RU2415026C2 - Method of producing multilayer body and multilayer body - Google Patents

Abstract

FIELD: process engineering.

SUBSTANCE: proposed multilayer body comprises, at least, one partially formed functional layer accurately aligned with, at least, one additional partially formed layer. First relief structure is formed on first section of multilayer body replicative layer. First layer is applied on replicative layer first section and, at least, on one second section whereon first relief structure is not formed, and is structure to comply with first relied structure. First layer is removed from first section but not removed from, at least, one second section, or removed from, at least, one second section but not removed from first section. Note here that, at least, one partially formed functional layer is formed directly and/or using first structured layer as templet layer after formation of, at least, one partially formed functional layer.

EFFECT: higher degree of protection against reproduction and forgery.

83 cl, 58 dwg, 2 tbl

Description

The invention relates to a method for manufacturing a multilayer body containing at least one partially formed functional layer, precisely aligned with at least one additional partially formed layer, and to a multilayer body, which can be obtained according to this method. The invention further relates in particular to a security element for security documents and valuable documents having such a multilayer body.

Optical security features are often used to complicate the copying and misuse of documents or products and, if possible, to prevent such copying and misuse. Thus, optical security elements are often used to protect documents, banknotes, credit cards, cash cards, identification cards and badges, packages, etc. It is known in this respect to use optically variable elements that cannot be duplicated by conventional copying methods. It is also known to create protective elements with a structured metal layer in the form of text, logo or other pattern.

The manufacture of a structured metal layer from a metal layer deposited on the site, for example, by spraying, requires many operations, in particular, in those cases where small structures having a high degree of protection against counterfeiting should be obtained. This applies, for example, to the known method of creating a metal layer, which is applied over the entire surface area, on the part of which it is necessary to perform demetallization by etching on the basis of "positive / negative" or by laser ablation, and which must be structured in this way. An alternative to this method can be a method in which the metal layers to be applied are applied to the carrier in an already structured form by using templates when applying the metal in the vapor phase.

The more the number of manufacturing steps required to obtain a protective element, the correspondingly more important is the accuracy of combining the individual stages of the process or the degree of accuracy of positioning of individual tools when forming the protective element relative to the signs or structures already present in the protective element.

GB 2136352A describes a method for manufacturing an intermediate film provided with a hologram as a security feature. In this case, the plastic film is metallized over its entire surface area after embossing the diffractive relief structure, and then demetallizing in separate areas, ensuring accurate mutual alignment with the embossed diffractive relief structure. The demetallization operation with accurate mutual alignment is expensive, and the degree of resolution achieved is limited by the adjustment tolerances and the type of operation used.

EP 0537439B2 describes methods for manufacturing a security element with filigree patterns. The patterns are formed from diffraction structures coated with a metal layer and surrounded by transparent areas in which the metal layer is removed. Provide the introduction of the contour of a filigree pattern in the form of a recess in a metal-coated carrier material; in this case, diffraction structures are simultaneously placed at the bottom of the recesses, and then the recesses are filled with a protective varnish. Excess protective varnish must be removed using the scraper blade. After applying a protective varnish, the metal layer in unprotected areas is removed by etching.

The aim of the present invention is to provide a multilayer body, which is particularly difficult to reproduce, and a method for manufacturing such a multilayer body in which a partially formed functional layer is formed to ensure perfectly accurate or almost perfectly accurate alignment with an additional partially formed layer.

This goal is achieved using the first method of manufacturing a multilayer body containing at least one partially formed functional layer, precisely aligned with at least one additional partially formed layer, where the first relief structure is formed on the first section of the replication layer of the multilayer body, where the first layer is applied to the replication layer in the first region and at least one second region, where the first relief structure is not formed in the replication layer, and the structure in accordance with the first relief structure, where the first layer is removed in the first section, but not removed in at least one second section, or removed in at least one second section, but not removed in the first section, and where at least one a partially formed functional layer is formed directly and / or using the first structured layer as a template layer after at least one partially formed functional layer is formed. The first layer in this case is applied, in particular, over the entire surface area to the replication layer, but the process may also include applying only to individual areas, for example, in the form of strips, etc.

In this way, multilayer bodies which are especially protected from counterfeiting can be manufactured.

The goal is further achieved by using the first multilayer body, which can be obtained using the first method according to the invention, and which contains at least one partially formed functional layer, precisely aligned with at least one additional partially formed layer, in which the first relief structure is formed on the first portion of the replication layer of the multilayer body, where at least one functional layer is applied to the replication layer in the first portion or at least at least one second portion, wherein the first relief structure is not shaped in the replication layer, structured by using the first relief structure.

Partially formed functional layers or additional layers created according to the invention can be obtained with a very high level of resolution. The achieved degree of accuracy of alignment and resolution is approximately 100 times higher than can be achieved by known methods. Since the width of the structural elements of the first relief structure can be in the wavelength range of visible light (from about 380 nm to 780 nm), as well as below, it is possible to create very thin contours, patterns or lines. Accordingly, great advantages are also achieved in this regard in comparison with the methods used to date, and it is possible, using the invention, to produce security elements having a significantly higher degree of protection against copying and counterfeiting than to date.

Lines and / or pixels or image elements can be made with high resolution, for example, with a width or diameter of less than 50 microns, in particular in the range from 0.5 microns to 10 microns, and in extreme cases even less, up to approximately 200 nm. Preferably, resolution levels in the range of about 0.5 μm to about 5 μm can be obtained, in particular in the range of about 1 μm. In comparison, lines with a width of less than 10 microns can be obtained only with a very significant complication of the process and increased costs when using methods that provide the ability to adjust tools to ensure high accuracy of mutual alignment.

The goal is achieved by using the second method of manufacturing a multilayer body containing at least one partially formed functional layer, precisely aligned with at least one additional partially formed layer, in which the first layer in the form of the first varnish layer of the photoresist is formed on the carrier layer and partially exposed, in particular by using the exposure means in the form of a template tape or the like, where the exposed first layer is developed and structured, and then using the first structured layer as a template layer, forming at least one partially shaped functional layer and / or at least one additional layer is partially formed. In this way, it is also possible to produce particularly tamper-resistant multilayer bodies.

The objective is further achieved by using a second multilayer body, which can be obtained by the second method according to the invention, containing at least one partially formed functional layer, precisely aligned with at least one additional partially formed layer, in which the first layer in the form of the first varnish layer of the photoresist is made in a structured form with a pattern on the carrier layer and use the first structured layer as a template layer to form at least one nth partially formed functional layer and / or at least one additional partially formed layer.

The term "functional layer" is used here to denote such a layer that either creates a visible color image at given wavelengths, or its presence can be determined electrically, magnetically or chemically. For example, it can be a layer containing dyes, for example, colored pigments or dyes that look colored, in particular multi-colored, in normal daylight. However, it can also be a layer containing special dyes, for example, photochromic or thermochromic substances, luminescent substances, substances that create an optically variable effect, for example, interference pigments, liquid crystals, metal pigments, etc., chemically active dyes, indicator dyes that interact with other substances with a reversible or irreversible color change, pigments with variable light emission, which, when excited by irradiation with waves, are different different lengths of light emit various colors, magnetic substances, electrically conductive substances, the color of which changes in an electric or magnetic field, which are called e-ink®, etc.

The term “replication layer” is used in general to denote a layer that can be created on a surface with a relief structure. It includes, for example, organic layers, for example, plastic or varnish layers or inorganic layers, for example, of inorganic plastic materials (e.g. silicone), glass layers, semiconductor layers, metal layers, etc., as well as combinations thereof.

The relief structure is created by embossing on the surface of the replication layer in the form of a plastic or varnish layer, in particular, formed from varnish, which hardens under the influence of UV radiation, in particular by means of a tool, in particular a punch or a shaft. The formation of a relief structure on the surface can also be performed by injection molding or by using the photolithography method. The relief structure is formed, in particular, on the surface of the replication layer in the form of a glass, semiconductor or metal layer by using the photolithography method, according to which a photosensitive layer is applied, exposed by using a template and developed. The portions of the photosensitive layer remaining on the replication layer are used as a template for etching and receive a relief structure by etching the replication layer. Then, the photosensitive layer is preferably removed. Depending on the respective manufacturing method used and the ultimate purpose of using the formed multilayer body, transparent or opaque replication layers can be used, in particular replication layers transparent or opaque to the human eye.

Preferably, at least one second embossed structure is made in at least one second portion of the replication layer, wherein at least one second embossed structure has a depth to width ratio (h / d) different from the corresponding parameter of the first embossed structure. The second relief structure is formed, in particular, in the same manner as the first relief structure. In addition, it is possible to produce at least two different second relief structures in at least one second region.

The desirability has been established that the first embossed structure was created with a greater depth to width ratio than at least one second embossed structure, and that the light transmission and, in particular, the light transmission of the first layer in the first section is greater than the light transmission and, in particular, the light transmission of the first layer in at least one second region.

Preferably, the first and / or at least one second relief structure is in the form of a diffractive relief structure. In particular, it is preferable that a diffractive relief structure with a depth to width ratio relating to individual structural elements greater than 0.3 is made in the first region as the first relief structure. The spatial frequency for the first relief structure is selected, in particular, in the range greater than 300 lines / mm, in particular in the range greater than 1000 lines / mm. It can be further ensured that the product of the spatial frequency and the depth of the relief of the first relief structure is greater than the product of the spatial frequency and the depth of the relief of the second relief structure. In this way, it is possible to ensure that the transmittance of the light of the first layer deposited on the replication layer in the first region is greater than the layer deposited in the second region due to the configuration of the relief structure in the replication layer in the first region and in the second region.

The first relief structure and / or at least one second relief structure may be in the form of a diffractive and / or refracting and / or scattering and / or light-focusing micro- or nanostructure, an isotropic or anisotropic opaque structure, a binary or permanent diffraction lens , structures from microprisms, a diffraction grating with a brightness angle, macrostructure, or combinations thereof.

In addition, it is also possible that the first relief structure and / or at least one second relief structure are made in the form of a linear or sinus cross-grid. The spatial frequency of the sine array in this case is in the range greater than 300 lines / mm. In addition, it is possible for the sine lattice to also be based on a transformed linear lattice raster, for example, oriented to a lattice raster of a wavy or circular shape. In the case of a sinus cross-grid, the difference in azimuthal angles is preferably 90 °, but may also include angles in the range of 5 ° to 85 °. In this case, the sine lattice means that the surface relief of the sine structure has a sinusoidal shape. In addition to sinusoidal surface reliefs, relief structures with various types of surface relief forms can also be used, for example, binary (rectangular), triangular and other relief forms.

Relief structures introduced into the replication layer can also be selected so that they can serve to orient liquid crystals (polymers). Thus, the replication layer and / or the first layer can then be used as an orientation layer for liquid crystals. As an example, groove-shaped structures are introduced into such orientation layers, while liquid crystals are oriented in such structures until their orientation is fixed in a given position by crosslinking or some other method. It may be possible to form at least one additional partially formed layer from the crosslinked liquid crystal layer.

Orientation layers may contain areas in which the direction of orientation of the structure is constantly changing. If the area created by such a diffraction structure is viewed through a polarizer, for example, with a rotating direction of polarization, then various distinctly noticeable security features, such as motion effects, can be generated based on a linear change in the direction of polarization of the area. It may also be possible for the orientation layer to contain diffraction structures for orienting the liquid crystals, which are locally differently oriented so that when viewed under polarized light, the liquid crystals represent a block of information, for example, a logo.

Thanks to the use of diffraction relief structures, with the appropriate choice regarding the thickness of the first layer, very large differences can be generated, which can already be perceived by the human eye, in the optical density of the first layer in the first section and in the second section. Unexpectedly, however, it was found that such large differences in the transmission of light in the first and second sections are not necessary for the implementation of the method according to the invention. Structures with small differences in the depth-to-width ratios, with a small layer thickness, usually have relatively small differences in light transmission. However, even small relative differences can be enhanced by increasing the thickness of the first layer and, thus, increasing the average optical density. Thus, good results can be achieved even with very small differences in the transmission of light by the first layer in the first and second sections.

The dimensionless ratio of depth to width is a characteristic sign of an increase in surface area, preferably periodic structures, for example, a sine-square configuration. Here, the distance between the highest and lowest consecutive points of such a structure is called “depth”, i.e. this distance includes the distance between the “peak” and the “trough”. The distance between two adjacent highest points, i.e. between two "peaks", called the "width". Now, the greater the ratio of depth to width, the correspondingly steeper the slopes of the “peak” and, accordingly, the thinner the first layer located on the slopes of the “peak”. The effect of creating a higher level of light transmission, in particular, light transmission by increasing the ratio of depth to width, was also considered in relation to structures with vertical sides, for example, rectangular gratings. However, they may also include structures to which this model cannot be applied. For example, they can include discretely distributed sections in the form of lines, which are made only in the form of a “depression”, where the distance between two “depressions” is many times greater than the depth of the “depressions”. In the formal application of the above definition of the ratio of depth to width, calculated in this way, it would be approximately equal to zero and would not reflect the characteristic physical meaning. Thus, in the case of discretely formed structures formed essentially only from a “trough”, the depth of the “trough” should be attributed to the width of the “trough”.

As was shown, in this respect it is not important that the first layer has a transparent nature in areas with a high ratio of depth to width. It may contain structures that, for example, form optically active portions of a Kinegram® hologram or security element. The only important consideration is that these areas are limited relative to other areas by their light transmission properties of lower or higher optical density.

The first and second embossed structures contain various embossed structures, for example, Kinegram® structures, in which one or more relief parameters, such as orientation, fineness or profile shape, are varied to provide the desired diffraction properties. Thus, the task when using such structures is not only to change the light transmission property of the first layer in the area in which the relief structure is formed in the replication layer, but also to function as an optically variable picture element after coating with a reflective layer or an optical separating layer. If, in addition to such a first relief structure, such a second relief structure is also formed in the replication lacquer layer, the first and second relief structures preferably differ in one or more parameters from the light transmission properties of the first layer and, thus, differ, for example, in depth topography or in relation to depth to width. Thus, it is possible, for example, to form two Kinegram® security elements with filigree linear patterns with partial mutual overlap in the replication layer. The first Kinegram® element constitutes the first relief structure, and the second Kinegram® element constitutes the second relief structure. The relief structures of the two elements differ in a typical ratio of depth to width, while other structural parameters are the same. Thus, there are three “groups” of structures, namely: group I structures in the first Kinegram® element, group II structures in the second Kinegram® element and group III structures or lack of structures in the background. In the first stage, the first layer is left, for example, a metal layer deposited in the vapor phase, for example, a layer of copper, in the area with the Kinegram® element with the first pattern, the rest is removed. Then, for example, a colored functional layer is applied over the entire surface area and removed in the background areas using appropriate processing processes. Thus, two precisely mutually aligned patterns are obtained.

The experiments showed that the difference in the light transmission properties of the first layer, which can be achieved by using different configurations of relief structures in the first and second sections, is especially pronounced in the UV radiation range. Thus, particularly good results can be achieved by using UV radiation for the exposure operation.

