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PL1809792T3 - Wspólny wieszak do operacji powlekania elektrolitycznego i PVD - Google Patents

Wspólny wieszak do operacji powlekania elektrolitycznego i PVD

Info

Publication number
PL1809792T3
PL1809792T3 PL05758558T PL05758558T PL1809792T3 PL 1809792 T3 PL1809792 T3 PL 1809792T3 PL 05758558 T PL05758558 T PL 05758558T PL 05758558 T PL05758558 T PL 05758558T PL 1809792 T3 PL1809792 T3 PL 1809792T3
Authority
PL
Poland
Prior art keywords
substrate
electroplating
coating
holder
coating operations
Prior art date
Application number
PL05758558T
Other languages
English (en)
Inventor
Klaus Brondum
Original Assignee
Vapor Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vapor Technologies Inc filed Critical Vapor Technologies Inc
Publication of PL1809792T3 publication Critical patent/PL1809792T3/pl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/06—Suspending or supporting devices for articles to be coated
    • C25D17/08—Supporting racks, i.e. not for suspending
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4581—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber characterised by material of construction or surface finish of the means for supporting the substrate
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48—After-treatment of electroplated surfaces

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Coating Apparatus (AREA)
PL05758558T 2004-06-17 2005-06-14 Wspólny wieszak do operacji powlekania elektrolitycznego i PVD PL1809792T3 (pl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/869,965 US7442285B2 (en) 2004-06-17 2004-06-17 Common rack for electroplating and PVD coating operations
PCT/US2005/020939 WO2006009686A1 (en) 2004-06-17 2005-06-14 Common rack for electroplating and pvd coating operations
EP05758558A EP1809792B1 (en) 2004-06-17 2005-06-14 Common rack for electroplating and pvd coating operations

Publications (1)

Publication Number Publication Date
PL1809792T3 true PL1809792T3 (pl) 2011-08-31

Family

ID=34972190

Family Applications (1)

Application Number Title Priority Date Filing Date
PL05758558T PL1809792T3 (pl) 2004-06-17 2005-06-14 Wspólny wieszak do operacji powlekania elektrolitycznego i PVD

Country Status (10)

Country Link
US (1) US7442285B2 (pl)
EP (1) EP1809792B1 (pl)
CN (1) CN1985028B (pl)
AT (1) ATE502137T1 (pl)
CA (1) CA2570977C (pl)
DE (1) DE602005026966D1 (pl)
ES (1) ES2360227T3 (pl)
MX (1) MXPA06014558A (pl)
PL (1) PL1809792T3 (pl)
WO (1) WO2006009686A1 (pl)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006032959B3 (de) * 2006-07-17 2007-12-27 JOH. WINKLHOFER & SÖHNE GMBH & Co. KG Werkstückträger für Vakuumbeschichtungsanlagen mit magnetischen Aufnahmekörpern
CN101204689B (zh) * 2006-12-20 2011-06-29 深圳富泰宏精密工业有限公司 夹具及应用该夹具的挂具结构
US7850830B2 (en) 2007-05-11 2010-12-14 Lacks Enterprises, Inc. Method and apparatus for racking articles for surface treatment
ITMI20090933A1 (it) * 2009-05-27 2010-11-28 Protec Surface Technologies S R L Apparato per la deposizione di film di rivestimento
DE102010000853A1 (de) * 2010-01-13 2011-07-14 Federal-Mogul Wiesbaden GmbH, 65201 Halter zur galvanischen Beschichtung von Gleitlagern und Werkzeug mit einem Halter
TWI412630B (zh) * 2011-05-23 2013-10-21 Wistron Corp Surface treatment fixture
US9017532B2 (en) * 2011-09-22 2015-04-28 Bradley A. Wright Electroplating process, system and components thereof
DE102013007454A1 (de) * 2013-05-02 2014-11-06 Oerlikon Trading Ag, Trübbach Vielseitige Haltevorrichtung zur Oberflächenbehandlung von stangenförmigen Substraten
JP6373803B2 (ja) * 2015-06-23 2018-08-15 東京エレクトロン株式会社 基板処理装置、基板処理方法および記憶媒体
USD818358S1 (en) * 2016-07-15 2018-05-22 Servi-Sure, LLC Rack for anodizing metal components
USD817166S1 (en) * 2016-07-15 2018-05-08 Servi-Sure, LLC Rack for anodizing metal components

