SG11201507487TA - Spin-on compositions of soluble metal oxide carboxylates and methods of their use - Google Patents
Spin-on compositions of soluble metal oxide carboxylates and methods of their useInfo
- Publication number
- SG11201507487TA SG11201507487TA SG11201507487TA SG11201507487TA SG11201507487TA SG 11201507487T A SG11201507487T A SG 11201507487TA SG 11201507487T A SG11201507487T A SG 11201507487TA SG 11201507487T A SG11201507487T A SG 11201507487TA SG 11201507487T A SG11201507487T A SG 11201507487TA
- Authority
- SG
- Singapore
- Prior art keywords
- spin
- compositions
- methods
- metal oxide
- soluble metal
- Prior art date
Links
- 229910044991 metal oxide Inorganic materials 0.000 title 1
- -1 metal oxide carboxylates Chemical class 0.000 title 1
- 239000000203 mixture Substances 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/06—Coating on selected surface areas, e.g. using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
- C23C18/1216—Metal oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/14—Decomposition by irradiation, e.g. photolysis, particle radiation or by mixed irradiation sources
- C23C18/143—Radiation by light, e.g. photolysis or pyrolysis
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
- H01L21/0276—Photolithographic processes using an anti-reflective coating
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Thermal Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Inorganic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- Materials For Photolithography (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/930,711 US9201305B2 (en) | 2013-06-28 | 2013-06-28 | Spin-on compositions of soluble metal oxide carboxylates and methods of their use |
| PCT/EP2014/063593 WO2014207142A1 (en) | 2013-06-28 | 2014-06-26 | Spin-on compositions of soluble metal oxide carboxylates and methods of their use |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11201507487TA true SG11201507487TA (en) | 2015-10-29 |
Family
ID=51063419
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11201507487TA SG11201507487TA (en) | 2013-06-28 | 2014-06-26 | Spin-on compositions of soluble metal oxide carboxylates and methods of their use |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US9201305B2 (en) |
| EP (1) | EP3014358B1 (en) |
| JP (1) | JP6342998B2 (en) |
| KR (1) | KR102128141B1 (en) |
| CN (1) | CN105209973B (en) |
| SG (1) | SG11201507487TA (en) |
| TW (1) | TWI606098B (en) |
| WO (1) | WO2014207142A1 (en) |
Families Citing this family (24)
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| US9315636B2 (en) | 2012-12-07 | 2016-04-19 | Az Electronic Materials (Luxembourg) S.A.R.L. | Stable metal compounds, their compositions and methods |
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| US9499698B2 (en) * | 2015-02-11 | 2016-11-22 | Az Electronic Materials (Luxembourg)S.A.R.L. | Metal hardmask composition and processes for forming fine patterns on semiconductor substrates |
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| US10241409B2 (en) * | 2015-12-22 | 2019-03-26 | AZ Electronic Materials (Luxembourg) S.à.r.l. | Materials containing metal oxides, processes for making same, and processes for using same |
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Family Cites Families (108)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3035071A (en) | 1957-06-24 | 1962-05-15 | Du Pont | Titanium acylate silicone copolymers |
| US3474054A (en) | 1966-09-13 | 1969-10-21 | Permalac Corp The | Surface coating compositions containing pyridine salts or aromatic sulfonic acids |
| US3625934A (en) | 1968-07-02 | 1971-12-07 | Jacobus Rinse | Oligomers of mixed tetravalent element oxides |
| US3758269A (en) | 1971-10-12 | 1973-09-11 | Sybron Corp | Anionically modified nylon in a jute backed carpet cation dyes and long chain alkyl quaternary ammonium salt applied to |
| US4251665A (en) | 1978-05-22 | 1981-02-17 | King Industries, Inc. | Aromatic sulfonic acid oxa-azacyclopentane adducts |
