TW200841991A - Process and apparatus for treating exhausted abrasive slurries from the lapping process for the recovery of their reusable abrasive component - Google Patents
Process and apparatus for treating exhausted abrasive slurries from the lapping process for the recovery of their reusable abrasive component Download PDFInfo
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- TW200841991A TW200841991A TW096148180A TW96148180A TW200841991A TW 200841991 A TW200841991 A TW 200841991A TW 096148180 A TW096148180 A TW 096148180A TW 96148180 A TW96148180 A TW 96148180A TW 200841991 A TW200841991 A TW 200841991A
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- Prior art keywords
- fine
- hydrocyclone
- abrasive
- suspension
- particles
- Prior art date
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- 238000000034 method Methods 0.000 title claims abstract description 80
- 239000002002 slurry Substances 0.000 title claims abstract description 61
- 230000008569 process Effects 0.000 title claims abstract description 37
- 238000011084 recovery Methods 0.000 title abstract description 7
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 85
- 229910052742 iron Inorganic materials 0.000 claims abstract description 42
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 30
- 239000007788 liquid Substances 0.000 claims abstract description 27
- 239000000654 additive Substances 0.000 claims abstract description 17
- 230000000996 additive effect Effects 0.000 claims abstract description 8
- 239000000725 suspension Substances 0.000 claims description 67
- 239000010419 fine particle Substances 0.000 claims description 60
- 239000002245 particle Substances 0.000 claims description 48
- 238000000227 grinding Methods 0.000 claims description 41
- 239000006194 liquid suspension Substances 0.000 claims description 25
- 238000005498 polishing Methods 0.000 claims description 23
- 238000003860 storage Methods 0.000 claims description 19
- 239000002253 acid Substances 0.000 claims description 18
- 238000000926 separation method Methods 0.000 claims description 14
- 239000008187 granular material Substances 0.000 claims description 13
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims description 12
- 230000007246 mechanism Effects 0.000 claims description 12
- 239000012445 acidic reagent Substances 0.000 claims description 11
- 238000007517 polishing process Methods 0.000 claims description 10
- 239000000203 mixture Substances 0.000 claims description 9
- 239000000126 substance Substances 0.000 claims description 9
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 8
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 8
- 238000001914 filtration Methods 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 7
- 229910001111 Fine metal Inorganic materials 0.000 claims description 6
- 159000000014 iron salts Chemical class 0.000 claims description 6
- 230000006378 damage Effects 0.000 claims description 4
- 235000006408 oxalic acid Nutrition 0.000 claims description 4
- 230000000087 stabilizing effect Effects 0.000 claims description 4
- 229910052684 Cerium Inorganic materials 0.000 claims description 3
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 claims description 3
- 239000000706 filtrate Substances 0.000 claims description 3
- 150000002505 iron Chemical class 0.000 claims description 3
- 238000005530 etching Methods 0.000 claims description 2
- 239000012065 filter cake Substances 0.000 claims description 2
- 238000000746 purification Methods 0.000 claims description 2
- 239000007790 solid phase Substances 0.000 claims description 2
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims 3
- 239000002923 metal particle Substances 0.000 claims 3
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims 2
- 241000219112 Cucumis Species 0.000 claims 1
- 235000015510 Cucumis melo subsp melo Nutrition 0.000 claims 1
- 235000013399 edible fruits Nutrition 0.000 claims 1
- 238000011049 filling Methods 0.000 claims 1
- 238000011835 investigation Methods 0.000 claims 1
- 230000035800 maturation Effects 0.000 claims 1
- 230000003287 optical effect Effects 0.000 claims 1
- 239000000049 pigment Substances 0.000 claims 1
- 238000002360 preparation method Methods 0.000 claims 1
- 230000000717 retained effect Effects 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 abstract description 10
- 238000003486 chemical etching Methods 0.000 abstract description 7
- 239000002699 waste material Substances 0.000 abstract description 5
- 239000000919 ceramic Substances 0.000 abstract description 3
- 239000010453 quartz Substances 0.000 abstract description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 3
- 239000006061 abrasive grain Substances 0.000 abstract 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
- 239000007787 solid Substances 0.000 description 10
- 238000005520 cutting process Methods 0.000 description 6
- 238000009825 accumulation Methods 0.000 description 5
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 5
- 238000004064 recycling Methods 0.000 description 5
- 239000003082 abrasive agent Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 239000004615 ingredient Substances 0.000 description 4
- 229920001223 polyethylene glycol Polymers 0.000 description 4
- 238000011160 research Methods 0.000 description 4
- 239000004575 stone Substances 0.000 description 4
- 239000002202 Polyethylene glycol Substances 0.000 description 3
- 238000005119 centrifugation Methods 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 239000012530 fluid Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- 229910001018 Cast iron Inorganic materials 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical group [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 238000002386 leaching Methods 0.000 description 2
- 238000004377 microelectronic Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000007670 refining Methods 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- 241000252185 Cobitidae Species 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- -1 and the residual (4) Substances 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000011344 liquid material Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000001471 micro-filtration Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- JTJMJGYZQZDUJJ-UHFFFAOYSA-N phencyclidine Chemical class C1CCCCN1C1(C=2C=CC=CC=2)CCCCC1 JTJMJGYZQZDUJJ-UHFFFAOYSA-N 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 238000004382 potting Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000003134 recirculating effect Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 210000004243 sweat Anatomy 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B55/00—Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
- B24B55/02—Equipment for cooling the grinding surfaces, e.g. devices for feeding coolant
- B24B55/03—Equipment for cooling the grinding surfaces, e.g. devices for feeding coolant designed as a complete equipment for feeding or clarifying coolant
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
- B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
- Disintegrating Or Milling (AREA)
- Treatment Of Sludge (AREA)
Abstract
Description
