper chamber has a weight of 2 tons or more, requiring a large lifting mechanism, and because of the large The vibration caused by the vibration or the safety problems of the workers will also emerge. Moreover, the transport robots are becoming more and more large, but it is increasingly difficult to keep the large substrates horizontally transported. After the application of the agent, the substrate is fanned to the curved 200842525 „Send'. When the board is moved out, the position is deviated or collided or damaged, etc., or the loading/unloading is entered, and J is in the US i fiiit king: smoothly Carrying out the transfer of the substrate to be processed to the minimum of the transfer film to the substrate contact portion of the transfer mark. [Solution to Problem] On the board iiii, the vacuum drying apparatus of the present invention is described. The treated base is useful; the gjf state is subjected to a drying process': a chamber capable of decompression, a space for receiving a horizontal state for H^A; a first exhaust mechanism, ίίίίίί; In the chamber, the air is transported in a closed manner, tmf, and: there is a roller transport passage that is continuous outside the middle and the middle of the chamber, and the roller on the a channel is carried out to carry the substrate out of the chamber; The substrate is substantially horizontally supported by the front end of the pin and is raised by a plurality of lift pins in a discrete arrangement in the chamber, and the front end of the device is raised above the aforementioned roller transport path by the implementation of the above-mentioned apparatus. The substrate subjected to the decompression treatment is transported in the transfer chamber by the roll J, and the roller is transported out of the chamber after the chamber is pressed and dried, so that the transport arm transporting machine is not required. ^ 'The substrate will not be bent like a fan-like shape, causing errors such as loading, separation, and damage. Moreover, when the substrate is carried in and out, it is not necessary to open and close: 盍 知 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , In addition, in the drying process + '(4) recorded roots _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ . In particular, the tip diameter of the pin by selecting the lift pin is 0.8 mm or less (it is preferably 〇 4 mm to 〇 6_ in consideration of the strength), and it is remarkable that 200842525 = low. Furthermore, in order to further reduce the generation of the transfer mark, the pin body having the hollow tube and the front end portion of the pin body are more preferably the rod tip portion having a circular shape at the front end thereof. One of the preferred aspects of the ϊϊ ϊϊ ί ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' If the sealing mechanism applied to the chamber for the lifting mechanism is necessary for this purpose, the plurality of lifting pins are moved up and down in the chamber in the decompressed state. Further, in accordance with a preferred aspect of the present invention, in the chamber, , , , =, the sub-' has a shaft with a fixed diameter 'to separate the portion of the f portion Bearing support. One of the inventions is more flexible: it can be edited in a rotatable manner and can be supported by a slanting heart. In this way, even a long roller can be in a straight posture. According to a preferred aspect of the present invention, in the chamber, the movement of the chamber is carried out by the roller. ς and 2 move out of the board to the outside of the carry-out σ, and on the side of the chamber ΐϊ = can be, type. It is a wall ^, but it is also possible to use one port for moving out of the entrance. On the side of the work, the u-knife/衮同' or inter-mechanism' is provided in the state of the π-age 僚 entrance or the 搬 搬, when the roller is transported, the rolling distance of the roller transport path is ρ In the case of the above-mentioned configuration, it is possible to reduce the transportation performance (the speed of the mosquitoes), and the second exhaust mechanism that performs the exhaust in the open state in the exhaust mechanism iff. This second row two is preferably shared with the f-discharging machine for vacuum suction of the exhaust port provided in the chamber. (Effects of the Invention) The pressure-reducing and drying device of the ΐϊ = = can carry out the transfer of the substrate to be processed safely and smoothly, and the transfer of the coating film of the substrate Traces are minimized. BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings. Processing li display === 彳 edge age cloth, 雠, development and ship, etc. - a series of processing. The process is performed by an external exposure device 12 disposed adjacent to the system. * This coating development processing system 10 has a horizontally long processing station at the center = 5) 3 long-side direction (X (four) (four) domain configuration (four) station (C / S) 14 and boundary E dish station (C / S) 14 ' for the system 1 〇 g 盒 搬 璋 璋 璋 璋 璋 璋 璋 璋 璋 璋 璋 璋 璋 i i i i i i i i i i i i i i i i i i i i i i i i i i i i i i i i i i i i i i i i i Each of the above [ Ϊ ίίί ^ ^ 〇 22 ^ G ^ ^ can operate on the X, Y, Z, 04 axes, and the adjacent processing station (P/S) 16 side and the substrate g are delivered. Processing station (P /S)16, which is parallel and reversed in the longitudinal direction of the horizontal system (χ direction) = line A, B, and each processing unit is sequentially arranged in a processing flow or step. More §, from the box station (C/S) 14 side to the interface station (I/F) 18 side of the upstream part 200842525 Ϊ Ϊ A: along the first advection transport channel 34, from the upstream, in order to match the ί IN PASS) 24, cleaning processing unit 26, first heat treatment unit 28, coating processing unit 30, and second heat treatment unit 32. Delivery of "more" λ, inpass 24 box (10)) Machine=ίίί理^^' to vote for both (four) industry time 1 advection transporting the inner portion 26, along the first advection transport passage 34 from the upper __ unit (Ε-gas 6 and scrubbing cleaning unit (R) 38苐1 heat treatment portion 28, from the upstream side in order Ground setting: fresh thin portion 3G 'From the top, the resist coating early element (COT) 44 and the vacuum drying unit (VD 埶, 32 乂 from the upstream side, sequentially set the pre-drying unit _ — Bake) 48 and cold (cold) (COL) 5〇. Located at the end of the adjacent side channel 34 on the downstream side of the second heat treatment unit 32, a passing unit (genus) 52 is provided. The substrate G sent by the second pass is passed through the unit. (PASS) 52 is delivered on the other hand, from the interface station (I/F) 18 side to the cassette station (c/s) 14 side 1 along the second advection transport path 64 from the upstream side sequentially into a column A phantom (DEV) 54, a post-drying unit (P〇ST_BAKE) 56, a cooling unit 〇, an inspection unit (AP) 60, and a carry-out unit (0UT-pASS) 62. Here, the rear supply unit 〇S 2 The BAKE 56 and the cooling unit (COL) 58 constitute the third heat treatment unit 66. The carry-out = tl (〇 UTPASS) 62 is processed from the second advection passage 64.

