SU201871A1 - METHOD OF ELECTROLYTIC OS.4. ALLOCATION OF ALLOYS - Google Patents
METHOD OF ELECTROLYTIC OS.4. ALLOCATION OF ALLOYSInfo
- Publication number
- SU201871A1 SU201871A1 SU911249A SU911249A SU201871A1 SU 201871 A1 SU201871 A1 SU 201871A1 SU 911249 A SU911249 A SU 911249A SU 911249 A SU911249 A SU 911249A SU 201871 A1 SU201871 A1 SU 201871A1
- Authority
- SU
- USSR - Soviet Union
- Prior art keywords
- nickel
- indium
- alloys
- electrolytic
- allocation
- Prior art date
Links
- 238000000034 method Methods 0.000 title description 6
- 229910045601 alloy Inorganic materials 0.000 title description 2
- 239000000956 alloy Substances 0.000 title description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 8
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 6
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- 239000003792 electrolyte Substances 0.000 description 3
- 229910052738 indium Inorganic materials 0.000 description 3
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical group [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 239000011780 sodium chloride Substances 0.000 description 3
- FEWJPZIEWOKRBE-UHFFFAOYSA-M 3-carboxy-2,3-dihydroxypropanoate Chemical compound OC(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-M 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- NTJPVVKEZMOHNU-UHFFFAOYSA-N 6-(oxan-4-yl)-1h-indazole Chemical compound C1COCCC1C1=CC=C(C=NN2)C2=C1 NTJPVVKEZMOHNU-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910000846 In alloy Inorganic materials 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- ZMFVLYPTTFPBNG-UHFFFAOYSA-N azane;2,3-dihydroxybutanedioic acid Chemical compound [NH4+].OC(=O)C(O)C(O)C([O-])=O ZMFVLYPTTFPBNG-UHFFFAOYSA-N 0.000 description 1
- NGPGDYLVALNKEG-UHFFFAOYSA-N azanium;azane;2,3,4-trihydroxy-4-oxobutanoate Chemical compound [NH4+].[NH4+].[O-]C(=O)C(O)C(O)C([O-])=O NGPGDYLVALNKEG-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-O azanium;hydron;hydroxide Chemical compound [NH4+].O VHUUQVKOLVNVRT-UHFFFAOYSA-O 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- YLZGECKKLOSBPL-UHFFFAOYSA-N indium nickel Chemical compound [Ni].[In] YLZGECKKLOSBPL-UHFFFAOYSA-N 0.000 description 1
- NJWNEWQMQCGRDO-UHFFFAOYSA-N indium zinc Chemical compound [Zn].[In] NJWNEWQMQCGRDO-UHFFFAOYSA-N 0.000 description 1
- 229910000337 indium(III) sulfate Inorganic materials 0.000 description 1
- XGCKLPDYTQRDTR-UHFFFAOYSA-H indium(iii) sulfate Chemical compound [In+3].[In+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O XGCKLPDYTQRDTR-UHFFFAOYSA-H 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 235000019321 monosodium tartrate Nutrition 0.000 description 1
- XIKYYQJBTPYKSG-UHFFFAOYSA-N nickel Chemical compound [Ni].[Ni] XIKYYQJBTPYKSG-UHFFFAOYSA-N 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 1
- 229940119126 sodium bitartrate Drugs 0.000 description 1
- 235000002639 sodium chloride Nutrition 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- IIACRCGMVDHOTQ-UHFFFAOYSA-M sulfamate Chemical compound NS([O-])(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-M 0.000 description 1
Description
Известим способы электроосаждени .сплаВОВ инди , наприимер, цинк - индий, из аммиачио-тартратных растворов.We will know the methods of electrodeposition of indium fluxes, for example, zinc - indium, from ammonia tartrate solutions.
Предлагаемый снособ дает возможность осаждать из вышеуказанных растворов сплаз никель - индий, получаемый до сих пор из. сульфаматного электролита.The proposed method allows you to precipitate from the above solutions Nickel - Indium splashes, obtained so far from. sulfamate electrolyte.