200841991 九、發明說明: 【發明所屬之技術領域】 =明有關一用於處理從研光程序排出的 以回 收㈣浆可再使用之研磨成分的方法及相關裝置。更特別 地:’本發明有關一種方法,藉著用於施行該方法所需要 =:,用於當用於研磨,、石英或陶磁之晶圓的研磨漿 被排出且富含不想要之廢料時,回收該研磨漿中所包含之200841991 IX. Description of the invention: [Technical field to which the invention pertains] = A method and related apparatus for processing a polishing component discharged from a polishing program to recover a reusable slurry. More particularly: 'The present invention relates to a method for performing the method =: for when a slurry for grinding, quartz or ceramic wafers is discharged and is enriched with unwanted waste Recycling the contained in the slurry
可再使用的研磨成分。哕太、、土 A 成刀@方以夠时來自研光程序的排 出研磨漿中所包含之仍然可 ’、、、 使用的王部研磨細粒,該等 研磨細粒係此類型研磨漿中 、 m、… 有的可再使用之成分,這 疋為心洋的液體是由水所組成 ^ 〇 ΑΛ Θ ^ 风旳且懸汗的添加物係以 不足的!存在而使得以經濟的方式進行回收可行。 【先前技術】 如已習知者,用於V帝H ί> 、私子及先笔伏打能量領域中之應用 ^ 將夕日日矽的錠塊或是單晶矽 鈸塊所獲得之薄矽碟片(“日 ^ 日日α )垂直地切割成其長度而 利用该錠塊。典型地,此籀 、隹Α各 種切片刼作係藉著線鋸或切刀來 仃’在该等線鑛或切刀中 且古h 刀刀中捲繞在滾筒及線軸的系統中 蚌以千* 、機械抵抗性的金屬線’係在移動的同 B寸以垂直於錠塊長度 ^ , 万式在要進仃切割的位置點處與錠 塊相接觸。同時,包含磨 ^ Λ , 所磨、、、田粒或顆粒之漿料(研磨漿)係 "切刀金屬線與錠塊之間的接觸區域。 用於以線鋸切割矽、石盆々甘α 央或,、他陶磁材料之錠塊的傳 6 200841991 統研磨聚係由-種懸浮、潤滑或冷卻的流體組成,例如礦 物油或高分子量之水溶性有機液體(特別是聚乙二醇, PEG),大體上為碳化矽(Sic)之合適硬度的研磨顆粒係懸浮 在該流體中。 矽曰曰圓接著遭受研光程序,以便保證微電子工業所需 要的嚴格機械公差,及消除藉由先前切割操作所導入的任 何對矽晶格之損壞’以及製備隨後之拋光操作所用的表 面。研光操作係以研光機器進行,該研光機器基本上由二 =大而完全平坦且圓形之重疊水平鑄鐵板件所組成的,該 等板件在彼此相反之方向中旋轉。下方的板件係以一研磨 漿均勻地覆蓋,且來自切割操作的矽晶圓係放置在該下方 板件上而位於特別之附屬設備内,該等附屬設備係比待研 光之矽晶圓更薄,且它們被製成藉著有齒輪的傳動系統藉 由圓形下方板件之運動而旋轉。 曰曰圓接著均勻地被覆盍以研磨漿,且上方板件係下降 到匕們上。如此造成整個系統旋轉,且研磨漿係在研光程 ::從頭到尾連續地餵入二個板件之間的空間中。該操作 、、’麄々,直至達到微電子技術所需要之晶圓厚度為止。 •用於研光程序的研磨漿係代替地由去離子水(懸浮液 =)通系為氧化銘Al2〇3且視所需之特殊用途而定而具有 ^ 及20微米間之目標粒徑的實際磨料;及一種市售 一予添加^之混合物所構成’該懸浮添加劑具有促進及穩 定研磨微粒在水中的懸浮的作用。此添加劑係以介於3 ^ 4重量百a比間之範圍的量存在於該懸浮物中,且通常係 7 200841991 一種低經濟價值之產品,而使得將其從排出研磨漿回收被 視為不值得的。用於矽晶圓的典型研磨漿組分係如下: -去離子水 76.5% 重量百分比 -市售懸浮添加劑 3.5% 重量百分比 -磨料:純氧化鋁 20.0% 重量百分比 (具有典型PW9或PW15之粒徑) 或與其他氧化物混合 200-300 公克/公升 -懸浮黏度 450 厘泊 於研光程序期間, 部份的研磨細粒會喪失其用 本身$曰/土从 ,曰K A丹用於製程 取土乍用的有用特性,這是因為氧化鋁的顆粒會分 研=、的顆粒,1因此不再適用於研光操作 :磨:!的粒捏尺寸分佈降低至較低平均值的事實所: 該秒晶圓、及來自研::二 ®之厚度減少時來自 部份為鐵顆位)及;Γ —起被研磨之禱鐵板件(大 在—種排出研磨漿中 处矛貝救。 及矽)的百八l 顆粒(尺寸<4微米之磨料、鐵 )的百刀比係固體部分的大約百分之3〇。 鑷 上 面 在研光操作期間會建立及累積研磨 寸別疋由於細微的顆粒係沈積在本身為… 辰度, 上,這是因為它們可能合到=身為不想要之研磨細粒 。 ㈢知及知壞正党到研光程序的表 Q此’離間研弁傭 研声將夕°°方板件的研磨毁不再 研“之機械與化學性質 不再具有新鮮 而被再利用,以所卿, %用於另-研光循環時 矽晶圓的流出速度與機械參數 8 200841991 其將負面地影響研光 觀點、及以金屬性污染的觀點兩者 程序的效率。 被拋棄之排出研磨嘮i έ<τ< & ί¥ , 經由民用與4廢棄物處理廠 末處理。然而,所產生的泥杳 > 一而接者迗至垃圾填埋地。 無論如何,除了必需處置 八+ + 仏莱產物之%境問題以外, 曾有喪失排出研磨漿中所包含 之相*可觀®之仍然可再使 用的研磨細粒之相當大的經濟 _ 方便性。运些研磨細粒可 被重複利用,因為它們仍麸呈古Reusable grinding ingredients.哕太,,土 A, 刀@方, enough to be used in the discharge slurry from the polishing program, the king-grinding fine particles that are still used, and the fine particles are in this type of slurry. , m, ... Some reusable ingredients, this is the heart of the liquid is composed of water ^ 〇ΑΛ Θ ^ Wind and sweat additives are insufficient! The existence makes it possible to recover in an economical way. [Prior Art] As has been known, it is used in the field of V-European, private and first-hand volts, and the thinness obtained from the ingots or single crystal blocks. The disc ("Day ^ Day α α ) is cut vertically into its length to utilize the ingot. Typically, this 刼, 隹Α various slicing is made by a wire saw or a cutter to 仃 'in the line mine Or in the cutter and the h-knife in the system of the drum and the bobbin, the thousands of wires and the mechanically resistant metal wire are tied to the same B-inch to the length of the ingot. At the point where the cutting is carried out, it is in contact with the ingot. At the same time, the slurry containing the grinding, grinding, grinding, granules or granules (grinding pulp) is the contact between the cutting wire and the ingot. Area. For the use of wire saws to cut 矽, 石 々 α 或 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , Water-soluble organic liquid of molecular weight (especially polyethylene glycol, PEG), which is generally suitable hardness of strontium carbide (Sic) The abrasive particles are suspended in the fluid. The rounds are then subjected to a polishing process to ensure the tight mechanical tolerances required by the microelectronics industry and to eliminate any damage to the lattice caused by previous cutting operations. And preparing a surface for subsequent polishing operations. The polishing operation is performed by a polishing machine consisting essentially of two large, completely flat and circular overlapping horizontal cast iron sheets, the plates Rotating in opposite directions to each other. The lower panel is evenly covered with a slurry, and the wafer from the cutting operation is placed on the lower panel and located in a special accessory device. They are thinner than the wafers to be polished, and they are made to rotate by the movement of the circular lower plate by the geared transmission system. The circle is then evenly coated to grind the slurry, and the upper plate The part is lowered onto us. This causes the whole system to rotate, and the slurry is in the grinding process: continuously feeds the space between the two plates from head to tail. The operation, '麄々 Until the wafer thickness required for microelectronics technology is reached. • The slurry used for the polishing process is instead made of deionized water (suspension =) through the oxidation of Al2〇3 and depending on the specific application required. An actual abrasive having a target particle size between ^ and 20 microns; and a commercially available mixture of added additives to form a suspension additive having the function of promoting and stabilizing the suspension of the abrasive particles in water. An amount in the range of 3 ^ 4 weight hundred a ratio is present in the suspension, and is generally a product of low economic value of 7 200841991, such that recovery from the discharged slurry is considered unworthy. The typical slurry composition of the germanium wafer is as follows: - deionized water 76.5% by weight - commercially available suspension additive 3.5% by weight - abrasive: pure alumina 20.0% by weight (with typical PW9 or PW15 particle size) or Mixing 200-300 g/L with other oxides - Suspension viscosity 450 cps During the polishing process, some of the fine particles will lose their use of $曰/土从, 曰 KA Dan for the process At first glance the soil with useful properties, it is because the alumina particles = research will be divided, particles, 1 and therefore no longer apply to the polished operations: grinding:! The fact that the size distribution of the granules is reduced to a lower average: the second wafer, and the thickness of the slab: from the second: when the thickness of the two is reduced, the part is the iron particle) and the 祷 被One hundred and eight l particles (size < 4 micron abrasive, iron) of the 100 parts of the solid portion of the piece (large in the discharge slurry) are about 3 percent.上 Above Surfaces are built and accumulated during the grinding operation. Because the fine particles are deposited on the surface itself, this is because they may be combined to = unwanted abrasive fines. (3) Knowing and knowing the bad party to the research program Q This is the 'disparity between the research and the research. The grinding and destruction of the square plate is no longer researched. The mechanical and chemical properties are no longer fresh and reused. According to the Qing, the % is used for the flow-out speed of the wafer during the other-lighting cycle and the mechanical parameter 8 200841991. It will negatively affect the efficiency of both the experimental viewpoint and the viewpoint of metallic contamination. Grinding 唠i έ<τ<& ί¥ , processed by the civil and 4 waste treatment plants. However, the resulting loach> is picked up to the landfill. In any case, except for the necessary disposal In addition to the % problem of the 仏 产物 product, there has been considerable economical _ convenience for the loss of the reusable abrasive granules contained in the slurry*. Reuse because they are still bran