The pieces are taken one by one and delivered to the transport mechanism 22 of the cassette station (c/s) 14. Bibi plate G η. Between the two processing lines A and B, there is an auxiliary transport space 68. The shuttle mechanism 7 is operated in the direction of the processing line (X direction) by a driving mechanism (not shown). The interface station (I/F) 18 has a transport device 7 for performing the above-described i-th and second flat flow 64 or an adjacent wire-shielded I2 wire plate Gf, and a rotating pedestal _74 and a periphery are disposed around the device 72. Device %. a Sit _74, a pedestal that rotates the substrate G in the horizontal plane for the fish exposure; 200842525 is transferred between 12 and 12 to convert the direction of the rectangular substrate 。. = Word Exposure Receiver (TITTM diagram) Among them, in the coating and developing treatment system, it is shown that the processing of the 丨 = step is reversed. First, at g - (c / s) 14, the transporter removes the i-substrate G from the top of the holder 20, The taken-out substrate g is carried into the loading unit on the processing line A side of the processing station (P/S) 16. (The procedure is called </ br>. The substrate G is transferred from the loading unit (inPASS) 24 or is put into the second advection conveying path 34. On 0

The substrate G that has been introduced into the first advection transport path 34 is initially subjected to ultraviolet cleaning treatment and rubbing by the excimer UV irradiation unit (E-UV) 36 and the scrub cleaning unit (SCR) 38 in the cleaning processing unit 26. Grinding cleaning process (steps S2, S3). A scrubbing unit (SCR) 38, for removing the particulate-like dirt L from the surface of the substrate by applying a brush or a blow cleaning to the substrate G horizontally moving on the advection conveying path 34, and then applying a rinsing treatment, and finally air The blade or the like dries the substrate G. In the scrubbing cleaning unit (SCR) 38, when a series of cleaning processes are completed, the substrate 〇 directly passes down from the first advancing transport path 34 and passes through the first heat treatment unit 28. In the first heat treatment unit 28, the substrate G is first adhered to the adhesion unit (AD) 40 by vapor HMDS, and the surface to be treated is hydrophobized (step S4). After the end of the adhesion process, the substrate G is cooled by a cooling unit (COL) 42 to a predetermined substrate temperature (step S5). Thereafter, the substrate G comes down from the first advection transport path 34 and is carried into the coating processing unit 30. In the coating treatment unit 30, the substrate G is first applied to the resist application unit (COT) 44 to maintain a smooth flow, and a resist liquid is applied to the top surface (processed surface) of the substrate by a non-rotation method using a slit nozzle, and then immediately The reduced-pressure drying unit (VD) 46 adjacent to the downstream side receives the room temperature drying treatment by the reduced pressure (step S6). The substrate G that has left the coating processing unit 30 passes through the first advection conveying passage 34 and passes through the second heat treatment unit 32. In the second heat treatment unit 32, the substrate G is first received in the pre-baking unit (PRE-BAKE) 48 as a heat treatment after the resist coating or before the exposure of the 200842525 to the end of the passage unit (_ by 74m^90^ The peripheral exposure device (4), here, accepts =; ===) anti-scenario development when the singularity is less than Ϊ 1_2 'for the anti-surname agent exposure on the substrate G. = #光^板G, miscellaneous exposure device 12 return interface = () 18 (AS9), one hundred first, was moved into the peripheral device redundant printing cry ί The predetermined part of the substrate recorded the scheduled f message _ one. The Λ Λ Λ Λ 72 72 72 72 72 72 72 72 72 72 72 72 72 72 72 72 72 72 72 72 72 72 72 72 72 72 72 72 72 72 72 72 72 72 72 72 72 72 72 72 72 72 72 72 72 72 72 Below =^, and secondly on the second advection transport path 64 to the processing line B ΪΓ: Ϊ?. At the beginning of the agricultural development unit, the substrate G is placed in a flat flow, and is subjected to a series of development treatments (steps) at the end of the 21st HV) 54'-series (four) processing of the substrate G. The heat treatment portion 66 is sequentially passed through the third heat treatment portion 4, and the substrate G is initially subjected to post-development heat treatment after the post-baking unit U^ATM 56 (step S12). Dreaming of the adhesion of the developer or the pattern of the butterfly film remaining on the substrate G to the substrate. Next, the substrate is cooled to a predetermined substrate temperature (step S13). In the inspection unit (ΑΡ) 6〇, the thickness inspection (step pattern, non-contact line width inspection or film quality, film s) 62 is taken from the second advection transport channel 64 to the substrate G where all the steps have been processed, Delivered to the shipping facility of the g-box station (c/s) 14. 