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TW200705116A - Method of cleaning optical surfaces of an irradiation unit in a two-step process - Google Patents

Method of cleaning optical surfaces of an irradiation unit in a two-step process

Info

Publication number
TW200705116A
TW200705116A TW095121742A TW95121742A TW200705116A TW 200705116 A TW200705116 A TW 200705116A TW 095121742 A TW095121742 A TW 095121742A TW 95121742 A TW95121742 A TW 95121742A TW 200705116 A TW200705116 A TW 200705116A
Authority
TW
Taiwan
Prior art keywords
optical surfaces
gas
irradiation unit
gas mixture
step process
Prior art date
Application number
TW095121742A
Other languages
English (en)
Inventor
Guenther Hans Derra
Thomas Kruecken
Christof Metzmacher
Achim Weber
Peter Zink
Original Assignee
Koninkl Philips Electronics Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninkl Philips Electronics Nv filed Critical Koninkl Philips Electronics Nv
Publication of TW200705116A publication Critical patent/TW200705116A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70166—Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Plasma & Fusion (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Cleaning In General (AREA)
TW095121742A 2005-06-21 2006-06-16 Method of cleaning optical surfaces of an irradiation unit in a two-step process TW200705116A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP05105475 2005-06-21

Publications (1)

Publication Number Publication Date
TW200705116A true TW200705116A (en) 2007-02-01

Family

ID=37496433

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095121742A TW200705116A (en) 2005-06-21 2006-06-16 Method of cleaning optical surfaces of an irradiation unit in a two-step process

Country Status (5)

Country Link
US (1) US8076655B2 (zh)
EP (1) EP1896904B1 (zh)
JP (1) JP5124452B2 (zh)
TW (1) TW200705116A (zh)
WO (1) WO2006136967A2 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
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CN104834187A (zh) * 2015-05-07 2015-08-12 中国科学院长春光学精密机械与物理研究所 一种euv光学元件的碳污染清洗方法

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US7365349B2 (en) * 2005-06-27 2008-04-29 Cymer, Inc. EUV light source collector lifetime improvements
US8317929B2 (en) * 2005-09-16 2012-11-27 Asml Netherlands B.V. Lithographic apparatus comprising an electrical discharge generator and method for cleaning an element of a lithographic apparatus
US8817226B2 (en) * 2007-02-15 2014-08-26 Asml Holding N.V. Systems and methods for insitu lens cleaning using ozone in immersion lithography
US8654305B2 (en) * 2007-02-15 2014-02-18 Asml Holding N.V. Systems and methods for insitu lens cleaning in immersion lithography
DE102007033701A1 (de) * 2007-07-14 2009-01-22 Xtreme Technologies Gmbh Verfahren und Anordnung zur Reinigung von optischen Oberflächen in plasmabasierten Strahlungsquellen
US8901521B2 (en) * 2007-08-23 2014-12-02 Asml Netherlands B.V. Module and method for producing extreme ultraviolet radiation
EP2215527A2 (en) * 2007-11-22 2010-08-11 Philips Intellectual Property & Standards GmbH Method of increasing the operation lifetime of a collector optics arranged in an irradiation device and corresponding irradiation device
DE102008000709B3 (de) 2008-03-17 2009-11-26 Carl Zeiss Smt Ag Reinigungsmodul, EUV-Lithographievorrichtung und Verfahren zu seiner Reinigung
DE102008000959A1 (de) * 2008-04-03 2009-10-08 Carl Zeiss Smt Ag Reinigungsmodul und EUV-Lithographievorrichtung mit Reinigungsmodul
JP5246916B2 (ja) 2008-04-16 2013-07-24 ギガフォトン株式会社 Ｅｕｖ光発生装置におけるイオン回収装置および方法
WO2009133759A1 (ja) * 2008-05-01 2009-11-05 国立大学法人九州工業大学 Ｅｕｖ露光装置のクリーニング方法
JP5559562B2 (ja) 2009-02-12 2014-07-23 ギガフォトン株式会社 極端紫外光光源装置
WO2011036248A1 (en) * 2009-09-25 2011-03-31 Asml Netherlands B.V. Source collector apparatus, lithographic apparatus and device manufacturing method
KR101819053B1 (ko) * 2010-04-22 2018-01-16 에이에스엠엘 네델란즈 비.브이. 극자외 방사선을 생성하는 컬렉터 거울 조립체 및 방법
DE102011084152A1 (de) * 2011-10-07 2013-04-11 Carl Zeiss Smt Gmbh Verfahren zur Einstellung der Intensitätsverteilung in einem optischen System einer mikrolithographischen Projektionsbelichtungsanlage, sowie optisches System
EP2959504B1 (en) 2013-02-25 2018-07-04 Kla-Tencor Corporation Method and system for gas flow mitigation of molecular contamination of optics
EP2959263B1 (en) 2013-02-25 2022-12-07 Kla-Tencor Corporation Methods and apparatus for cleaning objects in a chamber of an optical instrument by generating reactive ions using photon radiation
US10953441B2 (en) * 2013-03-15 2021-03-23 Kla Corporation System and method for cleaning optical surfaces of an extreme ultraviolet optical system
US9560730B2 (en) * 2013-09-09 2017-01-31 Asml Netherlands B.V. Transport system for an extreme ultraviolet light source
KR102346227B1 (ko) * 2014-11-19 2021-12-31 삼성전자주식회사 극자외선 광 생성 장치, 시스템 및 극자외선 광 생성 장치의 사용 방법
US9776218B2 (en) * 2015-08-06 2017-10-03 Asml Netherlands B.V. Controlled fluid flow for cleaning an optical element
US9888554B2 (en) * 2016-01-21 2018-02-06 Asml Netherlands B.V. System, method and apparatus for target material debris cleaning of EUV vessel and EUV collector
DE102017221143A1 (de) 2017-11-27 2019-05-29 Carl Zeiss Smt Gmbh Anordnung für eine EUV-Lithographieanlage
CN108097660B (zh) * 2018-01-18 2024-01-12 上海捷涌科技有限公司 气吹装置
NL2022644A (en) * 2018-03-05 2019-09-10 Asml Netherlands Bv Prolonging optical element lifetime in an euv lithography system
US11979971B2 (en) * 2018-06-29 2024-05-07 Taiwan Semiconductor Manufacturing Company, Ltd. EUV light source and apparatus for lithography
US10877190B2 (en) * 2018-08-17 2020-12-29 Taiwan Semiconductor Manufacturing Co., Ltd. Extreme ultraviolet radiation source
DE102021106289A1 (de) 2020-05-07 2021-11-11 Taiwan Semiconductor Manufacturing Co., Ltd. System und verfahren zum ausführen von extrem-ultraviolett-photolithografieprozessen
US11392040B2 (en) * 2020-05-07 2022-07-19 Taiwan Semiconductor Manufacturing Company, Ltd. System and method for performing extreme ultraviolet photolithography processes
US12287572B2 (en) * 2021-04-16 2025-04-29 Taiwan Semiconductor Manufacturing Co., Ltd. Lithography system and methods
US11662668B2 (en) 2021-08-30 2023-05-30 Taiwan Semiconductor Manufacturing Co., Ltd. Lithography contamination control

