[go: up one dir, main page]

TW200700917A - Photosensitive composition - Google Patents

Photosensitive composition

Info

Publication number
TW200700917A
TW200700917A TW095116290A TW95116290A TW200700917A TW 200700917 A TW200700917 A TW 200700917A TW 095116290 A TW095116290 A TW 095116290A TW 95116290 A TW95116290 A TW 95116290A TW 200700917 A TW200700917 A TW 200700917A
Authority
TW
Taiwan
Prior art keywords
photosensitive composition
cnh2n
photopolymerization
suppressing
integer
Prior art date
Application number
TW095116290A
Other languages
Chinese (zh)
Other versions
TWI309339B (en
Inventor
Koji Harada
Kenji Maruyama
Akio Abe
Kiyoshi Uchikawa
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200700917A publication Critical patent/TW200700917A/en
Application granted granted Critical
Publication of TWI309339B publication Critical patent/TWI309339B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

A photosensitive composition is provided which is capable of suppressing the generation of foreign substances when applied to a substrate. The photosensitive composition includes (a) a coloring agent, (b) a photopolymerization compound, (c) a photopolymerization initiator, and (d) a solvent represented by the following formula (1): R1-O-CnH2n-O-CnH2n-OH (1) Wherein R1 is a C1~C8 straight or branched chain, or cyclic alkyl group, or aryl group, and n is an integer from 2 to 5.
TW095116290A 2005-06-09 2006-05-08 Photosensitive composition TWI309339B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005168963 2005-06-09
JP2005230977A JP4727344B2 (en) 2005-06-09 2005-08-09 Photosensitive composition

Publications (2)

Publication Number Publication Date
TW200700917A true TW200700917A (en) 2007-01-01
TWI309339B TWI309339B (en) 2009-05-01

Family

ID=37731252

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095116290A TWI309339B (en) 2005-06-09 2006-05-08 Photosensitive composition

Country Status (3)

Country Link
JP (1) JP4727344B2 (en)
KR (1) KR20060128653A (en)
TW (1) TWI309339B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107272335A (en) * 2016-04-08 2017-10-20 东京应化工业株式会社 Photosensitive polymer combination

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5270814B2 (en) * 2005-08-11 2013-08-21 東京応化工業株式会社 Colorant dispersion for photosensitive composition
KR100818219B1 (en) * 2005-08-11 2008-04-01 도쿄 오카 고교 가부시키가이샤 Colorant Dispersion and Photosensitive Composition Using the Same
JP4733231B2 (en) * 2008-03-25 2011-07-27 綜研化学株式会社 Photosensitive resin and photosensitive resin composition using the same
JP5415128B2 (en) * 2008-04-18 2014-02-12 住友化学株式会社 Colored photosensitive resin composition and pattern and color filter formed using the same
JP5291405B2 (en) * 2008-07-31 2013-09-18 東京応化工業株式会社 Colored photosensitive resin composition, color filter, and liquid crystal display
JP6031807B2 (en) * 2012-04-13 2016-11-24 Jsr株式会社 Coloring composition, color filter and display element
JP5485433B2 (en) * 2013-02-08 2014-05-07 東京応化工業株式会社 Colored photosensitive resin composition, color filter, and liquid crystal display
JP5602895B2 (en) * 2013-02-08 2014-10-08 東京応化工業株式会社 Colored photosensitive resin composition, color filter, and liquid crystal display
JP5602894B2 (en) * 2013-02-08 2014-10-08 東京応化工業株式会社 Colored photosensitive resin composition, color filter, and liquid crystal display

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3360866B2 (en) * 1993-03-31 2003-01-07 東京応化工業株式会社 Photosensitive resin composition for color filters
JP3421415B2 (en) * 1994-03-09 2003-06-30 日立化成工業株式会社 Colored image forming material, photosensitive liquid using the same, photosensitive element, method for producing color filter, and color filter
JPH0815520A (en) * 1994-06-29 1996-01-19 Hitachi Chem Co Ltd Photosensitive resin composition for color filter, photosensitive film using the same, production of color filter and color filter
JPH0915844A (en) * 1995-06-29 1997-01-17 Hitachi Chem Co Ltd Colored image forming photosensitive solution, manufacture of color filter using it, and color filter
JP3787917B2 (en) * 1996-10-02 2006-06-21 日立化成工業株式会社 Colored image forming photosensitive solution, method for producing color filter using the same, and color filter
JP4843858B2 (en) * 2001-03-27 2011-12-21 大日本印刷株式会社 Black resin composition, black film, black matrix substrate, and method for producing black resin composition
JP3860806B2 (en) * 2002-12-19 2006-12-20 Ｊｓｒ株式会社 Method for forming colored layer for color filter

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107272335A (en) * 2016-04-08 2017-10-20 东京应化工业株式会社 Photosensitive polymer combination
CN107272335B (en) * 2016-04-08 2022-04-22 东京应化工业株式会社 Photosensitive resin composition

Also Published As

Publication number Publication date
KR20060128653A (en) 2006-12-14
TWI309339B (en) 2009-05-01
JP2007017924A (en) 2007-01-25
JP4727344B2 (en) 2011-07-20

Similar Documents

Publication Publication Date Title
WO2008081096A3 (en) Quinolinyl derivatives, method for preparing same, pharmaceutic compositions containing same, and use thereof as hypoglycemiant and hypolipemiant agents
WO2006025979A3 (en) Modulators of nuclear receptors
WO2003016291A1 (en) ACTIVATOR FOR PEROXISOME PROLIFERATOR-RESPONSIVE RECEPTOR δ
ATE523562T1 (en) CURDABLE COMPOSITION
WO2008107502A8 (en) Composition for teating infectious diseases
ATE526366T1 (en) COLORED CURABLE COMPOSITION, COLOR FILTER, PRODUCTION METHOD THEREOF AND SOLID STATE IMAGE RECORDING DEVICE
WO2008153154A1 (en) Cyclic compound, photoresist base material and photoresist composition
ATE487608T1 (en) REVERSIBLE THERMOCHROME COMPOSITIONS
TW200700917A (en) Photosensitive composition
BRPI0704154A (en) adhesive composition, method for bonding substrates, and article
ATE501103T1 (en) ORGANIC COMPOUNDS
FR2831548B1 (en) CROSSLINKABLE ADHESIVE SILICONE COMPOSITION COMPRISING AS A THIXOTROPIC AGENT A COMPOUND WITH CYCLIC AMINE FUNCTION CARRIED BY A SILOXANIC CHAIN
ATE503746T1 (en) NEW IMIDAZOLIDINE DERIVATIVES
EA200601295A1 (en) 1,3-DIOXANE DERIVATIVES AND THEIR ANALOGUES APPLICABLE FOR THE TREATMENT I.A. OBESITY AND DIABETES
TW200600971A (en) Calixresorcinarene compounds, photoresist base materials, and compositions thereof
DE602005013975D1 (en) NEW FLAME-REDUCING POLYSTYRENE
NO20054787D0 (en) Indene derivatives as pharmaceuticals
SG156562A1 (en) Light absorbent and organic antireflection coating composition containing the same
BRPI0410540A (en) protectors and their application
NO20074346L (en) New heterocyclic oxime compounds, processes for their preparation and pharmaceutical compositions containing them
GB2450661A (en) Compound, composition and use
NO20081948L (en) Hexahydro-cycloheptapyrazole cannabinoid modulators
NO20041671L (en) Anthelmintic composition
EA200802273A1 (en) NEUROPROTECTIVE CONNECTIONS AND THEIR APPLICATION
TW200707094A (en) Colored photosensitive resin composition