200842525 On the side of the box (C/S) 14, the transport mechanism 22 stores the processed substrate G picked up from the carry-out unit (quT PASS) 62 in any (usually the original) cassette c (step S1). The coating and developing system 10 can be applied to the vacuum drying unit (VD) 46 in the coating processing unit 3〇. Hereinafter, the constitution and function of the reduced-pressure drying unit (VD) 46 in the coating processing unit 30 in the preferred embodiment of the present invention will be described in detail with reference to Figs. 3 to 5 . Fig. 3 is a plan view showing the entire configuration of the coating treatment unit % in the embodiment. 4 to 6 show the configuration of a reduced-pressure drying unit (VD) 46 according to an embodiment, and Fig. 4 is a plan view thereof, and Figs. 5 and 6 are cross-sectional views thereof. ...s: anti-surname application unit (COT) 44 having: a floating pedestal 80 constituting the first advection transport passage 34 (Fig. 1) - part or a section floats in the air and is trained in the longitudinal direction of the pedestal ( χ * mouth = structure 82, and riding on the pedestal 8G on my substrate G's ς mouth 以及, and in the coating processing empty new anti-side nozzle correction y pedestal 80 top surface 'with a given gas (such as empty : a plurality of rolling body injection ports 88, by means of such gas injection ports) "[The force is used to make the substrate G float from the crucible top φ to a fixed height. (4) Read the substrate carrier mechanism 82, with: a pair of guides The track 9〇a, the dragon mouth seat 80 and extending in the X direction; the sliding mechanism %, can move back and forth along the temple; the substrate holding member such as the adsorption pad (not shown, A(10) can be used on both sides of the substrate The end can be separated from the person's name. In the mouth of the 80-y straight moving mechanism (not shown), the mechanism 92 is moved, so that the substrate (3 floats on the pedestal 80. k-direction (X-direction) private resist nozzle 84, for the horizontal direction (Y direction) _ extension of the pedestal 8 〇 (X direction), for the base type spray through the positive τ side 'It can be sprayed in a strip at a given coating liquid. Also, the anti-silver agent nozzle 4 = slit-shaped spout can make the resist 胄 84 ' with the nozzle branch supporting the nozzle 200842525 ^ 冓 94 - body Χdirection. The cloth position moves between the cloth position and the nozzle update unit 86. In the above-mentioned coating, the H new portion 86' is held by the pillar member 96 at a predetermined position above the pedestal 8G, and is provided with priming processing. The Ministry, the field team &amp;, the guarantee is in the anti-residue nozzle 84 spit anti-rhythm.. + mouth 2 3 preparation and the mouth 84 anti-spray mouth dry, t prevent anti-residue spray cleaning mechanism 102 'Used to remove the anti-caries agent attached to the anti-smooth spray and the nozzle. Spicy reduction is 84 near the heart side of the spit. 88 shots are scented ί ί 射 _f 4 'sliding mechanism% Keep the state of the substrate, |:=^ yuan, move the side in the transport direction (χ direction), pass the anti-cutting agent liquid to the top surface of the substrate G in the strip g ΪThe front end and the back end are woven in a velvet-like manner, and the razor axis is the substrate G coated with the secret. The Α 述 ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ At the rear end of the seat (10), the transfer roller is transported to the channel 1〇4, and the slide mechanism is released. The substrate G of the feed channel 1G4 is released, and then, as described, the recorder transports the pass|^ the roller arrives and moves, and moves into the rear stage. The vacuum drying unit (VD) 46. (4) The substrate G after the coating process is as described above, the transfer dry material S (VD) 46 ^, and the sliding mechanism 92 returns to the front end of the pedestal (9) in order to pick up the next substrate G. When the button nozzle 84 is finished, the cloth position (anti-spray discharge position) is mixed with the nozzle refreshing portion 86, and is updated or prepared in advance. After that, return to the coating position. As shown in FIG. 3, a resist coating unit (COT) 44 is disposed on the extending side of the pedestal 8 ,, and is provided with a 13 or a section of the first advection conveying passage 34 (Fig. 1}. The passage 104. The roller transport path i〇4 is continuously disposed in and out of the chamber 106 of the reduced-pressure drying unit (vd) 46. More specifically, the reduced-pressure drying unit (VD) 46 The surrounding roller transport path 104' is constituted by the loading side roller transport path 104a, which is disposed on the transport upstream side of the chamber, that is, the carry-in side, and the internal roller transport path 1〇4b, which is disposed in the chamber 106. The side roller transport passages 1〇4c are carried out, and are disposed on the downstream side of the transport of the chambers 1〇6, that is, the carry-out side. The roller transport passages 104a, 104b, 104c of the respective sections are in the transport direction (X In the direction), the plurality of rollers 1〇8a, 1〇8b, and 1〇8c which are disposed at appropriate intervals are rotated by the respective independent or common transport driving portions, and the substrate G is transported in the direction in which the rollers are transported (X In this case, the side roller transport path 1〇4a is carried in, and the function is to take the anti-caries agent coating unit ((7)τ) 44 The substrate G of the crucible 8 is transported by a roller to the chamber 1〇6 of the decompression drying unit (VD) 46. The internal roller transport passage 104b functions as a roll from the loading side. The sub-transport channel 1〇4a is transported by the rollers G and transported by the rollers at the same speed and fed into the chamber 1〇6, and the substrate G which is dried and dried in the chamber 106 is used as a roller. The delivery side of the delivery chamber 106 (rear stage). The carry-out side roller transport path 1 has, for example, functions to transport the processed substrate G from the internal roller transport path 1〇4b in the chamber 106 at the same speed. The roller is transported and sent to the rear stage processing unit (second heat treatment unit 32). As shown in Fig. 3 to Fig. 6, the chamber 1〇6 of the reduced pressure drying unit (VD) 46 is formed into a flattened rectangular shape. The body ' has a space in which the base can be accommodated. In the transport direction (X direction) of the chamber 106, a pair of (upstream side and lower side) chamber side walls facing each other are provided with a substrate G The slit-shaped inlet 110 and the outlet 112 are sized to pass through the advection. Further, the opening and closing of the inlet ι is carried out. The gate mechanisms 114 and 116 of the 12 are mounted on the outer wall of the chamber 1〇6. The top surface portion or the upper cover 118 can be removed during maintenance. The illustrations of the respective structures 114 and 116 are omitted, but the cover is covered. (Intermediate) The slit-shaped moving out population (10), 112) is hermetically closed; the third cylinder is checked and deducted from the level of n (uG, m) moving out and lower == 14 200842525 ΐ The second red cylinder moves the lid horizontally at a horizontally moving position relative to the carry-out inlets (10), 2), and at a horizontal return position away from the separation. In the chamber 106$, the rollers 1〇8b constituting the inner roller transport passage 1 are arranged at a height position of the carry-out person (10) and m), and are arranged at intervals in the transport direction (χ direction). The column '- part or all of the roller legs are connected to the horse feed source 12Q provided outside the chamber 1〇6 via a suitable transmission mechanism. Each of the rollers 108b has a rod body that is in contact with the back surface of the substrate cymbal by a cylindrical portion or a cylindrical portion having the same outer diameter, and constitutes a bearing whose both end portions are provided at or near the left and right side walls of the chamber hall (not The illustration) is supported in a rotatable manner. The side wall portion of the chamber 106 through which the rotating shaft 122 of the transmission mechanism passes is sealed by the sealing member 124. The rollers 1〇8a constituting the loading side roller conveying path 1〇4a are also omitted from the drawing, and the both end portions are rotatably supported by bearings fixed to the frame or the like, and the inner rolling passage 1_ Spin _ secret 12G common or other rotary drive source and rotate, drive. The same applies to 1〇8c constituting the carry-out side roller transport path 1〇4c. This reduced-pressure drying unit (VD) 46 has a lifting mechanism 126 for raising and lowering the substrate g in a substantially horizontal manner in the chamber 1〇6. The lifting mechanism 126 includes a plurality of (preferably 50 or more) lifting pins 128 arranged in a predetermined arrangement pattern (for example, a matrix) in the chamber 1〇6; a plurality of horizontal bars or horizontal plates The pin base 130' supports the lift pins 128 at a lower position than the inner roller transport passage 104b in each predetermined group or group; and the lift drive source, for example, the cylinder 132, moves the bases 130 to move up and down. Outside the chamber 1〇6 (bottom). More specifically, a plurality of (preferably seven or more) lift pins 128 are vertically spaced at regular intervals in the gap between the adjacent two rollers i 8b and 108b in parallel with the roller 108b (Y direction). A plurality of columns (preferably eight or more columns) are disposed at an appropriate interval in an erected arrangement in the direction of the transport direction, so that each of the pin bases 13 〇 supports a 丨 group or an Array (example 2 is illustrated) Group) of lift pins. Then, the bottom wall of the chamber 106 is hermetically penetrated via the sealing member 134, and the respective pin bases 13 on the inner side of the chamber are respectively connected to the respective cylinder tubes 132 on the outer side of the chamber by the lifting and lowering drive shaft 136 Connected to 15 200842525. And the pin tip shown in Fig. 6 moves up and down between the legs of the roller transporting passage. «Wang (Rise) position Each lift pin I28 has: pin body coffee, lower end n=8b ’ two? The upper end of the main body ma is straight and the tip of the pin is hidden. Compared with the _PEEK 4 ed cylindrical frequency, the _ on the upper end of the county body 128a is composed of the tip of the pin at 128. The substrate I on the mouthpiece is loaded with the conventional general lifting device for lifting the loader; the person picking up the front substrate is used to lift the lifting pin delivered to the transport robot, and the pin tip=. That is, the diameter of the lock tip portion of the lift pin for general transfer is (6) ί (; ΐΤ 上, the pin tip of the lift pin 128 in this embodiment is straight tan η: Γ (if strength is considered, it is