SG11201607500PA - Sensor for film thickness monitoring device, film thickness monitoring device provided with the same, and method for producing sensor for film thickness monitoring device - Google Patents
Sensor for film thickness monitoring device, film thickness monitoring device provided with the same, and method for producing sensor for film thickness monitoring deviceInfo
- Publication number
- SG11201607500PA SG11201607500PA SG11201607500PA SG11201607500PA SG11201607500PA SG 11201607500P A SG11201607500P A SG 11201607500PA SG 11201607500P A SG11201607500P A SG 11201607500PA SG 11201607500P A SG11201607500P A SG 11201607500PA SG 11201607500P A SG11201607500P A SG 11201607500PA
- Authority
- SG
- Singapore
- Prior art keywords
- film thickness
- monitoring device
- thickness monitoring
- sensor
- same
- Prior art date
Links
- 238000012806 monitoring device Methods 0.000 title 3
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B21/00—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant
- G01B21/02—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness
- G01B21/08—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness for measuring thickness
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N5/00—Analysing materials by weighing, e.g. weighing small particles separated from a gas or liquid
- G01N5/02—Analysing materials by weighing, e.g. weighing small particles separated from a gas or liquid by absorbing or adsorbing components of a material and determining change of weight of the adsorbent, e.g. determining moisture content
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Length Measuring Devices Characterised By Use Of Acoustic Means (AREA)
- Physical Vapour Deposition (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015041065 | 2015-03-03 | ||
| PCT/JP2016/056647 WO2016140321A1 (en) | 2015-03-03 | 2016-03-03 | Sensor for film thickness monitoring device, film thickness monitoring device provided with same, and method for manufacturing sensor for film thickness monitoring device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11201607500PA true SG11201607500PA (en) | 2016-10-28 |
Family
ID=56848944
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11201607500PA SG11201607500PA (en) | 2015-03-03 | 2016-03-03 | Sensor for film thickness monitoring device, film thickness monitoring device provided with the same, and method for producing sensor for film thickness monitoring device |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPWO2016140321A1 (en) |
| KR (1) | KR20160124170A (en) |
| CN (1) | CN106104251A (en) |
| SG (1) | SG11201607500PA (en) |
| WO (1) | WO2016140321A1 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6873638B2 (en) * | 2016-09-23 | 2021-05-19 | 太陽誘電株式会社 | Gas sensor and gas detection method |
| JP7064407B2 (en) * | 2018-08-31 | 2022-05-10 | キヤノントッキ株式会社 | Film forming equipment and control method of film forming equipment |
| JP7503481B2 (en) * | 2020-11-17 | 2024-06-20 | 株式会社アルバック | Film Thickness Monitor |
| CN112458407B (en) * | 2020-11-27 | 2023-06-02 | 江苏集萃有机光电技术研究所有限公司 | Crystal oscillator measurement system, crystal oscillator measurement method and crystal oscillator measurement device |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4375604A (en) * | 1981-02-27 | 1983-03-01 | The United States Of America As Represented By The Secretary Of The Army | Method of angle correcting doubly rotated crystal resonators |
| JPH03218411A (en) * | 1990-01-24 | 1991-09-26 | Nippon Dempa Kogyo Co Ltd | Crystal oscillator for monitor and film thickness controller using the same |
| US5321496A (en) * | 1990-03-14 | 1994-06-14 | Zellweger Uster, Inc. | Apparatus for monitoring trash in a fiber sample |
| US6147437A (en) * | 1999-08-11 | 2000-11-14 | Schlumberger Technology Corporation | Pressure and temperature transducer |
| JP2003218411A (en) * | 2002-01-21 | 2003-07-31 | Matsushita Electric Ind Co Ltd | Thermoelectric conversion material, method for producing the same, and thin-film thermoelectric conversion element |
| JP4388443B2 (en) | 2004-09-09 | 2009-12-24 | 株式会社アルバック | Film thickness monitoring method and film thickness monitoring apparatus |
| US7828929B2 (en) * | 2004-12-30 | 2010-11-09 | Research Electro-Optics, Inc. | Methods and devices for monitoring and controlling thin film processing |
| JP2006292733A (en) | 2005-03-15 | 2006-10-26 | Yoshinori Kanno | Quartz microbalance sensor device |
| JP5697427B2 (en) * | 2010-12-14 | 2015-04-08 | 株式会社アルバック | Vacuum deposition apparatus and thin film manufacturing method |
| CN202913055U (en) * | 2012-10-31 | 2013-05-01 | 上海膜林科技有限公司 | Discrete type crystal-controlled film thickness control device |
| CN102888591A (en) * | 2012-10-31 | 2013-01-23 | 上海膜林科技有限公司 | Discrete crystal control film thickness control device |
| CN103540906B (en) * | 2013-09-29 | 2015-07-29 | 中国科学院上海光学精密机械研究所 | The thick monitoring method of Optical/crystal comprehensive film |
-
2016
- 2016-03-03 SG SG11201607500PA patent/SG11201607500PA/en unknown
- 2016-03-03 CN CN201680000656.0A patent/CN106104251A/en active Pending
- 2016-03-03 WO PCT/JP2016/056647 patent/WO2016140321A1/en not_active Ceased
- 2016-03-03 KR KR1020167025509A patent/KR20160124170A/en not_active Ceased
- 2016-03-03 JP JP2016540712A patent/JPWO2016140321A1/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| JPWO2016140321A1 (en) | 2017-04-27 |
| CN106104251A (en) | 2016-11-09 |
| WO2016140321A1 (en) | 2016-09-09 |
| KR20160124170A (en) | 2016-10-26 |
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