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SG11201607500PA - Sensor for film thickness monitoring device, film thickness monitoring device provided with the same, and method for producing sensor for film thickness monitoring device - Google Patents

Sensor for film thickness monitoring device, film thickness monitoring device provided with the same, and method for producing sensor for film thickness monitoring device

Info

Publication number
SG11201607500PA
SG11201607500PA SG11201607500PA SG11201607500PA SG11201607500PA SG 11201607500P A SG11201607500P A SG 11201607500PA SG 11201607500P A SG11201607500P A SG 11201607500PA SG 11201607500P A SG11201607500P A SG 11201607500PA SG 11201607500P A SG11201607500P A SG 11201607500PA
Authority
SG
Singapore
Prior art keywords
film thickness
monitoring device
thickness monitoring
sensor
same
Prior art date
Application number
SG11201607500PA
Inventor
Atsushi Itoh
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Publication of SG11201607500PA publication Critical patent/SG11201607500PA/en

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B21/00Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant
    • G01B21/02Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness
    • G01B21/08Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness for measuring thickness
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N5/00Analysing materials by weighing, e.g. weighing small particles separated from a gas or liquid
    • G01N5/02Analysing materials by weighing, e.g. weighing small particles separated from a gas or liquid by absorbing or adsorbing components of a material and determining change of weight of the adsorbent, e.g. determining moisture content

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices Characterised By Use Of Acoustic Means (AREA)
  • Physical Vapour Deposition (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
SG11201607500PA 2015-03-03 2016-03-03 Sensor for film thickness monitoring device, film thickness monitoring device provided with the same, and method for producing sensor for film thickness monitoring device SG11201607500PA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015041065 2015-03-03
PCT/JP2016/056647 WO2016140321A1 (en) 2015-03-03 2016-03-03 Sensor for film thickness monitoring device, film thickness monitoring device provided with same, and method for manufacturing sensor for film thickness monitoring device

Publications (1)

Publication Number Publication Date
SG11201607500PA true SG11201607500PA (en) 2016-10-28

Family

ID=56848944

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201607500PA SG11201607500PA (en) 2015-03-03 2016-03-03 Sensor for film thickness monitoring device, film thickness monitoring device provided with the same, and method for producing sensor for film thickness monitoring device

Country Status (5)

Country Link
JP (1) JPWO2016140321A1 (en)
KR (1) KR20160124170A (en)
CN (1) CN106104251A (en)
SG (1) SG11201607500PA (en)
WO (1) WO2016140321A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6873638B2 (en) * 2016-09-23 2021-05-19 太陽誘電株式会社 Gas sensor and gas detection method
JP7064407B2 (en) * 2018-08-31 2022-05-10 キヤノントッキ株式会社 Film forming equipment and control method of film forming equipment
JP7503481B2 (en) * 2020-11-17 2024-06-20 株式会社アルバック Film Thickness Monitor
CN112458407B (en) * 2020-11-27 2023-06-02 江苏集萃有机光电技术研究所有限公司 Crystal oscillator measurement system, crystal oscillator measurement method and crystal oscillator measurement device

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4375604A (en) * 1981-02-27 1983-03-01 The United States Of America As Represented By The Secretary Of The Army Method of angle correcting doubly rotated crystal resonators
JPH03218411A (en) * 1990-01-24 1991-09-26 Nippon Dempa Kogyo Co Ltd Crystal oscillator for monitor and film thickness controller using the same
US5321496A (en) * 1990-03-14 1994-06-14 Zellweger Uster, Inc. Apparatus for monitoring trash in a fiber sample
US6147437A (en) * 1999-08-11 2000-11-14 Schlumberger Technology Corporation Pressure and temperature transducer
JP2003218411A (en) * 2002-01-21 2003-07-31 Matsushita Electric Ind Co Ltd Thermoelectric conversion material, method for producing the same, and thin-film thermoelectric conversion element
JP4388443B2 (en) 2004-09-09 2009-12-24 株式会社アルバック Film thickness monitoring method and film thickness monitoring apparatus
US7828929B2 (en) * 2004-12-30 2010-11-09 Research Electro-Optics, Inc. Methods and devices for monitoring and controlling thin film processing
JP2006292733A (en) 2005-03-15 2006-10-26 Yoshinori Kanno Quartz microbalance sensor device
JP5697427B2 (en) * 2010-12-14 2015-04-08 株式会社アルバック Vacuum deposition apparatus and thin film manufacturing method
CN202913055U (en) * 2012-10-31 2013-05-01 上海膜林科技有限公司 Discrete type crystal-controlled film thickness control device
CN102888591A (en) * 2012-10-31 2013-01-23 上海膜林科技有限公司 Discrete crystal control film thickness control device
CN103540906B (en) * 2013-09-29 2015-07-29 中国科学院上海光学精密机械研究所 The thick monitoring method of Optical/crystal comprehensive film

Also Published As

Publication number Publication date
JPWO2016140321A1 (en) 2017-04-27
CN106104251A (en) 2016-11-09
WO2016140321A1 (en) 2016-09-09
KR20160124170A (en) 2016-10-26

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