Согласно нзобретению процесс электроосаждеи1и ведут нри Комнатной темиератур-э и плотности тока 0,5-2,0 а/дм из электро-, лита следующего состава (в г/л): индий металлический (в .видеAccording to the invention, the electroplating process is carried out at the Room temperature and current density of 0.5-2.0 a / dm from electrolyte and litas of the following composition (in g / l): metallic indium (in the form
серно юислого инди )3-4sulfuric acid indie) 3-4
никель сернокислый40-50nickel sulfate40-50
битартрат натри 60-70bitartrate sodium 60-70
натрий сернокислый30-50sodium sulfate30-50
аммоний сернокислый15-25ammonium sulfate15-25
натрий хлористый30-40sodium chloride 30-40
гидрат аммони (25%-ный) 200-250 мл/л Аноды - платина нли графитСостав сплава: 20-35% инди , остальное никель.ammonium hydrate (25%) 200-250 ml / l Anodes - platinum or graphite alloy composition: 20-35% indie, the rest is nickel.
Получаемые равномерные мелкО|КристалЛИческие покрыти хорошо сцеплены с основным металлом изделн . Раствор готов т следуюнхим образом. Индий раствор ют в разбавленной серной кислоте (I : 1), вз той с небольшим избыткомThe resulting uniformly fine | Crystal coatings are well adhered to the base metal isdeln. The solution is prepared in the following manner. Indium is dissolved in dilute sulfuric acid (I: 1), taken with a slight excess
дл Нредотвраш,ени гидролиза. Отдельно раствор ют битартрат натри , хлористый натрий, сернокислые натрий и аммоний. Все полученные растворы сливают вместе, а затем смешивают с ранее полученным раствором аммиачного комплекса никел . Полученный электролит фильтруют « добавл ют аммиак.for Nredotvrash, yen hydrolysis. Separately, sodium bitartrate, sodium chloride, sodium sulfate and ammonium are dissolved. All the resulting solutions are poured together, and then mixed with the previously obtained solution of the ammonia complex of nickel. The electrolyte obtained is filtered and ammonia is added.
10ten
Пред ,м ет изобретени Pre, invention
Способ электролитического осаждени сплавов инди из аммиачнотартратного раствора при -комнатной температуре, отличаюшийс тем, что, с целью получени покрытий сплавом никель - «ндий, процесс ведут при плотности тока 0,5-2,Q а/дм, а в состаз электролита ввод т сернокислый никель и хлористый натрий при следующем соотношен«и компонентов (в г/л):The method of electrolytic deposition of indium alloys from an ammonium tartrate solution at-room temperature, characterized in that, in order to obtain nickel-nickel alloy coatings, the process is carried out at a current density of 0.5-2, Q a / dm, and Nickel sulphate and sodium chloride in the following ratio "and components (in g / l):
инднй металлический (в видеindny metal (in the form of
сернокислого инди )3-4indium sulfate) 3-4
никель сернокислый40-50nickel sulfate40-50
бИтартрат патри 60-70Patriot 60-70 bItartrate
натрий сернокислый30-50sodium sulfate30-50
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SU201871A1 true SU201871A1 (en) |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4048381A (en) * | 1975-01-22 | 1977-09-13 | Nippon Kokan Kabushiki Kaisha | Method for manufacturing an electro-galvanized steel sheet excellent in bare corrosion resistance and adaptability to chromating, and product thereof |
| EP0163059A3 (en) * | 1984-04-30 | 1986-05-28 | Allied Corporation | Novel nickel/indium alloy and method of using same in the manufacture of printed circuit boards |
| US4633050A (en) * | 1984-04-30 | 1986-12-30 | Allied Corporation | Nickel/indium alloy for use in the manufacture of electrical contact areas electrical devices |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4048381A (en) * | 1975-01-22 | 1977-09-13 | Nippon Kokan Kabushiki Kaisha | Method for manufacturing an electro-galvanized steel sheet excellent in bare corrosion resistance and adaptability to chromating, and product thereof |
| EP0163059A3 (en) * | 1984-04-30 | 1986-05-28 | Allied Corporation | Novel nickel/indium alloy and method of using same in the manufacture of printed circuit boards |
| US4626324A (en) * | 1984-04-30 | 1986-12-02 | Allied Corporation | Baths for the electrolytic deposition of nickel-indium alloys on printed circuit boards |
| US4633050A (en) * | 1984-04-30 | 1986-12-30 | Allied Corporation | Nickel/indium alloy for use in the manufacture of electrical contact areas electrical devices |
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