SG10201707291RA - Polishing apparatus and polishing method - Google Patents
Polishing apparatus and polishing methodInfo
- Publication number
- SG10201707291RA SG10201707291RA SG10201707291RA SG10201707291RA SG10201707291RA SG 10201707291R A SG10201707291R A SG 10201707291RA SG 10201707291R A SG10201707291R A SG 10201707291RA SG 10201707291R A SG10201707291R A SG 10201707291RA SG 10201707291R A SG10201707291R A SG 10201707291RA
- Authority
- SG
- Singapore
- Prior art keywords
- polishing
- polishing apparatus
- polishing method
- Prior art date
Links
- 238000005498 polishing Methods 0.000 title 2
- 238000000034 method Methods 0.000 title 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/005—Control means for lapping machines or devices
- B24B37/013—Devices or means for detecting lapping completion
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
- B24B37/10—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping
- B24B37/105—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping the workpieces or work carriers being actively moved by a drive, e.g. in a combined rotary and translatory movement
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/005—Control means for lapping machines or devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
- B24B37/10—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/27—Work carriers
- B24B37/30—Work carriers for single side lapping of plane surfaces
- B24B37/32—Retaining rings
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/34—Accessories
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/34—Accessories
- B24B37/345—Feeding, loading or unloading work specially adapted to lapping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/10—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving electrical means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/10—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving electrical means
- B24B49/105—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving electrical means using eddy currents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/12—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/16—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation taking regard of the load
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
- B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
- Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Disintegrating Or Milling (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016193641 | 2016-09-30 | ||
| JP2017074167A JP6357260B2 (en) | 2016-09-30 | 2017-04-04 | Polishing apparatus and polishing method |
| JP2017091152A JP6227821B1 (en) | 2016-09-30 | 2017-05-01 | Polishing apparatus and polishing method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG10201707291RA true SG10201707291RA (en) | 2018-04-27 |
Family
ID=60265848
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG10201707291RA SG10201707291RA (en) | 2016-09-30 | 2017-09-07 | Polishing apparatus and polishing method |
Country Status (6)
| Country | Link |
|---|---|
| US (3) | US10688620B2 (en) |
| JP (5) | JP6357260B2 (en) |
| KR (4) | KR102399251B1 (en) |
| CN (3) | CN113001396B (en) |
| SG (1) | SG10201707291RA (en) |
| TW (2) | TWI776509B (en) |
Families Citing this family (51)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102584066B1 (en) * | 2016-03-14 | 2023-09-27 | 도쿄엘렉트론가부시키가이샤 | Substrate processing apparatus, substrate processing method, and computer-readable recording medium |
| JP6357260B2 (en) * | 2016-09-30 | 2018-07-11 | 株式会社荏原製作所 | Polishing apparatus and polishing method |
| JP7098311B2 (en) * | 2017-12-05 | 2022-07-11 | 株式会社荏原製作所 | Polishing equipment and polishing method |