The first layer can be very thin with a layer thickness of the order of several nanometers. The first layer is obtained much thinner in areas with a large depth to width ratio due to a larger surface area than in areas with a lower depth to width ratio when applying the first layer with a constant surface density relative to the plane defined by the replication layer. It is preferable to form the first layer in the form of a metal layer or a layer of an alloy of metals. Such layers can be applied by tried and tested methods, for example, by spraying, and they already provide adequate optical density with a small thickness of the layers. However, the first layer may also be a layer containing the material of the functional layer, or a non-metallic layer, which, for example, can be colored, in particular, brightly colored, which can be doped or mixed with nanoparticles or nanospheres to increase its optical density. The desirability of the first layer being formed from a substance containing material for forming liquid crystals has also been proven.

It was also found desirable when applying the first method, that the first layer was applied with constant surface density to the plane defined by the replication layer, and that the first layer was subjected to etching, in particular acid or alkali, during etching as in the first region, and in at least one second region until the first layer is removed in the first region or at least until the transmission of light and, in particular, the light transmission of the first layer It will be increased in the first region relative to the light transmission and, in particular, light transmittance of the first layer at least one second portion or vice versa.

For example, alkalis or acids can be used as an etchant for the first layer. It may further be possible to only partially remove the first layer and interrupt the etching operation when a predetermined light transmission is achieved. In this way, it is possible, for example, to create protective features based on locally different light transmission. If, for example, aluminum is used as the first layer, then, in this way, liquors, for example, NaOH or KOH, can be used as isotropic active etchants. You can also use an acidic medium, for example PAN (a mixture of phosphoric acid, nitric acid and water).

The rate of interaction usually increases with increasing concentration of liquor and temperature. The choice of process parameters depends on the reproducibility of the process and the durability of the multilayer body. Factors that influence the etching process when using liquor are usually the chemical composition of the etching bath, in particular, the concentration of the etching agent, the temperature of the etching bath and the conditions for the material of the layer to be etched to flow into the etching bath. Typical etchant concentrations in the pickling bath are in the range of 0.1 to 10%, and the temperature should be in the range of 20 to 80 ° C.

The etching operation of the first layer can be supported by an electrochemical method. The etching operation is enhanced by applying an electrical voltage. The process is usually isotropic, with the result that an increase in surface area, depending on the structure, leads to an additional increase in the etching efficiency. To support the etching process, for example, to remove oxide layers, typical electrochemical additives, for example, wetting agents, buffering agents, inhibitors, activating agents, catalysts, etc. can be used.

During the etching process, a weakening of the etchant medium or saturation of the etching products, respectively, at the interface between the bath and the first layer can occur, as a result of which the etching rate decreases. Enhanced thorough mixing of the etching medium, possibly by creating an appropriate flow or by ultrasonic excitation, it is possible to improve the characteristics of the etching process.

The etching process can be further adjusted by controlling the temperature over time to optimize the results of the etching process. Thus, it is possible to perform etching in the cold state at the beginning of the process and to increase the temperature with an increase in the processing time period. In an etching bath, in which a three-dimensional temperature gradient is preferably maintained, a multilayer body is passed through an elongated etching bath with different temperature zones.

The last nanometers of the first layer can be relatively unstable and resistant to the action of the etching bath during the etching process. To remove residues of the first layer during the etching process, it is thus preferable to create a small mechanical support. The instability is based on a possible slight difference in the chemical composition of the first layer, presumably due to the action of the inter-surface layer at the interface during the formation of the first layer on the replication layer. In this case, the last nanometers of the first layer are preferably removed by wiping while passing the multilayer body over a shaft covered with a thin cloth. The fabric erases the remains of the first layer without damaging the multilayer body.

The etching process should not include a treatment step carried out using liquids. The etching process can also be a “dry process”, for example, plasma etching.

However, it may also be possible to partially (partially) remove the first layer, but only to reduce its thickness. Such an embodiment may be particularly preferred if it is necessary to form areas with layers deposited on each other, for example, to vary optical and / or electrical properties or to create decorative effects.

Desirability was also proven by applying the first method of applying the first layer with constant surface density to a plane defined by the replication layer, and using the first layer as an absorbing layer to partially remove the very first layer by exposing the first layer with a laser beam to the first section, as well as second section.

In the case of structures with a large depth-to-width ratio and, in particular, relief structures in which the typical distance between two adjacent elevated parts is less than the wavelength of the incident light, called zero-order structures, most of the incident light can be absorbed, even if the degree the reflection of the reflective layer is high in the area having a mirror reflective effect. The first layer in the form of a reflective layer is irradiated with a focused laser beam, in which case the laser radiation is absorbed to an increased degree, and the temperature of the reflective layer increases accordingly in areas with high absorption, which contain the aforementioned relief structures with a large ratio of depth to width. At high levels of energy supply, the reflective layer may peel off locally, in which case the first layer in the form of the reflective layer is removed or ablated, or the material of the reflective layer or the first layer coagulates. If the energy supply from the laser takes place only for a short period of time, and if the heating is thus small, then ablation or coagulation occurs only in areas predetermined by the relief structure.

Factors influencing laser ablation are: configuration of the relief structure (periodicity, depth, orientation and profile), wavelength, polarization and angle of incidence of the laser beam, duration of exposure (time-dependent power) and local dose of laser radiation; the absorption properties and characteristics of the first layer, and whether there are possibly additional layers deposited on top and supported below the first layer, for example, a structured photosensitive layer or a washable lacquer layer.

Among other things, it was found that lasers suitable for laser processing are yttrium-aluminum garnet lasers with Nd: Nd: YAG. They emit light with a wavelength of about 1064 nm and are preferably also pulsed. You can also use diode lasers. The laser wavelength can be changed by changing the frequency, for example, by doubling the frequency.

The laser beam is carried out on top of the multilayer body using a tool called a scanning device, for example, using galvanometer mirrors and light-focusing lenses. Pulses of a duration ranging from nanoseconds to microseconds are emitted during scanning and produce the above-described ablation or coagulation of the first layer, predefined by the structure. The duration of the pulses is usually less than a millisecond, preferably in the range of a few microseconds or less. Of course, pulses of duration ranging from nanoseconds to femtoseconds can also be used. Precise positioning of the laser beam is not required, since the process is self-executing, insofar as the photosensitive layer or washable varnish layer, which is partially present in the structured form, prevents the laser radiation from accessing the first layer. The process is preferably further optimized by appropriate selection of the laser beam profile and by overlapping adjacent pulses.

However, it is also possible to control the movement of the laser beam over the multilayer body to ensure precise alignment with the relief structures formed in the replication layer, or with holes in the photosensitive layer or washable lacquer layer so that only areas with the same relief structure or holes in a photosensitive layer, or without holes in the photosensitive layer, or in a washable lacquer layer. For example, camera systems can be used for such control.

Instead of a laser focused on a point or line, you can also use devices that irradiate a specific area, emitting short controlled pulses, such as flash lamps.

The advantage of the laser ablation process is, among other things, that partial removal of the first layer to ensure accurate alignment with the relief structure can also be achieved if it is coated on both sides with one or more additional layers transparent to laser radiation, and, thus directly inaccessible to the etching medium. The first layer is only cracked with a laser. The material of the first layer is again located in the form of small conglomerates or small balls that are not optically visible to the observer and only slightly affect the light transmission of the irradiated area.

The remains of the first layer, still remaining on the replication layer after laser treatment, in the first section may possibly be removed by subsequent washing or by etching, if the first layer is directly accessible for this. After etching the first layer, the rest of the etching pattern can be removed.

It is particularly preferable when using the first method that the first layer is applied with a constant surface density relative to the plane defined by the replication layer, and that the first layer is already formed with a layer thickness such that the light transmission and, in particular, the light transmission of the first layer in the first section is greater light transmission and, in particular, light transmission of the first layer in at least one second section and vice versa.

It is particularly preferable when using the first method that the first layer is applied with a constant surface density relative to the plane defined by the replication layer, and that the first photosensitive varnish layer is applied to the first layer or the replication layer is formed from the first photosensitive washable varnish layer, where the first photosensitive varnish layer or the first the wash-off varnish layer would be exposed through the first layer so that the first photosensitive varnish layer or first the first washable varnish layer was exposed to varying degrees due to the action of the first relief structure in the first and at least one second area, where the exposed first photosensitive varnish layer or the first washable varnish layer would be structured, and either the first structured one would be used simultaneously or subsequently a photosensitive varnish layer or a washable varnish layer as a first template layer; the first layer would be removed and thus structuring would be performed in the first region, but not in at least one second region, or in at least one second region, but not in the first region.

The method may furthermore be such that a photosensitive material having a binary characteristic is applied as a photosensitive layer or a photosensitive washable lacquer layer, and a photosensitive layer or a photosensitive washable lacquer layer is exposed through the first layer with such an exposure force and during such an exposure time that the photosensitive layer or photosensitive washable varnish layer is activated in the first section, in which the light transmission of the first layer increased due to the first relief structure, but is not activated in the second section. The method according to the invention can also be applied if the optical densities of the first and second sections are only slightly different from each other, and in this case, as already mentioned above, it is unexpectedly possible to assume that the optical density is obtained from high to medium.

The photosensitive layer or washable lacquer layer may be a photoresist, which may be in the form of a positive photoresist or a negative photoresist. Thus, using the existing replication layer, which otherwise has the same nature, it is possible to remove various portions of the first layer.

It may also be possible to use the photosensitive layer in the form of a photopolymer.

Depending on whether the photosensitive layer or the wash-off varnish layer is positive or negative photoresist, it hardens in the first areas or becomes soluble in the developer. In this regard, layers of positive and negative photoresist can also be applied directly next to each other and exposed at the same time. In this case, the first layer serves as a template, and it is preferably placed in direct contact with the photoresist so that accurate exposure can be made. When a photoresist occurs at the end of the process, uncured areas are washed off or damaged areas are removed. Depending on which photoresist is used, the developed photoresist is now either present precisely in areas where the first layer is either transparent or opaque to UV radiation. In order to increase the durability of the photoresist layer that has remained and which has been structured according to the first layer, the remaining regions are preferably then cured after the development operation.

The first layer is used, in particular, as a template layer to partially remove the very first layer, insofar as the photosensitive layer or a washable lacquer layer adjacent to the first layer is exposed through the first layer. This achieves advantages in comparison with the template layers used in conventional methods, since, using the template layer, they provide precise mutual alignment without complications and increase the costs associated with register adjustment. Only tolerances of the relief structure affect the tolerances of the locations of the sections of the first layer with different light transmission. Lateral displacement between the first relief structure and these sections of the first layer does not occur. The location of the sections of the first layer with the same physical properties is thus precisely aligned with the first relief structure.

With regard to the methodology for using the photosensitive layer, in addition, it is also possible that if the photoactivated layer is applied as the photosensitive layer to the first layer, then the photoactivated layer is exposed through the first layer and the replication layer and activated in the first section; and the activated portions of the photoactivated layer form means for etching the first layer so that the first layer is removed in the first section and thus structured.

The photosensitive layer or washable varnish layer can be further partially removed if the exposed areas are structurally weakened so that the exposed areas can be removed by scraping, brushing, erasing, ultrasonic or laser processing, and the like. If the fragility of the layer is partially increased as a result of exposure to a photosensitive layer or a washable varnish layer, the replication layer, due to the fact that it is elastic or flexible, can be passed over a sharp edge or knife blade and brittle sections can be separated.

When using the preferred configuration, it is possible to expose a UV-sensitive photosensitive layer or a washable lacquer layer through the first layer.

Accordingly, the first layer can be structured or partially removed in various ways immediately or after completing additional steps of the method. In this regard, at least one partially formed functional layer is formed immediately and / or subsequently using the first structured layer as a template layer.

Regarding the first method and the first multilayer body, the invention is based, on the one hand, on the fact that, using the properties of the first relief structure in the first portion of the replication layer, they affect the physical properties of the first layer deposited on the replication layer in this portion, for example, effective thickness or optical density, so that the light transmission properties of the first layer are different in the first and second sections. The first layer is applied to the replication layer, preferably by spraying, vapor deposition, in powder form or as a spray. Thanks to the technique used, the spraying operation entails the directed deposition of the material in such a way that during the spraying operation of the material of the first layer with a constant surface density relative to the plane defined by the replication layer, the material is deposited with a locally different thickness on the replication layer, provided with a relief structure. With regard to the technology of the method, it should be said that the application of the first layer in the vapor phase or in the form of a powder or in the form of a spray preferably also includes the creation of at least partially directed application of the material.

When performing the first method, a partially formed functional layer is preferably directly created by the first layer. In addition, it is also preferred that a partially formed functional layer is directly formed by the first structured photosensitive layer or the first washable lacquer layer.

Finally, desirability was also proved in the first method, if at least one partially formed functional layer and / or additional partially formed layer is formed using the procedure according to which the first varnish layer of positive or negative photoresist is then applied, then the first varnish layer of the photoresist is exposed through the first structured layer and the first exposed lacquer layer of the photoresist is structured.

Preferably, if a corresponding partially formed functional layer is formed, ensuring accurate mutual alignment with the first relief structure and at least one second relief structure, then in this case different varnish layers of the photoresist, in particular, differently colored varnish layers of the photoresist, are used to form partially formed functional layer. It is possible to use varnish layers of a photoresist that have substantially different properties, for example, spectral sensitivity, chemical composition, positive or negative characteristics, etc. However, it is also possible to use the same varnish layers of the photoresist, which, however, exhibit in various ways. Differences between the two varnish layers of the photoresist can be detected, in particular, by using the properties provided by the exposure operation, for example, wavelength, angle of incidence, polarization, etc.

Due to the nature of the first embossed structure and possibly also the nature of the first layer or additional layers, the adhesive property and / or diffusion resistance and / or surface reactivity of the replication layer or additional layers can be exerted locally so that the material for forming the first layer or additional layers, glued, diffused, or interacted with the replication layer or additional layers in locally different ways. When the material diffuses into the replication layer, part of the replication layer, including the material diffused into it, becomes the first layer.

Alternatively, the replication layer is partially created by diffusing the coloring agent itself into it, partially in the form of a partially formed functional layer, in which case an additional layer partially formed on the replication layer, for example, a structured photosensitive metal layer or an organic dielectric layer, functions locally as diffusion barrier. The photosensitive layer can be removed after partially staining the replication layer or before applying an additional layer.

It was further proven desirable when using the first method, that if the first layer is formed by applying a powder or liquid medium, then the first layer is structured, possibly after physical or chemical treatment of the powder or liquid medium, or either directly form at least one partially the formed functional layer, and / or using the first structured layer as the template layer, then at least one partially formed functional layer is formed.

The powder is applied, in particular, by sputtering or scattering, while the liquid medium is applied, in particular, by casting, printing or spraying. A mechanical action on the embossed structure can then be performed, for example, shaking, brushing or the like. Then, the first layer is partially removed in areas where adhesion is less or diffusion resistance is increased by mechanical removal, in particular by scraping with a scraper, air scraper or scraping blade, chemical dissolution, washing or a combination of these operations. The structuring of the first layer is preferably carried out with a scraping blade or scraper, which is moved along the replication layer, where parts of the first layer that have not penetrated into the recesses of the relief structure are removed. Then, a time-etched etching process can be performed to remove residual first layer or colored veils in flat areas. The etching process can also be used locally to influence the thickness of the first layer in the relief structure, to bring different levels of color saturation, or to regulate the iridescentness of the first layer with the effect of interference depending on the viewing angle.

