SG11202100089PA - Detection device and detection method - Google Patents
Detection device and detection methodInfo
- Publication number
- SG11202100089PA SG11202100089PA SG11202100089PA SG11202100089PA SG11202100089PA SG 11202100089P A SG11202100089P A SG 11202100089PA SG 11202100089P A SG11202100089P A SG 11202100089PA SG 11202100089P A SG11202100089P A SG 11202100089PA SG 11202100089P A SG11202100089P A SG 11202100089PA
- Authority
- SG
- Singapore
- Prior art keywords
- detection
- detection device
- detection method
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/1717—Systems in which incident light is modified in accordance with the properties of the material investigated with a modulation of one or more physical properties of the sample during the optical investigation, e.g. electro-reflectance
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/86—Investigating moving sheets
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/952—Inspecting the exterior surface of cylindrical bodies or wires
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N2021/0106—General arrangement of respective parts
- G01N2021/0112—Apparatus in one mechanical, optical or electronic block
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/1717—Systems in which incident light is modified in accordance with the properties of the material investigated with a modulation of one or more physical properties of the sample during the optical investigation, e.g. electro-reflectance
- G01N2021/1725—Modulation of properties by light, e.g. photoreflectance
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
- G01N2021/8848—Polarisation of light
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
- G01N2021/8854—Grading and classifying of flaws
- G01N2021/8861—Determining coordinates of flaws
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
- G01N2021/8854—Grading and classifying of flaws
- G01N2021/8874—Taking dimensions of defect into account
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/06—Illumination; Optics
- G01N2201/068—Optics, miscellaneous
- G01N2201/0683—Brewster plate; polarisation controlling elements
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/10—Scanning
- G01N2201/104—Mechano-optical scan, i.e. object and beam moving
- G01N2201/1042—X, Y scan, i.e. object moving in X, beam in Y
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Engineering & Computer Science (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Signal Processing (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810737921.4A CN110687051B (en) | 2018-07-06 | 2018-07-06 | Detection equipment and method |
| PCT/CN2019/094976 WO2020007370A1 (en) | 2018-07-06 | 2019-07-08 | Detecting device and method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11202100089PA true SG11202100089PA (en) | 2021-02-25 |
Family
ID=69060736
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11202100089PA SG11202100089PA (en) | 2018-07-06 | 2019-07-08 | Detection device and detection method |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US11940377B2 (en) |
| KR (1) | KR102516040B1 (en) |
| CN (2) | CN115165758B (en) |
| SG (1) | SG11202100089PA (en) |
| WO (1) | WO2020007370A1 (en) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113514477B (en) * | 2020-04-10 | 2024-06-11 | 深圳中科飞测科技股份有限公司 | Optical equipment, alignment method and detection method thereof |
| CN112215372B (en) * | 2020-10-21 | 2023-04-07 | 电子科技大学 | Computer-aided system for equipment detection in petroleum drilling system |
| CN112883601B (en) * | 2021-01-13 | 2023-05-02 | 歌尔股份有限公司 | Surface defect detection method, device, equipment and storage medium |