| JP6970601B2 (en) * | 2017-12-06 | 2021-11-24 | 株式会社荏原製作所 | How to design semiconductor manufacturing equipment |
| TWI759595B (en) * | 2018-05-11 | 2022-04-01 | 日商東京威力科創股份有限公司 | Substrate processing system and substrate processing method |
| CN110504186B (en) * | 2018-05-16 | 2022-01-18 | 台湾积体电路制造股份有限公司 | Method for monitoring condition of semiconductor manufacturing machine and semiconductor manufacturing system |
| JP2019198938A (en) * | 2018-05-18 | 2019-11-21 | 株式会社荏原製作所 | Method for detecting polished surface of polishing pad by using polishing head, and polishing device |
| JP7117171B2 (en) * | 2018-06-20 | 2022-08-12 | 株式会社荏原製作所 | Polishing apparatus, polishing method, and polishing control program |
| JP7083279B2 (en) * | 2018-06-22 | 2022-06-10 | 株式会社荏原製作所 | How to identify the trajectory of the eddy current sensor, how to calculate the progress of polishing the substrate, how to stop the operation of the substrate polishing device and how to equalize the progress of polishing the substrate, to execute these methods. The program and the non-transient recording medium on which the program is recorded |
| US11312015B2 (en) * | 2018-09-10 | 2022-04-26 | Reliabotics LLC | System and method for controlling the contact pressure applied by an articulated robotic arm to a working surface |
| JP2020053550A (en) * | 2018-09-27 | 2020-04-02 | 株式会社荏原製作所 | Polishing device, polishing method, and machine learning device |
| US11731232B2 (en) * | 2018-10-30 | 2023-08-22 | Taiwan Semiconductor Manufacturing Company, Ltd. | Irregular mechanical motion detection systems and method |
| CN109500712A (en) * | 2018-12-14 | 2019-03-22 | 北京半导体专用设备研究所(中国电子科技集团公司第四十五研究所) | Burnishing device and semiconductor crystal wafer flattening device |
| KR102708233B1 (en) * | 2019-02-15 | 2024-09-23 | 주식회사 케이씨텍 | Substrate polishing system |
| JP7155035B2 (en) * | 2019-02-18 | 2022-10-18 | 株式会社荏原製作所 | Polishing device and polishing method |
| JP7570004B2 (en) | 2019-02-19 | 2024-10-21 | パナソニックIpマネジメント株式会社 | Polishing system, learning device, and learning method for learning device |
| JP7160725B2 (en) * | 2019-03-06 | 2022-10-25 | 株式会社荏原製作所 | Substrate processing equipment |
| BR112021019580A2 (en) | 2019-03-29 | 2021-12-14 | Saint Gobain Abrasifs Sa | Performance of grinding solutions |
| CN110227990A (en) * | 2019-05-07 | 2019-09-13 | 重庆市璧山区宗辉机械有限公司 | A kind of intelligent blade milling drum |
| TW202044394A (en) * | 2019-05-22 | 2020-12-01 | 日商荏原製作所股份有限公司 | Substrate processing system |
| KR102262800B1 (en) * | 2019-07-10 | 2021-06-09 | 주식회사 에스피에스테크 | Spin base structure for CMP apparatus |
| JP2021028099A (en) * | 2019-08-09 | 2021-02-25 | 株式会社荏原製作所 | Endpoint detection device, endpoint detection method |
| JP7403998B2 (en) * | 2019-08-29 | 2023-12-25 | 株式会社荏原製作所 | Polishing equipment and polishing method |
| JP7374710B2 (en) * | 2019-10-25 | 2023-11-07 | 株式会社荏原製作所 | Polishing method and polishing device |
| CN110842742A (en) * | 2019-11-21 | 2020-02-28 | 苏州亮宇模具科技有限公司 | Grinding and polishing equipment capable of forming high-efficiency high-flatness and grinding and polishing method |
| JP2021091039A (en) * | 2019-12-10 | 2021-06-17 | 株式会社荏原製作所 | Processing unit and substrate treatment apparatus |
| JP7390945B2 (en) | 2020-03-19 | 2023-12-04 | 株式会社荏原製作所 | Polishing equipment, information processing system and program |
| JP7636141B2 (en) * | 2020-06-09 | 2025-02-26 | 株式会社ディスコ | Grinding Equipment |
| JP7443169B2 (en) * | 2020-06-29 | 2024-03-05 | 株式会社荏原製作所 | A storage medium storing a substrate processing apparatus, a substrate processing method, and a program for causing a computer of the substrate processing apparatus to execute the substrate processing method. |