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JP3069700B1 (ja) * 1999-07-22 2000-07-24 静岡大学長 放電容器及びその放電容器を備えたプラズマラジカル生成装置
DE10061248B4 (de) * 2000-12-09 2004-02-26 Carl Zeiss Verfahren und Vorrichtung zur In-situ-Dekontamination eines EUV-Lithographiegerätes
US6772776B2 (en) * 2001-09-18 2004-08-10 Euv Llc Apparatus for in situ cleaning of carbon contaminated surfaces
US6724460B2 (en) * 2001-11-19 2004-04-20 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method, device manufactured thereby, cleaning unit and method of cleaning contaminated objects
US6968850B2 (en) * 2002-07-15 2005-11-29 Intel Corporation In-situ cleaning of light source collector optics
US20040011381A1 (en) * 2002-07-17 2004-01-22 Klebanoff Leonard E. Method for removing carbon contamination from optic surfaces
CN1495528B (zh) * 2002-08-15 2011-10-12 Asml荷兰有限公司 光刻投射装置及用于所述装置中的反射器组件
DE60323927D1 (de) * 2002-12-13 2008-11-20 Asml Netherlands Bv Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
EP1429189B1 (en) * 2002-12-13 2008-10-08 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US8945310B2 (en) 2003-05-22 2015-02-03 Koninklijke Philips Electronics N.V. Method and device for cleaning at least one optical component
US7055263B2 (en) * 2003-11-25 2006-06-06 Air Products And Chemicals, Inc. Method for cleaning deposition chambers for high dielectric constant materials
US8075732B2 (en) * 2004-11-01 2011-12-13 Cymer, Inc. EUV collector debris management
ATE555422T1 (de) 2004-07-22 2012-05-15 Koninkl Philips Electronics Nv Optisches system mit einer reinigungsanordnung
US7355672B2 (en) * 2004-10-04 2008-04-08 Asml Netherlands B.V. Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus
US7868304B2 (en) * 2005-02-07 2011-01-11 Asml Netherlands B.V. Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured thereby
DE102005045568A1 (de) * 2005-05-31 2006-12-07 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung und Verfahren zum Schutz einer optischen Komponente, insbesondere in einer EUV-Quelle
US7750326B2 (en) * 2005-06-13 2010-07-06 Asml Netherlands B.V. Lithographic apparatus and cleaning method therefor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104834187A (zh) * 2015-05-07 2015-08-12 中国科学院长春光学精密机械与物理研究所 一种euv光学元件的碳污染清洗方法

Also Published As

Publication number Publication date
WO2006136967A3 (en) 2007-08-09
US20100051827A1 (en) 2010-03-04
US8076655B2 (en) 2011-12-13
EP1896904B1 (en) 2012-09-19
EP1896904A2 (en) 2008-03-12
JP2008544534A (ja) 2008-12-04
JP5124452B2 (ja) 2013-01-23
WO2006136967A2 (en) 2006-12-28

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