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SG10201912304WA - Electronic device and method of fabricating the same - Google Patents

Electronic device and method of fabricating the same

Info

Publication number
SG10201912304WA
SG10201912304WA SG10201912304WA SG10201912304WA SG10201912304WA SG 10201912304W A SG10201912304W A SG 10201912304WA SG 10201912304W A SG10201912304W A SG 10201912304WA SG 10201912304W A SG10201912304W A SG 10201912304WA SG 10201912304W A SG10201912304W A SG 10201912304WA
Authority
SG
Singapore
Prior art keywords
fabricating
same
electronic device
electronic
Prior art date
Application number
SG10201912304WA
Inventor
Woo Cho Han
Original Assignee
Sk Hynix Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sk Hynix Inc filed Critical Sk Hynix Inc
Publication of SG10201912304WA publication Critical patent/SG10201912304WA/en

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B63/00Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
    • H10B63/80Arrangements comprising multiple bistable or multi-stable switching components of the same type on a plane parallel to the substrate, e.g. cross-point arrays
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/5228Resistive arrangements or effects of, or between, wiring layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801Constructional details of multistable switching devices
    • H10N70/821Device geometry
    • H10N70/826Device geometry adapted for essentially vertical current flow, e.g. sandwich or pillar type devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76838Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
    • H01L21/76886Modifying permanently or temporarily the pattern or the conductivity of conductive members, e.g. formation of alloys, reduction of contact resistances
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/5226Via connections in a multilevel interconnection structure
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B63/00Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
    • H10B63/20Resistance change memory devices, e.g. resistive RAM [ReRAM] devices comprising selection components having two electrodes, e.g. diodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B63/00Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
    • H10B63/20Resistance change memory devices, e.g. resistive RAM [ReRAM] devices comprising selection components having two electrodes, e.g. diodes
    • H10B63/24Resistance change memory devices, e.g. resistive RAM [ReRAM] devices comprising selection components having two electrodes, e.g. diodes of the Ovonic threshold switching type
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00Galvanomagnetic devices
    • H10N50/80Constructional details
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/011Manufacture or treatment of multistable switching devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801Constructional details of multistable switching devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801Constructional details of multistable switching devices
    • H10N70/841Electrodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801Constructional details of multistable switching devices
    • H10N70/881Switching materials
    • H10N70/883Oxides or nitrides

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Semiconductor Memories (AREA)
SG10201912304WA 2019-04-08 2019-12-16 Electronic device and method of fabricating the same SG10201912304WA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020190041000A KR102706732B1 (en) 2019-04-08 2019-04-08 Electronic device and method for fabricating the same

Publications (1)

Publication Number Publication Date
SG10201912304WA true SG10201912304WA (en) 2020-11-27

Family

ID=71993870

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201912304WA SG10201912304WA (en) 2019-04-08 2019-12-16 Electronic device and method of fabricating the same

Country Status (4)

Country Link
US (1) US10741491B1 (en)
KR (1) KR102706732B1 (en)
CN (1) CN111799295B (en)
SG (1) SG10201912304WA (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023137693A (en) * 2022-03-18 2023-09-29 キオクシア株式会社 Memory device
TWI880169B (en) * 2022-03-18 2025-04-11 日商鎧俠股份有限公司 Memory device

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5148025B1 (en) * 1970-05-04 1976-12-18
KR101213702B1 (en) * 2006-04-21 2012-12-18 삼성전자주식회사 Non-volatile memory device having a pair of fins between which a void is defined
KR20080029608A (en) 2006-09-29 2008-04-03 주식회사 하이닉스반도체 Method for forming contact plug of semiconductor device
US7663134B2 (en) * 2007-07-10 2010-02-16 Taiwan Semiconductor Manufacturing Company, Ltd. Memory array with a selector connected to multiple resistive cells
KR101067051B1 (en) * 2007-11-29 2011-09-22 파나소닉 주식회사 Nonvolatile Memory and Manufacturing Method Thereof
JP4598147B2 (en) * 2007-12-10 2010-12-15 パナソニック株式会社 Nonvolatile memory device and manufacturing method thereof
KR101753256B1 (en) 2010-10-14 2017-07-05 삼성전자주식회사 Semiconductor deivces having a variable resistor and methods of fabricating the same
US8889478B2 (en) * 2010-11-19 2014-11-18 Panasonic Corporation Method for manufacturing nonvolatile semiconductor memory element, and nonvolatile semiconductor memory element
JP2012204399A (en) * 2011-03-23 2012-10-22 Toshiba Corp Resistance change memory
JP2013197536A (en) * 2012-03-22 2013-09-30 Toshiba Corp Semiconductor memory device
KR101934013B1 (en) * 2012-03-27 2018-12-31 에스케이하이닉스 주식회사 Resistance variable memory device
CN105226051B (en) * 2014-05-30 2018-06-29 中芯国际集成电路制造(上海)有限公司 Semi-conductor test structure and conductive plunger and the detection method of active region contact performance
KR102275540B1 (en) * 2014-12-18 2021-07-13 삼성전자주식회사 Variable Resistance memory device
CN107039443B (en) * 2015-07-23 2019-09-03 旺宏电子股份有限公司 Memory element and manufacturing method thereof
KR20170045871A (en) * 2015-10-20 2017-04-28 에스케이하이닉스 주식회사 Electronic device and method for fabricating the same

Also Published As

Publication number Publication date
KR20200118705A (en) 2020-10-16
CN111799295B (en) 2024-04-26
KR102706732B1 (en) 2024-09-19
CN111799295A (en) 2020-10-20
US10741491B1 (en) 2020-08-11

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