| JP7705444B2 (en) | 2020-07-14 | 2025-07-09 | アプライド マテリアルズ インコーポレイテッド | Method for detecting non-compliant substrate processing events during chemical mechanical polishing - Patents.com |
| CN111843675B (en) * | 2020-07-15 | 2021-09-07 | 郑州龙华机电工程有限公司 | An online monitoring system for power equipment |
| CN113970370B (en) * | 2020-07-24 | 2024-02-02 | 泉芯集成电路制造(济南)有限公司 | Vibration monitoring system and vibration monitoring method of grinding platform |
| JP7421460B2 (en) * | 2020-09-29 | 2024-01-24 | 株式会社荏原製作所 | Polishing equipment and how to determine when to replace polishing pads |
| WO2022086672A1 (en) * | 2020-10-21 | 2022-04-28 | Applied Materials, Inc. | Sequential application of cleaning fluids for improved maintenance of chemical mechanical polishing systems |
| KR102794221B1 (en) * | 2020-11-19 | 2025-04-15 | 주식회사 케이씨텍 | Wafer polishing apparatus |
| JP7599330B2 (en) * | 2020-12-25 | 2024-12-13 | 株式会社荏原製作所 | Polishing apparatus and polishing method |
| JP7682641B2 (en) * | 2021-02-22 | 2025-05-26 | 株式会社荏原製作所 | Substrate Processing Equipment |
| EP4297930A4 (en) * | 2021-02-26 | 2024-12-11 | Axus Technology, LLC | CONTAINMENT AND EXHAUST SYSTEM FOR SUBSTRATE POLISHING COMPONENTS |
| US11969140B2 (en) * | 2021-06-22 | 2024-04-30 | Micron Technology, Inc. | Surface cleaning |
| US20240278380A1 (en) * | 2021-06-22 | 2024-08-22 | Ebara Corporation | Polishing method and polishing apparatus |
| CN113579964B (en) * | 2021-08-05 | 2022-09-16 | 青岛理工大学 | Grinding wheel polishing control device and closed-loop control system comprising same |
| JP7667025B2 (en) * | 2021-08-06 | 2025-04-22 | 株式会社荏原製作所 | POLISHING APPARATUS AND METHOD FOR DETECTING POLISHING END POINT IN POLISHING APPARATUS |
| CN114055296B (en) * | 2021-11-30 | 2023-03-03 | 江西新龙电瓷电器制造有限公司 | Grinding wheel for processing porcelain insulator and grinding method thereof |
| US11769660B2 (en) * | 2021-12-03 | 2023-09-26 | Pulseforge, Inc. | Method and apparatus for removing particles from the surface of a semiconductor wafer |
| TWI834448B (en) * | 2021-12-31 | 2024-03-01 | 大陸商杭州眾硅電子科技有限公司 | Wafer polishing system and the wafer transferring method thereof |
| JP2023124546A (en) * | 2022-02-25 | 2023-09-06 | 株式会社荏原製作所 | Polishing machine and polishing end point detection method in polishing machine |
| JP2023177421A (en) | 2022-06-02 | 2023-12-14 | 株式会社荏原製作所 | polishing equipment |
| US20240139905A1 (en) * | 2022-10-27 | 2024-05-02 | Applied Materials, Inc. | Carrier head acoustic monitoring with sensor in platen |
| TWI863041B (en) * | 2022-11-29 | 2024-11-21 | 環球晶圓股份有限公司 | Method for estimating real-time wafer processing quality and an electronic device |
| JP2024093733A (en) * | 2022-12-27 | 2024-07-09 | 株式会社荏原製作所 | Polishing method, polishing apparatus, and recording medium |
| TWI893615B (en) * | 2024-01-16 | 2025-08-11 | 玖鉦機械工業有限公司 | Intelligent precision grinding machine |
Family Cites Families (59)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5893796A (en) * | 1995-03-28 | 1999-04-13 | Applied Materials, Inc. | Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus |
| JPH1190818A (en) * | 1997-09-12 | 1999-04-06 | Fujitsu Ltd | Polishing apparatus and polishing method |
| US5876265A (en) | 1995-04-26 | 1999-03-02 | Fujitsu Limited | End point polishing apparatus and polishing method |
| US5738574A (en) * | 1995-10-27 | 1998-04-14 | Applied Materials, Inc. | Continuous processing system for chemical mechanical polishing |
| JP3033488B2 (en) * | 1996-03-27 | 2000-04-17 | 日本電気株式会社 | Polishing end point detecting apparatus and method |