扪1乃然具有供研磨漿中之進一步使用 的正確尺寸。 由於分開與回收可再使用的研磨成分以在研光程序之 θ中使用的需求係該領域中之—越來越廣泛地意識到的問 題,已提出了數種用以回收研光程序排出研磨漿的特定技 術,且它們全部多樣化地組合以下的基本操作:a)藉由濕 式粒度为遠、尤其藉由離心作用或藉由使研磨漿通過一水 力旋流分離器(由液體所夾帶的固體細粒之靜力分離器,其 係利用離心力之作用)來分開研磨細粒;…藉著轉筒篩選法 破壞研磨細粒不想要的積聚塊。 如將在下文中參考先前技術的一些實施例而變得更清 楚的’目别的習知技術存在各種不方便性,例如在尺寸方 面或在細微的矽及/或鐵顆粒存在方面,可再使用之研磨 細粒的品質不足。 曰本專利申請案JP 2003266309(授與Komatsu Denshi扪1 has the correct size for further use in the slurry. Since the need to separate and recycle reusable abrasive components for use in the θ of the polishing program is a problem that is increasingly recognized in the art, several methods have been proposed for recycling the polishing process to remove the abrasive. Specific techniques of pulp, and they all versibly combine the following basic operations: a) by wet particle size far, especially by centrifugation or by passing the slurry through a hydrocyclone (entrained by liquid) The solid fine particle static separator, which uses the action of centrifugal force to separately grind the fine particles; ... destroys the undesired accumulation block of the abrasive fine particles by the drum screening method. As will be apparent from the following description of some embodiments of the prior art, there are various inconveniences, such as in terms of size or in the presence of fine flaws and/or iron particles, which can be reused. The quality of the ground fine particles is insufficient.曰本专利申请 JP 2003266309 (granted to Komatsu Denshi
Kinzokii KK)敘述一種系統,用於自動化回收、再循環及將 研磨漿饋送至研光機器的操作,及用於藉由破壞研磨細粒 9 200841991 v 的積聚塊及消除外來污染細粒來改善研光的產量。研磨細 粒積聚塊之分解係藉著一組轉筒篩選器而實施,來自研光 程序的排出研磨漿係被饋送到該等轉筒篩選器;研磨細粒 的積聚塊係因此被分開,且接著以一再循環液體之幫助而 分離。此液體能夠獲得含有合適比重之研磨細粒的懸浮 物’用以於研光機中被重複利用。 再循環之液體本身能夠獲得包含無法再使用之研磨細 _ 粒(亦即,低比重之細粒)及像鐵及矽的大部份汙染物之第 二懸浮物,且此懸浮物能接著被送至垃圾填埋地來處置。 所述之分遥系統允許消除研磨積聚塊,但不會產生高 :質之回收研磨細粒,這是因為所回收之研磨部分仍然包 S某一夏之細微污染研磨細粒與細微粉末(鐵與矽),其累 積在排出之研磨漿中成為研光程序之殘餘物。 另一種用於回收研光程序之排出研磨漿的程序係敘述 ;專利申 月木 JP 2002 239906(Ishikawajima Hanyoki % =rV1Ce KK)中,其有關用於重複使用用於研光程序中的研 磨漿之方法與相關設備,該方法與相關設備可提供精確的 =度刀造的研磨細粒及消除可能會在研光操作期間造成刮 傷及損壞的研磨細粒積聚塊。 、,所述方法係基於藉由離心作用分離研磨細粒:來自研 ^機器的排出研磨襞係被饋送到第一離心分離機,該第一 _ ^刀離機能夠將研光程序的液體從研磨細粒及從雜質分 離。第一離心分離機的研磨細粒係與一種用於清洗及分離 細微細粒的液體相混合,且接著被饋入從清洗液體分離可 10 200841991 再使用之研磨細粒的二個連續的離心分離機,此等分離機 因此將包含細微之研磨細粒及雜質。從二台連續的離心分 離機所獲得之研磨細粒係與從第一離心分離機所獲得之研 磨液體相混合,且如此獲得之回收懸浮物係饋入研光機器 之中。 於财述方法中,研磨成分與雜質從研光程序的液體的 分離係藉由單一的離心操作(第一離心分離機)而實施。因 此’可以預期研磨液體、及因此回收懸浮體會包含一種研 s成为且亦包含一此雜質。 【發明内容】 基於此先前技術,本發明的目標因此在於提供一種處 理排出研磨漿的方法,該研磨漿的種類為於使用在藉著研 光機态來研光晶圓的製程中,及該方法能夠實際上以一種 谷易運作之經濟上可行的製程來完全回收仍有可以在研光 私序中重複利用之合適尺寸的研磨細粒。該方法亦必需確 保此夠從已回收且可再使用之成分完全消除來自研光程序 之廢料(像來自研光機器的鑄鐵板件的矽與鐵),且破壞不 再可使用之研磨材料的細粒。 取 從回收矽晶圓的研光中所使用之研磨漿的特定需求開 始’研磨漿典型具有以下之特徵: 幵 •研磨劑:純氧化鋁或於與其他氧化物之混合物,具 有4及2 0微米之間的粒徑; •懸浮液體:去離子水; 200841991 .添加劑:具有高懸浮能力之市售類型;Kinzokii KK) describes a system for automated recovery, recycling and feeding of slurry to a polishing machine, and for improving the grinding by destroying the accumulation of fine particles 9 200841991 v and eliminating foreign contaminated fines The production of light. The decomposition of the fine-grained accumulation block is carried out by a set of drum filters, and the discharged slurry from the polishing program is fed to the drum filters; the accumulated blocks of the fine particles are thus separated, and It is then separated with the aid of a recycled liquid. This liquid is capable of obtaining a suspension of abrasive fine particles having a suitable specific gravity' for reuse in a calender. The recycled liquid itself is capable of obtaining a second suspension containing abrasive fine particles (i.e., low specific gravity fine particles) and most of the pollutants such as iron and antimony, and the suspended matter can be subsequently Send to landfill for disposal. The separation system allows to eliminate the grinding accumulation block, but does not produce high quality recovery of the fine particles, because the recovered grinding portion still contains a fine polluted fine particles and fine powder (iron) And 矽), which accumulates in the discharged slurry to become a residue of the polishing program. Another program for recycling the slurry of the polishing program is described in the patent Shenyuemu JP 2002 239906 (Ishikawajima Hanyoki % = rV1Ce KK), which relates to the reuse of the slurry used in the polishing process. The method and related equipment, the method and related equipment can provide precise grinding of the fine particles and eliminate the abrasive fine accumulation block which may cause scratches and damage during the polishing operation. The method is based on separating the ground fine particles by centrifugation: the discharge grinding system from the grinding machine is fed to the first centrifugal separator, the first knife can remove the liquid from the polishing program The fine particles are ground and separated from the impurities. The ground fines of the first centrifugal separator are mixed with a liquid for washing and separating fine fine particles, and then fed into two continuous centrifugal separations of the fine particles which are separated from the cleaning liquid. Machines, such separators will therefore contain finely ground fines and impurities. The finely divided fines obtained from the two successive centrifugal separators were mixed with the grinding liquid obtained from the first centrifugal separator, and the thus obtained recovered suspended solids were fed into a polishing machine. In the method of the invention, the separation of the polishing component and the impurities from the liquid of the polishing program is carried out by a single centrifugal operation (first centrifugal separator). Therefore, it is expected that the grinding liquid, and thus the recovered suspension, will contain a kind of research and also contain such an impurity. SUMMARY OF THE INVENTION Based on this prior art, the object of the present invention is therefore to provide a method for processing a discharge slurry, the type of the slurry being used in a process of polishing a wafer by a polishing machine state, and The method can actually completely recover the finely sized abrasive particles that can be reused in the grinding light private sequence in an economically viable process that is easy to operate. The method also necessitates ensuring that the recovered and reusable ingredients completely eliminate the waste from the polishing process (such as tantalum and iron from cast iron plates from the polishing machine) and destroy the abrasive materials that are no longer usable. Fine particles. Starting with the specific requirements of the slurry used in the polishing of recycled germanium wafers, the slurry typically has the following characteristics: • Abrasives: pure alumina or a mixture with other oxides, having 4 and 2 0 Particle size between microns; • Suspended liquid: deionized water; 200841991. Additives: Commercially available types with high suspension capacity;
