SG11201710863QA - Mems device and method for producing same - Google Patents
Mems device and method for producing sameInfo
- Publication number
- SG11201710863QA SG11201710863QA SG11201710863QA SG11201710863QA SG11201710863QA SG 11201710863Q A SG11201710863Q A SG 11201710863QA SG 11201710863Q A SG11201710863Q A SG 11201710863QA SG 11201710863Q A SG11201710863Q A SG 11201710863QA SG 11201710863Q A SG11201710863Q A SG 11201710863QA
- Authority
- SG
- Singapore
- Prior art keywords
- mems device
- producing same
- producing
- same
- mems
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00261—Processes for packaging MEMS devices
- B81C1/00269—Bonding of solid lids or wafers to the substrate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
- B81B7/0032—Packages or encapsulation
- B81B7/0077—Other packages not provided for in groups B81B7/0035 - B81B7/0074
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/02—Containers; Seals
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/0072—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks of microelectro-mechanical resonators or networks
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/05—Holders or supports
- H03H9/10—Mounting in enclosures
- H03H9/1057—Mounting in enclosures for microelectro-mechanical devices
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/24—Constructional features of resonators of material which is not piezoelectric, electrostrictive, or magnetostrictive
- H03H9/2405—Constructional features of resonators of material which is not piezoelectric, electrostrictive, or magnetostrictive of microelectro-mechanical resonators
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/02—Sensors
- B81B2201/0271—Resonators; ultrasonic resonators
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2207/00—Microstructural systems or auxiliary parts thereof
- B81B2207/09—Packages
- B81B2207/091—Arrangements for connecting external electrical signals to mechanical structures inside the package
- B81B2207/094—Feed-through, via
- B81B2207/095—Feed-through, via through the lid
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2203/00—Forming microstructural systems
- B81C2203/01—Packaging MEMS
- B81C2203/0118—Bonding a wafer on the substrate, i.e. where the cap consists of another wafer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2203/00—Forming microstructural systems
- B81C2203/03—Bonding two components
- B81C2203/033—Thermal bonding
- B81C2203/035—Soldering
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2203/00—Forming microstructural systems
- B81C2203/03—Bonding two components
- B81C2203/033—Thermal bonding
- B81C2203/036—Fusion bonding
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Micromachines (AREA)
- Pressure Welding/Diffusion-Bonding (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015184289 | 2015-09-17 | ||
| PCT/JP2016/077174 WO2017047663A1 (en) | 2015-09-17 | 2016-09-14 | Mems device and method for producing same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11201710863QA true SG11201710863QA (en) | 2018-01-30 |
Family
ID=58288916
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11201710863QA SG11201710863QA (en) | 2015-09-17 | 2016-09-14 | Mems device and method for producing same |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US10934161B2 (en) |
| JP (1) | JPWO2017047663A1 (en) |
| CN (1) | CN107848789B (en) |
| SG (1) | SG11201710863QA (en) |
| WO (1) | WO2017047663A1 (en) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6923010B2 (en) | 2018-02-09 | 2021-08-18 | 株式会社村田製作所 | MEMS device |
| WO2019159410A1 (en) * | 2018-02-14 | 2019-08-22 | 株式会社村田製作所 | Resonance device and resonance device manufacturing method |
| WO2019225047A1 (en) * | 2018-05-24 | 2019-11-28 | 株式会社村田製作所 | Mems device and mems device manufacturing method |
| US11174157B2 (en) * | 2018-06-27 | 2021-11-16 | Advanced Semiconductor Engineering Inc. | Semiconductor device packages and methods of manufacturing the same |
| DE102018210815A1 (en) * | 2018-06-30 | 2020-01-02 | Robert Bosch Gmbh | Electrical contacting, method for producing electrical contacting, system |
| JP7015484B2 (en) * | 2018-08-02 | 2022-02-03 | 株式会社村田製作所 | MEMS device |
| WO2020049814A1 (en) * | 2018-09-04 | 2020-03-12 | 株式会社村田製作所 | Manufacturing method for mems device, and mems device |
| JP7089706B2 (en) * | 2018-09-28 | 2022-06-23 | 株式会社村田製作所 | Resonator and resonance device manufacturing method |
| JP7169560B2 (en) | 2019-03-26 | 2022-11-11 | 株式会社村田製作所 | RESONANT DEVICE AND RESONANT DEVICE MANUFACTURING METHOD |
