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SG10201709477TA - Imprint apparatus, imprinting method, and method for manufacturing article - Google Patents

Imprint apparatus, imprinting method, and method for manufacturing article

Info

Publication number
SG10201709477TA
SG10201709477TA SG10201709477TA SG10201709477TA SG10201709477TA SG 10201709477T A SG10201709477T A SG 10201709477TA SG 10201709477T A SG10201709477T A SG 10201709477TA SG 10201709477T A SG10201709477T A SG 10201709477TA SG 10201709477T A SG10201709477T A SG 10201709477TA
Authority
SG
Singapore
Prior art keywords
substrate
imprint apparatus
shot area
manufacturing article
imprinting
Prior art date
Application number
SG10201709477TA
Inventor
Sato Kazuhiro
Miyaharu Takafumi
Original Assignee
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Kk filed Critical Canon Kk
Publication of SG10201709477TA publication Critical patent/SG10201709477TA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C37/00—Component parts, details, accessories or auxiliary operations, not covered by group B29C33/00 or B29C35/00
    • B29C37/0025—Applying surface layers, e.g. coatings, decorative layers, printed layers, to articles during shaping, e.g. in-mould printing
    • B29C37/0028—In-mould coating, e.g. by introducing the coating material into the mould after forming the article
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C37/00—Component parts, details, accessories or auxiliary operations, not covered by group B29C33/00 or B29C35/00
    • B29C37/0025—Applying surface layers, e.g. coatings, decorative layers, printed layers, to articles during shaping, e.g. in-mould printing
    • B29C37/0028—In-mould coating, e.g. by introducing the coating material into the mould after forming the article
    • B29C2037/0046—In-mould printing, in-mould transfer printing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

IMPRINT APPARATUS, IMPRINTING METHOD, AND METHOD FOR MANUFACTURING ARTICLE An imprint apparatus forms a pattern of an imprint material in a shot area of the substrate using the mold, and includes a heating mechanism that changes a shape of the substrate by irradiating the shot area of the substrate with light, wherein the heating mechanism includes a plurality of optical modulators that forms an illuminance distribution in the shot area of the substrate, and light beams from the plurality of optical modulators illuminate mutually different areas of the shot area. (Figure 1)
SG10201709477TA 2016-11-30 2017-11-17 Imprint apparatus, imprinting method, and method for manufacturing article SG10201709477TA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2016233247A JP6827785B2 (en) 2016-11-30 2016-11-30 Imprinting equipment, imprinting methods, and manufacturing methods for articles

Publications (1)

Publication Number Publication Date
SG10201709477TA true SG10201709477TA (en) 2018-06-28

Family

ID=62190802

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201709477TA SG10201709477TA (en) 2016-11-30 2017-11-17 Imprint apparatus, imprinting method, and method for manufacturing article

Country Status (6)

Country Link
US (1) US11204548B2 (en)
JP (1) JP6827785B2 (en)
KR (1) KR102282089B1 (en)
CN (1) CN108121155B (en)
SG (1) SG10201709477TA (en)
TW (1) TWI668734B (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3620856A1 (en) * 2018-09-10 2020-03-11 Canon Kabushiki Kaisha Imprint method and article manufacturing method
EP4398040A3 (en) 2018-11-08 2025-07-02 Canon Kabushiki Kaisha Imprint apparatus and product manufacturing method
JP7289633B2 (en) * 2018-11-08 2023-06-12 キヤノン株式会社 Imprint apparatus and article manufacturing method
JP7267801B2 (en) * 2019-03-26 2023-05-02 キヤノン株式会社 IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD
JP7379091B2 (en) * 2019-10-30 2023-11-14 キヤノン株式会社 Imprint device, imprint method, and article manufacturing method
US11366384B2 (en) * 2019-12-18 2022-06-21 Canon Kabushiki Kaisha Nanoimprint lithography system and method for adjusting a radiation pattern that compensates for slippage of a template
US11199774B2 (en) * 2020-03-30 2021-12-14 Canon Kabushiki Kaisha Method and apparatus to improve frame cure imaging resolution for extrusion control
US11747731B2 (en) * 2020-11-20 2023-09-05 Canon Kabishiki Kaisha Curing a shaped film using multiple images of a spatial light modulator