本發明的目標在於應用-種技術,該技術類似—種已 用來處理來自藉由線鋸切刀所切割之矽、石英或陶竟錠塊 的被排出之研磨漿的技術,此技術為相同發明人仍然未公 告的專利申請案RM2005 A000329之目標。用於回收來自 切割石夕晶圓的所有有用成分的特H兄的技術當㈣更加 複雜’此技術包含適合於且有利地心回收研光程序之研 磨成分的部分’其中排出的研磨漿係藉著在—水力旋流分 離器中之濕式粒度分選,藉由從料物之其餘部份移去可 再使用之研磨細粒而遭受分離,纟中該操作最佳地不是在 單-水力旋流分離器内實施,而是在一組適當地串聯連接 及以逆流被饋入之水力旋流分離器之中實施。 如已知的,在一水力旋流分離器中,所要處理之饋送 物係以高速且成切線地由頂部饋入裝置之中,而使得離心 力將較重的顆粒推向容器的侧邊。以螺旋方式移動,較重 之顆粒接著被收集於容器之圓錐形底部(下溢流)中,而該 淨化的液體則在頂部處從一中央導管(溢流)離開。在所提 出的水力旋流分離器群組中,從水力旋流分離器底部處所 獲得而如同一下溢流(UF)之富含懸浮物的磨料細粒係轉移 至饋入串聯的下一個水力旋流分離器中,且後來的水力旋 流分離器的底部會產生具有合適於重複使用尺寸之研磨細 粒的懸浮物。 根據可以在本發明中構想出的程序之一些較佳解決方 案,也可以使用描述於專利申請案RM2005 A000329中製 12 200841991 輪 程的其他技術特徵。特別是’從水力旋流分離器群組所獲 得而當做下溢流的細粒上所實施的酸浸處理的目標為:‘ 成仍^ 3在攸水力旋流分離器群組操作所回收的研磨細粒 饋料中之細小鐵顆粒的化學餘刻,且於一些情況中,是過 濾藉著化學银刻的過濾' 之後所回收的研磨細粒之懸浮物的 操作中。 因此,本發明具體地提供一種用於處理從研光程序所 φ排出之研磨漿的方法,且該研磨漿由一種懸浮液體、以及 可再使用之研磨細粒、細小研磨細粒、細小石夕細粒及細小 金屬細粒所構成,該懸浮液體基本上則由水及一種用於穩 定懸浮體物的添加劑所組成。該方法包括以下步驟: a)藉由濕式粒度分選處理將排出的研磨漿分離成:i) 一種含有可再使用之研磨細粒的液體懸浮物,及π)一種含 有細小研磨細粒、以及細小矽細粒與細小金屬細粒的液體 懸浮物。 _ b)消除含由前述細小研磨細粒及細小矽細粒與細小金 屬細粒的液體懸浮物,並收集含有可再使用之研磨細粒的 液體懸浮物’以便將其饋回研光程序之中。 該方法之特徵為以下之事實:操作步驟a)之濕式粒度 分選處理係藉由以下實施:在至少二個串聯地連接之第一 群組水力旋流分離器中處理混合物,以逆流饋入水,藉此 從該群組最後一個水力旋流分離器之底部處獲得一種液體 懸浮物,該液體懸浮物含有可再使用之研磨細粒及可以忽 略量的細小研磨細粒。較佳地,該第一群組由介於二及六 13 200841991 間的水力旋流分離器、但較佳地 平乂1土地疋四個水力旋流分離 組成The object of the present invention is to apply a technique similar to that which has been used to treat discharged slurry from a crucible, quartz or ceramic ingot cut by a wire sawing cutter. The inventor remains the target of the unpublished patent application RM2005 A000329. The technique used to recover all the useful ingredients from the cutting stone wafers is (4) more complicated. 'This technology contains a part of the grinding component that is suitable and beneficial for the recovery of the polishing program. Wet particle size sorting in a hydrocyclone separator is subjected to separation by removing the reusable abrasive fines from the remainder of the material, which is optimally not in a single-hydrodynamic force. It is implemented in a cyclone separator, but in a group of hydrocyclones that are suitably connected in series and fed in countercurrent. As is known, in a hydrocyclone, the feed to be treated is fed into the apparatus at high speed and tangentially from the top such that centrifugal forces push the heavier particles toward the sides of the container. Moving in a spiral, the heavier particles are then collected in the conical bottom (underflow) of the vessel, while the purified liquid exits from a central conduit (overflow) at the top. In the proposed hydrocyclone separator group, the abrasive-rich fines obtained from the bottom of the hydrocyclone and like the overflow (UF) are transferred to the next hydrocyclone fed into the series. The bottom of the hydrocyclone in the flow separator, and later the hydrocyclone, produces a suspension of ground fines suitable for re-use sizes. Other technical features of the 12 200841991 wheel described in the patent application RM2005 A000329 can also be used in accordance with some preferred solutions of the procedure that can be conceived in the present invention. In particular, the objective of the acid leaching treatment carried out on the fine granules obtained from the hydrocyclone separator group as the underflow flow is: 'Yes still 3' recovered in the operation of the hydrocyclone group The chemical residue of the fine iron particles in the fine particle feed is milled, and in some cases, the operation of filtering the suspended fines recovered by chemical silver engraving. Accordingly, the present invention specifically provides a method for treating a slurry discharged from a polishing program φ, and the slurry is composed of a suspension liquid, and reusable abrasive fine particles, fine abrasive fine particles, and fine stone eve It is composed of fine particles and fine metal fine particles, and the suspension liquid is basically composed of water and an additive for stabilizing the suspension. The method comprises the steps of: a) separating the discharged slurry by a wet particle size sorting process: i) a liquid suspension containing reusable abrasive fine particles, and π) a fine abrasive fine particle, And a liquid suspension of fine fine particles and fine metal fine particles. _ b) eliminating the liquid suspension containing the fine fine particles and the fine fine particles and the fine metal fine particles, and collecting the liquid suspension containing the reusable abrasive fine particles to feed them back to the polishing program in. The method is characterized by the fact that the wet particle size sorting process of operation step a) is carried out by treating the mixture in at least two first group of hydrocyclones connected in series for countercurrent feeding Water is introduced whereby a liquid suspension is obtained from the bottom of the last hydrocyclone of the group, the liquid suspension containing reusable abrasive fines and negligible amounts of fine abrasive fines. Preferably, the first group consists of a hydrocyclone separator between two and six 13 200841991, but preferably a flat raft 1 land 疋 four hydrocyclones separated
細粒。可從以硝酸、鹽酸、草酸、硫酸、 其混合物所組成的組群中選擇該酸試劑, μ述方法代表根據本發明方法的最簡單版本,盆係使 用在當回收的研磨成分中的細小鐵顆粒的最後濃度不重要 的時候。根據本發明所提出之方法的第一較佳變型,含由 從第-群組最後一個水力旋流分離器底部處獲得的可再使 用之研磨細粒的液體懸浮物係受到進一步處理,用以藉著 將酸試劑溶液添加至含有可再使用之研磨細粒的液體料 物之中’來獲得以化學蝕刻淨化的微量細小鐵細粒之研磨 擰檬酸及果酸或 且該酸試劑係過 量地使用,使得由該處理所獲得之被拋棄的流出液體可以 含有源自該酸浸操作之鐵鹽、連同過量的酸及任何細小鐵 的殘餘物。 根據該方法之較佳版本,在加入該酸試劑溶液之後, Φ 含有可再使用之研磨細粒的液體懸浮物係受到進一步的濕 式粒度分選處理,該處理也是藉著在串連地連接之一組至 少二個水力旋流分離器中處理混合物而實施、且以逆流饋 入水。一種含有可再使用之研磨細粒且基本上沒有細小的 不可使用研磨細粒的液體懸浮物,係從第二群組最後一個 水力旋流为離裔底部處獲得。該第二群組的第一個水力旋 流分離器頂部係會產生細小鐵顆粒的液體懸浮物、過量的 酸、及鐵鹽,且會被拋棄。 即使是以第二群組的水力旋流分離器,串聯連接的水 14 200841991 力旋流分離器之數目通常是介於二及六個之間的水力旋流 分離益’且較佳地是四個水力旋流分離器。Fine particles. The acid reagent can be selected from the group consisting of nitric acid, hydrochloric acid, oxalic acid, sulfuric acid, a mixture thereof, and the method of representing the simplest version of the method according to the present invention, the potting system uses fine iron in the recovered grinding component. When the final concentration of the particles is not important. According to a first preferred variant of the method proposed by the invention, the liquid suspension comprising reusable abrasive fines obtained from the bottom of the last hydrocyclone of the first group is further processed for By adding an acid reagent solution to the liquid material containing the reusable abrasive fine particles, a micro-fine iron fine particle purified by chemical etching is obtained, and the acid and the acid reagent are excessive. It is used such that the discarded effluent liquid obtained by the treatment may contain iron salts derived from the acid leaching operation, together with excess acid and any fine iron residue. According to a preferred version of the method, after the addition of the acid reagent solution, the liquid suspension containing Φ reusable abrasive fines is subjected to further wet particle size sorting treatment, which is also connected in series by One of the at least two hydrocyclone separators is treated with the mixture and fed in countercurrent. A liquid suspension containing reusable abrasive fines and substantially no fine, non-usable abrasive fines obtained from the last hydrodynamic swirl of the second group as the bottom of the alien. The top of the first hydrocyclone of the second group produces a liquid suspension of fine iron particles, excess acid, and iron salts, which are discarded. Even with the second group of hydrocyclones, the number of water connected in series 14 200841991 is usually between two and six hydrocyclophonic separations and preferably four A hydrocyclone separator.