| JP7265729B2 (en) * | 2019-06-19 | 2023-04-27 | 株式会社村田製作所 | RESONANT DEVICE AND RESONANT DEVICE MANUFACTURING METHOD |
| US12426506B2 (en) | 2019-07-19 | 2025-09-23 | Evatec Ag | Piezoelectric coating and deposition process |
| CN117751522A (en) * | 2021-07-29 | 2024-03-22 | 株式会社村田制作所 | Resonant device and method of manufacturing the same |
| JP7589837B2 (en) * | 2021-12-23 | 2024-11-26 | 株式会社村田製作所 | MEMS device and method for manufacturing the same |
| FR3143588A1 (en) * | 2022-12-19 | 2024-06-21 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Eutectic sealing process for two substrates |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102007048332A1 (en) * | 2007-10-09 | 2009-04-16 | Robert Bosch Gmbh | Composite of at least two semiconductor substrates and manufacturing method |
| US7981765B2 (en) * | 2008-09-10 | 2011-07-19 | Analog Devices, Inc. | Substrate bonding with bonding material having rare earth metal |
| EP2346083B1 (en) * | 2008-09-22 | 2016-03-30 | Alps Electric Co., Ltd. | Mems sensor |
| US8207586B2 (en) * | 2008-09-22 | 2012-06-26 | Alps Electric Co., Ltd. | Substrate bonded MEMS sensor |
| WO2010032821A1 (en) * | 2008-09-22 | 2010-03-25 | アルプス電気株式会社 | Mems sensor |
| US8089144B2 (en) * | 2008-12-17 | 2012-01-03 | Denso Corporation | Semiconductor device and method for manufacturing the same |
| JP5021098B2 (en) | 2009-12-11 | 2012-09-05 | パイオニア株式会社 | Semiconductor substrate bonding method and MEMS device |
| US20120319220A1 (en) * | 2009-12-11 | 2012-12-20 | Pioneer Micro Technology Corporation | Method of bonding semiconductor substrate and mems device |
| WO2011111540A1 (en) * | 2010-03-08 | 2011-09-15 | アルプス電気株式会社 | Physical quantity sensor |
| JP2012074837A (en) * | 2010-09-28 | 2012-04-12 | Nippon Dempa Kogyo Co Ltd | Piezoelectric device |
| US8741738B2 (en) * | 2011-06-08 | 2014-06-03 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method of fabrication of a semiconductor apparatus comprising substrates including Al/Ge and Cu contact layers to form a metallic alloy |
| US8652865B2 (en) | 2011-08-16 | 2014-02-18 | Freescale Semiconductor, Inc. | Attaching a MEMS to a bonding wafer |
| JP2013052449A (en) * | 2011-09-01 | 2013-03-21 | Alps Electric Co Ltd | Mems sensor |
| JP5716627B2 (en) * | 2011-10-06 | 2015-05-13 | オムロン株式会社 | Wafer bonding method and bonded portion structure |
| US9139423B2 (en) * | 2012-01-19 | 2015-09-22 | Taiwan Semiconductor Manufacturing Company, Ltd. | Micro electro mechanical system structures |
| US9466532B2 (en) * | 2012-01-31 | 2016-10-11 | Taiwan Semiconductor Manufacturing Company, Ltd. | Micro-electro mechanical system (MEMS) structures with through substrate vias and methods of forming the same |
| JP5898556B2 (en) * | 2012-04-25 | 2016-04-06 | アルプス電気株式会社 | MEMS sensor and manufacturing method thereof |
| TWI498975B (en) * | 2012-04-26 | 2015-09-01 | 亞太優勢微系統股份有限公司 | Method for bonding package structure and substrate |
| US9114977B2 (en) * | 2012-11-28 | 2015-08-25 | Invensense, Inc. | MEMS device and process for RF and low resistance applications |
| US20140264655A1 (en) * | 2013-03-13 | 2014-09-18 | Invensense, Inc. | Surface roughening to reduce adhesion in an integrated mems device |
| US20150048509A1 (en) * | 2013-08-16 | 2015-02-19 | Globalfoundries Singapore Pte. Ltd. | Cmos compatible wafer bonding layer and process |
| KR20150065067A (en) * | 2013-12-04 | 2015-06-12 | 삼성전자주식회사 | Capacitive micromachined ultrasonic transducer and method of fabricating the same |
| KR102155695B1 (en) * | 2014-02-12 | 2020-09-21 | 삼성전자주식회사 | Electro acoustic transducer |
| US9394161B2 (en) * | 2014-11-14 | 2016-07-19 | Taiwan Semiconductor Manufacturing Co., Ltd. | MEMS and CMOS integration with low-temperature bonding |
| US9290376B1 (en) * | 2015-06-12 | 2016-03-22 | Taiwan Semiconductor Manufacturing Co., Ltd. | MEMS packaging techniques |
-
2016
- 2016-09-14 SG SG11201710863QA patent/SG11201710863QA/en unknown
- 2016-09-14 WO PCT/JP2016/077174 patent/WO2017047663A1/en not_active Ceased
- 2016-09-14 JP JP2017539950A patent/JPWO2017047663A1/en active Pending
- 2016-09-14 CN CN201680042091.2A patent/CN107848789B/en active Active
-
2018
- 2018-01-09 US US15/865,691 patent/US10934161B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| US10934161B2 (en) | 2021-03-02 |
| CN107848789A (en) | 2018-03-27 |
| US20180127268A1 (en) | 2018-05-10 |
| WO2017047663A1 (en) | 2017-03-23 |
| JPWO2017047663A1 (en) | 2018-03-29 |
| CN107848789B (en) | 2020-10-27 |
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