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TW200602192A - Multilayerd structure and the manufacturing method of the same - Google Patents

Multilayerd structure and the manufacturing method of the same

Info

Publication number
TW200602192A
TW200602192A TW094109163A TW94109163A TW200602192A TW 200602192 A TW200602192 A TW 200602192A TW 094109163 A TW094109163 A TW 094109163A TW 94109163 A TW94109163 A TW 94109163A TW 200602192 A TW200602192 A TW 200602192A
Authority
TW
Taiwan
Prior art keywords
multilayerd
manufacturing
same
metal
titanium oxide
Prior art date
Application number
TW094109163A
Other languages
Chinese (zh)
Inventor
Shiro Ogata
Original Assignee
Sustainable Titania Technology
Dow Corning Toray Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sustainable Titania Technology, Dow Corning Toray Co Ltd filed Critical Sustainable Titania Technology
Publication of TW200602192A publication Critical patent/TW200602192A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
    • C23C28/3455—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer with a refractory ceramic layer, e.g. refractory metal oxide, ZrO2, rare earth oxides or a thermal barrier system comprising at least one refractory oxide layer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Laminated Bodies (AREA)
  • Catalysts (AREA)

Abstract

This invention relates to a multi-layered structure comprising a porous substrate, a water penetration prevention layer including a silicon-based compound, and a metal-doped titanium oxide layer. The surface of the structure has a self-cleaning property due to the presence of the metal-doped titanium oxide layer. Furthermore, the water penetration prevention layer can be colored. Therefore, a variety of designs are possible while maintaining of the texture of the substrate.
TW094109163A 2004-03-24 2005-03-24 Multilayerd structure and the manufacturing method of the same TW200602192A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004087345 2004-03-24

Publications (1)

Publication Number Publication Date
TW200602192A true TW200602192A (en) 2006-01-16

Family

ID=34993534

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094109163A TW200602192A (en) 2004-03-24 2005-03-24 Multilayerd structure and the manufacturing method of the same

Country Status (3)

Country Link
JP (1) JP4527112B2 (en)
TW (1) TW200602192A (en)
WO (1) WO2005090067A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20090034907A (en) * 2006-07-25 2009-04-08 사스티나부르 . 테크노로지 가부시키가이샤 Gas protection method
EP2436436A4 (en) * 2009-05-29 2012-10-10 Sustainable Titania Technology Inc METHOD FOR GAS REMOVAL OR DETOXIFICATION
WO2020129456A1 (en) * 2018-12-19 2020-06-25 富士フイルム株式会社 Photocatalyst composite material, signage display protection member, touch panel protection member, solar cell protection member, sensor cover protection member, signage display, touch panel, solar cell, and sensor cover

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1955768A1 (en) * 1995-06-19 2008-08-13 Nippon Soda Co., Ltd. Photocatalyst-carrying structure and photocatalyst coating material
JP3346278B2 (en) * 1998-05-15 2002-11-18 三菱マテリアル株式会社 Method of forming photocatalytic film on organic base material and its use
JP4155760B2 (en) * 2001-12-28 2008-09-24 神東塗料株式会社 Modified titania sol composition
TW200422260A (en) * 2002-11-07 2004-11-01 Sustainable Titania Technology Titania-metal complex and method for preparation thereof, and film forming method using dispersion comprising the complex

Also Published As

Publication number Publication date
JPWO2005090067A1 (en) 2008-05-08
JP4527112B2 (en) 2010-08-18
WO2005090067A1 (en) 2005-09-29

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