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SE0001367L - Apparat och förfarande för elektrokemisk bearbetning av substrat - Google Patents

Apparat och förfarande för elektrokemisk bearbetning av substrat

Info

Publication number
SE0001367L
SE0001367L SE0001367A SE0001367A SE0001367L SE 0001367 L SE0001367 L SE 0001367L SE 0001367 A SE0001367 A SE 0001367A SE 0001367 A SE0001367 A SE 0001367A SE 0001367 L SE0001367 L SE 0001367L
Authority
SE
Sweden
Prior art keywords
chamber
substrate
electrochemical processing
electrolyte
container
Prior art date
Application number
SE0001367A
Other languages
English (en)
Other versions
SE0001367D0 (sv
Inventor
Mats Haallberg
Lennart Olsson
Original Assignee
Obducat Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Obducat Ab filed Critical Obducat Ab
Priority to SE0001367A priority Critical patent/SE0001367L/sv
Publication of SE0001367D0 publication Critical patent/SE0001367D0/sv
Priority to PCT/SE2001/000824 priority patent/WO2001079592A1/en
Priority to AU48968/01A priority patent/AU4896801A/en
Publication of SE0001367L publication Critical patent/SE0001367L/sv

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/001—Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/02—Tanks; Installations therefor
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/003—Electroplating using gases, e.g. pressure influence
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F7/00—Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Weting (AREA)
  • Electroplating Methods And Accessories (AREA)
SE0001367A 2000-04-13 2000-04-13 Apparat och förfarande för elektrokemisk bearbetning av substrat SE0001367L (sv)

Priority Applications (3)

Application Number Priority Date Filing Date Title
SE0001367A SE0001367L (sv) 2000-04-13 2000-04-13 Apparat och förfarande för elektrokemisk bearbetning av substrat
PCT/SE2001/000824 WO2001079592A1 (en) 2000-04-13 2001-04-12 Apparatus and method for electrochemical processing of substrates
AU48968/01A AU4896801A (en) 2000-04-13 2001-04-12 Apparatus and method for electrochemical processing of substrates

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE0001367A SE0001367L (sv) 2000-04-13 2000-04-13 Apparat och förfarande för elektrokemisk bearbetning av substrat

Publications (2)

Publication Number Publication Date
SE0001367D0 SE0001367D0 (sv) 2000-04-13
SE0001367L true SE0001367L (sv) 2001-10-14

Family

ID=20279303

Family Applications (1)

Application Number Title Priority Date Filing Date
SE0001367A SE0001367L (sv) 2000-04-13 2000-04-13 Apparat och förfarande för elektrokemisk bearbetning av substrat

Country Status (3)

Country Link
AU (1) AU4896801A (sv)
SE (1) SE0001367L (sv)
WO (1) WO2001079592A1 (sv)