| US4200729A (en) | 1978-05-22 | 1980-04-29 | King Industries, Inc | Curing amino resins with aromatic sulfonic acid oxa-azacyclopentane adducts |
| US4347347A (en) | 1979-06-28 | 1982-08-31 | Ube Industries, Ltd. | Crosslinked organometallic block copolymers and process for production thereof |
| JPS5694651A (en) * | 1979-12-28 | 1981-07-31 | Tokyo Denshi Kagaku Kabushiki | Manufacture of material for electronic parts |
| JPS56119774A (en) * | 1980-02-22 | 1981-09-19 | Tokyo Denshi Kagaku Kabushiki | Liquid composition for forming metal oxide coat |
| JPS56159223A (en) | 1980-05-13 | 1981-12-08 | Seishi Yajima | Production of heat-resistant compound |
| US4416789A (en) | 1982-02-01 | 1983-11-22 | Rca Corporation | High density information disc lubricants |
| US4491628A (en) | 1982-08-23 | 1985-01-01 | International Business Machines Corporation | Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone |
| US4526766A (en) | 1983-12-13 | 1985-07-02 | Erco Industries Limited | Production of red phosphorus |
| US4529766A (en) | 1984-06-08 | 1985-07-16 | The B. F. Goodrich Company | Carboxylated rubber composition containing scorch inhibitor |
| JPS61136683A (en) * | 1984-12-07 | 1986-06-24 | Fuji Photo Film Co Ltd | Production of thin hexagonal ferrite film |
| JPS6229016A (en) * | 1985-07-31 | 1987-02-07 | 双葉電子工業株式会社 | Transparent conductive film forming liquid |
| JPH0610353B2 (en) * | 1986-02-07 | 1994-02-09 | 富士写真フイルム株式会社 | Manufacturing method of hexagonal ferrite thin film |
| JPS6356529A (en) | 1986-08-27 | 1988-03-11 | Nissan Chem Ind Ltd | Novel titanosiloxane polymer and production thereof |
| JP2565501B2 (en) * | 1987-02-06 | 1996-12-18 | 白水化学工業株式会社 | Method for producing metal-containing composition for high temperature oxidation prevention of metal material |
| JPS63293178A (en) * | 1987-05-25 | 1988-11-30 | Hakusui Kagaku Kogyo Kk | Metal-containing composition for inhibiting oxidation of metallic material at high temperature and production thereof |
| JPS6452074A (en) * | 1987-08-24 | 1989-02-28 | Mitsubishi Electric Corp | Coating agent for forming oxide-based superconducting film |
| JPH0250973A (en) * | 1988-08-10 | 1990-02-20 | Osaka City | Golden product and its manufacturing method |
| US5178989A (en) | 1989-07-21 | 1993-01-12 | Board Of Regents, The University Of Texas System | Pattern forming and transferring processes |
| JPH03138922A (en) | 1989-10-24 | 1991-06-13 | Matsushita Electric Ind Co Ltd | Minute-pattern forming method |
| EP0440374B1 (en) | 1990-01-30 | 1997-04-16 | Wako Pure Chemical Industries Ltd | Chemical amplified resist material |
| US5187019A (en) | 1991-09-06 | 1993-02-16 | King Industries, Inc. | Latent catalysts |
| JPH0570717A (en) * | 1991-09-10 | 1993-03-23 | Japan Synthetic Rubber Co Ltd | Coating liquid for forming transparent conductive film |
| JPH0632756A (en) | 1992-07-14 | 1994-02-08 | Ube Ind Ltd | Production of bis@(3754/24)hydroxyphenyl)methanes |
| JP3542156B2 (en) | 1994-02-25 | 2004-07-14 | ダウ コーニング アジア株式会社 | Method for producing polytitanosiloxane soluble in organic solvent |
| US5563228A (en) | 1994-02-25 | 1996-10-08 | Dow Corning Asia, Ltd. | Method for the preparation of polyheterosiloxanes |
| AU710259B2 (en) * | 1994-08-11 | 1999-09-16 | Canon Kabushiki Kaisha | Solution for fabrication of electron-emitting devices, manufacture method of electron-emitting devices, and manufacture method of image-forming apparatus |
| JP3230395B2 (en) * | 1994-11-17 | 2001-11-19 | 三菱マテリアル株式会社 | Composition for forming conductive film and method for forming conductive film |
| US5843624A (en) | 1996-03-08 | 1998-12-01 | Lucent Technologies Inc. | Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material |
| US5772978A (en) | 1996-04-24 | 1998-06-30 | Minnesota Mining And Manufacturing Company | Process for producing tungsten oxide |
| US6808859B1 (en) | 1996-12-31 | 2004-10-26 | Hyundai Electronics Industries Co., Ltd. | ArF photoresist copolymers |
