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TW200507055A - Polarized cancellation element, illumination device, exposure device, and exposure method - Google Patents

Polarized cancellation element, illumination device, exposure device, and exposure method

Info

Publication number
TW200507055A
TW200507055A TW093114046A TW93114046A TW200507055A TW 200507055 A TW200507055 A TW 200507055A TW 093114046 A TW093114046 A TW 093114046A TW 93114046 A TW93114046 A TW 93114046A TW 200507055 A TW200507055 A TW 200507055A
Authority
TW
Taiwan
Prior art keywords
exposure
polarized light
polarized
cancellation element
optical axis
Prior art date
Application number
TW093114046A
Other languages
Chinese (zh)
Inventor
Yuji Kudo
Hirohisa Tanaka
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW200507055A publication Critical patent/TW200507055A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/286—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising for controlling or changing the state of polarisation, e.g. transforming one polarisation state into another
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Polarising Elements (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

A element for eliminating polarization, without relying on the polarized direction of the incident polarized light, can certainly transfer incident polarized light into non-polarized light. The element for eliminating polarization can truly transfer incident polarized light into non-polarized light. The element for eliminating polarization of the invention comprises two deflection prisms that are arranged along the axis of light and made of the birefringence crystal material. From the direction of the optical axis, the direction of the crystal optical axis of the two deflection prisms is set in opposite direction. From the direction of optical axis, the direction of the vertex angle of the two deflection prisms is set in different but not opposite direction.
TW093114046A 2003-05-21 2004-05-19 Polarized cancellation element, illumination device, exposure device, and exposure method TW200507055A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003143240 2003-05-21
JP2003336869 2003-09-29

Publications (1)

Publication Number Publication Date
TW200507055A true TW200507055A (en) 2005-02-16

Family

ID=33478957

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093114046A TW200507055A (en) 2003-05-21 2004-05-19 Polarized cancellation element, illumination device, exposure device, and exposure method

Country Status (3)

Country Link
JP (1) JP4595809B2 (en)
TW (1) TW200507055A (en)
WO (1) WO2004104654A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112230499A (en) * 2019-07-15 2021-01-15 中强光电股份有限公司 Illumination system and projection apparatus

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101547077B1 (en) 2003-04-09 2015-08-25 가부시키가이샤 니콘 Exposure method and apparatus, and device manufacturing method
EP1668420B1 (en) * 2003-09-26 2008-05-21 Carl Zeiss SMT AG Exposure method as well as projection exposure system for carrying out the method
TWI569308B (en) 2003-10-28 2017-02-01 尼康股份有限公司 Optical illumination device, exposure device, exposure method and device manufacturing method
TWI385414B (en) 2003-11-20 2013-02-11 尼康股份有限公司 Optical illuminating apparatus, illuminating method, exposure apparatus, exposure method and device fabricating method
TWI395068B (en) 2004-01-27 2013-05-01 尼康股份有限公司 Optical system, exposure device and method of exposure
TWI379344B (en) 2004-02-06 2012-12-11 Nikon Corp Polarization changing device, optical illumination apparatus, light-exposure apparatus and light-exposure method
US7528931B2 (en) 2004-12-20 2009-05-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2006179660A (en) * 2004-12-22 2006-07-06 Nikon Corp Polarization measuring apparatus, polarization measuring method, exposure apparatus, and exposure method
US20060146307A1 (en) * 2004-12-30 2006-07-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI423301B (en) * 2005-01-21 2014-01-11 尼康股份有限公司 Illumination optical device, exposure device, exposure method and fabricating method of device
KR101762083B1 (en) 2005-05-12 2017-07-26 가부시키가이샤 니콘 Projection optical system, exposure apparatus and exposure method
US7649676B2 (en) * 2006-06-14 2010-01-19 Asml Netherlands B.V. System and method to form unpolarized light
DE102007010650A1 (en) 2007-03-02 2008-09-04 Carl Zeiss Smt Ag Lighting device for use with micro lithographic projection exposure system, has micro lens array arranged in light direction of propagation before light mixture system, where multiple micro lenses are arranged with periodicity
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
JP5267029B2 (en) 2007-10-12 2013-08-21 株式会社ニコン Illumination optical apparatus, exposure apparatus, and device manufacturing method
CN101681123B (en) 2007-10-16 2013-06-12 株式会社尼康 Illumination optical system, exposure apparatus, and device manufacturing method
SG185313A1 (en) 2007-10-16 2012-11-29 Nikon Corp Illumination optical system, exposure apparatus, and device manufacturing method
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
CN105606344B (en) 2008-05-28 2019-07-30 株式会社尼康 Lamp optical system, means of illumination, exposure device and exposure method
CN102183848B (en) * 2011-05-13 2013-02-27 暨南大学 Optical depolarizers with high spatial clutter distribution of polarization states

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59155806A (en) * 1983-02-24 1984-09-05 Kokusai Denshin Denwa Co Ltd <Kdd> Non-polarizing element
JP3661266B2 (en) * 1996-03-29 2005-06-15 株式会社島津製作所 Depolarization plate
KR100564436B1 (en) * 1997-07-22 2006-03-29 가부시키가이샤 니콘 Exposure method, exposure apparatus and light cleaning method
DE19829612A1 (en) * 1998-07-02 2000-01-05 Zeiss Carl Fa Microlithography lighting system with depolarizer

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112230499A (en) * 2019-07-15 2021-01-15 中强光电股份有限公司 Illumination system and projection apparatus
US11442352B2 (en) 2019-07-15 2022-09-13 Coretronic Corporation Lighting system and projection apparatus

Also Published As

Publication number Publication date
JPWO2004104654A1 (en) 2006-07-20
JP4595809B2 (en) 2010-12-08
WO2004104654A1 (en) 2004-12-02

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