best The remainder is G.4, leg), and is just shaped into a predetermined size (for example, R=〇.2~〇3_). The exhaust port 138 is formed at the I 1 or more locations of the bottom wall of the emirate. The air tubes 140 are connected to the vacuum exhausting unit 142. Each of the vacuum exhausts vacuum-pumps the chamber 106 from the state of the money to maintain the vacuum pumping. Further, in order to make most of the vacuum exhaust connecting tubes (Unsynchronized averaging, each exhaust pipe 140 can be used in both ends of the chamber 106, that is, near the transfer port 11 and the transfer port 112, and the position ti is lower. The cylindrical nitrogen emulsion extending in the direction is ejected by σρ 144. The money ejecting portion 144 is connected to a nitrogen supply source (not shown) by, for example, sintering a metal powder into a 16 200842525 tube 146 (® 4). After the treatment, the nitrogen gas ejecting portion 144 is returned from the state of the bear pressure state in which the chamber 1〇6 is sealed and returned to the atmospheric pressure state. The entire g surface is sprayed with nitrogen gas. ° ° Next, the action of the reduced pressure drying unit (乂〇) 46 in this embodiment will be described. As described above, the resist coating unit (c〇T) 44 adjacent to the upstream side The G is applied to the anti-funging agent liquid, and the vocabulary is moved from the floating field on the squat 8 to the side roller transport path. Then, as shown in Fig. 5, the substrate G is transported by rollers. The side roller transport path 10a moves upward, and finally enters the chamber 1〇6 of the decompression drying unit (VD) 46 from the carry-in port 11. At this time, the shutter mechanism 114 opens the inlet 110 in advance. The transport path 104b is also driven by the rotation of the rotary drive source 120, and is loaded into the side roller transport path 10, and the roller transport operation is performed in time, and the roller transport operation of the same transport speed is performed, as shown in FIG. The substrate G entering the port 11 is transported by rollers into the rear of the chamber 1 〇 6. At this time, the lifting mechanism 126 causes all the lift pins 128 to have lower front ends of the pins on the transport surface of the inner roller transport path. The return (down) position is first standby. Then, if the substrate G reaches the chamber 1〇6, the center is approximately At the position, the roller transport operation of the internal roller transport path 1 is stopped. At the same time or immediately before, the roller transport operation of the side roller transport path 1〇4a is stopped. As described above, the substrate G to be subjected to the vacuum drying treatment is carried into the chamber 1〇6 from the front or upstream side resist coating unit (c〇T) 44, at the same time (or tightly, before), + As shown in Fig. 5, the preceding substrate $, which has been subjected to vacuum drying treatment in the chamber 1〇6, is rolled by the internal roller transport path 1〇4b and the carry-out side roller transport path 丨〇4c. The sub-shipping is carried out from the unloading port 112 to the outside of the chamber and maintained in this state to be transported advancing to the second heat-treating portion 32 adjacent to the rear or downstream side (Fig. 1), as described in the 'resist coating unit ( The substrate G' coated with the resist liquid of the COT) 44 is transported into the decompression drying unit by the roller transported into the side roller transport path 1, for example, and the internal roller transport path 1〇牝200842,425. The chamber 106 of (VD) 46. Immediately after that, the shutter mechanisms 114 and 116 are actuated, and each of the carry-in port 110 and the transfer port 112 that has been opened up to this point is closed, and the chamber 106 is also sealed. Then, the lifting mechanism 126 moves the lifting cylinder 132 forward, and all the pin bases 13 〇: raises the predetermined stroke component so that the front end of all the lifting pins 128 in the chamber 1〇6 reaches beyond the internal roller conveying passage. The predetermined height position of the transport surface of 104b is Shishi. By the moving (rising) action of the lifting mechanism 126, as shown in FIG. 6, the substrate conveyance path l〇4b is maintained in a horizontal posture and transferred to the front end of the pin of the lift pin 128 and maintained in this state. Raised above the inner roller transport path 1〇4b. On the other hand, after the chamber 106 is sealed, the vacuum exhaust unit 142 is actuated to evacuate the chamber 106 to a predetermined degree of vacuum. In this way, in the chamber 1〇6, the substrate G is processed in a reduced pressure atmosphere, whereby the resist liquid film on the substrate can be appropriately dried with good efficiency. During this vacuum drying process, the substrate G is supported substantially horizontally by a plurality of lift pins 128, and the pin tip portion 128b of the lift pin 128 and having a rounded front end is extremely small in area and has no contact, thus, ie, thermal influence On the other hand, the trace of the anti-side film domain # substrate contact portion on the substrate G is not small and is negligible in practical use. Further, the pin tip portion i28b of the lowering pin 128 is made of a resin, and the pin body is applied as a hollow tube to reduce heat transfer, which is advantageous for