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TW200626631A - Photosensitizer, photosensitive acid generating agent, and photocurable composition - Google Patents

Photosensitizer, photosensitive acid generating agent, and photocurable composition

Info

Publication number
TW200626631A
TW200626631A TW094138869A TW94138869A TW200626631A TW 200626631 A TW200626631 A TW 200626631A TW 094138869 A TW094138869 A TW 094138869A TW 94138869 A TW94138869 A TW 94138869A TW 200626631 A TW200626631 A TW 200626631A
Authority
TW
Taiwan
Prior art keywords
photosensitizer
generating agent
acid generating
photocurable composition
photosensitive acid
Prior art date
Application number
TW094138869A
Other languages
Chinese (zh)
Other versions
TWI421271B (en
Inventor
Shigeaki Numata
Shuji Yokoyama
Original Assignee
Kawasaki Kasei Chemicals
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kawasaki Kasei Chemicals filed Critical Kawasaki Kasei Chemicals
Publication of TW200626631A publication Critical patent/TW200626631A/en
Application granted granted Critical
Publication of TWI421271B publication Critical patent/TWI421271B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

This invention provides a composition useful as a photosensitizer for a photocationic polymerizable composition, and a photosensitive acid generating agent and a photocurable composition containing the photosensitizer. The photosensitizer is characterized by comprising an anthracene derivative compound represented by formula (1) wherein R1, n, m, X1 and Y1 are as defined in the description, and a naphthalene derivative compound represented by formula (2) wherein R2, R3, p, q, X2, and Y2 are as defined in the description, or a benzene derivative compound represented by formula (3) wherein R4, R5, r, and X3 are as defined in the description.
TW94138869A 2005-01-06 2005-11-04 Light sensitizers, photosensitizing acid products and photohardenable compositions TWI421271B (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2005001146 2005-01-06
JP2005102878 2005-03-31
JP2005102879 2005-03-31

Publications (2)

Publication Number Publication Date
TW200626631A true TW200626631A (en) 2006-08-01
TWI421271B TWI421271B (en) 2014-01-01

Family

ID=36647508

Family Applications (1)

Application Number Title Priority Date Filing Date
TW94138869A TWI421271B (en) 2005-01-06 2005-11-04 Light sensitizers, photosensitizing acid products and photohardenable compositions

Country Status (3)

Country Link
JP (1) JP5422872B2 (en)
TW (1) TWI421271B (en)
WO (1) WO2006073021A1 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101937112A (en) * 2009-06-26 2011-01-05 住友化学株式会社 Polarization plates and used the laminated optical component of this polarization plates
TWI415916B (en) * 2007-03-15 2013-11-21 Sumitomo Chemical Co A photohardenable adhesive, a polarizing plate using the photohardenable adhesive, a method of manufacturing the same, an optical member, and a liquid crystal display device
CN111868105A (en) * 2018-04-25 2020-10-30 川崎化成工业株式会社 Photopolymerizable sensitizer composition