根據該方法的不同變型,其在結果方面係等同於第一 艾型,在加入酸試劑溶液之後,含有可再使用之研磨細粒 的液體懸浮物係藉由加人水而受到-W作,藉此在遽 餅中獲得—種含有可再使用之研磨細粒且基本上沒有細小 研磨細粒的固相。該過濾操作的濾液會產生一種過量的酸 及鐵鹽的液體懸浮物,且會被拋棄。 從根據本發明所提出之方法所產生的研磨細粒係適合 在研光程序中重複使用,且為此目的’在加入所需量的水 及新鮮的穩定化添加劑之後,係預防地被放置於具有搖動 機構的懸浮物成熟槽巾。如此獲得的时研磨懸浮物可在 使用之前與適量的新鮮研磨漿相混合,且整個批量係在研 光程序之中被饋入。 根據另一觀點,本發明係關於一種用於處理從根據前 述程序之研光程序排出的研磨漿之裝置,該裝置由以下依 序互相連接的元件所組成: 再下一個水力旋流分離器的再循環上溢流饋入下一個水力 旋流分離器。 ϊ·串聯地連接之第一群組之至少二個水力旋流分離 器,且以逆流饋入水中該第一水力旋流分離器係以排 出之研磨漿饋人,且每個水力旋流分離器的下溢流係連同 II.一儲槽,其配備有一搖動機構,用於製備將在研光 程序中重複利用的研光漿。 15 200841991 -ΙΠ·一儲槽,其配備有一搖動機構,用於使得經回收懸 浮物成熟。 較佳地’在具有用於製備將在研光程序中重複利用的 研光懸浮液體之搖動機構的儲槽上游處,亦有一個具有用 於細小鐵顆粒的化學蝕刻之搖動機構的儲槽,且在用於细 小鐵顆粒的化學钱刻之儲槽下游處,有第二組串聯地連接 之至少二個水力旋流分離器,水係以逆流饋入其中,其中 _ 第一水力旋流分離器係以排出的研磨漿饋入,且每個^力 旋流㈣器的下溢流係連同再下一個外水力旋流分離器的 再循壞上溢流饋入下一個水力旋流分離器之中。來自最後 一個水力旋流分離器底部處的懸浮物係饋入具有搖動機構 之儲槽,用於製備待重複利用的研光懸浮物。 根據採用過濾操作來代替第二組之水力旋流分離器之 設備配置的執行版本,在用於化學餘刻細小鐵顆粒的㈣ 下游處係有一過濾裝置,從該過濾裝置流出而由過量酸的 _ 及鐵鹽的液體懸浮物所組成的淨化液體係被拋棄。所獲得 之包含可再使用的研磨細粒的濾餅係饋入具有搖動機構之 用於製備待重複利用之研光懸浮物的儲槽。 【實施方式】 如圖1之代表主要參考配置的方塊圖所示,根據本發 明之較佳變體的製程基本上係由三區段所構成:第—組: 力旋流分離器-化學蝕刻·第二組水力旋流分離器。、 當經回收研磨成分中鐵的最後濃度很重要時,使用所 16 200841991 顯不之配置,且該配置基本上由以下操作組成: a) 在稱為儲槽1之容器内侧收集來自研光機器的排出 研磨漿,這是必要的,因為該製程能夠視所需的製程配置 而以連續模式或批次模式的其中任一者來實施;在圖丨中, 該製程係連續式的。 b) 將排出的研磨漿分離成二種成分,此分離係在以逆 流饋入的第一組水力旋流分離器中以濕式粒度分選處理所 實施: •一下溢流(U.F.)懸浮物,其含有在懸浮液體中可再 使用的研磨細粒(>4微米);細小的鐵顆粒仍然存在,高達 百萬分之1000-1500的程度。 •一上溢流(O.F.)懸浮物,其含有不可再使用之研磨 細粒(<4微米)、矽與鐵的細小細粒、以及容納在排出的研 磨漿中的添加劑。 c) 將來自操作b)之該組水力旋流分離器的UF.懸浮物 收集於一稱為儲槽2的容器中,該儲槽係用作用於含有可 再使用之研磨成分(>4微米)之懸浮物的儲存槽來使用。 d) 將一種酸試劑溶液(草酸、硫酸、鹽酸或其他酸)加 入刼作c)之儲槽2中,以進一步降低細小鐵顆粒的濃度。 e) 將儲槽2中所容納的可再使用研磨漿分離成二種成 刀此分離係在第二組水力旋流分離器中以濕式粒度分選 處理來實施: 下祕流(U.F·)懸浮物’其含有在懸浮液體中可再 使用的研磨細粒(>4微米),其中該細小鐵顆粒係減少至百 17 200841991 萬分之100-500。 上μ机(〇.F )的細小鐵顆粒懸浮物,其含有過量 之酸及鐵鹽,且被拋棄。 將/有可再使用之研磨細粒(>4冑米)的研磨漿收集 於合:中肖於製備該再生的懸浮物,且接著加入水及 該添加劑。 g) 將再生的研磨聚運送至—稱為儲槽3之容器,其中 懸浮物被保持在搖動情況之下且能夠穩定化。 h) 將奋,.内在儲槽3中的懸浮物與以新鮮研磨材料所製 備的懸浮物相混合,且接著將所產生的研磨裝運送至研光 機器供使用。 或者,相同定性特徵的最後產品能夠藉著以根據圖2 所况明之酉—己置而實施的製程獲得,該製程基本上由三個區 段組成:第-組水力旋流分離器_化學蝕刻_過濾。 當可再使用之研磨成分中鐵的最後濃度很重要時 用圖2所顯示之配置,而不是- 、 上涉及以下操作.· 斤-者,且該配置基本 a)在一稱為儲槽1之容器内側收從來自研光機哭的排 出研磨裝,這是必要的,因為該製程能夠視所需的 置而以連續模式或批次模式的其中任一者來實施;在壬 中,該製程係批次式的。 圖2 將排出的研磨漿分離成二種成分,此分離係在以逆 流饋入的第一組水力旋流分離哭中 现 實施: i中以濕式粒度分選處理所 18 200841991 • 下/奴纟,L (U.F·)懸浮物,其含有在懸浮液體中之可 再使用的研磨被細(>4微米);細小鐵顆粒仍然存在,並高 達百萬分之1000-1500的程度。 •一上Μ流(O.F.)懸浮物,其含有不可再使用之研磨 細粒(<4微米)、矽與鐵的細小細粒、以及包含在排出研磨 漿中之添加劑。 c) 將來自操作b)之該組水力旋流分離器的UF•懸浮物 收集到一稱為儲槽2之容器中,該儲槽係用作用於含有可 再使用之研磨成分(>4微米)之懸浮物的儲存槽來使用。 d) 將一酸試劑溶液(草酸、硫酸、鹽酸或其他酸)加入 操作c)之儲槽2中’以進一步降低細小鐵顆粒的濃度。 e) 將儲槽2中所容納的可再使用研磨漿分離成二種成 分,此分離係在第二組水力旋流分離器中以濕式粒度分選 處理來實施: 液相,其係由水、過量加入的酸及該酸的鐵鹽所 組成的,且被拋棄。 口相其係由尺寸>4微米之氧化鋁細粒及殘餘細 小鐵顆粒所組成的,殘餘㈣、鐵懸係在百萬分之U)0-500 的限值之内。 將藉由操作e)中之過據所獲得的固體與水及-種添 加』相扣σ以便在水中獲得可再使用之氧化銘細粒(>4 微米)的懸浮物。 g)將再生的研磨聚運送至—稱為儲槽3之容器,其中 該懸浮物被保持在搖動的狀態之下且能夠穩定化。 19 200841991 h)將容納在儲槽3中的懸浮物與以新鮮研磨材料所製 備之懸浮物相混合,且接著將所產生的研磨漿運送至研光 機器供使用。 产根據圖3所說明之配置而實現的製程係前述二種配置 之簡化’且僅由第-組水力旋流分離器所組成;當研磨成 分中鐵的最初濃度不重要時,使用此製程。於此情況中, 該製程由以下操作組成: 4在一稱為儲槽1之容器内側收從來自研光機器的排 出研磨漿,這是必要的,因為該製程能約視所需的製程配 置而以連續模式或批次模式二者來實施;在圖3中,該制 程係連續式的。 衣 b)將排出的研磨漿分離成二種成分,此分離係在以逆 流饋入的第一組水力旋流分離器中以濕式粒度分選處理所 實施: .一下溢流(U.F.)懸浮物,其含有在懸浮液體中之可 再使用的研磨微細(>4微米);細小鐵顆粒仍然存在,並高 達百萬分之1000-1500的程度。 〇 ΐΜ(αρ·)懸洋物,其含有不可再使用之研磨 細粒(<4微米)、矽與鐵的細小細粒、 ^ 漿中之添加劑。 is在排出研磨 操作b)之該組水力旋流分離器的Μ懸浮物 再:用一”储槽2的容器中,該儲槽係用作用於含有可 再使用之研磨成分㈣微米)之懸浮物的儲存槽來使用。 d)將如此獲得的再生研磨漿運 、 稱為儲槽3之容 20 200841991 σ〇其中懸/予物被保持在搖動狀態之下且能夠穩定化。 e)將合納在儲槽3中的懸浮物與以新鮮研磨材料所製 備之懸淨物相混合,且接著將所產生的研磨聚運送至研光 機器供使用。 可以使用圖4所示的水力旋流分離器群組配置,用以 將可再使用的研磨細粒(尺寸<4微米)從已經用過且不可再 使用的研磨細粒(尺寸>4微米)、及從鐵與矽的細小細粒處 分離。此第一組第一水力旋流分離器係以與第二組水力旋 鲁流分離器的上溢流相混合的排出研磨漿饋入。此第一組水 力旋流分離器係產生一下溢流懸浮物及一上溢流懸浮物, 該下溢流懸浮物係被饋送到第二水力旋流分離器;而該上 溢流懸浮物則含有尺寸<4微米之研磨細粒、鐵與石夕的細小 細粒及存在於排出研磨漿中的添加劑,且被拋棄及送到廢 棄物處理廠。 該第二水力旋流分離器係以與第三水力旋流分離器之 上溢流懸浮物相混合的第一水力旋流分離器的下溢流懸浮 _ 物饋入;由第二水力旋流分離器所產生的上溢流懸浮物則 被饋入第一水力旋流分離器,而下溢流懸浮物被饋入該第 三水力旋流分離器。 第三水力旋流分離器係以與第四水力旋流分離器之上 溢流懸浮物相混合的第二水力旋流分離器之下溢流懸浮物 饋入;由第三水力旋流分離器所產生之上溢流懸浮物係被 饋入第二水力旋流分離器,而下溢流懸浮物則饋入第四水 力旋流分離器。 21 200841991 第四水力旋流分離器係以與水預防地相混合的第三水 力旋流分離器的下溢流懸浮物饋入;由第四水力旋流分離 器所產生之上溢流懸浮物被饋入第三水力旋流分離器,而 含有尺寸>4微米之可再使用的研磨係粒、具有在百萬分之 1000-1500的限值内之鐵含量的下溢流懸浮物則被運送至 收集儲槽2。 使用圖5所概要地顯示之第二組水力旋流分離器,用 以藉由結合水力旋流分離器之分開離心作用與以鐵為基礎 的顆粒上之酸的化學蝕刻活性,進一步降低可再使用之研 磨漿中的鐵含量。 第二組水力旋流分離器中的第一個水力旋流分離器係 以來自儲槽2而與第二個水力旋流分離器之上溢流相混合 的可再使用研磨懸浮物饋入。該第一個水力旋流分離器產 生一下溢流懸浮物一上溢流懸浮體,該下溢流懸浮物係饋 入第二個水力旋流分離器;該上溢流懸浮體則含有被消除 的細小鐵顆粒及過量的酸,並被拋棄。 該弟二組水力旋流分離為的的弟二個水力旋流分離|§ 係以與第三個水力旋流分離器之上溢流相混合的第一個水 力旋流分離器之下溢流懸浮物饋入;由第二個水力旋流分 離器所產生之上溢流懸浮物係饋入第一個水力旋流分離 器,而下溢流懸浮體則饋入第三個水力旋流分離器。 第三個水力旋流分離器係以與第四個水力旋流分離器 之上溢流懸浮體相混合之第二個水力旋流分離器的下溢流 懸浮體饋入;由第三個水力旋流分離器所產生之上溢流懸 22 200841991According to a different variant of the method, it is equivalent to the first AI in terms of results, and after the addition of the acid reagent solution, the liquid suspension containing the reusable abrasive granules is subjected to -W by adding human water. Thereby, a solid phase containing reusable abrasive fine particles and substantially no fine abrasive fine particles is obtained in the baking cake. The filtrate from this filtration operation produces an excess of liquid suspension of acid and iron salts which is discarded. The abrasive fines produced by the method according to the invention are suitable for repeated use in the polishing process and for this purpose 'preventively placed after the addition of the required amount of water and fresh stabilizing additives A suspended mature matte with a shaking mechanism. The thus obtained grinding suspension can be mixed with an appropriate amount of fresh slurry before use, and the entire batch is fed in the polishing process. According to another aspect, the present invention is directed to an apparatus for processing a slurry discharged from a polishing program according to the foregoing procedure, the apparatus consisting of the following elements interconnected in sequence: the next hydrocyclone The recirculating overflow flow is fed to the next hydrocyclone. ϊ· at least two hydrocyclone separators connected in series by the first group, and feeding the water in a countercurrent flow to the first hydrocyclone separator to feed the discharged slurry, and each hydrocyclone is separated The underflow system of the device, together with the II.-storage tank, is equipped with a rocking mechanism for preparing a polishing slurry that will be reused in the polishing program. 