RU98118911A

RU98118911A - METHOD FOR TREATING WATER-CONTAINING GAS DEPOSITS AND UNDERGROUND GAS STORAGE WELLS

Info

Publication number: RU98118911A
Application number: RU98118911/03A
Authority: RU
Inventors: Бургер Виллибальд; Майер Ханс; Шрекк Роберт; Вельтье Хольгер; Дойбцер Бернвард; Лаутеншлагер Ханс
Original assignee: Ваккер-Хеми ГмбХ
Priority date: 1997-10-16
Filing date: 1998-10-15
Publication date: 2000-09-10

Claims

1. A method of processing water-containing wells in gas fields and underground gas storage wells, in which a homogeneous phase containing solvolysis-resistant, water-repellent active substance is pumped into the aquifer.

2. The method according to claim 1, wherein organosilicon compounds are used as the water-repellent active substance.

3. The method according to p. 2, in which the organosilicon compounds contain units of General formula I
A _a R _b SiX _c O _{[4- (a + b + c)] / 2} ,
where R denotes a hydrogen atom or a monovalent, divalent or trivalent hydrocarbon residue with 1-200 carbon atoms, which may be substituted by a halogen, amine, ammonium group, mercapto group, acrylate group or maleimide group, X denotes a chlorine atom, the residue of the formula -O-, where as a charge compensation, protons and / or organic or inorganic ionic substances, a residue of the general formula —OR ^1, or a residue of the general formula II may be present
- (R ² ) _h - [OCH (CH ₃ ) CH ₂ ] _e [OCH ₂ CH ₂ ] _f [O (CH ₂ ) ₄ ] _g OR ³
where R ¹ denotes a hydrogen atom or a hydrocarbon residue with 1-200 carbon atoms, which can be interrupted by one or more identical or different heteroatoms selected from O, S, N and P, R ² denotes a divalent hydrocarbon residue with 1-200 carbon atoms which may be interrupted by one or more groups of the formulas —C (O) -, —C (O) O—, —C (O) NR ¹ , —NR ¹ -, —N ⁺ HR ¹ -, —O—, - S and / or is substituted by an atom of F, Cl or Br, R ³ may have the meaning indicated for R ¹ or denote a residue of the formula —C (O) R ¹ or —Si (R ¹ ) ₃ , A is a residue of the general formula IV
-R ⁴ (B) _z
where R ⁴ denotes a di-, tri- or tetravalent hydrocarbon residue with 1-200 carbon atoms per residue, which can be interrupted by one or more groups of the formulas -C (O) -, -C (O) O-, -C (O ) NR ⁵ , -NR ⁵ -, -N ⁺ НR ⁵ -, -N ⁺ R ⁵ R ⁵ -, -О-, -S-, - (НО) Р (O) - or - (NaО) Р (O ) - and / or substituted by an atom of F, Cl or Br, where R ⁵ denotes a hydrogen atom or a hydrocarbon residue with 1-200 carbon atoms per residue, which can be interrupted by one or more groups of the formulas -C (O) -, -C ( O) O-, -C (O) NR ⁵ -, -NR ⁵ -, -N ⁺ HR ⁵ -, -N ⁺ R ⁵ R ⁵ -, -O- or -S- and / or P, Cl or Br, B may have the meaning indicated for R ⁵ , or o denotes a residue selected from the group consisting of -COO-, -SO ₃ , -OPO ₃ H _y ^(2-y) -, -N ⁺ R ⁵ R ⁵ R ⁵ , -P ⁺ R ⁵ R ⁵ R ⁵ , -NR ⁵ R ⁵ , —OH, —CH, F, Cl, Br, —C (O) H, —COOH, —S0 ₃ H, —C ₆ H ₄ —OH and —C _m F _{2m + 1} ,

x is an integer of 1-20, y is a numerical value of 0 or 1, z is a numerical value of 1, 2 or 3 depending on the valency R ⁴ , h is a numerical value of 0 or 1, m is an integer of 1-20, and, b and c each have numerical values 0, 1, 2 or 3, and the sum a + b + c <4, and e, f and g each denotes an integer 0-200, provided that the sum e + f + g> 1.

4. The method according to PP. 1-3, in which the organosilicon compounds contain units of General formulas (V) and (VI)
O _{(4-ik-1) / 2} R _i X _k Si-A ¹ - SiX _k R _i O _{(4-ik-1) / 2} ,

where A ² denotes a trivalent hydrocarbon residue with 1-200 carbon atoms, which can be interrupted by residues of the formulas -C (O) -, -C (O) O-, -C (O) NR ⁵ , -NR ⁵ -, -N ⁺ HR ⁵ -, -N ⁺ R ⁵ R ⁵ -, -O-, -S-, -N- or -N ⁺ R ⁵ - and / or is substituted by an atom of F, Cl or Br, A ¹ denotes a divalent residue R ² , i and k each have numerical values 0, 1, 2 or 3, provided that 1 + k≅3, and R and X have the meanings specified in paragraph 1.

5. The method according to PP. 1-4, in which the homogeneous phase contains solvents capable of mixing at 20 ° C with not more than 2 wt.% Water.