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TW200506102A - Gas feed line structure - Google Patents

Gas feed line structure

Info

Publication number
TW200506102A
TW200506102A TW092136124A TW92136124A TW200506102A TW 200506102 A TW200506102 A TW 200506102A TW 092136124 A TW092136124 A TW 092136124A TW 92136124 A TW92136124 A TW 92136124A TW 200506102 A TW200506102 A TW 200506102A
Authority
TW
Taiwan
Prior art keywords
line structure
feed line
gas feed
gas
contain
Prior art date
Application number
TW092136124A
Other languages
Chinese (zh)
Inventor
Takako Kimura
Jun Sonobe
Hideyuki Sato
Original Assignee
Air Liquide
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Liquide filed Critical Air Liquide
Publication of TW200506102A publication Critical patent/TW200506102A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00—Halogens; Halogen acids
    • C01B7/19—Fluorine; Hydrogen fluoride
    • C01B7/20—Fluorine
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D39/00—Filtering material for liquid or gaseous fluids
    • B01D39/14—Other self-supporting filtering material ; Other filtering material
    • B01D39/20—Other self-supporting filtering material ; Other filtering material of inorganic material, e.g. asbestos paper, metallic filtering material of non-woven wires
    • B01D39/2027—Metallic material
    • B01D39/2031—Metallic material the material being particulate
    • B01D39/2034—Metallic material the material being particulate sintered or bonded by inorganic agents
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Chemical Vapour Deposition (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • Glass Compositions (AREA)

Abstract

The invention provides a gas feed line structure that is well suited for supplying feed gases that contain 1% or more fluorine gas.
TW092136124A 2003-01-10 2003-12-19 Gas feed line structure TW200506102A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003004555A JP4440546B2 (en) 2003-01-10 2003-01-10 Gas supply line structure

Publications (1)

Publication Number Publication Date
TW200506102A true TW200506102A (en) 2005-02-16

Family

ID=32708963

Family Applications (1)

Application Number Title Priority Date Filing Date
TW092136124A TW200506102A (en) 2003-01-10 2003-12-19 Gas feed line structure

Country Status (4)

Country Link
JP (1) JP4440546B2 (en)
AU (1) AU2003292477A1 (en)
TW (1) TW200506102A (en)
WO (1) WO2004064125A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9011600B2 (en) 2009-02-12 2015-04-21 Griffith University Chemical vapour deposition system and process
JP5385891B2 (en) * 2010-12-24 2014-01-08 川崎重工業株式会社 Water-lubricated hydroelectric generator

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3541762A (en) * 1969-03-18 1970-11-24 Atomic Energy Commission Annular packed-bed filter
JPH01261208A (en) * 1988-04-11 1989-10-18 Mitsui Toatsu Chem Inc Method for purifying nitrogen trifluoride gas
EP0337294B1 (en) * 1988-04-11 1993-06-30 MITSUI TOATSU CHEMICALS, Inc. Process for purifying nitrogen trifluoride gas
GB9626329D0 (en) * 1996-12-19 1997-02-05 British Nuclear Fuels Plc Improvements in and relating to the storage, transportation and production of active fluoride
ATE505434T1 (en) * 2001-06-29 2011-04-15 Showa Denko Kk PRODUCTION OF A HIGH-PURITY FLUORINE GAS AND METHOD FOR ANALYZING TRACES IN A HIGH-PURITY FLUORINE GAS

Also Published As

Publication number Publication date
AU2003292477A1 (en) 2004-08-10
WO2004064125A1 (en) 2004-07-29
JP2004216233A (en) 2004-08-05
WO2004064125A8 (en) 2004-11-04
JP4440546B2 (en) 2010-03-24

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