| US6910942B1 (en) * | 1997-06-05 | 2005-06-28 | The Regents Of The University Of California | Semiconductor wafer chemical-mechanical planarization process monitoring and end-point detection method and apparatus |
| JPH11138399A (en) | 1997-11-07 | 1999-05-25 | Hitachi Ltd | Grinding equipment |
| JP3825220B2 (en) * | 1999-02-04 | 2006-09-27 | アプライド マテリアルズ インコーポレイテッド | Chemical mechanical polishing using moving abrasive sheet |
| US6120350A (en) * | 1999-03-31 | 2000-09-19 | Memc Electronic Materials, Inc. | Process for reconditioning polishing pads |
| US6213846B1 (en) * | 1999-07-12 | 2001-04-10 | International Business Machines Corporation | Real-time control of chemical-mechanical polishing processes using a shaft distortion measurement |
| JP2001044157A (en) * | 1999-07-16 | 2001-02-16 | Promos Technol Inc | Method and apparatus for detecting chemical mechanical polishing end point |
| US6306008B1 (en) * | 1999-08-31 | 2001-10-23 | Micron Technology, Inc. | Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization |
| US6293845B1 (en) | 1999-09-04 | 2001-09-25 | Mitsubishi Materials Corporation | System and method for end-point detection in a multi-head CMP tool using real-time monitoring of motor current |
| JP2001252866A (en) | 2000-03-07 | 2001-09-18 | Mitsubishi Materials Corp | Polishing equipment |
| JP3800942B2 (en) * | 2000-04-26 | 2006-07-26 | 日本電気株式会社 | Semiconductor wafer polishing end point detection apparatus and method |
| US6494765B2 (en) * | 2000-09-25 | 2002-12-17 | Center For Tribology, Inc. | Method and apparatus for controlled polishing |
| JP2004265317A (en) * | 2003-03-04 | 2004-09-24 | Daikin Ind Ltd | Equipment and its failure diagnosis system |
| CN100561182C (en) * | 2003-10-31 | 2009-11-18 | 应用材料公司 | Polishing Endpoint Detection System Using Friction Sensor |
| JP2005203729A (en) * | 2003-12-19 | 2005-07-28 | Ebara Corp | Substrate polishing equipment |
| US7050880B2 (en) * | 2003-12-30 | 2006-05-23 | Sc Solutions | Chemical-mechanical planarization controller |
| JP2004249458A (en) | 2004-04-12 | 2004-09-09 | Ebara Corp | Endpoint detection method of polishing |
| US7040958B2 (en) * | 2004-05-21 | 2006-05-09 | Mosel Vitelic, Inc. | Torque-based end point detection methods for chemical mechanical polishing tool which uses ceria-based CMP slurry to polish to protective pad layer |
| WO2006014411A1 (en) * | 2004-07-02 | 2006-02-09 | Strasbaugh | Method and system for processing wafers |
| KR100899973B1 (en) * | 2006-06-14 | 2009-05-28 | 이노플라 아엔씨 | Semiconductor wafer polishing apparatus |
| US7840305B2 (en) * | 2006-06-28 | 2010-11-23 | 3M Innovative Properties Company | Abrasive articles, CMP monitoring system and method |
| WO2008032753A1 (en) * | 2006-09-12 | 2008-03-20 | Ebara Corporation | Polishing apparatus and polishing method |
| JP2009028856A (en) * | 2007-07-27 | 2009-02-12 | Tokyo Seimitsu Co Ltd | Polishing end point detection method using torque change and apparatus thereof |
| JP2008108940A (en) * | 2006-10-26 | 2008-05-08 | Nikon Corp | Polishing apparatus and polishing method |
| DE102007015503B4 (en) * | 2007-03-30 | 2013-03-21 | Globalfoundries Inc. | Method and system for controlling chemical mechanical polishing by taking into account zone specific substrate data |
| JP5093651B2 (en) * | 2007-06-12 | 2012-12-12 | 株式会社ニコン | Work information management system |
| JP2007331108A (en) * | 2007-08-20 | 2007-12-27 | Ebara Corp | Substrate polishing device, and substrate polishing method |
| TWI450792B (en) * | 2008-08-05 | 2014-09-01 | Ebara Corp | Polishing method and apparatus |
| US8096852B2 (en) * | 2008-08-07 | 2012-01-17 | Applied Materials, Inc. | In-situ performance prediction of pad conditioning disk by closed loop torque monitoring |