| CN113514399B (en) * | 2021-03-26 | 2024-09-17 | 深圳中科飞测科技股份有限公司 | Detection device and detection method |
| CN115561179A (en) * | 2021-07-02 | 2023-01-03 | 三赢科技(深圳)有限公司 | Optical module applied to mobile equipment and mobile equipment |
| CN113533352B (en) * | 2021-08-20 | 2023-02-10 | 合肥御微半导体技术有限公司 | Detection system and detection method for surface defects |
| KR102839048B1 (en) * | 2022-12-23 | 2025-07-29 | 주식회사 파이버프로 | Optical fiber distribution vibration detection device and method |
| CN116433600A (en) * | 2023-02-28 | 2023-07-14 | 深圳职业技术学院 | Wafer defect classification method, device, storage medium and terminal equipment |
| CN118896956B (en) * | 2023-04-26 | 2025-12-09 | 深圳中科飞测科技股份有限公司 | Detection method, detection system, terminal equipment and storage medium |
| USD1103843S1 (en) | 2023-08-15 | 2025-12-02 | Volkswagen Aktiengesellschaft | Motor vehicle |
| CN117197617B (en) * | 2023-09-19 | 2024-05-28 | 芯率智能科技(苏州)有限公司 | A defect classification method and system for repeated defects |
| CN117080108B (en) * | 2023-10-18 | 2024-02-02 | 无锡卓海科技股份有限公司 | Wafer detection device and detection method |
| CN119023697A (en) * | 2024-07-31 | 2024-11-26 | 聚时科技(上海)有限公司 | A detection device, a detection method and a detection system |
| CN119246543A (en) * | 2024-08-07 | 2025-01-03 | 聚时科技(上海)有限公司 | A detection system, a detection control method, a defect detection device and a detection method |
| CN120161055B (en) * | 2025-03-26 | 2025-11-21 | 合肥工业大学 | A four-step phase-shift differential interferometry surface defect detection method |
| CN119880920B (en) * | 2025-03-27 | 2025-07-22 | 深圳镭赫技术有限公司 | Detection device and detection method |
| CN120177495A (en) * | 2025-05-20 | 2025-06-20 | 有为图像技术(苏州)有限公司 | Multi-channel synchronous scanning optical detection system |
| CN120801333B (en) * | 2025-09-15 | 2025-12-09 | 深圳中科飞测科技股份有限公司 | Defect detection system and defect detection method |
Family Cites Families (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1016895B (en) * | 1989-11-23 | 1992-06-03 | 清华大学 | Surface three-dimensional topography non-contact measuring instrument |
| US5032734A (en) | 1990-10-15 | 1991-07-16 | Vti, Inc. | Method and apparatus for nondestructively measuring micro defects in materials |
| US5883710A (en) * | 1994-12-08 | 1999-03-16 | Kla-Tencor Corporation | Scanning system for inspecting anomalies on surfaces |
| DE19626261A1 (en) | 1995-06-30 | 1997-01-02 | Nikon Corp | IC pattern and metal surface test object observation differential interference microscope |
| JPH1114611A (en) * | 1997-06-19 | 1999-01-22 | Hitachi Constr Mach Co Ltd | Electronic scanning system ultrasonic inspection equipment |
| KR100301067B1 (en) | 1999-08-23 | 2001-11-01 | 윤종용 | Method for detecting micro scratch and device adopting the same |
| US6753961B1 (en) * | 2000-09-18 | 2004-06-22 | Therma-Wave, Inc. | Spectroscopic ellipsometer without rotating components |
| KR100721414B1 (en) * | 2002-09-30 | 2007-05-23 | 도꾸리쯔교세이호징 가가꾸 기쥬쯔 신꼬 기꼬 | Confocal microscope, fluorescence measuring method and polarized light measuring method using confocal microscope |
| CN1310064C (en) * | 2004-11-16 | 2007-04-11 | 中国科学院安徽光学精密机械研究所 | Three-wire array CCD push-scanning type polarization imaging detection device |
| CN100398980C (en) * | 2005-02-04 | 2008-07-02 | 哈尔滨工业大学 | Three-dimensional super-resolution confocal array scanning microscopy detection method and device |
| KR100766178B1 (en) | 2006-01-18 | 2007-10-10 | 광주과학기술원 | Refractive index distribution measuring device of optical waveguide |
| US7701577B2 (en) * | 2007-02-21 | 2010-04-20 | Asml Netherlands B.V. | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method |