However, the washing process may also be suitable for structuring the first layer, in particular if the capillary forces in the relief structure are sufficient to secure the material that gets there from the first layer during washing. Here, in certain relief structures containing macroscopic recesses, as well as in additional recesses, a microstructure may be preferable.

In an additional preferred embodiment, a relief structure is formed by creating at least two grooves of different depths, or at the bottom of at least two grooves of different depths, where each of the grooves, in particular, has a depth in the range from 1 μm to 10 μm and a width in the range from 5 microns to 100 microns. If the grooves are filled, for example, with a stained photoresist and the replication layer is freed from the photoresist in areas without grooves, different levels of color saturation are obtained depending on the depth of the grooves and, possibly, additional optical effects.

In this case, it is also additionally possible that the configuration of the first relief structure, possibly also the configuration of the first layer or additional layers, locally affects the adhesion property and / or diffusion resistance and / or surface reactivity of the replication layer or additional layers so that the powder or the liquid medium adheres locally in various ways to the replication layer or additional layers, diffusing into it (into them) or interacting with it (with them).

Then, in a preferred embodiment, at least one partially formed functional layer or at least one additional partially formed layer is formed by an operation in which a first varnish layer of a positive or negative photoresist is applied, where the first varnish layer of the photoresist is exposed through the first structured layer and structured exposed first lacquer layer of the photoresist.

In addition, as an option, the replication layer is also partially formed by diffusing the coloring matter into it in the form of a partially formed functional layer, in which case the replication layer itself or a layer partially formed on it is locally used as a diffusion barrier.

With respect to the first method, the replication layer is at least partially flat, in particular in at least one second region. This is facilitated, for example, by cleaning the surface with a scraping scraper or a scraping blade, since the flat sections serve optimally as a support due to this. In addition, the flat areas can be coated with a metal reflective layer so as to create the optical effect of the mirror surfaces.

Finally, with regard to the first method, for the formation of relatively thick partially formed layers, the desirability of raking the material into exposed portions of the replication layer containing the first relief structure or at least one second relief structure, which when viewed in a direction perpendicular to the plane of the replication layer, was established. surrounded by a partially formed functional layer or an additional layer, and the formation of at least one additional partially with normed functional layer or an additional layer partially formed.

Regarding the second method, it has been found desirable that if at least one partially formed functional layer or at least one additional partially formed layer is formed by an operation in which a second lacquer layer of positive or negative photoresist mixed with a coloring material is applied, then the second varnish layer of the photoresist is exposed through the first structured layer, and the exposed second varnish layer of the photoresist is structured. In this regard, it is preferable if the first or second varnish layer of the photoresist is at least one partially formed functional layer. Subsequently, as an option, the carrier layer is formed partially by diffusion of the coloring matter, in the form of a partially formed functional layer or an additional layer, where at least the first and / or second structured varnish layer of the photoresist serves as a diffusion barrier.

Alternatively, the material is raked into open areas of the carrier layer, which, when viewed in a direction perpendicular to the plane of the carrier layer, are surrounded by a partially formed functional layer or an additional partially formed layer, and at least one additional partially formed functional layer or an additional partially formed layer is formed.

The configuration of the photoresist layers and, optionally, also the configuration of the additional layers, possibly also locally affects the adhesive property and / or diffusion resistance, and / or the surface reactivity of the carrier layer or additional layers so that the material for forming a partially formed functional layer or additional layers adheres to the carrier layer or additional layers in a locally different manner, diffuses into it or interacts with it. During the operation of diffusing the material into the carrier layer, a part of the carrier layer, including the material diffused into it, becomes a partially formed functional layer or an additional partially formed layer.

In addition, it was established that when using polyester as a replication layer or a carrier layer and using a metal layer as the first layer, the areas left in this case would be exposed by exposure to an electrostatic field, and the powder would be selectively deposited on the left areas due to different field characteristics, in the same way as the coloring powder. Thermal bonding of the powder is then performed to form a closed, firmly bonded, partially formed functional layer or additional layer.

The first layer is, therefore, usually a layer that can perform two functions. On the one hand, it can perform the function of a high-precision photomask to perform an operation associated with a partially formed functional layer and / or additional layers, while, on the other hand, at the end of the manufacturing process, it itself forms a partially formed layer that is very precisely positioned, for example , a partially formed functional layer or an additional layer, possibly in the form of an OVD layer (OVD - optical video disc), in the form of a conductive track or a functional layer of an electrical component, for example ep, an organic semiconductor component, a decorative layer, for example, a bright multicolor layer, etc.

Preferably, at least one partially formed functional layer is in the form of a lacquer layer or a polymer layer. Materials for the aforementioned preferred functional layer, for example pigments or dyes, can be readily incorporated into such a layer.

In particular, at least one partially formed functional layer is created with the addition of one or more, in particular non-metallic materials of the functional layer.

It is particularly preferable from the point of view of imparting a decorative effect to a partially formed functional layer if at least one partially formed functional layer is made with the addition of one or more colored, in particular bright multi-colored materials of the functional layer.

At least one additional partially formed layer is formed, in particular, by using the first layer and / or at least one colored lacquer layer from a positive or negative photoresist, and / or by using at least one optically variable layer with an optical effect, which varies depending on the viewing angle, and / or through the use of at least one metal reflective layer, and / or through the use of at least one dielectric -parameter reflecting layer. It may be possible to use, for example, TiO ₂ or ZnS as the dielectric. At least one partially formed functional layer and at least one additional partially formed layer can be formed with different refractive indices in such a way that optical effects can thereby be achieved.

The first layer and / or the second layer can also be made of polymer so that, for example, one layer can be electrically conductive and the other layer can be an electrical insulator, in which case both layers can be made in the form of transparent layers.

The optically variable layer is preferably such that it contains at least one substance with an optical effect that varies depending on the viewing angle, and / or is formed by using at least one layer of liquid crystals having an optical effect that varies depending on the viewing angle, and / or by using a thin film formed from the reflective layer from the set of layers, having an interference color effect depending on the angle of otreniya.

In addition, it has been established that the first structured layer is at least partially removed and replaced by at least one partially formed functional layer and / or at least one additional partially formed layer. You can also perform a complete deletion of the first structured layer.

An equally hydrophilic or hydrophobic medium with functional components (e.g., dyes, pigments) can be partially applied on top of the hydrophobic or hydrophilic deposited layer, which is partially formed by performing the next process step, for example, printing, dipping or spraying.

In a preferred configuration, the first additional partially formed layer can be applied to areas in which the first layer has been removed. It may further be possible for the residues of the first layer to be replaced after complete removal by a second additional partially formed layer. A multilayer body can now only contain high-resolution color printing from a photoresist for the observer, but otherwise it can be transparent. In this case, the photoresist serves as an etching pattern for the first layer.

The method according to the invention, therefore, is not limited to partial removal of the layer, but may include additional steps in which the layers are replaced or the steps are repeated using differences in optical density to form or differentiate sections.

Preferably, high-resolution display elements can thus be formed. It is possible, without departing from the scope of the invention, to apply elements of different colors of the display to ensure accurate mutual alignment and place them, for example, in a pixel raster grid. Since various multilayer bodies can be manufactured with the initial configuration of the first layer, using a procedure in which, for example, various exposure and etching processes are performed simultaneously or sequentially, positioning with accurate mutual alignment of successively applied layers is possible using the method according to the invention, despite to increase the stages of the method.

It may further be possible for the first layer and / or at least one partially formed functional layer and / or at least one additional partially formed layer to be galvanically strengthened if the structure contains electrically conductive layers or layers suitable for currentless electroplating.

Preferably, if at least one partially formed functional layer, when viewed in a direction perpendicular to the plane of the replication layer or the carrier layer, is formed to ensure accurate mutual alignment with at least one additional partially formed layer located above or below.

As an alternative to this, however, it is equally desirable if at least one partially formed functional layer, when viewed in the direction perpendicular to the plane of the replication layer or the carrier layer, is formed alternately or at a uniform interval relative to at least one additional partially formed layer.

Particularly attractive optical effects can be achieved if at least one first transparent separation layer is arranged between at least one partially formed functional layer and at least one additional partially formed layer. As an alternative to this or in combination with this, at least one second transparent separation layer is arranged between at least two additional partially formed layers. Thus, various color effects can be obtained and / or patterns can be made visible at different viewing angles, or the impression of three-dimensionality of the pattern or its optical depth can be obtained. The effect can also be enhanced if the first and / or second separation layer is formed locally from at least two layers of different thicknesses. In combination with this, at least one partially formed functional layer and at least one additional partially formed layer may have (each) a configuration formed of lines, and in this case, in particular, by constantly varying the line widths, an additional optical effect can be created .

It has been found desirable that the first and / or second separation layers be formed locally with a layer thickness in the range of less than 100 μm, in particular in the range of 2 μm to 50 μm.

It is particularly preferred that the at least one partially formed functional layer and the at least one additional partially formed layer have such a configuration that at least one optical position effect takes place that may become visible depending on the viewing angle, in particular, moire effect or shading effect.

The first layer is preferably applied over the entire surface to a replication layer or carrier layer with a thickness in which the first layer is opaque to the human eye and, in particular, has an optical density greater than 1.5, in particular an optical density in the range of 2 to 7 More specifically, it has been unexpectedly found that the ratio of the light transmission values of areas with a diffractive relief structure can be increased by increasing the opacity of the first layer. If, therefore, exposure is performed with an appropriate luminous intensity through a layer, usually called opaque (for example, having an optical density of 5), which due to its high optical density is usually not used as a template layer, then especially good results can be obtained.

A particularly preferred embodiment is one in which at least one partially formed functional layer and at least one additional partially formed layer are such that when viewed in a direction perpendicular to the plane of the replication layer or the carrier layer, they complement each other, creating a decorative and / or an informative geometric, alphanumeric, graphic, graphic or figurative representation.

In this regard, an embodiment which has been shown to have particularly significant counterfeit security is an embodiment in which at least one partially formed functional layer and at least one additional partially formed layer (each) have at least separate parts of the configuration formed of lines in which the lines are mixed with each other without bias and, in particular, also mixed with each other with a constant color configuration, for example, in IU rainbow. Different lines can also be alternatively or additionally mutually arranged side by side and can form a pattern of concentric circles.

In this regard, the particular preference for using thin lines has been proven, in particular if the lines, when viewed in the direction perpendicular to the plane of the replication layer or the carrier layer, are made in a width in the range less than 50 μm, in particular in the range from 0.5 μm to 10 microns.

In the manufacture of a multilayer body according to the described method, however, it may also be possible for the second region to contain two or more subareas covered by the first region, where the second diffraction relief structure is formed in the replication layer in the second region, and the first layer is a reflective layer , which is removed in the first section and, thus, formed to ensure accurate mutual alignment with the second relief structure. Such multilayer bodies can be successfully manufactured as counterfeit-protected security elements. They are especially well protected from counterfeiting, since particularly thin lines can be created by the method according to the invention. In addition, due to their diffraction structure and their orientation with exact mutual alignment with the reflective layer, these thin lines can be used to create optical effects, the fake of which is extremely difficult.

It may also be possible for the first region to contain two or more sub-regions covered by the second region, or vice versa, and the first layer to be a reflective layer that is removed in the second region, and thus be formed to ensure accurate mutual alignment with first relief structure. Preferred configurations are those in which the sub-sections of the second section or sub-sections of the first section, respectively, have a width of less than 2 mm, preferably less than 1 mm.

The at least one partially formed functional layer is preferably dyed with at least one opaque and / or at least one transparent dye, which is dyed or creates color, at least in the wavelength range of the electromagnetic spectrum, and, in particular, is bright multicolor or creating a bright color. In particular, it has been shown that it is desirable that the coloring matter be included in at least one partially formed functional layer that can be excited by radiation outside the visible spectrum, for example, UV radiation or infrared (IR) radiation, and can create visually distinguishable painted image. Thus, at least one partially formed functional layer can be provided with at least one dye or pigment that is excited by irradiation and fluorescent in red, green and / or blue, and thus creates a complementary color when irradiated.

At least one colorant is preferably selected from the group of inorganic or organic colorants, in particular pigments or dyes.

Among other things, coloring agents which luminesce and, in particular, fluoresce upon irradiation or are excited by UV radiation in the visible wavelength range are particularly preferred. In this regard, you can use luminescent pigments, dyes or copolymers, which in the absence of excitation are colored or colorless in the visible wavelength range. In addition, you can use a mixture containing at least two or more luminescent dyes of the same type or different types.

The pigments can be in the form of nanopigments ranging in size from 1 nm to 100 nm. Especially preferred in this regard are fluorescent nanopigments that are colorless in the visible wavelength range, which fluoresce under the influence of UV radiation, in particular at a wavelength of 254 nm, 313 nm or 365 nm. Nanopigments can be dispersed by simple mixing with a printed medium and can easily be incorporated into inkjet printing inks, while conventional pigments need to be triturated with a printing medium using complex and expensive operations to obtain a suitable dispersion. With regard to nanoparticles and their use, attention should be paid to WO 03/052025 A1.

It is particularly preferable to use a luminescent dye or a combination of at least two luminescent dyes which, when excited by various wavelengths, emit light of various visible colors. In this case, at least one luminescent glow can occur in the range of infrared and / or visible and / or ultraviolet radiation. Thus, for example, a single dye, when excited by UV radiation with a wavelength of 365 nm, can emit a colored fluorescent image in the visible range of light that differs from the emitted light when excited by UV radiation with a wavelength of 254 nm in the visible range of light. Such a bifluorescent pigment that fluoresces in the visible light in red when excited by UV radiation with a wavelength of 254 nm and fluoresces in the visible light in blue and white when excited with UV radiation with a wavelength of 365 nm, can be obtained, for example, under the designation BF11 from the organization Specimen Document Security Division (Hungary, Budapest). Examples related to monoluminescent dyes that emit visible light of various colors upon excitation and which can be used in combination can also be found in US Pat. No. 5,005,873.

Particularly preferred is a combination of luminescent dyes that are colorless in the visible wavelength range but luminescent with a colored glow under the influence of UV radiation in the visible range so that a true color image is obtained.

Organic luminescent dyes, excited by UV radiation, can be obtained, for example, under the designation UVITEX ^® , which, for example, fluoresce under the influence of UV radiation and in the visible range of light.

Among other materials, inorganic, excited luminescent coloring materials can be obtained, for example: La ₂ O ₂ S: Eu, ZnSiO ₄ : Mn or YVO ₄ : Nd and, for example, under the designation LUMILUX®.

Luminescent copolymers are, for example, copolyamides, copolyesters or copolyetheramides mixed with fluorescent components.

Luminescent dyes and mixtures thereof can be used for this separately or in combination with conventional non-luminescent dyes.

