SG10201912304WA - Electronic device and method of fabricating the same - Google Patents
Electronic device and method of fabricating the sameInfo
- Publication number
- SG10201912304WA SG10201912304WA SG10201912304WA SG10201912304WA SG10201912304WA SG 10201912304W A SG10201912304W A SG 10201912304WA SG 10201912304W A SG10201912304W A SG 10201912304WA SG 10201912304W A SG10201912304W A SG 10201912304WA SG 10201912304W A SG10201912304W A SG 10201912304WA
- Authority
- SG
- Singapore
- Prior art keywords
- fabricating
- same
- electronic device
- electronic
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B63/00—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
- H10B63/80—Arrangements comprising multiple bistable or multi-stable switching components of the same type on a plane parallel to the substrate, e.g. cross-point arrays
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/5228—Resistive arrangements or effects of, or between, wiring layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/801—Constructional details of multistable switching devices
- H10N70/821—Device geometry
- H10N70/826—Device geometry adapted for essentially vertical current flow, e.g. sandwich or pillar type devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76886—Modifying permanently or temporarily the pattern or the conductivity of conductive members, e.g. formation of alloys, reduction of contact resistances
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/5226—Via connections in a multilevel interconnection structure
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B63/00—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
- H10B63/20—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices comprising selection components having two electrodes, e.g. diodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B63/00—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
- H10B63/20—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices comprising selection components having two electrodes, e.g. diodes
- H10B63/24—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices comprising selection components having two electrodes, e.g. diodes of the Ovonic threshold switching type
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/80—Constructional details
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/011—Manufacture or treatment of multistable switching devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/801—Constructional details of multistable switching devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/801—Constructional details of multistable switching devices
- H10N70/841—Electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/801—Constructional details of multistable switching devices
- H10N70/881—Switching materials
- H10N70/883—Oxides or nitrides
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Semiconductor Memories (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020190041000A KR102706732B1 (en) | 2019-04-08 | 2019-04-08 | Electronic device and method for fabricating the same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG10201912304WA true SG10201912304WA (en) | 2020-11-27 |
Family
ID=71993870
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG10201912304WA SG10201912304WA (en) | 2019-04-08 | 2019-12-16 | Electronic device and method of fabricating the same |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US10741491B1 (en) |
| KR (1) | KR102706732B1 (en) |
| CN (1) | CN111799295B (en) |
| SG (1) | SG10201912304WA (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2023137693A (en) * | 2022-03-18 | 2023-09-29 | キオクシア株式会社 | Memory device |
| TWI880169B (en) * | 2022-03-18 | 2025-04-11 | 日商鎧俠股份有限公司 | Memory device |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5148025B1 (en) * | 1970-05-04 | 1976-12-18 | ||
| KR101213702B1 (en) * | 2006-04-21 | 2012-12-18 | 삼성전자주식회사 | Non-volatile memory device having a pair of fins between which a void is defined |
| KR20080029608A (en) | 2006-09-29 | 2008-04-03 | 주식회사 하이닉스반도체 | Method for forming contact plug of semiconductor device |
| US7663134B2 (en) * | 2007-07-10 | 2010-02-16 | Taiwan Semiconductor Manufacturing Company, Ltd. | Memory array with a selector connected to multiple resistive cells |
| KR101067051B1 (en) * | 2007-11-29 | 2011-09-22 | 파나소닉 주식회사 | Nonvolatile Memory and Manufacturing Method Thereof |
| JP4598147B2 (en) * | 2007-12-10 | 2010-12-15 | パナソニック株式会社 | Nonvolatile memory device and manufacturing method thereof |
| KR101753256B1 (en) | 2010-10-14 | 2017-07-05 | 삼성전자주식회사 | Semiconductor deivces having a variable resistor and methods of fabricating the same |
| US8889478B2 (en) * | 2010-11-19 | 2014-11-18 | Panasonic Corporation | Method for manufacturing nonvolatile semiconductor memory element, and nonvolatile semiconductor memory element |
| JP2012204399A (en) * | 2011-03-23 | 2012-10-22 | Toshiba Corp | Resistance change memory |
| JP2013197536A (en) * | 2012-03-22 | 2013-09-30 | Toshiba Corp | Semiconductor memory device |
| KR101934013B1 (en) * | 2012-03-27 | 2018-12-31 | 에스케이하이닉스 주식회사 | Resistance variable memory device |
| CN105226051B (en) * | 2014-05-30 | 2018-06-29 | 中芯国际集成电路制造(上海)有限公司 | Semi-conductor test structure and conductive plunger and the detection method of active region contact performance |
| KR102275540B1 (en) * | 2014-12-18 | 2021-07-13 | 삼성전자주식회사 | Variable Resistance memory device |
| CN107039443B (en) * | 2015-07-23 | 2019-09-03 | 旺宏电子股份有限公司 | Memory element and manufacturing method thereof |
| KR20170045871A (en) * | 2015-10-20 | 2017-04-28 | 에스케이하이닉스 주식회사 | Electronic device and method for fabricating the same |
-
2019
- 2019-04-08 KR KR1020190041000A patent/KR102706732B1/en active Active
- 2019-08-12 US US16/538,690 patent/US10741491B1/en active Active
- 2019-11-29 CN CN201911199764.7A patent/CN111799295B/en active Active
- 2019-12-16 SG SG10201912304WA patent/SG10201912304WA/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| KR20200118705A (en) | 2020-10-16 |
| CN111799295B (en) | 2024-04-26 |
| KR102706732B1 (en) | 2024-09-19 |
| CN111799295A (en) | 2020-10-20 |
| US10741491B1 (en) | 2020-08-11 |
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