15 200841991 - A storage tank equipped with a rocking mechanism for maturing the recovered suspension. Preferably, there is a reservoir upstream of the reservoir having a rocking mechanism for preparing a polishing suspension liquid to be reused in the polishing program, and a rocking mechanism having a chemical etching for fine iron particles. And at the downstream of the chemical tank for the fine iron particles, there is a second group of at least two hydrocyclone separators connected in series, and the water system is fed in countercurrent, wherein the first hydrocyclone is separated The device is fed with the discharged slurry, and the underflow flow system of each of the cyclone (four) devices is fed into the next hydrocyclone separator together with the recirculation overflow of the next external hydrocyclone separator. Among them. The suspension from the bottom of the last hydrocyclone is fed into a reservoir with a shaking mechanism for preparing the polishing suspension to be reused. According to an implementation version of the apparatus configuration in which the filtration operation is used in place of the second group of hydrocyclones, a filter device is provided downstream of the (four) for the chemically engraved fine iron particles, from which the excess is acid A purification liquid system consisting of _ and a liquid suspension of iron salts is discarded. The obtained filter cake containing reusable abrasive fines is fed into a storage tank having a shaking mechanism for preparing a polishing suspension to be reused. [Embodiment] As shown in the block diagram of the main reference configuration of Fig. 1, the process according to a preferred variant of the present invention is basically composed of three segments: a group: a force cyclone separator - chemical etching • The second group of hydrocyclone separators. When the final concentration of iron in the recovered abrasive component is important, the configuration shown in Figure 16 200841991 is used, and the configuration basically consists of the following operations: a) Collecting the grinding machine from the inside of the container called the storage tank 1 This is necessary to discharge the slurry because the process can be implemented in either continuous mode or batch mode depending on the desired process configuration; in the figure, the process is continuous. b) separating the discharged slurry into two components, which are carried out by wet particle size sorting in a first set of hydrocyclone fed in countercurrent: • Underflow (UF) suspension It contains abrasive fines (> 4 microns) reusable in suspension liquid; fine iron particles are still present, up to the order of 1000-1500 parts per million. • An overflow (O.F.) suspension containing non-reusable ground fines (<4 microns), fine fines of cerium and iron, and additives contained in the discharged grinding slurry. c) Collecting the UF. suspension from the group of hydrocyclone separators of operation b) in a vessel called tank 2 for use as a regrindable grinding component (>4 A storage tank for the suspension of micron) is used. d) An acid reagent solution (oxalic acid, sulfuric acid, hydrochloric acid or other acid) is added to the tank 2 as c) to further reduce the concentration of fine iron particles. e) Separating the reusable slurry contained in the tank 2 into two types of knives. This separation is carried out in a second group of hydrocyclone separators by wet particle size sorting: Lower Secret Stream (UF· The suspension "containing fine particles (> 4 micrometers) which can be reused in a suspension liquid, wherein the fine iron particles are reduced to 100-500 of 2008. A fine iron particle suspension of the upper machine (〇.F) containing an excess of acid and iron salts and discarded. The slurry having / reusable abrasive fines (> 4 mils) is collected in a mixture to prepare the regenerated suspension, and then water and the additive are added. g) The regenerated milled aggregate is transported to a vessel known as tank 3, wherein the suspended solids are kept under shaking and stabilized. h) mixing the suspended solids in the internal tank 3 with the suspension prepared from the freshly ground material, and then transporting the resulting abrasive package to a polishing machine for use. Alternatively, the final product of the same qualitative feature can be obtained by a process carried out according to the condition of Figure 2, which consists essentially of three sections: a first set of hydrocyclones _ chemical etching _filter. When the final concentration of iron in the reusable grinding component is important, use the configuration shown in Figure 2 instead of -, the following operations are involved. · kg - and the configuration is basically a) in a tank 1 The inside of the container receives the discharge grinding device from the polishing machine, which is necessary because the process can be implemented in either a continuous mode or a batch mode depending on the desired setting; The process is batch-based. Figure 2 Separates the discharged slurry into two components. This separation is carried out in the first group of hydrocyclone separations fed in countercurrent. The process is now carried out in a wet particle size sorting process. 18 200841991 • Down / slave纟, L (UF·) suspension containing reusable grinding in suspension liquid is fine (> 4 microns); fine iron particles are still present and are as high as 1000-1500 parts per million. • An overhead turbulent (O.F.) suspension containing non-reusable ground fines (<4 microns), fine fines of cerium and iron, and additives contained in the discharged slurry. c) Collecting the UF•suspension from the group of hydrocyclone separators of operation b) into a vessel called tank 2, which is used to contain reusable grinding components (>4 A storage tank for the suspension of micron) is used. d) An acid reagent solution (oxalic acid, sulfuric acid, hydrochloric acid or other acid) is added to the tank 2 of operation c) to further reduce the concentration of fine iron particles. e) separating the reusable slurry contained in the storage tank 2 into two components, the separation being carried out in a second group of hydrocyclones by wet particle size sorting: liquid phase, which is It consists of water, an excess of acid and an iron salt of the acid, and is discarded. The mouth phase is composed of alumina fine particles of size > 4 microns and residual fine iron particles, and the residual (4), iron suspension is within the limit of 0-500 parts per million U. The solid obtained by the operation in e) is decoupled from the water and the addition of σ to obtain a reusable oxidized fine particle (> 4 μm) suspension in water. g) The regenerated milled aggregate is transported to a vessel, referred to as tank 3, wherein the suspension is maintained under shaking and stabilized. 19 200841991 h) The suspended solids contained in the storage tank 3 are mixed with the suspended solids prepared from the fresh abrasive material, and then the resulting slurry is transported to a polishing machine for use. The process produced in accordance with the configuration illustrated in Figure 3 is a simplification of the foregoing two configurations and consists solely of the first set of hydrocyclones; this process is used when the initial concentration of iron in the abrasive component is not critical. In this case, the process consists of the following operations: 4 It is necessary to receive the discharged slurry from the polishing machine inside a container called the storage tank 1, which is necessary because the process can be approximated to the required process configuration. It is implemented in either continuous mode or batch mode; in Figure 3, the process is continuous. Cloth b) separating the discharged slurry into two components, the separation being carried out in a first group of hydrocyclone fed in countercurrent by wet particle size sorting treatment: a sub-overflow (UF) suspension Resin containing reusable finely ground (> 4 microns) in suspension liquid; fine iron particles are still present and are as high as 1000-1500 parts per million. 