A particularly attractive configuration is a configuration comprising at least one partially formed functional layer and at least one additional partially formed layer of mutually complementary colors, for example, red and green, at least when viewed from a given angle or under the influence of a given type of radiation.

Particularly remarkable and attractive effects are obtained when using the first multilayer body if at least one partially formed functional layer and / or at least one additional partially formed layer is coated with a diffractive relief structure and creates a holographic or cineographic optically variable effect.

A preferred first embodiment of the multilayer body is formed if at least one partially formed functional layer is, in particular, an opaque metal layer, and at least one additional partially formed layer is a painted lacquer layer or vice versa.

A preferred second embodiment of the multilayer body is formed if at least one partially formed functional layer is a layer containing liquid crystals, and at least one additional partially formed layer is a painted lacquer layer or vice versa.

A preferred third embodiment of the multilayer body is formed if at least one partially formed functional layer is formed from a reflective layer from a set of layers of a thin film having an interference color effect depending on the viewing angle, and at least one additional partially formed layer is a painted lacquer layer or vice versa.

A preferred fourth embodiment of the multilayer body is formed if at least one partially formed functional layer is a first painted lacquer layer and at least one additional partially formed layer is an additional differently painted lacquer layer.

A preferred fifth embodiment of a multilayer body is formed if at least one partially formed functional layer is a first painted lacquer layer and at least one additional partially formed layer is a dielectric reflective layer or vice versa.

In this case, it is preferable that the lacquer layers be painted with at least one opaque and / or at least one transparent substance. In particular, it was established that the painted lacquer layer was painted with at least one coloring material of yellow, magenta, cyan or black (CMYK model) or red, green and blue (RGB model). Accordingly, various color impressions can be created by both subtractive and additive color mixing, which, for example, can be accomplished by applying the above pigments or dyes, excited by radiation (for example, UV radiation, IR radiation).

The aforementioned fifth embodiment, in which the multilayer body comprises at least one partially formed functional layer in the form of a first painted lacquer layer and at least one additional partially formed layer in the form of a dielectric reflective layer, or vice versa, is particularly suitable for using varnish layers containing luminescent dyes, excited by UV radiation. More specifically, it has been found that various transparent layers of dielectrics, for example, a ZnS layer or many plastic materials, do not allow UV radiation to pass through and thus excitation of the colored layers containing luminescent coloring materials excited by UV radiation formed behind these materials in the course of radiation, is excluded or at least difficult. For this reason, in the fifth embodiment, the varnish layer can be positioned alternately with respect to the dielectric reflective layer so that the varnish layer to be excited by UV radiation should preferably be located only in areas where the dielectric reflective layer is not between the UV source radiation and a varnish layer, in the course of radiation.

In addition, it was established the desirability that at least one partially formed functional layer and / or at least one additional partially formed layer constituted (composed) at least in separate sections, a raster image formed from pixels, dots or lines Images that cannot be distinguished separately by the human eye.

Rasterization of the first layer is also possible for an effect in which, in addition to raster elements provided with a supported reflective layer and containing, possibly various, diffractive structures, there are raster elements representing transparent areas without a reflecting layer. In this regard, an amplitude modulated or surface modulated raster can be selected as a raster effect. Interesting optical effects can be achieved by a combination of such reflective / diffractive regions and non-reflective, transparent (under certain conditions also diffractive) regions. If such a bitmap is placed, for example, in a window of a valuable document, then a transparent bitmap can then be seen in the transillumination mode. In incident light, this image is only visible when viewed in a given range of angles in which light is not diffracted / reflected by reflective surfaces. In addition, you can also use such elements not only in a transparent window, but also overlay on a colored print. A colored print is visible, for example, in the form of a raster image in a given range of angles, while in a different range of angles it is not visible due to light reflection by diffraction structures or other (macro) structures. In addition, it is also possible to create a plurality of outgoing reflective regions with diminishing reflectivity by means of an appropriately selected raster.

Finally, it has been proven that the creation of at least two additional partially formed layers is optically attractive.

The replication layer may be located on the carrier layer, for example, if the replication layer is not self-supporting or at least is a very thin layer. The carrier layer is adapted so that it can be removed or separated, in particular from the formed multilayer body.

An embodiment of a multilayer body in the form of a film element, in particular in the form of a light transmitting film, a hot embossed film or a laminated film, is preferred. In this case, the film element preferably comprises an adhesive layer on at least one side thereof.

A multilayer body, however, can be not only a film element, but also a solid. Film elements are used, for example, to place them on documents, banknotes, etc., with security features. They may also contain security threads for weaving them into paper or inserting them into a card, which can be produced by the method according to the invention with a partially formed functional layer perfectly aligned with an additional partially formed layer. Preferably, solids, for example, an identity card, a base for a sensor element, semiconductor chips or surfaces of electronic devices, for example, body parts of a cell phone, can also be provided with a multilayer body according to the invention.

The security element for security or valuable documents provided with a multilayer body according to the invention or formed at least partially from a multilayer body is particularly tamper-resistant and has a visually attractive appearance. In particular, an identity card or pass, passport, bank card, identity card, banknote, security, ticket or security packaging, etc. considered as a protected or valuable document. To protect such documents, it is preferable to have at least a partially transparent multilayer body as a security element, in particular in important areas of the document, for example, in the field of photography in the passport or in the signature area of a person or throughout the document or in the document window. In addition, it is possible to make the first block of information visible in such a window as a reflection, and the second block of information could be visible in the light. New security elements can be generated with a particularly good and filigree appearance. Thus, it is possible, for example, to create images that are translucent when viewed in the light by forming a raster in at least one partially molded functional layer and / or an additional partially molded layer.

In addition to the multilayer body, the security document may also contain additional security means, for example, printed layers containing optically variable coloring materials, magnetic layers, watermarks, etc. In this case, the printed layers can be integrated into security elements or formed directly on the substrate of the security document. If the printed layers are formed on a security document containing luminescent coloring materials that are excited by exposure to UV radiation, it has been shown to be desirable that, for the reasons already mentioned, they should not be coated with transparent dielectric layers, for example, a ZnS layer that acts as UV filters and prevent or impede the excitation of fluorescent dyes.

The use of printed inks having a color under normal lighting conditions and additionally containing fluorescent dyes excited under the influence of UV radiation means, however, that it is also possible to create interesting optical effects if the printed image obtained from them is partially coated with a transparent dielectric layer transmissive to UV radiation, and partially not covered. In the event of exposure to UV radiation, a familiar color will then still be emitted in areas of the printed image where the transparent dielectric layer serves as a UV filter, while a fluorescent image occurs in areas where UV radiation falls directly onto the printed ink of the printed image . Depending on the corresponding configuration of the holes in the transparent dielectric layer, thus, fluorescent images appear in the form of a pattern or in the form of alphanumeric characters, etc. regardless of the shape of the printed image.

Electronic components can, however, also be manufactured with a multilayer body according to the invention. For example, at least one partially formed functional layer and / or at least one additional layer may constitute an electronic component, an antenna, a capacitor, a coil, or an organic component of a semiconductor. At least one partially formed functional layer and / or at least one additional partially formed layer may also contain a polymer so that, for example, one layer can be in the form of an electrical conductor and the other layer in the form of an electrical insulator, in which case both layers can be in the form of transparent layers.

As mentioned previously, it is possible to provide additional layers that can be formed on the multilayer body to ensure accurate mutual alignment by the method according to the invention. Multilayer bodies according to the invention are suitable, for example, as optical components, for example, lens systems, templates for exposure and projection. They can also be used as components or decorative elements in the field of telecommunications.

Additional optical effects can be created if at least one partially formed functional layer and / or at least one additional layer is formed or formed from a plurality of sublayers, in particular if the sublayers constitute a system of thin film layers.

It may be possible to form sublayers of various materials. Such a configuration can be provided not only for the aforementioned system of thin film layers. Thus, it is also possible, for example, to produce functional elements using nanotechnology, for example, a bimetallic switch with a size of several nanometers from two different layers of metal can be manufactured.

The methods of the invention encompass many different possible embodiments by creating multilayer bodies, and the stages of the methods are not limited to one use, for example, of an increasingly complex multilayer body. In addition, the layers of the multilayer body can be chemically, physically or electrically processed anywhere in the process, for example, to change the mechanical or chemical resistance or to influence another property of the corresponding layer.

Regardless of the above, the invention here also provides in general terms a security element and a method for manufacturing a security element comprising a transparent dielectric layer that is opaque to UV radiation, in particular a reflective layer provided with holes, where when viewed in a direction perpendicular to the plane of the dielectric layer a lacquer layer is formed containing luminescent dyes excited under the action of UV radiation from the side of the dielectric layer remote from the observer by at least at least partially and at least in the area of the holes in it.

The invention is described by way of example with reference to the drawings, in which:

figure 1 is a schematic section of a first embodiment of a multilayer body according to the invention;

figure 2 is a schematic section of the multilayer body shown in figure 1, obtained in the first stage of its manufacture;

figure 3 is a schematic section of the multilayer body shown in figure 1, obtained in the second stage of its manufacture;

figure 4 is a schematic section of the multilayer body shown in figure 1, obtained in the third stage of its manufacture;

figure 5 is a schematic section of the multilayer body shown in figure 1, obtained in the fourth stage of its manufacture;

Fig. 5a is a schematic sectional view illustrating a modified embodiment of the manufacturing step of Fig. 5;

Fig. 5b is a schematic cross-sectional view illustrating a manufacturing step to be performed after the step shown in Fig. 5a;

in Fig.6 is a schematic section of the multilayer body shown in Fig.1, obtained in the fifth stage of its manufacture;

in Fig.7 is a schematic section of the multilayer body shown in Fig.1, obtained in the sixth stage of its manufacture;

on Fig is a schematic section of another multilayer body;

figure 9 is a schematic section of another multilayer body;

figure 10-13 is a schematic section of a multilayer body obtained in the subsequent stages of manufacture related to the first method;

Fig. 14 is a schematic sectional view illustrating a manufacturing step related to the first method;

on Fig (A) -15 (F) are additional schematic sections of a multilayer body related to the first method;

Fig. 15 (G) is a plan view of a multilayer body formed according to the method illustrated in Figs. 15 (A) -15 (F);

in Fig.16 (A) -16 (C) are additional schematic sections of a multilayer body related to the first method;

on Fig (A) -17 (H) - additional schematic section of a multilayer body related to the first method;

on Fig (A) -18 (H) - additional schematic section of a multilayer body related to the first method;

Fig. 18 (K) is a plan view of a first multilayer body formed according to the method illustrated in Figs. 18 (A) -18 (H);

Fig. 18 (M) is a plan view of a second multilayer body formed according to the method of Figs. 18 (A) -18 (H);

on Fig is a schematic section of another multilayer body;

in Fig.20 (A) -20 (C) are additional schematic sections of a multilayer body related to the first method;

on Fig is a cross section of a multilayer body formed according to the first method;

on Fig (A) -23 (B) - schematic cross-section of various security documents containing multilayer bodies; and

on Fig (A) - (E) are schematic sections related to the second method.

Figure 1 shows a multilayer body 100, in which on a carrier film 1 are located: a functional layer 2; replication layer 3; the first structured aluminum layer 3m and two differently colored, transparent photoresist layers 12a, 12b mutually precisely aligned with the first 3m layer. Functional layer 2 is a layer that serves mainly to increase the mechanical and chemical stability of the multilayer body, but which can also be adapted in a known manner to create an optical effect, for which it can also be provided in the form of many sublayers. It can also be made in the form of a layer made of wax, or in the form of a separation layer. However, it is also possible to dispense with this layer and arrange the replication layer 3 directly on the carrier film 1. It may also be possible for the carrier film 1 itself to be made in the form of a replication layer.

The multilayer body 100 may form part of a film for thermal transfer, for example, a film for hot stamping, which is applied to the substrate using an adhesive layer (not shown in the drawing). The adhesive layer may be an adhesive melt melted under the influence of heat, by which the multilayer body adheres continuously to the surface of the substrate.

The carrier film 1 can be made in the form of a mechanically and thermally stable film of polyethylene terephthalate (PET).

In the replication layer 3, regions with different relief structures can be formed by known methods. The illustrated embodiment comprises first regions 4 with diffractive relief structures and second regions 6, which are planar regions.

The first layer 3m on the replication layer 3 contains demetallized portions 10d located exactly in accordance with the first portions 4. The multilayer body 100 looks transparent or partially transparent at portions 10d.

Figure 2-8 shows the manufacturing stage of the multilayer body 100. Elements similar to the elements shown in figure 1 are indicated by the same reference numbers.

Figure 2 shows a multilayer body 100a in which the functional layer 2 and the replication layer 3 are located on the carrier film 1.

The replication layer 3 is surface structured by known methods. For this purpose, for example, a thermoplastic replication varnish is used as the replication layer 3, which is applied by printing, spraying or varnishing, and a relief structure is formed in the replication varnish layer by a heated stamp or a heated replication roll.

The replication layer 3 can also be replication varnish, hardening under the influence of ultraviolet (UV) radiation, which is structured, for example, using a replication shaft. Structuring, however, can also be accomplished by exposure to UV radiation through a photomask. In this way, sections 4 and 6 are formed in the replication layer 3. Section 4 can, for example, be optically active sections of a hologram or a Kinegram® security element.

3 shows a multi-layer body 100b, 100a received from the multilayered body shown in Figure 2, by the operation, according to which the first layer 3m is applied, for example sprayed on the replication layer 3 with a uniform surface density relative to the plane defined by the replication layer 3. In In this embodiment, the first layer 3m is a layer several tens of nanometers thick. The thickness of the first layer 3m can preferably be chosen so that sections 4 and 6 have a low light transmittance, for example, from 10% to 0.001%, i.e. they have an optical density of from 1 to 5, preferably from 1.5 to 3. The optical density of the first layer is 3m, i.e. the negative decimal logarithm of the light transmission in sections 4 and 6, respectively, is from 1 to 3. Preferably, it may be possible for the first layer 3m to have an optical density of from 1.5 to 2.5. Sections 4 and 6 appear to be opaque to the observer's eye.

It is particularly preferred that the first layer 3m be applied in the form of a layer of such a thickness that the first layer 3m would be substantially opaque when applied to a flat surface, i.e. as in sections 6, and had an optical density greater than 2. The thicker the first 3m layer deposited on replication layer 3, the greater the effect of the change caused by the diffraction relief structure created in sections 4, which is the effective thickness of the optical layer on the light transmission characteristics first layer 3m. Studies have shown that the change in the effective optical density of the first layer 3m caused by the diffraction relief structure is approximately proportional to the thickness of the layer deposited in the vapor phase, and thus approximately proportional to the optical density. Since the optical density is the negative logarithm of the light transmission, the difference in light transmission between sections 4 and 6 is super-proportionally increased, thus, with an increase in the surface density of the deposited material of the first layer 3m.

