[go: up one dir, main page]

SE0600631L - Apparat och metod för eggbeläggning i kontinuerlig deponeringslinje - Google Patents

Apparat och metod för eggbeläggning i kontinuerlig deponeringslinje

Info

Publication number
SE0600631L
SE0600631L SE0600631A SE0600631A SE0600631L SE 0600631 L SE0600631 L SE 0600631L SE 0600631 A SE0600631 A SE 0600631A SE 0600631 A SE0600631 A SE 0600631A SE 0600631 L SE0600631 L SE 0600631L
Authority
SE
Sweden
Prior art keywords
deposition
target
zone
continuous
normal
Prior art date
Application number
SE0600631A
Other languages
English (en)
Other versions
SE529426C2 (sv
Inventor
Mikael Schuisky
Original Assignee
Sandvik Intellectual Property
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sandvik Intellectual Property filed Critical Sandvik Intellectual Property
Priority to SE0600631A priority Critical patent/SE0600631L/sv
Priority to CA002645924A priority patent/CA2645924A1/en
Priority to KR1020087023078A priority patent/KR20080102224A/ko
Priority to JP2009501384A priority patent/JP2009530500A/ja
Priority to PCT/SE2007/050124 priority patent/WO2007108757A1/en
Priority to CN2007800102183A priority patent/CN101405432B/zh
Priority to EP07716098A priority patent/EP1999293A4/en
Publication of SE529426C2 publication Critical patent/SE529426C2/sv
Publication of SE0600631L publication Critical patent/SE0600631L/sv

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/225—Oblique incidence of vaporised material on substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
SE0600631A 2006-03-21 2006-03-21 Apparat och metod för eggbeläggning i kontinuerlig deponeringslinje SE0600631L (sv)

Priority Applications (7)

Application Number Priority Date Filing Date Title
SE0600631A SE0600631L (sv) 2006-03-21 2006-03-21 Apparat och metod för eggbeläggning i kontinuerlig deponeringslinje
CA002645924A CA2645924A1 (en) 2006-03-21 2007-03-02 Edge coating in continuous deposition line
KR1020087023078A KR20080102224A (ko) 2006-03-21 2007-03-02 연속 적층 라인에서의 날 코팅
JP2009501384A JP2009530500A (ja) 2006-03-21 2007-03-02 連続堆積ラインにおけるエッジ被覆
PCT/SE2007/050124 WO2007108757A1 (en) 2006-03-21 2007-03-02 Edge coating in continuous deposition line
CN2007800102183A CN101405432B (zh) 2006-03-21 2007-03-02 连续沉积生产线中的边缘涂布
EP07716098A EP1999293A4 (en) 2006-03-21 2007-03-02 EDGE COATING IN A CONTINUOUS SEPARATION LINE

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE0600631A SE0600631L (sv) 2006-03-21 2006-03-21 Apparat och metod för eggbeläggning i kontinuerlig deponeringslinje

Publications (2)

Publication Number Publication Date
SE529426C2 SE529426C2 (sv) 2007-08-07
SE0600631L true SE0600631L (sv) 2007-08-07

Family

ID=38323926

Family Applications (1)

Application Number Title Priority Date Filing Date
SE0600631A SE0600631L (sv) 2006-03-21 2006-03-21 Apparat och metod för eggbeläggning i kontinuerlig deponeringslinje

Country Status (7)