| US5879859A (en) | 1997-07-16 | 1999-03-09 | International Business Machines Corporation | Strippable photoimageable compositions |
| JPH11258813A (en) * | 1998-03-13 | 1999-09-24 | Jsr Corp | Composition for forming antireflection film and antireflection film |
| JP2000010293A (en) | 1998-06-17 | 2000-01-14 | Jsr Corp | Composition for forming antireflection film and antireflection film |
| US6849377B2 (en) | 1998-09-23 | 2005-02-01 | E. I. Du Pont De Nemours And Company | Photoresists, polymers and processes for microlithography |
| US6790587B1 (en) | 1999-05-04 | 2004-09-14 | E. I. Du Pont De Nemours And Company | Fluorinated polymers, photoresists and processes for microlithography |
| US6348299B1 (en) | 1999-07-12 | 2002-02-19 | International Business Machines Corporation | RIE etch resistant nonchemically amplified resist composition and use thereof |
| KR20030076228A (en) | 2000-06-21 | 2003-09-26 | 아사히 가라스 가부시키가이샤 | Resist composition |
| US6242156B1 (en) | 2000-06-28 | 2001-06-05 | Gary Ganghui Teng | Lithographic plate having a conformal radiation-sensitive layer on a rough substrate |
| US6447980B1 (en) | 2000-07-19 | 2002-09-10 | Clariant Finance (Bvi) Limited | Photoresist composition for deep UV and process thereof |
| US20020155389A1 (en) | 2000-10-24 | 2002-10-24 | Bharath Rangarajan | Inverse resist coating process |
| DE60223654T2 (en) | 2001-02-09 | 2008-10-30 | Asahi Glass Co., Ltd. | RESIST COMPOSITION |
| JP2002363490A (en) * | 2001-06-11 | 2002-12-18 | Jsr Corp | Composition for forming insulating film, method for forming film, and silica-based insulating film |
| US6723488B2 (en) | 2001-11-07 | 2004-04-20 | Clariant Finance (Bvi) Ltd | Photoresist composition for deep UV radiation containing an additive |
| US7455955B2 (en) | 2002-02-27 | 2008-11-25 | Brewer Science Inc. | Planarization method for multi-layer lithography processing |
| US6872506B2 (en) | 2002-06-25 | 2005-03-29 | Brewer Science Inc. | Wet-developable anti-reflective compositions |
| US6740469B2 (en) | 2002-06-25 | 2004-05-25 | Brewer Science Inc. | Developer-soluble metal alkoxide coatings for microelectronic applications |
| JP3580547B2 (en) * | 2002-09-30 | 2004-10-27 | 三井金属鉱業株式会社 | Alcohol concentration detection device, alcohol concentration detection method using the same, and method of manufacturing alcohol concentration detection sensor |
| JP2004179254A (en) | 2002-11-25 | 2004-06-24 | Renesas Technology Corp | Method for manufacturing semiconductor device |
| JP2004179391A (en) * | 2002-11-27 | 2004-06-24 | Tokyo Ohka Kogyo Co Ltd | Method for forming semiconductor multilayer wiring |
| US20040171743A1 (en) | 2003-01-21 | 2004-09-02 | Terry Brewer, Ph.D. | Hybrid organic-inorganic polymer coatings with high refractive indices |
| US7378453B2 (en) | 2003-03-14 | 2008-05-27 | Nippon Shokubai Co., Ltd. | Surface crosslinking treatment method of water-absorbing resin powder |
| US20040224616A1 (en) | 2003-04-25 | 2004-11-11 | Jsr Corporation | Polishing pad and chemical mechanical polishing method |
| DE10352139A1 (en) | 2003-11-04 | 2005-06-09 | Basell Polyolefine Gmbh | Organometallic transition metal compound used for catalyst system for polymerization of olefin, is new |
| JP4131864B2 (en) | 2003-11-25 | 2008-08-13 | 東京応化工業株式会社 | Chemical amplification type positive photosensitive thermosetting resin composition, method for forming cured product, and method for producing functional device |
| JP4488234B2 (en) | 2003-12-26 | 2010-06-23 | 日産化学工業株式会社 | Coating type nitride film forming composition for hard mask |
| JP4602971B2 (en) * | 2004-02-20 | 2010-12-22 | 日本曹達株式会社 | Photosensitive substrate and patterning method |
| JP4620967B2 (en) | 2004-04-26 | 2011-01-26 | 太陽ホールディングス株式会社 | Thermosetting resin composition for permanent hole filling |
| ITPG20040013A1 (en) * | 2004-04-30 | 2004-07-30 | Fuma Tech Gmbh | ORGANIC SOLUTIONS OF TETRAVALENT METAL PHOSPHATES AND PYROPHOSPHATES PRECURSORS AND THEIR USE FOR THE MODIFICATION OF ELECTRODES AND FOR THE PREPARATION OF COMPOSITE MEMBRANES FOR FUEL CELLS OPERATING AT TEMPERATURES> 900 CENTIGRADS AND / OR LOW |