It should be noted that the optical density of the first layer 3m differs in sections 4 and 6, while it is less in sections 4 in comparison with sections 6. The reason for this is that the surface area in sections 4 is increased due to the ratio of depth to width elements other than zero, and the thickness of the first layer 3m as a result of this is reduced. The dimensionless ratio of depth to width and spatial frequency are characteristic features in relation to an increase in the surface area of preferably periodic structures. Such a structure is a periodic sequence of “peaks” and “troughs”. Here, the distance between the “peak” and the “trough” is called the “depth”, while the distance between the two “peaks” is called the “width”. The greater the ratio of depth to width, the correspondingly steeper the “peak slopes” and, accordingly, the thinner the first 3m layer deposited on the “peak slopes”. This effect can also be observed with a discrete distribution of "troughs", which can be located relative to each other at a distance that is many times greater than the depth of the "troughs". In this case, the depth of the “depression” should be related to the width of the “depression” in order to correctly describe the geometry of the “depression”, which determines the ratio of depth to width.

When creating sections with reduced optical density, it is important to know and choose the appropriate parameters in their mutual dependencies. The degree of decrease in optical density can be varied depending on the background, illumination, etc. An important role is played by the absorption of light by the first layer. For example, chromium and copper reflect light to a much lesser extent in some circumstances.

Table 1 shows the established degree of reflection of the first metal layers (Ag, Al, Au, Cr, Cu, Rh and Ti) located between the plastic films (refractive index n = 1.5) at a light wavelength of λ = 550 nm. In this case, the thickness index ε was determined as a fraction of the thickness t of the metal layer, which is required to ensure the degree of reflection R = 80% of the maximum value of R _max , and the thickness, which is required to ensure the degree of reflection R = 0% of the maximum value of R _max .

Table 1 Metal R _max t for 80% R _max t for 20% R _max ε h / d Ag 0.944 31 nm 9 nm 3.4 1.92 Al 0.886 12 nm 2.5 nm 4.8 2.82 Au 0.808 40 nm 12 nm 3.3 1.86 Rh 0.685 18 nm 4.5 nm 4.0 2,31 Cu 0.557 40 nm 12 nm 3.3 1.86 Cr 0.386 29 nm 8.5 nm 3.3 1.86 Ti 0.420 18 nm 5 nm 3.6 2.05

Based on suggestive considerations, silver and gold (Ag and Au), as can be seen, have a high degree of maximum reflection R _max and require a relatively small value of the ratio of depth to the width of the relief structure to reduce the optical density of the first layer, to ensure light transmission in the previous example. Aluminum (Al) also has a high degree of maximum reflection R _max (which is well known), but it requires a higher ratio of depth to width of the relief structure. Preferably, in such a way that it is possible to manufacture the first layer of silver or gold. However, it may also be possible to manufacture the first layer from other metals, metal alloys or materials of the functional layer.

Table 2 presents the results obtained by rigorous calculations of the diffraction of the relief structures in the form of linear sinusoidal gratings with a grating spacing of 350 nm, with various ratios of depth to width. The relief structures were coated with a layer of silver with a nominal thickness t ₀ = 40 nm. The light incident on the relief structures had a wavelength of λ = 550 nm (green) and was polarized with a wave of type TE and type TM, respectively.

table 2 Depth to Width Ratio Lattice pitch, nm Depth, nm The degree of reflection (OR) TE Light Transmission Degree (OT) TE The degree of reflection (OR) TM Light Transmission Degree (OT) TM 0 350 0 84.5% 9.4% 84.5% 9.4% 0.3 350 one hundred 78.4% 11.1% 50.0% 21.0% 0.4 350 150 42.0% 45.0% 31.0% 47.0% 1,1 400 2,3 2.3% 82.3% 1.6% 62.8% 2,3 350 800 1.2% 88.0% 0.2% 77.0%

It was found, in particular, the degree of light transmission or transmission of light, not to mention the ratio of depth to width, depends on the polarization of the incident light. This relationship is illustrated in Table 2 with a depth to width (h / d) ratio of 1.1. You can use this effect to selectively create additional partially formed layers.

It was also found that the degree of light transmission or reflection of the metal layer depends on the wavelength. This effect is especially pronounced under the action of polarized light with a TE-type wave.

It was also found that the degree of light transmission or transmission of light decreases if the angle of incidence of the light differs from the direct angle of incidence, i.e. the degree of light transmission decreases if the light falls irregularly. This means that the first layer 3m can be inherently transparent or less opaque than in the reflecting sections 6, only in a limited cone of incidence of light. Thus, it may be possible that the first layer 3m is opaque when light is incident at an angle, and in this regard, this effect is also suitable for selectively creating additional partially formed layers.

In addition to the ratio of depth to the width of the relief structure, the spatial frequency of the relief structure also affects the change in optical density. Thus, it was further established that a change in the transmission characteristics of the light of the first layer deposited on the relief structure can be achieved if the product of the spatial frequency by the depth of the relief in the first section of the relief structure is greater than the product of the spatial frequency by the depth of the relief in the second section of the relief structure.

However, areas with different light transmission or light transmittance can also be created by using other effects, for example:

- the dependence of light transmission on polarization as a consequence of the use of variously oriented structures;

- shape factor of relief structures; those. relief structures of a rectangular, sinusoidal, sawtooth or other profile may have different light transmission characteristics with the same product of the spatial frequency and the depth of the relief; and

- directional deposition in the vapor phase of the first layer in combination with special relief structures or combinations, or locations of relief structures.

If the first relief structure is a structure with a stochastic profile, for example, an opaque structure, then the correlation radius, the depth of microroughness and the statistical distribution of the profile can be typical parameters that affect the transmission of light.

Thus, to create areas with different light transmission or light transmission, you can also use relief structures in the first section and in the second section, characterized by one or more of the above parameters.

FIG. 4 shows a multilayer body 100c obtained from the multilayer body 100b of FIG. 3 and provided with a photosensitive layer 8. This body 100c may comprise an organic layer applied by classical coating methods, for example, intaglio printing in liquid form. The photosensitive layer 8 can also be applied in the vapor phase or applied by a lamination method in the form of a dry film.

The photosensitive layer 8 can be, for example, a positive photoresist, for example, AZ 1512 or AZ P4620 from Clariant or S1822 from Shipley, which is applied to the first 3m layer with a surface density of 0.1 g / m ² to 50.0 g / m ² . The thickness of the layer depends on the desired resolution and the method used. Thus, when using the reverse lithography method, it is rather desirable to apply thicker layers with a layer thickness of more than 1 μm corresponding to a surface density of about 1 g / m ² . Preferably, the surface density is in the range of 0.2 g / m ² to 10.0 g / m ² .

In this case, the application is made over the entire surface area. However, it is also possible to apply to separate areas, for example, to areas located outside the aforementioned sections 4 and 6. They can include areas that should only be relatively roughly combined with the pattern, for example, with decorative pictorial elements, for example, with chaotic patterns or drawings made up of repeatable images or texts.

FIG. 5 shows a multilayer body 100d obtained by exposing the multilayer body 100c shown in FIG. 4 through a carrier film 1. UV radiation 9 can be used for exposure. Since now (as described previously) sections 4 of the first layer 3m provided by diffraction structures having a depth to width ratio greater than zero, have a lower optical density than the reflecting portions 6 of the first 3m layer, then UV portions create portions 10 in which the photosensitive layer 8 is exposed to more degree, and these sites 10 differ in their chemical properties from sites 11 that have undergone less exposure.

In the embodiment of FIG. 5, uniform exposure is provided that is created in all areas of the multilayer body 100d with the same intensity. However, it is also possible to provide partial exposure, for example, for:

a) maintaining the structure with a large value of the ratio of depth to width as elements of the picture and the exclusion of their demetallization;

b) introducing an additional unit of information, for example, through a template in the form of a tape, which is moved together with the multilayer body 100d during the exposure process; and

c) the introduction of a separate unit of information, for example, a serial number.

For this, identification can be done by using a brief exposure using a programmable three-dimensional light modulator or an adjustable laser.

The wavelength and polarization of light and the angle of incidence of the light are lighting parameters by which it is possible to accentuate the effect and selectively process the relief structures in a targeted manner.

To this end, you can also use chemical properties. Sites 10 and 11 may differ, for example, their solubility in solvents. In this way, the photosensitive layer 8 can be “developed” after exposure to UV radiation, as shown further in FIG. 6. With the "manifestation" of the photosensitive layer 8 in the photosensitive layer 8, sections 10 or 11 are removed.

Although the depth-to-width ratio greater than 0.3 is usually provided in portions 4 to achieve the light transmission visible to the human eye, it has surprisingly been found that the depth-to-width ratio, which is essential for the manifestation of the photosensitive layer 8, can be substantially reduced. There is also no need for the first 3m layer to be so thin that sections 4 appear transparent upon visual inspection. The carrier film deposited in the vapor phase can thus be opaque, since the reduced light transmission can be compensated by the increased exposure dose of the photosensitive layer 8. In addition, it was found that, since the exposure of the photosensitive layer 8 is usually carried out using radiation in the range close to UV radiation, the impression arising from visual observation is not decisive in assessing the optical density.

5a and 5b show a modified embodiment of a multilayer body. The multilayer body 100d ′ shown in FIG. 5a does not contain the photosensitive layer 8 shown in FIG. 5. Instead, there is a replication layer 3 ', which is a photosensitive washable varnish layer painted with a thermochromic substance. The multilayer body 100d ′ is exposed from below through the first layer 3m, as a result of which the replication layer 3 ′ changes in the areas 10 subjected to a greater exposure, to such an extent that it can be washed away.

Fig. 5b shows a multilayer body 100d "obtained from the multilayer body 100d 'after the washing process. In sections 10, the first layer 3m was removed during the washing process together with the replication layer 3'. The structured replication layer 3 'is the first partially formed thermochromic a functional layer, while the first layer 3m constitutes the first additional partially formed aluminum layer perfectly aligned with it.

6 shows a “developed” multilayer body 100e obtained from the multilayer body 100d by exposure to a solvent applied to the surface of the exposed photosensitive layer 8. This ensures the formation of sections 10e in which the photosensitive layer 8. is removed. Parts 10e are sections 4 described with reference to figure 3, with a ratio of depth to width greater than zero, in the field of structural elements. The photosensitive layer 8 is created in sections 11, since it includes sections 6 described with reference to Fig. 3, where the structural elements have a depth to width ratio of zero. If a transparent positive photoresist dyed with a blue pigment is used as the photosensitive layer 8, a partially formed transparent functional layer of blue color is thus obtained, precisely aligned with the relief structure.

In the embodiment of FIG. 6, thus, the photosensitive layer 8 is formed from a positive photoresist. When using such a photoresist, the exposed areas are soluble in the developer. In contrast, when using negative photoresist, unexposed areas are soluble in the developer, as described below in the embodiment illustrated in FIGS. 9-12.

Now, as shown with reference to the multilayer body 100f shown in FIG. 7, the first layer 3m can be removed in areas 10e not protected by the developed photosensitive layer 8, which now serves as an etching pattern, from the damaging effect of the etchant. The etchant may be, for example, acid or liquor. In this manner, portions 10d, also shown in FIG. 1, are created. The structured photosensitive layer 8 constitutes the first partially formed transparent functional layer of blue color, while the first layer 3m after the etching operation is the first additional partially formed aluminum layer ideally combined with layer 8.

Thus, the first layer 3m can be structured to ensure accurate mutual alignment without additional technological steps. This does not require the adoption of costly precautions, for example, when using the etching pattern when exhibiting through the pattern or when printing. In such a conventional process, it is typical to use tolerances in excess of 0.2 mm. In contrast, when implementing the method according to the invention, tolerances in the range from microns to nanometers, i.e. tolerances determined only by the initial and replication processes selected to structure the replication layer.

It may be possible to create a first layer 3m in the form of a sequence of different metals, and differences in the physical and / or chemical properties of parts of the metal layer can be used. For example, it may be possible to apply the first part of a metal layer of aluminum having a high reflectivity, and this would mean that the reflective areas are well distinguished when viewing a multilayer body from the side of the carrier. Chrome can be applied as the second part of the metal layer, which has a high level of resistance to chemical attack of various etchants. The etching process of the first 3m layer can now be carried out in two stages. It may be possible to etch the chromium layer during the first stage, in which case the developed photosensitive layer 8 would be used as a template for etching, and then the aluminum layer would be etched during the second stage, in which case the chromium layer would now serve would be as a template for etching.

The use of such multilayer systems provides great flexibility in the choice of materials used for the manufacture of photoresist, etching agents and for creating the first 3m layer.

FIG. 8 shows a possible embodiment after the manufacturing step illustrated in FIG. 7, including scraping of a transparent ink layer 8a containing luminescent pigments in the first portions 10d. FIG. 8 shows a multilayer body 100g formed from: a carrier film 1; functional layer 2; replication layer 3; a first structured layer 3m of aluminum serving as a first additional partially formed layer; a structured transparent photosensitive layer 8 of blue color, serving as the first partially formed functional layer; and a partially formed additional layer 8a of transparent luminescent printing ink serving as a second partially formed functional layer.

FIG. 9 shows a second embodiment of a multilayer body 100e ′ in which instead of a photosensitive layer 8 of a positive photoresist (as shown in FIGS. 5, 6, 7 and 8), a photosensitive layer 8 of a negative photoresist is used. The multilayer body 100e 'according to Fig. 9 comprises portions 10e' in which the unexposed photosensitive layer 8 has been removed during development. The portions 10e 'are opaque portions of the first layer 3m. The exposed photosensitive layer 8 is not removed in portions 11 ', and they are light transmitting portions of the first layer 3m, i.e. areas with a lower optical density than sections 10e '.

Figure 10 shows a multilayer body 100f obtained by removing the first layer 3m by etching from the multilayer body 100e '(see Fig. 9). To this end, the developed photosensitive layer 8 is used as an etching template removed in portions 10e '(see Fig. 9) so that the first layer 3m can be destroyed by etching. Thus, portions 10d ′ were created that no longer contain the first layer 3m. In this case, the partially formed layer 8 may be in the form of an opaque lacquer layer of black color and may constitute a partially formed functional layer, while the partially formed first layer 3m is an additional layer.

As shown in FIG. 11, the multilayer body 100f ″ is obtained from the multilayer body 100f с by means of a reflective layer 3p containing a dielectric, for example TiO ₂ or ZnS, applied over the entire surface area. Such a layer can be applied, for example, over the entire surface area by vapor deposition; in this case, it can also be possible to form this layer from many superimposed thin layers, which, for example, can differ in their refractive index and by which, thus, preferential color effects in the light reflecting on them.The sequence of thin layers by which color effects are created can be formed, for example, of three thin layers having a consistently large, small, large refractive index.The color effect looks less sharp compared to the effect created by metal reflective layers, which is preferable, for example, if the drawings are made in this way on passports or ID cards. When viewed, drawings may look, for example, as transparent drawings of green or red.

12 shows a multilayer body 100f ″ obtained from a multilayer body 100f ″ (see FIG. 11) after removing the rest of the photosensitive layer 8. A conventional “reverse lithography” operation can be used for this. At the same time, when the photosensitive layer 8 is removed, the dielectric layer 3p deposited on it in the previous step is again removed. This process thus now includes forming adjacent sections on the multilayer body 100f ″ with a dielectric layer 3p and a first aluminum layer 3m, which differ from each other, for example, by their optical refractive index and / or their electrical conductivity.