〇 α (αρ·) suspended matter containing fine particles (<4 μm) which are not reusable, fine fine particles of bismuth and iron, and additives in the slurry. Is the suspension of the hydrocyclone of the set of hydrocyclones from the grinding operation b) again: in a vessel with a "reservoir 2, which is used as a suspension for containing reusable grinding components (4) micron) The storage tank of the material is used. d) The regenerated slurry obtained in this way is referred to as the tank 3 20 200841991 σ 〇 where the suspension/prey is kept under shaking and can be stabilized. The suspended solids in the storage tank 3 are mixed with the suspension prepared from the fresh abrasive material, and then the generated abrasive is collected and transported to a polishing machine for use. The hydrocyclone separation shown in Fig. 4 can be used. Group configuration for reusable abrasive fines (size < 4 microns) from already used and non-reusable abrasive fines (size > 4 microns), and fines from iron and tantalum Separation of the granules. The first group of first hydrocyclone separators are fed with a discharge slurry mixed with the overflow flow of the second group of hydraulic cyclone separators. The first group of hydrocyclone separators Generating an overflow suspension and an overflow suspension, the underflow The float system is fed to the second hydrocyclone separator; and the overflow overflow material contains fine particles of size < 4 microns, fine fine particles of iron and stone, and additives present in the discharged slurry. And being disposed of and sent to a waste treatment plant. The second hydrocyclone is an underflow of the first hydrocyclone separated from the overflow suspended matter above the third hydrocyclone. Suspended _ material feed; the overflow stream suspended by the second hydrocyclone is fed into the first hydrocyclone, and the underflow suspension is fed into the third hydrocyclone The third hydrocyclone is fed by the overflow suspension under the second hydrocyclone mixed with the overflow suspended matter above the fourth hydrocyclone; the third hydrocyclone The overflow overflow generated by the separator is fed into the second hydrocyclone, and the underflow suspension is fed to the fourth hydrocyclone. 21 200841991 The fourth hydrocyclone is Underflow of a third hydrocyclone with a water prevention ground The suspended matter is fed; the overflow overflow generated by the fourth hydrocyclone is fed into the third hydrocyclone, and the reusable abrasive granules having a size of > 4 microns are The underflow suspension of iron content within the limits of 1000-1500 parts per million is transported to the collection tank 2. The second group of hydrocyclones shown schematically in Figure 5 is used for Combined with the separate centrifugation of the hydrocyclone and the chemical etching activity of the acid on the iron-based particles, the iron content in the reusable slurry is further reduced. The first of the second group of hydrocyclones The hydrocyclone separator is fed with reusable grinding suspension from the reservoir 2 and mixed with the overflow above the second hydrocyclone. The first hydrocyclone produces a helium overflow. The flow suspension is an overflow suspension which is fed into a second hydrocyclone separator; the overflow suspension contains fine iron particles and excess acid which are eliminated and discarded. . The two hydrocyclone separations of the second group of hydraulic cyclones are separated by the first hydrocyclone separated by the overflow of the third hydrocyclone. Suspended matter feed; the overflow overflow suspended by the second hydrocyclone is fed into the first hydrocyclone, and the underflow suspension is fed into the third hydrocyclone Device. The third hydrocyclone is fed by an underflow suspension of a second hydrocyclone that is mixed with the overflow suspension above the fourth hydrocyclone; by the third hydraulic Overflow sag generated by cyclone separator 22 200841991
洋物係饋入第二個水力旋流分離器,而下溢流懸浮物則饋 入第四個水力旋流分離器。第四個水力旋流分離器係以第 三個水力旋流分離器之與水預防地相混合的下溢流懸浮物 饋入;由第四個水力旋流分離器所產生之上溢流懸浮物係 饋入第二個水力旋流分離器,而含有尺寸>4微米之可再使 =的研磨細粒、具有在百萬分之.值内之鐵含 置的下溢流懸浮物則被運送至收集儲槽2,在此處再生的 懸浮物係藉由加入水及一種添加劑而被製備。 由丽文可看出,根據本發明之製程的目標為達成有利 地應用至回收來自研光程序的研磨細粒之領域的結果,即 一種類似於共同繫屬之專利申請案RM2〇〇5 A〇〇〇329中所 敘述的技術。該二方法間之主要差異如下: a) 本發明係應用於來自不同製程(研光而不是切割)^ 排出研磨漿,其使用-種不同的研磨成分(氧化銘或氧化彩 的^合物,而不是碳化石夕)、一種不同的支撐液體(水,雨 不疋聚乙二醇或油)、及不同的添加劑。 b) ‘程相位與相對配置具有以下的主要差異· 士 a.先前製程之水力旋流分離器冑組的下溢流係饋入一 特別之過濾系統’該過濾系統位在相同之裝置内,亦執名 腐餘性餘刻、洗滌、化學巍釗、:套 ^ 无扣化予蝕刻濾液之洗滌及乾燥,而名The oceanic system feeds into the second hydrocyclone and the underflow suspension is fed to the fourth hydrocyclone. The fourth hydrocyclone is fed by an underflow suspension of a third hydrocyclone that is preventively mixed with water; an overflow overflow generated by a fourth hydrocyclone The system is fed into the second hydrocyclone, and the abrasive fines having a size of > 4 microns can be re-flowed, and the underflow suspension having an iron content within a millionth of a value is It is transported to the collection tank 2 where the suspended solids are prepared by adding water and an additive. As can be seen from Liwen, the object of the process according to the invention is to achieve a result which is advantageously applied to the field of recycling abrasive fines from the polishing process, ie a patent application similar to the common patent RM2〇〇5 A The technique described in 〇〇〇 329. The main differences between the two methods are as follows: a) The present invention is applied to discharge slurry from different processes (sintering instead of cutting), using a different type of grinding component (oxidized or oxidized color, Instead of carbonized stone, a different supporting liquid (water, rain is not polyethylene glycol or oil), and different additives. b) 'The process phase and the relative configuration have the following main differences. · a. The hydrocyclone separator of the previous process, the underflow system of the group is fed into a special filter system. The filter system is located in the same device. Also known as the residual residue, washing, chemical 巍钊,: set ^ no buttoning to the washing and drying of the etching filtrate, but the name