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3528364B2 (en) 1995-10-18 2004-05-17 ソニー株式会社 Laser beam synthesizing apparatus, synthesizing method, laser engraving apparatus, and laser engraving method
JP2002122945A (en) 2000-10-18 2002-04-26 Noritsu Koki Co Ltd Digital exposure apparatus and photographic processing apparatus having the same
TW529172B (en) * 2001-07-24 2003-04-21 Asml Netherlands Bv Imaging apparatus
US7153616B2 (en) 2004-03-31 2006-12-26 Asml Holding N.V. System and method for verifying and controlling the performance of a maskless lithography tool
JP4958614B2 (en) * 2006-04-18 2012-06-20 キヤノン株式会社 Pattern transfer apparatus, imprint apparatus, pattern transfer method, and alignment apparatus
WO2007142350A1 (en) * 2006-06-09 2007-12-13 Nikon Corporation Pattern formation method, pattern formation device, exposure method, exposure device, and device manufacturing method
KR101360160B1 (en) 2006-11-22 2014-02-12 엘아이지에이디피 주식회사 Apparatus for forming a nano-pattern and method using the same
KR101492287B1 (en) 2007-03-27 2015-02-11 칼 짜이스 에스엠테 게엠베하 Correction of optical elements by means of correction light emitted in a flat manner
WO2009153925A1 (en) * 2008-06-17 2009-12-23 株式会社ニコン Nano-imprint method and apparatus
US8345242B2 (en) * 2008-10-28 2013-01-01 Molecular Imprints, Inc. Optical system for use in stage control
JP2011248327A (en) * 2010-04-27 2011-12-08 Panasonic Corp Illumination device and projection type display apparatus provided therewith
CN102696157B (en) 2010-07-30 2014-03-05 索尼公司 Light source unit, lighting device and display
JP5713961B2 (en) 2011-06-21 2015-05-07 キヤノン株式会社 Position detection apparatus, imprint apparatus, and position detection method
JP5932286B2 (en) * 2011-10-14 2016-06-08 キヤノン株式会社 Imprint apparatus and article manufacturing method using the same
JP5686779B2 (en) * 2011-10-14 2015-03-18 キヤノン株式会社 Imprint apparatus and article manufacturing method using the same
JP2013175604A (en) 2012-02-24 2013-09-05 Toshiba Corp Pattern forming device, pattern forming method, and method for manufacturing semiconductor device
JP6076618B2 (en) 2012-05-14 2017-02-08 アストロデザイン株式会社 Optical resolution improvement device
CN103962079B (en) * 2013-01-28 2017-11-17 西门子公司 Heater and the equipment for chemically reacting
WO2014139543A1 (en) * 2013-03-13 2014-09-18 Carl Zeiss Smt Gmbh Microlithographic apparatus
JP6418773B2 (en) 2013-05-14 2018-11-07 キヤノン株式会社 Imprint apparatus, imprint method, and article manufacturing method
JP2015005676A (en) * 2013-06-22 2015-01-08 株式会社ニコン Illumination optical system, illumination optical apparatus, exposure apparatus, and device manufacturing method
JP6329353B2 (en) 2013-10-01 2018-05-23 キヤノン株式会社 Imprint apparatus and article manufacturing method
JP6336275B2 (en) * 2013-12-26 2018-06-06 キヤノン株式会社 Imprint apparatus and article manufacturing method
JP6294680B2 (en) * 2014-01-24 2018-03-14 キヤノン株式会社 Imprint apparatus and article manufacturing method
CN106255925B (en) 2014-05-02 2019-03-15 Asml荷兰有限公司 Reduction of hot spots for dense features
JP2016042498A (en) * 2014-08-13 2016-03-31 キヤノン株式会社 Imprint device and goods production method
US20170210036A1 (en) * 2016-01-22 2017-07-27 Canon Kabushiki Kaisha Mold replicating method, imprint apparatus, and article manufacturing method
US11175598B2 (en) * 2017-06-30 2021-11-16 Canon Kabushiki Kaisha Imprint apparatus and method of manufacturing article

Also Published As

Publication number Publication date
CN108121155B (en) 2022-06-03
TW201822250A (en) 2018-06-16
US20180149969A1 (en) 2018-05-31
CN108121155A (en) 2018-06-05
JP6827785B2 (en) 2021-02-10
JP2018092997A (en) 2018-06-14
TWI668734B (en) 2019-08-11
US11204548B2 (en) 2021-12-21
KR20180062391A (en) 2018-06-08
KR102282089B1 (en) 2021-07-27

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