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PL1991038T3 - Sposób i urządzenie do aktywacji atmosfery pieca - Google Patents

Sposób i urządzenie do aktywacji atmosfery pieca

Info

Publication number
PL1991038T3
PL1991038T3 PL08155974T PL08155974T PL1991038T3 PL 1991038 T3 PL1991038 T3 PL 1991038T3 PL 08155974 T PL08155974 T PL 08155974T PL 08155974 T PL08155974 T PL 08155974T PL 1991038 T3 PL1991038 T3 PL 1991038T3
Authority
PL
Poland
Prior art keywords
activation method
furnace atmosphere
atmosphere activation
furnace
atmosphere
Prior art date
Application number
PL08155974T
Other languages
English (en)
Inventor
Zbigniew Zurecki
Knorr Robert Ellsworth Jr
John Lewis Green
Original Assignee
Air Prod & Chem
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Prod & Chem filed Critical Air Prod & Chem
Publication of PL1991038T3 publication Critical patent/PL1991038T3/pl

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/48Generating plasma using an arc
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Analytical Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
  • Carbon And Carbon Compounds (AREA)
PL08155974T 2007-05-09 2008-05-09 Sposób i urządzenie do aktywacji atmosfery pieca PL1991038T3 (pl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US92838507P 2007-05-09 2007-05-09
US12/113,565 US8268094B2 (en) 2007-05-09 2008-05-01 Furnace atmosphere activation method and apparatus
EP08155974.2A EP1991038B1 (en) 2007-05-09 2008-05-09 Furnace atmosphere activation method and apparatus

Publications (1)

Publication Number Publication Date
PL1991038T3 true PL1991038T3 (pl) 2015-03-31

Family

ID=39699682

Family Applications (1)

Application Number Title Priority Date Filing Date
PL08155974T PL1991038T3 (pl) 2007-05-09 2008-05-09 Sposób i urządzenie do aktywacji atmosfery pieca

Country Status (12)

Country Link
US (1) US8268094B2 (pl)
EP (1) EP1991038B1 (pl)
KR (2) KR101151190B1 (pl)
CN (1) CN101307422B (pl)
BR (1) BRPI0803083A8 (pl)
CA (1) CA2631064C (pl)
MX (1) MX2008006049A (pl)
MY (1) MY151853A (pl)
PL (1) PL1991038T3 (pl)
RU (1) RU2008118730A (pl)
SG (1) SG148109A1 (pl)
TW (1) TWI397611B (pl)

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WO2014039726A1 (en) 2012-09-05 2014-03-13 Powerdyne, Inc. System for generating fuel materials using fischer-tropsch catalysts and plasma sources
HK1212413A1 (en) 2012-09-05 2016-06-10 Powerdyne, Inc. Methods for power generation from h2o, co2, o2 and a carbon feed stock
HK1212279A1 (en) 2012-09-05 2016-06-10 Powerdyne, Inc. Method for sequestering heavy metal particulates using h2o, co2, o2, and a source of particulates
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TW201418476A (zh) * 2012-11-01 2014-05-16 Metal Ind Res & Dev Ct 用於小型熱處理爐之爐氣產生裝置
US9740382B2 (en) * 2013-01-23 2017-08-22 Fisher-Rosemount Systems, Inc. Methods and apparatus to monitor tasks in a process system enterprise
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JP2015130555A (ja) * 2014-01-06 2015-07-16 株式会社東芝 画像処理装置、画像処理方法、および画像投影装置
US10869502B2 (en) * 2015-07-31 2020-12-22 14Th Round Inc. Disposable assembly for vaporizing e-liquid and a method of using the same
CN205143486U (zh) * 2015-09-02 2016-04-13 深圳市合元科技有限公司 雾化头、雾化器及电子烟
CN106987792A (zh) * 2017-06-07 2017-07-28 上海颐柏热处理设备有限公司 一种常压下的乙炔渗碳炉
RU2682986C1 (ru) * 2017-10-30 2019-03-25 Федеральное государственное автономное образовательное учреждение высшего образования "Крымский федеральный университет имени В.И. Вернадского" Способ упрочнения стального изделия ионно-плазменной карбонитрацией
CN112933885B (zh) * 2021-03-05 2022-09-06 中北大学 一种超重力非平衡选择性吸收三聚氰胺尾气中氨的方法和装置
CN113414474B (zh) * 2021-07-09 2022-06-17 天津大学 一种以二氧化碳作为环境气氛的钛合金焊接系统和焊接方法
JP2025001296A (ja) * 2023-06-20 2025-01-08 株式会社ダイヘン プラズマ処理装置
CN119191695B (zh) * 2024-11-28 2025-04-11 安徽火凤凰新材料科技有限公司 一种微晶玻璃加工用晶化辊道窑及使用方法

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Also Published As

Publication number Publication date
CN101307422A (zh) 2008-11-19
TW200912039A (en) 2009-03-16
KR101151190B1 (ko) 2012-06-11
MX2008006049A (es) 2009-03-03
US20080283153A1 (en) 2008-11-20
TWI397611B (zh) 2013-06-01
BRPI0803083A8 (pt) 2018-04-24
RU2008118730A (ru) 2009-11-20
CA2631064C (en) 2011-09-27
MY151853A (en) 2014-07-14
BRPI0803083A2 (pt) 2011-08-16
KR101258010B1 (ko) 2013-04-24
KR20080099822A (ko) 2008-11-13
EP1991038A2 (en) 2008-11-12
EP1991038A3 (en) 2010-09-01
KR20110058763A (ko) 2011-06-01
US8268094B2 (en) 2012-09-18
CA2631064A1 (en) 2008-11-09
SG148109A1 (en) 2008-12-31
EP1991038B1 (en) 2014-10-01
CN101307422B (zh) 2011-10-05

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