J私中,第一組水力旋流分離哭 。 離灸下砬流係饋入隨後I 程流動的其中之一,而此係取決於 V、U收研磨成分中可接今 的鐵污染之程度而定: 的處理之後繼之以化學 I·在第二組水力旋流分離器中 23 200841991 蝕刻(圖1)。 π·在過濾操作之後繼之以化學蝕刻(圖2)。 HI ·或甚至以回收研磨成分直接製備懸浮物,而沒有任 何化學蝕刻操作(圖3)。 b.先前專利申請案之水力旋流分離器群組的上溢流係 文到過濾、微過濾、蒸餾、及最後的過濾,以便回收懸浮 物流體(聚乙二醇或油)及完全地消除細小的顆粒,而在本 發明中,直接地拋棄第一組及第二組水力旋流分離器的上 溢流(懸浮物的流體是水,且因此不回收)。 c·本發明所述之製程能以連續模式或批次模式的其中 之一進行,視所使用之流動配置而定,而先前專利申請案 中之製程只是以連續模式。 ”本發明已特別參考-些特別實例揭示,但應了解,熟 習此項技術的人士可^隹许修令 了進仃修改及變化,而不會偏離如隨附 申請專利範圍所界定之本發明的範圍。 【圖式簡單說明】 本發明的特定倍$、ν β 將夂老 _ /、優點與相關之操作型式, a# 评更明顯,此等描述只|7 乍耗例之目的且係有關其某些較 ’、’、 係說明於隨附圖式中,其中:”例而王現。此等實例 圖1顯示根據本發明第 rt ^ ^ ^ 4知/3弟貫現形式之用於處理排 磨漿之製程的整體方塊圖; 辨出研 圖2頒示根據本發明第- 今貫現形式之用於處理排出研 24 200841991 磨漿之製程的整體方塊圖; ^圖3顯示根據本發明第三實現形式之用於處理排出研 磨漿之製程的整體方塊圖; 圖4顯示第一組串聯地連接之水力旋流分離器的簡化 衣置配置’其係代表該配置的主要區段;及 圖5顯示第二組串聯地連接之水力旋流分離器的簡化 裝置配置,其係代表該配置的較佳增加區段。In J private, the first group of hydrocyclone separated and cried. The turbulent flow from the moxibustion is fed into one of the subsequent I-flows, which depends on the degree of iron contamination that can be received in the V and U-receiving components: followed by the chemical I· The second group of hydrocyclones was etched in 23 200841991 (Fig. 1). π· is followed by a chemical etch after the filtration operation (Fig. 2). HI • Or even directly to prepare the suspension by recovering the abrasive components without any chemical etching operation (Fig. 3). b. Overflow of the hydrocyclone separator group of the prior patent application to filtration, microfiltration, distillation, and finally filtration to recover suspended fluid (polyethylene glycol or oil) and completely eliminate Fine particles, while in the present invention, the overflow of the first and second sets of hydrocyclones directly is discarded (the fluid of the suspension is water and therefore not recovered). c. The process of the present invention can be carried out in one of a continuous mode or a batch mode, depending on the flow configuration used, whereas the process in the prior patent application is only in a continuous mode. The present invention has been specifically described with reference to the particular embodiments thereof, and it is understood that those skilled in the art can make modifications and changes without departing from the scope of the invention as defined by the appended claims. [Simple description of the drawing] The specific times $, ν β of the present invention will be more obvious than the old _ /, advantages and related operational patterns, a#, which are only for the purpose of the |7 乍 且 且Some of the ', ', are described in the accompanying drawings, in which: "" and Wang Xian. BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 shows an overall block diagram of a process for treating a refining slurry according to the present invention in the form of the rt ^ ^ ^ 4 / 3 discriminating form; An overall block diagram of a process for treating the refining process of the Exhaustion 24 200841991; FIG. 3 shows an overall block diagram of a process for treating the discharged slurry according to a third implementation form of the present invention; FIG. 4 shows the first group A simplified garment arrangement of a hydrocyclone coupled in series, which represents a major section of the configuration; and Figure 5 shows a simplified arrangement of a second set of hydrocyclones connected in series, which is representative of A preferred addition section of the configuration.
【主要元件符號說明】 1 儲槽 2 儲槽 3 儲槽 25[Main component symbol description] 1 Storage tank 2 Storage tank 3 Storage tank 25
Claims (1)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| IT000692A ITRM20060692A1 (en) | 2006-12-22 | 2006-12-22 | PROCEDURE FOR THE TREATMENT OF ABRASIVE SUSPENSIONS EXHAUSTED FROM THE LAPPING PROCESS FOR THE RECOVERY OF THE RECYCLABLE ABRASIVE COMPONENT AND ITS RELATIVE PLANT. |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW200841991A true TW200841991A (en) | 2008-11-01 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW096148180A TW200841991A (en) | 2006-12-22 | 2007-12-17 | Process and apparatus for treating exhausted abrasive slurries from the lapping process for the recovery of their reusable abrasive component |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP2094441B1 (en) |
| AT (1) | ATE546256T1 (en) |
| IT (1) | ITRM20060692A1 (en) |
| TW (1) | TW200841991A (en) |
| WO (1) | WO2008078349A1 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI406737B (en) * | 2009-04-27 | 2013-09-01 | Ihi Compressor And Machinery Co Ltd | Method and device for managing coolant of wire saw |
| TWI417128B (en) * | 2009-04-27 | 2013-12-01 | Ihi Compressor And Machinery Co Ltd | Method and device for managing coolant of wire saw |
| TWI461258B (en) * | 2012-11-09 | 2014-11-21 | Sino American Silicon Prod Inc | Slurry recycling method and slurry recycling apparatus for the same |
| CN114193329A (en) * | 2021-12-09 | 2022-03-18 | 中环领先半导体材料有限公司 | Slurry utilization method for on-line recovery of abrasive disc |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102010011853A1 (en) | 2010-03-09 | 2011-09-15 | Schmid Silicon Technology Gmbh | Process for producing high-purity silicon |
| GB2484348A (en) | 2010-10-08 | 2012-04-11 | Rec Wafer Norway As | Abrasive slurry and method of production of photovoltaic wafers |
| DE102011115081B4 (en) | 2011-09-19 | 2017-08-31 | Baufeld-Mineralölraffinerie GmbH | Process for the recovery of solar silicon from sawed waste |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0741535B2 (en) * | 1991-04-10 | 1995-05-10 | 中小企業事業団 | Abrasive liquid regeneration / circulation device for lapping machine |
| JP2001287163A (en) * | 2000-04-06 | 2001-10-16 | Nec Corp | Polishing slurry regeneration apparatus |
-
2006
- 2006-12-22 IT IT000692A patent/ITRM20060692A1/en unknown
-
2007
- 2007-12-04 AT AT07866781T patent/ATE546256T1/en active
- 2007-12-04 WO PCT/IT2007/000844 patent/WO2008078349A1/en not_active Ceased
- 2007-12-04 EP EP07866781A patent/EP2094441B1/en not_active Not-in-force
- 2007-12-17 TW TW096148180A patent/TW200841991A/en unknown
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI406737B (en) * | 2009-04-27 | 2013-09-01 | Ihi Compressor And Machinery Co Ltd | Method and device for managing coolant of wire saw |
| TWI417128B (en) * | 2009-04-27 | 2013-12-01 | Ihi Compressor And Machinery Co Ltd | Method and device for managing coolant of wire saw |
| TWI461258B (en) * | 2012-11-09 | 2014-11-21 | Sino American Silicon Prod Inc | Slurry recycling method and slurry recycling apparatus for the same |
| CN114193329A (en) * | 2021-12-09 | 2022-03-18 | 中环领先半导体材料有限公司 | Slurry utilization method for on-line recovery of abrasive disc |
Also Published As
| Publication number | Publication date |
|---|---|
| ATE546256T1 (en) | 2012-03-15 |
| EP2094441A1 (en) | 2009-09-02 |
| EP2094441B1 (en) | 2012-02-22 |
| WO2008078349A1 (en) | 2008-07-03 |
| ITRM20060692A1 (en) | 2008-06-23 |
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