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TW200604626A - Process for producing component for liquid crystal display device, structure for liquid crystal display device, transfer material, and liquid crystal display device - Google Patents

Process for producing component for liquid crystal display device, structure for liquid crystal display device, transfer material, and liquid crystal display device

Info

Publication number
TW200604626A
TW200604626A TW094120900A TW94120900A TW200604626A TW 200604626 A TW200604626 A TW 200604626A TW 094120900 A TW094120900 A TW 094120900A TW 94120900 A TW94120900 A TW 94120900A TW 200604626 A TW200604626 A TW 200604626A
Authority
TW
Taiwan
Prior art keywords
liquid crystal
display device
crystal display
photosensitive resin
resin layer
Prior art date
Application number
TW094120900A
Other languages
Chinese (zh)
Other versions
TWI366698B (en
Inventor
Morimasa Sato
Mitsutoshi Tanaka
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of TW200604626A publication Critical patent/TW200604626A/en
Application granted granted Critical
Publication of TWI366698B publication Critical patent/TWI366698B/en

Links

Landscapes

  • Liquid Crystal (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Optical Filters (AREA)

Abstract

Provided is a process for producing components of liquid crystal display device which is suitable as a LCD for both reflection and transmission type and comprises an image structure together which has partially changed the film thickness within an area forming a pixel on an display and may simply and form it with high resolution. It has a step of exposing at the same time the two layer consisting of a first negative working photosensitive resin layer and a second negative working photosensitive resin layer provided on a substrate with lasers of different energies of two or more values, wherein the ratio (h1/h2) of the light sensitivity h1 of the first negative working photosensitive resin layer to the light sensitivity h2 of the second negative working photosensitive resin layer is larger than 1.
TW094120900A 2004-06-23 2005-06-23 Process for producing component for liquid crystal display device TWI366698B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004185473 2004-06-23
JP2005099452A JP4684707B2 (en) 2004-06-23 2005-03-30 Method for manufacturing composition for liquid crystal display device

Publications (2)

Publication Number Publication Date
TW200604626A true TW200604626A (en) 2006-02-01
TWI366698B TWI366698B (en) 2012-06-21

Family

ID=35904527

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094120900A TWI366698B (en) 2004-06-23 2005-06-23 Process for producing component for liquid crystal display device

Country Status (2)

Country Link
JP (1) JP4684707B2 (en)
TW (1) TWI366698B (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4593214B2 (en) * 2004-09-17 2010-12-08 大日本印刷株式会社 Method for patterning substrate for liquid crystal display device, substrate for liquid crystal display device, and liquid crystal display device
JP5145668B2 (en) * 2006-08-11 2013-02-20 大日本印刷株式会社 Pattern forming body and manufacturing method thereof
JP4967689B2 (en) * 2007-01-29 2012-07-04 凸版印刷株式会社 Exposure method, exposure apparatus, and method of manufacturing color filter for transflective liquid crystal display device
KR20110101917A (en) 2010-03-10 2011-09-16 삼성전자주식회사 Liquid crystal display
JP6601128B2 (en) * 2015-10-08 2019-11-06 ウシオ電機株式会社 Light irradiation apparatus and light irradiation method

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04301846A (en) * 1991-03-29 1992-10-26 Toshiba Corp Manufacture of mask substrate for exposure
JP2000321785A (en) * 1999-05-06 2000-11-24 Kansai Paint Co Ltd Three-layer laminated coating film for forming pattern and formation of pattern
JP3912663B2 (en) * 2002-02-26 2007-05-09 富士フイルム株式会社 Color filter pixel formation method, liquid crystal display color filter, liquid crystal display spacer and alignment control protrusion formation method, liquid crystal display spacer and alignment control protrusion
JP4731787B2 (en) * 2002-04-10 2011-07-27 富士フイルム株式会社 Exposure head and exposure apparatus

Also Published As

Publication number Publication date
TWI366698B (en) 2012-06-21
JP4684707B2 (en) 2011-05-18
JP2006039507A (en) 2006-02-09

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees