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SE321751B - - Google Patents

Info

Publication number
SE321751B
SE321751B SE3759/65A SE375965A SE321751B SE 321751 B SE321751 B SE 321751B SE 3759/65 A SE3759/65 A SE 3759/65A SE 375965 A SE375965 A SE 375965A SE 321751 B SE321751 B SE 321751B
Authority
SE
Sweden
Application number
SE3759/65A
Inventor
H Hoekje
F Strain
W Wilson
Original Assignee
Ppg Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ppg Industries Inc filed Critical Ppg Industries Inc
Publication of SE321751B publication Critical patent/SE321751B/xx

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B13/00Oxygen; Ozone; Oxides or hydroxides in general
    • C01B13/14Methods for preparing oxides or hydroxides in general
    • C01B13/20Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state
    • C01B13/22Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state of halides or oxyhalides
    • C01B13/28Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state of halides or oxyhalides using a plasma or an electric discharge
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C01B33/183Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01GCOMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G23/00Compounds of titanium
    • C01G23/04Oxides; Hydroxides
    • C01G23/047Titanium dioxide
    • C01G23/07Producing by vapour phase processes, e.g. halide oxidation
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00Crystal-structural characteristics
    • C01P2002/50Solid solutions
    • C01P2002/52Solid solutions containing elements as dopants
    • C01P2002/54Solid solutions containing elements as dopants one element only
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/60Particles characterised by their size
    • C01P2004/62Submicrometer sized, i.e. from 0.1-1 micrometer
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/60Optical properties, e.g. expressed in CIELAB-values
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/80Compositional purity
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/26Plasma torches
    • H05H1/32Plasma torches using an arc
    • H05H1/34Details, e.g. electrodes, nozzles
    • H05H1/40Details, e.g. electrodes, nozzles using applied magnetic fields, e.g. for focusing or rotating the arc

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
SE3759/65A 1964-03-25 1965-03-23 SE321751B (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US35459764A 1964-03-25 1964-03-25

Publications (1)

Publication Number Publication Date
SE321751B true SE321751B (xx) 1970-03-16

Family

ID=23394071

Family Applications (1)

Application Number Title Priority Date Filing Date
SE3759/65A SE321751B (xx) 1964-03-25 1965-03-23

Country Status (6)

Country Link
US (1) US3642442A (xx)
AU (1) AU1288970A (xx)
CA (1) CA945341A (xx)
DE (1) DE1542365A1 (xx)
GB (1) GB1108425A (xx)
SE (1) SE321751B (xx)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4214913A (en) * 1979-03-05 1980-07-29 E. I. Du Pont De Nemours And Company Process for producing rutile TiO2
IT1130853B (it) * 1980-01-11 1986-06-18 Montedison Spa Biossido di titanio post-trattato e procedimento per ottenerlo
FR2533205A1 (fr) * 1982-09-17 1984-03-23 Westinghouse Electric Corp Procede pour la production de silice par vaporisation
DE3703079A1 (de) * 1987-02-03 1988-08-11 Rolf Dipl Chem Dr Rer Bruening Verfahren zur herstellung von wasserfreiem synthetischem siliciumdioxid
DE4303492A1 (de) * 1993-02-06 1994-08-11 Krupp Widia Gmbh Vorrichtung und Verfahren zur Ablagerung von festen Stoffen, insbesondere von sehr feinkörnigen Stoffen, sowie Verwendung dieses Verfahrens
US5562764A (en) * 1994-06-28 1996-10-08 E. I. Du Pont De Nemours And Company Process for preparing improved TIO2 by silicon halide addition
JPH0878693A (ja) * 1994-08-31 1996-03-22 Semiconductor Energy Lab Co Ltd 半導体装置の作製方法
US5698177A (en) * 1994-08-31 1997-12-16 University Of Cincinnati Process for producing ceramic powders, especially titanium dioxide useful as a photocatalyst
US6706572B1 (en) 1994-08-31 2004-03-16 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing a thin film transistor using a high pressure oxidation step
RU2119454C1 (ru) * 1994-10-28 1998-09-27 Владимир Ильич Мазин Способ получения высокодисперсных оксидов
US5728205A (en) * 1996-12-11 1998-03-17 E. I. Du Pont De Nemours And Company Process for the addition of boron in a TiO2 manufacturing process
US6277354B1 (en) 1999-06-10 2001-08-21 E. I. Dupont De Nemours And Company Process for the recovery of chlorine from iron chlorides
US6994837B2 (en) * 2001-04-24 2006-02-07 Tekna Plasma Systems, Inc. Plasma synthesis of metal oxide nanopowder and apparatus therefor
RU2230033C1 (ru) * 2002-10-31 2004-06-10 Михаил Алексеевич Горовой Способ получения диоксида титана
JP2006516220A (ja) * 2002-12-17 2006-06-29 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー 反応チャンバープラズマ反応器系による蒸発濃縮法を使用する、ナノ粒子の製造方法
RU2289893C1 (ru) * 2005-06-14 2006-12-20 Михаил Алексеевич Горовой Плазмохимический реактор
AU2010319666B2 (en) 2009-11-10 2014-07-17 The Chemours Company Fc,Llc Process for in-situ formation of chlorides of silicon and aluminum in the preparation of titanium dioxide
EP2539279B1 (en) 2010-02-22 2014-04-16 E.I. Du Pont De Nemours And Company Process for in-situ formation of chlorides of silicon, aluminum and titanium in the preparation of titanium dioxide
AU2010361149B2 (en) 2010-09-21 2015-07-16 The Chemours Company Fc,Llc Process for in-situ formation of chlorides in the preparation of titanium dioxide
JP2014170743A (ja) * 2013-03-04 2014-09-18 Gs Platech Co Ltd 非移送式中空型プラズマトーチ
KR102202399B1 (ko) * 2019-02-28 2021-01-13 주식회사 더방신소재 산화물 분말 제조장치
CN111777076B (zh) * 2020-08-18 2025-01-28 苏州英纳特纳米科技有限公司 制备非晶态纳米球形二氧化硅的设备

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2616842A (en) * 1951-01-13 1952-11-04 Sheer Charles Arc process for the production of fume
US2731410A (en) * 1951-02-28 1956-01-17 Horace M Weir Production of compounds by means of the electric arc
BE511837A (xx) * 1951-06-04
US2921892A (en) * 1954-12-08 1960-01-19 Amalgamated Growth Ind Inc Apparatus and process for conducting chemical reactions
US2960726A (en) * 1956-01-23 1960-11-22 Sheer Korman Associates Process for fabricating electrodes
US3090745A (en) * 1958-05-16 1963-05-21 Berghaus Bernhard Method of and apparatus for producing reactions under electrical action
US3120427A (en) * 1960-11-01 1964-02-04 Thann Fab Prod Chem Preparation of titanium dioxide
US3275411A (en) * 1963-04-08 1966-09-27 American Cyanamid Co Plasma production of titanium dioxide

Also Published As

Publication number Publication date
GB1108425A (en) 1968-04-03
AU1288970A (en) 1970-05-21
DE1542365A1 (de) 1970-07-02
US3642442A (en) 1972-02-15
CA945341A (en) 1974-04-16

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