Families Citing this family (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2264524A3 (en) 2000-07-16 2011-11-30 The Board of Regents of The University of Texas System High-resolution overlay alignement methods and systems for imprint lithography
WO2002006902A2 (en) 2000-07-17 2002-01-24 Board Of Regents, The University Of Texas System Method and system of automatic fluid dispensing for imprint lithography processes
US6964793B2 (en) 2002-05-16 2005-11-15 Board Of Regents, The University Of Texas System Method for fabricating nanoscale patterns in light curable compositions using an electric field
US7037639B2 (en) 2002-05-01 2006-05-02 Molecular Imprints, Inc. Methods of manufacturing a lithography template
US7179079B2 (en) 2002-07-08 2007-02-20 Molecular Imprints, Inc. Conforming template for patterning liquids disposed on substrates
US7019819B2 (en) 2002-11-13 2006-03-28 Molecular Imprints, Inc. Chucking system for modulating shapes of substrates
US6932934B2 (en) 2002-07-11 2005-08-23 Molecular Imprints, Inc. Formation of discontinuous films during an imprint lithography process
US6916584B2 (en) 2002-08-01 2005-07-12 Molecular Imprints, Inc. Alignment methods for imprint lithography
US7071088B2 (en) 2002-08-23 2006-07-04 Molecular Imprints, Inc. Method for fabricating bulbous-shaped vias
US6980282B2 (en) 2002-12-11 2005-12-27 Molecular Imprints, Inc. Method for modulating shapes of substrates
US6929762B2 (en) 2002-11-13 2005-08-16 Molecular Imprints, Inc. Method of reducing pattern distortions during imprint lithography processes
US6871558B2 (en) 2002-12-12 2005-03-29 Molecular Imprints, Inc. Method for determining characteristics of substrate employing fluid geometries
MY136129A (en) 2002-12-13 2008-08-29 Molecular Imprints Inc Magnification correction employing out-of-plane distortion of a substrate
US7452574B2 (en) 2003-02-27 2008-11-18 Molecular Imprints, Inc. Method to reduce adhesion between a polymerizable layer and a substrate employing a fluorine-containing layer
US7122079B2 (en) 2004-02-27 2006-10-17 Molecular Imprints, Inc. Composition for an etching mask comprising a silicon-containing material
US6951173B1 (en) 2003-05-14 2005-10-04 Molecular Imprints, Inc. Assembly and method for transferring imprint lithography templates
US6805054B1 (en) 2003-05-14 2004-10-19 Molecular Imprints, Inc. Method, system and holder for transferring templates during imprint lithography processes
US7157036B2 (en) 2003-06-17 2007-01-02 Molecular Imprints, Inc Method to reduce adhesion between a conformable region and a pattern of a mold
US7136150B2 (en) 2003-09-25 2006-11-14 Molecular Imprints, Inc. Imprint lithography template having opaque alignment marks
US7730834B2 (en) 2004-03-04 2010-06-08 Asml Netherlands B.V. Printing apparatus and device manufacturing method
US7676088B2 (en) 2004-12-23 2010-03-09 Asml Netherlands B.V. Imprint lithography
US7490547B2 (en) 2004-12-30 2009-02-17 Asml Netherlands B.V. Imprint lithography
US7686970B2 (en) 2004-12-30 2010-03-30 Asml Netherlands B.V. Imprint lithography
US7354698B2 (en) 2005-01-07 2008-04-08 Asml Netherlands B.V. Imprint lithography
US7922474B2 (en) 2005-02-17 2011-04-12 Asml Netherlands B.V. Imprint lithography
US7523701B2 (en) 2005-03-07 2009-04-28 Asml Netherlands B.V. Imprint lithography method and apparatus
US7762186B2 (en) 2005-04-19 2010-07-27 Asml Netherlands B.V. Imprint lithography
US7611348B2 (en) 2005-04-19 2009-11-03 Asml Netherlands B.V. Imprint lithography
US7442029B2 (en) 2005-05-16 2008-10-28 Asml Netherlands B.V. Imprint lithography
US7692771B2 (en) 2005-05-27 2010-04-06 Asml Netherlands B.V. Imprint lithography
US20060267231A1 (en) 2005-05-27 2006-11-30 Asml Netherlands B.V. Imprint lithography
US7708924B2 (en) 2005-07-21 2010-05-04 Asml Netherlands B.V. Imprint lithography
US7418902B2 (en) 2005-05-31 2008-09-02 Asml Netherlands B.V. Imprint lithography including alignment
US7377764B2 (en) 2005-06-13 2008-05-27 Asml Netherlands B.V. Imprint lithography
US7878791B2 (en) 2005-11-04 2011-02-01 Asml Netherlands B.V. Imprint lithography
US8011915B2 (en) 2005-11-04 2011-09-06 Asml Netherlands B.V. Imprint lithography
US7517211B2 (en) 2005-12-21 2009-04-14 Asml Netherlands B.V. Imprint lithography
US8015939B2 (en) 2006-06-30 2011-09-13 Asml Netherlands B.V. Imprintable medium dispenser
US8318253B2 (en) 2006-06-30 2012-11-27 Asml Netherlands B.V. Imprint lithography
US7854877B2 (en) 2007-08-14 2010-12-21 Asml Netherlands B.V. Lithography meandering order
US8144309B2 (en) 2007-09-05 2012-03-27 Asml Netherlands B.V. Imprint lithography
CN118919485B (zh) * 2024-10-12 2024-12-06 成都旭瓷新材料有限公司 一种可调的基板快速装架装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE7603626L (sv) * 1975-03-27 1977-01-04 Otto Alfred Becker Anordning for att galvanisera metallytor, serskilt vid snittkantytor hos genom stapling tillskurna platar
US4163705A (en) * 1975-05-06 1979-08-07 Korpi Teuvo Tapio Apparatus for chemical and electrochemical treatment
IT1177925B (it) * 1984-07-24 1987-08-26 Centro Speriment Metallurg Procedimento per elettrodeposizione in continuo di metalli ad elevata denista' di corrente di celle verticali e relativo dispositivo di attuazione
FR2648157A1 (fr) * 1989-06-13 1990-12-14 Traitement Surface Mecanique Dispositif permettant d'assurer un depot electrolytique homogene sur des surfaces cylindriques de grandes dimensions
US5180438A (en) * 1989-10-11 1993-01-19 Hockh Metall-Reinigungsanlagen Gmbh Cleaning and drying system
SE467976B (sv) * 1991-02-20 1992-10-12 Dcm Innovation Ab Anordning foer elektroplaetering, vid framstaellning av matriser foer tillverkning av t ex cd-skivor samt foerfarande foer tillverkning av matriser medelst anordningen
US5660699A (en) * 1995-02-20 1997-08-26 Kao Corporation Electroplating apparatus
JPH08283995A (ja) * 1995-04-13 1996-10-29 Seikosha Co Ltd メッキ装置
US5522975A (en) * 1995-05-16 1996-06-04 International Business Machines Corporation Electroplating workpiece fixture
US5683564A (en) * 1996-10-15 1997-11-04 Reynolds Tech Fabricators Inc. Plating cell and plating method with fluid wiper

Also Published As

Publication number Publication date
AU4896801A (en) 2001-10-30
SE0001367D0 (sv) 2000-04-13
WO2001079592A1 (en) 2001-10-25

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Legal Events

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NAV Patent application has lapsed