| JP5390807B2 (en) * | 2008-08-21 | 2014-01-15 | 株式会社荏原製作所 | Polishing method and apparatus |
| US9579767B2 (en) * | 2010-04-28 | 2017-02-28 | Applied Materials, Inc. | Automatic generation of reference spectra for optical monitoring of substrates |
| CN102782814A (en) * | 2010-04-30 | 2012-11-14 | 应用材料公司 | Pad conditioning sweep torque modeling to achieve constant removal rate |
| JP5656525B2 (en) * | 2010-09-09 | 2015-01-21 | 株式会社ディスコ | Processing apparatus and operation program management method in processing apparatus |
| US8758085B2 (en) * | 2010-10-21 | 2014-06-24 | Applied Materials, Inc. | Method for compensation of variability in chemical mechanical polishing consumables |
| JP2012089752A (en) * | 2010-10-21 | 2012-05-10 | Hitachi Kokusai Electric Inc | Substrate processing system |
| CN105856061B (en) * | 2011-03-15 | 2019-06-11 | Agc株式会社 | Grinding method and grinding device of plate-like body |
| JP5691843B2 (en) * | 2011-05-27 | 2015-04-01 | 富士通セミコンダクター株式会社 | Semiconductor device manufacturing method and chemical mechanical polishing apparatus |
| CN202388364U (en) * | 2011-12-02 | 2012-08-22 | 浙江理工大学 | Control device for crystal grinding machine |
| JP2013176828A (en) * | 2012-02-29 | 2013-09-09 | Ebara Corp | Remote monitoring system of polishing end point detection device |
| US20140020830A1 (en) | 2012-07-19 | 2014-01-23 | Applied Materials, Inc. | Carrier Head Sweep Motor Current for In-Situ Monitoring |
| US20140141696A1 (en) * | 2012-11-21 | 2014-05-22 | Applied Materials, Inc. | Polishing System with In-Sequence Sensor |
| JP6254383B2 (en) * | 2013-08-29 | 2017-12-27 | 株式会社荏原製作所 | Dressing apparatus, chemical mechanical polishing apparatus including the dressing apparatus, and dresser disk used therefor |
| JP6030041B2 (en) * | 2013-11-01 | 2016-11-24 | 株式会社荏原製作所 | Polishing apparatus and polishing method |
| JP6366289B2 (en) * | 2014-02-07 | 2018-08-01 | 株式会社荏原製作所 | Status reporting apparatus, substrate processing apparatus, and status reporting method |
| JP6595987B2 (en) * | 2014-04-22 | 2019-10-23 | 株式会社荏原製作所 | Polishing method |
| JP6375728B2 (en) * | 2014-07-01 | 2018-08-22 | 富士電機株式会社 | Safety control device and safety control system |
| SG10201803908SA (en) * | 2014-09-02 | 2018-06-28 | Ebara Corp | End point detection method, polishing apparatus, and polishing method |
| JP6399873B2 (en) | 2014-09-17 | 2018-10-03 | 株式会社荏原製作所 | Film thickness signal processing apparatus, polishing apparatus, film thickness signal processing method, and polishing method |
| JP6357260B2 (en) * | 2016-09-30 | 2018-07-11 | 株式会社荏原製作所 | Polishing apparatus and polishing method |
| US10058974B1 (en) * | 2017-03-31 | 2018-08-28 | Taiwan Semiconductor Manufacturing Co., Ltd | Method for controlling chemical mechanical polishing process |
| JP7141204B2 (en) * | 2017-10-19 | 2022-09-22 | 株式会社荏原製作所 | Polishing device and polishing method |
| KR102591906B1 (en) * | 2017-10-31 | 2023-10-20 | 가부시키가이샤 에바라 세이사꾸쇼 | Polishing apparatus and polishing method |
| JP6906425B2 (en) * | 2017-10-31 | 2021-07-21 | 株式会社荏原製作所 | Board processing equipment |
| JP7098311B2 (en) * | 2017-12-05 | 2022-07-11 | 株式会社荏原製作所 | Polishing equipment and polishing method |
| KR102538861B1 (en) * | 2017-12-26 | 2023-06-01 | 가부시키가이샤 에바라 세이사꾸쇼 | Magnetic element and eddy current type sensor using the same |
-
2017
- 2017-04-04 JP JP2017074167A patent/JP6357260B2/en active Active
- 2017-05-01 JP JP2017091152A patent/JP6227821B1/en active Active
- 2017-09-07 SG SG10201707291RA patent/SG10201707291RA/en unknown
- 2017-09-13 TW TW110117574A patent/TWI776509B/en active
- 2017-09-13 TW TW106131446A patent/TWI731162B/en active