Now it may be possible to galvanically strengthen the first layer 3m and thereby create sections 11, for example, in the form of sections having particularly good electrical conductivity. Then, a transparent, UV-curable liquid crystal can be applied over the entire surface area as a quasi-negative photoresist and exposure can be carried out through the carrier layer 1. The less exposed or unexposed portions of the photoresist layer are placed on top of the partially formed first layer 3m, and they are removed. The result is a multilayer body (not shown separately here) comprising a first partially formed functional layer of transparent photoresist, a first additional partially formed layer in the form of a dielectric layer 3p and a second, partially formed additional layer in the form of a first layer 3m.

Alternatively or sequentially, it is possible to create transparent portions 11, and for this purpose, the first layer 3m can be removed by etching. It is possible to use an etchant that does not have a destructive effect on the 3p dielectric layer deposited on other sites. However, it may be possible to act as an etchant only until the first layer 3m is no longer distinguishable from the point of view of creating a visual impression.

13 shows a multilayer body 100 ′ obtained from the multilayer body 100f ″ (see FIG. 12) by adding the photoresist layers 12a, 12b shown in Fig. 1. The multilayer body 100 ′ is made in the same way as the multilayer body 100, shown in FIG. 1, by using the same replication layer 3. Thus, it is possible, using the method according to the invention, starting from a single arrangement, to produce multilayer bodies of various configurations.

The manufacturing process according to the invention can be further continued without compromising quality in the direction of structuring the additional layers to ensure accurate mutual alignment. To this end, it may be possible to use additional optical effects, for example, total reflection, polarization and spectral transmission of light by previously deposited layers, to create areas with different optical densities for the formation of photomasks with accurate mutual alignment.

It may also be possible to create a different level of local ability to absorb light using superimposed layers and the possibility of forming patterns for exposure or etching using laser thermal ablation.

Fig. 14 illustrates in detail the process of modifying the thickness of the first layer 3m, designed to create varying degrees of light transmission, in particular, light transmission.

On Fig shows schematically in an enlarged scale a section of part of the multilayer structure shown in Fig.3. The replication layer 3 in section 5 contains the first relief structure 5h with a large depth to width ratio (more than 0.3), while section 6 does not contain any relief structure or contains a flat section. Arrows 3s indicate the direction of deposition of the first layer 3m, which is formed here by spraying. The first layer 3m is formed with a nominal thickness t ₀ on a flat portion 6n, while a layer with a thickness t less than the nominal thickness t _{0 is} formed on a portion of the first relief structure 5h. In this regard, the thickness t should be considered as an average value, since the thickness t is formed depending on the angle of inclination of the surface of the first relief structure 5h relative to the horizontal. This tilt angle can be described mathematically by the first derivative of the function of the first relief structure 5h.

If, therefore, the tilt angle is zero, then this means that the first layer 3m is applied with a nominal thickness t ₀ , but if the value of the tilt angle is greater than zero, then this means that the first layer 3m is applied with a thickness t, i.e. thickness less than the nominal thickness t ₀ .

On Fig shown in cross section: a carrier layer 1 of PET; at least one functional layer 2 and replication layer 3. In the first portions C of the replication layer 3, a first kinematic relief structure is formed. In the second sections D, no relief structures are formed. The first layer 3m of silver in the vapor phase was deposited on the replication layer 3 over its entire area, and in this case, sections with different light transmission properties were created in the first layer 3m, providing accurate mutual combination of sections C and D.

As shown in FIG. 15 (B), the positive photoresist layer 12 was applied to the layered composite shown in FIG. 15 (A) over its entire surface area and exposed through the carrier layer 1. The regions C of the photoresist layer 12 exposed to a greater degree or exposed in the usual way, was removed, and the underlying first layer 3m was revealed in the area of the relief structure.

As shown in FIG. 15 (C), the first layer 3m was now removed in the etching regions C, and the structured photoresist layer 12 served as an etching pattern. After the etching operation, only the first structured layer 3m remained between the photoresist layer 12 and the replication layer 3.

As shown in FIG. 15 (D), the dielectric reflective layer R of zinc sulfide (ZnS) having a high refractive index, or from the reflective layer of a set of layers of a thin film having an interference color effect depending on the viewing angle, is now applied in steam phase over the entire surface area. Layer 12 of the photoresist could possibly have been removed earlier.

The set of layers shown in FIG. 15 (D) is now covered over its entire surface area with a red negative photoresist layer 12 ′ and exposed through the carrier layer 1. FIG. 15 (E) shows the result obtained after removing the negative layer 12 ′ photoresist in unexposed areas D.

Finally, layers that may no longer be needed are now removed in the flat second portion D using the structured layer 12 of the photoresist that has been dissolved and removed, and portions located on top of them are also removed from the dielectric reflection layer R. The result is shown in FIG. 15 (F). Now this is a 100k multilayer body comprising: a carrier layer 1; functional layer 2; replication layer 3; in the first portion C, a partially formed functional layer in the form of a structured red photoresist layer 12 'and an additional partially formed layer in the form of a dielectric structured reflective layer R, precisely aligned with the photoresist layer 12', except for the silver reflective surface formed from the partially formed first layer 3m on the flat second sections D.

FIG. 15 (G) is a plan view of a multilayer body 100k ′ obtained according to the method illustrated in FIG. 15 (A) -15 (F). An element D of a kinematic pattern representing the effect of forcing when tilted, formed from a plurality of thin lines with a line width of 20 μm in each case. The lines themselves correspond to the first sections C with a relief structure, while the sections between the lines correspond to the second sections D that do not have a relief structure. Accordingly, a kinematic effect is created by the lines due to the relief structure and the dielectric layer R, and the lines are also supported in red due to the photoresist layer 12 '. Reflective silver surfaces are located adjacent to site D.

On Fig (A) -16 (C) shows a view in section of another embodiment of the first method. On Fig (A) are shown: a carrier layer 1 of PET; functional layer 2 and replication layer 3, in which the embossed relief structure was created in the first sections C. In the second regions D there is no relief structure, here the replication layer 3 is flat. The first 3m layer of gold was deposited onto layer 3 by sputtering over the entire surface area in the form of an opaque layer, in which case a higher level of light transmission under UV irradiation was achieved in the first sections C than in sections D.

As shown in FIG. 16 (B), a blue opaque negative photoresist layer 12 was deposited over a 3m layer over the entire surface area and exposed through the carrier layer 1. Unexposed or less exposed portions of the photoresist layer 12 were removed, and thus disclosed the first layer 3m in sections D. The first layer 3m could now be removed by etching from the replication layer 3 in sections D.

The resulting body is shown in FIG. 16 (C). It is a 100m multilayer body, comprising: a carrier layer 1; functional layer 2; replication layer 3; a partially formed functional layer in the form of a blue photoresist layer 12, which is perfectly aligned with an additional partially formed layer in the form of a first gold layer 3m. If the multilayer body 100m is viewed from the side of the carrier layer 1, then in the first section C, a golden linear pattern is visible, on which a diffractive relief structure is superimposed, which creates an optically variable effect, in particular, a holographic effect. When viewed from the other side, the 100m multilayer body looks completely different. Thus, the observer when viewing the body 100m from the side of the photoresist layer 12 sees only an opaque filigree linear pattern of blue color in areas C. The golden linear pattern is thus completely hidden and therefore invisible. The 100m laminate is transparent in areas D.

On Fig (A) -17 (H) shows views in cross section illustrating the implementation of the first integrated method. On Fig (A) shows: the carrier layer 1; functional layer 2 and replication layer 3, in which three different relief structures are created by embossing. The first relief structure is formed in regions A, the second relief structure is formed in regions B, and the third kinematic relief structure is formed in regions C, while the relief structure is not formed in region D. The first and second relief structures are high-frequency lattice structures containing various characteristic relationships.

The first aluminum layer 3m was then sprayed as an opaque layer over the entire surface onto the replication layer 3, as shown in FIG. 17 (B), in which case regions A had a higher level of light transmission under UV irradiation than sections B; sections B had a higher level of light transmission under UV irradiation than sections C, and sections C had a higher level of light transmission under UV irradiation than sections D.

A positive photoresist layer 12 was applied to this structure over its entire surface area, as shown in Fig. 17 (C), and exposed through the first layer 3m, in which case, portions A with the first relief structure were exposed to a much greater extent, and layer 12 on them could then be removed.

17 (D) shows the photoresist layer 12 after being structured and after removing the first 3m layer in the etching sites A, where the photoresist structured layer 12 served as a template for etching. The first 3m layer, therefore, could only be detected in sections B, C, and D.

The positive photoresist layer 12 was now removed, and the blue negative photoresist layer 12 ′ was applied over the entire surface area and exposed through the carrier layer 1. In areas B, C, and D which were exposed to a lesser extent, the negative photoresist layer 12 ′ could then be removed , while in areas A, it solidified. In FIG. 17 (E) shows the layered structure at this stage after structuring the negative photoresist layer 12 ′.

As shown in FIG. 17 (F), an additional positive photoresist layer 12 ″ was created over the entire surface area and exposed through the carrier layer 1.

An additional 12 ″ positive photoresist layer was then removed in areas B. The resulting structure is shown in FIG. 17 (G).

The exposed first layer 3m was now removed by etching in areas B. The resulting structure is shown in FIG. 17 (H). It is a multilayer body 100n, comprising: a carrier layer 1; functional layer 2; replication layer 3; a partially formed blue functional layer in the form of a negative photoresist layer 12 '; an additional partially formed layer in the form of the first layer 3m, which acts, on the one hand, as a mirror surface in areas D, and on which, on the other hand, in layer C, a layer is applied where the kinematic effect is created.

An additional 12 "positive photoresist layer was optionally removed and the adhesive layer applied over the entire surface area. If a stained 12" positive photoresist layer was used, it could, however, also be left on the multilayer body.

On Fig (A) -18 (H) schematically shows a sectional view illustrating a first additional method of creating a filigree printing drawing containing two different printing inks or two colors, exactly exactly mutually combined with each other. On Fig (A) shows: the carrier layer 1; functional layer 2 and replication layer 3, in which two different relief structures are embossed. Thus, the first relief structure is formed in areas A; the second relief structure is formed in sections B, while in section D no relief structure is formed. The first and second relief structures are high-frequency lattice structures containing various characteristic ratios. The first layer 3m of aluminum was sprayed in the form of an opaque layer over the entire surface area onto the replication layer 3, and in this case, sections A had a higher level of light transmission under UV irradiation than sections B; sections B had a higher level of light transmission under UV irradiation than sections D.

As shown in FIG. 18 (B), a positive photoresist layer 12 was applied to this structure over its entire surface area and exposed through the carrier layer 1 and the first layer 3m, in which case the portions A with the first relief structure were exposed to a much greater extent , and layer 12 on them could then be removed in a special, targeted manner. The partially formed positive photoresist layer 12 was now used as a template for etching, and the exposed portions A of the first layer 3m were removed by etching. The resulting structure is shown in FIG. 18 (C).

A blue 12 12 negative photoresist layer was now applied over the entire surface area and exposed through the carrier layer; In areas A, solidification occurred. The negative photoresist layer 12 ′ was removed in sections B and D. The resulting structure is shown in FIG. 18 (D).

The positive photoresist layer 12 was now completely removed and the first 3m layer was also completely removed by etching.

An additional first layer of 3m ′ of aluminum was applied to the obtained structure over the entire surface area and an additional layer of 12 "positive photoresist was applied over the entire surface area. The result is shown in Fig. 18 (E). After that, an additional layer of 12" positive photoresist was exposed through the carrier layer 1, and then an additional 12 "positive photoresist layer was removed in areas B exhibited to a much greater extent. After filling with a 12" positive photoresist layer of the first relief structure in the area And the transmission of light through the additional first layer 3m 'in section A became equivalent to this parameter in section D, and section A, as well as section D of layer 12 "of positive photoresist, were preserved. The additional first layer 3m' was opened in sections B and removed by etching (see Fig. 18 (F)).

An additional layer of 12 ″ negative red photoresist was now applied over the entire surface area and exposed through the carrier layer 1; solidification occurred in sections B. In other areas, an additional layer of 12 ″ negative red photoresist was removed. The result is shown in FIG. 18 (G).

Finally, the additional positive photoresist layer 12 ″ was removed and the additional first metal layer 3m ′ was completely dissolved and removed by etching. The result is shown in FIG. 18 (H), where a multilayer body 100p is shown comprising: carrier layer 1; functional layer 2; partially formed a functional layer in the form of a blue negative photoresist layer 12 'and an additional partially formed layer in the form of an additional red negative photoresist layer 12' ". Layers 12 ', 12' "of red and blue colors are perfectly aligned with each other.

FIG. 18 (K) shows a plan view of a multilayer body 100p ′ obtained by the method described with reference to FIGS. 18 (A) -18 (H). In the figure, you can see the blue lines formed by the negative photoresist layer 12 'and the red lines formed by the additional 12' "photoresist layer, which together form a colored filigree security patterned element on a transparent background. The length of the red lines is shown on the ellipse section highlighted by the dotted line. In all places where the virtual dashed line intersects the colored lines of the patterned element, the color changes from red to blue, while the line runs straight without any deviations. e elements of this kind are very difficult to fake. Such arrangement of different colors along the line with the provision of accurate mutual alignment could not be achieved at present by known methods. The patterned elements created by the methods according to the invention, however, can equally contain colored lines adjacent to each other friend, or colored lines that are paired with each other.

Fig. 18 (M) shows a plan view of yet another multilayer body 100p "obtained by the method described with reference to Figs. 18 (A) to (H). In the figure, blue lines formed by the negative layer 12 'can be seen. photoresist, and red lines formed by an additional layer of 12 '"photoresist, which together form a colored round protective patterned element on a transparent background. The length of the red lines represents the cross shape. In all places on the periphery of the cross, the color changes directly from red to blue inside the line configuration, while the line continues without any shift. Such patterned elements are also very difficult to fake. As an alternative to this, such a protective patterned element instead of blue lines can be provided with a reflective metal layer, instead of red lines can be provided with a luminescent layer or a layer of liquid crystals, etc., etc. At the same time, it is possible to create various color patterns from the front and back sides of the multilayer body of such a security element.

On Fig shows a view in section of another multilayer body 100r obtained according to the invention. It contains a carrier layer 1 and a replication layer 3, in which a first relief structure is formed in the first regions A. In contrast, a relief structure is not formed in the second portions B. The green printing ink was printed into the first embossed structure, forming the first 3m "structured layer, shown here in a greatly enlarged form. After this, further processing could be carried out in two ways.

If it is necessary to create a structure, as on the left, in section A ₁ shown in Fig. 19, a transparent separation layer 2 'is formed and a positive red photoresist layer 12 is applied over it over the entire surface area included in this case. The photoresist layer 12 is exposed through the carrier layer 1 and the first 3m ″ layer serving as a photomask. The photoresist layer 12 is then removed in areas B. As a result, a partially formed functional layer is obtained in the form of a printed green ink that is precisely coated with an additional partially formed layer in the form of a structured layer of red photoresist 12. In addition, create optical effects of the position, for example, moire effects observed depending on the angle of view, or effects of local shading I arising due to the separation layer 2 '.

