SU503197A1 - Vesicular material - Google Patents

Description

R4 is a hydrogen atom, a nitro or sulfanilide group;

Rs is a hydrogen atom or a nitro group. The following azides can be used as photosensitive substances:

1.2-Azido-4-nitrobenzthiazole

2.2-Azido-5-nitrobenzthiazole

3.2-Azido-5-nitrobenzthiazole

4.2-Azido-7-nitrobenzthiazole

5.2,6-Diazidobenzthiazole

6.2,5-Diazidobenzthiazole

7.2-Chloro-6-azidobenzthiazole

8.2,7-Diazido-benzo 1,2o: 5.6 g of bistiazole

9.2-Methyl-7 - azidobenzo 1,2y: 5.6o bistiazole

10.2-Azido-4-phenyl-5-nitrothiazole

11.2-Azido-4- (p-nitrophenyl) thiazole

12.2-Azido-4- (lg-nitrophenyl) thiazole

13.2-Azido-4-phenyl-5-thiazolylsulfon-Manilide

14.2-Azido - 4-phenyl-5-thiazolylsulfon-Mo-methylanilide

15.2-Azido-4-phenyl-5-thiazolylsulfone - Nl-g-methyl anyl id

16.2-Azido-4 - phenyl-5-thiazolylsulfone-Nge-methylanilide

17.2-Azido-4-phenyl-5-thiazolylsulfon-No-methoxyanilide

18.2-Azido-4-phenyl-5 - thiazolylsulfon-N / g-methoxyanilide

19.2-Azido-4-phenyl-5-thiazolylsulfone-Yn-chloroanilide

20.2-Azido-4-phenyl-5-thiazolylsulfone - N-chloranilide

21.2-Azido - 4-phenyl-5-thiazolylsulfon-Mo-bromoanilide

22.2-Azido-4-fe1shl-5-thiazolylsulfo-L .i-bromoanilide

23.2-Azido-4-phenyl-5-thiazolylsulfone-Ml-nitroanilide

24. 2,4,6, -Triazidopyrimidine Example 1. Solutions of 0.25 g of 2-azido-4 nitrobenzthiazole in 10 ml of methyl ethyl ketone and 5 g of the ternary copolymer of vinylidene chloride, acrylonitrile and methyl methacrylate 66: 18: 16 in 15 ml of methyl ethyl ketone are mixed and applied shlintsy method "smearing on the polyethylene terephthalate base. The layer is dried in air, and then in a vacuum cabinet at 70-80 ° C for 5-6 hours. The thickness of the photosensitive layer is 10-13 microns. The layer is then exposed to UV light (DRSh-500 lamp) and developed at 100 ° C on a heated metal drum for 1-2 seconds. An image is obtained with a maximum optical projection density of 1.5-1.7. Similar results are obtained with azides 1-10.

Example 2. 0.1 g of 2-azido-4- (l-nitrophenyl) thiazole is dissolved in 5 ml of methyl ethyl ketone. Layer acquisition, exposure and development are carried out analogously to example 1. After development, an image is obtained with a maximum projection density of 1.87. Similar results are obtained with azides 11-26.

Example 3. 0.1 g of 2,6-diazidobeptosiazole and 1 g of the composition of copolymer of vipilidenechloride with acrylonitrile and polymethyl methacrylate, 0.75 g of the copolymer of vinylidene chloride with acrylonitrile and 0.25 g of PMMu are dissolved in 10 ml of methyl ethyl ketone. Layer acquisition, exposure and development are carried out analogously to example 1. After development, an image with a maximum projection density of 1.84 is obtained. Similar results are obtained with azides 1-10.

The table shows the comparative data of the test results of layers with azides and diazo compounds.

Table

From the data table. 1, it follows that the photosensitivity of Sdo, 85 layers with azides significantly exceeds the sensitivity of the layer with diazo compounds (4-diazido ethylanylincinnate chloride). The diffusion is maximum, the optical density of the layers with azides is 2 times the diffuse density of the diazo compound layer. The azide layer absorbs in the region of 260-300 nm, while the diazocoupling layer has a maximum spectral absorption in the region of 385 nm.

From tab. 1 also shows that the thermal stability of the proposed materials is higher. Vesicular materials with azides are also characterized by good stability during storage. When storing the layers under normal conditions, at 20–30 ° C and a relative humidity of 30–90%, no changes in photoviances were observed during the year.

Claims (1)

Invention Formula A vesicular material consisting of a substrate and a photosensitive layer containing a thermoplastic polymer binder and a photosensitive substance from the class of heterocyclic azides, characterized in that, in order to increase photosensitivity, heat resistance and diffuse density, as well as to obtain a material that is sensitive in the region of 200- 300 nm, as the heterocyclic azide, use one of the azides of the general structure I-IV (-Ra, C-ii. j EC With p Fuck CgHij C .z) N 111 where RI is nitro or azidogrunpa, R2 is an azido group, chlorine, an amino group, Rs is an azido group or alkyl. IV R4 is a nitro group or sulfanilides, Rs is hydrogen, a nitro group. ten