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SG11201608777TA - Pellicle frame, pellicle and method of manufacturing the same,original plate for exposure and method of manufacturing thesame, exposure device, and method of manufacturingsemiconductor device - Google Patents

Pellicle frame, pellicle and method of manufacturing the same,original plate for exposure and method of manufacturing thesame, exposure device, and method of manufacturingsemiconductor device

Info

Publication number
SG11201608777TA
SG11201608777TA SG11201608777TA SG11201608777TA SG11201608777TA SG 11201608777T A SG11201608777T A SG 11201608777TA SG 11201608777T A SG11201608777T A SG 11201608777TA SG 11201608777T A SG11201608777T A SG 11201608777TA SG 11201608777T A SG11201608777T A SG 11201608777TA
Authority
SG
Singapore
Prior art keywords
manufacturing
exposure
pellicle
manufacturingsemiconductor
same
Prior art date
Application number
SG11201608777TA
Other languages
English (en)
Inventor
Kazuo Kohmura
Yosuke Ono
Daiki Taneichi
Yasuyuki Sato
Toshiaki Hirota
Original Assignee
Mitsui Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Chemicals Inc filed Critical Mitsui Chemicals Inc
Publication of SG11201608777TA publication Critical patent/SG11201608777TA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67359—Closed carriers specially adapted for containing masks, reticles or pellicles

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
SG11201608777TA 2014-05-02 2015-04-27 Pellicle frame, pellicle and method of manufacturing the same,original plate for exposure and method of manufacturing thesame, exposure device, and method of manufacturingsemiconductor device SG11201608777TA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014095425 2014-05-02
PCT/JP2015/062742 WO2015166927A1 (fr) 2014-05-02 2015-04-27 Cadre de pellicule, pellicule et son procédé de fabrication, plaque originale d'exposition et son procédé de fabrication, dispositif d'exposition et procédé de fabrication de dispositif à semi-conducteur

Publications (1)

Publication Number Publication Date
SG11201608777TA true SG11201608777TA (en) 2016-12-29

Family

ID=54358654

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201608777TA SG11201608777TA (en) 2014-05-02 2015-04-27 Pellicle frame, pellicle and method of manufacturing the same,original plate for exposure and method of manufacturing thesame, exposure device, and method of manufacturingsemiconductor device

Country Status (8)

Country Link
US (1) US10216081B2 (fr)
EP (1) EP3118683A4 (fr)
JP (1) JP6279719B2 (fr)
KR (1) KR101853576B1 (fr)
CN (1) CN106233201A (fr)
SG (1) SG11201608777TA (fr)
TW (1) TWI670561B (fr)
WO (1) WO2015166927A1 (fr)

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JP6423730B2 (ja) * 2014-05-26 2018-11-14 三井化学株式会社 ペリクル用の支持枠
JP6367342B2 (ja) * 2014-09-19 2018-08-01 三井化学株式会社 ペリクル、ペリクルの製造方法及びペリクルを用いた露光方法
SG11201701805QA (en) * 2014-09-19 2017-04-27 Mitsui Chemicals Inc Pellicle, production method thereof, exposure method
CN108351586B (zh) 2015-09-02 2022-01-14 Asml荷兰有限公司 用于制造隔膜组件的方法
CN108699687B (zh) 2016-02-19 2022-03-01 爱沃特株式会社 化合物半导体基板、表膜、和化合物半导体基板的制造方法
JP6944768B2 (ja) 2016-08-29 2021-10-06 エア・ウォーター株式会社 ペリクルの製造方法
CN110325908A (zh) * 2017-02-17 2019-10-11 三井化学株式会社 防护膜组件、曝光原版、曝光装置及半导体装置的制造方法
EP3404487B1 (fr) 2017-05-15 2021-12-01 IMEC vzw Procédé de formation d'une membrane de pellicule ä nanotubes de carbone
EP3404486B1 (fr) 2017-05-15 2021-07-14 IMEC vzw Procédé de formation d'une pellicule
WO2019172141A1 (fr) * 2018-03-05 2019-09-12 三井化学株式会社 Pellicule, matrice d'exposition, dispositif d'exposition et procédé de fabrication de dispositif semi-conducteur
EP3764160B1 (fr) * 2018-03-09 2024-10-23 Kaneka Corporation Pellicule comprenant un film de graphite
KR102465834B1 (ko) * 2018-03-27 2022-11-11 미쯔이가가꾸가부시끼가이샤 펠리클용 지지 프레임, 펠리클 및 그의 제조 방법, 그리고 이것들을 사용한 노광 원판, 반도체 장치의 제조 방법
JP7139133B2 (ja) 2018-04-03 2022-09-20 信越化学工業株式会社 ペリクルフレーム、ペリクル、及びペリクルフレームの製造方法
JP7330245B2 (ja) * 2018-04-03 2023-08-21 信越化学工業株式会社 ペリクルフレーム、ペリクル、ペリクル付フォトマスク、露光方法、及び半導体デバイスの製造方法
JP7038640B2 (ja) * 2018-10-26 2022-03-18 信越化学工業株式会社 ペリクルの剥離方法及びペリクルの剥離装置
TWI770802B (zh) * 2020-02-04 2022-07-11 日商信越化學工業股份有限公司 防護薄膜框架、防護薄膜組件、帶防護薄膜組件的曝光原版及曝光方法、以及半導體裝置或液晶顯示板的製造方法
US11194246B1 (en) 2020-03-27 2021-12-07 Intel Corporation Monolithically framed pellicle membrane suitable for lithography in the fabrication of integrated circuits
US20230236497A1 (en) * 2020-05-14 2023-07-27 Shin-Etsu Chemical Co., Ltd. Pellicle Frame, Pellicle, Pellicle-Attached Exposure Original Plate, Method for Manufacturing Semiconductor, Method for Manufacturing Liquid Crystal Display Plate, and Exposure Method
KR102581084B1 (ko) * 2021-02-04 2023-09-21 주식회사 에프에스티 극자외선 리소그라피용 펠리클 프레임
KR20250095929A (ko) 2023-12-20 2025-06-27 한국전자기술연구원 극자외선 리소그래피용 펠리클

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Also Published As

Publication number Publication date
US20170192349A1 (en) 2017-07-06
KR101853576B1 (ko) 2018-04-30
TWI670561B (zh) 2019-09-01
CN106233201A (zh) 2016-12-14
KR20160138160A (ko) 2016-12-02
EP3118683A4 (fr) 2017-11-01
WO2015166927A1 (fr) 2015-11-05
JPWO2015166927A1 (ja) 2017-04-20
TW201543141A (zh) 2015-11-16
US10216081B2 (en) 2019-02-26
JP6279719B2 (ja) 2018-02-14
EP3118683A1 (fr) 2017-01-18

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