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TW200708893A - Pigment-dispersing type radiation-sensitive resin composition and method of forming colored pattern - Google Patents

Pigment-dispersing type radiation-sensitive resin composition and method of forming colored pattern

Info

Publication number
TW200708893A
TW200708893A TW095119051A TW95119051A TW200708893A TW 200708893 A TW200708893 A TW 200708893A TW 095119051 A TW095119051 A TW 095119051A TW 95119051 A TW95119051 A TW 95119051A TW 200708893 A TW200708893 A TW 200708893A
Authority
TW
Taiwan
Prior art keywords
pigment
sensitive resin
type radiation
resin composition
dispersing type
Prior art date
Application number
TW095119051A
Other languages
Chinese (zh)
Other versions
TWI326800B (en
Inventor
Tetsuya Kato
Kiyoshi Uchikawa
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200708893A publication Critical patent/TW200708893A/en
Application granted granted Critical
Publication of TWI326800B publication Critical patent/TWI326800B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Polymerisation Methods In General (AREA)
  • Epoxy Resins (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

A method of forming a pigment-dispersing type radiation-sensitive resin compositionand a colored pattern using the same is provided that is high in durability, and in particularly, in moisture resistance, after the photocuring thereof. A pigment-dispersing type radiation-sensitive resin composition is used which includes a photopolymerizable compound, a photopolymerization initiator, a pigment, a solvent, and a hydrophorbic resin, which forms a hydrophorbic surface with a water drop contact angle of no less than 75 degrees, after application and photocouring.
TW095119051A 2005-06-28 2006-05-29 Pigment-dispersing type radiation-sensitive resin composition and method of forming colored pattern TWI326800B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005188894A JP2007010796A (en) 2005-06-28 2005-06-28 Pigment-dispersed radiation-sensitive resin composition and colored pattern forming method
JP2005188893A JP4627224B2 (en) 2005-06-28 2005-06-28 Pigment-dispersed radiation-sensitive resin composition and method for forming colored pattern

Publications (2)

Publication Number Publication Date
TW200708893A true TW200708893A (en) 2007-03-01
TWI326800B TWI326800B (en) 2010-07-01

Family

ID=37868681

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095119051A TWI326800B (en) 2005-06-28 2006-05-29 Pigment-dispersing type radiation-sensitive resin composition and method of forming colored pattern

Country Status (4)

Country Link
JP (2) JP2007010796A (en)
KR (1) KR100805862B1 (en)
CN (1) CN100439946C (en)
TW (1) TWI326800B (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101386207B1 (en) * 2007-06-01 2014-04-21 주식회사 케이씨씨 Pigment dispersion and process for preparing the same
JP2009300564A (en) * 2008-06-11 2009-12-24 Toppan Printing Co Ltd Photosensitive colored composition, and color filter and liquid crystal display device using this
KR101200229B1 (en) * 2008-12-18 2012-11-09 도판 인사츠 가부시키가이샤 Color filter for liquid-crystal display device and liquid-crystal display device
JP5740184B2 (en) * 2010-03-25 2015-06-24 富士フイルム株式会社 Pattern forming method and resist composition
WO2015008596A1 (en) * 2013-07-19 2015-01-22 Dic株式会社 Active energy ray-curable composition, active energy ray-curable printing ink comprising same, and printed matter
JP6123620B2 (en) * 2013-09-30 2017-05-10 Jsr株式会社 Radiation-sensitive resin composition, display element insulating film, method for forming the same, and display element
US10712483B2 (en) * 2015-08-24 2020-07-14 Samsung Electronics Co., Ltd. Photosensitive compositions, quantum dot polymer composite pattern prepared therefrom, and electronic devices including the same
KR102152600B1 (en) * 2018-09-27 2020-09-07 한국세라믹기술원 Ceramic ink composition having hydrophobicity
JP7402034B2 (en) * 2019-12-16 2023-12-20 東京応化工業株式会社 Colored photosensitive composition, colored film, method for producing colored film, and method for producing patterned colored film
KR200497302Y1 (en) 2021-02-18 2023-09-27 주식회사 다우기업 A squeezing a tube tool
TW202315897A (en) 2021-10-06 2023-04-16 日商日本化藥股份有限公司 Colored photosensitive composition, cured product, and image display apparatus including cured product

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0758097B1 (en) * 1995-01-25 2002-08-21 Mitsubishi Chemical Corporation Polymerizable composition for color filter
JPH08220328A (en) * 1995-02-09 1996-08-30 Mitsubishi Chem Corp Polymerizable composition for color filter
US5908720A (en) * 1995-10-13 1999-06-01 Tokyo Ohka Kogyo Co., Ltd. Photosensitive resin composition for forming light shielding films, black matrix formed by the same, and method for the production thereof
JPH1184125A (en) 1997-09-12 1999-03-26 Tokyo Ohka Kogyo Co Ltd Photopolymerizable composition for color filter and production of color filter
JP2002145999A (en) * 2000-11-15 2002-05-22 Nagase Kasei Kogyo Kk Photopolymerizable unsaturated resin and photosensitive resin composition containing the resin
AU2003280695A1 (en) * 2002-11-06 2004-06-07 Asahi Glass Company, Limited Negative type photosensitive resin composition
JP2004219809A (en) * 2003-01-16 2004-08-05 Fuji Photo Film Co Ltd Light-shielding photosensitive resin composition, light-shielding photosensitive resin transfer material, method for forming light-shielding picture and color filter

Also Published As

Publication number Publication date
CN100439946C (en) 2008-12-03
JP2007010795A (en) 2007-01-18
TWI326800B (en) 2010-07-01
CN1892264A (en) 2007-01-10
JP2007010796A (en) 2007-01-18
KR20070000993A (en) 2007-01-03
KR100805862B1 (en) 2008-02-21
JP4627224B2 (en) 2011-02-09

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