minimizing transfer marks. The vacuum decompression process ends after a certain period of time, and the vacuum exhaust device = exhaust operation. Instead of this, the nitrogen gas ejecting portion 144 allows nitrogen gas to flow into the chamber. . Thereafter, after the internal pressure rises to the atmospheric pressure, the shutter mechanisms 114 and 116 enter: no and the outlet 112. Before and after this, the lifting mechanism 126 causes the lifting cylinder j to lower all the ship parts 13()- to the predetermined training component, so that the front end of the pin with the lifting pin|28 becomes the internal lion transport channel. The height position is up. By the _ (down) action of the lifting mechanism 126, the slanting posture is transferred from the _ end of the lift pin 128 to the inner roller, and then, the inner roller transport path l 〇 4b and the carry-out side roll Sub-transport 18 200842525 ϊ ΐ ϊ 该 该 该 该 该 该 2008 2008 2008 2008 2008 2008 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该The moving out, as shown in Fig. 5, comes from the subsequent coating of the resist coating unit (c〇T) 44, in the moving transport channel Xie &amp; and the internal roller transport channel just j The continuous roller transport can be carried into the chamber 1〇6 from the loading port 11。. The pressure drying unit (VD) 46, which is subjected to the vacuum drying treatment, is transported into the chamber by the roller. In the chamber 6, in the chamber 1〇6, the substrate G that has been dried and processed is transported out of the chamber 1 to 6 by the roller. Therefore, when the substrate is carried out, the substrate is not required to be transported. When the arm is broken, the position is deviated during loading/unloading, and the transfer port 112 is moved in and out of the substrate G. Therefore, the operation of the upper cover 118 (upper and lower) of the chamber 106 is not ridiculous, and there is no problem of dusting, which ensures safety for the operator. The lift pin 128 maintains the substrate G in a horizontal posture = the lift passage 104b is lifted upward to have a very fine pin tip portion, and the transfer mark of the substrate contact portion to which the resist film on the plate G is attached is reduced. The configuration and examples of the above-described decompression drying unit (VD) 46 of Figs. 3 to 6 can be variously modified within the scope of the technical idea of the present invention. Fig.: ~® 1) shows the vacuum drying of the second embodiment. The structure of the unit (VD) 46 (2: 3 to 6) has the same composition of the real f or the function of the upper knife. Further, Fig. 7 and Fig. 8 show the right image == in the chamber 1〇6. The configuration of the left half (upstream side) which is linearly symmetrical with respect to the center line N. In the second embodiment, the second feature is the internal roller transport path 1 〇牝 ', that is, in the first embodiment described above, Roller of internal roller transport path 1〇4b_ 19 200842525 = Column H is the carrier substrate G and the roller is transported if it corresponds to the township example, such as iS! 7w. Therefore, in the plurality of portions of the second cylindrical portion 1 SY, the two large portions of the two rollers 108d are smoothly rotated in a straight line shape using a ring-shaped large diameter=n======================= The bearing 152 of the support displacement supports and allows the position of the bearing 152 to be adjusted. More specifically, the long-length wire portion m extending in the center of the roller 108d is arranged at a fixed height, and the plurality of inverted U-shaped vertical support members 156 are set to be ==4 sub-type vertical. The inner side of the support member 156 is in contact with the transport direction (the horizontal support member 158 is brittlely aligned, and one or more (two in the illustrated example) central bearing i52 are mounted on the member 158. As shown in Fig. 9, the horizontal support member 158 is constituted by a corner cylinder, and the block 16 is fixed to the top surface of the horizontal support member 15S, and is formed with a height adjusting screw attached to the top surface of the reverse type vertical support member 156. The threaded hole of the 162 screw is checked (not shown by rotating the bolt 162, the height position of the horizontal support member 158 and the center bearing 152 can be variably adjusted. Then, by being mounted on one side of the reverse U-shaped vertical support member The lock (fixed) is tightened by the bolts 164, and the block 16 is pushed from the lateral direction to fix the horizontal support member 158 to the vertical support member I%. Also, the female wearer has 2 center bearings 152 of 1 The root horizontal support member I% is an example of a configuration supported by one anti-U sub-type vertical support member 156, and may be an example. For example, one horizontal support 158 having three center bearings 152 mounted as shown in FIG. 1A is supported by two inverted U-shaped vertical support members 156. ' Also, as shown in FIGS. 7 and 9 The base portion 154 is horizontally disposed 166 above the exhaust port 138 20 200842525 of the chamber 1〇6 to cover the two sides of the base 154. The two positions are earned and the bottom surface (floating) is installed. 