| JP4461901B2 (en) | 2004-05-11 | 2010-05-12 | Ｔｄｋ株式会社 | Hologram recording material and hologram recording medium |
| KR101001441B1 (en) | 2004-08-17 | 2010-12-14 | 삼성전자주식회사 | Organic-inorganic metal hybrid material and organic insulator composition comprising same |
| JP4811757B2 (en) | 2004-09-30 | 2011-11-09 | 独立行政法人産業技術総合研究所 | Mesoporous metal oxide composite optical waveguide sensor, method for producing the same, and gas sensor using the same |
| US7563549B2 (en) | 2005-05-20 | 2009-07-21 | Xerox Corporation | Imaging member |
| KR101245541B1 (en) | 2005-06-03 | 2013-03-21 | 가부시키가이샤 구라레 | Gas barrier laminate, method for producing same and package body using same |
| KR100666477B1 (en) | 2005-06-16 | 2007-01-11 | 한국과학기술연구원 | Titanium oxide nanorods and preparation method thereof |
| US7326442B2 (en) | 2005-07-14 | 2008-02-05 | International Business Machines Corporation | Antireflective composition and process of making a lithographic structure |
| JP4437226B2 (en) | 2005-08-30 | 2010-03-24 | 国立大学法人 新潟大学 | Method for producing photocatalytic film |
| EP1925630B1 (en) | 2005-09-13 | 2014-11-05 | Nippon Steel & Sumikin Chemical Co., Ltd. | Thermosetting resin composition |
| JP5464855B2 (en) * | 2005-10-28 | 2014-04-09 | ダウ グローバル テクノロジーズ エルエルシー | Silsesquioxane-titania hybrid polymer |
| JP4553835B2 (en) | 2005-12-14 | 2010-09-29 | 信越化学工業株式会社 | Antireflection film material, pattern forming method using the same, and substrate |
| JP5117002B2 (en) * | 2006-07-10 | 2013-01-09 | 富士フイルム株式会社 | Photocurable composition and pattern forming method using the same |
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| JP4204611B2 (en) | 2006-09-25 | 2009-01-07 | 信越化学工業株式会社 | Photomask blank manufacturing method |
| US8168372B2 (en) | 2006-09-25 | 2012-05-01 | Brewer Science Inc. | Method of creating photolithographic structures with developer-trimmed hard mask |
| US7416834B2 (en) | 2006-09-27 | 2008-08-26 | Az Electronic Materials Usa Corp. | Antireflective coating compositions |
| FR2916199B1 (en) | 2007-05-14 | 2012-10-19 | Inst Francais Du Petrole | OLEFIN OLIGOMERIZATION METHOD USING A CATALYTIC COMPOSITION COMPRISING AN ORGANOMETALLIC COMPLEX CONTAINING A HETERO-ATOMIC FUNCTIONALIZED PHENOXY LIGAND |
| US8039201B2 (en) | 2007-11-21 | 2011-10-18 | Az Electronic Materials Usa Corp. | Antireflective coating composition and process thereof |
| JP5625210B2 (en) | 2007-12-27 | 2014-11-19 | ナガセケムテックス株式会社 | Curable composition |
| JP5512934B2 (en) * | 2008-05-09 | 2014-06-04 | 住友化学株式会社 | Sol comprising amorphous Zr-O-based particles as a dispersoid, method for producing the same, photocatalyst coating liquid using the sol as a binder, and method for producing a photocatalytic functional product coated with the photocatalyst coating liquid |
| JP5101541B2 (en) | 2008-05-15 | 2012-12-19 | 信越化学工業株式会社 | Pattern formation method |
| JP5503916B2 (en) | 2008-08-04 | 2014-05-28 | 富士フイルム株式会社 | Resist composition and pattern forming method using the same |
| WO2010021030A1 (en) | 2008-08-20 | 2010-02-25 | 富士通株式会社 | Material for resist sensitization film formation, process for producing semiconductor device, semiconductor device, and magnetic head |
| JP5336306B2 (en) | 2008-10-20 | 2013-11-06 | 信越化学工業株式会社 | Resist underlayer film forming method, pattern forming method using the same, and resist underlayer film material |
| WO2010047109A1 (en) | 2008-10-23 | 2010-04-29 | 国立大学法人三重大学 | Polyorganosiloxane composition and cured product thereof |
| EP2477738B1 (en) | 2009-09-15 | 2019-01-23 | Basf Se | Photo-latent titanium-chelate catalysts |
| JP5534250B2 (en) | 2009-09-16 | 2014-06-25 | 日産化学工業株式会社 | Silicon-containing resist underlayer film forming composition having sulfonamide group |