- 2017-09-21 KR KR1020170121613A patent/KR102399251B1/en active Active
- 2017-09-25 US US15/714,938 patent/US10688620B2/en active Active
- 2017-09-29 CN CN202110238691.9A patent/CN113001396B/en active Active
- 2017-09-29 CN CN202310305749.6A patent/CN116117685A/en active Pending
- 2017-09-29 CN CN201710908822.3A patent/CN107877356B/en active Active
-
2018
- 2018-06-14 JP JP2018113733A patent/JP6547043B2/en active Active
-
2019
- 2019-06-24 JP JP2019116181A patent/JP6842505B2/en active Active
-
2020
- 2020-05-12 US US16/872,622 patent/US11583973B2/en active Active
-
2021
- 2021-02-19 JP JP2021025129A patent/JP7182653B2/en active Active
-
2022
- 2022-05-11 KR KR1020220057632A patent/KR102560691B1/en active Active
-
2023
- 2023-01-13 US US18/154,689 patent/US20230158632A1/en active Pending
- 2023-07-24 KR KR1020230095905A patent/KR102781163B1/en active Active
-
2025
- 2025-03-10 KR KR1020250030412A patent/KR20250040607A/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| KR102781163B1 (en) | 2025-03-17 |
| KR20180036545A (en) | 2018-04-09 |
| JP2018144227A (en) | 2018-09-20 |
| JP2018058197A (en) | 2018-04-12 |
| US11583973B2 (en) | 2023-02-21 |
| JP2018061002A (en) | 2018-04-12 |
| US20200269381A1 (en) | 2020-08-27 |
| US20230158632A1 (en) | 2023-05-25 |
| KR102399251B1 (en) | 2022-05-19 |
| JP6227821B1 (en) | 2017-11-08 |
| KR102560691B1 (en) | 2023-07-27 |
| JP6357260B2 (en) | 2018-07-11 |
| CN107877356A (en) | 2018-04-06 |
| CN116117685A (en) | 2023-05-16 |
| CN113001396A (en) | 2021-06-22 |
| CN113001396B (en) | 2023-04-21 |
| KR20220066027A (en) | 2022-05-23 |
| TWI776509B (en) | 2022-09-01 |
| US20180093360A1 (en) | 2018-04-05 |
| US10688620B2 (en) | 2020-06-23 |
| JP6842505B2 (en) | 2021-03-17 |
| JP6547043B2 (en) | 2019-07-17 |
| CN107877356B (en) | 2021-03-26 |
| KR20230117300A (en) | 2023-08-08 |
| TW202146163A (en) | 2021-12-16 |
| TW201813770A (en) | 2018-04-16 |
| TWI731162B (en) | 2021-06-21 |
| KR20250040607A (en) | 2025-03-24 |
| JP2021091090A (en) | 2021-06-17 |
| JP2019162716A (en) | 2019-09-26 |
| JP7182653B2 (en) | 2022-12-02 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| SG10201707291RA (en) | Polishing apparatus and polishing method | |
| GB201716759D0 (en) | Vehicle-window-transmittance-control apparatus and method | |
| SG10201501574SA (en) | Polishing apparatus and polishing method | |
| GB201616152D0 (en) | Well apparatus and associated methods | |
| GB201609468D0 (en) | Apparatus and method | |
| SG10202101299QA (en) | Polishing apparatus and polishing method | |
| ZA201807400B (en) | Apparatus and method | |
| GB2555874B (en) | Apparatus and method | |
| GB2558708B (en) | Method and apparatus | |
| SG11201702213YA (en) | Polishing apparatus and wafer polishing method | |
| HUP1600491A2 (en) | Method and apparatus for grinding and final smoothing | |
| SG11201707991SA (en) | Polishing apparatus and polishing method | |
| SG10201500455QA (en) | Polishing method and polishing apparatus | |
| SG10201608243QA (en) | Polishing apparatus and polishing method | |
| EP3108998A4 (en) | Polishing apparatus and polishing method | |
| GB201618501D0 (en) | Method and apparatus | |
| GB201605232D0 (en) | Apparatus and method | |
| SG10201801305PA (en) | Polishing Apparatus And Polishing Method | |
| SG11201806747QA (en) | Double-side polishing method and double-side polishing apparatus | |
| GB201600464D0 (en) | Apparatus and method | |
| GB2569904B (en) | Interface apparatus and method | |
| SG10201607236YA (en) | Polishing apparatus and polishing method | |
| SG11201801292PA (en) | Polishing method and polishing apparatus | |
| GB201615852D0 (en) | Method and apparatus | |
| GB201611451D0 (en) | Interface apparatus and method |