丨(10) As shown in Figure 7 of 106, the internal roller transport channel seems to be in contact with the bevel gear, and the connection is dusted. In addition to the cavity, _74, the motor 178 and the drive pulley block 180 are connected. 铷,, and 176, conveyed ▼, as shown in Fig. 7, in the lifting mechanism 126, each surface extends in parallel (Υ direction) horizontal support Rod off support, m = support rod 182 is perpendicular to this and is in the direction of χ; the second feature of his 2 embodiment is the internal roller transport passage 104b and the outer t = Λ雠子运赖道1G4a, purchase Correctly connected (four) sub-gamma, 188 ', and in the selection of the entrance 110, 112 and / or gate mechanism 114, ιΐ6 〇 j Figure 7 and Figure 8 shown in the room On the moving-out side, the rolling support portion 190 in which a plurality of drum-type roller rollers are disposed is disposed in the γ-direction at intervals of γ. Further, the upper portion of the shutter mechanism 116 is attached to the γ-direction partition. The rolling support portion 192 of the plurality of drum rollers 188 is disposed at an appropriate interval. The roller 186 of the discharge port 112 is always at the height of the roller transport path 1〇4&amp; the gate, the roller 188 of the 116, when The shutter mechanism 116 retreats to the bottom surface and opens the discharge port 112%, and is positioned at the height of the roller transport path 丨〇4. Further, in the illustrated example, the roller 188 of the shutter mechanism 116 is provided only in a row, but the rolling support portion 192 may be extended in the X direction to provide two or more rows. As shown in Fig. 11, in the rolling support portions 190 and 192, each of the drum rollers 186, 188 is exposed on the window 194 only in the vicinity of the top portion in contact with the back surface of the substrate cymbal, so that dust can be dusted even by the rotating action. Also try not to spread around. In general, the smaller the rolling interval (rolling pitch) of the roller transport path, the roller of the substrate 21 200842525 is transported to the mosquitoes at a high speed. However, ί ί;= can be limited by rate. In this regard, in the second embodiment, the rolling interval iii of the roller transport path can be reduced, and the lifting ability (safety and high speed) can be improved. The third feature of this second embodiment is the exhaust mechanism. As shown in Fig. 8, the vacuum exhaust unit 142 is connected not only to the chamber via the exhaust pipe 140, but also to the exhaust fan 196 to connect the exhaust fan (or exhaust line) 198. Exhaust

1% f in the tube is not equipped with an opening and closing valve, 2〇2. In order to carry out the loading and unloading of the substrate G, the opening and closing valve 202 is opened while the opening and closing of the populations 110 and 112 is opened, and the exhaust fan 198 is activated to enter the chamber from the loading and unloading ports 11 and 112, and the dust or The dust mites generated in the chamber 106 are effectively discharged from the exhaust port 138 to the outside of the chamber 1〇6 via the branch exhaust 196. When the vacuum is applied to the chamber 1〇6, the switch on the side of the exhaust unit 142 is turned on, and the on-off valve 2〇2 on the side of the exhaust fan 198 is closed in advance. In the above embodiment, the chambers 1〇6 of the reduced-pressure drying unit (VD) 46 are provided with a transfer port 11〇 and a transfer port 112 in the pair of chamber side walls facing each other in the transport direction, and the gas plate G passes through The chamber is 1〇6. However, it is also possible to use both the side wall of the chamber 1〇6 as a carry-in port and a carry-out port. In this case, the carry-in side roller transport path 104a and the carry-out side roller transport path can also be achieved. 1〇4c sharing. In the present invention, the substrate to be processed is not limited to the glass substrate for LCD, and may be a substrate for a flat panel display, a semiconductor wafer, a CD substrate, a photomask, a printed substrate, or the like. The coating liquid to be subjected to the vacuum drying treatment is not limited to the resist liquid, and may be, for example, a treatment liquid such as an interlayer insulating material, a dielectric material, or a wiring material. 22 200842525 BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 shows the constitution of a coating development processing system to which the present invention is applicable. Fig. 2 is a flow chart showing the processing steps of the above coating development processing system. Figure. Fig. 3 is a plan view showing the entire configuration of the coating treatment portion of the embodiment: Fig. 4 is a view showing the configuration of the vacuum drying unit of the first embodiment. Figure 5 is a view showing the portion of the vacuum drying unit of the first embodiment

〇 J VSJ Fig. 6 is a cross-sectional view showing the reduced-pressure dry state of the reduced-pressure drying unit of the i-th embodiment. Fig. 7 is a plan view showing the configuration of the reduced-pressure drying unit of the second embodiment. Fig. 8 is a view showing a configuration of a vacuum drying unit of the second embodiment. Fig. 9 is a cross-sectional view showing the mechanism in which the height of the center is centered in the second embodiment. Fig. 10 is a side view showing a modification of the mechanism for preliminarily adjusting the height position of the center bearing in the second embodiment.