| JP5721992B2 (en) | 2009-10-14 | 2015-05-20 | 富士フイルム株式会社 | Colored curable composition, resist solution, ink-jet ink, color filter, method for producing color filter, solid-state imaging device, liquid crystal display, organic EL display, image display device, and dye compound |
| EP2536871A4 (en) | 2010-02-15 | 2013-12-18 | Univ Cornell | ELECTROSPINNING DEVICE AND NANO FIBERS MANUFACTURED THEREOF |
| EP2400304A1 (en) | 2010-06-22 | 2011-12-28 | Centro de Investigación Cooperativa En Biomateriales ( CIC biomaGUNE) | Method for the characterization of intermolecular interactions |
| JP5266294B2 (en) | 2010-11-01 | 2013-08-21 | 信越化学工業株式会社 | Resist underlayer film material and pattern forming method using the same |
| JP5831463B2 (en) | 2011-01-18 | 2015-12-09 | 日立化成株式会社 | Resin composition, prepreg, laminate and printed wiring board using the same |
| US9281207B2 (en) | 2011-02-28 | 2016-03-08 | Inpria Corporation | Solution processible hardmasks for high resolution lithography |
| JP5825177B2 (en) * | 2011-03-30 | 2015-12-02 | Jsr株式会社 | Inorganic film forming composition for multilayer resist process and pattern forming method |
| JP2012237823A (en) | 2011-05-10 | 2012-12-06 | Konica Minolta Business Technologies Inc | Electrophotographic photoreceptor, process cartridge and image forming apparatus including the same |
| JP2014518944A (en) | 2011-05-13 | 2014-08-07 | グリーンセンター カナダ | Group 11 monometallic precursor compounds and their use in metal deposition |
| US8568958B2 (en) | 2011-06-21 | 2013-10-29 | Az Electronic Materials Usa Corp. | Underlayer composition and process thereof |
| US8647809B2 (en) * | 2011-07-07 | 2014-02-11 | Brewer Science Inc. | Metal-oxide films from small molecules for lithographic applications |
| JP5889568B2 (en) | 2011-08-11 | 2016-03-22 | メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ ＧｍｂＨ | Composition for forming tungsten oxide film and method for producing tungsten oxide film using the same |
| US9315636B2 (en) | 2012-12-07 | 2016-04-19 | Az Electronic Materials (Luxembourg) S.A.R.L. | Stable metal compounds, their compositions and methods |
| JP5830048B2 (en) | 2013-03-15 | 2015-12-09 | 信越化学工業株式会社 | Titanium-containing resist underlayer film forming composition and pattern forming method |
| US20150024522A1 (en) | 2013-07-22 | 2015-01-22 | Rohm And Haas Electronic Materials Llc | Organometal materials and process |
| US9296922B2 (en) | 2013-08-30 | 2016-03-29 | Az Electronic Materials (Luxembourg) S.A.R.L. | Stable metal compounds as hardmasks and filling materials, their compositions and methods of use |
| US9418836B2 (en) | 2014-01-14 | 2016-08-16 | Az Electronic Materials (Luxembourg) S.A.R.L. | Polyoxometalate and heteropolyoxometalate compositions and methods for their use |
| US9409793B2 (en) | 2014-01-14 | 2016-08-09 | Az Electronic Materials (Luxembourg) S.A.R.L. | Spin coatable metallic hard mask compositions and processes thereof |
-
2013
- 2013-06-28 US US13/930,711 patent/US9201305B2/en active Active
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2014
- 2014-06-26 CN CN201480026104.8A patent/CN105209973B/en active Active
- 2014-06-26 KR KR1020157035429A patent/KR102128141B1/en active Active
- 2014-06-26 SG SG11201507487TA patent/SG11201507487TA/en unknown
- 2014-06-26 JP JP2016522511A patent/JP6342998B2/en active Active
- 2014-06-26 WO PCT/EP2014/063593 patent/WO2014207142A1/en not_active Ceased
- 2014-06-26 EP EP14735520.0A patent/EP3014358B1/en active Active
- 2014-06-27 TW TW103122416A patent/TWI606098B/en active
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| US9201305B2 (en) | 2015-12-01 |
| EP3014358B1 (en) | 2017-08-16 |
| CN105209973A (en) | 2015-12-30 |
| JP2016532739A (en) | 2016-10-20 |
| TW201512325A (en) | 2015-04-01 |
| KR20160025508A (en) | 2016-03-08 |
| CN105209973B (en) | 2019-08-13 |
| KR102128141B1 (en) | 2020-06-30 |
| EP3014358A1 (en) | 2016-05-04 |
| JP6342998B2 (en) | 2018-06-13 |
| TWI606098B (en) | 2017-11-21 |
| US20150004801A1 (en) | 2015-01-01 |
| WO2014207142A1 (en) | 2014-12-31 |
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