If you want to create a structure, as in the area A ₂ shown in Fig. 19, to the right, then the positive photoresist layer 12 is applied over the entire surface area included in this case. The photoresist layer 12 is exposed through the carrier layer 1 and the first 3m ″ layer serving as a photomask. The photoresist layer 12 is then removed in areas B. As a result, a partially formed functional layer is obtained in the form of a printed green ink that is precisely coated with an additional partially formed layer in the form of a structured layer 12 of a red photoresist.

Finally, a 2 "adhesive layer can also be applied.

20 (A) -20 (C) are schematic cross-sectional views illustrating an additional first method. In this case (as shown in FIG. 20 (A)), the following are provided: a carrier layer 1; a functional layer 2 and a replication layer 3 in which a relief structure is formed in the first portions A, while the second portions D are left flat. The first 3m aluminum layer was then sprayed onto this structure over the entire surface area, with the 3m layer being transparent in areas A and opaque in areas D.

Then, a transparent yellow negative photoresist layer 12 was applied to this structure over the entire surface area and exposed through the carrier layer 1. Unexposed portions of the photoresist layer 12, i.e. located in sections D, then the first layer 3m was removed and revealed in them.

Then, an additional layer of blue opaque negative photoresist 12 'was applied over the entire surface area and exposed through the carrier layer 1. Unexposed portions of the additional photoresist layer 12', i.e. located in sections D, then the first layer 3m was removed and revealed in them. The result is shown in FIG. 20 (B).

Then, the first layer 3m was removed by etching in sections D, and two photoresist layers 12, 12 ′ were used as a template for etching. The result is shown in FIG. 20 (C). The multilayer body 100s contained: a carrier layer 1; functional layer 2; replication layer 3; a yellow photoresist layer 12 as a partially formed functional layer perfectly aligned with a blue photoresist layer 12 'as an additional partially formed layer on a transparent background. The presence of a transparent first layer 3m, still present in sections A, makes it possible to recognize the relief structure, although it itself does not create a color effect when viewing a multilayer body 100s from the side of the carrier layer 1.

On Fig shows another multilayer body according to the invention, obtained according to the first method, comprising: a carrier layer 1; replication layer 3; the first structured layer 3m of aluminum; a transparent separation layer 2 'and two differently colored photoresist layers 12, 12'. In this case, the orientation of the photoresist layers 12, 12 ′ is performed depending on the first layer located directly below the first layer 3m or in a position offset relative to it, where inclined displacement can also be performed in a specially targeted manner (as shown on the photoresist layer 12 ′) , due to exposure tilted through the first layer 3m. At the end of the manufacturing process, a 2 "transparent adhesive layer is applied.

On Fig (A) -23 (B) shows views in section of protective documents made according to the first method.

Fig . 22 (A) shows a transparent ID 1 ′, to which a transparent multilayer body 100t is adhered by means of an adhesive layer 2 ″ . It comprises: a functional layer 2 represented as a transparent protective varnish layer; a replication layer 3 of transparent varnish with the first relief structure; partially formed first layer 3m in the form of an opaque aluminum layer; additional partially formed layer in the form of a transparent dielectric reflective layer of zinc sulfide (ZnS) and partially formed fun The green layer 12 is an opaque printing ink. The functional layer 12 is formed to ensure perfect alignment with the additional partially formed layers 3m, 3m 'and the first relief structure in the replication layer 3. Accordingly, the holographic representation in linear form is presented to the observer through the functional layer 2; in this case, the holographic representation, on the one hand, is covered with thin aluminum lines, and on the other hand, with a transparent ZnS layer and green color. When considering identity card 1 'in the light, on the other hand, the observer sees only a filigree green printed image consisting of thin lines.

Fig. 22 (B) shows a transparent identity card 1 ', on which a transparent multilayer body 100t' is adhered by means of an adhesive layer 2 ". It contains: a transparent protective lacquer layer in the form of a functional layer 2; a replication layer 3 of a transparent varnish with a first relief structure; partially formed first layer 3m in the form of an opaque aluminum layer; additional partially formed layer in the form of a transparent dielectric reflective layer of ZnS and partially formed functional layer 12 in the form of an opaque printing ink of green color. Functional layer 12 is formed to ensure perfectly accurate alignment with additional partially formed layers 3m, 3m 'and the first relief structure in replication layer 3. Accordingly, a filigree printed image of green color, consisting of thin lines, is presented to the observer through the functional layer 2. When examining identity card 1 'in the light, on the other hand, the observer sees a holographic representation in linear form; the holographic representation is covered, on the one hand, with thin aluminum lines, and on the other hand, with a transparent ZnS layer and green paint.

23 (A) shows a transparent ID 1 ′ on which a “transparent multilayer body 100t” is adhered by means of a transparent adhesive layer 2. It contains: a transparent protective varnish layer in the form of a functional layer 2; replication layer 3 of clear lacquer with a first embossed structure; a partially formed first layer 3m in the form of an opaque aluminum layer; a 2 "adhesive layer which serves as a release layer here; an additional partially formed layer in the form of a red photoresist transparent layer 12 and a partially formed functional layer 12 'in the form of an opaque green printing ink. The red photoresist layer 12 when viewed in the direction perpendicular to the plane of the ID card 1 ', is partially aligned with the partially formed first layer 3m and partially offset from the layer 3m. Partially formed fu the national layer 12 'is formed with an offset relative to the first layer 3m. Thus, a filigree decorative image containing thin green and red lines and metal lines is presented to the observer through the functional layer 2, where the metal lines create a holographic effect due to the first relief structure. When examining identity card 1 'in the light, on the other hand, the observer sees a filigree decorative image of thin lines of green and red and metallic where metal lines, due to the first relief structure, create a holographic effect. However, it should be noted that some of the metal lines are superimposed with a transparent layer 12 of a red photoresist. If the forger separates the multilayer body 100t "from the identity card 1 'to change the data concerning the owner of the identity card, then layers 12, 12' of red and green colors remain on the surface of the identity card 1 ', while the other layers 2", 3m, 3, 2 can be separated. After changing the data, the separated set of layers needs to be reinserted into ID 1 'in such a way as to restore a filigree decorative image. However, due to the presence of thin lines, this is almost a hopeless thing, and deviations from the original position remain noticeable. ID 1 'is particularly effective against attempts to tamper with a 100t multilayer body. "

23 (B) shows a transparent ID 1 'on which is adhered by means of a transparent adhesive layer 2 "transparent multilayer body 100t'". It contains: a transparent protective varnish layer in the form of a functional layer 2; replication layer 3 of clear lacquer with a first embossed structure; a partially formed first layer 3m as a functional layer in the form of a red photoresist transparent layer 12; a 2 "adhesive layer serving as a release layer; and an additional partially formed layer in the form of an opaque green photoresist layer 12 '. The red photoresist layer 12 when viewed in a direction perpendicular to the identity plane 1' is precisely aligned with the first relief structure and in individual sections is precisely aligned with the partially formed green photoresist layer 12 '. Thus, the observer sees through the functional layer 2 a filigree decorative image consisting e of thin transparent lines of red color and opaque lines of black color. When viewed from the other side, the observer sees through the identity card 1 'filigree decorative image consisting of thin opaque lines of green color and transparent lines of red color. If the forger separates the 100t' 'multilayer body from the identity card 1 'to change the data regarding the owner of the identity card available on the surface of the identity card 1', the green layer 12 'remains on the identity card 1 ', while the other layers 2 ", 12, 3, 2 can be separated. After changing the data, the separated set of layers needs to be reinserted into ID 1 'in such a way as to restore a filigree decorative image. However, due to the presence of thin lines, this is almost a hopeless thing, and deviations from the original position remain noticeable. The 1 'ID is also particularly effectively protected by the 100t' "multilayer body against tampering.

24 (A) -24 (E) are schematic cross-sectional views illustrating a second method of manufacturing a filigree printed pattern containing two different colors that are perfectly aligned with each other.

24 (A) shows a transparent carrier layer 1 made of PET, on one side of which a red negative photoresist layer 12 is applied over the entire surface area. Then, the negative photoresist layer 12 was exposed in accordance with the figure by using a template 200 containing holes 200a for transmitting radiation (arrows indicate the direction of radiation). After the template was deleted, unexposed portions of the photoresist layer 12 were removed, while the exposed portions remained on the carrier layer 1 and formed a pattern of red lines. The result is shown in FIG. 24 (B).

The method now includes either a step of applying a layer of transparent varnish as a separation layer, and then a step of applying a layer 12 'of positive green photoresist or, on the other hand (as shown in Fig. 24 (C)), directly a step of applying a layer of 12' positive photoresist green. The positive photoresist layer 12 ′ is exposed through the carrier layer 1 and the partially formed red photoresist layer 12, serving as a template layer (arrows indicate the direction of radiation).

Now, the exposed portions of the green positive photoresist layer 12 'are removed, while the unexposed portions remain on the partially molded red photoresist layer 12. At the end of the manufacturing process, a 2 "transparent adhesive layer is applied.

24 (D) shows a security document provided with a multilayer body manufactured in the manner described above, where the obtained multilayer body 100v is shown glued to the transparent ID 1 '. The multilayer body 100v comprises: a transparent support layer 1; a red photoresist layer 12, serving as a partially formed functional layer perfectly aligned with the green photoresist layer 12 'in the form of an additional partially formed layer; and a transparent adhesive layer 2 ". When viewing a security document from the side of the carrier layer 1, the observer sees a filigree pattern of red lines, while when examining it from the identity card 1 'he sees a filigree pattern of green lines.

24 (E) shows a security document provided with a multilayer body formed with the inclusion of a separation layer, where the resulting multilayer body 100v 'is shown glued to a transparent identification card 1'. The multilayer body 100v ′ comprises: a transparent support layer 1; a red photoresist layer 12 serving as a partially formed functional layer; a transparent separation layer 2 ′ and a green photoresist layer 12 ′ in the form of an additional partially formed layer, perfectly aligned with the red photoresist layer 12; and a transparent adhesive layer 2 ". When examining a security document from the side of the carrier layer 1, the observer sees a filigree pattern from red lines, while when examining it from the identity card 1 'he sees a filigree pattern from green lines, where depending on the corresponding thickness the separation layer 2 ', when tilting the security document, a corresponding different color and / or optical effects of the overlay appears.

It should be borne in mind that it is impossible to fully describe the entire possible mass of methods, multilayer bodies and protected documents or components that can be formed. However, a person skilled in the art, knowing the content of the present invention, can easily modify or combine the steps of the method to achieve the desired results. Thus, a person skilled in the art can also easily combine the first method according to the invention with the second method according to the invention to obtain additional embodiments, in particular decorative effects using filigree linear patterns, while providing a high level of protection against counterfeiting.

Claims (83)