Fig. 2 is a perspective view showing the mounting structure of the roll-to-roll type of the carry-out port and/or the shutter mechanism of the second embodiment. W [Description of main component symbols] C EE G RL SY TITLER 10 12 13 14 周边 box peripheral exposure device substrate roller section shaft printing exposure applicator development processing system exposure device lifting cylinder 匣 box station (C/S) 23 200842525 16 Processing Station (P/S) 18 Interface station (I/F) 20 pedestal 22 transport mechanism 22a transport arm - 24 carry-in unit (IN PASS) 26 cleaning processing unit 28 first heat treatment unit 30 coating processing unit /. 32 second heat treatment unit 34 1st advection transport channel 36 Excimer UV irradiation unit (E-UV) 38 Scrub cleaning unit (SCR) 40 Adhesion unit (AD) 42 Cooling unit (COL) 44 Resin coating unit (COT) 46 Decompression drying Unit (VD) 48 Pre-bake unit (PRE-BAKE) 50 Cooling unit (COL) C 52 Passing unit (PASS) 54 Developing unit (DEV) 56 Post-drying unit (POSTBAKE) 58 Cooling unit (COL) 60 Inspection unit (AP) 62 Outlet unit (OUT PASS) 64 Second advection transport path 66 Third heat treatment unit 68 Auxiliary transport space 70 Shuttle mechanism 24 200842525 72 Transport unit 74 Rotating pedestal (R/S) 76 Peripheral unit 80 Pedestal 82 Substrate transport mechanism 84 Resist nozzle 86 Nozzle renewing portion 88 Gas ejection port 90A, 90B Guide rail 92 Sliding mechanism 94 Nozzle supporting member 96 Strut member 98 Precoating processing portion 100 Nozzle bath 102 Nozzle cleaning mechanism 104 Roller transport path 104a Roller transport path 104b Roller transport path 104c Roller transport path 106 Chambers 108a, 108b, 108c, 108d Roller 110 Carrying port 112 Carrying out port 114, 116 Gate mechanism 118 Upper cover 120 Rotary drive source 122 Rotary shaft 124 Sealing member 126 Lifting mechanism 25 200842525 128 Lifting pin 128a Pin body 128b Pin tip 130 Pin base 132 Cylinder 134 Sealing member 136 Elevating drive shaft 138 Exhaust port 140 Exhaust pipe 142 Vacuum exhaust 144 Nitrogen ejector 146 Piping 150 Bearing 152 Bearing 154 Base 156 Support member 158 Support member 160 Block 162 Bolt 164 Bolt 166 Venting rectification plate 168 Foot 172 Drive shaft 174 Motor 176 Drive pulley block 178 Conveyor belt 180 Drive pulley block 182 Horizontal support rod 184 Horizontal connection rod 26 200842525

186, 188, 190, 192 Rolling Support 194 Window 196 Exhaust Pipe 198 Exhaust Fan (or Exhaust Line) 200, 202 Open and Close Valve 27

Claims (1)

200842525 X. Patent application scope: 1. - A vacuum drying device, which is subjected to drying treatment on the substrate to be processed, and has: an ugly chamber for decompression, with a substrate for substantially horizontally The state is in a state of being loaded into the work iH: in order to perform the drying process, the chamber is in a closed configuration, and has a roller transport on the outer and inner sides of the chamber for the roller transport on the transport path. Lifting the wire plate out of the chamber; and + 2 ΐϊί, having a plurality of lift pins discretely disposed in the chamber, descending to thinly support the front end of the substrate substantially horizontally* and rise to the dry place _ 'Using the lifter_previous end than the roller transporting plate', when the substrate is carried out, the lift pin is made ί:=ΐ: the transport path is low', and the transport mechanism is used to perform the process, wherein The pin of the lifting pin is dry, shot, and the lock of the pin is reduced. The vacuum drying device of any one of items 1 to 3, which makes the tip of the resin made by Deng Deng. The body of Cheng Cheng Shen 4th fiber follows, its towel, the filling tip is the decompression dry wear of any one of the first to third patent applications, and the driving force is lowered and configured by the lifting force. The outside of the chamber, the declaration of the diameter of the 丨 丨 丨 3 3 3 3 项 , , , 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 28 a shaft and a plurality of annular rollers formed on or mounted on the shaft via the splicing interval, the rollers being in contact with the bottom surface of the substrate on the outer circumferential surface of the roller. 8. 8 of the patent application scope The vacuum drying device, wherein the rolling shaft, the first bearing fixed at a certain height position at both ends is rotatably supported, and the second bearing whose center portion is adjustable in height position is rotatable A vacuum drying apparatus according to any one of clauses J to 3, wherein the side wall portion of the chamber is provided for: transporting the substrate by the roller from the cavity Outdoor, moving into the chamber, and transporting the silk board gift from the chamber to the For the outside of the side wall of the room, there is a gate mechanism for opening and closing the moving population and the exiting port. 10·=Please take the vacuum drying device of the ninth patent range, where the moving port And the outlets are respectively disposed on the side wall portion of the chamber. The vacuum drying device of the ninth aspect of the patent, wherein the chamber is moved or partially formed to be a part of the transport passage of the cage. In the dehumidifying and drying device of the ninth item, in the sluice mechanism, the smashing machine, the moving population, or the moving out of the eleventh constitute the county sub-transportation channel - 1 to 3 items of towels 1 item of decompression and dry work, in which the chamber is inside (4), and in the open state, the second exhaust mechanism of the milk is introduced into the chamber. 1 运_1 排11, round: 29