| JP2010197352A (en) | 2009-02-27 | 2010-09-09 | Hitachi High-Technologies Corp | Defect inspection method and defect inspecting apparatus |
| CN201732057U (en) * | 2009-05-06 | 2011-02-02 | 许忠保 | Differential interference phase contrast tomography microscope |
| CN101666630B (en) * | 2009-10-30 | 2011-06-22 | 哈尔滨工业大学深圳研究生院 | Method and device for detecting precision wafer based on parallel optical flat splitting polarized beam and phase-shifting interferometry |
| JP5713264B2 (en) * | 2009-11-20 | 2015-05-07 | 独立行政法人産業技術総合研究所 | Defect inspection method, wafer or semiconductor element quality control method, and defect inspection apparatus |
| US8854628B2 (en) | 2010-09-22 | 2014-10-07 | Zygo Corporation | Interferometric methods for metrology of surfaces, films and underresolved structures |
| CN102759533B (en) * | 2011-04-27 | 2015-03-04 | 中国科学院微电子研究所 | Wafer inspection method and wafer inspection apparatus |
| KR20130072535A (en) | 2011-12-22 | 2013-07-02 | 삼성전기주식회사 | Non-invasive inspecting apparatus for defects and inspecting method using the same |
| CN102589471A (en) * | 2012-03-06 | 2012-07-18 | 上海理工大学 | Parallel confocal detection system and method |
| JP5773939B2 (en) * | 2012-04-27 | 2015-09-02 | 株式会社日立ハイテクノロジーズ | Defect inspection apparatus and defect inspection method |
| JP6328468B2 (en) * | 2014-03-31 | 2018-05-23 | 株式会社日立ハイテクノロジーズ | Defect inspection apparatus and inspection method |
| JP2015206642A (en) * | 2014-04-18 | 2015-11-19 | 株式会社日立ハイテクノロジーズ | Defect observation method and apparatus |
| CN104457995B (en) * | 2014-12-15 | 2017-02-08 | 清华大学深圳研究生院 | Fast polarization detector and detecting method |
| TWI542864B (en) * | 2014-12-30 | 2016-07-21 | 財團法人工業技術研究院 | A system for measuring anisotropy, a method for measuring anisotropy and a calibration method thereof |
| CN106153626B (en) | 2015-04-13 | 2019-02-22 | 无锡迈福光学科技有限公司 | A surface flaw optical detection device and detection method thereof |
| JP6697560B2 (en) * | 2015-12-23 | 2020-05-20 | エーエスエムエル ネザーランズ ビー.ブイ. | Metrology method and apparatus |
| KR20180028787A (en) * | 2016-09-09 | 2018-03-19 | 삼성전자주식회사 | Defect inspection system and method, and method for fabricating semiconductor using the inspection method |
| CN106989822B (en) * | 2017-04-05 | 2018-04-06 | 长春理工大学 | Imitate the optional polarization state detection device of mantis shrimp eye spectral coverage and method |
| CN207351398U (en) * | 2017-07-17 | 2018-05-11 | 哈尔滨工业大学深圳研究生院 | The coaxial microscopic three-dimensional topography measurement device of integrated full-automatic |
| US10830709B2 (en) * | 2018-09-28 | 2020-11-10 | Onto Innovation Inc. | Interferometer with pixelated phase shift mask |
| KR20220030067A (en) * | 2020-09-02 | 2022-03-10 | 삼성전자주식회사 | Wafer inspection apparatus and system including same |
-
2018
- 2018-07-06 CN CN202210752031.7A patent/CN115165758B/en active Active
- 2018-07-06 CN CN201810737921.4A patent/CN110687051B/en active Active
-
2019
- 2019-07-08 US US17/257,962 patent/US11940377B2/en active Active
- 2019-07-08 KR KR1020217002930A patent/KR102516040B1/en active Active
- 2019-07-08 WO PCT/CN2019/094976 patent/WO2020007370A1/en not_active Ceased
- 2019-07-08 SG SG11202100089PA patent/SG11202100089PA/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| US20210270725A1 (en) | 2021-09-02 |
| CN115165758A (en) | 2022-10-11 |
| US11940377B2 (en) | 2024-03-26 |
| WO2020007370A1 (en) | 2020-01-09 |
| CN110687051B (en) | 2022-06-21 |
| KR102516040B1 (en) | 2023-03-30 |
| CN110687051A (en) | 2020-01-14 |
| KR20210034001A (en) | 2021-03-29 |
| CN115165758B (en) | 2025-11-21 |
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