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5028937B2 (en) * 2006-10-04 2012-09-19 川崎化成工業株式会社 NOVEL ANTHRACENE COMPOUND, PROCESS FOR PRODUCING THE SAME AND USE THEREOF
GB2449124A (en) 2007-05-11 2008-11-12 Sun Chemical Ltd Sensitiser for cationic photoinitiators
JP5007942B2 (en) * 2007-08-06 2012-08-22 川崎化成工業株式会社 Polymerizable composition and polymer thereof
JP5574153B2 (en) * 2010-01-15 2014-08-20 川崎化成工業株式会社 Photo-cationic polymerizable composition
JP5641392B2 (en) * 2010-02-18 2014-12-17 川崎化成工業株式会社 Photocationic polymerization sensitizer composition, photosensitive acid generator composition, photocationic polymerizable composition, and polymer obtained by polymerizing the photocationic polymerizable composition
JP5516869B2 (en) * 2010-03-13 2014-06-11 川崎化成工業株式会社 Photocationic polymerization sensitizer composition, photosensitive acid generator composition, photocationic polymerizable composition, and polymer obtained by polymerizing the photocationic polymerization composition
JP5541504B2 (en) * 2010-04-28 2014-07-09 川崎化成工業株式会社 Photoradical polymerizable composition, polymerization method thereof and polymer thereof
JP5556375B2 (en) * 2010-05-27 2014-07-23 川崎化成工業株式会社 Photocurable composition
US20140005301A1 (en) 2011-02-23 2014-01-02 Basf Se Sulfonium sulfates, their preparation and use
JP5842566B2 (en) * 2011-11-19 2016-01-13 川崎化成工業株式会社 10- (2-Naphthyl) anthracene ether compound, process for its production and use thereof
TWI567497B (en) 2012-04-06 2017-01-21 Ａｚ電子材料盧森堡有限公司 Negative-type photosensitive siloxane composition
TWI567498B (en) 2012-04-06 2017-01-21 Ａｚ電子材料盧森堡有限公司 Negative-type photosensitive siloxane composition
US9631048B2 (en) 2012-04-19 2017-04-25 Basf Se Sulfonium compounds, their preparation and use
WO2014053714A1 (en) 2012-10-02 2014-04-10 Bluestar Silicones France Sas Cationically cross-linkable/polymerisable composition comprising an iodonium borate and releasing an acceptable odour
JP6277692B2 (en) * 2013-11-28 2018-02-14 川崎化成工業株式会社 Photocationic polymerizable composition and polymerization method thereof
JP6354972B2 (en) * 2013-11-28 2018-07-11 川崎化成工業株式会社 Photocationic polymerizable composition and polymerization method thereof
JP6476757B2 (en) * 2014-10-31 2019-03-06 川崎化成工業株式会社 Photosensitizer composition and photopolymerizable composition
WO2016153894A1 (en) 2015-03-20 2016-09-29 Blue Cube Ip Llc Curable compositions
JP6628075B2 (en) * 2015-06-25 2020-01-08 川崎化成工業株式会社 1,4-bis (substituted oxy) -2-naphthoic acid compound and use thereof
JP6512441B2 (en) * 2015-06-25 2019-05-15 川崎化成工業株式会社 4-silyloxy-1-hydroxy-2-naphthoic acid compound and use thereof
JP6660547B2 (en) * 2015-06-25 2020-03-11 川崎化成工業株式会社 Photopolymerization sensitizer
KR102622843B1 (en) 2016-02-15 2024-01-11 삼성디스플레이 주식회사 Flexible display device, method for fabricating hard coating polymer of the same
JP6939148B2 (en) * 2017-03-14 2021-09-22 川崎化成工業株式会社 Photopolymerization sensitizer containing 4-haloalkoxy-1-substituted oxynaphthalene compound and 4-haloalkoxy-1-substituted oxynaphthalene compound

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3579946B2 (en) * 1995-02-13 2004-10-20 Ｊｓｒ株式会社 Chemically amplified radiation-sensitive resin composition
JPH11322952A (en) * 1998-05-15 1999-11-26 Asahi Denka Kogyo Kk Photopolymerizable composition and formation of cured coating film
JP2000204123A (en) * 1999-01-12 2000-07-25 Dainippon Ink & Chem Inc Aqueous resin emulsion and thermosensitive recording material using the same
JP2000344704A (en) * 1999-01-29 2000-12-12 Nippon Kayaku Co Ltd New anthracene compound, resin composition containing the compound and production of 9,10-dietherified anthracene derivative
JP2002302507A (en) * 2001-01-31 2002-10-18 Nippon Soda Co Ltd Photocurable composition containing iodonium salt compound
JP3635401B2 (en) * 2001-03-12 2005-04-06 日本製紙株式会社 Thermal recording material

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI415916B (en) * 2007-03-15 2013-11-21 Sumitomo Chemical Co A photohardenable adhesive, a polarizing plate using the photohardenable adhesive, a method of manufacturing the same, an optical member, and a liquid crystal display device
CN101937112A (en) * 2009-06-26 2011-01-05 住友化学株式会社 Polarization plates and used the laminated optical component of this polarization plates
TWI471398B (en) * 2009-06-26 2015-02-01 Sumitomo Chemical Co A polarizing plate and a laminated optical member using the same
CN111868105A (en) * 2018-04-25 2020-10-30 川崎化成工业株式会社 Photopolymerizable sensitizer composition
CN111868105B (en) * 2018-04-25 2022-05-13 川崎化成工业株式会社 Photopolymerizable sensitizer composition
US11352450B2 (en) 2018-04-25 2022-06-07 Kawasaki Kasei Chemicals Ltd. Photopolymerization sensitizer composition

Also Published As

Publication number Publication date
TWI421271B (en) 2014-01-01
JPWO2006073021A1 (en) 2008-06-12
WO2006073021A1 (en) 2006-07-13
JP5422872B2 (en) 2014-02-19

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