Country Link
EP (1) EP1999293A4 (sv)
JP (1) JP2009530500A (sv)
KR (1) KR20080102224A (sv)
CN (1) CN101405432B (sv)
CA (1) CA2645924A1 (sv)
SE (1) SE0600631L (sv)
WO (1) WO2007108757A1 (sv)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE531749C2 (sv) 2007-09-17 2009-07-28 Seco Tools Ab Metod att utfälla slitstarka skikt på hårdmetall med bågförångning och katod med Ti3SiC2 som huvudbeståndsdel
JP5616265B2 (ja) 2011-03-25 2014-10-29 Hoya株式会社 薄膜の成膜方法、マスクブランクの製造方法及び転写用マスクの製造方法
SE536952C2 (sv) * 2012-06-25 2014-11-11 Impact Coatings Ab Kontinuerlig rulle-till-rulle-anordning
WO2015149857A1 (en) * 2014-04-03 2015-10-08 Applied Materials, Inc. Sputtering arrangement for sputtering a material on a substrate surface
EP3031982B1 (en) * 2014-12-10 2017-03-29 voestalpine Precision Strip AB A long life cermet coated crêping blade
EP3317456A1 (de) * 2015-07-02 2018-05-09 Voith Patent GmbH Bauteil für eine maschine zur herstellung und/oder behandlung einer faserstoffbahn und verfahren zur herstellung einer beschichtung eines bauteils
CN105870319B (zh) * 2016-04-26 2019-03-05 贝骨新材料科技（上海）有限公司 一种长条状压电薄膜传感器卷对卷制造方法
JP7382809B2 (ja) * 2019-12-02 2023-11-17 キヤノントッキ株式会社 成膜方法及び成膜装置
CN111235539B (zh) * 2020-03-10 2021-04-20 摩科斯新材料科技(苏州)有限公司 一种小孔内壁薄膜沉积方法及装置
CN111424248A (zh) * 2020-05-13 2020-07-17 沈阳理工大学 碳/碳复合材料表面高温抗氧化SiC/ZrC涂层的制备方法
KR20210149266A (ko) * 2020-06-01 2021-12-09 삼성디스플레이 주식회사 기판 고정 장치, 이를 포함하는 성막 처리 설비 및 이를 이용한 성막 처리 방법
CN113808935B (zh) * 2020-06-16 2023-12-15 中微半导体设备(上海)股份有限公司 耐腐蚀涂层形成方法和装置、等离子体零部件和反应装置
CN112044706A (zh) * 2020-08-05 2020-12-08 王华彬 一种涂布刮刀涂层涂敷的工艺
CN114250436B (zh) * 2020-09-25 2024-03-29 中微半导体设备(上海)股份有限公司 耐腐蚀涂层制备方法、半导体零部件和等离子体反应装置
CN112962078B (zh) * 2021-02-01 2023-07-18 肇庆宏旺金属实业有限公司 一种镀膜生产线及镀膜工艺
CN118086842B (zh) * 2023-07-27 2024-09-24 上海超导科技股份有限公司 用于离子束辅助沉积镀膜装置的镀膜系统
CN120738610B (zh) * 2025-09-05 2025-11-04 西北工业大学 基于仿形紧固夹具的钛铝合金叶片高温涂层均质化沉积方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56111804A (en) 1980-02-09 1981-09-03 Dainippon Printing Co Ltd Manufacture of body differing in optical property according to direction
DE4396720C1 (de) * 1992-12-23 2003-07-17 Unaxis Balzers Ag Verfahren und Anlage zur Schichtabscheidung und Verwendung der Anlage
PL178753B1 (pl) * 1994-04-25 2000-06-30 Gillette Co Ostrze golarki i sposób wytwarzania ostrza golarki
JPH10330930A (ja) * 1997-05-28 1998-12-15 Victor Co Of Japan Ltd スパッタ装置及びこれを用いた磁気ヘッドの製造方法
JP4641596B2 (ja) * 2000-07-26 2011-03-02 株式会社アルバック 立体基板へのスパッタリング成膜装置及び成膜方法
SE519466C2 (sv) * 2000-12-07 2003-03-04 Swedev Ab Schaber - eller rakelblad med beläggning av nickel innefattandes nötningsbeständiga partiklar och metod vid dess framställning
DE10147708C5 (de) * 2001-09-27 2005-03-24 Von Ardenne Anlagentechnik Gmbh Targetanordnung
SE527180C2 (sv) * 2003-08-12 2006-01-17 Sandvik Intellectual Property Rakel- eller schaberblad med nötningsbeständigt skikt samt metod för tillverkning därav
SE527386C2 (sv) * 2003-12-23 2006-02-21 Sandvik Intellectual Property Belagd rostfri stålbandsprodukt med dekorativt utseende
ES2565165T3 (es) * 2004-09-08 2016-03-31 Bic Violex S.A. Método para deposición de una capa sobre un filo de cuchilla de afeitar y cuchilla de afeitar

Also Published As

Publication number Publication date
WO2007108757A1 (en) 2007-09-27
CN101405432B (zh) 2011-04-13
KR20080102224A (ko) 2008-11-24
SE529426C2 (sv) 2007-08-07
CA2645924A1 (en) 2007-09-27
JP2009530500A (ja) 2009-08-27
EP1999293A1 (en) 2008-12-10
CN101405432A (zh) 2009-04-08
EP1999293A4 (en) 2010-07-21

Similar Documents

Publication Publication Date Title
SE0600631L (sv) Apparat och metod för eggbeläggning i kontinuerlig deponeringslinje
US6797131B2 (en) Design of hardware features to facilitate arc-spray coating applications and functions
MX2009009914A (es) Metodo de revestimiento de un substrato e instalacion de deposicion al vacio de la aleacion metalica.
US9121092B2 (en) Tribology combined with corrosion resistance: a new family of PVD- and PACVD coatings
EP2172577A3 (en) Surface treatments for turbine components to reduce particle accumulation during use thereof
DE69606307D1 (de) Verbesserungen in und betreffend Verfahren zur Verbesserung der Sputterabscheidung von Metall-Schwefel-Beschichtungen, z.B. Molybdändisulfid Beschichtungen und verbesserten Beschichtungen
BRPI0803100A2 (pt) processamento de ìons de imersão de plasma para revestimento de substratos ocos
MY139973A (en) Coated substrate with a curved surface, and a method for production of a coated substrate such as this
WO2020089180A9 (de) Beschichtungsvorrichtung, prozesskammer, sowie verfahren zum beschichten eines substrats und substrat beschichtet mit zumindest einer materialschicht
CN103866291B (zh) 一种耐腐蚀的气体喷淋头及其制作方法
WO2008099220A3 (en) Methods and apparatus for forming diamond-like coatings
KR101780466B1 (ko) 스퍼터 증착을 위한 소형의 회전가능한 스퍼터 디바이스들
MX2020013600A (es) Instalacion de deposicion al vacio y metodo para recubrir un sustrato.
WO2013006241A4 (en) Pedestal with edge gas deflector for edge profile control
US20150368783A1 (en) Deposition apparatus with gas supply and method for depositing material
MX2020013546A (es) Instalacion y metodo de deposicion al vacio para recubrir un sustrato.
PH12013502181A1 (en) High power impulse magnetron sputtering method providing enhanced ionization of the sputtered particles and apparatus for its implementation
TW200712233A (en) Coating machine and method for operating a coating machine
JP7301889B2 (ja) 基板コーティング用真空蒸着設備及び方法
SG139761A1 (en) A method and apparatus for providing a substrate coating having a predetermined resistivity, and uses therefor
TW200716777A (en) Real-time monitoring and controlling sputter target erosion
US20180135160A1 (en) Method for controlling a gas supply to a process chamber, controller for controlling a gas supply to a process chamber, and apparatus
WO2005020277A3 (en) Electron beam enhanced large area deposition system
TWI656240B (zh) Target sputtering surface roughness processing method
WO2005106070A3 (fr) Procede de depot sous vide

Legal Events

Date Code Title Description
NUG Patent has lapsed