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1005870A (en) * 1911-02-03 1911-10-17 Mortimer L Packer Device for supporting articles in an electroplating-bath.
US2793994A (en) * 1953-04-29 1957-05-28 Novitsky Joseph Plating rack with removable tips
US2898285A (en) * 1954-03-17 1959-08-04 Gen Motors Corp Electroplating rack
US2958642A (en) * 1955-05-26 1960-11-01 Belke Mfg Co Electroplating rack
US2820757A (en) * 1955-05-26 1958-01-21 Belke Mfg Co Plating racks and methods of racking articles for electroplating
US3042605A (en) * 1960-09-19 1962-07-03 Belke Mfg Co Electroplating racks
US3272733A (en) * 1963-04-15 1966-09-13 Belke Mfg Company Electroplating racks
US3357913A (en) * 1965-04-02 1967-12-12 Pilot Company Inc Electroplating rack
US3370974A (en) * 1965-10-20 1968-02-27 Ivan C. Hepfer Electroless plating on non-conductive materials
US3484361A (en) * 1967-06-12 1969-12-16 Lyman B Sperry Plating rack with plural layer plastisol coating
US3499832A (en) * 1967-09-11 1970-03-10 Frank A Hearn Jr Electroplating rack
US3533828A (en) * 1968-04-08 1970-10-13 Cosden Oil & Chem Co Metal plating of plastic surfaces
US3592744A (en) * 1968-12-02 1971-07-13 Macdermid Inc Method of preventing rack plating in continuous plating cycle for nonconductive articles
US3619243A (en) * 1970-02-17 1971-11-09 Enthone No rerack metal plating of electrically nonconductive articles
US3671416A (en) * 1971-02-08 1972-06-20 Belke Mfg Co Bulged sphincteral seals for electroplating racks
US3728232A (en) * 1971-12-10 1973-04-17 Chisso Corp Method of plating using a protective coating on an electroplating work support
US3939056A (en) * 1973-10-19 1976-02-17 Sony Corporation Coated plating rack
GB1512959A (en) 1974-10-16 1978-06-01 Lucas Electrical Ltd Electro-plating jigs
US4100054A (en) * 1977-03-11 1978-07-11 Essex Group, Inc. Combination insulating sleeve and electrical contact member for electro-plating rack
US4176039A (en) * 1979-03-02 1979-11-27 Wismer Joseph C Electroplating rack
US4872963A (en) * 1984-10-01 1989-10-10 Horn Samuel L Van Method and apparatus for improved electroplating and painting racks
JPS63161193A (ja) 1986-12-23 1988-07-04 Takaaki Murai メツキ用ハンガ−
US5879532A (en) * 1997-07-09 1999-03-09 Masco Corporation Of Indiana Process for applying protective and decorative coating on an article
JP2003520898A (ja) * 1998-07-10 2003-07-08 セミトゥール・インコーポレイテッド 化学メッキ及び電気メッキを使って銅メッキを行うための方法及び装置
JP2002526661A (ja) * 1998-10-02 2002-08-20 エヌケイティ リサーチ センター アクティーゼルスカブ 固体ポリマー基材表面のメタライジング方法およびそれにより得られる製品
KR100338112B1 (ko) * 1999-12-22 2002-05-24 박종섭 반도체 소자의 구리 금속 배선 형성 방법
US6391457B1 (en) * 1999-12-23 2002-05-21 Vapor Technologies, Inc. Coated article
US6399219B1 (en) * 1999-12-23 2002-06-04 Vapor Technologies, Inc. Article having a decorative and protective coating thereon
US6325899B1 (en) * 2000-03-10 2001-12-04 Action Caps, Llc Disposable and recyclable intermediates for use in electrostatic coating processes

Also Published As

Publication number Publication date
US7442285B2 (en) 2008-10-28
ATE502137T1 (de) 2011-04-15
CN1985028B (zh) 2010-10-27
ES2360227T3 (es) 2011-06-02
DE602005026966D1 (de) 2011-04-28
CN1985028A (zh) 2007-06-20
US20050279642A1 (en) 2005-12-22
CA2570977A1 (en) 2006-01-26
MXPA06014558A (es) 2007-03-23
WO2006009686A1 (en) 2006-01-26
EP1809792A1 (en) 2007-07-25
CA2570977C (en) 2012-07-24
EP1809792B1 (en) 2011-03-16

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