SG11201503659QA - Method and apparatus for cleaning semiconductor wafer - Google Patents
Method and apparatus for cleaning semiconductor waferInfo
- Publication number
- SG11201503659QA SG11201503659QA SG11201503659QA SG11201503659QA SG11201503659QA SG 11201503659Q A SG11201503659Q A SG 11201503659QA SG 11201503659Q A SG11201503659Q A SG 11201503659QA SG 11201503659Q A SG11201503659Q A SG 11201503659QA SG 11201503659Q A SG11201503659Q A SG 11201503659QA
- Authority
- SG
- Singapore
- Prior art keywords
- semiconductor wafer
- cleaning semiconductor
- cleaning
- wafer
- semiconductor
- Prior art date
Links
- 238000004140 cleaning Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
- H01L21/67781—Batch transfer of wafers
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/CN2012/085403 WO2014082212A1 (en) | 2012-11-28 | 2012-11-28 | Method and apparatus for cleaning semiconductor wafer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11201503659QA true SG11201503659QA (en) | 2015-06-29 |
Family
ID=50827023
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11201503659QA SG11201503659QA (en) | 2012-11-28 | 2012-11-28 | Method and apparatus for cleaning semiconductor wafer |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US10297472B2 (en) |
| JP (1) | JP6275155B2 (en) |
| KR (1) | KR101992660B1 (en) |
| CN (1) | CN104813438B (en) |
| SG (1) | SG11201503659QA (en) |
| WO (1) | WO2014082212A1 (en) |
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-
2012
- 2012-11-28 CN CN201280077256.1A patent/CN104813438B/en active Active
- 2012-11-28 JP JP2015544287A patent/JP6275155B2/en active Active
- 2012-11-28 SG SG11201503659QA patent/SG11201503659QA/en unknown
- 2012-11-28 KR KR1020157012686A patent/KR101992660B1/en active Active
- 2012-11-28 WO PCT/CN2012/085403 patent/WO2014082212A1/en not_active Ceased
- 2012-11-28 US US14/647,996 patent/US10297472B2/en active Active
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2019
- 2019-04-08 US US16/377,894 patent/US11462423B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP2016502275A (en) | 2016-01-21 |
| WO2014082212A1 (en) | 2014-06-05 |
| KR20150088792A (en) | 2015-08-03 |
| US20190273003A1 (en) | 2019-09-05 |
| US11462423B2 (en) | 2022-10-04 |
| CN104813438A (en) | 2015-07-29 |
| US20150332940A1 (en) | 2015-11-19 |
| US10297472B2 (en) | 2019-05-21 |
| KR101992660B1 (en) | 2019-09-30 |
| JP6275155B2 (en) | 2018-02-07 |
| CN104813438B (en) | 2017-07-25 |
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