1. A method of manufacturing a multilayer body (100t) containing at least one partially formed functional layer, precisely aligned with at least one additional partially formed layer, wherein the first relief structure is formed on the first portion of the replication layer (3) of the multilayer body (100t ), the first layer (3m) is applied to the replication layer (3) in the first portion and in at least one second portion in which the first relief structure is not formed in the replication layer, and structured according with a first embossed structure, characterized in that the first layer (3m) is removed in the first section, but not removed in at least one second section, or removed in at least one second section, but not removed in the first section, wherein at least one partially formed functional layer is formed directly and / or using the first structured layer (3m) as a template layer after the formation of at least one partially formed functional layer. 2. The method according to claim 1, characterized in that at least one second region forms at least one second relief structure having a depth to width ratio different from the first relief structure. 3. The method according to claim 2, characterized in that at least two different second relief structures are formed in at least one second section. 4. The method according to one of claims 2 and 3, characterized in that the first embossed structure is formed with a greater ratio of depth to width than at least one second embossed structure, and thus the transmission of light and, in particular, the light transmission of the first layer (3m) in the first section is increased relative to the transmission of light and, in particular, the light transmission of the first layer (3m) in at least one second section. 5. The method according to one of claims 1 to 3, characterized in that the first and / or at least one second relief structure is performed in the form of a diffractive relief structure. 6. The method according to claim 5, characterized in that a diffractive relief structure with a depth to width ratio of individual structural elements greater than 0.3 is formed in the first region as a first relief structure. 7. The method according to claim 5, characterized in that the spatial frequency of the first relief structure is selected in the range greater than 300 lines / mm, in particular in the range greater than 1000 lines / mm. 8. The method according to one of claims 1 to 3, characterized in that the first relief structure and / or at least one second relief structure is made in the form of diffraction, and / or refracting, and / or scattering and / or focusing light micro - or a nanostructure, in the form of an isotropic or anisotropic opaque structure, a binary or constant diffraction lens, a structure of microprisms, a concentrating diffraction grating, a macrostructure, or combinations thereof. 9. The method according to claim 1, characterized in that the first layer (3m) is applied with a constant surface density relative to the plane defined by the replication layer (3), and the first layer (3m) is subjected to an etchant, in particular acid or liquor, when used the etching process, both in the first section and in at least one second section, until the first layer (3m) is removed in the first section or at least until the transmission of light and, in particular, the light transmission of the first layer (3m) in the first section will not be t increased relative to the transmission of light and, in particular, the light transmission of the first layer (3m) in at least one second section, or vice versa. 10. The method according to claim 1, characterized in that the first layer (3m) is applied with a constant surface density relative to the plane defined by the replication layer (3), and the first layer (3m) is used as an absorbing layer to partially remove the first layer (3m) by the very first layer (3m) by applying laser light to both the first section and the second section. 11. The method according to claim 1, characterized in that the first layer (3m) is applied with a constant surface density relative to the plane defined by the replication layer (3), and the first layer (3m) is formed such a thickness that light transmission and, in particular, the light transmission of the first layer (3m) in the first section has been increased with respect to light transmission and, in particular, the light transmission of the first layer (3m) in at least one second section, or vice versa. 12. The method according to claim 1, characterized in that the first layer (3m) is applied with a constant surface density relative to the plane defined by the replication layer (3), and the first photosensitive varnish layer is applied to the first layer (3m) or the replication layer (3) formed from a first photosensitive washable varnish layer, wherein the first photosensitive varnish layer or the first washable varnish layer is exposed through the first layer (3m) so that the first photosensitive varnish layer or the first washable varnish layer and exposed to varying extent due to the first relief structure in the first region and at least one second portion, wherein the structuring is carried exposed first photosensitive lacquer layer or wash-off of the first lacquer layer; and the fact that either at the same time or subsequently use the first structured photosensitive varnish layer as a template layer; wherein the first layer (3m) is removed in the first section, but not removed in at least one second section; or removed in at least one second region, but not deleted in the first region, and thus structured. 13. The method according to p. 12, characterized in that the photoactivated layer is applied as a photosensitive layer to the first layer (3m), while the photoactivated layer is exposed through the first layer (3m) and the replication layer (3) and activated in the first section, and the activated sections of the photoactivated layer form a means for etching the first layer (3m) in such a way as to remove the first layer (3m) in the first section and thus structuring it. 14. The method according to one of claims 9 to 13, characterized in that at least one partially formed functional layer is formed directly. 15. The method according to one of claims 9 to 13, characterized in that the first layer (3m) directly forms a partially formed functional layer. 16. The method according to p. 12, characterized in that the first structured photosensitive layer or the first washable lacquer layer directly form a partially formed functional layer. 17. The method according to one of claims 9 to 13, characterized in that at least one partially formed functional layer and / or an additional partially formed layer is formed by the procedure according to which the first varnish layer is applied (12, 12 ', 12' ' , 12 '' ') positive or negative photoresist mixed, in particular, with a coloring matter; wherein the first varnish layer (12, 12 ', 12``, 12' '') of the photoresist is exposed through the first structured layer (3m) and the exposed first varnish layer is structured (12, 12 ', 12``, 12' '' ) photoresist. 18. The method according to one of claims 2 and 3, characterized in that the partially formed functional layer is respectively formed to ensure accurate mutual alignment with the first relief structure and at least one second relief structure, using different varnish layers (12, 12 ', 12' ', 12' '') of the photoresist and, in particular, differently colored lacquer layers of the photoresist to form partially formed functional layers. 19. The method according to one of claims 1 to 3, characterized in that the adhesion properties and / or diffusion resistance and / or surface reactivity of the replication layer (3) are locally affected by the configuration of the first relief structure so that the material for the formation of the first layer (3m) locally differently adheres to the replication layer (3), diffuses into it or interacts with it. 20. The method according to one of claims 1 to 3, characterized in that the replication layer (3) is partially formed by diffusion of a coloring matter therein for use as a partially formed functional layer, with an additional layer partially formed on the replication layer (3 ), serves locally as a diffusion barrier. 21. The method according to one of claims 1 to 3, characterized in that the first layer (3m) is formed by applying a powder or liquid medium, then the first layer (3m) is structured, possibly after physical or chemical treatment of the powder or liquid medium, and or at least one partially formed functional layer is formed directly and / or then at least one partially formed functional layer is formed using the first structured layer (3m) as a template layer. 22. The method according to item 21, characterized in that the adhesion properties and / or diffusion resistance and / or surface reactivity of the replication layer (3) are locally affected by the configuration of the first relief structure so that the powder or liquid medium is locally different it adheres to the replication layer (3), diffuses into it, or interacts with it. 23. The method according to item 21, wherein the at least one partially formed functional layer or at least one additional partially formed layer is formed by the procedure according to which the first varnish layer is applied (12, 12 ', 12' ', 12 '' ') positive or negative photoresist; the first varnish layer (12, 12 ', 12``, 12' '') of the photoresist is exposed through the structured first layer (3m) and the exposed first varnish layer (12, 12 ', 12``, 12' '') of the photoresist is structured . 24. The method according to claim 23, wherein the replication layer (3a) is partially made by diffusing a coloring material therein for use as a partially formed functional layer, wherein the replication layer (3) itself or a layer partially formed on it, serves locally as a diffusion barrier. 25. The method according to one of claims 1 to 3, characterized in that the replication layer (3) is at least partially flat in at least one second region. 26. The method according to item 21, wherein the first layer (3m) is structured by removal using a removal knife or scraper. 27. The method according to one of claims 1 to 3, characterized in that the material is raked into the open areas of the replication layer (3) with the first relief structure or at least one second relief structure, which when viewed in a direction perpendicular to the plane of the replication layer (3) are visible as being surrounded by a partially formed functional layer or an additional layer, and at least one first partially formed functional layer or an additional partially formed layer is formed. 28. A method of manufacturing a multilayer body (100v) containing at least one partially formed functional layer precisely aligned with at least one additional partially formed layer, wherein the first layer in the form of a first lacquer layer (12) of a photoresist is formed on a carrier layer ( 1) and partially exhibit; the exposed first layer is developed and structured, and then using the first structured layer as the template layer, at least one partially formed functional layer and / or at least one additional partially formed layer are formed. 29. The method according to p. 28, characterized in that at least one partially formed functional layer or at least an additional partially formed layer is formed by performing the procedure according to which a second varnish layer (12 ') of positive or negative photoresist mixed with coloring matter; the second varnish layer (12 ') of the photoresist is exposed through the first structured layer and the exposed second varnish layer (12') of the photoresist is structured. 30. The method according to p, characterized in that the first and / or second varnish layer (12, 12 ') of the photoresist forms at least one partially formed functional layer. 31. The method according to p. 28, characterized in that subsequently create a carrier layer (1) partially by diffusing the coloring matter into it in the form of a partially formed functional or additional layer, with at least the first and / or second structured varnish layer (12 12 ') of the photoresist serves as a diffusion barrier. 32. The method according to one of paragraphs 28-31, characterized in that the material is raked into open sections of the carrier layer (1), which, when viewed in the direction perpendicular to the plane of the carrier layer (1), are visible as surrounded by a partially formed functional layer or additional a partially formed layer, and at least one additional partially formed functional layer or an additional partially formed layer is formed. 33. The method according to one of claims 1 to 3, 28-30 and 31, characterized in that at least one partially formed functional layer is performed in the form of a varnish layer or a polymer layer. 34. The method according to one of claims 1 to 3, 28-30 and 31, characterized in that at least one partially formed functional layer is created by adding one or more, in particular non-metallic materials of the functional layer. 35. The method according to one of claims 1 to 3, 28-30 and 31, characterized in that at least one partially formed functional layer is created with the addition of one or more colored, in particular multicolor, materials of the functional layer, and / or at least one partially formed functional layer is in the form of a hydrophobic or hydrophilic layer. 36. The method according to one of claims 1 to 3, 28-30 and 31, characterized in that at least one additional partially formed layer is formed from the first layer (3m) and / or from at least one painted lacquer layer (12 , 12 ', 12' ', 12' '') of a positive or negative photoresist, and / or from at least one optically variable layer, which creates an optical effect that varies depending on the angle at which it is viewed, and / or at least at least one metal reflective layer and / or at least one dielectric reflective a layer (3m '). 37. The method according to clause 36, wherein the optically variable layer is a layer containing at least one substance having an optical effect, depending on the angle at which it is examined, and / or formed from at least one liquid crystal a layer having an optical effect that varies depending on the angle at which it is examined, and / or from a reflective layer from a set of layers of a thin film having an interference color effect depending on the angle at which it is watching. 38. The method according to one of claims 1 to 3, 28-30 and 31, characterized in that the first structured layer (3m) is at least partially removed and replaced by at least one partially formed functional layer and / or at least one additional partially formed layer. 39. The method according to § 38, characterized in that they completely remove the first structured layer (3m). 40. The method according to one of claims 1 to 3, 28-30 and 31, characterized in that at least one partially formed functional layer, when viewed in the direction perpendicular to the plane of the replication layer (3) or the carrier layer (1) are positioned to provide precise alignment above or below at least one additional partially formed layer. 41. The method according to one of claims 1 to 3, 28-30 and 31, characterized in that at least one partially formed functional layer, when viewed in the direction perpendicular to the plane of the replication layer (3) or the carrier layer (1) are positioned alternately or at regular intervals with respect to at least one additional partially formed layer. 42. The method according to one of claims 1 to 3, 28-30 and 31, characterized in that at least one first transparent separation layer (2 ') is located between at least one partially formed functional layer and at least one additional partially formed layer. 43. The method according to one of claims 1 to 3, 28-30 and 31, characterized in that at least one second transparent separation layer is arranged between at least two additional partially formed layers. 44. The method according to § 42, wherein the first and / or second separation layer is formed locally with at least two different layer thicknesses. 45. The method according to § 42, wherein the first and / or second separation layer is formed locally with a layer thickness in the range of less than 100 μm, in particular in the range of 2 to 50 μm. 46. The method according to claims 1-3, 28-30 and 31, characterized in that the first layer (3m) is applied over the entire surface area to the replication layer (3) or to the carrier layer (1) with a thickness in which the first layer ( 3m) is opaque to the human eye and, in particular, has an optical density in the range greater than 1.5. 47. The method according to item 46, wherein the first layer (3m) is applied with a thickness at which the first layer (3m) has an optical density in the range from 2 to 7. 48. The method according to claims 1-3, 28-30 and 31, characterized in that at least one partially formed functional layer and at least one additional partially formed layer are such that when viewed in a direction perpendicular to the plane of the replication layer ( 3) or the carrier layer (1), they complement each other in such a way that they create a decorative and / or informative geometric, alphanumeric, graphic, graphic or figurative representation, in particular a decorative element containing at least two liters SRI containing different functional material layers. 49. The method according to one of claims 1 to 3, 28-30 and 31, characterized in that at least one partially formed functional layer and at least one additional partially formed layer, respectively, are created in at least separate sections in linear form , while the lines pass into each other without lateral displacement and / or form a pattern of concentric circular lines. 50. The method according to 49, characterized in that the lines are adapted to transition into each other with a constant color configuration. 51. The method according to 49, characterized in that the lines are created when they are viewed in the direction perpendicular to the plane of the replication layer (3) or the carrier layer (1), with a width in the range of less than 100 microns, in particular in the range of 0.5 up to 50 microns. 52. The method according to one of claims 1 to 3, 28-30 and 31, characterized in that at least one partially formed functional layer is painted with at least one opaque and / or at least one transparent coloring material, which is at least at least in the wavelength range of the electromagnetic spectrum it is colored or color-creating, in particular it is brightly multicolor or creating bright multicolor; in particular, the coloring matter is contained in at least one functional partially formed layer, which can be excited outside the visible spectrum and can create a visually distinguishable color image. 53. The method according to paragraph 52, wherein the at least one partially formed functional layer and at least one additional partially formed layer are created using complementary colors. 54. The method according to paragraph 52, wherein the at least one coloring matter is selected from the group of inorganic or organic coloring matter, in particular pigments or dyes. 55. The method according to claim 1, characterized in that the replication layer (1) is located on the carrier layer (1). 56. The method according to one of claims 28 or 55, characterized in that the carrier layer (1) is adapted so that it can be separated from the formed multilayer body. 57. A multilayer body (100t), which can be obtained by the method according to claim 1 or according to claim 1 in combination with one of the items dependent on it, containing at least one partially formed functional layer, precisely aligned with at least one additional partially formed layer; wherein the first relief structure is formed on the first portion of the replication layer (3) of the multilayer body (100t); and at least one functional layer is deposited on the replication layer (3) in the first region or at least one second region in which the first relief structure is not formed in the replication layer (3), structured depending on the first relief structure. 58. The multilayer body according to Claim 57, wherein the at least one partially formed functional layer and / or at least one additional partially formed layer is coated on the back with a diffractive relief structure and presents a holographic or cineographic optically variable effect. 59. A multilayer body, which can be obtained by the method according to p. 28 or 28 in combination with one of the items dependent on it, containing at least one partially formed functional layer, precisely aligned with at least one additional partially formed layer, wherein the first layer in the form of the first varnish layer (12) of the photoresist is structured in the form of a pattern on the carrier layer (1), and using the first structured layer as a template layer, at least one partially formed anny functional layer and / or at least one additional layer is partially formed. 60. A multilayer body according to one of claims 57 to 59, characterized in that at least one partially formed functional layer and at least one additional partially formed layer complement each other to provide a decorative and / or informative geometric, alphanumeric, graphic, graphic or figurative color representation. 61. A multilayer body according to one of claims 57 to 59, characterized in that at least one partially formed functional layer and / or at least one additional partially formed layer is made in the form of at least one line with a width in the range of less than 50 μm in particular in the range from 0.5 to 10 microns, and / or made in the form of at least one pixel with a diameter in the range of less than 50 microns, in particular in the range from 0.5 to 10 microns. 62. A multilayer body according to one of claims 57 to 59, characterized in that at least one partially formed functional layer is, in particular, an opaque metal layer and at least one additional partially formed layer is a painted lacquer layer, or vice versa. 63. A multilayer body according to one of claims 57 to 59, characterized in that at least one partially formed functional layer is a layer containing liquid crystals, and at least one additional partially formed layer is a painted lacquer layer, or vice versa. 64. A multilayer body according to one of claims 57-59, characterized in that at least one partially formed functional layer is formed from a reflective layer from a set of layers of a thin film having an interference color effect depending on the viewing angle, and at least one the additional partially formed layer is a painted lacquer layer, or vice versa. 65. A multilayer body according to one of claims 57 to 59, characterized in that at least one partially formed functional layer is a first painted lacquer layer and at least one additional partially formed layer is an additional lacquered layer painted in a different color. 66. A multilayer body according to one of claims 57 to 59, characterized in that at least one partially formed functional layer is a first painted lacquer layer and at least one additional partially formed layer is a dielectric reflective layer. 67. The multilayer body according to claim 62, wherein the lacquer layer is painted with at least one opaque and / or at least one transparent substance. 68. The multilayer body according to Claim 67, wherein the colored lacquer layer is colored with at least one coloring material of yellow, magenta, cyan or black (CMYK model) or red, green or blue (RGB model), and / or at least one partially formed functional layer is made with at least one red, green and / or fluorescent pigment or dye excited by irradiation, whereby creating an additional color upon irradiation. 69. A multilayer body according to one of claims 57-59, characterized in that at least one partially formed functional layer and at least one additional partially formed layer are painted in complementary colors at least when viewed from a given angle or when exposed a given type of exposure. 70. A multilayer body according to one of claims 57-59, characterized in that at least one partially formed functional layer and at least one additional partially formed layer are respectively in the form of lines, so that the lines pass into each other without lateral displacement. 71. The multilayer body according to item 70, wherein the lines pass into each other with a constant color configuration. 72. A multilayer body according to one of claims 57 to 59, characterized in that at least one partially formed functional layer and / or at least one additional partially formed layer creates / creates a raster image formed from pixels, at least in portions, dots or image lines that cannot be distinguished individually by the human eye. 73. A multilayer body according to one of claims 57-59, characterized in that it contains at least two additional partially formed layers. 74. A multilayer body according to one of claims 57-59, characterized in that the first transparent separation layer (2 ') is formed between at least one partially formed functional layer and at least one additional partially formed layer. 75. A multilayer body according to one of paragraphs.57-59, characterized in that the second transparent separation layer is formed between at least two additional partially formed layers. 76. The multilayer body according to claim 74, wherein the at least one partially formed functional layer and at least one additional partially formed layer are such that at least one optical overlay effect is created, which can be observed depending on viewing angle. 77. A multilayer body according to one of claims 57 to 59, characterized in that the multilayer body (100t, 100v) is made in the form of a film element, in particular in the form of a transparent film, a hot-embossed film, or a laminated film. 78. A multilayer body according to claim 77, characterized in that the film element comprises an adhesive layer (2 ″) on at least one side. 79. A security element for security or security documents containing a multilayer body (100t, 100v) according to claim 57. 80. A security element for security or security documents containing a multilayer body (100t, 100v) according to claim 59. 81. The security element according to claim 79 or 80, characterized in that the security document or security document is a pass, passport, bank card, identity card, banknote, security, ticket or security packaging. 82. An electronic component comprising a multilayer body according to claim 57. 83. The electronic component containing a multilayer body according to § 59.

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